Ring for protecting a chamber block of a plasma processing device
Patent Information
- Application Number
- US29/847106
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Priority Date
- 2022-02-10
- Filing Date
- 2022-07-21
- Publication Date
- 2026-08-18
- Estimated Expiration
- 2041-08-18
Smart Images

Figure USD1143090-D00000_ABST
Description
[0001] FIG. 1 is a front, bottom and right side perspective view of a ring for protecting a chamber block of a plasma processing device according to the design;
[0002] FIG. 2 is a front view thereof;
[0003] FIG. 3 is a rear view thereof;
[0004] FIG. 4 is a right side view thereof;
[0005] FIG. 5 is a left side view thereof;
[0006] FIG. 6 is a top plan view thereof;
[0007] FIG. 7 is a bottom plan view thereof;
[0008] FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2; and,
[0009] FIG. 9 is an enlarged view of area 9 shown in FIG. 8.
[0010] The broken line box shown in FIG. 8 defines the enlarged portion view shown in FIG. 9 and forms no part of the claimed design.
Claims
The ornamental design for a ring for protecting a chamber block of a plasma processing device as shown and described.
Citation Information
Patent Citations
Discharge chamber for plasma treatment equipment
TWD186397S
Discharge chamber for a plasma processing apparatus
USD907593S
Elevator and atmospheric pressure control method of elevator
JP2017001755A
Cover ring for plasma processing systems
KR301227419S
Focus ring for plasma processing apparatus
US10170283B2