Cover ring for use in a semiconductor processing chamber

USD1145726SActive Publication Date: 2026-09-01APPLIED MATERIALS INC
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Patent Information

Application Number
US29/949945
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2024-06-28
Publication Date
2026-09-01
Estimated Expiration
2041-09-01

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Description

[0001] FIG. 1 is a bottom isometric view of a cover ring for use in a semiconductor processing chamber in accordance with some embodiments.

[0002] FIG. 2 is a top plan view thereof.

[0003] FIG. 3 is a bottom plan view thereof.

[0004] FIG. 4 is a front elevation view thereof.

[0005] FIG. 5 is a back elevation view thereof.

[0006] FIG. 6 is a right side elevation view thereof; and,

[0007] FIG. 7 is a left side elevation view thereof.

[0008] The broken lines in the drawings illustrate portions of the cover ring for use in a semiconductor processing chamber that form no part of the claimed design.

Claims

The ornamental design for a cover ring for use in a semiconductor processing chamber, as shown and described.

Citation Information

Patent Citations

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    US20040149226A1

  • Clamp member, film deposition apparatus, film deposition method, and semiconductor device manufacturing method

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    US20100065216A1

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    US20140130743A1