Systems and methods for creating garment pattern simulation drawings.
VN125887APending Publication Date: 2026-06-15JEN CATHOLIC UNIV
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Patent Information
- Authority / Receiving Office
- VN · VN
- Patent Type
- Applications
- Current Assignee / Owner
- JEN CATHOLIC UNIV
- Filing Date
- 2025-05-28
- Publication Date
- 2026-06-15
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Abstract
The invention relates to a system and method for generating a simulated garment pattern drawing. The system comprises an input device configured to input a standardized design drawing and design drawing outline; an outline style recognition module configured to recognize the design drawing outline style; a definition module configured to determine the number of human body parts and joints corresponding to the design drawing outline; a pattern generation module configured to calculate the number of combinations of garment technical drawings; a garment technical and simulation drawing module configured to generate a garment technical drawing and outline a simulated garment drawing on the design drawing outline according to the garment technical drawing; and a garment pattern simulation drawing module configured to generate a monolithic garment pattern simulation drawing according to the garment simulation drawing.
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