COMPOUNDS, PREPARATIONS, SURFACE TREATMENTS, METHODS OF MANUFACTURING, AND PRODUCTS

Abstract

The invention proposes a novel compound and a novel useful composition as a surface treatment capable of forming a treated surface layer of excellent light stability on a substrate, a surface treatment capable of forming such a treated surface layer, a method of producing an article comprising such a treated surface layer, and an article. A compound represented by Formula (1-1) or Formula (1-2). TO-(Si(R2)2-O)m-Si(R2)2-A-(Si(R)nL3-n)q (1-1) ((R)nL3-nSi)qA-(Si(R2)2-O)m-Si(R2)2-A-(Si(R)nL3-n)q (1-2)

Description

Compound, composition, surface treatment agent, method for producing article, and article

[0001] The present disclosure relates to compounds, compositions, surface treatment agents, methods for producing articles, and articles.

[0002] In recent years, there has been a demand for technologies that make surfaces of articles less susceptible to fingerprints and that make them easier to remove stains, in order to improve performance such as appearance and visibility. As a specific method, a method of performing a surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Document 1 describes a silane compound having a specific siloxane group that is used in the above-mentioned surface treatment agent.

[0004] International Publication No. 2023 / 017830

[0005] On the other hand, when a surface treatment layer was formed using the silane compound described in Patent Document 1, it was found that further improvement in the light resistance of the surface treatment layer formed was necessary.

[0006] The present disclosure has been made in consideration of these circumstances, and a problem to be solved by one embodiment of the present invention is to provide novel compounds and compositions useful as surface treatment agents capable of forming a surface treatment layer having excellent light resistance on a substrate. Another problem to be solved by one embodiment of the present invention is to provide a surface treatment agent capable of forming a surface treatment layer having excellent light resistance on a substrate. Another problem to be solved by one embodiment of the present invention is to provide a method for producing an article having a surface treatment layer having excellent light resistance, and the article.

[0007] The present disclosure includes the following aspects. [1] A compound represented by formula (1-1) or formula (1-2) described later. [2] The compound according to [1], wherein the compound represented by formula (1-1) is a compound represented by formula (2) described later, a compound represented by formula (3) described later, or a compound represented by formula (4) described later. [3] The compound according to [1], wherein m is an integer of 2 to 600. [4] The compound according to [1] or [3], wherein q is an integer of 1 to 4. [5] The compound according to [2], wherein m is an integer of 2 to 600. [6] The compound according to [2] or [5], wherein q is an integer of 1 to 4. [7] A composition comprising the compound according to any one of [1] to [6] and a liquid medium. [8] A surface treatment agent comprising the compound according to any one of [1] to [6]. [9] A surface treatment agent comprising the compound according to any one of [1] to [6] and a liquid medium.

[10] A method for manufacturing an article, comprising surface treating a substrate with the surface treatment agent according to [8] to manufacture an article having a surface treatment layer formed on the substrate.

[11] An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to [8].

[12] The article according to

[11] , which is an optical member.

[13] The article according to

[11] or

[12] , which is a display or a touch panel.

[14] A method for manufacturing an article, comprising surface treating a substrate with the surface treatment agent according to [9] to manufacture an article having a surface treatment layer formed on the substrate.

[15] An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to [9].

[16] The article according to

[15] , which is an optical member.

[17] The article according to

[15] or

[16] , which is a display or a touch panel.

[0008] According to one embodiment of the present invention, there are provided novel compounds and compositions useful as surface treatment agents capable of forming a surface treatment layer having excellent light resistance on a substrate. According to one embodiment of the present invention, there is provided a surface treatment agent capable of forming a surface treatment layer having excellent light resistance on a substrate. According to one embodiment of the present invention, there are provided a method for producing an article having a surface treatment layer having excellent light resistance, and the article.

[0009] In this specification, numerical ranges indicated using "to" include the numerical values ​​before and after "to" as the minimum and maximum values, respectively. In numerical ranges described in stages in this specification, the upper or lower limit value described in one numerical range may be replaced with the upper or lower limit value of another numerical range described in stages. Furthermore, in numerical ranges described in this specification, the upper or lower limit value of that numerical range may be replaced with a value shown in the Examples. In this specification, a "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. In this specification, "Me" refers to a methyl group. In this specification, when a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively.

[0010] The bonding direction of divalent groups represented in this specification is not limited unless otherwise specified. For example, when Y is -COO- in a compound represented by the formula "X-Y-Z", Y may be -CO-O- or -O-CO-. In addition, the compound may be "X-CO-O-Z" or "X-O-CO-Z".

[0011] [Compound] The compound of the present disclosure is a compound represented by formula (1-1) described below or a compound represented by formula (1-2) described below. In this specification, the compound of the present disclosure refers to at least one of the compounds represented by formula (1-1) and formula (1-2).

[0012] The compound of the present disclosure has a linking group having an alicyclic structure which may have a heteroatom at a specific position, and although the detailed reason is not clear, by using such a compound of the present disclosure, a surface treatment layer having excellent light resistance can be formed.

[0013] The compounds of the present disclosure will be described in detail below.

[0014] <Compound represented by formula (1-1)> TO-(Si(R ２ ) ２ -O) ｍ -Si(R ２) ２ -A-(Si(R) ｎ L ３－ｎ ) ｑ (1-1) In formula (1-1), T is (R １ ) ３ Si—, a monovalent cyclic polysiloxane residue, or a monovalent cage-like polysiloxane residue, R １ are each independently a hydrocarbon group or a trialkylsilyloxy group, R ２ are each independently a hydrocarbon group or a trialkylsilyloxy group, A is a (q+1)-valent linking group having an alicyclic structure which may have a heteroatom, R is each independently a hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, m is a number of 0 or more, n is each independently an integer of 0 to 2, and q is an integer of 1 or more.

[0015] In formula (1-1), T is (R １ ) ３ Si-, a monovalent cyclic polysiloxane residue, or a monovalent cage polysiloxane residue.

[0016] R １ Examples of the hydrocarbon group represented by the formula include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R １ The hydrocarbon group represented by the formula (I) is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and particularly preferably a methyl group.

[0017] R １ The alkyl group contained in the trialkylsilyloxy group represented by the formula (R) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. １The number of carbon atoms in the alkyl group contained in the trialkylsilyloxy group represented by R is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. １ The alkyl group contained in the trialkylsilyloxy group represented by the formula (I) is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group.

[0018] Multiple R １ may be the same or different from each other, and from the viewpoint of ease of production, it is preferable that they are the same.

[0019] Among these, from the viewpoint of improving the water repellency of the surface treatment layer, R １ is preferably a linear alkyl group or a trialkylsilyloxy group in which the alkyl group is a linear alkyl group, more preferably a methyl group, an ethyl group, an n-propyl group, an n-butyl group, or a trimethylsilyloxy group, and even more preferably a methyl group or a trimethylsilyloxy group. (R １ ) ３ Examples of groups represented by Si- include a methyldiethylsilyl group, a methylethylpropylsilyl group, a methylethylbutylsilyl group, a methyldipropylsilyl group, a methylpropylbutylsilyl group, a methyldibutylsilyl group, a dimethylethylsilyl group, a dimethylpropylsilyl group, a dimethylbutylsilyl group, a trimethylsilyl group, a triethylsilyl group, a tri-n-propylsilyl group, a tri-isopropylsilyl group, a tris(trimethylsilyloxy)silyl group, a methylbis(trimethylsilyloxy)silyl group, and a dimethyl(trimethylsilyloxy)silyl group.

[0020] The monovalent cyclic polysiloxane residue is preferably a group represented by formula (T1).

[0021]

[0022] In formula (T1), R ３ each independently represents a hydrocarbon group, a hydrocarbon group having a substituent, or —O—SiR ５１ ３ where s is an integer of 1 to 4, and R ５１are each independently a hydrocarbon group or a trialkylsilyloxy group, and * is a bonding position.

[0023] R ３ Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group.

[0024] R ３ The alkyl group as one embodiment of the hydrocarbon group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 1 to 4. Specifically, R ３ The alkyl group represented by the formula (I) is preferably a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an isobutyl group, or a heptyl group, and more preferably a methyl group.

[0025] R ３ Examples of the hydrocarbon group contained in the hydrocarbon group having a substituent represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group contained in the substituted alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 2 to 4.

[0026] R ３ Examples of the substituent in the hydrocarbon group having a substituent represented by the formula: include a halogen atom, a hydroxyl group, an alkoxy group, a trialkylsilyl ether group, a trialkylsilyl group, an amino group, a nitro group, a cyano group, a sulfonyl group, a trifluoromethyl group, and —SiR ５２ ３ Examples of the group include a group represented by the following formula: ５２ are each independently a hydrocarbon group or a trialkylsilyloxy group.

[0027] R ５２ The hydrocarbon group represented by R ３The hydrocarbon groups represented by R ５２ The alkyl group contained in the trialkylsilyloxy group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 8, even more preferably 1 to 4, and particularly preferably 1. The three alkyl groups contained in the trialkylsilyloxy group may be the same or different from each other.

[0028] The Three Rs ５２ may be the same or different from each other, but from the viewpoint of ease of production, it is preferable that they are the same.

[0029] R ３ -O-SiR ５１ ３ In the group represented by ５１ are each independently a hydrocarbon group or a trialkylsilyloxy group. ５１ The hydrocarbon group represented by R ３ The hydrocarbon groups represented by R ５１ The trialkylsilyloxy group represented by R ５２ Examples include the same as the trialkylsilyloxy group represented by the following formula:

[0030] Multiple R ３ may be the same or different from each other, but from the viewpoint of ease of production, it is preferable that they are the same.

[0031] Examples of the monovalent cyclic polysiloxane residue include the following groups: * indicates a bonding position.

[0032]

[0033]

[0034] The monovalent cage-like polysiloxane residue is preferably a group represented by formula (T2).

[0035]

[0036] In formula (T2), R４ are each independently a hydrocarbon group or a trialkylsilyloxy group, and * indicates the bonding position.

[0037] R ４ Examples of the hydrocarbon group represented by the formula include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group or a branched alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R ４ The hydrocarbon group represented by the formula (I) is more preferably a methyl group, an ethyl group, an n-propyl group, an n-butyl group, or an isobutyl group, and particularly preferably an isobutyl group.

[0038] R ４ The alkyl group contained in the trialkylsilyloxy group represented by the formula (R) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. ４ The number of carbon atoms in the alkyl group contained in the trialkylsilyloxy group represented by R is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. １ The hydrocarbon group represented by the formula (I) is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group.

[0039] Multiple R ４ may be the same or different from each other, and from the viewpoint of ease of production, it is preferable that they are the same.

[0040] Examples of the monovalent cage-like polysiloxane residue include the following groups: * indicates a bonding site.

[0041]

[0042] In formula (1-1), R ２ are each independently a hydrocarbon group or a trialkylsilyloxy group. ２ are each independently preferably a hydrocarbon group.２ The number of carbon atoms is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4.

[0043] R ２ When is a hydrocarbon group, the hydrocarbon group is preferably an aliphatic hydrocarbon group, more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and even more preferably 1 to 4 carbon atoms. The hydrocarbon group is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and particularly preferably a methyl group.

[0044] R ２ When is a trialkylsilyloxy group, the alkyl group contained in the trialkylsilyloxy group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group contained in the trialkylsilyloxy group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. The alkyl group contained in the trialkylsilyloxy group is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group.

[0045] In formula (1-1), each R is independently a hydrocarbon group. Examples of the hydrocarbon group represented by R include R ２ Examples of the hydrocarbon groups include those represented by the following formula:

[0046] In formula (1-1), each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. A hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. That is, a hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si-OH through a hydrolysis reaction. The silanol groups further react with each other to form Si-O-Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0047] Examples of hydrolyzable groups include alkoxy groups, aryloxy groups, halogen atoms, acyl groups, acyloxy groups, and isocyanato groups (-NCO). The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.

[0048] Examples of the group having a hydrolyzable group include the groups having a hydrolyzable group exemplified above. Ａ -L Ｂ is preferred. Ａ is an alkylene group, and L Ｂ is a hydrolyzable group. The alkylene group preferably has 1 to 10 carbon atoms. Ｂ The hydrolyzable group represented by the formula (I) has the same meaning as the hydrolyzable group represented by L described above, and the preferred embodiments are also the same.

[0049] Among these, from the viewpoint of ease of production of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom. L is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably an ethoxy group or a methoxy group, from the viewpoint of less outgassing during coating and better storage stability of the compound.

[0050] In formula (1-1), m is a number of 0 or more. m may be 1 or more. m is preferably a number of 2 to 600, more preferably a number of 3 to 500, even more preferably a number of 9 to 50, particularly preferably a number of 11 to 30, and most preferably a number of 11 to 25. In formula (1-1) or formula (1-2), "(Si(R ２ ) ２ The number m of repeating units represented by (a) (—O)) is an average value calculated from data obtained by measuring the compound by nuclear magnetic resonance (NMR).

[0051] In formula (1-1), n ​​is each independently an integer of 0 to 2. n is preferably 0 or 1, and more preferably 0. The presence of multiple Ls strengthens the adhesion of the surface treatment layer to the substrate. When n is 1 or less, multiple Ls present in one molecule may be the same or different from each other. From the viewpoint of easy availability of raw materials and ease of production of the compound, it is preferable that multiple Ls are the same. When n is 2, multiple Rs present in one molecule may be the same or different from each other. From the viewpoint of easy availability of raw materials and ease of production of the compound, it is preferable that multiple Rs are the same.

[0052] In formula (1-1), q is an integer of 1 or more. In order to improve the light resistance of the surface treatment layer, q is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably an integer of 1 to 3. When q is an integer of 2 or more, a plurality of [Si(R) ｎ L ３－ｎ From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable to use a plurality of [Si(R) ｎ L ３－ｎ ] are preferably the same.

[0053] In formula (1-1), A represents a (q+1)-valent linking group having an alicyclic structure which may have a heteroatom. Hereinafter, the ring constituting the alicyclic structure which may have a heteroatom contained in the compound of the present disclosure is also referred to as a "specific ring structure."

[0054] The specific ring structure possessed by A may be any of a monocycle, a fused polycycle, a bridged ring, a spiro ring, and an aggregate polycycle, so long as it is a ring that does not have aromaticity. The atoms constituting the ring may be a carbocycle consisting of only carbon atoms, or a heterocycle consisting of a heteroatom having a valence of divalent or higher and a carbon atom. Furthermore, the bond between the atoms constituting the ring may be a single bond, or a multiple bond as long as the ring is non-aromatic. The monocycle is preferably a 4- to 8-membered ring, and more preferably a 5- or 6-membered ring. The fused polycycle is preferably a fused polycycle in which two or more 4- to 8-membered rings are fused, more preferably a fused polycycle in which two to four rings selected from 5- and 6-membered rings are bonded, or more preferably a fused polycycle in which one or two rings selected from 5- and 6-membered rings are bonded to one 4-membered ring. The bridged ring is preferably a bridged ring in which the largest ring is a 5- or 6-membered ring, and more preferably an adamantane ring. The spiro ring is preferably a spiro ring consisting of two 4- to 6-membered rings. The assembled polycycle is preferably an assembled polycycle in which two or three rings selected from 5-membered rings and 6-membered rings are bonded via single bonds. The heteroatom constituting the specific ring structure is preferably a nitrogen atom, an oxygen atom, a sulfur atom, or a silicon atom, more preferably a nitrogen atom or an oxygen atom. The number of heteroatoms constituting the specific ring structure is preferably three or less. Furthermore, when the number of heteroatoms constituting the specific ring structure is two or more, these heteroatoms may be the same or different.

[0055] As the specific ring structure, from the viewpoints of ease of production of the compound and further excellent light resistance of the surface treatment layer, one selected from the group consisting of 3- to 8-membered aliphatic rings, 3- to 8-membered heteroaliphatic rings, fused rings in which 2 to 4 of these rings are fused, bridged rings in which the largest ring is a 5- or 6-membered ring, and assembled polycycles having two or more of these rings and connected by single bonds is preferred. Preferred rings are 5- or 6-membered aliphatic rings, 5- or 6-membered heterocycles having nitrogen atoms or oxygen atoms, fused rings in which 2 to 4 5- or 6-membered carbocyclic rings are fused, bridged rings in which the largest ring is a 5- or 6-membered ring, or fused rings of a 5- or 6-membered bridged ring in which the largest ring is a 5- or 6-membered ring and a 5-membered heterocycle. Examples of specific ring structures include the rings shown below, as well as a 1,3-cyclohexadiene ring, a 1,4-cyclohexadiene ring, a cyclopropane ring, a norbornene ring, a norbornadiene ring, a morpholine ring, an aziridine ring, a pyran ring, and an indene ring. Rings having an oxo group (═O) are also shown below. R in the following fused rings is a hydrogen atom or a methyl group.

[0056]

[0057]

[0058] In formula (1-1), A may be composed of only the specific ring structure, or may be a group combining at least one specific ring structure and at least one divalent or higher linking group. The divalent or higher linking group that A may have may be any group that does not impair the effects of the present disclosure, and examples thereof include alkylene groups that may have an etheric oxygen atom or a divalent organopolysiloxane residue, carbon atoms, nitrogen atoms, silicon atoms, and divalent to octavalent organopolysiloxane residues, as well as [-L １ -L ２ -L ３ -], [-L ４ -L ５ - (L ６ - *) ｒ ], and [-L ７ -L ８ -L ９ -L １０ - (L１１ - *) ｓ ]. * indicates [Si(R) ｎ L ３－ｎ ] represents the bonding position.

[0059] The compound represented by formula (1-1) is preferably a compound represented by the following formula (2), a compound represented by the following formula (3), or a compound represented by the following formula (4): (R １ ) ３ Si-O-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L １ -L ２ -L ３ -(Si(R) ｎ L ３－ｎ ) ｑ (2) (R １ ) ３ Si-O-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ４ -L ５ - (L ６ -Si(R) ｎ L ３－ｎ ) ｒ (3) (R １ ) ３ Si-O-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ７ -L ８ -L ９ -L １０ - (L １１ -Si(R) ｎ L ３－ｎ ) ｓ (4) In formula (2), L １ is a single bond or a divalent linking group, and L ２ is a divalent alicyclic group which may have a heteroatom, and L ３ is a (q+1)-valent linking group. ４is a single bond or a divalent linking group, and L ５ is an (r+1)-valent alicyclic group which may have a heteroatom, and L ６ are each independently a single bond or a divalent linking group, and r is an integer of 1 or more. ７ and L ９ are each independently a single bond or a divalent linking group, and L ８ is a divalent alicyclic group which may have a heteroatom, and L １０ is an (r+1)-valent alicyclic group which may have a heteroatom, and L １１ are each independently a single bond or a divalent linking group, and s is an integer of 1 or more. Among these, a compound represented by formula (2) or a compound represented by formula (4) is more preferred.

[0060] The compound represented by formula (2), the compound represented by formula (3), and the compound represented by formula (4) will be described below.

[0061] The compound represented by formula (1-1) may be a compound represented by formula (2) above. １ is a single bond or a divalent linking group. Examples of the divalent linking group include a divalent hydrocarbon group, —O—, —S—, and —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, and groups formed by combining two or more of these. １ -Si(R ２ ) ２ The terminal of the - side is -O-Si(R ａ ) ２ - is not. Also, L １The divalent linking group represented by the formula (I) is preferably a divalent group other than a divalent alicyclic group which may have a heteroatom. The divalent hydrocarbon group may be a divalent linear or branched saturated hydrocarbon group, an alkenylene group, or an alkynylene group. Examples of the divalent linear or branched saturated hydrocarbon group include an alkylene group. The alkylene group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, even more preferably 4 to 20, and particularly preferably 5 to 15. The alkenylene group preferably has 2 to 20 carbon atoms, and the alkynylene group preferably has 2 to 20 carbon atoms. The R ａ is an alkyl group (preferably having 1 to 10 carbon atoms). ｄ is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms). Examples of groups formed by combining two or more of these groups include -C(O)O-, -C(O)S-, and -C(O)N(R ｄ ) -, -N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-,-SO ２ N (R ｄ )-, -C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ an alkylene group having —SO ２ N (R ｄ )- and alkylene groups -C(O)N(R ｄ )-alkylene groups. １ represents a single bond, a divalent alkylene group, —O—, —S—, or —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -N(R ｄ)C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-,-SO ２ N (R ｄ )-, -C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ an alkylene group having —SO ２ N (R ｄ )- or an alkylene group -C(O)N(R ｄ )-alkylene group is preferred, and a single bond, an alkylene group, —C(O)O—, —C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ )- or an alkylene group -C(O)N(R ｄ )-alkylene group is more preferred, and a single bond, an alkylene group, an alkylene group having an etheric oxygen atom, or an alkylene group —C(O)N(R ｄ )-alkylene groups are more preferred.

[0062] In formula (2), L ２ is a divalent alicyclic group which may have a heteroatom. The divalent alicyclic group which may have a heteroatom is a group having the specific ring structure described above, and the preferred embodiments are also the same. ２preferably contains a ring selected from the group consisting of a cyclopentane ring, a cyclohexane ring, an adamantane ring, a piperidine ring, and the following fused rings, and more preferably contains an adamantane ring. The definition of R is as described above.

[0063]

[0064] The bond of the atom constituting the specific ring structure that does not constitute the ring is L. １ or L ３ is a bond bonded to the carbon atom. When there is a remaining bond, the remaining bond is bonded to a hydrogen atom or a substituent. Examples of the substituent include a halogen atom, an alkyl group (which may contain an etheric oxygen atom between carbon atoms), an alkenyl group, an allyl group, an alkoxy group, and an oxo group (═O). The remaining bond is preferably bonded to a hydrogen atom or an alkyl group, and more preferably to a hydrogen atom. The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 carbon atom.

[0065] In formula (2), L ３ is a (q+1)-valent linking group. ３ is preferably the group (3-1A) or the group (3-1B), and more preferably the group (3-1A).

[0066] -Q ａ -X ３１ (-Q ｂ - *) ｈ (-R ３１ ) ｉ (3-1A) -Q ｃ - [CH ２ C (R ３２ ) (-Q ｄ -*) ｙ -R ３３ (3-1B) In the formulas (3-1A) and (3-1B), * represents [—Si(R) ｎ L ３－ｎ ] is the bonding position.

[0067] In formula (3-1A), Q ａ is a single bond or a divalent linking group. ３１ When is an alkylene group, Qａ X ３１ The terminal on the side bonding to is not an alkylene group. １ It is the same as the definition explained in Q. ａ represents a divalent alkylene group, —O—, —S—, —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-,-SO ２ N (R ｄ )-, -C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ an alkylene group having —SO ２ N (R ｄ )- or an alkylene group -C(O)N(R ｄ )-alkylene group is preferred, and alkylene group, —C(O)O—, —C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ )- or an alkylene group -C(O)N(R ｄ )-alkylene group is more preferred, and alkylene group, —C(O)N(R ｄ )- or an alkylene group -C(O)N(Rｄ )-alkylene group is more preferred. ａ and R ｄ The definition and preferred embodiments of are as described above.

[0068] In formula (3-1A), X ３１ is an alkylene group, a nitrogen atom, a carbon atom, a silicon atom, or a divalent to octavalent organopolysiloxane residue. The alkylene group may have -O-, a divalent organopolysiloxane residue, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a divalent organopolysiloxane residue, and a dialkylsilylene group. X ３１ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 20, and more preferably 1 to 10. Examples of the divalent to octavalent organopolysiloxane residue include a divalent organopolysiloxane residue and a (w+1)-valent organopolysiloxane residue described below.

[0069] Among them, X ３１ From the viewpoint of improving the light resistance of the surface treatment layer, is preferably a nitrogen atom, a carbon atom, a silicon atom, or a tetravalent to octavalent organopolysiloxane residue, and more preferably a carbon atom.

[0070] In formula (3-1A), Q ｂ is a single bond or a divalent linking group. The definition of a divalent linking group is the same as that of Q ａ This is the same as the definition explained in Q. ｂ If there are two or more, there are two or more Q ｂ may be the same or different.

[0071] Among them, Q ｂ is preferably an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10, 2 to 6, or 2 to 5. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0072] In formula (3-1A), R ３１is a hydrogen atom, a hydroxyl group, or an alkyl group. ３１ If there are two or more, there are two or more (-R ３１ The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 carbon atom.

[0073] X ３１ When X is a single bond or an alkylene group, h is 1 and i is 0; ３１ is a nitrogen atom, h is an integer of 1 to 2, i is an integer of 0 to 1, and h+i=2 is satisfied; ３１ is a carbon atom or a silicon atom, h is an integer of 1 to 3, i is an integer of 0 to 2, and h+i=3 is satisfied; ３１ When is a divalent to octavalent organopolysiloxane residue, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7 is satisfied.

[0074] In particular, from the viewpoint of improving the light resistance of the surface treatment layer, i is preferably 0 or 1. Furthermore, from the viewpoint of improving the light resistance of the surface treatment layer, h is preferably 2 or 3.

[0075] In formula (3-1B), Q ｃ is a single bond or a divalent linking group. The definition of the divalent linking group is the same as that of the above L １ This is the same as the definition explained in

[0076] In formula (3-1B), R ３２ is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and is preferably a hydrogen atom in view of ease of production of the compound. As the alkyl group, a methyl group is preferred.

[0077] In formula (3-1B), Q ｄ is a single bond or an alkylene group. The alkylene group preferably has 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, and may have 1 to 10 carbon atoms or 1 to 6 carbon atoms. The alkylene group may also have 2 to 20 carbon atoms.

[0078] In formula (3-1B), R ３３ is a hydrogen atom or a halogen atom, and is preferably a hydrogen atom in view of ease of producing the compound.

[0079] y is an integer of 1 to 10, preferably an integer of 1 to 6. ２ C (R ３２ ) (-Q ｄ -*)] may be the same or different.

[0080] -L ３ -(Si(R) ｎ L ３－ｎ ) ｑ and L ３ As the group (3-1A), groups (3-1A-1) to (3-1A-7) are preferred.

[0081] -L ａ -(X ３２ ) ｓ１ -Q ｂ１ -Si(R) ｎ L ３－ｎ (3-1A-1) -L ａ -(X ３３ ) ｓ２ -Q ａ２ -N[-Q ｂ２ -Si(R) ｎ L ３－ｎ ] ２ (3-1A-2) -Q ａ３ -Si(R ｇ ) [-Q ｂ３ -Si(R) ｎ L ３－ｎ ] ２ (3-1A-3) -L ａ - [Q ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -C[-(O) ｕ４ -Q ｂ４ -Si(R) ｎ L ３－ｎ ] ３－ｗ１ (-R ３１ ) ｗ１ (3-1A-4) -Q ａ５ -Si[-Q ｂ５ -Si(R) ｎ L ３－ｎ ] ３ (3-1A-5) -L ａ - [Q ｅ ] ｖ -Qａ６ -Z ａ [-Q ｂ６ -Si(R) ｎ L ３－ｎ ] ｗ２ (3-1A-6) -L ａ - [Q ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -Z ｃ [-(O-Q ｂ４ ) ｕ４ -Si(R) ｎ L ３－ｎ ] ｗ３ (-OH) ｗ４ (3-1A-7) In the formulae (3-1A-1) to (3-1A-7), the definitions and preferred embodiments of R, L, and n are as described above.

[0082] Among them, the group (3-1A) is a group (3-1A-1) or a group (3-1A-4) to Si(R) ｎ L ３－ｎ The group (3-1A-4) is preferably a group obtained by removing Si(R) ｎ L ３－ｎ Groups excluding are more preferred.

[0083] In the formulae (3-1A-1), (3-1A-2), (3-1A-4), (3-1A-6) and (3-1A-7), L ａ is a single bond or an alkylene group. Examples of the alkylene group include １ The alkylene group has the same meaning as the alkylene group exemplified as the divalent linking group represented by the following formula (1), and preferred embodiments are also the same.

[0084] In the group (3-1A-1), X ３２ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ ) - (where N in the formula is Q ｂ１ (Binds to R ｄThe definition and preferred embodiments of are as described above. s1 is 0 or 1.

[0085] Among them, X ３２ is -O-, -S-, -N(R ｄ )-, -C(O)O-, -C(O)S-, -N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )- is preferred, and —C(O)O— or —C(O)N(R ｄ )- is more preferred.

[0086] Q ｂ１ is a single bond or an alkylene group. The alkylene group may have -O- or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a divalent organopolysiloxane residue, and a dialkylsilylene group. When the alkylene group has -O-, a divalent organopolysiloxane residue, or a dialkylsilylene group, it is preferable that these groups be present between carbon atoms. Q ｂ１ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, still more preferably 2 to 20, and particularly preferably 2 to 6. The number of carbon atoms may also be 1 to 10.

[0087] Among them, s1 is preferably 1, and Q ｂ１ is preferably an alkylene group having 2 to 6 carbon atoms.

[0088] [-(X ３２ ) ｓ１ -Q ｂ１ -Si(R) ｎ L ３－ｎ In the following formula, * represents L ２ This is the bonding position with

[0089]

[0090]

[0091] In the group (3-1A-2), X ３３is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )-. R ｄ The definition and preferred embodiments of are as described above. s2 is 0 or 1. s2 is preferably 0 in view of ease of production of the compound.

[0092] Q ａ２ represents a single bond, an alkylene group, -C(O)-, or an etheric oxygen atom, -C(O)-, -C(O)O-, -N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-,-SO ２ N (R ｄ )-, -C(O)N(R ｄ )- or -NH-. ｄ The definition and preferred embodiments of are as described above. ａ２ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 20, more preferably 1 to 10, even more preferably 1 to 6, and particularly preferably 1 to 3. ａ２ an ether oxygen atom between carbon atoms of an alkylene group having two or more carbon atoms, represented by —C(O)—, —C(O)O—, —N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-,-SO ２ N (R ｄ )-, -C(O)N(R ｄ The group having — or —NH— preferably has 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms.

[0093] Q ａ２ is preferably a single bond in terms of ease of production of the compound.

[0094] Q ｂ２is an alkylene group or a group having a divalent organopolysiloxane residue, an etheric oxygen atom, or —NH— between carbon atoms of an alkylene group having two or more carbon atoms. ｂ２ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. ｂ２ The number of carbon atoms in the divalent organopolysiloxane residue, the group having an etheric oxygen atom or an —NH— group between carbon atoms of the alkylene group having 2 or more carbon atoms, represented by the following formula (I), is preferably 2 to 10, and more preferably 2 to 6.

[0095] Q ｂ２ As the compound, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ OCH ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si).

[0096] Two [-Q ｂ２ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0097] [-(X ３３ ) ｓ２ -Q ａ２ -N[-Q ｂ２ -Si(R) ｎ L ３－ｎ ] ２ In the following formula, * represents L ２ In addition, in the formula, the bond to the reactive silyl group (CH ２ ) αIn the formula, α is an integer representing the number of methylene groups, and is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20. It may be 2 to 10, or may be 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10. Multiple α groups contained in the same compound may be the same or different, but are preferably the same. For example, multiple α groups contained in the same compound are all 2, 3, 8, 9, and 11. The same applies below.

[0098]

[0099]

[0100] In the group (3-1A-3), Q ａ３ is a single bond or an alkylene group which may have an etheric oxygen atom. ａ３ The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, more preferably 2 to 6 carbon atoms.

[0101] R ｇ is a hydrogen atom, a hydroxyl group, or an alkyl group. ｇ From the viewpoint of ease of production of the compound, a hydrogen atom or an alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 4 carbon atoms, and further preferably is a methyl group.

[0102] Q ｂ３ is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having two or more carbon atoms. ｂ３ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ３The number of carbon atoms in the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ３ is preferably -CH ２ CH ２ -, -CH ２ CH ２ CH ２ - or -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ - is preferred.

[0103] Two [-Q ｂ３ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0104] Examples of the group (3-1A-3) include the following groups: ２ This is the bonding position with

[0105]

[0106]

[0107] In the group (3-1A-4), Q ｅ is -C(O)O-, -SO ２ N (R ｄ )- or -C(O)N(R ｄ )-. R ３１ The definition of is as described above. When w1 is 1 or 2, R ３１ is preferably a hydrogen atom. s4 is 0 or 1. Q ａ４ is a single bond or an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group which may have an etheric oxygen atom is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 6, and particularly preferably 1 to 3. t4 is 0 or 1. However, Q ａ４is a single bond, it is 0. ａ４ -(O) ｔ４ When s4 is 0, a single bond or —CH ２ O-, -CH ２ OCH ２ -, -CH ２ OCH ２ CH ２ O-, -CH ２ OCH ２ CH ２ OCH ２ - or -CH ２ OCH ２ CH ２ CH ２ CH ２ OCH ２ - is preferred (however, the left side is L ２ When s4 is 1, it is a single bond, -CH ２ - or -CH ２ CH ２ - is preferred.

[0108] Q ｂ４ is an alkylene group, and the alkylene group is —O—, —C(O)N(R ｄ )-(R ｄ The definition of is as described above.) may have a divalent organopolysiloxane residue or a dialkylsilylene group. When the alkylene group has -O-, it is preferable that there is -O- between carbon atoms. Also, when the alkylene group is -C(O)N(R ｄ )-, dialkylsilylene group or divalent organopolysiloxane residue, carbon atom-carbon atom or (O) ｕ４ It is preferable that these groups are present at the end of the bond with Q. ｂ４ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 11 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 11.

[0109] u4 is 0 or 1. -(O) ｕ４ -Q ｂ４As the -, -CH is preferred from the viewpoint of ease of production of the compound. ２ CH ２ -, -CH ２ CH ２ CH ２ -, -(CH ２ ) ｂ -, -CH ２ OCH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ CH ２ CH ２ CH ２ -, -OCH ２ CH ２ CH ２ -, -OSi(CH ３ ) ２ CH ２ CH ２ CH ２ -, -OSi(CH ３ ) ２ OSi(CH ３ ) ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ Si(CH ３ ) ２ PhSi(CH ３ ) ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si). b is an integer of 4 to 11.

[0110] w1 is an integer of 0 to 2, preferably 0 or 1, and more preferably 0. [-(O) ｕ４ -Q ｂ４ -Si(R) ｎ L ３－ｎ If there are two or more [-(O) ｕ４ -Q ｂ４ -Si(R) ｎ L ３－ｎ ] may be the same or different. ３１ If there are two or more, there are two or more (-R ３１) may be the same or different.

[0111] [-[Q in group (3-1A-4)] ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -C[-(O) ｕ４ -Q ｂ４ -Si(R) ｎ L ３－ｎ ] ３－ｗ１ (-R ３１ ) ｗ１ In the following formula, * represents L ２ This is the bonding position with

[0112]

[0113]

[0114] In the group (3-1A-5), Q ａ５ is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, more preferably 2 to 6 carbon atoms. ａ５ As the compound, -OCH ２ CH ２ CH ２ -, -OCH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH ２ CH ２ - or -CH ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si).

[0115] Q ｂ５ is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having two or more carbon atoms. ｂ５The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ５ The number of carbon atoms in the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ５ As the compound, -CH ２ CH ２ CH ２ - or -CH ２ CH ２ OCH ２ CH ２ CH ２ - is preferred (however, the right side is Si(R) ｎ L ３－ｎ Bind to. ).

[0116] Three [-Q ｂ５ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0117] Examples of the group (3-1A-5) include the following groups: ２ This is the bonding position with

[0118]

[0119]

[0120] Q in group (3-1A-6) ｅ is as defined in the above group (3-1A-4). v is 0 or 1.

[0121] Q ａ６ is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, more preferably 2 to 6 carbon atoms. ａ６ As the compound, -CH ２ OCH２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH ２ CH ２ - or -CH ２ CH ２ CH ２ - is preferred (however, the right side is Z ａ Bind to. ).

[0122] Z ａ is a (w2+1)-valent organopolysiloxane residue, or a (w2+1)-valent group having an alkylene group between the organopolysiloxane residues. w2 is an integer of 2 to 7. Examples of the (w2+1)-valent organopolysiloxane residue and the (w2+1)-valent group having an alkylene group between the organopolysiloxane residues include the following groups. However, R in the following formula ａ is as described above. * is the bond position.

[0123]

[0124] Q ｂ６ is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having two or more carbon atoms. ｂ６ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ６ The number of carbon atoms in the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ６ As the compound, -CH ２CH ２ - or -CH ２ CH ２ CH ２ - is preferred. w2 [-Q ｂ６ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0125] [-[Q in group (3-1A-6)] ｅ ] ｖ -Q ａ６ -Z ａ [-Q ｂ６ -Si(R) ｎ L ３－ｎ ] ｗ２ In the following formula, * represents L ２ This is the bonding position with

[0126]

[0127] In the group (3-1A-7), Z ｃ is a hydrocarbon group having a valence of (w3+w4+1). w3 is an integer of 4 or more. w4 is an integer of 0 or more. Q ｅ , s4, Q ａ４ , t4, Q ｂ４ The definitions and preferred ranges of u4 and u5 are the same as those of the respective symbols in group (3-1A-4).

[0128] Z ｃ may be composed of a hydrocarbon chain, and may have an etheric oxygen atom between carbon atoms in the hydrocarbon chain, and is preferably composed of a hydrocarbon chain. ｃ The valence of Z is preferably from 5 to 20, more preferably from 5 to 10, still more preferably from 5 to 8, and particularly preferably from 5 to 6. ｃ The number of carbon atoms in [-(O-Q ｂ４ ) ｕ４ -Si(R)ｎ L ３－ｎ If there are two or more [-(O-Q ｂ４ ) ｕ４ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0129] [-[Q in group (3-1A-7)] ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -Z ｃ [-(O-Q ｂ４ ) ｕ４ -Si(R) ｎ L ３－ｎ ] ｗ３ (-OH) ｗ４ In the following formula, * represents L ２ This is the bonding position with

[0130]

[0131] L in formula (2) ３ may be a group (g2-1) (where d1+d3=1, q=d2+d4), a group (g2-2) (where q=e2), a group (g2-3) (where q=2), a group (g2-5) (where q=i2), a group (g2-6) (where q=1), or a group (g2-7) (where q=i3+1).

[0132]

[0133] -L ａ -A １ -Q １２ -C(R ｅ２ ) ３－ｅ２ (-Q ２２ -) ｅ２ ... (g2-2) -L ａ -A １ -Q １３ -N(-Q ２３ -) ２ ... (g2-3) -L ａ -A １ -Q １５ -Si(R ｅ３ ) ３－ｉ２ (-Q２５ -) ｉ２ ... (g2-5) -L ａ -A １ -Q ２６ -...(g2-6) -L ａ -A １ -Q １２ -CH(-Q ２２ -)-Si(R ｅ３ ) ３－ｉ３ (-Q ２５ -) ｉ３ …(g2-7)

[0134] However, in formulas (g2-1) to (g2-3) and (g2-5) to (g2-7), L ａ Side is L ２ and Q ２２ , Q ２３ , Q ２５ or Q ２６ The side is [-Si(R) ｎ L ３－ｎ ]. ａ The definition and preferred embodiments of are as described above. １ represents a single bond, -C(O)NR ６ -, -C(O)-, -OC(O)O-, -NHC(O)O-, -NHC(O)NR ６ -, -O- or -SO ２ NR ６ - is. １１ represents a single bond, —O—, an alkylene group, or —C(O)NR between carbon atoms of an alkylene group having two or more carbon atoms. ６ -, -C(O)-, -NR ６ - or O-. １２ represents a single bond, an alkylene group, or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O-. １３ is a single bond (where A １ is —C(O)—), an alkylene group, an alkylene group having 2 or more carbon atoms having —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６- or -O-, or a group having -C(O)- at the N-terminal of the alkylene group. １５ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O-. ２２ represents an alkylene group, an alkylene group having 2 or more carbon atoms, and a —C(O)NR group between carbon atoms. ６ -, -C(O)-, -NR ６ a group having - or -O-, and -C(O)NR at the end of the alkylene group not connected to Si; ６ -, -C(O)-, -NR ６ or a group having —O—, or an alkylene group having 2 or more carbon atoms, wherein —C(O)NR ６ -, -C(O)-, -NR ６ - or -O- and -C(O)NR at the end not connected to Si ６ -, -C(O)-, -NR ６ - or -O-, and Q ２２ If there are two or more, there are two or more Q ２２ may be the same or different. ２３ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and two Q ２３ may be the same or different. ２５ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O-, and Q ２５ If there are two or more, there are two or more Q ２５ may be the same or different. ２６ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O-. ２２ , Q２３ , Q ２５ , Q ２６ When R is an alkylene group, it preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 6 carbon atoms. ｅ１ is a hydrogen atom or an alkyl group, and two or more R ｅ１ may be the same or different. ｅ２ is a hydrogen atom, a hydroxyl group, an alkyl group, or an acyloxy group. ｅ３ is an alkyl group. ６ is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.

[0135] d1 is 0 or 1. d3 is 0 or 1. d1+d3 is 1. d2 is an integer of 0 to 3. d4 is an integer of 0 to 3. d2+d4 is an integer of 1 to 5. d1+d2 is an integer of 1 to 3. d3+d4 is an integer of 1 to 3. e2 is an integer of 1 to 3, preferably 2 or 3. i2 is an integer of 1 to 3, preferably 2 or 3. i3 is 2 or 3.

[0136] Q １２ , Q １３ , Q １５ , Q ２２ , Q ２３ , Q ２５ and Q ２６ The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoints of ease of production of the compound and further excellent light resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10, 1 to 6, or 1 to 4. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2.

[0137] R ｅ２ or R ｅ３ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, from the viewpoint of ease of production of the compound. ｅ２The number of carbon atoms in the alkyl group portion of the acyloxy group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound.

[0138] L in formula (2) ３ Other forms of the formula include a group (g2-8) (where d1 + d3 = 1, q = d2 × k3 + d4 × k3), a group (g2-9) (where q = e2 × k3), a group (g2-10) (where q = 2 × k3), a group (g2-12) (where q = i2 × k3), a group (g2-13) (where q = k3), or a group (g2-14) (where q = i3 × k3 + k3).

[0139]

[0140] -L ａ -A １ -Q １２ -C(R ｅ２ ) ３－ｅ２ (-Q ２２ -G １ ) ｅ２ ... (g2-9) -L ａ -A １ -Q １３ -N(-Q ２３ -G １ ) ２ ...(g2-10) -L ａ -A １ -Q １５ -Si(R ｅ３ ) ３－ｉ２ (-Q ２５ -G １ ) ｉ２ ...(g2-12) -L ａ -A １ -Q ２６ -G １ ...(g2-13) -L ａ -A １ -Q １２ -CH(-Q ２２ -G １ )-Si(R ｅ３ ) ３－ｉ３ (-Q ２５ -G １ ) ｉ３ …(g2-14)

[0141] However, in formulas (g2-8) to (g2-10) and (g2-12) to (g2-14), L ａ Side is L ２ and G １ The side is [-Si(R) ｎ L ３－ｎ ] and combine.

[0142] G １ is the following group (g3), and A has two or more G １ may be the same or different. １ The symbols other than -Si(R) are the same as those in formulas (g2-1) to (g2-3) and (g2-5) to (g2-7). ８ ) ３－ｋ３ (-Q ３ -) ｋ３ ...(g3) In the group (g3), the Si side is Q ２２ , Q ２３ , Q ２５ or Q ２６ Connect to Q ３ The side is [-Si(R) ｎ L ３－ｎ ]. ８ is an alkyl group. ３ represents an alkylene group, an alkylene group having 2 or more carbon atoms, and a —C(O)NR group between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O- containing group, or (OSi(R ９ ) ２ ) ｐ -O-, and two or more Q ３ may be the same or different. k3 is 2 or 3. R ６ is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. ９ is an alkyl group, a phenyl group, or an alkoxy group, and two R ９ may be the same or different. p is an integer of 0 to 5, and when p is 2 or more, there are two or more (OSi(R ９ ) ２ ) may be the same or different.

[0143] Q ３The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoint of ease of production of the compound and further superior light resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10, 1 to 6, or 1 to 4. However, when there is a specific bond between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2. R ８ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. ９ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. ９ In view of excellent storage stability of the compound, the number of carbon atoms in the alkoxy group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2. p is preferably 0 or 1.

[0144] Compound (2) includes L １ is an alkylene group, L ２ is a specific ring structure, L ３ may be a compound in which L is an alkylene group. １ and L ３ The alkylene group in L may be linear or branched, but is preferably linear. １ and L ３ The number of carbon atoms in the alkylene group is preferably 1 to 30, and may be 1 to 25, 1 to 20, 1 to 10, or 5 to 10. For example, L １ and L ３ is an alkylene group having 1 to 10 carbon atoms or 5 to 10 carbon atoms, and L ２ In addition, in the compounds having the above-mentioned preferred ranges and preferred combinations, q may be 1.

[0145] The compound represented by formula (1-1) may be a compound represented by formula (3). (R １ ) ３ Si-O-(Si(R ２ ) ２ -O) ｍ-Si(R ２ ) ２ -L ４ -L ５ - (L ６ -Si(R) ｎ L ３－ｎ ) ｒ (3)

[0146] R in formula (3) １ , R ２ , m, R, L and n are defined as R in formula (2). １ , R ２ , m, R, L and n have the same meanings and preferred embodiments.

[0147] In formula (3), L ４ is a single bond or a divalent linking group. ４ The divalent linking group represented by the formula (2) is １ The meaning and preferred embodiments are also the same as those of the divalent linking group represented by the following formula:

[0148] Among them, L ４ represents a divalent alkylene group, —O—, —S—, —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, -OC(O)-, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)-, alkylene group, -C(O)N(R ｄ an alkylene group having —N(R ｄ )C(O)-, an alkylene group having —OC(O)N(R ｄan alkylene group having —OC(O)—, an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ an alkylene group having —SO ２ N (R ｄ )- or an alkylene group -C(O)N(R ｄ )-alkylene groups are preferred, and alkylene groups, —OC(O)—, —C(O)—- alkylene groups, —C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ )- or an alkylene group -C(O)N(R ｄ )-alkylene group is more preferred, and an alkylene group having —C(O)— or an alkylene group —C(O)N(R ｄ )-alkylene groups are more preferred.

[0149] In formula (3), L ５ is an alicyclic group having a valence of (r+1) and which may have a heteroatom. The alicyclic group which may have a heteroatom is a group having the specific ring structure described above, and the preferred embodiments are also the same. ５ preferably contains a ring selected from the group consisting of a cyclopentane ring, a pyrrolidine ring, a cyclohexane ring, an adamantane ring, a piperidine ring, and the following fused rings, and more preferably contains an adamantane ring. The definition of R is as described above.

[0150]

[0151] One of the ring-constituting atoms of the alicyclic group is L ４ Or (L６ -Si(R) ｎ L ３－ｎ When the ring has two bonds bonded to the ring atom, one of the bonds may have L ４ and (-L ６ -Si(R) ｎ L ３－ｎ ) may be bonded to each other, and two (-L ６ -Si(R) ｎ L ３－ｎ ) may be bonded to L ４ and (-L ６ -Si(R) ｎ L ３－ｎ When r is an integer of 2 or more, it is preferable that r (-L ６ -Si(R) ｎ L ３－ｎ ) may be bonded to different ring-constituting atoms, and two of them may be bonded to one ring-constituting carbon atom, and two (-L ６ -Si(R) ｎ L ３－ｎ ) may be bonded to two or more ring-constituting carbon atoms.

[0152] In the ring-constituting atoms of the alicyclic group, the bonds constituting the ring and L ４ or L ６ When there is a remaining bond other than the bond bonded to (I), the remaining bond is bonded to a hydrogen atom or a substituent. Examples of the substituent include a halogen atom, an alkyl group which may contain an etheric oxygen atom between carbon atoms, an alkenyl group, an allyl group, an alkoxy group, and an oxo group (═O). The remaining bond is preferably bonded to a hydrogen atom or an alkyl group, more preferably to a hydrogen atom. The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 carbon atom.

[0153] In formula (3), L ６ are each independently a single bond or a divalent linking group. ６ The divalent linking group represented by the formula (2) is １ The meaning and preferred embodiments are also the same as those of the divalent linking group represented by the formula: ６If there are two or more, there are two or more L ６ may be the same or different.

[0154] Among them, L ６ is preferably an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10, 2 to 6, or 2 to 5. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0155] In formula (3), r is an integer of 1 or more. r is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 2 to 4, and particularly preferably an integer of 2 or 3. When r is an integer of 2 or more, a plurality of [—Si(R) ｎ L ３－ｎ From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable to use a plurality of [—Si(R) ｎ L ３－ｎ ] are preferably the same.

[0156] -L in formula (3) ４ -L ５ - (L ６ -Si(R) ｎ L ３－ｎ ) ｒ From [-Si(R) ｎ L ３－ｎ The group obtained by removing the group (g2-4) may be the following group (where r=h2): ａ -A １ -Q １４ -Z １ (-Q ２４ -) ｈ２ ... (g2-4) L ａ The definition of is L in formula (3-1A-1). ａ The same definition and preferred embodiments are also the same. １ represents a single bond, -C(O)NR ６ -, -C(O)-, -OC(O)O-, -NHC(O)O-, -NHC(O)NR ６ -, -O- or SO２ NR ６ - is. １４ Is, Q １４ Z to which １ When the atom in is a carbon atom, a single bond, an alkylene group, or an alkylene group having two or more carbon atoms may have a —C(O)NR ６ -, -C(O)-, -NR ６ - or O-, and Q １４ Z to which １ When the atom in is a nitrogen atom, a single bond (provided that A １ is —C(O)—), an alkylene group, an alkylene group having 2 or more carbon atoms having —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O-, or a group having -C(O)- at the N-terminal of the alkylene group. ２４ Is, Q ２４ Z to which １ When the atom in is a carbon atom, an alkylene group or an alkylene group having 2 or more carbon atoms has —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ a group having - or -O-, and -C(O)NR at the end of the alkylene group not connected to Si; ６ -, -C(O)-, -NR ６ or a group having —O—, or an alkylene group having 2 or more carbon atoms, wherein —C(O)NR ６ -, -C(O)-, -NR ６ - or -O- and -C(O)NR at the end not connected to Si ６ -, -C(O)-, -NR ６ - or -O-. ２４ Z to which １ When the atom in is a nitrogen atom, —C(O)NR is not present between carbon atoms of the alkylene group or the alkylene group having 2 or more carbon atoms. ６ -, -C(O)-, -NR ６ - or O-. ２４ If there are two or more, there are two or more Q ２４ may be the same or different. ６is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.

[0157] Q １４ and Q ２４ The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoints of ease of production of the compound and further excellent light resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10, 1 to 6, or 1 to 4. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2.

[0158] Z １ Is, Q １４ has a carbon atom or a nitrogen atom to which Q is directly bonded, and ２４ is a (1+h2)-valent alicyclic group having a carbon atom or a nitrogen atom to which Z is directly bonded. １ Examples of the alicyclic group represented by the formula (I) include the specific ring structures described above, and the preferred embodiments are also the same. １ The alicyclic group represented by Q １４ YaQ ２４ is directly bonded to the ring structure, for example, an alkylene group is linked to the alkylene group, and Q １４ YaQ ２４ are never connected.

[0159] h2 is an integer of 1 or more, and is preferably 2 to 6, more preferably 2 to 4, and even more preferably 2 or 3, in terms of ease of production of the compound and further superior light resistance of the surface treatment layer.

[0160] -L in formula (3) ４ -L ５ - (L ６ -Si(R) ｎ L ３－ｎ ) ｒ From [-Si(R) ｎ L ３－ｎ Another example of the group obtained by removing r is group (g2-11) (where r=h2×k3). ａ -A １ -Q １４ -Z１ (-Q ２４ -G １ ) ｈ２ ...(g2-11) However, in formula (g2-11), L ４ The side is [Si(R ２ ) ２ -] and G １ The side is [-Si(R) ｎ L ３－ｎ ] and binds to G １ The definition of is the same as that of G in the above group (g2-9). １ The same definition and preferred embodiments are also the same. ａ , A １ , Q １４ , Z １ and Q ２４ The definition and preferred embodiments of are as described above.

[0161] The compound represented by formula (1-1) may be a compound represented by formula (4). (R １ ) ３ Si-O-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ７ -L ８ -L ９ -L １０ - (L １１ -Si(R) ｎ L ３－ｎ ) ｓ (4)

[0162] R in formula (4) １ , R ２ , m, R, L and n are defined as R in formula (2). １ , R ２ , m, R, L and n have the same meanings and preferred embodiments.

[0163] In formula (4), L ７ and L ９ are each independently a single bond or a divalent linking group. ７ and L ９ The divalent linking group represented by the formula (2) is １The meaning and preferred embodiments are also the same as those of the divalent linking group represented by the following formula:

[0164] Among them, L ７ represents a single bond, an alkylene group, —O—, —S—, or —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, -OC(O)-, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ an alkylene group having —N(R ｄ )C(O)-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —OC(O)—, an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ an alkylene group having —SO ２ N (R ｄ )- or an alkylene group -C(O)N(R ｄ )-alkylene group is preferred, and a single bond, an alkylene group, —OC(O)—, —C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ)- or an alkylene group -C(O)N(R ｄ )-alkylene group is more preferred, and a single bond, an alkylene group, or an alkylene group having an etheric oxygen atom is even more preferred.

[0165] Also, L ９ represents a single bond, an alkylene group, —O—, —S—, or —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, -OC(O)-, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ an alkylene group having —N(R ｄ )C(O)-, an alkylene group having —OC(O)N(R ｄ )-, an alkylene group having an etheric oxygen atom, an alkylene group having -S-, an alkylene group having -C(O)-, an alkylene group having -OC(O)-, an alkylene group having -C(O)O-, an alkylene group having -C(O)S-, an alkylene group having -N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ an alkylene group having —SO ２ N (R ｄ )- or an alkylene group -C(O)N(R ｄ )-alkylene group is preferred, and a single bond, an alkylene group, —C(O)—, —OC(O)—, —C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄan alkylene group having —C(O)—, an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ )- or an alkylene group -C(O)N(R ｄ A single bond, —C(O)—, or an alkylene group having —C(O)— is even more preferred.

[0166] In formula (4), L ８ is a divalent alicyclic group which may have a heteroatom. The divalent alicyclic group which may have a heteroatom is a group having the specific ring structure described above, and the preferred embodiments are also the same. ８ preferably contains a ring selected from the group consisting of a cyclopentane ring, a cyclohexane ring, an adamantane ring, a piperidine ring, and the following fused rings, and more preferably contains an adamantane ring. The definition of R is as described above.

[0167]

[0168] L ８ The bond that does not constitute the ring of the atom that constitutes the specific ring structure of ７ or L ９ is a bond bonded to the carbon atom. When there is a remaining bond, the remaining bond is bonded to a hydrogen atom or a substituent. Examples of the substituent include a halogen atom, an alkyl group (which may contain an etheric oxygen atom between carbon atoms), an alkenyl group, an allyl group, an alkoxy group, and an oxo group (═O). The remaining bond is preferably bonded to a hydrogen atom or an alkyl group, and more preferably to a hydrogen atom. The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 carbon atom.

[0169] In formula (4), L １０is an (s+1)-valent alicyclic group which may have a heteroatom. The alicyclic group which may have a heteroatom is a group consisting of the specific ring structure described above, and the preferred embodiments are also the same. Among them, L １０ preferably contains a ring selected from the group consisting of a cyclopentane ring, a pyrrolidine ring, a cyclohexane ring, an adamantane ring, a piperidine ring, and the following fused rings, and more preferably contains an adamantane ring.

[0170] One of the ring-constituting atoms of the alicyclic group is L ９ Or (L １１ -Si(R) ｎ L ３－ｎ When the ring has two bonds bonded to the ring atom, one of the bonds may have L ９ and (-L １１ -Si(R) ｎ L ３－ｎ ) may be bonded to each other, and two (-L １１ -Si(R) ｎ L ３－ｎ ) may be bonded to L ９ and (-L １１ -Si(R) ｎ L ３－ｎ When s is an integer of 2 or more, it is preferable that s (-L １１ -Si(R) ｎ L ３－ｎ ) may be bonded to different ring-constituting atoms, and two of them may be bonded to one ring-constituting carbon atom, and two (-L １１ -Si(R) ｎ L ３－ｎ ) may be bonded to two or more ring-constituting carbon atoms.

[0171] In the ring-constituting atoms of the alicyclic group, the bonds constituting the ring and L ９ or L １１When there is a remaining bond other than the bond bonded to (I), the remaining bond is bonded to a hydrogen atom or a substituent. Examples of the substituent include a halogen atom, an alkyl group (which may contain an etheric oxygen atom between carbon atoms), an alkenyl group, an allyl group, an alkoxy group, and an oxo group (═O). The remaining bond is preferably bonded to a hydrogen atom or an alkyl group, and more preferably to a hydrogen atom. The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 carbon atom.

[0172] In formula (4), L １１ are each independently a single bond or a divalent linking group. １１ The divalent linking group represented by the formula (2) is １ The meaning and preferred embodiments are also the same as those of the divalent linking group represented by the formula: １１ If there are two or more, there are two or more L １１ may be the same or different.

[0173] Among them, L １１ is preferably a single bond or an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10, 2 to 6, or 2 to 5. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0174] In formula (4), s is an integer of 1 or more. s is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably an integer of 1 to 3. When s is an integer of 2 or more, a plurality of [—Si(R) ｎ L ３－ｎ From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable to use a plurality of [—Si(R) ｎ L ３－ｎ ] are preferably the same.

[0175] -L in formula (4) ９ -L １０- (L １１ -Si(R) ｎ L ３－ｎ ) ｒ From [-Si(R) ｎ L ３－ｎ The group obtained by removing s may be the group (g2-4) described above (where s=h2). ９ -L １０ - (L １１ -Si(R) ｎ L ３－ｎ ) ｒ From [-Si(R) ｎ L ３－ｎ Other examples of the group obtained by removing s are the above-mentioned groups (g2-11) (where s=h2×k3).

[0176] Examples of the compound represented by formula (1-1) include the compound of the following formula: The compound of the following formula is preferred because it is easy to produce industrially, easy to handle, and provides a surface treatment layer with even better light resistance. ｔ is the same as [TO-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ In the compound of the formula below, n is 1 to 30, preferably 1 to 20, and more preferably 1 to 12.

[0177]

[0178]

[0179]

[0180] The compound (1-1) is L １ is an alkylene group, L ２ is a specific ring structure, L ３ may be a compound in which L is an alkylene group. １ and L ３ The alkylene group of L may be linear or branched, but is preferably linear. １ and L ３The number of carbon atoms in the alkylene group is preferably 1 to 30, and may be 1 to 25, 1 to 20, 1 to 10, or 5 to 10. For example, L １ and L ３ is an alkylene group having 1 to 10 carbon atoms or 5 to 10 carbon atoms, and L ２ In addition, in the compounds having the above-mentioned preferred ranges and preferred combinations, q may be 1.

[0181] <Compound represented by formula (1-2)> (L ３－ｎ (R) ｎ Si) ｑ -A-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -A-(Si(R) ｎ L ３－ｎ ) ｑ (1-2) In formula (1-2), R ２ are each independently a hydrocarbon group or a trialkylsilyloxy group, A's are each independently a (q+1)-valent linking group having an alicyclic structure which may have a heteroatom, R's are each independently a hydrocarbon group, L's are each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, m is a number of 0 or more, n's are each independently an integer of 0 to 2, and q's are each independently an integer of 1 or more.

[0182] Each group in formula (1-2) has the same meaning as each group in formula (1-1), and the preferred embodiments are also the same.

[0183] The compound (1-2) is L １ is an alkylene group, L ２ is a specific ring structure, L ３ may be a compound in which L is an alkylene group. １ and L ３ The alkylene group of L may be linear or branched, but is preferably linear. １ and L ３The number of carbon atoms in the alkylene group is preferably 1 to 30, and may be 1 to 25, 1 to 20, 1 to 10, or 5 to 10. For example, L １ and L ３ is an alkylene group having 1 to 10 carbon atoms or 5 to 10 carbon atoms, and L ２ In addition, in the compounds having the above-mentioned preferred ranges and preferred combinations, q may be 1.

[0184] The number average molecular weight (Mn) of the compound of the present disclosure is preferably 500 to 20,000, more preferably 600 to 18,000, and even more preferably 700 to 15,000. When Mn is 500 or more, the light resistance of the surface treatment layer is superior. When Mn is 20,000 or less, the viscosity can be easily adjusted within an appropriate range and solubility is improved, resulting in excellent handleability during film formation.

[0185] [Composition] The composition of the present disclosure may contain a compound of the present disclosure, and components other than the compound of the present disclosure are not particularly limited. That is, the composition of the present disclosure may contain at least one of a compound represented by formula (1-1) and a compound represented by formula (1-2). The composition of the present disclosure may contain both a compound represented by formula (1-1) and a compound represented by formula (1-2). The composition of the present disclosure preferably contains a compound of the present disclosure and a liquid medium. When a liquid medium is contained, the composition of the present disclosure may be in a liquid state, and may be a solution or a dispersion. The composition of the present disclosure may contain a compound of the present disclosure, and may contain impurities such as by-products produced in the manufacturing process of the compound of the present disclosure.

[0186] The content of the compound of the present disclosure is preferably 0.001 to 40% by mass, more preferably 0.01 to 20% by mass, and even more preferably 0.1 to 10% by mass, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the compound of the present disclosure is preferably 0.01 to 10% by mass, more preferably 0.02 to 5% by mass, even more preferably 0.03 to 3% by mass, and particularly preferably 0.05 to 2% by mass, relative to the total amount of the composition of the present disclosure. The composition of the present disclosure may contain only one type of liquid medium, or two or more types.

[0187] The liquid medium is preferably an organic solvent.

[0188] Examples of organic solvents include compounds consisting of only hydrogen atoms and carbon atoms, and compounds consisting of only hydrogen atoms, carbon atoms, and oxygen atoms, and specific examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Of these, ester organic solvents are preferred.

[0189] Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, and isophorone. Specific examples of ether organic solvents include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane.Specific examples of the ester-based organic solvent include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol diacetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,3-butylene glycol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, and 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate.Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-tert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, and dipropylene glycol. Examples of the glycol monopropyl ether include glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, dipropylene glycol dimethyl ether pentane, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.Specific examples of alcohol-based organic solvents include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0190] In addition, examples of the organic solvent include halogen-based organic solvents, fluorine-containing organic solvents, nitrogen-containing compounds, sulfur-containing compounds, and siloxane compounds other than the compounds of the present disclosure.

[0191] Specific examples of halogen-containing organic solvents include dichloromethane, chloroform, carbon tetrachloride, dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane. Specific examples of fluorine-containing organic solvents include polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C ６ F １３ CH ２ CH ３ (e.g., Asahiklin (registered trademark) AC-6000 manufactured by AGC Corporation), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Nippon Zeon Co., Ltd.); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C ３ F ７ OCH ３) (e.g., Novec™ 7000 manufactured by Sumitomo 3M Co.), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Co.), perfluorobutyl ethyl ether (C ４ F ９ O.C. ２ H ５ ) (e.g., Novec™ 7200 manufactured by Sumitomo 3M Co.), perfluorohexyl methyl ether (C ２ F ５ CF (OCH ３ ) C ３ F ７ ) (e.g., Novec™ 7300 manufactured by Sumitomo 3M Co.), where the perfluoroalkyl group and the alkyl group may be linear or branched, and CF ３ CH ２ OCF ２ CHF ２ (e.g., Asahiklin (registered trademark) AE-3000 manufactured by AGC Corporation); hydrofluoroolefins (HFOs) (e.g., 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (e.g., Amorea (registered trademark) AS-300 manufactured by AGC Corporation)). Examples of nitrogen-containing compounds include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone. Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide. Examples of siloxane compounds other than the compounds of the present disclosure include hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethyltrisiloxane, hexamethylcyclotrisiloxane, hexaethylcyclotrisiloxane, octamethylcyclotetrasiloxane, octaethylcyclotetrasiloxane, and decamethyltetrasiloxane.

[0192] The content of the liquid medium is preferably 60 to 99.999 mass%, more preferably 80 to 99.99 mass%, and even more preferably 90 to 99.9 mass%, based on the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the liquid medium is preferably 90 to 99.99 mass%, more preferably 95 to 99.98 mass%, even more preferably 97 to 99.97 mass%, and particularly preferably 98 to 99.95 mass%, based on the total amount of the composition of the present disclosure.

[0193] The composition of the present disclosure may contain other components in addition to the compound and liquid medium of the present disclosure, as long as the effects of the present disclosure are not impaired. Examples of other components include additives, and specific examples include catalysts such as acid catalysts and base catalysts that promote the hydrolysis and condensation reaction of reactive silyl groups.

[0194] Examples of the catalyst that can be used include any appropriate acid or base, transition metals (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having an unshared electron pair in their molecular structure, and nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, and urea compounds). Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine and diethylamine.

[0195] Other components also include metal compounds having a hydrolyzable group (hereinafter also referred to as "specific metal compounds"). When the composition of the present disclosure contains a specific metal compound, the slip properties and antifouling properties of the surface treatment layer can be further improved. Examples of the specific metal compounds include metal compounds represented by any of formulas (M1) to (M3).

[0196] M (X ｂ１ ) ｍ１ (X ｂ２ ) ｍ２ (X ｂ３ ) ｍ３ ... (M1) Si (X ｂ４ ) (Xｂ５ ) ３ ... (M2) (X ｂ６ ) ３ Si-(Y ｂ１ )-Si(X ｂ７ ) ３ ...(M3) However, the metal compound represented by formula (M3) does not include the compound represented by formula (1-2) above.

[0197] In formula (M1), M is a trivalent or tetravalent metal atom, and X ｂ１ are each independently a hydrolyzable group, ｂ２ are each independently a siloxane skeleton-containing group, ｂ３ are each independently a hydrocarbon chain-containing group, m1 is an integer of 2 to 4, m2 and m3 are each independently an integer of 0 to 2, and when M is a trivalent metal atom, m1 + m2 + m3 is 3, and when M is a tetravalent metal atom, m1 + m2 + m3 is 4.

[0198] In formula (M2), X ｂ４ is a hydrolyzable silane oligomer residue, and X ｂ５ are each independently a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0199] In formula (M3), X ｂ６ and X ｂ７ are each independently a hydrolyzable group or a hydroxyl group, and Y ｂ１ is a divalent organic group.

[0200] In formula (M1), the metal represented by M also includes semimetals such as Si and Ge. M is preferably a trivalent metal or a tetravalent metal, more preferably Al, Fe, In, Hf, Si, Ti, Sn, or Zr, still more preferably Al, Si, Ti, or Zr, and particularly preferably Si.

[0201] In formula (M1), X ｂ１ The hydrolyzable group represented by the formula (1-1) has the same meaning as the hydrolyzable group represented by L in the formula (1-1), and the preferred embodiments are also the same.

[0202] X ｂ２The siloxane skeleton-containing group represented by the formula (I) has a siloxane unit (—Si—O—) and may be either linear or branched. Examples of the siloxane unit include a dialkylsilyloxy group, such as a dimethylsilyloxy group or a diethylsilyloxy group. The number of repeating siloxane units in the siloxane skeleton-containing group is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. The siloxane skeleton-containing group may contain a divalent hydrocarbon group as part of the siloxane skeleton. Specifically, some oxygen atoms in the siloxane skeleton may be replaced with a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include alkylene groups such as methylene, ethylene, propylene, and butylene. A hydrolyzable group, a hydrocarbon group (preferably an alkyl group), or the like may be bonded to the terminal silicon atom of the siloxane skeleton-containing group. The number of elements in the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. The upper limit of the number of elements is preferably 10 or more. Examples of the siloxane skeleton-containing group include *-(O-Si(CH ３ ) ２ ) ｎ CH ３ In this case, n is an integer of 1 to 5, and * represents a bonding site with an adjacent atom.

[0203] X ｂ３ The hydrocarbon chain-containing group represented by the formula (I) may be a group consisting of only a hydrocarbon chain, or may be a group having an etheric oxygen atom between carbon atoms in the hydrocarbon chain. The hydrocarbon chain may be linear or branched, with linear being preferred. The hydrocarbon chain may be saturated or unsaturated, with saturated hydrocarbon chain being preferred. The hydrocarbon chain-containing group preferably has 1 to 3 carbon atoms, more preferably 1 to 2, and even more preferably 1. The hydrocarbon chain-containing group is preferably an alkyl group, more preferably a methyl group, an ethyl group, or a propyl group.

[0204] Preferably, m1 is 3 or 4.

[0205] The compound represented by formula (M1) is preferably a compound represented by any one of formulas (M1-1) to (M1-5) in which M is Si, and more preferably a compound represented by formula (M1-1). The compound represented by formula (M1-1) is preferably tetraethoxysilane, tetramethoxysilane, or triethoxymethylsilane.

[0206] Si(X ｂ１ ) ４ ... (M1-1) CH ３ -Si(X ｂ１ ) ３ …(M1-2) C ２ H ５ -Si(X ｂ１ ) ３ ...(M1-3) n-C ３ H ７ -Si(X ｂ１ ) ３ ...(M1-4) (CH ３ ) ２ CH—Si(X ｂ１ ) ３ …(M1-5)

[0207] In formula (M2), X ｂ４ The number of silicon atoms contained in the hydrolyzable silane oligomer residue represented by the formula (I) is preferably 3 or more, more preferably 5 or more, and even more preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less. The hydrolyzable silane oligomer residue may have an alkoxy group bonded to a silicon atom. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, with a methoxy group or an ethoxy group being preferred. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one type. Examples of the hydrolyzable silane oligomer residue include (C ２ H ５ O) ３ Si-(OSi(OC) ２ H ５ ) ２ ) ４ O-*, etc. Here, * represents a bonding site with an adjacent atom.

[0208] In formula (M2), X ｂ５ Examples of the hydrolyzable group represented by X include the same hydrolyzable group represented by L in the above formula (1-1), a cyano group, a hydrogen atom, and an allyl group, and an alkoxy group or an isocyanato group is preferred. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. X ｂ５ As the group, a hydrolyzable group is preferred.

[0209] The compound represented by formula (M2) includes (H ５ C ２ O) ３ -Si-(OSi(OC) ２ H ５ ) ２ ) ４ O.C. ２ H ５ etc.

[0210] The compound represented by formula (M3) is a compound having reactive silyl groups at both ends of a divalent organic group, i.e., a bissilane. ｂ６ and X ｂ７ Examples of the hydrolyzable group represented by formula (M3) include an alkoxy group, an acyloxy group, a ketoxime group, an alkenyloxy group, an amino group, an aminoxy group, an amide group, an isocyanato group, and a halogen atom, and an alkoxy group or an isocyanato group is preferred. As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferred, and a methoxy group or an ethoxy group is more preferred. In formula (M3), X ｂ６ and X ｂ７ may be the same group or different groups. ｂ６ and X ｂ７ are preferably the same group.

[0211] In formula (M3), Y ｂ１ is a divalent organic group that connects the reactive silyl groups at both ends. ｂ１ The number of carbon atoms in Y is preferably 1 to 8, and more preferably 1 to 3. ｂ１ Examples of the alkylene group include an alkylene group, a phenylene group, and an alkylene group having an etheric oxygen atom between carbon atoms.２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ C(CH ３ ) ２ CH ２ -, -C(CH ３ ) ２ CH ２ CH ２ C(CH ３ ) ２ -, -CH ２ CH ２ OCH ２ CH ２ -, -CH ２ CH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH(CH ３ ) CH ２ OCH ２ CH (CH ３ ) - and -C ６ H ４ - are listed.

[0212] The compound represented by formula (M3) includes (CH ３ O) ３ Si(CH ２ ) ２ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ２ Si(OC ２ H ５ ) ３, (OCN) ３ Si(CH ２ ) ２ Si(NCO) ３ , Cl ３ Si(CH ２ ) ２ SiCl ３ , (CH ３ O) ３ Si(CH ２ ) ６ Si(OCH ３ ) ３ , and (C ２ H ５ O) ３ Si(CH ２ ) ６ Si(OC ２ H ５ ) ３ Examples include:

[0213] The content of other components that may be included in the composition of the present disclosure is preferably 10% by mass or less, and more preferably 1% by mass or less, relative to the total amount of the composition of the present disclosure. When the composition of the present disclosure contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, relative to the total amount of the composition of the present disclosure.

[0214] The total content of the compound of the present disclosure and other components (hereinafter also referred to as "solid content concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. The solid content concentration of the composition of the present disclosure is a value calculated from the mass of the composition before heating and the mass after heating in a convection dryer at 120°C for 4 hours.

[0215] The composition of the present disclosure contains a liquid medium, and is therefore useful for coating applications and can be used as a coating liquid.

[0216] In addition to the compound and liquid medium of the present disclosure, the composition of the present disclosure may contain other components other than the compound and liquid medium of the present disclosure, as long as the effects of the present disclosure are not impaired. Examples of other components include known additives such as acid catalysts and basic catalysts that promote the hydrolysis and condensation reaction of hydrolyzable silyl groups. The content of other components in the surface treatment agent of the present disclosure is preferably 10% by mass or less, more preferably 1% by mass or less.

[0217] The other components include a compound represented by the following formula (5): [Y １ ３ Y ２ -(O) ｓ５ -Y ３ ] ｓ６ Y ４ (Si(Y ５ ) ｓ７ (Y ６ ) ３－ｓ７ ) ｓ８ ...(5) In formula (5), Y １ are each independently a hydrocarbon group or a trialkylsilyloxy group; Y ２ is Si, Sn, or Ge, s5 is 0 or 1, and Y ３ are each independently an alkylene chain or a polyalkylene oxide chain, or a combination of an alkylene chain and a divalent polysiloxane residue; Y ４ represents a single bond or a s6+s8 valent linking group, ５ are each independently a hydrocarbon group; ６ are each independently a hydrolyzable group or a hydroxyl group; s7 are each independently an integer of 0 to 2; and s6 and s8 are each independently an integer of 1 or more.

[0218] The compound represented by formula (5) includes Y ３ is an alkylene chain or a polyalkylene oxide chain. Specific examples of the compound represented by formula (5) include the following compounds. In the formula, α is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0219] When the other component in the present surface treatment agent is a compound represented by formula (5), the content of the compound represented by formula (5) is preferably 50 mass % or less, more preferably 40 mass % or less.

[0220] [Surface Treatment Agent] In one embodiment, the surface treatment agent of the present disclosure contains the compound of the present disclosure. That is, the surface treatment agent of the present disclosure may contain at least one of the compound represented by formula (1-1) and the compound represented by formula (1-2). The surface treatment agent of the present disclosure may contain both the compound represented by formula (1-1) and the compound represented by formula (1-2). Furthermore, the surface treatment agent of the present disclosure may contain the compound of the present disclosure and a liquid medium. The surface treatment agent of the present disclosure may be the composition of the present disclosure. Preferred aspects of the liquid medium contained in the surface treatment agent of the present disclosure are the same as preferred aspects of the liquid medium contained in the composition of the present disclosure.

[0221] [Article] In one embodiment, the article of the present disclosure includes a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent of the present disclosure.

[0222] The surface treatment layer may be formed on a part of the surface of the substrate, or may be formed on the entire surface of the substrate. The surface treatment layer may be spread in the form of a film on the surface of the substrate, or may be scattered in the form of dots. In the surface treatment layer, the compound of the present disclosure contains a reactive silyl group (Si(R) ｎ L ３－ｎ )) is contained in a state in which hydrolysis of part or all of the silanol groups has progressed and dehydration condensation reaction of the silanol groups has progressed.

[0223] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0224] The type of substrate is not particularly limited, and examples thereof include substrates that are required to be water-repellent. Examples of substrates include substrates that may be used by contacting other articles (e.g., stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., a mounting table). Examples of substrate materials include metal, resin, glass, sapphire, ceramic, semiconductor, stone, fiber, nonwoven fabric, paper, wood, fur, natural leather, artificial leather, ceramics, and composite materials thereof. Glass may be chemically strengthened.

[0225] Examples of the substrate include glass or resin used for building materials, decorative building materials, interior goods, transportation equipment (e.g., automobiles), signs, bulletin boards, drinking vessels, tableware, aquariums, ornamental equipment (e.g., frames, boxes), laboratory equipment, furniture, textile products, packaging containers, art, sports, games, etc., and glass or resin used for the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, remote controls, etc. The shape of the substrate may be a plate or a film.

[0226] The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The material of the substrate for a touch panel is preferably glass or a transparent resin.

[0227] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the surface treatment layer and further improved light resistance of the surface treatment layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the surface treatment layer. Furthermore, when a base layer described below is provided on the surface-treated substrate, it has better adhesion to the base layer and further improved light resistance of the surface treatment layer. Therefore, when a base layer is provided, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the base layer.

[0228] The surface treatment layer may be provided directly on the surface of the substrate, or a primer layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the light resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a primer layer disposed on the substrate, and a surface treatment layer surface-treated with the surface treatment agent of the present disclosure disposed on the primer layer.

[0229] The underlayer is preferably a layer containing an oxide containing silicon and at least one specific element selected from the group consisting of Group 1 elements, Group 2 elements, Group 4 elements, Group 5 elements, Group 13 elements, and Group 15 elements of the periodic table.

[0230] The Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. As the Group 1 elements, lithium, sodium, and potassium are preferred, and sodium and potassium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 1 elements.

[0231] The Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. As the Group 2 elements, magnesium, calcium, and barium are preferred, and magnesium and calcium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 2 elements.

[0232] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. As the Group 4 elements, titanium and zirconium are preferred, and titanium is more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 4 elements.

[0233] The Group 5 elements of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. As the Group 5 element, vanadium is particularly preferred from the viewpoint of providing a surface treatment layer with superior light resistance. The underlayer may contain two or more Group 5 elements.

[0234] The Group 13 elements of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As the Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of enabling the surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 13 elements.

[0235] The Group 15 elements of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 elements, phosphorus, antimony, and bismuth are preferred, and phosphorus and bismuth are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 15 elements.

[0236] As the specific element contained in the underlayer, Group 1 elements, Group 2 elements, and Group 13 elements are preferred because they provide a surface treatment layer with better light resistance, more preferably Group 1 elements and Group 2 elements, and even more preferably Group 1 elements. The specific element may contain only one type of element or two or more types of elements.

[0237] The oxide contained in the underlayer may be a mixture of oxides of the above elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), a composite oxide containing two or more of the above elements, or a mixture of an oxide of the above elements alone and a composite oxide.

[0238] From the viewpoint of achieving superior light resistance of the surface treatment layer, the ratio of the total molar concentration of the specific elements in the underlayer to the molar concentration of silicon in the underlayer (specific elements / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80. The molar concentrations (mol %) of each element in the underlayer can be measured, for example, by depth profile analysis by X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0239] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the above lower limit, the adhesion of the underlayer to the surface treatment layer is further improved, and the light resistance of the surface treatment layer is more excellent. When the thickness of the underlayer is equal to or less than the above upper limit, the light resistance of the underlayer itself is excellent. The thickness of the underlayer is measured by observing the cross section of the underlayer using a transmission electron microscope (TEM).

[0240] The underlayer can be formed by, for example, a vapor deposition method using a vapor deposition material or a wet coating method.

[0241] The deposition material used in the deposition method preferably contains an oxide containing silicon and a specific element. Specific examples of the form of the deposition material include powder, melt, sintered body, granules, and crushed body, with melt, sintered body, and granules being preferred from the viewpoint of ease of handling. Here, the melt refers to a solid obtained by melting the powder of the deposition material at a high temperature and then cooling and solidifying it. The sintered body refers to a solid obtained by firing the powder of the deposition material. If necessary, a molded body obtained by pressing the powder may be used instead of the powder of the deposition material. The granule refers to a solid obtained by kneading the powder of the deposition material with a liquid medium (e.g., water, organic solvent) to obtain particles, and then drying the particles.

[0242] The vapor deposition material can be produced by, for example, the following methods: A method of mixing silicon oxide powder with a powder of an oxide of a specific element to obtain a vapor deposition material powder. A method of kneading the vapor deposition material powder with water to obtain particles, and then drying the particles to obtain granules of the vapor deposition material. A method of mixing a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel), a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element), and water, drying the mixture, and then firing the dried mixture or a compact obtained by pressing the dried mixture to obtain a sintered body. A method of melting a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel) and a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element) at a high temperature, and then cooling and solidifying the melt to obtain a melt.

[0243] A specific example of a vapor deposition method using a vapor deposition material is a vacuum vapor deposition method. The vacuum vapor deposition method is a method in which a vapor deposition material is evaporated in a vacuum chamber and attached to the surface of a substrate. The temperature during vapor deposition (for example, the temperature of the boat in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the pressure in the chamber in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming an underlayer using a vapor deposition material, one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used.

[0244] Specific examples of evaporation methods for the deposition material include a resistance heating method, in which the deposition material is melted and evaporated on a resistance heating boat made of a high-melting-point metal, and an electron gun method, in which the deposition material is irradiated with an electron beam to directly heat the deposition material, melting and evaporating the surface. The electron gun method is preferred as an evaporation method for the deposition material because it can evaporate high-melting-point substances due to its ability to locally heat the material, and because areas not irradiated by the electron beam are at low temperatures, eliminating the risk of reaction with the container or the inclusion of impurities. The evaporation method for the deposition material may use multiple boats, or all of the deposition materials may be placed in a single boat. The deposition method may be co-evaporation or alternating deposition. Specific examples include mixing silica and a specific source in the same boat, co-evaporating silica and a specific element source in separate boats, or similarly alternately depositing them in separate boats. The deposition conditions, order, etc., are appropriately selected depending on the composition of the underlayer.

[0245] In the wet coating method, it is preferable to form an undercoat layer on a substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0246] Specific examples of the silicon compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0247] Specific examples of compounds containing a specific element include oxides of the specific element, alkoxides of the specific element, carbonates of the specific element, sulfates of the specific element, nitrates of the specific element, oxalates of the specific element, and hydroxides of the specific element.

[0248] Examples of the liquid medium include the same liquid medium as that contained in the composition of the present disclosure.

[0249] The content of the liquid medium is preferably 0.01 to 20% by mass, more preferably 0.1 to 10% by mass, based on the total amount of the coating liquid used to form the underlayer.

[0250] Specific examples of wet coating methods for forming the underlayer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0251] After wet-coating the coating liquid, it is preferable to dry the coating film. The drying temperature for the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.

[0252] The article of the present disclosure may be an optical material having a surface treatment layer as the outermost layer. Examples of the optical material include optical materials related to displays and the like, as well as a wide variety of other optical materials. Examples of the optical material include displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic electroluminescent displays, inorganic thin-film electroluminescent dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), as well as protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0253] The article of the present disclosure is preferably an optical component. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. Examples of optical components include front protective plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MO discs; optical fibers; and the display surfaces of watches. In particular, the article of the present disclosure is preferably a display or a touch panel.

[0254] The article of the present disclosure may be a medical device or a medical material. The article of the present disclosure may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0255] When the article of the present disclosure is an optical component, the material constituting the surface of the substrate is a material for optical components, such as glass or transparent plastic. When the article of the present disclosure is an optical component, a functional layer such as a hard coat layer or an anti-reflection layer may be formed on the surface (outermost layer) of the substrate. The anti-reflection layer may be either a single-layer anti-reflection layer or a multi-layer anti-reflection layer. Examples of inorganic materials that can be used for the anti-reflection layer include SiO ２ , SiO, ZrO ２ , TiO ２ , TiO, Ti ２ O ３ , Ti ２ O ５ , Al ２ O ３ , Ta ２ O ５ , Ta ３ O ５, Nb ２ O ５ , HfO ２ , Si ３ N ４ , CeO ２ , MgO, Y ２ O ３ , SnO ２ , MgF ２ , and W.O. ３ These inorganic substances may be used alone or in combination of two or more (for example, as a mixture). When a multi-layer antireflection layer is formed, the outermost layer may contain SiO ２ and / or SiO is preferably used. When the article of the present disclosure is an optical glass component for a touch panel, a transparent electrode, for example, a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). Furthermore, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomization film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like, depending on its specific specifications.

[0256] [Method for manufacturing an article] The method for manufacturing an article according to the present disclosure is, for example, a method for manufacturing an article having a surface-treated layer formed on a substrate by performing a surface treatment on a substrate using the surface treatment agent according to the present disclosure. Examples of the surface treatment include a dry coating method and a wet coating method.

[0257] Examples of dry coating methods include vacuum deposition, CVD, and sputtering. Vacuum deposition is preferred as a dry coating method from the viewpoints of suppressing decomposition of the compound and simplicity of the equipment. For vacuum deposition, a pellet-shaped substance obtained by impregnating a metal porous body such as iron or steel with the compound of the present disclosure may be used. A composition containing the compound of the present disclosure and a liquid medium may be impregnated into a metal porous body such as iron or steel, and the liquid medium may be dried to obtain a pellet-shaped substance impregnated with the compound of the present disclosure.

[0258] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0259] In order to improve the light resistance of the surface treatment layer, an operation to promote the reaction between the compound of the present disclosure and the substrate may be performed as necessary. Examples of such an operation include heating, humidification, and light irradiation. For example, heating the substrate on which the surface treatment layer is formed in a humid atmosphere can promote reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds through condensation reactions of silanol groups. After surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Examples of removal methods include pouring a solvent over the surface treatment layer and wiping with a cloth soaked in the solvent.

[0260] The present invention will be described in more detail below using examples, but the present invention is not limited to these examples.

[0261] [Example 1: Compound (D)] <Step 1-1: Synthesis of Compound (A)> Under a nitrogen atmosphere, 2,3,4,5,6-pentafluorophenol (6.8 g), THF (tetrahydrofuran, 42 mL), and triethylamine (5.1 g) were added to a 100 mL flask and stirred at 25°C. Next, 3-cyclopentene-1-carboxylic acid chloride (5.0 g) was added dropwise, and the mixture was stirred for 1 hour. The reaction solution was filtered, and the solvent and low-boiling components were distilled off under reduced pressure. 7.9 g of compound (A) was obtained by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate). The structure of compound (A) was confirmed by the following NMR data.

[0262] 1 H-NMR (400MHz, CDCl3): δ5.72 (s, 2H), 3.45 (m, 1H), 2.85 (m, 4H).

[0263] ​

[0264] <Step 1-2: Synthesis of Compound (B)> Under a nitrogen atmosphere, compound (A) (5.6 g), THF (5.0 mL), and chlorodimethylsilane (2.3 g) were placed in a 200 mL flask and stirred at 25°C. Next, a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 0.10 mL) was added, and the mixture was stirred at 70°C for 2 hours. The solvent and low-boiling components were removed from the reaction solution by distillation under reduced pressure, yielding 7.2 g of compound (B). The structure of compound (B) was confirmed by the following NMR data.

[0265] 1 H-NMR (400MHz, CDCl3): δ3.10-2.50 (m, 1H), 2.30-1.20 (m, 7H), 0.43-(-0.08) (m, 6H).

[0266]

[0267] <Step 1-3: Synthesis of Compound (C)> Under a nitrogen atmosphere, trimethylsilanol (0.19 g) and THF (5 mL) were placed in a 100 mL three-neck flask and stirred at 25°C. The mixture was then cooled to 0°C, and a hexane solution (1.6 M, 0.9 mL) of n-BuLi (n-butyllithium) was added dropwise. A THF solution (1.2 M, 1 mL) of hexamethylcyclotrisiloxane was then added dropwise, followed by a THF solution (1.2 M, 9 mL) of hexamethylcyclotrisiloxane, and the mixture was stirred for 2 hours. Compound (B) (1.28 g) was then added, and the mixture was stirred for 1 hour. After stirring for 1 hour, 2,2-diallylpent-4-en-1-amine (0.95 g) was then added, and the mixture was stirred for 1 hour. Hexane and ion-exchanged water were added sequentially to the reaction mixture, and the mixture was separated, and the organic phase was separated. The solvent and low-boiling components were removed from the organic phase by distillation under reduced pressure, followed by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 1.2 g of compound (C). The structure of compound (C) was confirmed by the following NMR data. In compound (C), the average value of n was 18.

[0268] 1 ​​H-NMR (400MHz, CDCl3): δ5.80 (ddt, J=17.7, 10.6, 7.4Hz, 3H), 5.15-4.90 (m, 6H), 3.12 (d, J=6.3Hz, 2H), 3.10-2.50 (m, 1H), 2.30-1.20 (m, 7H), 0.43-(-0.08) (m, 129H).

[0269]

[0270] <Step 1-4: Synthesis of Compound (D)> Dichloromethane (10 g) and compound (C) (0.80 g) were placed in a 100 mL flask and stirred at 25°C. Next, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.40 g) were added and stirred at 25°C for 2 hours. The solvent was removed from the reaction solution by distillation under reduced pressure, yielding 0.75 g of compound (D). The structure of compound (D) was confirmed by the following NMR data. In compound (D), the average value of n was 18.

[0271] 1 H-NMR (400MHz, CDCl3): δ5.66 (d, J=6.4Hz, 1H), 3.49 (s, 27H), 3.46 (d, J=29.0Hz, 2H), 3.10-2.50 (m, 1H), 2.30-1.20 (m, 16H), 0.40 (m, 6H), 0.35-(-0.08) (m, 129H).

[0272]

[0273] ​[Example 2: Compound (K)] <Step 2-1: Synthesis of Compound (E)> DMF (N,N-dimethylformamide, 100 mL), 3-hydroxy-4-adamantanecarboxylic acid (5.0 g), potassium carbonate (10 g), and benzyl bromide (10 g) were added to a 300 mL flask and stirred at 50°C for 5 hours. Hexane and ion-exchanged water were added sequentially to the reaction solution, and the mixture was separated and the organic phase was isolated. The solvent and low-boiling components were removed from the organic phase by distillation under reduced pressure, followed by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 4.0 g of Compound (E). The structure of Compound (E) was confirmed by the following NMR data.

[0274] 1 H-NMR (400MHz, CDCl3): δ 7.38-7.26 (m, 5H), 5.13 (s, 2H), 3.67 (s, 1H), 2.65 (m, 1H), 2.36 (m, 1H), 2.10-1.60 (m, 12H).

[0275]

[0276] <Step 2-2: Synthesis of Compound (F)> DMF (100 mL), compound (E) (5.0 g), potassium carbonate (10 g), and allyl bromide (5 g) were added to a 300 mL flask and stirred at 100°C for 5 hours. Next, hexane and ion-exchanged water were added sequentially to the reaction solution, and the mixture was separated and the organic phase was isolated. The solvent and low-boiling components were removed from the organic phase by distillation under reduced pressure, followed by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 3.2 g of compound (F). The structure of compound (F) was confirmed by the following NMR data.

[0277] 1 H-NMR (400MHz, CDCl3): δ 7.38-7.26 (m, 5H), 5.84 (m, 1H), 5.30 (m, 2H), 5.13 (s, 2H), 4.13 (m, 2H), 2.65 (m, 1H), 2.36 (m, 1H), 2.10-1.60 (m, 12H).

[0278] ​​

[0279] <Step 2-3: Synthesis of Compound (G)> Under a nitrogen atmosphere, compound (F) (3.0 g), THF (5.0 mL), and chlorodimethylsilane (2.3 g) were placed in a 200 mL flask and stirred at 25°C. A xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 0.10 mL) was added, and the mixture was stirred at 25°C for 2 hours. The solvent and low-boiling components were removed from the reaction solution by distillation under reduced pressure, yielding 3.1 g of compound (G). The structure of compound (G) was confirmed by the following NMR data.

[0280] 1 H-NMR (400MHz, CDCl3): δ 7.38-7.26 (m, 5H), 5.13 (s, 2H), 3.42 (m, 2H), 2.65 (m, 1H), 2.36 (m, 1H), 2.10-1.60 (m,14H), 0.80 (m, 2H).

[0281]

[0282] <Step 2-4: Synthesis of Compound (H)> Under a nitrogen atmosphere, trimethylsilanol (0.19 g) and THF (5 mL) were added to a 100 mL three-neck flask and stirred at 25°C. The mixture was then cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 0.9 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.2 M, 1 mL) was then added dropwise, followed by a THF solution of hexamethylcyclotrisiloxane (1.2 M, 9 mL) and stirring for 2 hours. Compound (G) (1.28 g) was then added, and the mixture was stirred at 25°C for 1 hour. Hexane and ion-exchanged water were added sequentially to the reaction solution, followed by separation, and the organic phase was separated. The solvent and low-boiling components were removed from the organic phase by distillation under reduced pressure, followed by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 1.2 g of compound (H). The structure of compound (H) was confirmed by the following NMR data. In compound (H), the average value of n was 18.

[0283] 1 ​​H-NMR (400MHz, CDCl3): δ 7.38-7.26 (m, 5H), 5.13 (s, 2H), 3.42 (m, 2H), 2.65 (m, 1H), 2.36 (m, 1H), 2.10-1.60 (m, 14H), 0.42 (m, 2H),0.35-(-0.08) (m, 129H).

[0284]

[0285] <Step 2-5: Synthesis of Compound (I)> Under a hydrogen atmosphere, compound (H) (3.2 g), 10% palladium-carbon (50% water content, 320 mg), and THF (15 mL) were added to a 100 mL flask and stirred at 25°C for 4 hours. Insoluble matter was filtered off from the reaction solution, and the solvent in the filtrate was evaporated under reduced pressure to obtain 2.9 g of compound (I). The structure of compound (I) was confirmed by the following NMR data. In compound (I), the average value of n was 18.

[0286] 1 H-NMR (400MHz, CDCl3): δ 3.42 (m, 2H), 2.65 (m, 1H), 2.36 (m, 1H), 2.10-1.60 (m, 14H), 0.42 (m, 2H),0.35-(-0.08)(m, 129H).

[0287]

[0288] ​<Step 2-6: Synthesis of Compound (J)> Compound (I) (1.5 g), 2,2-diallylpent-4-en-1-amine (660 mg), triethylamine (0.70 mL), and THF (30 mL) were placed in a 100 mL flask and stirred at 25°C. Next, a solution of 1-propanephosphonic anhydride in ethyl acetate (50% by mass, 1.5 mL) was added, and the mixture was stirred at 25°C for 16 hours. Ion-exchanged water was sequentially added to the reaction solution, followed by ethyl acetate, and extraction as an organic phase. The organic phase was washed with 2N hydrochloric acid, saturated sodium bicarbonate water, and saturated saline, and dried over magnesium sulfate. Next, the solvent and low-boiling components were distilled off from the organic phase under reduced pressure, and flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) was performed to obtain 1.3 g of compound (J). The structure of compound (J) was confirmed by the following NMR data. The average value of n in compound (J) was 18.

[0289] 1 H-NMR (400MHz, CDCl3): δ 5.81 (ddt, J=16.9, 10.2, 6.7Hz, 2H), 5.42-5.27 (m, 1H), 5.05-4.85 (m, 4H), 3.42 (m, 2H), 3.19 (m, 2H), 2.65 (m, 1H), 2.36 (m, 1H), 2.10-1.60 (m, 14H), 0.42 (m, 2H), 0.35-(-0.08) (m, 129H).

[0290]

[0291] <Step 2-7: Synthesis of Compound (K)> Dichloromethane (10 g) and compound (J) (0.80 g) were placed in a 100 mL flask and stirred at 25°C. A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.40 g) were added and stirred at 25°C for 2 hours. The solvent was removed from the reaction solution by distillation under reduced pressure to obtain 0.75 g of compound (K). The structure of compound (K) was confirmed by the following NMR data. The average value of n in compound (K) was 18.

[0292] 1 ​​H-NMR (400MHz, CDCl3): δ 5.66 (s, 1H), 3.42 (m, 2H), 3.19(m, 2H), 2.65 (m, 1H), 2.36 (m, 1H), 2.10-1.60 (m, 23H), 0.42 (m, 2H),0.40 (m, 6H), 0.35-(-0.08) (m, 129H).

[0293]

[0294] [Example 3: Compound (O)] <Step 3-1: Synthesis of Compound (L)> Under a nitrogen atmosphere, 5-norbornene-2,3-dicarboxylic anhydride (3.0 g), THF (5.0 mL), and chlorodimethylsilane (2.3 g) were placed in a 200 mL flask and stirred at 25°C. A xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 0.10 mL) was added, and the mixture was stirred at 70°C for 2 hours. The solvent and low-boiling components were removed from the reaction solution by distillation under reduced pressure, yielding 3.1 g of Compound (L). The structure of Compound (L) was confirmed by the following NMR data.

[0295] 1 H-NMR (400MHz, CDCl3): δ 3.75 (m, 2H), 3.15 (m, 1H), 2.91 (m, 1H), 2.21-1.58 (m, 5H), 0.43-(-0.08) (m, 6H).

[0296]

[0297] ​<Step 3-2: Synthesis of Compound (M)> Under a nitrogen atmosphere, trimethylsilanol (0.19 g) and THF (5 mL) were added to a 100 mL three-neck flask and stirred at 25°C. The mixture was then cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 0.9 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.2 M, 1 mL) was then added dropwise, followed by a THF solution of hexamethylcyclotrisiloxane (1.2 M, 9 mL) and stirring for 2 hours. Compound (L) (1.28 g) was then added, and the mixture was stirred for 1 hour. Hexane and ion-exchanged water were added sequentially to the reaction solution, followed by separation, and the organic phase was separated. The solvent and low-boiling components were removed from the organic phase by distillation under reduced pressure, followed by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 1.2 g of compound (M). The structure of compound (M) was confirmed by the following NMR data: In compound (M), the average value of n was 18.

[0298] 1 H-NMR (400MHz, CDCl3): δ 3.75 (m, 2H), 3.15 (m, 1H), 2.91 (m, 1H), 2.21-1.50 (m, 5H), 0.06-(-0.10) (m, 129H)

[0299]

[0300] <Step 3-3: Synthesis of Compound (N)> DMF (100 mL), compound (M) (1.0 g), triethylamine (1.0 g), and 2,2-diallylpent-4-en-1-amine (660 mg) were added to a 300 mL flask and heated under reflux overnight. Hexane and ion-exchanged water were added sequentially to the reaction solution, followed by separation and the organic phase was separated. The solvent and low-boiling components were removed from the organic phase by distillation under reduced pressure, followed by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 1.0 g of compound (N). The structure of compound (N) was confirmed by the following NMR data. The average value of n in compound (N) was 18.

[0301] 1 ​​H-NMR (400MHz, CDCl3): δ 5.81 (m, 3H), 5.05-4.85 (m, 6H), 3.75 (m, 2H), 3.35 (m, 2H), 3.15 (m, 1H), 2.91 (m, 1H), 2.21-1.50 (m, 5H), 0.06-(-0.10) (m, 129H).

[0302]

[0303] <Step 3-4: Synthesis of Compound (O)> Dichloromethane (10 g) and compound (N) (0.80 g) were placed in a 100 mL flask and stirred at 25°C. Next, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.40 g) were added and stirred at 25°C for 2 hours. The solvent was removed from the reaction solution by distillation under reduced pressure to obtain 0.77 g of compound (O). The structure of compound (O) was confirmed by the following NMR data. The average value of n in compound (O) was 18.

[0304] 1 H-NMR (400MHz, CDCl3): δ 3.75 (m, 2H), 3.40 (s, 27H), 3.35 (m, 2H), 3.15 (m, 1H), 2.91 (m, 1H), 2.21-1.25 (m, 14H), 0.40 (m, 6H), 0.06-(-0.10) (m, 129H).

[0305]

[0306] Example 4: Compound (R)] <Step 4-1: Synthesis of Compound (P)> 5.0 g of Compound (P) was obtained in the same manner as in Step 2-1 of Example 2, except that 3-oxo-5β-cholanic acid (5.2 g) was used as the starting material instead of 3-hydroxy-4-adamantanecarboxylic acid. The structure of Compound (P) was confirmed by the following NMR data.

[0307] 1 ​​H-NMR (400MHz, CDCl3): δ 7.42-7.29 (m, 5H), 5.11 (d, J=2.6Hz, 2H), 2.51 (t, J=13.5Hz, 1H), 2.40 (ddd, J=15.1, 10.0, 5.0Hz, 1H), 2.27 (ddd, J=15.6, 9.4, 6.7Hz, 1H), 2.15-1.92 (m, 3H), 1.92-1.74 (m, 4H), 1.52-0.94 (m, 19H), 0.94-0.84 (m, 8H).

[0308]

[0309] <Step 4-2: Synthesis of Compound (Q)> Methyltriphenylphosphonium bromide (7.8 g) and THF (100 mL) were placed in a 300 mL flask and cooled to -78°C. Next, a hexane solution of n-BuLi (33 mL, 1.6 M) was added. The temperature was then raised to 0°C and the mixture was stirred for 1 hour. The mixture was again cooled to -78°C, and a tetrahydrofuran solution (90 mL) of compound (P) (3.4 g) was added, followed by stirring at 0°C for 12 hours. Aqueous ammonium chloride solution and diethyl ether were added sequentially to the reaction solution, followed by separation and the organic phase was separated. The organic phase was washed with saturated saline and dried over anhydrous sodium sulfate, and then subjected to flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 2.2 g of compound (Q). The structure of compound (Q) was confirmed by the following NMR data.

[0310] 1 H-NMR (400MHz, CDCl3): δ 7.42-7.29 (m, 5H), 5.11 (d, J=2.6Hz, 2H), 4.64-4.49 (m, 2H), 2.51 (t, J=13.5Hz, 1H), 2.40 (ddd, J=15.1, 10.0, 5.0Hz, 1H), 2.27 (ddd, J=15.6, 9.4, 6.7Hz, 1H), 2.15-1.92 (m, 3H), 1.92-1.74 (m, 4H), 1.52-0.94 (m, 19H), 0.94-0.84 (m, 8H).

[0311] ​

[0312] <Step 4-3: Synthesis of Compound (R)> 0.8 g of compound (R) was obtained in the same manner as in Steps 2-3 to 2-7 of Example 2, except that compound (Q) was used instead of compound (F). The structure of compound (R) was confirmed by the following NMR data. In compound (R), the average value of n was 18.

[0313] 1 H-NMR (400MHz, CDCl3): δ 3.40 (s, 27H), 3.35 (m, 2H), 2.40 (ddd, J=15.1, 10.0, 5.0Hz, 1H), 2.27 (ddd, J=15.5, 9.3, 6.6Hz,1H), 1.93 (d, J=10.7Hz, 1H), 1.83 (dd, J=10.8, 6.6Hz, 3H), 1.73 (d, J=13.1Hz, 1H), 1.60-0.79 (m, 95H), 0.42 (m, 2H), 0.40 (m, 6H), 0.22-(-0.24) (m, 129H).

[0314]

[0315] [Example 5: Compound (S)] The following compound (S) was synthesized according to the method described in Example 1 of WO 2023 / 017830. "18" in the following compound (S) represents [-Si(Me) ２ This means that the average number of repeating units represented by the formula [O-] was 18.

[0316]

[0317] [Production of Articles] Using the compounds synthesized in Examples 1 to 5, a substrate was subjected to surface treatment by the following method, and articles of Examples 101 to 105 each having a substrate and a surface-treated layer formed on the substrate were produced. A wet coating method was used as the surface treatment method. 30 g of silicon oxide was placed as a deposition source in a copper hearth in a vacuum deposition apparatus ("VTR-350M" manufactured by ULVAC Kiko Co., Ltd.). A glass substrate was placed in the vacuum deposition apparatus, and the interior of the vacuum deposition apparatus was heated to 5 × 10 －３ ​The pressure was evacuated to a pressure of 100 Pa or less. The hearth was heated to approximately 2000°C, and silicon oxide was vacuum-deposited on the surface of the substrate, preparing a silicon oxide layer-coated substrate having a silicon oxide layer approximately 20 nm thick. The silicon oxide layer-coated substrate was placed on the sample stage of a spray coater (API-90RS, manufactured by Apiros Co., Ltd.) with the silicon oxide layer facing up. Next, 13 g of a heptane solution containing 0.2 mass% of the compound obtained in each example was loaded into a syringe in the spray coater and spray-coated at an atomization pressure of 130 kPa, a nozzle-to-sample surface distance of 50 mm, and a scanning speed of 300 mm / sec (wet coating method). The silicon oxide layer-coated substrate with the compound coated on its surface was then heat-treated at 140°C for 30 minutes, yielding evaluation samples (articles) of Examples 101 to 105, in which the substrate, silicon oxide layer, and surface layer were laminated in this order.

[0318] [Evaluation] The light resistance of the articles of Examples 101 to 105 obtained by the wet coating method was evaluated by the following method.

[0319] <Lightfastness> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the article, and the water contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). Measurements were taken at five points on the surface treatment layer, and the arithmetic mean value calculated from the measurements was taken as the initial contact angle. The 2θ method was used to measure the water contact angle. A uniform light irradiation unit (manufactured by Ushio Inc.) was attached to a mercury lamp (manufactured by Ushio Inc., "SP-9250DB"), and the sample was placed 17.5 cm from the lens so that the surface treatment layer faced the mercury lamp. The light intensity at 200-800 nm was measured using an intensity meter (VEGA, manufactured by OPHIL), and was found to be 200 mW / cm ２The sample was irradiated with uniform light from a mercury lamp for 100 hours in an atmospheric atmosphere at a temperature of 20 to 40°C and a humidity of 30 to 75%. The water contact angle of the sample after irradiation was measured in the same manner as for the initial contact angle, and the arithmetic mean value calculated from the measured values ​​was taken as the water contact angle after light irradiation. The difference (degree of decrease) in the water contact angle before and after irradiation was calculated using the following formula, and the light resistance of the surface treatment layer was evaluated based on the calculated difference in the water contact angle before and after irradiation. The smaller the difference in the water contact angle before and after irradiation, the more excellent the light resistance. Difference in water contact angle before and after irradiation = (initial contact angle) - (water contact angle after light irradiation)

[0320] The evaluation criteria for light resistance are as follows: A: The difference in water contact angle before and after irradiation was less than 5°; B: The difference in water contact angle before and after irradiation was 5° or more and less than 10°; C: The difference in water contact angle before and after irradiation was 10° or more.

[0321] The evaluation results are shown in Table 1. Examples 1 to 4 and 101 to 104 are working examples, and Examples 5 and 105 are comparative examples. In the table, the "alicyclic structure" column of "compound" indicates the alicyclic structure of the compound synthesized in each example. Note that "fused ring A" is "4-azatricyclo[5.2.1.0] ２，６ ]decane ring, and "fused ring B" means "hexadecahydro-1H-cyclopenta[a]phenanthrene ring." Furthermore, since compound (S) synthesized in Example 5 does not have an alicyclic structure, "none" is entered in the "alicyclic structure" column.

[0322]

[0323] As shown in Table 1, it was found that the compounds of Examples 1 to 4 were capable of forming a surface treatment layer having superior light resistance compared to the compound of Example 5.

[0324] The compounds of the present disclosure are useful as surface treatment agents. The surface treatment agents can be used, for example, for display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, and substrates used in nanoimprint technology. The surface treatment agents can also be used for the bodies, window glass (windshields, side glass, rear glass), mirrors, bumpers, and the like of transportation equipment such as trains, automobiles, ships, and aircraft. The surface treatment agents can also be used for outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. The surface treatment agents can also be used for various indoor facilities such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. The surface treatment agents can also be used for antifouling treatment of jigs, interior walls, piping, and the like in factories. The surface treatment agents can also be used for goggles, eyeglasses, helmets, pachinko machines, textiles, umbrellas, playground equipment, and soccer balls. The surface treatment agents can also be used as anti-adhesion agents for various packaging materials such as food packaging, cosmetic packaging, and the inside of pots. The surface treatment agent can also be used for optical components such as car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical devices such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and antireflection films.

[0325] This application claims priority based on Japanese Patent Application No. 2023-113041, filed on July 10, 2023, the disclosure of which is incorporated herein by reference in its entirety.

Claims

1. A compound represented by formula (1-1) or formula (1-2). T-O-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -A-(Si(R) ｎ L ３－ｎ ) ｑ (1-1) ((R) ｎ L ３－ｎ Si) ｑ -A-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -A-(Si(R) ｎ L ３－ｎ ) ｑ (1-2) T is (R １ ) ３ Si-, a monovalent cyclic polysiloxane residue or a monovalent cage-shaped polysiloxane residue, R １ are each independently a hydrocarbon group or a trialkylsilyloxy group; R ２ are each independently a hydrocarbon group or a trialkylsilyloxy group, each A is independently a (q+1)-valent linking group having an alicyclic structure which may have a heteroatom, each R is independently a hydrocarbon group, each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, each m is a number of 0 or more, each n is independently an integer from 0 to 2, and each q is independently an integer of 1 or more.

2. The compound according to claim 1, wherein the compound represented by formula (1-1) is a compound represented by formula (2), a compound represented by formula (3), or a compound represented by formula (4). (R １ ) ３ Si-O-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L １ -L ２ -L ３ -(Si(R) ｎ L ３－ｎ ) ｑ (2) R １ are each independently a hydrocarbon group or a trialkylsilyloxy group; R ２ are each independently a hydrocarbon group or a trialkylsilyloxy group; L １ is a single bond or a divalent linking group, L ２ is a divalent alicyclic group which may have a heteroatom; L ３ is a (q+1)-valent linking group, each R is independently a hydrocarbon group, each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, each m is a number of 0 or more, each n is independently an integer of 0 to 2, and q is an integer of 1 or more. (R １ ) ３ Si-O-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ４ -L ５ - (L ６ -Si(R) ｎ L ３－ｎ ) ｒ (3) R １ are each independently a hydrocarbon group or a trialkylsilyloxy group; R ２ are each independently a hydrocarbon group or a trialkylsilyloxy group; L ４ is a single bond or a divalent linking group, L ５ is a (r+1)-valent alicyclic group which may have a heteroatom; L ６ are each independently a single bond or a divalent linking group, R is each independently a hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, m is a number of 0 or more, n is each independently an integer of 0 to 2, and r is an integer of 1 or more. (R １ ) ３ Si-O-(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ７ -L ８ -L ９ -L １０ - (L １１ -Si(R) ｎ L ３－ｎ ) ｓ (4) R １ are each independently a hydrocarbon group or a trialkylsilyloxy group; R ２ are each independently a hydrocarbon group or a trialkylsilyloxy group; L ７ and L ９ each independently represents a single bond or a divalent linking group; ８ is a divalent alicyclic group which may have a heteroatom; L １０ is a (r+1)-valent alicyclic group which may have a heteroatom; L １１ each independently represents a single bond or a divalent linking group, each R independently represents a hydrocarbon group, each L independently represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, each m is a number of 0 or more, each n independently represents an integer from 0 to 2, and each s is an integer of 1 or more.

3. The compound according to claim 1, wherein m is a number from 2 to 600.

4. The compound of claim 1, wherein q is an integer from 1 to 4.

5. The compound according to claim 2, wherein m is a number from 2 to 600.

6. The compound of claim 2, wherein q is an integer from 1 to 4.

7. A composition comprising a compound according to any one of claims 1 to 6 and a liquid medium.

8. A surface treatment agent comprising the compound according to any one of claims 1 to 6.

9. A surface treatment agent comprising the compound according to any one of claims 1 to 6 and a liquid medium.

10. A method for manufacturing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 8; and manufacturing an article having a surface treatment layer formed on the substrate.

11. An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 8.

12. The article of claim 11 which is an optical component.

13. The article according to claim 11, which is a display or a touch panel.

14. A method for manufacturing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 9; and manufacturing an article having a surface treatment layer formed on the substrate.

15. An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 9.

16. The article of claim 15 which is an optical component.

17. The article according to claim 15, which is a display or a touch panel.