The process for fabricating photocatalytic electrodes using silenit bismuth ferrite material by electrochemical method.

VN126800APending Publication Date: 2026-07-15HANOI UNIV OF SCI & TECH
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Patent Information

Application Number
VN1202409746
Authority / Receiving Office
VN · VN
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-12-27
Publication Date
2026-07-15

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Abstract

The invention proposes an electrochemical deposition process for the fabrication of photocatalytic electrodes made of bismuth ferrite silenite material (given the general formula BixFeyOz where x, y, and z are chemical ratio models. The chemical ratio models of silenite crystals vary depending on the precise chemical composition of the crystal). This process improves the quality of the silenite film with high adhesion and uniformity, and reduces the step of coating the bismuth ferrite silenite material onto the electrode after fabrication compared to traditional methods. The fabrication steps include: (a) cleaning for conductivity, (b) preparation of the electrolyte solution, (c) dissolution of the precursor, (d) preparation of the electrochemical cell, (e) electrochemical deposition, (f) washing the sample after electrochemical deposition, and (g) sample incubation.
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