GAS CULTURE EQUIPMENT, CHEMICAL SOLUTION SPRAYING EQUIPMENT WITH GAS CULTURE EQUIPMENT, METHODS FOR HARDENING CHEMICAL SOLUTION SAMPLES

VN127844APending Publication Date: 2026-08-17AP SYST INC
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Patent Information

Application Number
VN1202600217
Authority / Receiving Office
VN · VN
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-21
Filing Date
2026-01-10
Publication Date
2026-08-17

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Abstract

The invention's designation relates to a gas-generating apparatus which creates an inert gas environment around a chemical solution sample coated onto a substrate. The gas-generating apparatus comprises a pump located on one side of a discharge unit configured to discharge the chemical solution to supply the chemical solution sample on the substrate, a pump configured to inject inert gas toward the chemical solution sample, and a grooved gas flow control unit configured to control the movement of the inert gas and supported on the pump unit. According to the invention's designation, the amount of inert gas used to harden the chemical solution sample can be reduced. In addition, the inert gas can be distributed evenly in the space in which it is injected. Therefore, the hardening quality for multiple chemical solution samples can be uniform.
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