Magnetic field sputtering gun (MAGNETRON) with integrated multi-functional isolation base
VN128146APending Publication Date: 2026-08-17TRUONG AI HOC NGUYEN TAT THANH
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Patent Information
- Application Number
- VN1202604679
- Authority / Receiving Office
- VN · VN
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2026-06-08
- Publication Date
- 2026-08-17
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Figure VN1202604679_0
Abstract
The invention relates to a magnetron sputtering gun with an integrated multi-functional isolation base, in which a multi-functional isolation base is configured as the central element linking the sputtering core assembly (anode), the cylindrical shield (cathode), and the support assembly. This base is constructed from a heat-resistant, elastically deformable insulating material, performing the functions of electrical isolation, mechanical bonding, sealing, and shaping the vacuum gap between the electrodes. The vacuum gap is size-controlled and sealed at the bottom to limit parasitic plasma and increase electric field stability. Simultaneously, the elastic deformation of the base allows for thermal expansion compensation and maintains stable pressure on the sealing elements. Thanks to this integrated structure, the device achieves high stability, reduced leakage, reduced size, and is suitable for multi-source sputtering systems.
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