Low-e coated glass suitable for tempered and non-tempered use

Abstract

The invention is a low-e (20) coated glass (10) comprising an infrared reflective layer (23) located between a lower dielectric structure (21 ) comprising at least one dielectric layer and an upper dielectric structure (25) comprising at least one dielectric layer and designed to ensure that the optical performance thereof is constant in the case of tempered (T) and non-tempered (NT) uses.

Description

[0001] LOW-E COATED GLASS SUITABLE FOR TEMPERED AND NON-TEMPERED USE

[0002] TECHNICAL FIELD

[0003] The invention relates to a low-emission (low-e) coated glass which effectively transmits visible light while also providing heat control.

[0004] PRIOR ART

[0005] One of the factors that differentiate the optical properties of glasses is the coating applications made on the glass surface. One of the coating applications is the magnetic field-assisted sputtering method in a vacuum environment. This method is a frequently used method in the production of architectural and automotive coatings with low-e properties. The transmittance and reflectance values of the glasses coated with said method in the visible, near-infrared and infrared regions can be obtained at the targeted levels.

[0006] Apart from the visible region transmittance and reflectance values, the total solar energy transmittance (g) value is also an important parameter in coated glasses which can be used in the architectural and automotive sectors. The low total solar energy transmittance (g) value of coated glasses can be preferred to in regards to reducing the cooling loads in hot climate geographies. The total solar energy transmittance (g) values of coated glasses can also be kept at the targeted levels by the number of independent Ag layers they contain, and the parametric optimizations of the layers used.

[0007] Patent publication number CN103144381 B relates to a low-e coated glass. In said low-e coated glass, a first dielectric layer, a second barrier layer, a third dielectric layer, a fourth functional layer Ag (silver), a fifth protective layer, and a sixth protective layer are sequentially coated on a substrate. Said first dielectric layer is one of SiNx(silicon nitride), ZnOx(zinc oxide), ZnSnOx(zinc tin oxide) or TiOx(titanium oxide); the second barrier layer may be NiCr (nickel-chromium) or Cr (chromium); the third dielectric layer is one of SiNx, ZnOx, ZnSnOx, or TiOx; the fourth functional layer is an Ag layer; the fifth protective layer may be a NiCr or Cr layer; and the sixth protective layer may be a layer of ZnOx, ZnSnOx, AZO (aluminum zinc oxide), SiNx, or TiOx.

[0008] SUMMARY OF INVENTION

[0009] The present invention relates to low-e-coated glass to bring new advantages to the relevant technical field.

[0010] The main object of the invention is to produce a low-e coating having a constant optical performance in tempered and non-tempered uses.

[0011] Another object of the invention is to propose a low-e coated glass with intermediate level visible light transmittance.

[0012] Another object of the invention is to produce a low-e coating that allows the combination of tempered and non-tempered use.

[0013] Another object of the invention is to propose a low-e coating layer thickness relationship that allows the combination of tempered and non-tempered use.

[0014] In order to accomplish all the objects mentioned above and to be derived from the detailed description below, the present invention is a low-e coated glass comprising an infrared reflective layer positioned between a lower dielectric structure comprising at least one dielectric layer and an upper dielectric structure comprising at least one dielectric layer. Accordingly, in order to ensure that the optical performance of said low- e coating is constant in the case of tempered and non-tempered use, the total optical path of the upper dielectric structure should be between 65 nm and 120 nm, the total optical path of the lower dielectric structure should be between 20 nm and 90 nm, and the NT-FBLR / T-FBLR ratio should be 0.4-0.6.

[0015] Another preferred embodiment of the invention is that said lower dielectric structure comprises dielectric layers with different contents.

[0016] Another preferred embodiment of the invention is that said lower dielectric structure comprises at least one material with high refractive index. Another preferred embodiment of the invention is that the upper dielectric structure contains materials with a refractive index between 1 .5 and 2.1 .

[0017] Another preferred embodiment of the invention is that upper dielectric structure comprises layers having different contents.

[0018] Another preferred embodiment of the invention is a thermal insulation unit with a coated glass configured as described above and a visible zone transmittance value of 45 - 65%.

[0019] BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Fig. 1 shows a representative view of the low-e coated glass.

[0021] REFERENCE NUMERALS IN DRAWINGS

[0022] 10 Glass

[0023] 20 Low-e coating

[0024] 21 Lower dielectric structure

[0025] 211 First dielectric layer

[0026] 212 Second dielectric layer

[0027] 213 Third dielectric layer

[0028] 22 Lower barrier layer

[0029] 23 Infrared reflective layer

[0030] 24 Upper barrier layer

[0031] 25 Upper dielectric structure

[0032] 251 Fourth dielectric layer

[0033] 252 Fifth dielectric layer

[0034] 253 Sixth dielectric layer

[0035] 26 Protective layer

[0036] DETAILED DESCRIPTION OF THE INVENTION In this detailed description low-e coated (20) and low-e coated (20) glass (10) which are the subject of the invention, are explained by way of example only for a better understanding of the subject which will not create any limiting effect.

[0037] The production of low-e coated (20) glass (10) for architecture and automotive is carried out by the sputtering method. This invention generally relates to low-e coated (20) glasses (10) with high heat treatment resistance, which have daylight permeable properties, and the contents and application of said low-e coating (20). The low-e coated (20) glass (10) which is the subject of the invention can be used in single glass, double glazing units, and laminated structures in the architectural and automotive sectors.

[0038] The term "optical performance" mentioned in the invention refers to the visible region light transmittance, total solar energy transmittance, visible region internal and external reflection values for low-e coated (20) glass (10) in the thermal insulation unit second face usage, and CIE L*, a*, b* color values for single glass usage. The concept of intermediate transmittance refers to the visible transmittance value between 45% and 65%.

[0039] The refractive indices of all layers in the low-e coated (20) glass (10) which is the subject of the invention were determined using computational methods based on the optical constants obtained from single layer measurements. Said refractive indices are refractive index data at 550 nm.

[0040] The low-e coating (20), which is the subject of the invention, comprises an infrared reflective layer (23) that allows to transmit the solar energy spectrum visible region (hereinafter referred to as % TViS) at a targeted level and to reflect (by transmitting less) thermal radiation in the infrared region. Ag layer is used as the infrared reflective layer (23) and heat radiation is low.

[0041] In order to obtain a low-e coated (20) glass (10) which has an intermediate level of visible light transmittance, is heat treatable and is designed in such a way that the angular color change is at a level showing minimal change, by using the sputtering method, a low-e coating (20) consisting of multiple metal, metal oxide and metal nitride / oxynitride layers positioned on the glass (10) surface has been developed. Said layers are deposited on top of each other in a vacuum environment.

[0042] In this text, the term heat treatment refers to the use of at least one and / or more of the tempering, partial tempering, annealing, lamination and bending processes in combination.

[0043] From now on in the text, tempered uses will be shown as "T" and non-tempered uses will be shown as "NT" (non-tempered).

[0044] Studies have shown that the ratio between the thicknesses of the metallic layers in NT and T product arrangements is important at the point of obtaining NT and T version products for a certain transmittance level. The relationship between the thicknesses of the infrared reflective layer (23), the first barrier layer (22) and the second barrier layer (24) which constitutes said ratio is critical for keeping the optical performance of NT and T structures constant.

[0045] The term BLR (ratio of barrier layers) refers to the ratio of the physical thickness of the second barrier layer to the first barrier layer.

[0046] BLR=thickness of the second barrier layer (24) / thickness of the first barrier layer (22)

[0047] The term NT-BLR refers to the BLR ratio for non-tempered structures.

[0048] The term T-BLR refers to the BLR ratio for tempered structures.

[0049] The term FBLR represents the ratio of the physical thickness of the infrared reflective layer to the BLR.

[0050] FBLR= infrared reflective layer (23) thickness / BLR

[0051] The term NT-FBLR refers to the FBLR ratio for non-tempered structures.

[0052] The term T-FBLR refers to the FBLR ratio for tempered structures.

[0053] The term high refractive index refers to the refractive index value greater than 2.2. As a result of experimental studies to develop a low-e coating (20) arrangement that is preferred both in terms of ease of production and optical properties, the following data were determined.

[0054] In the low-e coating (20) which is the subject of the invention is, a lower dielectric structure (21 ) is used which will contact the glass (10). Said lower dielectric structure (21 ) comprises at least one or more of the materials SixNy, SiOxNy, ZnAI, ZnAIOx, ZnSnOx, SnOx, TiOx, TiNx, ZrNx. The lower dielectric structure (21 ) comprises at least one layer with a high refractive index. In the preferred embodiment, the lower dielectric structure (21 ) comprises a first dielectric layer (21 1 ), optionally a second dielectric layer (212), and a third dielectric layer (213).

[0055] Said first dielectric layer (211 ) comprises at least one of the materials SixNy, SiOxNy, ZnAI, ZnAIOx, ZnSnOx, SnOx, TiOx, TiNx, ZrNx. In the preferred embodiment, the first dielectric layer (211 ) comprises SixNy. The first dielectric layer (211 ) comprising SixNyacts as a diffusion barrier, inhibiting alkaline ion migration which is facilitated at high temperature. Thus, the first dielectric layer (21 1 ) comprising SixNysupports the resistance of the low-e coating (20) to heat treatment processes. The refractive index value of the first dielectric layer (211 ) comprising SixNyis between 1 .97 and 2.15.

[0056] Said second dielectric layer (212) comprises at least one of the materials SixNy, SiOxNy, ZnAI, ZnAIOx, ZnSnOx, SnOx, TiOx, TiNx, ZrNx. In the preferred embodiment, the second dielectric layer (212) comprises TiOx. The second dielectric layer (212) comprising TiOxhas a reflection-reducing effect in the low-e coating (20), but also has the capability to store mobile ions from the glass (10) to prevent the deterioration of the properties of the infrared reflective layer (23). The refractive index of the second dielectric layer (212) comprising TiOxis between 2.2 and 2.5.

[0057] Said third dielectric layer (213) comprises at least one of the materials SixNy, SiOxNy, ZnAI, ZnAIOx, ZnSnOx, SnOx, TiOx, TiNx, ZrNx. In the preferred embodiment, the third dielectric layer (213) comprises ZnAIOx. The preferred coating parameters for the third dielectric layer (213) comprising ZnAIOx allow this layer to be obtained as crystalline. The third dielectric layer (213) comprising ZnAIOx, due to its crystal structure being similar to that of the infrared reflective layer (23), allows the optoelectronic properties of the infrared reflective layer (23) to be obtained at the desired levels. The refractive index value of the third dielectric layer (213) comprising ZnAIOxis between 1.97 and 2.05.

[0058] The first barrier layer (22) is located on the third dielectric layer (213) comprising ZnAIOx. At least one of NiCr, NiCrOx, Ti, TiOx, ZnAIOx, ZnOxis used as the first barrier layer (22). In the preferred embodiment, one of NiCr or NiCrOx is used as the first barrier layer (22). In one embodiment of the invention, NiCr is used as the first barrier layer (22). In another embodiment of the invention, NiCrOx is used as the first barrier layer (22). The first barrier layer (22) comprising one of either NiCr or NiCrOx essentially improves the mechanical properties of the low-e coating (20) and also helps to achieve the visible region transmittance level at the targeted level with the optimization of the other layers.

[0059] An infrared reflective layer (23) is located on the first barrier layer (22). Ag layer is used as the infrared reflective layer (23).

[0060] A second barrier layer (24) is located on the infrared reflective layer (23). At least one of NiCr, NiCrOx, TiOx, ZnSnOx, ZnAIOx, ZnOxis used as the second barrier layer (24). In the preferred embodiment, the second barrier layer (24) comprises one of either NiCr or NiCrOx. In an embodiment of the invention, NiCr is used as the second barrier layer (24). In another alternative embodiment of the invention, NiCrOx is used as the second barrier layer (24). The second barrier layer (24) comprising one of either NiCr or NiCrOx ensures that the reflective properties of the infrared reflective layer (23) are maintained. In addition, the fact that the second barrier layer (24) is adjacent to the infrared reflective layer (23) located below and the upper dielectric structure (25) located above thereof contributes to the improvement of the mechanical properties of the low-e coating (20).

[0061] An upper dielectric structure (25) is located on the second barrier layer (24). Upper dielectric layer (25) comprises at least three of the materials SixNy, SiOxNy, ZnSnOx, SnOx, ZnAIOx, TiZrOx, TiOx, TiNx, ZrNx. Upper dielectric structure (25) comprises a fourth dielectric layer (251 ), a fifth dielectric layer (252), and a sixth dielectric layer (253), respectively. Said fourth dielectric layer (251 ) comprises at least one of the materials SixNy, SiOxNy, ZnSnOx, SnOx, ZnAIOx, TiZrOx, TiOx, TiNx, ZrNx. In the preferred embodiment, the fourth dielectric layer (251 ) comprises ZnAIOx. The refractive index of the fourth dielectric layer (251 ) comprising ZnAIOx is between 1.97 and 2.05. Said fifth dielectric layer (252) comprises at least one of the materials SixNy, SiOxNy, ZnSnOx, SnOx, ZnAIOx, TiZrOx, TiOx, TiNx, ZrNx. In the preferred embodiment, the fifth dielectric layer (252) comprises SiNy. The refractive index value of the fifth dielectric layer (252) comprising SixNyis between 1.97 and 2.15. Said sixth dielectric layer (253) comprises at least one of the materials SixNy, SiOxNy, ZnSnOx, SnOx, ZnAIOx, TiZrOx, TiOx, TiNx, ZrNx. In the preferred embodiment, the sixth dielectric layer (253) comprises SiOxNy. The refractive index value of the sixth dielectric layer (252) comprising SiOxNyis between 1.82 and 1.92. By arranging the upper dielectric structure (25) as mentioned, the reflection values of the low-e coating (20) are obtained at the targeted levels. The fourth dielectric layer (251 ) located in the upper dielectric structure exhibits good adhesion with the metal / metal oxide layer that precedes it and the subsequent dielectric layers that may contain oxide, oxynitride or nitride. Thus, it prevents delamination in low-e coating (20), increasing adhesion resistance.

[0062] A protective layer (26) is located on top of the upper dielectric structure (25). In an embodiment of the invention, said protective layer (26) comprises at least one of the materials SixNy, SiOxNy, ZnSnOx, SnOx, TiZrOx, TiOx, TiNx, ZrNx,ZrOx, NbZrOx, NbOx.

[0063] A protective layer (26) with high refractive index is located on top of the upper dielectric structure (25). in another alternative embodiment of the invention, said protective layer (26) comprises at least one of the materials NbOx, TiZrOx, TiOx, TiNx, ZrNx, ZrOx, NbZrOx. In the preferred embodiment, the protective layer (26) comprises TiOx. The use of a protective layer (26) comprising TiOxas the final layer increases the scratch resistance of the low-e coating (20). The refractive index of the protective layer (26) comprising TiOxis between 2.2 and 2.5.

[0064] If SiOxNyis preferably used as the sixth dielectric layer (253) positioned under and in contact with said protective layer (26), the total visible region transmittance value of the low-e coated (20) glass (10) increases. In this invention, the term "constant" refers to a change of ±1 unit for transmittance and reflection heat, light and color values in a thermal insulation unit comprising single glazing and / or double glazing. Here, the "unit" means % change for heat and light, and numerical change in L*, a*, and b* for color values. The term "AE" is used for the visual distinctiveness of two different glasses in terms of color. The "AE" value mentioned in this text refers to the difference in the color values (10) of "NT" and "T" coded low-e coated (20) glasses. The lower the AE value, the smaller the color difference. In the state of the art, it is as follows;

[0065] • <= 1 .0: Imperceptible to the human eye

[0066] • 1-2: Detectable through close observation

[0067] • 2-10: Detectable at first glance

[0068] • 11 -49: Colors are more similar than opposite

[0069] • 100: Colors are opposite

[0070] Although AE is a concept that describes the color difference, it can also be misleading. For this reason, in order to make a more accurate evaluation, it is preferred that the difference between each of the optical performance values defined in this invention text is minimal.

[0071] In the present art, in low-e coated (20) glasses (10), heat, light and color values generally vary before and after heat treatment. In some cases, heat and light transmittance may vary and only color values can be kept constant, in some cases, on the contrary, color values may vary, and only heat and light values can be kept constant. The desired situation is that the heat, light and color values can all be kept constant in NT and T applications.

[0072] In the low-e coatings (20) of the invention embodied under the scope mentioned above, the total optical path of the lower dielectric structure (21) is between 20 nm and 90 nm. In the preferred embodiment, the total optical path of the lower dielectric structure (21) is between 20 nm and 85 nm. In the most preferred embodiment, the total optical path of the lower dielectric structure (21) is between 25 nm and 80 nm.

[0073] In the low-e coatings (20) of the invention embodied under the scope mentioned above, the total the optical path of the upper dielectric structure (25) is between 65 nm and 120 nm. In the preferred embodiment, the total optical path of the upper dielectric structure (25) is between 70 nm and 115 nm. In the most preferred embodiment, the total optical path of the upper dielectric structure (25) is between 75 nm and 110 nm.

[0074] In the low-e coated glass (20) which is the subject of the invention (10), the ratio of the physical thicknesses of the infrared reflective layer (23) and the first barrier layer (22) located below this layer to the physical thickness of the second barrier layer located above this layer (23) is important. The physical thicknesses of the second barrier layer (24) and the first barrier layer (22) each should be no more than 2.5 nm.

[0075] According to the findings obtained as a result of the studies conducted in this context; it has been determined that the NT-BLR I T-BLR ratio is between 2 - 2.6 in NT and T applications for the low-e coating (20) described above.

[0076] In this context, the NT-FBLR I T-FBLR ratio should be between 0.4-0.6 to ensure that the optical performance is kept constant in NT and T applications for the low-e coating (20) described above. Thus, NT and T structures can achieve the same optical performance if the metallic layer thickness ratio and the optical path values of the lower dielectric structure (21 ) and the upper dielectric structure (25) are within the specified limits. In this way, even at different transmittance values, the optical performances of NT and T structures can be kept constant if the conditions described above are met.

[0077] Within this context, two examples are given below.

[0078] Example 1 :

[0079] In the low-e coating which is the subject of the invention; if

[0080] - NT-BLR / T-BLR ratio of 2.04

[0081] - NT-FBLR / T-FBLR ratio of 0.54 are used, the visible transmittance is between 59-65%. In said Example 1 embodiment, the total optical path of the lower dielectric structure (21) is kept between 57 nm - 67 nm, and the total optical path of the upper dielectric structure (25) is kept between 98 nm - 108 nm. Thus, for Example 1 , the optical performance values in NT and T applications remain constant.

[0082] Example 2:

[0083] In the low-e coating which is the subject of the invention; if

[0084] - NT-BLR / T-BLR ratio of 2.52

[0085] - NT-FBLR / T-FBLR ratio of 0.53 are used, the visible transmittance is between 47-53%. In said Example 2 embodiment, the total optical path of the lower dielectric structure (21) is kept between 33 nm - 43 nm, and the total optical path of the upper dielectric structure (25) is kept between 98 nm - 108 nm. Thus, for Example 2, the optical performance values in NT and T applications remain constant.

[0086] The changes in said optical performance values for the NT and T versions in the (10) low-e coated (20) glass which is the subject of the invention are as follows for the two example applications with different transmittance values given above.

[0087] Table 1

[0088] In this way, according to the need and preference of the place of use, it is possible to alternatively use low-e coated (20) glass (10) on the same fagade as annealed, laminated, tempered, etc., without sacrificing color, heat and light performances. The protection scope of the invention is specified in the appended claims and cannot be limited to what is described for illustrative purposes in this detailed description. Likewise, it is clear that a person skilled in the art can present similar embodiments in the light of the above, without departing from the main theme of the invention.

Claims

CLAIMS1. A low-e coated (20) glass (10) comprising an infrared reflective layer (23) located between a lower dielectric structure (21 ) comprising at least one dielectric layer and an upper dielectric structure (25) comprising at least one dielectric layer, characterized in that in order to ensure that the optical performance of said low-e coating (20) is constant in the case of tempered and non-tempered use, the total optical path of the upper dielectric structure (25) is between 65 nm and 120 nm, the total optical path of the lower dielectric structure (21 ) is between 20 nm and 90 nm, and the NT-FBLR / T-FBLR ratio is 0.4-0.6.

2. A low-e coated glass (10) according to claim 1 , characterized in that it comprises a protective layer (26) located on the upper dielectric structure (25).

3. A low-e coated (20) glass (10) according to claim 1 , characterized in that said lower dielectric structure (21 ) comprises dielectric layers with different contents.

4. A low-e coated (20) glass (10) according to claim 1 , characterized in that said lower dielectric structure (21 ) comprises at least one material with high refractive index.

5. A low-e coated (20) glass (10) according to claim 1 , characterized in that the upper dielectric structure (25) comprises materials having a refractive index between 1 .5 - 2.1 .

6. A low-e coated (20) glass (10) according to claim 1 , characterized in that the upper dielectric structure (25) comprises layers with different contents.

7. A thermal insulation unit comprising the low-e coated glass of claim 1 , with a visible transmittance value of 45 - 65%.

Images