Silicone depositing shampoo for damaged hair

The shampoo formulation for damaged hair addresses the challenge of 1,4 dioxane formation in conventional surfactants by using a specific alcohol ethoxysulfate surfactant and a dextran-based deposition aid polymer, achieving enhanced silicone deposition and compliance with regulatory limits.

WO2025064309A1 Publication Date: 2025-03-27DOW GLOBAL TECHNOLOGIES LLC +2
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Patent Information

Application Number
PCT/US2024/046617
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-09-18
Filing Date
2024-09-13
Publication Date
2025-03-27

AI Technical Summary

Technical Problem

Conventional shampoo formulations containing alkyl ethoxy sulfate anionic surfactants often generate undesirable 1,4 dioxane, which is challenging to remove and can exceed regulatory limits, especially when exposed to elevated temperatures during processing and handling.

Method used

A shampoo formulation for damaged hair that includes an alcohol ethoxysulfate surfactant of specific formula, a dermatologically acceptable silicone, and a deposition aid polymer, which is a dextran base polymer functionalized with quaternary ammonium moieties, to enhance silicone deposition while resisting 1,4 dioxane formation.

Benefits of technology

The formulation effectively resists 1,4 dioxane formation during sulfation and elevated temperature exposure, while significantly improving the deposition of silicone onto damaged hair, particularly bleached hair.

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Abstract

A shampoo formulation is provided comprising: water; an alcohol ethoxysulfate surfactant of formula I (I) wherein each R1 and R2 is independently a C1‑16 alkyl group; wherein the sum of the carbon atoms in R1 and R2 is 7-17; wherein M+ is a cation balancing the negative charge of the -SO3- anion of formula I; and wherein x is 1 in 95-100 mol% of the alcohol ethoxysulfate surfactant of formula I; a dermatologically acceptable silicone; and a deposition aid polymer, wherein the deposition aid polymer is a dextran base polymer functionalized with quaternary ammonium moieties; wherein the deposition aid polymer has a Kjeldahl nitrogen content, TKN, of 0.5-5 wt%; and wherein the deposition aid polymer comprises <0.1 % of the linkages between individual glucose units in the deposition aid polymer are β-1,3 linkages.
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