Display substrate and display device

Abstract

A display substrate and a display device. The display substrate comprises a substrate base, and a conductive structure and a first inorganic layer which are located on the substrate base. The substrate base comprises a first area and a second area; the conductive structure is located in the first area and the second area; the first inorganic layer is located on the side of the conductive structure away from the substrate base and is located in the first area and the second area. In at least part of the first area, an insulating layer is provided between the first inorganic layer and the conductive structure, and in at least part of the second area, the first inorganic layer is in contact with the surface of the conductive structure. In the display substrate provided in the present disclosure, the first inorganic layer is provided in both the first area and the second area, and in the second area, the first inorganic layer is in direct contact with the surface of the conductive structure, thereby implementing protection of the conductive structure by the first inorganic layer and preventing defects caused by etching of the conductive structure due to exposure.

Description

Display substrate and display device Technical Field

[0001] Embodiments of the present disclosure relate to a display substrate and a display device. Background Art

[0002] Organic light-emitting diode (OLED) display products have a wide range of applications due to their rich colors, fast response time, and foldability. Organic light-emitting diode displays include tandem devices. By adding at least one light-emitting layer and a charge-generating layer to the tandem device, the lifespan and brightness of the light-emitting device are increased, while power consumption is reduced, meeting user requirements for display device lifespan and power consumption.

[0003] Summary of the Invention

[0004] The present disclosure provides a display substrate and a display device.

[0005] An embodiment of the present disclosure provides a display substrate, comprising: a base substrate, and a conductive structure and a first inorganic layer located on the base substrate. The base substrate comprises a first region and a second region; the conductive structure is located in the first and second regions of the base substrate; and the first inorganic layer is located on a side of the conductive structure away from the base substrate, and is located in the first and second regions. An insulating layer is provided between the first inorganic layer and the conductive structure in at least a portion of the first region, and the first inorganic layer is in surface contact with the conductive structure in at least a portion of the second region.

[0006] For example, according to an embodiment of the present disclosure, the thickness of the insulating layer is greater than the thickness of any one of the first inorganic layer and the conductive structure.

[0007] For example, according to an embodiment of the present disclosure, the portion of the conductive structure located in the second area includes a power signal line.

[0008] For example, according to an embodiment of the present disclosure, the first area includes a display area, and the second area includes a partial area of ​​the non-display area; the display area includes a plurality of sub-pixels, and each sub-pixel in at least some of the sub-pixels includes a light-emitting functional layer, and the light-emitting functional layer includes a plurality of film layers; the display substrate includes a defining structure, the defining structure includes a portion of the first inorganic layer located in the first area, the defining structure is located between the light-emitting functional layer and the base substrate, and the portion of the defining structure located between adjacent sub-pixels is configured to isolate at least one layer of the light-emitting functional layer.

[0009] For example, according to an embodiment of the present disclosure, the insulating layer includes a first organic layer, and the portion of the first organic layer located in the first zone is arranged between the first inorganic layer and the conductive structure. The defining structure also includes at least one protrusion in the first organic layer that contacts the surface of the first inorganic layer, and at least part of the edge of the protrusion is retracted relative to the edge of the first inorganic layer in the defining structure.

[0010] For example, according to an embodiment of the present disclosure, the conductive structure includes at least two sub-conductive structures arranged in a stacked manner, and in a partial area of ​​the first zone, other organic layers are arranged between two adjacent sub-conductive structures of the at least two sub-conductive structures, and in the second zone, at least parts of two adjacent sub-conductive structures of the at least two sub-conductive structures are in direct contact, or at least a second inorganic layer is arranged between the two sub-conductive structures.

[0011] For example, according to an embodiment of the present disclosure, the base substrate also includes a third area, the third area includes a partial area of ​​the non-display area, the part of the conductive structure located in the third area includes at least one annular first isolation column, and in the direction perpendicular to the base substrate, the first isolation column and the first organic layer do not overlap; each sub-pixel in the at least part of the sub-pixels also includes a first electrode and a second electrode located on both sides of the light-emitting functional layer, and the first electrode is located between the light-emitting functional layer and the base substrate; at least a partial area of ​​the first area close to the third area or at least a partial area of ​​the third area close to the first area includes a second isolation column, the second isolation column includes a stacked structure formed by the first inorganic layer and the first organic layer, and in the second isolation column, the edge of the first inorganic layer includes a first protrusion protruding relative to at least a partial edge of the first organic layer, and the first isolation column and the second isolation column are configured to isolate the light-emitting functional layer and at least one of the second electrode.

[0012] For example, according to an embodiment of the present disclosure, the second isolation column includes a plurality of second isolation columns surrounding the center of the third region, and in at least one second isolation column, the first organic layer is provided with a first groove, and the first inorganic layer includes an opening exposing the first groove; the display substrate also includes a second organic layer, which is located on the side of the first inorganic layer away from the base substrate, and the second organic layer includes a first covering portion, which covers the first groove and the edge of the first inorganic layer close to the first groove.

[0013] For example, according to an embodiment of the present disclosure, the base substrate also includes a third area, the third area includes a partial area of ​​the non-display area, the third area is provided with at least one annular first isolation column, the first isolation column includes a first isolation layer and a second isolation layer arranged in a stacked manner, and the second isolation layer is located on the side of the first isolation layer away from the base substrate; the portion of the first organic layer located in the third area includes the first isolation layer, the portion of the first inorganic layer located in the third area includes the second isolation layer, and the second isolation layer is protruded relative to the edge of the first isolation layer to form a second protrusion, or a third organic layer is further provided between the first organic layer and the base substrate, the portion of the third organic layer located in the third area includes the first isolation layer, the portion of the first inorganic layer located in the third area includes the second isolation layer, and the second isolation layer is protruded relative to the edge of the first isolation layer to form a second protrusion.

[0014] For example, according to an embodiment of the present disclosure, a second groove is provided on the side of the first isolation layer away from the base substrate, and the second isolation layer exposes the second groove; the display substrate also includes a second organic layer, which is located on the side of the first inorganic layer away from the base substrate, and the second organic layer includes a second covering portion, and the second covering portion at least covers the second groove.

[0015] For example, according to an embodiment of the present disclosure, the portion of the second organic layer located in the first area also includes a pixel defining pattern, the pixel defining pattern includes a plurality of first openings and a plurality of second openings, one sub-pixel corresponds to at least one first opening, at least part of the light-emitting functional layer of the sub-pixel is located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode, and the second opening is configured to expose the edge of the defining structure.

[0016] For example, according to an embodiment of the present disclosure, each sub-pixel in at least some of the sub-pixels also includes a first electrode and a second electrode located on both sides of the light-emitting functional layer, and a pixel circuit, the first electrode is located between the light-emitting functional layer and the base substrate, and the first inorganic layer is located between the first electrode and the base substrate; the insulating layer includes a first organic layer, and in a partial area of ​​the first zone, the first organic layer includes a via, the first electrode is electrically connected to the pixel circuit through the via, and the first inorganic layer covers at least a portion of the inner wall of the via.

[0017] For example, according to an embodiment of the present disclosure, the first organic layer includes at least one protrusion in contact with the surface of the first inorganic layer in the defining structure at a position other than the via hole, and the defining structure includes the protrusion, and the edge of the protrusion is retracted relative to the edge of the first inorganic layer in the defining structure.

[0018] For example, according to an embodiment of the present disclosure, the display substrate further comprises: at least one circle of blocking portions surrounding the display area, at least a portion of the blocking portion's film layer being located on a side of the conductive structure away from the base substrate; the orthographic projection of the power signal line on the base substrate overlaps with the orthographic projection of the at least one circle of blocking portions on the base substrate; the portion of the power signal line located in the second area extends along a first direction; the portion of the at least one circle of blocking portions located in the second area comprises strip-shaped blocking portions extending along a second direction; and at least a portion of the first inorganic layer located in the second area extends along the second direction, with the first direction intersecting the second direction.

[0019] For example, according to an embodiment of the present disclosure, at least a portion of the first inorganic layer located in the second region includes at least one inorganic layer pattern, and the inorganic layer pattern covers at least a portion of an edge of the power signal line extending along the first direction.

[0020] For example, according to an embodiment of the present disclosure, the at least one inorganic layer pattern includes a plurality of inorganic layer patterns, the number of the strip-shaped barrier portions is at least one, and the strip-shaped barrier portions and the plurality of inorganic layer patterns are alternately arranged along the first direction.

[0021] For example, according to an embodiment of the present disclosure, the edge of the strip-shaped barrier portion covers the edge of the inorganic layer pattern, or the edge of the strip-shaped barrier portion is flush with at least a portion of the edge of the inorganic layer pattern.

[0022] For example, according to an embodiment of the present disclosure, the base substrate includes a fourth area, the fourth area surrounds a portion of the display area, and the orthographic projection of the portion of the power signal line located in the fourth area on the base substrate is completely located within the orthographic projection of the at least one circle of blocking portions on the base substrate.

[0023] For example, according to an embodiment of the present disclosure, in a direction perpendicular to the base substrate, a portion of the power signal line located in the fourth region does not overlap with the first inorganic layer.

[0024] For example, according to an embodiment of the present disclosure, the power signal line includes a first power signal line and a second power signal line, only the second power signal line is arranged in the fourth area, and the first power signal line and the second power signal line are arranged in the second area.

[0025] For example, according to an embodiment of the present disclosure, the display area includes a plurality of sub-pixels, and each sub-pixel in at least some of the sub-pixels includes a first electrode, a light-emitting functional layer and a second electrode stacked in sequence, and the light-emitting functional layer includes a plurality of film layers; the display substrate includes a defining structure, the defining structure includes a portion of the first inorganic layer located in the first area, the defining structure is located between the light-emitting functional layer and the base substrate, and the portion of the defining structure located between adjacent sub-pixels is configured to isolate at least one layer of the light-emitting functional layer; the display substrate also includes a second organic layer located on a side of the first inorganic layer away from the base substrate, the portion of the second organic layer located in the first area includes a pixel defining pattern, the pixel defining pattern includes a plurality of first openings, one sub-pixel corresponds to at least one first opening, at least a portion of the light-emitting functional layer of the sub-pixel is located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode, and the portion of the second organic layer located in the second area includes the film layer of the blocking portion.

[0026] For example, according to an embodiment of the present disclosure, the insulating layer includes a first organic layer, the portion of the first organic layer located in the second zone includes the first film layer of the blocking part, the portion of the second organic layer located in the second zone includes the second film layer of the blocking part, the second film layer is located on the side of the first film layer away from the base substrate, and in a direction perpendicular to the base substrate, the portion where the inorganic layer pattern overlaps with the blocking part is located between the first film layer and the second film layer.

[0027] For example, according to an embodiment of the present disclosure, at least one of the multiple inorganic layer patterns includes a main body portion extending along the second direction and a widened portion located on at least one side of the main body portion in the first direction, in the second direction, the length of the widened portion is smaller than the length of the main body portion, in the first direction, the width of the widened portion is smaller than the size of the blocking portion, and the widened portion covers the edge of the power signal line extending along the second direction.

[0028] For example, according to an embodiment of the present disclosure, the display substrate further comprises an encapsulation layer located on a side of the second organic layer away from the base substrate. At least a portion of an edge of the first protrusion in the second isolation column closest to the center of the third region is covered by the second organic layer, and at least a portion of an edge of the second organic layer is covered by the encapsulation layer.

[0029] For example, according to an embodiment of the present disclosure, the display substrate further comprises an encapsulation layer located on a side of the second organic layer away from the base substrate. Among the portions of the first inorganic layer covering the first organic layer, the portion farthest from the edge of the first region and protruding relative to the edge of the first organic layer is covered by the second organic layer, and the encapsulation layer covers at least a portion of the edge of the second organic layer.

[0030] For example, according to an embodiment of the present disclosure, the first inorganic layer includes a plurality of gaps exposing the first organic layer, and the second organic layer fills the plurality of gaps.

[0031] For example, according to an embodiment of the present disclosure, the base substrate includes a bending area, the insulating layer includes a first organic layer, the display substrate also includes a second organic layer, the second organic layer is located on the side of the first inorganic layer away from the conductive structure, the conductive structure, the first inorganic layer, the first organic layer and the portion of the second organic layer located in the bending area are all configured to be bendable, the portion of the first inorganic layer located in the bending area includes an opening, the portion of the first organic layer located in the bending area includes a third groove, and the second organic layer fills the opening and the third groove.

[0032] An embodiment of the present disclosure provides a display substrate, comprising: a base substrate, and a first inorganic layer, a first organic layer, a second organic layer, and a conductive structure located on the base substrate. The base substrate comprises a first sub-region and a second sub-region; the first inorganic layer is located in the first sub-region and the second sub-region of the base substrate; the first organic layer is located between the film layer containing the first inorganic layer and the base substrate; the second organic layer is located on the side of the film layer containing the first inorganic layer away from the base substrate; and the conductive structure is located between the film layer containing the first inorganic layer and the base substrate. The portion of the first inorganic layer located in the first sub-region contacts the first organic layer, the portion of the first inorganic layer located in the second sub-region contacts the conductive structure, and in the first sub-region, at least a portion of the edge of the first inorganic layer covering the first organic layer is covered by the second organic layer.

[0033] For example, according to an embodiment of the present disclosure, the base substrate also includes a third sub-area, the first sub-area includes a partial area of ​​the non-display area, the second sub-area includes a partial area of ​​the non-display area, and the third sub-area includes a partial area of ​​the display area; the display area includes a plurality of sub-pixels, and each sub-pixel in at least some of the sub-pixels includes a light-emitting functional layer, and the light-emitting functional layer includes a plurality of film layers; the display substrate includes a defining structure, the defining structure includes a portion of the first inorganic layer located in the first area, the defining structure is located between the light-emitting functional layer and the base substrate, and the portion of the defining structure located between adjacent sub-pixels is configured to isolate at least one layer of the light-emitting functional layer.

[0034] For example, according to an embodiment of the present disclosure, each sub-pixel in the at least part of the sub-pixels also includes a first electrode and a second electrode located on both sides of the light-emitting functional layer, and the first electrode is located between the light-emitting functional layer and the base substrate; the portion of the second organic layer located in the third sub-area includes a pixel defining pattern, which is located on the side of the first electrode away from the base substrate, and the pixel defining pattern includes a plurality of first openings and a plurality of second openings, one sub-pixel corresponds to at least one first opening, at least part of the light-emitting functional layer of the sub-pixel is located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode, and the second opening is configured to expose the edge of the defining structure.

[0035] For example, according to an embodiment of the present disclosure, the portion of the first organic layer located in the first sub-region includes a groove, the portion of the first inorganic layer located in the first sub-region includes an opening exposing at least part of the groove, and the portion of the second organic layer located in the first sub-region fills the opening and the groove.

[0036] For example, according to an embodiment of the present disclosure, the display area includes a plurality of sub-pixels, and each sub-pixel in at least some of the sub-pixels includes a light-emitting functional layer, and a first electrode and a second electrode located on both sides of the light-emitting functional layer, and the first electrode is located between the light-emitting functional layer and the base substrate; the non-display area includes at least one annular first isolation column, the first isolation column includes a first isolation layer and a second isolation layer stacked together, the first isolation layer is located between the second isolation layer and the base substrate, and the second isolation layer protrudes relative to the edge of the first isolation layer to separate the light-emitting functional layer and the second electrode; the portion of the second organic layer located in the non-display area includes the first isolation layer, and the portion of the first inorganic layer located in the non-display area includes the second isolation layer.

[0037] For example, according to an embodiment of the present disclosure, a first sub-groove is provided on the side of the first isolation layer away from the base substrate, and the second isolation layer exposes the first sub-groove; the portion of the second organic layer located in the non-display area covers the first sub-groove and the edge of the second isolation layer close to the first sub-groove.

[0038] For example, according to an embodiment of the present disclosure, the display substrate is provided with at least one second isolation column, which is located on a side of the first isolation column away from the center of the partial non-display area surrounded by the first isolation column, and the second isolation column includes a third isolation layer and a fourth isolation layer arranged in a stacked manner, the third isolation layer is located between the fourth isolation layer and the base substrate, and the edge of the fourth isolation layer protrudes relative to the edge of the third isolation layer to isolate the light-emitting functional layer and at least one of the second electrodes; the distance between at least a portion of the fourth isolation layer and the base substrate is greater than the distance between the second isolation layer and the base substrate.

[0039] For example, according to an embodiment of the present disclosure, a second sub-groove is provided on the side of the third isolation layer away from the base substrate, and the fourth isolation layer exposes the second sub-groove; the second organic layer covers the second sub-groove and the edge of the fourth isolation layer close to the second sub-groove.

[0040] An embodiment of the present disclosure provides a display substrate, comprising: a base substrate; an inorganic layer located on the base substrate; a conductive structure; and at least one barrier. The base substrate comprises a display area and a non-display area surrounding the display area; the inorganic layer is located on the base substrate, the display area and the non-display area; the conductive structure is located between the inorganic layer and the base substrate, and the conductive structure includes a power signal line; at least one barrier is located in the non-display area and surrounds the display area, with at least a portion of the barrier being located on a side of the conductive structure away from the base substrate. The non-display area comprises a first non-display area located to one side of the display area; the power signal line located in the first non-display area extends along a first direction; the barrier located in the first non-display area comprises a strip-shaped barrier extending in a second direction and overlapping the power signal line; the inorganic layer located in the first non-display area comprises an inorganic layer pattern extending in the second direction; the edge of the strip-shaped barrier overlaps at least a portion of the edge of the inorganic layer pattern in a direction perpendicular to the base substrate.

[0041] For example, according to an embodiment of the present disclosure, the non-display area includes a second non-display area surrounding the display area, and the orthographic projection of the portion of the power signal line located in the second non-display area on the base substrate is completely located within the orthographic projection of the at least one circle of blocking portions on the base substrate.

[0042] For example, according to an embodiment of the present disclosure, in a direction perpendicular to the base substrate, a portion of the power signal line located in the second non-display area does not overlap with the inorganic layer.

[0043] For example, according to an embodiment of the present disclosure, the power signal line includes a first power signal line and a second power signal line, only the second power signal line is set in the second non-display area, and the first power signal line and the second power signal line are set in the first non-display area.

[0044] For example, according to an embodiment of the present disclosure, the at least one inorganic layer pattern includes a plurality of inorganic layer patterns, the number of the strip-shaped barrier portions is at least one, and the strip-shaped barrier portions and the plurality of inorganic layer patterns are alternately arranged along the first direction.

[0045] For example, according to an embodiment of the present disclosure, the inorganic layer pattern covers the edge of the power signal line extending along the first direction.

[0046] For example, according to an embodiment of the present disclosure, the display substrate further includes: a first organic layer located between the inorganic layer and the base substrate, wherein a portion of the first organic layer located in the display area includes a planar layer; a portion of the first organic layer located in the non-display area includes a first film layer of the barrier portion; and a portion of the inorganic layer that overlaps with the barrier portion in a direction perpendicular to the base substrate covers at least a portion of an edge of the first film layer.

[0047] For example, according to an embodiment of the present disclosure, the display substrate further comprises: a second organic layer located on a side of the inorganic layer away from the base substrate. The portion of the second organic layer located in the non-display area comprises a second film layer of the barrier portion, the second film layer being located on a side of the first film layer away from the base substrate, and the portion of the inorganic layer pattern that overlaps the barrier portion in a direction perpendicular to the base substrate being located between the first film layer and the second film layer.

[0048] For example, according to an embodiment of the present disclosure, the display substrate further comprises: an encapsulation layer located on a side of the second organic layer away from the base substrate, wherein the encapsulation layer comprises a portion in contact with the barrier portion and a portion in contact with the inorganic layer.

[0049] An embodiment of the present disclosure provides a display device, comprising any of the above-mentioned display substrates. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, rather than limiting the present disclosure.

[0051] FIG1 is a schematic plan view of a display substrate provided according to an embodiment of the present disclosure.

[0052] FIG2 is a schematic diagram of a partial cross-sectional structure of the first region and the second region shown in FIG1 .

[0053] FIG3 is a plan view of a partial structure of the second area shown in FIG1 .

[0054] FIG. 4 is a scanning electron microscope image of a cross-sectional view taken along line AA′ shown in FIG. 3 .

[0055] 5 and 6 are schematic diagrams of partial cross-sectional structures of display substrates provided according to different examples of the embodiment of the present disclosure.

[0056] FIG7 is a schematic diagram of a partial planar structure of the second zone shown in FIG1 .

[0057] FIG8 is a schematic diagram of pixel arrangement in a display substrate according to an embodiment of the present disclosure.

[0058] 9 and 10 are schematic diagrams of partial cross-sectional structures taken along line BB′ shown in FIG. 8 according to different examples of the embodiment of the present disclosure.

[0059] FIG. 11 is a schematic plan view of the structure of the first and third regions of the display substrate shown in FIG. 1 .

[0060] FIG12 is a schematic diagram of a partial planar structure of the third zone shown in FIG11 .

[0061] FIG. 13 is a schematic diagram of a partial cross-sectional structure of the display substrate shown in FIG. 12 in one example.

[0062] 14 to 16 are process steps for forming the display substrate shown in FIG. 13 .

[0063] FIG17 is a schematic diagram of a partial cross-sectional structure of the display substrate shown in FIG12 in another example.

[0064] 18 and 19 are schematic diagrams of partial cross-sectional structures of the third region of the display substrate shown in FIG. 1 in different examples.

[0065] FIG20 is a schematic diagram showing that the encapsulation layer is broken at the boundary of the first inorganic layer.

[0066] FIG21 is a scanning electron microscope image showing that the encapsulation layer is broken at the boundary of the first inorganic layer.

[0067] 22 and 23 are structural diagrams of different examples of the embodiment of the present disclosure at the location of FIG. 20 .

[0068] 24 and 25 are schematic diagrams of the local structures of the bending region in the display substrate shown in FIG. 1 in different examples.

[0069] FIG26 is a schematic diagram of a partial cross-sectional structure of a non-display area of ​​a display substrate provided according to an embodiment of the present disclosure.

[0070] FIG27 is a schematic diagram of a partial cross-sectional structure of a display substrate provided according to an example of an embodiment of the present disclosure.

[0071] FIG28 is a schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0072] FIG29 is a schematic block diagram of a display device according to another embodiment of the present disclosure. DETAILED DESCRIPTION

[0073] To make the purpose, technical solutions, and advantages of the embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0074] Unless otherwise defined, technical or scientific terms used in this disclosure should have the ordinary meanings understood by people with ordinary skills in the field to which this disclosure belongs. The words "first", "second" and similar terms used in this disclosure do not indicate any order, quantity or importance, but are simply used to distinguish different components. The words "include" or "comprising" and similar terms mean that the elements or objects preceding the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0075] The terms "parallel," "perpendicular," and "identical" used in at least one embodiment of the present disclosure include "parallel," "perpendicular," and "identical" in the strict sense, as well as "approximately parallel," "approximately perpendicular," and "approximately identical," which include certain errors. These terms, taking into account errors associated with measurement and the measurement of specific quantities (e.g., limitations of the measurement system), represent acceptable deviations from a specific value as determined by a person skilled in the art. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of the stated value. In the following text of the present disclosure, when the number of a component is not specifically specified, it means that the component can be one or more, or can be understood as at least one. "At least one" means one or more, and "plurality" means at least two. The term "same-layer arrangement" as used in the disclosure refers to a structure in which two (or more) structures are formed by the same deposition process and patterned by the same patterning process, and their materials can be the same or different. The term "integrated arrangement structure" as used in the present disclosure refers to a structure in which two (or more) structures are formed by the same deposition process and patterned by the same patterning process, and are connected to each other, and their materials can be the same or different.

[0076] During research, the inventors of the present application discovered that the light-emitting functional layer of the light-emitting element may include a plurality of light-emitting layers stacked in layers, such as a tandem (Tandem) device. Tandem devices have the characteristics of low power consumption and long life. However, a charge generation layer (CGL) is provided between at least two of the multi-layer light-emitting layers in the Tandem device, and the charge generation layer has a relatively high conductivity. For example, when the charge generation layer is a full-surface film layer, the charge generation layers of two adjacent light-emitting elements are continuous film layers, and there is a phenomenon of lateral charge migration, which causes the display substrate to shift in low grayscale monochrome chromaticity, such as easily causing crosstalk between adjacent sub-pixels, resulting in color shift on the display substrate. For example, the charge generation layer easily causes crosstalk between sub-pixels of different colors at low brightness, resulting in low grayscale color shift.

[0077] The present disclosure provides a display substrate, comprising a base substrate, a conductive structure located on the base substrate, and a first inorganic layer. The base substrate comprises a first region and a second region; the conductive structure is located in the first region and the second region; the first inorganic layer is located on the side of the conductive structure away from the base substrate, and is located in the first region and the second region. In at least part of the first region, an insulating layer is provided between the first inorganic layer and the conductive structure, and in at least part of the second region, the first inorganic layer is in contact with the surface of the conductive structure. In the display substrate provided by the present disclosure, by providing the first inorganic layer in both the first region and the second region, and the first inorganic layer in the second region is in direct contact with the surface of the conductive structure, it is beneficial to realize the protection of the conductive structure by the first inorganic layer, and to prevent the conductive structure from being etched due to being exposed, thereby causing defects.

[0078] The present disclosure provides a display substrate, comprising a base substrate, a first inorganic layer, a first organic layer, a second organic layer, and a conductive structure located on the base substrate. The base substrate comprises a first sub-region and a second sub-region; the first inorganic layer is located in the first sub-region and the second sub-region of the base substrate; the first organic layer is located between the film layer where the first inorganic layer is located and the base substrate; the second organic layer is located on the side of the film layer where the first inorganic layer is located away from the base substrate; and the conductive structure is located between the film layer where the first inorganic layer is located and the base substrate. The portion of the first inorganic layer located in the first sub-region is in contact with the first organic layer, the portion of the first inorganic layer located in the second sub-region is in contact with the conductive structure, and in the first sub-region, at least a portion of the edge of the first inorganic layer covering the first organic layer is covered by the second organic layer. The display substrate provided by the present disclosure, by setting at least a portion of the edge of the first inorganic layer covering the first organic layer to be covered by the second organic layer, is conducive to preventing the encapsulation layer covering the edge of the first inorganic layer from breaking.

[0079] The present disclosure provides a display substrate, comprising a base substrate, an inorganic layer located on the base substrate, a conductive structure, and at least one circle of blocking portions. The base substrate comprises a display area and a non-display area surrounding the display area; the inorganic layer is located in the display area and the non-display area on the base substrate; the conductive structure is located between the inorganic layer and the base substrate, and the conductive structure comprises a power signal line; at least one circle of blocking portions is located in the non-display area and surrounds the display area, and at least part of the film layer of the blocking portion is located on a side of the conductive structure away from the base substrate. The non-display area comprises a first non-display area located on one side of the display area, the portion of the power signal line located in the first non-display area extends along a first direction, the portion of the blocking portion located in the first non-display area comprises a strip-shaped blocking portion extending along a second direction and overlapping with the power signal line, the portion of the inorganic layer located in the first non-display area comprises an inorganic layer pattern extending along the second direction, and the edge of the strip-shaped blocking portion overlaps at least part of the edge of the inorganic layer pattern in a direction perpendicular to the base substrate. The display substrate provided by the present disclosure provides an inorganic layer including an inorganic layer pattern in the first non-display area where the extension direction of the power signal line intersects with the extension direction of the strip-shaped blocking portion, which is beneficial for covering the edge of the power signal line to prevent defects such as etching from occurring at the edge of the power signal line.

[0080] The display substrate and the display device provided by the present disclosure are described below with reference to the accompanying drawings.

[0081] Figure 1 is a schematic plan view of a display substrate according to an embodiment of the present disclosure. Figure 2 is a schematic partial cross-sectional view of the first and second regions shown in Figure 1.

[0082] As shown in Figures 1 and 2, the display substrate includes a base substrate 01, a conductive structure 100, and a first inorganic layer 210 located on the base substrate 01. The base substrate 01 includes a first region 011 and a second region 012. The conductive structure 100 is located in the first region 011 and the second region 012 of the base substrate 01. The first inorganic layer 210 is located on the side of the conductive structure 100 away from the base substrate 01, and is located in the first region 011 and the second region 012. In at least a portion of the first region 011, an insulating layer is provided between the first inorganic layer 210 and the conductive structure 100. In at least a portion of the second region 012, the first inorganic layer 210 is in surface contact with the conductive structure 100. In the display substrate provided by the present disclosure, by providing the first inorganic layer 210 in both the first area 011 and the second area 012, and the first inorganic layer 210 in the second area 012 is in direct contact with the surface of the conductive structure 100, it is beneficial to achieve protection of the conductive structure 100 by the first inorganic layer 210, and prevent the conductive structure 100 from being etched due to exposure and causing defects.

[0083] In some examples, as shown in Figures 1 and 2, the first area 011 includes a display area, and the second area 012 includes a portion of a non-display area. For example, the display area is an area for displaying images, and the non-display area is an area that does not display images. For example, the second area 012 is located to one side of the first area 011. For example, the second area 012 may be an area provided with an electrical contact pad. For example, the second area 012 may be an area for electrical connection to a circuit board.

[0084] In some examples, as shown in Figure 2, the display area includes multiple sub-pixels 300, and each sub-pixel 300 in at least some of the sub-pixels 300 includes a light-emitting functional layer 310, and the light-emitting functional layer 310 includes multiple film layers; each sub-pixel 300 in at least some of the sub-pixels 300 also includes a first electrode 320 and a second electrode 330 located on both sides of the light-emitting functional layer 310, the first electrode 320 is located between the light-emitting functional layer 310 and the base substrate 01, and the first inorganic layer 210 is located between the first electrode 320 and the base substrate 01.

[0085] For example, as shown in FIG2 , the light-emitting functional layer 310 includes a charge generation layer. For example, the light-emitting functional layer can be a light-emitting functional layer included in an organic light-emitting element. For example, each sub-pixel 300 in the display area includes a light-emitting element.

[0086] For example, as shown in FIG2 , the light-emitting functional layer 310 may include a first light-emitting layer (EML), a charge generation layer (CGL), and a second light-emitting layer (EML) stacked together, with the charge generation layer being located between the first and second light-emitting layers. The charge generation layer has strong conductivity, which can give the light-emitting functional layer 310 the advantages of long life, low power consumption, and high brightness. For example, compared to a light-emitting functional layer 310 without a charge generation layer, the sub-pixel 300 can nearly double its brightness by providing a charge generation layer in the light-emitting functional layer 310.

[0087] For example, the light-emitting elements of the same sub-pixel 300 may be tandem light-emitting elements, such as a Tandem OLED.

[0088] For example, the charge generation layer may include an N-type charge generation layer and a P-type charge generation layer.

[0089] For example, in each sub-pixel 300 , the light emitting functional layer 310 may further include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL).

[0090] For example, the hole injection layer, hole transport layer, electron transport layer, electron injection layer, and charge generation layer are all shared layers of the multiple sub-pixels 300 and can be referred to as common layers. For example, the common layers and the second electrode 330 can be layers formed using an open mask.

[0091] For example, the second light-emitting layer may be positioned between the first light-emitting layer and the second electrode 330, and the hole injection layer may be positioned between the first electrode 320 and the first light-emitting layer. For example, an electron transport layer may be positioned between the charge generation layer and the first light-emitting layer. For example, a hole transport layer may be positioned between the second light-emitting layer and the charge generation layer. For example, an electron transport layer and an electron injection layer may be positioned between the second light-emitting layer and the second electrode 330.

[0092] For example, in the same sub-pixel 300, the first and second light-emitting layers may emit light of the same color. For example, in the same sub-pixel 300, the first and second light-emitting layers may emit light of different colors. By providing light-emitting layers emitting light of different colors in the same sub-pixel 300, the light emitted by the multiple light-emitting layers included in the sub-pixel 300 can be mixed into white light. By providing a color filter layer, the color of the light emitted by each sub-pixel 300 can be adjusted.

[0093] For example, the materials of the electron transport layer may include aromatic heterocyclic compounds, such as imidazole derivatives such as benzimidazole derivatives, imidazopyridine derivatives, and benzimidazolephenanthridine derivatives; oxazine derivatives such as pyrimidine derivatives and triazine derivatives; quinoline derivatives, isoquinoline derivatives, phenanthroline derivatives, and other compounds containing a nitrogen-containing six-membered ring structure (including compounds having phosphine oxide-based substituents on the heterocyclic ring), etc.

[0094] For example, the material of the charge generation layer may be a material containing a phosphorus oxygen group or a material containing triazine.

[0095] For example, the ratio of the electron mobility of the charge generation layer to the electron mobility of the electron transport layer is 10 -2 ~10 2 .

[0096] For example, the first electrode 320 may be an anode, and the second electrode 330 may be a cathode. For example, the cathode may be formed of a material with high conductivity and low work function, such as a metal material. For example, the anode may be formed of a transparent conductive material with a high work function.

[0097] 2 , the orthographic projection of the second electrode 330 in at least some of the sub-pixels 300 on the base substrate 01 is a full-surface structure. For example, the second electrode 330 may be a common electrode shared by multiple sub-pixels 300 .

[0098] In some examples, as shown in FIG2 , the display substrate includes a defining structure 400, the defining structure 400 includes a portion of the first inorganic layer 210 located in the first region 011, the defining structure 400 is located between the light-emitting functional layer 310 and the base substrate 01, and the portion of the defining structure 400 located between adjacent sub-pixels 300 is configured to isolate at least one layer of the light-emitting functional layer 310. For example, the defining structure 400 can isolate the above-mentioned charge generation layer to prevent crosstalk between adjacent sub-pixels 300 of different colors. For example, all film layers in the light-emitting functional layer 310 located between the charge generation layer and the base substrate 01 can be isolated at the edge of the defining structure 400. For example, all film layers in the light-emitting functional layer 310 will be isolated at the edge of the defining structure 400. For example, the second electrode 330 can be isolated at the edge of the defining structure 400, or can be provided continuously.

[0099] 2 , the thickness of the insulating layer 510 is greater than the thickness of any of the first inorganic layer 210 and the conductive structure 100. For example, the conductive structure 100 may be a metal structure.

[0100] For example, the insulating layer may be a single film layer or may include multiple film layers. For example, the insulating layer may include multiple organic layers, or the multiple film layers included in the insulating layer may include organic layers and inorganic layers, or metal layers may be provided between the multiple film layers included in the insulating layer.

[0101] In some examples, as shown in FIG2 , the insulating layer includes at least one organic layer, including a first organic layer 510. The portion of the first organic layer 510 located in the first region 011 is disposed between the first inorganic layer 210 and the conductive structure 100. The defining structure 400 further includes at least one protrusion 501 in the first organic layer 510 that contacts a surface of the first inorganic layer 210. At least a portion of the edge of the protrusion 501 is retracted relative to an edge of the first inorganic layer 210 in the defining structure 400. For example, the first organic layer 510 includes a plurality of protrusions 501, each of which corresponds to a plurality of sub-pixels 300 in a one-to-one manner, and the orthographic projection of the light-emitting area of ​​the sub-pixel 300 on the base substrate 01 is located within the orthographic projection of the protrusion 501 on the base substrate 01.

[0102] For example, as shown in FIG2 , the defining structure 400 is composed of a first inorganic layer 210 and a protrusion 501 of a first organic layer 510. For example, the orthographic projection of the first electrode 320 of the sub-pixel 300 on the base substrate 01 is completely located within the orthographic projection of the defining structure 400 on the base substrate 01. For example, the orthographic projection of the protrusion 501 on the base substrate 01 is completely located within the orthographic projection of the first inorganic layer 210 on the base substrate 01. For example, the thickness of the first organic layer 510 can be 2 microns. For example, the portion of the first organic layer 510 located in the display area can be the flat layer (PLN) closest to the first electrode 320 of the sub-pixel 300. For example, the material of the first inorganic layer 210 can include silicon nitride, silicon oxide, or silicon oxynitride. For example, the material of the first organic layer 510 can include materials such as polyimide.

[0103] In some examples, as shown in FIG2 , the display substrate further includes a second organic layer 520 located on a side of the first inorganic layer 210 away from the base substrate 01 . The portion of the second organic layer 520 located in the first region 011 includes a pixel-defining pattern 5200 . The pixel-defining pattern 5200 includes a plurality of first openings 5210 and a plurality of second openings 5220 . Each sub-pixel 300 corresponds to at least one first opening 5210 . At least a portion of the light-emitting functional layer 310 of the sub-pixel 300 is located within the corresponding first opening 5210 of the sub-pixel 300 . The first opening 5210 is configured to expose the first electrode 320 , and the second opening 5220 is configured to expose the edge of the defining structure 400 . For example, each sub-pixel 300 corresponds to one first opening 5210 . The light-emitting functional layer 310 located within the first opening 5210 emits light by contacting the first electrode 320 and the second electrode 330 . For example, the first opening 5210 is used to define the light-emitting area of ​​the sub-pixel 300 . For example, the edge of the defining structure 400 exposed by the second opening 5220 is used to isolate at least one layer of the light-emitting functional layer 310. For example, the pixel defining pattern 5200 includes a pixel defining portion surrounding the first opening 5210 and the second opening 5220, and the light-emitting functional layer may include a portion located within the first opening 5210 and a portion located on the pixel defining portion.

[0104] In some examples, as shown in Figures 1 and 2, the display substrate further includes at least one circle of blocking portions 630 (dam) surrounding the display area, and at least part of the film layer of the blocking portion 630 is located on the side of the conductive structure 100 away from the base substrate 01. The blocking portion 630 can be used to prevent the organic layer in the encapsulation layer 700 (described later) from overflowing the base substrate 01 during the manufacturing process. Figure 1 schematically shows two circles of blocking portions 630, but is not limited to this. The number of blocking portions 630 can be set according to product requirements. For example, the heights of different blocking portions can be the same or different. For example, the widths of different blocking portions can be the same or different. For example, the blocking portion can have a partial film layer located between the conductive structure and the base substrate.

[0105] In some examples, as shown in FIG2 , the portion of the first organic layer 510 located in the second region 012 comprises the first film layer 631 of the barrier 630 , while the portion of the second organic layer 520 located in the second region 012 comprises the second film layer 632 of the barrier 630 . The second film layer 632 is located on the side of the first film layer 631 away from the base substrate 01 . For example, the barrier 630 may include a first film layer 631 and a second film layer 632 arranged in a stacked arrangement, with the portion of the first organic layer 510 located in the second region 012 serving as the first film layer 631 of the barrier 630 , and the portion of the second organic layer 520 located in the second region 012 serving as the second film layer 632 of the barrier 630 . For example, the first film layer 631 and the second film layer 632 may be made of the same material. For example, the thickness of the second film layer 632 may be greater than that of the first film layer 631 . Of course, the embodiments of the present disclosure are not limited to this, and the barrier 630 may also include more film layers.

[0106] In some examples, as shown in Figures 1 and 2, the portion of the conductive structure 100 located in the second region 012 includes a power signal line 110. For example, the power signal line 110 can be a signal line that transmits at least one of a VDD power signal and a VSS power signal. Figure 2 schematically illustrates that the conductive structure 100 comprises a single-layer structure, but this is not limiting. The conductive structure can comprise a multi-layer structure. An organic layer, or an organic layer and an inorganic layer, can be disposed between two adjacent layers of the multi-layer structure located in the first region. For example, the boundaries of the conductive structures in different layers are different. For example, the conductive structure can comprise three layers, such as a first conductive structure, a second conductive structure, and a third conductive structure, arranged in sequence perpendicular to the substrate. The first conductive structure is located between the second conductive structure and the substrate 01 and within the conductive structure in the second region. The second conductive structure is located on the side of the first conductive structure away from the display region, and the third conductive structure is located on the side of the first conductive structure closer to the display region. Both the second and third conductive structures overlap with the first conductive structure, while the second and third conductive structures do not overlap. For example, the third conductive structure can include multiple vias to facilitate degassing of the organic layer between the substrates. For example, in the three-layer conductive structure, only the first conductive structure overlaps with the barrier in a direction perpendicular to the substrate. For example, the second conductive structure does not overlap with the first inorganic layer. For example, the first conductive structure contacts the surface of the first inorganic layer. For example, the edge of the third conductive structure that overlaps with the first conductive structure overlaps with the first inorganic layer. For example, the one-layer structure may include a single metal layer or multiple metal layers stacked together, such as a titanium / aluminum / titanium stacked film layer.

[0107] Figure 2 does not illustrate other film layers between the conductive structure 100 and the base substrate 01. For example, at least one metal layer is disposed between the conductive structure 100 and the base substrate 01, including structures such as the gate electrode of a thin-film transistor serving as a pixel electrode, a gate line electrically connected to the gate electrode, and multiple insulating layers, such as a gate insulating layer, a buffer layer, and an interlayer insulating layer. Figure 2 omits the structure between the pixel-defining pattern and the barrier portion.

[0108] 3 is a plan view of a partial structure of the second region shown in FIG. 1 , and FIG. 4 is a scanning electron microscope image of a cross-sectional view taken along line AA′ shown in FIG. 3 .

[0109] In some examples, as shown in Figures 1 and 3, the orthographic projection of the power signal line 110 on the base substrate 01 overlaps with the orthographic projection of at least one circle of blocking portions 630 on the base substrate 01, the portion of the power signal line 110 located in the second area 012 extends along the first direction, the portion of the at least one circle of blocking portions 630 located in the second area 012 includes a strip-shaped blocking portion 6300 extending along the second direction, and at least the portion of the first inorganic layer 210 located in the second area 012 extends along the second direction, and the first direction intersects the second direction. For example, the first direction can be the X direction shown in Figure 1, and the second direction can be the Y direction shown in Figure 1. For example, the angle between the first direction and the second direction can be 80 to 100 degrees. For example, the first direction is perpendicular to the second direction. The embodiments of the present disclosure are not limited to this, and the first direction and the second direction can be interchangeable.

[0110] In some examples, as shown in FIG3 , at least the portion of the first inorganic layer 210 located in the second region 012 includes at least one inorganic layer pattern 211. The inorganic layer pattern 211 extends along the second direction and covers the edge of the power signal line 110 extending along the first direction. For example, the inorganic layer pattern 211 contacts the surface of the power signal line 110. For example, a portion of the edge of the power signal line 110 is covered by both the inorganic layer pattern 211 and the strip-shaped barrier 6300. For example, the edge of the power signal line 110 includes a portion covered only by the first inorganic layer 210, a portion covered only by the barrier 630, and a portion covered by both the first inorganic layer 210 and the strip-shaped barrier 630. For example, the inorganic layer pattern 211 may be a strip-shaped film layer.

[0111] The display substrate provided by the present invention is provided with a first inorganic layer located in the display area, which is used to form a limiting structure to separate at least one layer of the light-emitting functional layer of adjacent sub-pixels with different colors, thereby achieving the purpose of reducing crosstalk. At the same time, the first inorganic layer is located in the non-display area, which covers the edge of the power signal line exposed in the blocked part, thereby enhancing the strict reliability verification conditions of the non-display area and avoiding the occurrence of related growth-type dark spots (GDS) problems.

[0112] In some examples, as shown in FIG3 , the at least one inorganic layer pattern 211 includes a plurality of inorganic layer patterns 211, the number of the strip-shaped barrier portions 6300 is at least one, and the strip-shaped barrier portions 6300 and the plurality of inorganic layer patterns 211 are alternately arranged along the first direction. For example, the number of the strip-shaped barrier portions 6300 is two, the number of the inorganic layer patterns 211 is three, the inorganic layer patterns 211 and the strip-shaped barrier portions 6300 are alternately arranged along the first direction, and the inorganic layer patterns 211 are located on both sides of the strip-shaped barrier portions 6300.

[0113] In some examples, as shown in Figures 3 and 4, the edge of the strip barrier 6300 covers at least a portion of the edge of the inorganic layer pattern 211, or the edge of the strip barrier 6300 is flush with a portion of the edge of the inorganic layer pattern 211. For example, the edges of the inorganic layer pattern 211 located on both sides of the strip barrier 6300 and adjacent to the strip barrier 630 extend into the strip barrier 6300 to prevent the strip barrier 6300 and the inorganic layer pattern 211 from being misaligned due to process reasons, thereby exposing a portion of the conductive structure 100. For example, the inorganic layer pattern 211 covers the conductive structure 100 exposed by the strip barrier 6300.

[0114] In some examples, as shown in Figures 2 to 4 , the portion where the inorganic layer pattern 211 overlaps the barrier portion 630 in a direction perpendicular to the base substrate 01 is located between the first film layer 631 and the second film layer 632. For example, the first film layer 631 and the second film layer 632 can be made of the same material. In locations other than where the first inorganic layer 210 is disposed between the first film layer 631 and the second film layer 632 of the barrier portion 630, there may be no distinct boundary between the first film layer 631 and the second film layer 632. For example, the first inorganic layer 210 may have an opening in the barrier portion 630. While the figures schematically illustrate the first film layer as comprising a single film layer, this is not limiting. The first film layer may also comprise two film layers, such as a portion within the first organic layer and a portion within the second organic layer, and there may be no distinct boundary between the two film layers.

[0115] For example, as shown in Figures 2 to 4, the thickness of the first inorganic layer 210 may be 20 to 100 nanometers. For example, the thickness of the first inorganic layer 210 may be 30 to 50 nanometers. For example, the thickness of the first inorganic layer 210 may be 40 to 80 nanometers. For example, the thickness of the first inorganic layer 210 may be 60 to 90 nanometers.

[0116] For example, as shown in FIG3 , the number of inorganic layer patterns 211 can be three, and the size of the inorganic layer pattern 211 located in the middle in the first direction is no larger than the size of the inorganic layer patterns 211 located on either side in the first direction. For example, the size of the inorganic layer pattern 211 located in the middle in the first direction, such as a width of approximately 40 microns, is determined by the spacing between the strip-shaped barrier portions 6300 on both sides. For example, the size of the inorganic layer pattern 211 located farthest from the display area in the first direction, such as a width of approximately 90 microns, is determined by the boundary between the first organic layer 510 and the second organic layer 520 on the side farthest from the display area.

[0117] For example, as shown in Figures 2 to 4, along a direction perpendicular to the base substrate 01, the portion of the inorganic layer pattern 211 overlapping the strip-shaped barrier 6300 has a dimension in the first direction of 10 to 40 microns. For example, the portion of the inorganic layer pattern 211 overlapping the strip-shaped barrier 6300 has a dimension in the first direction of 15 to 20 microns. For example, the portion of the inorganic layer pattern 211 overlapping the strip-shaped barrier 6300 has a dimension in the first direction of 12 to 18 microns. For example, the portion of the inorganic layer pattern 211 at the outermost edge, away from the edge of the strip-shaped barrier 6300, overlapping at least one of the first organic layer 510 and the second organic layer 520 has a dimension in the first direction of 10 to 40 microns. For example, the portion of the inorganic layer pattern 211 at the outermost edge, away from the edge of the strip-shaped barrier 6300, overlapping at least one of the first organic layer 510 and the second organic layer 520 has a dimension in the first direction of 15 to 30 microns.

[0118] In some examples, as shown in Figures 2 to 4, at least one of the multiple inorganic layer patterns 211 includes a main body 2111 extending along the second direction and a widened portion 2112 located on at least one side of the main body 2111 in the first direction, in the second direction, the length of the widened portion 2112 is smaller than the length of the main body 2111, in the first direction, the width of the widened portion 2112 is smaller than the size of the blocking portion 630, and the widened portion 2112 covers the edge of the power signal line 110 extending along the second direction.

[0119] For example, as shown in Figure 3, the widening portion 2112 can be located only at the edge of the power signal line 110 to widen the size of the edge of the power signal line 110 covered by the inorganic layer pattern 211, thereby preventing process deviations from causing both the inorganic layer pattern 211 and the strip-shaped blocking portion 6300 to expose the edge of the power signal line 110.

[0120] For example, as shown in FIG3 , the width of the widened portion 2112 in the first direction may be 5 to 20 microns. For example, the width of the widened portion 2112 may be 6 to 15 microns. For example, the width of the widened portion 2112 may be 7 to 10 microns. For example, the width of the widened portion 2112 may be 8 to 12 microns.

[0121] For example, as shown in FIG. 4 , other structures made of conductive materials, such as signal lines made of metal materials, may be provided between the conductive structure 100 and the base substrate 01 .

[0122] For example, as shown in FIG2 , in the first region 011, no other inorganic layer is disposed between the conductive structure 100 and the first inorganic layer 210. For example, in the first region 011, only an organic layer is disposed between the conductive structure 100 and the first inorganic layer 210. For example, the conductive structure may include a multi-layer conductive structure, such as the first conductive structure and the second conductive structure described above. In the first region, only an organic layer is disposed between the first conductive structure and the first inorganic layer, and only an organic layer is disposed between the second conductive structure and the first inorganic layer, such as an organic layer disposed between the first conductive structure and the second conductive structure. In the second region, the second conductive structure is in direct contact with the first inorganic layer, and the first conductive structure is in direct contact with the second conductive structure.

[0123] During the study, the inventors of this application discovered that: in the second zone, when the blocking portion intersects with the extension direction of the power signal line included in the conductive structure, the organic layer on the conductive structure outside the blocking portion is completely dug out, causing the conductive structure at this position to be exposed. As a result, during the subsequent development process, the edge of the conductive structure at this position is prone to side engraving to form an undercut structure, which in turn leads to major potential risks such as cracking or micro-cracks when the encapsulation layer covers the surface of the conductive structure. In the subsequent trust environment, this position is prone to GDSX defects.

[0124] In order to prevent the above-mentioned conductive structure from being side-etched, a passivation layer (PVX) is generally provided on the side of the conductive structure away from the base substrate in the display substrate to cover the conductive structure not covered by the blocking part, so as to protect the side of the conductive structure and achieve the purpose of product reliability verification.

[0125] Compared with a display substrate in which a passivation layer (PVX) is provided on the side of a general conductive structure away from the base substrate, in one example of the embodiment provided in the present disclosure, the first inorganic layer replaces the passivation layer in the general display substrate. On the basis of being compatible with the film layer defining the structure in the display area, the first inorganic layer can protect the conductive structure exposed by the blocking part in the second area (such as the first inorganic layer is in direct contact with the conductive structure), while saving the mask process for forming the above-mentioned passivation layer, thereby saving production costs and improving the production capacity of the backplane circuit.

[0126] 5 and 6 are schematic diagrams of partial cross-sectional structures of display substrates provided according to different examples of the embodiment of the present disclosure.

[0127] The display substrate shown in FIG. 5 differs from the display substrate shown in FIG. 2 in that the conductive structure 100 includes a different number of structural layers, and organic layers and / or inorganic layers are provided between the different structural layers included in the conductive structure 100 .

[0128] In some examples, as shown in FIG5 , the conductive structure 100 includes at least two stacked sub-conductive structures 101. In a partial area of ​​the first region 011 , other organic layers, such as a third organic layer 530, and a second inorganic layer 220 are provided between two adjacent sub-conductive structures 101 of at least two sub-conductive structures 101. In the second region 012 , only the second inorganic layer 220 is provided between the two adjacent sub-conductive structures 101, and no third organic layer is provided. For example, the second inorganic layer 220 may be a passivation layer (PVX). For example, multiple inorganic layers, or inorganic layers and other metal layers may be provided between two adjacent sub-conductive structures 101. For example, the thickness of the second inorganic layer 220 is greater than the thickness of the first inorganic layer 210. FIG5 schematically shows two sub-conductive structures 101, but is not limited thereto. It may also be three sub-conductive structures 101, with organic layers and / or inorganic layers provided between two adjacent sub-conductive structures.

[0129] For example, as shown in FIG5 , the second inorganic layer 220 can be a passivation layer (PVX) in the above-mentioned general display substrate. When only a passivation layer (equivalent to the second inorganic layer 220 shown in FIG5 ) is provided in the second area 012 of the above-mentioned general display substrate, and no first inorganic layer 210 is provided, the organic layer between the adjacent blocking portions 630 will be removed to expose the sub-conductive structure located on the top. In order to prevent the sub-conductive structure from being side-etched, the sub-conductive structure will be patterned and removed together, thereby retaining only the film layer other than the organic layer between the second inorganic layer 220 and the base substrate 01. In the display substrate provided by the present disclosure, by providing the first inorganic layer 210 on the side away from the base substrate 01 of the sub-conductive structure 100 farthest from the base substrate 01 among the above-mentioned at least two conductive structures 100, the sub-conductive structure 100 farthest from the base substrate 01 in the second area 012 can be retained, which is beneficial to reducing the resistance of the conductive structure 100 located in the second area 012.

[0130] The display substrate shown in FIG. 6 differs from the display substrate shown in FIG. 2 in that the conductive structure 100 includes a different number of film layers, and an organic layer is provided between the different film layers included in the conductive structure 100 .

[0131] In some examples, as shown in Figure 6, the conductive structure 100 includes at least two sub-conductive structures 100 arranged in a stacked manner. In the first area 011, other organic layers, such as a third organic layer 530, are arranged between two adjacent sub-conductive structures 100 of the at least two sub-conductive structures 100, but no inorganic layer is arranged; in the second area 012, at least parts of the above-mentioned two adjacent sub-conductive structures 100 are in direct contact. Compared to a general display substrate, a passivation layer is arranged between the above-mentioned two adjacent sub-conductive structures 100 located in the first area 011, and the first inorganic layer 210 is not arranged on the side of the sub-conductive structure 100 farthest away from the base substrate 01 away from the base substrate 01, and the conductive structure 100 located in the second area 012 only includes the substrate of the sub-conductive structure 100 located between the inorganic layer and the base substrate 01 among the above-mentioned two adjacent sub-conductive structures 100. The display substrate provided by the present disclosure omits the above-mentioned passivation layer between the two adjacent sub-conductive structures 100 to reduce one patterning process step, and at the same time, arranges the first inorganic layer 210 on the side of the two adjacent sub-conductive structures 100 away from the base substrate 01 to protect the two adjacent sub-conductive structures 100 located in the second area 012. In this way, the two adjacent sub-conductive structures 100 are in direct contact, which is beneficial to further reduce the resistance of the conductive structure 100 located in the second area 012.

[0132] In some examples, as shown in FIG1 , the base substrate 01 includes a fourth region 014, which surrounds the display region. The orthographic projection of the portion of the power signal line 110 located in the fourth region 014 on the base substrate 01 is completely within the orthographic projection of at least one barrier 630 on the base substrate 01. However, this is not limiting. Alternatively, the orthographic projection of the edge of the power signal line located in the fourth region on the base substrate may be completely within the orthographic projection of the barrier. For example, the first region 011 is the display region, and the fourth region 014 and the second region 012 form a non-display region surrounding the display region. For example, with the X-direction arrow pointing upward, the second region 012 is located below the display region, and the fourth region 014 is located above, to the left, and to the right of the display region. For example, a circle of blocking portions 630 is distributed in a circle of non-display area composed of the fourth area 014 and the second area 012. The blocking portion 630 located in the fourth area 014 completely covers the power signal line 110, and the blocking portion 630 located in the second area 012 intersects with the power signal line and exposes part of the power signal line 110. The exposed part of the power signal line 110 is covered by the first inorganic layer 210.

[0133] In some examples, as shown in Figures 1 and 3 , in a direction perpendicular to the base substrate 01, the portion of the power signal line 110 located in the fourth region 014 does not overlap with the first inorganic layer 210. For example, the power signal line 110 in the fourth region 014 is completely covered by the blocking portion 630, and the first inorganic layer 210 is not provided in the fourth region 014. For example, in a non-display area outside the display area, the first inorganic layer 210 is provided only on the lower side of the second region 012 (such as the lower pad area).

[0134] For example, in the fourth region, the power signal line does not overlap with the first inorganic layer in a direction perpendicular to the base substrate, while in the third region, part of the edge of the power signal line is still partially covered by the blocking portion after being covered by the first inorganic layer.

[0135] In some examples, as shown in Figures 1 and 3, the power signal line 110 includes a first power signal line 111 and a second power signal line 112. Only the second power signal line 112 is provided in the fourth area 014, while both the first power signal line 111 and the second power signal line 112 are provided in the second area 012. For example, the second power signal line 112 can be a VSS power signal line, which can be connected to a voltage source to output a constant voltage signal, such as a negative voltage signal. For example, the second power signal line 112 can also be grounded. For example, the first power signal line 111 can be a VDD power signal line, which can be connected to a voltage source to output a constant voltage signal, such as a positive voltage signal. For example, the first power signal line 111 also includes a portion located in the display area to electrically connect to the pixel circuit 340 included in the sub-pixel 300 to provide a power signal. For example, the second power signal line 112 is located in the non-display area and is arranged around the display area. The second power signal line 110 can include a portion located in the display area to electrically connect to the second electrode 330 included in the sub-pixel 300.

[0136] FIG7 is a schematic diagram of a partial planar structure of the second zone shown in FIG1 .

[0137] For example, as shown in Figures 1 and 7, the second area 012 is provided with a first power signal line 111 and a second power signal line 112. For example, the second power signal line 112 is located on both sides of the first power signal line 111 in the second direction. For example, the conductive structure 100 shown in Figure 3 can be the second power signal line 112, but is not limited to this, and can also be the first power signal line 111. For example, the power signal line can be electrically connected to the pin of the circuit board through a contact pad, and the contact pad is located on the side of the blocking portion away from the display area. Figure 7 schematically shows a fan-out routing area F electrically connected to a data line (not shown in the figure), and the data line is electrically connected to the pixel circuit of the sub-pixel to provide a data signal.

[0138] Figure 8 is a schematic diagram of pixel arrangement in a display substrate according to an embodiment of the present disclosure. Figures 9 and 10 are schematic diagrams of partial cross-sectional structures taken along line BB' of Figure 8 according to different examples of the present disclosure.

[0139] For example, as shown in FIG8 , the sub-pixels 300 may include sub-pixels 300 of different colors, such as a red sub-pixel emitting red light, a green sub-pixel emitting green light, and a blue sub-pixel emitting blue light. The area of ​​the light-emitting region of a blue sub-pixel is larger than the area of ​​the light-emitting region of a red sub-pixel, and the area of ​​the light-emitting region of a red sub-pixel is larger than the area of ​​the light-emitting region of a green sub-pixel. For example, the red sub-pixels and the blue sub-pixels are alternately arranged in both the row and column directions, and the blue-white sub-pixels are arranged in an array in both the row and column directions. A first pixel row including red sub-pixels and a second pixel row including green sub-pixels are alternately arranged in the column direction, and the first pixel row and the second pixel row are staggered in the row direction. FIG8 schematically illustrates one arrangement of multiple sub-pixels, but is not limited thereto. Multiple sub-pixels may also be arranged in other arrangements.

[0140] For example, as shown in Figures 9 and 10, the sub-pixel 300 further includes a pixel circuit 340, such as a plurality of transistors and at least one capacitor. For example, the pixel circuit 340 may have a 7T1C, 8T1C, 2T1C, or 3T1C structure, and the present disclosure does not limit this, and the configuration may be based on the actual requirements of the display substrate. Figures 9 and 10 schematically illustrate the conductive structure 100 as a portion of the pixel circuit 340, but are not limited thereto.

[0141] For example, as shown in Figures 9 and 10, the first inorganic layer 210 and the first organic layer 510 are both located between the first electrode 320 of the sub-pixel 300 and the base substrate 01. The first organic layer 510 includes a via 5101, such as an anode via 5101. The first electrode 320 of the sub-pixel 300 is electrically connected to the pixel circuit 340 through the via 5101. For example, the first inorganic layer 210 includes an opening that exposes the via 5101 of the first organic layer 510 to form a casing design.

[0142] During the study, the inventors of the present application found that: as shown in Figure 9, similar to the structural features of the above-mentioned defined structure 400, the edge of the first inorganic layer 210 located at the edge of the anode via 5101 protrudes relative to the edge of the first organic layer 510, so that the first electrode 320 of the sub-pixel 300 is prone to breakage during the process of overlapping with the pixel circuit 340, such as the conductive structure 100 through the sleeve hole formed by the first inorganic layer 210 and the first organic layer 510, which in turn causes uneven display (mura) or dark spots in pixels when the display substrate is used for display.

[0143] In some examples, as shown in FIG10 , the first inorganic layer 210 covers at least a portion of the inner wall of the anode via 5101 of the first organic layer 510 to prevent the first electrode 320 of the sub-pixel 300 from breaking during the bonding process with the pixel circuit 340. For example, the first inorganic layer 210 wraps the anode via 5101 formed on the surface of the first organic layer 510 that was originally exposed by the first inorganic layer 210, as shown in FIG9 .

[0144] For example, Figure 10 schematically shows that the first inorganic layer 210 can cover the entire inner wall of the anode via 5101. At this time, the position where the first organic layer 510 contacts the first inorganic layer 210 may not form loss caused by etching, but is not limited to this. The first inorganic layer 210 can cover part of the inner wall of the anode via 5101 away from the base substrate 01.

[0145] For example, as shown in FIG10 , the dimension d of the portion of the first inorganic layer 210 located on the sidewall of the anode via 5101, such as a thickness greater than 1 micron, is greater than 1 micron. For example, in a typical display substrate, when the first inorganic layer does not cover the inner wall of the anode via, the dimension of the anode via in the first organic layer is a. In the embodiment of the present disclosure, the dimension of the anode via in the first organic layer whose inner wall is covered by the first inorganic layer is greater than a. For example, the dimension of the anode via in the first organic layer whose inner wall is covered by the first inorganic layer can be 2 to 3 microns.

[0146] 9 and 10 only schematically illustrate the structure between the first electrode 320 of the sub-pixel 300 and the base substrate 01 . The side of the first electrode 320 away from the base substrate 01 is also provided with the light-emitting functional layer 310 , the second electrode 330 , the pixel defining pattern 5200 and other structures as shown in FIG. 2 .

[0147] For example, in the first zone, the first inorganic layer and an insulating layer in direct contact therewith, such as the first organic layer, may be provided with only the first inorganic layer in one area of ​​the first zone, such as in the anode via as shown in FIG10 , and in another area of ​​the first zone, only the first organic layer may be provided, such as between adjacent sub-pixels.

[0148] In some examples, as shown in FIG1 , the base substrate 01 further includes a third region 013 , which includes a portion of the non-display area. For example, the first region 011 surrounds the third region 013 . For example, the third region 013 includes a light-transmitting region and a non-light-transmitting region. The light-transmitting region is used to house a photosensor, such as, but not limited to, an infrared sensor, an ultrasonic sensor, a LIDAR (Light Detection and Ranging) sensor, a radar sensor, a camera, or a distance sensor; the non-light-transmitting region surrounds the light-transmitting region. For example, the third region 013 may also be referred to as an AA hole region.

[0149] Figure 11 is a schematic diagram of the planar structure of the first and third regions of the display substrate shown in Figure 1. Figure 12 is a schematic diagram of a partial planar structure of the third region shown in Figure 11. Figure 13 is a schematic diagram of a partial cross-sectional structure of the display substrate shown in Figure 12 in one example. The structure shown in Figure 12 may be the leftmost portion of the structure shown in Figure 11. Figures 13 to 17 omit the barrier between the first and second isolation pillars.

[0150] In some examples, as shown in Figures 11 to 13, the portion of the conductive structure 100 located in the third region 013 includes at least one annular first isolation column 610. In a direction perpendicular to the base substrate 01, the first isolation column 610 does not overlap with the first organic layer 510. For example, in a direction perpendicular to the base substrate 01, the first isolation column 610 does not overlap with the first inorganic layer 210. However, this is not limiting. For example, the first inorganic layer may cover the sidewalls of the first isolation column to prevent a broken cathode from connecting to the metal layer included in the first isolation column, thereby preventing problems such as water and oxygen intrusion.

[0151] For example, Figures 12 and 13 schematically illustrate that the portion of the conductive structure 100 located in the third region 013 includes four circles of first isolation pillars 610. For example, multiple circles of first isolation pillars 610 may be arranged at equal intervals. However, this is not limiting, and the number of first isolation pillars may also be one, two, or three circles. For example, the conductive structure 100 may include at least one layer of sub-conductive structures, one of which includes first isolation pillars 610.

[0152] For example, as shown in FIG11 , the third region 013 may include multiple light-transmitting regions 0130, such as three light-transmitting regions 0130, but the present invention is not limited thereto. The third region 013 may also include one light-transmitting region 0130. For example, a circle of first isolation pillars 610 may surround at least one light-transmitting region 0130. For example, different first isolation pillars 610 may surround the same light-transmitting region 0130 or different light-transmitting regions 0130.

[0153] In some examples, as shown in Figures 11 to 13, at least a portion of the edge of the first region 011 near the third region 013, or at least a portion of the edge of the third region 013 near the first region 011, includes a second isolation column 620. For example, the second isolation column 620 is provided on a portion of the edge of the third region 013 near the first region 011. For example, the third region 013 is further provided with at least one circle of blocking portions 630, which have the same function as the blocking portions 630 shown in Figure 3.

[0154] For example, B1 shown in FIG11 represents the boundary of the light-emitting layer formed using a fine metal mask (FMM) in the light-emitting functional layer 310, B2 represents the boundary of the first inorganic layer 210 located in the third region 013, the other common film layers in the light-emitting functional layer 310 entirely cover the third region 013, and the second electrode 330 of the sub-pixel 300 entirely covers the third region 013. For example, B3 shown in FIG12 represents the boundary of the second organic layer 520, and B4 represents the boundary of the first organic layer 510. For example, between two B4 boundaries, only the first organic layer 510 is disposed in the barrier portion 630 closest to the second isolation column 620.

[0155] For example, when only one light-transmitting region 0130 is provided in the third region 013, second isolation pillars 620 may be provided at all edges of the third region 013 near the first region 011, such as the second isolation pillars 620 surrounding the first isolation pillars 610. For example, when multiple light-transmitting regions 0130 are provided in the third region 013, the second isolation pillars 620 may be provided not only at the edge of the third region 013 near the first region 011 but also between two adjacent light-transmitting regions 0130, and each light-transmitting region 0130 may be surrounded by a second isolation pillar 620.

[0156] In some examples, as shown in Figure 13, the second isolation column 620 includes a stacked structure formed by a first inorganic layer 210 and a first organic layer 510, and in the second isolation column 620, the edge of the first inorganic layer 210 includes a first protrusion 621 that protrudes relative to at least a portion of the edge of the first organic layer 510, and the first isolation column 610 and the second isolation column 620 are configured to separate the light-emitting functional layer 310 and the second electrode 330, or the first isolation column 610 and the second isolation column 620 are configured to separate the light-emitting functional layer 310.

[0157] 14 to 16 are process steps for forming the display substrate shown in FIG. 13 .

[0158] For example, as shown in FIG14 , after patterning a pre-isolation column 6100 disposed on the same layer as the power signal line 110, a first organic material layer covering the pre-isolation column 6100 is formed, and the first organic material layer is patterned to form a first organic layer 510. The process of patterning the first organic material layer includes removing the first organic material layer covering the surface of the pre-isolation column 6100 and forming the anode via 5101 shown in FIG10 . The pre-isolation column 6100 is the structure before etching to form the first isolation column 610. The edges of the film layers (such as the film layers in a three-layer structure, which may include a titanium / aluminum / titanium structure) in the pre-isolation column 6100 are substantially flush, and do not include a protrusion for isolating the light-emitting functional layer 310 or the second electrode 330.

[0159] For example, as shown in FIG. 15 , a first inorganic material layer 2100 is formed on the pre-isolation pillars 6100 and the first organic layer 510 . The first inorganic material layer 2100 may be a whole film layer.

[0160] For example, as shown in Figure 16, the first inorganic material layer 2100 is patterned to form a limiting structure 400 located in the first area 011 and a second isolation column 620 located at the edge of the third area 013. In the process of patterning the first inorganic material layer 2100, the first organic layer 510 in contact with its surface will be etched to a certain extent, resulting in a certain loss, and then the position where the first organic layer 510 contacts the first inorganic layer 210 forms an undercut structure, and the portion of the first inorganic layer 210 that protrudes relative to the first organic layer 510 is the protrusion.

[0161] During research, the inventors of this application discovered that in a display substrate provided with a first inorganic layer 210, during the dry etching process for patterned removal of the first organic material layer on the pre-isolation column, the sidewalls of the pre-isolation column will be subject to a certain degree of side etching. As a result, during the process of removing the first inorganic material layer on the pre-isolation column, a portion of the inorganic material 0210 will remain at the side-etched position of the pre-isolation column sidewall, resulting in the inability to form the first isolation column 610 with an undercut morphology shown in Figure 13. Therefore, it is necessary to add an etching process to remove the inorganic material remaining on the sidewalls of the pre-isolation column. For example, during the process of etching to form the first electrode 320 after forming the first inorganic layer 210, the pre-isolation column can be etched to form the first isolation column 610.

[0162] For example, as shown in Figures 11 to 13, while a first isolation column 610 formed by a conductive structure 100 is provided in the third area 013, a second isolation column 620 formed by stacking a first inorganic layer 210 and a first organic layer 510 is provided. This is beneficial to further isolate the common film layer in the light-emitting functional layer 310 between the third area 013 and the first area 011 and the second electrode 330 set on the entire surface shared by multiple sub-pixels 300, thereby better ensuring the reliability verification of the AA hole area during the trust process.

[0163] Fig. 17 is a schematic diagram of a partial cross-sectional structure of another example of the display substrate shown in Fig. 12. The cross-sectional structure of the display substrate shown in Fig. 17 differs from that shown in Fig. 13 in that the structure of the second spacer pillars 620 is different.

[0164] In some examples, as shown in Figure 17, in at least one second isolation column 620, the first organic layer 510 is provided with a first groove 511, and the first inorganic layer 210 includes an opening 2110 exposing the first groove 511; the second organic layer 520 includes a first covering portion 521, and the first covering portion 521 covers the first groove 511 and the edge of the first inorganic layer 210 close to the first groove 511.

[0165] In the display substrate provided by the present disclosure, by setting an opening in the first inorganic layer included in the second isolation column and using a first covering portion to cover the edge of the opening of the first inorganic layer, it is not only beneficial to achieve water vapor outgassing (outgassing) of the first organic layer, but also can prevent the first inorganic layer in the second isolation column from having poor adhesion to the first organic layer and causing peeling problems.

[0166] For example, as shown in FIG17 , the same second isolation column 620 can be provided with one opening 2110 or multiple openings 2110. For example, the shape of the opening 2110 can be a closed ring to surround the light-transmitting area. For example, the shape of the opening 2110 can be a non-closed ring, such as the non-closed ring can include multiple small openings spaced apart. For example, the shapes of the openings 2110 provided in different second isolation columns 620 can be the same or different. For example, when the openings 2110 provided in different second isolation columns 620 are all closed rings, the widths of the different openings 2110 located in different second isolation columns 620 can be the same or different.

[0167] For example, as shown in FIG. 17 , the size of the opening 2110 of the first inorganic layer 210 exposing the first groove 511 may be the same as or different from the size of the first groove 511 . For example, the size of the opening 2110 may be smaller than the size of the first groove 511 .

[0168] 17 , the first covering portion 521 does not overlap with the first protrusion 621 in a direction perpendicular to the base substrate 01. For example, the first covering portion 521 does not overlap with the interval between adjacent second spacers 620 in a direction perpendicular to the base substrate 01.

[0169] For example, as shown in FIG17 , the minimum distance between the surface of the first organic layer 510 away from the base substrate 01 and the surface of the conductive structure 100 away from the base substrate 01 is 1.7 to 1.9 microns, such as 1.8 microns. For example, the maximum thickness of the first organic layer 510 directly above the conductive structure 100 is 2 to 2.2 microns, such as 2.1 microns.

[0170] For example, as shown in FIG. 17 , the first organic layer 510 included in the plurality of second spacers 620 may be an integrated structure, and the first organic layer 510 included in the plurality of second spacers 620 includes portions separated from each other.

[0171] Figures 18 and 19 are schematic diagrams of partial cross-sectional structures of different examples of the third region of the display substrate shown in Figure 1. The cross-sectional structures of the display substrates shown in Figures 18 and 19 differ from the cross-sectional structure of the display substrate shown in Figure 13 in that the structure of the first isolation pillars 610 is different.

[0172] In some examples, as shown in FIG18 , the first isolation pillar 610 includes a first isolation layer 611 and a second isolation layer 612 stacked together, with the second isolation layer 612 located on a side of the first isolation layer 611 away from the base substrate 01. The portion of the first organic layer 510 located in the third region 013 includes the first isolation layer 611, and the portion of the first inorganic layer 210 located in the third region 013 includes the second isolation layer 612. The second isolation layer 612 protrudes relative to the edge of the first isolation layer 611 to form a second protrusion 613. For example, the first isolation pillar 610 and the second isolation pillar 620 shown in FIG18 are both located in the third region 013.

[0173] Compared with the use of the conductive structure 100 to form the first isolation column 610 shown in Figures 13 to 17, this example uses the first inorganic layer 210 to replace the original passivation layer to save one mask step (such as PVX mask), and uses the first isolation column 610 formed by the stacked first inorganic layer 210 and the first organic layer 510 to replace the first isolation column 610 formed by the conductive structure 100. This can avoid the problem that the first inorganic layer 210 is easily left on the first isolation column 610, thereby reducing one mask process, such as the via mask process.

[0174] For example, as shown in FIG18 , the maximum distance between the surface of the first organic layer 510 directly above the conductive structure 100 that is away from the base substrate 01 and the surface of the conductive structure 100 that is away from the base substrate 01 is 2 to 2.2 microns, such as 2.1 microns. For example, the minimum distance between the surface of the first organic layer 510 directly above the conductive structure 100 that is away from the base substrate 01 and the surface of the conductive structure 100 that is away from the base substrate 01 is 1.7 to 1.9 microns, such as 1.8 microns. For example, the thickness of the portion of the first organic layer 510 that serves as the second isolation column 620 can be 0.2 to 0.4 microns, such as 0.3 microns.

[0175] For example, as shown in FIG. 18 , the thickness of the first isolation layer 611 may be 2 to 2.2 micrometers, such as 2.1 micrometers.

[0176] For example, as shown in FIG18 , the first isolation layer 611 of the first isolation column 610 closest to the second isolation column 620 among the plurality of first isolation columns 610 can be integrated with the first organic layer 510. For example, the distance between the second isolation layer 612 of the first isolation column 610 closest to the second isolation column 620 among the plurality of first isolation columns 610 and the conductive structure 100 can be 3.9 to 4.1 microns, such as 4 microns. For example, the distance between the second isolation layers 612 of adjacent first isolation columns 610 can be 9.5 to 10.5 microns, such as 10 microns.

[0177] For example, in another example, referring to FIG18 , a third organic layer is further disposed between the first organic layer 510 and the base substrate 01. The portion of the third organic layer located in the third region 013 includes the first isolation layer 611, and the portion of the first inorganic layer 210 located in the third region 013 includes a second isolation layer 612. The second isolation layer 612 protrudes relative to the edge of the first isolation layer 611 to form a second protrusion 613. In this example, the third organic layer between the first organic layer 510 and the base substrate 01 in the second isolation column 620 has been removed, and the first isolation column 610 uses a different organic layer as the first isolation layer 611 than that in the second isolation column 620. For example, the first organic layer and the third organic layer can be made of the same material. For example, when the third organic layer is used as the first isolation layer 611, the thickness of the first isolation layer 611 is less than the thickness of the first isolation layer 611 when the first organic layer 510 is used as the first isolation layer 611. For example, when the third organic layer is used as the first isolation layer 611, the thickness of the first isolation layer 611 can be 1.4 to 1.6 microns, such as 1.5 microns; or, it can be 0.7 to 0.9 microns, such as 0.8 microns.

[0178] In some examples, as shown in FIG19 , a second groove 614 is provided on a side of the first isolation layer 611 away from the base substrate 01 , and the second isolation layer 612 exposes the second groove 614 ; the display substrate also includes a second organic layer 520 , which is located on a side of the first inorganic layer 210 away from the base substrate 01 , and the second organic layer 520 includes a second covering portion 522 , and the second covering portion 522 at least covers the second groove 614 .

[0179] In the display substrate provided by the present disclosure, by setting a second groove in the first isolation layer included in the first isolation column and using a second covering portion to cover the second groove and the edge of the second isolation layer close to the second groove, it is not only beneficial to achieve water vapor discharge (outgassing) of the first isolation layer, but also can prevent the first isolation layer and the second isolation layer in the first isolation column from having poor adhesion and causing peeling problems.

[0180] For example, FIG19 schematically illustrates that, while the first spacer 610 is covered by the second covering portion 522, the second spacer 620 is covered by the first covering portion 521. This allows for the release of moisture from the organic layer in the first spacer 610 and the second spacer 620 while preventing the inorganic layer from being peeled off. Of course, the disclosed embodiments are not limited thereto, and while the first spacer 610 is covered by the second covering portion 522, the second spacer 620 may also be as shown in FIG18.

[0181] Figure 20 is a schematic diagram of a fracture in the encapsulation layer at the boundary of the first inorganic layer. Figure 21 is a scanning electron microscope image of a fracture in the encapsulation layer at the boundary of the first inorganic layer. The structure shown in Figure 20 can be located in the third region 013, where the first isolation pillar 610 is close to the first region 011, or at the edge of the second region 012, away from the first region 011.

[0182] For example, as shown in Figures 20 and 21, edge etching of the first inorganic layer 210 will cause loss to the first organic layer 510 thereunder, so that the first inorganic layer 210 includes a protrusion that protrudes relative to a portion of the edge of the second inorganic layer 220. The portion of the first inorganic layer 210 that protrudes relative to the edge of the first organic layer 510 is not covered by the second organic layer 520. When the encapsulation layer 700 is deposited on the edge of the first inorganic layer 210, it is easy to crack, forming a fracture area 701.

[0183] 22 and 23 are structural diagrams of different examples of the embodiment of the present disclosure at the location of FIG. 20 .

[0184] In some examples, as shown in Figures 12 and 22, the encapsulation layer 700 is located on a side of the second organic layer 520 away from the base substrate 01. The portion of the first inorganic layer 210 covering the first organic layer 510 that is farthest from the edge of the first region 011 and protrudes relative to the edge of the first organic layer 510 is covered by the second organic layer 520, and the encapsulation layer 700 covers the edge of the second organic layer 520. For example, the first organic layer 510 and the first inorganic layer 210 shown in Figure 22 are stacked to form a second isolation column 620 located in the third region 013.

[0185] In some examples, as shown in Figures 3 and 22, the encapsulation layer 700 is located on a side of the second organic layer 520 away from the base substrate 01. The portion of the first inorganic layer 210 covering the first organic layer 510 that is farthest from the edge of the first region 011 and protrudes relative to the edge of the first organic layer 510 is covered by the second organic layer 520, and the encapsulation layer 700 covers the edge of the second organic layer 520. For example, the second organic layer 520 shown in Figure 22 may be a portion of the blocking portion 630.

[0186] For example, the encapsulation layer 700 may include a plurality of film layers stacked together, such as an inorganic encapsulation layer, an organic encapsulation layer, and an inorganic encapsulation layer stacked together in sequence.

[0187] In the display substrate provided by the present disclosure, by covering the portion of the first inorganic layer protruding relative to the edge of the first organic layer with the second organic layer, the encapsulation layer can be prevented from breaking at the portion of the first inorganic layer protruding relative to the edge of the first organic layer.

[0188] 23 , the first inorganic layer 210 includes a plurality of gaps 212 exposing the first organic layer 510, and the second organic layer 520 fills the plurality of gaps 212. For example, the first organic layer 510 includes a plurality of recesses 513, the first inorganic layer 210 includes a plurality of gaps 212 exposing the plurality of recesses 513, and the second organic layer 520 fills the plurality of recesses 513.

[0189] During research, the inventors of this application discovered that when a large-area first organic layer is provided between the first inorganic layer of the display substrate and the base substrate, on the one hand, it is not conducive to the emission of water vapor from the first organic layer; on the other hand, the adhesion between the first inorganic layer and the first organic layer is poor, and the first inorganic layer is prone to peeling. The display substrate provided by the present disclosure, as shown in Figure 23, is conducive to the emission of water vapor from the first organic layer by providing a gap in the first inorganic layer covering the large area to expose part of the first organic layer; at the same time, the second organic layer located on the side of the first inorganic layer away from the first organic layer fills the gap in the first inorganic layer, which is conducive to the bonding of the first organic layer and the second organic layer, solving the problem of the first inorganic layer being prone to peeling.

[0190] 24 and 25 are schematic diagrams of the local structures of the bending region in the display substrate shown in FIG. 1 in different examples.

[0191] In some examples, as shown in Figures 1, 24, and 25, the base substrate 01 includes a bending region 015, and the display substrate includes a stacked base substrate 01, a conductive structure 100, a first organic layer 510, a first inorganic layer 210, a second organic layer 520, and an encapsulation layer 700. The portions of the conductive structure 100, the first inorganic layer 210, the first organic layer 510, and the second organic layer 520 located in the bending region 015 are all configured to be bendable. For example, the bending region 015 may overlap with a portion of the second region 012. Figures 24 and 25 schematically illustrate the morphology of the structure within the bending region when it is in a bent state, but are not limited thereto. The structure within the bending region may also be in a non-bent state.

[0192] During the study, the inventors of the present application found that: for some medium and large-sized display devices, or display devices used in mobile phones, a folding design is adopted in the bending zone. When the bending zone 015 is provided with a first inorganic layer 210 with a larger area and the display device is bent in the bending zone 015, due to the inability to release stress, the first inorganic layer 210 is prone to peeling off at least from the first organic layer 510 as shown in Figure 24. For example, a peeling off phenomenon similar to that shown in Figure 24 is also prone to occur between the first inorganic layer 210 and the second organic layer 520.

[0193] In some examples, as shown in FIG. 25 , the portion of the first inorganic layer 210 located in the bending region 015 includes an opening 2113 , the portion of the first organic layer 510 located in the bending region 015 includes a third groove 512 , and the second organic layer 520 fills the opening 2113 and the third groove 512 .

[0194] The display substrate provided by the present disclosure patterns the first inorganic layer in the bending area to include multiple openings exposing the first organic layer. The second organic layer contacts the first organic layer through the multiple openings, so that the organic layers located on both sides of the first inorganic layer adhere to each other through the multiple openings. While achieving the release of water vapor from the first organic layer and reducing the probability of peeling of the first inorganic layer, it is also beneficial to release the bending force through the openings, so as to improve the reliability of the folding effect of the flexible display substrate.

[0195] For example, as shown in FIG25 , the bending region 015 can be within 3 mm on either side of the bending line of the display substrate. For example, the orthographic projection of the opening 2113 on the base substrate 01 can be a regular shape such as a circle, ellipse, rectangle, or strip, or an irregular shape. For example, multiple openings 2113 can be evenly spaced.

[0196] The display substrate provided by the present disclosure can be patterned differently for the first inorganic layer in different areas, so as to isolate at least one layer of the light-emitting functional layer of adjacent sub-pixels of different colors in the display area to reduce crosstalk, and replace the original passivation layer covering the power signal line between adjacent blocking parts in the non-display area. On the basis of reducing one patterning process and reducing costs, it can serve as a passivation layer to solve the growing dark spot (GDS) problem in the reliability verification process of the area, which is beneficial to improving product yield and quality control, and / or, in addition to the first isolation column formed by the conductive structure in the non-display area, a second isolation column formed by stacking the first inorganic layer and the first organic layer is added to further isolate the common film layer in the light-emitting functional layer and the second electrode of the sub-pixel, which is beneficial to improving the power-off effect of the isolation column in the non-display area and reducing the growing dark spot (GDS) that is prone to occur during the reliability process at this position. The invention relates to a method for preventing a first isolation column formed by an original conductive structure and a first isolation column formed by stacking a first inorganic layer and a first organic layer or other organic layers, so as to save a step of patterning process for removing the inorganic material remaining on the side wall of the preset isolation column formed by the conductive structure, and / or, providing an opening in the first inorganic layer to expose the first organic layer so as to release water vapor while preventing the first inorganic layer from being peeled off, and / or, using a second organic layer to cover a portion of the first inorganic layer protruding from the edge of the first organic layer so as to prevent the encapsulation layer from breaking at the edge of the first organic layer, and / or, covering the inner wall of the anode via formed in the first organic layer with the first inorganic layer, so as to prevent the first electrode (such as the anode) from breaking at the edge of the anode via, thereby causing dark spots in pixels or uneven display.

[0197] The present disclosure provides another display substrate. Referring to Figures 1 to 7 , the display substrate comprises a base substrate 01, an inorganic layer 210 located on the base substrate 01, a conductive structure 100, and at least one barrier 630. The base substrate 01 includes a display area 031 and a non-display area 032 surrounding the display area 031. The inorganic layer 210 is located on the base substrate 01 in both the display area 031 and the non-display area 032. The conductive structure 100 is located between the inorganic layer 210 and the base substrate 01 and includes a power signal line 110. At least one barrier 630 is located in the non-display area 032 and surrounds the display area 031. The barrier 630 is located on the side of the conductive structure 100 away from the base substrate 01. The inorganic layer 210, conductive structure 100, and barrier 630 in the display substrate provided in this embodiment may have the same features as the first inorganic layer 210, conductive structure 100, and barrier 630 in the display substrate provided in the above-described embodiment.

[0198] Referring to Figures 1 to 7 , the non-display area 032 includes a first non-display area 0321 located to one side of the display area 031. The portion of the power signal line 110 located in the first non-display area 0321 extends along a first direction. The portion of the blocking portion 630 located in the first non-display area 0321 includes a strip-shaped blocking portion 6300 extending along a second direction and overlapping the power signal line 110. The portion of the inorganic layer 210 located in the first non-display area 0321 includes an inorganic layer pattern 211 extending along the second direction. Along a direction perpendicular to the base substrate 01, the edge of the strip-shaped blocking portion 6300 overlaps at least partially with the edge of the inorganic layer pattern 211. For example, along a direction perpendicular to the base substrate 01, the edge of the strip-shaped blocking portion 6300 completely overlaps with the edge of the inorganic layer pattern 211. The first and second directions in this embodiment can have the same characteristics as those in the above-described embodiments. The inorganic layer pattern 211, the strip-shaped barrier 6300, and the overlapping relationship between the ...

[0199] The display substrate provided by the present disclosure provides an inorganic layer including an inorganic layer pattern in the first non-display area where the extension direction of the power signal line intersects the extension direction of the strip-shaped blocking portion, which is beneficial for covering the edge of the power signal line to prevent defects such as etching from occurring at the edge of the power signal line.

[0200] For example, the inorganic layer provided by the present disclosure can replace the passivation layer in the above-mentioned display substrate to save one patterning process step.

[0201] In some examples, referring to Figures 1 to 7, the non-display area 032 includes a second non-display area 0322 surrounding the display area 031, and the orthographic projection of the portion of the power signal line 110 located in the second non-display area 0322 on the base substrate 01 is completely within the orthographic projection of at least one circle of blocking portions 630 on the base substrate 01. The second non-display area 0322 in this embodiment may be the fourth area 014 in the above-described embodiment, and the relationship between the portion of the power signal line 110 in the display substrate provided in this embodiment located in the second non-display area 0322 and the blocking portion 630 may be the same as the relationship between the portion of the power signal line 110 in the fourth area 014 and the blocking portion 630 in the display substrate provided in the above-described embodiment.

[0202] In some examples, referring to Figures 1 to 7 , in a direction perpendicular to the base substrate 01, the portion of the power signal line 110 located in the second non-display area 0322 does not overlap with the inorganic layer 210. The overlapping relationship between the portion of the power signal line 110 located in the second non-display area 0322 and the inorganic layer 210 in the display substrate provided in this embodiment can be the same as the overlapping relationship between the portion of the power signal line 110 located in the fourth area 014 and the first inorganic layer 210 in the display substrate provided in the above embodiment.

[0203] In some examples, referring to Figures 1 to 7, the power signal line 110 includes a first power signal line 111 and a second power signal line 112. Only the second power signal line 112 is provided in the second non-display area 0322, and the first power signal line 111 and the second power signal line 112 are provided in the first non-display area 0321. The first power signal line 111 and the second power signal line 112 in this embodiment can have the same characteristics as the first power signal line 111 and the second power signal line 112 in the above-described embodiments, respectively. The positional distribution characteristics of the first power signal line 111 and the second power signal line 112 in the first non-display area 0321 and the second non-display area 0322 in the display substrate provided in this embodiment can be the same as the positional distribution characteristics of the first power signal line 111 and the second power signal line 112 in the second area 012 and the fourth area 014 in the display substrate provided in the above-described embodiments.

[0204] In some examples, referring to Figures 1 to 7, the at least one inorganic layer pattern 211 includes a plurality of inorganic layer patterns 211, the number of strip-shaped barrier portions 6300 is at least one, and the strip-shaped barrier portions 6300 and the plurality of inorganic layer patterns 211 are alternately arranged along a first direction. The alternating arrangement relationship between the inorganic layer patterns 211 and the strip-shaped barrier portions 6300 in the display substrate provided in this embodiment can be the same as the alternating arrangement relationship between the inorganic layer patterns 211 and the strip-shaped barrier portions 6300 in the display substrate provided in the above embodiment. For example, the shape and size of the inorganic layer pattern in the display substrate provided in this embodiment can be the same as the shape and size of the inorganic layer pattern in the display substrate provided in the above embodiment.

[0205] In some examples, referring to Figures 1 to 7 , the inorganic layer pattern 211 covers the edge of the power signal line 110 extending along the first direction. The covering relationship between the inorganic layer pattern 211 and the edge of the power signal line 110 in the display substrate provided in this embodiment can be the same as the covering relationship between the inorganic layer pattern 211 and the edge of the power signal line 110 in the display substrate provided in the above embodiment.

[0206] In some examples, referring to Figures 1 to 7, the display substrate further includes a first organic layer 510 located between the inorganic layer and the base substrate 01. The portion of the first organic layer 510 located in the display area includes a planar layer (PLN), and the portion of the first organic layer 510 located in the non-display area 032 includes a first film layer 631 of a barrier 630. The portion of the inorganic layer 210 that overlaps with the barrier 630 in a direction perpendicular to the base substrate 01 covers the edge of the first film layer 631. The planar layer of the first organic layer 510 located in the display area 031 and the first film layer 631 of the barrier 630 in the non-display area 032 in the display substrate provided in this embodiment have the same characteristics as the planar layer of the first organic layer 510 located in the first area 011 and the first film layer 631 of the barrier 630 located in the second area 012 in the display substrate provided in the above-described embodiments, respectively.

[0207] In some examples, referring to Figures 1 to 7, the display substrate also includes a second organic layer 520, which is located on the side of the inorganic layer 210 away from the base substrate 01, and the portion of the second organic layer 520 located in the non-display area 032 includes a second film layer 632 of the blocking portion 630, and the second film layer 632 is located on the side of the first film layer 631 away from the base substrate 01, and in a direction perpendicular to the base substrate 01, the portion where the inorganic layer pattern 211 overlaps with the blocking portion 630 is located between the first film layer 631 and the second film layer 632. The second organic layer 520 in this embodiment is located in the second film layer 632 of the blocking portion 630 of the non-display area 032 and has the same characteristics as the second film layer 632 of the blocking portion 630 of the second organic layer 520 in the above embodiment is located in the second area 012. The positional relationship among the inorganic layer pattern 211, the first film layer 631 and the second film layer 632 in the display substrate provided in this embodiment and the positional relationship among the inorganic layer pattern 211, the first film layer 631 and the second film layer 632 in the display substrate provided in the above embodiment have the same characteristics.

[0208] FIG26 is a schematic diagram of a partial cross-sectional structure of a non-display area of ​​a display substrate provided according to an embodiment of the present disclosure.

[0209] In some examples, as shown in FIG26 , the display substrate further includes an encapsulation layer 700 located on a side of the second organic layer 520 away from the base substrate 01. The encapsulation layer 700 includes a portion in contact with the barrier 630 and a portion in contact with the inorganic layer. The encapsulation layer in the display substrate provided in this embodiment may have the same features as the encapsulation layer in the display substrate provided in the above embodiment.

[0210] The structure provided in the display area in the embodiment of the present disclosure may be the same as the structure provided in the display area in the above embodiment, such as the sub-pixel 300 , the pixel defining pattern 5200 , the defining structure 400 and other structures.

[0211] The above-mentioned display substrate provided by the present disclosure can be designed with different patterns for the inorganic layers located in the display area and the non-display area, so as to isolate at least one layer of the light-emitting functional layer of adjacently arranged sub-pixels of different colors in the display area to reduce crosstalk, while replacing the original passivation layer between adjacent blocking parts in the non-display area to cover the conductive structure to reduce one patterning process step.

[0212] The display substrate provided in this embodiment may be the same display substrate as the display substrate provided in the above embodiment, or it may be a different display substrate with different features in the non-display area. For example, the display substrate provided in this embodiment may include the third area in the above embodiment, or it may not include the third area in the above embodiment. For example, in this embodiment, only the first isolation column in the above embodiment may be provided, or the first isolation column and the second isolation column in the above embodiment may be provided at the same time. For example, in this embodiment, the first isolation column formed by the conductive structure in the above embodiment may be adopted, or the first isolation column formed by the stacking of the first inorganic layer and the first organic layer in the above embodiment may be adopted. For example, in the display area of ​​this embodiment, the sidewalls of the anode via included in the flat layer may be covered with an inorganic layer, or may not be covered with an inorganic layer. For example, the display substrate provided in this embodiment may include the bending area in the above embodiment, or may not include the bending area in the above embodiment.

[0213] Another embodiment of the present disclosure provides a display substrate. Figure 27 is a schematic diagram of a partial cross-sectional structure of a display substrate provided according to an example of an embodiment of the present disclosure. Figure 27 omits the structure between the barrier and the edge of the first inorganic layer, which is prone to fracture.

[0214] As shown in Figure 27, the display substrate includes a base substrate 01, and a first inorganic layer 210, a first organic layer 510, a second organic layer 520, and a conductive structure 100 located on the base substrate 01. The base substrate 01 includes a first sub-region 021 and a second sub-region 022. The first inorganic layer 210 is located in the first sub-region 021 and the second sub-region 022 of the base substrate 01. The first organic layer 510 is located between the film layer containing the first inorganic layer 210 and the base substrate 01. The second organic layer 520 is located on the side of the film layer containing the first inorganic layer 210 away from the base substrate 01. The conductive structure 100 is located between the film layer containing the first inorganic layer 210 and the base substrate 01. The portion of the first inorganic layer 210 located in the first sub-region 021 contacts the first organic layer 510, while the portion of the first inorganic layer 210 located in the second sub-region 022 contacts the conductive structure 100. In the first sub-region 021, at least a portion of the edge of the first inorganic layer 210 covering the first organic layer 510 is covered by the second organic layer 520. For example, all edges of the first inorganic layer 210 covering the first organic layer 510 are covered by the second organic layer 520 .

[0215] The display substrate provided by the present disclosure is advantageous in preventing the encapsulation layer covering the edge of the first inorganic layer from being broken by arranging the edge of the first organic layer covered by the first inorganic layer to be covered by the second organic layer.

[0216] Referring to FIG. 27 , the first inorganic layer 210, first organic layer 510, second organic layer 520, and conductive structure 100 in the display substrate provided in this embodiment may have the same features as the first inorganic layer 210, first organic layer 510, second organic layer 520, and conductive structure 100 in the display substrate provided in any of the embodiments shown in FIG. 1 to FIG. 26 . The first sub-region 021 in the display substrate provided in this embodiment may have the same features as the edge portion of the second region 012 or the third region 013 in the display substrate provided in the above-described embodiments. The second sub-region 022 in the display substrate provided in this embodiment may have the same features as the non-edge portion of the second region 012 in the display substrate provided in the above-described embodiments. Of course, the disclosed embodiments are not limited to this. When other inorganic layers, such as a second inorganic layer, are provided between the conductive structure and the base substrate, the first inorganic layer may also be in contact with the second inorganic layer in the second sub-region.

[0217] In some examples, referring to Figures 1 and 2, the base substrate 01 also includes a third sub-area 023, the first sub-area 021 includes a partial area of ​​the non-display area, the second sub-area 022 includes a partial area of ​​the non-display area, and the third sub-area 023 includes a partial area of ​​the display area; the display area includes a plurality of sub-pixels 300, and each sub-pixel 300 in at least some of the sub-pixels 300 includes a light-emitting functional layer 310, and the light-emitting functional layer 310 includes a plurality of film layers; the display substrate includes a defining structure 400, the defining structure 400 includes a portion of the first inorganic layer 210 located in the first area 011, the defining structure 400 is located between the light-emitting functional layer 310 and the base substrate 01, and the portion of the defining structure 400 located between adjacent sub-pixels 300 is configured to isolate at least one layer of the light-emitting functional layer 310. The third sub-region 023 in the display substrate provided in this embodiment may have the same characteristics as the first region 011 in the display substrate provided in the above embodiment, and the sub-pixel 300 and the defining structure 400 in the display substrate provided in this embodiment may respectively have the same characteristics as the sub-pixel 300 and the defining structure 400 in the display substrate provided in the above embodiment.

[0218] In some examples, referring to Figures 1 and 2, each sub-pixel 300 in at least some of the sub-pixels 300 also includes a first electrode 320 and a second electrode 330 located on both sides of the light-emitting functional layer 310, and the first electrode 320 is located between the light-emitting functional layer 310 and the base substrate 01; the portion of the second organic layer 520 located in the third sub-region 023 includes a pixel defining pattern 5200, which is located on the side of the first electrode 320 away from the base substrate 01, and the pixel defining pattern 5200 includes a plurality of first openings 5210 and a plurality of second openings 5220, and one sub-pixel 300 corresponds to at least one first opening 5210, and at least a portion of the light-emitting functional layer 310 of the sub-pixel 300 is located in the first opening 5210 corresponding to the sub-pixel 300, and the first opening 5210 is configured to expose the first electrode 320, and the second opening 5220 is configured to expose the edge of the defining structure 400. The pixel defining pattern 5200 in the display substrate provided in this embodiment and its positional relationship with the sub-pixel 300 and the defining structure 400 may have the same characteristics as the pixel defining pattern 5200 in the display substrate provided in the above embodiment and its positional relationship with the sub-pixel 300 and the defining structure 400.

[0219] FIG28 is a schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0220] In some examples, as shown in Figure 28, the portion of the first inorganic layer 210 located in the first sub-region 021 includes an opening 2101, the portion of the first organic layer 510 located in the first sub-region 021 includes a groove 5102, and the portion of the second organic layer 520 located in the first sub-region 021 fills the opening 2101 and the groove 5102.

[0221] During the study, the inventors of the present application found that: when a large-area first organic layer is provided between the first inorganic layer of the display substrate and the base substrate, on the one hand, it is not conducive to the emission of water vapor from the first organic layer; on the other hand, the adhesion between the first inorganic layer and the first organic layer is poor, and the first inorganic layer is prone to peeling. The display substrate provided by the present disclosure, as shown in FIG28, is conducive to the emission of water vapor from the first organic layer 510 by providing an opening in the first inorganic layer 210 covering the large-area first organic layer 510 to expose a portion of the first organic layer 510; at the same time, the second organic layer 520 located on the side of the first inorganic layer 210 away from the first organic layer 510 fills the opening of the first inorganic layer 210, which is conducive to the bonding of the first organic layer 510 and the second organic layer 520, thereby solving the problem of the first inorganic layer 210 being prone to peeling.

[0222] In some examples, referring to Figures 18 and 19, the non-display area includes at least one annular first isolation column 610, which includes a first isolation layer 611 and a second isolation layer 612 stacked together. The first isolation layer 611 is located between the second isolation layer 612 and the base substrate 01, and the second isolation layer 612 protrudes relative to the edge of the first isolation layer 611 to isolate the light-emitting functional layer 310 and the second electrode 330. The portion of the second organic layer 520 located in the non-display area includes the first isolation layer 611, and the portion of the first inorganic layer 210 located in the non-display area includes the second isolation layer 612. The first isolation column 610 including the first isolation layer 611 and the second isolation layer 612 in the display substrate provided in this embodiment can have the same features as the first isolation column 610 including the first isolation layer 611 and the second isolation layer 612 in the display substrate provided in the above embodiment.

[0223] In some examples, referring to FIG. 19 , a first sub-groove 6101 is provided on a side of the first isolation layer 611 away from the base substrate 01, and the second isolation layer 612 exposes the first sub-groove 6101. The portion of the second organic layer 520 located in the non-display area covers the first sub-groove 6101 and the edge of the second isolation layer 612 near the first sub-groove 6101. The positional relationship between the first sub-groove 6101 and the second organic layer 520 and the first sub-groove 6101 in the display substrate provided in this embodiment can have the same characteristics as the second groove 614 and the positional relationship between the second organic layer 520 and the second groove 614 in the display substrate provided in the above embodiment.

[0224] In some examples, referring to Figures 18 and 19, the display substrate is provided with at least one second isolation column 620. The second isolation column 620 is located on a side of the first isolation column 610 away from the center of the portion of the non-display area it surrounds. The second isolation column 620 includes a third isolation layer 623 and a fourth isolation layer 624 stacked together. The third isolation layer 623 is located between the fourth isolation layer 624 and the base substrate 01, and the edge of the fourth isolation layer 624 protrudes relative to the edge of the third isolation layer 623 to isolate the light-emitting functional layer 310 and the second electrode 330. The distance between at least a portion of the fourth isolation layer 624 and the base substrate 01 is greater than the distance between the second isolation layer 612 and the base substrate 01. The third isolation layer 623 and the fourth isolation layer 624 in the display substrate provided in this embodiment are the first organic layer 510 and the first inorganic layer 210, respectively. The second isolation column 620 in the display substrate provided in this embodiment can have the same characteristics as the second isolation column 620 in the display substrate provided in the above embodiment.

[0225] In some examples, referring to FIG. 19 , a second sub-groove 6231 is provided on a side of the third isolation layer 623 away from the base substrate 01, and the fourth isolation layer 624 exposes the second sub-groove 6231. The second organic layer 520 covers the second sub-groove 6231 and the edge of the fourth isolation layer 624 near the second sub-groove 6231. The second sub-groove 6231 in the display substrate provided in this embodiment has the same features as the first groove 511 in the display substrate provided in the above embodiment, and the positional relationship between the second organic layer 520 and the second sub-groove 6231 in the display substrate provided in this embodiment has the same features as the positional relationship between the second organic layer 520 and the first groove 511 in the display substrate provided in the above embodiment.

[0226] For example, referring to FIG10 , the first inorganic layer 210 covers at least a portion of the inner wall of the anode via 5101 of the first organic layer 510 to prevent the first electrode 320 of the sub-pixel 300 from breaking during the bonding process with the pixel circuit 340. For example, the first inorganic layer 210 wraps the anode via 5101 formed on the surface of the first organic layer 510 that was originally exposed by the first inorganic layer 210, as shown in FIG9 .

[0227] The above-mentioned display substrate provided by the present disclosure can be designed with different patterns for the first inorganic layer in different areas, so as to isolate at least one layer of the light-emitting functional layer of adjacent sub-pixels of different colors in the display area to reduce crosstalk. At the same time, the first inorganic layer is used between adjacent blocking parts in the non-display area to replace the original passivation layer to cover the conductive structure. On the basis of reducing one patterning process and reducing costs, it can serve as a passivation layer to solve the GDSX problem in the reliability verification process of the area, which is beneficial to improving product yield and quality control, and / or, in addition to the first isolation column formed by the conductive structure in the non-display area, a second isolation column formed by stacking the first inorganic layer and the first organic layer is added to further isolate the common film layer in the light-emitting functional layer and the second electrode of the sub-pixel, which is beneficial to improving the non-display area. The power-off effect of the isolation column reduces the GDSH problem that is easy to occur during the reliability process of this position, and / or, a first isolation column formed by stacking a first inorganic layer and a first organic layer or other organic layers is used to replace the first isolation column formed by the original conductive structure to save a patterning process step, and / or, an opening is set in the first inorganic layer to expose the first organic layer to release water vapor while preventing the first inorganic layer from being peeled off, and / or, a second organic layer is used to cover the part of the first inorganic layer that protrudes relative to the edge of the first organic layer to prevent the encapsulation layer from breaking at the edge of the first organic layer, and / or, the inner wall of the anode via formed in the first organic layer covers the first inorganic layer to prevent the first electrode (such as the anode) from breaking at the edge of the anode via, resulting in dark spots in pixels or uneven display.

[0228] The display substrate provided in this embodiment can be the same display substrate as the display substrate provided in the above embodiment, or it can be a different display substrate with different features in the non-display area. For example, this embodiment can use the first isolation pillar formed by the conductive structure in the above embodiment, or it can use the first isolation pillar formed by the stacked arrangement of the first inorganic layer and the first organic layer in the above embodiment. For example, the display substrate provided in this embodiment can include the bending region described in the above embodiment, or it can exclude the bending region described in the above embodiment.

[0229] FIG29 is a schematic block diagram of a display device according to another embodiment of the present disclosure. As shown in FIG29 , the display device 1000 includes a display substrate 1001. The display substrate 1001 can be the display substrate in any of the above embodiments.

[0230] For example, the display device 1000 may be an organic light emitting diode display device.

[0231] For example, the display device 1000 may further include a cover plate located on the light-emitting side of the display substrate 1001 .

[0232] For example, the display device 1000 may be any product or component with a display function, such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a laptop computer, a navigator, etc., but the present embodiment is not limited thereto.

[0233] For example, the display device 1000 may be a medium or large-sized smart handheld display device (NB) or a touch screen display device (TPC), and also has broad application potential in the field of foldable products.

[0234] There are a few points to note:

[0235] (1) The drawings of the embodiments of the present disclosure only involve structures related to the embodiments of the present disclosure, and other structures can refer to general designs.

[0236] (2) In the absence of conflict, features in the same embodiment and different embodiments of the present disclosure may be combined with each other.

[0237] The foregoing description is merely an exemplary embodiment of the present disclosure and is not intended to limit the scope of protection of the present disclosure. The scope of protection of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: A substrate base plate, comprising a first region and a second region; A conductive structure located in the first region and the second region on the substrate; A first inorganic layer is located on a side of the conductive structure away from the substrate and is located in the first area and the second area; In at least a part of the first zone, an insulating layer is provided between the first inorganic layer and the conductive structure, and in at least a part of the second zone, the first inorganic layer is in contact with the surface of the conductive structure.

2. The display substrate according to claim 1, wherein: The thickness of the insulating layer is greater than the thickness of any one of the first inorganic layer and the conductive structure.

3. The display substrate according to claim 1 or 2, wherein: The portion of the conductive structure located in the second area includes a power signal line.

4. The display substrate according to any one of claims 1 to 3, wherein: The first area includes a display area, and the second area includes a portion of a non-display area; The display area includes a plurality of sub-pixels, each of at least some of the sub-pixels includes a light-emitting functional layer, and the light-emitting functional layer includes a plurality of film layers; The display substrate includes a defining structure, the defining structure includes a portion of the first inorganic layer located in the first zone, the defining structure is located between the light-emitting functional layer and the base substrate, and the portion of the defining structure located between adjacent sub-pixels is configured to isolate at least one layer of the light-emitting functional layer.

5. The display substrate according to claim 4, wherein: The insulating layer includes a first organic layer, a portion of the first organic layer located in the first zone is arranged between the first inorganic layer and the conductive structure, and the defining structure also includes at least one protrusion in the first organic layer that contacts the surface of the first inorganic layer, and at least part of the edge of the protrusion is retracted relative to the edge of the first inorganic layer in the defining structure.

6. The display substrate according to any one of claims 1 to 5, wherein: The conductive structure includes at least two sub-conductive structures arranged in a stacked manner. In a partial area of ​​the first zone, other organic layers are arranged between two adjacent sub-conductive structures of the at least two sub-conductive structures. In the second zone, at least parts of two adjacent sub-conductive structures of the at least two sub-conductive structures are in direct contact, or at least a second inorganic layer is arranged between the two sub-conductive structures.

7. The display substrate according to claim 5, wherein: The base substrate further includes a third area, the third area includes a partial area of ​​the non-display area, the portion of the conductive structure located in the third area includes at least one annular first isolation column, and in a direction perpendicular to the base substrate, the first isolation column does not overlap with the first organic layer; Each of the at least some of the sub-pixels further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer, wherein the first electrode is located between the light-emitting functional layer and the base substrate; At least a portion of the first zone near the third zone or at least a portion of the third zone near the first zone includes a second isolation column, the second isolation column includes a stacked structure formed by the first inorganic layer and the first organic layer, in the second isolation column, the edge of the first inorganic layer includes a first protrusion protruding relative to at least a portion of the edge of the first organic layer, the first isolation column and the second isolation column are configured to isolate at least one of the light-emitting functional layer and the second electrode.

8. The display substrate according to claim 7, wherein: The second isolation column includes a plurality of second isolation columns surrounding the center of the third region, and in at least one of the second isolation columns, the first organic layer is provided with a first groove, and the first inorganic layer includes an opening exposing the first groove; The display substrate further includes a second organic layer located on a side of the first inorganic layer away from the base substrate, and the second organic layer includes a first covering portion, and the first covering portion covers the first groove and an edge of the first inorganic layer close to the first groove.

9. The display substrate according to claim 5, wherein: The base substrate further includes a third area, the third area includes a portion of the non-display area, the third area is provided with at least one annular first isolation column, the first isolation column includes a first isolation layer and a second isolation layer stacked, and the second isolation layer is located on a side of the first isolation layer away from the base substrate; The portion of the first organic layer located in the third zone includes the first isolation layer, the portion of the first inorganic layer located in the third zone includes the second isolation layer, and the second isolation layer is protruded relative to the edge of the first isolation layer to form a second protrusion, or, a third organic layer is further arranged between the first organic layer and the base substrate, the portion of the third organic layer located in the third zone includes the first isolation layer, the portion of the first inorganic layer located in the third zone includes the second isolation layer, and the second isolation layer is protruded relative to the edge of the first isolation layer to form a second protrusion.

10. The display substrate according to claim 9, wherein: A second groove is provided on a side of the first isolation layer away from the base substrate, and the second isolation layer exposes the second groove; The display substrate further includes a second organic layer located on a side of the first inorganic layer away from the base substrate, and the second organic layer includes a second covering portion, and the second covering portion at least covers the second groove.

11. The display substrate according to claim 8 or 10, wherein: The portion of the second organic layer located in the first area also includes a pixel defining pattern, which includes a plurality of first openings and a plurality of second openings, one sub-pixel corresponds to at least one first opening, at least a portion of the light-emitting functional layer of the sub-pixel is located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode, and the second opening is configured to expose an edge of the defining structure.

12. The display substrate according to claim 4, wherein: Each of the at least some of the sub-pixels further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer, and a pixel circuit, wherein the first electrode is located between the light-emitting functional layer and the base substrate, and the first inorganic layer is located between the first electrode and the base substrate; The insulating layer includes a first organic layer, and in a partial area of ​​the first zone, the first organic layer includes a via hole, the first electrode is electrically connected to the pixel circuit through the via hole, and the first inorganic layer covers at least a portion of an inner wall of the via hole.

13. The display substrate according to claim 12, wherein: The first organic layer includes at least one protrusion in contact with the surface of the first inorganic layer in the defining structure at a position other than the via hole, the defining structure includes the protrusion, and an edge of the protrusion is retracted relative to an edge of the first inorganic layer in the defining structure.

14. The display substrate according to claim 3, further comprising: At least one circle of blocking parts surrounds the display area, and at least part of the film layer of the blocking parts is located on a side of the conductive structure away from the base substrate. Among them, the orthographic projection of the power signal line on the base substrate overlaps with the orthographic projection of the at least one circle of blocking parts on the base substrate, the portion of the power signal line located in the second zone extends along the first direction, the portion of the at least one circle of blocking parts located in the second zone includes a strip-shaped blocking part extending along the second direction, and at least the portion of the first inorganic layer located in the second zone extends along the second direction, and the first direction intersects with the second direction.

15. The display substrate according to claim 14, wherein: At least a portion of the first inorganic layer located in the second region includes at least one inorganic layer pattern, and the inorganic layer pattern covers at least a portion of an edge of the power signal line extending along the first direction.

16. The display substrate according to claim 15, wherein: The at least one inorganic layer pattern includes a plurality of inorganic layer patterns, the number of the strip-shaped barrier portions is at least one, and the strip-shaped barrier portions and the plurality of inorganic layer patterns are alternately arranged along the first direction.

17. The display substrate according to claim 16, wherein: The edge of the strip-shaped barrier portion covers the edge of the inorganic layer pattern, or the edge of the strip-shaped barrier portion is flush with at least a portion of the edge of the inorganic layer pattern.

18. The display substrate according to any one of claims 14 to 17, wherein: The base substrate comprises a fourth area, the fourth area surrounds a portion of the display area, and an orthographic projection of a portion of the power signal line located in the fourth area on the base substrate is completely located within an orthographic projection of the at least one circle of blocking portions on the base substrate.

19. The display substrate according to claim 18, wherein: In a direction perpendicular to the base substrate, a portion of the power signal line located in the fourth region does not overlap with the first inorganic layer.

20. The display substrate according to claim 18, wherein: The power signal line includes a first power signal line and a second power signal line. Only the second power signal line is arranged in the fourth area, and the first power signal line and the second power signal line are arranged in the second area.

21. The display substrate according to any one of claims 15 to 17, wherein: The display area includes a plurality of sub-pixels, and each sub-pixel in at least some of the sub-pixels includes a first electrode, a light-emitting functional layer, and a second electrode stacked in sequence, and the light-emitting functional layer includes a plurality of film layers; The display substrate comprises a defining structure, the defining structure comprises a portion of the first inorganic layer located in the first region, the defining structure is located between the light-emitting functional layer and the base substrate, and a portion of the defining structure located between adjacent sub-pixels is configured to isolate at least one layer of the light-emitting functional layer; The display substrate further includes a second organic layer located on a side of the first inorganic layer away from the base substrate, a portion of the second organic layer located in the first region includes a pixel defining pattern, the pixel defining pattern includes a plurality of first openings, one sub-pixel corresponds to at least one first opening, at least a portion of the light-emitting functional layer of the sub-pixel is located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode, The portion of the second organic layer located in the second region includes a film layer of the barrier portion.

22. The display substrate according to claim 21, wherein: The insulating layer includes a first organic layer, a portion of the first organic layer located in the second zone includes a first film layer of the blocking part, a portion of the second organic layer located in the second zone includes a second film layer of the blocking part, the second film layer is located on a side of the first film layer away from the base substrate, and in a direction perpendicular to the base substrate, a portion where the inorganic layer pattern overlaps with the blocking part is located between the first film layer and the second film layer.

23. The display substrate according to claim 16, wherein: At least one of the multiple inorganic layer patterns includes a main body portion extending along the second direction and a widened portion located on at least one side of the main body portion in the first direction, in the second direction, the length of the widened portion is smaller than the length of the main body portion, in the first direction, the width of the widened portion is smaller than the size of the blocking portion, and the widened portion covers the edge of the power signal line extending along the second direction.

24. The display substrate according to claim 8, further comprising: an encapsulation layer, located on a side of the second organic layer away from the base substrate, At least a portion of the edge of the first protrusion in the second isolation column closest to the center of the third region is covered by the second organic layer, and at least a portion of the edge of the second organic layer is covered by the encapsulation layer.

25. The display substrate according to claim 22, further comprising: an encapsulation layer, located on a side of the second organic layer away from the base substrate, Among the portions of the first organic layer covered by the first inorganic layer, the portion farthest from the edge of the first region and protruding relative to the edge of the first organic layer is covered by the second organic layer, and the encapsulation layer covers at least a portion of the edge of the second organic layer.

26. The display substrate according to claim 24 or 25, wherein: The first inorganic layer includes a plurality of gaps exposing the first organic layer, and the second organic layer fills the plurality of gaps.

27. The display substrate according to claim 1, wherein: The base substrate includes a bending area, the insulating layer includes a first organic layer, the display substrate further includes a second organic layer, the second organic layer is located on a side of the first inorganic layer away from the conductive structure, and the conductive structure, the first inorganic layer, the first organic layer and the second organic layer are all configured to be bendable. The portion of the first inorganic layer located in the bending zone includes an opening, the portion of the first organic layer located in the bending zone includes a third groove, and the second organic layer fills the opening and the third groove.

28. A display substrate, comprising: A substrate base plate, comprising a first sub-region and a second sub-region; A first inorganic layer is located in the first sub-region and the second sub-region of the base substrate; A first organic layer is located between the film layer where the first inorganic layer is located and the base substrate; A second organic layer is located on a side of the film layer where the first inorganic layer is located away from the substrate; A conductive structure, located between the film layer where the first inorganic layer is located and the base substrate; The portion of the first inorganic layer located in the first sub-area contacts the first organic layer, the portion of the first inorganic layer located in the second sub-area contacts the conductive structure, and in the first sub-area, at least a portion of the edge of the first organic layer covered by the first inorganic layer is covered by the second organic layer.

29. The display substrate according to claim 28, wherein: The base substrate further includes a third sub-area, the first sub-area includes a partial area of ​​the non-display area, the second sub-area includes a partial area of ​​the non-display area, and the third sub-area includes a partial area of ​​the display area; The display area includes a plurality of sub-pixels, each of at least some of the sub-pixels includes a light-emitting functional layer, and the light-emitting functional layer includes a plurality of film layers; The display substrate includes a defining structure, the defining structure includes a portion of the first inorganic layer located in the third sub-area, the defining structure is located between the light-emitting functional layer and the base substrate, and the portion of the defining structure located between adjacent sub-pixels is configured to isolate at least one layer of the light-emitting functional layer.

30. The display substrate according to claim 29, wherein: Each of the at least some of the sub-pixels further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer, wherein the first electrode is located between the light-emitting functional layer and the base substrate; The portion of the second organic layer located in the third sub-area includes a pixel defining pattern, which is located on the side of the first electrode away from the base substrate. The pixel defining pattern includes a plurality of first openings and a plurality of second openings. One sub-pixel corresponds to at least one first opening. At least a portion of the light-emitting functional layer of the sub-pixel is located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode, and the second opening is configured to expose an edge of the defining structure.

31. The display substrate according to any one of claims 28 to 30, wherein: The portion of the first organic layer located in the first sub-region includes a groove, the portion of the first inorganic layer located in the first sub-region includes an opening exposing at least part of the groove, and the portion of the second organic layer located in the first sub-region fills the opening and the groove.

32. The display substrate according to claim 28, wherein: The base substrate further includes a third sub-area, the first sub-area includes a partial area of ​​the non-display area, the second sub-area includes a partial area of ​​the non-display area, and the third sub-area includes a partial area of ​​the display area. The display area includes a plurality of sub-pixels, at least some of which each include a light-emitting function. an energy layer, and a first electrode and a second electrode located on both sides of the light-emitting functional layer, wherein the first electrode is located between the light-emitting functional layer and the base substrate; The non-display area includes at least one annular first isolation column, the first isolation column includes a first isolation layer and a second isolation layer stacked, the first isolation layer is located between the second isolation layer and the base substrate, and the second isolation layer protrudes relative to the edge of the first isolation layer to isolate the light-emitting functional layer and the second electrode; A portion of the second organic layer located in the non-display area includes the first isolation layer, and a portion of the first inorganic layer located in the non-display area includes the second isolation layer.

33. The display substrate according to claim 32, wherein: A first sub-groove is provided on a side of the first isolation layer away from the base substrate, and the second isolation layer exposes the first sub-groove; A portion of the second organic layer located in the non-display area covers the first sub-groove and an edge of the second isolation layer close to the first sub-groove.

34. The display substrate according to claim 32 or 33, wherein: The display substrate is provided with at least one second isolation column, the second isolation column is located on a side of the first isolation column away from the center of the portion of the non-display area surrounded by the first isolation column, the second isolation column comprises a third isolation layer and a fourth isolation layer stacked, the third isolation layer is located between the fourth isolation layer and the base substrate, and the edge of the fourth isolation layer protrudes relative to the edge of the third isolation layer to isolate at least one of the light-emitting functional layer and the second electrode; A distance between at least a portion of the fourth isolation layer and the base substrate is greater than a distance between the second isolation layer and the base substrate.

35. The display substrate according to claim 34, wherein: A second sub-groove is provided on a side of the third isolation layer away from the base substrate, and the fourth isolation layer exposes the second sub-groove; The second organic layer covers the second sub-groove and an edge of the fourth isolation layer close to the second sub-groove.

36. A display substrate, comprising: A substrate, comprising a display area and a non-display area surrounding the display area; An inorganic layer, located in the display area and the non-display area on the base substrate; A conductive structure, located between the inorganic layer and the substrate, the conductive structure comprising a power signal line; At least one circle of blocking parts is located in the non-display area and surrounds the display area, and at least a part of the film layer of the blocking parts is located on a side of the conductive structure away from the base substrate. Among them, the non-display area includes a first non-display area located on one side of the display area, the power signal line is located in the first non-display area and extends in a first direction, the blocking portion is located in the first non-display area and includes a strip blocking portion extending in a second direction and overlapping with the power signal line, the inorganic layer is located in the first non-display area and includes an inorganic layer pattern extending in the second direction, and an edge of the strip blocking portion overlaps with at least a portion of an edge of the inorganic layer pattern along a direction perpendicular to the base substrate.

37. The display substrate according to claim 36, wherein: The non-display area includes a second non-display area surrounding the display area, and the orthographic projection of a portion of the power signal line located in the second non-display area on the base substrate is completely located within the orthographic projection of the at least one circle of blocking portions on the base substrate.

38. The display substrate according to claim 37, wherein: In a direction perpendicular to the base substrate, a portion of the power signal line located in the second non-display area does not overlap with the inorganic layer.

39. The display substrate according to claim 37, wherein: The power signal line includes a first power signal line and a second power signal line. Only the second power signal line is arranged in the second non-display area. The first non-display area includes the first power signal line and the second power signal line.

40. The display substrate according to any one of claims 36 to 39, wherein: The at least one inorganic layer pattern includes a plurality of inorganic layer patterns, the number of the strip-shaped barrier portions is at least one, and the strip-shaped barrier portions and the plurality of inorganic layer patterns are alternately arranged along the first direction.

41. The display substrate according to any one of claims 36 to 40, wherein: The inorganic layer pattern covers an edge of the power signal line extending along the first direction.

42. The display substrate according to claim 40, further comprising: A first organic layer is located between the inorganic layer and the base substrate, wherein a portion of the first organic layer located in the display area includes a planar layer, The portion of the first organic layer located in the non-display area includes the first film layer of the blocking portion, and the portion of the inorganic layer overlapping with the blocking portion in a direction perpendicular to the base substrate covers at least a portion of an edge of the first film layer.

43. The display substrate according to claim 42, further comprising: The second organic layer is located on a side of the inorganic layer away from the substrate. The portion of the second organic layer located in the non-display area includes the second film layer of the blocking portion, the second film layer is located on a side of the first film layer away from the base substrate, and in a direction perpendicular to the base substrate, the portion where the inorganic layer pattern overlaps with the blocking portion is located on the first film layer. layer and the second film layer.

44. The display substrate according to claim 43, further comprising: an encapsulation layer, located on a side of the second organic layer away from the base substrate, The encapsulation layer includes a portion in contact with the barrier portion and a portion in contact with the inorganic layer.

45. A display device comprising the display substrate according to any one of claims 1 to 44.

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