Film formation device and film formation method

WO2026063019A1PCT designated stage Publication Date: 2026-03-26KK TOSHIBA
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-07-08
Publication Date
2026-03-26

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  • Figure JP2025024543_26032026_PF_FP_ABST
    Figure JP2025024543_26032026_PF_FP_ABST
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Abstract

This film formation device of one embodiment comprises a conveyance unit and a discharge nozzle. Conveyance rolls comprise a conveyance roll capable of supporting a base material. The conveyance roll comprises a position adjustment roll for adjusting the position of the base material being conveyed in a state in which the entire width of the base material falls within a prescribed range. In the discharge nozzle, a discharge port is positioned on the outer side in the width direction of the base material with respect to the prescribed range, and the discharge nozzle applies a raw material liquid to the surface of the base material by discharging the raw material liquid from the discharge port toward the base material that is being conveyed in a state where the entire width thereof falls within the prescribed range.
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Citation Information

Patent Citations

  • Application device

    JP2019166425A

  • EMI shielding structure and manufacturing method for the same

    KR1020180067047A