Film formation device and film formation method
WO2026063019A1PCT designated stage Publication Date: 2026-03-26KK TOSHIBA
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-07-08
- Publication Date
- 2026-03-26
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Figure JP2025024543_26032026_PF_FP_ABST
Abstract
This film formation device of one embodiment comprises a conveyance unit and a discharge nozzle. Conveyance rolls comprise a conveyance roll capable of supporting a base material. The conveyance roll comprises a position adjustment roll for adjusting the position of the base material being conveyed in a state in which the entire width of the base material falls within a prescribed range. In the discharge nozzle, a discharge port is positioned on the outer side in the width direction of the base material with respect to the prescribed range, and the discharge nozzle applies a raw material liquid to the surface of the base material by discharging the raw material liquid from the discharge port toward the base material that is being conveyed in a state where the entire width thereof falls within the prescribed range.
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Citation Information
Patent Citations
Application device
JP2019166425A
EMI shielding structure and manufacturing method for the same
KR1020180067047A