Substrate processing system and inspection method
The substrate processing system addresses the challenge of acquiring wide-range images by moving cameras to capture overlapping images, enabling comprehensive inspection and evaluation of substrate support components.
WO2026126856A1PCT designated stage Publication Date: 2026-06-18TOKYO ELECTRON LTD
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- TOKYO ELECTRON LTD
- Filing Date
- 2025-12-01
- Publication Date
- 2026-06-18
Smart Images
Figure JP2025041863_18062026_PF_FP_ABST
Abstract
Disclosed is a substrate processing system comprising a chamber, a module, and a control circuit. The module has at least one camera. The control circuit is configured to generate a panoramic image of an inspection target within a processing space. The control circuit is configured to control the module so as to move the at least one camera to the processing space. The control circuit is configured to control the module so as to acquire a first image of a first range and a second image of a second range from the at least one camera. The control circuit is configured to generate the panoramic image from the first image and the second image by using, as a reference, a feature pattern common to the first image and the second image.
Need to check novelty before this filing date? Find Prior Art