Adjustment of micro and NANO photonic resonators by thermally activated local chemical etching triggered by resonant light

WO2026131538A1PCT designated stage Publication Date: 2026-06-25UNIV PARIS CITE +1

Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
UNIV PARIS CITE
Filing Date
2025-12-12
Publication Date
2026-06-25

AI Technical Summary

Technical Problem

Existing methods for tuning photonic microresonators suffer from precision issues, requiring high vacuum, cryogenic temperatures, material degradation, or lack of selectivity, making them impractical for industrial applications.

Method used

A method involving thermo-activated local chemical etching using a highly dilute etching fluid and resonant light to adjust the resonance wavelength of photonic resonators, allowing precise and selective tuning of multiple resonators simultaneously.

Benefits of technology

Achieves precise, permanent, and cost-effective tuning of photonic resonators with minimal dispersion, enabling high-quality factor resonators to be synchronized and manufactured at a low cost with atomic precision.

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Abstract

The invention relates to a method for tuning a resonant wavelength of at least one photonic resonator, the resonator being a micro or nano photonic resonator, the resonator having dimensions defining a resonant wavelength, the resonator being placed in a fluid, the method comprising a step of injecting light into the resonator placed in the fluid, the injected light having a wavelength equal to the resonant wavelength of the resonator, so that the injected light resonates inside the resonator, the method being characterized in that the fluid in which the resonator is placed is a highly diluted chemical etchant, the injected light thermally activating the chemical etching of the resonator.
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