A quick exchange embossing system with an open frame structure for frontal loading and corresponding method

WO2026133090A1PCT designated stage Publication Date: 2026-06-25BOEGLI GRAVURES SA

Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
BOEGLI GRAVURES SA
Filing Date
2025-12-15
Publication Date
2026-06-25

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  • Figure IB2025062892_25062026_PF_FP_ABST
    Figure IB2025062892_25062026_PF_FP_ABST
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Abstract

An embossing system comprising an open frame structure. The open frame structure comprises a first side structure which is longitudinally shaped, as a first arm of a U-shape, a second side structure which is longitudinally shaped, as a second arm of the U-shape, and positioned opposite to the first side structure, as the first and second arms of the U-shape, a bottom structure configured to connect the first and the second side structures at a first of their respective extremities of their longitudinal shapes, as a bottom of the U-shape, and a frontal opening of the open frame structure defined by the first and the second side structures at a second one of their respective extremities opposite to the first extremity, as an opening of the U-shape. The embossing system further comprises a first embossing roller, and a second embossing roller, a first fixture configured for removably housing the first embossing roller and a second fixture configured for removably housing the second embossing roller, the first side structure and the second side structure respectively comprising a first seat and a second seat configured to receive and removably mount respectively the first fixture and the second fixture, the frontal opening being configured to enable a frontal access to an inner-frame space that is located between the first embossing roller and the second embossing roller, and is further delimited by the bottom structure. The first embossing roller comprises first embossing structures and the second embossing roller comprises second embossing structures, each one of the second embossing structures corresponding to one of the first embossing structures, which is inversely congruent to the one of the second embossing structures. The embossing system further comprises roller gap adjustment means configured to apply forces between the first and the second embossing roller to variably adjust a roller distance that separates the first embossing roller from the second embossing roller, thereby varying the inner-frame space, anti-deformation means configured to prevent a deformation of the open frame structure, and preserve an adjusted roller distance; and synchronizing means configured to radially position a number of the first embossing structures in front of corresponding second embossing structures at a time of engaging the first and the second embossing rollers with the roller gap adjustment means, in an embossing position for an embossing.
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