Feed apparatuses for applyng a product to fragments of material and related methods

Abstract

Feed apparatuses for applying a product to fragments material and related methods are disclosed herein. An example feed apparatus is configured facilitate heap leaching of base metal sulfidic materials such as primary copper sulphides, including fragments of material that contain chalcopyrite (CuFeS2), and related methods.

Description

[0001] FEED APPARATUSES FOR APPLYNG A PRODUCT TO FRAGMENTS OF MATERIAL AND RELATED METHODS

[0002] TECHNICAL FIELD

[0003] Feed apparatuses for applying a product to fragments material and related methods are disclosed herein. An example feed apparatus is configured facilitate heap leaching of base metal sulfidic materials such as primary7copper sulphides, including fragments of material that contain chalcopyrite (CuFeS2), and related methods.

[0004] BACKGROUND

[0005] In conventional heap leaching of base metal sulfide containing minerals, mined material is stacked into heaps, aerated through direct injection of air via aeration pipes extending into the heap and / or by natural convection through exposed areas of the heap, and irrigated with an acidic solution for extraction of the base metal into solution.

[0006] The base metal is subsequently recovered from the acidic solution by a range of recovery options including solvent extraction and el ectrowinning (SX / EW), cementation onto more active metals such as iron, hydrogen reduction, and direct electrowinning. The acidic solution is regenerated and recycled through the heap to leach more base metal from the material in the heap. The material in the heap may comprise agglomerates of fragments of material formed in an agglomeration step.

[0007] Leaching may be assisted by the use of microorganisms.

[0008] Generally, heap and dump leaching (hereinafter collectively referred to as “heap leaching’7) provide lower metal recoveries than other metallurgical process options for recovering base metal from base metal-containing material, such as milling and flotation that produces base metal -containing concentrates that are then smelted to produce the relevant base metal.

[0009] Consequently, heap leaching tends to be reserved for lower grade material types that have at least a proportion of readily recoverable base metal, but where processing costs per unit of base metal are too high to support a concentrator process or where mineral liberation and other characteristics (e.g. arsenic content) will not support production of directly useable or saleable concentrates.

[0010] Standard best industry7practice is to use agglomerates of mined and thereafter crushed material fragments in heaps. Typically, the mined material is processed through multiple crushing steps, namely primary and secondary crushing steps, and in some instances tertiary crushing steps, and the crushed material fragments are agglomerated in an agglomeration step, typically with the use of an acidic solution.

[0011] Agglomeration is used to bind fine particles to coarse ones to increase the permeability of a material heap while acidic solution curing inhibits the dissolution of some silicates and accelerates base metal extraction.

[0012] Any discussion of documents, acts, materials, devices, articles or the like which has been included in the present specification is solely for the purpose of providing a context for the present disclosure. It is not to be taken as an admission that any or all of these matters form part of the prior art or were common general knowledge in the field relevant to the present disclosure as it existed before the priority date of each claim of this application.

[0013] SUMMARY

[0014] Feed apparatuses for applying a product to fragments material and related methods are disclosed herein. In an embodiment, a feed apparatus is disclosed. The feed apparatus includes an inlet adapted to receive fragments of material, an outlet downstream from the inlet, and at least one applicator located between the inlet and the outlet. The at least one applicator is configured to apply a product to the fragments of material as the fragments of material move between the inlet and the outlet to thereby form treated fragments of material.

[0015] In an embodiment, a method of leaching a base metal material is disclosed. The method includes applying a product to fragments of material in a feed apparatus to form treated fragments of material, forming agglomerates from the treated fragments of material, and leaching the agglomerates with a suitable leach liquor.

[0016] In an embodiment, a method of applying a product to fragments of material is disclosed. The method includes applying a product to the fragments of material in a feed apparatus to form treated fragments of the material and delivering the treated fragments of the material for further processing.

[0017] BRIEF DESCRIPTION OF THE DRAWINGS

[0018] To assist in understanding the present and to enable a person skilled in the art to put the methods and feed apparatuses disclosed herein into practical effect, preferred embodiments will be described by way of example only with reference to the accompanying drawings, wherein: FIG. 1 shows a schematic flowchart of a method of leaching base metal material, according to an embodiment.

[0019] FIG. 2 shows a cross-sectional side view of an embodiment of the feed apparatus, shown schematically in FIG. 1, according to an embodiment.

[0020] FIG. 3 shows an end view of the feed apparatus show n in FIG. 2.

[0021] FIG. 4 shows a cross-sectional top view of the feed apparatus through section line A shown in FIG. 2.

[0022] DETAILED DESCRIPTION

[0023] Feed apparatuses for applying a product to fragments material and related methods are disclosed herein. An example feed apparatus is configured facilitate heap leaching of base metal sulfidic materials such as primary copper sulphides, including fragments of material that contain chalcopyrite (CuFeS2), and related methods. It is noted that the apparatuses and methods disclosed herein are similarly applicable to leaching of base metal materials other than or in addition to chalcopyrite, such as other types of copper sulfides, other ty pes of copper, nickel, zinc, any other suitable base metal materials, or combinations of any of the foregoing. A reference to fragments of material or material herein is a reference to a material containing ores and waste. In certain embodiments, the methods and apparatuses disclosed herein are directed to treating fragments of material with a product in applications not concerned with leaching of a base metal.

[0024] FIG. 1 shows a schematic flowchart of a method 1000 of leaching base metal material, according to an embodiment.

[0025] Base metal material, which in the embodiment described is in the form of fragments of material 1001, are transferred to a feed apparatus 1100. Feed apparatus 1100 is discussed in greater detail below. In an embodiment, the fragments of material 1001 includes at least one copper sulfide, such as chalcopyrite.

[0026] The embodiments disclosed herein primarily disclose the fragments of material 1001 as including chalcopyrite. However, it is noted that the fragments of material 1001 disclosed herein may include one or more base metal materials other than or in addition to chalcopyrite. In an embodiment, the base metal material may include at least one of metal oxides, metal carbonates, metal hydroxy chlorides, metal hydroxysilicates, native metals (e.g. , copper), simple metal oxides, metal sulfides, metal sulfates, metal supergene sulfides or metal hypogene sulfides. In a particular example, the base metal material may include at least one of copper carbonates e.g., azurite (2CuCO3 Cu(0H)2) or malachite (CuCCh Cu(0H)2), copper hydroxy chlorides (e.g., atacamite (CU2C1(OH)2)), copper hydroxy silicates (e.g, chrysocolla (CuO SiO2 2H2O)), native copper (Cu), basic copper oxides (e.g., cuprite (CmO) or tenorite (CuO)), copper sulfates (e.g, antlerite (CuSO4-2Cu(OH)2) brochantite (CUSO4- 3CU(OH)2)). copper supergrene sulfides (e.g, chalcocite (CmS), covellite (CuS), or bornite (Cu?FeS4)), copper hypogene sulfides (e.g, chalcopyrite (CuFeS2). enargite (CU3ASS4), or pyrite (FeS2)). It is noted that pyrite is included as a copper hypogene sulfide since it is often present in copper minerals that include copper sulfides and / or facilitates leaching of copper sulfides (e.g, is a source ofFe2+. Fe?+, andH2SO4). In an embodiment, the base metal material may include at least one of iron (e.g, iron oxides, such as magnetite, hematite, goethite, limonite, or siderite), bauxite, other aluminum ores, manganese ores (e.g, manganese oxides, manganese carbonates, or manganese silicates), chromium ores (e.g, chromite), coal, gold ores, other precious metals ores, lithium ores (e.g. , spodumene, petalite, lepidolite, or amblygonite), nickel ores (e g, laterites or magmatic sulfide deposits), lead ores (e.g, galena, cerussite, or anglesite), uranium ores, zinc ores, molybdenum ores, phosphate ores, magnesium ores, silica, or titanium ores.

[0027] As is known in the art, the fragments of material 1001 may have previously been crushed to a suitable particle size distribution.

[0028] In the embodiment, the method 1000 also includes the step of applying a product 1004 to the fragments of material 1001 in a feed apparatus 1100 to form treated fragments of material 1002. In an embodiment, the product includes solubilized silver. In such an embodiment, the step of applying solubilized silver involves, in the embodiment described, application of solubilized silver as a solution in a fine mist or spray, or as solid particles in an aerosol. The solubilized silver may include, for example, metallic silver dissolved in an acid or silver salts dissolved in water or another solvent (e.g, silver nitrate dissolved in waler). This step is discussed in greater detail below'.

[0029] When the product 1004 includes silver, the silver may be present in a solvent or liquid component. The concentration of the silver in the solvent or liquid component may be about 0.05 g / L to about 2 g / L, such as about 0.05 g / L to about 0.1 g / L, about 0.075 g / L to about 0.15 g / L, about 0.1 g / L to about 0.2 g / L, about 0.15 g / L to about 0.3 g / L, about 0.2 g / L to about 0.4 g / L, about 0.3 g / L to about 0.5 g / L, about 0.4 g / L to about 0.6 g / L, about 0.5 g / L to about 0.7 g / L, about 0.6 g / L to about 0.8 g / L, about 0.7 g / L to about 0.9 g / L, about 0.8 g / L to about 1 g / L, about 0.9 g / L to about 1.25 g / L, about 1 g / L to about 1.5 g / L, about 1.25 g / L to about 1.75 g / L, or about 1.5 g / L to about 2 g / L. The amount of silver that may be provided to the feed apparatus 1100 may be selected to cause the silver to form 1x10’5weight % to about IxlO’3weight percent of the treated fragments of material 1002, such as about 2x10'5weight percent to about 5x1 O'4weight percent.

[0030] The embodiments disclosed herein primarily disclose that the product 1004 includes silver. However, it is noted that the product 1004 disclosed herein may include one or more products other than or in addition to silver. In an embodiment, the product 1004 may include pyrite, an acidic or leaching solution, moisture (e.g., water), one or more microorganisms, magnesia, calcium oxide (CaCh), cement, oxy gen-containing material, a binder, a pH buffer, a basic solution, or any other product that may be applied to the fragments of material 1001.

[0031] In an embodiment, the treated fragments of material 1002 is then delivered from the feed apparatus 1100 to an agglomerator 1200. Also fed into the agglomerator 1200 are feed materials 1005. In the embodiment, feed materials 1005 are in the form of an acidic solution. Preferably, the acidic solution is a sulfuric acid solution although any suitable acidic solution at any suitable concentration may be employed. In an embodiment, the treated fragments of material 1002 from the feed apparatus 1100 is directly stacked into a pile and leached or is further processed without providing the treated fragments of material 1002 to the agglomerator 1200.

[0032] In some embodiments, the feed materials also include microorganisms.

[0033] The agglomerator 1200 of the embodiment is of any suitable construction including a disc pelletizer, a rotary drum, a pin mixer, a pugmill mixer or the like. The agglomerator 1200 forms agglomerates 1003 from the treated fragments of material 1002 and the feed material 1005.

[0034] The agglomerator 1200 outputs the agglomerates 1003, which are then used in the construction of heap 1300. In an embodiment, at least one of copper in the chalcopyrite, other copper-containing minerals, or other metal-containing minerals in the agglomerates 1003 are leached from the agglomerates 1003 in the heap 1300 viathe supply of a suitable leach liquor 1006. The leached metal is then recovered from the leach liquor in downstream metal recovery steps (e.g., as is known in the art) and the metal barren leach liquor 1006 regenerated and recycled to the heap 1300.

[0035] The agglomerates 1003 produced in the agglomerator 1200 are, in the embodiment, transferred directly to a construction site ready to be deployed to the heap 1300. In alternative embodiments, the agglomerates 1003 may be stockpiled and used as required for heap 1300.

[0036] The embodiment of the method of leaching material containing chalcopyrite 1000 according as shown in FIG. 1 is suitable for forming agglomerates 1003 that can be used in standard heaps.

[0037] Examples of the heap 1300 are disclosed in international publication WO2012 / 031317 filed on September 6, 2010, the disclosure of which is incorporated herein, in its entirety, by this reference.

[0038] It has been found that adding solubilized silver as a solution in a fine mist or spray, or as solid particles in an aerosol as part of the agglomeration step provides significant improvement in the leaching process by making it possible to achieve higher levels of extraction of copper than traditional leaching methods used on material containing chalcopyrite and other material containing other copper-bearing minerals. This is described in international publication W02017 / 070747 filed October 30, 2015, the disclosure of which is incorporated herein, in its entirety, by this reference.

[0039] FIG. 2 shows a cross-sectional side view of an embodiment of the feed apparatus 1100. shown schematically in FIG. 1, according to an embodiment. The feed apparatus 1100 is in the form of an agglomerator feed apparatus. It will be appreciated that in other embodiments, the feed apparatus 1100 may be employed as a feed apparatus for other processing or treatment applications other than as a feed apparatus for an agglomerator.

[0040] FIG. 3 shows an end view of the feed apparatus 1100 shown in FIG. 2 and FIG. 4 shows a cross-sectional top view of the feed apparatus 1100 through section line A shown in FIG. 2

[0041] Also shown in FIG. 2 and FIG. 3 is a fragment delivery device 1400 and conveyor 1500.

[0042] The fragment delivery device 1400 is adapted to deliver fragments of material 1001 containing chalcopyrite to the feed apparatus 1 100 and comprises a feed conveyor 1410, a hood structure 1420, and components of an auto sampler in the form of a cutter 1430 and a cutter box 1440.

[0043] The hood structure 1420 defines an inlet 1421 and an outlet 1422 and a contained inner space 1423 between the inlet 1421 and the outlet 1422. The outlet 1422 is shaped and dimensioned to be mounted to feed apparatus 1100 as discussed in greater detail below.

[0044] The feed conveyor 1410 delivers fragments of material 1001 (e.g., containing chalcopyrite) through inlet 1421 into contained inner space 1423 of hood structure 1420. The fragments of material 1001 are then transferred from the feed conveyor 1410, through cutter box 1440, and exit the hood structure 1420 of fragment delivery device 1400 through outlet 1422.

[0045] In the embodiment, the fragments of material 1001 are transferred from the feed conveyor 1410 to the outlet 1422 through the contained inner space 1423 of hood structure 1420 under the force of gravity.

[0046] In other embodiments, such movement may occur through other devices, such as mechanical devices, electrical devices, pressure devices, and the like.

[0047] The cutter box 1440 is configured to store samples of the fragments of material 10 1 passing therethrough that are collected by the cutter 1430. These samples may be collected for analysis.

[0048] The feed apparatus 1100 is adapted to receiv e the fragments of material 1001 exiting the outlet 1422 of the fragment delivery device 1400.

[0049] The feed apparatus 1 100 defines an inlet 1110 adapted to receive the fragments of material 1001 from the outlet 1422 of fragment delivery device 1400. The feed apparatus 1100 also defines an outlet 1120 downstream from the inlet 1110 (e.g., at a distal end of the feed apparatus 1100 opposite the inlet 1110).

[0050] In the embodiment, as shown, the feed apparatus 1100 has a generally rectangular cross-sectional shape defined by walls 1101 forming a rectangular chute. The feed apparatus 1100 may exhibit other cross-sectional shapes, such as a square, circular or the like.

[0051] The feed apparatus 1100 may be configured so that, other than opening at inlet 1110 and outlet 1120, the feed apparatus 1100 is otherwise closed by walls 1101.

[0052] The feed apparatus 1100 may defines a cavity 1 102 between the walls 1101 thereof. As previously discussed, inlet 1110 of feed apparatus 1100 is sized and shaped to receive and mount the outlet 1422 of the feed apparatus 1100.

[0053] In the embodiment, the fragments of material 1001 travel through the cavity 1102 of the feed apparatus 1100 in a direction from the inlet 1110 to the outlet 1120 under the force of gravity.

[0054] In other embodiments, the feed apparatus 1100 may include one or more devices, such as mechanical devices, electrical devices, pressure devices, and the like that cause direction of travel of the fragments of material 1001 to in a direction other than downwards relative to the force of gravity.

[0055] The feed apparatus 1100 also has one or more applicators 1131 and one or more interference members 1132. In an embodiment, as shown, the feed apparatus 1100 has two applicators 1131 and three interference members 1132 located within cavity 1102 between the inlet 1110 and outlet 1120. In an embodiment, the feed apparatus 1100 includes a single applicator 1131 or three or more applicators 1131. In an embodiment, the feed apparatus 1100 includes one, two, or four or more inference members 1132.

[0056] The interference members 1132 are plates, shelves, or other obstructions that are at least partially positioned within the cavity’ 1102. For example, the interference members 1132 may extend from the walls 1101 of the feed apparatus 1100 and be at least partially positioned in the flow path of the fragments of material 1001. As such, the interference members 1132 facilitate mixing of the fragments of material 1001. Such mixing of the fragments of material 1001 may cause the product 1004 to mix with the fragments of material 1001 and cause more of the fragments of material 1001 to be exposed to the product 1004 dispensed from the applicators 1131, each of which causes the product 1004 to be more uniformly dispensed in the fragments of material 1001. The interference members 1131 may also protect the applicators 1131 from w ear caused by the fragments of material 1001 flowing through the cavity 1102 when the applicators 1 131 are positioned below the interference members 1131 relative to the flow7of the fragments of material 1131 through the cavity 1102.

[0057] Each interference member 1132 extends from a respective wall 1101 of the feed apparatus 1100 at least partially into the cavity71 102. In an embodiment, when the feed apparatus 1100 includes a plurality of interference members 1132, at least tw o of the interference members 1132 are spaced from one another in the direction of travel of the fragments of material 1001 within the cavity 1102 and extend partially into the cavity 1102 from respective wall 1101.

[0058] In the embodiment, a third interference member 1132 extends at least partially into the cavity7from a wall 1101 opposed to the wall from which the first two interference members 1132 are located. The third interference member 1132 is located so as to be spaced from the first two interference members 1132 in the direction of travel of the fragments of material 1001 within the cavity 1 102. In the embodiment, this third interference member 1132 is located so that it is spaced between the first two interference members in a direction of travel of the fragments of material 1001 within the cavity 1102.

[0059] Each of the interference members 1132 are angled in the direction of travel of the fragments of material 1001 within the cavity 1102 as each extends at least partially from its respective wall 1101. In the embodiment, each interference member 1132 extends at least partially into the cavity 1102 and is angled downwardly.

[0060] The interference members 1132 are planar in shape in the embodiment and extend across the entire extent of the respective wall 1101 from which each extends. In other embodiments, the interference members 1132 may be of any suitable shape and may extend from only a single wall (for example in embodiments where the feed apparatus 1100 has a circular cross-sectional shape) providing that they function to partially interrupt the movement of the fragments of material 1001 as they travel of within the cavity 1102 from the inlet 1110 to the outlet 1120.

[0061] This interruption occurs by way of contact, or operative contact, wi th the fragments of material 1001 as will be discussed below.

[0062] In the embodiment, each interference member 1132 extends at least partially into the cavity 1102 and is angled downward at an angle to the horizontal. In an example, the angle to the horizontal may be about 0° to about 35°, such as in ranges of about greater than 0° to about 35° or about 5° to about 20°. The angle to the horizontal may be selected based on the particle size, the moisture content, and the mineralogy of the fragments of material 1001. It is noted that other angles may be selected which facilitate the collection of the fragments of material 1001 on the surface of each interference member 1 132 whilst also allowing the movement of the fragments of material 1001 as they travel within the cavity 1102 from the inlet 1110 to the outlet 1120.

[0063] Each of the one or more applicators 1131 extends from at least one wall 1101 into the cavity 1102. The applicators 1131 may include any device that is configured to dispense the product 1004 into the cavity 1102. In an embodiment, at least one of the one or more applicators 1131 may be in the form of a spray applicator configured to eject a mist or spray of the product 1004 (e.g., solubilized silver) in a solution into the path of the fragments of material 1001 as they travel within the cavity 1 102 from the inlet 1 1 10 to the outlet 1120 to thereby apply the product 1004 to the fragments of material 1001 moving between the inlet 1110 and the outlet 1129 to form treated fragments of material 1002. In other words, in such an embodiment, the applicators 1131 may include a nozzle that is configured to spray the product 1004 into the cavity 1102. In an embodiment, at least one of the one or more applicators 1131 is in the form of an aerosol generating apparatus configured to eject the product 1004 (e.g., silver) as solid or liquid particles in an aerosol into the path of the fragments of material 1001 as they travel within the cavity 1102 from the inlet 1110 to the outlet 1120. In an embodiment, at least one of the one or more applicators 1131 may include hose configured to emit a j et or stream of the product 1004, a fan or air source configured to blow a solid or liquid product into the cavity 1102, or any other suitable device.

[0064] As previously discussed, at least one of the one or more applicators 1132 may be configured to also apply products other than silver to the fragments of material 1001 such as an acidic solution, microorganisms, or any other produce disclosed herein.

[0065] In an embodiment, at least one of the one or more applicators 1131 is located below and proximal to a respective interference member 1132 so as to protect each applicator 1131 from impact damage as a result of movement of the fragments of material 1001 as they travel within the cavity 1102 from the inlet 1 110 to the outlet 1120.

[0066] As previously mentioned, in other embodiments the movement of the fragments of material 1001 within the cavity 1102 from the inlet 1110 to the outlet 1120 is driven by forces other than the downward force of gravity (e.g., mechanical, pressure and the like) and in those embodiments, at least one of the one or more applicators 1131 is located downstream from and proximal to a respective interference member 1132 with respect to the direction of movement of the fragments of material 1001. In use, the embodiment of the feed apparatus 1100 as described herein is configured to apply a product 1004 (e.g.. in the form of a solubilized silver) to the fragments of material 1001 (e.g. , containing chalcopyrite) in the feed apparatus 1100 to form treated fragments of material 1002.

[0067] As the fragments of material 1001 travel within the cavity71102 from the inlet 1110 to the outlet 1120 they contact each successive interference member 1132 which causes interruption of movement and separation of each fragment from adjacent fragments. Those fragments then are treated with the product 1004 as the fragments of material 1001 pass through the product 1004 (e.g., solubilized silver solution spray) ejected from a respective applicator 1132.

[0068] The fragments of material 1001 collect on an upstream surface of each interference member 1132 in use as shown in FIG. 2 and hence contact of the stream of fragments with each interference member 1132 is operative contact. This operative contact acts to shield each interference member 1132 from the direct impact from the fragments of the material 1001 actively flowing through the cavity 1102 to reduce wear on each interference member. In an embodiment, as shown, at least one of the one or more interference members 1132 may include a barrier 1133 at an edge of the upstream surface of the interference member 1132. The barrier 1133 may cause some of the fragments of material 1001 to collect on the interference member 1132.

[0069] The treated fragments of material 1002 then exit the feed apparatus 1100 through outlet 1120. In the embodiment described with reference to the figures, the conveyor 1500 then delivers the treated fragments of material 1002 to an agglomerator (not shown) to form agglomerates from the treated fragments of material 1002. As previously discussed, the agglomerates are then subjected to aheap leaching process with a suitable liquor.

[0070] As previously discussed, in an embodiment shown in FIGS. 2-4, the feed apparatus 1100 is in the form of an agglomerator feed apparatus. It will be appreciated that in other embodiments, the feed apparatus 1100 may be employed as a feed apparatus for other processing or treatment applications other than as a feed apparatus for an agglomerator. For example, the feed apparatus 1100 may be employed to apply a detergent or other product to material to be fed to a flotation cell. Whilst a conveyor 1500 is used in the embodiment to transport the treated fragments of material 1002 to the agglomerator (not shown), any suitable mechanism may be employed.

[0071] The methods and feed apparatuses disclosed herein are an improvement over conventional methods and feed apparatuses for a variety of reasons. In an example, as previously discussed, it has surprisingly been found that application of solubilized silver to the fragments of material 1001 containing chalcopyrite in the feed apparatus 1100 prior to the agglomeration step offers benefits to the leaching process. However, it is noted that the methods and feed apparatuses disclosed herein may be used to apply products other than solubilized silver to the fragments of material 1001 and / or the application of the solubilized silver to fragments of material 1001 that does not contained chalcopyrite.

[0072] The feed apparatus 1100 has no moving parts and hence is suitably robust. The applicators 1132 are protected given their location in the feed apparatus 1100, as previously described, thus resulting in a lower likelihood of damage and clogging.

[0073] Furthermore, as the products 1004 (e.g., including solubilized silver) are introduced within the closed environment of the feed apparatus 1100, there results in less loss of the product 1004 to the surrounding environment. As such, less product 1004 is necessary to provide effective treatment of the fragments of material 1001 and hence delivers lower costs.

[0074] In the embodiment of the feed apparatus 1100 shown in FIGS. 2 and 3, the fragments of material 1001 move through the feed apparatus 1100 under the force of gravity and, as such, the fragments of material 1001 free fall through the cavity 1102 leaving all sides of the fragments of material 1001 exposed to product 1004 (e.g, solubilized silver) from the applicators 1131. Contact with the interruption members 1132 ensures that different rotational forces are applied to the fragments of material 1001 during movement through the cavity 1004 of the feed apparatus 1100.

[0075] The feed apparatus 1100 and methods disclosed herein also assist in reducing the loss of product 1004 being applied to the fragments of material 1001 due to the enclosed cavity 1104 of the feed apparatus 1100 and even application of product 1004 onto the fragments of material 1001.

[0076] The features in one embodiment can be used with features of another embodiment. The examples given and the combination of features disclosed are not intended to be limiting in the sense that they must be used together. Throughout the specification the aim has been to describe the methods and apparatuses without limiting the methods and apparatuses to any one embodiment or specific collection of features. Persons skilled in the relevant art may realize variations from the specific embodiments that will nonetheless fall within the scope of the present disclosure. For example, individual features from one embodiment may be combined with another embodiment.

[0077] It will be appreciated that various other changes and modifications may be made to the embodiments described herein without departing from the spirit and scope of the present description.

[0078] Throughout this specification the words “comprise” and “include”, or variations such as “comprises,” “comprising,” “includes”, or “including,” will be understood to imply the inclusion of a stated element, integer or step, or group of elements, integers or steps, but not the exclusion of any other element, integer or step, or group of elements, integers or steps.

[0079] Terms of degree (e.g., “about,” “substantially,” “generally,” etc.) indicate structurally or functionally insignificant variations. In an example, when the term of degree is included with a term indicating quantity, the term of degree is interpreted to mean ± 10%, ±5%, or +2% of the term indicating quantity. In an example, when the term of degree is used to modify a shape, the term of degree indicates that the shape being modified by the term of degree has the appearance of the disclosed shape. For instance, the term of degree may be used to indicate that the shape may have rounded comers instead of sharp comers, curved edges instead of straight edges, one or more protrusions extending therefrom, is oblong, is the same as the disclosed shape, etc.

Claims

CLAIMS1. A feed apparatus comprising: an inlet adapted to receive fragments of material; an outlet downstream from the inlet; and at least one applicator located between the inlet and the outlet, the at least one applicator configured to apply a product to the fragments of material as the fragments of material move between the inlet and the outlet to thereby form treated fragments of material.

2. The feed apparatus of claim 1 , wherein the product includes a solubilized silver.

3. The feed apparatus of claim 1, wherein the fragments of material is in the form of a material containing at least one base metal material.

4. The feed apparatus of claim 3, wherein the at least one base metal material includes chalcopyrite.

5. The feed apparatus of claim 1, further comprising at least one interference member adapted to operatively contact the fragments of the material as the fragments of the material move between the inlet and the outlet.

6. The feed apparatus of claim 5, wherein the at least one interference member extends from a wall of the feed apparatus into a cavity thereof.

7. The feed apparatus of claim 5 , w herein the at least one interference member is angled in a direction of travel of the fragments of material as the fragments of material moves between the inlet and the outlet.

8. The feed apparatus of claim 7, wherein the at least one interference member is oriented at an angle relative to horizontal of about 5° to about 20°.

9. The feed apparatus of claim 5, wherein the at least one interference member includes a plurality of interference members, the at least one applicator positioned between the plurality of interference members.

10. The feed apparatus of claim 5, wherein the at least one applicator is positioned downstream of the at least one interference member.

11. The feed apparatus of claim 5, wherein the at least one interference member includes a barrier on an edge of an upstream surface of the at least one interference member.

12. The feed apparatus of claim 1, wherein the at least one applicator isconfigured to eject a mist or spray of the product in a solution into the path of the fragments of the material as the fragments of material travels from the inlet to the outlet to thereby apply the product to the fragments of material.

13. The feed apparatus of claim 1, wherein the at least one applicator is configured to eject solid particles of silver in an aerosol into the path of the fragments of the material as the fragments of material travels from the inlet to the outlet to thereby apply the product to the fragments of the material.

14. A method of leaching a base metal material, the method comprising: applying a product to fragments of material in a feed apparatus to form treated fragments of material; forming agglomerates from the treated fragments of material; and leaching the agglomerates with a suitable leach liquor.

15. The method of claim 14, wherein the feed apparatus is the feed apparatus of any one of claims 1 to 13.

16. The method of claim 14, further comprising, before applying the product to the fragments of material, contacting the fragments of material against at least one interference member.

17. The method of claim 16, wherein contacting the fragments of material against the at least one interference member includes collecting some of the fragments of material on the at least one interference member and operably contacting a remainder of the fragments of material against the at least one interference member.

18. The method of claim 14, further comprising forming the treated fragments of material into a heap.

19. A method of applying a product to fragments of material, the method comprising: applying a product to the fragments of material in a feed apparatus to form treated fragments of the material; and delivering the treated fragments of the material for further processing.

20. The method of claim 19, including the step of feeding fragments of the material to an inlet of the feed apparatus prior to applying the product to the fragments of the material.

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