Photopolymer-based holographic recording medium, preparation method therefor, and use thereof

WO2026137716A1PCT designated stage Publication Date: 2026-07-02ZHUHAI MOJIE TECH CO LTD

Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
ZHUHAI MOJIE TECH CO LTD
Filing Date
2025-06-13
Publication Date
2026-07-02

AI Technical Summary

Technical Problem

Existing photopolymer holographic recording media suffer from low photosensitivity and unstable holographic performance, especially due to large grating offset caused by slow polymerization rate and high volume shrinkage.

Method used

Using epoxy resin and various polymerizable monomers as writing monomers, the polymerization rate is increased and the volume shrinkage is reduced through the ring-opening of epoxy resin and the covalent bond formation of polymerizable monomers. Combined with components such as photoinitiators, chain transfer agents and catalysts, a highly efficient holographic recording medium is formed.

Benefits of technology

A photopolymer-type holographic recording medium with high photosensitivity and stable holographic performance has been achieved, featuring low exposure, high diffraction efficiency, and excellent holographic performance.

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Abstract

The present application discloses a photopolymer-based holographic recording medium, a preparation method therefor, and a use thereof. The photopolymer-based holographic recording medium comprises writing monomers, and the writing monomers comprise an epoxy resin and polymerizable monomers. The polymerizable monomers are selected from at least one of: alkenyl naphthalene compounds, alkenyl anthracene compounds, alkenyl benzene compounds, acrylic compounds, methacrylic compounds, acrylate compounds, methacrylate compounds, N‑vinylpyrrole, N‑vinylcarbazole, N‑vinylimidazole, N‑vinylindole, N‑vinylpyrrolidone, and trans‑N‑3‑butynenylcarbazole.
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