Vacuum micro-cavity interferometer chip and manufacturing method therefor, and low-drift optical pressure sensor
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- SHANGHAI BAIANTEK SENSING TECH CO LTD
- Filing Date
- 2025-04-29
- Publication Date
- 2026-07-16
AI Technical Summary
Existing fiber optic pressure sensors are susceptible to electromagnetic interference in high-temperature or radiation environments, and getter contamination and uneven stress can cause measurement drift, making it difficult to meet the requirements of high accuracy and low drift over a wide temperature range.
A three-layer substrate structure is adopted, including a first substrate, a second substrate and a third substrate, which are connected by silicon-glass-silicon bonding to form a membrane island structure and a getter cavity. The getter cavity and the FP interference cavity are connected by vent holes to reduce getter particle contamination, and the temperature drift is reduced by stress isolation structure.
It achieves low drift characteristics and high zero-point stability across the entire temperature range of -55℃ to 125℃, meeting the requirements for high-precision pressure measurement and reducing the temperature coefficient and stress effects of the sensor.
Smart Images

Figure CN2025092084_16072026_PF_FP_ABST