Hose assembly, projection exposure system and production method

Abstract

The invention relates to a hose assembly (40, 40.1, 40.2) comprising: - an elastic hose (30); - an outer tube (32) which surrounds the elastic hose (30) at least in some portions; - at least one connection piece (31) for connecting the hose assembly (40) to a fluid line, - wherein the connection piece (31) is connected at least indirectly to the elastic hose (30), and wherein the connection (33, 33.1) of the connection piece (31) to the elastic hose (30) is, at least in some regions, an integrally bonded connection. The invention also relates to a method for producing a hose assembly (40, 40.1, 40.2) according to the invention. The invention further relates to a projection exposure system for semiconductor lithography (1, 101) equipped with the hose assembly (40, 40.1, 40.2).

Description

[0001] Hose assembly group, projection exposure system and manufacturing process

[0002] The invention relates to a tube assembly, in particular for use in a projection exposure system for semiconductor lithography, and to a projection exposure system for semiconductor lithography equipped with the tube assembly. The invention further relates to a method for manufacturing a tube assembly.

[0003] To enable ever smaller feature sizes on semiconductor devices, in accordance with Moore's Law, the demands on the systems used to manufacture them are also increasing, particularly projection exposure systems for semiconductor lithography. Current systems of this kind feature cooling circuits for the thermal stabilization of the optics and structures used.

[0004] The cooling lines or channels used can be routed through both the optical elements and the structural components of the system. Typically, the structures to be cooled are interconnected by pipe assemblies and networks, which are in turn mounted on the system's structures. Active cooling ensures both maximum heat dissipation and precise controllability of the system. The flowing fluid also improves heat transfer across the surfaces through which it flows (forced convection).

[0005] Water is usually used as the cooling medium due to its high heat capacity and availability; other fluids are also conceivable.

[0006] Especially in the development of water-cooled optical elements, their supporting structures, and infrastructure, pressure fluctuations / pulsations transported and transmitted via the fluid (e.g., water) play a crucial role in the performance of the overall system, particularly the lithography optics, and the image quality on a wafer. These pressure waves, which propagate through the fluid at the speed of sound (e.g., approximately 1500 m / s in acoustically reflective environments such as stainless steel), are referred to below as WLA – Water Line Acoustics.

[0007] The sources and triggering mechanisms for water-induced noise (WAL) are diverse. One example is flow-induced vibrations (FIV), which, depending on local geometric boundary conditions and the upstream and downstream flow conditions, cause persistent periodic and random fluctuations in the flow, i.e., turbulence. These hydrodynamic fluctuations lead to the coupling of acoustic pressure waves, which propagate as WAL both downstream and upstream and, depending on the geometry of the cooling circuit, can result in standing waves.

[0008] Another triggering mechanism involves transmitted structural vibrations and the interaction between structural components and the fluid. Both the structural vibrations themselves and the interaction exhibit frequency-dependent amplitudes. For example, in current systems, structural vibrations are transmitted via pipe supports to the pipe walls and thus directly into the water column. Cooling channels integrated directly into structural components can also absorb structural vibrations directly via the water itself. Additionally, acoustic disturbances from the environment can also affect the water column. Water level oscillation (WLA) is only triggered by fluid flow in a cooling system with active flow. The other mechanisms also occur in a system simply filled with water, without active flow.Therefore, even a countermeasure, such as switching off active cooling and thus shutting off the flow, does not provide a complete remedy, only against FIV as the source.

[0009] Pressure and momentum fluctuations from the fluid (WLA) and the resulting forces on the cooling channel walls lead to frequency-dependent dynamic excitation of the cooled components and the overall system. The sensitivity of the system components to incoming disturbances or vibrations also plays a role. Generally, depending on the geometric and acoustic boundary conditions as well as the materials used, the pressure waves (WLA) are reflected differently within the cooling system, resulting in frequency-dependent force amplitudes that act on the system. These disturbances negatively impact system performance (e.g., critical frequencies for the position control of the optics or deformation of the optical components due to pressure pulsations) and imaging accuracy.

[0010] To reduce the pressure fluctuations introduced into the fluid system to a specified level, (hardware) measures are required. These can be actively operated / controlled or, preferably, passive measures. One solution for reducing or suppressing pressure fluctuations in the fluid column (WLA) is the use of hose assemblies made of viscoelastic materials with gas inclusions.

[0011] Such hose assemblies typically comprise a flexible hose and an outer pipe surrounding the flexible hose. The hose and outer pipe are typically connected to adjacent pipe sections via fittings.

[0012] For example, European patent application EP 3951 228 A1 and European patent EP 2327914 B1 disclose hose assemblies in which elastic hoses are connected to fittings by clamp connections. However, this type of connection has proven to be comparatively complex and difficult to access for maintenance and leak testing. The object of the present invention is to provide a hose assembly, particularly for use in a projection exposure system for semiconductor lithography, with improved properties and a method for its manufacture. A further object of the present invention is to provide an improved projection exposure system for semiconductor lithography.

[0013] This problem is solved by a device and a method with the features of the independent claims. The dependent claims relate to advantageous embodiments and variants of the invention. A hose assembly according to the invention comprises an elastic hose and an outer tube that surrounds the elastic hose at least partially. Furthermore, the hose assembly comprises at least one connector for connecting the hose assembly to a fluid line, which is at least indirectly connected to the elastic hose. According to the invention, the connection of the connector to the elastic hose is, at least partially, a material-bonded connection.

[0014] In contrast to the clamping concepts known from the prior art, the measure according to the invention ensures that the end pieces of the elastic hose do not have to be subjected to a mechanical load for making the connection with the connecting piece, which could adversely affect the dynamic properties of the hose.

[0015] Furthermore, the solution according to the invention provides an improved testing method for the tightness of the connection. The materially bonded subassembly can be tested for the required tightness before assembly into the overall assembly by means of a simple helium leakage test.

[0016] Because the connection in the solutions known from the prior art is only created by joining the entire assembly, this possibility does not exist in this case.

[0017] In addition, the solution according to the invention offers an advantage for the entire assembly with regard to installation space requirements. Furthermore, the complexity of the components can be reduced, as the tolerance situation becomes more favorable. In particular, the invention makes it possible to manufacture the elastic hose in a comparatively simple manner, instead of having to provide complex molded parts with intricate structures, especially on sealing surfaces. The concept according to the invention also makes it possible to reduce the number of gaps that arise in connection with the joining technique.

[0018] In particular, the material-bonded connection can be designed as a bonding connection. In this case, the elastic hose – possibly using a suitable bonding agent – ​​is directly bonded to the adjacent component in the assembly. Various materials are conceivable for the elastic hose, such as thermoplastic polyurethanes (TPU), tetrafluoroethylene hexafluoropropylene vinylidene fluoride (THV), perfluoroelastomers (FFKM), or silicone. The bonding agent should be matched to the surface chemistry, e.g., the polarity, of the elements or materials involved in the connection. Depending on the material pairing, the bonding agent may even be omitted entirely. In this case, the components involved in the connection can be joined simply by applying heat and pressure.

[0019] After the components have been bonded together, the resulting sub-assembly can be inserted into the outer tube. The outer tube can be, for example, a corrugated hose, a smooth tube, or a combination of both.

[0020] In an advantageous embodiment of the invention, an adapter can be arranged between the connector and the elastic hose.

[0021] Such an adapter is particularly useful in cases where, due to the material pairing, a direct, bonded connection between the fitting and the flexible hose is difficult to establish. The adapter can act as an intermediary in this situation. It can be selected to match the materials used for the adjacent components, especially stainless steel, but also, for example, rigid plastics such as polyamide.

[0022] The adapter can be welded to the end face of the connector to create a smooth transition.

[0023] In particular, the adapter may contain one or more of the following materials: stainless steel, aluminum, polycarbonate or polyamide.

[0024] The material-bonded connection can be formed, for example, on at least one of the end faces of the elastic hose. In this case, the connection between the elastic hose and the component to which it is attached, such as the connector or adapter, can be significantly shorter in the axial direction than is known in the prior art. The effective length of the elastic element is thus increased, as no sections are consumed for clamping / fastening. Furthermore, the transition between the elastic hose and the component to which it is attached can be made smooth, particularly on the inside of the hose. This results in a reduced contribution to the impedance step of the assembly. Additionally, cleanability is improved and the formation of turbulence is significantly reduced.In particular, this solution eliminates the need for a free end of the elastic hose to protrude from the outer tube. This typically reduces the dynamically effective length of the elastic hose, as the section protruding from the outer tube is clamped in the solutions described in the prior art. Furthermore, the elimination of the clamping connection increases the reproducibility of the hose's dynamic properties, since the tolerances associated with clamping are no longer present. Additionally, the material-bonded connection can be formed on at least one end-facing section of the inner surface of the elastic hose. In other words, the material-bonded connection in this case consists of a section of the outer surface of, for example, a hollow cylindrical section of the connector and an inner surface of a similarly hollow cylindrical section of the elastic hose.This variant offers the advantage that, depending on the extent of the overlap between the elastic hose and the connector, the total area of ​​the joining surfaces involved in the connection can be appropriately adjusted.

[0025] It is also conceivable to form the material-bonded connection on at least one end section of the outside of the elastic hose, so that a section of the inside of the connector is used to make the connection.

[0026] In one embodiment of the invention, the connecting piece can be connected to the outer tube via a connecting sleeve; the connecting sleeve can have a threaded section through which it is screwed to the connecting piece and / or the adapter, thus advantageously creating a detachable connection. Alternatively, the connecting piece and the connecting sleeve can also be formed as a single unit.

[0027] A defined screw connection can be achieved in particular by providing the adapter or connector with a circumferential shoulder on its outside, which serves as a stop for the connecting sleeve during screwing.

[0028] The tightness of the assembly can be improved by placing a sealing structure between the shoulder and the connecting sleeve. This sealing structure can include at least one O-ring.

[0029] The sealing effect can be improved by including at least two concentrically arranged O-rings in the sealing structure.

[0030] Instead of a screw connection, the connecting sleeve can also be welded to the fitting and / or the adapter. With a properly executed weld, a tight seal is ensured without further measures. Adhesive bonds are also a possibility.

[0031] In principle, the use of an adapter can also be dispensed with, so that the connector and the elastic hose are directly connected to each other.

[0032] A projection exposure system according to the invention for semiconductor lithography can be equipped with a hose assembly as described above at various points in the temperature control system. The use of the hose assembly according to the invention is particularly advantageous in areas where pressure fluctuations or vibrations need to be compensated for or reduced.

[0033] A method according to the invention for manufacturing a corresponding hose assembly comprises at least the following steps:

[0034] - Manufacturing a sub-assembly by providing and at least indirectly joining a connector or adapter to an elastic hose - Inserting the sub-assembly into an outer tube

[0035] - Connecting the sub-assembly and the outer tube by means of connecting sleeves arranged at the ends of the outer tube to create a sealed volume between the sub-assembly and the outer tube.

[0036] In one variation of the procedure, a leak test of the material-bonded connection between the connector or adapter and the flexible hose can be performed. This can advantageously be done before the sub-assembly is inserted into the outer pipe.

[0037] Exemplary embodiments and variants of the invention are explained in more detail below with reference to the drawing. The drawing shows

[0038] Figure 1 schematically shows a projection exposure system for EUV projection lithography in meridional section.

[0039] Figure 2 schematically shows a projection exposure system for DUV projection lithography in meridional section.

[0040] Figure 3 shows a first exemplary embodiment of the invention,

[0041] Figure 4 shows another embodiment of the invention,

[0042] Figure 5 shows another variant of the invention,

[0043] Figure 6 shows exemplary process steps for manufacturing an assembly according to the invention, and

[0044] Figure 7 shows an example of an alternative hose assembly not claimed herein.

[0045] The following section describes, by way of example, the essential components of a projection exposure system 1 for microlithography, in which the invention can be applied, with reference to Figure 1. The description of the basic structure of the projection exposure system 1 and its components is not intended to be restrictive. One embodiment of the illumination system 2 of the projection exposure system 1 has, in addition to a radiation source 3, an illumination optic 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the radiation source 3 can also be provided as a separate module from the rest of the illumination system. In this case, the illumination system does not include the radiation source 3.

[0046] A reticle 7 located in the object field 5 is illuminated. The reticle 7 is held by a reticle holder 8. The reticle holder 8 can be moved, particularly in one scanning direction, via a reticle displacement drive 9.

[0047] Figure 1 shows a Cartesian xyz coordinate system for illustrative purposes. The x-direction runs perpendicular to the plane of the drawing. The y-direction runs horizontally, and the z-direction runs vertically. In Figure 1, the scan direction runs along the y-direction. The z-direction runs perpendicular to the object plane 6.

[0048] The projection exposure system 1 comprises a projection optic 10. The projection optic 10 serves to image the object field 5 onto an image field 11 in an image plane 12. The image plane 12 is parallel to the object plane 6. Alternatively, an angle other than 0° between the object plane 6 and the image plane 12 is also possible.

[0049] A structure on the reticulum 7 is imaged onto a photosensitive layer of a wafer 13 located in the image plane 12 within the image field 11. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be moved, particularly along the y-direction, via a wafer transfer drive 15. The movement of the reticulum 7 via the reticulum transfer drive 9 and of the wafer 13 via the wafer transfer drive 15 can be synchronized.

[0050] Radiation source 3 is an EUV radiation source. Specifically, radiation source 3 emits EUV radiation 16, which is also referred to below as useful radiation, illumination radiation, or illumination light. The useful radiation has a wavelength in the range between 5 nm and 30 nm. Radiation source 3 can be a plasma source, for example, an LPP source (Laser Produced Plasma, plasma generated using a laser) or a DPP source (Gas Discharged Produced Plasma, plasma generated by gas discharge). It can also be a synchrotron-based radiation source. Radiation source 3 can be a free-electron laser (FEL).

[0051] The illumination radiation 16 emanating from the radiation source 3 is focused by a collector 17. The collector 17 can be a collector with one or more ellipsoidal and / or hyperboloid reflective surfaces. The at least one reflective surface of the collector 17 can be illuminated with the illumination radiation 16 at grazing incidence (Gl), i.e., with angles of incidence greater than 45° relative to the normal direction of the mirror surface, or at normal incidence (NI), i.e., with angles of incidence less than 45°. The collector 17 can be structured and / or coated to optimize its reflectivity for the useful radiation and to suppress stray light.

[0052] After the collector 17, the illumination radiation 16 propagates through an intermediate focus in an intermediate focal plane 18. The intermediate focal plane 18 can represent a separation between a radiation source module, comprising the radiation source 3 and the collector 17, and the illumination optics 4.

[0053] The illumination optics 4 comprise a deflecting mirror 19 and, downstream in the beam path, a first faceted mirror 20. The deflecting mirror 19 can be a planar deflecting mirror or, alternatively, a mirror with an effect that influences the beam beyond the mere deflection effect. Alternatively or additionally, the deflecting mirror 19 can be designed as a spectral filter that separates a useful wavelength of the illumination radiation 16 from stray light of a different wavelength. If the first faceted mirror 20 is arranged in a plane of the illumination optics 4 that is optically conjugate to the object plane 6 as the field plane, it is also referred to as a field faceted mirror. The first faceted mirror 20 comprises a plurality of individual first facets 21, which are hereinafter also referred to as field facets. Only a few of these facets 21 are shown in Fig. 1 as examples.

[0054] The first facets 21 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or semicircular border contour. The first facets 21 can be designed as planar facets or alternatively as convexly or concavely curved facets.

[0055] As is known, for example, from DE 102008009600 A1, the first facets 21 can themselves each be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 20 can in particular be designed as a microelectromechanical system (MEMS system). For details, reference is made to DE 102008009600 A1.

[0056] Between the collector 17 and the deflecting mirror 19, the illumination radiation 16 runs horizontally, i.e. along the y-direction.

[0057] In the beam path of the illumination optics 4, a second faceted mirror 22 is arranged downstream of the first faceted mirror 20. If the second faceted mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil faceted mirror. The second faceted mirror 22 can also be arranged at a distance from a pupil plane of the illumination optics 4. In this case, the combination of the first faceted mirror 20 and the second faceted mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006 / 0132747 A1, EP 1 614008 B1, and US 6,573,978.

[0058] The second facet mirror 22 comprises a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also referred to as pupil facets.

[0059] The second facets 23 can also be macroscopic facets, which may, for example, have round, rectangular, or hexagonal borders, or alternatively, facets composed of micromirrors. Reference is also made to DE 102008009600 A1 in this regard. The second facets 23 can have planar or, alternatively, convexly or concavely curved reflective surfaces.

[0060] The illumination optics 4 thus form a double-faceted system. This basic principle is also known as a honeycomb condenser (fly's eye integrator). It can be advantageous not to arrange the second faceted mirror 22 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 10. In particular, the pupil faceted mirror 22 can be arranged tilted relative to a pupil plane of the projection optics 10, as described, for example, in DE 102017220586 A1.

[0061] With the aid of the second faceted mirror 22, the individual first facets 21 are imaged into the object field 5. The second faceted mirror 22 is the last beam-shaping, or indeed the last, mirror for the illumination radiation 16 in the beam path before the object field 5.

[0062] In another embodiment of the illumination optics 4, not shown, a transmission optic can be arranged in the beam path between the second facet mirror 22 and the object field 5, which contributes in particular to imaging the first facets 21 into the object field 5. The transmission optic can have exactly one mirror, or alternatively two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 4. The transmission optic can in particular comprise one or two mirrors for normal incidence (Nl mirrors, normal incidence mirrors) and / or one or two mirrors for grazing incidence (Gl mirrors, grazing incidence mirrors).

[0063] In the embodiment shown in Fig. 1, the lighting optics 4 has exactly three mirrors after the collector 17, namely the deflecting mirror 19, the field facet mirror 20 and the pupil facet mirror 22.

[0064] In a further embodiment of the illumination optics 4, the deflecting mirror 19 can also be omitted, so that the illumination optics 4 after the collector 17 can then have exactly two mirrors, namely the first faceted mirror 20 and the second faceted mirror 22. The imaging of the first facets 21 by means of the second facets 23 or with the second facets 23 and a transmission optic into the object plane 6 is regularly only an approximate imaging.

[0065] The projection optics 10 comprise a plurality of mirrors Mi, which are numbered according to their arrangement in the beam path of the projection exposure system 1.

[0066] In the example shown in Figure 1, the projection optics 10 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve, or any other number of mirrors Mi are also possible. The penultimate mirror M5 and the last mirror M6 each have an aperture for the illumination radiation 16. The projection optics 10 is a double-obscured optic. The projection optics 10 has an image-side numerical aperture greater than 0.5, and which can also be greater than 0.6, for example, 0.7 or 0.75.

[0067] The reflective surfaces of the mirrors Mi can be designed as freeform surfaces without an axis of rotational symmetry. Alternatively, the reflective surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflective surface shape. The mirrors Mi, like the mirrors of the illumination optics 4, can have highly reflective coatings for the illumination radiation 16. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.

[0068] The projection optics 10 has a large object-image offset in the y-direction between a y-coordinate of a center of the object field 5 and a y-coordinate of the center of the image field 11. This object-image offset in the y-direction can be approximately as large as a z-distance between the object plane 6 and the image plane 12.

[0069] The projection optics 10 can be anamorphic. In particular, they have different image scales βx, βy in the x and y directions. The two image scales βx, βy of the projection optics 10 are preferably (βx, βy) = (+ / - 0.25, + / - 0.125). A positive image scale β indicates an image without image inversion. A negative value for the image scale β indicates an image with image inversion.

[0070] The projection optics 10 thus lead to a reduction in the x-direction, that is, in the direction perpendicular to the scan direction, in a ratio of 4:1.

[0071] The projection optics 10 lead to a reduction of 8:1 in the y-direction, that is, in the scan direction.

[0072] Other magnification ratios are also possible. Magnification ratios with the same sign and absolute values ​​in the x and y directions, for example with absolute values ​​of 0.125 or 0.25, are also possible.

[0073] The number of intermediate image planes in the x- and y-directions in the beam path between the object field 5 and the image field 11 can be the same or, depending on the design of the projection optics 10, different. Examples of projection optics with different numbers of such intermediate images in the x- and y-directions are known from US 2018 / 0074303 A1.

[0074] Each pupil facet 23 is assigned to exactly one of the field facets 21 to form an illumination channel for illuminating the object field 5. This can result, in particular, in illumination according to Köhler's principle. The far field is divided into a multitude of object fields 5 by means of the field facets 21. The field facets 21 generate a plurality of images of the intermediate focus on the pupil facets 23 assigned to each of them.

[0075] The field facets 21 are each superimposed on the reticulum 7 by an associated pupil facet 23 to illuminate the object field 5. The illumination of the object field 5 is particularly homogeneous. It preferably exhibits a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.

[0076] The illumination of the entrance pupil of the projection optics 10 can be geometrically defined by the arrangement of the pupil facets. By selecting the illumination channels, in particular the subset of pupil facets that guide light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the illumination setting. A preferred pupil uniformity in the area of ​​defined illuminated sections of an illumination pupil of the illumination optics 4 can also be achieved by redistributing the illumination channels.

[0077] Further aspects and details of the illumination of the object field 5, and in particular of the entrance pupil of the projection optics 10, are described below. The projection optics 10 may, in particular, have a homocentric entrance pupil. This may be accessible. It may also be inaccessible.

[0078] The entrance pupil of the projection optics 10 cannot always be illuminated exactly by the pupil facet mirror 22. When the projection optics 10 image the center of the pupil facet mirror 22 telecentrically onto the wafer 13, the aperture rays often do not intersect at a single point. However, a surface can be found where the pairwise determined separation of the aperture rays is minimized. This surface represents the entrance pupil or a surface conjugate to it in real space. In particular, this surface exhibits a finite curvature.

[0079] The projection optics 10 may have different entrance pupil positions for the tangential and sagittal beam paths. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second faceted mirror 22 and the reticle 7. This optical element allows the different positions of the tangential and sagittal entrance pupils to be taken into account. In the arrangement of the components of the illumination optics 4 shown in Figure 1, the pupil faceted mirror 22 is arranged in a plane conjugate to the entrance pupil of the projection optics 10. The field faceted mirror 20 is tilted relative to the object plane 6. The first faceted mirror 20 is tilted relative to an arrangement plane defined by the deflecting mirror 19.The first faceted mirror 20 is arranged at an angle to an arrangement plane defined by the second faceted mirror 22.

[0080] Figure 2 schematically shows in meridional section another projection exposure system 101 for DUV projection lithography, in which the invention can also be applied.

[0081] The construction of the projection exposure system 101 and the principle of the illustration are comparable to the construction and procedure described in Figure 1. Identical components are designated with a reference numeral increased by 100 compared to Figure 1; thus, the reference numerals in Figure 2 begin with 101.

[0082] In contrast to an EUV projection exposure system 1 as described in Figure 1, due to the longer wavelength of the DUV radiation 116 used as useful light in the range of 100 nm to 300 nm, in particular 193 nm, refractive, diffractive and / or reflective optical elements 117, such as lenses, mirrors, prisms, end plates and the like, can be used in the DUV projection exposure system 101 for imaging or illumination.The projection exposure system 101 essentially comprises a lighting system 102, a reticule holder 108 for receiving and precisely positioning a reticule 107 provided with a structure, by which the subsequent structures on a wafer 113 are determined, a wafer holder 114 for holding, moving and precisely positioning this wafer 113 and a projection lens 110, with several optical elements 117, which are held in a lens housing 119 of the projection lens 110 via mounts 118.

[0083] The illumination system 102 provides DUV radiation 116 required for imaging the reticulum 107 onto the wafer 113. A laser, plasma source, or the like can be used as the source of this radiation 116. Within the illumination system 102, the radiation 116 is shaped by optical elements such that, upon striking the reticulum 107, the DUV radiation 116 exhibits the desired properties with respect to diameter, polarization, wavefront shape, and the like. The construction of the subsequent projection optics 101 with the lens housing 119 differs in principle from the construction described in Figure 1, except for the additional use of refractive optical elements 117 such as lenses, prisms, and end plates, and is therefore not described further.

[0084] Figure 3 shows in a schematic sectional view a first embodiment of a part of a hose assembly 40 according to the invention, as it can be used, for example, in one of the systems 1 or 101 described above.

[0085] The figure, like the following figures, shows only an end portion of a hose assembly 40 according to the invention. It is self-evident that the other end of the hose assembly 40 can be designed analogously. In the example shown, the elastic hose 30 is indirectly connected to a connector 31 via an adapter 35.

[0086] In this process, a material-bonded connection 33 is created between the elastic hose 30 and the adapter 35, which can be realized, for example, by a bonding process.

[0087] The adapter 35 can be connected to the connector 31, in particular via a weld 37. The material of the adapter 35 is advantageously selected such that it is suitable both for welding to the connector 31 and for bonding, in particular by adhesive bonding, to the elastic hose 30.

[0088] The connecting piece 31 can serve to connect the hose assembly 40 to a fluid line of a temperature control system of a projection exposure system and can, for example, be designed as a flange.

[0089] A connecting sleeve 34 is screwed at its first end to the adapter 35 via a threaded section 36, and thus also indirectly to the connector 31. Alternatively (not shown in the figure), a material-bonded connection, such as an adhesive or welded joint, is also possible for the connection between the connecting sleeve 34 and the adapter 35. At its second end, the connecting sleeve 34 is connected via a weld 38 to an outer tube designed as a corrugated hose 32, so that a gas-tight interior is formed between the corrugated hose 32 and the elastic hose 30 in a manner known per se.

[0090] The stepless transition between the elastic hose 30 and the adapter 35 is clearly visible in the figure. The transition between the adapter 35 and the connector 31 is designed similarly, resulting in an overall advantageous reduction of potential impedance jumps and turbulence sources in the fluid-carrying area of ​​the hose assembly 40. The advantageous avoidance of narrow gaps in the fluid-carrying area, which would complicate cleaning of the assembly and also increase the risk of corrosion, is also evident.

[0091] Figure 4 shows a slightly modified embodiment of the assembly 40.1 according to the invention compared to Figure 3. Corresponding elements have been provided with the same reference numeral as used in Figure 3.

[0092] In contrast to the embodiment shown in Figure 3, the adapter 35.1 is provided with a circumferential shoulder 41 on its outer surface. The circumferential shoulder 41 serves as a stop for the connecting sleeve 34 when screwed together. To improve the sealing of the assembly, the two concentric O-rings 42.1 and 42.2 are arranged between the shoulder 41 and the connecting sleeve 34 as part of a sealing structure 42.

[0093] Another variant 40.2 of the invention is shown in Figure 5. In this figure as well, elements that correspond to elements already known from the previous figures are designated with the same reference numerals. In the embodiment of the invention shown in Figure 5, the material-bonded connection 33.1 is formed on an end section of the inside of the elastic hose. Furthermore, in the embodiment shown in Figure 5, the connecting sleeve 34 is not screwed to the adapter 35, but welded by means of a weld seam 43. The connecting sleeve 34 can, in principle, be welded to either the adapter 35 or, alternatively, to the connector 31.

[0094] Figure 6 schematically shows in sub-figures 6.1 to 6.4 a possible manufacturing process of the hose assembly 40 according to the invention.

[0095] In a first step (partial figure 6.1), the elastic hose 30 and the adapter 35 are bonded end-to-end, forming a subassembly 47 consisting of hose 30 and adapter 35. In a second, optional step (partial figure 6.1), a leak test is performed using a helium leak test. For this purpose, helium is first introduced inside the subassembly 47 formed from adapter 35 and elastic hose 30 and pressurized. Any helium escaping through the connection 33 is detected by the helium sensor 48. If necessary, the connection 33 can then be reworked.

[0096] In a third step (partial figure 6.3) the sub-assembly 47 consisting of adapter 35 and elastic hose 30 is inserted into the interior of an outer tube designed as a corrugated hose 32 in the example shown.

[0097] Finally, in a fourth step (partial figure 6.4) the connecting piece 31 and the connecting sleeve 34 are welded to the adapter 35 and to the corrugated hose 32 respectively, thus completing the hose assembly 40 according to the invention.

[0098] In the example shown, an adapter 35 was used between the connector 31 and the flexible hose 30. It goes without saying that the procedure, in particular the leak test, can also be applied with the necessary adjustments in variants where no adapter 35 is used, but the flexible hose 30 is connected directly to the connector 31.

[0099] Figure 7 shows an alternative embodiment of a hose assembly 40.3, which is not claimed herein. In the example shown, the elastic hose 30.1 is provided at its end section with a radially projecting, circumferential sealing element 44. The sealing element 44 is crimped between a shoulder 46 formed on the connector 31.1 and the connecting sleeve 34.1. The connecting sleeve 34.1 is connected to the shoulder 46 of the connector 31.1 by the weld seam 43.1. The sealing element 44 and the elastic hose 30.1 can, for example, be made of silicone or a fluororubber.

[0100] Similarly, the outer tube 32, which is also designed as a corrugated hose, is connected to the connecting sleeve 34.1 via the weld seam 38.1. An advantage of this concept is that the elastic hose 30.1 with the molded sealing element 44 can be manufactured relatively easily using a process known from the prior art, such as injection molding.

[0101] A further improvement in the tightness of the hose assembly 40.3 shown can be achieved by arranging an additional sealing structure 45 with several sealing elements 45.1, 45.2, and 45.3 in the area of ​​the sealing body 44. The sealing elements 45.1, 45.2, and 45.3 are formed as circumferential structures. In the figure, the sealing elements 45.1, 45.2, and 45.3 are shown in dashed lines in their uncompressed state, in which they project from the sealing body 44 at a specific angle. These structures can be either concentrically circumferential or interrupted. When the connecting sleeve 34.1 is clamped and subsequently welded to the connector 31.1, the sealing elements 45.1, 45.2, and 45.3 press against each other as shown in solid lines in the figure, thus creating a further improved sealing effect similar to a labyrinth seal. The angle between the sealing elements is 45.1, 45.2, 45.The angle of 3 and the sealing body in the uncompressed state can be freely selected within a range of 0-180°.

[0102] It is also conceivable that the sealing elements 45.1, 45.2, 45.3 are each oriented at different angles to the sealing body 44. The sealing structure 45 can be formed integrally with the elastic hose 30.1 or the sealing body 44; it is equally conceivable to manufacture the sealing structure 45 and its sealing elements 45.1, 45.2, 45.3 separately and subsequently apply them to the sealing body 44, particularly before the final assembly of the hose assembly 40.3. In the example shown, the sealing elements 45.1, 45.2, and 45.3 are oriented radially inwards so that they interlock with the surrounding structure and thus prevent the sealing body 44 from slipping out of the area between the shoulder 46 and the connecting sleeve 34.1. The sealing elements 45.1 , 45.2 and 45.3 can also have a triangular, quadrilateral, in particular square or a round, in particular disk-shaped cross-section, unlike the one shown in the figure.

[0103] In the example shown, a counter contour on the opposing components is not strictly necessary, as several individual sealing points are formed radially one behind the other after compression on the respective sealing elements 45.1, 45.2, 45.3, similar to double O-ring concepts. The axial extent of the sealing structure 45 on the sealing body 44 should be at least 5% of the width of the sealing body 44, preferably at least 10%.

[0104] Manufacturing the elastic hose 30.1 in one piece with the sealing element and sealing structure 45 advantageously reduces the complexity of the hose assembly 40.3. Likewise, the tolerance requirements for the components are reduced, particularly the requirements for the fits at the sealing points themselves, and the axially stressed installation space is also reduced. Due to the comparatively simple shape of the elastic hose 30.1, especially the absence of undercuts, it can be manufactured using a simple tool, for example, in an injection molding process.

[0105] Furthermore, purely axial pressing of the components involved also proves advantageous. The benefit here is the gain in effective length.

[0106] An axial crimp requires less installation space in the axial direction, thus increasing the effective length of the hose. Reference list

[0107] 1 projection monitoring system

[0108] 2 Lighting system

[0109] 3. Radiation source

[0110] 4 Lighting optics

[0111] 5 object field

[0112] 6 Object level

[0113] 7 reticles

[0114] 8 label holders

[0115] 9 Reticle displacement drive

[0116] 10 Projection optics

[0117] 11 Image field

[0118] 12 Image plane

[0119] 13 wafers

[0120] 14 wafer holders

[0121] 15 wafer transfer drive

[0122] 16 EUV radiation / Illumination radiation 17 Collector

[0123] 18 Intermediate focus plane

[0124] 19 deflecting mirrors

[0125] 20 faceted mirrors

[0126] 21 facets

[0127] 22 faceted mirrors

[0128] 23 facets

[0129] 30,30.1 Elastic hose

[0130] 31,31.1 Connector

[0131] 32 Outer pipe

[0132] 33,33.1 connection

[0133] 34,34.1 Connecting sleeve 35,35.1 Adapter

[0134] 36 thread section

[0135] 37 weld seam

[0136] 38,38.1 Weld 40,40.1,40.2,40.3. Hose assembly

[0137] Paragraph 41

[0138] 42 Sealing structure

[0139] 42.1,42.2 O-rings

[0140] 43.43.1 Weld

[0141] 44 sealing elements

[0142] 45 Sealing structure 45.1, 45.2, 45.3 Sealing elements

[0143] Paragraph 46

[0144] 47 Subassembly

[0145] 48 Helium sensor

[0146] 101 Projection exposure system 102 Lighting system

[0147] 107 reticles

[0148] 108 label holders

[0149] 110 Projection optics

[0150] 113 wafers

[0151] 114 wafer holders

[0152] 116 DUV radiation

[0153] 117 optical element

[0154] 118 versions

[0155] 119 lens bodies

[0156] M1-M6 mirrors

Claims

Patent claims 1. Hose assembly (40, 40.1, 40.2), comprising - an elastic hose (30) - an outer tube (32) that surrounds the elastic hose (30) at least partially - at least one connector (31) for connecting the hose assembly (40) to a fluid line - wherein the connecting piece (31 ) is at least indirectly connected to the elastic hose (30) characterized by the fact that the connection (33,33.1) of the connector (31) with the elastic hose (30) is a material-bonded connection, wherein the material-bonded connection (33) is formed on at least one of the end faces of the elastic hose (30) or on at least one end section of the inside of the elastic hose (30) or on at least one end section of the outside of the elastic hose (30).

2. Hose assembly (40, 40.1, 40.2) according to claim 1 , characterized by the fact that the material-bonded connection (33,33.1) is formed as a bonding connection.

3. Hose assembly (40, 40.1, 40.2) according to one of the preceding claims, characterized by the fact that An adapter (35) is arranged between the connector (31) and the elastic hose (30).

4. Hose assembly (40, 40.1, 40.2) according to claim 3 characterized by the fact that the adapter (35) is welded to the end face of the connector (31). - 24 -5. Hose assembly (40, 40.1, 40.2) according to claim 3 or 4, characterized in that the adapter (35) contains one or more of the following materials: stainless steel, aluminium, polycarbonate or polyamide.

6. Hose assembly (40, 40.1, 40.2) according to one of the preceding claims, characterized by the fact that the connecting piece (31) is connected to the outer tube (32) via a connecting sleeve (34).

7. Hose assembly (40, 40.1) according to claim 6, characterized by the fact that the connecting sleeve (34) has a threaded section (36) via which it is screwed to the connecting piece (31) and / or the adapter (35).

8. Hose assembly (40.1) according to claim 7, characterized by the fact that the adapter (35) or the connector (31) has a circumferential shoulder (41) on its outside, which serves as a stop for the connecting sleeve (34) when screwing it together.

9. Hose assembly (40.1) according to claim 8, characterized by the fact that A sealing structure (42) is arranged between the shoulder (41) and the connecting sleeve (34).

10. Hose assembly (40.1) according to claim 9, characterized by the fact that the sealing structure (42) comprises at least one O-ring (42.1,42.2).

11. Hose assembly (40.1 ) according to claim 10, characterized in that the sealing structure (42) comprises at least two concentrically arranged O-rings (42.1 ,42.2).

12. Hose assembly (40.1) according to claim 6, characterized by the fact that the connecting sleeve (34) is welded to the connector (31) and / or the adapter (35).

13. Hose assembly according to one of claims 1 or 2 or 6 to 12, characterized in that the connector (31) and the elastic hose (30) are directly connected to each other.

14. Projection exposure system (1,101) for semiconductor lithography with a tube assembly (40,40.1,40.2) according to one of the preceding claims.

15. Method for manufacturing a hose assembly (40, 40.1, 40.2), in particular a hose assembly (40, 40.1, 40.2) according to any one of the preceding claims 1 to 13, including at least the following steps: - Manufacturing a sub-assembly (47) by providing and joining a connector (31) or an adapter (35) with an elastic hose (30) - Inserting the sub-assembly (47) into an outer tube (32) - Connecting the sub-assembly (47) and the outer tube (32) by means of connecting sleeves arranged at the ends of the outer tube (32) to create a closed volume between the sub-assembly (47) and the outer tube (32).

16. Method according to claim 15, characterized by the fact that A leak test is performed on the material-bonded connection between the connector (31) or the adapter (35) and the elastic hose (30). / Method according to claim 16, characterized by the fact that The leak test is carried out before the sub-assembly (47) is inserted into the outer tube (32). - 27 -

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