Filtration system and method

Abstract

Embodiments of the present description provide a filtration system and method. The system comprises a liquid supply filtration unit, a cleaning unit, and a controller, wherein the liquid supply filtration unit is configured to be in an active state or in a sleep state; when the liquid supply filtration unit is in the active state, the liquid supply filtration unit filters liquid supplied to a liquid-using device; when the liquid supply filtration unit is in the sleep state, the liquid supply filtration unit stops filtering the liquid supplied to the liquid-using device; and the controller is configured to control the cleaning unit to clean the liquid supply filtration unit in the sleep state.

Description

A filtration system and method Technical Field

[0001] This specification relates to the field of filtration technology, and in particular to a filtration system and method. Background Technology

[0002] In current industrial production processes, filtration systems are widely used across various industries to separate particulate matter from solids, liquids, and gases. However, current filtration systems, employing only a single liquid supply filtration method, struggle to cope with complex production environments, especially in precision machining industries such as semiconductors and optical polishing. Liquid supply filtration units require cleaning, which can lead to interruptions in liquid supply; therefore, the current single liquid supply filtration method cannot guarantee the continuity and efficiency of liquid filtration.

[0003] Therefore, it is desirable to provide a filtration system and method that not only maintains the cleanliness and performance of the liquid supply filtration unit, but also avoids liquid supply interruptions that may occur during cleaning in the filtration process, thereby improving the operating efficiency and reliability of the entire filtration system. Summary of the Invention

[0004] This specification provides a filtration system according to one or more embodiments, the filtration system including a liquid supply filtration unit, a cleaning unit, and a controller; the liquid supply filtration unit is configured to be in an active state or a dormant state; wherein, when the liquid supply filtration unit is in the active state, it filters the liquid supplied to the liquid-using device, and when the liquid supply filtration unit is in the dormant state, it stops filtering the liquid supplied to the liquid-using device; the controller is configured to control the cleaning unit to clean the liquid supply filtration unit in the dormant state.

[0005] This specification provides a filtration method according to one or more embodiments. The filtration method is executed by a controller of a filtration system, which further includes a liquid supply filtration unit and a cleaning unit. The liquid supply filtration unit is configured to be in an active state or a dormant state. When the liquid supply filtration unit is in an active state, it filters the liquid supplied to the liquid-using device. When the liquid supply filtration unit is in a dormant state, it stops filtering the liquid supplied to the liquid-using device. The method includes controlling the cleaning unit to clean the liquid supply filtration unit in the dormant state.

[0006] This specification provides a filtering device according to one or more embodiments, the device including at least one processor and at least one memory, the at least one memory being used to store computer instructions, the at least one processor executing at least a portion of the computer instructions to implement the filtering method.

[0007] This specification provides one or more embodiments of a computer-readable storage medium having stored computer instructions that, when at least a portion of the computer instructions are executed by a processor, enable the filtering method described herein. Attached Figure Description

[0008] This specification will be further described by way of exemplary embodiments, which will be described in detail with reference to the accompanying drawings. These embodiments are not limiting; in these embodiments, the same reference numerals denote the same structures, wherein:

[0009] Figure 1 is a schematic diagram of a filtration system shown in some embodiments;

[0010] Figure 2 is a schematic diagram of a filtration system according to some embodiments of this specification;

[0011] Figure 3 is a schematic diagram of a filtration system according to some other embodiments of this specification;

[0012] Figure 4 is a schematic diagram illustrating the determination of the first preset condition according to some embodiments of this specification;

[0013] Figure 5 is a schematic diagram illustrating the determination of the second preset condition according to some embodiments of this specification;

[0014] Figure 6 is an exemplary flowchart illustrating the determination of a second preset condition according to other embodiments of this specification;

[0015] Figure 7 is an exemplary flowchart of determining predicted return flow data according to some embodiments of this specification;

[0016] Figure 8 is a schematic diagram of a first filter pattern according to some embodiments of this specification;

[0017] Figure 9 is a schematic diagram of a second filter pattern according to some embodiments of this specification;

[0018] Figure 10 is a schematic diagram of a filtration system according to some other embodiments of this specification;

[0019] Figure 11 is a flowchart illustrating the determination of preset filtering parameters according to some embodiments of this specification;

[0020] Figure 12 is an exemplary flowchart of a filtering method according to some embodiments of this specification;

[0021] Figure 13 is an exemplary flowchart of a filtering method according to other embodiments of this specification. Detailed Implementation

[0022] To more clearly illustrate the technical solutions of the embodiments in this specification, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are merely some examples or embodiments of this specification. For those skilled in the art, these drawings can be applied to other similar scenarios without creative effort. Unless obvious from the context or otherwise specified, the same reference numerals in the drawings represent the same structures or operations.

[0023] It should be understood that the terms “system,” “device,” “unit,” and / or “module” used herein are one way to distinguish different components, elements, parts, sections, or assemblies at different levels. However, if other terms can achieve the same purpose, they may be replaced by other expressions.

[0024] Flowcharts are used in this specification to illustrate the operations performed by the system according to embodiments of this specification. It should be understood that the preceding or following operations are not necessarily performed in exact order. Instead, the steps can be processed in reverse order or simultaneously. Furthermore, other operations can be added to these processes, or one or more steps can be removed from them.

[0025] Figure 1 is a schematic diagram of a filtration system shown in some embodiments.

[0026] In some embodiments, the flexibility of filtration systems makes them widely applicable to industrial processes. For example, applications of filtration systems may include, but are not limited to, wafer polishing, chemical product manufacturing, and biopharmaceutical processing. The key function of a filtration system is to maintain the purity of the fluid medium, preventing the introduction of particulate matter and contaminants, thereby ensuring the quality and performance of the final product.

[0027] In some embodiments, as shown in FIG1, liquid enters the liquid supply and filtration unit 110 through the inlet, and the liquid supply and filtration unit 110 can filter the liquid entering the liquid-using device 120. In the liquid supply and filtration unit 110, the liquid passes through the filter element, which can effectively remove impurities such as solid particles, suspended matter, colloidal particles, bacteria, and viruses, ensuring that the liquid meets the predetermined purity standard. After filtration, the liquid then flows into the liquid-using device 120 and is discharged through the outlet of the liquid-using device 120, thereby completing the liquid filtration operation.

[0028] For more information on the liquid supply and filtration unit, liquid application equipment, inlet, and outlet, please refer to Figure 2 and its related description.

[0029] In some embodiments of this specification, the application scenario of double-sided wafer polishing is used as an example for illustrative purposes. The purpose of polishing is to improve the smoothness and flatness of the double-sided wafer surface through chemical and mechanical actions to meet the requirements of subsequent process steps. The use of polishing slurry during the polishing process helps to provide the necessary chemical etching and lubrication effects. Oxidants are used to etch the wafer surface to form an oxide layer, while abrasives are used to remove these oxide layers through mechanical action, thereby achieving smoothing of the double-sided wafer surface.

[0030] In some embodiments, during the double-sided wafer polishing process, using a filtration system to filter the polishing slurry can effectively remove small particles such as residues, oxides, and abrasive agglomerates from the liquid. If these particles are not effectively removed, they will reduce the quality of the polishing slurry, affecting polishing efficiency and the surface quality of the double-sided wafer. Therefore, filtration can ensure the cleanliness of the polishing slurry, maintain its stability and performance, and prevent defects such as scratches and contamination from appearing on the surface of the double-sided wafer.

[0031] In some embodiments, the filtration system used in double-sided wafer polishing typically employs a single liquid supply filtration method, which is insufficient to handle complex production environments, especially in precision machining industries such as semiconductor and optical polishing. The liquid supply filtration unit requires cleaning, which can lead to interruptions in the liquid supply. Currently, a single liquid supply filtration method cannot ensure the continuity and efficiency of liquid filtration.

[0032] Therefore, it is desirable to provide a filtration system and method that not only maintains the cleanliness and performance of the liquid supply filtration unit, but also avoids liquid supply interruptions that may occur during cleaning in the filtration process, thereby improving the operating efficiency and reliability of the entire filtration system.

[0033] Figure 2 is a schematic diagram of a filtration system according to some embodiments of this specification.

[0034] In some embodiments, as shown in FIG2, the filtration system 200 includes a liquid supply filtration unit 210 (a first liquid supply filtration unit 210-1 and a second liquid supply filtration unit 210-2), a cleaning unit 220, and a controller 230, etc.

[0035] The liquid supply filtration unit 210 is a device for filtering liquids to remove impurities and ensure the purity of the liquids.

[0036] In some embodiments, the liquid supply filtration unit 210 is configured to be in an active state or a dormant state. When the liquid supply filtration unit 210 is in an active state, it filters the liquid supplied to the liquid supply device 240; when the liquid supply filtration unit 210 is in a dormant state, it stops filtering the liquid supplied to the liquid supply device 240.

[0037] The active state refers to the state in which the liquid supply filtration unit 210 is performing its predetermined function. For example, in the active state, the filtration system operates normally, and the liquid passes through the filter medium to remove impurities, ensuring that the quality of the liquid flowing into the liquid-using equipment 240 meets the process requirements.

[0038] Filter media refers to materials used in the filtration process that can intercept solid particles and other impurities while allowing liquids to pass through. For example, filter media may include, but are not limited to, non-woven fabrics, filter paper, and glass fibers. In some embodiments, filter media may also refer to filter elements in a filter unit or filter.

[0039] Liquid refers to the working fluid in a filtration system, that is, the fluid that needs to be purified by the filter medium, such as polishing fluid.

[0040] The dormant state refers to the state in which the liquid supply filtration unit 210 temporarily stops its filtration function. For example, in the dormant state, the filtration system does not perform liquid filtration operations.

[0041] In some embodiments, the controller can determine whether the liquid supply filter unit 210 is in an active or dormant state through various methods. In some embodiments, the controller can determine the active liquid supply filter unit at preset intervals based on the filtration effect of different liquid supply filter units. For example, the controller can determine the state of the liquid supply filter unit with better filtration effect as active, and other liquid supply filter units as dormant. The preset interval can be set based on historical experience.

[0042] Filtration performance refers to the ability of a liquid supply filtration unit to remove impurities from a liquid.

[0043] In some embodiments, the controller can determine the filtration effect by the difference between the pressure sensing data at the inlet of the liquid supply filter unit and the pressure sensing data at the inlet of the liquid-using device at the most recent sampling time, and the difference between the liquid supply flow rate data at the inlet of the liquid supply filter unit and the flow rate sensing data at the inlet of the liquid-using device. A larger difference in pressure sensing data and a smaller difference in flow rate data between the liquid supply filter unit and the inlet of the liquid-using device indicate a better filtration effect of the corresponding liquid supply filter unit. In some embodiments, impurity particles increase the flow resistance of the liquid, leading to an increase in pressure in the pipeline, i.e., an increase in liquid pressure. A larger difference in pressure sensing data before and after filtration indicates that more impurity particles in the liquid are filtered out, and a better filtration effect.

[0044] In some embodiments, the number of liquid supply filtration units 210 is not less than two. For example, the number of liquid supply filtration units may include two, three, etc. The number of liquid supply filtration units 210 can be preset according to actual needs.

[0045] In some embodiments, as shown in FIG2, the liquid supply filtration unit 210 includes a first liquid supply filtration unit 210-1 and a second liquid supply filtration unit 210-2. In some embodiments, the first liquid supply filtration unit 210-1 and the second liquid supply filtration unit 210-2 are two liquid supply filtration units that can perform filtration respectively, and their states can be switched. For example, in response to the better filtration effect of the first filtration unit 210-1, the controller can determine the state of the first filtration unit 210-1 as active and the state of the second liquid supply filtration unit 210-2 as dormant.

[0046] In some embodiments of this specification, by configuring multiple liquid supply filtration units, when the filtration effect of one liquid supply filtration unit is poor or needs cleaning or maintenance due to blockage or other reasons, the liquid supply filtration unit can be put into a dormant state, while other liquid supply filtration units are put into an active state, thereby ensuring that the filtration system does not need to be shut down and maintaining a continuous production process.

[0047] In some embodiments, the liquid supply filtration unit 210 may include at least one liquid supply filter.

[0048] A liquid supply filter is a device used to purify impurities in a liquid during the liquid supply process. Examples of liquid supply filters include, but are not limited to, filter elements and filter housings.

[0049] In some embodiments, the liquid supply filtration unit 210 may include at least one different liquid supply filter. The filter element size, filtration accuracy, and filter material of the different liquid supply filters may be the same or different. The first liquid supply filtration unit 210-1 and the second liquid supply filtration unit 210-2 may each include different or the same liquid supply filter.

[0050] In some embodiments, the number of liquid supply filters included in the liquid supply filtration unit 210, as well as the filter element size, filtration accuracy, and filter element material of the liquid supply filters, can be preset according to actual needs. By configuring multiple liquid supply filters with different filter element sizes, multiple filtrations of residual foreign matter in the liquid can be achieved, thereby improving the filtration quality. For example, the liquid supply filtration unit sequentially includes one 40μm filter element and two 20μm filter elements. The liquid can first pass through the 40μm filter element and then be further filtered through the 20μm filter elements.

[0051] Liquid-using equipment 240 refers to equipment that requires the use of a liquid medium during operation. For example, liquid-using equipment 240 may include, but is not limited to, various types of mechanical equipment. For instance, liquid-using equipment 240 may be various polishing equipment (e.g., double-sided chemical mechanical polishing (CMP) equipment) for polishing various products (e.g., wafers).

[0052] In some embodiments, the liquid application device 240 includes a wafer polishing apparatus. A wafer polishing apparatus is a mechanical device used for surface treatment of wafers to improve their appearance, dimensional accuracy, or surface properties. Wafer polishing apparatus requires the use of coolants, lubricants, or other liquids to assist the polishing process; therefore, a filtration system is needed to remove impurities from the liquid to prevent damage to the product surface or to affect the polishing effect.

[0053] The inlet port refers to the point where liquid enters each device in the filtration system.

[0054] The outlet refers to the point at which the liquid leaves the various devices in the filtration system after being treated or filtered.

[0055] The inlet and outlet can be equipped with valves or other control devices to regulate or shut off the flow of liquid.

[0056] In some embodiments, the inlet and outlet can be as shown in Figure 2, such as the inlet and outlet of the first liquid supply filter unit 210-1 and the second liquid supply filter unit 210-2, and the inlet and outlet of the liquid-using device 240.

[0057] The cleaning unit 220 refers to a device for cleaning components in the filtration system that are in a dormant state. For example, the cleaning unit 220 includes, but is not limited to, spray equipment, drying equipment, cleaning pressure sensors, solenoid valves, etc.

[0058] In some embodiments, the cleaning unit 220 may include multiple cleaning units, and different cleaning units may clean different liquid supply filters, etc.

[0059] In some embodiments, the number of cleaning units may be related to the number of liquid supply filter units. For example, multiple cleaning units may correspond one-to-one with the liquid supply filter in each liquid supply filter unit.

[0060] In some embodiments, a cleaning unit may correspond to different cleaning pressure sensors, solenoid valves, etc.

[0061] Spraying equipment may include, but is not limited to, high-pressure spray guns and fan-shaped nozzles. Drying equipment may include, but is not limited to, infrared dryers and rotary dryers.

[0062] Controller 230 refers to a device capable of processing information and / or data related to the filtering system. For example, controller 230 may include, but is not limited to, a central processing unit, an input / output module, a communication module, etc. By way of example only, controller 230 may be a PLC controller, etc.

[0063] In some embodiments, the controller 230 may further include a storage device. A storage device refers to an apparatus for storing information and / or data related to the filtering system. In some embodiments, the storage device may include random access memory (RAM), read-only memory (ROM), removable memory, and any combination thereof.

[0064] In some embodiments, the controller 230 is configured to control the cleaning unit 220 to clean the liquid supply filter unit 210, which is in a dormant state. Further details regarding this embodiment can be found in FIG12 and its related description.

[0065] In some embodiments, the liquid supply filtration unit includes a first liquid supply filtration unit in an active state and a second liquid supply filtration unit in a dormant state. The controller is further configured to: switch the first liquid supply filtration unit from an active state to a dormant state in response to a first preset condition being met; and switch the second liquid supply filtration unit from a dormant state to an active state.

[0066] In some embodiments, the description mainly uses a first liquid supply filter unit in an active state and a second liquid supply filter unit in a dormant state as examples. The states of different liquid supply filter units may be different at different times. For example, the second liquid supply filter unit may be in an active state while the first liquid supply filter unit is in a dormant state. This is not a limitation.

[0067] In some embodiments, when the number of liquid supply filter units is greater than two, for example, the liquid supply filter units include a first liquid supply filter unit in an active state and other liquid supply filter units in a dormant state. As an example, the other liquid supply filter units in a dormant state may be a second liquid supply filter unit in a dormant state and a third liquid supply filter unit in a dormant state. When the controller switches the states of the aforementioned three liquid supply filter units, it can switch the first liquid supply filter unit in an active state to a dormant state, and switch one of the second and third liquid supply filter units in a dormant state to an active state.

[0068] Liquid supply pressure data refers to the pressure data of the liquid flow in the supply pipeline of the first liquid supply filter unit in an active state. Liquid supply pressure data reflects the status of the liquid supply filter unit. The filter media may become clogged with solid particles and impurities, increasing resistance as the liquid flows through, or there may be malfunctions, such as reduced efficiency of the liquid supply pump or valves not fully opening. In such cases, it is necessary to increase the liquid supply pressure to maintain the flow rate. For example, a high liquid supply pressure may indicate that the current liquid supply filter unit is clogged and / or malfunctioning, requiring timely cleaning, inspection, and other treatments.

[0069] Liquid supply pipelines refer to the connecting pipes inside the liquid supply filtration unit.

[0070] In some embodiments, one or more pressure sensors are provided in the liquid supply pipe of the first liquid supply filtration unit in the activated state, and the controller can use the pressure data collected by the aforementioned one or more pressure sensors as the liquid supply pressure data.

[0071] In some embodiments, the pressure sensor may be installed at the outlet and / or inlet of the liquid supply filter unit.

[0072] The first preset condition refers to the condition used to determine whether it is necessary to switch the state of the liquid supply filter unit. For example, the first preset condition can be that the liquid supply pressure data is less than or equal to a first preset threshold.

[0073] The first preset threshold can be set by a professional technician or by the system default. For example, the first preset threshold could be 2 bars.

[0074] In some embodiments, the first preset condition can be obtained based on prior experience.

[0075] In some embodiments, the controller may also determine a first preset condition based on the liquid supply flow rate data of the liquid supply filtration unit and equipment parameters, etc. For more details, please refer to Figure 4 and its related description.

[0076] In some embodiments, in response to the supply pressure data of the first liquid supply filter unit not meeting a first preset condition, the controller can switch the first liquid supply filter unit from an active state to a dormant state by closing all supply valves in the active first liquid supply filter unit (e.g., the supply valves at the inlet and outlet of the active first liquid supply filter unit). Simultaneously, the controller can open all supply valves in the dormant second liquid supply filter unit (e.g., the supply valves at the inlet and outlet of the dormant second liquid supply filter unit) to switch the second liquid supply filter unit from a dormant state to an active state.

[0077] In some embodiments, in response to the first liquid supply filter unit switching from an active state to a dormant state, the controller 230 can control the cleaning unit 220 to clean the first liquid supply filter unit, and then clean it for continued use next time.

[0078] In some embodiments, the state switching process of the first liquid supply filtration unit and the second liquid supply filtration unit is a continuous and repetitive process, which can ensure the stable operation of the liquid supply filtration unit and the long-term maintenance of filtration efficiency, so as to achieve high efficiency and continuous operation of the filtration system.

[0079] In some embodiments of this specification, in response to the fact that the supply pressure data of the first liquid supply filter unit currently in the active state does not meet the first preset condition, the first liquid supply filter unit may have problems such as blockage or failure. The filtration system automatically switches the first liquid supply filter unit from the active state to the dormant state through the controller; and switches the second liquid supply filter unit from the dormant state to the active state, thereby realizing uninterrupted filtration service and ensuring filtration efficiency.

[0080] In some embodiments, the controller 230 is further configured to: stop the cleaning unit 220 from cleaning the liquid supply filter unit 210 in the dormant state in response to the cleaning pressure data of the liquid supply filter unit 210 in the dormant state not meeting a third preset condition.

[0081] Cleaning pressure data refers to data used to characterize the liquid pressure status of the cleaning unit 220 during the cleaning process.

[0082] In some embodiments, the cleaning unit 220 is provided with a cleaning pressure sensor, and the controller 230 can use the pressure data collected by multiple cleaning pressure sensors as cleaning pressure data.

[0083] In some embodiments, the cleaning pressure sensor may be installed at the inlet and / or outlet of the cleaning unit.

[0084] The third preset condition refers to the condition used to determine whether the cleaning unit should stop the cleaning operation. For example, the third preset condition can be that multiple cleaning pressure data are all less than or equal to the cleaning pressure threshold.

[0085] In some embodiments, cleaning pressure data can reflect the working status and cleaning effect of the cleaning unit. When the cleaning pressure data monitored by the cleaning pressure sensor is less than or equal to the cleaning pressure threshold, it indicates that the cleaning effect has been achieved, the resistance of the filtration system has decreased, or the cleaning unit has completed the predetermined cleaning cycle, and further cleaning may no longer be necessary. Therefore, by monitoring the cleaning pressure data and comparing it with the cleaning pressure threshold, if multiple cleaning pressure data meet a third preset condition, it will be determined that the cleaning operation can be stopped, thereby improving the intelligence level of the filtration system.

[0086] The cleaning pressure threshold can be set by a professional technician or by the system default. For example, the third preset threshold is 0.8 bar or 0.6 bar, etc.

[0087] In some embodiments, the third preset condition can be obtained based on prior experience.

[0088] In some embodiments, if the cleaning pressure data of the liquid supply filter unit 210 in a dormant state does not meet a third preset condition, it indicates that the cleaning of the liquid supply filter unit 210 has met the preset requirements, and cleaning can be stopped. After cleaning is stopped, the controller 230 can control the drainage of water from the filter element of the liquid supply filter in the liquid supply filter unit 210 to ensure that the liquid subsequently passing through the liquid supply filter unit is not diluted. After the water in the filter element of the liquid supply filter is completely drained and the pressure sensor drops to 0, the drain solenoid valve is closed. At this time, the liquid supply filter of the liquid supply filter unit 210 has completed cleaning and is ready for subsequent use.

[0089] In some embodiments, when the liquid supply filtration unit 210 includes at least one liquid supply filter, the third preset condition may include at least one third sub-condition corresponding to the at least one liquid supply filter. The controller 230 may determine at least one third sub-condition based on the device parameters and usage data of the at least one liquid supply filter.

[0090] The third sub-condition refers to the condition used to determine whether the liquid supply filter needs to be stopped for cleaning. One liquid supply filter can correspond to one third sub-condition. Different liquid supply filters may have the same or different third sub-conditions.

[0091] Equipment parameters refer to data describing the configuration, specifications, etc., of each device in the filtration system. In some embodiments, equipment parameters may include at least one of filter element size, filtration accuracy, and filter element material. Equipment parameters may include parameters of the liquid supply filtration unit, the liquid return filtration unit, the liquid supply filter, and the liquid return filter, etc.

[0092] Filter element size refers to the physical dimensions of the filter element. For example, filter element size includes, but is not limited to, the length, height, and width of the filter element.

[0093] Filtration accuracy is an important parameter used to measure the filtration capacity of a device, and it is related to or corresponds to the pore diameter of the filter element. Filtration accuracy is usually described in micrometers (μm). In some embodiments, filtration accuracy can be equated to the pore diameter of the filter element. The higher the filtration accuracy, the smaller the particles the filter element can intercept.

[0094] Filter material refers to the materials used to manufacture filter elements. For example, filter materials include, but are not limited to, polypropylene, polyester, stainless steel, cellulose, ceramic, activated carbon, etc.

[0095] In some embodiments, the controller 230 can determine device parameters by querying product manuals or similar documents pre-stored in a storage device. For example, the controller 230 can determine the device parameters of different liquid supply filters by querying product manuals for liquid supply filters pre-stored in the storage device.

[0096] Usage data refers to information related to the operation and maintenance of each device in the filtration system. For example, usage data for a liquid supply filter may include at least one of the following: the service life of the liquid supply filter, the cleaning interval, and operating condition information during use.

[0097] Service life refers to the length of time a liquid supply filter or its components (e.g., filter cartridges) has been in use since installation. Service life can be used to determine whether a liquid supply filter or its components are nearing the end of their expected lifespan, and thus whether replacement or maintenance is necessary.

[0098] The cleaning interval refers to the length of time between two cleaning operations of the liquid supply filter or its components.

[0099] Operating condition information during use refers to the distribution of sensor data (e.g., temperature data, flow rate data, etc.) when the liquid supply filter or its components are working. As an example, using a liquid supply filter A as an example, the operating condition information during the use of filter A could be: Over a one-year service period, the filter element operates for 20% of the time at a "liquid supply temperature of 20℃ and a liquid supply flow rate of 1L / min", 30% of the time at a "liquid supply temperature of 23℃ and a liquid supply flow rate of 2L / min", and 50% of the time at a "liquid supply temperature of 18℃ and a liquid supply flow rate of 0.9L / min". This can be represented in the form of ((20℃, 1L / min, 20%), (23℃, 2L / min, 30%), (18℃, 0.9L / min, 50%). Here, 20%, 30%, and 50% represent the proportion of time spent using the corresponding operating condition information. 20℃, 23℃, and 18℃ represent the liquid supply temperature data under the corresponding operating conditions. 1L / min, 2L / min, and 0.9L / min represent the liquid supply flow rate data under the corresponding operating conditions.

[0100] Liquid supply temperature data refers to the temperature data collected by multiple temperature sensors installed on multiple liquid supply filters in the liquid supply filtration unit when it is in an active state.

[0101] Liquid supply flow rate data refers to the flow rate of liquid during liquid supply.

[0102] In some embodiments, multiple flow sensors may be installed in the liquid supply pipeline, and the average value of the flow data collected by the aforementioned flow sensors shall be used as the liquid supply flow data.

[0103] For more information on the liquid supply flow rate data, please refer to Figure 4 and its related description.

[0104] In some embodiments, the controller can acquire usage data in various ways. For example, the controller can obtain the service life from the usage data based on the current time and the time of commissioning. Another example is that the controller can determine the cleaning time interval from the usage data based on the time interval between two consecutive openings of the solenoid valve of the cleaning unit corresponding to the liquid supply filter. Yet another example is that the controller can perform statistical analysis based on the collected liquid supply temperature data to obtain operating condition information during the usage process from the usage data.

[0105] In some embodiments, the controller can determine a third sub-condition for different liquid supply filters based on their device parameters and usage data. For example, the controller constructs a correlation curve by analyzing historical cleaning intervals and cleaning pressure threshold data for different liquid supply filters. The controller selects historical liquid supply filters with high similarity to the current liquid supply filter in terms of service life, filter element size, etc. Using the aforementioned correlation curve and the cleaning interval of the current liquid supply filter, the controller determines the adjustment amount for the cleaning pressure threshold corresponding to the current liquid supply filter. The controller can adjust the cleaning pressure threshold of the current liquid supply filter based on the adjustment amount, thereby determining the third sub-condition for that liquid supply filter. For example, the third sub-condition for the current liquid supply filter may be that the cleaning pressure data is less than or equal to the adjusted cleaning pressure threshold.

[0106] Historical supply filters refer to multiple supply filters in historical data.

[0107] A correlation curve is a curve used to characterize the relationship between the historical liquid supply filter's cleaning interval and the cleaning pressure threshold. The horizontal axis of the correlation curve represents the historical liquid supply filter's cleaning interval, and the vertical axis represents the historical liquid supply filter's cleaning pressure threshold at that cleaning interval.

[0108] In some embodiments, the controller can record the cleaning pressure threshold corresponding to each historical liquid supply filter at the aforementioned cleaning time interval, and use the cleaning pressure threshold as a numerical point. In response to collecting a sufficient number of numerical points, for example, if the number of numerical points is greater than a preset number threshold, the controller sorts all numerical points in ascending order according to the duration of the corresponding cleaning time interval, connects the numerical points in pairs, and thus forms a correlation curve.

[0109] Similarity is a numerical value used to characterize whether the current liquid supply filter is similar to the historical liquid supply filters.

[0110] In some embodiments, the controller can calculate the cosine distance between the current operating condition information of the liquid supply filter and the historical operating condition information of the liquid supply filter, and use the reciprocal of the aforementioned cosine distance as the similarity.

[0111] In some embodiments, the controller finds a corresponding numerical point with the same cleaning time interval as the current liquid supply filter based on the correlation curve of the historical liquid supply filter. The controller compares the cleaning pressure threshold corresponding to the numerical point with the initial cleaning pressure value of the historical liquid supply filter and calculates the difference between the two. The difference is then used as the adjustment amount for the cleaning pressure threshold of the liquid supply filter.

[0112] The initial cleaning pressure value refers to the pressure reading when technicians determine that the liquid supply filter has reached a clean state during the initial cleaning of the historical liquid supply filter.

[0113] In some embodiments of this specification, the controller determines a third sub-condition based on the device parameters and usage data of the liquid supply filter, enabling the setting of a more precise cleaning pressure threshold for each liquid supply filter. This helps to improve cleaning effectiveness while avoiding resource waste.

[0114] In some embodiments of this specification, the controller cleans the liquid supply filter unit and monitors its cleaning pressure data while the unit is in a dormant state. If the cleaning pressure data does not meet a third preset condition, the controller stops the cleaning operation, resulting in a cleaned liquid supply filter unit ready for use. Timely stopping of the cleaning operation avoids unnecessary cleaning processes, saves resources, and improves cleaning efficiency.

[0115] For more information on the liquid supply filtration unit 210, the liquid supply filter, the liquid application device 240, the liquid inlet, the liquid outlet, the cleaning unit 220, and the controller 230, please refer to Figures 3-13 and their related descriptions.

[0116] In some embodiments, the filtration system may further include a return unit. The return unit includes a return valve. The return valve is disposed between the liquid-using device and the liquid supply filtration unit 210. The controller is further configured to: in response to a return pressure data exceeding a preset return pressure threshold, open the return valve to deliver liquid back to the liquid supply filtration unit 210 for repeated filtration of the liquid.

[0117] A return unit is a device that returns the liquid before it enters the liquid-using equipment to the supply filtration unit for further filtration. The structure and working principle of the return unit are similar to those of the supply filtration unit, and will not be described in detail here.

[0118] In some embodiments, the return unit may further include a return pump. The structure and working principle of the return pump can be similar to those of the supply pump, and will not be described in detail here.

[0119] A return valve is a device used to control the return of liquid before it enters the liquid-using equipment to the inlet of the liquid supply and filtration unit. The outlet of the return valve is connected to the inlet of the liquid supply and filtration unit via a pipe, while the inlet is connected to the pipe between the inlet of the liquid-using equipment and the outlet of the liquid supply and filtration unit 210. When the return valve is open, the return pump starts, and the liquid returns to the inlet of the liquid supply and filtration unit through the pipe under the action of the return pump, thus achieving repeated filtration of the liquid.

[0120] Backflow pressure data refers to the monitored liquid pressure value in the pipeline between the inlet of the liquid-using equipment and the outlet of the liquid supply and filtration unit.

[0121] In some embodiments, a pressure sensor is installed on the pipe between the inlet of the return valve and the outlet of the liquid supply filter unit. The controller can use the pressure data on the pipe between the inlet of the return valve and the outlet of the liquid supply filter unit as the return pressure data.

[0122] In some embodiments, the controller can also obtain a preset return pressure threshold through methods such as clustering. For example, the controller can obtain multiple first clustering vectors corresponding to different historical times and obtain a first target vector. The controller clusters the multiple first clustering vectors and the first target vector to obtain a first cluster. The controller determines the preset return pressure threshold based on the actual return pressure threshold corresponding to the first clustering vector in the first cluster where the first target vector is located.

[0123] The first cluster vector reflects the following information for the corresponding historical time: equipment parameters, pipeline parameters, and wafer parameters of multiple liquid supply filters in the liquid supply filtration unit. The first cluster vector also corresponds to the actual return pressure threshold for the corresponding historical time.

[0124] In some embodiments, the first target vector reflects the following information at the current time: device parameters, piping parameters, and wafer parameters of the multiple liquid supply filters in the liquid supply filtration unit. For details regarding the piping parameters, wafer parameters, etc., please refer to the relevant description in Figure 6.

[0125] In some embodiments, the controller may cluster multiple first clustering vectors and a first target vector based on a clustering algorithm to obtain multiple first clusters.

[0126] In some embodiments, the controller can cluster multiple first clustering vectors and a first target vector to obtain two or more first clusters. For example, the controller can perform cluster analysis on historical data of the wafer polishing equipment at multiple different historical time points and the first target vector to obtain two or more first clusters.

[0127] In some embodiments, the controller may select a first cluster containing a first target vector, and determine a preset return pressure threshold based on the actual return pressure threshold corresponding to the first cluster vector in the first cluster that has a better subsequent processing effect. For example, the actual return pressure threshold corresponding to the first cluster vector in the first cluster that has a better subsequent processing effect may be used as the preset return pressure threshold, or the average value of the actual return pressure thresholds corresponding to the first cluster vectors in the first cluster that have a better subsequent processing effect may be used as the preset return pressure threshold.

[0128] The subsequent processing effect can be determined by weighting the impurity content and filtration time of the liquid flowing out of the liquid-using equipment. The weight values ​​can be preset according to actual needs. The controller identifies and determines the impurity content and filtration time in the liquid by statistically analyzing the impurity content (e.g., obtained by sampling and analysis by professional technicians) and filtration time of the liquid flowing out of the liquid-using equipment, thereby determining the subsequent processing effect.

[0129] In some embodiments, when the liquid flowing from the outlet of the liquid supply and filtration unit has a high impurity content, the interaction between impurity particles and the friction between the impurities and the pipe may increase the liquid flow resistance, thereby increasing the pressure in the pipe between the liquid supply device and the liquid supply and filtration unit. Therefore, when the return pressure data is greater than a preset return pressure threshold, it indicates that the impurity content in the liquid is high. At this time, the controller can control the return valve to open, thereby allowing the liquid to flow back to the inlet of the liquid supply and filtration unit for further filtration. In some embodiments, when it is determined based on the return pressure data that the impurity content in the liquid is high, it can be further assumed that the impurities in the liquid can pass through the filter pores on the filter element of the current liquid supply and filtration unit, indicating that the particle size of the impurities is smaller than the diameter of the filter pores. At this time, the controller can control the return valve to open and further switch the liquid supply and filtration unit to use a filter element with a smaller pore diameter to further filter the liquid, thereby filtering out the smaller particle size impurities.

[0130] In some embodiments of this specification, during the process of liquid flowing into the liquid-using equipment after being filtered by the liquid supply filtration unit, a return liquid unit is added and the return liquid flow rate data is obtained. In response to the return liquid pressure data being greater than the preset return liquid pressure threshold, the liquid is returned to the inlet of the liquid supply filtration unit for further filtration. This helps to ensure the quality of the liquid entering the liquid-using equipment, thereby ensuring the quality of the processed products.

[0131] In some embodiments of this specification, the liquid supply filtration unit is designed to switch between an active state and a dormant state, ensuring the continuity and efficiency of liquid filtration. In the active state, the filtration system can effectively filter the liquid supplied to the liquid-using equipment. In the dormant state, the filtration system stops filtration, and the controller simultaneously controls the cleaning unit to clean the liquid supply filtration unit in the dormant state. This not only maintains the cleanliness and performance of the liquid supply filtration unit but also avoids potential interruptions in liquid supply caused by cleaning during filtration, thereby improving the overall operating efficiency and reliability of the filtration system.

[0132] Figure 3 is a schematic diagram of a filtration system according to some other embodiments of this specification.

[0133] In some embodiments, as shown in FIG3, the filtration system 300 includes a liquid supply filtration unit 210 (first liquid supply filtration unit 210-1, second liquid supply filtration unit 210-2), a cleaning unit 220, and a controller 230, as well as a liquid supply container 310, a liquid supply pump 320, a liquid return container 330, a liquid return pump 340, and a liquid return filtration unit 350 (first liquid return filtration unit 350-1, second liquid return filtration unit 350-2).

[0134] In some embodiments, the connection relationship between the cleaning unit and the return liquid filtration unit / return liquid filter is similar to that of the supply liquid filtration unit / supply liquid filter, and will not be described again here.

[0135] In some embodiments, in addition to the plurality of cleaning units in FIG2 that correspond one-to-one with the liquid supply filters in each liquid supply filtration unit, the cleaning unit also includes a plurality of cleaning units that correspond one-to-one with the liquid return filters in each liquid return filtration unit.

[0136] For more information on the liquid supply filtration unit 210, the cleaning unit 220, and the controller 230, please refer to Figure 2 and its related description.

[0137] The liquid return filtration unit 350 refers to a device for filtering liquid recovered from the liquid-using device 240. In some embodiments, as shown in FIG3, the liquid return filtration unit 350 has an inlet and an outlet; more details about the inlet and outlet can be found in FIG2 and its related description.

[0138] In some embodiments, the return liquid filtration unit 350 may further include at least one different return liquid filter. The filter element size, filtration accuracy, and filter material of the different return liquid filters may be the same or different. The first return liquid filtration unit 350-1 and the second return liquid filtration unit 350-2 may each include different or the same return liquid filter.

[0139] In some embodiments, the number of return liquid filters included in the return liquid filtration unit 350, as well as the filter element size, filtration accuracy, and filter element material of the return liquid filters, can be preset according to actual needs. By configuring multiple return liquid filters with different filter element sizes, multiple filtrations of residual foreign matter in the liquid can be achieved, thereby improving the filtration quality. For example, the return liquid filtration unit sequentially includes a return liquid filter with an 80μm filter element and a return liquid filter with a 40μm filter element. The liquid can first pass through the return liquid filter with the 80μm filter element, and then pass through the return liquid filter with the 40μm filter element for further filtration.

[0140] A liquid return filter is a device used to purify the medium in a liquid during the liquid return process. For example, a liquid return filter includes, but is not limited to, filter elements and filter housings.

[0141] In some embodiments, the return liquid filtration unit 350 is configured to be in an active state or a dormant state; wherein, when the return liquid filtration unit 350 is in the active state, it filters the liquid from the self-use liquid recovery device 240, and when the return liquid filtration unit 350 is in the dormant state, it stops filtering the liquid from the self-use liquid recovery device 240. For more information on the active and dormant states, please refer to Figure 2 and its related description.

[0142] In some embodiments, the controller 230 is further configured to control the cleaning unit 220 to clean the return liquid filter unit 350, which is in a dormant state. For more details on this embodiment, please refer to FIG13 and its related description.

[0143] In some embodiments, the number of liquid return filtration units 350 is not less than two. For example, the number of liquid return filtration units 350 may include two, three, etc. The number of liquid return filtration units 350 can be preset according to actual needs.

[0144] In some embodiments, as shown in FIG3, the return liquid filtration unit 350 includes a first return liquid filtration unit 350-1 and a second return liquid filtration unit 350-2. In some embodiments, the first return liquid filtration unit 350-1 and the second return liquid filtration unit 350-2 are two return liquid filtration units that can perform filtration respectively, and their states can be switched. The state switching method is similar to the state switching method of the supply liquid filter, as shown in FIG2 and its related description.

[0145] In some embodiments of this specification, by configuring multiple return liquid filtration units, when one return liquid filtration unit needs cleaning or maintenance due to blockage or other reasons, it can be immediately switched to another return liquid filtration unit, thereby ensuring that the filtration system does not need to be shut down and maintaining a continuous production process.

[0146] In some embodiments, as shown in FIG3, the return liquid filtration unit includes a first return liquid filtration unit in an active state and a second return liquid filtration unit in a dormant state. In some embodiments, the first return liquid filtration unit in an active state and the second return liquid filtration unit in a dormant state are mainly used as examples for description. At different points in time, the states of different return liquid filtration units may be different. For example, the second return liquid filtration unit may be in an active state and the first return liquid filtration unit may be in a dormant state, etc., which is not limited here.

[0147] In some embodiments, the controller is further configured to: switch the first return liquid filter unit from an active state to a dormant state in response to the return liquid pressure data of the first return liquid filter unit not meeting a second preset condition; and switch the second return liquid filter unit from a dormant state to an active state.

[0148] In some embodiments, when the number of return liquid filter units is greater than two, for example, the return liquid filter units include a first return liquid filter unit in an active state and other return liquid filter units in a dormant state. As an example, the other return liquid filter units in a dormant state may be a second return liquid filter unit in a dormant state and a third return liquid filter unit in a dormant state. When the controller switches the states of the aforementioned three return liquid filter units, it can switch the first return liquid filter unit in the active state to a dormant state, and switch one of the second or third return liquid filter units in the dormant state to an active state.

[0149] Return pressure data refers to the pressure value of liquid flowing in the return pipeline.

[0150] The return liquid pipeline refers to the connecting pipe inside the return liquid filtration unit.

[0151] In some embodiments, one or more pressure sensors are provided in the return pipeline, and the controller can use the pressure data collected by the aforementioned one or more pressure sensors as the return pressure data.

[0152] In some embodiments, the pressure sensor may be installed at the outlet and / or inlet of the return liquid filtration unit.

[0153] The second preset condition refers to the condition used to determine whether the state of the return liquid filter unit 350 needs to be switched. For example, the second preset condition can be that the return liquid pressure data is less than or equal to a second preset threshold.

[0154] The second preset threshold can be set by a professional technician or by the system default. For example, the second preset threshold could be 2 bars.

[0155] In some embodiments, the second preset condition can be obtained based on prior experience.

[0156] For more information on determining the second preset condition, please refer to Figures 5 and 6 and their related descriptions.

[0157] In some embodiments, in response to the return pressure data of the first return fluid filter unit not meeting a second preset condition, the controller closes all return fluid valves in the active first return fluid filter unit (e.g., the return fluid valves at the inlet and outlet of the active first return fluid filter unit), thereby switching the first return fluid filter unit from an active state to a dormant state. Simultaneously, the controller opens all return fluid valves in the dormant second return fluid filter unit (e.g., the return fluid valves at the inlet and outlet of the dormant second return fluid filter unit), thereby switching the second return fluid filter unit from a dormant state to an active state. In some embodiments, in response to the aforementioned switch of the first return fluid filter unit from an active state to a dormant state, the controller can control a cleaning unit to clean the first return fluid filter unit, preparing it for future use.

[0158] In some embodiments, the process of switching between the state of the first return liquid filtration unit and the second return liquid filtration unit is a continuous and repetitive process, which can ensure the stable operation of the return liquid filtration unit and the long-term maintenance of filtration efficiency, so as to achieve high efficiency and continuous operation of the filtration system.

[0159] In some embodiments of this specification, if the controller responds to the fact that the return pressure data of the first return filter unit, which is currently in an active state, does not meet the second preset condition, then the first return filter unit may have problems such as blockage or malfunction. The filtration system automatically switches the second return filter unit, which is in a dormant state, to an active state through the controller, thereby achieving uninterrupted filtration service and ensuring filtration efficiency.

[0160] In some embodiments of this specification, the return liquid filtration unit can be configured to switch between an active state and a dormant state. When the return liquid filtration unit is in the active state, it can effectively filter the liquid from the self-use liquid recycling equipment, ensuring the cleanliness of the recycled liquid. When the return liquid filtration unit is in the dormant state, the filtration operation can be stopped, thereby saving energy and extending the service life of the filtration unit. Furthermore, the controller configuration enables the cleaning unit to clean the return liquid filtration unit in the dormant state, not only preventing contamination of the return liquid filtration unit when it is not in operation, but also ensuring that the return liquid filtration unit can immediately restore its high-efficiency filtration performance when it re-enters the active state, thereby improving the overall operating efficiency of the filtration system.

[0161] In some embodiments, the filtration system further includes a supply pump 320, a return pump 340, a supply container 310, and a return container 330, etc.

[0162] In some embodiments, as shown in FIG3, the outlet of the liquid supply container 310 is connected to the inlet of the liquid supply filter unit 210 through the liquid supply pump 320, the outlet of the liquid supply filter unit 210 is connected to the inlet of the liquid application device 240, the outlet of the liquid application device 240 is connected to the inlet of the return container 330, the outlet of the return container 330 is connected to the inlet of the return filter unit 350 through the return pump 340, and the outlet of the return filter unit 350 is connected to the inlet of the liquid supply container 310.

[0163] Liquid supply container 310 refers to a container used for storing and supplying liquids. Liquid supply container 310 typically has an inlet and an outlet to facilitate the supply of liquid to liquid-using equipment, and the liquid filtered by return filter unit 350 can flow back into liquid supply container 310 to maintain the recycling of liquid.

[0164] In some embodiments, the shape and size of the liquid supply container 310 can be designed according to actual needs. For example, the liquid supply container 310 can be designed as a liquid supply tank.

[0165] The liquid supply pump 320 refers to a pumping device used to draw liquid from the liquid supply container 310 and deliver it to the liquid supply filter unit 210.

[0166] The return container 330 refers to a container used for recovering and storing liquids from the liquid-using device 240 after use.

[0167] In some embodiments, the shape and size of the return container 330 can be designed according to actual needs. For example, the return container 330 can be designed as a return tank.

[0168] The return pump 340 refers to a pumping device used to extract liquid from the return container 330 after use by the liquid-using equipment 240 and deliver it to the return filter unit 350.

[0169] In some embodiments, the outlet of the liquid supply container 310 is connected to the inlet of the liquid supply filter unit 210 via a liquid supply pump 320, ensuring that the liquid is delivered to the liquid supply filter unit 210 for preliminary filtration under the action of the liquid supply pump. The filtered liquid flows from the outlet of the liquid supply filter unit 210 into the inlet of the liquid-using device 240, providing clean liquid for production or process flow. After use, the liquid in the liquid-using device 240 is discharged through the outlet and flows into the inlet of the return container 330. The outlet of the return container 330 is connected to the inlet of the return filter unit 350 via a return pump 340, allowing the liquid to enter the return filter unit 350 for further filtration under the action of the return pump 340. The liquid, after being filtered again by the return filter unit 350, flows back to the inlet of the liquid supply container 310, completing the entire cycle. The above filtration process is guided by the controller 230 through the opening and closing of the valves to direct the flow of liquid and control the state of the liquid supply filtration unit 210 and / or the liquid return filtration unit 350. In turn, the controller 220 controls the cleaning unit 220 to clean the liquid supply filtration unit 210 and / or the liquid return filtration unit 350 in the dormant state, ensuring that the liquid remains clean throughout the entire circulation process and realizing the closed-loop filtration operation of the filtration system.

[0170] In some embodiments of this specification, the interconnected design of the filtration system enables efficient liquid recycling, significantly reducing liquid waste and replacement frequency. The dual protection provided by the supply and return filtration units ensures the consistency and cleanliness of the liquid used in the equipment, thereby improving the performance and lifespan of the wafer polishing equipment. Furthermore, the smooth circulation design of the filtration system simplifies the operation process, reduces maintenance costs, and makes the entire liquid circulation process—from the supply container to the equipment and back—smoother and more efficient.

[0171] Figure 4 is a schematic diagram illustrating the determination of the first preset condition according to some embodiments of this specification.

[0172] In some embodiments, the controller is further configured to determine a first preset condition 440 based on the liquid supply flow data 410 of the liquid supply filtration unit and the device parameters 420.

[0173] For more information on liquid supply flow data, equipment parameters, and the first preset condition, please refer to Figure 2 and its related description.

[0174] In some embodiments, the controller may determine the first preset condition 440 in various ways based on the liquid supply flow rate data 410 of the liquid supply filtration unit and the device parameters 420. For example, the first preset condition 440 may be determined by a skilled technician through prior experiments.

[0175] In some embodiments, the controller may determine the first preset condition 440 in various ways at preset intervals, based on the liquid supply flow rate data 410 of the liquid supply filter unit and the device parameters 420. For example, the controller may construct a first feature vector based on the liquid supply flow rate data 410 of the liquid supply filter unit and the device parameters 420, and search in the first vector database 430 based on the first feature vector to determine the first preset threshold in the first preset condition 440.

[0176] The first vector database 430 is a database used to determine the first preset condition. In some embodiments, the first vector database 430 includes a plurality of first reference vectors and a reference first preset threshold corresponding to each first reference vector.

[0177] In some embodiments, the controller can construct a first reference vector based on historical data and determine a first historical preset threshold that meets a preset selection criterion as a reference first preset threshold corresponding to the first reference vector. For example, the preset selection criterion can be a first historical preset threshold corresponding to a low impurity content in the liquid during multiple processing processes corresponding to a set of historical liquid supply flow data and historical equipment parameters in the selected historical data, as the reference first preset threshold corresponding to the first reference vector. The controller identifies and determines the impurity content in the liquid by statistically analyzing the liquid impurity content data in each processing process (e.g., obtained by sampling and analysis by professional technicians), thereby determining the lower impurity content in the processing process.

[0178] In some embodiments, the controller can determine a first preset threshold by calculating the similarity between multiple first reference vectors and a first feature vector, respectively. For example, the controller can use multiple first reference vectors whose similarity to the first feature vector satisfies a first similarity condition as multiple second target vectors, and use the average of multiple reference first preset thresholds corresponding to the multiple second target vectors as the first preset threshold. The first similarity condition can be determined as needed. For example, the first similarity condition could be that the similarity is greater than a first similarity threshold.

[0179] In some embodiments, the similarity between the first reference vector and the first feature vector can be negatively correlated with the vector distance between the first reference vector and the first feature vector, and the vector distance can be determined based on cosine distance, etc. For example, the similarity can be the reciprocal of the vector distance.

[0180] In some embodiments, the preset period, the first similarity threshold, etc., can be set by professional technicians or by system default.

[0181] In some embodiments of this specification, by dynamically determining the first preset condition (i.e., the first preset threshold corresponding to the switching state of the liquid supply filtration unit) at preset intervals, it is beneficial to improve the accuracy of the determined first preset condition, save the resources of the cleaning unit, and also ensure that the liquid supply filtration unit does not work under overload conditions.

[0182] Figure 5 is a schematic diagram illustrating the determination of the second preset condition according to some embodiments of this specification.

[0183] In some embodiments, the controller is further configured to determine a second preset condition 540 based on the return flow rate data 510 of the return liquid filtration unit and the device parameters 520.

[0184] Based on the preceding text, equipment parameters 420 and 520 are similar, as shown in Figure 2 and its related description. The difference lies in that equipment parameter 420 corresponds to the liquid supply filtration unit, while equipment parameter 520 corresponds to the liquid return filtration unit.

[0185] In some embodiments, the controller may determine the second preset condition 540 in various ways based on the return flow rate data 510 of the return liquid filtration unit and the device parameters 520. For example, the second preset condition 540 may be determined by a skilled technician through prior experiments.

[0186] Return flow rate data refers to the flow rate of liquid during the return process.

[0187] In some embodiments, multiple flow sensors are installed in the return pipeline, and the controller can use the average value of the flow data collected by the aforementioned flow sensors as the return flow data.

[0188] In some embodiments, the controller can determine the second preset condition 540 in various ways at preset intervals, based on the return flow rate data 510 of the return liquid filtration unit and the device parameters 520. For example, the controller can construct a second feature vector based on the return flow rate data 510 of the return liquid filtration unit and the device parameters 520, and then search in the second vector database 530 based on the second feature vector to determine the second preset threshold corresponding to the second preset condition 540.

[0189] The second vector database 530 is a database used to determine the second preset condition. In some embodiments, the second vector database 530 includes a plurality of second reference vectors and a second preset threshold corresponding to the reference second preset condition for each second reference vector.

[0190] In some embodiments, the controller can construct a second reference vector based on historical data and determine a second historical preset threshold that meets a preset selection criterion as the second preset threshold corresponding to the second reference vector. For example, the preset selection criterion can be a second preset threshold corresponding to a low impurity content in the liquid during multiple processing processes corresponding to a set of historical return flow data and historical equipment parameters in the historical data, as a reference second preset threshold corresponding to the second reference vector.

[0191] In some embodiments, the controller can calculate the similarity between multiple second reference vectors and second feature vectors respectively, and determine a second preset threshold. For example, the controller can use multiple second reference vectors whose similarity with the second feature vectors satisfies the second similarity condition as multiple third target vectors, and use the average of multiple second preset thresholds corresponding to the multiple third target vectors as the second preset threshold. The second similarity condition can be determined as needed. For example, the second similarity condition can be that the similarity is greater than the second similarity threshold.

[0192] In some embodiments, the similarity between the second reference vector and the second feature vector can be negatively correlated with the vector distance between the second reference vector and the second feature vector, and the vector distance can be determined based on cosine distance, etc. For example, the similarity can be the reciprocal of the vector distance.

[0193] In some embodiments, the second similarity threshold may be set by a professional technician or by system default.

[0194] For more information on determining the second preset condition, please refer to Figure 6 and its related description.

[0195] In some embodiments of this specification, by dynamically determining the second preset threshold corresponding to the switching state of the return liquid filtration unit within a preset period, it is beneficial to save the resources of the cleaning unit and also ensure that the return liquid filtration unit does not work under overload conditions.

[0196] Figure 6 is an exemplary flowchart illustrating the determination of a second preset condition according to other embodiments of this specification. As shown in Figure 6, process 600 may include the following steps. Process 600 may be executed by a controller.

[0197] In some embodiments, the first preset condition is updated periodically based on a preset period. The controller is further configured to determine whether the difference between the first preset condition in the current preset period and the first preset condition in the previous preset period meets a difference condition. In response to the first preset condition in the current preset period meeting the difference condition (yes), the controller is further configured to: determine predicted return flow data based on the liquid supply flow rate data and liquid supply pressure data of the liquid supply filtration unit; and determine a second preset condition based on the predicted return flow rate data.

[0198] For more information regarding the first preset condition, controller, liquid supply filter unit, liquid supply flow rate data, and liquid supply pressure data, please refer to Figure 2 and its related description. For more information regarding the second preset condition, please refer to Figure 3 and its related description.

[0199] The preset period is the time interval for updating the first preset condition. The current preset period refers to the period between the current time and the last time the first preset condition was updated, where the time interval is less than the corresponding time interval of the preset period. The previous preset period refers to the period within one time interval prior to the last time the first preset condition was updated.

[0200] The difference condition refers to the condition used to determine whether the change of the first preset threshold is significant between the current preset period and the previous preset period. For example, the difference condition can be that the absolute value of the difference between the first preset threshold corresponding to the current preset period and the first preset threshold corresponding to the previous preset period is greater than a preset difference threshold.

[0201] The difference conditions and preset difference thresholds can be set by professional technicians or by system defaults. For example, the preset difference threshold could be 20% of the first preset threshold determined within the current preset period.

[0202] In some embodiments, in response to the difference between the first preset condition in the current preset period and the first preset condition in the previous preset period satisfying the difference condition, the controller executes steps 610 and 620.

[0203] The gap refers to the difference between the first preset conditions corresponding to the two preset periods mentioned above.

[0204] Step 610: Determine the predicted return flow rate based on the liquid supply flow rate data and liquid supply pressure data of the liquid supply filtration unit.

[0205] Predicted return flow rate data refers to the return flow rate data at a future time point corresponding to the current time point at which a first preset threshold is determined.

[0206] In some embodiments, the controller can determine the predicted return flow rate data based on the supply flow rate data and supply pressure data of the supply filtration unit through various methods. For example, the controller can acquire two or more second cluster vectors corresponding to different historical times and acquire a fourth target vector. The controller clusters the two or more second cluster vectors and the fourth target vector to obtain two or more second clusters. The controller determines the predicted return flow rate data based on the return flow rate data corresponding to the second cluster vector in the second cluster where the fourth target vector is located. The clustering can be based on a clustering algorithm, which may include, but is not limited to, the K-Means algorithm.

[0207] The second cluster vector reflects the following information for the corresponding historical time: liquid supply flow rate data and liquid supply pressure data. In some embodiments, the second cluster vector corresponds to the return flow rate data of the active return filtration unit for the corresponding historical time.

[0208] In some embodiments, the second clustering vector may further include at least one of historical pipeline parameters, wafer parameters, etc.

[0209] Pipeline parameters refer to the physical characteristics associated with pipelines (e.g., supply pipelines, return pipelines). For example, pipeline parameters include, but are not limited to, pipeline material and pipeline length.

[0210] Wafer parameters refer to parameters related to wafer specifications. For example, wafer parameters include, but are not limited to, wafer dimensions.

[0211] In some embodiments, the controller can obtain pre-stored pipeline parameters and wafer parameters, etc., through a storage device.

[0212] In some embodiments, the controller can acquire multiple sets of data from multiple different historical time points from historical data. Each set of data includes data such as fluid supply flow rate, fluid supply pressure, pipeline parameters, and wafer parameters at a historical time point. The controller can construct a second cluster vector for each historical time point based on each set of data. The aforementioned historical time point can be the first historical time point among the historical time points.

[0213] In some embodiments, the second clustering vector corresponds to the return flow rate data of the return filtration unit that is in an active state at the second historical time point in the corresponding historical time point.

[0214] The second historical point in time refers to the point in time after the first historical point in time.

[0215] In some embodiments, the controller may, in the processing process (such as the wafer polishing process) corresponding to the second clustering vector, after collecting the liquid supply flow rate data and liquid supply pressure data within a preset time period, use the actual return liquid flow rate data in the return liquid pipeline as historical return liquid flow rate data.

[0216] In some embodiments, the fourth target vector reflects the following information at the current time: liquid supply flow rate data and liquid supply pressure data of the liquid supply filtration unit.

[0217] In some embodiments, the controller can construct a fourth target vector based on real-time liquid flow rate data and liquid pressure data.

[0218] In some embodiments, the controller may also construct a fourth target vector based on real-time liquid flow rate data, liquid pressure data, pipeline parameters, and wafer parameters.

[0219] A cluster is a set of data vectors that are grouped together using a clustering algorithm.

[0220] For more information on determining the predicted return flow rate data, please refer to Figure 7 and its related description.

[0221] In some embodiments, the controller may cluster two or more second clustering vectors and a fourth target vector based on a clustering algorithm to obtain two or more second clusters.

[0222] In some embodiments, the controller can cluster two or more second clustering vectors and a fourth target vector to obtain two or more second clusters. For example, the controller can perform cluster analysis on historical data of the wafer polishing equipment at multiple different historical time points and the fourth target vector to obtain two or more second clusters. Each second clustering vector includes the liquid supply flow rate data, liquid supply pressure data, pipeline parameters, and wafer parameters at that historical time point. The fourth target vector includes the liquid supply flow rate data, liquid supply pressure data, pipeline parameters, and wafer parameters at the real-time time point.

[0223] In some embodiments, the controller can use the historical return flow rate data corresponding to the second cluster vector in the second cluster containing the fourth target vector to help determine the predicted return flow rate data, thereby optimizing subsequent filtration efficiency and product quality. For example, the controller can select the second cluster containing the fourth target vector and use the average value of the predicted return flow rate data corresponding to the second cluster vector in the second cluster at the second historical time point as the predicted return flow rate data.

[0224] Step 620: Determine the second preset condition based on the predicted return flow rate data.

[0225] In some embodiments, the controller may replace the return flow rate data with the predicted return flow rate data and determine the second preset conditions through the second vector database. For more details, please refer to Figure 5 and its related description.

[0226] In some embodiments, after determining the second preset condition, the controller can adjust the second preset condition in advance.

[0227] In some embodiments, in response to the fact that the difference between the first preset condition in the current preset period and the first preset condition in the previous preset period does not meet the difference condition, the controller may still determine the second preset condition through the second vector database at preset intervals, based on the return flow data of the return liquid filtration unit and the device parameters.

[0228] In some embodiments of this specification, in response to the difference between the first preset condition in the current preset period and the first preset condition in the previous preset period satisfying the difference condition, the second preset condition is adjusted in advance to effectively avoid the timing of adjusting the second threshold being different from the timing of significant changes in the liquid supply flow rate data and liquid supply pressure data, thus ensuring the timeliness of the second preset threshold adjustment, thereby improving the response speed and stability of the filtration system and optimizing the overall performance of the filtration system.

[0229] Figure 7 is an exemplary flowchart illustrating the determination of predicted return flow data according to some embodiments of this specification. As shown in Figure 7, process 700 may include the following steps. Process 700 can be executed by a controller.

[0230] In some embodiments, in response to the liquid application device including a wafer polishing device, the liquid supply filtration unit including two or more liquid supply filters, and the liquid return filtration unit including two or more liquid return filters, the controller is further configured to: acquire two or more clustering vectors corresponding to different historical times; acquire a target vector; cluster the two or more clustering vectors and the target vector to obtain two or more clusters; and determine the predicted liquid return flow data based on the liquid return flow data corresponding to the clustering vector in the cluster where the target vector is located.

[0231] For more information on liquid handling equipment, liquid supply filtration units, liquid supply filters, liquid return filtration units, and liquid return filters, please refer to Figure 2 and its related descriptions.

[0232] Step 710: Obtain two or more clustering vectors corresponding to different historical times.

[0233] The clustering vector at this point can also be called the third clustering vector, which will be explained below.

[0234] Historical time refers to a preset period of the past, which can be set by professional technicians or by the system default.

[0235] In some embodiments, the clustering vector reflects the following information corresponding to a historical time: a first filter pattern, a second filter pattern, liquid supply flow rate data of the active liquid supply filter unit, liquid supply pressure data, pipeline parameters, and wafer parameters, etc. In some embodiments, the clustering vector corresponds to the return flow rate data of the active return liquid filter unit at a corresponding historical time.

[0236] For more information on activation status, liquid supply filtration unit, liquid supply flow rate data, liquid supply pressure data, and return liquid filtration unit, please refer to Figure 2 and its related description. For more information on return liquid flow rate data, please refer to Figure 5 and its related description. For more information on pipeline parameters and wafer parameters, please refer to Figure 6 and its related description.

[0237] The first filtration map is a knowledge graph used to characterize the distribution and properties of each liquid supply filter in an activated liquid supply filtration unit. More information about the first filtration map can be found in Figure 8 and its related description.

[0238] The second filtration map is a knowledge graph used to characterize the distribution and properties of each return liquid filter in an activated return liquid filtration unit. More information about the second filtration map can be found in Figure 9 and its related description.

[0239] In some embodiments, the controller can acquire multiple sets of data from multiple different historical time points from historical data. Each set of data includes a first filter profile, a second filter profile, liquid supply flow rate data, liquid supply pressure data, pipeline parameters, and wafer parameters for a historical time point. The controller can construct a clustering vector for each historical time point based on each set of data. The aforementioned historical time point can be the first historical time point among historical time points.

[0240] In some embodiments, the clustering vector corresponds to the return flow rate data of the return filtration unit that is in an active state at the second historical time point in the corresponding historical time point.

[0241] Step 720: Obtain the target vector.

[0242] The target vector at this point can also be called the fifth target vector, which will be explained below.

[0243] In some embodiments, the fifth target vector reflects the following information at the current time: a first filter profile, a second filter profile, liquid supply flow rate data of the activated liquid supply filter unit, liquid supply pressure data, pipeline parameters, and wafer parameters.

[0244] In some embodiments, the controller can construct a fifth target vector based on the first filter profile, the second filter profile, the liquid supply flow rate data, the liquid supply pressure data, the pipeline parameters, and the wafer parameters at real-time points.

[0245] Step 730: Cluster the two or more clustering vectors and the target vector to obtain two or more clusters.

[0246] In some embodiments, the controller can cluster two or more third cluster vectors and a fifth target vector based on a clustering algorithm to obtain two or more clusters. The clustering algorithm may include, but is not limited to, the K-Means algorithm.

[0247] In some embodiments, the controller can cluster two or more clustering vectors and a fifth target vector to obtain two or more clusters. For example, the controller can perform cluster analysis on historical data of the wafer polishing equipment at multiple different historical time points and the fifth target vector to obtain two or more clusters. Each clustering vector includes a first filter profile, a second filter profile, liquid supply flow rate data and liquid supply pressure data of the liquid supply filter unit in the active state, pipeline parameters, and wafer parameters at that historical time point. The fifth target vector includes the first filter profile, the second filter profile, liquid supply flow rate data, liquid supply pressure data, pipeline parameters, and wafer parameters at the real-time time point.

[0248] In some embodiments, the first and second filter maps can be represented as vectors. For example, the controller can use a machine learning model such as a graph convolutional neural network to perform graph embedding processing on the first or second filter map to obtain the vector representation of the map. The liquid supply flow rate data, liquid supply pressure data, pipe parameters, and wafer parameters of the activated liquid supply filter unit can also be encoded or processed into vectors. The controller can obtain a third clustering vector by concatenating or superimposing these vectors.

[0249] In some embodiments, the processing method for the fifth target vector is similar to that for the third clustering vector, and will not be repeated here.

[0250] Step 740: Determine the predicted return flow rate data based on the return flow rate data corresponding to the cluster vector in the cluster where the target vector is located.

[0251] In some embodiments, the controller can use the return flow rate data corresponding to historical cluster vectors in the cluster containing the fifth target vector to help determine the predicted return flow rate data, thereby optimizing subsequent filtration efficiency and product quality. For example, the controller can select the cluster containing the fifth target vector and use the average value of the predicted return flow rate data corresponding to the cluster vectors in the cluster at the second historical time point as the predicted return flow rate data.

[0252] In some embodiments, in response to the supply filter unit including a supply filter and / or the return filter unit including a return filter, both the supply filter and / or the return filter are in an active state, and the controller can determine the predicted return flow rate data based on the aforementioned steps 710 to 740.

[0253] In some embodiments of this specification, the performance of the supply and return filters can be monitored by acquiring and analyzing clustering vectors from different historical time points. The controller classifies the clustering vectors from historical time points and the fifth target vector at the current time point using a clustering algorithm. Based on the return flow rate data corresponding to the clustering vectors in the cluster containing the fifth target vector, it determines the predicted return flow rate data. This optimizes liquid circulation efficiency, reduces resource waste, improves product quality and consistency, and achieves a more stable and reliable production process. Furthermore, introducing a first and second filter map during clustering takes into account the connection relationships between the various supply and / or return filters, thereby improving the accuracy of the prediction.

[0254] Figure 8 is a schematic diagram of a first filter pattern according to some embodiments of this specification.

[0255] In some embodiments, as shown in FIG8, liquid can flow from the supply container 310 into the supply filter (e.g., supply filter 1, supply filter 2, supply filter 3, supply filter 4, etc.). The supply filter is a node of the first filtration pattern 800. The supply container 310 and the supply filter can be connected by a supply pipe.

[0256] For more information on the liquid supply filter and supply piping, please refer to Figure 2 and its related description. For more information on the liquid supply container, please refer to Figure 3 and its related description.

[0257] In some embodiments, the first filter graph 800 consists of at least one node and at least one edge, the edge connecting the node, and the node and edge having attributes.

[0258] In some embodiments, the nodes of the first filtration map 800 include the liquid supply filter nodes corresponding to each liquid supply filter in the activated liquid supply filtration unit. In some embodiments, when there is a pipe connection between two liquid supply filters, there is an edge between the liquid supply filter nodes corresponding to the two liquid supply filters.

[0259] In some embodiments, the edges of the first filter map 800 are directed edges, and the direction of the edges represents the connection direction between nodes (i.e., the direction of liquid flow). For example, the edge between liquid supply filter 1 and liquid supply filter 2 can represent that liquid supply filter 1 is the upstream node of the edge and liquid supply filter 2 is the downstream node of the edge, and liquid can flow from liquid supply filter 1 to liquid supply filter 2 through the liquid supply pipe.

[0260] In some embodiments, the features of the nodes of the first filtration pattern 800 can reflect the characteristics of the node. For example, the features of the nodes of the first filtration pattern 800 include, but are not limited to, the liquid supply pressure data, liquid supply temperature data, and equipment parameters of the corresponding liquid supply filter.

[0261] In some embodiments, the edges of the first filter pattern 800 and / or the second filter pattern 900 further include edge features; the edge features include one or more of the following information for the corresponding pipe: material, pressure, temperature data, and length. More details about the second filter pattern 900 can be found in the relevant description of Figure 9.

[0262] Material refers to the type of substance that makes up the pipe. For example, materials can include, but are not limited to, carbon steel, plastic, aluminum, and copper.

[0263] Pressure refers to the force acting on the inner wall of a pipe. In some embodiments, a pressure sensor is deployed in the pipe, and the controller can use the data measured by the pressure sensor as the pressure of the pipe.

[0264] Temperature data refers to the temperature of the pipeline. In some embodiments, a temperature sensor is deployed in the pipeline, and the controller can use the data measured by the temperature sensor as the temperature data of the pipeline.

[0265] Length refers to the distance between the two ends of a pipe. In some embodiments, the controller can obtain the lengths of different pipes that have been pre-stored through a storage device.

[0266] In some embodiments of this specification, by including one or more information such as the material, pressure, temperature data, and length of the corresponding pipe in the edge features, comprehensive monitoring and management of the pipe status can be achieved, thereby optimizing the performance and reliability of the filtration system.

[0267] In some embodiments, the controller constructs a first filtering graph 800 based on the aforementioned nodes, edges, node features, and edge features. For example, the controller can construct first filtering graphs corresponding to different historical times and current times based on the liquid supply filters at different historical times and current times, the liquid supply pressure data, liquid supply temperature data, equipment parameters of the liquid supply filters, and data such as the material, pressure, temperature, and length of the pipes.

[0268] In some embodiments, the first filtration map 800 may further include nodes corresponding to the liquid supply container. When there is a pipe connection between the liquid supply container and the liquid supply filter, there is an edge between the nodes of the liquid supply container and the nodes of the liquid supply filter.

[0269] In some embodiments, the characteristics of the nodes and edges of the liquid supply container are similar to the characteristics of the nodes and edges of the liquid supply filter.

[0270] Figure 9 is a schematic diagram of a second filter pattern according to some embodiments of this specification.

[0271] In some embodiments, as shown in FIG9, the liquid treated by the liquid application device can flow from the return container 330 into the return filter (e.g., return filter 1, return filter 2, return filter 3, return filter 4, etc.). The return filter is a node of the second filtration pattern 900. The return container 330 and the return filter can be connected by a return pipe.

[0272] For more information on return liquid filters, return liquid pipelines, and return liquid containers, please refer to Figure 3 and its related descriptions.

[0273] In some embodiments, the second filtering graph 900 consists of at least one node and at least one edge, the edge connecting the node, and the node and edge having attributes.

[0274] In some embodiments, the nodes of the second filtration map 900 include return liquid filter nodes corresponding to each return liquid filter in the activated return liquid filtration unit. In some embodiments, when there is a pipe connection between two return liquid filters, there is an edge between the return liquid filter nodes corresponding to the two return liquid filters.

[0275] In some embodiments, the edges of the second filter map 900 are directed edges, and the direction of the edges represents the connection direction between nodes (i.e., the direction of liquid flow). For example, the edge between return filter 1 and return filter 2 can represent that return filter 1 is the upstream node of the edge and return filter 2 is the downstream node of the edge, and liquid can flow from return filter 1 to return filter 2 through the return pipe.

[0276] In some embodiments, the features of the nodes in the second filtration profile 900 can reflect the characteristics of that node. For example, the features of the nodes in the second filtration profile 900 include, but are not limited to, return liquid pressure data, return liquid temperature data, and device parameters corresponding to the return liquid filter.

[0277] In some embodiments, the features of the edges of the second filter graph 900 are similar to the features of the edges of the first filter graph 800, as can be seen in Figure 8 and its related description.

[0278] In some embodiments, the second filtration map 900 may further include nodes corresponding to the return liquid container. When there is a pipe connection between the return liquid container and the return liquid filter, there is an edge between the nodes of the return liquid container and the nodes of the return liquid filter.

[0279] In some embodiments, the characteristics of the nodes and edges of the return container are similar to those of the nodes and edges of the return filter.

[0280] In some embodiments, the controller constructs a second filtering graph 900 based on the nodes, edges, node features, and edge features described above. The construction method of the second filtering graph 900 is similar to the filtering method of the first filtering graph 800, as shown in Figure 8 and its related description.

[0281] Figure 10 is a schematic diagram of a filtration system according to some other embodiments of this specification.

[0282] In some embodiments, the liquid supply filtration unit includes two or more liquid supply filters (e.g., liquid supply filter 211-1, filter 211-2, liquid supply filter 211-3, etc.), and / or the liquid return filtration unit includes two or more liquid return filters (e.g., liquid return filter 351-1, liquid return filter 351-2, etc.). The controller 230 is further configured to: control at least some of the liquid supply filters in the activated liquid supply filtration unit to be in an activated state for liquid filtration based on preset filtration parameters, and / or control at least some of the liquid return filters in the activated liquid return filtration unit to be in an activated state for liquid filtration. As an example, at least one of the liquid supply filters 211-1, 211-2, and 211-3 is in an activated state.

[0283] For more information on the liquid supply filtration unit, liquid supply filter, controller, and activation status, please refer to Figure 2 and its related description. For more information on the liquid return filtration unit and liquid return filter, please refer to Figure 3 and its related description.

[0284] Preset filtration parameters refer to parameters used to guide or control the operation of the supply filtration unit and / or return filtration unit.

[0285] In some embodiments, the preset filtration parameters include the status configuration values ​​of each liquid supply filter in the liquid supply filtration unit in the active state, and / or the status configuration values ​​of each liquid return filter in the liquid return filtration unit in the active state.

[0286] A status configuration value describes the operating status of a supply filter or return filter. In some embodiments, the status configuration value indicates whether its corresponding supply filter or return filter is active. For example, the status configuration value can be represented by a numerical value. As an example only, 1 indicates that the supply filter or return filter is active, and 0 indicates that the supply filter or return filter is dormant.

[0287] In some embodiments, each supply filter or return filter may correspond to a status configuration value.

[0288] In some embodiments, the controller can open the valve corresponding to the liquid supply filter or the liquid return filter that is in an active state. The liquid flows into the liquid-using device after being filtered by the liquid supply filter that is in an active state, and then flows from the liquid-using device to the liquid return filter for filtration again.

[0289] In some embodiments, the preset filtering parameters can be determined in a variety of ways. For example, the preset filtering parameters can be determined by a professional technician based on prior experience.

[0290] In some embodiments, the controller is further configured to: determine preset filtration parameters based on the supply pressure data, supply temperature data, and equipment parameters of two or more supply filters in the activated supply filtration unit, and / or the return pressure data, return temperature data, and equipment parameters of two or more return filters in the activated return filtration unit.

[0291] In some embodiments, the controller may determine preset filtration parameters by querying a first preset relationship table based on the supply pressure data, supply temperature data, and equipment parameters of two or more supply filters in the activated supply filtration unit, and / or the return pressure data, return temperature data, and equipment parameters of two or more return filters in the activated return filtration unit.

[0292] In some embodiments, the first preset relationship table may include the correspondence between preset filtration parameters and the liquid supply pressure data, liquid supply temperature data, and equipment parameters of two or more liquid supply filters in the activated liquid supply filtration unit, the liquid return pressure data, liquid return temperature data, and equipment parameters of two or more liquid return filters in the activated liquid return filtration unit, and preset filtration parameters. In some embodiments, the first preset relationship table may be determined based on historical data of the liquid supply pressure data, liquid supply temperature data, and equipment parameters of two or more liquid supply filters in the activated liquid supply filtration unit, the liquid return pressure data, liquid return temperature data, and equipment parameters of two or more liquid return filters in the activated liquid return filtration unit, and actual preset filtration parameters. In some embodiments, the first preset relationship table may be based on empirical presets.

[0293] In some embodiments, the controller may determine preset filtration parameters at preset intervals based on the supply pressure data, supply temperature data, and equipment parameters of two or more supply filters in the active supply filtration unit, and / or the return pressure data, return temperature data, and equipment parameters of two or more return filters in the active return filtration unit. If the preset filtration parameters differ for adjacent preset intervals, the preset filtration parameters are considered to have been adjusted.

[0294] In some embodiments of this specification, the controller determines preset filtration parameters based on the supply pressure data, supply temperature data, and equipment parameters of two or more supply filters in the activated supply filtration unit, and / or the return pressure data, return temperature data, and equipment parameters of two or more return filters in the activated return filtration unit. This enables some filters to operate, allowing the filtration system to dynamically adjust the operating filters based on real-time sensor data. This not only ensures the stability of the filtration effect but also achieves efficient resource utilization and reduces energy consumption and maintenance costs by intelligently allocating filtration tasks to some filters.

[0295] In some embodiments, in response to the liquid supply filtration unit including a liquid supply filter and / or the liquid return filtration unit including a liquid return filter, both the liquid supply filter and / or the liquid return filter are in an active state, and the controller can turn on the aforementioned liquid supply filter and / or liquid return filter to filter the liquid based on preset filtration parameters.

[0296] In some embodiments of this specification, by configuring a controller to manage the activation status of two or more supply filters and / or two or more return filters based on preset filtration parameters, the flexibility and reliability of liquid filtration are improved. This ensures continuous system operation during maintenance or failure of a single supply filter and / or return filter, optimizes filtration efficiency, and extends the service life of the supply filters and / or return filters. Furthermore, allowing two or more supply filters and / or two or more return filters to operate alternately avoids the limitations of single-size filter cartridges. If only large-size filter cartridges are used, small-particle impurities may not be effectively filtered. Conversely, if only small-size filter cartridges are used, large-particle impurities may cause clogging, resulting in poor filtration. Therefore, configuring a controller to control the activation status of two or more supply filters and / or two or more return filters based on preset filtration parameters helps improve filtration efficiency.

[0297] In some embodiments, the controller is further configured to: in response to an adjustment of preset filtration parameters, control the cleaning unit to clean the dormant supply filter and / or dormant return filter based on the adjusted preset filtration parameters. For example, the controller can control the cleaning unit corresponding to the supply filter and / or return filter that was previously in an active state but has now become dormant, and clean them.

[0298] In some embodiments, the controller can determine that the preset filtration parameters have been adjusted by controlling the opening or closing of the valves corresponding to different liquid supply filters of the activated liquid supply filtration unit.

[0299] In some embodiments of this specification, the controller is capable of responding to adjustments of preset filtration parameters and controlling the cleaning unit to clean the supply and / or return filters in a dormant state based on the adjusted preset filtration parameters. This ensures that any accumulated contaminants in the supply and / or return filters are cleaned in a timely manner before they are put back into operation, thereby avoiding the impact of contaminants on subsequent filtration performance and guaranteeing the continuous, efficient operation and long-term stability of the filtration system.

[0300] In some embodiments, as shown in FIG10, the filtration system 1000 includes two liquid supply filtration units, two liquid return filtration units, a controller 230, a liquid supply container 310, a liquid return container 330, a liquid supply pump 1050, a liquid return pump 1060, an L flow meter 1070, an F2 solenoid valve (e.g., solenoid valve 1010-1-solenoid valve 1010-17, etc.), a Y1 pressure sensor (e.g., pressure sensor 1020-1-pressure sensor 1020-10, etc.), an X wastewater interface (e.g., wastewater interface 1030-1-wastewater interface 1030-4, etc.), an M1 liquid supply pump 1050, an M2 liquid return pump 1060, and a cleaning unit corresponding to each liquid supply filter and / or liquid return filter. More details about the devices in the filtration system 1000 can be found in FIG2-9, FIG11-13, and their related descriptions.

[0301] In some embodiments, as shown in FIG10, each liquid supply filtration unit includes three liquid supply filters, such as liquid supply filter 211-1, liquid supply filter 211-2 and liquid supply filter 211-3 or liquid supply filter 211-4, liquid supply filter 211-5 and liquid supply filter 211-6. Each liquid return filtration unit includes two liquid return filters, such as liquid return filter 351-1 and liquid return filter 351-2 or liquid return filter 351-3 and liquid return filter 351-4, etc.

[0302] In some embodiments, taking the liquid supply filter 211-1 as an example, its corresponding cleaning unit includes a pressure sensor 1020-2, a solenoid valve 1010-3, a solenoid valve 1010-2, a wastewater interface 1030-1, and a cleaning fluid (e.g., distilled water) inlet interface DW1040-1. The configuration of the cleaning units corresponding to other liquid supply filters and / or return filters is similar to that of the cleaning unit corresponding to the liquid supply filter 211-1.

[0303] An electromagnetic valve is a device that uses electromagnetic force to open or close the valve.

[0304] The water inlet is a component that connects the cleaning fluid supply source to the relevant devices in the filtration system, and is used to introduce the cleaning fluid.

[0305] In some embodiments, the controller can connect to control pressure sensors and solenoid valves to acquire relevant sensing data (e.g., liquid supply pressure data). It can also control the opening and closing of the solenoid valves to control the status of related devices in the filtration system and to perform cleaning operations. For example, taking the liquid supply filter 211-1 as an example, the controller opens the cleaning circuit by controlling the opening of solenoid valves 1010-3 and 1010-2 to perform a cleaning operation. Then, the filter element in the liquid supply filter 211-1 is backflushed through the cleaning fluid inlet DW1040-1, thereby washing away impurities blocked by the filter pores. Finally, wastewater is discharged from the wastewater inlet 1030-1, completing the filtration operation.

[0306] In some embodiments, the filtration system includes an active first liquid supply filtration unit (e.g., the first liquid supply filtration units corresponding to liquid supply filters 211-1, 211-2, and 211-3) and a first return liquid filtration unit (e.g., the first return liquid filtration units corresponding to return liquid filters 351-1 and 351-2), and a dormant second liquid supply filtration unit (e.g., the second liquid supply filtration units corresponding to liquid supply filters 211-4, 211-5, and 211-6) and a second return liquid filtration unit (e.g., the second return liquid filtration units corresponding to return liquid filters 351-3 and 351-4). When the production start-up liquid-using equipment 240 is started, the liquid supply pump 1050 is started, and liquid enters the liquid-using equipment 240 from the liquid supply container 310 through the first liquid supply filtration unit, returns to the return liquid container 330, passes through the first return liquid filtration unit via the return liquid pump 1060, and returns to the liquid supply container 310. At this time, the solenoid valves of the first liquid supply filtration unit (e.g., the solenoid valves connected to liquid supply filters 211-1, 211-2, and 211-3) and the first liquid return filtration unit (e.g., the solenoid valves connected to liquid return filters 351-1 and 351-2) are in the open state, the solenoid valves of the second liquid supply filtration unit (e.g., the solenoid valves connected to liquid supply filters 211-4, 211-5, and 211-6) and the solenoid valves of the second liquid return unit (e.g., the solenoid valves connected to liquid return filters 351-3 and 351-4) are in the closed state, and the solenoid valves corresponding to the cleaning unit are in the closed state.

[0307] In some embodiments, when the supply pressure data corresponding to one pressure sensor in the first liquid supply filter unit exceeds a first preset threshold, all solenoid valves in the second liquid supply filter unit are opened, and the solenoid valves in the first liquid supply filter unit are closed. The cleaning unit then cleans the first supply unit. When the pressure sensor in the first liquid supply filter unit reaches the cleaning pressure threshold, the corresponding solenoid valve for distilled water is closed. After the water in the supply filter of the first liquid supply filter unit is drained and the pressure sensor reading drops to 0, the solenoid valve of the cleaning unit is closed. At this point, the supply filter in the first liquid supply filter unit has been cleaned and is ready for use. The operation and cleaning methods of the second liquid supply filter unit, the first return liquid filter unit, and the second return liquid filter unit are the same as those of the first liquid supply unit and will not be described again here.

[0308] Figure 11 is a schematic flowchart illustrating the determination of preset filtering parameters according to some embodiments of this specification. As shown in Figure 11, process 1100 may include the following steps. Process 1100 can be executed by a controller.

[0309] In some embodiments, the controller is further configured to: acquire a first filter map and / or a second filter map. Based on the first filter map and / or the second filter map, the controller determines preset filtering parameters through a parameter determination model.

[0310] Step 1110: Obtain the first filter map and / or the second filter map.

[0311] For more information on the first filter map, please refer to Figure 8 and its related description. For more information on the second filter map, please refer to Figure 9 and its related description.

[0312] Step 1120: Based on the first filter map and / or the second filter map, determine the preset filter parameters through the parameter determination model.

[0313] In some embodiments, when preset filtering parameters are determined simultaneously based on a first filter map and a second filter map, the controller can concatenate the first filter map and the second filter map into a single filter map. The controller can then determine the preset filtering parameters based on the concatenated filter map using a parameter determination model.

[0314] For more information on the preset filtering parameters, please refer to Figure 10 and its related description.

[0315] A parameter determination model refers to a model used to determine preset filtering parameters. In some embodiments, the parameter determination model can be a machine learning model, such as at least one or any combination of a graph neural network (GNN) model, a neural network (NN) model, etc.

[0316] In some embodiments, the parameter determination model can be trained based on a large number of labeled training samples. The controller can input multiple labeled training samples into the initial parameter determination model, construct a loss function based on the labels and the results of the initial parameter determination model, and iteratively update the initial parameter determination model based on the loss function. The model training is completed when preset conditions are met, resulting in a trained parameter determination model. These preset conditions may include loss function convergence, reaching a threshold number of iterations, etc.

[0317] In some embodiments, the training samples for determining the training parameters of the model can be the first filtration map of the sample supply filter in the activated sample supply filtration unit and the second filtration map of the sample return filter in the activated sample return filtration unit from historical sample data. The labels can be the preset filtration parameters actually used in the historical sample data.

[0318] In some embodiments, the controller may also use training samples with better filtering quality as the positive sample group and training samples with poorer filtering quality as the negative sample group to train the parameter determination model.

[0319] Good filtration quality means the impurity content of the liquid is below the preset impurity threshold. Poor filtration quality means the impurity content of the liquid is above or equal to the preset impurity threshold. The preset impurity threshold can be set by a professional technician or by system default.

[0320] In some embodiments, the impurity content in the liquid can be determined by professional technicians through sampling and analysis.

[0321] In some embodiments, the controller may also determine a preset impurity threshold in various ways based on the size of the product (e.g., a wafer, etc.). For example, the preset impurity threshold may be set by a skilled technician or by system default. Another example is that the preset impurity threshold may be positively correlated with the size of the product.

[0322] In some embodiments of this specification, the larger the size of the product, the more impurities may be generated during the processing. In this case, the original impurity content in the liquid needs to be low to ensure the polishing effect.

[0323] In some embodiments of this specification, the controller determines preset filtration parameters by acquiring a first filtration profile and / or a second filtration profile and inputting it into a parameter determination model. This helps the filtration system automatically adjust the preset filtration parameters according to actual operating conditions, thereby optimizing filtration efficiency. The controller's determination of preset filtration parameters based on the first and / or second filtration profiles also considers the connection relationship between the supply filter and / or return filter. It can comprehensively consider sensor data from both the return pipeline and the supply pipeline, further improving the accuracy of determining the preset filtration parameters.

[0324] Figure 12 is an exemplary flowchart of a filtering method according to some embodiments of this specification.

[0325] As shown in Figure 12, process 1200 may include the following steps. Process 1200 can be executed by a controller.

[0326] In some embodiments, the filtration system further includes a liquid supply filtration unit and a cleaning unit. The liquid supply filtration unit is configured to be in an active state or a dormant state. When the liquid supply filtration unit is in the active state, it filters the liquid supplied to the liquid-using device; when the liquid supply filtration unit is in the dormant state, it stops filtering the liquid supplied to the liquid-using device. The filtration method includes controlling the cleaning unit to clean the liquid supply filtration unit when it is in the dormant state.

[0327] For information on the liquid filtration unit, cleaning unit, activation state, and dormancy state, please refer to Figure 2 and its related descriptions.

[0328] Step 1210: Control the cleaning unit to clean the liquid supply filter unit that is in a dormant state.

[0329] In some embodiments, the filtration system opens the valve corresponding to the cleaning unit via a controller and controls the cleaning unit to clean the liquid supply filter unit, which is in a dormant state. The cleaning process includes activating a spray device to flush the liquid supply filter unit with cleaning fluid to remove impurities and deposits, thereby maintaining filtration efficiency without shutting down the system.

[0330] Cleaning fluid refers to a liquid used to remove impurities and deposits. For example, cleaning fluid can be distilled water (DW), etc.

[0331] In some embodiments of this specification, the cleaning unit is controlled by the controller to clean the liquid supply filter unit when it is in a dormant state. This can maintain the cleanliness and filtration efficiency of the liquid supply filter unit without affecting normal liquid supply filtration operation, avoid filtration system shutdown caused by blockage or contamination of the liquid supply filter unit, and improve the operational stability of the filtration system.

[0332] In some embodiments, the liquid supply filtration unit includes a first liquid supply filtration unit in an active state and a second liquid supply filtration unit in a dormant state. The filtration method further includes: switching the first liquid supply filtration unit from an active state to a dormant state in response to a first preset condition being met; and switching the second liquid supply filtration unit from a dormant state to an active state.

[0333] In some embodiments, the controller may determine whether the liquid supply pressure data of the first liquid supply filter unit meets a first preset condition. In response to the first liquid supply filter unit not meeting the first preset condition (no), the controller executes steps 1220 and 1230.

[0334] Step 1220: Switch the first liquid supply filtration unit from the active state to the dormant state.

[0335] Step 1230: Switch the second liquid supply filtration unit from dormant state to active state.

[0336] For more information on steps 1220 and 1230, please refer to Figure 2 and its related description.

[0337] In some embodiments of this specification, by monitoring the liquid supply pressure data of the first liquid supply filter unit, and when the first preset condition is not met, the first liquid supply filter unit is switched from an active state to a dormant state, while the second liquid supply filter unit is switched from a dormant state to an active state, thereby ensuring the continuity and stability of liquid filtration.

[0338] In some embodiments, the filtering method may further include step 1240.

[0339] Step 1240: In response to the fact that the cleaning pressure data of the liquid supply filter unit in the dormant state does not meet the third preset condition, the cleaning unit stops cleaning the liquid supply filter unit in the dormant state.

[0340] For more information on step 1240, please refer to Figure 2 and its related description.

[0341] In some embodiments of this specification, when the liquid supply filter unit is in a dormant state, the controller monitors the cleaning pressure data of the dormant liquid supply filter unit and stops the cleaning unit operation when the pressure does not meet a third preset condition, thus obtaining a cleaned liquid supply filter unit for later use. Timely stopping of the cleaning operation avoids unnecessary cleaning processes, saves resources, and ensures the efficiency of the cleaning process.

[0342] Figure 13 is an exemplary flowchart of a filtering method according to other embodiments of this specification.

[0343] As shown in Figure 13, process 1300 may include the following steps. Process 1300 can be executed by a controller.

[0344] In some embodiments, the filtration system further includes a liquid return filtration unit. The liquid return filtration unit is configured to be in an active state or a dormant state. When the liquid return filtration unit is in the active state, it filters the liquid recovered from the liquid-using device; when the liquid return filtration unit is in the dormant state, it stops filtering the liquid recovered from the liquid-using device. The filtration method further includes controlling a cleaning unit to clean the liquid return filtration unit in the dormant state.

[0345] For more information on the return liquid filtration unit, active state, dormant state, and cleaning unit, please refer to Figure 2 and its related description.

[0346] Step 1310: Control the cleaning unit to clean the return liquid filter unit that is in a dormant state.

[0347] The cleaning process is similar to step 1210 above, as shown in Figure 12 and its related description.

[0348] In some embodiments of this specification, the cleaning unit is controlled by the controller to clean the return liquid filter unit when it is in a dormant state. This can maintain the cleanliness and filtration efficiency of the return liquid filter unit without affecting normal return liquid filtration operation, avoid filtration system shutdown caused by blockage or contamination of the return liquid filter unit, and improve the operational stability of the filtration system.

[0349] In some embodiments, the return liquid filtration unit includes a first return liquid filtration unit in an active state and a second return liquid filtration unit in a dormant state. The filtration method further includes: switching the first return liquid filtration unit from an active state to a dormant state in response to the return liquid pressure data of the first return liquid filtration unit not meeting a second preset condition; and switching the second return liquid filtration unit from a dormant state to an active state.

[0350] In some embodiments, the controller can determine whether the return pressure data of the first return liquid filtration unit meets a second preset condition. In response to the return pressure data of the first return liquid filtration unit not meeting the second preset condition (no), the controller executes steps 1320 and 1330.

[0351] Step 1320: Switch the first return liquid filtration unit from the active state to the dormant state.

[0352] Step 1330: Switch the second return liquid filtration unit from dormant state to active state.

[0353] For more information on steps 1320 and 1330, please refer to Figure 3 and its related description.

[0354] In some embodiments of this specification, when the controller responds to the fact that the return pressure data of the first return liquid filter unit, which is currently in an active state, does not meet the second preset condition, and the first return liquid filter unit may have problems such as blockage or malfunction, the controller switches the first return liquid filter unit to a dormant state and switches the second return liquid filter unit to an active state, thereby ensuring the continuity and stability of liquid filtration.

[0355] In some embodiments, the filtering method may further include step 1340.

[0356] Step 1340: In response to the fact that the cleaning pressure data of the liquid return filter unit in the dormant state does not meet the third preset condition, the cleaning unit stops cleaning the liquid return filter unit in the dormant state.

[0357] For more information on step 1340, please refer to Figure 3 and its related description.

[0358] This specification provides a filtering device according to one or more embodiments, the device including at least one processor and at least one memory, the at least one memory for storing computer instructions, and the at least one processor executing at least a portion of the computer instructions to implement the filtering method.

[0359] This specification provides one or more embodiments of a computer-readable storage medium that stores computer instructions, which, when at least a portion of the computer instructions are executed by a processor, enable a filtering method.

[0360] The basic concepts have been described above. Obviously, for those skilled in the art, the detailed disclosure above is merely illustrative and does not constitute a limitation of this specification. Although not explicitly stated herein, those skilled in the art may make various modifications, improvements, and corrections to this specification. Such modifications, improvements, and corrections are suggested in this specification and therefore remain within the spirit and scope of the exemplary embodiments described herein.

[0361] Furthermore, unless expressly stated in the claims, the order of processing elements and sequences, the use of numbers and letters, or other names described in this specification are not intended to limit the order of the processes and methods described herein. Although various examples have been discussed in the foregoing disclosure of some embodiments of the invention that are currently considered useful, it should be understood that such details are for illustrative purposes only, and the appended claims are not limited to the disclosed embodiments; rather, the claims are intended to cover all modifications and equivalent combinations that conform to the spirit and scope of the embodiments described herein. For example, while the system components described above can be implemented using hardware devices, they can also be implemented solely using software solutions, such as installing the described system on existing servers or mobile devices.

[0362] Similarly, it should be noted that, in order to simplify the description disclosed herein and thus aid in the understanding of one or more embodiments of the invention, the foregoing description of embodiments in this specification may sometimes combine multiple features into a single embodiment, drawing, or description thereof. However, this method of disclosure does not imply that the subject matter of this specification requires more features than those mentioned in the claims. In fact, the embodiments contain fewer features than all the features of a single embodiment disclosed above.

[0363] Finally, it should be understood that the embodiments described in this specification are merely illustrative of the principles of the embodiments described herein. Other variations may also fall within the scope of this specification. Therefore, alternative configurations of the embodiments described herein are intended to be illustrative rather than limiting, and should be considered consistent with the teachings of this specification. Accordingly, the embodiments described herein are not limited to those explicitly introduced and described herein.

Claims

1. A filtration system, characterized by, The filter system comprises a liquid supply filter unit, a cleaning unit and a controller; The liquid supply filter unit is configured to be in an active state or in a dormant state; wherein when the liquid supply filter unit is in the active state, the liquid supplied to the liquid using equipment is filtered, and when the liquid supply filter unit is in the dormant state, the filtering of the liquid supplied to the liquid using equipment is stopped; The controller is configured to control the cleaning unit to clean the liquid supply filter unit in the dormant state.

2. The filtration system of claim 1, wherein, The number of the liquid supply filter units is not less than 2.

3. The filtration system of claim 2, wherein, The liquid supply filter unit comprises a first liquid supply filter unit in the active state and a second liquid supply filter unit in the dormant state; The controller is further configured to: in response to the liquid supply pressure data of the first liquid supply filter unit not satisfying a first preset condition, switch the first liquid supply filter unit from the active state to the dormant state; and switch the second liquid supply filter unit from the dormant state to the active state.

4. The filtration system of claim 3, wherein, The controller is further configured to: determine the first preset condition based on the liquid supply flow data and equipment parameters of the liquid supply filter unit; wherein the equipment parameters comprise one or more of the following: filter element size, filtering accuracy, filter element material.

5. The filtration system of claim 1 or 3, wherein, The filter system further comprises a liquid return filter unit; The liquid return filter unit is configured to be in an active state or in a dormant state; wherein when the return liquid filter unit is in the active state, the liquid recovered from the liquid using equipment is filtered, and when the return liquid filter unit is in the dormant state, the filtering of the liquid recovered from the liquid using equipment is stopped; The controller is further configured to control the cleaning unit to clean the return liquid filter unit in the dormant state.

6. The filtration system of claim 5, wherein, The number of the return liquid filter units is not less than 2.

7. The filtration system of claim 6, wherein, The return liquid filter unit comprises a first return liquid filter unit in the active state and a second return liquid filter unit in the dormant state; The controller is further configured to: in response to the return liquid pressure data of the first return liquid filter unit not satisfying a second preset condition, switch the first return liquid filter unit from the active state to the dormant state; and switch the second return liquid filter unit from the dormant state to the active state.

8. The filtration system of claim 7, wherein, The controller is further configured to: determining the second preset condition based on the return liquid flow data and equipment parameters of the return liquid filter unit; wherein the equipment parameters comprise one or more of the following: filter element size; filtering accuracy; filter element material.

9. The filtration system of claim 7, wherein, The first preset condition is updated periodically based on a preset period, and the controller is further configured to: in response to the difference between the first preset condition in the current preset period and the first preset condition in the previous preset period satisfying a difference condition: determine predicted return liquid flow data based on the liquid supply flow data and the liquid supply pressure data of the liquid supply filter unit; determine the second preset condition based on the predicted return liquid flow data.

10. The filtration system of claim 9, wherein, The liquid using equipment comprises a wafer polishing equipment; the liquid supply filter unit comprises two or more liquid supply filters; the return liquid filter unit comprises two or more return liquid filters; The controller is further configured to: obtaining two or more clustering vectors corresponding to different historical times; the clustering vectors reflect information of the first filtration graph, the second filtration graph, the supply liquid flow data of the supply liquid filtration unit in the active state, the supply liquid pressure data, the pipeline parameters and the wafer parameters corresponding to the historical times; the clustering vectors correspond to the return liquid flow data of the return liquid filtration unit in the active state corresponding to the historical times; obtaining a target vector; the target vector reflects information of the first filtration graph, the second filtration graph, the supply liquid flow data of the active supply liquid filtration unit, the supply liquid pressure data, the pipeline parameters and the wafer parameters corresponding to the current time; clustering the two or more clustering vectors and the target vector to obtain two or more clusters; determining the predicted return liquid flow data based on the return liquid flow data corresponding to the clustering vectors in the cluster where the target vector is located; wherein the first filtration graph comprises nodes and edges, the nodes comprise supply liquid filter nodes corresponding to each supply liquid filter in the active supply liquid filtration unit, the node characteristics of the supply liquid filter nodes comprise the supply liquid pressure data, the supply liquid temperature data and the equipment parameters of the corresponding supply liquid filter, and edges exist between the supply liquid filter nodes corresponding to two supply liquid filters when the two supply liquid filters are connected by a pipeline; the second filtration graph comprises nodes and edges, the nodes comprise return liquid filter nodes corresponding to each return liquid filter in the active return liquid filtration unit, the node characteristics of the return liquid filter nodes comprise the return liquid pressure data, the return liquid temperature data and the equipment parameters of the corresponding return liquid filter, and edges exist between the return liquid filter nodes corresponding to two return liquid filters when the two return liquid filters are connected by a pipeline.

11. The filtration system of claim 1, wherein, The controller is further configured to: stop the cleaning unit from cleaning the supply liquid filtration unit in the dormant state in response to the cleaning pressure data of the supply liquid filtration unit in the dormant state not satisfying a third preset condition.

12. The filtration system of claim 11, wherein, The supply liquid filtration unit comprises at least one supply liquid filter, and the third preset condition comprises at least one third sub-condition corresponding to the at least one supply liquid filter; The controller is further configured to: determine the at least one third sub-condition based on the equipment parameters and the usage data of the at least one supply liquid filter; The equipment parameters comprise one or more of the following: filter element size, filter precision and filter element material, and the usage data comprises one or more of the following: service life, cleaning time interval and working condition information during use.

13. The filtration system of claim 5, wherein, The filtration system further comprises a supply liquid pump, a return liquid pump, a supply liquid container and a return liquid container; The liquid outlet of the supply liquid container is communicated with the liquid inlet of the supply liquid filtration unit through the supply liquid pump, the liquid outlet of the supply liquid filtration unit is communicated with the liquid inlet of the liquid using device, the liquid outlet of the liquid using device is communicated with the liquid inlet of the return liquid container, the liquid outlet of the return liquid container is communicated with the liquid inlet of the return liquid filtration unit through the return liquid pump, and the liquid outlet of the return liquid filtration unit is communicated with the liquid inlet of the supply liquid container.

14. The filtration system of any one of claims 1-13, wherein, The liquid supply filtering unit comprises two or more liquid supply filters, and / or the liquid return filtering unit comprises two or more liquid return filters; The controller is further configured to: control at least part of the liquid supply filters in the liquid supply filtering unit in the active state to perform liquid filtering based on preset filtering parameters, and / or control at least part of the liquid return filters in the liquid return filtering unit in the active state to perform liquid filtering based on preset filtering parameters; The preset filtering parameters comprise state configuration values of each liquid supply filter in the liquid supply filtering unit in the active state, and / or state configuration values of each liquid supply filter in the liquid return filtering unit in the active state, which indicate whether the corresponding liquid supply filter or liquid return filter is in the active state.

15. The filtration system of claim 14, wherein, The controller is further configured to: determine the preset filtering parameters based on the liquid supply pressure data, the liquid supply temperature data and the equipment parameters of two or more liquid supply filters in the liquid supply filtering unit in the active state, and / or the liquid return pressure data, the liquid return temperature data and the equipment parameters of two or more liquid return filters in the liquid return filtering unit in the active state; The equipment parameters comprise one or more of the following: filter element size, filtering accuracy and filter element material.

16. The filtration system of claim 15, wherein, The controller is further configured to: obtain a first filtering graph and / or a second filtering graph; determine the preset filtering parameters based on the first filtering graph and / or the second filtering graph by a parameter determination model, which is a machine learning model; The first filtering graph comprises nodes and edges, the nodes comprise liquid supply filter nodes corresponding to each liquid supply filter in the liquid supply filtering unit in the active state, the node features of the liquid supply filter nodes comprise the liquid supply pressure data, the liquid supply temperature data and the equipment parameters of the corresponding liquid supply filter, and edges exist between the liquid supply filter nodes corresponding to two liquid supply filters when the two liquid supply filters are connected by a pipeline; The second filtering graph comprises nodes and edges, the nodes comprise liquid return filter nodes corresponding to each liquid return filter in the liquid return filtering unit in the active state, the node features of the liquid return filter nodes comprise the liquid return pressure data, the liquid return temperature data and the equipment parameters of the corresponding liquid return filter, and edges exist between the liquid return filter nodes corresponding to two liquid return filters when the two liquid return filters are connected by a pipeline.

17. The filtration system of claim 16, wherein, The edges of the first filtering graph and / or the second filtering graph further comprise edge features; the edge features comprise one or more of the following information of the corresponding pipeline: material, pressure, temperature data and length.

18. The filtration system of claim 14, wherein, The controller is further configured to: in response to the preset filtering parameters being adjusted, control the cleaning unit to clean the liquid supply filters in the dormant state and / or the liquid return filters in the dormant state based on the adjusted preset filtering parameters.

19. A filtration method, characterized by, The filtering method is executed by a controller of a filtering system, the filtering system further comprising a liquid supply filtering unit and a cleaning unit; the liquid supply filtering unit is configured to be in an active state or in a dormant state; wherein when the liquid supply filtering unit is in the active state, filtering liquid supplied to a liquid-using device is performed, and when the liquid supply filtering unit is in the dormant state, filtering liquid supplied to the liquid-using device is stopped; The method comprises: controlling the cleaning unit to clean the liquid supply filtering unit in the dormant state.

20. The filtration method of claim 19, wherein, The number of the liquid supply filtering units is not less than 2.

21. The filtration method of claim 20, wherein, The liquid supply filtering unit comprises a first liquid supply filtering unit in the active state and a second liquid supply filtering unit in the dormant state; the method further comprises: in response to the liquid supply pressure data of the first liquid supply filtering unit not satisfying a first preset condition, switching the first liquid supply filtering unit from the active state to the dormant state; and switching the second liquid supply filtering unit from the dormant state to the active state.

22. The filtration method of claim 21, wherein, The method further comprises: determining the first preset condition based on the liquid supply flow data of the liquid supply filtering unit and device parameters; wherein the device parameters comprise one or more of the following: filter element size, filtering precision, filter element material.

23. The filtration method of claim 19 or 21, wherein, The filtering system further comprises a liquid return filtering unit; the liquid return filtering unit is configured to be in an active state or in a dormant state; wherein when the return liquid filtering unit is in the active state, filtering liquid recovered from the liquid-using device is performed, and when the return liquid filtering unit is in the dormant state, filtering liquid recovered from the liquid-using device is stopped; The method further comprises: controlling the cleaning unit to clean the liquid return filtering unit in the dormant state.

24. The filtration method of claim 23, wherein, The number of the liquid return filtering units is not less than 2.

25. The filtration method of claim 24, wherein, The liquid return filtering unit comprises a first liquid return filtering unit in the active state and a second liquid return filtering unit in the dormant state; the method further comprises: in response to the liquid return pressure data of the first liquid return filtering unit not satisfying a second preset condition, switching the first liquid return filtering unit from the active state to the dormant state; and switching the second liquid return filtering unit from the dormant state to the active state.

26. The filtration method of claim 25, wherein, The method further comprises: determining, based on the liquid return flow data of the liquid return filtering unit and device parameters, the second preset condition; wherein the device parameters comprise one or more of the following: filter element size, filtering accuracy, filter element material.

27. The filtration method of claim 25, wherein, The first preset condition is updated periodically based on a preset period, and the method further comprises: in response to the difference between the first preset condition in the current preset period and the first preset condition in the previous preset period satisfying a difference condition: determining predicted liquid return flow data based on the liquid supply flow data and the liquid supply pressure data of the liquid supply filtering unit; determining the second preset condition based on the predicted liquid return flow data.

28. The filtration method of claim 27, wherein, The liquid-using device comprises a wafer polishing device; the liquid supply filtering unit comprises two or more liquid supply filters; the liquid return filtering unit comprises two or more liquid return filters; determining predicted liquid return flow data based on the liquid supply flow data and the liquid supply pressure data of liquid supply filtering unit comprises: obtaining two or more clustering vectors corresponding to different historical times; the clustering vectors reflect information of the first filtration graph, the second filtration graph, the supply liquid flow data of the supply liquid filtration unit in the active state, the supply liquid pressure data, the pipeline parameters and the wafer parameters corresponding to the historical times; the clustering vectors correspond to the return liquid flow data of the return liquid filtration unit in the active state corresponding to the historical times; obtaining a target vector; the target vector reflects information of the first filtration graph, the second filtration graph, the supply liquid flow data of the active supply liquid filtration unit, the supply liquid pressure data, the pipeline parameters and the wafer parameters corresponding to the current time; clustering the two or more clustering vectors and the target vector to obtain two or more clusters; determining the predicted return liquid flow data based on the return liquid flow data corresponding to the clustering vectors in the cluster where the target vector is located; wherein the first filtration graph comprises nodes and edges, the nodes comprise supply liquid filter nodes corresponding to each supply liquid filter in the active supply liquid filtration unit, the node features of the supply liquid filter nodes comprise the supply liquid pressure data, the supply liquid temperature data and the equipment parameters of the corresponding supply liquid filter, and edges exist between the supply liquid filter nodes corresponding to two supply liquid filters when the two supply liquid filters are connected by a pipeline; the second filtration graph comprises nodes and edges, the nodes comprise return liquid filter nodes corresponding to each return liquid filter in the active return liquid filtration unit, the node features of the return liquid filter nodes comprise the return liquid pressure data, the return liquid temperature data and the equipment parameters of the corresponding return liquid filter, and edges exist between the return liquid filter nodes corresponding to two return liquid filters when the two return liquid filters are connected by a pipeline.

29. The filtration method of claim 19, wherein, The method further comprises: in response to the cleaning pressure data of the supply liquid filtration unit in the dormant state not satisfying a third preset condition, stopping the cleaning unit from cleaning the supply liquid filtration unit in the dormant state.

30. The filtration method of claim 29, wherein, The supply liquid filtration unit comprises at least one supply liquid filter, and the third preset condition comprises at least one third sub-condition corresponding to the at least one supply liquid filter; the method further comprises: determining the at least one third sub-condition based on the equipment parameters and the usage data of the at least one supply liquid filter; wherein the equipment parameters comprise one or more of the following: filter element size, filtration accuracy and filter element material, and the usage data comprises one or more of the following: service life, cleaning time interval and working condition information during use.

31. The filtration method of claim 23, wherein, The filtration system further comprises a supply liquid container and a return liquid container; the liquid outlet of the supply liquid container is in communication with the liquid inlet of the supply liquid filtration unit, the liquid outlet of the supply liquid filtration unit is in communication with the liquid inlet of the liquid using device, the liquid outlet of the liquid using device is in communication with the liquid inlet of the return liquid container, the liquid outlet of the return liquid container is in communication with the liquid inlet of the return liquid filtration unit, and the liquid outlet of the return liquid filtration unit is in communication with the liquid inlet of the supply liquid container.

32. The filtration method of any one of claims 19-31, wherein, The liquid supply filtering unit comprises two or more liquid supply filters, and / or the liquid return filtering unit comprises two or more liquid return filters; the method further comprises: controlling at least part of the liquid supply filters in the liquid supply filtering unit in the active state to be in the active state for liquid filtering based on preset filtering parameters, and / or controlling at least part of the liquid return filters in the liquid return filtering unit in the active state to be in the active state for liquid filtering; the preset filtering parameters comprise state configuration values of each liquid supply filter in the liquid supply filtering unit in the active state, and / or state configuration values of each liquid supply filter in the liquid return filtering unit in the active state, the state configuration values indicating whether the corresponding liquid supply filter or liquid return filter is in the active state.

33. The filtration method of claim 32, wherein, The method further comprises: determining the preset filtering parameters based on the liquid supply pressure data, liquid supply temperature data and equipment parameters of two or more liquid supply filters in the liquid supply filtering unit in the active state, and / or the liquid return pressure data, liquid return temperature data and equipment parameters of two or more liquid return filters in the liquid return filtering unit in the active state; wherein the equipment parameters comprise one or more of the following: filter element size, filtering accuracy and filter element material.

34. The filtration method of claim 33, wherein, The determination of the preset filtering parameters based on the liquid supply pressure data, liquid supply temperature data and equipment parameters for two or more liquid supply filters in the liquid supply filtering unit in the active state, and / or liquid return pressure data, liquid return temperature data and equipment parameters for two or more liquid return filters in the liquid return filtering unit in the active state comprises: obtaining a first filtering graph and / or a second filtering graph; determining the preset filtering parameters based on the first filtering graph and / or the second filtering graph by a parameter determination model, the parameter determination model being a machine learning model; wherein the first filtering graph comprises nodes and edges, the nodes comprising liquid supply filter nodes corresponding to each liquid supply filter in the liquid supply filtering unit in the active state, the node features of the liquid supply filter nodes comprising liquid supply pressure data, liquid supply temperature data and equipment parameters of the corresponding liquid supply filter; when two liquid supply filters have a pipeline connection, there is an edge between the liquid supply filter nodes corresponding to the two liquid supply filters; the second filtering graph comprises nodes and edges, the nodes comprising liquid return filter nodes corresponding to each liquid return filter in the liquid return filtering unit in the active state, the node features of the liquid return filter nodes comprising liquid return pressure data, liquid return temperature data and equipment parameters of the corresponding liquid return filter; when two liquid return filters have a pipeline connection, there is an edge between the liquid return filter nodes corresponding to the two liquid return filters.

35. The filtration method of claim 34, wherein, The edges of the first filtering graph and / or the second filtering graph further comprise edge features; the edge features comprise one or more of the following information of the corresponding pipeline: material, pressure, temperature data and length.

36. The filtration method of claim 32, wherein, The method further comprises: In response to the preset filter parameter being adjusted, the cleaning unit is controlled to clean the liquid supply filter in the sleep state and / or the liquid return filter in the sleep state based on the adjusted preset filter parameter.

37. A filter device, characterized by The device comprises at least one processor and at least one memory; The at least one memory is configured to store computer instructions; The at least one processor is configured to execute at least part of the computer instructions to implement the filtering method according to any one of claims 19 to 36.

38. A computer-readable storage medium, characterized in that, The storage medium stores computer instructions, and when at least part of the computer instructions is executed by a processor, the filtering method according to any one of claims 19 to 36 can be implemented.

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