Seal member, substrate processing device, and method for assembling seal part

Abstract

Provided are: a seal member which improves sealability; a substrate processing device; and a method for assembling a seal part.　The seal member is used for a seal part of a substrate processing device, and includes: a seal member body having an annular shape; and a visual recognition part provided on the surface of the seal member body and having a color different from that of the seal member body. When the direction penetrating an opening formed by the seal member body is defined as an axial direction, the visual recognition part is provided on one side in the axial direction.

Description

Sealing member, substrate processing apparatus, and method for assembling a sealing portion

[0001] The present disclosure relates to a sealing member, a substrate processing apparatus, and a method for assembling a sealing portion.

[0002] Patent Document 1 discloses a gasket that is attached to a gasket mounting groove provided in one of two members facing each other and is in close contact with the other member, and a linear paint mark for checking whether the gasket is twisted is provided along the circumferential direction of the gasket on the side surface of the gasket.

[0003] Utility Model Registration No. 3204911 Gazette

[0004] On one side, the present disclosure provides a sealing member, a substrate processing apparatus, and a method for assembling a sealing portion that improve sealing performance.

[0005] In order to solve the above problems, according to one aspect, there is provided a sealing member used for a sealing portion of a substrate processing apparatus, the sealing member having an annular sealing member body, and a visual recognition portion provided on the surface of the sealing member body and having a color different from that of the sealing member body. With the direction in which the opening formed by the sealing member body is penetrated as the axial direction, the visual recognition portion is provided on one side in the axial direction.

[0006] According to one aspect, it is possible to provide a sealing member, a substrate processing apparatus, and a method for assembling a sealing portion that improve sealing performance.

[0007] An example of a diagram illustrating the configuration of a plasma processing system. An example of a diagram illustrating the configuration of a capacitively coupled plasma processing apparatus. An example of a cross-sectional view showing the structure of a valve with a seal. A flowchart showing an example of a process for forming the structure of the seal. An example of a partially cut perspective view showing a part of the seal member cut off. An example of a cross-sectional view showing the state in which the seal member is attached to the groove of the first member. An example of a plan view of the first member viewed from above with the seal member attached to the groove of the first member. An example of a cross-sectional view showing the structure of the seal. An example of a partially cut perspective view showing a part of the seal member cut off. An example of a cross-sectional view showing the state in which the seal member is attached to the groove of the first member. An example of a plan view of the first member viewed from above with the seal member attached to the groove of the first member. An example of a cross-sectional view showing the structure of the seal.

[0008] Various exemplary embodiments will be described in detail below with reference to the drawings. In each drawing, the same or corresponding parts will be denoted by the same reference numerals.

[0009] [Plasma Processing System] Figure 1 is an example of a diagram illustrating an example of the configuration of a plasma processing system. In one embodiment, the plasma processing system includes a plasma processing apparatus 1 and a control unit 2. The plasma processing system is an example of a substrate processing system, and the plasma processing apparatus 1 is an example of a substrate processing apparatus. The plasma processing apparatus 1 includes a plasma processing chamber 10, a substrate support unit 11, and a plasma generation unit 12. The plasma processing chamber 10 has a plasma processing space. The plasma processing chamber 10 also has at least one gas supply port for supplying at least one processing gas to the plasma processing space, and at least one gas outlet for discharging gas from the plasma processing space. The gas supply port is connected to a gas supply unit 20, which will be described later, and the gas outlet is connected to an exhaust system 40, which will be described later. The substrate support unit 11 is located in the plasma processing space and has a substrate support surface for supporting a substrate.

[0010] The plasma generation unit 12 is configured to generate plasma from at least one processing gas supplied into the plasma processing space. The plasma formed in the plasma processing space may be capacitively coupled plasma (CCP), inductively coupled plasma (ICP), ECR (Electron Cyclotron Resonance) plasma, helicon wave excited plasma (HWP), or surface wave plasma (SWP), etc. Various types of plasma generation units, including AC (Alternating Current) plasma generation units and DC (Direct Current) plasma generation units, may also be used. In one embodiment, the AC signal (AC power) used in the AC plasma generation unit has a frequency in the range of 100 kHz to 10 GHz. Therefore, the AC signal includes an RF (Radio Frequency) signal and a microwave signal. In one embodiment, the RF signal has a frequency in the range of 100 kHz to 150 MHz.

[0011] The control unit 2 processes computer-executable instructions that cause the plasma processing apparatus 1 to perform the various processes described herein. The control unit 2 may be configured to control the elements of the plasma processing apparatus 1 to perform the various processes described herein. In one embodiment, part or all of the control unit 2 may be included in the plasma processing apparatus 1. The control unit 2 is implemented, for example, by a computer 2a. The control unit 2 may include a processing unit 2a1, a storage unit 2a2, and a communication interface 2a3. The functions realized by the processing unit 2a1 described herein may be implemented in a circuit or processing circuit, including a general-purpose processor, an application-specific processor, integrated circuits, ASICs (Application Specific Integrated Circuits), a CPU (Central Processing Unit), a conventional circuit, and / or a combination thereof, programmed to realize the described functions. The processor is considered to be a circuit or processing circuit, including transistors and other circuits. The processor may be a programmed processor that executes a program stored in the storage unit 2a2. This program may be pre-stored in the storage unit 2a2 or retrieved via a medium when needed. The acquired program is stored in the storage unit 2a2 and read from the storage unit 2a2 and executed by the processing unit 2a1. The medium may be various storage media readable by the computer 2a, or it may be a communication line connected to the communication interface 2a3. The storage unit 2a2 may include RAM (Random Access Memory), ROM (Read Only Memory), HDD (Hard Disk Drive), SSD (Solid State Drive), or a combination thereof. The communication interface 2a3 may communicate with the plasma processing device 1 via a communication line such as a LAN (Local Area Network).In this disclosure, circuits, units, and means are hardware programmed to perform or configured to perform the functions described. Such hardware may be any hardware described in this disclosure, or any hardware known to be programmed to perform or execute the functions described. If such hardware is a processor that is considered to be a type of circuit, such circuit, means, or unit is a combination of hardware and software used to constitute such hardware and / or processor.

[0012] [Plasma Processing Equipment] Below, an example of the configuration of a capacitively coupled plasma processing equipment as an example of plasma processing equipment 1 will be described. Figure 2 is an example of a diagram illustrating the configuration of a capacitively coupled plasma processing equipment (substrate processing equipment) 1.

[0013] The capacitively coupled plasma processing apparatus 1 includes a plasma processing chamber 10, a gas supply unit 20, a power supply system 30, and an exhaust system 40. The plasma processing apparatus 1 also includes a substrate support unit 11 and a gas introduction unit. The gas introduction unit is configured to introduce at least one processing gas into the plasma processing chamber 10. The gas introduction unit includes a shower head 13. The substrate support unit 11 is located inside the plasma processing chamber 10. The shower head 13 is located above the substrate support unit 11. In one embodiment, the shower head 13 constitutes at least a portion of the ceiling of the plasma processing chamber 10. The plasma processing chamber 10 has a plasma processing space 10s defined by the shower head 13, the side walls 10a of the plasma processing chamber 10, and the substrate support unit 11. The plasma processing chamber 10 is grounded. The shower head 13 and the substrate support unit 11 are electrically insulated from the housing of the plasma processing chamber 10.

[0014] The substrate support portion 11 includes a main body portion 111 and a ring assembly 112. The main body portion 111 has a central region 111a for supporting the substrate W and an annular region 111b for supporting the ring assembly 112. A wafer is an example of a substrate W. The annular region 111b of the main body portion 111 surrounds the central region 111a of the main body portion 111 in a plan view. The substrate W is placed on the central region 111a of the main body portion 111, and the ring assembly 112 is placed on the annular region 111b of the main body portion 111 so as to surround the substrate W on the central region 111a of the main body portion 111. Therefore, the central region 111a is also called the substrate support surface for supporting the substrate W, and the annular region 111b is also called the ring support surface for supporting the ring assembly 112.

[0015] In one embodiment, the main body 111 includes a base 1110 and an electrostatic chuck 1111. The base 1110 includes a conductive member. The conductive member of the base 1110 can function as a lower electrode. The electrostatic chuck 1111 is placed on the base 1110. The electrostatic chuck 1111 includes a ceramic member 1111a and an electrostatic chuck electrode 1111b placed within the ceramic member 1111a. The electrostatic chuck electrode 1111b is also called a clamping electrode. In one embodiment, the electrostatic chuck electrode 1111b is electrically connected or coupled to a chuck power supply. The chuck power supply may be a DC power supply or an AC power supply. The ceramic member 1111a has a central region 111a. In one embodiment, the ceramic member 1111a also has an annular region 111b. Furthermore, other members surrounding the electrostatic chuck 1111, such as an annular electrostatic chuck or an annular insulating member, may have an annular region 111b. In this case, the ring assembly 112 may be placed on the annular electrostatic chuck or the annular insulating member, or it may be placed on both the electrostatic chuck 1111 and the annular insulating member. In addition, at least one bias electrode, which is electrically connected or coupled to the power supply 31 and / or power supply 32 described later, may be placed inside the ceramic member 1111a. In this case, at least one bias electrode functions as a lower electrode. Also, the conductive member of the base 1110 and the bias electrode inside the ceramic member 1111a may function as multiple lower electrodes. In one embodiment, the first voltage generation unit 32a, which functions as a voltage pulse generation unit described later, is electrically connected or coupled to the bias electrode inside the ceramic member 1111a, and the first RF generation unit 31a, described later, is electrically connected or coupled to the conductive member of the base 1110. Furthermore, the electrostatic chuck electrode 1111b may function as a lower electrode. Therefore, the substrate support portion 11 includes at least one lower electrode.

[0016] The ring assembly 112 includes one or more annular members. In one embodiment, the one or more annular members include one or more edge rings and at least one covering ring. The edge rings are formed of a conductive or insulating material, and the covering rings are formed of an insulating material.

[0017] The substrate support section 11 may also include a temperature control module configured to adjust at least one of the electrostatic chuck 1111, the ring assembly 112, and the substrate W to a target temperature. The temperature control module may include a heater, a heat transfer medium, a flow path 1110a, or a combination thereof. A heat transfer fluid such as brine or gas flows through the flow path 1110a. In one embodiment, the flow path 1110a is formed within the base 1110, and one or more heaters are arranged within the ceramic member 1111a of the electrostatic chuck 1111. The substrate support section 11 may also include a heat transfer gas supply section configured to supply heat transfer gas to the gap between the back surface of the substrate W and the central region 111a.

[0018] The showerhead 13 is configured to introduce at least one processing gas from the gas supply unit 20 into the plasma processing space 10s. The showerhead 13 has at least one gas supply port 13a, at least one gas diffusion chamber 13b, and a plurality of gas inlet ports 13c. The processing gas supplied to the gas supply port 13a passes through the gas diffusion chamber 13b and is introduced into the plasma processing space 10s through the plurality of gas inlet ports 13c. The showerhead 13 also includes at least one upper electrode. In addition to the showerhead 13, the gas introduction unit may also include one or more side gas injectors (SGIs) attached to one or more openings formed in the side wall 10a.

[0019] The gas supply unit 20 may include at least one gas source 21 and at least one flow controller 22. In one embodiment, the gas supply unit 20 is configured to supply at least one processing gas to the shower head 13 from a corresponding gas source 21 via a corresponding flow controller 22. Each flow controller 22 may include, for example, a mass flow controller or a pressure-controlled flow controller. Furthermore, the gas supply unit 20 may include at least one flow modulation device that modulates or pulses the flow rate of at least one processing gas.

[0020] The power supply system 30 includes a power supply 31 that is electrically connected to or coupled to the plasma processing chamber 10. In one embodiment, the power supply 31 is electrically connected to or coupled to the plasma processing chamber 10 via at least one impedance matcher. The impedance matcher may be a mechanically controlled matcher or an electronically controlled matcher. The power supply 31 is configured to supply at least one RF signal (RF power) to at least one lower electrode and / or at least one upper electrode. This generates plasma from at least one processing gas supplied to the plasma processing space 10s. Therefore, the power supply 31 can function as at least part of the plasma generation unit 12. In addition, by supplying a bias RF signal to at least one lower electrode, a bias potential is generated on the substrate W, and ionic components in the formed plasma can be drawn into the substrate W.

[0021] The power supply 31 includes a first RF generation unit 31a and a second RF generation unit 31b. The first RF generation unit 31a is electrically connected or coupled to at least one lower electrode and / or at least one upper electrode and is configured to generate a source RF signal (source RF power) to generate plasma in the plasma processing space 10s. In one embodiment, the first RF generation unit 31a is electrically connected or coupled to at least one lower electrode and / or at least one upper electrode via at least one impedance matcher. In one embodiment, the source RF signal has a frequency in the range of 10 MHz to 150 MHz. In one embodiment, the first RF generation unit 31a may be configured to generate a plurality of source RF signals having different frequencies. One or more generated source RF signals are supplied to at least one lower electrode and / or at least one upper electrode.

[0022] The second RF generation unit 31b is electrically connected to or coupled to at least one lower electrode and is configured to generate a bias RF signal (bias RF power). In one embodiment, the second RF generation unit 31b is electrically connected to or coupled to at least one lower electrode via at least one impedance matcher. When the first RF generation unit 31a is electrically connected to or coupled to a lower electrode, the second RF generation unit 31b may be electrically connected to or coupled to the same lower electrode, or it may be electrically connected to or coupled to a different lower electrode. The frequency of the bias RF signal may be the same as or different from the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency lower than the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency in the range of 100 kHz to 60 MHz. In one embodiment, the second RF generation unit 31b may be configured to generate a plurality of bias RF signals having different frequencies. The generated one or more bias RF signals are supplied to at least one lower electrode. In various embodiments, at least one of the source RF signal and the bias RF signal may be pulsed.

[0023] The power supply system 30 may also include a power supply 32 that is electrically connected to or coupled to the plasma processing chamber 10. The power supply 32 includes a first voltage generation unit 32a and a second voltage generation unit 32b. In one embodiment, the first voltage generation unit 32a is electrically connected to or coupled to at least one lower electrode and is configured to generate a first voltage signal. The generated first voltage signal is applied to at least one lower electrode. In one embodiment, the second voltage generation unit 32b is electrically connected to or coupled to at least one upper electrode and is configured to generate a second voltage signal. The generated second voltage signal is applied to at least one upper electrode.

[0024] In various embodiments, the first and / or second voltage signals may be pulsed. In this case, the first voltage generation unit 32a and / or the second voltage generation unit 32b function as voltage pulse generation units configured to generate a sequence of voltage pulses. Thus, the sequence of voltage pulses is applied to at least one lower electrode and / or at least one upper electrode. In one embodiment, the sequence of voltage pulses has a plurality of cycles, each cycle including a burst of voltage pulses in a first period and a constant reference voltage in a second period. That is, in the sequence of voltage pulses, the burst of voltage pulses is repeated. The absolute value of the voltage level of the voltage pulse is greater than the absolute value of the voltage level of the reference voltage. The voltage pulse may have an arbitrary waveform having a rectangle, trapezoid, triangle, or a combination thereof, and the arbitrary waveform may change over time. The voltage pulse may have positive polarity or negative polarity. The sequence of voltage pulses may also include one or more positive voltage pulses and one or more negative voltage pulses within one cycle. The first and second voltage generation units 32a and 32b may be provided in addition to the power supply 31, and the first voltage generation unit 32a may be provided in place of the second RF generation unit 31b.

[0025] The exhaust system 40 may be connected to, for example, a gas outlet 10e located at the bottom of the plasma processing chamber 10. The exhaust system 40 may include a pressure regulating valve and a vacuum pump. The pressure regulating valve regulates the pressure in the plasma processing space 10s. The vacuum pump may include a turbomolecular pump, a dry pump, or a combination thereof.

[0026] Here, the plasma processing apparatus 1 has a sealing portion 200 for sealing gas or liquid. The sealing portion 200 is provided with a sealing member 250 such as an O-ring.

[0027] An example of a seal portion 200 will be explained using Figure 3. Figure 3 is an example of a cross-sectional view showing the structure of a valve having a seal portion 200. For example, the exhaust system 40 is equipped with an APC (Automatic Pressure Control) valve as a pressure regulating valve. The seal portion 200 of the APC valve has a valve seat member (first member 210) having an opening 211, a valve body member (second member 220) that closes the opening 211, and a seal member 250 fitted into a groove 215 provided so as to surround the opening 211 of the valve seat member (first member 210). When the valve body member (second member 220) closes the opening 211 of the valve seat member (first member 210), the seal member 250 and the valve body member (second member 220) come into contact, and the gap between the valve body member (second member 220) and the valve seat member (first member 210) is sealed by the seal member 250. Furthermore, by separating the valve body member (second member 220) from the valve seat member (first member 210) (see Figure 3), the opening 211 is opened.

[0028] Here, if the valve body member (second member 220) maintains a state in which it closes the opening 211 of the valve seat member (first member 210), there is a risk that the sealing member 250 may become fixed to the valve body member (second member 220). If the valve body member (second member 220) is separated from the valve seat member (first member 210) while the sealing member 250 is fixed to the valve body member (second member 220), there is a risk that the sealing member 250 may fall out of the groove 215. Furthermore, even if the valve body member (second member 220) closes the opening 211 of the valve seat member (first member 210) again, there is a risk that the sealing performance may not be ensured. For this reason, a structure for the sealing portion 200 that prevents the sealing member 250 from falling out of the groove 215 is required.

[0029] [Structure of the seal portion of the first embodiment] Next, the structure of the seal portion 200 of the first embodiment will be described using Figures 4 to 8. Figure 4 is a flowchart showing an example of the process for forming the structure of the seal portion 200. Figure 5 is an example of a partial cutaway perspective view showing a part of the seal member 250 cut off. Figure 6 is an example of a cross-sectional view showing the state in which the seal member 250 is attached to the groove portion 215 of the first member 210. Figure 7 is an example of a plan view of the first member 210 viewed from above in the state in which the seal member 250 is attached to the groove portion 215 of the first member 210. Figure 8 is an example of a cross-sectional view showing the structure of the seal portion 200.

[0030] First, the configuration of the sealing portion 200 will be explained using Figure 8. As shown in Figure 8, the sealing portion 200 has a first member 210, a second member 220, and a sealing member 250. The sealing portion 200 seals the gap between the first member 210 and the second member 220 by sandwiching the sealing member 250 between the first member 210 and the second member 220.

[0031] The first member 210 has an opposing surface (first opposing surface) 210s that faces the second member 220. The first member 210 has a groove 215 in the opposing surface 210s for fitting a sealing member 250. The groove 215 has a dovetail structure in which the opening width is narrower towards the opening side (entrance side) and wider towards the back side (bottom surface 215s side). The sealing member 250 is fitted into the groove 215 while being elastically deformed. This prevents the sealing member 250 fitted into the groove 215 from falling out.

[0032] The second member 220 has an opposing surface (second opposing surface) 220s that faces the opposing surface (first opposing surface) 210s of the first member 210. The second member 220 may also be a member that can move relative to the first member 210. For example, the sealing portion 200 may be configured to switch between a first state (see Figure 8) in which the second member 220 is brought closer to the first member 210 (bringing the opposing surfaces 210s and 220s into contact) to seal the gap between the first member 210 and the second member 220, and a second state (see Figure 3) in which the sealing is released by moving the second member 220 away from the first member 210 (separating the opposing surfaces 210s and 220s). That is, in the examples of Figures 3 and 8, the second member 220 may be configured to move vertically relative to the first member 210.

[0033] For example, the first member 210 is a valve seat member having an opening 211 (see Figures 3 and 7) on its opposing surface 210s. The first member 210 also has a groove 215 on its opposing surface 210s that surrounds the opening 211. The second member 220 is a valve body member that opens and closes the opening 211 of the first member 210. The first member 210 and the second member 220 may be made of a metal such as aluminum or stainless steel.

[0034] Next, the sealing member 250 before being attached to the sealing portion 200 will be described using Figure 5. As shown in Figure 5, the sealing member 250 is a ring-shaped member. The sealing member 250 has a ring-shaped sealing member body 251 and a marker (visibility portion) 253. Here, the direction through which the opening formed by the ring-shaped sealing member 250 passes is defined as the axial direction. The marker 253 is provided on one side in the axial direction (the upper side in Figure 5).

[0035] The sealing member body 251 is formed in an annular shape (torus shape). The material of the sealing member body 251 is, for example, fluororubber or silicone rubber. Specifically, the material of the sealing member body 251 can be any of the following: vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), fluorosilicone rubber (FVMQ), etc. Alternatively, the material of the sealing member body 251 may be, for example, a material in which a filler has been added to fluororubber or silicone rubber. Specifically, the added filler may be Al ２ O ３ , TiO ２ Si, SiO ２ You can use any of the following: C, etc.

[0036] The marker 253 is provided on the upper surface of the sealing member body 251. For example, the marker 253 is provided on the upper end portion of the sealing member body 251. The marker 253 is formed in an annular shape that follows the annular shape of the sealing member body 251. Furthermore, when the sealing member 250 is attached to the groove portion 215 of the first member 210, the marker 253 is formed in a portion that is exposed from the opening of the groove portion 215 (a visible portion) (see Figures 6 and 7). In addition, when no external force is applied to the sealing member 250 (sealing member body 251), the marker 253 is formed in a linear (annular) shape of approximately equal width. The line width of the marker 253 is preferably, for example, 1 mm or more.

[0037] For example, if the sealing member body 251 is torus-shaped, the marker 253 is formed in a circular shape when viewed axially (from above). Furthermore, the circular marker 253 is not limited to being provided on the upper end portion of the sealing member body 251. The marker 253 may be formed on the portion that is exposed from the opening of the groove 215 when the sealing member 250 is attached to the groove 215 of the first member 210, and may also be provided at a position shifted inward or outward from the upper end portion of the sealing member body 251.

[0038] Further, the marker 253 has a surface state that can be visually distinguished from the seal member body 251. For example, the seal member body 251 and the marker 253 may have different colors. Also, it is preferable that the color difference between the seal member body 251 and the marker 253 is large. For example, for the black seal member body 251, the marker 253 may be white, yellow, or the like. Also, the color of the marker 253 and the color of the seal member body 251 may be in a complementary color relationship with each other.

[0039] Further, the marker 253 is made of a material that can be removed from the seal member body 251. That is, the marker 253 is made of a material that can be selectively removed with respect to the seal member body 251.

[0040] For example, when the seal member body 251 has resistance to chemical solutions (e.g., water, alcohol, organic solvents, fluorine solvents, etc.), the marker 253 may be made of a material that can be removed with a chemical solution (e.g., beeswax, aqueous paint, oil paint, etc.). For example, the marker 253 can be wiped off and removed using a chemical solution.

[0041] Also, when the seal member body 251 is a heat-resistant material, the marker 253 may be made of a material that can be removed by heating the seal member 250 (e.g., to 60°C, etc.) (e.g., beeswax, low-temperature decomposable particles, etc.).

[0042] Also, when the seal member body 251 is a material having radical resistance, the marker 253 may be made of a material that can be removed by radicals (e.g., oxygen radicals, fluorine radicals, etc.) (e.g., hydrocarbon-based resins, hydrocarbon-based oils and CNTs (carbon nanotubes), etc.).

[0043] Note that the marker 253 may be, for example, a coating film formed by applying a material to the upper part of the seal member body 251. Also, the marker 253 may be formed, for example, by printing a material on the upper part of the seal member body 251. Also, the marker 253 is not limited to this, and may be formed, for example, by laser, PVD, CVD, ALD, etc.

[0044] Next, an example of the process for forming the structure of the seal portion 200 will be described with reference to FIG. 4.

[0045] In step S101, the operator attaches a seal member 250 (see FIG. 5) to the groove portion 215 of the first member 210. FIG. 6 shows a state where the seal member 250 is attached to the groove portion 215 of the first member 210.

[0046] Here, the operator fits the seal member 250 into the groove portion 215 of the first member 210 while elastically deforming the seal member 250 shown in FIG. 5. At this time, the seal member 250 is arranged such that the marker 253 is on the upper side, and the marker 253 is exposed from the opening of the groove portion 215. Thus, it is arranged so that the marker 253 can be visually recognized from the opening of the groove portion 215.

[0047] In step S102, the operator checks the state of the seal member 250. Here, the operator checks the state of the marker 253 of the seal member 250 when viewing the first member 210 and the seal member 250 from above (the side of the opposing surface 210s). FIG. 7 is a view of the seal member 250 attached to the groove portion 215 of the first member 210 as seen from above the first member 210.

[0048] Here, the width of the marker 253 is formed to be narrower than the opening width of the groove portion 215. Thus, as shown in FIG. 7, in a state where the seal member 250 is fitted into the groove portion 215, the boundary between the marker 253 and the seal member body 251 is arranged to be visible. In other words, it is arranged so that the width (thickness) of the marker 253 can be seen.

[0049] Here, when fitting the seal member 250 into the groove portion 215, the seal member 250 is elastically deformed and fitted into the groove portion 215. For this reason, in the seal member 250, there may be formed a compressed portion 301 compressed in the circumferential direction, a tensioned portion 302 pulled in the circumferential direction, and a twisted portion 303 arranged in a twisted manner. In a state where such a compressed portion 301, tensioned portion 302, twisted portion 303, etc. are formed, there is a risk that the sealing performance will deteriorate.

[0050] In contrast, in the sealing member 250, the width (thickness) of the marker 253 increases in the compression section 301. Also, in the sealing member 250, the marker 253 (thickness) decreases in the tension section 302. Furthermore, in the sealing member 250, the position of the marker 253 shifts towards the inner circumference (or outer circumference) of the sealing member 250 in the twisted section 303.

[0051] In this way, with the sealing member 250, it is possible to determine whether the sealing member 250 is properly positioned in the groove 215 by checking the state of the marker 253. In other words, the worker can ensure the integrity of the sealing member 250 by fitting it into the groove 215 while checking the state of the marker 253. Therefore, the sealing performance of the sealing member 250 can be improved.

[0052] In step S103, the worker determines whether the condition of the sealing member 250 is within the acceptable range. That is, they determine whether the shape of the marker 253 (width (thickness), position, etc.) is within the acceptable range. If the condition of the sealing member 250 is not within the acceptable range (NO in S103), the worker proceeds to step S104. In step S104, the worker removes the sealing member 250 from the groove 215 and reattaches it to the groove 215. Then, the worker returns to step S102. Thus, the worker repeats the reattachment of the sealing member 250 (S104) and the confirmation of the condition of the sealing member 250 (S102) until the condition of the sealing member 250 is within the acceptable range.

[0053] If the condition of the sealing member 250 is within the acceptable range (YES in S103), proceed to step S105.

[0054] In step S105, the marker 253 is removed.

[0055] For example, if the marker 253 is made of a material soluble in the chemical solution, the marker 253 is removed from the seal member body 251 (seal member 250) by wiping the upper portion of the seal member 250 exposed from the opening of the groove 215 with the chemical solution. In addition, by wiping the upper surface of the seal member body 251 (seal member 250) with the chemical solution, minute foreign matter can be removed from the surface of the seal member 250, and the sealing performance between the seal member body 251 (seal member 250) and the opposing surface 220s of the second member 220 is also improved.

[0056] Furthermore, if the marker 253 is made of a material that vaporizes when heated (for example, to 60°C), the marker 253 is removed from the seal member body 251 (seal member 250) by heating the seal member 250. For example, if the seal portion 200 is a seal portion provided between the valve body member and the valve seat member of the APC valve, the plasma processing apparatus 1 is assembled with the marker 253 attached to the seal member 250. The control unit 2 then opens the APC valve, separating the second member 220 and the first member 210. The control unit 2 also generates plasma (for example, oxygen plasma) in the plasma processing space 10s. The high-temperature gas is then exhausted through the APC valve. As a result, the high-temperature gas is supplied to the seal member 250 provided in the APC valve, and the marker 253 is removed from the seal member body 251 (seal member 250). Plasma generation may be, for example, a seasoning treatment or a cleaning treatment.

[0057] Furthermore, if the marker 253 is made of a material that can be removed by radicals, the marker 253 is removed from the seal member body 251 (seal member 250) by supplying radicals to the seal member 250. For example, if the seal portion 200 is a seal portion provided between the valve body member and the valve seat member of the APC valve, the plasma processing apparatus 1 is assembled with the marker 253 attached to the seal member 250. Then, the control unit 2 opens the APC valve, separating the second member 220 and the first member 210. The control unit 2 also generates plasma (for example, oxygen plasma) in the plasma processing space 10s. As a result, radicals generated by the plasma are supplied to the seal member 250 provided on the APC valve, and the marker 253 is removed from the seal member body 251 (seal member 250). Note that the plasma generation may be, for example, a seasoning treatment or a cleaning treatment.

[0058] In step S106, the second member 220 is brought into contact with the sealing member 250 to form the sealing portion 200. Figure 8 shows the state after the second member 220 has been attached.

[0059] As shown in Figure 8, the upper side of the seal member body 251 and the opposing surface 220s of the second member 220 are brought into contact. For example, if the seal portion 200 is a seal portion provided between the valve body member and the valve seat member of an APC valve, the valve body (second member 220) is moved toward the valve seat member (first member 210), and the valve body (second member 220) and the seal member 250 (seal member body 251) are brought into contact to close the opening 211.

[0060] Here, as shown in steps S102 to S103, the state of the sealing member 250 fitted into the groove 215 can be confirmed based on the shape of the marker 253. This ensures that the sealing member 250 is properly fitted into the groove 215. Therefore, it is possible to prevent the sealing member 250 from falling out of the groove 215.

[0061] Furthermore, as shown in Figure 8, when the marker 253 is removed, the sealing member body 251 comes into contact with the opposing surface 220s of the second member 220. This improves the sealing performance of the sealing portion 200.

[0062] [Structure of the seal portion of the second embodiment] Next, the structure of the seal portion 200A of the second embodiment will be described using Figures 9 to 12. Figure 9 is an example of a partial cutaway perspective view showing a part of the seal member 250A cut off. Figure 10 is an example of a cross-sectional view showing the state in which the seal member 250A is attached to the groove portion 215 of the first member 210. Figure 11 is an example of a plan view of the first member 210 viewed from above in the state in which the seal member 250A is attached to the groove portion 215 of the first member 210. Figure 12 is an example of a cross-sectional view showing the structure of the seal portion 200A.

[0063] First, the configuration of the seal portion 200A will be explained using Figure 12. As shown in Figure 12, the seal portion 200A includes a first member 210, a second member 220, and a seal member 250A. The seal portion 200A seals the gap between the first member 210 and the second member 220 by sandwiching the seal member 250A between them. Here, the seal portion 200A of the second embodiment shown in Figures 9 to 12 differs from the seal portion 200 of the first embodiment shown in Figures 5 to 8 in the configuration of the seal member 250A. The other configurations are the same, and redundant explanations will be omitted. Furthermore, the process for forming the structure of the seal portion 200A of the second embodiment is the same as the process for forming the structure of the seal portion 200 of the first embodiment shown in Figure 4, except that the seal member 250A is used instead of the seal member 250, and redundant explanations will be omitted.

[0064] The sealing member 250A before being attached to the sealing portion 200A will be described with reference to Figure 9. As shown in Figure 9, the sealing member 250A is a ring-shaped member. The sealing member 250A has a first portion 251A and a second portion 252A that constitute the sealing member body, and a marker (visibility portion) 253A. Here, the direction through which the opening formed by the ring-shaped sealing member 250A passes is defined as the axial direction. The marker 253A is provided on one side in the axial direction (the upper side in Figure 9). The marker 253A is also provided on the surface of the second portion 252A.

[0065] The sealing member body (251A, 252A) of the sealing member 250A is formed in an annular shape (torus shape) and is molded from two different materials. The sealing member body (251A, 252A) of the sealing member 250A has a first portion 251A made of a first material and a second portion 252A made of a second material. Here, the direction through which the opening formed by the annular sealing member 250A passes is defined as the axial direction. One side in the axial direction (the lower side in Figure 9) becomes the first portion 251A, and the other side in the axial direction (the upper side in Figure 9) becomes the second portion 252A.

[0066] Furthermore, the first portion 251A is the portion of the first member 210 that abuts against the bottom surface 215s and / or side surface of the groove 215. The second portion 252A is the portion of the second member 220 that abuts against the opposing surface 220s.

[0067] The second material constituting the second portion 252A is made of a material that is less prone to adhesion than the first material constituting the first portion 251A. Furthermore, the first material constituting the first portion 251A may be made of a material that has a higher holding force in the groove (for example, a material with high adhesive strength) than the second material constituting the second portion 252A.

[0068] Specifically, the first material is composed of, for example, fluororubber or silicone rubber. Specifically, the first material can be any of the following: vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), fluorosilicone rubber (FVMQ), etc.

[0069] Furthermore, the second material is composed of a material to which a filler has been added, for example, fluororubber or silicone rubber. Specifically, the fluororubber or silicone rubber used in the second material is composed of one of the following: vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), fluorosilicone rubber (FVMQ), etc. Furthermore, the filler added to the second material is Al ２ O ３ , TiO ２ Si, SiO ２ Any of the following can be used: C, etc. Note that the fluororubber or silicone rubber used in the first material and the fluororubber or silicone rubber used in the second material may be the same fluororubber or silicone rubber, or they may be different fluororubber or silicone rubbers.

[0070] Furthermore, the first part 251A and the second part 252A may have different colors. Specifically, the color of the second material may differ from the color of the first material by adding a filler. Also, even if the first material and the second material have the same color, the first part 251 and the second part 252 may have different colors by adding a coloring agent to either the first or the second material. Alternatively, a configuration in which different coloring agents are added to the first material and the second material may also be used. Furthermore, it is preferable that the colors of the first part 251A and the second part 252A are complementary colors to each other.

[0071] The marker 253A is provided on the upper surface of the sealing member body (251A, 252A). For example, the marker 253A is provided on the upper end portion of the sealing member body (251A, 252A). Specifically, the marker 253A is provided on the surface of the second portion 252A of the sealing member body. The marker 253A is also formed in an annular shape along the shape of the annular sealing member body (251A, 252A). Furthermore, the marker 253A is formed on the portion that is exposed from the opening of the groove 215 when the sealing member 250A is attached to the groove 215 of the first member 210 (see Figures 10 and 11). In addition, when no external force is applied to the sealing member 250A (sealing member body (251A, 252A)), the marker 253A is formed in a linear shape of equal width. The line width of the marker 253A is preferably, for example, 1 mm or more.

[0072] For example, if the sealing member body (251A, 252A) is torus-shaped, the marker 253A is formed in a circular shape when viewed axially (viewed from above). Furthermore, the circular marker 253A is not limited to being provided on the upper end portion of the sealing member body (251A, 252A). The marker 253A may be formed on the portion that is exposed from the opening of the groove 215 when the sealing member 250A is attached to the groove 215 of the first member 210, and may also be provided at a position shifted inward or outward from the upper end portion of the sealing member body 251.

[0073] Furthermore, the marker 253A has a surface condition that allows it to be visually distinguished from the sealing member body (251A, 252A). For example, the sealing member body (251A, 252A) and the marker 253A may be different in color. It is preferable that there is a large difference in color between the sealing member body (251A, 252A) and the marker 253A. For example, the sealing member body (251A, 252A) may be black, while the marker 253A may be white, yellow, or the like. Also, the color of the marker 253A and the color of the sealing member body (251A, 252A) may be complementary colors.

[0074] Furthermore, the marker 253A is made of a material that can be removed from the sealing member body (251A, 252A). In other words, the marker 253A is made of a material that can be selectively removed from the sealing member body (251A, 252A).

[0075] For example, if the sealing member body (251A, 252A) is resistant to chemicals (e.g., water, alcohol, organic solvent, fluorine solvent, etc.), the marker 253A may be made of a material that can be removed with a chemical (e.g., beeswax, water-based paint, oil-based paint, etc.). For example, the marker 253A can be wiped off using a chemical.

[0076] Furthermore, if the sealing member body (251A, 252A) is made of a heat-resistant material, the marker 253A may be made of a material that can be removed by raising the temperature of the sealing member 250A (for example, to 60°C, etc.) (for example, beeswax, low-temperature decomposable particles, etc.).

[0077] Furthermore, if the sealing member body (251A, 252A) is made of a radical-resistant material, the marker 253A may be made of a material that can be removed by radicals (e.g., oxygen radicals, fluorine radicals, etc.) (e.g., hydrocarbon resin, hydrocarbon oil and CNT (carbon nanotube), etc.).

[0078] The marker 253A may be a coating film formed by applying a material to the upper part of the sealing member body (251A, 252A), for example. Alternatively, the marker 253A may be formed by printing a material on the upper part of the sealing member body (251A, 252A), for example. Furthermore, the marker 253A is not limited to these methods and may be formed by, for example, laser, PVD, CVD, ALD, etc.

[0079] As a result, when fitting the sealing member 250A into the groove 215 (see steps S101 to S104 in Figure 4), the worker can easily distinguish between the first portion 251A and the second portion 252A. Therefore, the worker can fit the sealing member 250A into the groove 215 such that the first portion 251A is on the back side of the groove 215 and the second portion 252A is on the entrance side of the groove 215.

[0080] Furthermore, with the sealing member 250A, it is possible to determine whether the sealing member 250A is properly positioned in the groove 215 by checking the state of the marker 253A. In other words, the worker can ensure the integrity of the sealing member 250A by checking the state of the marker 253A while fitting the sealing member 250A into the groove 215. Therefore, the sealing performance of the sealing member 250A can be improved.

[0081] Here, as shown in Figure 12, the removal of the marker 253A (see step S105 in Figure 4) causes the second portion 252A of the sealing member body to come into contact with the opposing surface 220s of the second member 220. This improves the sealing performance of the sealing portion 200A.

[0082] Furthermore, it is possible to prevent or suppress the sealing member 250A (second portion 252A) from becoming fixed to the second member 220. This prevents or suppresses the sealing member 250A from falling out of the groove 215 when the second member 220 is separated from the first member 210. As a result, even when the second member 220 is brought into contact with the first member 210 again, the sealing performance of the sealing member 250A can be ensured. Therefore, the sealing performance of the sealing member 250A can be improved.

[0083] Alternatively, while the sealing member 250A is held in the groove 215 of the first member 210, the first portion 251A of the sealing member 250A may be made to adhere to the first member 210. For example, the first portion 251A of the sealing member 250A may be made to adhere to the bottom surface 215s of the groove 215. This improves the holding force of the groove 215 in holding the sealing member 250A, and further prevents the sealing member 250A from falling out of the groove 215.

[0084] An example of molding the sealing member 250A will be described. The first part 251A is formed by filling a mold with a first material to form an annular member with a semicircular cross-section. The second part 252A is formed by filling a mold with a second material to form an annular member with a semicircular cross-section. Then, the first part 251A and the second part 252A may be combined and heat-treated to form a single sealing member 250A.

[0085] While embodiments of the plasma processing system have been described above, this disclosure is not limited to the embodiments described above, and various modifications and improvements are possible within the scope of the gist of this disclosure as described in the claims.

[0086] The embodiments disclosed above include, for example, the following aspects: (Note 1) A sealing member used in a sealing portion of a substrate processing apparatus, comprising: a sealing member body having an annular shape; and a visible portion provided on the surface of the sealing member body and having a different color from the sealing member body, wherein the direction through which the opening formed by the sealing member body is axial, and the visible portion is provided on one side in the axial direction. (Note 2) The sealing member according to Note 1, wherein the sealing portion has a groove into which the sealing portion is fitted, and the visible portion is provided at a position that is exposed from the opening of the groove when the sealing member is fitted into the groove. (Note 3) The sealing member according to Note 1 or Note 2, wherein when no external force is applied to the sealing member, the visible portion is formed in a linear shape of equal width. (Note 4) The sealing member according to Note 3, wherein the line width of the visible portion is 1 mm or more. (Note 5) The sealing member according to any one of Notes 1 to 4, wherein the visible portion is made of a material that can be removed by a chemical solution. (Note 6) The sealing member according to any one of Notes 1 to 4, wherein the visible portion is made of a material that can be removed by heating. (Note 7) The sealing member according to any one of Notes 1 to 4, wherein the visible portion is made of a material that can be removed by radicals. (Note 8) The sealing member body comprises a first portion made of a first material and a second portion made of a second material different from the first material, and the visible portion is provided on the surface of the second portion, according to any one of Notes 1 to 7. (Note 9) The sealing member according to Note 8, wherein the second material is made of a material that is less likely to adhere than the first material.(Note 10) A substrate processing apparatus having a sealing portion, wherein the sealing portion comprises: a first member having a groove on a first opposing surface; a second member having a second opposing surface facing the first opposing surface of the first member; a sealing member disposed in the groove; and a control unit, wherein the sealing member comprises: a sealing member body having an annular shape; and a visible portion provided on the surface of the sealing member body and having a different color from the sealing member body, wherein the direction through which the opening formed by the sealing member body penetrates is defined as the axial direction, and the visible portion is provided on one side in the axial direction, the substrate processing apparatus. (Note 11) The substrate processing apparatus according to Note 10, wherein the control unit is configured to perform a step of heating the sealing member and vaporizing the visible portion to remove it. (Note 12) The substrate processing apparatus according to Note 10, wherein the control unit is configured to perform a step of supplying radicals to the sealing member to remove the visible portion. (Note 13) A method for assembling a seal portion comprising: a first member having a groove on a first opposing surface; a second member having a second opposing surface facing the first opposing surface; and a seal member disposed in the groove, the method comprising: fitting the seal member having an annular seal member body and a visible portion of a different color from the seal member body, provided on the surface of the seal member body on one side in the axial direction with the direction penetrating the opening formed by the seal member body as the axial direction; confirming the state of the seal member fitted into the groove based on the shape of the visible portion; removing the visible portion; and bringing the second opposing surface of the second member into contact with the seal member.

[0087] Furthermore, this application claims priority based on Japanese Patent Application No. 2025-006840, filed on 17 January 2025, and the entire contents of these Japanese Patent Applications are incorporated herein by reference.

[0088] 1 Plasma processing apparatus 40 Exhaust system 200, 200A Seal part 210 First member 210s Opposing surface (first opposing surface) 211 Opening 215 Groove part 215s Bottom surface 220 Second member 220s Opposing surface (second opposing surface) 250, 250A Seal member 251 Seal member body 251A First part (seal member body) 252A Second part (seal member body) 253, 253A Marker (visibility part) 301 Compression part 302 Tension part 303 Twist part

Claims

1. A sealing member used in a sealing portion of a substrate processing apparatus, comprising: a sealing member body having an annular shape; and a visible portion provided on the surface of the sealing member body and having a different color from the sealing member body, wherein the direction in which the sealing member body penetrates the opening formed by the sealing member body is defined as the axial direction, and the visible portion is provided on one side in the axial direction.

2. The sealing portion has a groove into which the sealing portion is fitted, and the visible portion is provided at a position that is exposed from the opening of the groove when the sealing member is fitted into the groove, according to claim 1.

3. The sealing member according to claim 1, wherein, when no external force is applied to the sealing member, the visible portion is formed in a linear shape of equal width.

4. The sealing member according to claim 3, wherein the line width of the visible portion is 1 mm or more.

5. The sealing member according to claim 1, wherein the visible portion is made of a material that can be removed with a chemical solution.

6. The sealing member according to claim 1, wherein the visible portion is made of a material that can be removed by heating.

7. The sealing member according to claim 1, wherein the visible portion is made of a material that can be removed by radicals.

8. The sealing member according to claim 1, wherein the sealing member body comprises a first portion made of a first material and a second portion made of a second material different from the first material, and the visible portion is provided on the surface of the second portion.

9. The sealing member according to claim 8, wherein the second material is made of a material that is less prone to adhesion than the first material.

10. A substrate processing apparatus having a sealing portion, wherein the sealing portion comprises: a first member having a groove on a first opposing surface; a second member having a second opposing surface facing the first opposing surface of the first member; a sealing member disposed in the groove; and a control unit, wherein the sealing member comprises: a sealing member body having an annular shape; and a viewing portion provided on the surface of the sealing member body and having a different color from the sealing member body, wherein the direction through which the opening formed by the sealing member body penetrates is defined as the axial direction, and the viewing portion is provided on one side in the axial direction.

11. The substrate processing apparatus according to claim 10, wherein the control unit is configured to perform the step of heating the sealing member and vaporizing the visible portion to remove it.

12. The substrate processing apparatus according to claim 10, wherein the control unit is configured to perform the step of supplying radicals to the sealing member to remove the visible portion.

13. A method for assembling a seal portion comprising: a first member having a groove on a first opposing surface; a second member having a second opposing surface facing the first opposing surface; and a seal member disposed in the groove, the method comprising: fitting the seal member having an annular seal member body and a visible portion of a different color from the seal member body, provided on the surface of the seal member body on one side in the axial direction with the direction penetrating the opening formed by the seal member body as the axial direction; confirming the state of the seal member fitted into the groove based on the shape of the visible portion; removing the visible portion; and bringing the second opposing surface of the second member into contact with the seal member.

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