Substrate processing apparatus

Abstract

The present invention relates to a substrate processing apparatus and, more particularly, to a substrate processing apparatus for simultaneously processing a plurality of substrates. The present invention provides a substrate processing apparatus comprising: an inner tube (110) forming a processing space (S1) therein and having a protrusion (111) radially formed on an outer surface of an open lower end thereof; an outer tube (120) in which the inner tube (110) is disposed, the outer tube (120) having an installation groove (121) formed on an inner surface thereof, wherein the protrusion (111) is inserted into and in contact with and supported by the installation groove (121); and a heater unit (10) disposed outside the outer tube (120) and heating the processing space (S1).

Description

Substrate processing device

[0001] The present invention relates to a substrate processing apparatus, and more specifically, to a substrate processing apparatus that processes a plurality of substrates simultaneously.

[0002] A substrate processing device is a configuration for performing substrate processing such as deposition, etching, and heat treatment on a substrate, and can be classified into single-wafer type, batch type, etc. A batch-type substrate processing device refers to a configuration that performs substrate processing by stacking multiple substrates in a vertical direction.

[0003] A batch-type substrate processing device of this type may generally include a reaction tube section in which a plurality of substrates are arranged in multiple stages to perform substrate processing, a substrate support unit for stacking a plurality of substrates vertically inside the reaction tube, a heater section for creating a process temperature atmosphere inside the reaction tube section, and a gas injection nozzle installed with a length in the vertical direction of the reaction tube to inject process gas.

[0004] Meanwhile, in conventional substrate processing devices, materials including metal are applied considering the combination and processing of each component, and in particular, metal materials are applied partially or wholly to the part in contact with the substrate support unit at the bottom of the reaction tube section and to the lower side of the substrate support unit, so that metal is exposed within the processing space where the substrate is processed.

[0005] However, in this case, as the metal is continuously and repeatedly exposed to the cleaning gas introduced to clean the processing space after the substrate processing is completed, the area is corroded, reducing durability, and there is a problem that the quality of the processed substrate is degraded due to contamination generated during the corrosion process.

[0006] In particular, conventional substrate processing devices have a problem in which the metal manifold is exposed to the processing space because the separate support relationship between the inner tube and the outer tube is omitted and they are supported directly or indirectly through the metal manifold at the bottom.

[0007] The objective of the present invention is to provide a substrate processing device in which a direct support relationship is applied between an inner tube and an outer tube in order to solve the above-mentioned problems.

[0008] The present invention is created to achieve the purpose of the present invention as described above, and the present invention discloses a substrate processing device comprising: an inner tube (110) having a processing space (S1) formed inside and a radially protruding portion (111) formed on an open lower outer surface; an outer tube (120) having the inner tube (110) disposed inside and having an installation groove (121) formed on an inner surface into which the protruding portion (111) is inserted and which contacts and supports the protruding portion (111); and a heater portion (10) that heats the processing space (S1) from the outside of the outer tube (120).

[0009] The inner tube (110) and the outer tube (120) may be formed of the same non-metallic material.

[0010] The inner tube (110) and the outer tube (120) can be formed from a single quartz material.

[0011] The outer tube (120) may include a passage groove (122) that extends from the installation groove (121) to the bottom so that the protrusion (111) can pass through, so that the protrusion (111) is inserted into the installation groove (121).

[0012] The outer tube (120) may include a lower surface (129) on the lower side relative to the installation groove (121) to define the installation groove (121), an upper surface (128) on the upper side relative to the installation groove (121), and a concave inner surface (127) formed between the lower surface (129) and the upper surface (128).

[0013] The outer tube (120) may include a seating groove (123) formed flatly so that the protrusion (111) is seated on the upper surface of the lower surface (129).

[0014] The above protrusions (111) may be provided in multiple numbers spaced apart from each other on the outer surface of the inner tube (110).

[0015] The above installation groove (121) may be formed in multiple numbers that correspond to a plurality of the above protrusions (111) and are separated from each other.

[0016] It may include a separating part (124) that is extended and formed between the lower surface (129) and the upper surface (128) to separate the installation groove (121) from each other so as to correspond to a plurality of protrusions (111) spaced apart from each other.

[0017] The above separation part (124) may be formed at a location adjacent to the above passage groove (122).

[0018] The above outer tube (120) may include a lower portion (140) in which the installation groove (121) is formed on the lower side, and an upper tube (130) that extends upward from the lower portion (140) and has a closed upper end.

[0019] The lower portion (140) may have an inner diameter smaller than the inner diameter of the upper tube (130) to form a step with the upper tube (130).

[0020] The interspace (S2) between the processing space (S1), the inner tube (110), and the outer tube (120) can communicate with each other through the passage groove (122).

[0021] A gas injection nozzle (300) may be additionally included, which is installed by horizontally penetrating the lower region of the side wall of the outer tube (120) based on the installation groove (121) to inject process gas into the processing space (S1).

[0022] It may include a boat portion (700) that supports a plurality of substrates (1) by stacking them and is inserted into the processing space (S1) through vertical movement, and a cap flange portion (800) that supports the boat portion (700) from below and rises to contact the bottom of the outer tube (120) to seal the processing space (S1).

[0023] The substrate processing device according to the present invention has the advantage of preventing the exposure of metal materials within the processing space and exposing only non-metal materials, thereby preventing corrosion of the components even when using corrosive gases such as cleaning gases, which enhances the durability of the device and improves the quality of substrate processing through prevention of contamination.

[0024] In addition, the substrate processing device according to the present invention has the advantage of increasing space utilization through direct support between an inner tube and an outer tube made of non-metallic material, and preventing metal exposure to the processing space by omitting the metal support structure.

[0025] In particular, the substrate processing device according to the present invention has the advantage of superior support rigidity compared to a configuration in which a protrusion protruding from the inner surface of the outer tube is seated and supported, as the protrusion of the inner tube is inserted and supported within a groove structure formed on the inner surface of the outer tube.

[0026] In addition, the substrate processing device according to the present invention has the advantage of maximizing the volume of the processing space by minimizing the space between the outer tube and the inner tube, as the side wall of the inner tube can be installed in close proximity to the inner surface of the outer tube as the protrusion of the inner tube is inserted into the groove structure on the inner surface of the outer tube.

[0027] Thus, the substrate processing device according to the present invention has the advantage of increasing space efficiency and gas usage efficiency by increasing the diameter of the processing space of the inner tube, thereby reducing the dead volume of the processing space within the device as it becomes larger, and preventing damage to the substrate and various components by preventing collision between the rotating boat part and the inner tube.

[0028] FIG. 1 is a cross-sectional view showing a substrate processing apparatus according to the present invention.

[0029] FIG. 2 is an enlarged cross-sectional view showing the installation of a gas injection nozzle in a substrate processing device according to FIG. 1.

[0030] FIG. 3 is an exploded perspective view showing the configurations of the gas injection nozzle, gas supply unit, fastening unit, and sealing unit of the substrate processing device according to FIG. 2.

[0031] FIG. 4 is a perspective view showing the manifold section of the substrate processing device according to FIG. 2.

[0032] Figure 5 is a drawing showing the appearance of an installation hole in the manifold section of a substrate processing device according to Figure 4.

[0033] FIG. 6 is a cross-sectional view showing the cap flange portion in close contact with the reaction tube portion of the substrate processing apparatus according to FIG. 1.

[0034] FIG. 7 is an enlarged cross-sectional view showing the relationship between the cap flange portion and the base portion according to one embodiment of the substrate processing apparatus according to FIG. 1.

[0035] FIG. 8 is an exploded perspective view showing the connection between each component of the cap flange part and the base part of the substrate processing device according to FIG. 1.

[0036] FIG. 9 is a plan view showing the appearance of an inner tube in a substrate processing apparatus according to FIG. 1.

[0037] FIG. 10 is a drawing showing the inner surface of the lower part of the outer tube of the substrate processing device according to FIG. 1.

[0038] FIG. 11 is a cross-sectional view showing a part of the appearance of a substrate support unit among the substrate processing apparatus according to FIG. 1.

[0039] FIG. 12 is a perspective view showing the fixed insulation part and the rotating insulation part of the substrate support unit of the substrate processing device according to FIG. 11.

[0040] The substrate processing apparatus according to the present invention will be described below with reference to the attached drawings.

[0041] As shown in FIGS. 1 to 5, the substrate processing device according to the present invention comprises: a reaction tube section (100) made of a first material having an open bottom and a processing space (S1) formed inside; a manifold section (200) made of a second material arranged to surround the reaction tube section (100) from the outside and supporting the bottom of the reaction tube section (100); a gas injection nozzle (300) that penetrates the reaction tube section (100) and the manifold section (200) in common and injects process gas into the processing space (S1); and a gas supply section (400) installed on the outer surface of the manifold section (200) to communicate with the gas injection nozzle (300) and to deliver the process gas.

[0042] Additionally, the substrate processing device according to the present invention may include a connecting part (500) that is connected to a gas supply part (400) and coupled to a manifold part (200) to connect the gas supply part (400) to the manifold part (200), a spacer (610) installed to surround a gas injection nozzle (300) on the outside of a reaction tube part (100), and a sealing part (600) including a first sealing member (620) provided between the spacer (610) and the end of the gas supply part (400).

[0043] Here, the substrate (1) subject to substrate treatment according to the present invention is configured to perform substrate treatment such as deposition and heat treatment, and any substrate such as a semiconductor manufacturing substrate, an LCD manufacturing substrate, an OLED manufacturing substrate, a solar cell manufacturing substrate, or a transparent glass substrate can be applied.

[0044] In particular, the substrate processing device according to the present invention may be configured to perform cleaning by injecting a halogen-based cleaning gas, such as F2 or Cl2, into the interior after substrate processing, thereby preventing exposure to the metal material processing space and improving corrosion resistance.

[0045] The above reaction tube (100) is configured such that the bottom is open and a processing space (S1) is formed inside, and various configurations are possible.

[0046] At this time, the reaction tube (100) may be formed of a first non-metallic material to prevent exposure of the metal material to the processing space (S1), and the first non-metallic material may be, for example, quartz.

[0047] That is, the reaction tube (100) can be composed of a single quartz (SiO2) material, and in particular, a single non-metallic material, i.e., a single quartz material, rather than a combination of metal and non-metal.

[0048] For example, the reaction tube section (100) may be configured as a single tube with a processing space (S1) formed inside, and as another example, as shown in FIG. 1, it may include an inner tube (110) that forms a processing space (S1) inside as a double tube, and an outer tube (120) that surrounds the inner tube (110) so that the inner tube (110) is spaced apart inside, with the bottom open and the top closed.

[0049] Meanwhile, the inner tube (110) and the outer tube (120) can be supported through a manifold section (200) provided at the bottom, and in particular, the outer tube (120) can be supported by direct contact through the manifold section (200) described later, and the inner tube (110) can be supported indirectly through the manifold section (200) by being supported through the outer tube (120).

[0050] The inner tube (110) is configured to have an open bottom and forms a processing space (S1) inside, and can be composed of a single non-metallic quartz material like the outer tube (120) described above.

[0051] At this time, the inner tube (110) may be provided with an open ceiling or a dome-shaped ceiling, or as another example, may be applied with a closed ceiling and a flat ceiling surface.

[0052] The above outer tube (120) may be configured such that it is placed inside the heater section (10), is made of a non-metallic quartz material, and has a ceiling formed in a dome shape.

[0053] At this time, the outer tube (120) can be supported through the manifold section (200) described later.

[0054] Meanwhile, a detailed description of the installation relationship and specific configuration between the inner tube (110) and the outer tube (120) according to the present invention will be provided later.

[0055] The above manifold section (200) is configured to surround the reaction tube section (100) from the outside and to support the lower end of the reaction tube section (100), and various configurations are possible.

[0056] At this time, the manifold section (200) may be composed of a second material different from the first material having rigidity and ease of processing, so as to support the reaction tube section (100), which is non-metallic as the first material, and at the same time, install the gas injection nozzle (300) and gas supply section (400) described later.

[0057] For example, the above manifold part (200) may be formed of a second metal material, and more specifically, Hastelloy such as SUS, Al, and nickel alloy may be applied.

[0058] Additionally, as shown in FIG. 4, the manifold section (200) may include an annular manifold (210) that surrounds the lower side of the reaction tube section (100) through which a gas injection nozzle (300) is installed, and a support section (220) that extends inwardly from the lower part of the manifold (210) to support the lower end of the reaction tube section (100).

[0059] That is, the support member (220) is formed in an annular shape at the bottom of the manifold (210) and can be formed to protrude to support a part of the bottom of the reaction tube (100), i.e., the bottom of the outer tube (120).

[0060] Additionally, the manifold section (200) may be formed of metal with consideration for rigidity, ease of processing, and durability so that the gas injection nozzle (300) and gas supply section (400) described later can be installed as described above, but it may be installed to surround the lower outer surface of the reaction tube section (100) to prevent metal exposure within the processing space (S1).

[0061] More specifically, it can be installed to support an outer portion of the lower part of the outer tube (120) by contacting it, and can be installed on a flat surface outside the inner surface of the outer tube (120).

[0062] Meanwhile, the above manifold section (200) may be configured to have a gas injection nozzle (300) to be installed through it and to fix a gas supply section (400) connected to the gas injection nozzle (300) to supply process gas.

[0063] To this end, the manifold part (200) may have an installation hole (201) formed on its side through which a gas injection nozzle (300) passes and is supported.

[0064] At this time, the installation hole (201) is formed by penetrating the side of the manifold (210), and may be formed in a circular or elliptical shape corresponding to the cross-section of the gas injection nozzle (300), and may be provided in multiple numbers along the circumferential direction of the outer surface of the manifold (210) corresponding to a plurality of gas injection nozzles (300).

[0065] Meanwhile, the above-mentioned installation hole (201) may be formed with an inner diameter corresponding to the outer diameter of the spacer (610) and the gas supply unit (400) so that the spacer (610) and the gas supply unit (400), which will be described later, are inserted and supported.

[0066] Additionally, the manifold portion (200) may include an extension groove (202) that is formed through and extends radially from the front mounting hole (201), as shown in FIG. 5.

[0067] For example, the manifold section (200) may be formed as a groove structure having a certain length extending radially from the installation hole (201), and may be formed symmetrically on both sides from the center of the installation hole (201).

[0068] Thus, the extension groove (202) allows access to a tool for removing the first sealing member (620) and the second sealing member (630) of the sealing part (600) installed on the inner side of the installation hole (201), thereby enabling the first sealing member (620) and the second sealing member (630) to be removed and replaced from the outside.

[0069] That is, when the extension groove (202) is omitted, the first sealing member (620) is installed on the outer surface of the gas injection nozzle (300) along the inner surface of the circular installation hole (201). Since the first sealing member (620) is compressed between the inner surface of the installation hole (201) and the outer surface of the gas injection nozzle (300), there is a problem that it is difficult to remove by accessing from the outside.

[0070] To improve this, a gap is formed between the first sealing member (620) and the inner surface of the installation hole (201) through an extension groove (202) that is radially extended in the installation hole (201), and a tool for removing the first sealing member (620) is inserted so that the first sealing member (620) can be easily removed and replaced from the outside.

[0071] Meanwhile, the above manifold section (200) is a sealing section (600) described later, and is equipped with a first sealing member (620) and a second sealing member (630) that are prone to damage due to high temperature. Furthermore, in order to prevent damage to the first sealing section (813) and the second sealing section (830) of a cap flange section (800) that may be provided at an adjacent location, it may include a cooling channel (203) formed to allow a refrigerant to circulate.

[0072] The above cooling channel (203) is configured to allow refrigerant supplied from the outside to circulate inside the manifold (210), and may be formed internally through processing or may be formed by installing a separate pipe through which refrigerant flows.

[0073] At this time, the cooling channel (203) is formed by processing on the lower side of the manifold (210) as shown in FIG. 2, and receives a refrigerant at a relatively low temperature from an external refrigerant source, and can induce the refrigerant, after heat exchange is finished, to be discharged to the refrigerant source side.

[0074] In addition, as shown in FIG. 5, the manifold portion (200) may have a bolt groove (204) formed on the side of the manifold (210) for a fastening means to be bolted through the fastening portion (500), thereby allowing the fastening portion (500) to be fixed to the manifold portion (200) as the fastening means passing through the fastening portion (500) described later is bolted.

[0075] Meanwhile, the above manifold section (200) can be coupled with the reaction pipe fixing section (40) at the top, and the reaction pipe fixing section (40) can be fixed by being coupled with the manifold section (200) while covering the upper surface of the flange protruding outward from the bottom of the reaction pipe section (100).

[0076] The above gas injection nozzle (300) may be configured to penetrate the reaction tube section (100) and the manifold section (200) in common and to inject process gas into the processing space (S1).

[0077] For example, the gas injection nozzle (300) is an 'L'-shaped nozzle and is connected to a gas supply unit (400) to receive process gas and can inject process gas toward a plurality of substrates (1) arranged in a vertical direction.

[0078] That is, the gas injection nozzle (300) may include a vertical section that injects process gas by forming a plurality of injection holes in the vertical direction and a horizontal section that extends horizontally from the bottom of the vertical section and is installed by penetrating the reaction pipe section (100) and the manifold section (200).

[0079] Meanwhile, the gas injection nozzle (300) may be installed by penetrating the lower end of the reaction pipe (100) in a horizontal direction to prevent exposure of a metal material such as the manifold part (200) inside the processing space (S1), and may be positioned so that its end protrudes from the installation hole (201) of the manifold part (200) to a predetermined degree.

[0080] The above gas supply unit (400) is configured to be installed on the outer surface of the manifold unit (200) to communicate with the gas injection nozzle (300) and to deliver process gas, and various configurations are possible.

[0081] That is, the gas supply unit (400) may be configured to deliver process gas by being connected to an external gas supply source and connected to a gas injection nozzle (300) that protrudes through the installation hole (201) of the manifold unit (200).

[0082] For example, the gas supply unit (400) may include a gas supply pipe (410) into which a portion of the end of the gas injection nozzle (300) is inserted and connected, and a pipe connection unit (420) provided on the outer surface of the gas supply pipe (410) and connected to a connection unit (500).

[0083] The above gas supply pipe (410) may be configured to have an inner diameter corresponding to the outer diameter of the gas injection nozzle (300) so that a part of the end of the gas injection nozzle (300) is inserted.

[0084] At this time, the gas supply pipe (410) may have a flow path formed inside with an inner diameter smaller than the inner diameter of the gas injection nozzle (300), and may be formed so that the end of the gas injection nozzle (300) is inserted.

[0085] Meanwhile, the outer diameter of the gas supply pipe (410) is formed to correspond to the installation hole (201) so that at least a portion can be inserted into the installation hole (201), and a second sealing member (630) is arranged to surround the outer surface of the gas injection nozzle (300) on the front side so that the second sealing member (630) can be pressed toward the spacer (610) described later.

[0086] The above pipe connection part (420) is configured to be provided on the outer surface of the gas supply pipe (410) and connected to the connection part (500), and various configurations are possible.

[0087] For example, the pipe connection part (420) may be configured such that screw threads are formed on its outer surface, and the connection nut (520) of the connection part (500) described later is connected by a bolt connection, and the manifold part (200), the connection part (500), and the gas supply part (400) may all be fixed by connecting to the bolt groove (204) through a connection means while the connection part (500) is screw-connected to the pipe connection part (420).

[0088] Meanwhile, the pipe connection part (420) may be provided on the outer surface of the gas supply pipe (410) so as to be rotatable while interfering with the gas supply pipe (410), and may be bolted to the connection nut (510) of the connection part (500) as it rotates.

[0089] At this time, the gas supply unit (400) is provided with an extension unit (430) as a kind of handle or rotating object integrally at the rear of the pipe connection unit (420), so that the connection nut (510) and the pipe connection unit (420) can be bolted together by rotating the extension unit (430) by various devices or users, thereby allowing the pipe connection unit (420) and the gas supply pipe (410) to be pressurized and moved forward.

[0090] Additionally, the gas supply unit (400) may further include a pipe heater unit (440) installed around the gas supply pipe (410) at the rear of the pipe connection unit (420) and the expansion unit (430) of the gas supply pipe (410) to control the temperature of the supplied process gas as shown in FIG. 2, and in particular to prevent the temperature from dropping during the process of supplying the process gas and to heat it to maintain an appropriate temperature.

[0091] For example, the pipe heater unit (440) is a jacket heater and is provided on the outer surface of the gas supply pipe (410) to heat the supplied process gas to maintain the temperature above a certain level.

[0092] The above-mentioned connecting part (500) may be configured to be connected to the gas supply part (400) and coupled to the manifold part (200) to connect the gas supply part (400) to the manifold part (200).

[0093] That is, the above-mentioned connecting part (500) may be configured to fix a gas supply part (400) that is connected to a gas injection nozzle (300) and delivers process gas to a manifold part (200), thereby indirectly fixing a gas injection nozzle (300) that is installed by penetrating the installation groove (201) of the manifold part (200) and connected to the gas supply part (400).

[0094] To this end, the fastening portion (500) may include a fastening nut (510) that is bolted to the outer surface of the gas supply portion (400) and connected to the manifold portion (200) through a fastening means, as shown in FIGS. 2 and 3, and a fastening pad (520) that is installed so that the gas supply portion (400) passes between the manifold portion (200) and the fastening nut (510).

[0095] The above-mentioned fastening nut (510) may be configured such that a thread corresponding to the thread formed on the outer surface of the gas supply part (400), that is, the pipe fastening part (420) described above, is formed on its inner surface to be bolted to the pipe fastening part (420), and a fastening means passes through and is coupled to the bolt groove (204) to be fixedly coupled to the outer surface of the manifold part (200).

[0096] More specifically, the fastening nut (510) is fixedly coupled to the outer surface of the manifold part (200) as the fastening means penetrates and is fastened to the bolt groove (204), and can penetrate so that the center corresponds to and aligns with the installation hole (201), and can be fixed in a state where the gas supply pipe (410) is pressurized and advanced toward the installation hole (201), i.e., toward the gas injection nozzle (300), by rotating the pipe fastening part (420) and bolting it to the outer surface of the pipe fastening part (420) while having a screw thread formed on the inner surface that is bolted according to the rotation of the pipe fastening part (420).

[0097] The above fastening pad (520) is positioned between the fastening nut (510) and the side of the manifold part (200), penetrates through a fastening means, and is fixed together with the fastening nut (510), and can perform a cushioning role between the fastening nut (510) and the manifold part (200).

[0098] The sealing part (600) may be configured to be installed surrounding the gas injection nozzle (300) to prevent gas leakage at the connection point between the gas injection nozzle (300) and the external gas supply part (400), and to prevent and fix movement in the forward and backward directions due to the process gas delivery pressure of the gas injection nozzle (300).

[0099] For example, the sealing portion (600) may include a spacer (610) installed around the gas injection nozzle (300) on the outside of the reaction tube portion (100), and a first sealing member (620) provided between the spacer (610) and the end of the gas supply portion (400).

[0100] Additionally, the sealing portion (600) may further include a second sealing member (630) that is positioned between the outer surface of the reaction tube portion (100) and the spacer (610) and is in close contact with the outer surface of the gas injection nozzle (300).

[0101] The above spacer (610) may be configured to be installed around the gas injection nozzle (300) in the installation hole (201) of the manifold section (200) to maintain a gap between the gas supply section (400) and the reaction pipe section (100).

[0102] In particular, the spacer (610) may be formed with an outer diameter corresponding to the inner diameter of the installation hole (201) and installed by being aligned within the installation hole (201), and may be configured such that a second sealing member (630) is positioned between the front side, i.e., the reaction tube section (100), and a first sealing member (620) is positioned between the rear side, i.e., the gas supply section (400), while the spacer is positioned surrounding the gas injection nozzle (300).

[0103] At this time, the spacer (610) may be formed with a front end and a rear end inclined so that it can be pressed toward the gas injection nozzle (300) as the second sealing member (630) positioned at the front and the first sealing member (620) positioned at the rear are pressed.

[0104] More specifically, the front end is formed with a slope such that the inner diameter increases as it moves toward the front side, thereby inducing the second sealing member (630) to be pressed toward the gas injection nozzle (300) as it is pressed toward the front side of the spacer (610), and the rear end is formed with a slope such that the inner diameter increases as it moves toward the rear side, thereby inducing the first sealing member (620) to be pressed toward the gas injection nozzle (300) as it is pressed toward the rear side of the spacer (610).

[0105] The first sealing member (620) may be configured to surround the outer surface of the gas injection nozzle (300) between the spacer (610) and the gas supply pipe (410) as shown in FIG. 2.

[0106] At this time, the first sealing member (620) can be pressed forward through the gas supply pipe (410) between the spacer (610) and the gas supply pipe (410) and simultaneously pressed against the outer surface of the gas injection nozzle (300) to be in close contact with the gas injection nozzle (300), and accordingly, the movement of the gas injection nozzle (300) forward and backward can be minimized through friction to fix the gas injection nozzle (300).

[0107] In addition, the first sealing member (620) can prevent gas leakage at the connection point between the reaction tube section (100), the gas injection nozzle (300), and the manifold section (200) and maintain a seal, and in particular, can prevent gas leakage by sealing the connection point between the end of the gas injection nozzle (300) and the gas supply pipe (410).

[0108] The second sealing member (630) may be configured to surround the outer surface of the gas injection nozzle (300) between the spacer (610) and the outer surface of the reaction tube (100).

[0109] At this time, the second sealing member (630) can be pressed forward through the spacer (610) between the outer surface of the reaction tube (100) and the spacer (610), and at the same time pressed against the outer surface of the gas injection nozzle (300), so as to be in close contact with the gas injection nozzle (300), and accordingly, the movement of the gas injection nozzle (300) forward and backward can be minimized through friction, thereby fixing the gas injection nozzle (300).

[0110] In addition, the second sealing member (630) can prevent gas leakage at the connection point between the reaction tube section (100), the gas injection nozzle (300), and the manifold section (200) and maintain the seal.

[0111] In the substrate processing device according to the present invention, since components such as a metal nozzle adapter and manifold for installing a gas injection nozzle (300) cannot be exposed within the processing space (S1) due to the influence of corrosion caused by exposure of various process gases, including cleaning gas, within the reaction tube section (100), as described above, the entire gas injection nozzle (300) and the reaction tube section (100) can be made of quartz material.

[0112] However, in this case, process gas must be supplied to the gas injection nozzle (300), which is made of quartz, through a connection between the gas injection nozzle (300) and the external gas supply unit (400), and in order to ensure the rigidity of the joint structure of these connection parts, the gas injection nozzle (300) may be extended through the outer tube (120) to the manifold unit (200), which is made of metal, to apply a joint structure with the gas supply unit (400).

[0113] More specifically, the gas injection nozzle (300), which is made of quartz, is extended through the outer tube (120) to the manifold part (200), which is made of metal, and the gas supply part (400) and the gas injection nozzle (300) are connected to each other in a sealed state through the connection part (500) so that process gas can be delivered without leakage.

[0114] In this process, since the gas injection nozzle (300) made of quartz material has relatively weak rigidity and is highly susceptible to damage, the gas supply unit (400) is not directly connected to the gas injection nozzle (300). Instead, the connecting unit (500) combined with the gas supply unit (400) is connected to the manifold unit (200), and at the same time, the sealing unit (600) including the first sealing member (620), the second sealing member (630), and the spacer (610) is pressurized to minimize the external force applied directly to the gas injection nozzle (300), thereby preventing damage while maintaining a seal between the gas supply unit (400) and the gas injection nozzle (300).

[0115] Thus, the substrate processing device according to the present invention can apply a gas injection nozzle (300) and an outer tube (120) made of quartz material to prevent metal exposure to the processing space (S1), and at the same time, ensure the connection and sealing between the gas injection nozzle (300) made of quartz material with low rigidity and the gas supply unit (400) through the pressing of the sealing unit (600) resulting from the connection through the manifold unit (200) made of metal material and the fastening unit (500).

[0116] Meanwhile, as another embodiment, the substrate processing device according to the present invention comprises: a reaction tube portion (100) of a first material having an open bottom and a processing space (S1) formed inside, as shown in FIGS. 1 and FIGS. 6 to 8; a boat portion (700) that supports a plurality of substrates (1) by stacking them and is inserted into the processing space (S1) through vertical movement; a cap flange portion (800) of a second material that supports the boat portion (700) from below the boat portion (700), rises to contact the bottom of the reaction tube portion (100) to seal the processing space (S1); and a base portion (900) of a third material provided on the cap flange portion (800), the edge of which is located outside the inner surface of the reaction tube portion (100).

[0117] In addition, the substrate processing device according to the present invention may further include a lower heater part (1000) that is coupled and installed on the lower surface of the cap flange part (800).

[0118] The above reaction tube (100) is composed of a first material with an open bottom and a processing space (S1) formed inside, and various configurations are possible.

[0119] In particular, the reaction tube section (100) may be composed of a single reaction tube as described above, and as another example, may be applied as a double tube structure of the inner tube (110) and outer tube (120) described above, and may be composed of a single non-metallic material.

[0120] At this time, the reaction tube portion (100) may include a contact surface that contacts the cap flange portion (800) on the inner side of the lower surface, and a stepped surface that forms a step with the contact surface on the outer side of the lower surface and is supported through the manifold portion (200).

[0121] That is, the lower surface of the lower part (140) of the outer tube (120) is contacted as the cap flange part (800) described later rises to form a contact surface for sealing the processing space (S1), and may include a stepped surface that is supported through a support part (220) and forms a step with the contact surface on the outside of the contact surface.

[0122] In this case, to prevent the metal material from being exposed in the processing space (S1) formed inside the reaction tube (100), a base part (900) of a third material provided on the cap flange part (800) may be positioned such that its edge is located outside the inner surface of the reaction tube (100).

[0123] That is, by positioning the edge of the base portion (900) on a part of the contact surface of the reaction tube portion (100), the exposure of the cap flange portion (800) to the bottom surface of the processing space (S1) can be prevented, and only the base portion (900) can be exposed.

[0124] Meanwhile, the specific configuration of the reaction tube (100) is as described above, so a redundant explanation is omitted and the above description can be applied in the same way.

[0125] The above boat section (700) may be configured to support a plurality of substrates (1) by stacking them and to be inserted into a processing space (S1) through vertical movement.

[0126] That is, the boat part (700) can be supported and integrally connected through the cap flange part (800) described later, and can be moved up and down together through the up and down movement of the cap flange part (800) to be introduced into the processing space (S1) or taken out of the processing space (S1).

[0127] At this time, the boat unit (700) can support a plurality of substrates (1) spaced apart from each other in the vertical direction, and accordingly, the plurality of substrates (1) can be introduced into and removed from the processing space (S1) so that substrate processing can be performed.

[0128] Meanwhile, the boat portion (700) can rotate around a virtual vertical line passing through the center while positioned on the cap flange portion (800), and accordingly, rotate within the processing space (S1) to improve the uniformity of substrate processing.

[0129] For example, the boat portion (700) may include a boat (710) that supports a plurality of substrates (1), and a boat support portion (720) that has one end connected to the boat (710) and the other end installed on a cap flange portion (800) to support the boat (710).

[0130] Additionally, the boat section (700) may further include a connecting support section (730) that is provided between the boat (710) and the boat support section (720) and connects the boat (710) and the boat support section (720).

[0131] The above boat (710) may be configured to support a plurality of substrates (1) spaced apart from each other in the vertical direction.

[0132] For example, the boat (710) may include, as shown in FIG. 11, a plate (713) forming at least one of the top and bottom, at least three support rods (712) arranged vertically parallel to each other on the plate (713), and a plurality of substrate support members (711) formed in the vertical direction on the support rods (712) to contact and support the substrate (1).

[0133] At this time, the plate (713) may have only a bottom and the top may be omitted, or it may be provided at both the top and bottom, and the bottom may be completely closed or the center may be open through it.

[0134] The boat support member (720) is configured to support the boat (710), with one end connected to the boat (710) and the other end installed on the cap flange member (800).

[0135] In addition, as another example, the boat support member (720) may be connected to a connecting support member (730) so that its upper end is connected to the boat (710) and its lower end is installed on a cap flange member (800).

[0136] At this time, the boat support member (720) may include a support flange (722) that is coupled to and installed on a turntable (820) provided on the cap flange member (800) and rotates integrally with the turntable (820), and a boat support rod (721) that is vertically provided on the support flange (722).

[0137] At this time, the boat support member (720) may be installed to cover the upper surface of the turntable (820) so as not to expose the metal turntable (820) to the processing space (S1), and more specifically, the diameter of the support flange (722) may be formed larger than the diameter of the turntable (820) to cover the turntable (820) on a flat surface so as not to expose the turntable (820) to the processing space (S1).

[0138] At this time, the support flange (722) can be installed in conjunction with the turntable (820), and as another example, as shown in FIG. 7, it can be provided so that the fixing pin part (840) described later is inserted while simply placed on the turntable (820) and can rotate integrally with the turntable (820).

[0139] The above connecting support member (730) is configured to be provided between the boat (710) and the boat support member (720) to connect the boat (710) and the boat support member (720), and various configurations are possible.

[0140] That is, the above-mentioned connecting support member (730) may include a connecting plate (731) provided on a boat support rod (721) as shown in FIG. 11, and a plurality of connecting rods (732) provided vertically upward from the connecting plate (731).

[0141] At this time, the connecting plate (731) can be applied in a configuration parallel to the aforementioned plate (713) as a plate supported by the boat support rod (721), and can support a plurality of connecting rods (732).

[0142] The above plurality of connecting rods (732) may be configured to support the aforementioned boat (710) and simultaneously support the rotating insulation part (1300) described later.

[0143] That is, the above connecting rods (732) can be connected to the boat support rod (721) and rotate integrally with the boat support part (720), and the rotating insulation part (1300) described later can be installed in combination to induce the rotating insulation part (1300) to rotate.

[0144] The above cap flange portion (800) may be configured to support the boat portion (700) from below the boat portion (700), rise to contact the bottom of the reaction tube portion (100), and seal the processing space (S1).

[0145] At this time, the cap flange portion (800) may be formed of a second material that is distinct from the first material of the reaction tube portion (100), and the second material may be a metal material, as in the aforementioned manifold portion (200).

[0146] That is, the cap flange portion (800) can be formed of a metal material having sufficient rigidity, and accordingly, breakage and damage can be prevented during the pressurized contact process with the reaction tube portion (100).

[0147] For example, the cap flange portion (800) may include a cap flange (810) into which the base portion (900) is inserted and whose edge contacts the bottom of the reaction tube portion (100) to seal the processing space (S1), and a turntable (820) provided on the cap flange (810) and connected to the boat portion (700) to rotate the boat portion (700).

[0148] Additionally, the cap flange portion (800) may include a second seal portion (830) provided on a corresponding cap flange (810) for sealing between the cap flange (810) and the reaction tube portion (100).

[0149] Additionally, the cap flange portion (800) may include at least one fixing pin portion (840) installed to be inserted into the upper surface of the turntable (820) and the lower surface of the boat support portion (720).

[0150] The above cap flange (810) is configured such that the base portion (900) is inserted and the edge contacts the bottom of the reaction tube portion (100) to seal the processing space (S1), and various configurations are possible.

[0151] That is, the above cap flange (810) is configured to support the boat section (700) and move up and down integrally with the boat section (700) to seal the processing space (S1) while the boat section (700) is introduced into the processing space (S1), and may be configured to contact the bottom of the reaction tube section (100), more specifically, the contact surface.

[0152] For example, the cap flange (810) may include a base plate (811) on which a turntable (820) and a base part (900), described later, are installed on the upper surface, and a base flange (812) provided to surround the base part (900) at the edge of the base plate (811) and contact the reaction tube part (100).

[0153] Additionally, the cap flange (810) may include a first seal (813) provided between the base plate (811) and the base flange (812).

[0154] The above base plate (811) may be a plate-shaped configuration made of metal material, configured such that a turntable (820) and a base part (900) are installed on the upper surface.

[0155] At this time, the base plate (811) has a rotary drive unit (1100), which will be described later, installed through the center, and a turntable (820) connected to the rotary drive unit (1100) is installed on the upper surface, and a base unit (900) can be installed to surround the turntable (820).

[0156] In addition, an annular base flange (812) is provided along the edge of the base plate (811) so that the processing space (S1) can be sealed according to the contact between the base flange (812) and the contact surface of the reaction tube (100).

[0157] The above base flange (812) may be configured to be annular in shape and provided at the edge of the base plate (811), and may be configured to seal the processing space (S1) by contacting the contact surface of the reaction tube (100), while simultaneously covering the side of the base part (900) disposed on the upper surface of the base plate (811).

[0158] At this time, the base flange (812) is formed such that its inner diameter is larger than the inner diameter of the reaction tube section (100), thereby allowing the outer diameter of the base section (900), which will be described later, to be larger than the inner diameter of the reaction tube section (100), and accordingly, the exposure of the base flange (812) within the processing space (S1) can be prevented.

[0159] To this end, the base flange (812) is formed such that its width is smaller than that of the contact surface, so that through the base portion (900), a portion of the inner surface of the reaction tube portion (100), i.e., the outer tube (120), is covered and the remaining portion of the contact surface is in contact.

[0160] Meanwhile, in this case, the base flange (812) is positioned such that the upper surface contacting the reaction tube section (100) is equal to or higher than the edge of the base section (900), thereby preventing interference between the base section (900) and the contact surface of the reaction tube section (100) when in contact with the contact surface.

[0161] In addition, the base flange (812) is provided with a second seal (830) as a sealing member along the circumferential direction on its upper surface, so as to maintain sealing for the processing space (S1).

[0162] The first seal (813) above is a sealing member provided between the base plate (811) and the base flange (812), and is configured in an annular shape to seal the space between the base plate (811) and the base flange (812) which are installed according to their connection relationship.

[0163] Meanwhile, the base flange (812) may have a flange cooling channel (819) through which a refrigerant flows to prevent damage due to high temperature to the second chamber (830) provided on the upper surface and the first chamber (813) provided on the lower surface.

[0164] At this time, the flange cooling channel (819) is formed in an annular shape inside the base flange (812) and can cool the base flange (812) and surrounding components through heat exchange by receiving and discharging a low-temperature refrigerant from the outside and circulating it, thereby preventing damage to the first chamber (813) and the second chamber (830) due to high temperature and contamination of the surrounding components.

[0165] The above turntable (820) is provided on the cap flange (810) and is connected to the boat section (700) to rotate the boat section (700), and various configurations are possible.

[0166] That is, the above-mentioned turntable (820) is configured to rotate by being connected to a rotary drive unit (1100) described later to rotate the boat unit (700), thereby enabling the boat unit (700) to rotate.

[0167] For example, the turntable (820) may include a rotating plate (821) positioned in the center of a base plate (811) and connected to a boat support (720), as shown in FIG. 7, and a lower plate (822) positioned below the rotating plate (821) and forming a gas passage between it and the rotating plate (821).

[0168] The above-mentioned rotating plate (821) may be configured to rotate the connected boat part (700) by rotating through the rotational force transmitted through the rotational drive part (1100).

[0169] At this time, the rotating plate (821) may be connected to the boat support member (720) by having a fixing pin part (840) provided between it and the bottom surface of the boat support member (720). In particular, the fixing pin part (840) is provided on the upper surface so as to protrude upward, and the fixing pin part (840) is inserted into an insertion groove formed on the bottom surface of the boat support member (720) to be connected, thereby allowing the boat support member (720) to be rotated as a whole according to the rotation.

[0170] The lower plate (822) is provided between the base plate (811) and the rotating plate (821) at the center side of the base plate (811), and can form a gas passage through which inert gas supplied from the outside flows between the lower plate (822) and the rotating plate (821).

[0171] More specifically, as shown in FIG. 7, the lower plate (822) is installed with the rotary drive unit (1100) passing through it, and a gas passage may be formed between it and the rotary drive unit (1100) to transmit inert gas transmitted from the outside.

[0172] At this time, the lower plate (822) can transmit the inert gas being transmitted between the base part (900) and the turntable (820) by forming a horizontal passage (823) between the rotating plate (821) and the vertical gas passage between the rotating drive part (1100).

[0173] Additionally, the lower plate (822) can guide the rotation of the rotating plate (821) through a rotation guide portion (824) formed on the upper surface to interlock with the lower surface of the rotating plate (821). More specifically, a plurality of concentric protruding rings are provided to interlock with the lower surface and the upper surface of the rotating plate (821), respectively, thereby guiding the rotation and simultaneously forming a part of a gas passage that transmits gas.

[0174] The above second seal (830) may be a configuration provided on a corresponding cap flange (810) for sealing between the cap flange (810) and the reaction tube (100).

[0175] For example, the second seal (830) may be provided as an annular sealing member on either the cap flange (810) or the bottom surface of the reaction tube (100) as a contact surface.

[0176] The above-mentioned fixed pin portion (840) is configured to be inserted into the upper surface of the turntable (820) and the lower surface of the boat support portion (720), and various configurations are possible.

[0177] That is, the above fixing pin portion (840) is configured to protrude from the upper surface of the turntable (820) and is inserted into the lower insertion groove of the boat support portion (720), thereby connecting the turntable (820) and the boat support portion (720).

[0178] For example, the above fixing pin portion (840) may include a first fixing pin (841) inserted into an insertion groove formed in the center of the bottom surface of the support flange (722), as shown in FIG. 7, and a second fixing pin (842) inserted into a plurality of insertion grooves formed at locations other than the center of the bottom surface of the support flange (722).

[0179] At this time, the second fixing pin (842) may be provided in multiple numbers and formed symmetrically with respect to the center, and by being inserted into an insertion groove formed at a position corresponding to the bottom surface of the support flange (722) while fixed to the rotating plate (821) and interfering, the rotating plate (821) and the support flange (722), i.e., the boat part (700), can be induced to rotate as a single unit.

[0180] The base portion (900) is provided on the cap flange portion (800) and is composed of a third material such that its edge is located outside the inner surface of the reaction tube portion (100), and various configurations are possible.

[0181] That is, the base portion (900) may be provided on the cap flange portion (800) with a third material of non-metallic material, and may have a diameter such that the edge is located outside the inner surface of the reaction tube portion (100), i.e., the inner surface of the outer tube (120), in order to prevent metal exposure to the processing space (S1).

[0182] At this time, the third material is a non-metal and may be the same material as the first material, and may be composed of, for example, quartz material.

[0183] Additionally, the base portion (900) can cover the side of the turntable (820) to prevent exposure to the processing space (S1) of the turntable (820), and, for example, can be applied in an annular configuration so that the turntable (820) is positioned in the center and the side of the turntable (820) is covered.

[0184] Additionally, the base portion (900) may form a guide channel to guide gas supplied from the outside through the cap flange portion (800) into the processing space (S1), and more specifically, may form an upward guide channel between the turntable (820) and the horizontal channel formed between the lower plate (822) and the rotating plate (821) as described above.

[0185] For example, the base portion (900) may include an annular base body (910) that surrounds the turntable (820) on the cap flange portion (800) and forms a first guide channel (901) between the turntable (820) and the protruding guide portion (920) that extends upward from the base body (910) to surround the lower side of the boat support portion (720) and forms a second guide channel (902) that extends from the first guide channel (901) between the boat support portion (720).

[0186] The above base body (910) is configured to surround the turntable (820) on the cap flange portion (800) and form a first guide channel (901) between it and the turntable (820), and can be formed in an annular shape.

[0187] At this time, the base body (910) is made of the aforementioned non-metallic quartz material and can be placed between the turntable (820) and the base flange (812) on the base plate (811).

[0188] In particular, the base body (910) may be formed such that its outer diameter is larger than the inner diameter of the outer tube (120) in order to prevent exposure to the processing space (S1) of the base flange (812) near the contact surface of the reaction tube (100), so that its edge is positioned on the flat outer side of the inner surface of the outer tube (120).

[0189] In addition, the base body (910) has an upper surface positioned at a height equal to or lower than the upper surface of the base flange (812), thereby preventing interference with the contact surface during the process in which the base flange (812) comes into contact with the contact surface.

[0190] More specifically, the base body (910) is provided to form a plane at the same height as the base flange (812), and the second chamber (830) provided on the base flange (812) is in contact with and compressed on the contact surface, thereby maintaining a seal on the processing space (S1).

[0191] Meanwhile, as shown in FIG. 7, the base body (910) may form a first guide channel (901) by creating a gap between the inner surface and the turntable (820), and the inert gas transmitted through the horizontal channel (823) via the first guide channel (901) formed therein may be transmitted to the processing space (S1) side via the second guide channel (902).

[0192] The above-mentioned protruding guide portion (920) is formed to extend upward from the base body (910) to surround the lower side of the boat support portion (720), and is configured to form a second guide channel (902) extending from the first guide channel (901) between the boat support portion (720) and the protruding guide portion (920), and various configurations are possible.

[0193] That is, the protruding guide portion (920) is formed as an annular structure extending upward from the base body (910) to surround the lower end of the boat support portion (720) provided on the upper surface of the turntable (820), i.e., the support flange (722), and the support flange (722) is positioned in the center to form a second guide channel (902) between the support flange (722) and the inner surface.

[0194] At this time, the protruding guide portion (920) is formed with an inner diameter larger than that of the base body (910) and corresponds to the support flange (722) that covers the turntable (820), with a diameter larger than that of the turntable (820). Accordingly, the second guide channel (902) and the first guide channel (901), which are located at different positions on the plane, can be connected through the gap between the upper surface of the base body (910) and the lower surface of the support flange (722).

[0195] Meanwhile, at this time, the protruding guide part (920) is formed with an inner surface that corresponds to the lower side of the boat support part (720) and a vertical surface (921), and an outer surface that is formed with an inclined surface (922) in which the outer diameter increases as it goes downward, thereby enabling the formation of a stable airflow within the processing space (S1) by inducing airflow in the outward direction through the inclined surface of the outer surface exposed to the processing space (S1).

[0196] The lower heater part (1000) is configured to be installed by coupling to the lower surface of the cap flange part (800), and various configurations are possible.

[0197] For example, the lower heater part (1000) is provided in contact with the bottom surface of the base plate (811) to generate heat, thereby controlling the temperature around the cap flange part (800).

[0198] Hereinafter, as another embodiment of the substrate processing apparatus according to the present invention, the specific configuration of the reaction tube section (100) will be described in detail with reference to the attached drawings.

[0199] A substrate processing device according to the present invention comprises, as shown in FIG. 1, an inner tube (110) having a processing space (S1) formed inside and a radially protruding portion (111) formed on an open lower outer surface; an outer tube (120) having the inner tube (110) disposed inside and having an installation groove (121) formed on an inner surface into which the protruding portion (111) is inserted and which contacts and supports the protruding portion (111); and a heater portion (10) that heats the processing space (S1) from the outside of the outer tube (120).

[0200] In addition, the substrate processing device according to the present invention may include a heater base (20) that supports a heater part (20) outside the reaction tube part (100).

[0201] In the substrate processing device according to the present invention, the reaction tube section (100), i.e., the inner tube (110) and the outer tube (120), can be configured as a single quartz material without combination with a separate metal material, and accordingly, the inner tube (110) and the outer tube (120) can be installed in direct contact.

[0202] The heater unit (10) may be configured to surround the outer tube (120) and form a temperature atmosphere for performing the process.

[0203] The heater unit (10) can be installed by being positioned on a heater base (20) provided on the outside of the outer tube (120).

[0204] The inner tube (110) is configured to form a processing space (S1) inside and a radially protruding portion (111) is formed on the open lower outer surface, and various configurations are possible.

[0205] The general configuration of the inner tube (110) described above is identical to the description above, so a redundant description is omitted.

[0206] Meanwhile, the inner tube (110) may be provided with at least one radially protruding portion (111) on the open lower outer surface.

[0207] For example, the above-mentioned protrusion (111) is configured to be provided in a single number along at least a portion of the outer surface of the inner tube (110), and may be configured to protrude radially from the lower outer surface of the inner tube (110) to form at least a portion of an annular ring shape, and accordingly, the inner tube (110) may be supported by being supported on the inner surface of the outer tube (120) described later.

[0208] In addition, as another example, the protrusions (111) may be provided in multiple numbers spaced apart from each other on the outer surface of the inner tube (110), as shown in FIG. 9, and at least three may be provided spaced apart from each other so that they are seated in the seating groove (123) described later of the outer tube (120), thereby allowing the inner tube (110) to be supported on the inner surface of the outer tube (120).

[0209] The above outer tube (120) is configured such that an inner tube (110) is disposed inside, a protrusion (111) is inserted into the inner surface, and an installation groove (121) that contacts and supports the protrusion (111) is formed, and various configurations are possible.

[0210] As the general configuration of the outer tube (120) is as described above, the same description can be applied, so a redundant description is omitted.

[0211] The above outer tube (120) may include a lower portion (140) having an installation groove (121) formed on the lower side, and an upper tube (130) extending upward from the lower portion (140) and having a closed upper end.

[0212] The lower portion (140) may be configured such that an installation groove (121) is formed on the lower side, and the aforementioned lower surface is formed with a step surface and the aforementioned contact surface, is supported through the manifold portion (200), and is sealed by contacting the support flange (812) of the cap flange portion (800).

[0213] The upper tube (130) may be configured to extend upward from the lower part (140) and have a closed upper end, and may have a dome-shaped ceiling and form a processing space (S1) inside.

[0214] At this time, the lower portion (140) may be formed with an inner diameter smaller than the inner diameter of the upper tube (130) and a thickness thicker than that of the upper tube (130) to form a step with the upper tube (130).

[0215] Thus, the lower portion (140) can have various processing structures formed on its inner surface, including the installation groove (121), passage groove (122), and seating groove (123) described later, through its relatively thick thickness.

[0216] At this time, the outer tube (120) may be provided with various processing structures to support the inner tube (110) by supporting the protrusion (111) of the inner tube (110) on the inner surface of the lower part (140) and directly contacting and supporting the inner tube (110).

[0217] Accordingly, the inner tube (110) has the advantage of superior support rigidity compared to a configuration in which the protrusion (111) is supported by being seated on a protrusion protruding from the inner surface of the outer tube (120), as the protrusion (111) is inserted and supported within a groove structure formed on the inner surface of the outer tube (120).

[0218] In addition, as the protrusion (111) of the inner tube (110) is inserted into the installation groove (121) as an inner groove structure of the outer tube (120), the side wall of the inner tube (110) can be installed in close proximity to the inner surface of the outer tube (120), thereby minimizing the space (S2) between the outer tube (120) and the inner tube (110) and maximizing the volume of the processing space (S1).

[0219] In this way, by increasing the diameter of the processing space (S1) of the inner tube (110), the dead volume of the processing space (S1) within the device being enlarged can be reduced, thereby increasing space efficiency and increasing the efficiency of process gas usage, and there is an advantage of preventing collision between the rotating boat part (700) and the inner tube (110) to prevent damage to the substrate and various components.

[0220] To this end, the outer tube (120) may include, as shown in FIG. 10, an installation groove (121) into which a protrusion (111) is inserted and which contacts and supports the protrusion (111), and a passage groove (122) formed to extend from the installation groove (121) to the bottom so that the protrusion (111) is inserted into the installation groove (121) at the bottom portion (140).

[0221] Additionally, the outer tube (120) may include a lower surface (129) on the lower side relative to the installation groove (121) to define the installation groove (121), an upper surface (128) on the upper side relative to the installation groove (121), and a concave inner surface (127) formed between the lower surface (129) and the upper surface (128).

[0222] The above-mentioned installation groove (121) is formed concavely on the inner surface of the lower part (140) inwardly compared to the upper surface (128) and the lower surface (129) of the lower part, and can be defined through the bottom surface of the upper surface (128), the upper surface of the lower surface (129), and the inner surface of the groove (127).

[0223] At this time, the installation groove (121) may be configured to have a groove structure formed concavely on the inner surface of the outer tube (120) so as to support the protrusion (111) of the inner tube (110) while it is inserted.

[0224] That is, the above-mentioned installation groove (121) may refer to an area into which a protrusion (111) is inserted and which supports the protrusion (111) by directly contacting it.

[0225] The above passage groove (122) may be configured to extend from the installation groove (121) to the bottom so that the protrusion (111) passes through, so that the protrusion (111) is inserted into the installation groove (121) at the bottom part (140).

[0226] That is, the above-mentioned passage groove (122) may refer to a section formed to prevent interference between the protrusion (111) and the lower part (140) of the outer tube (120) and to allow the protrusion (111) to be inserted into the installation groove (121) during the process of raising and installing the inner tube (110) into the inner side of the outer tube (120) which has an open bottom.

[0227] To this end, the passage groove (122) may be formed in a planar shape corresponding to the protrusion (111) on the lower surface (129) and concavely formed at a position corresponding to the protrusion (111) so as to be connected to the installation groove (121).

[0228] Thus, the inner tube (110) can be supported by directly contacting the outer tube (120) by raising the protrusion (111) while it is aligned with the passage groove (122) to position the protrusion (111) within the installation groove (121), and by rotating it to support the protrusion (111) on the upper surface of the lower surface (129) within the installation groove (121).

[0229] At this time, in order to support the protrusion (111) of the inner tube (110) more stably, the outer tube (120) may include a seating groove (123) formed flatly so that the protrusion (111) is seated on the upper surface of the lower surface (129), and the protrusion (111) can be stably supported by being inserted and seated on the seating groove (123).

[0230] Meanwhile, the above-mentioned installation groove (121) may be formed as a single groove along the circumference of the inner surface of the lower part (140), or as another example, it may be formed as a plurality of grooves separated from each other corresponding to a plurality of protrusions (111).

[0231] In this case, the outer tube (120) may include a separating part (124) that is extended between the lower surface (129) and the upper surface (128) and separates the installation groove (121) from each other so as to correspond to a plurality of protrusions (111) spaced apart from each other.

[0232] That is, the separation part (124) is configured to extend between the lower surface (129) and the upper surface (128) to separate a plurality of installation grooves (121) from each other, as shown in FIG. 10, and can separate the installation grooves (121) from each other by corresponding to a plurality of protrusions (111) that are spaced apart from each other.

[0233] More specifically, the separation part (124) is formed protruding between the upper surface of the lower surface (129) and the lower surface of the upper surface (128), so as to form a plane with the inner surface of the lower surface (129) and the upper surface (128), thereby separating the installation grooves (121).

[0234] At this time, the separation portion (124) may be formed at a location adjacent to the passage groove (122), and more specifically, as shown in FIG. 10, it may be configured to form one side of the passage groove (122).

[0235] Meanwhile, the inner tube (110) is configured to be seated and supported within the installation groove (121) through the protrusion (111), and the interspace (S2) between the processing space (S1), the inner tube (110), and the outer tube (120) can communicate with each other through the passage groove (122).

[0236] Additionally, the aforementioned gas injection nozzle (300) can inject process gas into the processing space (S1) by penetrating the lower surface (129), and more specifically, it can be installed by penetrating the lower region horizontally based on the installation groove (121) in the side wall of the outer tube (120) to inject process gas into the processing space (S1) inside the inner tube (110).

[0237] In particular, in this case, as described above, the inner tube (110) is inserted into and supported in the installation groove (121), and since the inner surface is positioned in a plane adjacent to the inner surface of the lower part (140) of the outer tube (120), the horizontal part of the gas injection nozzle (300) with an 'L' shape structure can be installed by horizontally penetrating the lower area of ​​the installation groove (121) as the lower part (140) of the outer tube (120), and the vertical part can be installed in a position closest to the inner surface of the inner tube (110).

[0238] A substrate processing device according to the present invention, as another embodiment, includes a reaction tube (100) having an open bottom end and a processing space (S1) formed inside, as shown in FIG. 1; and a substrate support unit (20) that supports stacked substrates (1) and is installed to be movable up and down to introduce and remove the substrates (1) into and out of the processing space (S1). Below, the substrate support unit according to the present invention will be described in detail with reference to the attached drawings.

[0239] As shown in FIGS. 11 and 12, the substrate support unit according to the present invention comprises: a boat portion (700) that supports a plurality of substrates (1) stacked thereon; a cap flange portion (800) that supports the boat portion (700) so as to be rotatable at the bottom of the boat portion (700); a rotational drive portion (1100) provided on the cap flange portion (800) to rotate the boat portion (700); and a fixed insulation portion (1200) that surrounds and is fixedly installed on a lower part of the boat portion (700).

[0240] In addition, the substrate support unit according to the present invention may further include a rotating insulation unit (1300) installed in the boat unit (700) and rotating integrally with the boat unit (700).

[0241] The above boat section (700) may be configured to support a plurality of substrates (1) by stacking them, and the specific configuration is as described above, so a redundant description is omitted.

[0242] Additionally, the cap flange portion (800) is configured to support the boat portion (700) so that it can rotate from the lower part of the boat portion (700), and the rotational drive portion (1100) is configured to be provided in the cap flange portion (800) to rotate the boat portion (700). Since each is identical to what was previously described, a redundant description is omitted.

[0243] Meanwhile, the substrate support unit according to the present invention is provided with an insulating section between the boat section (700) and the cap flange section (800) to prevent temperature exchange and heat loss between the processing space (S1) and the outside.

[0244] In particular, when the boat section (700) is introduced into the processing space (S1), the heater section (10) is configured to supply heat to the boat section (700). Therefore, insulation between the cap flange section (800), which is adjacent to the external space and does not receive heat from the heater section (10) at the lower side, and the processing space (S1) is essential.

[0245] The above fixed insulation part (1200) is configured to be fixedly installed by surrounding a lower part of the boat part (700), and various configurations are possible.

[0246] That is, the fixed insulation part (1200) may be configured to maintain a fixed state, separated from the boat part (700) which rotates integrally through the turntable (820) of the cap flange part (800).

[0247] As such, since the fixed insulation part (1200) is kept in a fixed state independently of the rotating boat part (700), the gap between it and the inner surface of the inner tube (110) can be further reduced and minimized compared to when it is rotating, and the insulation effect can be improved accordingly.

[0248] In addition, as described above, in the case of a rotating structure, multiple boat support rods (721) must be provided to ensure support stability. However, in the case of a fixed insulation part (1200), since it maintains a fixed state, the support and connection relationship with the boat support rods (721) is omitted, allowing a single boat support rod (721) to be provided in the center. Accordingly, the structure of the boat part (700) is simplified, which has the advantage of making installation and maintenance of the device easy.

[0249] Furthermore, compared to an insulating structure that includes a rotating structure, the application of a fixed insulating part (1200) that maintains a fixed state has the advantage of enabling a more stable structural application.

[0250] To this end, the fixed insulation part (1200) may be provided between the boat (710) and the support flange (722) so that the boat support rod (721) of the boat support part (720) passes through the lower part of the boat part (700), more specifically.

[0251] At this time, the fixed insulation member (1200) can maintain a fixed state without interference with the rotating boat member (700) as it is arranged to surround the boat support rod (721) which is provided vertically in the center without interference with the boat support member (720).

[0252] More specifically, the fixed insulation member (1200) may include a plurality of fixed insulation rods (1220) that are fixed and supported on the base member (900) and are provided in a vertical direction, and a plurality of fixed insulation plates (1210) that are installed on the fixed insulation rods (1220) at a distance from each other in the vertical direction.

[0253] That is, the fixed insulation member (1200) is configured to perform insulation through a plurality of fixed insulation plates (1210), and insulation can be performed as a plurality of fixed insulation plates (1210) parallel to each other are spaced apart from each other in the vertical direction.

[0254] At this time, a fixed insulation rod (1220) may be provided to support a plurality of fixed insulation plates (1210), and at this time, a plurality of fixed insulation rods (1220) may be provided on a plane, more preferably at least three of which are spaced apart from each other on a plane to provide stable support for the fixed insulation plates (1210).

[0255] At this time, the fixed insulation plate (1210) may be provided with at least two members that are separable from each other in a plane centered on the boat support rod (721) so as to be installed on the boat support rod (721) positioned in the center, for example, the two members may be arranged in contact with each other to form a single circular plate in a plane, or the two members may be combined and installed together.

[0256] The above fixed insulation rod (1220) is configured to be provided in a vertical direction to support and fix the fixed insulation plate (1210), and various configurations are possible.

[0257] At this time, the fixed insulation rod (1220) can be fixedly supported on the base part (900), and when a plurality of fixed insulation parts (1200) forming a single unit are stacked together, the corresponding fixed insulation rods (1220) are connected and stacked together, and the lowest fixed insulation rod (1220) can be inserted into a groove (930) formed on the base part (900) or fixedly coupled to the base part (900).

[0258] Thus, the fixed insulation rod (1220) can maintain a fixed state together with the fixed base part (900) compared to the rotating turntable (820), and as the fixed insulation rod (1220) maintains a fixed state, the fixed insulation plate (1210) also maintains a fixed state, so that the fixed insulation part (1200) can maintain a fixed state unlike the rotating boat part (700).

[0259] Meanwhile, the above fixed insulation member (1200) may be provided by having a plurality of fixed insulation plates (1210) in the vertical direction and a plurality of fixed insulation rods (1220) spaced apart from each other on a plane supporting them as a single unit, and stacking a plurality of fixed insulation members (1200) in the vertical direction, and at this time, a plurality of fixed insulation rods (1220) corresponding to each other may be connected to each other to be stacked.

[0260] To this end, the fixed insulation rod (1220) has a protrusion or groove formed on its upper side and a corresponding groove or protrusion formed on its lower side so as to be connected to the fixed insulation rod (1220) of an adjacent fixed insulation part (1200), so that the fixed insulation rods (1220) corresponding to each other on the plane of the plurality of fixed insulation parts (1200) can be joined by fitting them together, thereby allowing the plurality of fixed insulation parts (1200) to be stacked and joined.

[0261] In addition, the fixed insulation rod (1220) can support the fixed insulation plate (1210) in a fixed position by being inserted into a rod insertion groove formed on the edge of the fixed insulation plate (1210) in the shape of a flat plate, as shown in FIG. 12, or by supporting the edge of the fixed insulation plate (1210).

[0262] Meanwhile, the fixed insulation part (1200) can be applied as a combination of multiple insulation plates as described above, and as another example, the fixed insulation part (1200) can also be applied as a thermal insulation tube in which a boat part (700) is installed through a base part (900).

[0263] The above-mentioned rotating insulation unit (1300) is configured to be installed in the boat unit (700) and rotate integrally with the boat unit (700), and various configurations are possible.

[0264] That is, the above-mentioned rotating insulation part (1300) may be configured to be installed on a rotating boat part (700) and rotate as a single unit, unlike the above-mentioned fixed insulation part (1200).

[0265] At this time, the rotating insulation member (1300) can be positioned between the fixed insulation member (1200) and the boat (710) as it is installed on the connecting support member (730), and more specifically, it may include a rotating insulation rod (1320) connected to the connecting support member (730) and a plurality of rotating insulation plates (1310) provided parallel to each other in the vertical direction on the rotating insulation rod (1320).

[0266] The above-mentioned rotating insulation rod (1320) can be connected by being partially inserted into a groove formed on the connecting support part (730), that is, the connecting plate (731), and aligned in a fixed position, and can be fixedly coupled with its lower end inserted into the groove of the connecting plate (731).

[0267] The above-mentioned rotating insulation plate (1310) is configured to be arranged in multiple numbers in the vertical direction on the rotating insulation rod (1320) and can be formed as a horizontal plate-shaped structure.

[0268] At this time, the rotating insulation plate (1310) may be composed of the same insulation material as the fixed insulation plate (1210) described above, and may be connected to or supported by the rotating insulation rod (1320) and rotate integrally with the connecting support part (730) according to the rotating insulation rod (1320).

[0269] Meanwhile, the above-mentioned rotating insulation part (1300) may be provided with only a rotating insulation plate (1310) and the rotating insulation rod (1320) omitted, and the rotating insulation plate (1310) may be installed to be coupled to the connecting rod (732) of the connecting support part (730).

[0270] Additionally, the rotating insulation section (1300) can be positioned such that the gap between it and the inner surface of the reaction tube section (100) is greater than the gap between the fixed insulation section (1200) and the inner surface of the reaction tube section (100).

[0271] That is, the rotating insulation part (1300) can be formed such that the gap between the inner surface of the inner tube (110) and the edge is larger than the gap between the fixed insulation part (1200), which maintains a fixed state, and the inner surface of the inner tube (110), so as to prevent collision with the inner surface of the reaction tube part (100) according to the rotating structure, i.e., the inner surface of the inner tube (110).

[0272] To this end, the rotating insulation part (1300) may be formed with a diameter smaller than that of the fixed insulation part (1200), as shown in FIG. 11.

[0273] Meanwhile, the rotating insulation part (1300) can enhance the stability of the device by reducing the possibility of collision with the inner tube (110) due to rotation, and the fixed insulation part (1200) can maximize insulation performance by maintaining a fixed state and minimizing the gap with the inner tube (110).

[0274]

[0275] The foregoing merely describes some preferred embodiments that can be implemented by the present invention. As is well known, the scope of the present invention should not be interpreted as being limited to the above embodiments, and all technical concepts that share the fundamental principles with the technical concept of the present invention described above shall be considered to be included within the scope of the present invention.

Claims

1. An inner tube (110) having a processing space (S1) formed inside and a radially protruding portion (111) formed on the open lower outer surface; An outer tube (120) having the inner tube (110) disposed therein, the protrusion (111) inserted into the inner surface, and an installation groove (121) formed to contact and support the protrusion (111); A substrate processing device characterized by including a heater part (10) that heats the processing space (S1) on the outside of the outer tube (120).

2. In Claim 1, The inner tube (110) and the outer tube (120) are, A substrate processing device characterized by being formed of the same non-metallic material.

3. In Claim 1, The inner tube (110) and the outer tube (120) are, A substrate processing device characterized by being formed from a single quartz material.

4. In Claim 1, The above outer tube (120) is, A substrate processing device characterized by including a passage groove (122) that extends from the installation groove (121) to the bottom so that the protrusion (111) is inserted into the installation groove (121).

5. In Claim 4, The above outer tube (120) is, A substrate processing device characterized by including a lower surface (129) on the lower side relative to the installation groove (121) to define the installation groove (121), an upper surface (128) on the upper side relative to the installation groove (121), and a concave inner surface (127) formed between the lower surface (129) and the upper surface (128).

6. In Claim 5, The above outer tube (120) is, A substrate processing device characterized by including a corresponding planar mounting groove (123) formed on the upper surface of the lower surface (129) so that the protrusion (111) is mounted thereon.

7. In Claim 1, The above protrusion (111) is, A substrate processing device characterized by having a plurality of units spaced apart from each other on the outer surface of the inner tube (110).

8. In Claim 7, The above installation groove (121) is, A substrate processing device characterized by being formed in multiple parts that are separated from each other and correspond to a plurality of the above-mentioned protrusions (111).

9. In Claim 5, A substrate processing device characterized by including a separating part (124) that is extended and formed between the lower surface (129) and the upper surface (128) to separate the installation groove (121) from each other so as to correspond to a plurality of protrusions (111) spaced apart from each other.

10. In Claim 9, The above separation part (124) is, A substrate processing device characterized by being formed at a position adjacent to the above-mentioned passage groove (122).

11. In Claim 1, The above outer tube (120) is, A substrate processing device characterized by including a lower portion (140) in which the installation groove (121) is formed on the lower side, and an upper tube (130) that extends upward from the lower portion (140) and has a closed upper end.

12. In Claim 11, The lower part (140) above is, A substrate processing device characterized by having an inner diameter smaller than the inner diameter of the upper tube (130) to form a step with the upper tube (130).

13. In Claim 4, A substrate processing device characterized in that the interspace (S2) between the processing space (S1), the inner tube (110), and the outer tube (120) communicates with each other through the passage groove (122).

14. In Claim 1, A substrate processing device characterized by additionally including a gas injection nozzle (300) that is installed horizontally through the lower region based on the installation groove (121) of the side wall of the outer tube (120) and injects process gas into the processing space (S1).

15. In Claim 1, A substrate processing device characterized by including a boat portion (700) that supports a plurality of substrates (1) by stacking them and is inserted into the processing space (S1) through vertical movement, and a cap flange portion (800) that supports the boat portion (700) from below the boat portion (700), rises to contact the bottom of the outer tube (120), and seals the processing space (S1).

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