Arc suppression optimization method
By converting the radio frequency power output into a pulse output within the plasma chamber and combining it with multiple arc detection methods, the problem of unstable arc suppression is solved, thereby improving the accuracy of arc suppression and the safety and lifespan of the equipment.
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- SHENZHEN CSL VACUUM SCI & TECH CO LTD
- Filing Date
- 2026-01-16
- Publication Date
- 2026-07-30
AI Technical Summary
Existing methods for suppressing electric arcs inside plasma cavities result in a sudden drop in power output, increasing the instability of the plasma cavity and affecting the lifespan of the equipment, while also exhibiting poor suppression accuracy.
When an electric arc is generated, the output of the radio frequency power supply is converted from a constant signal to a pulse output, and after a preset time, the constant signal output is restored. At the same time, the suppression operation is cyclically started or stopped by monitoring the generation of the electric arc, and the electric arc suppression is optimized by combining multiple electric arc detection methods.
It achieves effective and stable suppression of electric arcs, improves the stability and accuracy of suppression, reduces equipment damage, and extends service life.
Smart Images
Figure CN2026073023_30072026_PF_FP_ABST
Abstract
Description
An optimization method for arc suppression Technical Field
[0001] This application relates to the field of arc suppression technology, and in particular to an optimized method for arc suppression. Background Technology
[0002] A typical RF power supply system generally includes an RF power supply and a plasma chamber. The RF power supply is the power supply for the plasma chamber and is widely used in equipment such as RF sputtering, PECVD chemical vapor deposition, and reactive ion etching. In practical applications, the generation of electric arcs within the plasma chamber can lead to a decrease in product yield, significantly impacting the process and further causing electromagnetic interference (EMI) problems.
[0003] Currently, regarding the generation of electric arcs within plasma chambers, patent application number 202210548174.6 proposes a method for suppressing electric arcs in plasma chambers. When an electric arc is detected within the plasma chamber, the power output to the output terminal of the plasma chamber is directly cut off by the control module of the main control module to suppress the arc. After the electric arc disappears within the plasma chamber, the control module of the main control module restores the power output to the output terminal and resumes arc detection sampling according to the previously frozen operating parameters.
[0004] While the above solution can suppress electric arcs to some extent, cutting off the power output from the plasma cavity's output end by the main control module causes a sudden drop in the plasma cavity's power output, increasing the plasma cavity's instability, reducing the accuracy of arc suppression, and affecting the equipment's lifespan. Summary of the Invention
[0005] Based on the above analysis, the embodiments of this application aim to provide an arc suppression optimization method to solve the problem of low arc suppression effect in existing plasma cavity methods.
[0006] This application provides an arc suppression optimization method, the method comprising:
[0007] When an electric arc is generated, the arc suppression operation is activated:
[0008] The output of the RF power supply is converted from a constant signal output to a pulse output; after a preset time, the output of the RF power supply is converted back to a constant signal output.
[0009] Based on the above solution, this application also makes the following improvements:
[0010] Furthermore, the method also includes:
[0011] Monitor again for the generation of an electric arc; when an electric arc is detected again, repeatedly initiate the arc suppression operation until the number of cycles reaches the limit, at which point the RF power supply will stop operating.
[0012] Furthermore, the method also includes:
[0013] Monitor again for the generation of an electric arc; if an electric arc is detected again, stop the operation of the radio frequency power supply.
[0014] Furthermore, the arc suppression initiation operation also includes:
[0015] Freeze the operating parameters and convert the output of the RF power supply from a constant signal output to a pulse output; after a preset time, switch the output of the RF power supply back to a constant signal output according to the operating parameters before freezing.
[0016] Furthermore, pulse output is achieved in the following way:
[0017] The potential setting value and frequency setting value are used in PWM calculation to achieve pulse output.
[0018] Furthermore, the step of incorporating the potential setpoint and frequency setpoint into the PWM calculation to achieve pulse output includes:
[0019] Based on the potential setting value, the potential of the control pulse signal switches between a low potential and the potential setting value; based on the frequency setting value, the frequency of the control pulse signal switches between the frequency setting value and a limited frequency point; in order to generate a pulse signal;
[0020] Pulse output is achieved based on the generated pulse signal.
[0021] Furthermore, the presence of an electric arc is monitored using the following methods:
[0022] Arc detection sampling is performed on the plasma cavity, and the real-time reflected power inside the plasma cavity is obtained based on the sampling results;
[0023] The real-time reflected power of two or more consecutively sampled points is obtained. If the difference between the real-time reflected power of the first and last sampled points does not exceed the reflection power difference threshold, then no electric arc is generated in the plasma cavity; otherwise, an electric arc is generated in the plasma cavity.
[0024] Furthermore, the presence of an electric arc is monitored using the following methods:
[0025] Arc detection sampling is performed on the plasma cavity, and the real-time reflected power and real-time forward power inside the plasma cavity are obtained based on the sampling results;
[0026] If the ratio of real-time reflected power to real-time forward power is not higher than a preset percentage, then no electric arc will be generated in the plasma cavity; otherwise, an electric arc will be generated in the plasma cavity.
[0027] Furthermore, the presence of an electric arc is monitored using the following methods:
[0028] Arc detection sampling is performed on the plasma cavity, and the real-time reflected power and real-time forward power inside the plasma cavity are obtained based on the sampling results;
[0029] If the transient change of the real-time reflected power relative to the real-time forward power is not higher than a certain percentage, no electric arc will be generated in the plasma cavity; otherwise, an electric arc will be generated in the plasma cavity.
[0030] Furthermore, the constant signal refers to a preset continuous cyclic waveform or a regulated signal.
[0031] Compared with the prior art, this application can achieve at least one of the following beneficial effects:
[0032] The arc suppression optimization method provided in this application initiates an arc suppression operation when an arc is generated, converting the output of the RF power supply from a constant signal output to a pulse output. After a preset time, the output of the RF power supply is converted back to a constant signal output. This achieves effective and stable arc suppression, improving the stability and accuracy of arc suppression. Furthermore, by extending the operation after the RF power supply output is converted back to a constant signal output, a further arc suppression optimization method is provided, facilitating technicians to select the appropriate arc suppression optimization method based on specific circumstances. The implementation method of the pulse output is further explained, and several optimization schemes for the arc detection method are proposed, enabling technicians to better implement the arc suppression optimization process.
[0033] In this application, the above-described technical solutions can be combined with each other to achieve more preferred combinations. Other features and advantages of this application will be set forth in the following description, and some advantages may become apparent from the description or be learned by practicing this application. The objectives and other advantages of this application can be realized and obtained from the specific points highlighted in the description and accompanying drawings. Attached Figure Description
[0034] The accompanying drawings are for illustrative purposes only and are not intended to limit the scope of this application. Throughout the drawings, the same reference numerals denote the same parts.
[0035] Figure 1 is a flowchart of the first arc suppression optimization method provided in the embodiment of this application;
[0036] Figure 2 is a flowchart of the second arc suppression optimization method provided in the embodiment of this application;
[0037] Figure 3 is a flowchart of the third arc suppression optimization method provided in the embodiments of this application;
[0038] Figure 4 is a schematic diagram of the structure of the radio frequency power supply system that can achieve arc suppression optimization according to the embodiment of this application;
[0039] Figure 5 is a schematic diagram of the arc monitoring process provided in an embodiment of this application. Detailed Implementation
[0040] The preferred embodiments of this application are described in detail below with reference to the accompanying drawings, which constitute a part of this application and are used together with the embodiments of this application to illustrate the principles of this application, but are not intended to limit the scope of this application.
[0041] A specific embodiment of this application discloses an arc suppression optimization method, the flowchart of which is shown in Figure 1. The method includes the following steps: when an arc is generated, an arc suppression operation is initiated: the output of the radio frequency power supply is converted from a constant signal output to a pulse output; after a preset time, the output of the radio frequency power supply is converted back to a constant signal output.
[0042] Compared with existing technologies, the arc suppression optimization method provided in this embodiment, when an arc is generated, converts the output of the radio frequency power supply from a constant signal output to a pulse output, achieving a smooth transition in arc suppression and avoiding sudden drops in power output. This effectively improves the stability and accuracy of arc suppression, extending the service life of the equipment. Furthermore, after a preset time, the output of the radio frequency power supply is switched back to a constant signal output, effectively resolving the impact of prolonged arc suppression on the normal operation of the equipment.
[0043] Based on the above scheme, this embodiment also proposes a preferred scheme for the arc suppression optimization method, the flowchart of which is shown in Figure 2. Specifically, based on the method shown in Figure 1, it further includes: monitoring again for arc generation; when arc generation is detected again, cyclically initiating arc suppression operations until the number of cycles reaches a limit, at which point the RF power supply operation is stopped. In this method, by monitoring again for arc generation and cyclically initiating arc suppression operations based on the arc monitoring results, the cost of arc suppression is effectively reduced and the efficiency of arc suppression is improved.
[0044] Based on the above scheme, this embodiment also proposes a preferred scheme for an arc suppression optimization method, the flowchart of which is shown in Figure 3. Specifically, based on the method shown in Figure 1, it further includes: re-monitoring for arc generation; and when arc generation is detected again, stopping the operation of the radio frequency power supply. In this method, by re-monitoring for arc generation and stopping the operation of the radio frequency power supply when arc generation is detected, the energy source of the arc can be quickly cut off, reducing the heat and mechanical energy generated by the arc, mitigating the damage to the equipment caused by the arc, and improving the safety of the equipment.
[0045] In practical applications, an appropriate arc suppression optimization method can be selected based on the actual application scenario and the target application.
[0046] Preferably, in the above-mentioned arc suppression optimization method, the arc suppression operation is initiated by: freezing the operating parameters and converting the output of the RF power supply from a constant signal output to a pulse output; after a preset time, the output of the RF power supply is converted back to a constant signal output according to the operating parameters before freezing.
[0047] In practice, different output modes can be set for the RF power supply, such as CW mode and pulse mode. CW mode is used to output a constant signal, which refers to a preset continuous cyclic waveform or regulated signal. Pulse mode is used to achieve pulse output.
[0048] Preferably, in this embodiment, pulse output is achieved by incorporating a potential setting value and a frequency setting value into a PWM calculation to achieve pulse output. Specifically, the following method can be used to incorporate the potential setting value and the frequency setting value into the PWM calculation to achieve pulse output: controlling the potential of the pulse signal to switch between a low potential and a potential setting value according to the potential setting value; controlling the frequency of the pulse signal to switch between a frequency setting value and a defined frequency point according to the frequency setting value; thereby generating a pulse signal; and achieving pulse output based on the generated pulse signal.
[0049] In practical applications, the presence of an electric arc can be monitored in various ways. Specifically, sampling objects can include the power output terminal, chamber electrodes, specific nodes of the chamber load, and plasma spectra. Arc detection sampling methods such as forward power, reflected power, voltage, current, and impedance can be used to obtain corresponding sampling results, which are then used to achieve arc detection. This embodiment preferentially selects several arc detection methods, which are described in detail below.
[0050] (1) Arc detection based on real-time reflected power
[0051] Arc detection sampling is performed on the plasma cavity, and the real-time reflected power pr in the plasma cavity is obtained based on the sampling results. The real-time reflected power pr of two or more consecutive sampling points is obtained. If the difference between the real-time reflected power of the first and last sampling points (i.e., the difference between the first and last boundary values Δpr) does not exceed the reflection power difference threshold, then no arc is generated in the plasma cavity; otherwise, an arc is generated in the plasma cavity.
[0052] (2) Arc detection based on the ratio of real-time reflected power to real-time forward power
[0053] Arc detection sampling is performed on the plasma cavity, and the real-time reflected power pr and real-time forward power pf in the plasma cavity are obtained based on the sampling results. If the ratio of real-time reflected power to real-time forward power (pr / pf) is not higher than a preset percentage, then no arc is generated in the plasma cavity; otherwise, an arc is generated in the plasma cavity.
[0054] (3) Arc detection based on the transient change of real-time reflected power relative to real-time forward power
[0055] Arc detection sampling is performed on the plasma cavity, and the real-time reflected power and real-time forward power in the plasma cavity are obtained based on the sampling results. If the transient change of the real-time reflected power relative to the real-time forward power (referring to the ratio of the difference, i.e., Δ(pr / pf)) is not higher than a certain percentage, then no arc is generated in the plasma cavity; otherwise, an arc is generated in the plasma cavity.
[0056] (4) Arc detection based on reflection coefficient
[0057] Arc detection sampling is performed on the plasma cavity. Based on the sampling results, the instantaneous reflection coefficient and average reflection coefficient within the plasma cavity are obtained. The absolute value of the difference between the instantaneous reflection coefficient and the average reflection coefficient is compared with a set reflection coefficient threshold. Based on the comparison result, it is determined whether an arc is generated within the plasma cavity. For example, the instantaneous reflection coefficient is denoted as Γcur, and the average reflection coefficient is denoted as Γaver. The above comparison process can be described as determining whether |Γcur–Γaver|<Γth holds true. If it does, it means the system is currently operating normally and no arc is generated within the plasma cavity; if it does not, it means the system is currently malfunctioning and an arc is generated within the plasma cavity. The above part, which involves arc detection sampling, gamma mean (reflection coefficient within the plasma cavity) calculation and comparison processing, is used to accurately determine whether an arc is generated within the cavity. This process can also be called ARC (arc) monitoring. The process of determining whether an arc is generated within the plasma cavity based on the comparison result can include the following judgment: if the absolute value of the difference is less than the set reflection coefficient threshold, satisfying the set analysis and judgment conditions, it is determined whether an arc is generated or not within the plasma cavity. It is understood that in the above embodiments, the presence or absence of an electric arc in the cavity can be directly determined by judging whether |Γcur–Γaver|<Γth is true. In this embodiment, to further improve the accuracy of arc generation determination, the presence or absence of an electric arc in the cavity can be more accurately determined by judging whether |Γcur–Γaver|<Γth is true and whether the set analysis and judgment conditions are met. The set analysis and judgment conditions may include one or more combinations thereof:
[0058] 1) If the absolute value of the difference is less than the set reflection coefficient threshold for N consecutive times, it is determined that no electric arc is generated in the plasma cavity; N is a positive integer not less than 2.
[0059] Specifically, if it is determined that |Γcur–Γaver|<Γth has been continuously exceeded N times, it can be determined that no electric arc is generated in the current plasma cavity.
[0060] 2) If the absolute value of the difference is greater than the set reflection coefficient threshold M times within the set time period and is not continuous, then it is determined that no electric arc is generated in the plasma cavity; M is a positive integer not less than 1.
[0061] Specifically, if |Γcur–Γaver|>Γth occurs M times discontinuously within a certain period, it can be determined that no electric arc is being generated in the plasma cavity at present; the period is the set time period, and the specific length can be determined based on the monitoring experience of actual applications or the statistical situation of historical monitoring data.
[0062] 3) If the absolute value of the difference is greater than the set reflection coefficient threshold once, it is determined that an electric arc is generated in the plasma cavity.
[0063] Specifically, if |Γcur–Γaver|>Γth is 1, then it can be determined that an electric arc is generated inside the plasma cavity.
[0064] 4) If the absolute value of the difference is greater than the set reflection coefficient threshold for N consecutive times, it is determined that an electric arc is generated in the plasma cavity; N is a positive integer not less than 2.
[0065] Specifically, if |Γcur–Γaver|>Γth is repeated multiple times (including twice), then it can be determined that an electric arc is generated inside the plasma cavity.
[0066] It should be noted that the above-mentioned analytical judgment conditions can also be used in combination, as long as the mutually exclusive conditions are not combined.
[0067] Preferably, the detection time period for arc detection sampling includes multiple detection time periods ranging from short to long. The reflection coefficient threshold is set to a manually set threshold or a system-adaptively set threshold. The aforementioned plasma cavity arc suppression method may further include the following steps: starting from the shortest detection time period, if the frequency of arc generation in the plasma cavity is less than the set frequency threshold, the detection time is extended to the next larger detection time period; otherwise, the detection time remains unchanged, and the system-adaptively set threshold is adaptively increased by a multiple or a fixed value. Specifically, the reflection coefficient threshold Γth can be set manually (e.g., based on work experience or historical monitoring data) or adaptively by the system. When adaptively set by the system, an initial value Γth can be set first to introduce an initial comparison process of |Γcur–Γaver|<Γth. This initial value Γth can be manually set or calculated using dynamic or historical data of Γcur and Γaver. In actual monitoring, several predetermined detection time periods, ranging from small to large, can be used, such as, but not limited to, 8µs, 16µs, 32µs, and so on. First, a minimum detection time period, such as 8µs, is set. Within this minimum detection time period, the frequency of arc generation is evaluated by checking if |Γcur–Γaver| < Γth. If the arc generation frequency is less than a preset frequency threshold, the detection time period is extended to the next larger detection time period, such as 16µs or 32µs. The adaptively set coefficient threshold of the system can remain unchanged. Conversely, if the arc generation frequency is higher than the preset frequency threshold within the minimum detection time period, the Γth value is increased, either by a multiple or a fixed increase, or by first obtaining the dynamic maximum value of |Γcur–Γaver| and then using a multiple or fixed increase as the adjusted Γth. Through these steps, the system can adaptively adjust the coefficient threshold, thereby further improving the accuracy of arc generation detection.
[0068] In summary, the arc suppression optimization method provided in this embodiment initiates an arc suppression operation when an arc is generated, converting the output of the RF power supply from a constant signal output to a pulse output. After a preset time, the output of the RF power supply is converted back to a constant signal output. This achieves effective and stable arc suppression, improving the stability and accuracy of arc suppression. Furthermore, by extending the operation after the RF power supply output is converted back to a constant signal output, a further arc suppression optimization method is provided, facilitating technicians to select the appropriate arc suppression optimization method based on specific circumstances. The implementation method of the pulse output is further explained, and several optimization schemes for the arc detection method are proposed, enabling technicians to better implement the arc suppression optimization process.
[0069] Another specific embodiment of this application provides a radio frequency power supply system capable of optimizing arc suppression, as shown in Figure 4. The radio frequency power supply system includes a radio frequency power supply, a main control module, and an arc monitoring module. The arc monitoring module monitors for the generation of an arc and generates an arc signal when an arc is generated, sending it to the main control module. Based on the received arc signal, the main control module initiates an arc suppression operation, performing the following actions: controlling the output of the radio frequency power supply to convert from a constant signal output to a pulse output; and starting a timer. Once the timer reaches a set duration, the output of the radio frequency power supply is converted back to a constant signal output.
[0070] Preferably, the RF power supply system further includes a parameter management module; wherein, the main control module generates a parameter freeze signal based on the received arc signal and sends it to the parameter management module; it also generates a parameter unfreeze signal after the timer reaches a set duration and sends it to the parameter management module; the parameter management module freezes the working parameters of the last corresponding restoration node of the RF power supply based on the received parameter freeze signal; and restores the working parameters of the last corresponding restoration node of the RF power supply based on the received parameter unfreeze signal. In specific implementation, the parameter management module can have a built-in state machine. The state machine, as a directed graph that performs state transitions according to logic, can freeze the working parameters of the last corresponding restoration node of the RF power supply based on the received parameter freeze signal; and restore the working parameters of the last corresponding restoration node of the RF power supply based on the received parameter unfreeze signal.
[0071] Preferably, the output of the main control module is connected to the input of the power amplifier. The main control module generates a pulse signal by participating in PWM calculations using the potential setpoint and frequency setpoint. This pulse signal controls the phase of the control terminal of the inverter's switching transistor, and the phase difference controls the pulse power output of the power amplifier to control the RF power supply output as a pulse output. In specific implementation, the main control module can have a built-in PID controller to perform the following operations to generate the pulse signal: controlling the pulse signal's potential to switch between a low potential and the potential setpoint according to the potential setpoint; and controlling the pulse signal's frequency to switch between the frequency setpoint and a defined frequency point according to the frequency setpoint; thus generating the pulse signal.
[0072] The RF power supply is configured with different output modes, such as CW mode and pulse mode. CW mode outputs a constant signal, which refers to a preset continuous cyclic waveform or a regulated signal. Pulse mode is used to achieve pulse output. When switching to pulse mode, the PID controller can either recalculate the PID or lock down the PID (a mechanism where the PID is saved and suspended).
[0073] Preferably, the main control module also presets an arc suppression limit number of times; when the number of arc suppression cycles reaches the arc suppression limit number, the operation of the radio frequency power supply is stopped.
[0074] Preferably, the main control module, after converting the output of the RF power supply back to a constant signal output within a preset time, will stop the operation of the RF power supply if an arc signal is received again.
[0075] Preferably, the arc monitoring module includes a signal sampling unit and an ARC processing unit; wherein, the signal sampling unit is used to sample signals related to arc detection to obtain sampled signals; the ARC processing unit is used to receive and process the sampled signals to monitor whether an arc is generated.
[0076] Preferably, the ARC processing unit can select an appropriate method to monitor whether an electric arc is generated, based on the actual situation. For example, arc detection can be implemented in the following ways.
[0077] (1) ARC processing unit, used to receive and process the sampling signal to obtain the real-time reflected power in the plasma cavity; also used to obtain the real-time reflected power of two or more sampling points that are continuously sampled. If the difference between the real-time reflected power of the first and last sampling points does not exceed the reflection power difference threshold, then no electric arc is generated in the plasma cavity; otherwise, an electric arc is generated in the plasma cavity.
[0078] (2) ARC processing unit, used to receive and process the sampling signal to obtain the real-time reflected power and real-time forward power in the plasma cavity; if the ratio of real-time reflected power to real-time forward power is not higher than a preset percentage, then no electric arc is generated in the plasma cavity; otherwise, an electric arc is generated in the plasma cavity.
[0079] (3) ARC processing unit, used to receive and process the sampling signal to obtain the real-time reflected power and real-time forward power in the plasma cavity; if the transient change of the real-time reflected power relative to the real-time forward power is not higher than a certain percentage, then no electric arc is generated in the plasma cavity; otherwise, an electric arc is generated in the plasma cavity.
[0080] (4) An ARC processing unit is used to receive and process the sampled signal to obtain the instantaneous reflection coefficient and the average reflection coefficient in the plasma cavity; the absolute value of the difference between the instantaneous reflection coefficient and the average reflection coefficient is compared with a set reflection coefficient threshold, and the result is used to determine whether an electric arc is generated in the plasma cavity. A schematic diagram of the arc monitoring process is shown in Figure 5. The specific implementation of arc monitoring is described in detail in the previous embodiment and will not be repeated here.
[0081] The specific implementation process of this application embodiment can be found in the above method embodiment, and will not be repeated here.
[0082] Since this embodiment is based on the same principle as the above method embodiments, this system also has the corresponding technical effects of the above method embodiments.
[0083] Those skilled in the art will understand that all or part of the processes of the methods described in the above embodiments can be implemented by a computer program instructing related hardware, and the program can be stored in a computer-readable storage medium. The computer-readable storage medium may be a disk, optical disk, read-only memory, or random access memory, etc.
[0084] The above description is merely a preferred embodiment of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this application should be included within the scope of protection of this application.
Claims
1. An optimized method for arc suppression, characterized in that, The method includes: When an electric arc is generated, the arc suppression operation is activated: The output of the RF power supply is converted from a constant signal output to a pulse output; after a preset time, the output of the RF power supply is converted back to a constant signal output.
2. The arc suppression optimization method according to claim 1, characterized in that, The method further includes: Monitor again for the generation of an electric arc; when an electric arc is detected again, repeatedly initiate the arc suppression operation until the number of cycles reaches the limit, at which point the RF power supply will stop operating.
3. The arc suppression optimization method according to claim 1, characterized in that, The method further includes: Monitor again for the generation of an electric arc; if an electric arc is detected again, stop the operation of the radio frequency power supply.
4. The arc suppression optimization method according to any one of claims 1-3, characterized in that, The arc suppression initiation operation also includes: Freeze the operating parameters and convert the output of the RF power supply from a constant signal output to a pulse output; after a preset time, switch the output of the RF power supply back to a constant signal output according to the operating parameters before freezing.
5. The arc suppression optimization method according to any one of claims 1-3, characterized in that, Pulse output is achieved in the following way: The potential setting value and frequency setting value are used in PWM calculation to achieve pulse output.
6. The arc suppression optimization method according to claim 5, characterized in that, The step of incorporating the potential setpoint and frequency setpoint into PWM calculations to achieve pulse output includes: Based on the potential setting value, the potential of the control pulse signal switches between a low potential and the potential setting value; based on the frequency setting value, the frequency of the control pulse signal switches between the frequency setting value and a limited frequency point; in order to generate a pulse signal; Pulse output is achieved based on the generated pulse signal.
7. The arc suppression optimization method according to any one of claims 1-3, characterized in that, The presence of an electric arc can be monitored using the following methods: Arc detection sampling is performed on the plasma cavity, and the real-time reflected power inside the plasma cavity is obtained based on the sampling results; The real-time reflected power of two or more consecutively sampled points is obtained. If the difference between the real-time reflected power of the first and last sampled points does not exceed the reflection power difference threshold, then no electric arc is generated in the plasma cavity; otherwise, an electric arc is generated in the plasma cavity.
8. The arc suppression optimization method according to any one of claims 1-3, characterized in that, The presence of an electric arc is also monitored using the following methods: Arc detection sampling is performed on the plasma cavity, and the real-time reflected power and real-time forward power inside the plasma cavity are obtained based on the sampling results; If the ratio of real-time reflected power to real-time forward power is not higher than a preset percentage, then no electric arc will be generated in the plasma cavity; otherwise, an electric arc will be generated in the plasma cavity.
9. The arc suppression optimization method according to any one of claims 1-3, characterized in that, The presence of an electric arc is also monitored using the following methods: Arc detection sampling is performed on the plasma cavity, and the real-time reflected power and real-time forward power inside the plasma cavity are obtained based on the sampling results; If the transient change of the real-time reflected power relative to the real-time forward power is not higher than a certain percentage, no electric arc will be generated in the plasma cavity; otherwise, an electric arc will be generated in the plasma cavity.
10. The arc suppression optimization method according to claim 1, wherein the constant signal refers to a preset continuous cyclic waveform or a regulated signal.