Apparatus and method for simultaneously depositing layers on substrates
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- AIXTRON AG
- Filing Date
- 2026-01-15
- Publication Date
- 2026-07-30
Smart Images
Figure EP2026050921_30072026_PF_FP_ABST
Abstract
Description
Description Device and method for the simultaneous deposition of layers onto substrates field of technology
[0001] The invention relates to a device for the simultaneous deposition of layers onto substrates in a first and at least one second reactor chamber, with a common exhaust gas disposal device, with which the first and the second reactor chamber are each connected to a gas outlet line with an exhaust gas pump, with a pressure gauge for determining a total pressure in the first reactor chamber, with a differential pressure gauge for determining a difference in the total pressure in the first reactor chamber and the second reactor chamber, with a pressure regulating valve and with a control device for pressure regulation using measured values supplied by the pressure gauge and the differential pressure gauge, and by varying a valve position of the pressure regulating valve.
[0002] The invention also relates to a method for operating the exhaust gas disposal device. State of the art
[0003] When simultaneously performing the same coating process in multiple process chambers of one or more CVD reactors, it is crucial that the process conditions in the different process chambers are identical. To measure the absolute pressure in the process chambers, each chamber of conventional CVD reactors is equipped with an absolute pressure gauge. However, these absolute pressure gauges typically have a 31372N1PCT drg / g 8 January 2026 Ai 2024-24 Deviation of 0.5% from the actual value. In practice, this inaccuracy leads to a significant difference between the pressures prevailing in the reactor chambers.
[0004] US Patent 2022 / 0090264 discloses a device with two reactor chambers that share a common exhaust gas disposal system. Each of the two reactor chambers is connected to a gas outlet line with an exhaust gas pump. An absolute pressure gauge is located in each of the two gas outlet lines to measure the pressure within the respective process chamber. The measured values from the absolute pressure gauges are transmitted to a control unit, which determines whether the pressure difference is within a predetermined range. If the pressure difference is outside the range, an inert gas is injected into the gas outlet lines to regulate the pressure difference within the predetermined range.
[0005] US Patent 2023 / 0008718 A1 also discloses a device with two reactor chambers that share a common exhaust gas disposal system. Each of the two reactor chambers is connected to a gas outlet line with an exhaust gas pump. The absolute pressures within the gas outlet lines are measured by an absolute pressure gauge located upstream of the common gas outlet line. To determine the pressure difference between the gas outlet lines, the values measured by the absolute pressure gauges are compared. The absolute pressures are regulated by introducing an inert gas into the reactor chamber. 31372N1PCT drg / g January 8, 2026 Ai 2024-24
[0006] TW I 667720 B describes a device with two reactor chambers that share an exhaust gas disposal system, wherein the absolute pressure in the reactor chambers is measured by means of an absolute pressure gauge connected to each reactor chamber.
[0007] WO 2016 / 040448 A1 discloses a device with a reactor chamber divided into different sections by means of gas curtains. Two gas sources are provided, each connected to one of the sections via a supply line. Each of the two supply lines is equipped with a pressure gauge, one of which is an absolute pressure gauge and the other a differential pressure gauge, which measures the difference between the two pressures in the supply lines. Furthermore, a throttle valve is arranged in each of the two supply lines, which controls the pressure in the respective supply line. Summary of the invention
[0008] The invention is based on the objective of providing measures by which the pressure difference between several process chambers of one or more CVD reactors can be minimized.
[0009] The problem is solved by the device or method specified in the claims. The dependent claims not only represent advantageous further developments of the technical teachings specified in the dependent claims, but are also independent solutions to the problem.
[0010] First and foremost, a differential pressure gauge is provided, which is arranged in a pressure measuring line connecting two reactor chambers. The reactor chambers can each be accessed via a 31372N1PCT drg / g January 8, 2026 Ai 2024-24 The gas outlet line must be connected to a common exhaust gas disposal device. The pressure measuring line may be different from the gas outlet lines. For example, the pressure measuring line may be a pipe connected at one end to one of the two reactor chambers and at the other end to the other reactor chamber. In addition, an absolute pressure gauge is provided for measuring the absolute pressure in one of the two reactor chambers. The absolute pressure gauge may also be located in the pressure measuring line. However, the absolute pressure gauge may also be located in one of the gas outlet lines.
[0011] The gas outlet lines can converge into a common gas outlet line. Each gas outlet line can be equipped with a pressure regulating valve. Each pressure regulating valve can be assigned to one of the two reactor chambers. The pressure regulating valves can be used to control the pressure in the respective reactor chamber. Alternatively, only one pressure regulating valve can be provided in all the gas outlet lines, specifically located in the common gas outlet line. The pressure regulating valves can be located upstream of an exhaust gas pump in the common gas outlet line, which pumps gases out of the reactor chambers. The pressure regulating valves can also be connected to separate process pumps. The exhaust gases can, for example, be routed through the exhaust lines into a scrubber.
[0012] Furthermore, a control device is provided which controls the pressure regulating valves using the measured values determined by the absolute pressure gauge and the differential pressure gauge. According to the invention, various control methods can be provided to control the pressure regulating valves. 31372N1PCT drg / g January 8, 2026 Ai 2024-24
[0013] In a first embodiment of the invention, a first reactor chamber can be assigned a first gas outlet line in which a first pressure regulating valve is arranged, and a second reactor chamber can be assigned a second gas outlet line in which a second pressure regulating valve is arranged. The absolute pressure in the first reactor chamber can be regulated by controlling the first pressure regulating valve, and the absolute pressure in the second reactor chamber can be regulated by controlling the second pressure regulating valve. The absolute pressure in the first reactor chamber can be measured using the absolute pressure gauge. The absolute pressure gauge can be arranged in the gas outlet line or the pressure measuring line associated with the first reactor chamber. The differential pressure between the first and second reactor chambers can be measured using the differential pressure gauge arranged in the pressure measuring line.The measured values can be transmitted to the control unit. The control unit can be configured to use the measured values supplied by the absolute pressure gauge to control the valve position of the first pressure regulating valve, which could, for example, be a throttle valve. The control unit can also be configured to use both the measured values supplied by the absolute pressure gauge and the differential pressure gauge to regulate the difference between the absolute pressures of the reactor chambers towards zero. For example, the control unit can use the measured values from the absolute pressure gauge and the differential pressure gauge to control the second pressure regulating valve. In particular, the second pressure regulating valve can be controlled by summing a measured value from the absolute pressure gauge (i.e., the absolute pressure in the first reactor chamber) and a measured value from the differential pressure gauge.
[0014] Alternatively, both pressure control valves can be controlled together using a first control loop. An input value (valve position center) can be transmitted to the first control loop, which is functionally dependent. 31372N1PCT drg / g January 8, 2026 Ai 2024-24 is the sum of the absolute pressure (P) measured by the absolute pressure gauge and half the differential pressure (dP) determined by the differential pressure gauge, i.e., valve position center = f(P + dP / 2). The first control loop can vary the opening cross-section of both pressure control valves simultaneously between an open position (100%) and a closed position (0%) using the control parameter (valve position center). A second control loop can be provided, which uses the differential pressure (dP) determined by the differential pressure gauge as its input signal.The second control loop can generate an output signal depending on the differential pressure (dP) value, which additionally controls a difference between the opening cross-sections (dValvePosition) of the two pressure control valves. The control value transmitted to one of the two pressure control valves (ValvePosition1) depends on the difference between the input value transmitted to the first control loop (ValvePositionMedium), i.e., the sum of the absolute pressure (P) and half the differential pressure (dP / 2), and the difference between the opening cross-sections of the two pressure control valves (dValvePosition), i.e., ValvePosition1 = ValvePositionMedium - dValvePosition. The control value transmitted to the other pressure controller (ValvePosition2), on the other hand, corresponds to the sum of the input value transmitted to the first control loop (ValvePositionMedium) and the difference between the opening cross-sections of the two pressure control valves (dValvePosition).h. Valve position = Valve position middle + d Valve position.
[0015] In a second embodiment of the invention, only one pressure regulating valve can be provided in the gas outlet lines, wherein the gas outlet lines are merged into a common gas outlet line upstream of the pressure regulating valve in the flow direction. The pressure regulating valve can preferably be arranged in the common gas outlet line. To regulate the differential pressure between the reactor chambers, a first purge gas flow can be introduced into at least one of the reactor chambers. 31372N1PCT drg / g 8 January 2026 Ai 2024-24 For this purpose, a purge gas supply line with a purge gas mass flow controller for regulating the mass flow of the purge gas can be connected to at least one of the two reactor chambers. Alternatively, a purge gas supply line can be connected to at least one of the gas outlet lines.
[0016] The control unit can be configured to control the pressure regulating valve using the measured values from the absolute pressure gauge transmitted to it. Furthermore, the control unit can be configured to regulate the difference between the two absolute pressures of the reactor chambers towards zero by varying the setpoint of the purge gas mass flow controller, using the measured values from the differential pressure gauge transmitted to it.
[0017] The reactor chambers can be reactor chambers of one or more CVD reactors. Each reactor chamber can comprise a process chamber, in which, for example, coating or cleaning processes can be carried out, and an adjoining heating chamber. The process chamber and the heating chamber can be connected by flow to the gas outlet line associated with the reactor chamber. A heating device for heating the bottom of the reactor chamber can be arranged in the heating chamber. The first purge gas supply line can preferably open into the heating chamber.
[0018] In a third embodiment of the invention, as in the second embodiment, only one pressure regulating valve can be provided in a common exhaust gas stream of the reactor chambers. The control device can be configured to regulate this pressure regulating valve using the measured values supplied by the absolute pressure gauge and the differential pressure gauge. In particular, a sum of a measured value can be used for this purpose. 31372N1PCT drg / g January 8, 2026 Ai 2024-24 of the absolute pressure gauge and half of a reading from the differential pressure gauge. Additionally, as in the second embodiment, the difference between the two absolute pressures can be regulated to zero by injecting a purge gas into at least one of the reactor chambers, whereby the control device can be configured to control the purge gas mass flow controller using the reading from the differential pressure gauge.
[0019] The same coating process, particularly a process for depositing III-V semiconductors, can preferably be carried out simultaneously in the multiple reactor chambers. However, other materials, such as 2D materials, can also be deposited onto substrates in the reactor chambers.
[0020] Each of the two process chambers is connected to the differential pressure gauge via a pressure measuring line. A differential pressure gauge can have two cavities, separated, for example, by a diaphragm. Each cavity is connected to a pressure measuring line. When no gas flows through the pressure measuring line, the same pressure prevails in both cavities as in the corresponding process chambers. When a pressure difference occurs, the diaphragm deforms into one or the other cavity. This deformation can be measured. Instead of a diaphragm, a piston can also be used to separate the two cavities. A differential pressure gauge, and in particular a differential pressure gauge of this simple design, is less expensive than an absolute pressure gauge, so the manufacturing costs of a device according to the invention are minimized by using a differential pressure gauge. 31372N1PCT drg / g January 8, 2026 Ai 2024-24
[0021] To avoid dead spaces, the two previously described cavities of the differential pressure gauge can be purged. For this purpose, a second purge gas supply line can open into each cavity, allowing a second purge gas flow to enter. In a first embodiment, this flow can be regulated by a mass flow controller, or in a second embodiment, it can be limited, for example, by restrictors formed by orifice plates. Even a very small purge gas flow is sufficient to purge the pressure measuring lines. Preferably, the mass flow controllers or the restrictors each supply the same mass flow of an inert gas.
[0022] In a further embodiment of the invention, a group of more than two reactors or reactor chambers can be provided. One of these reactor chambers is hereinafter referred to as the main chamber, the internal pressure of which can be measured with an absolute pressure gauge. The other two reactor chambers are hereinafter referred to as secondary chambers. The absolute pressure in the secondary chambers is not measured directly. Rather, a differential pressure is measured relative to one of the other reactor chambers. In a first embodiment, each of the at least two secondary chambers is connected to the main chamber via one or a pair of pressure measuring lines, so that the internal pressure in each secondary chamber can be determined by direct comparison with the internal pressure in the main chamber. A differential pressure gauge is located in each of the two pairs of pressure measuring lines.Other embodiments may include additional secondary chambers, each connected to the main chamber via a pair of pressure measuring lines containing a differential pressure gauge. The pressure measuring lines are arranged parallel to each other. 31372N1PCT drg / g January 8, 2026 Ai 2024-24
[0023] In a further embodiment of the invention, which also comprises a group of more than two reactors or reactor chambers, only a first of the auxiliary chambers is connected to the main chamber via a pair of pressure measuring lines containing a differential pressure gauge. A second auxiliary chamber is connected to the first auxiliary chamber via another pair of pressure measuring lines containing another differential pressure gauge. In this embodiment, only the internal pressure in the first auxiliary chamber is directly compared with the internal pressure in the main chamber. The internal pressure in the second auxiliary chamber is directly compared with the internal pressure in the first auxiliary chamber.Further embodiments are provided which have additional secondary chambers, wherein only the first secondary chamber or only some secondary chambers are connected to the main chamber by a pair of pressure measuring lines containing a differential pressure gauge, and all further secondary chambers are connected to only one other secondary chamber each by a pair of pressure measuring lines containing a pressure gauge. The pressure measuring lines are, in effect, arranged in a series one behind the other.
[0024] In a further embodiment, several of these groups, or groups each comprising only two reactors or reactor chambers, can be combined with one another, preferably with all reactor chambers of these groups being connected to a common exhaust gas disposal system. A group can have pressure measuring lines that, as described above, run parallel to each other and connect a main chamber to a secondary chamber. Alternatively, a group can also have pressure measuring lines arranged in a series, as described above. 31372N1PCT drg / g 8 January 2026 Ai 2024-24 Brief description of the drawings
[0025] Exemplary embodiments of the invention are explained below with reference to the accompanying drawings. These show: Fig. 1 shows a circuit diagram of a first embodiment of the invention, wherein two reactor chambers 1, 1' are each connected to a gas outlet line 12, 13 with an exhaust gas pump 14, wherein a pressure regulating valve 3, 3' is arranged in each of the exhaust gas lines 12, 13, and a differential pressure measuring device 10 is arranged in a pressure measuring line 19, 19' connecting the two reactor chambers 1, 1'; Fig. 2 shows a circuit diagram according to Figure 1 of a second embodiment, wherein only a single pressure regulating valve 3 is provided in a common exhaust gas line 21, into which the two exhaust gas lines 12, 13, each assigned to one of the reactor chambers 1, 1', open; Fig. 3 shows a simplified circuit diagram of a further embodiment in which the device has three reactor chambers 1, 1', 1" wherein one reactor chamber 1 forms a main chamber, the internal pressure of which is measured by an absolute pressure gauge 9 and the other two reactor chambers 1', 1" form secondary chambers in which a differential pressure is measured relative to the absolute pressure in the main chamber, wherein pressure measuring lines 19, 19', 19", each containing a differential pressure gauge 10, 10', are connected in parallel to each other; 31372N1PCT drg / g 8 January 2026 Ai 2024-24Fig. 4 a simplified circuit diagram of a further embodiment in which the device has three reactor chambers 1, 1′, 1′′, wherein one reactor chamber 1 forms a main chamber, the internal pressure of which is measured by an absolute pressure gauge 9 and the other two reactor chambers 1′, 1′′ form secondary chambers in which a differential pressure is measured, wherein the pressure measuring lines 19, 19′, 19′′, in each of which a pressure gauge 10, 10′ is located, are connected in series; Fig. 5 shows a simplified circuit diagram of a further embodiment in which two groups 27, 28 of arrangements of three reactor chambers 1, 1′, 1′′ are provided and the pressure measuring lines 19, 19′, 19′′ of the individual groups 27, 28 are connected in parallel to each other; Fig. 6 shows a simplified circuit diagram of a further embodiment in which two groups 27, 28 of arrangements of three reactor chambers 1, 1′, 1′′ are provided and the pressure measuring lines 19, 19′, 19′′ of the individual groups 27, 28 are arranged in series. Description of the embodiments
[0026] Figure 1 shows a first embodiment of the invention with two reactor chambers 1, 1′, each comprising a process chamber 23, 23′ and a heating chamber 24, 24′ connected thereto. A heating device (not shown) for heating the process chamber 23, 23′ is arranged in the heating chamber 24, 24′. Various gases can be fed into the process chambers 23, 23′ through supply lines 7, 7′, 7′′, 8, 8′, 8′′, which undergo pyrolytic combustion. 31372N1PCT drg / g January 8, 2026 Ai 2024-24 can be decomposed and deposited as a layer on substrates arranged in the process chamber 23, 23'. The gases fed into the process chamber 23, 23' and their decomposition products are discharged from the process chamber 23, 23' via a gas outlet 2, 2'. The gas outlet 2, 2' is connected to a cleaning device, for example a scrubber 6, via a gas outlet line 12, 13. A pump 14 is provided to remove the gases from the process chamber 23, 23'. The gases are pumped out of the process chamber 23, 23' by the pump 14.
[0027] To regulate the pressure in the reactor chambers 1, 1', a pressure regulating valve 3, 3' is arranged in each of the gas outlet lines 12, 13. This can, for example, be a throttle valve. The valve position of the pressure regulating valves 3, 3' is controlled by measured values supplied by an absolute pressure gauge 9 and / or a differential pressure gauge 10. Downstream of the pressure regulating valves 3, 3', the gas outlet lines 12, 13 are combined to form a common gas outlet line 21, in which the exhaust gas pump 14 is arranged and which is flow-connected to the scrubber 6.
[0028] To measure the absolute pressure in a first reactor chamber 1, the absolute pressure gauge 9 is arranged in a pressure measuring line 19, 19' connecting the first reactor chamber 1 with a second reactor chamber 1'. The absolute pressure gauge 9 provides measured values that are transmitted to a control unit 11, which uses these measured values to control the valve position of a first pressure regulating valve 3 located in the gas outlet line 12 associated with the first reactor chamber 1.
[0029] The same coating process is carried out simultaneously in both reactor chambers 1 and 1'. This ensures that the coating process does not degrade during the coating process. 31372N1PCT drg / g January 8, 2026 Ai 2024-24 To ensure that the different layers exhibit the same properties, it is necessary that the process conditions in both reactor chambers 1, 1' are the same. To measure pressure differences between the two reactor chambers 1, 1', a differential pressure gauge 10 is arranged in the pressure measuring line 19, 19'. The differential pressure gauge 10 provides measured values to the control unit 11. The control unit 11 uses the measured values from the absolute pressure gauge 9 and the measured values from the differential pressure gauge 10 to control the valve position of a second pressure regulating valve 3', which is arranged in the gas outlet line 13 assigned to the second reactor chamber 1'. The control unit 11 is configured to use these measured values to regulate the difference between the absolute pressures of the reactor chambers 1, 1' towards zero.
[0030] Figure 2 shows a second embodiment of the invention. Unlike the first embodiment shown in Figure 1, only one pressure regulating valve 3 is provided, which is arranged in the common gas outlet line 21 upstream of the exhaust gas pump 14. The gas outlet lines 12, 13 assigned to the reactor chambers 1, 1' are thus joined upstream of the pressure regulating valve 3. The pressure regulating valve 3 is controlled by the control unit 11 using the measured values of the absolute pressure gauge 9 arranged in the pressure measuring line 19.
[0031] To reduce the differential pressure between the two reactor chambers 1, 1' to zero, a purge gas is fed into at least one of the two reactor chambers 1, 1'. The purge gas is supplied by a purge gas source 26, 26', which is connected to the reactor chamber 1, 1' via a first purge gas supply line 20, 20'. The purge gas is preferably fed into the heating chamber 24, 24' to purge the heating device located there. Like the process chamber 23, 23', the heating chamber 24, 24' is equipped with the gas outlet 2, 2'. 31372N1PCT drg / g January 8, 2026 Ai 2024-24flow connected. Thus, the absolute pressure prevailing in the heating chamber 24, 24' corresponds to the absolute pressure in the process chamber 23, 23'. The mass flow of the purge gases is regulated by means of a purge gas mass flow controller 25, 25' arranged in the first purge gas supply lines 20, 20'. The mass flow controllers 25, 25' are controlled by the control unit 11 with the measured values of the differential pressure gauge 10.
[0032] Alternatively, the valve position of the pressure control valve 3 is controlled by the readings of the absolute pressure gauge 9 and the readings of the differential pressure gauge 10. Preferably, the pressure control valve 3 is controlled by the sum of one reading from the absolute pressure gauge 9 and half of one reading from the differential pressure gauge 10. This results in the average pressure of both reactor chambers 1, 1' following the absolute pressure of the first reactor chamber 1. Additionally, the mass flow controllers 25, 25' are controlled using the readings from the differential pressure gauge 10, so that the difference in absolute pressures between the two reactor chambers 1, 1' is reduced to zero.
[0033] The differential pressure gauge 10 can have a simple design. It can have two cavities connected by a deformable partition, each cavity being connected to one of the process chambers 23, 23' via a pressure measuring line 19, 19'. A sensor can be used to monitor any deformation or displacement of the partition. The sensor then provides a signal to which a pressure difference can be assigned. To purge the cavities, purge gas supply lines 22, 22' can be provided, through which a purge gas can be passed through the pressure measuring lines 19, 19'. The purge gases can, for example, be controlled by mass flow controllers 4, 4', as shown by way of example in Figure 2. However, other devices are also possible. 31372N1PCT drg / g January 8, 2026 Ai 2024-24 Suitable means, such as one or more throttles, are provided for regulating the mass flows of the second purge gases fed into the pressure measuring lines 19, 19'. Preferably, the purge gases in the purge gas source 5 are of equal volume and are fed into the pressure measuring lines 19, 19'. The injection point of the second purge gases, i.e., the point where the purge gas supply lines 22, 22' open into the pressure measuring lines 19, 19', can also be located at a distance from the differential pressure gauge. For example, the purge gas flow can be divided into several partial flows, with at least one partial flow being injected at a distance from the differential pressure gauge 10, in particular in the immediate vicinity of one of the reactor chambers 1, 1'.
[0034] Figures 3 to 6 show further embodiments with more than two reactor chambers 1, 1', 1", where the circuit diagrams are simplified. These embodiments nevertheless include the components described above, in particular for control, regulation, gas supply, and gas disposal.
[0035] Figure 3 shows an embodiment consisting of three reactors with a total of three essentially identical or functionally equivalent reactor chambers 1, 1', 1", where the absolute pressure is measured only in reactor chamber 1. For this purpose, an absolute pressure gauge 9 is provided, which can measure the absolute pressure directly in the process chamber. In the drawing, the absolute pressure gauge 9 is arranged in the pressure measuring line 19. The pressure measuring line 19 opens into two differential pressure gauges 10, 10' connected in parallel. Each of the two differential pressure gauges 10, 10' is connected to one of the other two reactor chambers 1', 1" via an associated pressure measuring line 19', 19". The In- 31372N1PCT drg / g January 8, 2026 Ai 2024-24 The internal pressure in reactor chamber 1 is measured directly using the absolute pressure gauge 9. The internal pressures within the two other reactor chambers 1′, 1′′, on the other hand, are determined by comparing the internal pressure measured in reactor chamber 1 with the differential pressure measured by the differential pressure gauge 10, 10′. The pressure measuring lines 19, 19', 19" are connected in parallel.
[0036] Figure 4 shows an embodiment with several such reactors, comprising a total of three reactor chambers 1, 1', 1", where the absolute pressure is measured only in reactor chamber 1 using an absolute pressure gauge 9. The internal pressures in the other two reactor chambers 1', 1" are not measured directly, but rather determined by comparing an absolute pressure with a differential pressure measured by a differential pressure gauge 10, 10'. Here, only reactor chamber 1' is directly connected to reactor chamber 1, whose internal pressure is measured by the absolute pressure gauge 9, via a pair of pressure measuring lines 19, 19' containing a differential pressure gauge 10. The other reactor chamber 1" is connected to reactor chamber P via a pair of pressure measuring lines 19', 19", containing another differential pressure gauge 10'. The pressure measuring lines 19, 19', 19" are connected in series here.
[0037] In further embodiments, as shown in Figures 3 and 4, further reactor chambers can be provided, each of which is connected to one of the other reactor chambers via a pair of pressure measuring lines, each containing a differential pressure measuring device, wherein the pairs of pressure measuring lines are connected either in parallel or in series. 31372N1PCT drg / g January 8, 2026 Ai 2024-24
[0038] In these embodiments, the gas outlets 2, 2', 2" can be connected to an exhaust gas disposal device 6, as shown in the embodiments illustrated in Figures 1 and 2. In particular, this is a common exhaust gas disposal device 6. Here, too, each of the reactor chambers 1, 1', 1'' can be assigned a valve 3, 3', as shown in the embodiment according to Figure 1. However, it is also possible for gas outlet lines 12, 13, 13' to be connected to a common throttle valve. It is particularly intended that the gas outlet lines 12, 13, 13' can be combined with or without individual throttle valves.
[0039] The embodiment shown in Figure 5 depicts two groups 27, 28, each group having an arrangement of reactor chambers 1, 1', 1" as shown in Figure 3. The gas outlet lines 12, 13, 13' of the two groups 27, 28 open into a common gas outlet line 21, which directs the exhaust gas to an exhaust gas disposal device 6. One or more throttle valves may also be provided here. It is particularly intended that only one throttle valve is arranged in the common gas outlet line 21 and that the device has the same properties as the embodiments described above.
[0040] The embodiment shown in Figure 6 depicts two groups 27, 28, each group having an arrangement of reactor chambers 1, 1', 1" as shown in Figure 4. The gas outlet lines 12, 13, 13' of the two groups 27, 28 open into a common gas outlet line 21, which directs the exhaust gas to an exhaust gas disposal device 6. Otherwise, this embodiment can have the same properties as the embodiments described above. 31372N1PCT drg / g January 8, 2026 Ai 2024-24
[0041] The foregoing statements serve to explain the inventions covered by the application as a whole, which each independently further develop the prior art at least through the following combinations of features, whereby two, several or all of these combinations of features may also be combined, namely:
[0042] A device characterized in that at least the differential pressure measuring device 10 is arranged in a pressure measuring line 19, 19' connecting the two reactor chambers 1, 1' to each other, which is different from the gas outlet lines 12, 13.
[0043] A device characterized by a common exhaust gas disposal device flow-connected with the gas outlet lines 12, 13, which has a single pressure gauge 9, wherein the number of differential pressure gauges 10 corresponds to the number of second reactor chambers 1'.
[0044] A device characterized in that a pressure regulating valve 3, 3' is arranged in each of the two gas outlet lines 12, 13 and the control device 11 is configured to regulate the absolute pressure in the first reactor chamber 1 using the measured values supplied by the pressure gauge 9 and by varying the valve position of the pressure regulating valve 3 arranged in the gas outlet line 12 assigned to the first reactor chamber 1, and to regulate the difference of the absolute pressures in the reactor chambers 1, 1' to zero using measured values supplied by both the pressure gauge 9 and the differential pressure gauge 10. 31372N1PCT drg / g January 8, 2026 Ai 2024-24
[0045] A device characterized in that the two gas outlet lines 12, 13 are joined upstream of the pressure regulating valve 3 in the direction of flow, and in that a first purge gas supply line 20, 20' with a mass flow controller 25, 25' opens into at least one of the reactor chambers 1, 1' or into at least one of the gas outlet lines 12, 13, wherein the control device 11 is configured to regulate the absolute pressure in the first reactor chamber 1 using the measured values supplied by the pressure gauge 9 and by varying the valve position of the pressure regulating valve 3 arranged in the gas outlet line 12 assigned to the first reactor chamber 1, and to regulate the difference of the absolute pressures in the reactor chambers 1, 1' to zero using the measured values supplied by the differential pressure gauge 10 by varying the setpoint of the mass flow controller 25, 25'.
[0046] A device characterized in that second purge gas supply lines 22, 22' open into a branch 19, 19' of the pressure measuring line in the immediate vicinity of the differential pressure measuring device 10, with which a lower flow of an inert gas can flow through the pressure measuring line 19, 19' in a mass flow-controlled manner, wherein the gases flowing through the second purge gas supply lines 22, 22' provide the same or different mass flows.
[0047] A device characterized in that the reactor chamber 1, 1' has a process chamber 23, 23' into which reactive gases or inert gases supplied by gas sources 7, 7', 7", 8, 8', 8" can be fed in a controlled manner by mass flow controllers 17, 17', 17", 18, 18', 18", wherein the reactive gases react at an elevated process temperature within the process chamber 23, 23' to form a layer that is deposited on the substrates, wherein the inert gas and reaction products are transported away through the gas outlet line 12, 13, and in that the reactor chamber 1, 1' has a heating chamber 24, 24' in which a heating device is arranged to 31372N1PCT drg / g 8 January 2026 Ai 2024-24 to heat the substrates to the process temperature, with the purge gas supply lines 22, 22' leading into the heating chamber 24, 24'.
[0048] A method characterized in that the valve position of the pressure control valve 3 arranged in the gas outlet line 12 assigned to the first reactor chamber 1 is regulated against a setpoint using the measured values supplied by the pressure gauge 9, and the difference of the absolute pressures is regulated against zero using measured values supplied by both the pressure gauge 9 and the differential pressure gauge 10.
[0049] A method characterized in that the valve position of the pressure control valve 3 arranged in the gas outlet line 12 assigned to the first reactor chamber 1 is regulated against a setpoint using the measured values supplied by the pressure measuring device 9, and the difference of the absolute pressures is regulated against zero using the measured values supplied by the differential pressure measuring device 10.
[0050] A method characterized in that the valve position of the pressure control valve 3 arranged in the gas outlet line 12 assigned to the first reactor chamber 1 is regulated against a setpoint using the measured values supplied by the pressure measuring device 9, and the difference of the absolute pressures is regulated against zero using the measured values supplied by the differential pressure measuring device 10.
[0051] A device characterized in that the gas outlet lines 12, 13 open into a common gas outlet line 21 in which the pressure regulating valve 3 and the exhaust pump 14 are arranged. 31372N1PCT drg / g January 8, 2026 Ai 2024-24
[0052] A device characterized in that an exhaust gas pump 14 is arranged in each of the gas outlet lines 12, 13.
[0053] All disclosed features are essential to the invention (individually, but also in combination with one another). The disclosure of this application hereby incorporates in full the disclosure content of the associated / attached priority documents (copy of the earlier application), also for the purpose of including features of these documents in the claims of the present application. The dependent claims, even without the features of a referenced claim, characterize independent inventive developments of the prior art, in particular for the purpose of filing divisional applications based on these claims. The invention specified in each claim may additionally include one or more of the features described above, in particular those identified by reference numerals and / or listed in the reference numeral list.The invention also relates to design forms in which individual features mentioned in the above description are not realized, in particular insofar as they are recognizably unnecessary for the respective purpose or can be replaced by other technically equivalent means. 31372N1PCT drg / g 8. Tanuar 2026 Ai 2024-24List of reference symbols 1 Reactor chamber 15' Supply line 1' Reactor chamber 15" Supply line 1" reactor chamber 16 supply line 2 Gas outlet 16' Supply line 2' Gas outlet 16" Supply line 2" gas outlet 17" supply line 3 Valve 17' Supply line 3' Valve 17" Supply line 4 mass flow controllers 18 supply line 4' Mass flow regulator 18' Supply line 5 Purge gas source 18" supply line 6 Scrubber, exhaust gas disposal 19 Pressure measuring line device 19' Pressure measuring line 7 Gas source 19" pressure measuring line 7' Gas source 20 first purge gas supply line 7" Gas source 20' first purge gas supply line 8 Gas source 20" first purge gas supply line 8' Gas source 21 common gas outlet line 8" Gas source tung 9 Absolute pressure gauge 22 Second purge gas supply line 10 Differential pressure gauge 22' Second purge gas supply line 10' Differential pressure gauge 23 Process chamber 11 Control unit 23' Process chamber 12 Gas outlet pipe 24 Heating chamber 13 Gas outlet pipe 24' Heating chamber 13' Gas outlet line 25 Purge gas mass flow regulator 14 Exhaust gas pump 25' Purge gas mass flow regulator 15 Supply line 26 Gas source 31372N1PCT drg / g 8 January 2026 Ai 2024-2426′ Gas source27 Group of reactor chambers28 Group of reactor chambers 31372N1PCT drg / g January 8, 2026 Ai 2024-24
Claims
Claims 1. Device for the simultaneous deposition of layers onto substrates in a first and at least one second reactor chamber (1, 1'), wherein the first and the second reactor chamber (1, 1') are each connected to a gas outlet line (12, 13, 13") with at least one exhaust gas pump (14), with a pressure gauge (9) to determine an absolute pressure in the first reactor chamber (1), with at least one differential pressure measuring device (10, 10′) for determining a difference in absolute pressure in the first reactor chamber (1) and the second reactor chamber (1′, 1"), with a pressure regulating valve (3, 3′) and with a control device (11) for pressure regulation using measured values supplied by the pressure gauge (9) and the differential pressure gauge (10, 10′), and by varying a valve position of the pressure regulating valve (3, 3′), characterized in that at least one differential pressure measuring device (10, 10′) is arranged in a pressure measuring line (19, 19′, 19′) connecting the two reactor chambers (1, 1′, 1"), which is different from the gas outlet lines (12, 13).
2. Device according to claim 1, characterized by a common exhaust gas disposal device flow-connected with the gas outlet lines (12, 13), which has a single pressure gauge (9), wherein the number of differential pressure gauges (10, 10′) corresponds to the number of second reactor chambers (1′). 31372N1PCT drg / g 8 January 2026 Ai 2024-243. Device according to claim 1 or 2, characterized in that a pressure regulating valve (3, 3') is arranged in each of the two gas outlet lines (12, 13) and the control device (11) is set up to regulate the absolute pressure in the first reactor chamber (1) using the measured values supplied by the pressure gauge (9) and by varying the valve position of the pressure regulating valve (3) arranged in the gas outlet line (12) assigned to the first reactor chamber (1). to regulate the difference of the absolute pressures in the reactor chambers (1, 1') towards zero using the measured values supplied by both the pressure gauge (9) and the differential pressure gauge (10).
4. Device according to claim 1 or 2, characterized in that the two gas outlet lines (12, 13) are joined in the flow direction upstream of the pressure regulating valve (3), and that a first purge gas supply line (20, 20′) with a mass flow regulator (25, 25′) opens into at least one of the reactor chambers (1, 1') or into at least one of the gas outlet lines (12, 13), wherein the control device (11) is configured to regulate the absolute pressure in the first reactor chamber (1) using the measured values supplied by the pressure gauge (9) and by varying the valve position of the pressure regulating valve (3) arranged in the gas outlet line (12) associated with the first reactor chamber (1) and to regulate the difference of the absolute pressures in the reactor chambers (1, 1′) towards zero by varying the setpoint of the mass flow controller (25, 25′) using the measured values supplied by the differential pressure gauge (10, 10′). 31372N1PCT drg / g 8 January 2026 Ai 2024-245. Device according to one of the preceding claims, characterized in that second purge gas supply lines (22, 22') open into a branch (19, 19', 19") of the pressure measuring line in the immediate vicinity of the differential pressure gauge (10, 10'), with which a lower flow of an inert gas can flow through the pressure measuring line (19, 19', 19") in a mass flow-controlled manner. wherein the gases flowing through the second purge gas supply lines (22, 22') provide the same or different mass flows.
6. Device according to one of the preceding claims, characterized in that the reactor chambers (1, 1', 1") have a process chamber (23, 23') into which reactive gases or inert gases supplied by gas sources (7, 7', 7", 8, 8', 8") can be fed in a controlled manner by mass flow controllers (17, 17', 17", 18, 18', 18"). where the reactive gases react at an increased process temperature within the process chamber (23, 23') to form a layer that is deposited on the substrates, wherein the inert gas and reaction products are transported away through the gas outlet line (12, 13), and that the reactor chamber (1, 1', 1") has a heating chamber (24, 24') in which a heating device is arranged to heat the substrates to the process temperature, the second purge gas supply lines (22, 22') lead into the heating chamber (24, 24').
7. Device according to one of claims 1 to 6, characterized in that the gas outlet lines (12, 13) open into a common gas outlet line (21) in which the pressure regulating valve (3) and an exhaust gas pump (14) are arranged. 31372N1PCT drg / g 8 January 2026 Ai 2024-248. Device according to one of the preceding claims, characterized by two or more second reactor chambers (1', 1''), hereinafter referred to as secondary chambers, wherein the differential pressure measuring devices (10', 10") are each arranged in a pressure measuring line pair (19, 19', 19") which connects the first reactor chamber (1) to one of the auxiliary chambers (1', 1").
9. Device according to one of the preceding claims, characterized by two or more second reactor chambers (1', 1"), hereinafter referred to as secondary chambers, wherein a first of the differential pressure measuring devices (10) is in a pressure measuring line pair (19, 19') between the first reactor chamber (1) and a first auxiliary chamber (1') and a second differential pressure gauge is arranged in a pressure measuring line pair (19', 19") between the first auxiliary chamber (1') and the second auxiliary chamber (1").
10. Device according to one of the preceding claims, characterized by at least two groups (27, 28) of arrangements of reactor chambers (1, 1', 1"), wherein each group (27, 28) is configured according to one of the preceding claims and wherein the gas outlet lines (12, 13, 13') are flow-connected to a common exhaust gas disposal device (6).
11. Device according to one of the preceding claims, characterized in that an exhaust gas pump (14) is arranged in each of the gas outlet lines (12, 13). 31372N1PCT drg / g 8 January 2026 Ai 2024-2412. Method for operating a device according to one of claims 1 to 3 or 5 to 9, characterized in that the valve position of the pressure regulating valve (3) arranged in the gas outlet line (12) associated with the first reactor chamber (1) is regulated against a setpoint using the measured values supplied by the pressure gauge (9) and The difference in absolute pressures is regulated to zero using the measured values supplied by both the pressure gauge (9) and the differential pressure gauge (10).
13. Method for operating a device according to claim 4, characterized in that the valve position of the pressure control valve (3) is regulated against a setpoint using the measured values supplied by the pressure gauge (9) and the difference of the absolute pressures is regulated against zero using the measured values supplied by the differential pressure gauge (10).
14. Method for operating a device according to one of claims 1, 2 or 4 to 11, characterized in that the valve position of the pressure regulating valve (3) arranged in the gas outlet line (12) associated with the first reactor chamber (1) is regulated against a setpoint using the measured values supplied by the pressure gauge (9) and The difference in absolute pressures is regulated to zero using the measured values supplied by the differential pressure gauge (10).
15. Device or method characterized by one or more of the characterizing features of one of the preceding claims. 31372N1PCT drg / g January 8, 2026 Ai 2024-24