Seal member and substrate processing device

Abstract

Provided are a seal member that improves sealability, and a substrate processing device.　An annular seal member according to the present invention has a first annular portion that is composed of a first material, and a second annular portion that is composed of a second material which is different from the first material.

Description

Sealing member and substrate processing apparatus

[0001] This disclosure relates to a sealing member and a substrate processing apparatus.

[0002] Patent Document 1 discloses a plasma processing apparatus in which a sealing member is arranged.

[0003] Japanese Patent Publication No. 2010-225396

[0004] In one aspect, this disclosure provides a sealing member and a substrate processing apparatus that improve sealing performance.

[0005] To solve the above problems, according to one embodiment, an annular sealing member can be provided having a first annular portion made of a first material and a second annular portion made of a second material different from the first material.

[0006] From one perspective, it is possible to provide a sealing member and a substrate processing apparatus that improve sealing performance.

[0007] An example of a diagram illustrating the configuration of a plasma processing system. An example of a diagram illustrating the configuration of a capacitively coupled plasma processing apparatus. An example of a cross-sectional view showing the structure of a valve with a seal. An example of a partially cut perspective view showing a portion of the seal member. An example of a cross-sectional view showing the structure of the seal. An example of a cross-sectional view of the seal member. An example of a plan view of the first member seen from above. An example of a cross-sectional view of the seal member. An example of a partially cut perspective view showing a portion of the seal member. An example of a flowchart showing the process of attaching the seal member. An example of a cross-sectional view showing the structure of the seal after the seal member has been attached to the groove. An example of a cross-sectional view showing the structure of the seal after plasma processing. An example of a cross-sectional view of the seal member.

[0008] Various exemplary embodiments will be described in detail below with reference to the drawings. In each drawing, the same or corresponding parts will be denoted by the same reference numerals.

[0009] [Plasma Processing System] Figure 1 is an example of a diagram illustrating an example of the configuration of a plasma processing system. In one embodiment, the plasma processing system includes a plasma processing apparatus 1 and a control unit 2. The plasma processing system is an example of a substrate processing system, and the plasma processing apparatus 1 is an example of a substrate processing apparatus. The plasma processing apparatus 1 includes a plasma processing chamber 10, a substrate support unit 11, and a plasma generation unit 12. The plasma processing chamber 10 has a plasma processing space. The plasma processing chamber 10 also has at least one gas supply port for supplying at least one processing gas to the plasma processing space, and at least one gas outlet for discharging gas from the plasma processing space. The gas supply port is connected to a gas supply unit 20, which will be described later, and the gas outlet is connected to an exhaust system 40, which will be described later. The substrate support unit 11 is located in the plasma processing space and has a substrate support surface for supporting a substrate.

[0010] The plasma generation unit 12 is configured to generate plasma from at least one processing gas supplied into the plasma processing space. The plasma formed in the plasma processing space may be capacitively coupled plasma (CCP), inductively coupled plasma (ICP), ECR (Electron Cyclotron Resonance) plasma, helicon wave excited plasma (HWP), or surface wave plasma (SWP), etc. Various types of plasma generation units, including AC (Alternating Current) plasma generation units and DC (Direct Current) plasma generation units, may also be used. In one embodiment, the AC signal (AC power) used in the AC plasma generation unit has a frequency in the range of 100 kHz to 10 GHz. Therefore, the AC signal includes an RF (Radio Frequency) signal and a microwave signal. In one embodiment, the RF signal has a frequency in the range of 100 kHz to 150 MHz.

[0011] The control unit 2 processes computer-executable instructions that cause the plasma processing apparatus 1 to perform the various processes described herein. The control unit 2 may be configured to control the elements of the plasma processing apparatus 1 to perform the various processes described herein. In one embodiment, part or all of the control unit 2 may be included in the plasma processing apparatus 1. The control unit 2 is implemented, for example, by a computer 2a. The control unit 2 may include a processing unit 2a1, a storage unit 2a2, and a communication interface 2a3. The functions realized by the processing unit 2a1 described herein may be implemented in a circuit or processing circuit, including a general-purpose processor, an application-specific processor, integrated circuits, ASICs (Application Specific Integrated Circuits), a CPU (Central Processing Unit), a conventional circuit, and / or a combination thereof, programmed to realize the described functions. The processor is considered to be a circuit or processing circuit, including transistors and other circuits. The processor may be a programmed processor that executes a program stored in the storage unit 2a2. This program may be pre-stored in the storage unit 2a2 or retrieved via a medium when needed. The acquired program is stored in the storage unit 2a2 and read from the storage unit 2a2 and executed by the processing unit 2a1. The medium may be various storage media readable by the computer 2a, or it may be a communication line connected to the communication interface 2a3. The storage unit 2a2 may include RAM (Random Access Memory), ROM (Read Only Memory), HDD (Hard Disk Drive), SSD (Solid State Drive), or a combination thereof. The communication interface 2a3 may communicate with the plasma processing device 1 via a communication line such as a LAN (Local Area Network).In this disclosure, circuits, units, and means are hardware programmed to perform or configured to perform the functions described. Such hardware may be any hardware described in this disclosure, or any hardware known to be programmed to perform or execute the functions described. If such hardware is a processor that is considered to be a type of circuit, such circuit, means, or unit is a combination of hardware and software used to constitute such hardware and / or processor.

[0012] [Plasma Processing Equipment] Below, an example of the configuration of a capacitively coupled plasma processing equipment as an example of plasma processing equipment 1 will be described. Figure 2 is an example of a diagram illustrating the configuration of a capacitively coupled plasma processing equipment (substrate processing equipment) 1.

[0013] The capacitively coupled plasma processing apparatus 1 includes a plasma processing chamber 10, a gas supply unit 20, a power supply system 30, and an exhaust system 40. The plasma processing apparatus 1 also includes a substrate support unit 11 and a gas introduction unit. The gas introduction unit is configured to introduce at least one processing gas into the plasma processing chamber 10. The gas introduction unit includes a shower head 13. The substrate support unit 11 is located inside the plasma processing chamber 10. The shower head 13 is located above the substrate support unit 11. In one embodiment, the shower head 13 constitutes at least a portion of the ceiling of the plasma processing chamber 10. The plasma processing chamber 10 has a plasma processing space 10s defined by the shower head 13, the side walls 10a of the plasma processing chamber 10, and the substrate support unit 11. The plasma processing chamber 10 is grounded. The shower head 13 and the substrate support unit 11 are electrically insulated from the housing of the plasma processing chamber 10.

[0014] The substrate support portion 11 includes a main body portion 111 and a ring assembly 112. The main body portion 111 has a central region 111a for supporting the substrate W and an annular region 111b for supporting the ring assembly 112. A wafer is an example of a substrate W. The annular region 111b of the main body portion 111 surrounds the central region 111a of the main body portion 111 in a plan view. The substrate W is placed on the central region 111a of the main body portion 111, and the ring assembly 112 is placed on the annular region 111b of the main body portion 111 so as to surround the substrate W on the central region 111a of the main body portion 111. Therefore, the central region 111a is also called the substrate support surface for supporting the substrate W, and the annular region 111b is also called the ring support surface for supporting the ring assembly 112.

[0015] In one embodiment, the main body 111 includes a base 1110 and an electrostatic chuck 1111. The base 1110 includes a conductive member. The conductive member of the base 1110 can function as a lower electrode. The electrostatic chuck 1111 is placed on the base 1110. The electrostatic chuck 1111 includes a ceramic member 1111a and an electrostatic chuck electrode 1111b placed within the ceramic member 1111a. The electrostatic chuck electrode 1111b is also called a clamping electrode. In one embodiment, the electrostatic chuck electrode 1111b is electrically connected or coupled to a chuck power supply. The chuck power supply may be a DC power supply or an AC power supply. The ceramic member 1111a has a central region 111a. In one embodiment, the ceramic member 1111a also has an annular region 111b. Furthermore, other members surrounding the electrostatic chuck 1111, such as an annular electrostatic chuck or an annular insulating member, may have an annular region 111b. In this case, the ring assembly 112 may be placed on the annular electrostatic chuck or the annular insulating member, or it may be placed on both the electrostatic chuck 1111 and the annular insulating member. In addition, at least one bias electrode, which is electrically connected or coupled to the power supply 31 and / or power supply 32 described later, may be placed inside the ceramic member 1111a. In this case, at least one bias electrode functions as a lower electrode. Also, the conductive member of the base 1110 and the bias electrode inside the ceramic member 1111a may function as multiple lower electrodes. In one embodiment, the first voltage generation unit 32a, which functions as a voltage pulse generation unit described later, is electrically connected or coupled to the bias electrode inside the ceramic member 1111a, and the first RF generation unit 31a, described later, is electrically connected or coupled to the conductive member of the base 1110. Furthermore, the electrostatic chuck electrode 1111b may function as a lower electrode. Therefore, the substrate support portion 11 includes at least one lower electrode.

[0016] The ring assembly 112 includes one or more annular members. In one embodiment, the one or more annular members include one or more edge rings and at least one covering ring. The edge rings are formed of a conductive or insulating material, and the covering rings are formed of an insulating material.

[0017] The substrate support section 11 may also include a temperature control module configured to adjust at least one of the electrostatic chuck 1111, the ring assembly 112, and the substrate W to a target temperature. The temperature control module may include a heater, a heat transfer medium, a flow path 1110a, or a combination thereof. A heat transfer fluid such as brine or gas flows through the flow path 1110a. In one embodiment, the flow path 1110a is formed within the base 1110, and one or more heaters are arranged within the ceramic member 1111a of the electrostatic chuck 1111. The substrate support section 11 may also include a heat transfer gas supply section configured to supply heat transfer gas to the gap between the back surface of the substrate W and the central region 111a.

[0018] The showerhead 13 is configured to introduce at least one processing gas from the gas supply unit 20 into the plasma processing space 10s. The showerhead 13 has at least one gas supply port 13a, at least one gas diffusion chamber 13b, and a plurality of gas inlet ports 13c. The processing gas supplied to the gas supply port 13a passes through the gas diffusion chamber 13b and is introduced into the plasma processing space 10s through the plurality of gas inlet ports 13c. The showerhead 13 also includes at least one upper electrode. In addition to the showerhead 13, the gas introduction unit may also include one or more side gas injectors (SGIs) attached to one or more openings formed in the side wall 10a.

[0019] The gas supply unit 20 may include at least one gas source 21 and at least one flow controller 22. In one embodiment, the gas supply unit 20 is configured to supply at least one processing gas to the shower head 13 from a corresponding gas source 21 via a corresponding flow controller 22. Each flow controller 22 may include, for example, a mass flow controller or a pressure-controlled flow controller. Furthermore, the gas supply unit 20 may include at least one flow modulation device that modulates or pulses the flow rate of at least one processing gas.

[0020] The power supply system 30 includes a power supply 31 that is electrically connected to or coupled to the plasma processing chamber 10. In one embodiment, the power supply 31 is electrically connected to or coupled to the plasma processing chamber 10 via at least one impedance matcher. The impedance matcher may be a mechanically controlled matcher or an electronically controlled matcher. The power supply 31 is configured to supply at least one RF signal (RF power) to at least one lower electrode and / or at least one upper electrode. This generates plasma from at least one processing gas supplied to the plasma processing space 10s. Therefore, the power supply 31 can function as at least part of the plasma generation unit 12. In addition, by supplying a bias RF signal to at least one lower electrode, a bias potential is generated on the substrate W, and ionic components in the formed plasma can be drawn into the substrate W.

[0021] The power supply 31 includes a first RF generation unit 31a and a second RF generation unit 31b. The first RF generation unit 31a is electrically connected or coupled to at least one lower electrode and / or at least one upper electrode and is configured to generate a source RF signal (source RF power) to generate plasma in the plasma processing space 10s. In one embodiment, the first RF generation unit 31a is electrically connected or coupled to at least one lower electrode and / or at least one upper electrode via at least one impedance matcher. In one embodiment, the source RF signal has a frequency in the range of 10 MHz to 150 MHz. In one embodiment, the first RF generation unit 31a may be configured to generate a plurality of source RF signals having different frequencies. One or more generated source RF signals are supplied to at least one lower electrode and / or at least one upper electrode.

[0022] The second RF generation unit 31b is electrically connected to or coupled to at least one lower electrode and is configured to generate a bias RF signal (bias RF power). In one embodiment, the second RF generation unit 31b is electrically connected to or coupled to at least one lower electrode via at least one impedance matcher. When the first RF generation unit 31a is electrically connected to or coupled to a lower electrode, the second RF generation unit 31b may be electrically connected to or coupled to the same lower electrode, or it may be electrically connected to or coupled to a different lower electrode. The frequency of the bias RF signal may be the same as or different from the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency lower than the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency in the range of 100 kHz to 60 MHz. In one embodiment, the second RF generation unit 31b may be configured to generate a plurality of bias RF signals having different frequencies. The generated one or more bias RF signals are supplied to at least one lower electrode. In various embodiments, at least one of the source RF signal and the bias RF signal may be pulsed.

[0023] The power supply system 30 may also include a power supply 32 that is electrically connected to or coupled to the plasma processing chamber 10. The power supply 32 includes a first voltage generation unit 32a and a second voltage generation unit 32b. In one embodiment, the first voltage generation unit 32a is electrically connected to or coupled to at least one lower electrode and is configured to generate a first voltage signal. The generated first voltage signal is applied to at least one lower electrode. In one embodiment, the second voltage generation unit 32b is electrically connected to or coupled to at least one upper electrode and is configured to generate a second voltage signal. The generated second voltage signal is applied to at least one upper electrode.

[0024] In various embodiments, the first and / or second voltage signals may be pulsed. In this case, the first voltage generation unit 32a and / or the second voltage generation unit 32b function as voltage pulse generation units configured to generate a sequence of voltage pulses. Thus, the sequence of voltage pulses is applied to at least one lower electrode and / or at least one upper electrode. In one embodiment, the sequence of voltage pulses has a plurality of cycles, each cycle including a burst of voltage pulses in a first period and a constant reference voltage in a second period. That is, in the sequence of voltage pulses, the burst of voltage pulses is repeated. The absolute value of the voltage level of the voltage pulse is greater than the absolute value of the voltage level of the reference voltage. The voltage pulse may have an arbitrary waveform having a rectangle, trapezoid, triangle, or a combination thereof, and the arbitrary waveform may change over time. The voltage pulse may have positive polarity or negative polarity. The sequence of voltage pulses may also include one or more positive voltage pulses and one or more negative voltage pulses within one cycle. The first and second voltage generation units 32a and 32b may be provided in addition to the power supply 31, and the first voltage generation unit 32a may be provided in place of the second RF generation unit 31b.

[0025] The exhaust system 40 may be connected to, for example, a gas outlet 10e located at the bottom of the plasma processing chamber 10. The exhaust system 40 may include a pressure regulating valve and a vacuum pump. The pressure regulating valve regulates the pressure in the plasma processing space 10s. The vacuum pump may include a turbomolecular pump, a dry pump, or a combination thereof.

[0026] Here, the plasma processing apparatus 1 has a sealing portion 200 for sealing gas or liquid. The sealing portion 200 is provided with a sealing member 250 such as an O-ring.

[0027] An example of a seal portion 200 will be explained using Figure 3. Figure 3 is an example of a cross-sectional view showing the structure of a valve having a seal portion 200. For example, the exhaust system 40 is equipped with an APC (Automatic Pressure Control) valve as a pressure regulating valve. The seal portion 200 of the APC valve has a valve seat member (first member 210) having an opening 211, a valve body member (second member 220) that closes the opening 211, and a seal member 250 fitted into a groove (annular groove) 215 provided so as to surround the opening 211 of the valve seat member (first member 210). When the valve body member (second member 220) closes the opening 211 of the valve seat member (first member 210), the seal member 250 and the valve body member (second member 220) come into contact, and the gap between the valve body member (second member 220) and the valve seat member (first member 210) is sealed by the seal member 250. Furthermore, by separating the valve body member (second member 220) from the valve seat member (first member 210) (see Figure 3), the opening 211 is opened.

[0028] Here, if the valve body member (second member 220) maintains a state in which it closes the opening 211 of the valve seat member (first member 210), there is a risk that the sealing member 250 may become fixed to the valve body member (second member 220). If the valve body member (second member 220) is separated from the valve seat member (first member 210) while the sealing member 250 is fixed to the valve body member (second member 220), there is a risk that the sealing member 250 may fall out of the groove 215. Furthermore, even if the valve body member (second member 220) closes the opening 211 of the valve seat member (first member 210) again, there is a risk that the sealing performance may not be ensured. For this reason, a structure for the sealing portion 200 that prevents the sealing member 250 from falling out of the groove 215 is required.

[0029] [Structure of the seal portion of the first embodiment] Next, the structure of the seal portion 200 of the first embodiment will be described with reference to Figures 4 and 5. Figure 4 is an example of a partial cutaway perspective view in which a part of the seal member 250 has been cut. Figure 5 is an example of a cross-sectional view showing the structure of the seal portion 200.

[0030] The seal part 200 includes a first member 210, a second member 220, and a seal member 250. The seal part 200 seals the gap between the first member 210 and the second member 220 by sandwiching the seal member 250 between the first member 210 and the second member 220.

[0031] The first member 210 has a facing surface (hereinafter also referred to as the first surface) 210s facing the second member 220. The first member 210 has a groove part 215 for fitting the seal member 250 into the facing surface 210s. The groove part 215 has a tapered groove structure in which the opening width is narrower toward the opening side (the inlet side) and wider toward the inner side (the side of the bottom surface 215s). The seal member 250 is fitted into the groove part 215 while being elastically deformed. This prevents the seal member 250 fitted into the groove part 215 from falling off.

[0032] The second member 220 has a facing surface (hereinafter also referred to as the second surface) 220s facing the facing surface (the first surface) 210s of the first member 210. Also, the second member 220 may be a member capable of moving relative to the first member 210. For example, the seal part 200 has a first state (see FIG. 5) in which the second member 220 is brought closer to the first member 210 (the facing surface 210s and the facing surface 220s are abutted) and the gap between the first member 210 and the second member 220 is sealed by the seal part 200, and a second state (see FIG. 3) in which the second member 220 is separated from the first member 210 (the facing surface 210s and the facing surface 220s are separated) to release the seal. That is, in the examples of FIGS. 3 and 5, the second member 220 may be configured to be movable in the vertical direction with respect to the first member 210.

[0033] For example, the first member 210 is a valve seat member having an opening 211 (see FIGS. 3 and FIG. 7 described later) in the facing surface 210s. Also, the first member 210 has a groove part 215 surrounding the opening 211 in the facing surface 210s. The second member 220 is a valve body member that opens and closes the opening 211 of the first member 210. Note that the first member 210 and the second member 220 may be made of a metal such as aluminum or SUS.

[0034] The seal member (annular seal member) 250 is a member having an annular shape. The seal member 250 is formed of two different materials. The seal member 250 has a first annular portion 251 made of a first material and a second annular portion 252 made of a second material. Here, the direction passing through the opening formed by the annular seal member 250 is defined as the axial direction. One side in the axial direction (the lower side in FIG. 4) is the first annular portion 251, and the other side in the axial direction (the upper side in FIG. 4) is the second annular portion 252.

[0035] Also, the first annular portion 251 is a portion on the side that contacts the bottom surface 215s and / or the side surface of the groove portion (annular groove) 215 of the first member 210. The second annular portion 252 is a portion on the side that contacts the opposing surface 220s of the second member 220. As shown in FIG. 4, the first annular portion 251 has a first annular surface 251S, and the second annular portion 252 has a second annular surface 252S. By joining the first annular surface 251S and the second annular surface 252S, the seal member 250 having the first annular portion 251 and the second annular portion 252 is formed.

[0036] The second material constituting the second annular portion 252 is made of a material in which sticking is less likely to occur than the first material constituting the first annular portion 251. Also, the first material constituting the first annular portion 251 may be made of a material that is more easily held in the groove portion 215 than the second material constituting the second annular portion 252. For example, the first material constituting the first annular portion 251 may be made of a material having a higher adhesive force than the second material constituting the second annular portion 252.

[0037] Specifically, the first material is made of, for example, fluororubber or silicone rubber. Specifically, the first material can use any rubber material such as vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinylmethyl silicone rubber (VMQ), fluorosilicone rubber (FVMQ), etc.

[0038] Furthermore, the second material is composed of a material to which a filler has been added, for example, fluororubber or silicone rubber. Specifically, the fluororubber or silicone rubber used in the second material is composed of one of the following rubber materials, for example, vinylidene fluoride fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), or fluorosilicone rubber (FVMQ). Furthermore, the filler added to the second material is Al ２ O ３ , TiO ２ Si, SiO ２ Any of the following can be used: C, etc. The fluororubber or silicone rubber used in the first material and the fluororubber or silicone rubber used in the second material may be the same fluororubber or silicone rubber, or they may be different fluororubber or silicone rubber. In other words, the first material and the second material may be the same rubber material (fluororubber, silicone rubber). Alternatively, the first material and the second material may be different rubber materials (fluororubber, silicone rubber).

[0039] Furthermore, the first annular portion 251 and the second annular portion 252 may have different colors. The first annular portion 251 may have a first color, and the second annular portion 252 may have a second color different from the first color. Specifically, the color of the second material may differ from the color of the first material by adding a filler. Also, even if the first material and the second material have the same color, the first annular portion 251 and the second annular portion 252 may have different colors by adding a coloring agent to either the first material or the second material. Alternatively, a configuration in which different coloring agents are added to the first material and the second material may be used. Furthermore, it is preferable that the color of the first annular portion 251 and the color of the second annular portion 252 are complementary colors to each other.

[0040] As a result, when fitting the sealing member 250 into the groove 215, the worker can easily distinguish between the first annular portion 251 and the second annular portion 252. Therefore, the worker can fit the sealing member 250 into the groove 215 such that the first annular portion 251 is on the back side of the groove 215 and the second annular portion 252 is on the entrance side of the groove 215.

[0041] Furthermore, it is possible to prevent or suppress the sealing member 250 (second annular portion 252) from becoming fixed to the second member 220. This prevents or suppresses the sealing member 250 from falling out of the groove 215 when the second member 220 is separated from the first member 210. As a result, even when the second member 220 is brought into contact with the first member 210 again, the sealing performance of the sealing member 250 can be ensured. Therefore, the sealing performance of the sealing member 250 can be improved.

[0042] Furthermore, when the sealing member 250 is fitted into the groove 215 of the first member 210, the sealing member 250 may be held in the groove 215. For example, by fitting the sealing member 250 into the groove 215 of the dovetail groove structure, the side wall of the groove 215 and the sealing member 250 come into contact, and the sealing member 250 is held in the groove 215. Alternatively, when the sealing member 250 is held in the groove 215 of the first member 210, the first annular portion 251 of the sealing member 250 may exert a holding force on the first member 210. For example, the first annular portion 251 of the sealing member 250 may exert a holding force (for example, an adhesive force) on the bottom surface 215s of the groove 215. This improves the holding force of the groove 215 in holding the sealing member 250, and further prevents the sealing member 250 from falling out of the groove 215.

[0043] An example of molding the sealing member 250 will be described. A first annular portion 251 is formed by filling a mold with a first material to form an annular member with a semicircular cross-section. A second annular portion 252 is formed by filling a mold with a second material to form an annular member with a semicircular cross-section. Then, the first annular portion 251 and the second annular portion 252 may be combined and heat-treated to form a single sealing member 250.

[0044] [Structure of the seal portion of the second embodiment] Next, the structure of the seal portion 200 of the second embodiment will be described with reference to Figures 6 and 7. Figure 6 is an example of a cross-sectional view of the seal member 250A. Figure 7 is an example of a plan view of the first member 210 viewed from above. Here, the seal portion 200 of the second embodiment differs from the seal portion 200 of the first embodiment (see Figure 5) in the configuration of the seal member 250A. The other configurations are the same and redundant explanations will be omitted.

[0045] Figure 7 is a plan view of the first member 210 seen from above. However, in order to clearly show the positional relationship between the first member 210 and the sealing member 250A (first annular portion 251A, second annular portion 252A), the upper surface of the first member 210 is shown with diagonal hatching, the first annular portion 251A is shown with dot shading, and the second annular portion 252A is shown as a solid black area.

[0046] The sealing member (annular sealing member) 250A is a ring-shaped member. The sealing member 250A is formed from two different materials. The sealing member 250A has a first annular portion 251A made of the first material and a second annular portion 252A made of the second material. Here, the direction through which the opening formed by the annular sealing member 250A passes is defined as the axial direction. The top of one side in the axial direction (the upper side in Figure 6) becomes the second annular portion 252A, and the other part becomes the first annular portion 251A.

[0047] Furthermore, the first annular portion 251A is the portion that abuts against the bottom surface 215s and / or side surface of the groove 215 of the first member 210. The second annular portion 252A is the portion that abuts against the opposing surface 220s of the second member 220. As shown in Figure 6, the first annular portion 251A has an annular groove (recess) 251TA. The second annular portion 252A is positioned within the annular groove 251TA. This constitutes a sealing member 250A having the first annular portion 251A and the second annular portion 252A.

[0048] The second material constituting the second annular portion 252A is made of a material that is less prone to adhesion than the first material constituting the first annular portion 251A. Furthermore, the first material constituting the first annular portion 251A may be made of a material that is more easily held in the groove 215 (for example, a material with high adhesive strength) than the second material constituting the second annular portion 252A.

[0049] Specifically, the first material is composed of, for example, fluororubber or silicone rubber. More specifically, the first material can be any of the following rubber materials: vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), fluorosilicone rubber (FVMQ), etc.

[0050] Furthermore, the second material is composed of a material to which a filler has been added, for example, fluororubber or silicone rubber. Specifically, the fluororubber or silicone rubber used in the second material is composed of one of the following rubber materials, for example, vinylidene fluoride fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), or fluorosilicone rubber (FVMQ). Furthermore, the filler added to the second material is Al ２ O ３ , TiO ２ Si, SiO ２ Any of the following can be used: C, etc. The fluororubber or silicone rubber used in the first material and the fluororubber or silicone rubber used in the second material may be the same fluororubber or silicone rubber, or they may be different fluororubber or silicone rubber. In other words, the first material and the second material may be the same rubber material (fluororubber, silicone rubber). Alternatively, the first material and the second material may be different rubber materials (fluororubber, silicone rubber).

[0051] Furthermore, the first annular portion 251A and the second annular portion 252A have different colors. That is, the first annular portion 251A has a first color, and the second annular portion 252A has a second color different from the first color. Specifically, the color of the second material may differ from the color of the first material by adding a filler. Also, even if the first material and the second material have the same color, the first annular portion 251 and the second annular portion 252 may have different colors by adding a coloring agent to either the first or second material. Alternatively, a configuration in which different coloring agents are added to the first material and the second material may be used. Furthermore, it is preferable that the color of the first annular portion 251A and the color of the second annular portion 252A are complementary colors to each other.

[0052] As a result, when fitting the sealing member 250A into the groove 215, the worker can easily distinguish between the first annular portion 251A and the second annular portion 252A. Therefore, the worker can fit the sealing member 250A into the groove 215 such that the first annular portion 251A is on the back side of the groove 215 and the second annular portion 252A is on the entrance side of the groove 215.

[0053] Furthermore, the width of the second annular portion 252A is formed to be narrower than the opening width of the groove portion 215. As a result, as shown in Figure 7, when the sealing member 250A is fitted into the groove portion 215, the boundary between the first annular portion 251A and the second annular portion 252A is visible. In other words, it is positioned so that the width (thickness) of the second annular portion 252A can be seen.

[0054] Here, when fitting the sealing member 250A into the groove 215, the sealing member 250A is elastically deformed to fit into the groove 215. As a result, the sealing member 250A may have a compressed portion 301 that is compressed in the circumferential direction, a stretched portion 302 that is stretched in the circumferential direction, and a twisted portion 303 that is arranged in a twisted manner. When such compressed portion 301, stretched portion 302, twisted portion 303, etc. are formed, the sealing performance may be reduced.

[0055] In contrast, in the sealing member 250A, the width (thickness) of the second annular portion 252A increases in the compression portion 301. Also, in the sealing member 250A, the width (thickness) of the second annular portion 252A decreases in the tension portion 302. Furthermore, in the sealing member 250A, the position of the second annular portion 252A shifts towards the inner circumference (or outer circumference) of the sealing member 250A in the twisted portion 303.

[0056] In this way, with the sealing member 250A, it is possible to determine whether the sealing member 250A is properly positioned in the groove 215 by checking the state of the second annular portion 252A. In other words, the worker can ensure integrity by checking the groove 215 and fitting the sealing member 250A into the groove 215. Therefore, the sealing performance of the sealing member 250A can be improved.

[0057] Furthermore, it is possible to prevent or suppress the sealing member 250A (second annular portion 252A) from becoming fixed to the second member 220. This prevents or suppresses the sealing member 250A from falling out of the groove 215 when the second member 220 is separated from the first member 210. As a result, even when the second member 220 is brought into contact with the first member 210 again, the sealing performance of the sealing member 250A can be ensured. Therefore, the sealing performance of the sealing member 250A can be improved.

[0058] Furthermore, when the sealing member 250A is fitted into the groove 215 of the first member 210, the sealing member 250A may be held in the groove 215. For example, by fitting the sealing member 250A into the groove 215 of the dovetail groove structure, the side wall of the groove 215 and the sealing member 250A come into contact, and the sealing member 250A is held in the groove 215. Alternatively, when the sealing member 250A is held in the groove 215 of the first member 210, the first annular portion 251A of the sealing member 250A may exert a holding force on the first member 210. For example, the first annular portion 251A of the sealing member 250A may exert a holding force (for example, an adhesive force) on the bottom surface 215s of the groove 215. This improves the holding force of the groove 215 in holding the sealing member 250A, further preventing the sealing member 250A from falling out of the groove 215.

[0059] [Structure of the seal portion of the third embodiment] Next, the structure of the seal portion 200 of the third embodiment will be described with reference to Figure 8. Figure 8 is an example of a cross-sectional view of the seal member 250B. Here, the seal portion 200 of the third embodiment differs from the seal portion 200 of the first embodiment (see Figure 5) in the configuration of the seal member 250B. The other configurations are the same and redundant explanations will be omitted.

[0060] The sealing member (annular sealing member) 250B is a ring-shaped member. The sealing member 250B is formed from two different materials. The sealing member 250B has a first annular portion 251B made of the first material and a second annular portion 252B made of the second material. Here, the direction through which the opening formed by the annular sealing member 250B passes is defined as the axial direction. A part of one side in the axial direction (the upper side in Figure 6) becomes the second annular portion 252B, and the other part becomes the first annular portion 251B.

[0061] Further, the first annular portion 251B is a portion that abuts against the bottom surface 215s and / or the side surface of the groove portion 215 of the first member 210. The second annular portion 252B may not abut against the opposing surface 220s of the second member 220. As shown in FIG. 8, the first annular portion 251B has an annular groove (recess) 251TB. The second annular portion <00003>252B is disposed within the annular groove 25<0<00003>TB>. Thereby, the seal member 250B having the first annular portion 25<0<000(3>1B and the second annular portion 252B is configured.

[0062] The second material that constitutes the second annular portion 252B is made of a material in which sticking is less likely to occur than the first material that constitutes the first annular portion 251B. Further, the first material that constitutes the first annular portion 251B may be made of a material (for example, a material having a high adhesive force) that is more likely to be held in the groove portion 215 than the second material that constitutes the second annular portion 252B.

[0063] Specifically, the first material is made of, for example, fluororubber or silicone rubber.<0 Further, specifically, the first material may use any rubber material such as vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), fluorosilicone rubber (FVMQ), etc.

[0064] Further, the second material is made of a material in which a filler is added to, for example, fluororubber or silicone rubber. Specifically, the fluororubber or silicone rubber used for the second material is made of any rubber material such as vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), fluorosilicone rubber (FVMQ), etc. Further, the filler added to the second material is Al ２ O ３ 、TiO ２ 、Si、SiO ２ It should be noted that there seems to be some incomplete or incorrect formatting in the original text (such as "<(00003>" which might be an error). This translation attempts to make sense of the text as best as possible based on the available content.Any of the following can be used: C, etc. The fluororubber or silicone rubber used in the first material and the fluororubber or silicone rubber used in the second material may be the same fluororubber or silicone rubber, or they may be different fluororubber or silicone rubber. In other words, the first material and the second material may be the same rubber material (fluororubber, silicone rubber). Alternatively, the first material and the second material may be different rubber materials (fluororubber, silicone rubber).

[0065] Furthermore, the first annular portion 251B and the second annular portion 252B have different colors. That is, the first annular portion 251B has a first color, and the second annular portion 252B has a second color different from the first color. Specifically, the color of the second material may differ from the color of the first material by adding a filler. Also, even if the first material and the second material have the same color, the first annular portion 251 and the second annular portion 252 may have different colors by adding a coloring agent to either the first or second material. Alternatively, a configuration in which different coloring agents are added to the first material and the second material may be used. Furthermore, it is preferable that the color of the first annular portion 251B and the color of the second annular portion 252B are complementary colors to each other.

[0066] As a result, when fitting the sealing member 250B into the groove 215, the worker can easily distinguish between the first annular portion 251B and the second annular portion 252B. Therefore, the worker can fit the sealing member 250B into the groove 215 such that the first annular portion 251B is on the back side of the groove 215 and the second annular portion 252B is on the entrance side of the groove 215.

[0067] Furthermore, the width of the second annular portion 252B is formed to be narrower than the opening width of the groove portion 215. Also, when the sealing member 250B is fitted into the groove portion 215, it is positioned so that the boundary between the first annular portion 251B and the second annular portion 252B is visible. In other words, it is positioned so that the width (thickness) of the second annular portion 252B can be seen.

[0068] Here, when fitting the sealing member 250B into the groove 215, the sealing member 250B is elastically deformed to fit into the groove 215. As a result, the sealing member 250B may have a compressed portion 301 that is compressed in the circumferential direction, a stretched portion 302 that is stretched in the circumferential direction, and a twisted portion 303 that is arranged in a twisted manner. When such a compressed portion 301, stretched portion 302, twisted portion 303, etc. are formed, the sealing performance may be reduced.

[0069] In contrast, in the sealing member 250B, the width (thickness) of the second annular portion 252B increases in the compression portion 301. Also, in the sealing member 250B, the width (thickness) of the second annular portion 252B decreases in the tension portion 302. Furthermore, in the sealing member 250B, the position of the second annular portion 252B shifts toward the inner circumference (or outer circumference) of the sealing member 250B in the twisted portion 303.

[0070] In this way, with the sealing member 250B, it is possible to determine whether the sealing member 250B is properly positioned in the groove 215 by checking the state of the second annular portion 252B. In other words, the worker can ensure integrity by checking the groove 215 and fitting the sealing member 250B into the groove 215. Therefore, the sealing performance of the sealing member 250B can be improved.

[0071] Furthermore, when the sealing member 250B is fitted into the groove 215 of the first member 210, the sealing member 250B may be held in the groove 215. For example, by fitting the sealing member 250B into the groove 215 of the dovetail groove structure, the side wall of the groove 215 and the sealing member 250B come into contact, and the sealing member 250B is held in the groove 215. Alternatively, when the sealing member 250B is held in the groove 215 of the first member 210, the first annular portion 251B of the sealing member 250B may exert a holding force on the first member 210. For example, the first annular portion 251B of the sealing member 250B may exert a holding force (for example, an adhesive force) on the bottom surface 215s of the groove 215. This improves the holding force of the groove 215 in holding the sealing member 250B, preventing or suppressing the sealing member 250B from falling out of the groove 215 when the second member 220 is separated from the first member 210. As a result, even when the second member 220 is brought into contact with the first member 210 again, the sealing performance of the sealing member 250B can be ensured. Therefore, the sealing performance of the sealing member 250B can be improved.

[0072] In the sealing member 250B shown in Figure 8, the second annular portion 252B is shown as being formed at an angle toward the inner circumference (at a position shifted counterclockwise from the top in Figure 8), but this is not the only option. The sealing member 250B may also be formed with the second annular portion 252B at an angle toward the outer circumference (at a position shifted clockwise from the top in Figure 8). Furthermore, if the groove 215 is a rectangular groove (with the side surface of the groove 215 being a vertical surface), the sealing member 250B may be formed, for example, with the second annular portion 252B formed laterally on either the inner or outer circumference.

[0073] [Structure of the seal portion of the fourth embodiment] Next, the structure of the seal portion 200 of the fourth embodiment will be described using Figures 9 to 12. Figure 9 is an example of a partial cutaway perspective view in which a part of the seal member 250C has been cut. Here, the seal portion 200 of the fourth embodiment differs from the seal portion 200 of the first embodiment (see Figures 3 and 5) in the configuration of the seal member 250C. The other configurations are the same and redundant explanations will be omitted.

[0074] The sealing member 250C before being attached to the groove 215 will be described with reference to Figure 9. As shown in Figure 9, the sealing member (annular sealing member) 250C is an annular-shaped member. The sealing member 250C has an annular body 251C and a friction-reducing film 252C. In the example in Figure 9, the friction-reducing film 252C is arranged on the entire surface of the annular body 251C.

[0075] The annular body 251C is formed in an annular shape (torus shape). The material of the annular body 251C is, for example, fluororubber or silicone rubber. Specifically, the material of the annular body 251C can be any rubber material such as vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), or fluorosilicone rubber (FVMQ). Alternatively, the material of the annular body 251C may be, for example, a material in which a filler has been added to fluororubber or silicone rubber. The filler added to the annular body 251C is Al ２ O ３ , TiO ２ Si, SiO ２ You may use C or any other of the above.

[0076] The friction-reducing film 252C is preferably a film with a lower coefficient of friction (static and dynamic friction coefficients) with respect to the wall surface of the groove portion 215 than the annular body 251C. Furthermore, the friction-reducing film 252C is preferably a film that can be consumed by radicals generated by the plasma treatment (S104) described later and removed from the surface of the annular body 251C. Furthermore, the friction-reducing film 252C is preferably a film that can follow the elastic deformation of the annular body 251C. In addition, the friction-reducing film 252C may be a film formed by coating or the like.

[0077] The friction-reducing film 252C may be composed of, for example, a fluororesin (e.g., polytetrafluoroethylene (PTFE)). Alternatively, the friction-reducing film 252C may be composed of, for example, a glass-based coating (e.g., SiO ２The material may also contain fine particles of fluororesin (for example, polytetrafluoroethylene (PTFE), etc.). As a result, the friction-reducing film 252C has low friction properties, can follow the deformation of the annular body 251C, and can be removed by radicals.

[0078] Specifically, as the friction-reducing film 252C, for example, Rita Surf (manufactured by Rita Fine Co., Ltd.) can be used.

[0079] In the example shown in Figure 9, the annular body 251C is depicted as being made of a single material, but it is not limited to this. For example, as shown in Figures 4, 6, and 8, the annular body 251C may be composed of a first annular portion (251, 251A, 251B) and a second annular portion (252, 252A, 252B) made of different materials.

[0080] Figure 10 is an example of a flowchart showing the process of attaching the sealing member 250C.

[0081] In step S101, the annular body 251C is prepared. Here, the worker prepares the annular body 251C before the friction-reducing film 252C is formed.

[0082] In step S102, a friction-reducing film 252C is formed on the surface of the annular body 251C. Here, the worker applies, for example, a solution obtained by mixing a hardening agent with the main agent to the surface of the annular body 251C. The solution is then cured to form a friction-reducing film 252C on the surface of the annular body 251C. As a result, a sealing member 250C with a friction-reducing film 252C formed on the surface of the annular body 251C is prepared, as shown in Figure 9.

[0083] In step S103, the sealing member 250C is attached to the groove 215. Here, the worker attaches the sealing member 250C to the groove 215.

[0084] Figure 11 is an example of a cross-sectional view showing the structure of the seal portion 200 after the seal member 250C has been attached to the groove portion 215.

[0085] When the sealing member 250C is attached to the groove 215, the sealing member 250C may have a compressed portion (see compressed portion 301 in Figure 7), a stretched portion (see stretched portion 302 in Figure 7), and a twisted portion (see twisted portion 303 in Figure 7) formed on it in the circumferential direction. However, by having a friction-reducing film 252C on the surface of the annular body 251C, the sealing member 250C moves within the groove 215 due to the restoring force of the elastically deformed annular body 251C, suppressing the formation of the compressed portion, stretched portion, twisted portion, etc. Therefore, it is possible to prevent a decrease in the sealing performance of the sealing member 250C caused by the formation of the compressed portion, stretched portion, twisted portion, etc. In addition, it is possible to improve the workability when an operator attaches the sealing member 250C to the groove 215.

[0086] In step S104, the friction-reducing film 252C is removed by plasma treatment. Here, the operator attaches the first member 210, to which the sealing member 250C is attached in the groove 215, to the plasma treatment apparatus 1. The control unit 2 then controls the plasma generation unit 12, the gas supply unit 20, etc. to generate plasma of the treatment gas in the plasma treatment space 10s of the plasma treatment apparatus 1 and supply radicals to the sealing member 250C.

[0087] Figure 12 is an example of a cross-sectional view showing the structure of the seal portion 200 after plasma treatment.

[0088] As shown in Figure 12, the friction-reducing film 252C formed on the surface of the annular body 251C is removed. As a result, the annular body 251C comes into direct contact with the wall surface of the groove 215. Also, when the opening 211 of the first member 210 is closed with the valve member (second member 220), the annular body 251C comes into direct contact with the wall surface (opposing surface 220s) of the valve member (second member 220). This prevents a decrease in sealing performance. Furthermore, since the frictional force between the annular body 251C and the wall surface of the groove 215 can be increased, it is possible to suppress the sealing member from detaching from the groove 215.

[0089] Furthermore, if a twisted portion or the like is formed on the sealing member installed in the groove 215, there is a risk that the sealing member may detach from the groove 215. In contrast, the sealing member 250C can prevent the sealing member 250C from detaching from the groove 215 by suppressing the formation of a twisted portion or the like.

[0090] [Structure of the seal portion of the fifth embodiment] Next, the structure of the seal portion 200 of the fifth embodiment will be described using Figure 13. Figure 13 is an example of a cross-sectional view of the seal member 250D. Here, the seal portion 200 of the fifth embodiment differs from the seal portion 200 of the first embodiment (see Figures 3 and 5) in the configuration of the seal member 250D. The other configurations are the same and redundant explanations will be omitted.

[0091] The sealing member (annular sealing member) 250D before being attached to the groove 215 has an annular body 251D and a friction-reducing film 252D. Here, the friction-reducing film 252D is formed on at least a portion of the entire surface of the annular body 251D. In the example of Figure 13, the friction-reducing film 252D is formed on the inner and outer circumferences of the annular body 251D. In other words, when the sealing member 250D is attached to the groove 215, the friction-reducing film 252D is positioned to contact the side surface of the groove 215.

[0092] The annular body 251D is formed in an annular shape (torus shape), similar to the annular body 251C. The material of the annular body 251D is, for example, fluororubber or silicone rubber. Specifically, the material of the annular body 251D can be any rubber material such as vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), or fluorosilicone rubber (FVMQ). Alternatively, the material of the annular body 251D may be, for example, a material in which a filler has been added to fluororubber or silicone rubber. The filler added to the annular body 251D is Al ２ O ３ , TiO ２ Si, SiO ２ You may use C or any other of the above.

[0093] The friction-reducing film 252D is preferably a film with a lower coefficient of friction (static and dynamic friction coefficients) with respect to the wall surface of the groove 215 than the annular body 251D, similar to the friction-reducing film 252C. Furthermore, the friction-reducing film 252D is preferably a film that can be consumed by radicals generated by the plasma treatment (S104) described later and removed from the surface of the annular body 251D. Furthermore, the friction-reducing film 252D is preferably a film that can follow the elastic deformation of the annular body 251D. In addition, the friction-reducing film 252D may be a film formed by coating or the like.

[0094] The friction-reducing film 252D may be composed of, for example, a fluororesin (e.g., polytetrafluoroethylene (PTFE)) similar to the friction-reducing film 252C. Alternatively, the friction-reducing film 252D may be composed of, for example, a glass-based coating (e.g., SiO2) containing fine particles of fluororesin (e.g., polytetrafluoroethylene (PTFE)). As a result, the friction-reducing film 252D has low friction properties, can follow the deformation of the annular body 251D, and can be removed by radicals. Specifically, as the friction-reducing film 252D, for example, Rita Surf (manufactured by Rita Fine Co., Ltd.) can be used.

[0095] In the example shown in Figure 13, the annular body 251D is depicted as being made of a single material, but it is not limited to this. For example, as shown in Figures 4, 6, and 8, the annular body 251D may be composed of a first annular portion (251, 251A, 251B) and a second annular portion (252, 252A, 252B) made of different materials.

[0096] The process for attaching the sealing member 250D is the same as the process for attaching the sealing member 250C (see Figures 10 to 12), except that the location where the solution for forming the friction-reducing film 252C is applied is different, so redundant explanations will be omitted.

[0097] The sealing member 250D has a friction-reducing film 252D on the surface of the annular body 251D, which prevents a decrease in the sealing performance of the sealing member 250D caused by the formation of compression, tension, twisting, etc. Furthermore, it improves the workability when an operator attaches the sealing member 250D to the groove 215. In addition, when the opening 211 of the first member 210 is closed with the valve body member (second member 220), the annular body 251D comes into direct contact with the wall surface (opposing surface 220s) of the valve body member (second member 220). This prevents a decrease in sealing performance. Furthermore, since the frictional force between the annular body 251D and the wall surface of the groove 215 can be increased, it is possible to suppress the sealing member from detaching from the groove 215.

[0098] Furthermore, if a twisted portion or the like is formed on the sealing member installed in the groove 215, there is a risk that the sealing member may detach from the groove 215. In contrast, the sealing member 250D can prevent the sealing member 250D from detaching from the groove 215 by suppressing the formation of a twisted portion or the like.

[0099] While embodiments of the plasma processing system have been described above, this disclosure is not limited to the embodiments described above, and various modifications and improvements are possible within the scope of the gist of this disclosure as described in the claims.

[0100] The embodiments disclosed above include, for example, the following: (Note 1) An annular sealing member having a first annular portion made of a first material and a second annular portion made of a second material different from the first material. (Note 2) The annular sealing member according to Note 1, wherein the second material is made of a material that is less prone to adhesion than the first material. (Note 3) The annular sealing member according to Note 1 or Note 2, wherein the first material is fluororubber or silicone rubber, and the second material is fluororubber or silicone rubber and a filler. (Note 4) The first material comprises any of the following rubber materials: vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), or fluorosilicone rubber (FVMQ). The second material comprises any of the following rubber materials: vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), or fluorosilicone rubber (FVMQ), and a filler. The filler is Al ２ O ３ , TiO ２ Si, SiO ２An annular sealing member according to any one of the appendices 1 to 3, wherein the first material and the second material are the same rubber material, according to appendice 4. (Appendix 6) An annular sealing member according to appendice 4, wherein the first material and the second material are different rubber materials, according to appendice 7. An annular sealing member according to any one of the appendices 1 to 6, wherein the first annular portion has a first color, and the second annular portion has a second color different from the first color, according to appendice 8. An annular sealing member according to any one of the appendices 1 to 7, wherein the first annular portion has a first annular surface, and the second annular portion has a second annular surface that joins with the first annular surface, according to appendice 9. An annular sealing member according to any one of the appendices 1 to 7, wherein the first annular portion has an annular groove, and the second annular portion is disposed within the annular groove. (Note 10) An annular sealing member according to any one of Notes 1 to 9, having a friction-reducing film disposed on the surface of the annular sealing member, wherein the friction-reducing film is removable by plasma. (Note 11) An annular sealing member having an annular body and a friction-reducing film disposed on the surface of the annular body, wherein the friction-reducing film is removable by plasma. (Note 12) The friction-reducing film is SiO ２An annular sealing member according to Appendix 11, comprising a fluororesin and a friction-reducing film covering the entire surface of the annular body, according to Appendix 11 or Appendix 12. (Appendix 14) An annular sealing member according to Appendix 11 or Appendix 12, wherein the friction-reducing film covers at least a portion of the surface of the annular body, according to Appendix 11 or Appendix 12. (Appendix 15) A substrate processing apparatus comprising: a first member having a first surface having an annular groove; a second member having a second surface facing the first surface; and an annular sealing member disposed between the first member and the second member, wherein the annular sealing member is made of a first material and has a first annular portion in contact with the annular groove; and a second annular portion made of a second material different from the first material and has contact with the second surface. (Appendix 16) A substrate processing apparatus according to Appendix 15, wherein the second material is made of a material that is less prone to adhesion than the first material. (Note 17) The substrate processing apparatus according to Note 15 or Note 16, wherein the first annular portion has a first color, and the second annular portion has a second color different from the first color. (Note 18) The substrate processing apparatus according to any one of Notes 15 to 17, wherein the first annular portion has a first annular surface, and the second annular portion has a second annular surface that joins with the first annular surface. (Note 19) The substrate processing apparatus according to any one of Notes 15 to 17, wherein the first annular portion has an additional annular groove, and the second annular portion is disposed within the additional annular groove. (Note 20) The substrate processing apparatus according to any one of Notes 15 to 19, wherein the friction-reducing film is disposed on the surface of the annular sealing member, and the friction-reducing film is removable by plasma.

[0101] Furthermore, this application claims priority based on Japanese Patent Application No. 2025-016397, filed on 3 February 2025, and the entire contents of these Japanese Patent Applications are incorporated herein by reference.

[0102] 1 Plasma processing apparatus 40 Exhaust system 200 Seal section 210 First member 210s Opposing surface (first surface) 211 Opening 215 Groove section (annular groove) 215s Bottom surface 220 Second member 220s Opposing surface (second surface) 250, 250A, 250B, 250C, 250D Seal member (annular seal member) 251, 251A, 251B First annular section 252, 252A, 252B Second annular section 251C, 251D Annular body 252C, 252D Friction reduction film 251S First annular surface 252S Second annular surface 251TA, 251TB Annular groove 301 Compression section 302 Tension section 303 Twisted section

Claims

1. An annular sealing member having a first annular portion made of a first material and a second annular portion made of a second material different from the first material.

2. The annular sealing member according to claim 1, wherein the second material is made of a material that is less prone to adhesion than the first material.

3. The annular sealing member according to claim 1, wherein the first material comprises fluororubber or silicone rubber, and the second material comprises fluororubber or silicone rubber and a filler.

4. The first material comprises any of the following rubber materials: vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), or fluorosilicone rubber (FVMQ); the second material comprises any of the following rubber materials: vinylidene fluoride-based fluororubber (FKM), perfluoroelastomer (FFKM), vinyl methyl silicone rubber (VMQ), or fluorosilicone rubber (FVMQ), and a filler; the filler is Al ２ O ３ , TiO ２ Si, SiO ２ The annular sealing member according to claim 1, which is either C or 5. The annular sealing member according to claim 4, wherein the first material and the second material are the same rubber material.

6. The annular sealing member according to claim 4, wherein the first material and the second material are different rubber materials.

7. The annular sealing member according to claim 1, wherein the first annular portion has a first color, and the second annular portion has a second color different from the first color.

8. The annular sealing member according to claim 1, wherein the first annular portion has a first annular surface, and the second annular portion has a second annular surface that joins with the first annular surface.

9. The annular sealing member according to claim 1, wherein the first annular portion has an annular groove, and the second annular portion is disposed within the annular groove.

10. The annular sealing member according to claim 1, wherein it has a friction-reducing film disposed on the surface of the annular sealing member, and the friction-reducing film is removable by plasma.

11. An annular sealing member comprising an annular body and a friction-reducing film disposed on the surface of the annular body, wherein the friction-reducing film is removable by plasma.

12. The friction-reducing film is made of SiO ２ The annular sealing member according to claim 11, further comprising a fluororesin.

13. The annular sealing member according to claim 11, wherein the friction-reducing film covers the entire surface of the annular body.

14. The annular sealing member according to claim 11, wherein the friction-reducing film covers at least a portion of the surface of the annular body.

15. A substrate processing apparatus comprising: a first member having a first surface having an annular groove; a second member having a second surface facing the first surface; and an annular sealing member disposed between the first member and the second member, wherein the annular sealing member has a first annular portion made of a first material and in contact with the annular groove; and a second annular portion made of a second material different from the first material and in contact with the second surface.

16. The substrate processing apparatus according to claim 15, wherein the second material is made of a material that is less prone to adhesion than the first material.

17. The substrate processing apparatus according to claim 15, wherein the first annular portion has a first color, and the second annular portion has a second color different from the first color.

18. The substrate processing apparatus according to claim 15, wherein the first annular portion has a first annular surface, and the second annular portion has a second annular surface that is joined to the first annular surface.

19. The substrate processing apparatus according to claim 15, wherein the first annular portion has an additional annular groove, and the second annular portion is disposed within the additional annular groove.

20. The substrate processing apparatus according to claim 15, further comprising a friction-reducing film disposed on the surface of the annular sealing member, wherein the friction-reducing film is removable by plasma.

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