Display substrate, preparation method therefor, and display apparatus

Abstract

Provided are a display substrate, comprising a display region and a peripheral region located at the periphery of the display region. The display substrate comprises: a base substrate; a driving circuit layer, located on the base substrate; a first electrode layer, located on the side of the driving circuit layer away from the base substrate, the first electrode layer comprising a plurality of first electrodes arranged at intervals, and the plurality of first electrodes being spaced apart along a first direction and a second direction; and a pixel defining layer, located on the side of the first electrode layer away from the base substrate, the pixel defining layer comprising a plurality of openings, and each opening exposing at least a portion of one of the first electrodes. The display substrate further comprises a blocking structure located on the side of the pixel defining layer away from the base substrate. The blocking structure is located in the peripheral region. The blocking structure extends along an edge of the display region and partially surrounds the display region.

Description

Display substrate, its preparation method, and display device Technical Field

[0001] This disclosure relates to the field of display technology, and in particular to a display substrate, a method for preparing the substrate, and a display device. Background Technology

[0002] Quantum dot display technology, especially quantum dot light-emitting diode (QLED) display technology, is an emerging display technology that utilizes the unique optical properties of quantum dots to enhance image quality. With continuous technological advancements, quantum dot display technology is expected to achieve wider applications in the future, such as wearable devices, virtual reality (VR), and augmented reality (AR). How to better manufacture QLED display products and ensure their display performance is one of the important research topics for researchers.

[0003] The information disclosed in this section is only for understanding the background of the inventive concept of this disclosure, and therefore may include information that does not constitute prior art. Summary of the Invention

[0004] In one aspect, a display substrate is provided, comprising a display area and a peripheral area surrounding the display area, wherein the display substrate includes:

[0005] Substrate;

[0006] The driving circuit layer is located on the substrate.

[0007] A first electrode layer is located on the side of the driving circuit layer away from the substrate. The first electrode layer includes a plurality of first electrodes spaced apart, which are arranged at intervals along a first direction and a second direction.

[0008] A pixel defining layer is located on the side of the first electrode layer away from the substrate. The pixel defining layer includes a plurality of openings, each of which exposes at least a portion of one of the first electrodes.

[0009] The display substrate further includes a barrier structure located on the side of the pixel defining layer away from the substrate, the barrier structure being located in the peripheral region; and

[0010] The blocking structure extends along the edge of the display area and partially surrounds the display area.

[0011] According to some exemplary embodiments, the blocking structure extends along a first direction and is located on one side of the plurality of openings along the second direction.

[0012] According to some exemplary embodiments, the display substrate includes two blocking structures, which are respectively located on both sides of the plurality of openings along the second direction, and the two blocking structures are spaced apart.

[0013] According to some exemplary embodiments, the display substrate further includes multiple light-emitting functional layers; and

[0014] At least one of the light-emitting functional layers includes a first sub-layer and a second sub-layer, the first sub-layer and the second sub-layer are made of the same material, at least a portion of the first sub-layer is located in the display area, the second sub-layer is located on the side of the pixel defining layer away from the substrate, and the second sub-layer is located on the side of the blocking structure away from the display area and is in contact with the blocking structure.

[0015] According to some exemplary embodiments, the substrate includes a first surface facing the driving circuit layer, and the thickness of the second sublayer is greater than the thickness of the first sublayer along a direction perpendicular to the first surface.

[0016] According to some exemplary embodiments, the blocking structure and the pixel defining layer are connected as an integral structure.

[0017] According to some exemplary embodiments, the blocking structure includes a first retaining wall that extends continuously along the first direction.

[0018] According to some exemplary embodiments, the blocking structure further includes a second barrier wall located on the side of the first barrier wall away from the display area and spaced apart from the first barrier wall, and the second barrier wall extends continuously along the first direction.

[0019] According to some exemplary embodiments, the substrate includes a first surface facing the driving circuit layer, and along a direction perpendicular to the first surface, the heights of the first barrier and the second barrier are different, or the heights of the first barrier and the second barrier are the same.

[0020] According to some exemplary embodiments, the height of the first retaining wall is greater than the height of the second retaining wall.

[0021] According to some exemplary embodiments, the first barrier includes a first sub-part and a second sub-part located on the side of the first sub-part away from the substrate, wherein the orthographic projection of the second sub-part on the substrate falls within the orthographic projection of the first sub-part on the substrate.

[0022] According to some exemplary embodiments, the display substrate further includes a planarization layer located between the driving circuit layer and the first electrode layer, the planarization layer including vias through which the first electrode layer is electrically connected to the driving circuit layer; and

[0023] The planarization layer has a protrusion on its surface facing the first electrode layer, and the orthographic projection of the second barrier on the substrate at least partially overlaps with the orthographic projection of the protrusion on the substrate.

[0024] According to some exemplary embodiments, the blocking structure further includes a plurality of first isolation columns located on the side of the first barrier away from the display area, the plurality of first isolation columns being spaced apart along the first direction;

[0025] The first retaining wall has multiple first recesses on its side facing the multiple first isolation columns, and the first recesses are recessed towards the display area; and

[0026] The plurality of first isolation pillars are located on the side of the plurality of first recesses away from the display area.

[0027] According to some exemplary embodiments, the barrier structure further includes a plurality of second isolation posts, the plurality of second isolation posts being located on the side of the plurality of first isolation posts away from the first retaining wall; and

[0028] Multiple second isolation columns and multiple first isolation columns are arranged alternately along the first direction.

[0029] According to some exemplary embodiments, the orthographic projection of the first isolation pillar on the substrate is circular, and the orthographic projection of the first recess on the substrate is arc-shaped.

[0030] According to some exemplary embodiments, in the first isolation pillar and the first recess that are adjacent along the second direction, the line connecting the geometric center of the orthographic projection of the first isolation pillar on the substrate and the center of the circle in which the orthographic projection of the first recess on the substrate is located is substantially perpendicular to the first direction.

[0031] According to some exemplary embodiments, the substrate includes a first surface facing the driving circuit layer, and the first barrier and the first isolation pillar have equal heights along a direction perpendicular to the first surface.

[0032] According to some exemplary embodiments, the blocking structure further includes a second barrier wall, which is located on the side of the first barrier wall away from the display area and is connected to the first barrier wall as an integral structure;

[0033] The first barrier includes a first barrier body and a partition portion located on the side of the first barrier body away from the substrate. The partition portion includes a partition surface away from the display area. The orthographic projection of one end of the partition surface away from the substrate onto the substrate is located on the side of the partition surface near the substrate away from the display area.

[0034] The second barrier includes a second recess, which is recessed toward the substrate.

[0035] According to some exemplary embodiments, the barrier surface intersects the surface of the first barrier body away from the substrate at an acute angle.

[0036] According to some exemplary embodiments, the second retaining wall includes a plurality of second recesses, the plurality of second recesses being arranged in at least two rows distributed along a second direction; and

[0037] A row of second recesses includes a plurality of second recesses spaced apart along the first direction.

[0038] According to some exemplary embodiments, in two adjacent rows of second recesses, a plurality of second recesses in one row are respectively located on the side of a plurality of second recesses in the other row away from the first retaining wall; or,

[0039] In two adjacent rows of second recesses, a plurality of second recesses in one row and a plurality of second recesses in the other row are arranged alternately along the first direction.

[0040] According to some exemplary embodiments, a hydrophobic layer is provided on the surface of the second barrier away from the substrate, and / or a hydrophilic layer is provided on the surface of the second barrier located within the second recess.

[0041] According to some exemplary embodiments, the surface of the second barrier away from the substrate is parallel to the surface of the substrate facing the driving circuit layer.

[0042] According to some exemplary embodiments, the substrate includes a first surface facing the driving circuit layer, and the distance between the second barrier surface away from the substrate and the first surface gradually decreases in a direction perpendicular to the first surface along a direction away from the display area.

[0043] According to some exemplary embodiments, the second retaining wall includes a plurality of stepped portions, the plurality of stepped portions being sequentially connected along the second direction; and

[0044] The substrate includes a first surface facing the driving circuit layer, and the height of the stepped portion away from the first barrier wall along a direction perpendicular to the first surface is less than the height of the stepped portion close to the first barrier wall.

[0045] According to some exemplary embodiments, the stepped portion includes a surface away from the substrate comprising a stepped plane and a stepped ramp connected along the second direction, the stepped plane being parallel to the first surface, and the virtual extension surface of the stepped ramp forming an acute angle with the first surface;

[0046] At least one of the second recesses is recessed at the plane of the step, and / or at least one of the second recesses is recessed at the slope of the step.

[0047] According to some exemplary embodiments, the substrate includes a first surface facing the driving circuit layer, and a plurality of second recesses have equal recess depths along a direction perpendicular to the first surface.

[0048] According to some exemplary embodiments, the substrate includes a first surface facing the driving circuit layer; and

[0049] In two adjacent second recesses along the second direction, the second recess near the first retaining wall has a greater depth perpendicular to the first surface than the second recess away from the first retaining wall.

[0050] According to some exemplary embodiments, the display substrate further includes a light-emitting layer located on the side of the pixel defining layer away from the substrate and a second electrode layer located on the side of the light-emitting layer away from the substrate, the light-emitting layer comprising quantum dots.

[0051] In another aspect, a method for fabricating an array substrate is provided, the display substrate including a display area and a peripheral area located around the display area, the fabrication method comprising:

[0052] A driving circuit layer is formed on the substrate.

[0053] A first electrode layer is formed on the side of the driving circuit layer away from the substrate. The first electrode layer includes a plurality of first electrodes spaced apart and arranged at intervals along a first direction and a second direction.

[0054] A pixel defining layer is formed on the side of the first electrode layer away from the substrate. The pixel defining layer includes a plurality of openings, each opening exposing a portion of a plurality of the first electrodes. The side of the pixel defining layer away from the substrate includes a blocking structure located in the peripheral region, extending along the edge of the display area and partially surrounding it.

[0055] A multilayer light-emitting functional layer is formed on the side of the pixel defining layer away from the substrate.

[0056] According to some exemplary embodiments, forming multiple light-emitting functional layers includes forming a first functional layer on the pixel defining layer, forming a light-emitting layer on the side of the first functional layer away from the substrate, and forming a second functional layer on the side of the light-emitting layer away from the substrate; and

[0057] The steps for forming at least one of the first functional layer, the light-emitting layer, and the second functional layer include: forming a wet film layer using photo-induced ink, and then curing the wet film layer using a photo-induced process.

[0058] The substrate includes a first surface facing the driving circuit layer, and the maximum height of the blocking structure perpendicular to the first surface is greater than or equal to a critical height Z0, where Z0 is represented by the following formula:

[0059] Wherein, γ represents the surface tension of the photoinduced ink, ρ represents the density of the photoinduced ink, and θ represents the contact angle of the photoinduced ink on the surface of the barrier structure.

[0060] In another aspect, a display device is provided, comprising a display substrate as described in any of the preceding claims. Attached Figure Description

[0061] The features and advantages of this disclosure will become more apparent from a detailed description of exemplary embodiments thereof with reference to the accompanying drawings.

[0062] Figure 1 schematically shows a plan view of a display substrate according to some embodiments of the present disclosure.

[0063] Figure 2 schematically shows an enlarged view of region A1 in Figure 1.

[0064] Figure 3 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 3 schematically shows a cross-sectional view taken along line BB' in Figure 2.

[0065] Figure 4 schematically shows a plan view of a display substrate according to some embodiments of the present disclosure.

[0066] Figure 5 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 5 schematically shows a cross-sectional view taken along line CC' in Figure 4.

[0067] Figure 6 schematically shows a cross-sectional view of a first barrier in a display substrate according to some embodiments of the present disclosure.

[0068] Figure 7 schematically shows another enlarged view of region A1 in Figure 1.

[0069] Figure 8 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 8 schematically shows a cross-sectional view taken along line DD' in Figure 7.

[0070] Figure 9 schematically shows another enlarged view of region A1 in Figure 1.

[0071] Figure 10 schematically shows another enlarged view of region A1 in Figure 1.

[0072] Figure 11 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 11 schematically shows a cross-sectional view taken along line EE' in Figure 10.

[0073] Figure 12 schematically shows another enlarged view of region A1 in Figure 1.

[0074] Figure 13 schematically shows an enlarged view of region A2 in Figure 11.

[0075] Figure 14 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 14 schematically shows a cross-sectional view taken along line EE' in Figure 10.

[0076] Figure 15 schematically shows another enlarged view of region A1 in Figure 1.

[0077] Figure 16 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 16 schematically shows a cross-sectional view taken along line FF' in Figure 15.

[0078] Figure 17 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 17 schematically shows a cross-sectional view taken along line EE' in Figure 10.

[0079] Figure 18 schematically illustrates a flowchart of a method for fabricating a display substrate according to some embodiments of the present disclosure.

[0080] Figures 19A-19D schematically illustrate the fabrication process of a display substrate fabrication method according to some embodiments of the present disclosure.

[0081] Figures 20A-20B schematically illustrate the blocking principle of a blocking structure in a display substrate according to some embodiments of the present disclosure. Detailed Implementation

[0082] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. All other embodiments obtained by those skilled in the art based on the described embodiments of this disclosure without creative effort are within the protection scope of this disclosure.

[0083] It should be noted that, for clarity and / or descriptive purposes, the dimensions and relative dimensions of components may be enlarged in the accompanying drawings. Therefore, the dimensions and relative dimensions of the individual components are not necessarily limited to those shown in the drawings. In the specification and accompanying drawings, the same or similar reference numerals indicate the same or similar parts.

[0084] When an element is described as being "on" another element, "connected to" another element, or "attached to" another element, the element may be directly on, directly connected to, or directly attached to the other element, or there may be intermediate elements. However, when an element is described as being "directly on" another element, "directly connected to" another element, or "directly attached to" another element, there are no intermediate elements. Other terms and / or expressions used to describe relationships between elements should be interpreted in a similar manner, such as "between" versus "directly between," "adjacent" versus "directly adjacent," or "on" versus "directly on," etc. Furthermore, the term "connection" can refer to a physical connection, an electrical connection, a communication connection, and / or a fluid connection. Moreover, the X-axis, Y-axis, and Z-axis are not limited to the three axes of a Cartesian coordinate system and can be interpreted in a broader sense. For example, the X-axis, Y-axis, and Z-axis may be perpendicular to each other, or may represent different directions that are not perpendicular to each other. For the purposes of this disclosure, “at least one of X, Y, and Z” and “at least one selected from the group consisting of X, Y, and Z” can be interpreted as only X, only Y, only Z, or any combination of two or more of X, Y, and Z such as XYZ, XY, YZ, and XZ. As used herein, the term “and / or” includes any and all combinations of one or more of the listed related items.

[0085] It should be noted that although the terms "first," "second," etc., may be used herein to describe various components, members, elements, regions, layers, and / or parts, these components, members, elements, regions, layers, and / or parts should not be limited by these terms. Rather, these terms are used to distinguish one component, member, element, region, layer, and / or part from another. Thus, for example, the first component, first member, first element, first region, first layer, and / or first part discussed below may be referred to as a second component, second member, second element, second region, second layer, and / or second part without departing from the teachings of this disclosure.

[0086] For ease of description, spatial relation terms, such as “above,” “below,” “left,” “right,” etc., may be used herein to describe the relationship between one element or feature and another element or feature as shown in the figure. It should be understood that spatial relation terms are intended to cover other orientations of the device in use or operation besides those described in the figure. For example, if the device in the figure were inverted, an element described as “below” or “under” other elements or features would be oriented “above” or “on top” other elements or features.

[0087] In this document, the terms “substantially,” “approximately,” “approximately,” “roughly,” and other similar terms are used as terms of approximation rather than as terms of degree, and they are intended to account for inherent deviations in measured or calculated values ​​that would be recognized by one of ordinary skill in the art. Taking into account factors such as process variations, measurement problems, and errors associated with the measurement of a particular quantity (i.e., limitations of the measurement system), “approximately” as used herein includes stated values ​​and indicates that a particular value is within an acceptable range of deviation for one of ordinary skill in the art. For example, “approximately” may mean within one or more standard deviations, or within ±30%, ±20%, ±10%, ±5% of the stated value.

[0088] It should be noted that in this paper, "same layer" refers to a layer structure formed by using the same film deposition process to form a film layer for a specific pattern, and then using the same mask to pattern that film layer in a single patterning process. Depending on the specific pattern, a single patterning process may include multiple exposure, development, or etching processes, and the specific pattern in the formed layer structure can be continuous or discontinuous. That is, multiple elements, components, structures, and / or portions located in the "same layer" are made of the same material and formed by the same single patterning process. Typically, multiple elements, components, structures, and / or portions located in the "same layer" have approximately the same thickness.

[0089] Those skilled in the art will understand that, unless otherwise stated herein, the terms “height” or “thickness” refer to the dimensions along the surface of each film layer disposed perpendicular to the display substrate, i.e., the dimensions along the light-emitting direction of the display substrate, or the dimensions along the normal direction of the display device.

[0090] In this document, the term "transistor" can refer to a bipolar junction transistor (BJT), a thin-film transistor (TFT), a field-effect transistor (FET), or other devices with similar characteristics. In the embodiments of this disclosure, to distinguish the two terminals of a transistor other than the control terminal, one terminal is referred to as the first terminal, and the other as the second terminal. In actual operation, when the transistor is a TFT or a FET, the first terminal can be the drain, and the second terminal can be the source; alternatively, the first terminal can be the source, and the second terminal can be the drain.

[0091] Quantum dots can alter the color of emitted light by selecting their constituent materials, size, and shape. This makes QLED display technology highly accurate in color display and provides more stable images. By precisely controlling the size and composition of quantum dots, a wider color gamut can be produced, resulting in more realistic and detailed images. Quantum dot materials have high luminous efficiency, enabling higher brightness output. Compared to traditional LCD technology, QLED display technology offers superior performance in brightness, color, and contrast, while also consuming less energy. Quantum dot display technology has begun to be used in electronic products such as televisions, mobile phones, and computer monitors.

[0092] Currently, QLED display substrates suffer from poor light emission uniformity and low luminous efficiency. Through research, the inventors discovered that a significant contributing factor to this problem is the uneven thickness of the relevant film layers within the light-emitting functional layer of the QLED device.

[0093] Extensive research by the inventors revealed that the key factor causing uneven film thickness lies in the macroscopic liquid film flow phenomenon during photoinduced film formation. Specifically, the light-emitting functional layer in QLEDs can be formed by first coating to create a liquid film, and then using a photoinduced process to induce the solvent in the liquid film to evaporate, resulting in a solid film layer. During the coating process (e.g., slot coating), residual liquid remains in the coating head. To ensure film uniformity within the display area, this residual liquid is coated onto the surrounding areas. However, during photoinduced formation, the energy generated by the light inducer propels the liquid film flow. The residual liquid in the surrounding areas forms a macroscopic liquid film flow along the direction of the photoinduced device's movement and flows into the display area, thus causing uneven thickness of the light-emitting functional layer within the display area.

[0094] Figure 1 schematically shows a plan view of a display substrate according to some embodiments of the present disclosure. Figure 2 schematically shows an enlarged view of region A1 in Figure 1. Figure 3 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 3 schematically shows a cross-sectional view taken along line BB' in Figure 2.

[0095] Referring to Figures 1, 2, and 3, the display panel includes a display area AA and a peripheral area NA surrounding the display area AA. The display panel includes a substrate 100, a driving circuit layer 200 on the substrate 100, and a light-emitting device layer 300 on the side of the driving circuit layer 200 away from the substrate 100. The driving circuit layer 200 includes multiple pixel driving circuits located in the display area AA. The light-emitting device layer 300 includes a first electrode layer 310 on the driving circuit layer 200, a multilayer light-emitting functional layer 320 on the side of the first electrode layer 310 away from the substrate 100, and a second electrode layer 330 on the side of the multilayer light-emitting functional layer 320 away from the substrate 100.

[0096] The multilayer light-emitting functional layer 320 is stacked along a direction away from the first electrode layer 310. Along this direction, the multilayer light-emitting functional layer 320 may include at least one first functional layer, a light-emitting layer 322 located on the side of the at least one first functional layer away from the first electrode layer 310, and at least one second functional layer located on the side of the light-emitting layer 322 away from the first electrode layer 310 (only the light-emitting layer 322 is schematically shown in the figure). The at least one first functional layer may include a hole transport layer, and the at least one second functional layer may include an electron transport layer.

[0097] The first electrode layer 310 includes a plurality of first electrodes 311 spaced apart, located in the display area AA. The first electrodes 311 are arranged in an array along a first direction X and a second direction Y. A pixel delimiting layer (PDL) is further disposed between the first electrode layer 310 and the multilayer light-emitting functional layer 320. The PDL includes a plurality of openings KK located in the display area AA, each opening KK exposing at least one first electrode 311. The light-emitting functional layer 320 contacts the plurality of first electrodes 311 through the multiple openings KK. The light-emitting functional layer 320 includes a plurality of light-emitting devices spaced apart, each light-emitting device including a first electrode 311 and a portion of the light-emitting functional layer 320 and the second electrode layer 330 above the first electrode 311. The light-emitting layer may include a quantum dot structure, and the light-emitting device is a QLED device.

[0098] The display substrate also includes a blocking structure 400 located on the side of the pixel defining layer (PDL) away from the substrate 100. The blocking structure 400 is located in the peripheral region NA and extends along the edge of the display region AA, partially surrounding the display region AA. That is, the blocking structure 400 is located in a portion of the peripheral region NA and does not need to completely surround the display region AA.

[0099] The specific location of the blocking structure 400 is determined according to the running direction of the light-inducing device in the light-inducing process of forming the light-emitting functional layer 320. For example, when the light-inducing device runs from one side of the first peripheral region NA1 to one side of the second peripheral region NA2 along the second direction Y (the first peripheral region NA1 and the second peripheral region NA2 are located on both sides of the display area AA along the second direction Y), the blocking structure 400 can be set in the first peripheral region NA1, and the blocking structure 400 extends along the first direction X.

[0100] The blocking principle of the blocking structure 400 is explained here in conjunction with the formation process of the light-emitting functional layer 320. The light-emitting functional layer 320 can be formed sequentially through a film-forming process and a photo-inducing process. In the film-forming process, the initial position of the film-forming equipment (such as a slot coating equipment) is located in the first peripheral region NA1, and on the side of the blocking structure 400 away from the display region AA. The film-forming equipment coats the accumulated liquid present in the equipment onto the side of the blocking structure 400 away from the display region AA, and moves along the second direction Y towards the second peripheral region NA2, forming a wet film layer located in the display region AA. In the photo-inducing process, the initial position of the photo-inducing equipment is located in the first peripheral region NA1, and on the side of the blocking structure 400 away from the display region AA, and moves along the second direction Y towards the second peripheral region NA2. This process sequentially solidifies the accumulated liquid on the side of the blocking structure 400 away from the display region AA and the wet film layer located in the display region AA. During the process of photo-induced curing of the liquid, the liquid is propelled by the light-induced energy to flow towards the display area AA. However, due to the presence of the blocking structure 400, the liquid will not flow further into the display area AA, thus ensuring the uniformity of the film thickness of the portion of the light-emitting functional layer 320 located in the display area AA, thereby improving the display uniformity of the display substrate.

[0101] For example, the first direction X can be the row direction, that is, the extension direction of the scan line in the driving circuit layer 200, and the second direction Y can be the column direction, that is, the extension direction of the data line in the driving circuit layer 200.

[0102] For example, the first direction X can be the column direction, and the second direction Y can be the row direction.

[0103] According to some exemplary embodiments, at least one of the multilayer light-emitting functional layers 320 is formed by the above-described film-forming process and photo-inducing process. For example, the light-emitting layer 322 may be formed by the film-forming process and photo-inducing process, and / or, the first functional layer may be formed by the film-forming process and photo-inducing process, and / or, the second functional layer may be formed by the film-forming process and photo-inducing process.

[0104] According to some exemplary embodiments, referring to FIG3, in the light-emitting functional layer 320 formed by the above-described film-forming process and photo-inducing process, the light-emitting functional layer 320 includes a first sub-layer 320A and a second sub-layer 320B, and the first sub-layer 320A and the second sub-layer 320B are made of the same material. For example, the light-emitting layer 322 is formed by the above-described film-forming process and photo-inducing process. The light-emitting layer 322 includes a first sub-layer 320A and a second sub-layer 320B. At least a portion of the first sub-layer 320A is located in the display area AA, and at least a portion of the first sub-layer 320A is located within the opening KK of the pixel defining layer PDL, that is, a sub-film layer obtained by curing a wet film layer located in the display area AA is formed. The second sub-layer 320B is located on the side of the pixel defining layer PDL away from the substrate 100, and the second sub-layer 320B is located on the side of the blocking structure 400 away from the display area AA and is in contact with the blocking structure 400, that is, a sub-film layer obtained by curing a wet film layer located on the side of the blocking structure 400 away from the display area AA is formed.

[0105] It should be noted that, in order to more clearly illustrate the structure of the light-emitting layer 322 formed by the photo-induced process, the first functional layer and the second functional layer are omitted in Figure 3. However, in the actual formed display substrate, the first functional layer and the second functional layer are present.

[0106] According to some exemplary embodiments, referring to FIG3, the substrate 100 includes a first surface 100a facing the driving circuit layer 200. Along a direction perpendicular to the first surface 100a, the thickness T2 of the second sublayer 320B is greater than the thickness T1 of the first sublayer 320A. The amount of liquid accumulated on the side of the barrier structure 400 away from the display area AA is relatively large. After curing, the second sublayer 320B has a raised structure. The fact that the thickness of the second sublayer 320B is greater than the thickness of the first sublayer 320A should be understood as meaning that the thickness of the thickest part of the second sublayer 320B is greater than the thickness of the first sublayer 320A.

[0107] It should be noted that the shape of the second sublayer 320B is not fixed. The shape of the second sublayer 320B depends on various factors such as the film formation process, the photo-induced process, and the structure of the barrier structure. Figure 3 only schematically illustrates one shape of the second sublayer 320B. In actual products, the second sublayer 320B can be other shapes.

[0108] According to some exemplary embodiments, referring to Figures 1 and 2, the blocking structure 400 extends along the first direction X, and the blocking structure 400 is located on one side of the plurality of openings KK along the second direction Y, that is, the blocking structure 400 can be set only on one side of the initial position of the photo-inducing device in the photo-inducing process.

[0109] According to some exemplary embodiments, referring to Figures 1 and 2, the display substrate has a first edge 110 and a second edge 120 located on both sides of a first direction X. The distance between the end of the blocking structure 400 near the first edge 110 and the first edge 110 in the first direction X is a first distance G1, and the distance between the opening KK closest to the first edge 110 and the first edge 110 in the first direction X is a second distance G2, where the first distance G1 is smaller than the second distance G2. The distance between the end of the blocking structure 400 near the second edge 120 and the second edge 120 in the first direction X is a third distance G3, and the distance between the opening KK closest to the second edge 120 and the second edge 120 in the first direction X is a fourth distance G4, where the third distance G3 is smaller than the fourth distance G4.

[0110] Figure 4 schematically shows a plan view of a display substrate according to some embodiments of the present disclosure. Figure 5 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 5 schematically shows a cross-sectional view taken along line CC' in Figure 4.

[0111] According to some exemplary embodiments, the display substrate includes two blocking structures 400, which are respectively located on both sides of a plurality of openings KK along the second direction Y, and the two blocking structures 400 are spaced apart. The two blocking structures 400 located on both sides along the second direction Y can be symmetrically arranged along the second direction Y. That is, the blocking structure 400 can be respectively set on one side of the initial position of the light-inducing device and on the opposite side of the initial position in the light-inducing process. Since liquid accumulation will also form on the opposite side of the initial position during the film deposition process, the blocking structure 400 set on the opposite side of the initial position can prevent the liquid accumulation at that position from flowing into the display area AA.

[0112] According to some exemplary embodiments, referring to Figures 1 and 4, the blocking structure 400 is a straight structure extending along the first direction X, and the two ends of the blocking structure 400 along the first direction X are located on the same side of the plurality of openings KK along the second direction Y.

[0113] According to some exemplary embodiments, based on the blocking structure 400 shown in FIG1 or FIG4, the two ends of the blocking structure 400 along the first direction X can continue to extend a certain distance towards the second direction Y, and a portion extending along the second direction Y is located on both sides of the plurality of openings KK along the first direction X.

[0114] According to some exemplary embodiments, referring to FIG3, the blocking structure 400 can be connected to the pixel defining layer PDL as an integral structure. That is, the blocking structure 400 and the pixel defining layer PDL are interconnected structures formed by the same film deposition process and patterned by the same patterning process. For example, a halftone mask can be used in the patterning process so that the thickness of the portion of the pixel defining layer PDL with the blocking structure 400 is greater than the thickness of other portions of the pixel defining layer PDL.

[0115] According to some exemplary embodiments, referring to Figures 2 and 3, the blocking structure 400 includes a first barrier 410 that extends continuously along a first direction X.

[0116] According to some exemplary embodiments, referring to Figures 2 and 3, the blocking structure 400 further includes a second barrier 420. The second barrier 420 is located on the side of the first barrier 410 away from the display area AA and is spaced apart from the first barrier 410. The second barrier 420 extends continuously along the first direction X. By providing two barrier structures that extend continuously along the first direction X, the blocking structure 400 can have a better blocking effect.

[0117] According to some exemplary embodiments, referring to Figures 1 to 3, the length of the second retaining wall 420 extending along the first direction X is equal to the length of the first retaining wall 410 extending along the first direction X.

[0118] According to some exemplary embodiments, referring to FIG3, the substrate 100 includes a first surface 100a facing the driving circuit layer 200. Along the direction perpendicular to the first surface 100a, the height H1 of the first barrier 410 and the height H2 of the second barrier 420 are not the same. For example, the height H1 of the first barrier 410 is greater than the height H2 of the second barrier 420.

[0119] According to some exemplary embodiments, the height of the first retaining wall 410 and the height of the second retaining wall 420 can be set to be the same along a direction perpendicular to the first surface 100a.

[0120] Figure 6 schematically shows a cross-sectional view of a first barrier in a display substrate according to some embodiments of the present disclosure.

[0121] According to some exemplary embodiments, referring to Figures 3 and 6, the first barrier 410 includes a first sub-part 411 and a second sub-part 412 located on the side of the first sub-part 411 away from the substrate 100. The orthographic projection of the second sub-part 412 on the substrate 100 falls within the orthographic projection of the first sub-part 411 on the substrate 100. Thus, the cross-sectional structure of the first barrier 410 is stepped, which allows the first barrier 410 to have a better blocking effect.

[0122] According to some exemplary embodiments, referring to Figures 3 and 6, the first sub-part 411 has a first trapezoidal cross-sectional shape in the direction perpendicular to the first surface 100a, and the second sub-part 412 has a second trapezoidal cross-sectional shape in the direction perpendicular to the first surface 100a. The length of the top side of the first trapezoid is greater than the length of the bottom side of the second trapezoid.

[0123] It should be noted that, depending on the needs, the second retaining wall 420 can also be configured as a stepped structure as shown in Figure 6, or both the first retaining wall 410 and the second retaining wall 420 can be configured as stepped structures as shown in Figure 6.

[0124] According to some exemplary embodiments, referring to FIG3, the display substrate further includes a planarization layer PLN located between the driving circuit layer 200 and the first electrode layer 310. The planarization layer PLN includes a via V0, through which the first electrode 311 is electrically connected to the driving circuit layer 200. The surface of the planarization layer PLN facing the first electrode layer 310 includes a protrusion Q. The orthographic projection of the second barrier 420 on the substrate 100 at least partially overlaps with the orthographic projection of the protrusion Q on the substrate 100. That is, the second barrier 420 in the pixel defining layer PDL can be formed by raising the protrusion Q in the planarization layer PLN, thereby simplifying the process of forming the pixel defining layer PDL.

[0125] Referring to Figures 2 and 3, the shape of the protrusion Q depends on the shape of the second retaining wall 420. Since the second retaining wall 420 is continuously extended along the first direction X, the protrusion Q is also set as a strip that continuously extends along the first direction X.

[0126] Figure 7 schematically shows another enlarged view of region A1 in Figure 1. Figure 8 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 8 schematically shows a cross-sectional view taken along line DD' in Figure 7.

[0127] According to some exemplary embodiments, referring to Figures 7 and 8, the blocking structure 400 further includes a plurality of first isolation posts 430 located on the side of the first barrier wall 410 away from the display area AA, and the plurality of first isolation posts 430 are arranged at intervals along a first direction X. A plurality of first recesses D1 are provided on the side of the first barrier wall 410 facing the plurality of first isolation posts 430, and the first recesses D1 are recessed towards the display area AA. The plurality of first isolation posts 430 are located on the side of the plurality of first recesses D1 away from the display area AA.

[0128] The inventors discovered that, for example, when a fluid, such as accumulated liquid, approaches a circular or similarly circular object, the fluid undergoes a flow around it due to the object's obstruction. That is, the fluid forms vortices on the sides and rear of the circular object and flows along its surface. Based on this phenomenon, in the embodiments of this disclosure, the blocking structure 400 is configured to include a plurality of first isolation pillars 430 and a first baffle 410 having a plurality of first recesses D1 corresponding to the plurality of first isolation pillars 430. After passing through the first isolation pillars 430, the accumulated liquid undergoes a flow around them and reaches the first recesses D1 of the first baffle 410. The first recesses D1 impede further flow of the accumulated liquid and cause it to flow in the opposite direction, thereby preventing the accumulated liquid from flowing further towards the display area AA.

[0129] According to some exemplary embodiments, referring to FIG8, the substrate 100 includes a first surface 100a facing the driving circuit layer 200. Along a direction perpendicular to the first surface 100a, the height H1 of the first barrier 410 and the height H3 of the first isolation pillar 430 are substantially equal. This arrangement allows the barrier structure 400 to have a better blocking effect.

[0130] Figure 9 schematically shows another enlarged view of region A1 in Figure 1.

[0131] According to some exemplary embodiments, referring to FIG9, the blocking structure 400 further includes a plurality of second isolation pillars 440. The plurality of second isolation pillars 440 are located on the side of the plurality of first isolation pillars 430 away from the first barrier wall 410, and the plurality of second isolation pillars 440 and the plurality of first isolation pillars 430 are arranged alternately along the first direction X. By setting the plurality of second isolation pillars 440 alternately with the plurality of first isolation pillars 430 on the side of the first isolation pillars 430 away from the display area AA, the combined arrangement of the first isolation pillars 430 and the second isolation pillars 440 can more effectively reduce the flow rate of the accumulated liquid, thereby further improving the blocking effect of the blocking structure 400.

[0132] For example, the shape of the orthographic projection of the first isolation pillar 430 on the substrate 100 can be the same as the orthographic projection of the second isolation pillar 440 on the substrate 100, and the height of the first isolation pillar 430 can be substantially equal to the height of the second isolation pillar 440 along the direction perpendicular to the first surface 100a.

[0133] It should be noted that, as needed, one or more rows of isolation columns can be set on the side of the multiple second isolation columns 440 away from the display area AA.

[0134] According to some exemplary embodiments, referring to FIG7, the shape of the orthographic projection of the first isolation pillar 430 on the substrate 100 can be circular, elliptical or hexagonal, etc. FIG7 schematically shows the case of being circular.

[0135] According to some exemplary embodiments, referring to FIG7, the shape of the orthographic projection of the first recess D1 on the substrate 100 is an arc shape or an elliptical arc shape, etc.

[0136] According to some exemplary embodiments, referring to FIG7, the orthographic projection of the first isolation pillar 430 on the substrate 100 is circular, and the orthographic projection of the first recess D1 on the substrate 100 is arc-shaped. Among the first isolation pillar 430 and the first recess D1 adjacent along the second direction Y, the line L connecting the geometric center of the orthographic projection of the first isolation pillar 430 on the substrate 100 and the center of the circle containing the orthographic projection of the first recess D1 on the substrate 100 is substantially perpendicular to the first direction X. In this way, the accumulated liquid after flowing around the first isolation pillar 430 can be better blocked by the first recess D1 of the first baffle 410, thereby making the baffle structure 400 have a better blocking effect.

[0137] According to some exemplary embodiments, referring to FIG7, the radius of the circle in which the orthographic projection of the first recess D1 on the substrate 100 is located is greater than the radius of the orthographic projection of the first isolation pillar 430 on the substrate 100, and a portion of the first isolation pillar 430 may be located within the first recess D1.

[0138] According to some exemplary embodiments, referring to FIG7, a plurality of first recesses D1 may be continuously provided along one side of the first direction X.

[0139] Figure 10 schematically shows another enlarged view of region A1 in Figure 1. Figure 11 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 11 schematically shows a cross-sectional view taken along line EE' in Figure 10.

[0140] According to some exemplary embodiments, referring to Figures 10 and 11, the blocking structure 400 further includes a second barrier 420, which is located on the side of the first barrier 410 away from the display area AA and is integrally connected to the first barrier 410. The first barrier 410 includes a first barrier body 413 and a partition portion 414 located on the side of the first barrier body 413 away from the substrate 100. The partition portion 414 includes a partition surface 414a on the side away from the display area AA. The orthographic projection of the end of the partition surface 414a away from the substrate 100 on the substrate 100 is located on the side of the partition surface 414a near the substrate 100 that is away from the display area AA. The second barrier 420 includes a second recess D2, which is recessed towards the substrate 100.

[0141] The second recess D2 in the second baffle 420 can prevent the liquid from flowing towards the display area AA. The baffle 414 on the first baffle 410 has an undercut structure, which can further block the liquid that has passed through the second baffle 420 and continues to flow towards the display area AA. Through the combined action of the baffle 414 in the first baffle 410 and the second recess D2 in the second baffle 420, the liquid can be effectively blocked, thereby preventing the liquid from flowing into the display area AA.

[0142] According to some exemplary embodiments, referring to FIG11, the partition surface 414a can be a plane that is inclined relative to the surface of the first barrier body 413 that is far away from the substrate 100, and the partition surface 414a intersects the surface of the first barrier body 413 that is far away from the substrate 100 with an included angle α being an acute angle.

[0143] For example, the included angle α can be 80°, 70°, 60°, 50°, 40°, or 30°, etc.

[0144] It should be noted that the barrier surface 414a can also be stepped or have other structures, as long as the barrier surface 414a has an undercut structure to achieve an effective blocking effect.

[0145] According to some exemplary embodiments, referring to Figures 10 and 11, the second barrier 420 includes a plurality of second recesses D2. The plurality of second recesses D2 are arranged in at least two rows along the second direction Y. Each row of second recesses D2 includes a plurality of second recesses D2 spaced apart along the first direction X. Figures 10 and 11 schematically illustrate the case of four rows of second recesses D2. The multiple rows of second recesses D2 can block the liquid flowing towards the side near the display area AA layer by layer, so that the barrier structure 400 can have a better blocking effect.

[0146] According to some exemplary embodiments, referring to FIG10, in two adjacent rows of second recesses D2, a plurality of second recesses D2 in one row of second recesses D2 are respectively located on the side of a plurality of second recesses D2 in another row of second recesses D2 away from the first retaining wall 410.

[0147] Figure 12 schematically shows another enlarged view of region A1 in Figure 1.

[0148] According to some exemplary embodiments, referring to FIG12, in two adjacent rows of second recesses D2, a plurality of second recesses D2 in one row of second recesses D2 and a plurality of second recesses D2 in another row of second recesses D2 are arranged alternately along the first direction X, that is, the interval between the second recesses D2 in one row of second recesses D2 and the second recesses D2 in another row of second recesses D2 is arranged adjacent to each other along the second direction Y.

[0149] According to some exemplary embodiments, referring to FIG10, the shape of the orthographic projection of the second recess D2 on the substrate can be rectangular, circular, elliptical, trapezoidal, triangular, hexagonal, etc.

[0150] According to some exemplary embodiments, referring to FIG10, the shape of the orthographic projection of the second recess D2 on the substrate is rectangular, and the length of the rectangle along the first direction is greater than the length along the second direction.

[0151] Figure 13 schematically shows an enlarged view of region A2 in Figure 11.

[0152] According to some exemplary embodiments, referring to Figures 11 and 13, a hydrophobic layer 421 is provided on the surface of the second barrier 420 away from the substrate 100, and a hydrophilic layer 422 is provided on the surface of the second barrier 420 located in the second recess D2.

[0153] According to some exemplary embodiments, referring to FIG13, the hydrophobic layer 421 can completely cover the surface of the second barrier 420 away from the substrate 100. The hydrophobic layer 421 may include a material with hydrophobic properties, or the hydrophobic layer 421 may include microstructures with hydrophobic properties.

[0154] According to some exemplary embodiments, referring to FIG13, the hydrophilic layer 422 can completely cover the inner wall of the second recess D2. The hydrophilic layer 422 may comprise a material with hydrophilic properties, or the hydrophilic layer 422 may comprise microstructures with hydrophilic properties.

[0155] According to some exemplary embodiments, referring to FIG13, the surface of the first barrier 410 may also be provided with a hydrophobic layer, for example, a hydrophobic layer may be provided on the barrier surface 414a of the barrier portion.

[0156] According to some exemplary embodiments, referring to FIG10, the surface of the second barrier 420 away from the substrate 100 is parallel to the surface of the substrate 100 facing the drive circuit layer 200. That is, in the portion where the second recess D2 is not provided, the second barrier 420 is designed with equal thickness.

[0157] Figure 14 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 14 schematically shows a cross-sectional view taken along line EE' in Figure 10.

[0158] According to some exemplary embodiments, referring to FIG14, the virtual extension surface of the second barrier 420 away from the substrate 100 forms an acute angle with the surface of the substrate 100 facing the driving circuit layer 200, that is, the angle β between the virtual extension surface of the second barrier 420 away from the substrate 100 and the first direction X is an acute angle. In other words, in the portion where the second recess D2 is not provided, the distance between the surface of the second barrier 420 away from the substrate 100 and the first surface 100a in the direction perpendicular to the first surface 100a gradually decreases along the direction away from the display area AA.

[0159] Figure 15 schematically shows another enlarged view of region A1 in Figure 1. Figure 16 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 16 schematically shows a cross-sectional view taken along line FF' in Figure 15.

[0160] According to some exemplary embodiments, referring to Figures 15 and 16, the second barrier 420 includes a plurality of stepped portions 423, which are sequentially connected along the second direction Y. The substrate 100 includes a first surface 100a facing the driving circuit layer 200. Along the direction perpendicular to the first surface 100a, the height H4 of the stepped portion 423 away from the first barrier 410 is less than the height H5 of the stepped portion 423 near the first barrier 410.

[0161] It should be noted that the height of the step portion 423 should be understood as the height of the position of the step portion 423 furthest from the substrate 100.

[0162] According to some exemplary embodiments, referring to Figures 15 and 16, the surface of the stepped portion 423 away from the substrate 100 includes a stepped plane 4231 and a stepped ramp 4232 connected along the second direction Y. The stepped plane 4231 is parallel to the first surface 100a, and the virtual extension surface of the stepped ramp 4232 forms an acute angle with the first surface 100a. At least one second recess D2 is recessed at the stepped plane 4231. The second baffle 420 with the stepped structure itself has a certain flow-blocking effect, and combined with the second recess D2 in the second baffle 420, the blocking effect of the blocking structure 400 can be further improved.

[0163] According to some exemplary embodiments, at least one second recess D2 may be recessed at the step slope 4232.

[0164] According to some exemplary embodiments, a portion of the second recess D2 can be recessed at the step slope 4232, and another portion of the second recess D2 can be recessed at the step plane 4231, that is, the second recess D2 is provided at both the step slope 4232 and the step plane 4231.

[0165] According to some exemplary embodiments, referring to FIG11, the substrate 100 includes a first surface 100a facing the driving circuit layer 200, and a plurality of second recesses D2 having equal recess depths H6 along a direction perpendicular to the first surface 100a.

[0166] In addition, Figures 14 and 16 also illustrate the case where the depths of multiple second recesses D2 are equal.

[0167] According to some exemplary embodiments, referring to FIG14 or FIG16, in two adjacent second recesses D2 along the second direction Y, the bottom surface of the second recess D2 closer to the display area AA is farther from the first surface 100a than the bottom surface of the second recess D2 farther from the display area AA.

[0168] Figure 17 schematically shows a cross-sectional view of a display substrate according to some embodiments of the present disclosure, wherein Figure 17 schematically shows a cross-sectional view taken along line EE' in Figure 10.

[0169] According to some exemplary embodiments, referring to FIG17, in two adjacent second recesses D2 along the second direction Y, the recess depth H7 of the second recess D2 near the first baffle 410 perpendicular to the first surface 100a is greater than the recess depth H8 of the second recess D2 away from the first baffle 410 perpendicular to the first surface 100a. The distance between the bottom surface of the second recess D2 near the first baffle 410 and the first surface 100a is equal to the distance between the bottom surface of the second recess D2 away from the display area AA and the first surface 100a. The bottom surfaces of each second recess D2 can be located on the same horizontal plane.

[0170] It should be noted that in the second recess D2 illustrated in Figures 11, 14, 16, and 17, the bottom surface of the second recess D2 is flush with the surface of the pixel defining layer PDL located in the display area AA that is away from the substrate 100, or the bottom surface of the second recess D2 is further away from the first surface 100a than the surface of the pixel defining layer PDL located in the display area AA that is away from the substrate 100. However, the embodiments of this disclosure are not limited to this, and the bottom surface of the second recess D2 may also be closer to the first surface 100a than the surface of the pixel defining layer PDL located in the display area AA that is away from the substrate 100.

[0171] Figure 18 schematically illustrates a flowchart of a method for fabricating a display substrate according to some embodiments of the present disclosure.

[0172] At least some embodiments of this disclosure also provide a method for fabricating an array substrate. The display substrate includes a display area and a peripheral area located around the display area. Referring to FIG18, the fabrication method includes the following steps S10-S40.

[0173] In step S10, a driving circuit layer is formed on the substrate.

[0174] In step S20, a first electrode layer is formed on the side of the driving circuit layer away from the substrate. The first electrode layer includes a plurality of first electrodes spaced apart and arranged at intervals along a first direction and a second direction.

[0175] In step S30, a pixel defining layer is formed on the side of the first electrode layer away from the substrate. The pixel defining layer includes multiple openings, each of which exposes a portion of a plurality of first electrodes. The side of the pixel defining layer away from the substrate includes a blocking structure located in the peripheral region. The blocking structure extends along the edge of the display area and partially surrounds the display area.

[0176] In step S40, a multilayer light-emitting functional layer is formed on the side of the pixel defining layer away from the substrate.

[0177] Figures 19A-19D schematically illustrate the fabrication process of a display substrate fabrication method according to some embodiments of the present disclosure.

[0178] The fabrication process of the display substrate will be described in detail below with reference to Figures 19A-19D.

[0179] Referring to FIG19A, a driving circuit layer 200 is formed on a substrate 100, and a planarization layer PLN is formed on the side of the driving circuit layer 200 away from the substrate 100. The driving circuit layer 200 includes a plurality of pixel driving circuits located within the display area AA, and the planarization layer PLN includes a plurality of vias V0, each of which exposes a portion of the plurality of pixel driving circuits.

[0180] The planarization layer PLN has a protrusion Q on the side away from the substrate 100. The protrusion Q is located in the peripheral region NA and on the side of the display region AA along the second direction Y. For example, the planarization layer PLN has two protrusions Q on the side away from the substrate 100, and the two protrusions Q are located on both sides of the display region AA along the second direction Y.

[0181] Referring to FIG19B, a first electrode layer 310 is formed on the side of the planarization layer PLN away from the substrate 100. The first electrode layer 310 includes a plurality of first electrodes 311 located in the display area AA. The plurality of first electrodes 311 are electrically connected to a plurality of pixel driving circuits through a plurality of vias V0 in the planarization layer PLN.

[0182] Referring to FIG19C, a pixel defining layer PDL is formed on the side of the first electrode layer 310 away from the substrate 100. The pixel defining layer PDL includes a plurality of openings KK located in the display area AA, and the plurality of openings KK expose at least a portion of the plurality of first electrodes 311. The side of the pixel defining layer PDL away from the substrate 100 also includes a blocking structure 400 located in the peripheral area NA. For example, the pixel defining layer PDL includes two blocking structures 400, which are located on both sides of the plurality of openings KK along the second direction Y (the planar structure of which can be seen in FIG4).

[0183] The blocking structure 400 may include a first barrier 410 and a second barrier 420. The second barrier 420 is located on the side of the first barrier 410 away from the display area AA. The orthographic projection of the second barrier 420 on the substrate 100 at least partially overlaps with the orthographic projection of the first barrier 410 on the substrate 100. The second barrier 420 is a structure formed by being supported by protrusions Q in the planarization layer PLN. The height of the first barrier 410 is greater than the height of the second barrier 420, and the first barrier 410 can be formed by using a halftone mask for exposure in the patterning process of forming the pixel boundary layer PDL.

[0184] Referring to FIG19D, multiple light-emitting functional layers 320 are sequentially formed on the side of the pixel defining layer PDL away from the substrate 100, and a second electrode layer 330 is formed on the side of the light-emitting functional layer 320 away from the substrate 100.

[0185] Forming a multilayer light-emitting functional layer 320 may include forming a first functional layer on the pixel defining layer PDL, forming a light-emitting layer on the side of the first functional layer away from the substrate 100, and forming a second functional layer on the side of the light-emitting layer away from the substrate 100.

[0186] The steps for forming at least one of the first functional layer, the light-emitting layer, and the second functional layer include: forming a wet film layer using a photo-induced ink, and then curing the wet film layer by a photo-induced process.

[0187] In the film-forming process, the initial position of the film-forming equipment (such as a slot coating equipment) is located in the first peripheral region NA1 and on the side of the barrier structure 400 away from the display area AA. The film-forming equipment coats the liquid present in the equipment onto the side of the barrier structure 400 away from the display area AA, and moves along the second direction Y towards the second peripheral region NA2 to form a wet film layer located in the display area AA.

[0188] In the photo-induced process, the initial position of the photo-induced device 500 is located in the first peripheral region NA1, on the side of the blocking structure 400 away from the display region AA, and moves towards the second peripheral region NA2 along the second direction Y. This process sequentially solidifies the liquid accumulation on the side of the blocking structure 400 away from the display region AA and the wet film layer on the display region AA. During the photo-induced solidification of the liquid accumulation, the liquid accumulation is propelled by the energy of the photo-induced flow towards the display region AA. However, due to the presence of the blocking structure 400, the liquid accumulation will not flow further into the display region AA, ensuring the uniformity of the film thickness of the portion of the light-emitting functional layer 320 located in the display region AA, thereby improving the display uniformity of the display substrate.

[0189] For example, the step of forming the light-emitting layer 322 includes forming a wet film layer using photo-induced ink, and then curing the wet film layer by a photo-induced process. The light-emitting layer 322 includes a first sub-layer 320A and a second sub-layer 320B, which are located on opposite sides of the barrier structure 400 along the second direction Y. At least a portion of the first sub-layer 320A is located in the display area AA, i.e., it is a sub-film layer formed by photo-induced curing of the wet film layer located in the display area AA. The second sub-layer 320B is located on the side of the barrier structure 400 away from the display area AA and is in contact with the barrier structure 400, i.e., it is a sub-film layer formed by curing the liquid accumulation on the side of the barrier structure 400 away from the display area AA.

[0190] For example, the substrate 100 includes a first surface 100a facing the driving circuit layer 200. Along a direction perpendicular to the first surface 100a, the thickness T2 of the second sublayer 320B is greater than the thickness T1 of the first sublayer 320A. The amount of liquid accumulated on the side of the barrier structure 400 away from the display area AA is relatively large. After curing, the second sublayer 320B has a raised structure, and the thickness at the highest point of the second sublayer 320B is greater than the thickness of the first sublayer 320A.

[0191] It should be noted that, in order to more clearly illustrate the structure of the light-emitting layer 322 formed by the photo-induced process, the first functional layer and the second functional layer are omitted in Figure 19D, but in the actual formed display substrate, the first functional layer and the second functional layer are present.

[0192] It should be noted that the fabrication process of the display substrate is illustrated using the example of a barrier structure 400 including a first barrier wall 410 and a second barrier wall 420. When the barrier structure 400 is another structure described above, the display substrate can be formed following similar steps.

[0193] According to some exemplary embodiments, referring to FIG19C, the substrate 100 includes a first surface 100a facing the driving circuit layer 200, and the maximum height H of the barrier structure 400 along a direction perpendicular to the first surface 100a is... max The height is greater than or equal to the critical height Z0, which is represented by the following formula:

[0194] Where γ represents the surface tension of the photoinduced ink, ρ represents the density of the photoinduced ink, and θ represents the contact angle of the photoinduced ink on the surface of the blocking structure 400. This configuration allows the blocking structure 400 to effectively prevent the liquid accumulation in the peripheral area NA from flowing into the display area AA during the photoinduced process.

[0195] It should be noted that γ and ρ depend on the material system of the photoinducing ink used. When the photoinducing ink used is fixed, γ and ρ are fixed parameters. θ depends on the material system of the photoinducing ink used and the material of the blocking structure 400. When the photoinducing ink used and the blocking structure 400 are fixed, θ is a fixed parameter.

[0196] Figures 20A-20B schematically illustrate the blocking principle of a blocking structure in a display substrate according to some embodiments of the present disclosure.

[0197] The derivation process and principle of the above formula are given below with reference to Figures 20A and 20B.

[0198] Referring to Figure 20A, the diagonal line on the left represents the sidewall of the barrier structure, and the curve on the right side of this sidewall represents the cross-sectional shape formed by the static climbing of the photoinduced ink at this sidewall due to surface tension. X represents the distance from the sidewall, and Z represents the height of the photoinduced ink.

[0199] At position X equals 0, i.e., the position in contact with the sidewall, the height of the light-induced ink is Z0; at position X equals B', the height of the light-induced ink is 0.

[0200] Through research, the inventors discovered that when the height of the blocking structure is greater than Z0, during the light-induced process, the blocking structure can effectively prevent the liquid accumulation in the surrounding area from flowing into the display area. The derivation process of Z0 is given below.

[0201] The pressure received by the photoinduced ink at the curved liquid surface formed by climbing up the sidewall of the barrier structure is the sum of atmospheric pressure and Laplace pressure, specifically expressed by the following formula.

[0202] Formula 1: P = P atm +γC

[0203] Where C is the radius of curvature of the curved liquid surface at the corresponding position. Referring to Figure 20A, C can be obtained by taking the second derivative with respect to x, thus transforming Formula 1 into Formula 2 as follows.

[0204] Formula 2:

[0205] Furthermore, the pressure received by the photoinduced ink at the curved liquid surface formed by climbing up the sidewall of the barrier structure can also be expressed as Equation 3 below.

[0206] Formula 3: P = P atm -ρgz

[0207] The pressure at the point where the height of the photoinduced ink in the curved liquid surface approaches zero is atmospheric pressure P. atm The pressure difference caused by the height difference in the curved liquid surface is ρgz, so we can obtain Formula 3.

[0208] Combining Formula 2 and Formula 3, we can obtain Formula 4 as follows.

[0209] Formula 4:

[0210] Assumption Substituting these formulas into Formula 4 above, we obtain Formula 5 as follows.

[0211] Formula 5:

[0212] Based on Formula 5 and Figure 20A, we can obtain Formula 6 as follows.

[0213] Formula 6: z(x)=Z0exp(-kx)

[0214] Differentiating Equation 6 yields Equation 7.

[0215] Formula 7: z'(x)=-kZ0*e -kx

[0216] For formula seven, when z'(0) is 0, z'(0) = -kZ0.

[0217] Draw a tangent line at x=0 on the curved liquid surface curve shown in Figure 20A. Referring to Figure 20B, the angle between the tangent line and the vertical direction is θ, which is the contact angle of the photoinduced ink on the surface of the blocking structure.

[0218] Therefore, z'(0) = -kZ0 = -tan(90°-θ);

[0219] Furthermore, it can be deduced that

[0220] At least some embodiments of this disclosure also provide a display device comprising the display substrate described above. The display device may include any device or product with display functionality. For example, the display device may be a smartphone, mobile phone, e-book reader, desktop computer (PC), laptop PC, netbook PC, personal digital assistant (PDA), portable multimedia player (PMP), digital audio player, mobile medical device, camera, wearable device (e.g., head-mounted device, electronic clothing, electronic bracelet, electronic necklace, electronic accessory, electronic tattoo, or smartwatch), television set, etc.

[0221] It should be understood that the display panel and display device according to the embodiments of this disclosure have all the features and advantages of the display substrate described above, as detailed in the above description, which will not be repeated here. Although some embodiments of the overall technical concept of this disclosure have been shown and described, those skilled in the art will understand that changes can be made to these embodiments without departing from the principles and spirit of the overall technical concept, the scope of which is defined by the claims and their equivalents.

Claims

1. A display substrate, comprising a display area and a peripheral area surrounding the display area, wherein, The display substrate includes: Substrate; The driving circuit layer is located on the substrate. A first electrode layer is located on the side of the driving circuit layer away from the substrate. The first electrode layer includes a plurality of first electrodes spaced apart, which are arranged at intervals along a first direction and a second direction. A pixel defining layer is located on the side of the first electrode layer away from the substrate. The pixel defining layer includes a plurality of openings, each of which exposes at least a portion of one of the first electrodes. The display substrate further includes a barrier structure located on the side of the pixel defining layer away from the substrate, the barrier structure being located in the peripheral region; and The blocking structure extends along the edge of the display area and partially surrounds the display area.

2. The display substrate according to claim 1, wherein, The blocking structure extends along a first direction and is located on one side of the plurality of openings along a second direction.

3. The display substrate according to claim 2, wherein, The display substrate includes two blocking structures, which are located on both sides of the plurality of openings along the second direction, and the two blocking structures are spaced apart.

4. The display substrate according to any one of claims 1-3, wherein, The display substrate further includes multiple light-emitting functional layers; and At least one of the light-emitting functional layers includes a first sub-layer and a second sub-layer, the first sub-layer and the second sub-layer are made of the same material, at least a portion of the first sub-layer is located in the display area, the second sub-layer is located on the side of the pixel defining layer away from the substrate, and the second sub-layer is located on the side of the blocking structure away from the display area and is in contact with the blocking structure.

5. The display substrate according to claim 4, wherein, The substrate includes a first surface facing the driving circuit layer, and the thickness of the second sub-layer is greater than the thickness of the first sub-layer along a direction perpendicular to the first surface.

6. The display substrate according to any one of claims 1-5, wherein, The blocking structure and the pixel defining layer are connected as a single structure.

7. The display substrate according to any one of claims 1-5, wherein, The barrier structure includes a first retaining wall that extends continuously along the first direction.

8. The display substrate according to claim 7, wherein, The blocking structure further includes a second barrier wall, which is located on the side of the first barrier wall away from the display area and is spaced apart from the first barrier wall, and the second barrier wall extends continuously along the first direction.

9. The display substrate according to claim 8, wherein, The substrate includes a first surface facing the driving circuit layer. Along a direction perpendicular to the first surface, the heights of the first barrier and the second barrier are either different or the heights of the first barrier and the second barrier are the same.

10. The display substrate according to claim 9, wherein, The height of the first retaining wall is greater than the height of the second retaining wall.

11. The display substrate according to claim 10, wherein, The first barrier includes a first sub-part and a second sub-part located on the side of the first sub-part away from the substrate, wherein the orthographic projection of the second sub-part on the substrate falls within the orthographic projection of the first sub-part on the substrate.

12. The display substrate according to claim 10 or 11, wherein, The display substrate further includes a planarization layer located between the driving circuit layer and the first electrode layer. The planarization layer includes vias, and the first electrode layer is electrically connected to the driving circuit layer through the vias. as well as The planarization layer has a protrusion on its surface facing the first electrode layer, and the orthographic projection of the second barrier on the substrate at least partially overlaps with the orthographic projection of the protrusion on the substrate.

13. The display substrate according to claim 7, wherein, The blocking structure also includes a plurality of first isolation columns located on the side of the first barrier wall away from the display area, and the plurality of first isolation columns are arranged at intervals along the first direction; The first retaining wall has a plurality of first recesses on its side facing the plurality of first isolation columns, and the first recesses are recessed toward the display area. as well as The plurality of first isolation pillars are located on the side of the plurality of first recesses away from the display area.

14. The display substrate according to claim 13, wherein, The barrier structure further includes a plurality of second isolation posts, the plurality of second isolation posts being located on the side of the plurality of first isolation posts away from the first retaining wall; and Multiple second isolation columns and multiple first isolation columns are arranged alternately along the first direction.

15. The display substrate according to claim 13 or 14, wherein, The orthographic projection of the first isolation pillar on the substrate is circular, and the orthographic projection of the first recess on the substrate is arc-shaped. 16.The display substrate of claim 15, wherein, In the first isolation pillar and the first recess that are adjacent along the second direction, the line connecting the geometric center of the orthographic projection of the first isolation pillar on the substrate and the center of the circle in which the orthographic projection of the first recess on the substrate is located is substantially perpendicular to the first direction. 17.The display substrate of any one of claims 13-16, wherein, The substrate includes a first surface facing the driving circuit layer, and the first barrier and the first isolation pillar have the same height along a direction perpendicular to the first surface. 18.The display substrate of claim 7, wherein, The blocking structure also includes a second barrier wall, which is located on the side of the first barrier wall away from the display area and is connected to the first barrier wall as an integral structure. The first barrier includes a first barrier body and a partition portion located on the side of the first barrier body away from the substrate. The partition portion includes a partition surface away from the display area. The orthographic projection of the end of the partition surface away from the substrate on the substrate is located on the side of the orthographic projection of the end of the partition surface near the substrate away from the display area. as well as The second barrier includes a second recess, which is recessed toward the substrate.

19. The display substrate of claim 18, wherein, The barrier surface intersects the surface of the first barrier body away from the substrate, and the included angle is an acute angle. 20.The display substrate according to claim 18 or 19, wherein, The second retaining wall includes a plurality of second recesses, the plurality of second recesses being arranged in at least two rows distributed along a second direction; and A row of second recesses includes a plurality of second recesses spaced apart along the first direction. 21.The display substrate of claim 20, wherein, In two adjacent rows of second recesses, a plurality of second recesses in one row are located on the side of a plurality of second recesses in the other row that are away from the first retaining wall; or, In two adjacent rows of second recesses, a plurality of second recesses in one row and a plurality of second recesses in the other row are arranged alternately along the first direction.

22. The display substrate of any of claims 18-21, wherein, The second barrier wall has a hydrophobic layer on its surface away from the substrate, and / or the second barrier wall has a hydrophilic layer on its surface within the second recess.

23. The display substrate of any of claims 18-22, wherein, The surface of the second barrier away from the substrate is parallel to the surface of the substrate facing the driving circuit layer.

24. The display substrate according to any one of claims 18-22, wherein, The substrate includes a first surface facing the driving circuit layer, and the distance between the second barrier surface away from the substrate and the first surface in a direction perpendicular to the first surface gradually decreases along the direction away from the display area.

25. The display substrate according to any one of claims 18-22, wherein, The second retaining wall includes a plurality of stepped portions, which are sequentially connected along the second direction; and The substrate includes a first surface facing the driving circuit layer, and the height of the stepped portion away from the first barrier wall along a direction perpendicular to the first surface is less than the height of the stepped portion close to the first barrier wall.

26. The display substrate according to claim 25, wherein, The stepped portion includes a surface away from the substrate, comprising a stepped plane and a stepped ramp connected along the second direction, the stepped plane being parallel to the first surface, and the virtual extension surface of the stepped ramp forming an acute angle with the first surface; At least one of the second recesses is recessed at the plane of the step, and / or at least one of the second recesses is recessed at the slope of the step.

27. The display substrate according to claims 20-26, wherein, The substrate includes a first surface facing the driving circuit layer, and the recesses of the plurality of second recesses have equal depths along a direction perpendicular to the first surface.

28. The display substrate according to claims 24-26, wherein, The substrate includes a first surface facing the driving circuit layer; as well as In two adjacent second recesses along the second direction, the second recess near the first retaining wall has a greater depth perpendicular to the first surface than the second recess away from the first retaining wall.

29. The display substrate according to claims 1-28, wherein, The display substrate further includes a light-emitting layer located on the side of the pixel defining layer away from the substrate and a second electrode layer located on the side of the light-emitting layer away from the substrate, wherein the light-emitting layer comprises quantum dots.

30. A method for fabricating an array substrate, wherein the display substrate includes a display area and a peripheral area located around the display area, wherein, The preparation method includes: A driving circuit layer is formed on the substrate. A first electrode layer is formed on the side of the driving circuit layer away from the substrate. The first electrode layer includes a plurality of first electrodes spaced apart and arranged at intervals along a first direction and a second direction. A pixel defining layer is formed on the side of the first electrode layer away from the substrate. The pixel defining layer includes a plurality of openings, each opening exposing a portion of a plurality of the first electrodes. The side of the pixel defining layer away from the substrate includes a blocking structure located in the peripheral region, extending along the edge of the display area and partially surrounding it. A multilayer light-emitting functional layer is formed on the side of the pixel defining layer away from the substrate.

31. The preparation method according to claim 30, wherein, Forming multiple light-emitting functional layers includes forming a first functional layer on the pixel defining layer, forming a light-emitting layer on the side of the first functional layer away from the substrate, and forming a second functional layer on the side of the light-emitting layer away from the substrate. as well as The steps for forming at least one of the first functional layer, the light-emitting layer, and the second functional layer include: forming a wet film layer using photo-induced ink, and then curing the wet film layer using a photo-induced process. The substrate includes a first surface facing the driving circuit layer, and the maximum height of the blocking structure perpendicular to the first surface is greater than or equal to a critical height Z0, where Z0 is represented by the following formula: Wherein, γ represents the surface tension of the photoinduced ink, ρ represents the density of the photoinduced ink, and θ represents the contact angle of the photoinduced ink on the surface of the barrier structure.

32. A display device, wherein, Includes the display substrate according to any one of claims 1-29.

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