Article
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2026-02-06
- Publication Date
- 2026-08-13
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Figure JPOXMLDOC01-APPB-C000001 
Figure JPOXMLDOC01-APPB-C000002 
Figure JPOXMLDOC01-APPB-C000003
Abstract
Description
Goods
[0001] This disclosure pertains to articles.
[0002] Certain silane compounds are known to provide excellent water and oil repellency when used for surface treatment of substrates (Patent Document 1).
[0003] International Publication No. 2015 / 087903
[0004] This disclosure aims to provide articles having a surface treatment layer with excellent abrasion resistance and fingerprint wiping properties.
[0005] This disclosure includes the following embodiments: [1] An article comprising: a substrate; a silicon oxide layer provided on the substrate; and a surface treatment layer in direct contact with the silicon oxide layer, wherein the surface treatment layer comprises a siloxane compound having a dimethylsiloxane structure and no reactive functional groups. [2] The article according to [1], wherein the average thickness of the silicon oxide layer is in the range of 0.5 to 100 nm. [3] The article according to [1] or [2], wherein the silicon oxide layer comprises an alkali metal atom. [4] The article according to [3], wherein the alkali metal atom is sodium. [5] The article according to any one of [1] to [4], wherein the arithmetic mean roughness (Ra) of the surface of the silicon oxide layer is 20 nm or less. [6] The article according to any one of [1] to [5], wherein the arithmetic mean roughness (Ra) of the surface of the silicon oxide layer is 10 nm or less. [7] The article according to any one of [1] to [6], wherein the arithmetic mean roughness (Ra) of the surface of the silicon oxide layer is 5 nm or less. [8] The article according to any one of [1] to [7], further comprising a layer containing a metal oxide between the substrate and the silicon oxide layer. [9] The article according to any one of [1] to [8], wherein the siloxane compound has a branched siloxane structure.
[10] The siloxane compound is of formula (1): It is a compound represented by R 1a Each of them is independent of C 1-6 hydrocarbon group or A group: It is a group represented by R 51 Each of them is independent of R 53-(SiR 53 2 -R 61 )) ma -represented group, and R 61 are each independently an oxygen atom or a C 1-6 alkylene group, and R 53 are each independently a methyl group or R 51’ and R 51’ has the same meaning as R 51 , ma are each independently an integer from 0 to 2, provided that in R 51 , the number of R 51’ is 3 or less, and R 52 are each independently a methyl group, na is an integer from 1 to 3, and R 54 is an oxygen atom or a C 1-6 alkylene group, n2 is 0 or 1, and R<-R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 76 Each of them is independent of C 1-6 It is an alkylene group, R 77 Each of these is an independently substituted arylene group, and R 78 Each of these is independently a single bond, or C 1-6 It is an alkylene group, R 79 Each of these is independently a single bond or an oxygen atom, and R 75 Each of these is an independent hydrocarbon group, where x is an integer from 0 to 500, y is an integer from 0 to 500, z is an integer from 0 to 500, x + y + z is 1 or greater, and the order of existence of each repeating unit enclosed in parentheses with x, y, or z is arbitrary in the formula. The group is represented by ], R 2a Each of them is independent of C 1-6 A group represented by a hydrocarbon group or an A group, R 55 is an oxygen atom or C 1-6 An article according to any one of [1] to [9], wherein it is an alkylene group and n1 is 0 or 1.
[11] R 1a and R 2a The article described in
[10] , wherein is a methyl group.
[12] R 1a and R 2a It is represented by a methyl group, an n-butyl group, or an A group, however, R 1a and R 2aThe article according to
[10] , wherein at least one of them is an A group.
[13] The Si / C atomic ratio on the surface of the surface treatment layer is 0.42 or more, the article according to any one of [1] to
[12] .
[14] The surface treatment layer consists of at least one of the following silane compounds, the article according to any one of [1] to
[13] . (In the formula, TMS represents a trimethylsilyl group, and n is independently 1 to 500 respectively.)
[15] The substrate is a glass substrate, the article according to any one of [1] to
[14] .
[16] An optical member, the article according to any one of [1] to
[15] .
[17] A display, the article according to any one of [1] to
[16] .
[18] Formula (1): [In the formula: R 1a are each independently a hydrocarbon group of C 1-6 or an A group: is a group represented by, and R 51 are each independently R 53 -(SiR 53 2 -R 61 ) ma - is a group represented by, and R 61 are each independently an oxygen atom or a C 1-6 alkylene group, and R 53 are each independently a methyl group or R 51’ , and R 51’ has the same meaning as R 51 , and ma are each independently an integer of 0 to 2, provided that in R 51 , the number of R 51’ is 3 or less, and R 52 are each independently a methyl group, and na is an integer of 1 to 3, and R 54 is an oxygen atom or a C 1-6 alkylene group, and n2 is 0 or 1, and R S are each independently the following formula: [In the formula: R 73 are each independently a single bond, a C 1-12 alkylene group, -R76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 74 Each of them is independent of C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 76 Each of them is independent of C 1-6 It is an alkylene group, R 77 Each of these is an independently substituted arylene group, and R 78 Each of these is independently a single bond, or C 1-6 It is an alkylene group, R 79 Each of these is independently a single bond or an oxygen atom, and R75 Each of these is an independent hydrocarbon group, where x is an integer from 0 to 500, y is an integer from 0 to 500, z is an integer from 0 to 500, x + y + z is 1 or greater, and the order of existence of each repeating unit enclosed in parentheses with x, y, or z is arbitrary in the formula. The group is represented by ], R 2a Each of them is independent of C 1-6 A group represented by a hydrocarbon group or an A group, R 55 is an oxygen atom or C 1-6 A silane compound represented by
[19] R, where n1 is 0 or 1, and is an alkylene group. 1a and R 2a is a methyl group, the silane compound described in
[18] .
[20] R 1a and R 2a It is represented by a methyl group, an n-butyl group, or an A group, however, R 1a and R 2a A silane compound according to
[18] , wherein at least one of the groups is an A group.
[21] A silane compound according to any one of
[18] to
[20] , wherein the molecular weight distribution determined from the chromatogram obtained by gel permeation chromatography is 1.1 or greater.
[22] A silane compound according to any one of
[18] to
[21] , wherein the molecular weight distribution determined from the chromatogram obtained by gel permeation chromatography is 1.5 or greater.
[23] A silane compound according to any one of
[18] to
[22] , wherein the average molecular weight determined from the chromatogram obtained by gel permeation chromatography is 1,000 or more and less than 10,000.
[24] Formula (1): [In the formula: R 1a Each of them is independent of C 1-6 hydrocarbon group or A group: It is a group represented by R 51 Each of them is independent of R 53 - (SiR 53 2 -R 61 ) ma It is a group represented by -, R 61 Each of these is independently an oxygen atom, or C 1-6It is an alkylene group, R 53 Each of these is independently a methyl group or R 51’ And R 51’ R 51 This is synonymous, and ma is an integer between 0 and 2, independently of R. 51 Medium, R 51’ The number is 3 or less, R 52 Each of these is independently a methyl group, na is an integer from 1 to 3, and R 54 is an oxygen atom or C 1-6 It is an alkylene group, n2 is 0 or 1, R S Each of these is independent and expressed by the following formula: [In the formula: R 73 Each of them is independently a single bond, C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 74 Each of them is independent of C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 76 Each of them is independent of C 1-6 It is an alkylene group, R 77 Each of these is an independently substituted arylene group, and R 78 Each of these is independently a single bond, or C 1-6 It is an alkylene group, R 79 Each of these is independently a single bond or an oxygen atom, and R 75 Each of these is an independent hydrocarbon group, where x is an integer from 0 to 500, y is an integer from 0 to 500, z is an integer from 0 to 500, x + y + z is 1 or greater, and the order of existence of each repeating unit enclosed in parentheses with x, y, or z is arbitrary in the formula. The group is represented by ], R 2a Each of them is independent of C 1-6 A group represented by a hydrocarbon group or an A group, R 55 is an oxygen atom or C 1-6 A silane compound represented by [an alkylene group, where n1 is 0 or 1] and formula (3): [In the formula: n3 is an integer between 0 and 200, n4 is 0 or 1, R 41 R is an alkyl group having 1 to 4 carbon atoms. 42 Each of these independently consists of a methyl group or an A group: It is a group represented by R 51 Each of them is independent of R 53 - (SiR 53 2 -R 61 ) ma It is a group represented by -, R 61Each of these is independently an oxygen atom, or C 1-6 It is an alkylene group, R 53 Each of these is independently a methyl group or R 51’ And R 51’ R 51 This is synonymous, and ma is an integer between 0 and 2, independently of R. 51 Medium, R 51’ The number is 3 or less, R 52 Each of these is independently a methyl group, and R 54 is an oxygen atom or C 1-6 It is an alkylene group, na is an integer from 1 to 3, z is 0 or 1, and R 43 This is an alkyl group having 1 to 4 carbon atoms or -Si[(-O-SiR 44 2 -) ma1 R 44 ] p3 (R 45 ) 3-p3 It is a group represented by R 44 Each of these independently consists of a hydrogen atom, a hydroxyl group, a C1-C4 alkyl group, or R 43’ And R 43’ R 43 This is synonymous, and ma1 is an integer from 1 to 5, independently of each other, however R 43 Medium, R 43’ The number is 3 or less, R 45 A surface treatment agent comprising a silane compound represented by
[25] , wherein each of the elements is an alkyl group having 1 to 4 carbon atoms, and p3 is an integer from 0 to 3.
[24] The surface treatment agent according to
[24] , wherein the molar ratio of the silane compound represented by formula (1) to the silane compound represented by formula (3) is 99.9:0.1 to 0.1:99.9.
[0006] The composition of this disclosure provides a laminate having a surface treatment layer with excellent abrasion resistance and fingerprint wiping properties.
[0007] As used herein, "hydrocarbon group" means a group containing carbon and hydrogen, obtained by removing a hydrogen atom from a hydrocarbon. Such hydrocarbon groups are not particularly limited, but include C 1-30 Examples of hydrocarbon groups include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The above-mentioned "aliphatic hydrocarbon group" may be linear, branched, or cyclic, and may be saturated or unsaturated. The hydrocarbon group may also contain one or more ring structures. The hydrocarbon group may be substituted with one or more substituents.
[0008] In the use herein, the substituents of the "hydrocarbon group" are not particularly limited, but may be, for example, a halogen atom, or one or more halogen atoms. 1-6 alkyl group, C 2-6 Alkenyl group, C 2-6 Alkynyl group, C 3-10 Cycloalkyl groups, C 3-10 Unsaturated cycloalkyl group, 5-10 membered heterocyclyl group, 5-10 membered unsaturated heterocyclyl group, C 6-10 Examples include one or more groups selected from aryl groups and heteroaryl groups with 5 to 10 members.
[0009] In this specification, the arylene group may be a monocyclic aromatic group or a polycyclic aromatic group. The arylene group is, for example, a divalent 1- to 3-cyclic aromatic group, specifically a divalent group obtained by removing two hydrogen atoms from benzene, naphthalene, anthracene, fluorene, or phenanthrene, as listed below. The above arylene group may be substituted with one or more substituents. The bond position is arbitrary.
[0010]
[0011] The articles of this disclosure include a substrate, a silicon oxide layer provided on the substrate, and a surface treatment layer in direct contact with the silicon oxide layer, wherein the surface treatment layer contains a siloxane compound having a dimethylsiloxane structure and lacking reactive functional groups. Hereinafter, the "siloxane compound having a dimethylsiloxane structure and lacking reactive functional groups" may be referred to as the "siloxane compound."
[0012] (Substrates) Substrates usable in this disclosure may consist of, for example, glass, resin (natural or synthetic resin, such as common plastic materials), metal, ceramics, semiconductors (silicon, germanium, etc.), fibers (textiles, nonwovens, etc.), fur, leather, wood, ceramics, stone, etc., building materials, sanitary products, or any suitable material.
[0013] For example, if the article to be manufactured is an optical component, the material constituting the surface of the substrate may be an optical component material, such as glass or transparent plastic. Also, if the article to be manufactured is an optical component, some layer (or film), such as a hard coat layer or an anti-reflective layer, may be formed on the surface (outermost layer) of the substrate. Either a single-layer anti-reflective layer or a multi-layer anti-reflective layer may be used for the anti-reflective layer. An example of an inorganic material that can be used for the anti-reflective layer is SiO 2 SiO, ZrO 2 , TiO 2 ,TiO,Ti 2 O 3 Ti 2 O 5 Al 2 O 3 Ta 2 O 5 Ta 3 O 5 , Nb 2 O 5 , HfO 2 Si 3 N 4 , CEO 2 , MgO, Y 2 O 3 , SnO 2 MgF 2 WO 3These are some examples. These inorganic materials may be used individually or in combination of two or more (for example, as a mixture). When a multilayer anti-reflective layer is used, the outermost layer is SiO 2 It is preferable to use and / or SiO. If the article to be manufactured is an optical glass component for a touch panel, a thin film using a transparent electrode, such as indium tin oxide (ITO) or indium zinc oxide, may be present on a part of the surface of the substrate (glass). The substrate may also have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomizing film layer, a hard coating film layer, a polarizing film, a phase difference film, and a liquid crystal display module, depending on its specific specifications.
[0014] As optical materials, a wide variety of optical materials are preferred, in addition to optical materials related to displays, etc.: for example, displays such as cathode ray tubes (CRTs; e.g., PC monitors), liquid crystal displays, plasma displays, organic EL displays, inorganic thin-film EL dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), field emission displays (FEDs), etc., or protective plates for such displays, or materials on which an anti-reflective coating has been applied to their surface.
[0015] Other examples of optical components include: lenses for eyeglasses and the like; front protective plates, anti-reflective plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; touch panel sheets for devices such as mobile phones and personal digital assistants; disc surfaces for optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MOs; optical fibers; and display surfaces for watches.
[0016] Furthermore, the articles of this disclosure may be medical devices or medical materials. Also, articles having layers obtained by this disclosure may be automotive interior and exterior components. Examples of exterior components include: windows, light covers, and exterior camera covers. Examples of interior components include: instrument panel covers, navigation system touch panels, and decorative interior components.
[0017] The shape of the substrate is not particularly limited and may be, for example, a plate, a film, or other form. Furthermore, the surface area of the substrate on which the surface treatment layer is to be formed may be at least a part of the substrate surface and can be appropriately determined according to the intended use and specific specifications of the article to be manufactured.
[0018] In one embodiment, the substrate may consist of a material that originally has hydroxyl groups, at least on its surface. Examples of such materials include glass, metals (especially base metals) on which a native oxide film or thermal oxide film is formed on the surface, ceramics, semiconductors, etc. Alternatively, if the material has insufficient hydroxyl groups, such as resins, or if it does not originally have hydroxyl groups, the substrate can be pretreated to introduce or increase hydroxyl groups on its surface. Examples of such pretreatment include plasma treatment (e.g., corona discharge) and ion beam irradiation. Plasma treatment can introduce or increase hydroxyl groups on the substrate surface and can also be suitably used to clean the substrate surface (remove foreign matter, etc.). Another example of such pretreatment is a method in which an interfacial adsorbent having carbon-carbon unsaturated bond groups is formed in the form of a monolayer on the substrate surface by the LB method (Langmuir-Bludget method) or chemical adsorption method, and then the unsaturated bonds are cleaved in an atmosphere containing oxygen or nitrogen.
[0019] In another embodiment, such a substrate may consist of a material in which at least its surface portion is made of another reactive group, such as a silicone compound having one or more Si-H groups, or an alkoxysilane.
[0020] In a preferred embodiment, the substrate is glass. Preferred glass includes sapphire glass, soda-lime glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystal glass, quartz glass, and crystallized glass, with chemically strengthened soda-lime glass, chemically strengthened alkali aluminosilicate glass, and chemically bonded borosilicate glass being particularly preferred.
[0021] (Silicon oxide layer) The silicon oxide layer is SiO 2This is an intermediate layer consisting of the following. By providing such an intermediate layer, the adhesion between the glass and the surface treatment layer is improved, durability is enhanced, and a stronger coating can be created.
[0022] The average thickness of the silicon oxide layer is preferably in the range of 0.5 to 100 nm. The average thickness refers to the average value of the layer thickness perpendicular to the surface of the substrate. By setting the thickness of the silicon oxide layer to be above the lower limit of the above range, the effect of improving adhesion by the silicon oxide layer is further enhanced. Methods for measuring the average thickness include reflectance measurement, transmission measurement, shape thickness measurement, mass thickness measurement, and physical property thickness measurement. For example, it can be obtained by taking measurements at 3 to 5 locations using spectroscopic ellipsometry and calculating the average value.
[0023] In one embodiment, the average thickness of the silicon oxide layer may be greater than the average film thickness of the surface treatment layer. For example, the ratio of the average thickness of the silicon oxide layer to the average film thickness of the surface treatment layer may be 100:1 to 2:1.
[0024] In one embodiment, the average thickness of the silicon oxide layer may be smaller than the average thickness of the surface treatment layer. For example, the ratio of the average thickness of the silicon oxide layer to the average thickness of the surface treatment layer may be 1:100 to 1:2.
[0025] In one embodiment, the average thickness of the silicon oxide layer may be about the same as the average thickness of the surface treatment layer. For example, the ratio of the average thickness of the silicon oxide layer to the average thickness of the surface treatment layer may be 1:1 to 2:1 or 1:2 to 1:1.
[0026] A silicon oxide layer can be formed by applying a silicon oxide precursor to the surface of a substrate. If the silicon oxide layer contains alkali metal atoms, the silicon oxide layer can be formed by applying a surface treatment agent containing a silicon oxide precursor and an alkali metal source to the surface of the substrate.
[0027] Examples of silicon oxide precursors include silicic acid, partial condensates of silicic acid, alkali metal silicates, silane compounds having a hydrolyzable group bonded to a silicon atom, and partial hydrolyzable condensates of the silane compounds. Silicic acid and its partial condensates can be dehydrated and condensed to produce silicon oxide, while alkali metal silicates can be converted to silicic acid or its partial condensates using an acid or cation exchange resin, and the resulting silicic acid or partial condensates can be dehydrated and condensed to produce silicon oxide. Examples of hydrolyzable groups in silane compounds having a hydrolyzable group bonded to a silicon atom include alkoxy groups and chlorine atoms. The hydrolyzable group in the silane compound can be hydrolyzed to a hydroxyl group, and the resulting silanol compound can be dehydrated and condensed to produce silicon oxide. Examples of silane compounds having a hydrolyzable group bonded to a silicon atom include alkoxysilanes such as tetraalkoxysilanes and alkyltrialkoxysilanes, and tetrachlorosilanes.
[0028] Examples of alkali metal sources include alkali metal hydroxides and water-soluble alkali metal salts. Examples of water-soluble alkali metal salts include alkali metal carbonates, alkali metal bicarbonates, alkali metal hydrochlorides, and alkali metal nitrates. Alkali metal hydroxides and alkali metal carbonates are preferred as alkali metal sources.
[0029] Furthermore, alkali metal silicates can be used as silicon oxide precursors and alkali metal sources. Alkali metal silicates can be converted to silicon oxide via silicic acid, but a small amount of alkali metal may remain in the silicon oxide produced during this process. Therefore, by adjusting the amount of residual alkali metal atoms, silicon oxide containing a predetermined amount of alkali metal atoms can be obtained.
[0030] In one embodiment, the silicon oxide layer contains alkali metal atoms in addition to silicon oxide.
[0031] Examples of the alkali metal atoms mentioned above include lithium, sodium, and potassium. The alkali metal atom is preferably sodium.
[0032] The alkali metal atom concentration in the silicon oxide layer can be measured using various surface analysis instruments, such as time-of-flight secondary ion mass spectrometry (TOF-SIMS), X-ray photoelectron spectroscopy (XPS), and X-ray fluorescence analysis (XRF).
[0033] The proportion of alkali metal atoms to the total atoms in the silicon oxide layer can be obtained by XPS depth profiling using ion sputtering. This is done by repeatedly alternating between XPS measurement and surface etching using an ion gun built into the XPS instrument.
[0034] In the silicon oxide layer, the average concentration of alkali metals in the region with a depth of 1 nm or less from the surface in contact with the surface treatment layer can be determined by obtaining a depth profile of alkali metal atom concentrations by TOF-SIMS depth profiling using ion sputtering, and then calculating the average value of alkali metal atom concentrations in that profile. TOF-SIMS depth profiling using ion sputtering is performed by alternately repeating TOF-SIMS measurement and surface etching by ion sputtering using an ion gun built into the TOF-SIMS apparatus.
[0035] The arithmetic mean roughness (Ra) on the surface of the silicon oxide layer is not particularly limited, but may be, for example, 20 nm or less, 10 nm or less, 5 nm or less, 3 nm or less, or 1 nm or less. The lower limit of the arithmetic mean roughness (Ra) is not particularly limited, but may be 0.1 nm or more. The value of Ra can be obtained by using the average value of the surface irregularities as a reference line and calculating the average value of the distance from that reference line. The arithmetic mean roughness can be measured using a laser microscope or an atomic force microscope (AFM).
[0036] Preferably, a layer containing a metal oxide is provided between the substrate and the silicon oxide layer.
[0037] Examples of metals include Ti, Zr, Hf, Nb, Ta, Al, Cr, Mo, and Mn, specifically Ti and Zr.
[0038] Examples of metal oxides include TiO 2 , ZrO 2 Ta 2 O 5 One could list these:
[0039] The layer containing the metal oxide may further contain inorganic particles and organic particles.
[0040] In one embodiment, the layer containing the metal oxide consists solely of the metal oxide.
[0041] In one embodiment, the layer containing the metal oxide consists of two or more types of metal oxides.
[0042] In one embodiment, the layer containing the metal oxide comprises the metal oxide and particles, where the particles refer to inorganic particles and / or organic particles.
[0043] The average film thickness of the layer containing the metal oxide is, for example, in the range of 0.5 to 100 nm, and more specifically, in the range of 1 to 20 nm.
[0044] In one embodiment, the average thickness of the metal oxide layer may be greater than the average thickness of the silicon oxide layer. For example, the ratio of the average thickness of the metal oxide layer to the average thickness of the surface treatment layer may be 100:1 to 2:1.
[0045] In one embodiment, the average thickness of the metal oxide layer may be less than the average thickness of the silicon oxide layer. For example, the ratio of the average thickness of the metal oxide layer to the average thickness of the silicon oxide layer may be 1:100 to 1:2.
[0046] In one embodiment, the average thickness of the layer containing the metal oxide may be approximately the same as the average thickness of the silicon oxide layer. For example, the ratio of the average thickness of the silicon oxide layer to the average thickness of the surface treatment layer may be 1:1 to 2:1 or 1:2 to 1:1.
[0047] (Surface treatment layer) The surface treatment layer can be formed by applying it in direct contact with the silicon oxide layer to cover the surface of the silicon oxide layer. The surface treatment layer contains a siloxane compound having a dimethylsiloxane structure and no reactive functional groups.
[0048] In one embodiment, the siloxane compound has a branched siloxane structure. A branched siloxane structure is a siloxane structure in which at least one Si branched structure is present.
[0049] The above branching structure preferably has the following structure: This is the case. Note that in the above formula, the Si atom is tetravalent, but other bonds are not shown.
[0050] In one embodiment, the above branching structure has the following structure: [* indicates a bonding site.] This is also possible. That is, it may be branched into two SiO atoms, or it may be branched into three SiO atoms. Note that in the above formula, the Si atom in SiO is tetravalent, but other bonding sites are not shown.
[0051] In one embodiment, the siloxane compound is given by formula (1): It is a compound represented by [formula].
[0052] R 1a Each of them is independent of C 1-6 hydrocarbon group or A group: It is a base represented by .
[0053] In one embodiment, R 1a is a methyl group. In one embodiment, R 1a is an n-butyl group. In one embodiment, R 1a It is group A.
[0054] Formula (1) may have a branched siloxane structure.
[0055] The above branching structure preferably has the following structure: This is the case. Note that in the above formula, the Si atom is tetravalent, but other bonds are not shown.
[0056] The above branching structure is the two R in equation (1) 1aIt may be present in only one of them, or in both.
[0057] In one embodiment, the above branching structure has the following structure: [* indicates a bonding site.] This is also possible. That is, it may be branched into two SiO atoms, or it may be branched into three SiO atoms. Note that in the above formula, the Si atom in SiO is tetravalent, but other bonding sites are not shown.
[0058] In the above embodiment, -R of formula (1) S -Si(R 2a ) 2 - (R 55 ) n1 If the group represented by - is called a B group, then the bond site represented by * is R 1a It may be included in and bonded to other atoms that are not bonded to the B group; R 1a It may be included in and bonded to an atom that is bonded to the B group; it may also be directly bonded to an atom included in the B group. If one * is included in the above branched structure, * is directly bonded to an atom included in the B group, or R 1a It is preferable that it is contained in and bonded to an atom that is bonded to the B group. If the above branched structure contains two or more *s, each * is independently R 1a It may be included in and bonded to other atoms that are not bonded to the B group; R 1a It may be included in and bonded to an atom that is bonded to the B group; it may also be bonded to an atom included in the B group. If there are two or more * symbols, at least one * symbol bond must be bonded to an atom included in the B group, or R 1a It is preferable that the atom contained in and bonded to the B group is bonded to the atom.
[0059] R 51 Each of them is independent of R 53 - (SiR 53 2 -R 61 ) ma It is a base represented by -.
[0060] R 53 Each of these is independently a methyl group or R 51’ That is the case.
[0061] R 53 In one embodiment, is a methyl group.
[0062] R 53 In one embodiment, each is independently a methyl group or R 51’ However, at least one R 53 is R 51’ That is the case.
[0063] R 51’ R 51 This is synonymous with R 51’ R 53 - (SiR 53 2 -R 61 ) ma It is a group represented by -. However, R 51 Medium, R 51’ The number is 20 or less, preferably 10 or less, more preferably 6 or less, and even more preferably 3 or less.
[0064] R 61 Each of these is independently an oxygen atom, or C 1-6 It is an alkylene group.
[0065] R 61 C in 1-6 The alkylene group may be linear or branched. 1-6 The alkylene group is preferably C 1-4 Alkylene group, more preferably C 2-4 It may be an alkylene group.
[0066] In one embodiment, R 61 The answer is O.
[0067] In one embodiment, a portion R 61 is O, and the other R 61 is C 1-6 It is an alkylene group.
[0068] R 51 In this material, there are two or more Si-O bonds, preferably three or more, more preferably four or more, and even more preferably six or more, for example, eight or more, nine or more, ten or more, or twelve or more.
[0069] R 53Each of these is independently a hydrocarbon group or R 51’ That is the case.
[0070] R 53 The hydrocarbon group in the above-mentioned compound may preferably be an alkyl group or an aryl group.
[0071] The alkyl group described above may be linear or branched. The alkyl group is preferably a C1-C6 alkyl group, more preferably a C1-C4 alkyl group. The alkyl group is particularly preferably a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, or a tert-butyl group.
[0072] The aryl group may be monocyclic or polycyclic. The aryl group is preferably an aryl group having 6 to 20 carbon atoms, more preferably an aryl group having 6 to 10 carbon atoms. The aryl group is particularly preferably a phenyl group.
[0073] R 53 The alkyl group is preferably an alkyl group having 1 to 4 carbon atoms.
[0074] Each of ma is an independent integer between 0 and 2. However, R 51 Medium, R 51’ The number is 3 or less.
[0075] R 52 This is a methyl group.
[0076] na is an integer between 1 and 3. In one embodiment, na is 2. In another embodiment, na is 3. Note that R 51’ If present, na is (SiR 53 2 -R 61 ) ma Each is selected independently.
[0077] R 54 is an oxygen atom or C 1-6 It is an alkylene group.
[0078] R 54 In one embodiment, is an oxygen atom.
[0079] R 54In one embodiment, C 1-6 It is an alkylene group. C 1-6 The alkylene group may have a linear or branched structure. Preferably, C 1-6 Alkylene groups have a linear structure.
[0080] n2 is either 0 or 1. In one embodiment, n2 is 0. In one embodiment, n2 is 1.
[0081] In a preferred embodiment, in group A, R 51 Each of them is independent of R 53 - (SiR 53 2 -R 61 ) ma It is a group represented by -, R 61 Each of these is independently an oxygen atom, or C 1-6 It is an alkylene group, R 53 Each of these is independently a methyl group or R 51’ And R 51’ R 51 This is synonymous, and ma is an integer between 0 and 2, independently of R. 51 Medium, R 51’ The number is 3 or less, R 52 is a methyl group, na is an integer from 1 to 3, and R 54 is an oxygen atom or C 1-6 It is an alkylene group, and n2 is either 0 or 1.
[0082] While not limited to specific structures, the following are examples of possible structures for group A.
[0083] In a preferred embodiment, group A is the following group: That is the case.
[0084] In one aspect, group A is the following group.
[0085] In one aspect, group A is the following group.
[0086] R 2a Each of them is independent of C 1-6 It is a hydrocarbon group or an A group. In one embodiment, R 2a is C 1-6 It is a hydrocarbon group. In one embodiment, R 2a is an A group. In one embodiment, R 2a is a methyl group. In one embodiment, R 2a It is an n-butyl group.
[0087] R S Each of these is independent and expressed by the following formula: [In the formula: R 73 Each of them is independently a single bond, C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 74 Each of them is independent of C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 76 Each of them is independent of C 1-6 It is an alkylene group, R 77 Each of these is an independently substituted arylene group, and R 78 Each of these is independently a single bond, or C 1-6 It is an alkylene group, R 79 Each of these is independently a single bond or an oxygen atom, and R 75 Each of these is an independent hydrocarbon group, x is an integer from 0 to 500, y is an integer from 0 to 500, z is an integer from 0 to 500, x + y + z is 1 or greater, and the order of existence of each repeating unit enclosed in parentheses with x, y, or z is arbitrary in the formula. This is the group represented by ].
[0088] R 73 Each of them is independently a single bond, C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and preferably C 1-12 Alkylene group, or -R 76-O-R 76 - is the case.
[0089] In one embodiment, R 73 It is a single bond.
[0090] In one embodiment, R 73 C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and preferably C 1-12 Alkylene group, or -R 76 -O-R 76 - is the case.
[0091] R 74 Each of them is independent of C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77-R 79 -R 76 -R 79 - is the case.
[0092] In one embodiment, R 74 Each of them is independent of C 1-12 Alkylene group, or -R 76 -O-R 76 - is the case.
[0093] In another embodiment, R 74 Each of these is independently of -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - is the case.
[0094] In one embodiment, R 73 Each of them is independent of C 1-12 Alkylene group, or -R 76 -O-R 76 - and R 74 Each of them is independent of C 1-12 Alkylene group, or -R 76 -O-R 76 - is the case.
[0095] In another embodiment, R 73 Each of them is independent of C 1-12 Alkylene group, or -R 76 -O-R 76 - and R 74 Each of these is independently of -R 78 -R 77 -R 78 -, -R 78 -R77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - is the case.
[0096] The above CC 1-12 The alkylene group may be linear or branched. 1-12 The alkylene group is preferably linear.
[0097] The above CC 1-12 The alkylene group is preferably C 2-8 Alkylene group, more preferably C 2-6 It is an alkylene group.
[0098] R 76 Each of them is independent of C 1-6 It is an alkylene group. 1-6 The alkylene group may be linear or branched. 1-6 The alkylene group is preferably linear.
[0099] The above CC 1-6 The alkylene group is preferably C 2-4 Alkylene group, more preferably C 2-3 It is an alkylene group.
[0100] In a preferred embodiment, multiple R 76 In a group containing all R 76 They are the same base.
[0101] R 77 These are all independently substituted arylene groups.
[0102] In one embodiment, R 77 Each of them operates independently. That is the case.
[0103] In one embodiment, R 77 This is a phenylene group.
[0104] In another embodiment, R 77 This is a naphthylene group.
[0105] The above-mentioned arylene group may have substituents. The number of substituents is not particularly limited, for example, 1 to 4, preferably 1 or 2.
[0106] In one embodiment, the phenylene group and naphthylene group may have substituents. The number of substituents is not particularly limited, and is, for example, 1 to 4, preferably 1 or 2. 2,5-substituted phenylene is preferred as the substituted phenylene group.
[0107] Each substituent relating to the above arylene group is independently -R 141 -R 142 That is the case.
[0108] R 141 This is a single bond, an oxygen atom, or a sulfur atom, preferably a single bond or an oxygen atom, and more preferably an oxygen atom.
[0109] R 142 C may be substituted with a halogen. 1-12 Alkyl alkyl group, -(O-R) 143 ) p , -R 144 -R 145 , -R 144 -OR 146 That is the case.
[0110] The halogen mentioned above is fluorine, chlorine, bromine, or iodine, and is preferably fluorine.
[0111] R 142 C in 1-12 The alkyl group may be linear or branched.
[0112] R 143 C 1-6 Alkylene group, preferably C 2-4 This is an alkylene group. Such an alkylene group may be linear or branched.
[0113] R 144 C 1-12 Alkylene group, preferably C 1-6 This is an alkylene group. Such an alkylene group may be linear or branched.
[0114] R 145 -CH=CH 2 , or -OCOCH=CH 2 That is the case.
[0115] R 146 is a hydrogen atom, or C 1-6 It is an alkyl group. Such alkyl group may be linear or branched. C 1-6 The alkyl group is preferably C 1-3 Alkyl alkyl group, comfort C 1-2 An alkyl group, more preferably a methyl group.
[0116] R 78 Each of these is independently a single bond, or C 1-6 It is an alkylene group. 1-6 The alkylene group may be linear or branched.
[0117] In one embodiment, R 78 It is a single bond.
[0118] In another embodiment, R 78 C 1-6 It is an alkylene group.
[0119] R 79 Each of these is independently either a single bond or an oxygen atom.
[0120] In one embodiment, R 79 It is a single bond.
[0121] In another embodiment, R 79 This is an oxygen atom.
[0122] R 75 These are each, independently, hydrocarbon groups. Such hydrocarbon groups may be substituted.
[0123] R 75Each of these is independently preferably an unsubstituted hydrocarbon group or a hydrocarbon group substituted with a halogen atom.
[0124] R 75 Each of these C atoms may be independently substituted, preferably with a halogen atom. 1-18 Alkyl or aryl group, more preferably C 1-18 It is an alkyl group or an aryl group.
[0125] The above CC 1-18 The alkyl group may be linear or branched, but is preferably linear. 1-18 The alkyl group is preferably C 1-10 Alkyl alkyl group, comfort C 1-6 Alkyl alkyl groups, more preferably C 1-4 An alkyl group, and more preferably a methyl group.
[0126] The above aryl group is preferably a phenyl group.
[0127] In one embodiment, R 75 Each of them is independent of C 1-6 Alkyl alkyl group, preferably C 1-4 An alkyl group, more preferably a methyl group.
[0128] In another embodiment, R 75 This is a phenyl group.
[0129] In another embodiment, R 75 Each of these is independently a methyl group or a phenyl group, preferably a methyl group.
[0130] x is an integer from 0 to 500, preferably from 0 to 300, more preferably from 0 to 100, even more preferably from 1 to 100, even more preferably from 5 to 60, and even more preferably from 10 to 30.
[0131] In one embodiment, x is 0.
[0132] In one embodiment, x is an integer from 1 to 500, preferably from 1 to 300, more preferably from 1 to 100, even more preferably from 5 to 60, even more preferably from 10 to 60, and particularly preferably from 10 to 30, for example, integers from 2 to 100, 2 to 50, 2 to 30, 5 to 100, 5 to 50, 5 to 30, or 5 to 20. By setting x within this range, the frictional durability of the resulting surface-treated layer is improved.
[0133] In another embodiment, x is an integer between 10 and 500, more preferably between 10 and 100, and even more preferably between 10 and 80, for example, an integer between 20 and 500, 20 and 100, 20 and 80, 30 and 80, 40 and 80, or 40 and 70. By setting x within this range, the tactile feel and slipperiness of the resulting surface-treated layer are improved.
[0134] In one embodiment, x may be an integer between 5 and 500, an integer between 5 and 300, an integer between 5 and 200, or an integer between 5 and 150.
[0135] y is an integer from 0 to 500, preferably from 0 to 300, more preferably from 0 to 100, even more preferably from 1 to 100, even more preferably from 5 to 60, and even more preferably from 10 to 30.
[0136] In one embodiment, y is 0.
[0137] In one embodiment, y is an integer from 1 to 500, preferably from 1 to 300, more preferably from 1 to 100, even more preferably from 5 to 60, even more preferably from 10 to 60, and particularly preferably from 10 to 30, for example, integers from 2 to 100, 2 to 50, 2 to 30, 5 to 100, 5 to 50, 5 to 30, or 5 to 20. By setting y within this range, the frictional durability of the resulting surface-treated layer is improved.
[0138] In another embodiment, y is an integer between 10 and 500, more preferably between 10 and 100, and even more preferably between 10 and 80, for example, an integer between 20 and 500, 20 and 100, 20 and 80, 30 and 80, 40 and 80, or 40 and 70. By setting y within this range, the tactile feel and slipperiness of the resulting surface-treated layer are improved.
[0139] z is an integer from 0 to 500, preferably from 0 to 300, more preferably from 0 to 100, even more preferably from 1 to 100, even more preferably from 5 to 60, and even more preferably from 10 to 30.
[0140] In one embodiment, z is 0.
[0141] In one embodiment, z is an integer from 1 to 500, preferably from 1 to 300, more preferably from 1 to 100, even more preferably from 5 to 60, even more preferably from 10 to 60, and particularly preferably from 10 to 30, for example, integers from 2 to 100, 2 to 50, 2 to 30, 5 to 100, 5 to 50, 5 to 30, or 5 to 20. By setting z within this range, the frictional durability of the resulting surface-treated layer is improved.
[0142] In another embodiment, z is an integer between 10 and 500, more preferably between 10 and 100, and even more preferably between 10 and 80, for example, an integer between 20 and 500, 20 and 100, 20 and 80, 30 and 80, 40 and 80, or 40 and 70. By setting z within this range, the tactile feel and slipperiness of the resulting surface-treated layer are improved.
[0143] In one embodiment, y is 0 and z is 0.
[0144] In another embodiment, x is 0 and y is 0.
[0145] In yet another embodiment, x is 0 and z is 0.
[0146] The above R S The base material may be a random polymer or a block polymer.
[0147] In one embodiment, R 1a and R 2aThis is a methyl group.
[0148] In one embodiment, R 1a , R 2a and R 75 This is a methyl group.
[0149] In one embodiment, R 1a and R 2a This is an n-butyl group.
[0150] In one embodiment, R 1a , R 2a and R 75 This is an n-butyl group.
[0151] In one embodiment, R 1a and R 2a It is represented by a methyl group, an n-butyl group, or an A group, however, R 1a and R 2a At least one of them is group A.
[0152] In one embodiment, R 1a and R 2a It is represented by a methyl group or an A group, however, R 1a and R 2a At least one of them is group A.
[0153] In one embodiment, R 1a and R 2a It is represented by an n-butyl group or an A group, however, R 1a and R 2a At least one of them is group A.
[0154] R 55 is an oxygen atom or C 1-6 It is an alkylene group. In one embodiment, R 55 is an oxygen atom. In one embodiment, R 55 C 1-6 It is an alkylene group.
[0155] n1 is either 0 or 1. In one embodiment, n1 is 0. In one embodiment, n1 is 1.
[0156] In one embodiment, the molecular weight distribution of the siloxane compound determined from the chromatogram obtained by gel permeation chromatography is 1.1 or higher, and may be, for example, 1.5 or higher. Polystyrene is used as the standard sample for gel permeation chromatography.
[0157] In one embodiment, the average molecular weight of the siloxane compound determined from the chromatogram obtained by gel permeation chromatography is 1,000 or more and less than 10,000, for example, 1,000 to 5,000. Polystyrene is used as the standard sample for gel permeation chromatography.
[0158] In one embodiment, the degree of dispersion of the siloxane compound, as determined from the chromatogram obtained by gel permeation chromatography, may be 2.0 or less, 1.5 or less, or 1.3 or less. The degree of dispersion is the ratio of the weight-average molecular weight to the number-average molecular weight, i.e., a value expressed as Mw / Mn. The smaller the degree of dispersion, the smaller the variation in the molecular weight of the siloxane compound.
[0159] Siloxane compounds are not particularly limited, but examples include the following compounds. (In the formula, TMS represents a trimethylsilyl group, and n is independently between 1 and 500.)
[0160] The above n may be an integer between 5 and 500, an integer between 5 and 300, an integer between 5 and 200, or an integer between 5 and 150. n is the above R S This can correspond to x in the given context.
[0161] The method for synthesizing siloxane compounds is not particularly limited, but can be carried out using, for example, the following methods.
[0162] (Manufacturing Method 1) In this manufacturing method, the siloxane compound of the present disclosure can be synthesized by reacting a silanol-modified siloxane compound at both ends with a chlorosilane compound.
[0163] For example, a siloxane compound modified with silanols at both ends is represented by the following formula: HO-(Si(CH) 3 )2 O) n Si(CH 3 ) 2 -OH
[0164] Examples of siloxane compounds with both terminals modified with silanol include DMS-S12, DMS-S14, DMS-S15, DMS-S21, DMS-S27, DMS-S31, DMS-S33, DMS-S35, DMS-S42, DMS-S45, DMS-S51, and PDS-1615, all manufactured by Gelest.
[0165] Examples of chlorosilane compounds include 3-chloro-1,1,1,3,5,5,5-heptamethyltrisiloxane, 3-chloro-1,1,1,5,5,5-hexamethyl-3-((trimethylsilyl)oxy)trisiloxane, and chlorotrimethylsilane.
[0166] The above reaction may also be carried out in the presence of a base. Specific examples of bases include diethylamine, triethylamine, aniline, and pyridine.
[0167] The temperature of the above reaction is not particularly limited. For example, the reaction temperature may be 0 to 150°C, 0 to 100°C, or 0 to 50°C.
[0168] The above reaction can be carried out in a solvent. As a solvent, for example, at least one selected from the group consisting of diethyl ether, tetrahydrofuran, cyclopentyl methyl ether, acetonitrile, dichloromethane, chloroform, benzene, toluene, and 1,3-bis(trifluoromethyl)benzene can be used. Alternatively, the above reaction may be carried out without a solvent.
[0169] (Manufacturing Method 2) In this manufacturing method, the siloxane compound of the present disclosure can be synthesized by reacting a silanol compound with an organolithium reagent to produce a lithium silanolate, then adding a cyclic siloxane compound, and further reacting it with a chlorosilane compound.
[0170] Examples of silanol compounds include 1,1,1,3,5,5,5-heptamethyltrisiloxan-3-ol, tris(trimethylsilyl)hydrogen silicate, and trimethylsilanol. Examples of organolithium reagents include n-butyllithium.
[0171] Examples of cyclic siloxane compounds include hexamethylcyclotrisiloxane.
[0172] Examples of chlorosilane compounds include 3-chloro-1,1,1,3,5,5,5-heptamethyltrisiloxane, 3-chloro-1,1,1,5,5,5-hexamethyl-3-((trimethylsilyl)oxy)trisiloxane, and chlorotrimethylsilane.
[0173] The above reaction is carried out in the presence of a base. Specific examples of bases include diethylamine, triethylamine, aniline, and pyridine.
[0174] The temperature of the above reaction is not particularly limited. For example, the reaction temperature may be -100 to 100°C, -100 to 50°C, or -100 to 0°C.
[0175] The above reaction can be carried out in a solvent. As a solvent, for example, at least one selected from the group consisting of diethyl ether, tetrahydrofuran, and cyclopentyl methyl ether can be used.
[0176] In one embodiment, the surface treatment layer contains 10 to 20% by mass of a siloxane compound relative to the entire surface treatment layer.
[0177] In one embodiment, the surface treatment layer contains 90 to 100% by mass of a siloxane compound relative to the entire surface treatment layer.
[0178] In one embodiment, the surface treatment layer contains 100% by mass of a siloxane compound relative to the entire surface treatment layer.
[0179] The average thickness of the surface treatment layer may be in the range of 0.5 to 100 nm. This allows for the acquisition of a surface treatment layer with good optical properties.
[0180] In one embodiment, the Si / C atomic ratio on the surface of the surface-treated layer, i.e., (concentration of Si originating from the surface-treated layer) / (concentration of C), is 0.42 or higher. This ratio can be measured by XPS measurement as described later. The Si / C atomic ratio on the surface of the surface-treated layer is not particularly limited, but may be 0.5 or lower.
[0181] Examples of siloxane compounds that can have a Si / C atomic ratio of 0.42 or more and 0.5 or less on the surface of the surface treatment layer include dimethyl silicone oil such as KF-96 manufactured by Shin-Etsu Chemical Co., Ltd., and methylphenyl silicone oil such as KF-50-100cs manufactured by Shin-Etsu Chemical Co., Ltd. By controlling the Si / C atomic ratio on the surface of the surface treatment layer to 0.42 or more and 0.5 or less, a surface treatment layer with excellent wear resistance and fingerprint wiping properties can be obtained.
[0182] Siloxane compounds that may have a Si / C atomic ratio of less than 0.42 on the surface of the surface treatment layer include methylstyryl-modified silicone oils such as KF-410 from Shin-Etsu Chemical Co., Ltd., long-chain alkyl-modified silicone oils such as KF-4701 from Shin-Etsu Chemical Co., Ltd., and silicone oils having a silalkylene skeleton such as DCS-8024 from Gelest. If the Si / C atomic ratio on the surface of the surface treatment layer is less than 0.42, either or both of the abrasion resistance and fingerprint wiping properties on the surface of the surface treatment layer may be insufficient.
[0183] The Si ratio derived from the surface treatment layer of the above layer is preferably 23% or more, and more preferably 26% or more. The upper limit of such siloxane concentration is not particularly limited, but may be, for example, 50% or less or 40% or less.
[0184] The layer on the substrate has a surface treatment layer-derived Si ratio of 23% or more, which improves the fingerprint-wiping properties of the layer.
[0185] The Si ratio derived from the surface treatment layer may vary depending on the amount of surface treatment agent used.
[0186] When the Si ratio derived from the surface treatment layer increases, for example to 40% or more, the slipperiness of the layer improves.
[0187] The above XPS measurement will be performed under the following conditions. The surface composition of the surface treatment layer applied to the substrate will be determined using an X-ray photoelectron spectroscopy (XPS) analyzer (ULVAC-PHI PHI5000VersaProbeII). The measurement conditions for the XPS analysis are as follows: X-ray source: Monochromatic AlKα rays (25W) Photoelectron detection area: 1400 μm × 300 μm Photoelectron detection angle: 45 degrees Pass energy: 23.5 eV Measured elements: Carbon (C1s) 278-298 eV, Nitrogen (N1s) 390-410 eV, Oxygen (O1s) 523-543 eV, Fluorine (F1s) 680-698 eV, Silicon (Si2p) 94-114 eV
[0188] After performing XPS measurements under the above conditions, the atomic ratios of C concentration, O concentration, Si concentration, and N concentration (atomic%) can be calculated from the peak areas of C1s, O1s, Si2p, and N1s.
[0189] After setting the main peak at C1s to 283.8 eV, the peaks detected at binding energy 95–105 eV were divided, and the peak area with a full width at half maximum of 1.65 ± 0.2 eV at 102.2 eV ± 0.2 eV was defined as peak 1. Peak 1 is the peak originating from the SiO2 layer.
[0190] When the peak area composed of peaks other than those mentioned above is defined as peak 2, peak 2 is a peak originating from the surface treatment layer.
[0191] The Si ratio derived from the surface treatment layer can be calculated using the following formula: Si ratio derived from surface treatment layer (%) = Peak 2 / (Peak 1 + Peak 2) × 100
[0192] The concentration of Si originating from the surface treatment layer can be calculated using the following formula: Concentration of Si originating from the surface treatment layer (atomic%) = (Si concentration) × (Percentage of Si originating from the surface treatment layer)
[0193] In a preferred embodiment, the C concentration originates from the surface treatment layer.
[0194] The surface treatment layer is formed using a composition containing a siloxane compound, for example, a surface treatment agent obtained by mixing a siloxane compound with a solvent. The siloxane compound may be one type or two or more types.
[0195] The surface treatment agent is further formulated with a siloxane compound, as in formula (3): It may contain a silane compound represented by the formula: where n3 is an integer from 0 to 200, n4 is 0 or 1, and R 41 R is an alkyl group having 1 to 4 carbon atoms. 42 Each of these independently consists of a methyl group or an A group: It is a group represented by R 51 Each of them is independent of R 53 - (SiR 53 2 -R 61 ) ma It is a group represented by -, R 61 Each of these is independently an oxygen atom, or C 1-6 It is an alkylene group, R 53 Each of these is independently a methyl group or R 51’ And R 51’ R 51 This is synonymous, and ma is an integer between 0 and 2, independently of R. 51 Medium, R 51’ The number is 3 or less, R 52 Each of these is independently a methyl group, and R 54 is an oxygen atom or C 1-6 It is an alkylene group, na is an integer from 1 to 3, z is 0 or 1, and R 43 This is an alkyl group having 1 to 4 carbon atoms or -Si[(-O-SiR 44 2 -) ma1 R 44 ] p3 (R 45 ) 3-p3 It is a group represented by R 44 Each of these independently consists of a hydrogen atom, a hydroxyl group, a C1-C4 alkyl group, or R 43’ And R43’ R 43 This is synonymous, and ma1 is an integer from 1 to 5, independently of each other, however R 43 Medium, R 43’ The number is 3 or less, R 45 Each of these is an alkyl group having 1 to 4 carbon atoms, and p3 is an integer from 0 to 3.
[0196] Preferably, the surface treatment agent comprises a siloxane compound represented by formula (1) and formula (3): It includes a silane compound represented by and .
[0197] n3 is an integer between 0 and 200, and may also be an integer between 0 and 100.
[0198] n4 is either 0 or 1. In one embodiment, n4 is 0. In one embodiment, n4 is 1.
[0199] R 41 These are alkyl groups having 1 to 4 carbon atoms.
[0200] R 42 Each of these independently consists of a methyl group or an A group: It is a group represented by R. 51 , R 52 , R 54 na and z have the same meaning as described above.
[0201] R 43 This is an alkyl group having 1 to 4 carbon atoms or -Si[(-O-SiR 44 2 -) ma1 R 44 ] p3 (R 45 ) 3-p3 It is a group represented by . In one embodiment, R 43 is an alkyl group having 1 to 4 carbon atoms. In one embodiment, R 43 is -Si[(-O-SiR 44 2 -) ma1 R 44 ] p3 (R 45 ) 3-p3 It is a base represented by .
[0202] R44 Each of these independently consists of a hydrogen atom, a hydroxyl group, a C1-C4 alkyl group, or R 43’ In one embodiment, R 44 is a hydrogen atom. In one embodiment, R 44 is a hydroxyl group. In one embodiment, R 44 is an alkyl group having 1 to 4 carbon atoms. In one embodiment, R 44 R 43’ That is the case.
[0203] R 43’ R 43 This is synonymous with R. 43 Medium, R 43’ The number is 3 or less. In one embodiment, R 43 Medium, R 43’ The number is 3. In one embodiment, R 43 Medium, R 43’ The number is 2. In one embodiment, R 43 Medium, R 43’ The number is 1.
[0204] Each of the values of ma1 is an integer between 1 and 5, independently of the others. In one embodiment, ma is 1.
[0205] R 45 Each of these is an alkyl group having 1 to 4 carbon atoms, independently of the others.
[0206] p3 is an integer between 0 and 3, preferably between 1 and 3.
[0207] The molar ratio of the siloxane compound to the silane compound represented by formula (3) is, for example, 99.9:0.1 to 0.1:99.9, preferably 10:90 to 50:50, and more preferably 10:90 to 30:70. The siloxane compound is preferably a silane compound represented by formula (1).
[0208] The surface treatment agent may further include a solvent, a non-reactive silicone compound (hereinafter referred to as "silicone oil") which can be understood as a silicone oil, an amine compound, alcohols, a surfactant, a polymerization inhibitor, a sensitizer, and the like.
[0209] In one embodiment, the surface treatment agent is R90 It further contains compounds represented by -OH. 90 is a monovalent organic group, preferably C 1-20 Alkyl alkyl group or C 3-20 These are alkylene groups, and these groups may be substituted with one or more substituents. Examples of substituents include hydroxyl groups, -OR 91 (Here, R 91 is C 1-10 Alkyl alkyl group, preferably C 1-3 Examples include alkyl groups (for example, a methyl group).
[0210] In one embodiment, the surface treatment agent is R 81 OR 82 , R 83 n8 C 6 H 6-n8 , R 84 R 85 R 86 Si-(O-SiR 87 R 88 ) m8 -R 89 , and (OSiR 87 R 88 ) m9 [In the formula R 81 ~R 89 Each of these is independently a monovalent organic group having 1 to 10 carbon atoms, m8 is an integer from 1 to 6, m9 is an integer from 3 to 8, and n8 is an integer from 0 to 6. The compound may further contain a solvent selected from the compounds represented by [ ].
[0211] The monovalent organic group having 1 to 10 carbon atoms may be linear, branched, or may even contain a cyclic structure.
[0212] In one embodiment, the monovalent organic group having 1 to 10 carbon atoms may contain an oxygen atom, a nitrogen atom, or a halogen atom.
[0213] In another embodiment, the monovalent organic group having 1 to 10 carbon atoms does not contain a halogen atom.
[0214] In a preferred embodiment, the monovalent organic group having 1 to 10 carbon atoms is a hydrocarbon group which may be substituted with a halogen, preferably an unsubstituted hydrocarbon group.
[0215] In one embodiment, the hydrocarbon group is a straight chain.
[0216] In another embodiment, the hydrocarbon group is a branched chain.
[0217] In another embodiment, the hydrocarbon group includes a cyclic structure.
[0218] In one embodiment, the solvent is R 81 OR 82 That is the case.
[0219] R 81 and R 82 Each of these is independently preferably a hydrocarbon group having 1 to 8 carbon atoms, more preferably C 1-6 an alkyl group, or C 5-8 It may be a cycloalkyl group.
[0220] In one embodiment, the solvent is R 83 n8 C 6 H 6-n8 That is the case.
[0221] C 6 H 6-n8 This is an n8 valent benzene ring. That is, R 83 n8 C 6 H 6-n8 This is n8 R 83 This is a benzene substituted with [substance name].
[0222] R 83 Each of these is a halogen, or a C which may be substituted with a halogen. 1-6 It can be an alkyl group.
[0223] n8 is preferably an integer between 1 and 3.
[0224] In one embodiment, the solvent is R 84 R 85 R 86 Si-(O-SiR 87 R 88) m8 -R 89 That is the case.
[0225] In one embodiment, the solvent is (OSiR 87 R 88 ) m9 (OSiR) 87 R 88 ) m9 This involves multiple OSIRs 87 R 88 It is a cyclic siloxane formed by the ring-like bonding of units.
[0226] R 84 ~R 89 Each of these is independently a hydrogen atom, or C 1-6 an alkyl group, preferably C 1-6 Alkyl alkyl group, more comfortably C 1-3 The alkyl group is more preferably a methyl group.
[0227] m8 is preferably an integer from 1 to 6, more preferably an integer from 1 to 5, and even more preferably 1 to 2.
[0228] m9 is preferably an integer between 3 and 6, more preferably an integer between 3 and 5.
[0229] In one embodiment, the solvent may be, for example, aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, or mineral spirits; aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene, or solvent naphtha; methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, or ethyl-2-hydroxybutyl acetate. Esters such as ethyl acetate, ethyl acetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, ethyl 2-hydroxyisobutyrate; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, 2-hexanone, cyclohexanone, methylaminoketone, 2-heptanone; ethyl cellosolve, methyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether, propylene Glycol ethers such as glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, and ethylene glycol monoalkyl ether; alcohols such as methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, and tert-amyl alcohol; glycols such as ethylene glycol and propylene glycol; cyclic ethers such as tetrahydrofuran, tetrahydropyran, and dioxane; amides such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone; ether alcohols such as methyl cellosolve, cellosolve, isopropyl cellosolve, butyl cellosolve, and diethylene glycol monomethyl ether; and diethylene glycol monoethyl ether acetate.Polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C; 6 F 13 CH 2 CH 3 (e.g., AsahiKlin (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), C 6 F 13 H (e.g., AsahiKlin (registered trademark) AC-2000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorola (registered trademark) H manufactured by Nippon Zeon Co., Ltd.); fluorinated hydrocarbons such as 1,1,2-trichloro-1,2,2-trifluoroethane, 1,2-dichloro-1,1,2,2-tetrafluoroethane, 1,1-dichloro-1,2,2,3,3-pentafluoropropane (HCFC225), 1,3-bis(trifluoromethyl)benzene; CF 3 CH 2 OH, CF 3 CF 2 CH 2 OH, (CF 3 ) 2 CHOH and other fluorinated alcohols; hydrofluoroethers (HFE) (e.g., perfluoropropyl methyl ether (C 3 F 7 OCH 3 ) (e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C 2 F 5 CF(OCH 3 )C 3 F 7)(e.g., Novec (trademark) 7300 manufactured by Sumitomo 3M Limited) and other alkyl perfluoroalkyl ethers (the perfluoroalkyl group and the alkyl group may be linear or branched), or CF 3 CH 2 OCF 2 CHF 2 (e.g., Asahiklin (registered trademark) AE-3000 manufactured by Asahi Glass Co., Ltd.), hydrofluoroolefins; CF 3 CH=CHCl (e.g., CELEFIN (registered trademark) 1233Z manufactured by Central Glass Co., Ltd.), CHF 2Examples include ethers such as CF=CHCl (for example, AMOLEA® AS-300 manufactured by Asahi Glass Co., Ltd.) and cyclopentyl methyl ether; siloxanes such as hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octamethylcyclotetrasiloxane, octamethylcyclopentasiloxane, decamethylcyclopentasiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, and tetradecamethylhexasiloxane; and dimethyl sulfoxide. Alternatively, mixed solvents of two or more of these are also possible. Among these, aliphatic hydrocarbons, aromatic hydrocarbons, esters, glycol ethers, alcohols, ether alcohols, and siloxanes are preferred. For example, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, mineral spirits, benzene, toluene, xylene, naphthalene, methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, ethyl-2-hydroxybutyrate, ethyl acetate acetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, 2- Ethyl propylene glycol monomethyl ether hydroxyisobutyrate, propylene glycol monoethyl ether, propylene glycol monobutyl ether, methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, diethylene glycol monomethyl ether, hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane, octamethylcyclotetrasiloxane, and octamethylcyclopentasiloxane are preferred.
[0230] Silicone oil is a different compound from siloxane compounds.
[0231] The silicone oil is not particularly limited, but for example, the following general formula (3a): R 101a - (SiR 103a 2 -O) a1 -SiR 103a 2 -R 101a ...(3a) [wherein: R 101a Each is independently a hydrogen atom or a hydrocarbon group, and R 103a Examples of compounds represented by [ ] include each being independently a hydrogen atom or a hydrocarbon group, where a1 is 2 to 3000.
[0232] The above R 103a Each of these is independently either a hydrogen atom or a hydrocarbon group. Such hydrocarbon groups may be substituted.
[0233] R 103a Each of these is independently preferably an unsubstituted hydrocarbon group or a hydrocarbon group substituted with a halogen atom.
[0234] R 103a Each of these C atoms may be independently substituted, preferably with a halogen atom. 1-6 Alkyl or aryl group, more preferably C 1-6 It is an alkyl group or an aryl group.
[0235] The above CC 1-6 The alkyl group may be linear or branched, but is preferably linear. 1-6 The alkyl group is preferably C 1-3 An alkyl group, more preferably a methyl group.
[0236] The above aryl group is preferably a phenyl group.
[0237] In one embodiment, R 103a Each of them is independent of C 1-6 Alkyl alkyl group, preferably C 1-3 An alkyl group, more preferably a methyl group.
[0238] In another embodiment, R 103a This is a n-butyl group.
[0239] In another embodiment, R 103a This is a phenyl group.
[0240] In another embodiment, R 103a This is a methyl group or a phenyl group, preferably a methyl group.
[0241] The above R 101a Each of these is independently a hydrogen atom or a hydrocarbon group, and the above R 3a It is synonymous with [the above].
[0242] R 101a Each of these C atoms may be independently substituted, preferably with a halogen atom. 1-6 Alkyl or aryl group, more preferably C 1-6 It is an alkyl group or an aryl group.
[0243] In one embodiment, R 101a Each of them is independent of C 1-6 Alkyl alkyl group, preferably C 1-3 An alkyl group, more preferably a methyl group.
[0244] In another embodiment, R 101a This is a n-butyl group.
[0245] In another embodiment, R 101a This is a phenyl group.
[0246] In another embodiment, R 101a This is a methyl group or a phenyl group, preferably a methyl group.
[0247] The above a1 is between 2 and 1500. a1 is preferably 5 or more, more preferably 10 or more, even more preferably 15 or more, for example 30 or more, or 50 or more. a1 is preferably 1000 or less, more preferably 500 or less, even more preferably 200 or less, even more preferably 150 or less, for example 100 or less, or 80 or less.
[0248] a1 can preferably be 5 to 1000, more preferably 10 to 500, even more preferably 15 to 200, and even more preferably 15 to 150.
[0249] Another silicone oil is (3b) below: R 101a -R SO2 -R 103a ...(3b) [wherein: R 101a Each of these is independently a hydrocarbon group, and R 103a Each of these is independently a hydrocarbon group, and R SO2 is, -R S -SiR 5 2 - and R S and R 5 This is synonymous with the above. Examples of compounds represented by ] are given.
[0250] The above-mentioned silicone oil may have an average molecular weight of 500 to 1,000,000, preferably 1,000 to 100,000. The molecular weight of the silicone oil can be measured using GPC (gel permeation chromatography).
[0251] Examples of the above silicone oil include -(SiR 3a 2 -O) a1 A linear or cyclic silicone oil in which a1 is 30 or less may be used. Linear silicone oils may be so-called straight silicone oils and modified silicone oils. Examples of straight silicone oils include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrogen silicone oil. Examples of modified silicone oils include straight silicone oils modified with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol, etc. An example of a cyclic silicone oil is cyclic dimethylsiloxane oil.
[0252] The above-mentioned silicone oil may be included in the surface treatment agent in an amount of, for example, 0 to 50% by mass, preferably 0.001 to 30% by mass, and more preferably 0.1 to 5% by mass.
[0253] In the surface treatment agent, such silicone oil may be included in an amount of, for example, 0 to 300 parts by mass, preferably 0 to 100 parts by mass, more preferably 0 to 50 parts by mass, and even more preferably 0 to 10 parts by mass, based on 100 parts by mass of the total of the compounds contained in the composition of the present disclosure (the sum of these if there are two or more compounds, and the same applies hereinafter).
[0254] Silicone oil contributes to improving the surface slipperiness of the surface-treated layer.
[0255] Examples of the alcohols mentioned above include methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, and tert-amyl alcohol. Adding these alcohols to the composition improves the stability of the composition.
[0256] Other components besides those listed above include, for example, tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, and methyltriacetoxysilane.
[0257] In addition to the components mentioned above, the surface treatment agent may contain trace amounts of impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and silane condensates.
[0258] In one embodiment, the surface treatment agent is for a dry coating method, preferably for vacuum deposition.
[0259] In one embodiment, the surface treatment agent is for a wet coating method, preferably an immersion coating.
[0260] The surface treatment agent can be impregnated into porous materials, such as porous ceramic materials, or metal fibers, such as steel wool compressed into a cotton-like form, to form pellets. These pellets can be used, for example, in vacuum deposition.
[0261] The coating method using the above-mentioned surface treatment agent is not particularly limited. For example, wet coating and dry coating methods can be used.
[0262] Examples of wet coating methods include immersion coating, spin coating, flow coating, spray coating, roll coating, gravure coating, wipe coating, squeegee coating, die coating, inkjet, casting, Langmuir-Bludget method, and similar methods.
[0263] Examples of dry coating methods include vapor deposition (usually vacuum deposition), sputtering, CVD, and similar methods. Specific examples of vapor deposition methods (usually vacuum deposition) include resistance heating, electron beams, high-frequency heating using microwaves, ion beams, and similar methods. Specific examples of CVD methods include plasma CVD, optical CVD, thermal CVD, and similar methods.
[0264] Furthermore, coating using the atmospheric pressure plasma method is also possible.
[0265] When using the wet coating method, the surface treatment agent may be diluted with a solvent before being applied to the substrate surface. From the viewpoint of the stability of the composition of this disclosure and the volatility of the solvent, the following solvents are preferably used: aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, and mineral spirits; aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene, and solvent naphtha; methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, and carboxymethyl acetate. Esters such as tol, diethyl oxalate, ethyl pyruvate, ethyl-2-hydroxybutyrate, ethyl acetacetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, and ethyl 2-hydroxyisobutyrate; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, 2-hexanone, cyclohexanone, methylaminoketone, and 2-heptanone; ethyl cellosolve, methyl cellosol Glycol ethers such as methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, and ethylene glycol monoalkyl ether; alcohols such as methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, and tert-amyl alcohol; glycols such as ethylene glycol and propylene glycol; cyclic ethers such as tetrahydrofuran, tetrahydropyran, and dioxane; amides such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone;Ether alcohols such as methyl cellosolve, cellosolve, isopropyl cellosolve, butyl cellosolve, diethylene glycol monomethyl ether; diethylene glycol monoethyl ether acetate; polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C; 6 F 13 CH 2 CH 3 (e.g., Asahiklin (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), C 6 F 13 H (e.g., Asahiklin (registered trademark) AC-2000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorola (registered trademark) H manufactured by Nippon Zeon Co., Ltd.); fluorinated hydrocarbons such as 1,1,2-trichloro-1,2,2-trifluoroethane, 1,2-dichloro-1,1,2,2-tetrafluoroethane, 1,1-dichloro-1,2,2,3,3-pentafluoropropane (HCFC225), 1,3-bis(trifluoromethyl)benzene; CF 3 CH 2 OH, CF 3 CF 2 CH 2 OH, (CF 3 ) 2 CHOH and other fluorinated alcohols; hydrofluoroether (HFE) (e.g., perfluoropropyl methyl ether (C 3 F 7 OCH 3 )(e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C 4 F 9 OCH 3 )(e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 )(e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C 2 F 5 CF(OCH3 ) C 3 F 7 ) (for example, Novec™ 7300 manufactured by Sumitomo 3M Limited) or alkyl perfluoroalkyl ethers (the perfluoroalkyl group and alkyl group may be linear or branched), or CF 3 CH 2 OCF 2 CHF 2 (For example, AsahiClean® AE-3000 manufactured by Asahi Glass Co., Ltd.), hydrofluoroolefins; CF 3 CH=CHCl (for example, CELEFIN® 1233Z manufactured by Central Glass Co., Ltd.), CHF 2Examples include ethers such as CF=CHCl (for example, AMOLEA® AS-300 manufactured by Asahi Glass Co., Ltd.) and cyclopentyl methyl ether; siloxanes such as hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octamethylcyclotetrasiloxane, octamethylcyclopentasiloxane, decamethylcyclopentasiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, and tetradecamethylhexasiloxane; dimethyl sulfoxide, etc. Alternatively, mixed solvents of two or more of these are also possible. Among these, aliphatic hydrocarbons, aromatic hydrocarbons, esters, glycol ethers, alcohols, ether alcohols, and siloxanes are preferred. For example, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, mineral spirits, benzene, toluene, xylene, naphthalene, methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, ethyl-2-hydroxybutyrate, ethyl acetate acetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, 2- Ethyl propylene glycol monomethyl ether hydroxyisobutyrate, propylene glycol monoethyl ether, propylene glycol monobutyl ether, methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, diethylene glycol monomethyl ether, hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane, octamethylcyclotetrasiloxane, and octamethylcyclopentasiloxane are preferred.
[0266] In one aspect, when using the wet coating method, the solvent is, for example, R 90 Compounds represented by -OH can be used. 90is a monovalent organic group, preferably C 1-20 Alkyl alkyl group or C 3-20 These are alkylene groups, and these groups may be substituted with one or more substituents. Examples of substituents include hydroxyl groups, -OR 91 (Here, R 91 is C 1-10 Alkyl alkyl group, preferably C 1-3 Examples include alkyl groups (for example, a methyl group).
[0267] When using the dry coating method, the surface treatment agent of this disclosure may be subjected to the dry coating method as is, or it may be diluted with the solvent described above before being subjected to the dry coating method.
[0268] In another embodiment, the article of the present disclosure comprises a substrate, a silicon oxide layer provided on the substrate, and a surface treatment layer in direct contact with the silicon oxide layer, wherein a branched siloxane structure is detected in the surface treatment layer by X-ray photoelectron spectroscopy.
[0269] The base material, silicon oxide layer, surface treatment layer, and branched siloxane structure are all the same as described above.
[0270] Branched siloxane structures can be detected in X-ray photoelectron spectroscopy (XPS) by further dividing Peak 2 into two and fitting them together. For XPS, the ULVAC-PHIE PHI5000VersaProbeII can be used.
[0271] The articles, compositions used in the articles, and siloxane compounds of this disclosure have been described in detail above. However, the articles, compositions used in the articles, and siloxane compounds of this disclosure are not limited to those exemplified above.
[0272] The present invention will be further described in detail by the following examples, but the present invention is not limited thereto.
[0273] (Synthesis Example 1) 10.02 g of 1,1,1,3,5,5,5-heptamethyltrisiloxane, 89.66 g of dichloromethane, and 11.49 g of trichloroisocyanuric acid were added separately and heated to 40°C and stirred for 1 hour. Subsequently, 7.55 g of compound (1) was obtained by distillation purification.
[0274] Compound (1)
[0275] (Synthesis Example 2) 2.0 g of terminal silanol polydimethylsiloxane (DMS-S12,16-32cSt, Gelest.Inc), 5 mL of toluene, and 0.2 mL of pyridine were added separately. Then, a solution of 1.39 g of compound (1), 5 mL of toluene, and 0.2 mL of pyridine was added dropwise while cooling in an ice bath. After addition, the mixture was stirred at room temperature for 2 hours. Subsequently, 3.02 g of compound (2) was obtained by purification.
[0276] Compound (2) (Average value of n is 7) (Number-average molecular weight approximately 1,000, degree of dispersion Mw / Mn 1.20)
[0277] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: 0.10-0.80 (m), 0.35-0.43 (s)
[0278] (Synthesis Example 3) 2.0 g of terminal silanol polydimethylsiloxane (DMS-S14,35-45cSt, Gelest. Inc.), 5 mL of toluene, and 0.17 mL of pyridine were added separately. Then, a solution of 1.07 g of compound (1), 5 mL of toluene, and 0.17 mL of pyridine was added dropwise while cooling in an ice bath. After addition, the mixture was stirred at room temperature for 2 hours. Subsequently, 3.27 g of compound (3) was obtained by purification. Compound (3) (Average value of n is 13) (Number-average molecular weight approximately 1,900, degree of dispersion Mw / Mn 1.25) 1 H NMR (CDCl3, 400 MHz) δ[ppm]: 0.10-0.80 (m), 0.35-0.43 (s)
[0279] (Synthesis Example 4) 2.5 g of terminal silanol polydimethylsiloxane (DMS-S15,45-85cSt, Gelest. Inc.), 5 mL of toluene, and 0.24 mL of pyridine were added separately. Then, a solution of 1.55 g of compound (1), 5 mL of toluene, and 0.24 mL of pyridine was added dropwise while cooling in an ice bath. After addition, the mixture was stirred at room temperature for 2 hours. Subsequently, 1.04 g of compound (4) was obtained by purification. Compound (4) (Average value of n is 35) (Number-average molecular weight approximately 5,000, degree of dispersion Mw / Mn 1.44) 1 H NMR (CDCl3, 400 MHz) δ[ppm]: 0.10-0.80 (m), 0.35-0.43 (s)
[0280] Compounds (5) to (8) used were KF96-10cs (number average molecular weight approximately 2,000, dispersion degree Mw / Mn 1.13), 20cs (number average molecular weight approximately 3,000, dispersion degree Mw / Mn 1.25), 100cs (number average molecular weight approximately 5,000, Mw / Mn 1.642), and 300cs (number average molecular weight approximately 10,000, dispersion degree 1.95), all manufactured by Shin-Etsu Chemical Co., Ltd. The above number average molecular weights were measured using GPC.
[0281] (GPC measurement conditions) GPC: Agilent 1260 Infinity II Column: Shodex GPC KF-803L Flow rate: 0.5 ml / min Concentration: 0.5 wt% Solvent: THF (tetrahydrofuran) Injection volume: 20 μL Detector: RI Standard material: Polystyrene
[0282] <Preparation of Surface Treatment Agent> A surface treatment agent was prepared by combining compound A and compound B according to Table 1 below. The solid content concentration of the compound relative to the solvent was 20% by weight.
[0283]
[0284] <Na-containing intermediate layer forming material> 2.2 g of sodium hydroxide was dissolved in 24 g of distilled water to obtain an 8.4% by mass sodium hydroxide aqueous solution. 24 g of this 8.4% by mass sodium hydroxide aqueous solution and 20 g of MS gel (M.S.GEL D-100-60A (manufactured by AGC SI-TECH)) were mixed to allow the sodium hydroxide aqueous solution to be absorbed into the MS gel. The MS gel that absorbed the sodium hydroxide aqueous solution was dried at 25°C for 8 hours, then molded in a tablet molding machine (4 MPa for 1 minute), and fired at 1,000°C for 1 hour to obtain molded body 1 (pellet, silicon dioxide containing sodium).
[0285] <Formation of base layer and surface treatment layer> Surface treatment agents 1 to 8 prepared above were vacuum deposited onto chemically strengthened glass (Corning Gorilla Glass, 0.7 mm thick). Specifically, 0.1 g of surface treatment agent was filled into a molybdenum boat in the vacuum deposition apparatus, and the inside of the vacuum deposition apparatus was subjected to a pressure of 3.0 × 10⁻⁶ -3 The air was evacuated to below Pa. Then, depending on the combination of substrate layers to be used, a substrate layer of the desired thickness was formed by depositing molded body 1, silicon dioxide, titanium dioxide, and zirconia dioxide using an electron beam deposition method. Subsequently, a surface treatment layer was formed by heating the boat using a resistance heating method. After that, the surface treatment layer was obtained by heat treatment in an oven at 150°C for 2 hours. When two types of substrate layers are combined, the substrate layer 1 is on the substrate side and the substrate layer 2 is on the surface treatment agent side, so they are formed in the order of substrate layer 1 → substrate layer 2 → surface treatment layer. Substrate layers 1 and 2 were each deposited to a thickness of 5 nm.
[0286] <Evaluation> [Evaluation of fingerprint wiping properties] The fingerprint wiping properties of the surface treatment layer formed above were evaluated using the following procedure.
[0287] (Application of artificial fingerprint stamp) After the surface treatment layer was formed, any excess on the surface was wiped off with ethanol. An artificial fingerprint solution was stamped onto the surface of the surface treatment layer.
[0288] The composition of the artificial fingerprint solution and the stamping conditions are shown below. (Method for preparing the artificial fingerprint solution) The artificial fingerprint solution was prepared as follows, with reference to Japanese Patent Publication No. 2006-120317. 1.6 g of Kanto loam (JIS test powder 1 (11 types), Japan Powder Industry Technology Association) and 32 g of methoxypropanol (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed. 4 g of triolein (manufactured by Tokyo Chemical Industry Co., Ltd.) was added and stirred. (Method for creating an artificial fingerprint sheet) A glass plate (Corning Gorilla Glass, 0.7 mm thick) was UV washed for 10 minutes. 1.1 mL of the artificial fingerprint solution prepared above was spin-coated onto the glass plate (5000 rpm, 10 seconds). The resulting glass plate was then heated in a drying oven at 60°C for 3 minutes.
[0289] (Stamp Conditions) Stamp: Silicone rubber (imprinting surface Φ16 mm) The stamp was pressed onto the artificial fingerprint sheet created above with a load of 5 kgw for 10 seconds to transfer the artificial fingerprint. The stamp with the transferred artificial fingerprint was pressed onto a sample to be evaluated for wipeability with a load of 5 kgw for 10 seconds to adhere the artificial fingerprint solution.
[0290] (Method for wiping off artificial fingerprints) The formed surface treatment layer was wiped 10 times using a rubbing tester (manufactured by Imoto Seisakusho Co., Ltd.) under the following conditions: • Wiping method: Friction element: Bencot M-3II (product name, manufactured by Asahi Kasei Corporation) Travel distance (one way): 60 mm Travel speed: 8,400 mm / min Load: 1000 g / 3 cm²
[0291] After performing the wiping procedure described above, the degree of artificial fingerprint adhesion on the stamp area was visually inspected and scored.
[0292] The criteria for evaluating fingerprint wiping ability are as follows: (Criteria for evaluating fingerprint wiping ability) 5 Not detected at all 4 Almost not detected 3 Only vaguely detected 2 Detected 1 Clearly detected
[0293] [Evaluation of Cotton Abrasion Durability] (Evaluation Method) The formed surface treatment layer was subjected to abrasion using a rubbing tester (manufactured by Imoto Seisakusho Co., Ltd.) under the following conditions, and the water contact angle was measured after 1000 abrasion cycles. Abrasion method: Friction element: Bencot M-3II (product name, manufactured by Asahi Kasei Corporation) Travel distance (one way): 60 mm Travel speed: 8,400 mm / min Load: 1000 g / 3 cm²
[0294] (Contact Angle Measurement Method) The contact angle was measured using a fully automatic contact angle meter, DropMaster 700 (manufactured by Kyowa Interface Science Co., Ltd.), in a 25°C environment. Specifically, the substrate with the surface treatment layer to be measured was placed horizontally, 2 μL of water was dropped onto its surface from a microsyringe, and the static contact angle was measured by capturing a still image 1 second after dropping with a video microscope. The static contact angle was measured at five different points on the surface treatment layer of the substrate, and the average value was used.
[0295] (Cotton abrasion durability evaluation: Judgment criteria) The water contact angle after 1000 abrasions is as follows: ○: 90° or more ×: Less than 90°
[0296] Table 2 shows the combinations of undercoat and surface treatment agents used, as well as the cotton abrasion resistance and fingerprint wiping properties on the formed surface treatment layer.
[0297]
[0298] [XPS Measurement Method] The surface composition of the surface treatment layer applied to the substrate was determined using an X-ray photoelectron spectroscopy (XPS) analyzer (ULVAC-PHI PHI5000VersaProbeII). The measurement conditions for XPS analysis were as follows: • X-ray source: Monochromatic AlKα rays (25W) • Photoelectron detection area: 1400 μm × 300 μm • Photoelectron detection angle: 45 degrees • Pass energy: 23.5 eV • Measured elements: Carbon (C1s) 278-298 eV, Nitrogen (N1s) 390-410 eV, Oxygen (O1s) 523-543 eV, Silicon (Si2p) 94-114 eV
[0299] After setting the main peak at C1s to 283.8 eV, the peak detected at binding energy 95–105 eV was divided, and the peak area with a half-width of 1.65 ± 0.2 eV at 102.2 eV ± 0.2 eV was defined as peak 1. Peak 1 is SiO 2 These peaks originate from the layer or glass substrate.
[0300] Peak 2 was defined as the peak area composed of peaks other than those mentioned above. Peak 2 is a peak originating from the surface treatment layer having a siloxane structure.
[0301] The Si ratio derived from the surface treatment layer was calculated using the following formula: Si ratio derived from surface treatment layer (%) = Peak 2 / (Peak 1 + Peak 2) × 100
[0302] The Si concentration derived from the surface treatment layer was calculated using the following formula: Si concentration derived from the surface treatment layer (atomic%) = (Si concentration) × (Si ratio derived from the surface treatment layer)
[0303] The Si / C ratio derived from the surface treatment layer was calculated using the following formula: Si / C ratio derived from the surface treatment layer = (Concentration of Si derived from the surface treatment layer) / (Concentration of C)
[0304] Table 3 below shows the Si / C ratio derived from the surface treatment layer obtained by XPS measurement.
[0305] [AFM Measurement Method] The arithmetic mean roughness of the surface treatment layer applied to the substrate was measured using an atomic force microscope (AFM, Hitachi High-Tech Corporation AFM5200S). The measurement conditions were as follows: • Measurement mode: DFM • Field of view: 10 μm × 10 μm • Number of data points: 256 × 256 • Scanning frequency: 1.0 Hz
[0306] For Examples 1-21 and Comparative Examples 1-4 in Table 1 above, the surface-treated surfaces were measured using AFM, and it was confirmed that the arithmetic mean roughness of all surfaces was 3 nm or less.
[0307] The articles of this disclosure can be suitably used for a wide variety of applications.
Claims
1. An article comprising: a base material; a silicon oxide layer provided on the base material; and a surface treatment layer in direct contact with the silicon oxide layer, wherein the surface treatment layer contains a siloxane compound having a dimethylsiloxane structure and no reactive functional groups.
2. The article according to claim 1, wherein the average thickness of the silicon oxide layer is in the range of 0.5 to 100 nm.
3. The article according to claim 1 or 2, wherein the silicon oxide layer contains alkali metal atoms.
4. The article according to claim 3, wherein the alkali metal atom is sodium.
5. The article according to any one of claims 1 to 4, wherein the arithmetic mean roughness (Ra) of the surface of the silicon oxide layer is 20 nm or less.
6. The article according to any one of claims 1 to 5, wherein the arithmetic mean roughness (Ra) of the surface of the silicon oxide layer is 10 nm or less.
7. The article according to any one of claims 1 to 6, wherein the arithmetic mean roughness (Ra) of the surface of the silicon oxide layer is 5 nm or less.
8. The article according to any one of claims 1 to 7, further comprising a layer containing a metal oxide between the substrate and the silicon oxide layer.
9. The article according to any one of claims 1 to 8, wherein the siloxane compound has a branched siloxane structure.
10. The siloxane compound is a compound represented by the formula (1): where R 77 , 78 , 76 , 77 , 77 , 78 , 79 , 79 , 77 , 78 , 78 , 78 , 79 , 79 , 78 , 76 , 77 is independently a hydrocarbon group of C 1-6 or an A group: where R 51 is independently a group represented by R 53 -(SiR 53 2 -R 61 ) ma -; R 61 is independently an oxygen atom or a C 1-6 alkylene group; R 53 is independently a methyl group or R 51’ ; R 51’ is synonymous with R 51 ; ma is independently an integer of 0 to 2; provided that in R 51 , the number of R 51’ is 3 or less; R 52 is independently a methyl group; na is an integer of 1 to 3; R 54 is an oxygen atom or a C 1-6 alkylene group; n2 is 0 or 1; R S is independently the following formula: [where: R 73 is independently a single bond, a C 1-12 alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R<00000 79 -R 77 -R 79 -R 76 -R 79 - and R 74 Each of them is independent of C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 76 Each of them is independent of C 1-6 It is an alkylene group, R 77 Each of these is an independently substituted arylene group, and R 78 Each of these is independently a single bond, or C 1-6 It is an alkylene group, R 79 Each of these is independently a single bond or an oxygen atom, and R 75 Each of these is an independent hydrocarbon group, where x is an integer from 0 to 500, y is an integer from 0 to 500, z is an integer from 0 to 500, x + y + z is 1 or greater, and the order of existence of each repeating unit enclosed in parentheses with x, y, or z is arbitrary in the formula. The group is represented by ], R 2a Each of them is independent of C 1-6 A group represented by a hydrocarbon group or an A group, R 55 is an oxygen atom or C 1-6 The article according to any one of claims 1 to 9, wherein it is an alkylene group and n1 is 0 or 1.
11. R 1a and R 2a The article according to claim 10, wherein is a methyl group.
12. R 1a and R 2a It is represented by a methyl group, an n-butyl group, or an A group, however, R 1a and R 2a The article according to claim 10, wherein at least one of the elements is element A.
13. The article according to any one of claims 1 to 12, wherein the Si / C atomic ratio on the surface of the surface treatment layer is 0.42 or more.
14. The article according to any one of claims 1 to 13, wherein the surface treatment layer comprises at least one of the following silane compounds. (In the formula, TMS represents a trimethylsilyl group, and n is independently between 1 and 500.) 15. The article according to any one of claims 1 to 14, wherein the substrate is a glass substrate.
16. An article that is an optical component, as described in any one of claims 1 to 15.
17. An article according to any one of claims 1 to 16, which is a display.
18. Formula (1): [where: R 1a are each independently a hydrocarbon group of C 1-6 or an A group: is a group represented by, and R 51 are each independently R 53 -(SiR 53 2 -R 61 ) ma - is a group represented by, and R 61 are each independently an oxygen atom or a C 1-6 [[ID= 79 -R 76 -R 79 - and R 74 Each of them is independent of C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 76 Each of them is independent of C 1-6 It is an alkylene group, R 77 Each of these is an independently substituted arylene group, and R 78 Each of these is independently a single bond, or C 1-6 It is an alkylene group, R 79 Each of these is independently a single bond or an oxygen atom, and R 75 Each of these is an independent hydrocarbon group, where x is an integer from 0 to 500, y is an integer from 0 to 500, z is an integer from 0 to 500, x + y + z is 1 or greater, and the order of existence of each repeating unit enclosed in parentheses with x, y, or z is arbitrary in the formula. The group is represented by ], R 2a Each of them is independent of C 1-6 A group represented by a hydrocarbon group or an A group, R 55 is an oxygen atom or C 1-6 A silane compound represented by [an alkylene group, where n1 is 0 or 1].
19. R 1a and R 2a The silane compound according to claim 18, wherein is a methyl group.
20. R 1a and R 2a It is represented by a methyl group, an n-butyl group, or an A group, however, R 1a and R 2a The silane compound according to claim 18, wherein at least one of the groups is an A group.
21. A silane compound according to any one of claims 18 to 20, wherein the molecular weight distribution determined from the chromatogram obtained by gel permeation chromatography is 1.1 or greater.
22. The silane compound according to any one of claims 18 to 21, wherein the molecular weight distribution determined from the chromatogram obtained by gel permeation chromatography is 1.5 or greater.
23. The silane compound according to any one of claims 18 to 22, wherein the average molecular weight determined from the chromatogram obtained by gel permeation chromatography is 1,000 or more and less than 10,000.
24. Formula (1): [In the formula: R 1a Each of them is independent of C 1-6 hydrocarbon group or A group: It is a group represented by R 51 Each of them is independent of R 53 - (SiR 53 2 -R 61 ) ma It is a group represented by -, R 61 Each of these is independently an oxygen atom, or C 1-6 It is an alkylene group, R 53 Each of these is independently a methyl group or R 51’ And R 51’ R 51 This is synonymous, and ma is an integer between 0 and 2, independently of R. 51 Medium, R 51’ The number is 3 or less, R 52 Each of these is independently a methyl group, na is an integer from 1 to 3, and R 54 is an oxygen atom or C 1-6 It is an alkylene group, n2 is 0 or 1, R S Each of these is independent and expressed by the following formula: [In the formula: R 73 Each of them is independently a single bond, C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 74 Each of them is independent of C 1-12 Alkylene group, -R 76 -O-R 76 -, -R 78 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 77 -R 78 -, -R 78 -R 77 -R 79 -R 76 -R 79 -R 77 -R 78 -, or -R 79 -R 76 -R 79 -R 77 -R 79 -R 76 -R 79 - and R 76 Each of them is independent of C 1-6 It is an alkylene group, R 77 Each of these is an independently substituted arylene group, and R 78 Each of these is independently a single bond, or C 1-6 It is an alkylene group, R 79 Each of these is independently a single bond or an oxygen atom, and R 75 Each of these is an independent hydrocarbon group, where x is an integer from 0 to 500, y is an integer from 0 to 500, z is an integer from 0 to 500, x + y + z is 1 or greater, and the order of existence of each repeating unit enclosed in parentheses with x, y, or z is arbitrary in the formula. The group is represented by ], R 2a Each of them is independent of C 1-6 A group represented by a hydrocarbon group or an A group, R 55 is an oxygen atom or C 1-6 A silane compound represented by [an alkylene group, where n1 is 0 or 1] and formula (3): [In the formula: n3 is an integer between 0 and 200, n4 is 0 or 1, R 41 R is an alkyl group having 1 to 4 carbon atoms. 42 Each of these independently consists of a methyl group or an A group: It is a group represented by R 51 Each of them is independent of R 53 - (SiR 53 2 -R 61 ) ma It is a group represented by -, R 61 Each of these is independently an oxygen atom, or C 1-6 It is an alkylene group, R 53 Each of these is independently a methyl group or R 51’ And R 51’ R 51 This is synonymous, and ma is an integer between 0 and 2, independently of R. 51 Medium, R 51’ The number is 3 or less, R 52 Each of these is independently a methyl group, and R 54 is an oxygen atom or C 1-6 It is an alkylene group, na is an integer from 1 to 3, z is 0 or 1, and R 43 This is an alkyl group having 1 to 4 carbon atoms or -Si[(-O-SiR 44 2 -) ma1 R 44 ] p3 (R 45 ) 3-p3 It is a group represented by R 44 Each of these independently consists of a hydrogen atom, a hydroxyl group, a C1-C4 alkyl group, or R 43’ And R 43’ R 43 This is synonymous, and ma1 is an integer from 1 to 5, independently of each other, however R 43 Medium, R 43’ The number is 3 or less, R 45 A surface treatment agent comprising a silane compound represented by [ ], where each is an alkyl group having 1 to 4 carbon atoms, and p3 is an integer from 0 to 3.
25. The surface treatment agent according to claim 24, wherein the molar ratio of the silane compound represented by formula (1) to the silane compound represented by formula (3) is 99.9:0.1 to 0.1:99.9.