Silane compound

Abstract

This silane compound is represented by formula (1). The reference symbols are as defined in the description.

Description

Silane compound

[0001] The present disclosure relates to a silane compound.

[0002] It is known that certain silane compounds can provide excellent water and oil repellency when used for surface treatment of a substrate (Patent Document 1).

[0003] Japanese Patent Application Laid-Open No. 2019-44179

[0004] An object of the present disclosure is to provide a silane compound capable of forming a surface treatment layer having good ultraviolet durability, fingerprint wiping property, and friction durability.

[0005] The present disclosure provides the following. [1] Formula (1): [In the formula: n is an integer of 10 to 300, p is an integer of 11 to 60, X is -C(=O)NR ４１ -, -C(=O)- or -C(=O)O-, and R ４１ is a hydrogen atom, an oxyalkylene-containing group, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, r is 0 or 1, and R ｐ is a single bond or an alkylene group having 1 to 30 carbon atoms, X ｂ is a silicon atom, a carbon atom or a nitrogen atom, and R ａ１ are each independently -Z １ [[ID=Z9]] -SiR ｂ１ ｐ１ R ｃ１ ｑ１ and R ｂ１ are each independently a hydroxyl group or a hydrolyzable group, and R ｃ１ are each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and Z １ are each independently a single bond, an alkylene group having 1 to 30 carbon atoms or -(CH ２ ) ｓ１ -(O) ｓ２ -, s1 is an integer of 0 to 30, s2 is an integer of 1 to 10, provided that the order of existence of each repeating unit enclosed in parentheses with s1 and s2 is Z １The structure is arbitrary, except for structures in which oxygen atoms are bonded in a continuous chain, p1 is an integer between 0 and 3, q1 is an integer between 0 and 3, k1, l1 and m1 are independent integers of 0 or more, however, the sum of l1 and p1 is 1 or more, and the sum of k1, l1 and m1 is X ｂ The valence of is -1. A silane compound represented by [2] The silane compound described in [1], where r is 0. [3] r is 0, X ｂ [1] or [2] is a silane compound, wherein [4] r is 1, and [5] r is 1, and X ｂ A is a carbon atom, k1 is 2, l1 is 0 or 1, m1 is 0 or 1, p1 is an integer from 0 to 3, each independently, and q1 is an integer from 0 to 3, provided that the sum of l1 and p1 is 1 or more, the silane compound as described in [1] or [4]. [6] r is 1, X ｂ A is a carbon atom, k1 is 3, l1 and m1 are 0, p1 is an integer from 0 to 3 independently, q1 is an integer from 0 to 3 independently, provided that the sum of p1 is 1 or more, the silane compound as described in [1] or [4]. [7] r is 1, X ｂA silane compound according to [1] or [4], wherein n is a nitrogen atom, k1 is 2, l1 and m1 are 0, p1 is each an integer from 0 to 3, and q1 is each an integer from 0 to 3, provided that at least one p1 is 1 or greater. [8] A silane compound according to any one of [1] to [7], wherein n is an integer from 10 to 150, and p is an integer from 11 to 50. [9] A silane compound according to any one of [1] to [8], wherein n is an integer from 10 to 100, and p is an integer from 11 to 30.

[10] A silane compound according to any one of [1] to [9], wherein n is an integer from 20 to 80.

[11] A silane compound according to any one of [1] to

[10] , wherein n is an integer between 20 and 80, and p is an integer between 16 and 24.

[12] A silane compound according to any one of [1] to

[11] , wherein the following is any one: CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -Si(OCH) ３ ) ３ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -Si(OCH) ２ CH ３ ) ３ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -C(=O)NH-(CH ２ ) ｐ -Si(OCH) ３ ) ３ CH ３ -[Si(CH３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)NH-(CH ２ ) ｐ -Si(OCH) ２ CH ３ ) ３ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)NH-CH[CH ２ OCH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)NH-CH[CH ２ OCH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH) ３ )２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ CH ３-[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -C[CH] ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ３ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -C[CH] ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ３ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)N[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)N[CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２[In the formula, n is an integer from 10 to 300 independently, and p is an integer from 11 to 60 independently.]

[13] The silane compound described in

[12] , wherein n is an integer from 20 to 80 independently, and p is an integer from 16 to 24 independently.

[14] Formula (1A): [In the formula: n is an integer between 10 and 300, p is an integer between 11 and 60, and X is -C(=O)NR] ４１ -, -C(=O)- or -C(=O)O-, R ４１ R is a hydrogen atom, an oxyalkylene-containing group, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and r is 0 or 1. ｐ X is a single bond or an alkylene group having 1 to 30 carbon atoms. ｂ Z is a silicon atom, a carbon atom, or a nitrogen atom. １１ Each of these is independently a single bond, an alkylene group having 1 to 28 carbon atoms, or -(CH ２ ) ｓ３ - (O) ｓ２ -, where s3 is an integer from 0 to 28, and s2 is an integer from 1 to 10, and the order of existence of each repeating unit enclosed in parentheses with s3 and s2 is Z １１ The structure is arbitrary, except for structures in which oxygen atoms are bonded in succession, and R ｂ１ Each of these is independently a hydroxyl group or a hydrolyzable group, R ｃ１ Each of these is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, k1, l1 and m1 are independently independent integers of 0 or more, and the sum of k1, l1 and m1 is X ｂ The valency is -1. A compound represented by ].

[15] A surface treatment agent comprising the silane compound described in any one of [1] to

[13] .

[16] A surface treatment agent comprising a condensate of the silane compound described in any one of [1] to

[13] .

[17] Furthermore, [In the formula: p3 is an integer between 6 and 80, and X ３ is -C(=O)NR ４１ -, -C(=O)- or -C(=O)O-, R４１ is a hydrogen atom, an oxyalkylene-containing group, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and r3 is 0 or 1, R ｐ３ X is a single bond or an alkylene group having 1 to 30 carbon atoms. ｂ３ R is a silicon atom, carbon atom, or nitrogen atom. ａ３ Each of them is independent of -Z ３ -SiR ｂ３ ｐ３ R ｃ３ ｑ３ And R ｂ３ Each of these is independently a hydroxyl group or a hydrolyzable group, R ｃ３ Each is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, Z ３ Each of these is independently a single bond, an alkylene group having 1 to 30 carbon atoms, or -(CH ２ ) ｓ１ - (O) ｓ２ - and s1 is an integer from 0 to 30, s2 is an integer from 1 to 10, where the order of existence of each repeating unit enclosed in parentheses with s1 and s2 is Z ３ The elements within are arbitrary, except for structures in which oxygen atoms are bonded in a continuous chain, p3 are each independent integers from 0 to 3, q3 are each independent integers from 0 to 3, k3, l3 and m3 are each independent integers of 0 or more, however, the sum of l3 and p3 is 1 or more, and the sum of k3, l3 and m3 is X ｂ３

[15] or

[16] A surface treatment agent according to

[18] , comprising a compound represented by formula (2), which has a valence of -1.

[17] A surface treatment agent according to

[19] , wherein the content of the compound represented by formula (2) is 0.1 to 30% by mass relative to the sum of the compound represented by formula (1) and the compound represented by formula (2).

[19] A surface treatment agent according to any one of

[15] to

[18] , for vacuum deposition.

[20] A surface treatment agent according to any one of

[15] to

[18] , for wet coating.

[21] A pellet containing the surface treatment agent according to any one of

[15] to

[19] .

[22] An article comprising a substrate and a layer formed on the substrate from the surface treatment agent according to any one of

[15] to

[20] .

[23] An article according to

[22] , comprising an intermediate layer containing silicon oxide between the substrate and the layer.

[24] An article according to

[23] , wherein the intermediate layer contains alkali metal atoms.

[25] The article according to

[24] , wherein at least a portion of the alkali metal atoms are sodium atoms.

[26] The article according to any one of

[22] to

[25] , which is an optical component.

[27] The article according to any one of

[22] to

[26] , which is a display.

[0006] According to this disclosure, it is possible to provide a silane compound that can form a surface treatment layer with good UV resistance, fingerprint wipeability, and abrasion resistance.

[0007] As used herein, "monovalent organic group" means a monovalent group containing carbon. A monovalent organic group is not particularly limited, but may be a hydrocarbon group or a derivative thereof. A hydrocarbon group derivative means a group having one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy, etc., at the terminal or molecular chain of a hydrocarbon group. When simply referred to as "organic group," it means a monovalent organic group.

[0008] As used herein, "hydrocarbon group" means a group containing carbon and hydrogen, obtained by removing a hydrogen atom from a hydrocarbon. Such hydrocarbon groups are not particularly limited, but include C １－３０Examples of hydrocarbon groups include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The above-mentioned "aliphatic hydrocarbon group" may be linear, branched, or cyclic, and may be saturated or unsaturated. The hydrocarbon group may also contain one or more ring structures. The hydrocarbon group may be substituted with one or more substituents.

[0009] In the use herein, the substituents of the "hydrocarbon group" are not particularly limited, but may be, for example, a halogen atom, or one or more halogen atoms. １－６ alkyl group, C ２－６ Alkenyl group, C ２－６ Alkynyl group, C ３－１０ Cycloalkyl groups, C ３－１０ Unsaturated cycloalkyl group, 5-10 membered heterocyclyl group, 5-10 membered unsaturated heterocyclyl group, C ６－１０ Examples include one or more groups selected from aryl groups and heteroaryl groups with 5 to 10 members.

[0010] As used herein, "hydrolyzable group" means a group that can undergo hydrolysis, that is, a group that can be removed from the main skeleton of a compound by hydrolysis. Examples of hydrolyzable groups include -OR ｈ , -OCOR ｈ -O-N=CR ｈ ２ , -NR ｈ ２ , - NHR ｈ , -NCO, halogen (in these formulas, R ｈ Examples include (where represents a substituted or unsubstituted alkyl group having 1 to 6 carbon atoms), preferably -OR ｈ (That is, an alkoxy group.) ｈ Examples include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl groups; and substituted alkyl groups such as chloromethyl groups. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred.

[0011] [Silane Compounds] The silane compounds of this disclosure are defined by formula (1): It is expressed as follows: In the formula: n is an integer from 10 to 300, p is an integer from 11 to 60, and X is -C(=O)NR ４１ -, -C(=O)- or -C(=O)O-, R ４１ R is a hydrogen atom, an oxyalkylene-containing group, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and r is 0 or 1. ｐ X is a single bond or an alkylene group having 1 to 30 carbon atoms. ｂ R is a silicon atom, carbon atom, or nitrogen atom. ａ１ Each of them is independent of -Z １ -SiR ｂ１ ｐ１ R ｃ１ ｑ１ And; R ｂ１ Each of these is independently a hydroxyl group or a hydrolyzable group; R ｃ１ Each is independently a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; Z １ Each of these is independently a single bond, an alkylene group having 1 to 30 carbon atoms, or -(CH ２ ) ｓ１ - (O) ｓ２ - and; s1 is an integer from 0 to 30, s2 is an integer from 1 to 10, where the order of existence of each repeating unit enclosed in parentheses with s1 and s2 is Z １ The structure is arbitrary, except for structures in which oxygen atoms are bonded in a continuous chain; p1 is an integer between 0 and 3, independently of each other; q1 is an integer between 0 and 3, independently of each other; k1, l1, and m1 are independent integers greater than or equal to 0, provided that the sum of l1 and p1 is 1 or greater, and the sum of k1, l1, and m1 is X ｂ Its valence is -1.

[0012] By having the above configuration, it is possible to form a surface treatment layer with good physical properties in all aspects, including ultraviolet (UV) resistance, fingerprint wiping ability, and abrasion resistance.

[0013] n is an integer between 10 and 300. n may be 15 or greater, 20 or greater, 30 or greater, 50 or greater, 150 or less, 100 or less, 80 or less, or 70 or less. In one embodiment, n is between 10 and 150. In one embodiment, n is between 10 and 100. In one embodiment, n is between 15 and 300. In one embodiment, n is between 20 and 300. In one embodiment, n is between 10 and 80. In one embodiment, n is between 20 and 80. In one embodiment, n is between 10 and 70. In one embodiment, n is between 15 and 150. In one embodiment, n is between 15 and 100. In one embodiment, n is between 15 and 80. In one embodiment, n is between 15 and 70. In one embodiment, n is between 20 and 80. In one embodiment, n is 20 to 70. In one embodiment, n is 30 to 80. In one embodiment, n is 30 to 70. In one embodiment, n is 50 to 80. In one embodiment, n is 50 to 70.

[0014] CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - The weight-average molecular weight of the group may be in the range of 750 to 22,000, or in the range of 2,200 to 6,000. The weight-average molecular weight can be measured by NMR (nuclear magnetic resonance) or GPC (gel permeation chromatography).

[0015] p is an integer between 11 and 60. p may be 16 or greater, 18 or greater, 20 or greater, 22 or greater, 50 or less, 30 or less, or 24 or less. In one embodiment, p is an integer between 11 and 50. In one embodiment, p is an integer between 11 and 30. In one embodiment, p is an integer between 11 and 24. In one embodiment, p is an integer between 16 and 60. In one embodiment, p is an integer between 16 and 30. In one embodiment, p is an integer between 16 and 24. In one embodiment, p is an integer between 18 and 24.

[0016] In one embodiment, n is an integer between 10 and 150, and p is an integer between 11 and 50. In one embodiment, n is an integer between 10 and 100, and p is an integer between 11 and 50. In one embodiment, n is an integer between 10 and 100, and p is an integer between 11 and 30. In one embodiment, n is an integer between 20 and 80, and p is an integer between 16 and 24. In one embodiment, n is an integer between 30 and 80 independently, and p is an integer between 11 and 60 independently. In one embodiment, n is an integer between 30 and 80, and p is an integer between 16 and 24.

[0017] X is -C(=O)NR ４１ It is -, -C(=O)- or -C(=O)O-.

[0018] R ４１ This is a hydrogen atom, an oxyalkylene-containing group, a C1-C6 alkyl group, or a phenyl group. The oxyalkylene-containing group is preferably an oxyethylene group, an oxypropylene group, or an oxybutylene group, and more preferably an oxyethylene group. The C1-C6 alkyl group is preferably a C1-C3 alkyl group, and more preferably a C1-C2 alkyl group. In one embodiment, the alkyl group is a methyl group. In one embodiment, the alkyl group is an ethyl group.

[0019] In another embodiment, R ４１ This is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.

[0020] In one embodiment, X is -C(=O)NH-. In another embodiment, X is -C(=O)NCH ３ -. In one embodiment, X is -C(=O)-. In one embodiment, X is -C(=O)O-.

[0021] R ｐ is a single bond or an alkylene group having 1 to 30 carbon atoms. In one embodiment, R ｐ It is a single bond. In one embodiment, R ｐ This is an alkylene group having 1 to 30 carbon atoms.

[0022] R ｐ The alkylene group having 1 to 30 carbon atoms is preferably an alkylene group having 1 to 20 carbon atoms, and more preferably an alkylene group having 1 to 6 carbon atoms. In one embodiment, the alkylene group is an alkylene group having 1 to 3 carbon atoms. In one embodiment, the alkylene group is an alkylene group having 4 to 12 carbon atoms.

[0023] r is either 0 or 1. In one embodiment, r is 0. In one embodiment, r is 1.

[0024] In one embodiment, p is an integer between 18 and 24, and R ｐ It is a single bond.

[0025] In one embodiment, p is an integer between 18 and 24, and R ｐ This is an alkylene group having 1 to 3 carbon atoms.

[0026] In one embodiment, - (CH ２ ) ｐ - (X) ｒ -R ｐ In -, p is an integer between 18 and 24, X is -C(=O)NH-, r is 1, R ｐ It is a single bond.

[0027] In one embodiment, - (CH ２ ) ｐ - (X) ｒ -R ｐ In -, p is an integer between 18 and 24, X is -C(=O)NH-, r is 1, R ｐThis is an alkylene group having 1 to 3 carbon atoms.

[0028] X ｂ is a silicon atom, a carbon atom, or a nitrogen atom. In one embodiment, X ｂ is a silicon atom. In one embodiment, X ｂ is a carbon atom. In one embodiment, X ｂ It is a nitrogen atom.

[0029] k1, l1, and m1 are each independent non-negative integers. However, the sum of k1, l1, and m1 is X ｂ The valence of is -1. For example, X ｂ If X is a silicon atom or a carbon atom, the sum of k1, l1, and m1 is 3. For example, X ｂ If it is a nitrogen atom, the sum of k1, l1, and m1 is 2.

[0030] R ａ１ Each of them is independent of -Z １ -SiR ｂ１ ｐ１ R ｃ１ ｑ１ That is the case.

[0031] Z １ Each of these is independently a single bond, an alkylene group having 1 to 30 carbon atoms, and -(CH ２ ) ｓ１ - (O) ｓ２ - In one embodiment, Z １ It is a single bond. In one embodiment, Z １ is an alkylene group having 1 to 30 carbon atoms. In one embodiment, Z １ is, -(CH ２ ) ｓ１ - (O) ｓ２ - is the case.

[0032] Z １ The alkylene group having 1 to 30 carbon atoms is preferably an alkylene group having 1 to 20 carbon atoms, and more preferably an alkylene group having 1 to 6 carbon atoms. In one embodiment, the alkylene group is an alkylene group having 1 to 3 carbon atoms. In one embodiment, the alkylene group is an alkylene group having 4 to 12 carbon atoms.

[0033] s1 is an integer between 0 and 30, and s2 is an integer between 1 and 10, where the order of existence of each repeating unit enclosed in parentheses with s1 and s2 is Z. １ The following are optional. However, peroxide structures with consecutive oxygen atoms are not included. That is, structures in which oxygen atoms are bonded consecutively are not included. For example, -O-O- bonds, -O-O-O- bonds, etc. are not included.

[0034] In one embodiment, s1 is an integer between 1 and 30. In one embodiment, s1 is an integer between 2 and 20. In one embodiment, s1 is an integer between 2 and 10. In one embodiment, s1 is an integer between 2 and 6.

[0035] In one embodiment, s2 is an integer between 1 and 10. In another embodiment, s2 is 1. However, this does not include a structure in which oxygen atoms are bonded in succession.

[0036] In one embodiment, Z １ is, -(CH ２ ) ｓ１１ -O-(CH ２ ) ｓ１２ - is the case. In the formula, s11 is an integer from 1 to 30, and s12 is an integer from 1 to 30; preferably, s11 is an integer from 1 to 20, and s12 is an integer from 3 to 10; preferably, s11 is an integer from 1 to 10, and s12 is an integer from 3 to 6; for example, s11 is 1 and s12 is 3, where the order of existence of each repeating unit enclosed in parentheses with s1 and s2 is Z １ The structure is arbitrary, except that it does not include structures in which oxygen atoms are bonded consecutively. However, the sum of s11 and s12 is an integer between 1 and 30.

[0037] In one embodiment, Z １ is, -(CH ２ ) ｓ１１ -[O-(CH ２ ) ｓ１５ ] ｓ１６- is the case. In the formula, s11 is an integer from 1 to 20, s15 is an integer from 2 to 6, and s16 is an integer from 0 to 10; preferably, s11 is an integer from 1 to 10, s15 is an integer from 2 to 4, and s16 is an integer from 1 to 4; for example, s11 is 1, s15 is 2, and s16 is 1 or 2. However, this does not include a structure in which oxygen atoms are bonded in succession.

[0038] Z １ In one embodiment, each is independently a single bond or an alkylene group having 1 to 30 carbon atoms.

[0039] R ｂ１ Each of these is independently a hydroxyl group or a hydrolyzable group. In one embodiment, R ｂ１ is a hydroxyl group. In one embodiment, R ｂ１ is a hydrolyzable group, for example, an alkoxy group having 1 to 6 carbon atoms, more specifically an alkoxy group having 1 to 3 carbon atoms, and more specifically a methoxy group or an ethoxy group. In one embodiment, R ｂ１ is a methoxy group. In one embodiment, R ｂ１ This is an ethoxy group.

[0040] R ｃ１ Each is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. In one embodiment, R ｃ１ is a hydrogen atom. In one embodiment, R ｃ１ is an alkyl group having 1 to 6 carbon atoms, for example, an alkyl group having 1 to 3 carbon atoms, specifically a methyl group or an ethyl group. In one embodiment, R ｃ１ is a methyl group. In one embodiment, R ｃ１ This is an ethyl group.

[0041] Each of the values ​​of p1 is an independent integer between 0 and 3, and each of the values ​​of q1 is an independent integer between 0 and 3. However, the sum of p1 and q1 is 3.

[0042] However, the sum of l1 and p1 must be 1 or greater.

[0043] In one embodiment, the sum of k1, l1, and m1 is 3, and l1 is an integer from 1 to 3. In one embodiment, the sum of k1, l1, and m1 is 3, and l1 is 2 or 3. In one embodiment, the sum of k1, l1, and m1 is 3, and l1 is 3.

[0044] In one embodiment, the sum of k1, l1 and m1 is 3, k1 is an integer from 1 to 3, and p1 is an independent integer from 1 to 3, preferably 2 or 3, and more preferably 3. In one embodiment, the sum of k1, l1 and m1 is 3, k1 is 2, l1 or m1 is 1, and p1 is an independent integer from 1 to 3, preferably 2 or 3, and more preferably 3. In one embodiment, the sum of k1, l1 and m1 is 3, k1 is 3, and p1 is an independent integer from 1 to 3, preferably 2 or 3, and more preferably 3.

[0045] In one embodiment, the sum of k1, l1, and m1 is 2, and l1 is either 1 or 2. In one embodiment, the sum of k1, l1, and m1 is 2, and l1 is 1. In one embodiment, the sum of k1, l1, and m1 is 2, and l1 is 2.

[0046] In one embodiment, the sum of k1, l1, and m1 is 2, and k1 is 1 or 2. In one embodiment, the sum of k1, l1, and m1 is 2, k1 is 1, and p1 is an integer from 1 to 3, preferably 2 or 3, and more preferably 3. In one embodiment, the sum of k1, l1, and m1 is 2, k1 is 2, and p1 is each an independent integer from 1 to 3, preferably 2 or 3, and more preferably 3.

[0047] In one embodiment, r is 0, X ｂ k1 is a silicon atom, k1 is 0, l1 is an integer from 1 to 3, m1 is an integer from 0 to 2, preferably l1 is 2 or 3, m1 is 0 or 1, and more preferably l1 is 3.

[0048] In one embodiment, r is 1, X ｂis a silicon atom, k1 is 2, l1 is 0 or 1, m1 is 0 or 1, p1 is an integer from 0 to 3, and q1 is an integer from 0 to 3, provided that the sum of l1 and p1 is 1 or more. In the above embodiment, preferably p1 is 2 or 3, and more preferably p1 is 3.

[0049] In one embodiment, r is 1, X ｂ A is a carbon atom, k1 is 2, l1 is 0 or 1, m1 is 0 or 1, p1 is an integer from 0 to 3, and q1 is an integer from 0 to 3, provided that the sum of l1 and p1 is 1 or more. In the above embodiment, preferably p1 is 2 or 3, and more preferably p1 is 3.

[0050] In one embodiment, r is 1, X ｂ A is a carbon atom, k1 is 3, l1 and m1 are 0, p1 is an integer from 0 to 3, and q1 is an integer from 0 to 3, provided that the sum of p1 is 1 or more. In the above embodiment, preferably p1 is 2 or 3, and more preferably p1 is 3.

[0051] In one embodiment, r is 1, X ｂ k1 is a nitrogen atom, k1 is 2, l1 and m1 are 0, p1 is an integer from 0 to 3 independently, and q1 is an integer from 0 to 3 independently, provided that at least one p1 is 1 or greater. In the above embodiment, preferably p1 is 2 or 3, and more preferably p1 is 3.

[0052] In one embodiment, -X ｂ R ａ１ ｋ１ R ｂ１ ｌ１ R ｃ１ ｍ１ It is one of the following groups:

[0053] Examples of silane compounds represented by formula (1) are given below. CH ３ -[Si(CH３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -Si(OCH) ３ ) ３ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -Si(OCH) ２ CH ３ ) ３ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)NH-(CH ２ ) ｐ -Si(OCH) ３ ) ３ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)NH-(CH ２ ) ｐ -Si(OCH) ２ CH ３ ) ３ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)NH-CH[CH ２ OCH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)NH-CH[CH ２ OCH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ CH ２ CH２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -C[CH] ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ３ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -C[CH] ２ CH ２ CH ２ Si(OCH)２ CH ３ ) ３ ] ３ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -C(=O)N[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -C(=O)N[CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ [In the formula, n is an integer from 10 to 300, and p is an integer from 11 to 60, each independently.] In one embodiment, n is an integer from 10 to 150, and p is an integer from 11 to 50, each independently. In one embodiment, n is an integer from 10 to 100, and p is an integer from 11 to 50, each independently. In one embodiment, n is an integer from 10 to 100, and p is an integer from 11 to 30, each independently. In one embodiment, n is an integer from 30 to 80, and p is an integer from 11 to 60, each independently. In one embodiment, n is an integer from 30 to 80, and p is an integer from 16 to 24, each independently.

[0054] [Method for producing the silane compound represented by formula (1)] (Method 1) The method for producing the silane compound represented by formula (1) includes the following steps: Step (IA): Formula (1A): A compound having an olefin group at the terminal, represented by (R ｙ O) ３ A step of reacting with SiH to obtain a silane compound represented by formula (1).

[0055] R ｙ Each of these is independently an alkyl group having 1 to 3 carbon atoms, for example, a methyl group, an ethyl group, or a propyl group, and specifically a methyl group.

[0056] n, p, X, r, R Ｐ , X ｂ , R ｂ１ , R ｃ１ k1, l1, and m1 have the same meaning as described above.

[0057] Z １１ is, Z １ It is a group with two fewer carbon atoms than Z. １１ Each of these is independently a single bond, an alkylene group having 1 to 28 carbon atoms, or -(CH ２ ) ｓ３ - (O) ｓ２ - and however, the order of existence of each repeating unit enclosed in parentheses with s2 and s3 is Z １１ It is optional in one aspect. In one embodiment, Z １１ It is a single bond. In one embodiment, Z １１ is an alkylene group having 1 to 28 carbon atoms. In one embodiment, Z １１ is, -(CH ２ ) ｓ３ - (O) ｓ２ - is the case.

[0058] Z １１ The alkylene group having 1 to 28 carbon atoms is preferably an alkylene group having 1 to 18 carbon atoms, and more preferably an alkylene group having 1 to 4 carbon atoms. In one embodiment, Z １１ Each of these is independently a methylene group. In one embodiment, Z １１ These are, independently, alkylene groups having 2 to 10 carbon atoms.

[0059] Z １１ no- (CH ２ ) ｓ３ - (O) ｓ２In this equation, s3 is an integer between 0 and 28, preferably between 1 and 28, and more preferably between 1 and 18; s2 is an integer between 1 and 8, preferably 1. Note that s2 has the same meaning as described above, and s3 is two numbers less than s1.

[0060] In one embodiment, Z １１ is, -(CH ２ ) ｓ３１ -O-(CH ２ ) ｓ３２ It is expressed as -. In the formula, s31 is an integer from 0 to 28, and s32 is an integer from 0 to 28; preferably, s31 is an integer from 1 to 28, and s32 is an integer from 1 to 28; more preferably, s31 is an integer from 1 to 20, and s32 is an integer from 1 to 8; even more preferably, s31 is an integer from 1 to 8, and s32 is an integer from 2 to 8; for example, s31 is 1 and s32 is 1. s31 is the same as s11 above, and s32 is two less than s12 above. The sum of s31 and s32 is s3.

[0061] Step (IA) described above may be carried out in a solvent. The solvent is not particularly limited as long as it dissolves the compound represented by formula (1A) and the silane compound represented by formula (1), but for example, at least one selected from the group consisting of diethyl ether, tetrahydrofuran, cyclopentyl methyl ether, ethylene glycol, dichloromethane, chloroform, benzene, toluene, and 1,3-bis(trifluoromethyl)benzene can be used. Preferably, acetonitrile, dichloromethane, chloroform, toluene, diethyl ether, and tetrahydrofuran are used. Alternatively, the reaction may be carried out without a solvent.

[0062] The above process (IA) can be carried out, for example, at 0 to 150°C, and more specifically, at 0 to 50°C.

[0063] The reaction time for the above process (IA) is, for example, 1 to 72 hours.

[0064] The composition containing compound (1A) may further contain catalysts and additives.

[0065] Examples of catalysts include metal catalysts, such as catalysts containing Pt, Ni, Pd, Rh, Ru, Co, and Fe.

[0066] The catalyst described above is particularly preferably composed of a platinum compound from the viewpoint of catalytic activity.

[0067] Examples of the above platinum compounds include elemental platinum; platinum complexes such as platinum / divinyltetramethyldisiloxane complex and platinum / tetramethyltetravinylcyclotetrasiloxane complex; chloroplatinic acid; and platinum oxide. Among these, platinum complexes are preferred, and platinum / divinyltetramethyldisiloxane complex and platinum / tetramethyltetravinylcyclotetrasiloxane complex are more preferred.

[0068] Examples of additives include aliphatic amine compounds, aromatic amine compounds, phosphate amide compounds, amide compounds, urea compounds, and sulfoxide compounds. For example, diethylamine, triethylamine, allylamine, 2-allylpenta-4-en-1-amine, 2,2-diallylpenta-4-en-1-amine, 10,10-diallyltrideca-12-en-1-amine, 2-(undeca-10-en-1yl)trideca-12-en-1-amine, aniline, pyridine, hexamethylphosphate triamide, N,N-diethylacetamide, N,N-diethylformamide, N,N-dimethylacetamide, N-methylformamide, N,N-dimethylformamide, N-methylpyrrolidone, tetramethylurea, dimethyl sulfoxide (DMSO), tetramethylene sulfoxide, methylphenyl sulfoxide, diphenyl sulfoxide, etc.

[0069] After the above process (1A), a purification process may be carried out.

[0070] (Manufacturing Method 2) In another embodiment, a method for producing a silane compound represented by formula (1) includes the following steps: Step (IB): Formula (1B): [In the formula: p2 is an integer between 9 and 58, and X is -C(=O)NR ４１ -, -C(=O)- or -C(=O)O-, R ４１is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and r is 0 or 1, R ｐ２ CH is a reactive group. ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ Add H, [In the formula: n is an integer between 10 and 300, p is an integer between 11 and 60, and X is -C(=O)NR] ４１ -, -C(=O)- or -C(=O)O-, R ４１ is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and r is 0 or 1, R ｐ２ is a reactive group. Step (IIB): Step (IIB): A step to obtain a silane compound represented by formula (1) by adding a silanating agent to a compound represented by formula (2B).

[0071] p2 is an integer that is 2 less than p.

[0072] p, X, r, and n have the same meaning as described above.

[0073] R ｐ２ The group is not particularly limited as long as it reacts in process (IIB), but could be, for example, the following groups. * indicates a junction.

[0074] The silanating agent is not particularly limited as long as it is a compound that can form an alkoxide group from the reactive group, but for example, 3-(trimethoxysilyl)propan-1-amine, 4-(trimethoxysilyl)butan-1-amine, 5-(trimethoxysilyl)pentan-1-amine, 6-(trimethoxysilyl)hexan-1-amine, 7-(trimethoxysilyl)heptan-1-amine, 8-(trimethoxysilyl)octan-1-amine, 9 -(trimethoxysilyl)nonan-1-amine, 10-(trimethoxysilyl)decan-1-am ine, 11-(trimethoxysilyl) undecan-1-amine, 12-(trimethoxysilyl) do decan-1-amine, 13-(trimethoxysilyl)tridecan-1-amine, 14-(trimeth oxysilyl)tetradecan-1-amine, 15-(trimethoxysilyl)pentadecan-1-a mine, 16-(trimethoxysilyl)hexadecan-1-amine, 17-(trimethoxysilyl ) heptadecan-1-amine, 18-(trimethoxysilyl)octadecan-1-amine, 19-( 20-(trimethoxysilyl)icosan-1 -amine, 21-(trimethoxysilyl)henicosan-1-amine, 22-(trimethoxysilyl yl) docosan-1-amine, 23-(trimethoxysilyl)tricosan-1-amine, 24-(tr imethoxysilyl)tetracosan-1-amine, 25-(trimethoxysilyl)pentacosa n-1-amine, 26-(trimethoxysilyl) hexacosan-1-amine, 27-(trimethoxysilyl) silyl) heptacosan-1-amine, 28-(trimethoxysilyl) octacosan-1-amine,29-(trimethoxysilyl)nonacosan-1-amine, 30-(trimethoxysilyl)triacontan-1-amine, bis[3-(trimethoxysilyl)propyl]amine, 5-(trimethoxysilyl)-2-(3-(trimethoxysilyl)propyl)pentan Examples include -1-amine, 13-(trimethoxysilyl)-2-(11-(trimethoxysilyl)undecyl)tridecan-1-amine, 5-(trimethoxysilyl)-2,2-bis(3-(trimethoxysilyl)propyl)pentan-1-amine, etc.

[0075] Step (IB) described above may be carried out in a solvent. The solvent is not particularly limited as long as it dissolves the compound represented by formula (1A) and the silane compound represented by formula (1), but for example, at least one selected from the group consisting of diethyl ether, tetrahydrofuran, cyclopentyl methyl ether, ethylene glycol, dichloromethane, chloroform, benzene, toluene, and 1,3-bis(trifluoromethyl)benzene can be used. Preferably, acetonitrile, dichloromethane, chloroform, toluene, diethyl ether, and tetrahydrofuran are used. Alternatively, the above step may be carried out without a solvent.

[0076] The above process (IB) can be carried out, for example, at 0 to 150°C, and more specifically, at 0 to 100°C.

[0077] The reaction time for the above process (IB) is, for example, 1 to 72 hours.

[0078] The above process (2B) can be carried out, for example, at 0 to 150°C, and more specifically, at 0 to 100°C.

[0079] The reaction time for the above step (2B) is, for example, 1 to 72 hours.

[0080] After the above process (2B), a purification process may be carried out.

[0081] [Intermediates] This disclosure further discloses compounds represented by the following formula (1A). These compounds are intermediates of silane compounds represented by formula (1). [In the formula: n is an integer between 10 and 300, p is an integer between 11 and 60, and X is an integer between -C(=O)NR ４１ -, -C(=O)- or -C(=O)O-, R ４１ Each of these is independently a hydrogen atom, a C1-C6 alkyl group, or a phenyl group, and each of these is independently 0 or 1. ｐ X is a single bond or an alkylene group having 1 to 30 carbon atoms. ｂ Z is a silicon atom, a carbon atom, or a nitrogen atom. １１ Each of these is independently a single bond or an alkylene group having 1 to 28 carbon atoms, R ｂ１ Each of these is independently a hydroxyl group or a hydrolyzable group, R ｃ１ Each is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; k1, l1 and m1 are independently integers of 0 or more, and the sum of k1, l1 and m1 is X ｂ Its valence is -1.

[0082] n, p, X, r, R Ｐ Z １１ , R ｂ１ , R ｃ１ k1, l1, and m1 have the same meaning as described above.

[0083] X ｂ This is equivalent to the above. In one embodiment, X ｂ X is a silicon atom. In one embodiment, X ｂ is a carbon atom. In one embodiment, X ｂ It is a nitrogen atom.

[0084] In one embodiment, k1 is 2 or 3, l1 is 0, and m1 is 0 or 1. In one embodiment, k1 is 2, l1 is 0, and m1 is 1. In one embodiment, k1 is 3, and l1 and m1 are 0.

[0085] In one embodiment, Xｂ is a carbon atom, where k1 is 2 or 3, l1 is 0, and m1 is 0 or 1. In one embodiment, X ｂ is a carbon atom, where k1 is 2, l1 is 0, and m1 is 1. In one embodiment, X ｂ is a carbon atom, where k1 is 3, and l1 and m1 are 0.

[0086] [Composition] The compositions of the present disclosure comprise at least one compound selected from the group consisting of silane compounds represented by formula (1) of the present disclosure and condensates obtained by condensing at least a portion of a silane compound.

[0087] The compositions of this disclosure are preferably used as surface treatment agents or as components of surface treatment agents.

[0088] In one embodiment, the composition of the present disclosure (e.g., a surface treatment agent) comprises a silane compound represented by formula (1) of the present disclosure.

[0089] In one embodiment, the composition of the Disclosure (e.g., a surface treatment agent) comprises a condensate of a silane compound represented by formula (1) of the Disclosure.

[0090] In one embodiment, the surface treatment agent of the present disclosure is at least one compound represented by formula (1) itself.

[0091] In one embodiment, the content of the silane compound represented by formula (1) above may be preferably 0.1 to 50.0% by mass, more preferably 1.0 to 30.0% by mass, even more preferably 5.0 to 25.0% by mass, and particularly preferably 10.0 to 20.0% by mass, relative to the total surface treatment agent.

[0092] In another embodiment, the content of the silane compound represented by formula (1) above may be preferably 0.001 to 30% by mass, more preferably 0.01 to 10% by mass, even more preferably 0.05 to 5% by mass, and particularly preferably 0.05 to 2% by mass, relative to the total surface treatment agent.

[0093] In one embodiment, the surface treatment agent of the present disclosure may contain a silane compound represented by formula (1) and a condensate obtained by condensing at least a portion of the silane compound represented by formula (1).

[0094] In the above embodiment, the content of the condensate may be preferably 40% by mass or less, more preferably 30% by mass or less, relative to the total of the silane compound represented by formula (1) and the condensate. Here, the content of the condensate can be determined, for example, from the ratio of peak position and area in GPC.

[0095] The above surface treatment agent is preferably further, [In the formula: p3 is an integer between 6 and 80, X ３ is -C(=O)NR ４１ -, -C(=O)- or -C(=O)O-, R ４１ is a hydrogen atom, an oxyalkylene-containing group, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and r3 is 0 or 1, R ｐ３ X is a single bond or an alkylene group having 1 to 30 carbon atoms. ｂ３ R is a silicon atom, carbon atom, or nitrogen atom. ａ３ Each of them is independent of -Z ３ -SiR ｂ３ ｐ３ R ｃ３ ｑ３ And R ｂ３ Each of these is independently a hydroxyl group or a hydrolyzable group, R ｃ３ Each is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, Z ３ Each of these is independently a single bond, an alkylene group having 1 to 30 carbon atoms, or -(CH ２ ) ｓ１ - (O) ｓ２ - and s1 is an integer from 0 to 30, s2 is an integer from 1 to 10, where the order of existence of each repeating unit enclosed in parentheses with s1 and s2 is Z １ In this equation, each is arbitrary, p3 is an independent integer between 0 and 3, q3 is an independent integer between 0 and 3, k3, l3 and m3 are independent integers greater than or equal to 0, provided that the sum of l3 and p3 is 1 or greater, and the sum of k3, l3 and m3 is X ｂ３ It contains compounds represented by ], which have a valency of -1.

[0096] p3, X ３ , r3, R ｐ３ , X ｂ３ , R ａ３ , R ｂ３ , R ｃ３ k3, l3, m3, s1 and s2 are the same as p, X, r, and R, respectively. ｐ , X ｂ , R ａ１ , R ｂ１ , R ｃ１ This is synonymous with k1, l1, m1, s1, and s2. Z ３ p3 and q3 are, respectively, the above Z １ This is synonymous with p1 and q1.

[0097] The content of the compound represented by formula (2) is preferably 0.1 to 30% by mass, more preferably 0.5 to 10% by mass, even more preferably 1 to 3% by mass, and particularly preferably 1 to 2% by mass, relative to the total of the compound represented by formula (1) and the compound represented by formula (2).

[0098] The compound represented by formula (2) may be present in the surface treatment agent as a single compound or as two or more compounds.

[0099] The surface treatment agents disclosed herein may include solvents, silicone oils, amine compounds, alcohols, catalysts, surfactants, polymerization inhibitors, sensitizers, and the like.

[0100] In one embodiment, the surface treatment agent of the present disclosure is R ９０ Contains compounds represented by -OH. ９０ is a monovalent organic group, preferably C １－２０ Alkyl alkyl group or C ３－２０ These are alkylene groups, and these groups may be substituted with one or more substituents. Examples of substituents include hydroxyl groups, -OR ９１ (Here, R ９１ is C １－１０ Alkyl alkyl group, preferably C １－３ Examples include alkyl groups (for example, a methyl group).

[0101] In one embodiment, the surface treatment agent of the present disclosure is R ８１ OR ８２ , R８３ ｎ８ C ６ H ６－ｎ８ , R ８４ R ８５ R ８６ Si-(O-SiR ８７ R ８８ ) ｍ８ -R ８９ , and (OSiR ８７ R ８８ ) ｍ９ [In the formula R ８１ ~R ８９ Each of these is independently a monovalent organic group having 1 to 10 carbon atoms, m8 is an integer from 1 to 6, m9 is an integer from 3 to 8, and n8 is an integer from 0 to 6. The solvent may be selected from the compounds represented by [ ].

[0102] The monovalent organic group having 1 to 10 carbon atoms may be linear, branched, or may even contain a cyclic structure.

[0103] In one embodiment, the monovalent organic group having 1 to 10 carbon atoms may contain an oxygen atom, a nitrogen atom, or a halogen atom.

[0104] In another embodiment, the monovalent organic group having 1 to 10 carbon atoms does not contain a halogen atom.

[0105] In a preferred embodiment, the monovalent organic group having 1 to 10 carbon atoms is a hydrocarbon group which may be substituted with a halogen, preferably an unsubstituted hydrocarbon group.

[0106] In one embodiment, the hydrocarbon group is a straight chain.

[0107] In another embodiment, the hydrocarbon group is a branched chain.

[0108] In another embodiment, the hydrocarbon group includes a cyclic structure.

[0109] In one embodiment, the solvent is R ８１ OR ８２ That is the case.

[0110] R ８１ and R ８２Each of these is independently preferably a hydrocarbon group having 1 to 8 carbon atoms, more preferably C １－６ an alkyl group, or C ５－８ It may be a cycloalkyl group.

[0111] In one embodiment, the solvent is R ８３ ｎ８ C ６ H ６－ｎ８ That is the case.

[0112] C ６ H ６－ｎ８ This is an n8 valent benzene ring. That is, R ８３ ｎ８ C ６ H ６－ｎ８ This is n8 R ８３ This is a benzene substituted with [substance name].

[0113] R ８３ Each of these is a halogen, or a C which may be substituted with a halogen. １－６ It can be an alkyl group.

[0114] n8 is preferably an integer between 1 and 3.

[0115] In one embodiment, the solvent is R ８４ R ８５ R ８６ Si-(O-SiR ８７ R ８８ ) ｍ８ -R ８９ That is the case.

[0116] In one embodiment, the solvent is (OSiR ８７ R ８８ ) ｍ９ (OSiR) ８７ R ８８ ) ｍ９ This involves multiple OSIRs ８７ R ８８ It is a cyclic siloxane formed by the ring-like bonding of units.

[0117] R ８４ ~R ８９ Each of these is independently a hydrogen atom, or C １－６ an alkyl group, preferably C １－６ Alkyl alkyl group, more comfortably C１－３ The alkyl group is more preferably a methyl group.

[0118] m8 is preferably an integer from 1 to 6, more preferably an integer from 1 to 5, and even more preferably 1 to 2.

[0119] m9 is preferably an integer between 3 and 6, more preferably an integer between 3 and 5.

[0120] In one embodiment, the solvent may be, for example, aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, or mineral spirits; aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene, or solvent naphtha; methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, carbitol acetate, diethyl oxalate, ethyl pyruvate, or ethyl-2-hydroxybutyl acetate. Esters such as ethyl acetate, ethyl acetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, ethyl 2-hydroxyisobutyrate; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, 2-hexanone, cyclohexanone, methylaminoketone, 2-heptanone; ethyl cellosolve, methyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether, propylene Glycol ethers such as glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, and ethylene glycol monoalkyl ether; alcohols such as methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, and tert-amyl alcohol; glycols such as ethylene glycol and propylene glycol; cyclic ethers such as tetrahydrofuran, tetrahydropyran, and dioxane; amides such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone; ether alcohols such as methyl cellosolve, cellosolve, isopropyl cellosolve, butyl cellosolve, and diethylene glycol monomethyl ether; and diethylene glycol monoethyl ether acetate.Polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C; ６ F １３ CH ２ CH ３ (For example, AsahiClean® AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (for example, Zeolora® H manufactured by Nippon Zeon Co., Ltd.); fluorinated hydrocarbons such as 1,1,2-trichloro-1,2,2-trifluoroethane, 1,2-dichloro-1,1,2,2-tetrafluoroethane, 1,1-dichloro-1,2,2,3,3-pentafluoropropane (HCFC225), and 1,3-bis(trifluoromethyl)benzene; CF ３ CH ２ OH, CF ３ CF ２ CH ２ OH, (CF ３ ) ２ Fluorine-containing alcohols such as CHOH; hydrofluoroethers (HFE) (e.g., perfluoropropyl methyl ether (C) ３ F ７ OCH ３ ) (For example, Novec® 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (For example, Novec™ 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C ４ F ９ OC ２ H ５ ) (For example, Novec™ 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C ２ F ５ CF(OCH) ３ ) C ３ F ７ ) (for example, Novec™ 7300 manufactured by Sumitomo 3M Limited) or alkyl perfluoroalkyl ethers (the perfluoroalkyl group and alkyl group may be linear or branched), or CF ３ CH２ OCF ２ CHF ２ Examples include ethers such as cyclopentyl methyl ether (for example, AsahiClean® AE-3000 manufactured by Asahi Glass Co., Ltd.), hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octamethylcyclotetrasiloxane, octamethylcyclopentasiloxane, decamethylcyclopentasiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane, and dimethyl sulfoxide. Alternatively, mixed solvents of two or more of these are also possible. Among these, aliphatic hydrocarbons, esters, glycol ethers, alcohols, ether alcohols, and siloxanes are preferred. For example, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, mineral spirits, methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, diethylene glycol monomethyl ether, hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane, octamethylcyclotetrasiloxane, and octamethylcyclopentasiloxane are preferred.

[0121] Examples of silicone oils include (non-reactive) silicone compounds.

[0122] The silicone oil is not particularly limited, but for example, the following general formula (3a): R １ａ - (SiR ３ａ ２ -O) ａ１ -SiR ３ａ ２ -R １ａ ...(3a) [wherein: R １ａEach is independently a hydrogen atom or a hydrocarbon group, and R ３ａ Examples of compounds represented by [ ] include each being independently a hydrogen atom or a hydrocarbon group, where a1 is 2 to 3000.

[0123] The above R ３ａ Each of these is independently either a hydrogen atom or a hydrocarbon group. Such hydrocarbon groups may be substituted.

[0124] R ３ａ Each of these is independently preferably an unsubstituted hydrocarbon group or a hydrocarbon group substituted with a halogen atom. The halogen atom is preferably a fluorine atom.

[0125] R ３ａ Each of these C atoms may be independently substituted, preferably with a halogen atom. １－６ Alkyl or aryl group, more preferably C １－６ It is an alkyl group or an aryl group.

[0126] The above CC １－６ The alkyl group may be linear or branched, but is preferably linear. １－６ The alkyl group is preferably C １－３ An alkyl group, more preferably a methyl group.

[0127] The above aryl group is preferably a phenyl group.

[0128] In one embodiment, R ３ａ Each of them is independent of C １－６ Alkyl alkyl group, preferably C １－３ An alkyl group, more preferably a methyl group.

[0129] In another embodiment, R ３ａ This is a phenyl group.

[0130] In another embodiment, R ３ａ This is a methyl group or a phenyl group, preferably a methyl group.

[0131] The above R １ａ Each of these is independently a hydrogen atom or a hydrocarbon group, and the above R ３ａIt is synonymous with [the above].

[0132] R １ａ Each of these C atoms may be independently substituted, preferably with a halogen atom. １－６ Alkyl or aryl group, more preferably C １－６ It is an alkyl group or an aryl group.

[0133] In one embodiment, R １ａ Each of them is independent of C １－６ Alkyl alkyl group, preferably C １－３ An alkyl group, more preferably a methyl group.

[0134] In another embodiment, R １ａ This is a phenyl group.

[0135] In another embodiment, R １ａ This is a methyl group or a phenyl group, preferably a methyl group.

[0136] The above a1 is between 2 and 1500. a1 is preferably 5 or more, more preferably 10 or more, even more preferably 15 or more, for example 30 or more, or 50 or more. a1 is preferably 1000 or less, more preferably 500 or less, even more preferably 200 or less, even more preferably 150 or less, for example 100 or less, or 80 or less.

[0137] a1 can preferably be 5 to 1000, more preferably 10 to 500, even more preferably 15 to 200, and even more preferably 15 to 150.

[0138] Another silicone oil is (3b) below: R １ａ -R ＳＯ２ -R ３ａ ...(3b) [wherein: R １ａ Each of these is independently a hydrocarbon group, and R ３ａ Each of these is independently a hydrocarbon group, and R ＳＯ２ This is a divalent siloxane-containing group, preferably -R Ｓ -SiR ７５ ２ - and R Ｓ The formula is as follows: [In the formula: R７３ Each of them is independently a single bond, C １－１２ Alkylene group, -R ７６ -O-R ７６ -, -R ７８ -R ７７ -R ７８ -, -R ７８ -R ７７ -R ７９ -R ７７ -R ７８ -, -R ７８ -R ７７ -R ７９ -R ７６ -R ７９ -R ７７ -R ７８ -, or -R ７９ -R ７６ -R ７９ -R ７７ -R ７９ -R ７６ -R ７９ - and R ７４ Each of them is independent of C １－１２ Alkylene group, -R ７６ -O-R ７６ -, -R ７８ -R ７７ -R ７８ -, -R ７８ -R ７７ -R ７９ -R ７７ -R ７８ -, -R ７８ -R ７７ -R ７９ -R ７６ -R ７９ -R ７７ -R ７８ -, or -R ７９ -R ７６ -R ７９ -R ７７ -R ７９ -R ７６ -R ７９ - and R ７６ Each of them is independent of C １－６ It is an alkylene group, R ７７ Each of these is independently a phenylene group or a naphthylene group, which may be substituted, and R ７８ Each of these is independently a single bond, or C１－６ It is an alkylene group, R ７９ Each of these is independently a single bond or an oxygen atom, and R ７５ Each of the following is an independent hydrocarbon group, where x is an integer from 0 to 500, y is an integer from 0 to 500, z is an integer from 0 to 500, x + y + z is 1 or greater, and the order of existence of each repeating unit enclosed in parentheses with x, y, or z is arbitrary in the formula. This is a group represented by ]. Examples of compounds represented by ] are shown.

[0139] The above-mentioned silicone oil may have an average molecular weight of 500 to 1,000,000, preferably 1,000 to 100,000. The molecular weight of the silicone oil can be measured using GPC.

[0140] Examples of the above silicone oil include -(SiR ３ａ ２ -O) ａ１ A linear or cyclic silicone oil in which a1 is 30 or less may be used. Linear silicone oils may be so-called straight silicone oils and modified silicone oils. Examples of straight silicone oils include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrogen silicone oil. Examples of modified silicone oils include straight silicone oils modified with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol, etc. An example of a cyclic silicone oil is cyclic dimethylsiloxane oil.

[0141] The above-mentioned silicone oil may be included in the surface treatment agent of this disclosure in an amount of, for example, 0 to 50% by mass, preferably 0.001 to 30% by mass, and more preferably 0.1 to 5% by mass.

[0142] In the surface treatment agents of the present disclosure, such silicone oil may be included in an amount of, for example, 0 to 300 parts by mass, preferably 0 to 100 parts by mass, more preferably 0 to 50 parts by mass, and even more preferably 0 to 10 parts by mass, based on 100 parts by mass of the total of the compounds of the present disclosure (the sum of the two or more compounds, and the same applies hereinafter).

[0143] Silicone oil contributes to improving the surface slipperiness of the surface-treated layer.

[0144] Examples of the alcohols mentioned above include methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, and tert-amyl alcohol. Adding these alcohols to the surface treatment agent improves the stability of the surface treatment agent.

[0145] Examples of catalysts include acids (e.g., acetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, p-toluenesulfonic acid, trifluoroacetic acid, etc.), bases (e.g., sodium hydroxide, potassium hydroxide, ammonia, triethylamine, diethylamine, etc.), transition metals (e.g., Ti, Ni, Sn, Zr, Al, B, Si, Ta, Nb, Mo, W, Cr, Hf, V, etc.), sulfur-containing compounds having lone pairs of electrons in their molecular structure, or nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphate amide compounds, amide compounds, urea compounds, etc.).

[0146] Examples of the above-mentioned aliphatic amine compounds include diethylamine and triethylamine. Examples of the above-mentioned aromatic amine compounds include aniline and pyridine.

[0147] In a preferred embodiment, the transition metal is included as a transition metal compound represented by M-R (wherein M is a transition metal atom and R is a hydrolyzable group). By making the transition metal compound a compound in which a transition metal and a hydrolyzable group are bonded, transition metal atoms can be more efficiently incorporated into the surface treatment layer, further improving the friction durability and chemical resistance of the surface treatment layer.

[0148] The hydrolyzable group means a group that can undergo a hydrolysis reaction, similar to the hydrolyzable group for the above compound, that is, a group that can be detached from the transition metal atom by a hydrolysis reaction. Examples of the hydrolyzable group include -OR ｍ , -OCOR ｍ , -O-N=CR ｍ ２ , -NR ｍ ２ , -NHR ｍ , -NCO, halogen (in these formulas, R ｍ represents a substituted or unsubstituted C １－４ alkyl group).

[0149] In a preferred embodiment, the hydrolyzable group is -OR ｍ , preferably methoxy or ethoxy. By using an alkoxy group as the hydrolyzable group, the transition metal atom can be more efficiently included in the surface treatment layer, and the frictional durability and chemical resistance of the surface treatment layer can be further improved.

[0150] In one embodiment, the hydrolyzable group may be the same as the hydrolyzable group contained in the above compound. By making the hydrolyzable groups in the compound and the transition metal compound the same group, even when such hydrolyzable groups are exchanged with each other, the influence can be minimized.

[0151] In another embodiment, the hydrolyzable group may be different from the hydrolyzable group contained in the above compound. By making the hydrolyzable groups in the compound and the transition metal compound different, the reactivity of hydrolysis can be controlled.

[0152] In one embodiment, the hydrolyzable group and the hydrolyzable group contained in the above compound may be interchanged with each other in the surface treatment agent.

[0153] In a preferred embodiment, the transition metal compound is Ta(OR ｍ )(wherein R ５ is a substituted or unsubstituted C ｍ is a substituted or unsubstituted C １－４It is an alkyl group.) Preferably Ta(OCH ２ CH ３ ) ５ , or Si (OR ｍ ) １－ｍ１ R ｍ’ ｍ１ (In the formula, R ｍ C is either substituted or non-substituted. １－４ It is an alkyl group, R ｍ’ C １－４ It is an alkyl group, and m1 is 0 or 1. Preferably, it may be tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, tetraisopropoxysilane, dimethyldiethoxysilane, or dimethyldimethoxysilane.

[0154] The catalyst may be present in the entire surface treatment agent at, for example, 0.0002% by mass or more. Preferably, the catalyst is present at 0.02% by mass or more, and more preferably at 0.04% by mass or more, relative to the entire surface treatment agent. The catalyst may be present at, for example, 10% by mass or less, and particularly at 1% by mass or less, relative to the entire surface treatment agent. The surface treatment agent of this disclosure, by containing the catalyst at the above concentrations, can contribute to the formation of a surface treatment layer with better durability.

[0155] The content of the catalyst is preferably 0 to 10% by mass, more preferably 0 to 5% by mass, and particularly preferably 0 to 1% by mass, relative to the compound of this disclosure.

[0156] The catalyst promotes the hydrolysis and dehydration condensation of the compounds of the present disclosure, thereby promoting the formation of the layer formed by the surface treatment agent of the present disclosure.

[0157] Other components besides those listed above include, for example, tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, and methyltriacetoxysilane.

[0158] In addition to the components described above, the surface treatment agent disclosed herein may contain trace amounts of impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and silane condensates.

[0159] In one embodiment, the surface treatment agent of the present disclosure is for a dry coating method, preferably for vacuum deposition.

[0160] In one embodiment, the surface treatment agent of the present disclosure is for wet coating, preferably immersion coating.

[0161] The surface treatment agent disclosed herein can be formed into pellets by impregnating porous materials, such as porous ceramic materials, or metal fibers, such as steel wool compressed into a cotton-like form. These pellets can be used, for example, in vacuum deposition.

[0162] [Articles] The articles of this disclosure are described below.

[0163] The articles of this disclosure include a substrate and a layer (surface treatment layer) formed on the surface of the substrate from the composition of this disclosure (e.g., a surface treatment agent).

[0164] The substrates usable in this disclosure may consist of, for example, glass, resin (natural or synthetic resin, such as common plastic materials), metal, ceramics, semiconductors (silicon, germanium, etc.), fibers (textiles, nonwovens, etc.), fur, leather, wood, ceramics, stone, building materials, sanitary products, or any other suitable material.

[0165] For example, if the article to be manufactured is an optical component, the material constituting the surface of the substrate may be an optical component material, such as glass or transparent plastic. Also, if the article to be manufactured is an optical component, some layer (or film), such as a hard coat layer or an anti-reflective layer, may be formed on the surface (outermost layer) of the substrate. Either a single-layer anti-reflective layer or a multi-layer anti-reflective layer may be used for the anti-reflective layer. An example of an inorganic material that can be used for the anti-reflective layer is SiO ２ SiO, ZrO ２ , TiO ２ ,TiO,Ti ２ O ３ Ti ２ O ５ Al ２ O ３ Ta ２ O ５ Ta ３ O５ , Nb ２ O ５ , HfO ２ Si ３ N ４ , CEO ２ , MgO, Y ２ O ３ , SnO ２ MgF ２ WO ３ These are some examples. These inorganic materials may be used individually or in combination of two or more (for example, as a mixture). When a multilayer anti-reflective layer is used, the outermost layer is SiO ２ It is preferable to use and / or SiO. If the article to be manufactured is an optical glass component for a touch panel, a thin film using a transparent electrode, such as indium tin oxide (ITO) or indium zinc oxide, may be present on a part of the surface of the substrate (glass). The substrate may also have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomizing film layer, a hard coating film layer, a polarizing film, a phase difference film, and a liquid crystal display module, depending on its specific specifications.

[0166] The shape of the substrate is not particularly limited and may be, for example, a plate, a film, or other form. Furthermore, the surface area of ​​the substrate on which the surface treatment layer is to be formed may be at least a part of the substrate surface and can be appropriately determined according to the intended use and specific specifications of the article to be manufactured.

[0167] In one embodiment, the substrate may consist of a material that originally has hydroxyl groups, at least on its surface. Examples of such materials include glass, metals (especially base metals) on which a native oxide film or thermal oxide film is formed on the surface, ceramics, semiconductors, etc. Alternatively, if the material has insufficient hydroxyl groups, such as resins, or if it does not originally have hydroxyl groups, the substrate can be pretreated to introduce or increase hydroxyl groups on its surface. Examples of such pretreatment include plasma treatment (e.g., corona discharge) and ion beam irradiation. Plasma treatment can introduce or increase hydroxyl groups on the substrate surface and can also be suitably used to clean the substrate surface (remove foreign matter, etc.). Another example of such pretreatment is a method in which an interfacial adsorbent having carbon-carbon unsaturated bond groups is formed in the form of a monolayer on the substrate surface by the LB method (Langmuir-Bludget method) or chemical adsorption method, and then the unsaturated bonds are cleaved in an atmosphere containing oxygen or nitrogen.

[0168] In another embodiment, such a substrate may consist of a material in which at least its surface portion is made of another reactive group, such as a silicone compound having one or more Si-H groups, or an alkoxysilane.

[0169] In a preferred embodiment, the substrate is glass. Preferred glass includes sapphire glass, soda-lime glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystal glass, quartz glass, and crystallized glass, with chemically strengthened soda-lime glass, chemically strengthened alkali aluminosilicate glass, and chemically bonded borosilicate glass being particularly preferred.

[0170] In one embodiment, the article of the present disclosure may include an intermediate layer containing silicon oxide between the substrate and the surface treatment layer. By providing such an intermediate layer, the adhesion between the substrate (e.g., glass) and the surface treatment layer is improved, and the durability is enhanced.

[0171] In a preferred embodiment, the intermediate layer may contain an alkali metal in addition to silicon oxide.

[0172] Examples of the alkali metals mentioned above include lithium, sodium, and potassium. Preferably, at least a portion of the alkali metal is sodium.

[0173] The thickness of the intermediate layer is not particularly limited, but is preferably 1 to 200 nm, and particularly preferably 1 to 20 nm. By setting the thickness of the intermediate layer to be above the lower limit of the above range, the effect of improving adhesion by the intermediate layer is further enhanced.

[0174] The silicon dioxide intermediate layer described above can be formed by applying a silicon dioxide precursor to the surface of the substrate. If the intermediate layer contains alkali metal atoms, the intermediate layer can be formed by applying a surface treatment agent containing a silicon dioxide precursor and an alkali metal source to the surface of the substrate.

[0175] Examples of silicon oxide precursors include silicic acid, partial condensates of silicic acid, alkali metal silicates, silane compounds having a hydrolyzable group bonded to a silicon atom, and partial hydrolyzable condensates of the silane compounds. Silicic acid and its partial condensates can be dehydrated and condensed to produce silicon oxide, while alkali metal silicates can be converted to silicic acid or its partial condensates using an acid or cation exchange resin, and the resulting silicic acid or partial condensates can be dehydrated and condensed to produce silicon oxide. Examples of hydrolyzable groups in silane compounds having a hydrolyzable group bonded to a silicon atom include alkoxy groups and chlorine atoms. The hydrolyzable group in the silane compound can be hydrolyzed to a hydroxyl group, and the resulting silanol compound can be dehydrated and condensed to produce silicon oxide. Examples of silane compounds having a hydrolyzable group bonded to a silicon atom include alkoxysilanes such as tetraalkoxysilanes and alkyltrialkoxysilanes, and tetrachlorosilanes.

[0176] Examples of alkali metal sources include alkali metal hydroxides and water-soluble alkali metal salts. Examples of water-soluble alkali metal salts include alkali metal carbonates, alkali metal bicarbonates, alkali metal hydrochlorides, and alkali metal nitrates. Alkali metal hydroxides and alkali metal carbonates are preferred as alkali metal sources.

[0177] Furthermore, alkali metal silicates can be used as silicon oxide precursors and alkali metal sources. Alkali metal silicates can be converted to silicon oxide via silicic acid, but a small amount of alkali metal may remain in the silicon oxide produced during this process. Therefore, by adjusting the amount of residual alkali metal atoms, silicon oxide containing a predetermined amount of alkali metal atoms can be obtained.

[0178] The alkali metal atom concentration in the intermediate layer can be measured using various surface analyzers, such as TOF-SIMS (time-of-flight secondary ion mass spectrometry), XPS (X-ray photoelectron spectroscopy), and XRF (X-ray fluorescence spectroscopy).

[0179] The proportion of alkali metal atoms in the total atoms of the intermediate layer can be obtained by XPS depth profiling using ion sputtering. This is done by repeatedly alternating between XPS measurement and surface etching using an ion gun built into the XPS instrument.

[0180] In the intermediate layer, the average concentration of alkali metals in the region with a depth of 1 nm or less from the surface in contact with the surface treatment layer is determined by obtaining a depth profile of alkali metal atom concentration by TOF-SIMS depth profiling by ion sputtering, and then calculating the average value of alkali metal atom concentration in the profile. TOF-SIMS depth profiling by ion sputtering is performed by alternately repeating TOF-SIMS measurement and surface etching by ion sputtering using an ion gun built into the TOF-SIMS apparatus.

[0181] The articles of this disclosure can be manufactured by forming a layer of the surface treatment agent of this disclosure on the surface of the substrate, and post-treating this layer as necessary, thereby forming a layer from the surface treatment agent of this disclosure.

[0182] Layer formation of the surface treatment agent of this disclosure can be carried out by applying the surface treatment agent to the surface of a substrate so as to cover the surface. The coating method is not particularly limited. For example, a wet coating method and a dry coating method can be used.

[0183] Examples of wet coating methods include immersion coating, spin coating, flow coating, spray coating, roll coating, gravure coating, wipe coating, squeegee coating, die coating, inkjet, casting, Langmuir-Bludget method, and similar methods.

[0184] Examples of dry coating methods include vapor deposition (usually vacuum deposition), sputtering, CVD, and similar methods. Specific examples of vapor deposition methods (usually vacuum deposition) include resistance heating, electron beams, high-frequency heating using microwaves, ion beams, and similar methods. Specific examples of CVD methods include plasma CVD, optical CVD, thermal CVD, and similar methods.

[0185] Furthermore, coating using the atmospheric pressure plasma method is also possible.

[0186] When using a wet coating method, the surface treatment agents of the present disclosure may be diluted with a solvent before being applied to the substrate surface. From the viewpoint of the stability of the surface treatment agents of the present disclosure and the volatility of the solvent, the following solvents are preferably used: aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, and mineral spirits; aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene, and solvent naphtha; methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, and calcium acetate. Esters such as bitol, diethyl oxalate, ethyl pyruvate, ethyl-2-hydroxybutyrate, ethyl acetacetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, ethyl 2-hydroxyisobutyrate; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, 2-hexanone, cyclohexanone, methylaminoketone, 2-heptanone; ethyl cellosolve, methyl cellosorb Glycol ethers such as methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, and ethylene glycol monoalkyl ether; alcohols such as methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octyl alcohol, 3-methyl-3-methoxybutanol, and tert-amyl alcohol; glycols such as ethylene glycol and propylene glycol; cyclic ethers such as tetrahydrofuran, tetrahydropyran, and dioxane; amides such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone;Ether alcohols such as methyl cellosolve, cellosolve, isopropyl cellosolve, butyl cellosolve, diethylene glycol monomethyl ether; diethylene glycol monoethyl ether acetate; polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C; ６ F １３ CH ２ CH ３ (e.g., Asahi Kasei Corporation's Asahiklin (registered trademark) AC-6000), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeon Corporation's Zeorola (registered trademark) H); fluorinated hydrocarbons such as 1,1,2-trichloro-1,2,2-trifluoroethane, 1,2-dichloro-1,1,2,2-tetrafluoroethane, 1,1-dichloro-1,2,2,3,3-pentafluoropropane (HCFC225), 1,3-bis(trifluoromethyl)benzene; CF ３ CH ２ OH, CF ３ CF ２ CH ２ OH, (CF ３ ) ２ CHOH and other fluorinated alcohols; hydrofluoroethers (HFE) (e.g., perfluoropropyl methyl ether (C ３ F ７ OCH ３ ) (e.g., Sumitomo 3M Limited's Novec (trademark) 7000), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (e.g., Sumitomo 3M Limited's Novec (trademark) 7100), perfluorobutyl ethyl ether (C ４ F ９ OC ２ H ５ ) (e.g., Sumitomo 3M Limited's Novec (trademark) 7200), perfluorohexyl methyl ether (C ２ F ５ CF(OCH ３ )C ３ F ７) (for example, Novec™ 7300 manufactured by Sumitomo 3M Limited) or alkyl perfluoroalkyl ethers (the perfluoroalkyl group and alkyl group may be linear or branched), or CF ３ CH ２ OCF ２ CHF ２ (For example, AsahiClean® AE-3000 manufactured by Asahi Glass Co., Ltd.), ethers such as cyclopentyl methyl ether; siloxanes such as hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octamethylcyclotetrasiloxane, octamethylcyclopentasiloxane, decamethylcyclopentasiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane; dimethyl sulfoxide, etc. These solvents can be used alone or as a mixture of two or more. Among these, aliphatic hydrocarbons, esters, glycol ethers, alcohols, ether alcohols, and siloxanes are preferred. For example, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, mineral spirits, methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, methanol, ethanol, iso-propanol, n-butanol, isobutanol, tert-butanol, sec-butanol, diethylene glycol monomethyl ether, hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, tetradecamethylhexasiloxane, octamethylcyclotetrasiloxane, and octamethylcyclopentasiloxane are preferred.

[0187] In one aspect, when using the wet coating method, the solvent is, for example, R ９０ Compounds represented by -OH can be used. ９０ is a monovalent organic group, preferably C １－２０ Alkyl alkyl group or C ３－２０These are alkylene groups, and these groups may be substituted with one or more substituents. Examples of substituents include hydroxyl groups, -OR ９１ (Here, R ９１ is C １－１０ Alkyl alkyl group, preferably C １－３ Examples include alkyl groups (for example, a methyl group).

[0188] When using the dry coating method, the surface treatment agent of this disclosure may be subjected to the dry coating method as is, or it may be diluted with the solvent described above before being subjected to the dry coating method.

[0189] The layer formation of the surface treatment agent is preferably carried out such that the surface treatment agent of the present disclosure is present in the layer together with a catalyst for hydrolysis and dehydration condensation. For convenience, in the case of a wet coating method, the surface treatment agent of the present disclosure may be diluted with a solvent, and the catalyst may be added to the diluted solution of the surface treatment agent of the present disclosure immediately before application to the substrate surface. In the case of a dry coating method, the surface treatment agent of the present disclosure with the catalyst added may be directly vapor-deposited (usually by vacuum deposition), or a pellet-like material impregnated with the surface treatment agent of the present disclosure with the catalyst added may be used for vapor deposition (usually by vacuum deposition).

[0190] Any suitable acid or base, transition metals (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having lone pairs of electrons in their molecular structure, or nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphate amide compounds, amide compounds, urea compounds, etc.) can be used as catalysts. Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine and diethylamine. Examples of transition metals, aliphatic amine compounds, and aromatic amine compounds are the same as those mentioned above.

[0191] The surface treatment layer included in the articles of this disclosure may have high abrasion resistance. In addition to high abrasion resistance, the surface treatment layer may also have water repellency, oil repellency, stain resistance (e.g., preventing the adhesion of dirt such as fingerprints), waterproofness (preventing water from entering electronic components, etc.), surface slipperiness (or lubricity, e.g., ease of wiping away dirt such as fingerprints and excellent tactile feel to the fingers), and chemical resistance, and may be suitably used as a functional thin film.

[0192] Accordingly, this disclosure also relates to optical materials having the above-mentioned surface treatment layer as the outermost layer.

[0193] As optical materials, a wide variety of optical materials are preferred, in addition to optical materials related to displays, as exemplified below: for example, displays such as cathode ray tubes (CRTs; e.g., PC monitors), liquid crystal displays, plasma displays, organic EL displays, inorganic thin-film EL dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), or protective plates for such displays, or materials on which an anti-reflective coating has been applied to their surface.

[0194] The articles of this disclosure may be optical components, but are not limited to these. Examples of optical components include: lenses such as those in eyeglasses; front protective plates, anti-reflective plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; touch panel sheets for devices such as mobile phones and personal digital assistants; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MOs; optical fibers; and display surfaces of watches.

[0195] Furthermore, the articles of this disclosure may be medical devices or medical materials. Also, articles having layers obtained by this disclosure may be automotive interior and exterior components. Examples of exterior components include: windows, light covers, and exterior camera covers. Examples of interior components include: instrument panel covers, navigation system touch panels, and decorative interior components.

[0196] The thickness of the above layer is not particularly limited. In the case of optical components, the thickness of the above layer may be in the range of, for example, 1 to 50 nm, preferably 1 to 30 nm, and more preferably 1 to 15 nm, from the viewpoint of optical performance, abrasion resistance, and antifouling properties.

[0197] For X-ray photoelectron spectroscopy (XPS) analysis to measure the atomic composition and constituent atom ratios of the surface treatment layer, the PHI5000VersaProbeII from ULVAC-PHI can be used. XPS analysis conditions include a 25W monochromatic AlKα X-ray source, a 1400 μm × 300 μm photoelectron detection area, a photoelectron detection angle in the range of 20 to 90 degrees (e.g., 20, 45, 90 degrees), and a pass energy of 23.5 eV. For sputtering, gas cluster ion beams or Ar ions can be used. Using the above apparatus and measurement conditions, the peak areas of C1s, O1s, and Si2p can be observed, and the atomic ratios of carbon, oxygen, and silicon can be calculated to determine the composition of the surface treatment layer and the intermediate layer.

[0198] Furthermore, depth analysis can also be performed. For XPS analysis, the measurement conditions include using a monochromatic AlKα X-ray source at 25W, a photoelectron detection area of ​​1400 μm × 300 μm, a photoelectron detection angle in the range of 20 to 90 degrees (e.g., 20 degrees, 45 degrees, 90 degrees), and a pass energy of 23.5 eV. Ar ions, gas cluster ions, C60 ions, etc., can be used as sputtering ions. Etching from 1 to 100 nm by sputtering can also be performed to obtain the composition of the coating film at each etching depth.

[0199] By adjusting the photoelectron detection angle in the XPS analysis described above, the detection depth can be adjusted as needed. For example, by setting a shallow angle close to 20 degrees, the detection depth can be set to about 3 nm, while by setting a deep angle close to 90 degrees, the detection depth can be set to about 10-something nm.

[0200] The silicon dioxide intermediate layer described above can be formed by applying a silicon dioxide precursor to the surface of the substrate. If the intermediate layer contains an alkali metal, the intermediate layer can be formed by applying a surface treatment agent containing a silicon dioxide precursor and an alkali metal source to the surface of the substrate.

[0201] Examples of silicon oxide precursors include silicic acid, partial condensates of silicic acid, alkali metal silicates, silane compounds having a hydrolyzable group bonded to a silicon atom, and partial hydrolyzable condensates of the silane compounds. Silicic acid and its partial condensates can be dehydrated and condensed to produce silicon oxide, while alkali metal silicates can be converted to silicic acid or its partial condensates using an acid or cation exchange resin, and the resulting silicic acid or partial condensates can be dehydrated and condensed to produce silicon oxide. Examples of hydrolyzable groups in silane compounds having a hydrolyzable group bonded to a silicon atom include alkoxy groups and chlorine atoms. The hydrolyzable group in the silane compound can be hydrolyzed to a hydroxyl group, and the resulting silanol compound can be dehydrated and condensed to produce silicon oxide. Examples of silane compounds having a hydrolyzable group bonded to a silicon atom include alkoxysilanes such as tetraalkoxysilanes and alkyltrialkoxysilanes, and tetrachlorosilanes.

[0202] Examples of alkali metal sources include alkali metal hydroxides and water-soluble alkali metal salts. Examples of water-soluble alkali metal salts include alkali metal carbonates, alkali metal bicarbonates, alkali metal hydrochlorides, and alkali metal nitrates. Alkali metal hydroxides and alkali metal carbonates are preferred as alkali metal sources.

[0203] Furthermore, alkali metal silicates can be used as silicon oxide precursors and alkali metal sources. Alkali metal silicates can be converted to silicon oxide via silicic acid, but a small amount of alkali metal may remain in the silicon oxide produced during this process. Therefore, by adjusting the amount of residual alkali metal, silicon oxide containing a predetermined amount of alkali metal atoms can be obtained.

[0204] The thickness of the above-mentioned intermediate layer is not particularly limited, but is, for example, in the range of 1 to 50 nm, preferably 1 to 30 nm, more preferably 2 to 15 nm, and even more preferably 3 to 10 nm.

[0205] The silane compounds, surface treatment agents containing said silane compounds, and articles obtained using said surface treatment agents have been described in detail above. However, this disclosure is not limited to those exemplified above.

[0206] The present disclosure will be described below with reference to examples, but the present disclosure is not limited to the following examples.

[0207] (Synthesis Example A-1) 2.11 g of 22-tricosenoic acid, 95 ml of toluene, and 1.26 g of 1,1'-carbonyldiimidazole were added and stirred at room temperature for 1 hour. Subsequently, the compound (A-1) CH was obtained by purification. ２ =CH(CH ２ ) ２０ CO(C) ３ H ４ N ２ ) 2.22 g was obtained.

[0208] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: 1.250 (s), 1.333-1.426 (m), 1.761-1.836 (m), 2.007-2.061 (dd), 2.837-2.875 (t), 4.909-5.016 (m), 5.761-5.863 (m), 7.104 (s), 7.481 (s), 8.174 (s)

[0209] Compound (A-1)

[0210] (Synthesis Example A-2) 1.38 g of compound (A-1), 24.9 g of toluene, CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２After adding 6.12 g of H to each, 0.56 ml of a xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was charged, and the mixture was heated to 60°C and stirred for 12 hours. Subsequently, purification was performed to obtain the following polydimethylsiloxane group-containing compound (A-2) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CO(C) ３ H ４ N ２ 6.86 g was obtained. The average value of n was 26.

[0211] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.076-0.223 (m), 0.505-0.543 (t), 1.253 (br s), 1.767-1.841 (m), 2.857-2.894 (t), 7.124 (s), 7.497 (s), 8.273 (s)

[0212] Compound (A-2)

[0213] (Synthesis Example A-3) 6.86 g of compound (A-2), 6.86 g of heptane, and 1.48 g of bis[3-(trimethoxysilyl)propyl]amine were added and stirred at 60°C for 3 hours. Subsequently, the compound (A) CH was obtained by purification. ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CON[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ 6.71 g was obtained. The average value of n was 26.

[0214] 1H NMR (CDCl3, 400 MHz) δ[ppm]: -0.109-0.216 (m), 0.499-0.537 (t), 0.559-0.612 (m), 1.245 (br s), 1.570-1.630 (m), 2.256-2.295 (t), 3.182-3.221 (t), 3.264-3.301 (t),3.556 (br s),3.575 (br s)

[0215] (Synthesis example B) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ By using H and performing the same procedure as in synthesis examples A-2 to A-3, except for changing the raw materials, compound (B) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CON[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ The result was obtained. The average value of n was 37.

[0216] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.109-0.216 (m), 0.499-0.537 (t), 0.559-0.612 (m), 1.245 (br s), 1.570-1.630 (m), 2.256-2.295 (t), 3.182-3.221 (t), 3.264-3.301 (t),3.556 (br s),3.575 (br s)

[0217] (Synthesis example C) CH ３ (Si(CH ３ ) ２ O) ｎ Si(CH ３ ) ２By using H and performing the same procedure as in synthesis examples A-2 to A-3, except for changing the raw materials, compound (C) CH ３ (Si(CH ３ ) ２ O) ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CON[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ The result was obtained. The average value of n was 34.

[0218] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.109-0.216 (m), 0.499-0.537 (t), 0.559-0.612 (m), 1.245 (br s), 1.570-1.630 (m), 2.256-2.295 (t), 3.182-3.221 (t), 3.264-3.301 (t),3.556 (br s),3.575 (br s)

[0219] (Synthesis Example D) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ By using H and performing the same procedure as in synthesis examples A-2 to A-3, except for changing the raw materials, compound (D) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CON[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ The result was obtained. The average value of n was 48.

[0220] 1H NMR (CDCl3, 400 MHz) δ[ppm]: -0.109-0.216 (m), 0.499-0.537 (t), 0.559-0.612 (m), 1.245 (br s), 1.570-1.630 (m), 2.256-2.295 (t), 3.182-3.221 (t), 3.264-3.301 (t),3.556 (br s),3.575 (br s)

[0221] (Synthesis Example E-1) 4.03 g of 22-perfluorophenol tricosenoate and 5.0 ml of THF (tetrahydrofuran) were added and stirred. At room temperature, 0.080 ml of a xylene solution containing 1.30 ml of dimethylchlorosilane and 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added and stirred at room temperature for 16 hours. After that, volatile components were removed by vacuum distillation and purification was performed to obtain 4.6 g of compound (E-1), chlorodimethylsilyltricosenate.

[0222] Compound (E-1)

[0223] In a separate reactor, 1.33 g of hexamethyldisiloxane and 10 ml of THF were added and stirred. Then, 2.57 ml of a hexane solution of 15% n-butyllithium was added in a 30°C water bath. After cooling in an ice bath, 17.79 g of hexamethylcyclotrisiloxane and 20 ml of THF were added in solution and stirred for a further 8 hours. While cooling in an ice bath, 2.3 g of the previously synthesized compound (E-1) chlorodimethylsilyltricosenate and 10 ml of THF were added in solution and stirred for 1 hour. Then, 1.50 g of 2-allylpent-4-en-1-amine was added and stirred for 16 hours while remaining in the ice bath. After that, a portion of the reaction solution was purified to obtain compound (E-2) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ CH [CH ２ CH=CH ２ ]２ 2.8 g was obtained. The average value of n was 57.

[0224] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.089 - 0.211 (m), 0.494 - 0.533 (t), 1.242 - 1.335 (m), 1.586 - 1.623 (m), 1.692 - 1.758 (m), 2.000 - 2.160 (m), 3.193 - 3.224 (t), 5.023 - 5.077 (m), 5.455 (br), 5.728 - 5.832 (m)

[0225] (Synthesis Example E) 2.74 g of compound (E-2), 5.5 mL of toluene, 14 μL of pyridine, and 70 μL of xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by 0.29 mL of trimethoxysilane, and the mixture was stirred at room temperature for 16 hours. After that, the compound (E) CH was obtained by purification. ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ CH [CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ 2.63 g was obtained. The average value of the repeating units of dimethylsiloxane was 57.

[0226] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.104-0.196 (m), 0.498(t), 0.604 (t), 1.226-1.339 (m), 1.404(quin), 1.568-1.664 (m), 2.130 (t), 3.160(t), 3.496-3.584 (m), 5.471 (br)

[0227] (Synthesis Example F-1) 4.03 g of 22-perfluorophenol tricosenoate and 5.0 ml of THF were added and stirred. At room temperature, 0.080 ml of a xylene solution containing 1.30 ml of dimethylchlorosilane and 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added and stirred at room temperature for 16 hours. After that, volatile components were removed by vacuum distillation and purification was performed to obtain compound (F-1), chlorodimethylsilyltricosenate, 4.6 g.

[0228] Compound (F-1)

[0229] In a separate reactor, 0.63 g of hexamethyldisiloxane and 5 ml of THF were added and stirred, and 1.29 ml of a hexane solution of 15% n-butyllithium was added at room temperature. After cooling in an ice bath, 8.90 g of hexamethylcyclotrisiloxane and 10 ml of THF were added in solution and stirred for a further 8 hours. While cooling in an ice bath, 1.2 g of the previously synthesized compound (F-1) chlorodimethylsilyltricosenate and 5 ml of THF were added in solution and stirred for 1 hour, and then 1.03 g of 2,2-diallylpent-4-en-1-amine was added and stirred for 16 hours while remaining in the ice bath. After that, a portion of the reaction solution was purified to obtain compound (E-2) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ C[CH ２ CH=CH ２ ] ３ 2.8 g was obtained. The average value of n was 52.

[0230] 1H NMR (CDCl3, 400 MHz) δ[ppm]: -0.087 - 0.212 (m), 0.498 - 0.536 (t), 1.244 - 1.338 (m), 1.585 - 1.620 (m), 2.017 - 2.036 (d), 2.129 - 2.167 (t), 3.183 - 3.198 (d), 5.062 - 5.109 (m), 5.502 (br), 5.807 - 5.912 (m)

[0231] (Synthesis Example F) 3.02 g of compound (F-2), 6 mL of toluene, 16 μL of pyridine, and 80 μL of xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by 0.51 mL of trimethoxysilane, and the mixture was stirred at room temperature for 16 hours. After that, the compound (F) was purified to obtain CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ C[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ３ 2.63 g was obtained. The average value of the repeating units of dimethylsiloxane was 52.

[0232] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.104-0.195 (m), 0.498(t), 0.578 (t), 1.136-1.376 (m), 1.467-1.685 (m), 2.133 (t), 3.084(d), 3.356-714 (m), 5.681 (br)

[0233] (Synthesis example G) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH２ ) ２２ CONH-CH ２ C[CH ２ CH=CH ２ ] ３ 1.92 g of [compound name], 3.9 mL of toluene, 11 μL of pyridine, and 50 μL of xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by 0.35 mL of trimethoxysilane, and the mixture was stirred at room temperature for 16 hours. Subsequently, the compound (G) CH was obtained by purification. ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ C[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ３ 1.89 g was obtained. The average number of repeating units of dimethylsiloxane was 41.

[0234] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.104-0.196 (m), 0.499(t), 0.577 (t), 1.137-1.376 (m), 1.558-1.668 (m), 2.133 (t), 3.084(d), 3.463-3.613 (m), 5.678 (br)

[0235] (Synthesis Example H-1) 1.5 g of perfluorophenol 22-tricosenoate, 6 ml of tetrahydrofuran, and 90 μL of a xylene solution containing 2% of a Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added to each, and then 0.48 mL of dimethylchlorosilane was charged and the mixture was stirred at room temperature for 5 hours. After that, volatile components were removed by vacuum distillation and purification was performed to obtain compound (H-1), chlorodimethylsilyltricosenoate.

[0236] In a separate reactor, 2.4 mL of hexamethyldisiloxane and 16 mL of THF were added and stirred. 3.7 mL of a hexane solution of 15% n-butyllithium was added in a 30°C water bath. After cooling in an ice bath, 15.9 g of hexamethylcyclotrisiloxane and 18 mL of THF were added in solution and stirred for a further 8 hours. While cooling in an ice bath, the previously synthesized compound (H-1) chlorodimethylsilyltricosenate and 16 mL of THF were added in solution and stirred for 1 hour. Then, 2.8 g of 2-allylpent-4-en-1-amine was added and stirred for 16 hours while remaining in the ice bath. Subsequently, a portion of the reaction solution was purified to obtain compound (H-2) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ CH [CH ２ CH=CH ２ ] ２ 1.44 g was obtained. The average value of n was 70.

[0237] 1 H NMR (CDCl3, 400 MHz) δ5.84-5.74 (m, 2H), 5.08-5.03 (m, 4H), 3.22 (t, 2H),2.17-2.05 (m, 6H), 1.37-1.19 (m, 40H), 1.74 (quint, 1H), 0.52 (t, 2H), 0.3- -0.2(m, 428H)

[0238] (Synthesis Example H) 1.38 g of compound (H-1), 5 mL of toluene, 10 μL of pyridine, and 30 μL of xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by 0.24 mL of trimethoxysilane, and the mixture was stirred at room temperature for 16 hours. After that, the compound (H) was purified to obtain CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH２ ) ２２ CONH-CH ２ CH [CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ 0.76 g was obtained. The average value of the repeating units of dimethylsiloxane was 70.

[0239] 1 H NMR (CDCl3, 400 MHz) δ[ppm]:δ 3.56 (s, 18H), 3.18 (t, 2H), 2.15 (t, 2H), 1.62(m, 3H), 1.38-1.16 (m, 38H), 0.52 (t, 2H), 0.1-0.05 (m, 428H)

[0240] (Synthesis Example I) CH ３ (Si(CH ３ ) ２ O) ４８ Si(CH ３ ) ２ By using H and performing the same procedure as shown in the synthesis examples A-2 to A-3 the other day, except for changing the raw materials, compound (33) CH ３ (Si(CH ３ ) ２ O) ４８ Si(CH ３ ) ２ (CH ２ ) ２２ CON((CH ２ ) ３ Si(OCH) ３ ) ３ ) ２ The result was obtained. The average value of n is 48.

[0241] (Synthesis Example J) Compound (J) was synthesized according to the method described in Synthesis Examples 5 and 6 of the specification of Japanese Patent Application Publication No. 2024-25759, except that tricosanoic acid chloride was used as a raw material.

[0242] 1H NMR (CDCl3 , 400 MHz) δ [ppm]: 0.025-0.159 (m), 0.629(t), 0.881 (t), 1.183-1.323 (m), 1.374-1.541 (m), 1.662 (quin), 2.154 (t), 3.184 (t), 3.557-3.575 (m), 5.524 (t)

[0243] (Compound J)

[0244] (Synthesis Example M) Compound (M) was synthesized according to the method described in Synthesis Example 1 of the specification of Japanese Patent Application Publication No. 2024-25759.

[0245] (Compound M)

[0246] (Synthesis Example P) Compound (P) was synthesized according to the method described in Synthesis Example 2 of the specification of Japanese Patent Application Publication No. 2024-25759.

[0247] (Compound P)

[0248] (Synthesis example S) CH ３ (Si(CH ３ ) ２ O) ｎ Si(CH ３ ) ２ After adding 6.04 g of H, 14.1 g of toluene, and 0.66 g of 10-undecenyltrimethoxysilane, 0.19 ml of xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was charged, and the mixture was heated to 80°C and stirred for 2 hours. Subsequently, the compound (S) CH was obtained by purification. ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) １１ Si(OCH) ３ ) ３ 6.50 g was obtained. The average value of n was 37.

[0249] 1H NMR (CDCl3, 400 MHz) δ[ppm]: -0.078-0.221 (m), 0.503-0.542 (t), 0.626-0.668 (t),1.252 (br s), 1.367-1.425 (m), 3.568 (br s)

[0250] (Synthesis Example T) (CH ３ ) ３ Si-(OSi(CH ３ ) ２ ) ｎ - (CH ２ ) １０ -CON(CH ２ CH=CH ２ ) ２ Mix (2 g), toluene (10 mL), xylene solution of Karlstedt catalyst (2%, 0.20 mL), aniline (32 mg), and trimethoxysilane (1.00 mL), stir overnight at room temperature, and then concentrate under reduced pressure to obtain compound (T) (CH ３ ) ３ Si-(OSi(CH ３ ) ２ ) ｎ - (CH ２ ) １０ -CON[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ (2.23 g) was obtained. The average value of the number of repeating units n was 19.

[0251] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.20-0.31 (m), 0.42-0.65 (m, 6H), 1.10-1.40 (m, 14H), 1.63-1.71 (m, 6H), 2.26 (t, 2H, 7.2 Hz), 3.19 (t, 2H, 7.6 Hz), 3.27 (t, 2H, 7.6 Hz), 3.45-3.65 (m, 18H).

[0252] (Synthesis example U) CH ３ CH ２ CH ２ CH ２[Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ CH=CH ２ 3.55 g of [compound name], 15 mL of toluene, 0.08 mL of pyridine, and 0.6 mL of xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by 3.0 mL of trimethoxysilane, and the mixture was stirred at room temperature for 16 hours. Subsequently, the compound (U) CH was obtained by purification. ３ CH ２ CH ２ CH ２ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ 3.43 g was obtained. The average value of the number of repeating units n was 13.

[0253] Compound (46)

[0254] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: 0.019-0.100 (m), 0.491-0.531 (m), 0.626 (t), 0.859 (t), 1.184-1.327(m), 1.578-1.653 (m), 2.122 (t), 3.225 (q), 3.520-3.626 (m), 5.600 (br)

[0255] (Synthesis Example V) CH ３ -Si(CH ３ ) ２ O-Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２CH=CH ２ 0.79 g of [compound name], 15.0 mL of toluene, 0.05 mL of pyridine, and 0.6 mL of xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by 1.0 mL of trimethoxysilane, and the mixture was stirred at room temperature for 16 hours. Subsequently, the compound (V) CH was obtained by purification. ３ -Si(CH ３ ) ２ O-Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ 0.912 g was obtained.

[0256] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: 0.005-0.202 (m), 0.472-0.591 (m), 0.623-0.664 (m), 1.245-1.282 (m), 1.576-1.669 (m), 2.119-2.158 (t), 3.216-3.265 (m), 3.534-3.614 (m)

[0257] (Synthesis example W-1) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ By using H and performing the same procedure as in Synthesis Example A-2, except for changing the raw materials, compound (W-1)CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CO(C) ３ H ４ N ２ The result was obtained. The average value of n was 52.

[0258] Compound (W-1)

[0259] (Synthesis Example W-2) 4.49 g of compound (W-1), 26 mL of toluene, and 0.07 g of allylamine were added and stirred at room temperature for 2 hours. After that, the compound (W-2) CH was obtained by purification. ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ CH=CH ２ 3.69 g was obtained. The average value of n was 52.

[0260] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.074-0.226 (m), 0.529 (t), 1.192-1.377 (br), 1.642 (quin), 2.191 (t), 3.894 (tt), 5.121-5.207 (m),5.434 (br),5.799-5.881 (m)

[0261] (Synthesis Example W) 3.69 g of compound (W-2), 3.7 mL of toluene, and 0.047 mL of xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by the addition of 0.32 mL of trimethoxysilane and stirring at 45°C for 2 hours. Subsequently, the compound (W)CH was obtained by purification. ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ 3.63 g was obtained. The average value of n was 52.

[0262] 1H NMR (CDCl3, 400 MHz) δ[ppm]: -0.099-0.242 (m), 0.529 (t), 0.655 (t), 1.171-1.406 (m), 1.549-1.677 (m), 2.150 (t), 3.254 (q), 3.479-3.618 (m),5.633 (br)

[0263] (Synthesis Example X-1) 9.51 g of 2-amino-1,3-propanediol, 475 mL of methanol, and 25 g of di-tert-butyl dicarbonate were added, and the mixture was stirred at room temperature for 24 hours. Subsequently, the mixture was purified by silica gel chromatography to obtain 18.3 g of compound (X-1) tert-butyl (1,3-dihydroxypropan-2-yl)carbamate.

[0264] Compound (X-1)

[0265] (Synthesis Example X-2) 17.1 g of compound (X-1) and 790 mL of dimethyl sulfoxide were added, and the mixture was cooled to 17°C. 28.4 mL of allyl bromide and 18.4 g of potassium hydroxide were added, and the mixture was stirred at room temperature for 3 hours. Aqueous ammonium chloride solution and heptane were added and the mixture was separated. The resulting organic layer was washed with water, and then magnesium sulfate was added and the mixture was dried. After filtering off the magnesium sulfate, the mixture was concentrated, and the resulting crude product was purified by silica gel chromatography to obtain 13.5 g of compound (X-2), tert-butyl (1,3-bis(allyloxy)propan-2-yl)carbamate.

[0266] Compound (X-2)

[0267] (Synthesis Example X-3) 12.5 g of compound (X-2) and 230 mL of dichloromethane were added separately, the mixture was cooled to -2°C, 92.0 mL of trifluoroacetic acid was added, and the mixture was stirred at room temperature for 9 hours. Aqueous sodium carbonate solution and ethyl acetate were added and the mixture was separated, and magnesium sulfate was added and dried. After filtering off the magnesium sulfate, the mixture was concentrated, and the resulting crude product was purified by silica gel chromatography to obtain 5.10 g of compound (X-3) 1,3-bis(allyloxy)propan-2-amine.

[0268] Compound (X-3)

[0269] (Synthesis Example X-4) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ By using H and performing the same procedure as in Synthesis Example A-2, except for changing the raw materials, compound (X-4) CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CO(C) ３ H ４ N ２ The result was obtained. The average value of n was 47.

[0270] Compound (X-4)

[0271] (Synthesis Example X-5) 2.0 g of compound (X-4), 5.4 mL of toluene, and 0.11 g of compound (X-3) were added and stirred at room temperature for 2 hours. Subsequently, the compound (X-5) CH was obtained by purification. ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH(CH ２ OCH ２ CH=CH ２ )２ 2.2 g was obtained. The average value of n was 47.

[0272] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.099-0.244 (m), 0.529 (t), 1.170-1.400 (m), 1.645 (quin), 2.192(t), 3.151-3.207(m), 3.304-3.571(m), 3.999-4.100 (m), 5.157-5.294 (m), 5.479(br), 5.853-5.951 (m)

[0273] (Synthesis Example X) 2.2 g of compound (X-5), 2.2 mL of toluene, and 0.03 mL of xylene solution containing 2% of the Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane were added, followed by 0.14 mL of trimethoxysilane, and the mixture was stirred at 45°C for 2 hours. After that, the compound (X)CH was purified. ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH(CH ２ OCH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ) ２ 2.3 g was obtained. The average value of n was 47.

[0274] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.099-0.244 (m), 0.529 (t), 0.655 (t), 1.170-1.400 (m), 1.554-1.674 (m), 2.150 (t), 3.354 (dt), 3.479-3.618 (m), 4.009(m), 5.635 (br)

[0275] (Synthesis Example Y) By using triethoxysilane and performing the same procedure as in Synthesis Example W except for changing the starting material, compound (Y)CH ３ [Si(CH ３ ) ２ O] ｎ Si(CH ３ ) ２ (CH ２ ) ２２ CONH-CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ 4.69 g was obtained. The average value of n was 46.

[0276] 1 H NMR (CDCl3, 400 MHz) δ[ppm]: -0.092-0.206 (m), 0.509 (t), 0.623 (t), 1.153-1.347 (m), 1.531-1.723 (m), 2.132 (t), 3.239 (q), 3.752-3.886 (m),5.697 (br)

[0277] <Preparation of Surface Treatment Agent> As shown in Table 1 below, a surface treatment agent was prepared by dissolving the compounds and additives, or by dissolving the compounds in a solvent to form a surface treatment layer. Heptane was used as the solvent, and the solid content concentration relative to the solvent was 20% by weight. Additives were added at a rate of 5% by weight relative to the solid components of compounds E, F, A, and C, and a solution was prepared so that the total mass of compounds E, F, A, and C and the additives was 20% by weight relative to the solvent.

[0278]

[0279] <Na-containing intermediate layer forming material> 2.2 g of sodium hydroxide (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) was dissolved in 24 g of distilled water to obtain an 8.4% by mass sodium hydroxide aqueous solution. 24 g of this 8.4% by mass sodium hydroxide aqueous solution and 20 g of MS gel (M.S.GEL D-100-60A (manufactured by AGC SI-TECH)) were mixed to allow the sodium hydroxide aqueous solution to be absorbed into the MS gel. The MS gel that absorbed the sodium hydroxide aqueous solution was dried at 25°C for 8 hours, then molded in a tablet molding machine (4 MPa for 1 minute), and fired at 1,000°C for 1 hour to obtain molded body 1 (pellet).

[0280] <Preparation of surface treatment layer> (Na-containing SiO ２ Intermediate layer) The surface treatment agent prepared above was vacuum deposited onto chemically strengthened glass (Corning Gorilla Glass, 0.7 mm thick). Specifically, 0.1 g of the surface treatment agent was filled into a molybdenum boat in the vacuum deposition apparatus, and the inside of the vacuum deposition apparatus was subjected to a pressure of 3.0 × 10⁻¹⁰ －３ The pressure was reduced to below Pa. Subsequently, a silicon dioxide film containing Na with a thickness of 7 nm was formed by depositing using electron beam evaporation with the molded body 1, and then a surface treatment layer was formed by heating the boat using resistance heating. After that, the surface treatment layer was obtained by heat treatment at 150°C for 1 hour in an oven.

[0281] (SiO ２ Intermediate layer) The surface treatment agent prepared above was vacuum deposited onto chemically strengthened glass (Corning Gorilla Glass, 0.7 mm thick). Specifically, 0.1 g of the surface treatment agent was filled into a molybdenum boat in the vacuum deposition apparatus, and the inside of the vacuum deposition apparatus was subjected to a pressure of 3.0 × 10⁻¹⁰ －３ The pressure was reduced to below Pa. Subsequently, a silicon dioxide film with a thickness of 5 nm was formed, and then a surface treatment layer was formed by heating the boat using a resistance heating method. After that, the surface treatment layer was obtained by heat treatment in an oven at 150°C for 1 hour.

[0282] [UV Durability Evaluation] A weather resistance test was performed on the substrate having the surface treatment layer obtained above. UV irradiation was performed for 200 hours, and the static contact angle of oil droplets was measured before and after the irradiation. The retention rate of the static contact angle of the oil was used as an indicator of UV durability.

[0283] UV irradiation was performed using a UVB-313 lamp (manufactured by Q-Lab, with an irradiance of 0.35 W / m² at 310 nm). ２ The experiment was conducted using a lamp with a distance of 5 cm between the lamp and the surface treatment layer of the substrate, and with the temperature of the plate on which the substrate was placed set to 63°C. When measuring the static contact angle of the oil, the surface treatment layer was wiped five times back and forth with a Kimwipe (product name, manufactured by Jujo Kimberly Co., Ltd.) impregnated with ethanol, and then five times back and forth with a dry Kimwipe, and the static contact angle was measured immediately afterward.

[0284] (Contact Angle Measurement Method) The contact angle was measured using a fully automatic contact angle meter, DropMaster 700 (manufactured by Kyowa Interface Science Co., Ltd.), in a 25°C environment. Specifically, the substrate with the surface treatment layer to be measured was placed horizontally, 2 μL of water was dropped onto its surface from a microsyringe, and the static contact angle was measured by capturing a still image with a video microscope one second after dropping. The static contact angle was measured at five different points on the surface treatment layer of the substrate, and the average value was used.

[0285] (Evaluation criteria for UV durability) The water contact angle on a substrate with a surface treatment layer was measured after 200 hours of UV irradiation. A larger water contact angle indicates that the coating remains intact even after UV irradiation.

[0286] [Method for Measuring the Oleic Acid Drop Angle] (Contact Angle Measurement Method) The contact angle was measured in a 25°C environment using a fully automatic contact angle meter, DropMaster 700 (manufactured by Kyowa Interface Science Co., Ltd.). Specifically, the substrate with the surface treatment layer to be measured was placed horizontally, and 5 μL of oleic acid was dropped onto its surface from a microsyringe. Starting 1 second after dropping, the stage was tilted by 1° every second, and still images were captured with a video microscope. The angle of the stage when the formed oleic acid droplet moved 1 mm was recorded as the oleic acid drop angle. The oleic acid drop angle was measured similarly at three points on the substrate with different surface treatment layers, and the average value was used. A smaller drop angle indicates a surface with excellent sliding properties.

[0287] Table 2 shows the results of the UV durability evaluation and the measurement of the oleic acid fall angle.

[0288]

[0289] The silane compounds, compositions containing silane compounds, surface treatment agents, and articles of this disclosure can be suitably used in a wide variety of applications.

Claims

1. Formula (1): [In the formula: n is an integer from 10 to 300, p is an integer from 11 to 60, X is -C(=O)NR ｂ , ｓ２ , １ , ２ , ｓ１ , ｃ１ , １ , ｂ１ -, -C(=O)- or -C(=O)O-, R ４１ is a hydrogen atom, an oxyalkylene-containing group, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, r is 0 or 1, R ｐ is a single bond or an alkylene group having 1 to 30 carbon atoms, X ｂ is a silicon atom, a carbon atom or a nitrogen atom, R ａ１ are each independently -Z １ -SiR ｂ１ ｐ１ R ｃ１ ｑ１ and R ｂ１ are each independently a hydroxyl group or a hydrolyzable group, R ｃ１ are each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, Z １ are each independently a single bond, an alkylene group having 1 to 30 carbon atoms or -(CH ２ ) ｓ１ -(O) ｓ２ -, s1 is an integer from 0 to 30, s2 is an integer from 1 to 10, provided that the order of existence of each repeating unit enclosed in parentheses with s1 and s2 is arbitrary in Z １ and does not include a structure in which oxygen atoms are continuously bonded, p1 are each independently an integer from 0 to 3, q1 are each independently an integer from 0 to 3, k1, l1 and m1 are each independently an integer of 0 or more, provided that ｂ [[ID= 2. The silane compound according to claim 1, wherein r is 0.

3. r is 0, and X ｂ The silane compound according to claim 1 or 2, wherein is a silicon atom, k1 is 0, l1 is an integer from 1 to 3, and m1 is an integer from 0 to 2.

4. The silane compound according to claim 1, wherein r is 1.

5. r is 1, X ｂ The silane compound according to claim 1 or 4, wherein l1 is a carbon atom, k1 is 2, l1 is 0 or 1, m1 is 0 or 1, p1 is an integer from 0 to 3, and q1 is an integer from 0 to 3, wherein the sum of l1 and p1 is 1 or more.

6. r is 1, and X ｂ The silane compound according to claim 1 or 4, wherein is a carbon atom, k1 is 3, l1 and m1 are 0, p1 is an integer from 0 to 3 independently, and q1 is an integer from 0 to 3 independently, provided that the sum of p1 is 1 or more.

7. r is 1, X ｂ The silane compound according to claim 1 or 4, wherein is a nitrogen atom, k1 is 2, l1 and m1 are 0, p1 is each an integer from 0 to 3, and q1 is each an integer from 0 to 3, provided that at least one p1 is 1 or more.

8. The silane compound according to any one of claims 1 to 7, wherein n is an integer from 10 to 150, and p is an integer from 11 to 50.

9. The silane compound according to any one of claims 1 to 8, wherein n is an integer between 10 and 100, and p is an integer between 11 and 30.

10. The silane compound according to any one of claims 1 to 9, wherein n is an integer from 20 to 80.

11. The silane compound according to any one of claims 1 to 10, wherein n is an integer from 20 to 80, and p is an integer from 16 to 24.

12. The silane compound according to claim 1, which is any one of the following: CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -Si(OCH) ３ ) ３ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -Si(OCH) ２ CH ３ ) ３ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -C(=O)NH-(CH ２ ) ｐ -Si(OCH) ３ ) ３ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -C(=O)NH-(CH ２ ) ｐ -Si(OCH) ２ CH ３ ) ３ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -C(=O)NH-CH[CH ２ OCH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=O)NH-CH[CH ２ OCH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -CH[CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -C[CH] ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ３ CH ３ -[Si(CH) ３ ) ２ O] ｎ -Si(CH) ３ ) ２ -(CH) ２ ) ｐ -C(=0)NH-CH ２ -C[CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ３ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -C(=O)N[CH ２ CH ２ CH ２ Si(OCH) ３ ) ３ ] ２ CH ３ -[Si(CH ３ ) ２ O] ｎ -Si(CH ３ ) ２ - (CH ２ ) ｐ -C(=O)N[CH ２ CH ２ CH ２ Si(OCH) ２ CH ３ ) ３ ] ２ [In the formula, n is an independent integer between 10 and 300, and p is an independent integer between 11 and 60.] 13. The silane compound according to claim 12, wherein n is an integer from 20 to 80, and p is an integer from 16 to 24, each independently.

14. Formula (1A): [In the formula: n is an integer between 10 and 300, p is an integer between 11 and 60, and X is -C(=O)NR] ４１ -, -C(=O)- or -C(=O)O-, R ４１ R is a hydrogen atom, an oxyalkylene-containing group, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and r is 0 or 1. ｐ X is a single bond or an alkylene group having 1 to 30 carbon atoms. ｂ Z is a silicon atom, a carbon atom, or a nitrogen atom. １１ Each of these is independently a single bond, an alkylene group having 1 to 28 carbon atoms, or -(CH ２ ) ｓ３ - (O) ｓ２ -, where s3 is an integer from 0 to 28, and s2 is an integer from 1 to 10, and the order of existence of each repeating unit enclosed in parentheses with s3 and s2 is Z １１ The structure is arbitrary, except for structures in which oxygen atoms are bonded in succession, and R ｂ１ Each of these is independently a hydroxyl group or a hydrolyzable group, R ｃ１ Each of these is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, k1, l1 and m1 are independently independent integers of 0 or more, and the sum of k1, l1 and m1 is X ｂ The compound is represented by [ ], which has a valency of -1.

15. A surface treatment agent comprising a silane compound according to any one of claims 1 to 13.

16. A surface treatment agent comprising a condensate of a silane compound according to any one of claims 1 to 13.

17. Furthermore, [In the formula: p3 is an integer between 6 and 80, and X ３ is -C(=O)NR ４１ -, -C(=O)- or -C(=O)O-, R ４１ is a hydrogen atom, an oxyalkylene-containing group, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and r3 is 0 or 1, R ｐ３ X is a single bond or an alkylene group having 1 to 30 carbon atoms. ｂ３ R is a silicon atom, carbon atom, or nitrogen atom. ａ３ Each of them is independent of -Z ３ -SiR ｂ３ ｐ３ R ｃ３ ｑ３ And R ｂ３ Each of these is independently a hydroxyl group or a hydrolyzable group, R ｃ３ Each is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, Z ３ Each of these is independently a single bond, an alkylene group having 1 to 30 carbon atoms, or -(CH ２ ) ｓ１ - (O) ｓ２ - and s1 is an integer from 0 to 30, s2 is an integer from 1 to 10, where the order of existence of each repeating unit enclosed in parentheses with s1 and s2 is Z ３ The elements within are arbitrary, except for structures in which oxygen atoms are bonded in a continuous chain, p3 are each independent integers from 0 to 3, q3 are each independent integers from 0 to 3, k3, l3 and m3 are each independent integers of 0 or more, however, the sum of l3 and p3 is 1 or more, and the sum of k3, l3 and m3 is X ｂ３ The surface treatment agent according to claim 15 or 16, comprising a compound represented by ], which has a valency of -1.

18. The surface treatment agent according to claim 17, wherein the content of the compound represented by formula (2) is 0.1 to 30% by mass relative to the total of the compound represented by formula (1) and the compound represented by formula (2).

19. A surface treatment agent according to any one of claims 15 to 18, for use in vacuum deposition.

20. A surface treatment agent according to any one of claims 15 to 18, for wet coating.

21. A pellet containing the surface treatment agent described in any one of claims 15 to 19.

22. An article comprising a base material and a layer formed on the base material from a surface treatment agent according to any one of claims 15 to 20.

23. The article according to claim 22, comprising an intermediate layer containing silicon oxide between the substrate and the layer.

24. The article according to claim 23, wherein the intermediate layer contains alkali metal atoms.

25. The article according to claim 24, wherein at least a portion of the alkali metal atoms are sodium atoms.

26. An article according to any one of claims 22 to 25, which is an optical component.

27. An article according to any one of claims 22 to 26, which is a display.

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