Display device and electronic device comprising same

Abstract

This display device comprises: a pixel defining layer defining a pixel area; a light-emitting layer disposed in the pixel area; a first electrode and a second electrode respectively disposed below and above the light-emitting layer; a reflective pattern disposed below the first electrode; and an etching prevention pattern disposed below the reflective pattern, wherein the etching prevention pattern may be electrically connected to the first electrode.

Description

Display device and electronic device including the same

[0001] The embodiments of the present application relate to a display device and an electronic device including the same. More specifically, the invention relates to a display device including a light-emitting layer and an electronic device including the same.

[0002] Organic light-emitting diodes possess self-luminous characteristics and can provide enhanced viewing angle and contrast characteristics. Additionally, they can provide high response speed and high brightness. The display device has multiple pixels. The multiple pixels can emit light of different colors.

[0003] A light-emitting layer and electrodes that drive it can be placed in the light-emitting region of a pixel. Recently, various designs are being studied for the light-emitting region to improve the viewing angle and luminance ratio of the light emitted from the light-emitting layer.

[0004] One objective of the present invention is to provide a display device having improved luminescence uniformity.

[0005] One objective of the present invention is to provide a display device having improved frontal light efficiency, viewing angle, and side luminance ratio.

[0006] One objective of the present invention is to provide an electronic device comprising a display device having improved luminous uniformity, frontal luminous efficiency, viewing angle, and side luminance ratio.

[0007] A display device according to exemplary embodiments includes a pixel defining film defining a pixel area; a light-emitting layer disposed within the pixel area; a first electrode and a second electrode disposed respectively below and above the light-emitting layer; a reflection pattern disposed below the first electrode; and an etching prevention pattern disposed below the reflection pattern, wherein the etching prevention pattern may be electrically connected to the first electrode.

[0008] In some embodiments, the etching prevention pattern may have the same potential as the first electrode.

[0009] In some embodiments, the first electrode may be an anode and the second electrode may be a cathode.

[0010] In some embodiments, the reflection pattern may include an uneven shape having an upper surface and an inclined surface.

[0011] In some embodiments, the first electrode, the light-emitting layer, and the second electrode may be arranged in a shape corresponding to the shape of the reflection pattern.

[0012] In some embodiments, the etching prevention pattern may be integrally connected.

[0013] In some embodiments, the anti-etching pattern may be electrically connected to a first electrode at the bottom of the reflection pattern closest to the pixel definition film.

[0014] In some embodiments, the anti-etching pattern may include a spiral pattern.

[0015] In some embodiments, the spiral pattern may have a structure in which semicircles with different diameters are alternately connected with respect to the spiral center.

[0016] In some embodiments, the spiral pattern may have a structure in which semicircles with sequentially increasing diameters are connected, starting from the semicircle with the smallest diameter, with the spiral starting point at the center of the spiral.

[0017] In some embodiments, the distance between a specific spiral pattern line and its outer spiral pattern line and the centerline of the spiral pattern line may be greater than or equal to the pitch of the spiral pattern line.

[0018] In some embodiments, among pairs of mutually perpendicular symmetry axes passing through the center of the spiral, there may exist pairs of symmetry axes in which the number of pattern lines passing through each mutually perpendicular symmetry axis is the same.

[0019] In some embodiments, the anti-etching pattern may include a mesh pattern.

[0020] In some embodiments, the mesh pattern has contact areas where openings face each other, and the contact areas may be formed such that among pairs of mutually perpendicular symmetry axes passing through the center of the mesh pattern, there exist pairs of symmetry axes through which the number of contact areas passing through each mutually perpendicular symmetry axis is the same.

[0021] A display device according to exemplary embodiments includes a light-emitting element and a transistor electrically connected to the light-emitting element, and

[0022] The light-emitting element comprises: a pixel defining film defining a pixel region; a light-emitting layer disposed within the pixel region; a first electrode and a second electrode disposed respectively below and above the light-emitting layer; a reflection pattern disposed below the first electrode; and an etching prevention pattern disposed below the reflection pattern, wherein the etching prevention pattern is electrically connected to the first electrode.

[0023] The transistor comprises an active layer, a gate insulating layer, a gate electrode, and a connecting electrode, and the first electrode and the etching prevention pattern can be electrically connected to the connecting electrode.

[0024] In some embodiments, the etching prevention pattern may extend to the contact portion of the first electrode and the connecting electrode.

[0025] In some embodiments, the etching prevention pattern may come into contact with at least a portion of the contact portion of the first electrode and the connecting electrode.

[0026] In some embodiments, the anti-etching pattern may be conductive.

[0027] An electronic device according to exemplary embodiments may include the aforementioned display device; a window structure providing a display surface of the display device; and a housing in which the display device is accommodated.

[0028] In some embodiments, the electronic device may include a flat panel display, a curved display, a computer monitor, a medical monitor, a television, a billboard, indoor or outdoor lighting, a signal light, a head-up display, a transparent display, a flexible display, a rollable display, a foldable display, a stretchable display, a laser printer, a telephone, a mobile phone, a tablet, a phablet, a personal information terminal (PDA), a wearable device, a laptop computer, a digital camera, a camcorder, a viewfinder, a micro display, a 3D display, a virtual reality or augmented reality display, a vehicle, a video wall, a theater or stadium screen, or a light therapy device.

[0029] In a display device according to embodiments of the present invention, the etching prevention pattern may be electrically connected to the first electrode. Accordingly, parasitic capacitance caused by the etching prevention pattern may be eliminated, thereby improving luminescence uniformity.

[0030] The anti-etching pattern can have a symmetrical structure. Accordingly, luminescence uniformity can be improved.

[0031] A reflective pattern may be provided on the upper part of the anti-etching pattern. Accordingly, frontal light efficiency is improved, and the viewing angle and side luminance ratio (color difference) can also be improved.

[0032] FIG. 1 is a schematic cross-sectional view of a display device according to exemplary embodiments.

[0033] Figure 2 is a partial enlarged cross-sectional view of region B in Figure 1.

[0034] Figure 3 is a partial enlarged cross-sectional view of a display device according to a comparative example.

[0035] Figure 4 is a schematic plan view of an anti-etching pattern according to a comparative example.

[0036] FIGS. 5a to 5c are schematic cross-sectional views illustrating a method for manufacturing a reflection pattern and an anti-etching pattern according to exemplary embodiments.

[0037] FIGS. 6 to 9 are schematic plan views of an anti-etching pattern having a spiral pattern shape of a display device according to exemplary embodiments.

[0038] FIGS. 10 to 15 are schematic plan views of an anti-etching pattern having a mesh-like pattern shape of a display device according to exemplary embodiments.

[0039] FIG. 16 is a schematic exploded perspective view showing an electronic device in exemplary embodiments.

[0040] FIG. 17 is a schematic diagram showing an electronic device according to exemplary embodiments.

[0041] FIG. 18 is a block diagram of an electronic device according to one embodiment.

[0042] FIGS. 19 and 20 are schematic diagrams of electronic devices according to various embodiments.

[0043] Hereinafter, embodiments of the present invention will be described in more detail with reference to the attached drawings. In this case, the same reference numerals are used for identical components in the drawings, and redundant descriptions of identical components are omitted. The embodiments disclosed in the attached drawings are exemplary and should be understood to include all modifications, equivalents, and substitutions that fall within the spirit and scope of the present invention.

[0044] Terms used in this specification, such as "is on," "is placed," "is overlapped," "is connected," and "is combined," include not only direct placement / connection / combination but also cases where other components are placed in between.

[0045] Terms such as "first," "second," "third," "below," "lower side," "underside," "above," "upper side," "top side," "left side," and "right side" are used as relative concepts to distinguish different components or locations and do not specify absolute positions or order.

[0046] FIG. 1 is a schematic cross-sectional view showing a display device according to exemplary embodiments.

[0047] Referring to FIG. 1, the display device may include a circuit layer (CL) disposed on a base substrate (200) and light-emitting elements (ED1, ED2, ED3) disposed on the circuit layer (CL).

[0048] The base substrate (200) may be provided as a support substrate or back-plane substrate of an image display device. A glass substrate or a plastic substrate may be used as the base substrate (200).

[0049] In some embodiments, the base substrate (200) may comprise a polymer material having transparency and flexibility. In this case, the base substrate (200) may be employed in a transparent flexible display device. For example, the base substrate (200) may comprise a polymer material such as polyimide, polysiloxane, epoxy resin, acrylic resin, or polyester. In one embodiment, the base substrate (200) may comprise polyimide.

[0050] The circuit layer (CL) may include transistors (TR1, TR2, TR3). The circuit layer (CL) may include wiring layers and insulating layers that form a thin-film transistor array (TFT-Array).

[0051] The circuit layer (CL) may further include a buffer layer (205) formed on the upper surface of the base substrate (200). Moisture penetrating through the base substrate (200) can be blocked by the buffer layer (205), and the diffusion of impurities between the base substrate (200) and the structure formed on the base substrate (200) can be blocked.

[0052] The buffer layer (205) may include, for example, silicon oxide, silicon nitride, or silicon oxynitride. These may be used alone or in combination of two or more. In some embodiments, the buffer layer (205) may have a stacked structure including a silicon oxide film and a silicon nitride film.

[0053] Transistors (TR1, TR2, TR3) may be disposed on the buffer layer (205). The first transistor (TR1), the second transistor (TR2), and the third transistor (TR3) may be electrically connected to the first light-emitting element (ED1), the second light-emitting element (ED2), and the third light-emitting element (ED3), respectively.

[0054] The transistors (TR1, TR2, TR3) may each include an active layer (210), a gate insulating layer (220), and a gate electrode (230).

[0055] The active layer (210) is placed on the buffer layer (205) and may be arranged repeatedly / regularly for each pixel. The active layer (210) may include a silicon compound such as amorphous silicon or polysilicon. A portion of the active layer (210) may be doped with a p-type dopant or an n-type dopant, and the active layer (210) may include a source region, a drain region, and a channel region.

[0056] The active layer (210) may include an oxide semiconductor such as indium-gallium-zinc oxide (IGZO), zinc-tin oxide (ZTO), or ITZO.

[0057] A gate insulating layer (220) is formed on an active layer (210), and a gate electrode (230) may be laminated on the gate insulating layer (220). As shown in FIG. 1, the gate insulating layer (220) may be formed in a pattern shape that partially covers each active layer (210). Alternatively, the gate insulating layer (220) may extend continuously across a plurality of pixels or light-emitting regions and may be commonly included for the first to third transistors (TR1, TR2, TR3).

[0058] The gate electrode (230) can be overlapped in a vertical direction with the channel region of the active layer (210).

[0059] An interlayer insulating layer (240) covering a gate insulating layer (220) and a gate electrode (230) may be formed on the active layer (210). Connecting electrodes (250, 260) that are in contact with or electrically connected to the active layer (210) may be disposed on the interlayer insulating layer (240).

[0060] The connecting electrodes (250, 260) penetrate the interlayer insulating layer (240) and can be connected to the active layer (210). When the gate insulating layer (220) is formed continuously and commonly across a plurality of light-emitting regions, the connecting electrodes (250, 260) can penetrate the gate insulating layer (220) together.

[0061] The connecting electrodes (250, 260) may include a source electrode (250) that is connected to or in contact with the source region of the active layer (210) and a drain electrode (260) that is connected to or in contact with the drain region of the active layer (210).

[0062] The gate insulating layer (220) and the interlayer insulating layer (240) may include silicon oxide, silicon nitride, or silicon oxynitride, and may have a stacked structure including a silicon oxide film and a silicon nitride film.

[0063] The gate electrode (230) and connecting electrodes (250, 260) may include metals such as Ag, Mg, Al, W, Cu, Ni, Cr, Mo, Ti, Pt, Ta, Nd, Sc, alloys thereof, or nitrides thereof.

[0064] The via insulating film (270) can be formed on the interlayer insulating layer (240) to cover the connecting electrodes (250, 260).

[0065] The via insulating film (270) may accommodate a via structure that electrically connects the first electrode (110) and the source electrode (250). The via insulating film (270) may be provided as a flattening film of the circuit layer (CL). In some embodiments, the via insulating film (270) may include an organic material such as polyimide, epoxy resin, acrylic resin, or polyester.

[0066] Light-emitting elements (ED1, ED2, ED3) may be disposed on the via insulating film (270). For example, as described with reference to FIG. 1, the light-emitting elements (ED1, ED2, ED3) may include a first electrode (110), a light-emitting layer (EL), and a second electrode (150) sequentially stacked from the via insulating film (170).

[0067] The first electrode (110) can be electrically connected to a transistor (TR1, TR2, TR3) or a connecting electrode (250, 260) included in the circuit layer (CL) through the via structure. As shown in FIG. 1, the first electrode (110) can be in contact with or connected to a source electrode (250) and provided as a pixel electrode patterned for each light-emitting region or pixel region.

[0068] The pixel electrode may be provided as an anode and may include a high work function conductive material that promotes hole injection. The pixel electrode may be provided as a transparent electrode. The pixel electrode may include a transparent conductive oxide such as ITO (indium tin oxide), IZO (indium zinc oxide), ZnO (zinc oxide), ITZO (indium tin zinc oxide), etc.

[0069] The pixel electrode may be provided as a semi-transparent electrode or a reflective electrode. The pixel electrode may include a metal selected from Ag, Mg, Cu, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Ca, LiF, Mo, Ti, W, In, Sn, Zn, or an alloy of two or more of these.

[0070] The pixel electrode may have a single-layer structure or a multi-layer structure. For example, the pixel electrode may have a three-layer structure of ITO / Ag / ITO.

[0071] A pixel defining film (280) can be formed on a via insulating film (270) to define a light-emitting region or a pixel region. For example, a red light-emitting region, a green light-emitting region, and a blue light-emitting region are separated and defined by the pixel defining film (280), and light-emitting elements (ED1, ED2, ED3) can correspond to a red light-emitting element, a green light-emitting element, and a blue light-emitting element, respectively.

[0072] The pixel defining film (280) can partially cover the first electrode (110) of each light-emitting region.

[0073] As illustrated in FIG. 1, the light-emitting layer (EL) can be selectively formed separated between the pixel defining film (280). In some embodiments, the light-emitting layer (EL) can be continuously formed on top of the pixel defining film (280) so as to be continuously formed in common across a plurality of light-emitting regions or pixel regions.

[0074] A hole transport region (not shown) may be disposed on the lower surface of the light-emitting layer (EL), and an electron transport region (not shown) may be formed on the upper surface of the light-emitting layer (EL). In some embodiments, the hole transport region and the electron transport region may be formed in common and continuously on the pixel defining film (280) and a plurality of first electrodes (110).

[0075] The second electrode (150) may be provided as a common electrode formed continuously across a plurality of light-emitting regions or pixel regions.

[0076] The common electrode may be provided as an electron injection electrode or a cathode. The common electrode may include metals, alloys, electrically conductive compounds, etc., having a low work function.

[0077] For example, the common electrode may include lithium (Li), silver (Ag), magnesium (Mg), aluminum (Al), aluminum-lithium (Al-Li), calcium (Ca), magnesium-indium (Mg-In), magnesium-silver (Mg-Ag), ytterbium (Yb), silver-ytterbium (Ag-Yb), ITO, IZO, etc. These may be used alone or in combination of two or more.

[0078] The common electrode may be provided as a transmissive electrode, a semi-transmissive electrode, or a reflective electrode. The common electrode may have a single-layer structure or a multi-layer structure.

[0079] The encapsulation layer (290) is disposed on the pixel defining film (280) and the light-emitting elements (ED1, ED2, ED3) to protect the light-emitting elements (ED1, ED2, ED3) from moisture or oxygen. The encapsulation layer (290) may be formed as a thin film encapsulation (TFE) having a single layer or a multilayer structure.

[0080] The encapsulation layer (290) may include an inorganic film comprising silicon nitride (SiNx), silicon oxide (SiOx), indium tin oxide, indium zinc oxide, or any combination thereof; an organic film comprising polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyimide, polyethylene sulfonate, polyoxymethylene, polyarylate, hexamethyldisiloxane, an acrylic resin (e.g., polymethyl methacrylate, polyacrylic acid, etc.), an epoxy resin (e.g., AGE (aliphatic glycidyl ether), etc.) or any combination thereof; or a combination of an inorganic film and an organic film.

[0081] The display device may further include a functional layer (300) disposed on the encapsulation layer (290). The functional layer (300) may include a sensor layer such as a touch sensor layer; or an optical layer such as a polarizing layer, a color conversion layer, or a color filter layer.

[0082] Figure 2 is a partial enlarged cross-sectional view of region B in Figure 1.

[0083] In some embodiments, the display device may have a reflection pattern (ML) disposed below the first electrode (110). By disposing of the reflection pattern (ML), viewing angle characteristics, such as the viewing angle side luminance ratio (LvA), may be improved.

[0084] In some embodiments, the reflection pattern (ML) may include an uneven shape having an upper surface and an inclined surface. By having the reflection pattern (ML) have an uneven shape, the viewing angle side luminance ratio (LvA) can be improved by the inclined surface of the unevenness, and the light efficiency in the front direction can also be improved by the upper surface of the unevenness.

[0085] The reflection pattern (ML) may include, for example, silicon nitride, silicon oxide, etc., by considering the refractive index of the upper and lower layer materials.

[0086] In some embodiments, the first electrode (110), the light-emitting layer (EL), and the second electrode (150) may be arranged in a shape corresponding to the shape of the reflection pattern (ML).

[0087] In some embodiments, an anti-etching pattern (ESL) may be placed below the reflection pattern (ML). The reflection pattern (ML) may be formed by photolithography, and in this case, since the lower via insulating film (270) may be damaged during the etching process to form the reflection pattern (ML), an anti-etching pattern (ESL) may be formed and the reflection pattern (ML) may be formed on top of it to prevent this.

[0088] In exemplary embodiments, the anti-etching pattern (ESL) may be electrically connected to the first electrode (110). In some embodiments, the anti-etching pattern (ESL) and the first electrode (110) may be electrically connected by direct contact.

[0089] FIGS. 3 and FIGS. 4 illustrate a comparative example in which the anti-etching pattern (ESL) is not electrically connected to the first electrode (110).

[0090] FIG. 3 is an enlarged cross-sectional view of a portion corresponding to the area of ​​FIG. 2 where the etching prevention pattern (ESL) is not electrically connected to the first electrode (110). FIG. 4 is a schematic plan view of the etching prevention pattern (ESL) of FIG. 3 and the first electrode (110).

[0091] As described above, the anti-etching pattern (ESL) and the reflection pattern (ML) can be formed through photolithography. During the photolithography process, if wet etching is performed, isotropic etching proceeds by the etching solution, so an under-cut phenomenon occurs in which the anti-etching pattern (ESL) located below the reflection pattern (ML) is further etched. Accordingly, as shown in FIG. 3, the anti-etching pattern (ESL) is etched further inward than the bottom edge of the reflection pattern (ML), and a void space (VD) is created. Therefore, even if the reflection pattern (ML) is designed to have a size such that the bottom edge contacts the first electrode (110), the anti-etching pattern (ESL) below the reflection pattern (ML) may not be connected to the first electrode (110).

[0092] As illustrated in FIGS. 3 and 4, if the anti-etching pattern (ESL) is not electrically connected to the first electrode (110), parasitic capacitance may be generated by the anti-etching pattern (ESL). For example, when a display device is driven and an electrical signal is applied to the first electrode (110) and the second electrode (150), parasitic capacitance may be generated between the anti-etching pattern (ESL) and the first electrode (110). If parasitic capacitance is generated by the anti-etching pattern (ESL), the electrical signal applied to the light-emitting layer (EL) may be disturbed, and the uniformity of light may be reduced.

[0093] As illustrated in FIG. 2, when the etching prevention pattern (ESL) is electrically connected to the first electrode (110), the etching prevention pattern (ESL) may have the same electrical characteristics as the first electrode (110) and thus may not generate parasitic capacitance. In some embodiments, the etching prevention pattern (ESL) may have the same potential as the first electrode (110).

[0094] In some embodiments, the anti-etching pattern (ESL) is integrally connected so that the entire anti-etching pattern (ESL) may have the same electrical characteristics, for example, the same potential.

[0095] In some embodiments, the etching prevention pattern (ESL) may have sufficient conductivity to have the same electrical characteristics as the first electrode (110). For example, the etching prevention pattern (ESL) may include at least one of ITO (indium tin oxide), IZO (indium zinc oxide), ZnO (zinc oxide), and ITZO (indium tin zinc oxide). In some embodiments, the etching prevention pattern (ESL) may be formed from the same material as the first electrode (110).

[0096] In some embodiments, the etching prevention pattern (ESL) may be electrically connected to the first electrode (110) at the bottom of the reflection pattern (ML) closest to the pixel defining film (280). When connected to the first electrode (110) at this location, the effect on the light emitted from the corresponding pixel can be minimized. In some embodiments, the etching prevention pattern (ESL) may be electrically connected to the first electrode (110) by extending from the bottom of the reflection pattern (ML) closest to the pixel defining film (280) to the bottom of the pixel defining film (280), thereby further increasing the reliability of the connection with the first electrode (110) while having almost no effect on the light emitted from the light-emitting layer (EL).

[0097] In some embodiments, the etching prevention pattern (ESL) may extend to a contact portion (CNT) where the first electrode (110) contacts the connecting electrode (250, 260) and may be electrically connected to the first electrode (110) and the connecting electrode (250, 260). In some embodiments, the etching prevention pattern (ESL) may cover all or part of the contact portion (CNT). By the etching prevention pattern (ESL) covering at least part of the contact portion (CNT), the sameness of electrical characteristics with the first electrode (110) may be further enhanced.

[0098] In some embodiments, the anti-etching pattern (ESL) is not extended to the contact portion (CNT) but is extended to the contact connection portion (ESL-C) so as not to directly contact the connecting electrode (250, 260) and can be electrically connected to the first electrode (110). This allows for increased electrical connectivity with the contact portion (CNT) of the first electrode (110).

[0099] FIGS. 5A, 5B, and 5C schematically illustrate a method for manufacturing a reflection pattern (ML) and an anti-etching pattern (ESL) according to exemplary embodiments.

[0100] An etching prevention pattern forming layer (PESL) is formed on the via insulating film (270), and a reflection pattern forming layer (PML) is formed on the upper surface. Each layer can be performed by a deposition process.

[0101] A reflection pattern (ML) can be formed by forming a photoresist (PR) in the shape of the reflection pattern (ML) to be formed on a reflection pattern forming layer (PML) and then etching it. The etching method of the reflection pattern forming layer (PML) can be performed by wet etching or dry etching, and for example, it can be performed by dry etching.

[0102] After the reflection pattern (ML) is formed, the photoresist (PR) on top of the reflection pattern (ML) is removed, and the etching prevention pattern forming layer (PESL) is etched by photolithography in the same manner to form an etching prevention pattern (ESL). In some embodiments, the etching prevention pattern forming layer (PESL) may be wet-etched.

[0103] FIGS. 6 to 15 show schematic plan views of embodiments of the shape of an anti-etching pattern (ESL).

[0104] As illustrated in FIGS. 6 to 9, the anti-etching pattern (ESL) may include a helical pattern. The helical direction of the helical pattern may be clockwise or counterclockwise.

[0105] FIG. 8 illustrates a schematic structure of a spiral pattern according to one embodiment. In some embodiments, the spiral pattern may have a structure in which semicircles with different diameters are alternately connected with respect to the spiral center. As shown in FIG. 8, the spiral pattern may have a structure in which the right semicircle, whose center line of the spiral pattern is indicated by a dotted line, and the left semicircle, whose center line of the spiral pattern is indicated by a solid line, are alternately connected.

[0106] In some embodiments, the spiral pattern may have a structure in which semicircles with the smallest diameter are alternately connected, starting from the spiral starting point at the center of the spiral, and the diameters of the semicircles increase sequentially. As shown in FIG. 8, semicircle B-1, which has the smallest diameter and starts from the spiral starting point, has its other end connected to one end of semicircle A-1. Semicircle A-1 has a larger diameter than semicircle B-1. The other end of semicircle A-1 is connected to one end of semicircle B-2, which has a larger diameter than semicircle A-1. In this way, the semicircles are alternately connected in the order B-1 / A-1 / B-2 / A-2 / B-3 / A-3 / B-4 / A-4, and the diameters of the circles may increase in this order.

[0107] In some embodiments, arc B-5, which is connected to the contact portion (CNT) at the outermost edge of the spiral pattern, may have an arc length smaller than, equal to, or larger than that of a semicircle depending on the position of the contact portion (CNT).

[0108] In some embodiments, the spacing distance (D) between a specific spiral pattern line and its outer spiral pattern line and the centerline of the spiral pattern line may be greater than or equal to the pitch (pitch, the sum of the line width (E) of the pattern line and the spacing distance (F) between the pattern lines) of the spiral pattern line. In this case, a spiral pattern can be formed as the diameter of the corresponding semicircle gradually increases from the center of the spiral.

[0109] In some embodiments, assuming a pair of mutually perpendicular symmetry axes passing through the center of the spiral, there may exist pairs of symmetry axes in which the number of pattern lines passed by each mutually perpendicular symmetry axis is the same. Referring to FIG. 9, the mutually perpendicular C1 symmetry axes have the same number of pattern lines passed by each symmetry axis after the center of the spiral. In this way, the uniformity of light emitted from the corresponding light-emitting layer (EL) can be further improved by having the same number of pattern lines passed by each mutually perpendicular symmetry axis.

[0110] As illustrated in FIGS. 10 to 15, the anti-etching pattern (ESL) may include a mesh pattern.

[0111] As illustrated in FIG. 10, the mesh pattern may be formed integrally and may have an opening (OP). In some embodiments, the mesh pattern has a contact area (OPC) where the openings (OP) face each other, and the contact area (OPC) may be formed such that among pairs of mutually perpendicular symmetry axes passing through the center of the mesh pattern, there exist pairs of symmetry axes in which the number of contact areas through which each mutually perpendicular symmetry axis passes is the same. For example, in pair C1 of symmetry axes, the number of contact areas through which each symmetry axis passes is the same. In this way, the uniformity of light emitted from the corresponding light-emitting layer (EL) can be further improved by having the number of contact areas through which each mutually perpendicular symmetry axis passes be the same.

[0112] In some embodiments, assuming pairs of mutually perpendicular symmetry axes passing through the center of a mesh-like pattern, there may exist pairs of symmetry axes in which the number of openings (OPs) through which each mutually perpendicular symmetry axis passes is the same. In this case, the uniformity of light emitted from the corresponding light-emitting layer (EL) can be further improved.

[0113] As illustrated in FIGS. 11 to 13, the shape of the opening (OP) of the mesh pattern may vary. In some embodiments, there may be variations in which the opening (OP) is rotated by a predetermined angle with respect to the center of the mesh pattern. For example, FIG. 11 shows the opening (OP) of the mesh pattern of FIG. 10 rotated 90 degrees clockwise with respect to the center of the pattern. Additionally, FIG. 12 and FIG. 13 show the opening (OP) of the mesh pattern of FIG. 10 rotated 45 degrees counterclockwise and 45 degrees clockwise, respectively, with respect to the center of the pattern.

[0114] As shown in FIGS. 14 and 15, the mesh pattern can have various shapes of openings (OP).

[0115] The mesh-type pattern illustrated in FIGS. 11 to 15 may also be formed such that among pairs of mutually perpendicular symmetry axes, there exist pairs of symmetry axes in which the number of contact areas (OPCs) through which each mutually perpendicular symmetry axis passes is the same. Additionally, assuming pairs of mutually perpendicular symmetry axes passing through the center of the mesh-type pattern, there may exist pairs of symmetry axes in which the number of openings (OPs) through which each mutually perpendicular symmetry axis passes is the same.

[0116] FIG. 16 is a schematic exploded perspective view showing an electronic device in exemplary embodiments.

[0117] According to exemplary embodiments, the electronic device may be implemented in the form of a mobile phone (smartphone), tablet, PC, etc., including the display device described above.

[0118] Referring to FIG. 16, the electronic device may include a window structure (WS), a display panel (DP), and a rear structure (RS).

[0119] The window structure (WS) provides an external display surface perceived by a user, such as the viewing surface of a mobile phone, for example, and may include a transparent material film. For example, the window structure (WS) may include glass (e.g., ultra-thin glass (UTG)), a hard coating film, a plastic film, etc.

[0120] The outer surface of the window structure (WS) may include an active area (AA) and a peripheral area (PA). The active area (AA) may provide a surface on which an image of the display device is substantially displayed and where a user's touch / command is input. The peripheral area (PA) may substantially correspond to the bezel area of ​​the display device.

[0121] The display panel (DP) includes the display device described above and may include a display area (DA) and a non-display area (NDA). The display area (DA) of the display panel (DP) may substantially correspond to or overlap with the active area (AA) of the window structure (WS). The non-display area (NDA) of the display panel (DP) may substantially correspond to or overlap with the peripheral area (PA) of the window structure (WS).

[0122] In some embodiments, functional element regions (E1, E2) may be included within an active region (AA) of a window structure (WS). For example, the first functional element region (E1) may be included at one end of the active region (AA) and may be implemented, for example, in the form of a camera hole. The second functional element region (E2) may be provided as a fingerprint sensing region.

[0123] For example, a sensor structure for touch sensing or fingerprint sensing may be placed within the display panel (DP), or between the window structure (WS) and the display panel (DP).

[0124] The rear structure (RS) may be provided as a chassis structure or housing of the display device or electronic device. A cover panel may be disposed between the rear structure (RS) and the display panel (DP).

[0125] FIG. 17 is a schematic diagram showing an electronic device according to exemplary embodiments.

[0126] The electronic device may be installed, embedded, attached, or integrated into the vehicle (400). The vehicle (400) is not limited to the structure shown in FIG. 17 and may include means of transportation such as a three-wheeled or four-wheeled vehicle, construction machinery, a two-wheeled vehicle, a motor device, a bicycle, a train, etc. Additionally, electric vehicles, hybrid vehicles, etc. may be included in the vehicle (400).

[0127] Referring to FIG. 17, at least one of the first to fifth display devices (DP1, DP2, DP3, DP4, DP5) can be applied to a vehicle (400).

[0128] According to exemplary embodiments, the first display device (DP1) may be placed in the cluster area (410). In the cluster area (410), driving information such as mileage and speed, and various warning lights may be displayed.

[0129] The second display device (DP2) may be placed on the front window (FW) of the vehicle (400). For example, the second display device (DP2) may be installed in the form of a head-up display (HUD).

[0130] A third display device (DP3) may be placed on the center fascia (420) of the vehicle (400). On the center fascia (420), buttons or switches for controlling the operation of a video / music player, air conditioner, heater, etc., may be displayed, and vehicle information may be displayed.

[0131] The fourth display device (DP4) may be applied to the side mirror (430) of the vehicle (400). The side mirror (430) is installed on both sides, inside and / or outside the vehicle, respectively, and the fourth display device (DP4) may be applied to at least one of the side mirrors (430) on both sides.

[0132] The fifth display device (DP5) may be placed on the passenger seat dashboard (440). Information / images identical or different from those displayed on the cluster area (410) and / or the center fascia (420) may be displayed through the passenger seat dashboard (440).

[0133] In some embodiments, the electronic device may be, for example, a flat panel display, a curved display, a computer monitor, a medical monitor, a television, a billboard, an indoor or outdoor lighting and / or signal light, a head-up display, a fully or partially transparent display, a flexible display, a rollable display, a foldable display, a stretchable display, a laser printer, a telephone, a mobile phone, a tablet, a phablet, a personal information terminal (PDA), a wearable device, a laptop computer, a digital camera, a camcorder, a viewfinder, a microdisplay, a 3D display, a virtual reality or augmented reality display, a vehicle, a video wall including multiple displays tiled together, a theater or stadium screen, a light therapy device, and a signboard.

[0134] A display device according to the embodiments of the present disclosure can be applied to various electronic devices. An electronic device according to one embodiment includes the display device described above and may further include a module or device having additional functions other than the display device.

[0135] FIG. 18 is a block diagram of an electronic device according to one embodiment. Referring to FIG. 18, an electronic device (10) according to one embodiment may include a display module (11), a processor (12), a memory (13), and a power module (14).

[0136] The processor (12) may include at least one of a central processing unit (CPU), an application processor (AP), a graphic processing unit (GPU), a communication processor (CP), an image signal processor (ISP), and a controller.

[0137] The memory (15) may store data information necessary for the operation of the processor (12) or the display module (11). When the processor (12) executes an application stored in the memory (15), a video data signal and / or an input control signal is transmitted to the display module (11), and the display module (11) can process the received signal and output video information through a display screen.

[0138] The power module (14) may include a power supply module, such as a power adapter or battery device, and a power conversion module that converts the power supplied by the power supply module to generate power required for the operation of the electronic device (10).

[0139] At least one of each component of the electronic device (11) described above may be included in a display device according to the embodiments described above. Additionally, some of the individual modules functionally included in one module may be included in the display device, while others may be provided separately from the display device. For example, the display device may include a display module (11), and the processor (12), memory (13), and power module (14) may be provided in the form of other devices within the electronic device (11) that are not the display device.

[0140] FIG. 19 is a schematic diagram of an electronic device according to various embodiments.

[0141] Referring to FIG. 19, various electronic devices to which the display device according to the embodiments described above is applied may include not only image display electronic devices such as a smartphone (10_1a), a tablet PC (10_1b), a laptop (10_1c), a TV (10_1d), and a desk monitor (10_1e), but also wearable electronic devices including display modules such as smart glasses, a head-mounted display, and a smart watch, and automotive electronic devices (10_3) including display modules such as a CID (Center Information Display) and a room mirror display placed on the instrument panel, center fascia, and dashboard of a car.

[0142] FIG. 20 illustrates a case where an electronic device including a display module is applied to a vehicle. For example, the electronic device (10_3) may be applied to the instrument panel, center fascia, etc. of a vehicle, or may be applied to a Center Information Display (CID) placed on the dashboard of a vehicle or a room mirror display that replaces a side mirror.

Claims

1. A pixel defining film that defines a pixel region; A light-emitting layer disposed within the pixel area above; A first electrode and a second electrode respectively disposed at the lower and upper portions of the light-emitting layer; A reflection pattern disposed below the first electrode; and It includes an anti-etching pattern disposed below the reflection pattern, and A display device in which the above-mentioned etching prevention pattern is electrically connected to the above-mentioned first electrode.

2. A display device according to claim 1, wherein the etching prevention pattern has the same potential as the first electrode.

3. A display device according to claim 1, wherein the first electrode is an anode and the second electrode is a cathode.

4. A display device according to claim 1, wherein the reflection pattern comprises an uneven shape having an upper surface and an inclined surface.

5. A display device according to claim 4, wherein the first electrode, the light-emitting layer, and the second electrode are arranged in a shape corresponding to the shape of a reflection pattern.

6. A display device according to claim 1, wherein the etching prevention pattern is integrally connected.

7. A display device according to claim 1, wherein the etching prevention pattern is electrically connected to a first electrode at the bottom of the reflection pattern closest to the pixel defining film.

8. A display device according to claim 1, wherein the etching prevention pattern comprises a spiral pattern.

9. A display device according to claim 8, wherein the spiral pattern has a structure in which semicircles with different diameters are alternately connected with respect to the spiral center.

10. A display device according to claim 9, wherein the spiral pattern has a structure in which semicircles with the diameters of the circles increasing sequentially from the semicircle with the smallest diameter are alternately connected, with the spiral starting point at the center of the spiral.

11. A display device according to claim 9, wherein the distance between the centerlines of a specific spiral pattern line and the outer spiral pattern line is greater than or equal to the pitch of the spiral pattern line.

12. A display device according to claim 9, wherein among pairs of mutually perpendicular axes of symmetry passing through the center of a spiral, there exists a pair of axes of symmetry in which the number of pattern lines passing through each mutually perpendicular axis of symmetry is the same.

13. A display device according to claim 1, wherein the etching prevention pattern comprises a mesh-type pattern.

14. In claim 13, the mesh pattern has a contact area where the openings face each other, and The above contact area is, A display device formed such that among pairs of mutually perpendicular symmetry axes passing through the center of the above mesh-type pattern, there exist pairs of symmetry axes in which the number of contact areas through which each mutually perpendicular symmetry axis passes is the same.

15. Includes a light-emitting element and a transistor electrically connected to the light-emitting element, The above light-emitting element is, A pixel defining film that defines a pixel region; A light-emitting layer disposed within the pixel area above; A first electrode and a second electrode respectively disposed at the lower and upper portions of the light-emitting layer; A reflection pattern disposed below the first electrode; and It includes an anti-etching pattern disposed below the reflection pattern, and The above etching prevention pattern is electrically connected to the first electrode, and The above transistor is, It includes an active layer, a gate insulating layer, a gate electrode, and a connecting electrode, A display device in which the first electrode and the etching prevention pattern are electrically connected to the connecting electrode.

16. A display device according to claim 15, wherein the etching prevention pattern extends to the contact portion of the first electrode and the connecting electrode.

17. A display device according to claim 15, wherein the etching prevention pattern contacts at least a portion of the contact portion of the first electrode and the connecting electrode.

18. A display device according to claim 15, wherein the etching prevention pattern is conductive.

19. Display device of Claim 1; A window structure providing a display surface of the above-mentioned display device; and An electronic device comprising a housing in which the above-mentioned display device is accommodated.

20. The electronic device of claim 19, wherein the electronic device comprises a flat panel display, a curved display, a computer monitor, a medical monitor, a television, an advertising board, indoor or outdoor lighting, a signal light, a head-up display, a transparent display, a flexible display, a rollable display, a foldable display, a stretchable display, a laser printer, a telephone, a mobile phone, a tablet, a phablet, a personal information terminal (PDA), a wearable device, a laptop computer, a digital camera, a camcorder, a viewfinder, a micro display, a 3D display, a virtual reality or augmented reality display, a vehicle, a video wall, a theater or stadium screen, or a light therapy device.

Images