Reaction tube and furnace tube apparatus
Patent Information
- Application Number
- PCT/CN2025/144378
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-13
- Filing Date
- 2025-12-22
- Publication Date
- 2026-09-17
Smart Images
Figure CN2025144378_17092026_PF_FP_ABST
Abstract
Description
Reaction tube and furnace tube equipment Technical Field
[0001] This application relates to the field of semiconductor manufacturing equipment, specifically to a reaction tube and furnace tube device. Background Technology
[0002] Furnace tube equipment has a wide range of applications in the semiconductor manufacturing field. Among them, the reaction tube is the core component of the process reaction, and its structural design and gas flow field uniformity are directly related to the thin film deposition quality and product consistency.
[0003] As shown in Figure 7, traditional reaction tubes typically employ an inner tube 200' and an outer tube 100' structure, with the outer tube 100' and inner tube 200' integrated together. Gas is generally supplied to the inner tube 200' via a gas supply pipe, and an exhaust port 210' extending vertically is provided on the inner tube 200', with the width of the exhaust port 210' remaining consistent vertically. However, since the exhaust port is usually located at the lower end of the outer tube, there are significant regional differences in gas emission within the inner tube 200': the upper exhaust port 210', being farther from the exhaust port, has relatively weaker exhaust capacity; while the lower exhaust port 210', being closer to the exhaust port, has stronger exhaust capacity. This uneven airflow distribution caused by the difference in exhaust capacity can easily affect the uniformity of thin film deposition on the substrate and the stability of the process. Summary of the Invention
[0004] This application solves the technical problem of uneven exhaust from the reaction tube through the following technical solution:
[0005] A reaction tube for use in furnace tube equipment, the reaction tube comprising:
[0006] An outer tube, the lower end of which is provided with an air extraction port;
[0007] An inner tube, disposed within the outer tube, includes an exhaust port extending vertically, and the inner tube comprises, from top to bottom, the following components along the vertical direction:
[0008] In the first region, the width of the exhaust port decreases from top to bottom.
[0009] The second region has the same width for all exhaust ports, and the width of the exhaust ports in the second region is not greater than the width of the exhaust ports in the first region.
[0010] In the third region, the width of the exhaust port decreases from top to bottom and is not greater than the width of the exhaust port in the second region.
[0011] A reaction tube for use in furnace tube equipment, the reaction tube comprising:
[0012] The outer tube has an air extraction port at its lower end;
[0013] An inner tube, disposed within the outer tube, comprises, from top to bottom, the following components along the vertical direction:
[0014] A first region, wherein a plurality of first exhaust ports are provided at intervals along the vertical direction within the first region, and the diameter of the plurality of first exhaust ports decreases from top to bottom;
[0015] The second region is provided with at least one second exhaust port extending along the vertical direction. The width or diameter of the second exhaust port is the same and is not greater than the diameter of the plurality of first exhaust ports.
[0016] The third region has multiple third exhaust ports spaced apart along the vertical direction. The diameter of the multiple third exhaust ports decreases from top to bottom, and the diameter of the third exhaust port is not greater than the width or diameter of the second exhaust port.
[0017] A furnace tube apparatus, comprising a reaction tube as described above.
[0018] By dividing the inner tube vertically into three regions from top to bottom—the first region corresponding to the upper part, the second region to the middle part, and the third region to the lower part—the differentiated design of the exhaust port widths in each region achieves a relative balance in the gas exhaust capacity of the upper, middle, and lower parts of the inner tube. Specifically, the first region has the widest exhaust port, enhancing the exhaust capacity of the upper part of the inner tube. This application finds that the substrate film thickness in the middle part of the existing inner tube is relatively uniform, meeting production requirements. Therefore, the exhaust port width in the second region is set to be consistent and moderate, without altering the exhaust port width in the middle part of the inner tube. The third region has the smallest exhaust port width, reducing the exhaust capacity of the lower part of the inner tube and alleviating the excessive exhaust capacity in the lower part of the inner tube caused by the exhaust port being located below the outer tube. In summary, this application, based on the existing inner tube, improves the exhaust capacity of the upper region, maintains the exhaust capacity of the middle region, and reduces the exhaust capacity of the lower region, thereby achieving a relative balance in the exhaust capacity of the three regions.
[0019] Overview of the attached figures
[0020] The features and performance of this application are further described by the following embodiments and accompanying drawings.
[0021] Figure 1 is a schematic diagram of the structure of the reaction tube in Embodiment 1 of this application;
[0022] Figure 2 is a first schematic diagram of the front structure of the reaction tube in Embodiment 1 of this application;
[0023] Figure 3 is a second schematic diagram of the front structure of the reaction tube in Embodiment 1 of this application;
[0024] Figure 4 is a third schematic diagram of the front structure of the reaction tube in Embodiment 1 of this application;
[0025] Figure 5 is a schematic diagram of the reaction tube in Embodiment 2 of this application;
[0026] Figure 6 is a schematic diagram of the furnace tube equipment in Embodiment 3 of this application;
[0027] Figure 7 is a schematic diagram of the structure of the reaction tube in the prior art.
[0028] Preferred embodiments of this application
[0029] The present application is further illustrated below by way of embodiments, but this does not limit the present application to the scope of the embodiments.
[0030] As shown in Figures 1 and 2, a reaction tube for use in furnace tube equipment includes an inner tube 200 and an outer tube 100. An exhaust port 110 is provided at the lower end of the outer tube 100. The inner tube 200 is disposed inside the outer tube 100. The inner tube 200 includes an exhaust port 210 extending vertically, and the inner tube 200 includes, from top to bottom, three regions: a first region 220, a second region 230, and a third region 240. The width of the exhaust port 210 in the first region 220 decreases from top to bottom. The width of the exhaust port 210 in the second region 230 is the same and not greater than the width of the exhaust port 210 in the first region 220. The width of the exhaust port 210 in the third region 240 decreases from top to bottom and is not greater than the width of the exhaust port 210 in the second region 230. The top of the inner tube 200 is closed. The width of the exhaust port 210 can be measured horizontally or along the arc length of the inner tube 200 on the horizontal plane.
[0031] The reaction tube of this application divides the inner tube 200 vertically into three regions from top to bottom: the first region 220 corresponds to the upper region of the inner tube 200, the second region 230 corresponds to the middle region of the inner tube 200, and the third region 240 corresponds to the lower region of the inner tube 200. The differentiated design of the exhaust port 210 width in each region allows for a relatively balanced gas exhaust capacity in the upper, middle, and lower regions of the inner tube 200. Specifically, the exhaust port 210 in the first region 220 has the largest width, enhancing the exhaust capacity of the upper region of the inner tube 200. The inventors of this application discovered that the substrate film thickness in the middle region of existing inner tubes is relatively uniform, meeting production requirements. Therefore, the exhaust port 210 in the second region 230 is set to have a uniform and moderate width. The exhaust port 210 in the third region 240 has the smallest width, reducing the exhaust capacity of the lower region of the inner tube 200 and alleviating the excessive exhaust capacity in the lower region of the inner tube 200 caused by the extraction port 110 being located below the outer tube 100. In summary, this application, based on the existing inner pipe, improves the exhaust capacity of the upper region, does not change the exhaust capacity of the middle region, and reduces the exhaust capacity of the lower region, thereby achieving a relative balance in the exhaust capacity of the upper, middle, and lower regions. Furthermore, the exhaust ports 210 of the first region 220 and the third region 240 are wider as they approach the top, which can further regulate the exhaust capacity of the inner pipe 200 in the vertical direction.
[0032] In some embodiments, as shown in Figure 2, the exhaust ports 210 in the first region 220 and the third region 240 are projected as trapezoids on the vertical plane, while the exhaust ports 210 in the second region 230 are projected as rectangles on the vertical plane. Using trapezoidal exhaust ports 210 in the first region 220 and the third region 240, while employing rectangular exhaust ports 210 in the second region 230, allows for differentiated airflow distribution control for different regions. The trapezoidal exhaust ports help create a gradually decreasing exhaust capacity, providing a smooth airflow transition; while the rectangular exhaust ports do not change the existing exhaust port structure of the inner tube. Overall, this design balances the exhaust capacity of each region, effectively ensuring the consistency and quality of thin film deposition on the substrate.
[0033] As shown in Figure 3, in some embodiments, there may be a gap between the exhaust port 211 of the first region 220 and the exhaust port 212 of the second region 230, and / or, there may be a gap between the exhaust port 212 of the second region 230 and the exhaust port 213 of the third region 240. The spacing helps to form a supporting structure with reinforcing ribs on the inner tube 200, thereby enhancing the strength of the inner tube 200. This design effectively mitigates the problem of reduced strength of the inner tube 200 caused by adding exhaust ports. Specifically, the spacing can be 5-10 mm.
[0034] As shown in Figure 4, in some embodiments, there are multiple exhaust ports 211 in the first region 220, and these multiple exhaust ports 211 are spaced apart; or, there are multiple exhaust ports 212 in the second region 230, and these multiple exhaust ports 212 are spaced apart; or, there are multiple exhaust ports 213 in the third region 240, and these multiple exhaust ports 213 are spaced apart. By setting intervals between the exhaust ports in any region, the inner tube 200 maintains a continuous material structure at the exhaust port locations, thereby further improving the strength of the inner tube 200 and enhancing its load-bearing capacity and resistance to deformation.
[0035] As shown in Figure 3, in some embodiments, when multiple substrates arranged vertically are loaded inside the inner tube 200, the second region 230 corresponds to the multiple substrates located in the middle region of the inner tube 200, and the projection of the vent 212 in the second region 230 onto the vertical plane covers at least 1 / 3 of the total number of substrates. The inventors of this application have discovered that in existing reaction tube structures, the film thickness of the multiple substrates in the middle region of the inner tube 200 is relatively uniform. This design ensures that the uniformity of the film thickness of the substrates in the middle region of the inner tube 200 is not affected and can still maintain a relatively uniform thickness. In some embodiments, the vent in the second region 230 can also cover at least 1 / 2 of the total number of substrates.
[0036] In some embodiments, as shown in Figures 2 and 3, the opening area of the exhaust port in the first region 220 is larger than the opening area of the exhaust port in the third region 240. When there are multiple exhaust ports, the opening area is the total area of all exhaust ports. Designing the opening area of the exhaust port in the first region 220 to be larger than that in the third region 240 allows for the formation of a larger gas discharge channel in the upper region of the inner pipe 200, effectively compensating for the insufficient exhaust capacity in the upper region of the inner pipe 200 caused by the exhaust port being located at the lower end of the outer pipe 100.
[0037] Example 2
[0038] As shown in Figure 5, this embodiment provides a reaction tube for use in furnace tube equipment. The reaction tube includes an outer tube 100 and an inner tube 200. An exhaust port is provided at the lower end of the outer tube 100. The inner tube 200 is disposed inside the outer tube 100 and includes a first region 220, a second region 230, and a third region 240 vertically from top to bottom. Multiple first exhaust ports 250 are spaced apart vertically within the first region 220, with the diameter of the multiple first exhaust ports 250 decreasing from top to bottom. At least one second exhaust port 260 extending vertically is provided within the second region 230. The width of the second exhaust ports 260 is the same and not greater than the diameter of the multiple first exhaust ports 250. Multiple third exhaust ports 270 are spaced apart vertically within the third region 240, with the diameter of the multiple third exhaust ports 270 decreasing from top to bottom, and the diameter of the third exhaust ports 270 not greater than the width of the second exhaust ports 260. The projection of the second exhaust port 260 onto the vertical plane is rectangular. The projections of the first exhaust port 250 and the third exhaust port 270 onto the vertical plane are circular.
[0039] Through the aforementioned partitioned design, the first region 220 corresponds to the upper region of the inner tube 200, the second region 230 corresponds to the middle region of the inner tube 200, and the third region 240 corresponds to the lower region of the inner tube 200. Each region is equipped with a different exhaust port, effectively compensating for the difference in exhaust capacity of the inner tube 200 as it approaches the exhaust port due to the lower end of the outer tube 100. This overcomes the shortcomings of insufficient exhaust capacity in the upper region and excessive exhaust capacity in the lower region of the inner tube 200 in traditional structures. Furthermore, by using multiple first exhaust ports 250 and multiple third exhaust ports 270 with decreasing diameters, the exhaust capacity of the upper and lower regions of the inner tube 200 can be adjusted step by step, thereby compensating for the uneven airflow in the vertical direction caused by the lower end of the outer tube 100.
[0040] In some embodiments, at least one second exhaust port 260 extending vertically may also be provided in the second region 230. The projection of the second exhaust port 260 on the vertical plane is circular. The second exhaust ports 260 have the same diameter. The diameter of the second exhaust port 260 is not greater than the diameter of the plurality of first exhaust ports 250, and the diameter of the third exhaust port 270 is not greater than the diameter of the second exhaust port 260.
[0041] When multiple substrates arranged vertically are loaded inside the inner tube 200, the second vent 260 corresponds to the multiple substrates located in the middle region of the inner tube 200, and the projection of the second vent 260 in the vertical plane covers at least 1 / 3 of the total number of substrates. In some embodiments, the second vent 260 may also cover at least 1 / 2 of the total number of substrates.
[0042] Example 3
[0043] This embodiment provides a furnace tube device, including a reaction tube as shown in Embodiment 1 or Embodiment 2.
[0044] Referring to Figure 6, the interior of the inner tube 200 forms a reaction chamber 280, which contains multiple substrates 300 arranged vertically. The furnace tube equipment also includes an ionization chamber 400 and a gas supply pipe 500. The ionization chamber 400 is arranged vertically. The ionization chamber 400 has several first gas holes 410 that communicate with the reaction chamber 280. The gas supply pipe 500 is located inside the ionization chamber 400 and has several second gas holes 510 arranged vertically. The gas supply pipe 500 is used to introduce the process gas to be ionized into the ionization chamber 400 through the second gas holes 510. After the process gas is ionized in the ionization chamber 400, it is introduced into the reaction chamber 280 through the first gas holes 410 to deposit a corresponding thin film on the surface of the substrates 300.
[0045] By using the reaction tube of Example 1 or Example 2, the furnace tube equipment effectively compensates for the difference in exhaust capacity of the inner tube 200 as it approaches the exhaust port 110 at the lower end of the outer tube 100 during the process. This overcomes the defects of insufficient exhaust capacity in the upper region and excessive exhaust capacity in the lower region of the inner tube 200 in the traditional structure, and ultimately achieves the effect of improving the stability of the reaction process and the uniformity of the film.
[0046] While specific embodiments of this application have been described above, those skilled in the art should understand that these are merely illustrative examples. Those skilled in the art can make various changes or modifications to these embodiments without departing from the principles and essence of this application, but all such changes and modifications fall within the protection scope of this application.
Claims
1. A reaction tube for use in furnace tube equipment, characterized in that, The reaction tube includes: An outer tube, the lower end of which is provided with an air extraction port; An inner tube, disposed within the outer tube, includes an exhaust port extending vertically, and the inner tube comprises, from top to bottom, the following components along the vertical direction: In the first region, the width of the exhaust port decreases from top to bottom. The second region has the same width for all exhaust ports, and the width of the exhaust ports in the second region is not greater than the width of the exhaust ports in the first region. In the third region, the width of the exhaust port decreases from top to bottom and is not greater than the width of the exhaust port in the second region.
2. The reaction tube as described in claim 1, characterized in that, There are multiple exhaust ports, and there is a gap between the exhaust ports in the first region and the exhaust ports in the second region, and / or there is a gap between the exhaust ports in the second region and the exhaust ports in the third region.
3. The reaction tube as described in claim 1 or 2, characterized in that, There are multiple exhaust ports, with intervals between the multiple exhaust ports in the first region, or between the multiple exhaust ports in the second region, or between the multiple exhaust ports in the third region.
4. The reaction tube as described in claim 1, characterized in that, When multiple substrates arranged vertically are loaded inside the inner tube, the second region corresponds to multiple substrates located in the middle region of the inner tube, and the projection of the exhaust port in the second region onto the vertical plane covers at least 1 / 3 of the total number of substrates.
5. The reaction tube as described in claim 1, characterized in that, The opening area of the exhaust port in the first region is greater than the opening area of the exhaust port in the third region.
6. The reaction tube as described in claim 1, characterized in that, The shape of the exhaust port in the first region and the third region is projected onto the vertical plane as a trapezoid, and the shape of the exhaust port in the second region is projected onto the vertical plane as a rectangle.
7. A reaction tube for use in furnace tube equipment, characterized in that, The reaction tube includes: The outer tube has an air extraction port at its lower end; An inner tube, disposed within the outer tube, comprises, from top to bottom, the following components along the vertical direction: A first region, wherein a plurality of first exhaust ports are provided at intervals along the vertical direction within the first region, and the diameter of the plurality of first exhaust ports decreases from top to bottom; The second region is provided with at least one second exhaust port extending along the vertical direction. The width or diameter of the second exhaust port is the same and is not greater than the diameter of the plurality of first exhaust ports. The third region has multiple third exhaust ports spaced apart along the vertical direction. The diameter of the multiple third exhaust ports decreases from top to bottom, and the diameter of the third exhaust port is not greater than the width or diameter of the second exhaust port.
8. The reaction tube as described in claim 7, characterized in that, When multiple substrates arranged vertically are loaded inside the inner tube, the second vent corresponds to the multiple substrates located in the middle region of the inner tube, and the projection of the second vent on the vertical plane covers at least 1 / 3 of the total number of substrates.
9. A furnace tube device, characterized in that, Includes the reaction tube as described in any one of claims 1-8.
10. The furnace tube equipment as described in claim 9, characterized in that, The interior of the inner tube forms a reaction chamber, and the furnace tube equipment also includes: An ionization chamber is arranged along the vertical direction, and the ionization chamber has a plurality of first gas holes that communicate with the reaction chamber; A gas supply pipe is located in the ionization chamber and has several second gas holes along the vertical direction. The gas supply pipe is used to introduce the process gas to be ionized into the ionization chamber through the second gas holes. After the process gas to be ionized in the ionization chamber, it is introduced into the reaction chamber through the first gas holes to deposit a corresponding thin film on the substrate surface.