Stacke structure, structural component and preparation method therefor, and electronic device

Abstract

Provided in the embodiments of the present application are a stack structure, a structural component and a preparation method therefor, and an electronic device. The stack structure is configured to be arranged on one side of a substrate, and comprises a chromium oxide layer, a titanium aluminum oxynitride layer and a titanium aluminum nitride layer that are stacked in sequence, the chromium oxide layer being closer to the substrate. By means of the stacked arrangement and synergistic cooperation of the three color layers, namely, the chromium oxide layer, the titanium aluminum oxynitride layer and the titanium aluminum nitride layer, the stack structure can not only present a distinct purple appearance, but also achieve relatively high wear resistance.

Description

Laminated structures, structural components and their fabrication methods, and electronic devices

[0001] This application claims priority to Chinese Patent Application No. 202510308870.3, filed with the China National Intellectual Property Administration on March 14, 2025, entitled "PVD Coating, Structural Components, Preparation Methods Thereof and Electronic Devices Thereof", the entire contents of which are incorporated herein by reference; and Chinese Patent Application No. 202510671545.3, filed with the China National Intellectual Property Administration on May 22, 2025, entitled "Laminated Structures, Structural Components, Preparation Methods Thereof and Electronic Devices Thereof", the entire contents of which are incorporated herein by reference. Technical Field

[0002] This application relates to the field of coating technology, specifically to a laminated structure, structural component, its preparation method, and electronic device. Background Technology

[0003] Physical vapor deposition (PVD) is a technique that uses physical methods to deposit thin film materials onto a substrate surface in a vacuum environment. PVD coatings produced using this technique can achieve a relatively rich range of color effects. In recent years, purple has become one of the most popular colors for the exterior structural components of 3C electronic devices. Summary of the Invention

[0004] In view of this, embodiments of this application provide a highly wear-resistant purple PVD laminate structure, structural component, preparation method thereof, and electronic device, so as to enrich the appearance of the structural component of the electronic device and improve its wear resistance by means of the PVD laminate structure.

[0005] Specifically, the first aspect of this application provides a stacked structure, which includes a chromium oxide layer, a titanium aluminum oxynitride layer, and a titanium aluminum nitride layer stacked sequentially.

[0006] In the aforementioned laminated structure, the layering and synergistic effect of the three color layers—chromium oxide, titanium aluminum oxynitride, and titanium aluminum nitride—creates a distinct purple appearance. Furthermore, the chromium oxide layer, which exhibits a certain purple hue, has high hardness and a dense structure. Layering the titanium aluminum oxynitride and titanium aluminum nitride layers on top of this chromium oxide layer not only enhances the purple effect but also further improves the overall wear resistance of the laminated structure. Therefore, this laminated structure achieves a balance between a striking purple appearance and high hardness and good wear resistance.

[0007] In some embodiments of this application, along the direction from the chromium oxide layer to the titanium aluminum nitride layer, the oxygen content in the titanium aluminum nitride layer gradually decreases, while the nitrogen content gradually increases. The nitrogen and oxygen elements in the titanium aluminum nitride layer satisfy this distribution characteristic, which can significantly improve the bonding strength between the chromium oxide layer and the titanium aluminum nitride layer, resulting in higher overall structural stability of the laminated structure.

[0008] In some embodiments of this application, the thickness ratio of the titanium aluminum oxynitride layer to the chromium oxide layer is (0.8–1.2):1; and / or, the thickness ratio of the titanium aluminum nitride layer to the chromium oxide layer is (0.8–1.2):1. The relatively close thicknesses of the titanium aluminum oxynitride layer or the titanium aluminum nitride layer with the chromium oxide layer result in a more pronounced purple effect in the aforementioned laminated structure.

[0009] In some embodiments of this application, the sum of the thicknesses of the chromium oxide layer, the titanium aluminum oxynitride layer, and the titanium aluminum nitride layer is 0.4–4 μm. These three layers serve as color layers. Controlling the total thickness of the color layers in the above-mentioned laminated structure within this range allows the laminated structure to exhibit a distinct purple appearance while also possessing sufficient wear resistance, ensuring long-term use without significant color fading. In some embodiments, the sum of the thicknesses of the chromium oxide layer, the titanium aluminum oxynitride layer, and the titanium aluminum nitride layer is 0.4–1.5 μm. This allows the laminated structure to better balance a distinct purple appearance with good wear resistance.

[0010] In some embodiments of this application, the laminated structure further includes a substrate layer located on the side of the chromium oxide layer opposite to the titanium aluminum oxynitride layer. The substrate layer includes one or more of a Cr layer and a Ti layer. The substrate layer can be used to improve the adhesion between the chromium oxide layer and the substrate supporting the laminated structure.

[0011] In some possible embodiments of this application, the thickness of the underlayer is 0.5–2 μm. An appropriate thickness of the underlayer effectively ensures a high bonding force between the chromium oxide layer and the substrate supporting the multilayer structure, while avoiding excessive thickness of the overall multilayer structure due to an excessively thick underlayer.

[0012] In some embodiments of this application, the stacked structure further includes a transition layer located between the underlayer and the chromium oxide layer. Specifically, the transition layer comprises a chromium carbide transition layer and a chromium carbide transition layer stacked together, with the chromium carbide transition layer adjacent to the chromium oxide layer.

[0013] The bonding strength between the two-layer transition layer and the chromium oxide layer and the underlayer is relatively high, which can significantly improve the bonding strength between the chromium oxide layer and the underlayer, so that the substrate can retain the purple-colored stacked structure for a long time.

[0014] In some embodiments of this application, along the direction from the chromium oxide layer to the titanium aluminum nitride layer, the carbon content in the chromium carbide transition layer gradually decreases while the oxygen content gradually increases. Therefore, the chromium carbide transition layer can effectively enhance the bonding strength between the chromium oxide layer and the chromium carbide transition layer, which is beneficial for the overall structural stability of the laminated structure and allows the three color layers, exhibiting a purple appearance, to achieve better long-term bonding on the substrate.

[0015] In some possible embodiments of this application, the thickness of the transition layer is 0.1–0.5 μm. A moderate thickness of the transition layer effectively increases the adhesion between the chromium oxide layer and the underlayer while avoiding excessive thickness in the overall laminated structure.

[0016] In some possible embodiments of this application, the thickness of the laminated structure is 1–4 μm. A suitable overall thickness of the laminated structure is beneficial for its stable bonding to the substrate and to prevent detachment, while also contributing to a distinct purple appearance and good wear resistance.

[0017] In this embodiment, measured from the titanium aluminum nitride layer side, the L value of the stacked structure in the Lab color space is 30-50, the a value is -5-20, and the b value is -10-30. A stacked structure with Lab values ​​meeting the above requirements can exhibit a distinct purple hue, resulting in a striking appearance.

[0018] In this embodiment of the application, the Vickers hardness of the laminated structure, measured from the titanium aluminum nitride layer side, is greater than or equal to 600 HV. The high Vickers hardness of the laminated structure reflects its good overall wear resistance and scratch resistance, allowing for long-term use without fading, thus maintaining a distinct purple appearance for an extended period.

[0019] In some embodiments of this application, the Vickers hardness of the laminated structure is 600 HV to 2000 HV. In this case, the laminated structure can effectively combine high hardness with a relatively thin thickness.

[0020] In this embodiment of the application, measurements from the titanium aluminum nitride layer show that the laminated structure, under a 2000g load, undergoes 2000-8000 cycles of friction with a displacement of 100mm on a phenolic resin tabletop without significant color fading. This reflects the excellent wear resistance of the laminated structure, allowing for long-term use without color fading.

[0021] A second aspect of this application provides a structural component, including a substrate and a laminated structure as described in the first aspect of this application, wherein the laminated structure is disposed on one side of the substrate.

[0022] In some embodiments of this application, the substrate includes a metal substrate.

[0023] In some possible embodiments of this application, the metal substrate includes one or more of titanium alloys, zirconium alloys, and stainless steel. These are commonly used substrate materials for the exterior structural components of electronic devices, suitable for fabricating PVD coatings.

[0024] One side of the aforementioned structural component features the wear-resistant and distinctly purple layered structure described in this application embodiment, thus allowing the component to achieve both a good purple color effect and high wear resistance. This structural component can serve as an exterior structural component for electronic devices.

[0025] A third aspect of this application provides an electronic device, which includes at least one structural component as described in the second aspect of this application.

[0026] In some possible embodiments of this application, the electronic device includes a circuit board and a housing. The housing is assembled on the outside of the electronic device, and the circuit board is located inside the housing. The housing includes at least one structural component as described in the second aspect of the embodiments of this application. Exemplarily, the housing may include one or more of the following: a mid-frame, a back cover, a camera trim, and a hinge cover. At least one of these may employ the structural components described in the embodiments of this application. The hinge cover is only present in foldable electronic devices. This electronic device includes, but is not limited to, mobile phones, tablets, laptops, smart wearable devices, etc.

[0027] Since the above-mentioned structural component in the embodiments of this application has a distinct purple appearance and good wear resistance, electronic devices with housings using this structural component can simultaneously achieve a purple appearance and high wear resistance, making the electronic devices highly competitive in the market.

[0028] This application also provides a method for manufacturing a structural component, comprising the following steps:

[0029] A chromium oxide layer is deposited on one side of the substrate surface;

[0030] A titanium oxyaluminum layer is deposited on the chromium oxide layer;

[0031] A titanium aluminum nitride layer is deposited on the titanium aluminum nitride layer to obtain a structural component.

[0032] In some embodiments of this application, prior to the deposition of the chromium oxide layer, the method further includes depositing an underlayer on one side surface of the substrate.

[0033] In some embodiments of this application, after the deposition of the underlayer and before the deposition of the chromium oxide layer, a transition layer is further deposited on the underlayer; wherein the transition layer comprises a chromium carbide layer and a chromium oxide layer stacked together, the chromium carbide layer being located between the underlayer and the chromium oxide layer.

[0034] The above-mentioned structural component manufacturing method is simple, reliable, and can realize large-scale industrial production of structural components that combine purple color effect and high wear resistance. Attached Figure Description

[0035] Figure 1 is a three-dimensional structural diagram of an electronic device provided in an embodiment of this application.

[0036] Figure 2 is an exploded three-dimensional structural diagram of the electronic device shown in Figure 1.

[0037] Figure 3 is a schematic diagram of the rear structure of the electronic device in Figure 1.

[0038] Figure 4 is a schematic diagram of a stacked structure provided in an embodiment of this application.

[0039] Figure 5 is another schematic diagram of the stacked structure provided in the embodiment of this application.

[0040] Figure 6 is a schematic diagram of another type of stacked structure provided in the embodiments of this application.

[0041] Figure 7 is a schematic cross-sectional view of a structural member employing the laminated structure shown in Figure 4 of this application.

[0042] Figure 8 is a schematic cross-sectional view of a structural member employing the laminated structure shown in Figure 6 of this application.

[0043] Figure 9 is a schematic flowchart of a method for preparing a structural component according to an embodiment of this application.

[0044] Figure 10 is a schematic diagram of another process for the preparation method of the structural component provided in the embodiment of this application.

[0045] Key reference numerals: 1000 - Electronic device, 1 - Housing, 2 - Circuit board, 3 - Display module, 4 - Battery, 5 - Camera module, 110 - Back cover, 120 - Mid-frame, 130 - Camera trim, 10 - Layered structure, 11 - Chromium oxide layer, 12 - Titanium aluminum nitride layer, 13 - Titanium aluminum nitride layer, 14 - Underlayment, 15 - Transition layer, 151 - Chromium carbide transition layer, 152 - Chromium oxycarbonate transition layer, 20 - Substrate, 100 - Structural component. Detailed Implementation

[0046] The embodiments of this application will now be described in conjunction with the accompanying drawings.

[0047] Referring to Figures 1 and 2, Figure 1 is a three-dimensional structural diagram of an electronic device provided in an embodiment of this application. Figure 2 is an exploded three-dimensional structural diagram of the electronic device shown in Figure 1. The electronic device 1000 may include, but is not limited to, a cellphone, a notebook computer, a tablet computer, a personal digital assistant, a wearable device (such as a bracelet, watch, etc.), an augmented reality (AR) device, a virtual reality (VR) device, or a mobile device. In this embodiment of the application, a cellphone is used as an example for illustration.

[0048] It should be noted that Figures 1 and 2, as well as the related figures below, only schematically illustrate some of the components included in the electronic device 1000. The actual shape, size, location, and construction of these components are not limited by Figures 1 and 2, as well as the figures below. It is understood that the electronic device 1000 may include more or fewer components than shown, or combine some components, or split some components, or have different component arrangements.

[0049] As shown in Figures 1 and 2, the electronic device 1000 may include a housing 1 assembled on the outside of the electronic device and a circuit board 2 located inside the housing 1. In some embodiments, the electronic device 1000 may also include a display module 3, which may be mounted on the housing 1. The display module 3 can be used to display images, information, menus, and other graphical user interfaces. For example, the display module 3 is generally located on the front side of the electronic device 1000. The display module 3 and the housing 1 can together enclose the internal space of the electronic device 1000. This internal space can be used to house various electronic components, such as the circuit board 2, battery 4, microphone, speaker, camera module, etc. The circuit board 2 may be electrically connected to the display module 3. The battery 4 may be electrically connected to the circuit board 2. The battery 4 can be used to power the electronic components (such as the circuit board 2, display module 3, etc.) in the electronic device 1000.

[0050] In some embodiments, as shown in FIG2, the housing 1 may include a rear cover 110 assembled on the rear side of the electronic device 1000. The rear cover 110 may only cover the rear side of the electronic device 1000 (such as the side facing away from the display module 3), or it may cover both the rear side and the side frame of the electronic device 1000. The rear cover 110 is mainly used to enclose electronic components such as the circuit board 2 and the battery 4 in the internal space of the electronic device 1000 to protect the electronic components.

[0051] In some embodiments, as shown in FIG2, the housing 1 may further include a middle frame 120, one side of which may be fixedly connected to the rear cover 110. For example, a display module 3 may be mounted on the middle frame 120, with the display module 3 facing away from the rear cover 110. That is, the middle frame 120 is disposed between the display module 3 and the rear cover 110. The middle frame 120 primarily serves to support the entire device. In some embodiments, as shown in FIG2, the middle frame 120 includes a middle plate 121 and a frame 122 disposed along the outer periphery of the middle plate 121.

[0052] Figure 3 is a schematic diagram of the rear structure of the electronic device in Figure 1. In some embodiments, as shown in Figure 3, the electronic device 1000 may further include a camera module 5 located inside the electronic device 1000. Correspondingly, the housing 1 may also include a camera decorative piece 130, which can be applied to the camera module 5 to decorate and protect the lens of the camera module 5. The camera module 5 may be a front-facing camera module or a rear-facing camera module. The location of the camera decorative piece 130 depends on the location of the camera module 5; it may be located on the front or rear side of the electronic device 1000. In this embodiment, the camera module 5 is a rear-facing camera module, and the camera decorative piece 130 is located on the rear side of the electronic device 1000. In this example, the camera module 5 may be located on the side of the rear cover 110 facing the display module 3.

[0053] In some embodiments, as shown in FIG3, the camera decorative element 130 can be mounted on the back cover 110. The camera decorative element 130 can be a separate structure from the back cover 110. Light-transmitting holes can be provided on the back cover 110 and the camera decorative element 130 (a light-transmitting hole 1101 on the back cover 110 is shown in FIG2). The light-transmitting hole connects the interior of the electronic device 1000 to the outside. For example, light from outside the electronic device 1000 can enter the interior of the electronic device 1000 through the light-transmitting hole 1101. The camera module 5 can collect the light entering the interior of the electronic device 1000. In another embodiment, the camera decorative element 130 can also be an integral structure with the back cover 110.

[0054] In this embodiment, the outer surfaces of structural components such as the back cover 110, the mid-frame 120, and the camera decorative element 130 facing the outside of the electronic device 1000 (i.e., away from the internal space of the electronic device 1000) can constitute a part of the appearance surface of the electronic device 1000. For example, the outer surface of the frame 122 of the mid-frame 120 facing the outside of the electronic device, the outer surface of the back cover 110 facing the outside of the electronic device, and the outer surface of the camera decorative element 130 facing the outside of the electronic device are all part of the appearance surface of the electronic device 1000. In this embodiment, when the outer surface of a structural component facing the outside of the electronic device can constitute at least a part of the appearance surface of the electronic device, such a structure can be called an appearance structural component. For example, the back cover 110, the mid-frame 120, and the camera decorative element 130 can be appearance structural components of the electronic device 1000.

[0055] To enhance the appearance of electronic devices, the surfaces of their structural components typically feature PVD coatings formed using PVD technology. In recent years, purple has become a highly sought-after aesthetic choice for the structural components of electronic devices such as mobile phones, tablets, and smartwatches. Therefore, this application provides a PVD laminate structure that balances a good purple appearance with good wear resistance, along with a structural component using this PVD laminate structure, its fabrication method, and an electronic device.

[0056] The stacked structure provided in the embodiments of this application will be described in detail below.

[0057] Figure 4 is a schematic diagram of a stacked structure provided in an embodiment of this application. Referring to Figure 4, the stacked structure 10 includes a chromium oxide layer 11, a titanium aluminum nitride layer 12, and a titanium aluminum nitride layer 13 stacked sequentially. This stacked structure 10 can be disposed on one side of a substrate. When disposed on one side of the substrate, the chromium oxide layer 11 is close to the substrate, and the titanium aluminum nitride layer 13 is away from the substrate. For example, the titanium aluminum nitride layer 13 can be the outermost layer of the stacked structure 10 facing away from the substrate.

[0058] In the stacked structure 10 provided in this embodiment, the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 can serve as color layers. These three layers work synergistically, allowing the stacked structure 10 to exhibit a distinct purple hue over a wide color distribution range. Furthermore, the chromium oxide layer 11, which exhibits a certain purple effect, has high hardness and a dense coating structure, resulting in good wear resistance, which is beneficial for improving the wear resistance of the stacked structure 10. The titanium aluminum oxynitride layer 12 and the titanium aluminum nitride layer 13 are then stacked on top of the chromium oxide layer 11, which, in addition to exhibiting a distinct purple effect, further enhance the overall wear resistance of the stacked structure 10. Therefore, the stacked structure 10 can achieve both a good purple appearance and good wear resistance.

[0059] Each layer in the aforementioned stacked structure 10 can be prepared using PVD technology; therefore, the stacked structure 10 can be referred to as a PVD stacked structure. Furthermore, it is understood that the stacked structure 10 composed of the aforementioned chromium oxide layer 11, titanium aluminum oxynitride layer 12, and titanium aluminum nitride layer 13 has low transmittance in the visible light region, thus providing a certain color-masking effect and giving the substrate it supports a good purple appearance.

[0060] In this embodiment, the chemical formula of chromium oxide can be represented as CrO. x (Hereinafter referred to as CrO), the chemical formula of titanium aluminum oxynitride can be represented as Ti. w Al z O x N y (This application may be abbreviated as TiAlON below), the chemical formula of titanium aluminum nitride can be represented as Ti w Al z N y (This application may be abbreviated as TiAlN below).

[0061] It should be noted that the subscripts of each element in the above chemical formulas should ensure that the corresponding chemical formulas satisfy charge balance. Furthermore, there is no correlation between the 'x' and 'y' elements in the above chemical formulas, nor between the 'z' and 'w' elements. That is, the same letters (such as 'w', 'z', etc.) in different chemical formulas are not related; they are not distinguished for the sake of convenience.

[0062] In some embodiments of this application, along the direction from the chromium oxide layer 11 to the titanium aluminum nitride layer 13 (e.g., the Z direction in Figure 4), the oxygen content in the titanium aluminum nitride layer 12 gradually decreases, while the nitrogen content gradually increases. That is, the closer the titanium aluminum nitride layer 12 is to the titanium aluminum nitride layer 13, the higher the nitrogen content and the lower the oxygen content; conversely, the closer the titanium aluminum nitride layer 12 is to the chromium oxide layer 11, the higher the oxygen content and the lower the nitrogen content. This distribution characteristic of nitrogen and oxygen in the titanium aluminum nitride layer 12 significantly enhances the bonding strength between the chromium oxide layer 11 and the titanium aluminum nitride layer 13, resulting in higher overall structural stability and reliability of the laminated structure 10.

[0063] In some embodiments of this application, the thickness ratio of the titanium aluminum oxynitride layer 12 to the chromium oxide layer 11 can be (0.8–1.2):1. The thickness ratio of the titanium aluminum oxynitride layer 13 to the chromium oxide layer 11 can also be (0.8–1.2):1. The thickness ratio of the titanium aluminum oxynitride layer 12 / 13 to the chromium oxide layer 11 is close to 1:1, thus the combination of these three layers makes the purple effect of the above-mentioned stacked structure 10 more obvious. For example, the aforementioned two thickness ratios can be independently 0.85:1, 0.88:1, 0.9:1, 0.95:1, 1:1, 1.05:1, 1.1:1, 1.15:1, or 1.2:1, etc.

[0064] In some embodiments, the thickness ratio of the titanium aluminum oxynitride layer 12 to the titanium aluminum nitride layer 13 can be (0.8 to 1.2):1, specifically 0.85:1, 0.88:1, 0.9:1, 0.95:1, 1:1, 1.05:1, 1.1:1, 1.12:1, 1.15:1, or 1.2:1, etc. Thus, the combination of the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 makes the purple effect of the aforementioned stacked structure 10 more pronounced.

[0065] In some embodiments of this application, the sum of the thicknesses of the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 can be 0.4 to 4 μm. It is understood that, in the case that the stacked structure 10 does not include other film layers, this sum of thicknesses is the total thickness of the stacked structure 10.

[0066] The chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 are color layers. Controlling the total thickness of the color layers in the laminated structure 10 within this range allows the laminated structure 10 to exhibit a distinct purple appearance while also possessing sufficient wear resistance, ensuring long-term use without significant fading. For example, the sum of the above thicknesses can be 0.5μm, 0.6μm, 0.8μm, 0.9μm, 1μm, 1.1μm, 1.2μm, 1.3μm, 1.4μm, 1.5μm, 1.6μm, 1.8μm, 2μm, 2.2μm, 2.5μm, 3μm, 3.2μm, 3.5μm, or 3.8μm, etc.

[0067] In some embodiments, the sum of the thicknesses of the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 can be 0.4–1.5 μm. When the sum of the thicknesses is 0.4–1.5 μm, it is beneficial for the laminated structure 10 to better balance a distinct purple appearance and good wear resistance. In some embodiments, the sum of the thicknesses is 1–1.5 μm.

[0068] In this embodiment, the L value of the laminated structure 10 in the Lab color space is 30-50, the a value is -5-20, and the b value is -10-30. The L, a, and b values ​​can be measured using a colorimeter. Specifically, the L, a, and b values ​​are tested from the side of the titanium aluminum nitride layer 13 of the laminated structure 10, or in other words, the test is conducted on the side of the laminated structure 10 away from the substrate supporting it.

[0069] Where L represents the brightness value, and a and b represent the hue index. The a value specifically represents the red-green range of the color; a positive a value represents red, and a negative a value represents green. When a is positive, the larger the a value, the redder the color; when a is negative, the larger the absolute value of a, the greener the color. The b value specifically represents the yellow-blue range of the color; a negative b value represents blue. Similarly, when b is negative, the larger the absolute value of b, the bluer the color.

[0070] The coordinate values ​​L, a, and b of the laminated structure 10 in this embodiment of the application are within the aforementioned range in the Lab color space, resulting in a distinct purple color for the laminated structure 10. Furthermore, the wide range of its hue values ​​a and b indicates that the laminated structure 10 can exhibit purple within a broad color distribution range, allowing for the control of different hues of purple as needed. In addition, this purple PVD laminated structure exhibits better wear resistance compared to conventional purple coatings.

[0071] In this embodiment, the overall color of the aforementioned stacked structure 10 can be bluish-purple or reddish-purple. This hue refers to the color observed from the titanium aluminum nitride layer 13 side of the stacked structure 10. Specifically, when the value of b in the stacked structure 10 is negative and the value of a is a large positive value, the stacked structure 10 can exhibit a purple color with a reddish-blue hue, and can be referred to as reddish-purple. When the value of b in the stacked structure 10 is negative and the value of a is negative, the stacked structure 10 can exhibit a bluish-purple color.

[0072] For example, the L value of the aforementioned layered structure 10 in the Lab color space can be 30, 32, 35, 36, 38, 40, 42, 45, 48, or 50, etc. The a value of the aforementioned layered structure 10 in the Lab color space can be -4, -3, -2, -1, 1, 2, 5, 6, 8, 10, 12, 15, 16, 18, or 19, etc. The b value of the aforementioned layered structure 10 in the Lab color space can be -11, -12, -15, -16, -18, -20, -22, -25, -28, or -29, etc.

[0073] In this embodiment of the application, the Vickers hardness of the aforementioned laminated structure 10 is greater than or equal to 600 HV. A higher Vickers hardness of the laminated structure 10 reflects better overall wear resistance and scratch resistance, allowing for prolonged use without fading, thus maintaining a distinct purple appearance for a long time. For example, the Vickers hardness of the laminated structure 10 can be greater than or equal to 800 HV, greater than or equal to 1000 HV, or greater than or equal to 1200 HV, etc.

[0074] In some embodiments, the Vickers hardness of the above-described laminated structure 10 can be 600–2000 HV. In this case, the laminated structure 10 can effectively combine a thin thickness with a high hardness. For example, the Vickers hardness can be 800 HV, 1000 HV, 1100 HV, 1200 HV, 1300 HV, 1400 HV, 1500 HV, 1600 HV, 1700 HV, 1800 HV, or 1900 HV. In some embodiments, the Vickers hardness of the laminated structure 10 can be 1000–2000 HV.

[0075] The Vickers hardness mentioned above can be measured using the indentation method, specifically from the side of the titanium aluminum nitride layer 13 of the laminated structure 10. This Vickers hardness can at least reflect the superposition effect of the three layers: chromium oxide layer 11, titanium aluminum nitride layer 12, and titanium aluminum nitride layer 13. Specifically, the test method for the Vickers hardness of the laminated structure 10 can include: pressing an indenter onto the surface of the titanium aluminum nitride layer 13 of the laminated structure 10, continuously increasing the applied load until a predetermined indentation depth is reached, and calculating the Vickers hardness by measuring the indentation depth and the corresponding applied load.

[0076] In this embodiment, the aforementioned laminated structure 10 underwent 2000 to 8000 cycles of friction testing with a displacement of 100 mm on a phenolic resin tabletop under a 2000g load without showing significant color fading. This reflects that the laminated structure 10 has good wear resistance and can be used for a long time without fading. The friction test was conducted from the side of the titanium aluminum nitride layer 13 of the laminated structure 10.

[0077] The above friction test method can be as follows: Place the sample to be tested with the above-mentioned laminated structure 10 on the substrate surface on a commercial phenolic resin board table, apply a force of 2000g (including the sample and the clamping fixture) to make the titanium aluminum nitride layer 13 in the laminated structure 10 rub back and forth with the table. The sample displacement is 100mm in each friction test, the test rate is 60 friction tests every 1min, and the table position is changed every 1000 friction tests. Test how many friction tests the laminated structure 10 can withstand without obvious discoloration.

[0078] Figure 5 is another schematic diagram of the stacked structure provided in the embodiment of this application. The main difference between Figure 5 and Figure 4 is that the stacked structure has an additional bottom layer 14.

[0079] In some embodiments of this application, as shown in FIG5, the laminated structure 10 may further include a base layer 14, which is located on the side of the chromium oxide layer 11 opposite to the titanium aluminum oxynitride layer 12. The base layer 14 is mainly used to improve the bonding between the chromium oxide layer 11 and the substrate supporting the laminated structure 10, thereby increasing the retention time of the laminated structure 10 on the substrate.

[0080] In this embodiment, the underlayer 14 can be a metallic material. In some embodiments of this application, the underlayer 14 may include one or more of Cr and Ti layers, but is not limited thereto. It is understood that when the underlayer 14 is two of Cr and Ti layers, it is a stacked structure of Cr and Ti layers. The Cr and / or Ti layers have good adhesion to the chromium oxide layer 11 and common metal substrates, effectively improving the bonding strength between them.

[0081] In some possible embodiments of this application, the thickness of the underlayer 14 can be 0.5–2 μm. A moderate thickness of the underlayer 14 effectively ensures a high bonding force between the chromium oxide layer 11 and the substrate supporting the multilayer structure 10, while avoiding excessive thickness of the overall multilayer structure 10 due to an excessively thick underlayer 14. For example, the thickness of the underlayer 14 can be 0.6 μm, 0.8 μm, 0.9 μm, 1 μm, 1.1 μm, 1.2 μm, 1.3 μm, 1.4 μm, 1.5 μm, 1.6 μm, 1.8 μm, or 1.9 μm. In some embodiments, the thickness of the underlayer can be 0.8–1.2 μm.

[0082] It is understood that in some other embodiments of this application, the laminated structure 10 may not contain the base layer 14, for example, when the substrate supporting the laminated structure 10 is elemental Ti or a Ti alloy.

[0083] Figure 6 is a schematic diagram of another layered structure provided in an embodiment of this application. The main difference between Figure 6 and Figure 5 is the addition of a transition layer 15.

[0084] In some embodiments of this application, as shown in FIG6, the laminated structure 10 further includes a transition layer 15. The transition layer 15 may be located between the underlayer 14 and the chromium oxide layer 11. Exemplarily, the transition layer 15 may include a chromium carbide transition layer 151 and a chromium carbide transition layer 152 stacked together. The chromium carbide transition layer 152 is closer to the chromium oxide layer 11, while the chromium carbide transition layer 151 is farther away from the chromium oxide layer 11. This two-layer transition layer 15 has high bonding strength with both the chromium oxide layer 11 and the underlayer 14, thereby significantly improving the bonding strength between the chromium oxide layer 11 and the underlayer 14, allowing the laminated structure 10 with a purple appearance to be stably retained on the substrate for a long time.

[0085] In this embodiment, the chemical formula of chromium carbide can be represented as CrC. v (Hereinafter abbreviated as CrC). The chromium oxide layer is a chromium compound layer containing both carbon and oxygen elements. For example, the chemical formula of chromium oxide can be represented as Cr. u O x C v As stated above in this application, the subscripts of each element in each chemical formula should ensure that the corresponding chemical formula satisfies charge balance. Furthermore, identical letters (such as v, x, etc.) in different chemical formulas are not related and are not distinguished for ease of description.

[0086] In some embodiments of this application, along the direction from the chromium oxide layer 11 to the titanium aluminum nitride layer 13 (i.e., the Z direction in FIG. 6), the carbon content in the chromium oxide transition layer 152 gradually decreases while the oxygen content gradually increases. That is, the closer to the chromium oxide layer 11 in the chromium oxide transition layer 152, the lower the carbon content and the higher the oxygen content; the closer to the chromium carbide transition layer 151, the higher the carbon content and the lower the oxygen content. Therefore, the chromium oxide transition layer 152 can effectively improve the bonding strength between the chromium oxide layer 11 and the chromium carbide transition layer 151, resulting in higher overall structural stability of the laminated structure 10. This allows the three color layers (chromium oxide layer 11 - titanium aluminum nitride layer 12 - titanium aluminum nitride layer 13) exhibiting a purple appearance to achieve better long-term bonding on the substrate.

[0087] It is understood that in other embodiments of this application, the stacked structure 10 may also include a transition layer 15 but not a base layer 14.

[0088] In some possible embodiments of this application, the thickness of the transition layer 15 can be 0.1–0.5 μm. That is, the sum of the thicknesses of the chromium carbide transition layer 151 and the chromium carbide transition layer 152 is 0.1–0.5 μm. A moderate thickness of the transition layer 15 effectively increases the adhesion between the chromium oxide layer 11 and the underlayer 14, while avoiding the negative impact of an excessively thick overall laminate structure 10. For example, the thickness of the transition layer 15 can be 0.15 μm, 0.2 μm, 0.25 μm, 0.3 μm, 0.35 μm, or 0.4 μm, etc. In some embodiments, the thickness of the transition layer 15 can be 0.1–0.3 μm.

[0089] In some embodiments of this application, the thickness ratio of the chromium carbide transition layer 151 to the chromium carbide transition layer 152 can be 1:(0.8-1.2). This is advantageous because it results in higher bonding strength between the two-layer transition layer 15 and the underlying substrate 14 and the upper chromium oxide layer 11, thereby ensuring a long-term and stable retention of the purple color layer composed of the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 on the substrate. For example, the thickness ratio of the chromium carbide transition layer 151 to the chromium carbide transition layer 152 can be 1:0.85, 1:0.9, 1:0.95, 1:1.0, 1:1.05, or 1:1.1, etc.

[0090] The sum of the thicknesses of the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 mentioned above in this application is also suitable for the situations in Figures 5 and 6. In some embodiments, in Figures 5 and 6, the sum of the thicknesses of the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 is 0.4–1.5 μm. Optionally, this sum of thicknesses is 1–1.5 μm, and more preferably 1.1–1.5 μm.

[0091] In some embodiments of this application, the thickness of the above-mentioned laminated structure 10 can be 1 to 4 μm. The laminated structure 10 has a suitable overall thickness, which is beneficial for its stable bonding to the substrate and its resistance to detachment, as well as for the laminated structure 10 to have a distinct purple appearance and good wear resistance.

[0092] For example, the thickness of the laminated structure 10 can be 1 μm, 1.1 μm, 1.2 μm, 1.3 μm, 1.4 μm, 1.5 μm, 1.6 μm, 1.7 μm, 1.8 μm, 1.9 μm, 2 μm, 2.1 μm, 2.2 μm, 2.3 μm, 2.4 μm, 2.5 μm, 2.6 μm, 2.7 μm, 2.8 μm, 2.9 μm, 3 μm, 3.1 μm, 3.2 μm, 3.3 μm, 3.4 μm, 3.5 μm, 3.6 μm, 3.7 μm, 3.8 μm, 3.9 μm, or 4 μm, etc. In some embodiments, the thickness of the laminated structure 10 can be 2 to 3 μm. This is more conducive to the laminated structure 10 achieving both a good purple appearance and wear resistance.

[0093] It should be noted that the thickness of the laminated structure 10 mentioned here is suitable not only for the case where it includes three color layers (chromium oxide layer 11, titanium aluminum oxynitride layer 12, and titanium aluminum nitride layer 13), an underlayer 14, and a transition layer 15 (as shown in Figure 6), but also for the case shown in Figure 4 above (where the laminated structure 10 only includes the three color layers chromium oxide layer 11, titanium aluminum oxynitride layer 12, and titanium aluminum nitride layer 13), and for the case where the laminated structure 10 includes the above three color layers and the underlayer 14 (as shown in Figure 5), or for the case where it includes the above three color layers and the transition layer 15. Furthermore, the Lab value, Vickers hardness, and abrasion resistance test parameters of the laminated structure 10 mentioned above are all suitable for the cases in Figures 5 and 6. These will not be elaborated upon here.

[0094] Next, the structural components using the laminated structure provided in the embodiments of this application will be described.

[0095] Figure 7 is a cross-sectional schematic diagram of a structural member employing the laminated structure shown in Figure 4 of this application. Figure 8 is a cross-sectional schematic diagram of a structural member employing the laminated structure shown in Figure 6 of this application.

[0096] As shown in Figures 7 and 8, the structural component 100 includes a substrate 20 and the aforementioned stacked structure 10 of this application embodiment, which is disposed on one side of the substrate 20. As described above, the stacked structure 10 includes a chromium oxide layer 11, a titanium aluminum nitride layer 12, and a titanium aluminum nitride layer 13 stacked sequentially. The chromium oxide layer 11 is close to the substrate 20, while the titanium aluminum nitride layer 13 is away from the substrate 20.

[0097] In the structural component 100 provided in this application embodiment, the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 can serve as color layers. Through the synergistic effect of these three color layers, the stacked structure 10 formed by them can exhibit a distinct purple color over a wide range of color distribution, thereby giving the structural component 100 a distinct purple appearance. Furthermore, the chromium oxide layer 11 has high hardness and a dense coating structure, resulting in good wear resistance, which is beneficial to improving the wear resistance of the stacked structure 10. The titanium aluminum oxynitride layer 12 and the titanium aluminum nitride layer 13 are then stacked on top of the chromium oxide layer 11, which, in addition to exhibiting a distinct purple effect, further enhance the overall wear resistance of the stacked structure 10. Therefore, the structural component 100 can achieve both a good purple appearance and good wear resistance.

[0098] For details regarding the material and / or thickness characteristics of the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13, as well as the color, hardness, and wear resistance of the laminated structure 10, please refer to the description of Figure 4 above in this application. Furthermore, the relevant performance parameters of the laminated structure 10 mentioned above are all applicable to the structural component 100.

[0099] In some embodiments of this application, as shown in FIG8, the laminated structure 10 further includes a base layer 14 and a transition layer 15. The base layer 14 is located on the side of the chromium oxide layer 11 facing away from the titanium aluminum oxynitride layer 12. The transition layer 15 may be located between the base layer 14 and the chromium oxide layer 11. For details regarding the material and / or thickness characteristics of the base layer 14 and the transition layer 15, please refer to the preceding descriptions of FIG5 and FIG6 in this application.

[0100] It should be noted that, where there is no conflict, the various features in the embodiments of this application can be combined with each other, and any combination of features in different embodiments is also within the protection scope of this application. That is to say, the multiple embodiments described above can also be arbitrarily combined according to actual needs. For example, the underlayer 14 or the transition layer 15 can also be removed from the structural member 100 shown in FIG8.

[0101] In this application embodiment, the substrate 20 supporting the laminated structure 10 may include a metal substrate. In some embodiments of this application, the metal substrate may include one or more of titanium alloys, zirconium alloys, stainless steel, etc., but is not limited thereto. These are substrate materials commonly used in the appearance structural components of electronic devices and suitable for fabricating PVD coatings on them.

[0102] Because one side of the structural component 100 has the aforementioned wear-resistant and purple-colored laminated structure 10 of this application embodiment, the structural component can achieve both a good purple color effect and high wear resistance. This structural component 100 can serve as an exterior structural component of the electronic device 1000. The substrate 20 faces the internal space of the electronic device 1000, and the laminated structure 10 faces the external surface of the electronic device 1000. The laminated structure 10 constitutes the external film structure of the structural component 100. Specifically, the surface of the titanium aluminum nitride layer 13 facing away from the chromium oxide layer 11 can constitute part of the exterior surface of the electronic device 1000.

[0103] For example, at least one of the following components in electronic devices such as mobile phones and tablets—such as the mid-frame, back cover, and decorative parts (e.g., camera decorative parts)—can utilize the structural component 100. Furthermore, when the electronic device is a foldable device, its hinge cover can also utilize the structural component 100. For instance, in a foldable mobile phone, at least one of the mid-frame, back cover, camera decorative parts, and hinge cover can utilize the structural component 100. Another example is the mid-frame, watch strap, bezel, and decorative parts of a watch.

[0104] The following describes the preparation method of the structural component provided in the embodiments of this application.

[0105] Figure 9 is a schematic flowchart of a method for preparing a structural component according to an embodiment of this application. The following describes the method for preparing a structural component according to an embodiment of this application, taking the preparation of the structural component shown in Figure 7 as an example, with reference to Figure 9. The preparation steps of the structural component 100 may include, but are not limited to, the following steps S101, S102, and S103.

[0106] S101, a chromium oxide layer 11 is deposited on one side surface of the substrate 20;

[0107] S102, depositing a titanium oxyaluminum layer 12 on the chromium oxide layer 11;

[0108] S103, a titanium aluminum nitride layer 13 is formed by depositing titanium aluminum nitride layer 12.

[0109] In this process, the deposition of the chromium oxide layer 11 in step S101, the deposition of the titanium aluminum nitride layer 12 in step S102, and the deposition of the titanium aluminum nitride layer 13 in step S103 can all be performed using PVD technology. PVD can include, but is not limited to, magnetron sputtering, vacuum evaporation, or ion plating (e.g., arc ion plating, radio frequency ion plating), etc.

[0110] In some embodiments of this application, the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 can be formed by magnetron sputtering. The working principle of magnetron sputtering is to use the interaction of a magnetic field and an electric field to make electrons move near the surface of the target material, thereby increasing the probability of electrons colliding with an inert gas (such as argon) to generate ions. The generated ions collide with the target material under the action of the electric field, causing the target material to be sputtered. In the sputtered particles, neutral target atoms or molecules are deposited on the substrate to form a thin film.

[0111] The magnetron sputtering process generally involves the following steps: First, the substrate material to be deposited is cleaned and placed inside the magnetron sputtering furnace, with the target and gas supply pipes positioned. After evacuating the magnetron sputtering furnace to a certain vacuum level, an inert gas is introduced. Then, the furnace is heated to the desired deposition temperature to deposit the desired film. When forming compound films, it is typically necessary to introduce a reactive gas for compound film formation after heating to the required deposition temperature.

[0112] For example, in step S101, the deposition of the chromium oxide layer 11 can be achieved by using a Cr target as the target material and depositing it in an oxygen (O2) atmosphere.

[0113] In step S102, the titanium aluminum oxynitride layer 12 can be deposited using Ti and Al targets as targets and deposited in a mixed atmosphere of nitrogen (N2) and oxygen (O2).

[0114] In some embodiments of this application, during step S102, when depositing the titanium aluminum nitride layer 12, the flow ratio of O2 to N2 can be controlled to gradually decrease as the deposition process proceeds. Thus, the O content in the formed titanium aluminum nitride layer 12 gradually decreases along the direction away from the substrate 20, while the nitrogen content gradually increases along the same direction. Under these conditions, the titanium aluminum nitride layer 12 can effectively improve the bonding strength between the titanium aluminum nitride layer 13 and the chromium oxide layer 11, resulting in higher overall structural stability of the laminated structure 10.

[0115] In step S103, the titanium aluminum nitride layer 13 can be deposited using Ti and Al targets as targets and deposited in a nitrogen (N2) atmosphere.

[0116] After the processing in step S103, the resulting structural component 100 includes a substrate 20 and a stacked structure 10 formed on one side surface of the substrate 20. The stacked structure 10 includes a chromium oxide layer 11, a titanium aluminum oxynitride layer 12 and a titanium aluminum nitride layer 13 sequentially stacked on one side of the substrate 20.

[0117] In the above preparation method, by sequentially depositing a chromium oxide layer 11, a titanium aluminum oxynitride layer 12, and a titanium aluminum nitride layer 13 on one side of the substrate 20, the resulting structural component can have a distinct purple appearance. Furthermore, the surface film layer on this structural component (i.e., the stack of chromium oxide layer 11, titanium aluminum oxynitride layer 12, and titanium aluminum nitride layer 13) exhibits higher hardness and better wear resistance compared to existing purple PVD coatings. This structural component preparation method is simple, highly reliable, and can achieve large-scale industrial production of structural components that simultaneously possess a purple appearance and high wear resistance.

[0118] The thicknesses and their relationships among the chromium oxide layer 11, the titanium aluminum oxynitride layer 12, and the titanium aluminum nitride layer 13 can be found in the preceding description of this application. Their respective thicknesses can be adjusted by regulating deposition process parameters (including deposition time, target power, etc.).

[0119] In some embodiments of this application, the deposition time for forming the chromium oxide layer 11 can be 20 to 50 minutes, specifically 22 minutes, 25 minutes, 28 minutes, 30 minutes, 32 minutes, 35 minutes, 38 minutes, 40 minutes, 42 minutes, 45 minutes, or 48 minutes.

[0120] In some embodiments of this application, the deposition time for forming the titanium aluminum oxynitride layer 12 can be 10 to 30 minutes, specifically 12 minutes, 15 minutes, 18 minutes, 20 minutes, 22 minutes, 25 minutes, or 28 minutes.

[0121] In some embodiments of this application, the deposition time for forming the titanium aluminum nitride layer 13 can be 10 to 30 minutes, for example, 12 minutes, 15 minutes, 18 minutes, 20 minutes, 22 minutes, 25 minutes, or 28 minutes.

[0122] Figure 10 is a schematic flowchart of another method for preparing a structural component according to an embodiment of this application. The flowchart shown in Figure 10 can be used to form the structural component shown in Figure 8. The preparation of the structural component shown in Figure 8 may include, but is not limited to, the following steps S201, S202, and S203.

[0123] S201, a base layer 14 is deposited on one side surface of the substrate 20, a transition layer 15 is deposited on the base layer 14, and a chromium oxide layer 11 is deposited on the transition layer 15.

[0124] S202, depositing a titanium oxyaluminum nitride layer 12 on the chromium oxide layer 11;

[0125] S203, deposited on the titanium aluminum nitride layer 12 to form a titanium aluminum nitride layer 13.

[0126] The main difference between Figure 10 and Figure 9 lies in the fact that step S201 differs from step S101 described above. Specifically, before depositing the chromium oxide layer 11 on the substrate, an underlayer 14 is first deposited on the substrate, and then a transition layer 15 is formed on the underlayer 14. As described earlier in this application, the underlayer 14 may include one or more of a Cr layer and a Ti layer. When depositing the Cr underlayer, a Cr target is used. When depositing the Ti underlayer, a Ti target is used. For the thickness of the underlayer 14, please refer to the description above in this application.

[0127] The deposition of the transition layer 15 on the underlayer 14 may include: first depositing a chromium carbide transition layer 151, and then depositing a chromium carbide transition layer 152 on the chromium carbide transition layer 151. When depositing the chromium carbide transition layer 151, a Cr target may be used as the target material, and deposition may be performed in the presence of a carbon source gas (e.g., acetylene). When depositing the chromium carbide transition layer 152, a Cr target may be used as the target material, and deposition may be performed in the presence of a carbon source gas (e.g., acetylene) and oxygen (O2). Further structural characteristics and thickness of the transition layer 15 can be found in the preceding description of this application.

[0128] In some embodiments of this application, during the deposition of the chromium carbide transition layer 152, the flow ratio of O2 to carbon source gas can be controlled to gradually increase as the deposition process proceeds. This results in a chromium carbide transition layer 152 with a gradually increasing oxygen-to-carbon ratio. Specifically, along the direction from the chromium oxide layer 11 to the titanium aluminum nitride layer 13, the carbon content in the chromium carbide transition layer 152 gradually decreases, while the oxygen content gradually increases. This chromium carbide transition layer 152 can better enhance the bonding strength between the chromium oxide layer 11 and the chromium carbide transition layer 151, resulting in higher overall structural stability of the stacked structure 10 and a more stable bond to the substrate 20.

[0129] In some embodiments of this application, the deposition time of the chromium carbide transition layer 151 can be 10 to 30 minutes, specifically 12 minutes, 15 minutes, 18 minutes, 20 minutes, 22 minutes, 25 minutes, or 28 minutes.

[0130] In some embodiments of this application, the deposition time of the chromium oxide transition layer 152 can be 10 to 30 minutes, specifically 12 minutes, 15 minutes, 18 minutes, 20 minutes, 22 minutes, 25 minutes, or 28 minutes.

[0131] After the above step S203, the structure of the obtained structural component 100 is shown in FIG8, including a substrate 20 and a stacked structure 10 formed on one side surface of the substrate 20. The stacked structure 10 includes a base layer 14, a transition layer 15, a chromium oxide layer 11, a titanium aluminum oxynitride layer 12 and a titanium aluminum nitride layer 13 sequentially stacked on one side of the substrate 20.

[0132] It is understood that if a multilayer structure as shown in FIG. 5 is prepared on a substrate, a base layer 14 may be deposited on the substrate first, before depositing the chromium oxide layer 11 on one side surface of the substrate. The chromium oxide layer 11 can then be deposited on the base layer 14. Alternatively, in other embodiments of this application, a transition layer 15 may be deposited on the substrate first, without forming the base layer 14, before depositing the chromium oxide layer 11 on one side surface of the substrate. The chromium oxide layer 11 can then be deposited on the transition layer 15.

[0133] The embodiments of this application will be further described below through multiple examples.

[0134] Example 1

[0135] The fabrication of a structural component includes:

[0136] 1) First, the required stainless steel substrate is ultrasonically cleaned and placed in the magnetron sputtering furnace, with the target and gas supply pipes positioned. The furnace body is evacuated to 0.1 Pa, and then argon gas is introduced for two cycles of cleaning. Next, the furnace temperature is raised to 120°C, and a Cr target is sputtered onto the substrate to form a Cr underlayer with a thickness of 1 μm while argon gas is introduced.

[0137] 2) Acetylene gas is introduced into the magnetron sputtering furnace to sputter a Cr target to deposit a CrC transition layer with a thickness of 0.1 μm.

[0138] 3) While keeping the acetylene flow rate constant, a small amount of oxygen is simultaneously introduced into the magnetron sputtering furnace to sputter the Cr target to deposit a carbon oxide chromium transition layer with a thickness of 0.1 μm.

[0139] 4) Stop the acetylene gas supply, keep the oxygen supply, and sputter the Cr target to deposit a CrO color layer with a thickness of 0.4 μm.

[0140] 5) Place Ti and Al targets in the magnetron sputtering furnace, and introduce nitrogen gas while keeping the oxygen flow rate constant. Sputter the Ti and Al targets simultaneously to deposit a TiAlON color layer with a thickness of 0.4 μm.

[0141] 6) Stop the oxygen supply and continue the nitrogen supply to deposit a TiAlN color layer with a thickness of 0.45 μm. This completes the preparation of the purple PVD coating on the substrate, resulting in a purple structural component.

[0142] Table 1 below summarizes the relevant parameter information and performance test results of the structural components provided in Example 1 and other examples and comparative examples.

[0143] Table 1

[0144] As can be seen from Table 1, the comparison between Example 2 and Comparative Example 1 shows that when the color layer set on the substrate is a TiO layer, its hardness and abrasion resistance are poor. In addition, the coordinate values ​​of the TiO layer in the Lab color space are somewhat different from those of the color layer in Example 2, and the purple effect is not as obvious as the purple effect presented by the three-layer color layer in Example 2.

[0145] A comparison between Example 2 and Comparative Examples 2-3 shows that when the substrate has a CrO color layer but lacks one or both of the TiAlON and TiAlN color layers, the L, a, and b values ​​of the resulting structural component in the Lab color space are not within the range required by the application, and the purple effect is not obvious. For example, when viewed from the side of the color layer away from the substrate, the structural component of Comparative Example 2 appears slightly gray. The Vickers hardness and the number of abrasion resistance tests of the structural components of Comparative Examples 2-3 are also lower than those of Example 2.

[0146] Furthermore, a comparison between Example 1 and Examples 2-3 shows that when there is a stacked structure of CrO color layer, TiAlON color layer and TiAlN color layer on the substrate of the structural component, the presence of an underlayer and a transition layer on the substrate is more conducive to improving the Vickers hardness and abrasion resistance of the structural component.

[0147] The above description merely illustrates exemplary embodiments of this application, and while the description is specific and detailed, it should not be construed as limiting the scope of this patent application. It should be noted that those skilled in the art can make various modifications and improvements to the technical solutions described in the foregoing embodiments without departing from the concept of this application, and such modifications and improvements are all considered to be within the scope of protection of this application. Therefore, the scope of protection of this patent application should be determined by the scope of the appended claims.

[0148] Where there is no conflict, the embodiments and features in the embodiments of this application can be combined with each other, and any combination of features in different embodiments is also within the protection scope of this application. That is to say, the multiple embodiments described above can also be arbitrarily combined according to actual needs.

[0149] It should be noted that all the above figures are exemplary illustrations of this application. The figures mainly illustrate the parts of the product related to the embodiments of this application, and the product may still include other parts not shown in the figures. Furthermore, the actual shape, actual position, actual size and proportion, actual construction, actual quantity, etc. of the product's components or structures are not limited by the figures.

[0150] In this application's embodiments, "and / or" is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone; where A and B can be singular or plural. Additionally, in this application, the character " / " generally indicates that the preceding and following related objects have an "or" relationship. For example, A / B can represent A or B.

[0151] In the embodiments of this application, "multiple (types)" means two or more (types). "At least one (type)" means one (type) or multiple (types). "At least one of the following" or similar expressions refer to any combination of these items, including any combination of single or multiple items. For example, "at least one of a, b, or c", or "at least one of a, b, and c", can both represent: a, b, c, ab (i.e., a and b), ac, bc, or abc, where a, b, and c can be single or multiple.

[0152] In this application, the numerical range indicated by "~" refers to the range including the minimum and maximum values ​​recorded before and after "~". For example, the value of c can be 0.5 to 15, meaning that the value of c can be between 0.5 and 15, including the endpoint values ​​of 0.5 and 15. Furthermore, the numerical values ​​and ranges involved in the embodiments of this application are approximate values, and may have a certain range of errors due to the influence of manufacturing processes / testing methods, etc., and this part of the error is also within the scope of protection of this application. In addition, expressions regarding parameter ranges in this application, such as "greater than or equal to (≥)", "less than or equal to (≤)", "above", and "below", all include the stated number.

Claims

1. A layered structure (10), characterized in that, The stacked structure (10) includes a chromium oxide layer (11), a titanium aluminum oxynitride layer (12), and a titanium aluminum nitride layer (13) stacked sequentially.

2. The stacked structure according to claim 1, characterized in that, Along the direction from the chromium oxide layer (11) to the titanium aluminum nitride layer (13), the oxygen content in the titanium aluminum nitride layer (12) gradually decreases and the nitrogen content gradually increases.

3. The laminated structure according to claim 1 or 2, characterized in that, The thickness ratio of the titanium aluminum nitride layer (12) to the chromium oxide layer (11) is (0.8-1.2):1; and / or, the thickness ratio of the titanium aluminum nitride layer (13) to the chromium oxide layer (11) is (0.8-1.2):

1.

4. The laminated structure according to any one of claims 1-3, characterized in that, The sum of the thicknesses of the chromium oxide layer (11), the titanium aluminum oxynitride layer (12), and the titanium aluminum nitride layer (13) is 0.4 to 1.5 μm.

5. The laminated structure according to any one of claims 1-4, characterized in that, The stacked structure (10) further includes a base layer (14), which is located on the side of the chromium oxide layer (11) away from the titanium aluminum oxynitride layer (12); The base layer (14) includes one or more of Cr and Ti layers.

6. The stacked structure according to claim 5, characterized in that, The stacked structure (10) further includes a transition layer (15), which is located between the base layer (14) and the chromium oxide layer (11); wherein the transition layer (15) includes a chromium carbide transition layer (151) and a chromium carbide transition layer (152) stacked together, and the chromium carbide transition layer (152) is close to the chromium oxide layer (11).

7. The stacked structure according to claim 6, characterized in that, Along the direction from the chromium oxide layer (11) to the titanium aluminum nitride layer (13), the carbon content in the carbon chromium oxide transition layer (152) gradually decreases, while the oxygen content gradually increases.

8. The laminated structure according to any one of claims 6-7, characterized in that, The thickness of the transition layer (15) is 0.1 to 0.5 μm.

9. The laminated structure according to any one of claims 5-8, characterized in that, The thickness of the base layer (14) is 0.5 to 2 μm.

10. The laminated structure according to any one of claims 1-9, characterized in that, The thickness of the stacked structure (10) is 1 to 4 μm.

11. The laminated structure according to any one of claims 1-10, characterized in that, The L value of the stacked structure (10) measured from the side of the titanium aluminum nitride layer (13) is 30 to 50, the a value is -5 to 20, and the b value is -10 to -30 in the Lab color space.

12. The laminated structure according to any one of claims 1-11, characterized in that, The Vickers hardness of the stacked structure (10) measured from the side of the titanium aluminum nitride layer (13) is greater than or equal to 600 HV.

13. The stacked structure according to claim 12, characterized in that, The Vickers hardness of the laminated structure (10) is 600-2000 HV.

14. The laminated structure according to any one of claims 1-13, characterized in that, Measured from the side of the titanium aluminum nitride layer (13), the laminated structure (10) did not show obvious discoloration after being rubbed 2000 to 8000 times with a displacement of 100 mm on a phenolic resin tabletop under a load of 2000g.

15. A structural component (100), characterized in that, It includes a substrate (20) and a stacked structure (10) according to any one of claims 1-14, the stacked structure (10) being disposed on one side of the substrate (20), and the chromium oxide layer (11) being close to the substrate (20).

16. The structural component according to claim 15, characterized in that, The substrate (20) includes a metal substrate.

17. The structural component according to claim 16, characterized in that, The metal substrate includes one or more of titanium alloys, zirconium alloys, and stainless steel.

18. An electronic device (1000), characterized in that, The electronic device (1000) includes a housing (1) and a circuit board (2), the housing (1) being assembled on the outside of the electronic device (1000), and the circuit board (2) being located inside the housing (1), wherein the housing (1) includes at least one structural member (100) according to any one of claims 15-17.

19. A method for manufacturing a structural component, characterized in that, Includes the following steps: A chromium oxide layer is deposited on one side of the substrate surface; A titanium oxyaluminum layer is deposited on the chromium oxide layer; A titanium aluminum nitride layer is deposited on the titanium aluminum nitride layer to obtain a structural component.

20. The preparation method according to claim 19, characterized in that, Prior to the deposition of the chromium oxide layer, the method further includes depositing an underlayer on one side surface of the substrate.

21. The preparation method according to claim 20, characterized in that, After the deposition of the underlayer and before the deposition of the chromium oxide layer, the method further includes: depositing a transition layer on the underlayer; The transition layer includes a chromium carbide layer and a chromium oxide layer stacked together, with the chromium carbide layer located between the underlayer and the chromium oxide layer.

Images