Compound, method for manufacturing compound, composition, surface treatment agent, article, and method for manufacturing article

Abstract

The present invention provides a compound, a composition, and a surface treatment agent with which a surface treatment layer having excellent water resistance can be formed, an article provided with a surface treatment layer having excellent water repellence, and a method for manufacturing the compound and the article. A compound according to the present invention is a compound represented by the following formula.　Formula (1): R-Z1-A-[(Si(R3)n1L1 2-n1-Q3)s1-Si(R3)n2L1 3-n2]q Each symbol in the formula is as described in the specification.

Description

Compound, Method for Producing Compound, Composition, Surface Treatment Agent, Article, and Method for Producing Article

[0001] The present disclosure relates to a compound, a method for producing a compound, a composition, a surface treatment agent, an article, and a method for producing an article.

[0002] In recent years, techniques for making the surface of optical articles less prone to fingerprint adhesion and techniques for facilitating easy removal of stains in order to improve appearance and visibility have become widespread in applications such as eyeglass lenses, wearable terminals, and touch panel displays. As a specific method for improving performances such as appearance and visibility, a method of performing surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Document 1 describes a composition containing a divalent linear organopolysiloxane group and a specific compound having a hydrolyzable group.

[0004] International Publication No. WO 2021 / 187184

[0005] Surface treatment agents are required to further improve water immersion resistance.

[0006] The present disclosure has been made in view of such circumstances, and an object thereof is to provide a compound, a composition, and a surface treatment agent capable of forming a surface treatment layer excellent in water immersion resistance, an article provided with a surface treatment layer excellent in water immersion resistance, and a method for producing the compound and the article.

[0007] The present disclosure includes the following aspects. [1] A compound represented by the following formula (1). R-Z １ -A-[(Si(R ３ ) ｎ１ L １ ２－ｎ１ -Q ３ ) ｓ１ -Si(R ３ ) ｎ２ L １ ３－ｎ２ ｑ ...(1) Provided that R is a group represented by the following formula (2), Z １ is an alkylene group that may have a divalent group between carbon-carbon atoms, A is a single bond or a (q+1)-valent linking group, R ３ are each independently a hydrocarbon group, L​１ These are, independently, a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, Q ３ is a single bond or a divalent linking group, s1 is an integer from 0 to 3, n1 is independently 0 or 1, n2 is independently an integer from 0 to 2, and q is an integer of 1 or more. R １ Each of these independently comprises a hydrocarbon group or -OSiR １１ ３ It is a group containing R １１ Each is independently a hydrocarbon group, m is an integer from 0 to 6, p is an integer from 1 to 3, and X-Y is CH-CH ２ Alternatively, C = CH, where * represents Z in equation (1). １ The bonding position with [2] The compound according to [1], wherein m is 0 or 1. [3] The compound according to [1] or [2], wherein p is 1. [4] The Z １ The compound is an alkylene group having 11 or more carbon atoms, as described in any one of [1] to [3]. [5] A method for producing the compound described in any one of [1] to [4], comprising reacting a compound represented by the following formula (1-1) with a compound represented by the following formula (2-1). R ２１ -Z ２ -W １ ... (1-1) However, R ２１ Therefore, -CH≡C, and Z ２ This is an alkylene group which may have a divalent group between carbon atoms, W １ is a halogen atom, -NH ２ , or -A-[(Si(R ３ ) ｎ１ L １ ２－ｎ１ - Q ３ ) ｓ１ -Si(R ３ ) ｎ２ L １ ３－ｎ２ ] ｑ A is a single bond or a (q+1) valence linking group, and R３ Each of these is independently a hydrocarbon group, L １ These are, independently, a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, Q ３ is a single bond or a divalent linking group, s1 is an integer from 0 to 3, n1 is independently 0 or 1, n2 is independently an integer from 0 to 2, q is an integer of 1 or more, R １ Each of these independently comprises a hydrocarbon group or -OSiR １１ ３ It is a group containing R １１ Each is independently a hydrocarbon group, m is an integer from 0 to 6, and p is an integer from 1 to 3. [6] A composition comprising the compound described in any one of [1] to [4] and a liquid medium. [7] A composition comprising the compound described in any one of [1] to [4] and another compound having a reactive silyl group. [8] A surface treatment agent comprising the compound described in any one of [1] to [4]. [9] A surface treatment agent comprising the compound described in any one of [1] to [4] and a liquid medium.

[10] A surface treatment agent comprising the compound described in any one of [1] to [4] and another compound having a reactive silyl group.

[11] An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with a surface treatment agent comprising the compound described in any one of [1] to [4].

[12] An article according to

[11] which is an optical member.

[13] An article according to

[11] or

[12] which is a display or touch panel.

[14] A method for manufacturing an article, comprising surface-treating a substrate with a surface treatment agent containing a compound described in any one of items [1] to [4], thereby producing an article in which a surface-treated layer is formed on the substrate.

[0008] This disclosure provides compounds, compositions, and surface treatment agents capable of forming a surface treatment layer with excellent water resistance, articles comprising a surface treatment layer with excellent water resistance, and methods for manufacturing the compounds and articles.

[0009] The embodiments for carrying out the embodiments of this disclosure will be described in detail below. However, the embodiments of this disclosure are not limited to the embodiments described below. In the embodiments described below, the components (including elemental steps, etc.) are not essential unless otherwise specified. The same applies to numerical values ​​and their ranges, and do not limit the embodiments of this disclosure.

[0010] In this disclosure, the term "process" includes not only processes that are independent of other processes, but also processes that cannot be clearly distinguished from other processes, provided that the purpose of the process is achieved. In this disclosure, numerical ranges indicated using "~" include the numbers before and after "~" as the minimum and maximum values, respectively. In numerical ranges described in stages in this disclosure, the upper or lower limit of one numerical range may be replaced with the upper or lower limit of another numerical range described in stages. Also, in numerical ranges described in this disclosure, the upper or lower limit of that numerical range may be replaced with the values ​​shown in the examples. In this disclosure, each component may contain multiple types of the corresponding substance. If multiple types of the substance corresponding to each component are present in the composition, the content or amount of each component means the total content or amount of the multiple types of substances present in the composition, unless otherwise specified. In this disclosure, "surface treatment layer" means a layer formed on the surface of the substrate by surface treatment. In this disclosure, when a compound or group is represented by a specific formula (X), the compound or group represented by formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively. In this disclosure, organo(poly)siloxane residue means organosiloxane residue or organopolysiloxane residue. In this disclosure, "Me" may mean a methyl group, and "Et" may mean an ethyl group. In this disclosure, when there are multiple identical symbols in a single chemical formula, such identical symbols may represent the same structure or may represent different structures within a defined range.

[0011] [Compound] The compound of this disclosure is a compound represented by formula (1), described later. Compound (1) has a reactive silyl group at one end and a ring structure represented by formula (2), described later, at the other end. A surface treatment layer formed using such compound (1) has excellent abrasion resistance because the reactive silyl groups are densely arranged and adhere closely to the substrate. In addition, the ring structure (group (2)) is arranged on the air interface side of the surface treatment layer. The surface treatment layer has a dense arrangement of bulky ring structures on the air interface side, which suppresses the penetration of water into the surface treatment layer and also has excellent wipeability for fingerprints and other contaminants adhering to the surface. In this disclosure, this property of being resistant to water penetration into the surface treatment layer is sometimes referred to as "water resistance". The compound of this disclosure will be described in detail below.

[0012] <Compound (1)> Compound (1) is represented by the following formula (1): R-Z １ -A-[(Si(R ３ ) ｎ１ L １ ２－ｎ１ - Q ３ ) ｓ１ -Si(R ３ ) ｎ２ L １ ３－ｎ２ ] ｑ …(1) However, R is a group represented by the following formula (2), and Z １ A is an alkylene group which may have a divalent group between carbon atoms, A is a single bond or a (q+1) valent linking group, and R ３ Each of these is independently a hydrocarbon group, L １ These are, independently, a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, Q ３ is a single bond or a divalent linking group, s1 is an integer from 0 to 3, n1 is independently 0 or 1, n2 is independently an integer from 0 to 2, and q is an integer of 1 or more. R １ Each of these independently comprises a hydrocarbon group or -OSiR １１ ３ It is a group containing R １１Each is independently a hydrocarbon group, m is an integer from 0 to 6, p is an integer from 1 to 3, and X-Y is CH-CH ２ Alternatively, C = CH, where * represents Z in equation (1). １ This is the connection point.

[0013] R is a group represented by equation (2). In equation (2), R １ Each of these independently comprises a hydrocarbon group or -OSiR １１ ３ It is a group that includes R. １ Examples of hydrocarbon groups represented by include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. Among these, aliphatic hydrocarbon groups are preferred, and alkyl groups are more preferred. The alkyl group may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group, but a linear alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 6, and even more preferably 1 to 4 carbon atoms. １ The hydrocarbon group represented is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, with the methyl group being even more preferred.

[0014] -OSiR １１ ３ In the group represented by R １１ Each of these is independently a hydrocarbon group or a trialkylsilyloxy group. １１ As a hydrocarbon group represented by R １ Examples include hydrocarbon groups similar to those represented by R. １１ The alkyl group contained in the trialkylsilyloxy group represented by may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group, but a linear alkyl group is preferred. １ The number of carbon atoms in the alkyl group contained in the trialkylsilyloxy group represented by is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. １ The alkyl group included in the trialkylsilyloxy group represented by is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, with the methyl group being even more preferred.

[0015] A plurality of R １ may be the same as or different from each other, and are preferably the same from the viewpoint of ease of production.

[0016] m is an integer of 0 to 6. Among these, from the viewpoint of further improving water immersion resistance and fingerprint wipeability, m is preferably 0 to 4, more preferably 0 to 2, still more preferably 0 to 1, and particularly preferably 0.

[0017] p is an integer of 1 to 3. Among these, from the viewpoint of further improving water immersion resistance and fingerprint wipeability, p is preferably 1 to 2, more preferably 1.

[0018] X-Y is CH-CH ２ or represents C=CH. In formula (2), * represents the bonding position with Z １ . Specific examples of R (that is, group (2)) include the following.

[0019]

[0020] Z １ is an alkylene group which may have a divalent group between carbon atoms. Z １ The number of carbon atoms of the alkylene group in is preferably 11 or more, more preferably 12 to 100, still more preferably 12 to 48, and particularly preferably 18 to 36, from the viewpoint of improving wear resistance in the surface treatment layer. The number of carbon atoms herein does not include carbon atoms contained in the divalent group described later.

[0021] Z １ Examples of the divalent group that may be contained in include -O-, -S-, -C(=O)NR ５ -, -NR ５ C(=O)-, -C(=O)-, -C(=O)O-, -OC(=O)-, -NR ５ C(=O)NR ５ -, -C(=O)S-, -SC(=O)-, -S(=O) ２ NR ５ -, -NR ５ S(=O) ２ -, -S(=O) ２ O-, -OS(=O) ２-, or a phenylene group may be mentioned. However, R ５ Each of these is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. The above divalent group has one Z １ It may contain only one, or it may contain two or more.

[0022] Z １ The group is preferably represented by the following formula (1Z): *-Z ３ - (Q ２４ -Z ４ ) ｔ２ -** ... (1Z) However, Z ３ and Z ４ Each of these is independently a linear alkylene group, Q ２４ The above Z １ It is a divalent group that may be included, t2 is 0 to 2, * is the bond position on the R side of formula (1), and ** is the bond position on the A side of formula (1).

[0023] Z ３ The linear alkylene group may be any alkylene group having 1 or more carbon atoms, preferably 6 or more carbon atoms, more preferably 7 to 100 carbon atoms, even more preferably 10 to 48 carbon atoms, and particularly preferably 11 to 36 carbon atoms. ４ The linear alkylene group may be any alkylene group having 1 or more carbon atoms, preferably 1 to 12 carbon atoms, and more preferably 1 to 6 carbon atoms. t2 is 0 to 2, preferably 0 to 1, and more preferably 0.

[0024] A is a single bond or a (q+1) valence linking group. If A is a single bond, Z １ Si is directly bonded to A, and q is 1. When A is a (q+1) valent linking group, its structure is not particularly limited. For example, a group Q with two or more valencies. １ Q １ A divalent group Z connects to Si. ２ Using this, it is expressed in the following formula (A1). *-Q １ [-Z ２ -**] ｑ ... (A1) However, Q １ is a single bond or a group with two or more valent values, Z ２ is a single bond or a divalent group, q is the same as in formula (1), and * is Z１ The bond locations are shown, and ** indicates the bond location with Si.

[0025] Q １ If the linking group is divalent (q is 1), Q １ Examples include divalent hydrocarbon groups, divalent heterocyclic groups, -O-, -S-, and -C(=O)NR ６ -, -NR ６ C(=O)-, -C(=O)-, -C(=O)O-, -OC(=O)-, -NR ６ C(=O)NR ６ -, -C(=O)S-, -SC(=O)-, -S(=O) ２ NR ６ -, -NR ６ S (=O) ２ -, -S (=O) ２ O-, -OS (=O) ２ -, -SO ２ -, -N(R ６ )-, -C(=O)-, -Si(R ６ ) ２ - and groups formed by combining two or more of these. However, R ６ Each of these is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. The above divalent hydrocarbon group may be a divalent saturated hydrocarbon group or a divalent aromatic hydrocarbon group. The divalent saturated hydrocarbon group may be linear, branched, or cyclic.

[0026] Q １ If the linking group is trivalent or higher (q is 2 or higher), Q １ For example, a trivalent nitrogen atom (*-N(-**) ２ ), trivalent carbon atoms (*-CR ７ (-**) ２ ), tetravalent carbon atoms (*-C(-**) ３ ), trivalent silicon atom (*-SiR ８ (-**) ２ ), tetravalent silicon atom (*-Si(-**) ３ Examples include 3- to 4-valent ring structure residues, 3- to 4-valent organopolysiloxane residues, and 3- to 4-valent hydrocarbon residues, and combinations thereof. However, R ７R is a hydrogen atom, a hydroxyl group, an alkyl group, or an alkoxy group. ８ * is an alkyl group, and * is Z １ The connection point on the side, ** is Z ２ This indicates the connection point on the side.

[0027] *-Q １ [-Z ２ -**] ｑ The following base is a specific example of this. However, α is an integer from 1 to 100, and * is Z. １ The bond locations are shown, and ** indicates the bond location with Si.

[0028]

[0029]

[0030] R ７ and R ８ Alkyl groups in and R ７ The alkyl group constituting the alkoxy group in is preferably a linear or branched alkyl group having 1 to 6 carbon atoms, with linear alkyl groups being more preferred. Specific examples of alkyl groups include methyl, ethyl, n-propyl, n-butyl, and tert-butyl groups. From the viewpoint of further improving liquid repellency, methyl or ethyl groups are preferred, with methyl groups being more preferred.

[0031] Q １The ring structure constituting the ring structure residue is preferably one selected from the group consisting of a 3- to 8-membered aliphatic ring, a benzene ring, a 3- to 8-membered heteroring, a fused ring formed by the fusion of two or three of these rings, a bridging ring with a 5- or 6-membered ring as the largest ring, and a polycyclic aggregate having two or more of these rings, where the linking group is a single bond, an alkylene group with 3 or fewer carbon atoms, an oxygen atom, or a sulfur atom. Preferred rings are a benzene ring, a 5- or 6-membered aliphatic ring, a 5- or 6-membered heteroring having a nitrogen atom or an oxygen atom, and a fused ring of a 5- or 6-membered carbon ring and a 4- to 6-membered heteroring. Specific examples of rings include the following, as well as the 1,3-cyclohexadiene ring, 1,4-cyclohexadiene ring, anthracene ring, cyclopropane ring, decahydronaphthalene ring, norbornene ring, norbornadiene ring, furan ring, pyrrole ring, thiophene ring, pyrazine ring, morpholine ring, aziridine ring, isoquinoline ring, oxazole ring, isoxazole ring, thiazole ring, imidazole ring, pyrazole ring, pyran ring, pyridazine ring, pyrimidine ring, and indene ring. Note that rings containing an oxo group (=O) are also shown below. Q １ The ring structure residues are structures in which an arbitrary hydrogen atom is missing from these ring structures.

[0032]

[0033] Q １ Examples of organopolysiloxane residues in include the following groups. However, R ａ This is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group. Also, * is Z. １ or Z ２ This is the connection point.

[0034]

[0035] Q １ The group may be represented by (Q1) below. *-(Q ３１ -Z ６ ) ｋ１ - Q ３２ (-**) ｋ２... (Q1) However, Q ３１ It is a divalent group, Z ６ Q is a single bond or an alkylene group. ３２ This is a trivalent nitrogen atom (*-N(-**) ２ ), trivalent carbon atoms (*-CR ７ (-**) ２ ), tetravalent carbon atoms (*-C(-**) ３ ), trivalent silicon atom (*-SiR ８ (-**) ２ ), tetravalent silicon atom (*-Si(-**) ３ ), a trivalent-to-tetravalent ring structure residue, a trivalent-to-tetravalent organopolysiloxane residue, or a trivalent-to-tetravalent hydrocarbon residue, where k1 is 0 or 1 and k2 is 2 or 3.

[0036] Q ３１ The divalent group in is Z １ It is similar to a divalent group that may be included. Q ３２ In Q, the 3- to 4-valent ring structure residues and 3- to 4-valent organopolysiloxane residues are Q １ This is similar to the trivalent or tetravalent ring structure residues or trivalent or tetravalent organopolysiloxane residues in Z. ６ The alkylene group in this product is preferably a linear alkylene group. Furthermore, the alkylene group has 1 to 6 carbon atoms, and more preferably 1 to 3 carbon atoms.

[0037] Z ２ This is an alkylene group that may have a single bond or a divalent group between carbon atoms. ２ The number of carbon atoms in the alkylene group in the surface treatment layer is preferably 6 or more, more preferably 7 to 100, even more preferably 10 to 48, and particularly preferably 11 to 36, from the viewpoint of improving wear resistance in the surface treatment layer. Note that the carbon atoms in the divalent group are not included in the carbon number. ２ The divalent group that may be included is Z １ It is similar to a divalent group that may be included.

[0038] Z ２ A single bond, represented by the following formula (2Z), is preferred. *-Z ７ - (Q２５ -Z ８ ) ｔ３ -** ... (2Z) However, Z ７ and Z ８ Each of these is independently a linear alkylene group, Q ２５ The above Z １ It is a divalent group that may be included, t3 is 0 to 2, and * is Q in formula (1). １ This is the bonding position on the side, and ** is Q in equation (1). ２ This is the joint position on the side.

[0039] Z ７ The linear alkylene group may be any alkylene group having 1 or more carbon atoms, preferably 6 or more carbon atoms, more preferably 7 to 100 carbon atoms, even more preferably 10 to 48 carbon atoms, and particularly preferably 12 to 36 carbon atoms. ８ The linear alkylene group may be any alkylene group having 1 or more carbon atoms, preferably 1 to 12 carbon atoms, and more preferably 1 to 6 carbon atoms. t3 is 0 to 2, preferably 0 to 1, and more preferably 0.

[0040] Z １ and Z ２ The total number of carbon atoms is preferably 6 or more, more preferably 11 to 100, even more preferably 12 to 48, and particularly preferably 20 to 36.

[0041] In formula (1), (Si(R ３ ) ｎ１ L １ ２－ｎ１ - Q ３ ) ｓ１ -Si(R ３ ) ｎ２ L １ ３－ｎ２ In R ３ L is a hydrocarbon group, １ Q is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. ３ is a single bond or a divalent linking group, n1 is 0 or 1, n2 is an integer from 0 to 2, and s1 is an integer from 0 to 4.

[0042] R ３The hydrocarbon group in is preferably an alkyl group, preferably a linear alkyl group or a branched alkyl group, and more preferably a linear alkyl group. The number of carbon atoms in the hydrocarbon group is preferably 1 to 6, more preferably 1 to 4, and even more preferably 1 to 2.

[0043] A hydrolyzable group is a group that becomes a hydroxyl group through hydrolysis. That is, Si-L １ A hydrolyzable silyl group represented by can be converted to a silanol group represented by Si-OH through hydrolysis. The silanol groups can further react with each other to form Si-O-Si bonds. Additionally, silanol groups can undergo dehydration condensation reactions with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0044] L １ Examples of hydrolyzable groups in this context include alkoxy groups, aryloxy groups, halogen atoms, acyl groups, acyloxy groups, amino groups, alkylene oxide-modified alkoxy groups, and -O-N=CR groups. ｒ ２ and isocyanate groups (-NCO) are examples. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes heteroaryl groups. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms. R ｒ Each of these is independently an alkyl group having 1 to 10 carbon atoms.

[0045] Groups having hydrolyzable groups include groups in which a hydrolyzable group is bonded to a linking group. Examples of linking groups include alkylene groups, -O- groups, and combinations thereof. Examples of groups having hydrolyzable groups include alkoxyalkyleneoxy groups. Preferably, an alkoxyalkyleneoxy group is a group in which an alkoxy group having 1 to 4 carbon atoms is bonded to a carbon atom of an alkyleneoxy group having 1 to 10 carbon atoms. Specific examples of alkoxyalkyleneoxy groups include 2-methoxyethoxy groups. Among them, L １From the viewpoint of ease of compound production, an alkoxy group or halogen atom having 1 to 4 carbon atoms is preferred. １ Because it exhibits less outgassing during application and superior storage stability of the compound, an alkoxy group having 1 to 4 carbon atoms is preferred, and an ethoxy group or a methoxy group is more preferred.

[0046] Q ３ The divalent linking group in is Q １ This is similar to a divalent linking group in Q. ３ Among them, -O- or -CR ａ２ ２ - is preferable. However, R ａ２ R is a hydrogen atom or a hydrocarbon group. ａ２ The hydrocarbon group can be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, with an aliphatic hydrocarbon group being preferred and an alkyl group being more preferred. The alkyl group may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred. The number of carbon atoms in the hydrocarbon group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. Specific examples of hydrocarbon groups include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group, with a methyl group or an ethyl group being preferred, and a methyl group being more preferred, from the viewpoint of further improving liquid repellency.

[0047] If s1 is 0, (Si(R ３ ) ｎ１ L １ ２－ｎ１ - Q ３ ) ｓ１ -Si(R ３ ) ｎ２ L １ ３－ｎ２ is -Si(R ３ ) ｎ２ L １ ３－ｎ２ This is the result. -Si(R ３ ) ｎ２ L １ ３－ｎ２ A specific example is -Si(OCH ３ ) ３ , -Si(OCH ２ CH ３) ３ , -Si(OH) ３ , -SiCH ３ (OCH ３ ) ２ , -SiCH ３ (OCH ２ CH ３ ) ２ , -SiCH ３ (OH) ２ , -Si(CH ３ ) ２ OCH ３ , -Si(CH ３ ) ２ OCH ２ CH ３ , -Si(CH ３ ) ２ OH, -Si(CH ２ CH ３ )(OCH ３ ) ２ , -Si(CH ２ CH ３ )(OCH ２ CH ３ ) ２ , -Si(CH ２ CH ３ )(OH) ２ , -Si(CH ２ CH ３ ) ２ OCH ３ , -Si(CH ２ CH ３ ) ２ OCH ２ CH ３ , -Si(CH ２ CH ３ ) ２ OH, are mentioned.

[0048] When p4 is 1 to 4, (Si(R ３ ) ｎ１ L １ ２－ｎ１ -Q ３ ) ｓ１ -Si(R ３ ) ｎ２ L １ ３－ｎ２ the -Si(R ３ ) ｎ１ L １ ２－ｎ１A specific example of - is -Si(OCH ３ ) ２ -, -Si(OCH ２ CH ３ ) ２ -, -Si(OH) ２ -i -SiCH ３ (OCH ３ ) -, -SiCH ３ (OCH ２ CH ３ ) -, -SiCH ３ (OH)-,-Si(CH ２ CH ３ ) (OCH ３ )-,-Si(CH ２ CH ３ ) (OCH ２ CH ３ )-,-Si(CH ２ CH ３ )(OH)- is one example.

[0049] n1 is 0 or 1, and 0 is preferred. １ The presence of multiple layers strengthens the adhesion of the surface treatment layer to the substrate.

[0050] n2 is an integer between 0 and 2, preferably 0 or 1, and more preferably 0. １ The presence of multiple layers strengthens the adhesion of the surface treatment layer to the substrate.

[0051] s1 is an integer from 0 to 4, and from the viewpoint of ease of composition, 0 or 1 is preferred.

[0052] Furthermore, q in equation (1) is an integer between 1 and 3. It is particularly preferable that q1 be 1 or 2, as this provides superior wear resistance to the surface treatment layer.

[0053] Examples of compounds represented by formula (1) include the following:

[0054]

[0055] [Method for producing compound (1)] The method for producing compound (1) is not particularly limited, but it can be suitably produced by the following method. That is, the method for producing compound (1) according to this embodiment includes reacting a compound represented by the following formula (1-1) with a compound represented by the following formula (2-1). R ２１ -Z ２ -W １ ... (1-1)

[0056] However, R ２１ Therefore, -CH≡C, and Z ２ This is an alkylene group which may have a divalent group between carbon atoms, W １ is a halogen atom, -NH ２ , or -A-[(Si(R ３ ) ｎ１ L １ ２－ｎ１ - Q ３ ) ｓ１ -Si(R ３ ) ｎ２ L １ ３－ｎ２ ] ｑ The other signs are the same as those described in formula (1).

[0057] The above reaction involves compound (2-1) (CH ２ ) ｍ and termination SiR １ ２ Between C(-Z) ２ -W １ This is a reaction that introduces CH. The reaction conditions for the above reaction can be found in the examples described later.

[0058] [Composition] The composition of the present disclosure (hereinafter also referred to as "the composition") may contain the compound of the present disclosure, but other components are not particularly limited. Examples of components that may be included in the composition include a liquid medium, a compound having a reactive silyl group and different from compound (1), and impurities such as by-products generated in the manufacturing process of the compound of the present disclosure. If the composition contains a liquid medium, the composition may be a solution or a dispersion.

[0059] The content of compound (1) is preferably 0.001 to 40% by mass, more preferably 0.01 to 20% by mass, and even more preferably 0.1 to 10% by mass, based on the total amount of the composition. In the case of the composition used in a wet coating method, the content of compound (1) is preferably 0.01 to 10% by mass, more preferably 0.02 to 5% by mass, even more preferably 0.03 to 3% by mass, and particularly preferably 0.05 to 2% by mass, based on the total amount of the composition. The liquid medium contained in the composition of this disclosure may be only one type, or it may be two or more types.

[0060] As the liquid medium, an organic solvent is preferred. Examples of organic solvents include compounds consisting only of hydrogen atoms and carbon atoms, and compounds consisting only of hydrogen atoms, carbon atoms, and oxygen atoms. Specifically, examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Among these, hydrocarbon organic solvents or ester organic solvents are preferred.

[0061] Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexane, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, and isophorone. Specific examples of ether organic solvents include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane.Specific examples of ester-based organic solvents include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, and ethylene glycol monoethyl ether acetate. Examples include ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, and 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate.Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol monotert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, and diethylene glycol monobutyl ether. Examples include propylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, diethylene glycol monoethyl ether, tripropylene glycol methyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.Specific examples of alcoholic organic solvents include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0062] Examples of organic solvents include halogenated organic solvents, nitrogen-containing compounds, sulfur-containing compounds, siloxane compounds, and fluorine-containing organic solvents.

[0063] Specific examples of halogenated organic solvents include dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane.

[0064] Examples of nitrogen-containing compounds include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone.

[0065] Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide.

[0066] Examples of siloxane compounds include hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethyltrisiloxane, hexamethylcyclotrisiloxane, hexaethylcyclotrisiloxane, octamethylcyclotetrasiloxane, octaethylcyclotetrasiloxane, and decamethyltetrasiloxane.

[0067] Examples of fluorine-containing organic solvents include polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); and polyfluoroaliphatic hydrocarbons (e.g., C ６ F １３ CH ２ CH ３ (For example, Asahi Clean® AC-6000 manufactured by AGC Inc.), 1,1,2,2,3,3,4-heptafluorocyclopentane (for example, Zeolora® H manufactured by Nippon Zeon Corporation); hydrofluoroether (HFE) (for example, perfluoropropyl methyl ether (C) ３ F ７ OCH ３ ) (For example, Novec™ 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (For example, Novec™ 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C ４ F ９ OC ２ H ５ ) (For example, Novec™ 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C ２ F ５ CF(OCH) ３ ) C ３ F ７ ) (for example, Novec™ 7300 manufactured by Sumitomo 3M Limited) and other alkyl perfluoroalkyl ethers (the perfluoroalkyl group and alkyl group may be linear or branched), and CF ３ CH ２ OCF ２ CHF ２Examples include (for example, AsahiClean® AE-3000 manufactured by AGC Inc.); and hydrofluoroolefins (HFOs) (for example, 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (for example, Amorea® AS-300 manufactured by AGC Inc.)).

[0068] The liquid medium content is preferably 60 to 99.999% by mass, more preferably 80 to 99.99% by mass, and even more preferably 90 to 99.9% by mass, based on the total amount of the composition. In the case of the composition of this disclosure used in a wet coating method, the liquid medium content is preferably 90 to 99.99% by mass, more preferably 95 to 99.98% by mass, even more preferably 97 to 99.97% by mass, and particularly preferably 98 to 99.95% by mass, based on the total amount of the composition. Other compounds having a reactive silyl group include compounds that can function as surface treatment agents and are different from compound (1). Preferred such compounds are those having an organo(poly)siloxane residue and a reactive silyl group, and examples include compounds represented by the following formulas (11) or (21). A ａ１ -L ａ１ - Q ａ１ - (T ａ１ ) ｍａ１ …(11) (T ａ１ ) ｍａ１ - Q ａ１ -L ａ２ - Q ａ１ - (T ａ１ ) ｍａ１ ... (21) However, A ａ１ L is a group that includes an alkyl group or one or more selected from Si, Ge, and Sn, and does not have a reactive silyl group. ａ１ It is a divalent group, L ａ２ Q is a divalent group. ａ１ is a single bond or a (ma1+1) valence group, T ａ１ is a group containing a reactive silyl group, and ma1 is an integer greater than or equal to 1.

[0069] A ａ１The alkyl group may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. Specific examples of alkyl groups include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group, an ethyl group, or a tert-butyl group is preferred, and a methyl group is more preferred.

[0070] A ａ１ Examples of groups that include one or more selected from Si, Ge, and Sn and do not have a reactive silyl group include the groups represented by the following formulas (A1) to (A3). ａ２１ ３ M-(Q) ａ１１ ) ｚａ１ - (R ａＳｉ ) ｚａ２ - …(A1)

[0071] However, R ａ２１ Each of these independently comprises a hydrocarbon group, or R ｂ２１ ３ M-R ｂ２２ - and R ｂ２１ Each of these independently comprises a hydrocarbon group, or R ｃ２１ ３ M-R ｃ２２ - and R ｃ２１ Each of these independently comprises a hydrocarbon group, or R ｄ２１ ３ M-R ｄ２２ - and R ｄ２１ Each of these independently comprises a hydrocarbon group, or R ｅ２１ ３ M-R ｅ２２ - and R ｅ２１ Each of these is independently a hydrocarbon group, and R ｂ２２ , R ｃ２２ , R ｄ２２ , R ｅ２２ Each is independently an oxygen atom or an alkylene group having 1 to 6 carbon atoms, R ａ２４ Each of these independently comprises a hydrocarbon group or Rｂ２１ ３ M-R ｂ２２ - and R ａ２５ Each of these independently comprises a hydrocarbon group or R ｂ２１ ３ M-R ｂ２２ -, M is independently Si, Ge, or Sn, ta11 is an integer from 1 to 5, Q ａ１１ is -O-, -C(=O)-, or an alkylene group having 1 to 6 carbon atoms, za1 is 0 or 1, za2 is 0 or 1, R ａＳｉ This is a group represented by the following formula (RSi): -(SiR ａ４１ ２ O) ｓａ４１ -SiR ａ４１ ２ - …(RSi) R ａ４１ Each of these is independently a hydrocarbon group, and sa41 is a number greater than or equal to 0.

[0072] R ａ２１ , R ｂ２１ , R ｃ２１ , R ｄ２１ , R ｅ２１ , R ａ２４ , R ａ２５ , and R ａ４１ The hydrocarbon group in this compound can be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, with an aliphatic hydrocarbon group being preferred and an alkyl group being more preferred. The alkyl group may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred. The number of carbon atoms in the hydrocarbon group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. Specific examples of hydrocarbon groups include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group, with a methyl group or an ethyl group being preferred, and a methyl group being more preferred, from the viewpoint of further improving liquid repellency.

[0073] R ｂ２２ , R ｃ２２ , R ｄ２２ , R ｅ２２ and Q ａ１１In this formula, linear alkylene groups with 1 to 6 carbon atoms are preferred. Specific examples of alkylene groups with 1 to 6 carbon atoms include methylene, ethylene, propylene, butylene, pentylene, and hexylene groups.

[0074] M is Si, Ge, or Sn, with Si being preferred. sa41 is SiR ａ４１ ２ This is the number of repeating units of O, and can be any number greater than or equal to 0, preferably 1 or more, more preferably 1 to 600, even more preferably 2 to 500, and particularly preferably 8 to 50.

[0075] From equation (A1), (Q ａ１１ ) ｚａ１ - (R ａＳｉ ) ｚａ２ Specific examples of substructures excluding the following are listed below. However, * represents Q. ａ１１ This is the connection point.

[0076]

[0077] From equation (A2), (Q ａ１１ ) ｚａ１ - (R ａＳｉ ) ｚａ２ Specific examples of substructures excluding the following are listed below. However, * represents Q. ａ１１ This is the connection point.

[0078]

[0079] From equation (A3), (Q ａ１１ ) ｚａ１ - (R ａＳｉ ) ｚａ２ Specific examples of substructures excluding the following are listed below. However, * represents Q. ａ１１ This is the connection point.

[0080]

[0081] L ａ１ and L ａ２ The divalent group in is preferably a chain-like group, and examples include one or more combinations selected from the groups represented by the following formulas (LA) to (LD): -(SiR ａ１１ ２O) ｓａ１ -SiR ａ１１ ２ -...(LA) -(SiR ａ１１ ２ -R ａ１２ ) ｓａ２ -SiR ａ１１ ２ -...(LB) -(SiR ａ１１ ２ -R ａ１２ O) ｓａ３ -SiR ａ１１ ２ -...(LC) -(CR ａ１３ ２ ) ｓａ４ - ... (LD) However, R ａ１１ Each of these is independently a monovalent hydrocarbon group or organopolysiloxane residue which may have an ether bond between carbon atoms, and R ａ１２ Each of these is independently a divalent hydrocarbon group which may have an ether bond between carbon atoms, and R ａ１３ Each of these is independently a hydrogen atom or a monovalent hydrocarbon group which may have an ether bond between carbon atoms, sa1, sa2, and sa3 are each independently a number from 1 to 200, and sa4 is an integer from 1 to 200.

[0082] R ａ１１ Among these, hydrocarbon groups are preferred, and alkyl groups are more preferred. The alkyl group may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. From the viewpoint of improving liquid repellency, linear alkyl groups or branched alkyl groups are preferred. The number of carbon atoms in the hydrocarbon group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. Specific examples of hydrocarbon groups include methyl groups, ethyl groups, n-propyl groups, n-butyl groups, and tert-butyl groups. From the viewpoint of further improving liquid repellency, methyl groups or ethyl groups are preferred, and methyl groups are more preferred. ａ１２Among these, divalent hydrocarbon groups are preferred, and alkylene groups are more preferred. The alkylene group may be a linear alkylene group, a branched alkylene group, or a cyclic alkylene group. From the viewpoint of improving liquid repellency, linear alkylene groups or branched alkylene groups are preferred. The number of carbon atoms in the hydrocarbon group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. ａ１３ R is preferably a hydrogen atom or a monovalent hydrocarbon group, and as a monovalent hydrocarbon group, ａ１１ The structure mentioned above is preferred. ａ１３ Hydrogen atoms are more preferred. Sa1, Sa2, and Sa3 are each independently preferably 1 to 150, more preferably 1 to 100, and even more preferably 1 to 20. Sa4 is preferably 11 to 150, more preferably 21 to 100, and even more preferably 29 to 36, from the viewpoint of superior wear resistance.

[0083] L ａ１ The group is preferably represented by the following formulas (L1a) to (L1b): -Ak １ -...(L1a) -Ak １ -R Ｓｉ -Ak １ - …(L1b) However, Ak １ R is a group represented by the above formula (LD), Ｓｉ This is a group represented by formula (LA) or a group represented by formula (LB).

[0084] L ａ２ The group is preferably represented by the following formulas (L2a) to (L2c). -R Ｓｉ -...(L2a) -Ak １ -R Ｓｉ -Ak １ -...(L2b) -R Ｓｉ -Ak １ -R Ｓｉ - ... (L2c) However, Ak １ R is a group represented by the above formula (LD), Ｓｉ This is a group represented by formula (LA) or a group represented by formula (LB).

[0085] Qａ１ In this, the (ma1+1) valence base is preferably the base represented by the following formula (QA). * ａ２ - Q ａ４ -R ａ３ - Q ａ５ (-R ａ４ - * ａ３ ) ｍａ１ ... (QA) However, Q ａ４ R is a single bond or a divalent group. ａ３ Q is a hydrocarbon group which may have a single bond or an ether bond between carbon atoms. ａ５ R is a single bond or a (ma1+1) valence group. ａ４ is a hydrocarbon group which may have a single bond or an ether bond between carbon atoms, ma1 is an integer of 1 or more, * ａ２ is, L ａ１ or L ａ２ This is the bonding position with, * ａ３ is, T ａ１ This is the connection point.

[0086] Q ａ４ These are single bonds, -O-, -S-, -C(=O)NR ａ５ -, -NR ａ５ C(=O)-, -C(=O)-, -C(=O)O-, -OC(=O)-, -NR ａ５ C(=O)NR ａ５ -, -C(=O)S-, -SC(=O)-, -S(=O) ２ NR ａ５ -, -NR ａ５ S (=O) ２ -, -S (=O) ２ O-, -OS (=O) ２ - or a phenylene group is preferred. However, R ａ５ is a hydrogen atom or a hydrocarbon group.

[0087] Q ａ５ is a single bond, CR ａ６ ｍａ２ , NR ａ７ ｍａ３ , SiR ａ８ ｍａ４, a (ma1+1) valent ring structure, a (ma1+1) valent organopolysiloxane residue, or a (ma1+1) valent hydrocarbon residue, R ａ６ R is a hydrogen atom, a hydroxyl group, or a hydrocarbon group which may have an ether bond between carbon atoms. ａ７ and R ａ８ m is a hydrogen atom, or a hydrocarbon group which may have an ether bond between carbon atoms, ma2 is an integer from 0 to 2, ma3 is 0 or 1, and ma4 is an integer from 0 to 2.

[0088] Q ａ１ This is A or *-Q in compound (1) mentioned above. １ [-Z ２ -**] ｑ A similar structure can be cited. However, * here represents L ａ１ or L ａ２ This is the bonding position with T, and ** is T ａ１ This is the connection point.

[0089] T ａ１ Examples of groups include those represented by the following formula (TA). * ａ１ -[Si(R ａ１ ) ２ - Q ａ３ ] ｒａ１ -Si(R ａ１ ) ３ ... (TA) However, R ａ１ Each of these is independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydroxyl group, Q ａ３ is an oxygen atom, or -CR ａ２ ２ - and R ａ２ is a hydrogen atom or hydrocarbon group, ra1 is an integer from 0 to 3, * ａ１ Q ａ１ This is the connection point.

[0090] A specific example when ra1 is 1 or greater is -Si(OCH ３ ) ２ -O-Si(OCH) ３ ) ３ , -Si(OCH ３ ) ２ -CH ２-Si (OCH) ３ ) ３ ,-Si(OCH ３ ) ２ -C(CH ３ ) ２ -Si(OCH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -O-Si(OCH ３ ) ３ ,-Si(OCH ３ ) ２ -O-Si(OCH ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -O-Si(OCH ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -CH ２ -Si (OCH) ３ ) ３ ,-Si(OCH ３ ) ２ -CH ２ -Si (OCH) ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -CH ２ -Si(OCH ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -C(CH) ３ ) ２ -Si (OCH) ３ ) ３ ,-Si(OCH ３ ) ２ -C(CH ３ ) ２ -Si(OCH ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ )２ -C(CH ３ ) ２ -Si(OCH) ２ CH ３ ) ３ -Si(OH) ２ -O-Si(OH) ３ -Si(OH) ２ -O-Si(OCH) ３ ) ３ , -Si(OCH ３ ) ２ -O-Si(OH) ３ -Si(OH) ２ -CH ２ -Si(OH) ３ -Si(OH) ２ -CH ２ -Si(OCH) ３ ) ３ , -Si(OCH ３ ) ２ -CH ２ -Si(OH) ３ -Si(OH) ２ -C(CH ３ ) ２ -Si(OH) ３ -Si(OH) ２ -C(CH ３ ) ２ -Si(OCH) ３ ) ３ , -Si(OCH ３ ) ２ -C(CH ３ ) ２ -Si(OH) ３ These are some examples.

[0091] When ra1 is 0, the above group (TA) is the group represented by the following formula (Ta). * ａ１ -Si(R ａ１ ) ３ …(Ta) However, R ａ１ Each of these is independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydroxyl group, R １ At least one of them is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, * ａ１ Q ａ１ This is the connection point.

[0092] A specific example of the above group (Ta) is the Si(R) of compound (1). ３ ) ｎ２ L １ ３－ｎ２ Similar examples include the above.

[0093] In the compositions of this disclosure, among the above compounds (11), the compound represented by the following formula (11a) is preferred. ４１ - (SiR ２ ２ -O) ｐ１ -SiR ２ ２ -Z １ - Q １ [Z ２ -Si(R ３ ) ｎ L １ ３－ｎ ] ｑ１ ... (11a) However, R ４１ R is a hydrocarbon group having 1 to 4 carbon atoms, which may have a halogen atom. ２ Each of these is independently a hydrocarbon group, p1 is a non-negative integer, and Z １ Q is an alkylene group which may have a divalent group between carbon atoms, １ Z is a single bond or a (1+q1) valence linking group. ２ Each of these is an alkylene group which may have a single bond or a divalent group between carbon atoms, R ３ Each of these is independently a hydrocarbon group, L １ Each of the following is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; each of the following is independently an integer from 0 to 2; p1 is an integer of 0 or more; and q1 is an integer from 1 to 3.

[0094] If the composition contains compound (11) and / or compound (21), the content of compound (1) is preferably 1 to 99.9% by mass, more preferably 10 to 90% by mass, and more preferably 20 to 80% by mass, of the total 100% by mass of compound (1), compound (11), and compound (21).

[0095] The composition may further contain other components, provided that they do not impair the effects of the disclosure. Examples of other components include additives, specifically catalysts such as acid catalysts and base catalysts that promote the hydrolysis and condensation reactions of reactive silyl groups.

[0096] As catalysts, for example, any suitable acid or base, transition metals (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having lone pairs of electrons in their molecular structure, nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphate amide compounds, amide compounds, urea compounds), etc., can be used. Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide; and organic amines such as triethylamine and diethylamine.

[0097] Other components include metal compounds having hydrolyzable groups (hereinafter also referred to as "specific metal compounds"). When the composition of this disclosure contains a specific metal compound, the slipperiness and antifouling properties of the surface treatment layer can be further improved. Examples of specific metal compounds include metal compounds represented by any of formulas (M1) to (M3).

[0098] M(X) ｂ１ ) ｍ１１ (X ｂ２ ) ｍ１２ (X ｂ３ ) ｍ１３ …(M1) Si(X ｂ４ ) (X ｂ５ ) ３ …(M2) (X ｂ６ ) ３ Si - (Y ｂ１ )-Si(X ｂ７ ) ３ ... (M3)

[0099] In formula (M1), M is a trivalent or tetravalent metal atom, and X ｂ１ Each of these is independently a hydrolyzable group, X ｂ２Each of these is independently a siloxane skeleton-containing group, X ｂ３ Each of these is independently a hydrocarbon chain-containing group, m11 is an integer from 2 to 4, and m12 and m13 are independently integers from 0 to 2. When M is a trivalent metal atom, m11 + m12 + m13 is 3, and when M is a tetravalent metal atom, m11 + m12 + m13 is 4.

[0100] In formula (M2), X ｂ４ X is a hydrolyzable silane oligomer residue. ｂ５ Each of these is independently a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0101] In formula (M3), X ｂ６ and X ｂ７ Each of these is independently a hydrolyzable group or a hydroxyl group, Y ｂ１ It is a divalent organic group.

[0102] In formula (M1), the metal represented by M also includes metalloids such as Si and Ge. M is preferably a trivalent metal or a tetravalent metal, more preferably Al, Fe, In, Hf, Si, Ti, Sn, or Zr, even more preferably Al, Si, Ti, or Zr, and particularly preferably Si.

[0103] In formula (M1), X ｂ１ The hydrolyzable group represented by is L in formula (1) above. １ This is synonymous with the hydrolyzable group represented by , and the preferred embodiment is the same.

[0104] X ｂ２The siloxane skeleton-containing group represented by has siloxane units (-Si-O-) and may be linear or branched. The siloxane unit is preferably a dialkylsilyloxy group, such as a dimethylsilyloxy group or a diethylsilyloxy group. The number of repeating siloxane units in the siloxane skeleton-containing group is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. The siloxane skeleton-containing group may contain a divalent hydrocarbon group in part of the siloxane skeleton. Specifically, some oxygen atoms in the siloxane skeleton may be replaced by a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include alkylene groups such as methylene, ethylene, propylene, and butylene. A hydrolyzable group, a hydrocarbon group (preferably an alkyl group), etc., may be bonded to the silicon atom at the end of the siloxane skeleton-containing group. The number of elements in the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. The lower limit of the number of elements is preferably 10. Examples of siloxane skeleton-containing groups include *-(O-Si(CH ３ ) ２ ) ｎ CH ３ A group represented by is preferred, where n is an integer from 1 to 5, and * represents a bonding site with an adjacent atom.

[0105] X ｂ３ The hydrocarbon chain-containing group represented by may be a group consisting solely of a hydrocarbon chain, or a group having an etheric oxygen atom between carbon atoms of the hydrocarbon chain. The hydrocarbon chain may be linear or branched, with linear being preferred. The hydrocarbon chain may be saturated or unsaturated, with saturated hydrocarbon being preferred. The number of carbon atoms in the hydrocarbon chain-containing group is preferably 1 to 3, more preferably 1 to 2, and even more preferably 1. The hydrocarbon chain-containing group is preferably an alkyl group, more preferably a methyl group, an ethyl group, or a propyl group.

[0106] m1 is preferably 3 or 4.

[0107] The compound represented by formula (M1) is preferably any of the compounds represented by formulas (M1-1) to (M1-5) where M is Si, and the compound represented by formula (M1-1) is more preferred. The compound represented by formula (M1-1) is preferably tetraethoxysilane, tetramethoxysilane, or triethoxymethylsilane.

[0108] Si(X ｂ１ ) ４ ... (M1-1) CH ３ -Si(X ｂ１ ) ３ ... (M1-2) C ２ H ５ -Si(X ｂ１ ) ３ ...(M1-3) n-C ３ H ７ -Si(X ｂ１ ) ３ ...(M1-4) (CH ３ ) ２ CH-Si(X ｂ１ ) ３ ... (M1-5)

[0109] In formula (M2), X ｂ４ The number of silicon atoms in the hydrolyzable silane oligomer residue represented by (C) is preferably 3 or more, more preferably 5 or more, and even more preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less. The hydrolyzable silane oligomer residue may have an alkoxy group bonded to a silicon atom. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, etc., with a methoxy group or an ethoxy group being preferred. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and it is preferable to have one. As for the hydrolyzable silane oligomer residue, (C) ２ H ５ O) ３ Si-(OSi(OC) ２ H ５ ) ２ ) ４ Examples include O-*, where * represents a bonding site with an adjacent atom.

[0110] In formula (M2), X ｂ５ The hydrolyzable group represented by is L in formula (1) above. １ Examples of hydrolyzable groups similar to those represented by , include cyano groups, hydrogen atoms, and allyl groups, with alkoxy groups or isocyanate groups being preferred. As for alkoxy groups, alkoxy groups having 1 to 4 carbon atoms are preferred. ｂ５ A hydrolyzable group is preferred.

[0111] Compounds represented by formula (M2) include (H ５ C ２ O) ３ -Si-(OSi(OC) ２ H ５ ) ２ ) ４ OC ２ H ５ These are some examples.

[0112] The compound represented by formula (M3) is a compound having reactive silyl groups at both ends of a divalent organic group, i.e., a bissilane. In formula (M3), X ｂ６ and X ｂ７ Examples of hydrolyzable groups represented by include alkoxy groups, acyloxy groups, ketoxime groups, alkenyloxy groups, amino groups, aminooxy groups, amide groups, isocyanate groups, and halogen atoms, with alkoxy groups or isocyanate groups being preferred. As for alkoxy groups, alkoxy groups having 1 to 4 carbon atoms are preferred, and methoxy groups or ethoxy groups are more preferred. In formula (M3), X ｂ６ and X ｂ７ These may be the same group or different groups. In terms of availability, X ｂ６ and X ｂ７ It is preferable that they are the same group.

[0113] In formula (M3), Y ｂ１ Y is a divalent organic group that links reactive silyl groups at both ends. ｂ１ The number of carbon atoms is preferably 1 to 8, and more preferably 1 to 3. ｂ１Examples include alkylene groups, phenylene groups, and alkylene groups having an etheric oxygen atom between carbon atoms. For example, -CH ２ CH ２ -ien-CH ２ CH ２ CH ２ -ien-CH ２ CH ２ CH ２ CH ２ -ien-CH ２ CH ２ CH ２ CH ２ CH ２ -ien-CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -ien-CH ２ C (CH ３ ) ２ CH ２ -, -C(CH ３ ) ２ CH ２ CH ２ C (CH ３ ) ２ -ien-CH ２ CH ２ OCH ２ CH ２ -ien-CH ２ CH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH(CH ３ )CH ２ OCH ２ CH (CH ３ ) -, and -C ６ H ４ - is one example.

[0114] Compounds represented by formula (M3) include (CH ３ O) ３ Si(CH) ２ ) ２ Si(OCH) ３ ) ３ , (C ２ H ５ O) ３ Si(CH) ２) ２ Si(OC ２ H ５ ) ３ (OCN) ３ Si(CH) ２ ) ２ Si (NCO) ３ , Cl ３ Si(CH) ２ ) ２ SiCl ３ , (CH ３ O) ３ Si(CH) ２ ) ６ Si(OCH) ３ ) ３ , and (C ２ H ５ O) ３ Si(CH) ２ ) ６ Si(OC ２ H ５ ) ３ These are some examples.

[0115] The content of other components that may be included in the composition of this disclosure is preferably 10% by mass or less, and more preferably 1% by mass or less, based on the total amount of the composition of this disclosure. If the composition of this disclosure contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, based on the total amount of the composition of this disclosure.

[0116] The total content of the compound of this disclosure and other components (hereinafter also referred to as "solids concentration") is preferably 0.001 to 40% by mass, more preferably 0.01 to 20% by mass, and even more preferably 0.1 to 10% by mass, based on the total amount of the composition of this disclosure. The solids concentration of the composition of this disclosure is a value calculated from the mass of the composition before heating and the mass after heating in a convection dryer at 120°C for 4 hours.

[0117] Since the composition disclosed herein contains a liquid medium, it is useful for coating applications and can be used as a coating solution.

[0118] [Surface Treatment Agent] In one embodiment, the surface treatment agent of the present disclosure comprises the compound of the present disclosure. Alternatively, the surface treatment agent of the present disclosure may comprise the compound of the present disclosure and a liquid medium. The surface treatment agent of the present disclosure may also be a composition of the present disclosure. A preferred embodiment of the liquid medium contained in the surface treatment agent of the present disclosure is the same as a preferred embodiment of the liquid medium contained in the composition of the present disclosure.

[0119] [Article] In one embodiment, the article of the Disclosure includes a substrate and a surface treatment layer disposed on the substrate and surface-treated with a surface treatment agent of the Disclosure.

[0120] The surface treatment layer may be formed on a part of the surface of the substrate or on the entire surface of the substrate. The surface treatment layer may be spread as a film on the surface of the substrate or may be scattered as dots. In the surface treatment layer, the compound of the present disclosure is included in a state in which hydrolysis of some or all of the reactive silyl groups has progressed and the dehydration condensation reaction of the silanol groups has progressed.

[0121] The thickness of the surface treatment layer is preferably 1 to 100 nm, and more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effects of the surface treatment are easily obtained. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the vibration period of the interference pattern obtained by the X-ray reflectivity method using an X-ray diffractometer for thin film analysis (product name "ATX-G", manufactured by RIGAKU Corporation).

[0122] The type of substrate is not particularly limited; for example, a substrate for which water repellency is required. Examples of substrates include those that may be used in contact with other articles (e.g., styluses) or human fingers; those that may be held by human fingers during operation; and those that may be placed on other articles (e.g., stands). Examples of substrate materials include metals, resins, glass, sapphires, ceramics, semiconductors, stones, fibers, nonwoven fabrics, paper, wood, furs, natural leather, artificial leather, ceramics, and composite materials thereof. Glass may be chemically strengthened.

[0123] Examples of substrates include building materials, decorative building materials, interior furnishings, transportation equipment (e.g., automobiles), signs, bulletin boards, beverage containers, tableware, aquariums, ornamental equipment (e.g., picture frames, boxes), laboratory equipment, furniture, textile products, packaging containers; glass or resin used in art, sports, games, etc.; and glass or resin used in the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, and remote controls. The substrate may be in the form of a plate or a film.

[0124] Suitable substrates include touch panel substrates, display substrates, and eyeglass lenses, with touch panel substrates being particularly preferred. Glass or transparent resin are preferred materials for the touch panel substrate.

[0125] The substrate may have one or both surfaces treated with a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate exhibits better adhesion to the surface-treated layer and improved abrasion resistance of the surface-treated layer. Therefore, it is preferable to apply the surface treatment to the surface of the substrate that comes into contact with the surface-treated layer. Furthermore, if a base layer is provided, as described later, a surface-treated substrate exhibits better adhesion to the base layer and improved abrasion resistance of the surface-treated layer. Therefore, if a base layer is provided, it is preferable to apply the surface treatment to the surface of the substrate that comes into contact with the base layer.

[0126] The surface treatment layer may be provided directly on the surface of the substrate, or a base layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a base layer disposed on the substrate, and a surface treatment layer disposed on the base layer and surface-treated with the surface treatment agent of the present disclosure.

[0127] The base layer is preferably a layer containing an oxide comprising silicon and at least one specific element selected from the group consisting of Group 1, Group 2, Group 4, Group 5, Group 13, and Group 15 elements of the periodic table.

[0128] The Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. From the viewpoint of being able to form a surface treatment layer on the substrate more uniformly without defects, or from the viewpoint of further suppressing variations in the composition of the substrate between samples, lithium, sodium, and potassium are preferred as Group 1 elements, and sodium and potassium are more preferred. The substrate may contain two or more Group 1 elements.

[0129] The Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. From the viewpoint of enabling the formation of a surface treatment layer on the substrate more uniformly and without defects, or of further suppressing variations in the composition of the substrate between samples, magnesium, calcium, and barium are preferred as Group 2 elements, with magnesium and calcium being more preferred. The substrate may contain two or more Group 2 elements.

[0130] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. From the viewpoint of forming a surface treatment layer on the substrate more uniformly and without defects, or from the viewpoint of further suppressing variations in the composition of the substrate between samples, titanium and zirconium are preferred as Group 4 elements, with titanium being more preferred. The substrate may contain two or more Group 4 elements.

[0131] The elements of Group 5 of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. Vanadium is particularly preferred as the Group 5 element from the viewpoint of providing superior wear resistance to the surface treatment layer. The base layer may contain two or more Group 5 elements.

[0132] The elements of Group 13 of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of being able to form a surface treatment layer on the substrate layer more uniformly without defects, or from the viewpoint of further suppressing variations in the composition of the substrate layer between samples. The substrate layer may contain two or more Group 13 elements.

[0133] The elements of Group 15 of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. From the viewpoint of forming a surface treatment layer on the substrate more uniformly and without defects, or from the viewpoint of further suppressing variations in the composition of the substrate between samples, phosphorus, antimony, and bismuth are preferred as Group 15 elements, and phosphorus and bismuth are more preferred. The substrate may contain two or more Group 15 elements.

[0134] The specific elements included in the base layer are preferably Group 1, Group 2, and Group 13 elements because they provide superior wear resistance to the surface treatment layer, more preferably Group 1 and Group 2 elements, and even more preferably Group 1 elements. The specific elements may consist of only one element or two or more elements.

[0135] The oxides contained in the sublayer may be a mixture of oxides of the above elements (silicon and specific elements) individually (for example, a mixture of silicon oxide and an oxide of a specific element), a composite oxide containing two or more of the above elements, or a mixture of oxides of the above elements individually and a composite oxide.

[0136] The ratio of the total molar concentration of specific elements in the substrate to the molar concentration of silicon in the substrate (specific element / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80, from the viewpoint of achieving superior wear resistance of the surface treatment layer. The molar concentration (mol%) of each element in the substrate can be measured, for example, by depth profiling analysis using X-ray photoelectron spectroscopy (XPS) with ion sputtering.

[0137] The substrate layer may be a single layer or multiple layers. The substrate layer may have irregularities on its surface. The thickness of the substrate layer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. If the thickness of the substrate layer is above the lower limit, the adhesion of the substrate layer to the surface treatment layer is further improved, and the abrasion resistance of the surface treatment layer is further improved. If the thickness of the substrate layer is below the upper limit, the abrasion resistance of the substrate layer itself is excellent. The thickness of the substrate layer is measured by cross-sectional observation of the substrate layer using a transmission electron microscope (TEM).

[0138] The underlayer can be formed, for example, by a vapor deposition method using a vapor deposition material, or by a wet coating method.

[0139] The vapor deposition material used in the vapor deposition method preferably contains silicon and oxides containing specific elements. Specific examples of the vapor deposition material's form include powder, molten material, sintered material, granulated material, and crushed material. From the viewpoint of ease of handling, molten material, sintered material, and granulated material are preferred. Here, molten material refers to a solid obtained by melting the vapor deposition material powder at a high temperature and then cooling and solidifying it. Sintered material refers to a solid obtained by firing the vapor deposition material powder. If necessary, a molded body may be used instead of the vapor deposition material powder by press-forming the powder. Granulated material refers to a solid obtained by kneading the vapor deposition material powder with a liquid medium (e.g., water, organic solvent) to obtain particles, and then drying the particles.

[0140] Vapor deposition materials can be manufactured by, for example, the following methods: - A method of obtaining a vapor deposition material powder by mixing silicon oxide powder and an oxide powder of a specific element. - A method of obtaining particles by kneading the vapor deposition material powder and water, and then drying the particles to obtain a vapor deposition material granule. - A method of obtaining a sintered body by drying a mixture of silicon-containing powder (e.g., silicon oxide powder, silica sand, silica gel), a powder containing a specific element (e.g., oxide powder of a specific element, carbonate, sulfate, nitrate, oxalate, hydroxide) and water, and then firing the dried mixture or a molded body formed by press molding therefrom. - A method of obtaining a molten body by melting silicon-containing powder (e.g., silicon oxide powder, silica sand, silica gel) and a powder containing a specific element (e.g., oxide powder of a specific element, carbonate, sulfate, nitrate, oxalate, hydroxide) at a high temperature, and then cooling and solidifying the molten material.

[0141] A specific example of a deposition method using deposition materials is the vacuum deposition method. The vacuum deposition method is a method in which the deposition material is evaporated in a vacuum chamber and deposited onto the surface of a substrate. The deposition temperature (for example, the temperature of the boat in which the deposition material is placed when using a vacuum deposition apparatus) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The deposition pressure (for example, the pressure in the chamber in which the deposition material is placed when using a vacuum deposition apparatus) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming a base layer using a deposition material, one deposition material may be used, or two or more deposition materials containing different elements may be used.

[0142] Specific examples of evaporation methods for deposition materials include the resistance heating method, in which the deposition material is melted and evaporated on a high-melting-point metal resistance heating boat, and the electron gun method, in which an electron beam is irradiated onto the deposition material to directly heat it, melt the surface, and evaporate it. The electron gun method is preferred as an evaporation method for deposition materials because it allows for localized heating, enabling the evaporation of high-melting-point substances, and because areas not exposed to the electron beam remain at low temperatures, eliminating the risk of reaction with the container or contamination by impurities. Multiple boats may be used for evaporation, or all deposition materials may be placed in a single boat. The deposition method may be co-deposition or alternating deposition. Specifically, examples include mixing silica and a specific element source in the same boat, co-deposition using silica and a specific element source in separate boats, and alternating deposition using separate boats. The deposition conditions and order are appropriately selected depending on the composition of the underlying layer.

[0143] In the wet coating method, it is preferable to form a base layer on the substrate by a wet coating method using a coating solution containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0144] Specific examples of silicon compounds include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0145] Specific examples of compounds containing a specific element include oxides of that element, alkoxides of that element, carbonates of that element, sulfates of that element, nitrates of that element, oxalates of that element, and hydroxides of that element.

[0146] Examples of liquid media include those similar to the liquid media contained in the composition of this disclosure.

[0147] The liquid medium content is preferably 0.01 to 20% by mass, and more preferably 0.1 to 10% by mass, relative to the total amount of coating liquid used to form the base layer.

[0148] Specific examples of wet coating methods for forming a base layer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Bludget coating, and gravure coating.

[0149] It is preferable to wet coat the coating liquid and then dry the coating film. The drying temperature of the coating film is preferably 20 to 200°C, and more preferably 80 to 160°C.

[0150] The articles of this disclosure may be optical materials having a surface treatment layer as the outermost layer. Preferred optical materials include a wide variety of optical materials, in addition to optical materials related to displays. Examples of optical materials include displays such as cathode ray tubes (CRTs; e.g., personal computer monitors), liquid crystal displays, plasma displays, organic EL displays, inorganic thin-film EL dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), or protective plates for such displays, or materials with an anti-reflective coating applied to their surfaces.

[0151] The articles of this disclosure are preferably optical components. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as endoscopes, photocopiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflective films. Other examples of optical components include front protective plates, anti-reflective plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; disc surfaces for optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MOs; optical fibers; and display surfaces for watches. In particular, the articles of this disclosure are preferably displays or touch panels.

[0152] The articles disclosed herein may be medical devices or medical materials. The articles disclosed herein may also be automotive interior and exterior components. Examples of exterior components include windows, light covers, and aftermarket camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0153] When the article of this disclosure is an optical component, the material constituting the surface of the substrate is an optical component material, such as glass or transparent plastic. Furthermore, when the article of this disclosure is an optical component, a functional layer such as a hard coat layer or an anti-reflective layer may be formed on the surface (outermost layer) of the substrate. The anti-reflective layer may be either a single-layer anti-reflective layer or a multi-layer anti-reflective layer. Examples of inorganic materials that can be used for the anti-reflective layer include SiO ２ SiO, ZrO ２ , TiO ２ ,TiO,Ti ２ O ３ Ti ２ O ５ Al ２ O ３ Ta ２ O ５ Ta ３ O ５, Nb ２ O ５ , HfO ２ , Si ３ N ４ , CeO ２ , MgO, Y ２ O ３ , SnO ２ , MgF ２ , and WO ３ . These inorganic substances may be used alone or in a combination of two or more thereof (for example, as a mixture). In the case of a multilayer antireflection layer, SiO is preferably used in the outermost layer ２ and / or SiO. When the article of the present disclosure is an optical glass component for a touch panel, it may have a thin film using a transparent electrode, such as indium tin oxide (ITO) or indium zinc oxide, on a part of the surface of a substrate (glass). Further, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coating film layer, a polarizing film, a retardation film, a liquid crystal display module, and the like according to its specific specifications.

[0154] [Method for Producing Article] The method for producing an article of the present disclosure is, for example, a method of subjecting a substrate to surface treatment using the surface treatment agent of the present disclosure to produce an article having a surface treatment layer formed on the substrate. Examples of the surface treatment include dry coating methods and wet coating methods.

[0155] Examples of the dry coating method include techniques such as vacuum deposition, CVD, and sputtering. Among dry coating methods, the vacuum deposition method is preferred from the viewpoints of suppressing decomposition of the compound and the simplicity of the apparatus. During vacuum deposition, a pellet-shaped substance obtained by impregnating a porous metal such as iron or steel with the compound of the present disclosure may be used. A pellet-shaped substance may be used, which is obtained by impregnating a porous metal such as iron or steel with a composition containing the compound of the present disclosure and a liquid medium, and drying the liquid medium to impregnate the compound of the present disclosure. When a pellet-shaped substance is used, since a compound that is solid at 25°C has lower molecular mobility, deterioration of storage stability due to hydrolysis and condensation reactions is suppressed.

[0156] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, cast coating, Langmuir-Bludget coating, and gravure coating.

[0157] To improve the abrasion resistance of the surface treatment layer, operations to promote the reaction between the compound of this disclosure and the substrate may be performed as needed. Such operations include heating, humidification, and light irradiation. For example, heating a substrate on which a surface treatment layer has been formed in a humid atmosphere can promote reactions such as the hydrolysis of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds by the condensation reaction of silanol groups. After surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Methods of removal include, for example, pouring a solvent over the surface treatment layer or wiping it with a cloth soaked in a solvent.

[0158] The present invention will be described in more detail below using examples, but the present invention is not limited to these examples. Examples 1 to 6 are examples, and Examples 7 to 9 are comparative examples.

[0159] [Synthesis of Compound I-1] 11-bromo-1-undecene (5.0 g) with Au / TiO ２ A catalyst (gold content: 1% by mass, 0.5 g), 1,1,1,3,5,7,7,7-octamethyltetrasiloxane (6.0 g), and dichloromethane (20 g) were added, and the mixture was stirred at 25°C for 12 hours. After removing the low-boiling point components under reduced pressure, 2.3 g of compound I-1 was obtained by flash column chromatography using silica gel (developing solvent: hexane / dichloromethane).

[0160]

[0161] 1 ​H NMR (400 MHz, CDCl3) δ 5.32 (hept, J = 0.9 Hz, 1H), 3.42 (t, J = 4.7 Hz, 2H), 2.96 - 1.05 (m, 16H), 0.23 - -0.44 (m, 24H)

[0162] [Synthesis of Compound I-2] THF (20 g) and magnesium (1.1 g) were added to 18-bromo-1-octadecene (3.0 g), and the mixture was stirred at 60°C for 2 hours. After removing magnesium residues by filtering the reaction solution, the reaction solution was cooled to 0°C, and Compound I-1 (1.5 g) and CuCl ２ (0.01 g) was added, and the mixture was stirred at 0°C for 24 hours. Extraction was performed after adding hydrochloric acid and heptane, low-boiling components were distilled off under reduced pressure, and then flash column chromatography using silica gel (developing solvent: decane) was performed, to obtain 0.6 g of Compound I-2.

[0163]

[0164] 1 H NMR (400 MHz, CDCl3) δ 5.91 - 4.60 (m, 3H), 2.13 - 1.06 (m, 50H), 0.22 - -0.50 (m, 24H).

[0165] [Synthesis of Compound I-3] Heptane (10 g) was added to Compound I-2 (0.6 g) to dissolve the same. Next, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.6 g) were added, and the mixture was stirred at 50°C for 2 hours. After the solvent was distilled off under reduced pressure, flash column chromatography using silica gel (developing solvent: decane / dichloromethane) was performed, to obtain 0.4 g of Compound I-3.

[0166]

[0167] 1H NMR (400 MHz, CDCl3) δ 5.32 (q, J = 1.1 Hz, 1H), 3.58 (s, 9H), 2.45- 1.13 (m, 52H), 0.65 (t, J = 9.2 Hz, 2H), 0.24 - -0.46 (m, 24H).

[0168] [Synthesis of Compound II-1] 11-bromo-1-undecene (5.0 g) with Au / TiO ２ A catalyst (gold content: 1% by mass, 0.5 g), 1,1,3,3-tetramethyldisiloxane (2.9 g), and dichloromethane (20 g) were added, and the mixture was stirred at 25°C for 12 hours. After removing the low-boiling point components under reduced pressure, 3.5 g of compound II-1 was obtained by flash column chromatography using silica gel (developing solvent: hexane / dichloromethane).

[0169]

[0170] 1 H NMR (400 MHz, CDCl3) δ 5.75 (dp, J = 2.0, 1.0 Hz, 1H), 3.42 (t, J = 4.7 Hz, 2H), 2.65 (td, J = 8.3, 1.0 Hz, 2H), 1.87 - 1.12 (m, 14H), 0.26 - -0.15 (m, 12H).

[0171] [Synthesis of Compound II-2] 3.0 g of 18-bromo-1-octadecene was mixed with 20 g of THF and 1.1 g of magnesium, and stirred at 60°C for 2 hours. After filtering the reaction mixture to remove the magnesium residue, the reaction mixture was cooled to 0°C, and Compound II-1 (1.5 g) and CuCl were added. ２ (0.01 g) was added and stirred at 0°C for 24 hours. Hydrochloric acid and heptane were added for extraction, and low-boiling components were removed by reduced pressure distillation. Then, 0.9 g of compound II-2 was obtained by flash column chromatography using silica gel (eluent: decane).

[0172]

[0173] 1 ​​H NMR (400 MHz, CDCl3) δ 5.94 - 4.83 (m, 4H), 2.45- 1.07 (m, 50H), 0.24 - -0.04 (m, 12H).

[0174] [Synthesis of Compound II-3] Compound 1-2 (0.9 g) was dissolved in heptane (10 g). Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.9 g) were added, and the mixture was stirred at 50°C for 2 hours. After removing the solvent under reduced pressure, 0.5 g of Compound II-3 was obtained by flash column chromatography using silica gel (developing solvent: decane / dichloromethane).

[0175]

[0176] 1 H NMR (400 MHz, CDCl3) δ 5.75 (dt, J = 2.1, 1.1 Hz, 1H), 3.58 (s, 9H), 2.34- 1.10 (m, 52H), 0.65 (t, J = 9.2 Hz, 2H), 0.24 - -0.11 (m, 12H).

[0177] [Synthesis of Compound III-1] Structural design C Compound I-2 (0.6 g) was dissolved in heptane (10 g). Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and dimethoxysilyltrimethyl silicate (1.0 g) were added, and the mixture was stirred at 50°C for 2 hours. After removing the solvent under reduced pressure, 0.5 g of Compound III-1 was obtained by flash column chromatography using silica gel (developing solvent: decane / dichloromethane).

[0178]

[0179] 1 ​​H NMR (400 MHz, CDCl3) δ 5.32 (q, J = 1.1 Hz, 1H), 3.73-3.31 (m, 15H), 2.45- 1.13 (m, 52H), 0.65 (t, J = 9.2 Hz, 2H), 0.24 - -0.46 (m, 24H).

[0180] [Synthesis of Compound IV-1] 18-bromo-1-octadecene (5.0 g) with Au / TiO ２ A catalyst (gold content: 1% by mass, 0.5 g), 1,1,1,3,5,7,7,7-octamethyltetrasiloxane (4.4 g), and dichloromethane (20 g) were added, and the mixture was stirred at 25°C for 12 hours. After removing the low-boiling point components under reduced pressure, 2.1 g of compound IV-1 was obtained by flash column chromatography using silica gel (developing solvent: hexane / dichloromethane).

[0181]

[0182] 1 H NMR (400 MHz, CDCl3) δ 5.41-5.21 (m, 1H), 3.42 (t, J = 4.7 Hz, 2H), 2.52 - 1.05 (m, 30H), 0.23 - -0.44 (m, 24H)

[0183] [Synthesis of Compound IV-2] Compound IV-1 (2.1 g) was mixed with sodium azide (2.0 g) and DMF (10 g) and stirred at 50°C for 2 hours. Water (50 g) and heptane (50 g) were added, and after extraction, the solvent was removed by distillation under reduced pressure. THF (20 g) and lithium aluminum hydride (10 ml, 1.0 M in THF) were added to the obtained crude solution (1.8 g) and stirred at 0°C for 1 hour. Sodium sulfate decahydrate (1.5 g) was added, and insoluble matter was removed by filtration. Then, 0.9 g of Compound IV-2 was obtained by flash column chromatography using silica gel (developing solvent: dichloromethane / methanol).

[0184]

[0185] 1 ​​H NMR (400 MHz, CDCl3) δ 5.41-5.21 (m, 1H), 2.55 - 1.05 (m, 32H), 0.23 - -0.44 (m, 24H)

[0186] [Synthesis of Compound IV-3] Compound IV-2 (0.9 g) was mixed with dichloromethane (10 g), 2-(2-propen-1-yl)-4-pentenoyl chloride (1.1 g), and triethylamine (2.0 g), and stirred at 30°C for 12 hours. Hydrochloric acid (10 g) and heptane (10 g) were added, and after extraction, the solvent was removed by distillation under reduced pressure. 0.8 g of compound IV-3 was obtained by flash column chromatography using silica gel (developing solvent: heptane / ethyl acetate).

[0187]

[0188] 1 H NMR (400 MHz, CDCl3) δ 5.81 - 4.79 (m, 7H), 3.24 - 1.91 (m, 9H), 1.58 - 1.06 (m, 28H), 0.23 - -0.47 (m, 24H).

[0189] [Synthesis of Compound IV-4] Compound IV-3 (0.8 g) was dissolved in heptane (10 g). Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.8 g) were added, and the mixture was stirred at 50°C for 2 hours. By removing the solvent under reduced pressure, 1.0 g of compound IV-4 was obtained.

[0190]

[0191] 1 H NMR (400 MHz, CDCl3) δ 5.41-5.21 (m, 1H), 3.58 (s, 18H), 3.20 - 2.04 (m, 5H), 1.67 - 1.05 (m, 36H), 0.83 - 0.55 (m, 4H), 0.22 - -0.42 (m, 24H).

[0192] ​​[Synthesis of Compound V-1] Compound 4-2 (0.9 g), dichloromethane (10 g), and Pd / C (0.1 g STD type (Pd 5%) (hydrated) (manufactured by N.E. Chemcat)) were added to a sealed metal reactor. Hydrogen was added until the internal pressure reached 0.3 MPa, and the mixture was stirred at 30°C for 12 hours under sealed conditions. After filtration, the solvent was removed by distillation under reduced pressure, and 0.4 g of compound V-1 was obtained by flash column chromatography using silica gel (developing solvent: dichloromethane / methanol).

[0193]

[0194] 1 H NMR (400 MHz, CDCl3) δ 2.88-2.50 (m, 2H), 1.96 - 0.75 (m, 33H), 0.24 - -0.23 (m, 24H).

[0195] [Synthesis of Compound V-2] Compound V-1 (0.4 g) was mixed with dichloromethane (10 g), 2-(2-propen-1-yl)-4-pentenoyl chloride (1.0 g), and triethylamine (2.0 g) and stirred at 30°C for 12 hours. Hydrochloric acid (10 g) and heptane (10 g) were added, and after extraction, the solvent was removed by distillation under reduced pressure. 0.3 g of compound V-2 was obtained by flash column chromatography using silica gel (developing solvent: heptane / ethyl acetate).

[0196]

[0197] 1 H NMR (400 MHz, CDCl3) δ 5.87 - 4.81 (m, 6H), 3.20 - 1.82 (m, 7H), 1.71 - 0.75 (m, 33H), 0.23 - -0.29 (m, 24H).

[0198] ​​[Synthesis of Compound V-3] Compound V-2 (0.3 g) was dissolved in heptane (10 g). Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.8 g) were added, and the mixture was stirred at 50°C for 2 hours. By removing the solvent under reduced pressure, 0.4 g of compound V-3 was obtained.

[0199]

[0200] 1 H NMR (400 MHz, CDCl3) δ 3.58 (s, 18H), 3.09 (td, J = 5.8, 5.1 Hz, 2H), 2.35 - 0.47 (m, 46H), 0.26 - -0.29 (m, 24H).

[0201] [Synthesis of Compound VI-1] 2,2,6,6-tetramethyl-1,2,6-oxadisilane-4-carboxylic acid (1 g) was mixed with THF (20 g) and lithium aluminum hydride (10 ml, 1.0 M in THF), and the mixture was stirred at 0°C for 1 hour. Sodium sulfate decahydrate (1.5 g) was added, and after removing insoluble matter by filtration, the solvent was removed by vacuum distillation. Then, the resulting crude solution (0.7 g) was mixed with toluene (10 g) and PBr. ３ (1.5 g) was added and the mixture was heated and stirred at 40°C for 24 hours. After extraction with water and heptane, the solvent was removed by vacuum distillation, and 0.5 g of compound VI-1 was obtained by flash column chromatography using silica gel (developing solvent: heptane / dichloromethane).

[0202]

[0203] 1 H NMR (400 MHz, CDCl3) δ 3.22-2.99 (m, 2H), 1.84 - 0.47 (m, 5H), 0.15 - -0.11 (m, 12H).

[0204] ​​[Synthesis of Compound VI-2] 18-Bromo-1-Octadecene (1.5 g) was mixed with THF (20 g) and magnesium (1.1 g) and stirred at 60°C for 2 hours. After filtering the reaction mixture to remove the magnesium residue, the reaction mixture was cooled to 0°C and compound VI-1 (0.5 g) and CuCl were added. ２ (0.01 g) was added and the mixture was stirred at 0°C for 24 hours. Hydrochloric acid and heptane were added for extraction, and low-boiling components were removed by distillation under reduced pressure. Then, 0.3 g of compound VI-2 was obtained by flash column chromatography using silica gel (eluent: decane).

[0205]

[0206] 1 H NMR (400 MHz, CDCl3) δ 5.90-5.55 (m, 1H), 5.25 - 4.80 (m, 2H), 2.13- 0.61 (m, 39H), 0.15 - -0.11 (m, 12H).

[0207] [Synthesis of Compound VI-3] Compound VI-2 (0.3 g) was dissolved in heptane (10 g). Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.3 g) were added, and the mixture was stirred at 50°C for 2 hours. By removing the solvent under reduced pressure, 0.4 g of compound VI-3 was obtained.

[0208]

[0209] 1 H NMR (400 MHz, CDCl3) δ 3.58 (s, 9H), 1.54 - 0.43 (m, 43H), 0.15 - -0.11 (m, 12H).

[0210] [Synthesis of Compound VII-1] Compound VII-1 was obtained according to the method described in International Publication No. 2024 / 034669.

[0211]

[0212] ​​[Synthesis of Compound VIII-1] Compound VIII-1 was obtained according to the method described in Synthesis Example 2 of Japanese Patent Application Publication No. 2017-201010. The average value of the number of repeating units n was 9.

[0213]

[0214] [Synthesis of Compound IX-1] Compound IX-1 was obtained according to the method described in Synthesis Example 2C of International Application No. PCT / JP2023 / 008163.

[0215]

[0216] [Manufacturing of Articles] The substrate was surface-treated using the above compound to obtain each article. For each example, the following dry coating method was used as the surface treatment method. Chemically strengthened glass was used as the substrate. The obtained articles were evaluated by the following method. The results are shown in Table 1. 30 g of silicon oxide was placed as a deposition source in the copper hearth inside the vacuum deposition apparatus (ULVAC KIKO "VTR-350M"). The glass substrate was placed inside the vacuum deposition apparatus, and the inside of the vacuum deposition apparatus was evaporated in 5 × 10⁻¹⁰⁻¹ －３ The system was evacuated until the pressure was below Pa. The hearth was heated to approximately 2,000°C, and silicon oxide was vacuum-deposited onto the surface of the substrate to produce a substrate with a silicon oxide layer approximately 20 nm thick. This was done using a vacuum deposition apparatus (ULVAC, product name: VTR350M) (vacuum deposition method). 0.5 g of each compound was packed into a molybdenum boat inside the vacuum deposition apparatus, and the inside of the vacuum deposition apparatus was evacuated to 1 × 10⁻⁶ －３ The pressure was reduced to below Pa. The boat containing the compound was heated at a rate of 10°C / min or less, and when the deposition rate measured by a quartz crystal film thickness gauge exceeded 1 nm / second, the shutter was opened to begin film formation on the substrate surface. When the film thickness reached approximately 50 nm, the shutter was closed to end film formation on the substrate surface with the silicon oxide layer. The substrate on which the compound or composition was deposited was heat-treated at 140°C for 30 minutes and washed with ethanol to obtain an article having a surface treatment layer on the substrate surface.

[0217] [Evaluation] <Water Repellency> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the object, and the initial water contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average value measured at five locations on the surface treatment layer was defined as the water contact angle. The water repellency of the surface treatment layer was evaluated based on the following criteria. The 2θ method was used to calculate the water contact angle. (Evaluation Criteria) A (Excellent): Initial water contact angle is 105 degrees or higher B (Poor): Initial water contact angle is less than 105 degrees

[0218] <Abrasion Resistance Test> Using a reciprocating traverse testing machine (KNT Co., Ltd., custom-made), a flannel cloth conforming to JIS L0803:2011 was used to test the surface of surface-treated glass at a rate of 2N / 4cm². ２ After applying a load and undergoing 200 reciprocating wear cycles at a speed of 100 cycles per minute, the water contact angle was evaluated using the method described above. (Evaluation Criteria) A (Excellent): Decrease in water contact angle after wear is 5 degrees or less B (Good): Decrease in water contact angle after wear is greater than 5 degrees and less than or equal to 10 degrees C (Acceptable): Decrease in water contact angle after wear is greater than 10 degrees and less than or equal to 15 degrees D (Unacceptable): Decrease in water contact angle after wear is greater than 15 degrees

[0219] <Water Resistance> The item was cut into 1cm x 1cm squares and immersed in saturated saline solution at 20°C for 300 hours. After removal, it was washed with ethanol, dried, and the water contact angle was measured. The smaller the decrease in water repellency (water contact angle) after immersion, the smaller the decrease in performance due to water, and the better the water resistance. (Evaluation Criteria) A (Excellent): Decrease in water contact angle after immersion is 3° or less B (Acceptable): Decrease in water contact angle after immersion is more than 3° but 10° or less C (Unacceptable): Decrease in water contact angle after immersion is more than 10°

[0220] <Fingerprint Wiping Performance> A 1 kg weight equipped with a 2 cm diameter red rubber stopper to serve as the fingerprint stamp portion was prepared. Next, 70 μL of artificial fingerprint solution (manufactured by Isekyu Co., Ltd.) was dropped onto a cloth, and the fingerprint stamp was left in the solution for 1 minute. To remove excess artificial fingerprint solution from the fingerprint stamp, it was left in a new cloth for 20 seconds. After that, an article with a surface treatment layer was placed on a hot plate heated to 23°C. The fingerprint stamp was pressed onto the surface treatment layer. The article with the artificial fingerprint solution attached was placed in a sliding device (product name "HHS-2000", manufactured by Shinto Kagaku Co., Ltd.). A wiping cloth (Savina Minimax, manufactured by KB Seiren Co., Ltd.) was attached to a flat indenter with an area of ​​1 cm square using double-sided tape, and placed in the sliding device. With a load of 100 g, the artificial fingerprint solution attached to the surface treatment layer was wiped off with the wiping cloth in one direction. The haze was measured on the wiped area using a haze meter (product name "NDH7000SP", manufactured by Nippon Denshoku Co., Ltd.). (Evaluation criteria) A (Excellent): Haze value less than 0.1% B (Good): Haze value between 0.1% and less than 1% C (Poor): Haze value of 1% or more

[0221] The results for each are shown in Table 1.

[0222]

[0223] As shown in the results above, the articles of Examples 1 to 6 using Compound I-3, Compound II-3, Compound III-1, Compound IV-4, Compound V-3, and Compound VI-3 were confirmed to have excellent abrasion resistance and water penetration resistance of the surface treatment layer.

[0224] The articles of the present invention have excellent water resistance. These articles can be used, for example, as display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, and in nanoimprint technology. They can also be used as bodies, windows (windshields, side windows, rear windows), mirrors, bumpers, etc., in transportation equipment such as trains, automobiles, ships, and aircraft. Furthermore, they can be used as exterior walls of buildings, tents, solar power generation modules, soundproofing panels, concrete, and other outdoor items; fishing nets, insect nets, and water tanks. They can also be used as kitchen, bathroom, washbasin, mirror, and toilet-related parts; chandeliers, ceramics such as tiles; artificial marble, air conditioners, and various other indoor equipment. They can also be used as jigs, interior walls, and piping in factories. Additionally, they can be used as goggles, eyeglasses, helmets, slingshots, textiles, umbrellas, playground equipment, and soccer balls. Furthermore, they can be used as various packaging materials such as food packaging, cosmetic packaging, and the interior of pots. Furthermore, it can be used as an optical component in car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as endoscopes, photocopiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflective films.

[0225] This application claims priority based on Japanese Patent Application No. 2025-041411, filed on 14 March 2025, and incorporates all of its disclosures herein.

Claims

1. A compound represented by the following formula (1): R-Z １ -A-[(Si(R ３ ) ｎ１ L １ ２－ｎ１ -Q ３ ) ｓ１ -Si(R ３ ) ｎ２ L １ ３－ｎ２ ｑ ...(1) Provided that: R is a group represented by the following formula (2); Z １ is an alkylene group optionally having a divalent group between carbon-carbon atoms; A is a single bond or a (q+1)-valent linking group; R ３ are each independently a hydrocarbon group; L １ are each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; Q ３ is a single bond or a divalent linking group; s1 is an integer of 0 to 3; n1 is each independently 0 or 1; n2 is each independently an integer of 0 to 2; q is an integer of 1 or more; R １ are each independently a hydrocarbon group or a group comprising -OSiR １１ ３ ; R １１ are each independently a hydrocarbon group; m is an integer of 0 to 6; p is an integer of 1 to 3; X-Y represents CH-CH ２ or C=CH; * is a bonding position to Z in formula (1) １ .​ 2. The compound according to claim 1, wherein m is 0 or 1.

3. The compound according to claim 1, wherein p is 1.

4. Said Z １ The compound according to claim 1, wherein is an alkylene group having 11 or more carbon atoms.

5. A method for producing a compound according to any one of claims 1 to 4, comprising reacting a compound represented by the following formula (1-1) with a compound represented by the following formula (2-1). ２１ -Z ２ -W １ ... (1-1) However, R ２１ Therefore, -CH≡C, and Z ２ This is an alkylene group which may have a divalent group between carbon atoms, W １ is a halogen atom, -NH ２ , or -A-[(Si(R ３ ) ｎ１ L １ ２－ｎ１ - Q ３ ) ｓ１ -Si(R ３ ) ｎ２ L １ ３－ｎ２ ] ｑ A is a single bond or a (q+1) valence linking group, and R ３ Each of these is independently a hydrocarbon group, L １ These are, independently, a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, Q ３ is a single bond or a divalent linking group, s1 is an integer from 0 to 3, n1 is independently 0 or 1, n2 is independently an integer from 0 to 2, q is an integer of 1 or more, R １ Each of these independently comprises a hydrocarbon group or -OSiR １１ ３ It is a group containing R １１ Each of these is independently a hydrocarbon group, m is an integer from 0 to 6, and p is an integer from 1 to 3.

6. A composition comprising a compound according to any one of claims 1 to 4 and a liquid medium.

7. A composition comprising a compound according to any one of claims 1 to 4 and another compound having a reactive silyl group.

8. A surface treatment agent comprising the compound described in any one of claims 1 to 4.

9. A surface treatment agent comprising a compound according to any one of claims 1 to 4 and a liquid medium.

10. A surface treatment agent comprising a compound according to any one of claims 1 to 4 and another compound having a reactive silyl group.

11. An article comprising a base material and a surface treatment layer disposed on the base material and surface-treated with a surface treatment agent containing a compound according to any one of claims 1 to 4.

12. The article according to claim 11, which is an optical component.

13. The article according to claim 12, which is a display or touch panel.

14. A method for manufacturing an article, comprising surface-treating a substrate with a surface treatment agent containing a compound described in any one of claims 1 to 4, thereby producing an article in which a surface-treated layer is formed on the substrate.

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