Purification device

Abstract

A purification device (11) includes: a case (12) provided with a supply port (14a) configured to supply gas into the case (12) and a discharge port (14b) configured to discharge gas to outside of the case (12); a catalyst layer (51) including a catalyst configured to capture oxygen contained in the gas; an adsorbent layer (61) that is disposed downstream of the catalyst layer (51) and that includes an adsorbent configured to adsorb moisture contained in the gas; and a heating device (20) configured to heat the catalyst layer (51) and the adsorbent layer (61). The purification device (11) further includes a partition plate (41) that partitions the catalyst layer (51) and the adsorbent layer (61) so that a direction of gas flow from the supply port (14a) to the discharge port (14b) is repeatedly changed. The partition plate (41) constitutes the heating device (20).

Description

Purification Apparatus

[0001] The present disclosure relates to a purification apparatus.

[0002] For example, semiconductor manufacturing is performed in a chamber with an inert gas atmosphere. The inert gas supplied into the chamber is not discharged directly as it is, but is supplied to a purification apparatus as a gas to be purified and purified therein, as disclosed, for example, in Patent Document 1.

[0003] The circulating purification apparatus disclosed in Patent Document 1 includes a purification cylinder, which is a purification apparatus for purifying inert gas. A catalyst layer is provided inside the cylinder body of the purification cylinder on the upstream side in the flow direction of the inert gas, and an adsorbent layer is provided on the downstream side in the flow direction relative to the catalyst layer. A heater for heating the catalyst layer and the adsorbent layer is provided inside the cylinder body of the purification cylinder. The heater extends in the direction in which the central axis of the cylinder body extends and is inserted into the catalyst layer and the adsorbent layer.

[0004] The inert gas supplied into the cylinder body of the purification cylinder is introduced into the catalyst layer. Oxygen contained in the inert gas is captured by the catalyst while flowing through the catalyst layer. Further, the inert gas flows through the adsorbent layer. Moisture in the inert gas is adsorbed by the adsorbent.

[0005] Regeneration gas may be supplied to the purification cylinder in some cases. After the regeneration gas is supplied to the purification cylinder, when the purification cylinder is heated by the heater, the catalyst layer and the adsorbent layer are heated by the heater. Then, due to the heat from the heater, the oxygen captured in the catalyst layer reacts with the regeneration gas to form water and desorbs from the catalyst. The water adsorbed in the adsorbent layer also desorbs from the adsorbent. Thereafter, the water desorbed from the catalyst layer and the adsorbent layer is discharged together with the regeneration gas. As a result, the catalyst layer and the adsorbent layer of the purification cylinder are regenerated.

[0006] Japanese Unexamined Patent Publication No. 2007-1785

[0007] In gas purification apparatuses including the purification cylinder disclosed in Patent Document 1, improvement of gas purification efficiency and reduction of the time required for regeneration of the catalyst and the adsorbent are constantly desired.

[0008] A purification apparatus according to one aspect of the present disclosure comprises: a case through which a gas to be purified flows, the case having a supply port configured to supply the gas into the interior of the case and a discharge port configured to discharge the purified gas to the outside of the case; a catalyst layer housed inside the case and containing a catalyst configured to capture oxygen contained in the gas; an adsorbent layer housed inside the case and positioned downstream of the catalyst layer in the gas flow direction from the supply port to the discharge port, and containing an adsorbent configured to adsorb moisture contained in the gas; and a heating device configured to heat the catalyst layer and the adsorbent layer to regenerate the catalyst and the adsorbent, respectively. The purification apparatus is configured such that the gas flows through the catalyst layer and the adsorbent layer. The purification apparatus further comprises a partition plate separating the catalyst layer and the adsorbent layer so as to repeatedly change the direction of gas flow from the supply port to the discharge port. The partition plate constitutes the heating device.

[0009] Figure 1 is a circuit diagram showing a circulating purification system. Figure 2 is a perspective view showing a purification apparatus of the first embodiment. Figure 3 is a cross-sectional view showing the purification apparatus of Figure 2. Figure 4 is a schematic diagram showing a purification apparatus of the second embodiment. Figure 5 is a cross-sectional view showing the purification apparatus of Figure 4. Figure 6 is a cross-sectional perspective view showing the purification apparatus of Figure 4. Figure 7 is a schematic diagram showing a modified purification apparatus. Figure 8 is a perspective view showing the purification apparatus of Figure 7. Figure 9 is a cross-sectional perspective view showing the purification apparatus of Figure 7.

[0010] (First Embodiment) The first embodiment of the purification apparatus will be described below. As shown in Figure 1, the circulating purification system 100 includes a box G which is the source and destination of the inert gas to be purified, and a purification apparatus 11 which purifies the inert gas. The inert gas is, for example, nitrogen gas. The box G is formed, for example, by assembling resin panels or metal panels.

[0011] The circulating purification system 100 includes a forward path 10a and a return path 10b, which connect to the box G of the purification device 11, and a circulation pump P provided in the forward path 10a. In the circulating purification system 100, the box G, the purification device 11, the forward path 10a, and the return path 10b constitute a circulation circuit 101 for circulating inert gas. The circulating purification system 100 circulates the inert gas within the circulation circuit 101 by driving the circulation pump P.

[0012] The circulating purification system 100 includes a regenerating gas supply source 21 and a pressure-maintaining gas supply source 31 for maintaining the pressure of the circulation circuit 101. The circulating purification system 100 also includes a regenerating gas supply passage 22 that connects the regenerating gas supply source 21 to the purification device 11, and a regenerating gas discharge passage 23 through which the regenerating gas discharged from the purification device 11 flows. The regenerating gas discharge passage 23 is connected to the purification device 11.

[0013] The circulating purification system 100 includes a vacuum pump 18 for evacuating the purification device 11. The vacuum pump 18 is connected to the purification device 11. The circulating purification system 100 includes a pressure-holding gas supply path 32 that connects a pressure-holding gas supply source 31 to the return path 10b. The pressure-holding gas supply path 32 is connected to the portion of the return path 10b downstream of the purification device 11 in the circulation direction of the inert gas in the circulation circuit 101. The regenerated gas supplied from the regenerated gas supply source 21 is hydrogen gas, and the pressure-holding gas supplied from the pressure-holding gas supply source 31 is nitrogen gas.

[0014] In the circulating purification system 100 described above, when the circulation pump P is driven with the regenerating gas discharge path 23 blocked and the supply of regenerating gas from the regenerating gas supply source 21 blocked, the inert gas discharged from box G is supplied to the purification device 11 via the forward path 10a as unpurified inert gas. The inert gas supplied to the purification device 11 is purified in the purification device 11 and then supplied back to box G via the return path 10b as purified inert gas. As a result, the inert gas circulates through the circulation circuit 101. In the circulating purification system 100, while the inert gas is being purified, pressure-retaining gas is supplied from the pressure-retaining gas supply source 31 to the return path 10b via the pressure-retaining gas supply path 32. As a result, the circulation circuit 101 is maintained at a constant pressure.

[0015] In the circulating purification system 100, when the circulation of inert gas in the circulation circuit 101 is stopped and the regenerated gas supply passage 22 and the regenerated gas discharge passage 23 are opened, the vacuum pump 18 is driven, and the purification device 11 is evacuated. Then, regenerated gas is supplied from the regenerated gas supply source 21 to the purification device 11 via the regenerated gas supply passage 22. After flowing through the purification device 11, the regenerated gas is discharged outside the purification device 11 via the regenerated gas discharge passage 23, and is also discharged from the vacuum pump 18.

[0016] <Purification Apparatus> As shown in Figures 2 and 3, the purification apparatus 11 comprises a case 12 and a plurality of partition plates 41 provided inside the case 12. In Figure 2, although not shown, the purification apparatus 11 comprises a catalyst layer 51 housed inside the case 12 and an adsorbent layer 61 housed inside the case 12.

[0017] <Case> An inert gas or regenerating gas flows inside the case 12. The case 12 is a rectangular box made of metal plate. The case 12 comprises a bottom plate 13, two long side walls 14, two short side walls 15, and a top plate 16. The bottom plate 13 is rectangular when viewed in the direction of its thickness. In the following description, when the bottom plate 13 is viewed in the direction of its thickness, the direction in which the long side of the bottom plate 13 extends will be called the first direction X of the case 12, and the direction in which the short side of the bottom plate 13 extends will be called the second direction Y. The direction perpendicular to the first direction X and the second direction Y will be called the third direction Z. The third direction Z coincides with the thickness direction of the bottom plate 13. The bottom plate 13 comprises an outer surface 131 and an inner surface 132, which are opposite to each other in the third direction Z, that is, in the thickness direction.

[0018] The two long side walls 14 extend from the two long side edges of the base plate 13 in a third direction Z. Each long side wall 14 has an outer surface 141 and an inner surface 142 that are opposite to each other in the thickness direction. The second direction Y coincides with the thickness direction of the long side wall 14. The two short side walls 15 extend from the two short side edges of the base plate 13 in a third direction Z. The short side walls 15 have an outer surface 151 and an inner surface 152 that are opposite to each other in the thickness direction. The first direction X coincides with the thickness direction of the short side walls 15. The top plate 16 closes the interior of the case 12, which is the space enclosed by the two long side walls 14 and the two short side walls 15. The top plate 16 has an outer surface 161 and an inner surface 162 that are opposite to each other in the thickness direction. The third direction Z coincides with the thickness direction of the top plate 16. The inner surface 132 of the bottom plate 13 and the inner surface 162 of the top plate 16 face each other in the third direction Z.

[0019] A drain port 13a is formed in the bottom plate 13. The drain port 13a is connected to the vacuum pump 18. Two regeneration gas discharge ports 13b are formed in the bottom plate 13 for discharging the regeneration gas supplied to the inside of the case 12 to the outside of the case 12. Each regeneration gas discharge port 13b is connected to the regeneration gas discharge passage 23. The drain port 13a and the pair of regeneration gas discharge ports 13b are arranged at equal intervals in the first direction X of the bottom plate 13.

[0020] One of the two long side walls 14 has a supply port 14a for supplying inert gas into the case 12 and a discharge port 14b for discharging the purified inert gas to the outside of the case 12. The supply port 14a is formed near the first end of the long side wall 14 in the first direction X. The discharge port 14b is formed near the second end of the long side wall 14 in the first direction X. The supply port 14a and the discharge port 14b are located near the bottom plate 13 in the third direction Z. The forward path 10a is connected to the supply port 14a. The return path 10b is connected to the discharge port 14b.

[0021] A regeneration gas supply port 16a is formed in the top plate 16. The regeneration gas supply port 16a is located near the regeneration gas discharge port 13b in the first direction X. A regeneration gas supply passage 22 is connected to the regeneration gas supply port 16a. The regeneration gas supply port 16a is provided to supply regeneration gas, which regenerates the catalyst in the catalyst layer 51, into the inside of the case 12.

[0022] <Partition Plates> Multiple partition plates 41 divide the inside of the case 12. The partition plates 41 are rectangular in shape, with their longer sides extending in the third direction Z and their shorter sides extending in the second direction Y. Here, the inner surface 132 of the bottom plate 13 is designated as the first inner surface N1, and the inner surface 162 of the top plate 16 is designated as the second inner surface N2. The first inner surface N1 and the second inner surface N2 are surfaces of the inside of the case 12 that face each other in the third direction Z and extend in the first direction X. Therefore, the case 12 has a first inner surface N1 and a second inner surface N2 that face each other and extend in the direction of extension. The first direction X is the direction of extension of the first inner surface N1 and the second inner surface N2. Multiple partition plates 41 are arranged side by side at equal intervals in the first direction X. Each partition plate 41 has two partition surfaces 41a that are opposite to each other in the thickness direction, and these surfaces are arranged so that they intersect, specifically orthogonal to, the first direction X. Multiple partition plates 41 are arranged side by side so that the partition surfaces 41a of adjacent partition plates 41 face each other in the first direction X.

[0023] Three of the multiple partition plates 41 are first partition plates, which are provided so as to be in contact with the first inner surface N1 and spaced apart from the second inner surface N2. Specifically, the three partition plates 41 are bottom plate side partition plates 42, which are provided so that the end faces of both ends in the third direction Z that face the bottom plate 13 are in contact with the first inner surface N1 and the end faces that face the top plate 16 are spaced apart from the second inner surface N2. Two of the multiple partition plates 41 are first partition plates, which are provided so as to be spaced apart from the first inner surface N1 and in contact with the second inner surface N2. Specifically, the two partition plates 41 are top plate side partition plates 43, which are provided so that the end faces of both ends in the third direction Z that face the bottom plate 13 are spaced apart from the first inner surface N1 and the end faces that face the top plate 16 are in contact with the second inner surface N2. Therefore, the purification apparatus 11 is equipped with multiple partition plates 41, which include multiple bottom-side partition plates 42 and multiple top-side partition plates 43.

[0024] Inside the case 12, the bottom-side partition plates 42 and the top-side partition plates 43 are arranged alternately in the first direction X. The three bottom-side partition plates 42 and the two top-side partition plates 43 divide the inside of the case 12 at equal intervals in the first direction X.

[0025] Each bottom-side partition plate 42 extends from the inner surface 132 of the bottom plate 13, i.e., the first inner surface N1, toward the top plate 16. Each bottom-side partition plate 42 is in contact with both inner surfaces 142 of the two opposing long side walls 14 in the second direction Y. Therefore, the three bottom-side partition plates 42 divide the inside of the case 12 into four sections in the first direction X. Each bottom-side partition plate 42 does not partition the area near the top plate 16 inside the case 12.

[0026] Each top-side partition plate 43 extends from the inner surface 162 of the top plate 16, i.e., the second inner surface N2, toward the bottom plate 13. Each top-side partition plate 43 is in contact with both inner surfaces 142 of the two opposing long side walls 14 in the second direction Y. Therefore, the two top-side partition plates 43 divide the inside of the case 12 into three sections in the first direction X. Each top-side partition plate 43 does not partition the area near the bottom plate 13 inside the case 12.

[0027] Of the three bottom plate side partition plates 42, the bottom plate side partition plate 42 facing one short side wall 15 is designated as the first bottom plate side partition plate 421, and the bottom plate side partition plate 42 facing the other short side wall 15 is designated as the second bottom plate side partition plate 422. Of the three bottom plate side partition plates 42, the bottom plate side partition plate 42 positioned between the first bottom plate side partition plate 421 and the second bottom plate side partition plate 422 is designated as the third bottom plate side partition plate 423.

[0028] Of the two top-side partition plates 43, the top-side partition plate 43 positioned between the first bottom-side partition plate 421 and the third bottom-side partition plate 423 is the first top-side partition plate 431. Of the two top-side partition plates 43, the top-side partition plate 43 positioned between the second bottom-side partition plate 422 and the third bottom-side partition plate 423 is the second top-side partition plate 432.

[0029] Inside the case 12, a first space S1 is defined, partitioned by one short side wall 15 and the first bottom plate side partition plate 421; a second space S2 is defined, partitioned by the first bottom plate side partition plate 421 and the first top plate side partition plate 431; and a third space S3 is defined, partitioned by the first top plate side partition plate 431 and the third bottom plate side partition plate 423. Inside the case 12, a fourth space S4 is defined, partitioned by the third bottom plate side partition plate 423 and the second top plate side partition plate 432; a fifth space S5 is defined, partitioned by the second top plate side partition plate 432 and the second bottom plate side partition plate 422; and a sixth space S6 is defined, partitioned by the second bottom plate side partition plate 422 and the other short side wall 15.

[0030] The first space S1 and the second space S2 communicate with each other near the top plate 16. The second space S2 and the third space S3 communicate with each other near the bottom plate 13. The third space S3 and the fourth space S4 communicate with each other near the top plate 16. The fourth space S4 and the fifth space S5 communicate with each other near the bottom plate 13. The fifth space S5 and the sixth space S6 communicate with each other near the top plate 16. The first space S1 and the second space S2 are separated from each other near the bottom plate 13 by the first bottom plate side partition plate 421. The second space S2 and the third space S3 are separated from each other near the top plate 16 by the first top plate side partition plate 431. The third space S3 and the fourth space S4 are separated from each other near the bottom plate 13 by the third bottom plate side partition plate 423. The fourth space S4 and the fifth space S5 are separated from each other by the second top-side partition plate 432 near the top plate 16. The fifth space S5 and the sixth space S6 are separated from each other by the second bottom-side partition plate 422 near the bottom plate 13. Therefore, inside the case 12, the three bottom-side partition plates 42 and the two top-side partition plates 43 alternately form areas where adjacent spaces communicate with each other near the bottom plate 13 and areas where adjacent spaces are separated from each other near the top plate 16, from one end to the other in the first direction X.

[0031] The supply port 14a opens to the first space S1 near the bottom plate 13. The discharge port 14b opens to the sixth space S6 near the bottom plate 13. One of the two regenerated gas discharge ports 13b opens to the first space S1 at the bottom plate 13. The other of the two regenerated gas discharge ports 13b opens to the second space S2 at the bottom plate 13. The drain port 13a opens to the third space S3 at the bottom plate 13. The regenerated gas supply port 16a opens to the first space S1 at the top plate 16. In other words, the regenerated gas supply port 16a opens toward the first space S1 separated by the first bottom plate side partition plate 421.

[0032] The partition plate 41 functions as a heater. In other words, the partition plate 41 is a heater. A power supply 17 is connected to the case 12 by connecting wires 19. Power supplied from the power supply 17 is supplied to each partition plate 41 via the connecting wires 19. When power is supplied to the partition plate 41, the partition plate 41 itself is heated and functions as a heater.

[0033] <Catalyst Layer> The catalyst layer 51 is housed inside the case 12. The catalyst layer 51 contains a catalyst that captures oxygen contained in the inert gas. Nickel is used as the catalyst that forms the catalyst layer 51. Nickel has a high oxygen capture capacity and also has the ability to capture small amounts of carbon monoxide, hydrogen, and carbon dioxide.

[0034] The two catalyst layers 51 are housed in a first space S1 and a second space S2, respectively. Both partition surfaces 41a of the first bottom plate side partition plate 421 and one partition surface 41a of the first top plate side partition plate 431 are in surface contact with the catalyst layers 51. The two catalyst layers 51 are separated from each other by the first bottom plate side partition plate 421. The regeneration gas supply port 16a is positioned to supply regeneration gas to each of the two catalyst layers 51 separated from each other by the first bottom plate side partition plate 421. The two regeneration gas discharge ports 13b are provided to discharge regeneration gas from each of the catalyst layers 51 separated from each other by the first bottom plate side partition plate 421.

[0035] <Adsorbent Layer> The adsorbent layer 61 is housed inside the case 12. The adsorbent layer 61 contains an adsorbent that adsorbs moisture contained in the inert gas. Synthetic zeolite is used as the adsorbent that forms the adsorbent layer 61. Synthetic zeolite has the ability to remove water, and furthermore, it has the ability to remove small amounts of carbon dioxide and carbon monoxide, etc.

[0036] The adsorbent layer 61 is housed in the third space S3 to the sixth space S6. The first top-side partition plate 431 separates the second space S2 and the third space S3, and functions as a partition plate that separates the catalyst layer 51 and the adsorbent layer 61. The partition surfaces 41a of the first top-side partition plate 431, the third bottom-side partition plate 423, the second top-side partition plate 432, and the second bottom-side partition plate 422 are in surface contact with the adsorbent layer 61.

[0037] Inside the case 12, the catalyst layer 51 and the adsorbent layer 61 are separated from the inner surface 132 of the bottom plate 13 and from the inner surface 162 of the top plate 16 in the third direction Z. Inside the case 12, a bottom plate side circulation space R1 exists between the catalyst layer 51 and the adsorbent layer 61 and the bottom plate 13. The bottom plate side circulation space R1 is provided throughout the case 12 in the first direction X and is partitioned at multiple locations in the first direction X by a first bottom plate side partition plate 421, a third bottom plate side partition plate 423, and a second bottom plate side partition plate 422.

[0038] Specifically, the bottom plate side circulation space R1 is partitioned between the first space S1 and the second space S2 by the first bottom plate side partition plate 421, and also partitioned between the third space S3 and the fourth space S4 by the third bottom plate side partition plate 423. The bottom plate side circulation space R1 is partitioned between the fifth space S5 and the sixth space S6 by the second bottom plate side partition plate 422.

[0039] Inside the case 12, a top-side circulation space R2 exists between the catalyst layer 51 and the adsorbent layer 61 and the top plate 16. The top-side circulation space R2 is provided throughout the case 12 in a first direction X and is partitioned at multiple locations in the first direction X by a first top-side partition plate 431 and a second top-side partition plate 432. Specifically, the top-side circulation space R2 is partitioned between the second space S2 and the third space S3 by the first top-side partition plate 431, and between the fourth space S4 and the fifth space S5 by the second top-side partition plate 432.

[0040] Therefore, within the case 12, the first space S1 and the second space S2 communicate with each other via the top-side circulation space R2, and the second space S2 and the third space S3 communicate with each other via the bottom-side circulation space R1. Within the case 12, the third space S3 and the fourth space S4 communicate with each other via the top-side circulation space R2, and the fourth space S4 and the fifth space S5 communicate with each other via the bottom-side circulation space R1. The fifth space S5 and the sixth space S6 communicate with each other via the top-side circulation space R2.

[0041] Each of the catalyst layer 51 and adsorbent layer 61 that are in contact with the partition surface 41a of each partition plate 41 are heated by the heat transferred from the partition plate 41 when the partition plate 41 is heated and functions as a heater. In the first embodiment, a heating device 20 is formed by the partition plate 41, the power supply 17, and the connecting wires 19 to heat each of the catalyst layer 51 and the adsorbent layer 61 for the regeneration of the catalyst and adsorbent, respectively.

[0042] <Flow of Inert Gas> As shown by the solid arrow V in Figure 3, the inert gas supplied into the case 12 through the supply port 14a is supplied to the catalyst layer 51 housed in the first space S1. The inert gas flows through the catalyst layer 51 of the first space S1 in the direction from the bottom plate 13 toward the top plate 16, then flows through the top plate side circulation space R2 and flows into the catalyst layer 51 of the second space S2. The inert gas flows through the catalyst layer 51 of the second space S2 in the direction from the top plate 16 toward the bottom plate 13, then flows through the bottom plate side circulation space R1 and flows into the adsorbent layer 61 of the third space S3. The inert gas flows through the adsorbent layer 61 of the third space S3 in the direction from the bottom plate 13 toward the top plate 16, then flows through the top plate side circulation space R2 and flows into the adsorbent layer 61 of the fourth space S4. The inert gas flows through the adsorbent layer 61 of the fourth space S4 from the top plate 16 towards the bottom plate 13, then flows through the bottom plate side circulation space R1 and flows into the adsorbent layer 61 of the fifth space S5. The inert gas flows through the adsorbent layer 61 of the fifth space S5 from the bottom plate 13 towards the top plate 16, then flows through the top plate side circulation space R2 and flows into the adsorbent layer 61 of the sixth space S6. After that, the inert gas flows through the sixth space S6 from the top plate 16 towards the bottom plate 13, and is then discharged to the outside of the case 12 through the discharge port 14b.

[0043] Accordingly, while the interior of the case 12 is partitioned into a plurality of spaces S1 to S6 by the three bottom plate-side partition plates 42 and the two top plate-side partition plates 43, adjacent spaces are communicated with each other by the bottom plate-side circulation space R1 and the top plate-side circulation space R2, so that the inert gas flowing from the supply port 14a toward the discharge port 14b flows while alternately changing its flow direction in the third direction Z. Therefore, the purification apparatus 11 includes the three bottom plate-side partition plates 42 and the two top plate-side partition plates 43 that partition the catalyst layer 51 and the adsorbent layer 61 such that the flow direction of the inert gas from the supply port 14a toward the discharge port 14b is repeatedly changed. Since the inert gas flows as described above, the adsorbent layer 61 is disposed downstream of the catalyst layer 51 in the flow direction of the inert gas from the supply port 14a toward the discharge port 14b.

[0044] <Flow of Regeneration Gas> As shown by the broken-line arrow W in FIG. 3, the regeneration gas supplied into the case 12 through the regeneration gas supply port 16a is supplied to the catalyst layers 51 in both the first space S1 and the second space S2 from the top plate-side circulation space R2 communicating with the first space S1 and the second space S2. The regeneration gas supplied to the catalyst layer 51 of the first space S1 and the catalyst layer 51 of the second space S2 flows in parallel in the direction from the top plate 16 toward the bottom plate 13, and is then discharged to the outside of the case 12 through each of the two regeneration gas discharge ports 13b.

[0045] [Operation of First Embodiment] The operation of the first embodiment will be described together with aspects of purification of inert gas by the purification apparatus 11 and aspects of regeneration of the catalyst and the adsorbent.

[0046] First, the purification of inert gas will be described. The inert gas discharged from the box G is supplied as unpurified inert gas into the case 12 through the forward path 10a and the supply port 14a. The inert gas supplied into the case 12 flows through the catalyst layer 51 of the first space S1, and then flows through the catalyst layer 51 of the second space S2. While the inert gas flows through the catalyst layer 51, oxygen contained in the inert gas, as well as small amounts of carbon monoxide, hydrogen, carbon dioxide and the like are removed by the catalyst.

[0047] Subsequently, after the inert gas is introduced into the third space S3, it flows through the adsorbent layer 61 of the third space S3, the adsorbent layer 61 of the fourth space S4, the adsorbent layer 61 of the fifth space S5, and the adsorbent layer 61 of the sixth space S6. While the inert gas flows through the adsorbent layers 61 of the third space S3 to the sixth space S6, moisture, a small amount of carbon monoxide and carbon dioxide in the inert gas are adsorbed by the adsorbent.

[0048] The inert gas purified while passing through the inside of the case 12 is discharged to the return path 10b through the discharge port 14b. The inert gas discharged to the return path 10b is re-supplied to the box G via the return path 10b.

[0049] Next, the regeneration of the catalyst layer 51 and the adsorbent layer 61 will be described. Regeneration gas is supplied from the regeneration gas supply source 21 to the purification device 11. Further, each partition plate 41 is heated by power supply from the power source 17. Then, the catalyst layer 51 and the adsorbent layer 61 are directly heated by the partition surface 41a of the partition plate 41. By heat from the partition plate 41, oxygen trapped in the catalyst layer 51 reacts with hydrogen contained in the regeneration gas to form water, and then desorbs from the catalyst. The water adsorbed on the adsorbent layer 61 also desorbs from the adsorbent. At least a part of the water desorbed from the catalyst layer 51 and the adsorbent layer 61 is discharged to the outside of the case 12 through the regeneration gas discharge port 13b together with the regeneration gas. The water desorbed from the catalyst layer 51 and the adsorbent layer 61 is also discharged to the outside of the case 12 through the drain port 13a. As a result, the catalyst layer 51 and the adsorbent layer 61 are regenerated, so the oxygen trapping ability of the catalyst layer 51 and the water removing ability of the adsorbent layer 61 are restored.

[0050] According to the first embodiment described above, the following effects can be obtained. (1-1) The purification apparatus 11 is equipped with a plurality of partition plates 41 that partition the inside of the case 12. The inside of the case 12 is partitioned into a first space S1 to a sixth space S6 by the plurality of partition plates 41. Adjacent spaces among the first space S1 to the sixth space S6 are in communication with each other. The locations where adjacent spaces are in communication with each other are alternately located near the bottom plate 13 and near the top plate 16, from one end to the other in the first direction X. When the inert gas supplied to the inside of the case 12 flows through the first space S1 to the sixth space S6, the inert gas flows in such a way that it is repeatedly folded back inside the case 12. In other words, by providing a plurality of partition plates 41, the purification apparatus 11 can repeatedly change the direction of flow of the inert gas in the opposite direction. Therefore, since gases generally flow in a straight line, in this embodiment, the distance over which the inert gas flows inside the case 12 can be increased compared to the case 12 of the same shape and volume where the inert gas flows straight in the first direction X without multiple partition plates 41. As a result, the purification apparatus 11 can increase the amount of catalyst and adsorbent that the inert gas comes into contact with as it flows through the case 12, thereby improving the purification efficiency of the inert gas.

[0051] Each of the multiple partition plates 41 in the purification apparatus 11 also functions as a heater. Therefore, when the catalyst and adsorbent are regenerated, the catalyst layer 51 and the adsorbent layer 61 are directly heated by the partition surfaces 41a of the partition plates 41 that separate the catalyst layer 51 and the adsorbent layer 61. For example, compared to a case where the catalyst layer 51 and the adsorbent layer 61 are heated by a rod-shaped heater that extends through the catalyst layer 51 and the adsorbent layer 61, the purification apparatus 11 can increase the heating area of ​​the catalyst layer 51 and the adsorbent layer 61 by the heating device 20. Therefore, the time required to heat the catalyst layer 51 and the adsorbent layer 61 can be shortened. As a result, the purification apparatus 11 can improve the purification efficiency and shorten the time required to regenerate the catalyst and adsorbent.

[0052] (1-2) The purification apparatus 11 can repeatedly fold and flow the inert gas by providing a plurality of partition plates 41 inside the case 12. Therefore, in this embodiment, the case 12 can be made smaller while maintaining the purification function, compared to the case 12 of the same shape and volume in which the inert gas flows straight in the first direction X without partition plates 41.

[0053] (1-3) The regeneration gas supply port 16a is positioned to supply inert gas to each of the catalyst layers 51 housed in the first space S1 and the second space S2, respectively, through the top plate side flow space R2. The regeneration gas discharge port 13b is positioned to communicate with each of the first space S1 and the second space S2. Therefore, the regeneration gas supplied into the case 12 through the regeneration gas supply port 16a flows in parallel to both the catalyst layer 51 in the first space S1 and the catalyst layer 51 in the second space S2. Thus, compared to, for example, the case in which the regeneration gas is flowed to the catalyst layer 51 in the first space S1 and then to the catalyst layer 51 in the second space S2, the time required to flow the regeneration gas to the two catalyst layers 51 can be shortened in this embodiment. Therefore, the time required for catalyst regeneration can be shortened.

[0054] (1-4) In the purification apparatus 11, the purification of inert gas cannot be performed while the catalyst and adsorbent are being regenerated. However, the purification apparatus 11 can shorten the time required for the regeneration of the catalyst and adsorbent by increasing the heating efficiency of the catalyst layer 51 and the adsorbent layer 61 using multiple partition plates 41. Therefore, the time until the next inert gas purification treatment can be shortened.

[0055] (1-5) The first top-side partition plate 431 of the multiple partition plates 41 functions as a partition plate that separates the catalyst layer 51 and the adsorbent layer 61. Therefore, by providing the first top-side partition plate 431, the purification apparatus 11 can suppress the mixing of the catalyst layer 51 and the adsorbent layer 61.

[0056] (1-6) Each partition plate 41 is formed from the heater itself. For example, compared to a case where the partition plate 41 is brought into contact with a heat source and heated by the heat transmitted from the heat source, the purification apparatus 11 can shorten the time required to heat the partition plate 41 and increase the heating efficiency. As a result, the time required to heat the catalyst layer 51 and the adsorbent layer 61 can be shortened.

[0057] (1-7) The circulating purification system 100 is equipped with a pressure-retaining gas supply source 31. The pressure-retaining gas supply source 31 is connected to the forward path 10a and supplies inert gas to the inert gas circulation circuit 101. This allows the pressure in the inert gas circulation circuit 101 to be maintained.

[0058] (Second Embodiment) Next, a second embodiment of the purification apparatus will be described. Note that detailed explanations of parts of the second embodiment that are the same as those of the first embodiment will be omitted.

[0059] As shown in Figures 4, 5, and 6, the purification apparatus 71 comprises a cylindrical case 72, a first helical plate 81 and a second helical plate 82 which are partition plates provided inside the case 72, a catalyst layer 51 housed inside the case 72, an adsorbent layer 61 housed inside the case 12, and a heater 77 housed inside the case 72. In Figures 5 and 7, the catalyst layer 51 and the adsorbent layer 61 are omitted from the illustration to make the configuration of the case 72 easier to understand. The direction in which the central axis M of the case 72 extends is the axial direction T.

[0060] <Case> The case 72 is a double cylinder made of metal plate. The case 72 comprises a bottom plate 73, an outer cylinder portion 74, an inner cylinder portion 75, and a top plate 76. The bottom plate 73 is circular when viewed in the direction of its thickness. The bottom plate 73 has an outer surface 731 and an inner surface 732, which are opposite surfaces in the direction of its thickness.

[0061] The outer cylinder portion 74 is cylindrical and extends axially in the direction T from the periphery of the bottom plate 73. The inner cylinder portion 75 is located inside the outer cylinder portion 74 and is surrounded by the outer cylinder portion 74. The inner cylinder portion 75 is cylindrical and extends axially in the direction T from the top plate 76. The central axis of the outer cylinder portion 74 and the central axis of the inner cylinder portion 75 coincide with the central axis M of the case 72. Therefore, the central axes of the outer cylinder portion 74 and the inner cylinder portion 75 extend axially in the direction T. The outer cylinder portion 74 and the inner cylinder portion 75 are arranged concentrically with respect to the central axis M. The outer cylinder portion 74 has an outer circumferential surface 741 and an inner circumferential surface 742. The inner cylinder portion 75 has an outer circumferential surface 751 and an inner circumferential surface 752.

[0062] Inside the case 72, an outer annular space SP1 is defined, surrounded by the inner circumferential surface 742 of the outer cylinder portion 74 and the outer circumferential surface 751 of the inner cylinder portion 75, while an inner annular space SP2 is defined between the inner circumferential surface 752 of the inner cylinder portion 75 and the outer circumferential surface of the heater 77.

[0063] The top plate 76 closes the outer annular space SP1 and the inner annular space SP2. The top plate 16 has an outer surface 761 and an inner surface 762 which are opposite to each other in the axial direction T, that is, in the thickness direction of the top plate 76. The top plate 76 has a regeneration gas supply port 76a formed therein for supplying regeneration gas to the inside of the case 72.

[0064] A suction port 73a is formed in the bottom plate 73. A vacuum pump 18 for vacuum suction is connected to the suction port 73a. A supply port 74a and a discharge port 74b are formed in the outer cylinder portion 74, near the top plate 76 in the axial direction T. The discharge port 74b is formed at a different position from the supply port 74a in the circumferential direction of the outer cylinder portion 74. The supply port 74a and the discharge port 74b are located at the same position in the axial direction T of the outer cylinder portion 74. In other words, the supply port 74a and the discharge port 74b are provided in the case 72 at the end closer to the top plate 16, in the direction in which the central axis M extends, that is, in the axial direction T.

[0065] The case 72 has a connecting cylindrical portion 74c that connects the supply port 74a to the inner annular space SP2. The connecting cylindrical portion 74c is hollow and is provided at the end of the case 72 closer to the top plate 16, and extends radially across the case 72.

[0066] Although not shown in the diagram, the supply port 74a is connected to the forward path 10a. The discharge port 74b is connected to the return path 10b. The supply port 74a communicates with the inner annular space SP2 by the connecting cylinder portion 74c, and is isolated from the outer annular space SP1. The discharge port 74b communicates with the outer annular space SP1.

[0067] The heater 77 is positioned inside the inner cylinder 75 so as to extend along the central axis M of the case 72, that is, along the central axis of the inner cylinder 75. The heater 77 is connected to the power supply 17 via a connecting wire 19.

[0068] The first helical plate 81 is positioned in the outer annular space SP1. The spirally extending inner edge of the first helical plate 81 is in contact with the outer circumferential surface 751 of the inner cylinder portion 75, while the spirally extending outer edge is in contact with the inner circumferential surface 742 of the outer cylinder portion 74. The first helical plate 81 helically partitions the outer annular space SP1. Therefore, the outer annular space SP1 is helically partitioned by the first helical plate 81 with respect to the central axis M of the case 72.

[0069] The first helical plate 81 is positioned in the axial direction T between the supply port 74a, the discharge port 74b, the communicating cylinder portion 74c, and the bottom plate 73. Of the first helical plate 81, the surface facing the top plate 76 is spaced apart from the inner surface 762 of the top plate 76. The first helical plate 81 is spaced apart from the inner surface 732 of the bottom plate 73 in the axial direction T.

[0070] The second helical plate 82 is positioned in the inner annular space SP2. The spirally extending inner edge of the second helical plate 82 is in contact with the outer surface of the heater 77, while the spirally extending outer edge is in contact with the inner surface 752 of the inner cylinder portion 75. The second helical plate 82 helically partitions the inner annular space SP2. Therefore, the inner annular space SP2 is helically partitioned by the second helical plate 82 with the heater 77 at its center.

[0071] The second helical plate 82 is positioned in the axial direction T between the supply port 74a, the discharge port 74b, the connecting cylinder portion 74c, and the bottom plate 73. Of the second helical plate 82, the surface facing the top plate 76 is spaced apart from the inner surface 762 of the top plate 76. The second helical plate 82 is spaced apart from the inner surface 732 of the bottom plate 73 in the axial direction T.

[0072] The catalyst layer 51 is housed in an inner annular space SP2 that is divided in a spiral shape. In the inner annular space SP2, which is divided in a spiral shape by the second spiral plate 82, the catalyst layer 51 is also divided by the second spiral plate 82 so as to extend in a spiral shape. The catalyst layer 51 is spaced apart in the axial direction T from the bottom plate 73 and the top plate 76, respectively. Both sides of the second spiral plate 82 in the thickness direction are partition surfaces 82a that separate the catalyst layer 51. The partition surfaces 82a are in surface contact with the catalyst layer 51.

[0073] The adsorbent layer 61 is housed in an outer annular space SP1 that is partitioned in a spiral shape. In the outer annular space SP1, which is partitioned in a spiral shape by the first spiral plate 81, the adsorbent layer 61 is also partitioned by the first spiral plate 81 so as to extend in a spiral shape. The adsorbent layer 61 is spaced apart in the axial direction T from the bottom plate 73 and the top plate 76, respectively. The catalyst layer 51 and the adsorbent layer 61 have both end faces in the axial direction T that are located at the same position in the axial direction T. Both sides of the first spiral plate 81 in the thickness direction are partition surfaces 81a that partition the adsorbent layer 61. The partition surfaces 81a are in surface contact with the adsorbent layer 61.

[0074] Inside the case 72, in the axial direction T, a bottom-plate side flow space R1 is defined between the catalyst layer 51 and the adsorbent layer 61 and the bottom plate 13, and a top-plate side flow space R2 is defined between the adsorbent layer 61 and the top plate 16. The bottom-plate side flow space R1 faces both the catalyst layer 51 and the adsorbent layer 61. The suction port 73a communicates with the bottom-plate side flow space R1. The top-plate side flow space R2 is isolated from the inner annular space SP2 by the inner cylinder portion 75. Therefore, the inner annular space SP2, in which the catalyst layer 51 is housed, is isolated from the outer annular space SP1 in the portion near the top plate 16, while in the portion near the bottom plate 13 it communicates with the outer annular space SP1 by the bottom-plate side flow space R1.

[0075] The first helical plate 81 is electrically connected to a power supply 17 located outside the case 72 via a connecting wire 19. The first helical plate 81 can be heated by power supplied from the power supply 17. The heater 77 can be heated by power supplied from the power supply 17. Heat from the heater 77 is transferred to the second helical plate 82. Therefore, the heating device 20 of the refining apparatus 71 consists of the heater 77, the second helical plate 82, the first helical plate 81, the power supply 17, and the connecting wire 19.

[0076] [Operation of the second embodiment] The inert gas discharged from the box G is supplied to the inside of the case 72 via the supply port 74a through the forward passage 10a. The inert gas supplied to the inside of the case 72 is introduced into the inner annular space SP2 via the connecting cylinder 74c. The inert gas flows spirally through the inner annular space SP2 from the top plate 76 toward the bottom plate 73. As the inert gas flows through the catalyst layer 51 of the inner annular space SP2, oxygen contained in the inert gas, as well as small amounts of carbon monoxide, hydrogen, and carbon dioxide, etc., are removed by the catalyst.

[0077] Next, the inert gas flows into the bottom plate side circulation space R1 and is then introduced into the outer annular space SP1. The inert gas flows spirally through the outer annular space SP1 from the bottom plate 73 toward the top plate 76. As the inert gas flows through the adsorbent layer 61 of the outer annular space SP1, moisture in the inert gas, as well as small amounts of carbon monoxide and carbon dioxide, are adsorbed by the adsorbent. Therefore, in the purification apparatus 71, the direction of flow of the inert gas from the supply port 74a toward the discharge port 74b is spiral in both the catalyst layer 51 and the adsorbent layer 61. As a result, the direction of flow of the inert gas rotates around the central axis M. Thus, when viewing the purification apparatus 71 along the central axis M, the direction of flow of the inert gas from the supply port 74a toward the discharge port 74b is repeatedly changed. Therefore, the first spiral plate 81 and the second spiral plate 82 partition the catalyst layer 51 and the adsorbent layer 61 so that the direction of flow of the inert gas is repeatedly changed.

[0078] The inert gas, purified as it passes through the inside of case 72, is discharged to the return path 10b through the discharge port 74b. The inert gas discharged to the return path 10b is then resupplied to box G via the return path 10b.

[0079] Next, the regeneration of the catalyst and adsorbent will be explained. In the circulating purification system 100, regenerated gas is supplied from the regenerated gas supply source 21 to the purification device 71. In addition, the second helical plate 82 is heated via the heater 77 by power supplied from the power supply 17, and the first helical plate 81 is heated by power supplied to the first helical plate 81. As a result, the catalyst layer 51 is heated by the heater 77 and the second helical plate 82, and the adsorbent layer 61 is heated by the first helical plate 81.

[0080] As a result, the heat from the heater 77 and the second helical plate 82 causes the oxygen trapped in the catalyst layer 51 to react with the hydrogen contained in the regenerated gas to form water, which is then released from the catalyst. The heat from the first helical plate 81 also causes the water adsorbed in the adsorbent layer 61 to be released from the adsorbent. The water released from the catalyst layer 51 and the adsorbent layer 61, along with the regenerated gas, is sucked through the suction port 73a by the vacuum pump 18 and discharged outside the case 72. Consequently, the catalyst and adsorbent are regenerated, and the oxygen capture capacity of the catalyst layer 51 and the water removal capacity of the adsorbent layer 61 are restored.

[0081] Accordingly, according to the second embodiment, in addition to the effects of (1-4) and (1-7) described in the first embodiment, the following effects can be obtained. (2-1) The purification apparatus 71 is equipped with a first helical plate 81 that spirally partitions the outer annular space SP1, and a second helical plate 82 that spirally partitions the inner annular space SP2. As a result, the purification apparatus 71 can spirally flow the inert gas supplied to the inside of the case 72 in both the outer annular space SP1 and the inner annular space SP2. Compared to the case in which the inert gas flows straight in the axial direction T of the case 72 without the first helical plate 81 and the second helical plate 82 in a case 72 of the same shape and volume, the distance over which the inert gas flows can be increased in this embodiment. As a result, the purification apparatus 71 can increase the distance over which the inert gas flows and improve the purification efficiency.

[0082] Each of the first helical plate 81 and the second helical plate 82 of the purification apparatus 71 is heatable. Therefore, when the catalyst and adsorbent are regenerated, the catalyst layer 51 and the adsorbent layer 61 are directly heated by the partition surfaces 81a and 82a of the first helical plate 81 and the second helical plate 82 that separate the catalyst layer 51 and the adsorbent layer 61. For example, compared to a case where the catalyst layer 51 and the adsorbent layer 61 are heated only by a rod-shaped heater 77 that extends through the catalyst layer 51 and the adsorbent layer 61, the purification apparatus 71 can increase the heating area of ​​the catalyst layer 51 and the adsorbent layer 61. Therefore, the time required to heat the catalyst layer 51 and the adsorbent layer 61 can be shortened. As a result, the purification apparatus 71 can improve the purification efficiency and shorten the regeneration process.

[0083] (2-2) The purification apparatus 71 can flow the inert gas spirally inside the case 72 by providing a first helical plate 81 and a second helical plate 82 inside the case 72. Therefore, in this embodiment, the case 72 can be made smaller while maintaining the purification function, compared to the case 72 of the same shape and volume in which the inert gas flows straight in the axial direction T without providing the first helical plate 81 and the second helical plate 82.

[0084] (2-3) For example, consider the case where the supply port 74a is located near the top plate 16 of the case 72 and the discharge port 74b is located near the bottom plate 13 of the case 72. In this example, there is a risk that the inert gas supplied to the case 72 through the supply port 74a will flow through the catalyst layer 51 from the top plate 16 toward the bottom plate 13 and then be discharged through the discharge port 74b located at the end of its flow. In contrast, in the purification apparatus 71 according to this embodiment, both the supply port 74a and the discharge port 74b are provided in the case 72 near the top plate 16 in the axial direction T. The inert gas is supplied to the case 72 near the top plate 16 through the supply port 74a and then flows through the catalyst layer 51 from the top plate 16 toward the bottom plate 13. Furthermore, the inert gas flows through the adsorbent layer 61 on the outer circumference of the catalyst layer 51 from the bottom plate 13 toward the top plate 16 and reaches the discharge port 74b. Therefore, in the purification apparatus 71, the inert gas supplied to the case 72 through the supply port 74a is prevented from being discharged through the discharge port 74b after it has flowed through the catalyst layer 51 but before it flows through the adsorbent layer 61.

[0085] (2-5) The inner cylinder portion 75 can separate the catalyst layer 51 and the adsorbent layer 61. Therefore, by having a double-cylinder structure with an inner cylinder portion 75, the mixing of the catalyst layer 51 and the adsorbent layer 61 can be suppressed.

[0086] (2-6) The purification apparatus 71 heats the second helical plate 82 by bringing its inner edge into contact with the heater 77. As a result, the catalyst layer 51 is heated by the heater 77 in addition to the second helical plate 82, so the catalyst layer 51 can be heated efficiently.

[0087] [Examples of Modifications] The above embodiment can be implemented with the following modifications. The above embodiment and the following examples of modifications can be combined with each other to the extent that they do not contradict each other technically.

[0088] ○As shown in Figures 7, 8, and 9, in the purification apparatus 71 of the second embodiment, the case 72 does not need to have an inner cylinder portion 75. In this case, the case 72 is formed in a cylindrical shape by a bottom plate 73, an outer cylinder portion 74, and a top plate 76. A spiral partition plate 83 is housed inside the case 72. The spiral partition plate 83 spirally partitions the inside of the case 72 over the entire radial direction and substantially the entire axial direction T. A heater 77 is positioned in the center of the case 72 so as to pass through the center of the spiral partition plate 83 and extend along the central axis M. The inner edge of the spiral partition plate 83 is in contact with the outer circumferential surface of the heater 77. The outer edge of the spiral partition plate 83 is in contact with the inner circumferential surface 742 of the outer cylinder portion 74.

[0089] A supply port 74a is formed in the outer cylinder portion 74 near the bottom plate 73. A discharge port 74b is formed in the outer cylinder portion 74 near the top plate 76. Therefore, the supply port 74a and the discharge port 74b are located separately at both ends of the outer cylinder portion 74 in the axial direction T. A regenerated gas supply port 76a is provided on the top plate 76.

[0090] Inside the case 72, the catalyst layer 51 is housed in the portion near the bottom plate 73, and an adsorbent layer 61 is stacked between the catalyst layer 51 and the top plate 76 in the axial direction T. In the axial direction T, a bottom plate side flow space R1 is defined between the catalyst layer 51 and the bottom plate 73. In the axial direction T, a top plate side flow space R2 is defined between the adsorbent layer 61 and the top plate 76. The supply port 74a communicates with the bottom plate side flow space R1. The discharge port 74b communicates with the top plate side flow space R2. Inside the case 72, which is divided spirally by the spiral partition plate 83, the catalyst layer 51 and the adsorbent layer 61 are each separated by the partition surface 83a of the spiral partition plate 83 so as to extend spirally.

[0091] In this configuration, the purification apparatus 71 is equipped with a spiral partition plate 83 that spirally divides the inside of the case 72. Therefore, the purification apparatus 71 can allow the inert gas supplied to the inside of the case 72 to flow spirally. Compared to a case 72 of the same shape and volume where the inert gas flows straight in the axial direction T of the case 72 without the spiral partition plate 83, the purification apparatus 71 according to this modified example can increase the distance over which the inert gas flows. As a result, the purification apparatus 71 can increase the distance over which the inert gas flows and improve the purification efficiency.

[0092] The spiral partition plate 83 of the purification apparatus 71 is heatable. Therefore, when the catalyst and adsorbent are regenerated, the catalyst layer 51 and the adsorbent layer 61 are directly heated by the partition surface 83a of the spiral partition plate 83 that separates the catalyst layer 51 and the adsorbent layer 61. For example, compared to a case where the catalyst layer 51 and the adsorbent layer 61 are heated by a rod-shaped heater that extends through the catalyst layer 51 and the adsorbent layer 61, the purification apparatus 71 according to this modified example can increase the heating area of ​​the catalyst layer 51 and the adsorbent layer 61. Therefore, the time required to heat the catalyst and adsorbent can be shortened.

[0093] As a result, the purification apparatus 11 can improve purification efficiency and shorten the time required for regeneration. ○In the purification apparatus 71 of the second embodiment, the supply port 74a and the discharge port 74b may be provided at the end of the case 72 that is closer to the bottom plate 13, at both ends in the axial direction T.

[0094] ○In the purification apparatus 71 of the second embodiment, the supply port 74a may be provided at one of the two ends of the case 72 in the axial direction T, and the discharge port 74b may be provided at the other end.

[0095] ○In the second embodiment, the catalyst layer 51 may be housed in the outer annular space SP1, and the adsorbent layer 61 may be housed in the inner annular space SP2. In this case, the inert gas may be flowed through the catalyst layer 51 in the outer annular space SP1, and then through the adsorbent layer 61 in the inner annular space SP2. In this case, the supply port 74a is in communication with the outer annular space SP1, and the discharge port 74b is in communication with the inner annular space SP2.

[0096] ○In the second embodiment, at least one of the first helical plate 81 and the second helical plate 82 may function as a heater. ○In the first embodiment, the partition plates 41 may be arranged at unequal intervals in the first direction X.

[0097] ○If the direction of flow of the inert gas inside the case 12 can be repeatedly changed, the order in which the bottom plate side partition plate 42 and the top plate side partition plate 43 are arranged can be changed as appropriate. ○In the first embodiment, the inner surface 152 of one short side wall 15 of the case 12 may be designated as the first inner surface, and the inner surface 152 of the other short side wall 15 may be designated as the second inner surface. In this case, the direction in which the first inner surface and the second inner surface extend is the third direction Z. In this case, the partition plates 41 are arranged in parallel with a gap in the third direction Z, and each partition plate 41 is arranged such that its partition surface 41a intersects with the third direction Z. The multiple partition plates 41 may include a first partition plate that contacts the inner surface 152 of one short side wall 15 and is spaced apart from the inner surface 152 of the other short side wall 15, and a second partition plate that is spaced apart from the inner surface 152 of one short side wall 15 and contacts the inner surface 152 of the other short side wall 15. In this case, the supply ports 14a are provided at both ends of the third direction Z on one short side wall 15.

[0098] ○In the first embodiment, the purification apparatus 11 may have multiple regenerated gas supply ports 16a on the top plate 16 and three or more regenerated gas discharge ports 13b on the bottom plate 13. In this case, each regenerated gas discharge port 13b may be arranged to communicate with each of the three or more catalyst layers 51 separated by partition plates 41.

[0099] ○In the first embodiment, only one regenerated gas discharge port 13b may be provided on the bottom plate 13. ○In the first embodiment, the partition plate 41 may be a square plate, or it may have a shape in which the short side extends in the first direction X and the long side extends in the second direction Y. In short, as long as the inert gas can be repeatedly folded and flowed inside the case 12, the shape of the case 12 and the shape of the partition plate 41 may be changed as appropriate.

[0100] ○In the first embodiment, the partition surface 41a of the partition plate 41 does not have to be perpendicular to the first direction X, which is the extending direction. For example, the partition plates 41 may be arranged side by side so that their partition surfaces 41a intersect the first direction X at an angle.

[0101] ○In the first embodiment, when the multiple partition plates 41 are viewed from the third direction Z, adjacent partition plates 41 in the first direction X may be arranged in a V-shape. In short, as long as the multiple partition plates 41 are arranged in the first direction X, the angle at which each partition plate 41 intersects the first direction X is not limited to the first embodiment.

[0102] ○The gas to be purified may be air or other gases. ○The circulating purification system 100 may be equipped with multiple purification devices 11. ○The circulating purification system 100 does not need to be equipped with a pressure-retaining gas supply source 31 and a pressure-retaining gas supply passage 32.

[0103] As used herein, the term “ring-shaped” may refer to any structure that forms a loop shape as a whole. The “ring-shaped” shape includes, but is not limited to, circular, elliptical, and polygonal shapes with sharp or rounded corners. Similarly, the term “tubular” may refer to, but is not limited to, any structure having a circular, elliptical, and polygonal shape with sharp or rounded corners.

Claims

1. A purification apparatus comprising: a case through which a gas to be purified flows, the case having a supply port configured to supply the gas into the interior of the case and a discharge port configured to discharge the purified gas to the outside of the case; a catalyst layer housed inside the case and containing a catalyst configured to capture oxygen contained in the gas; an adsorbent layer housed inside the case and positioned downstream of the catalyst layer in the gas flow direction from the supply port to the discharge port, and containing an adsorbent configured to adsorb moisture contained in the gas; and a heating device configured to heat the catalyst layer and the adsorbent layer to regenerate the catalyst and the adsorbent, respectively, wherein the gas is configured to flow through the catalyst layer and the adsorbent layer, and further comprising a partition plate separating the catalyst layer and the adsorbent layer so as to repeatedly change the direction of gas flow from the supply port to the discharge port, the partition plate constituting the heating device.

2. The purification apparatus according to claim 1, further comprising a partition plate that separates the catalyst layer and the adsorbent layer.

3. The case comprises a first inner surface and a second inner surface that face each other and extend in the extending direction, a plurality of partition plates are provided inside the case, the plurality of partition plates are arranged side by side at intervals in the extending direction and are arranged so that the partition surfaces of each partition plate intersect in the extending direction, the plurality of partition plates comprises a first partition plate that is in contact with the first inner surface and spaced apart from the second inner surface, and a second partition plate that is spaced apart from the first inner surface and in contact with the second inner surface, the first partition plate and the second partition plate are arranged alternately side by side in the extending direction, the catalyst layer is partitioned by the first partition plate, the case is provided with a regeneration gas supply port configured to supply regeneration gas for regenerating the catalyst into the inside of the case, and a plurality of regeneration gas discharge ports configured to discharge the regeneration gas to the outside of the case. The purification apparatus according to claim 1, wherein the regenerating gas supply port is positioned to supply the regenerating gas to each of the catalyst layers separated by the first partition plate, and the plurality of regenerating gas discharge ports are provided to discharge the regenerating gas from each of the catalyst layers separated by the first partition plate.

4. The purification apparatus according to claim 3, wherein the partition plate is a heater.

5. The purification apparatus according to claim 1, wherein the case is cylindrical, the partition plate extends spirally in the direction in which the central axis of the case extends, a heater provided in the heating device extends inside the case along the central axis, and the partition plate has a spiral inner edge that contacts the heater.

6. The purification apparatus according to claim 5, wherein the case comprises an outer cylindrical portion and an inner cylindrical portion located inside the outer cylindrical portion, the heater is arranged along the central axis of the inner cylindrical portion, an outer annular space is defined inside the case by the outer cylindrical portion and the inner cylindrical portion, and an inner annular space is defined inside the inner cylindrical portion, the inner annular space is divided spirally around the heater by the spirally shaped partition plate, the catalyst layer is housed in the spirally divided inner annular space, the outer annular space is divided spirally around the central axis of the case by the spirally shaped partition plate, and the adsorbent layer is housed in the spirally divided outer annular space.

7. The purification apparatus according to claim 6, wherein the supply port and the discharge port are provided at either one of the ends of the case in the direction in which the central axis extends.

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