Method and system for producing milled silica and / or silicate-based material

Abstract

The present disclosure is directed to a method for producing milled silica and / or silicate-based material including: dry milling a silica and / or silicate-based material in a mill including a stationary container at least partially filled with a milling media and an agitator configured to mill the silica and / or silicate-based material disposed in the container, the silica and / or silicate-based material milled by the mill to a d90 particle size ranging from 1-15 µm, the container and / or the agitator lined with an anti-marking material such that the milled silica and / or silicate-based material has an L* of at least 80.

Description

METHOD AND SYSTEM FOR PRODUCING MILLED SILICA AND / OR SILICATE- BASED MATERIALCROSS-REFERENCE TO RELATED APPLICATION

[0001] This application claims priority to U.S. Provisional Application No.63 / 775,417, filed on March 21, 2025, the disclosure of which is hereby incorporated by reference in its entirety.BACKGROUNDField

[0002] The present disclosure relates to producing milled mineral material and, in some non-limiting embodiments or aspects, to methods and systems for producing milled silica and / or silicate-based material.Technical Considerations

[0003] Milled mineral materials, such as milled silica and / or silicate-based materials are useful in a wide variety of applications. For example, milled minerals may be used in architectural materials and / or electronics components. Milled minerals may also be useful as components of inks, paints, and / or cosmetic products.

[0004] However, reducing the mineral to the desired particle size and / or particle size distribution is a non-trivial task that can require significant energy expenditure. Moreover, the milling process to reduce the material to the desired particle size and / or particle size distribution can often undesirably discolor the material.SUMMARY

[0005] The present disclosure relates to a method for producing milled silica and / or silicate-based material including: dry milling a silica and / or silicate-based material in a mill including a stationary container at least partially filled with a milling media and an agitator configured to mill the silica and / or silicate-based material disposed in the container, the silica and / or silicate-based material milled by the mill to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an antimarking material such that the milled silica and / or silicate-based material has an L* of at least 80.

[0006] In some non-limiting embodiments or aspects, the silica and / or silicate-based material may have a Mohs hardness of from 6 to 8.

[0007] In some non-limiting embodiments or aspects, the mill may include a stirred media mill (SMM) or agitator (media) mill.

[0008] In some non-limiting embodiments or aspects, the method may further include reducing the silica and / or silicate-based material to a d90 particle size of less than 5 mm prior to the dry milling.

[0009] In some non-limiting embodiments or aspects, the silica and / or silicate-based material may include a silica-based material including at least one of the following: quartz, cristobalite, diatomaceous earth, opal, glass, and / or any combination thereof.

[0010] In some non-limiting embodiments or aspects, the silica and / or silicate-based material may include a silica-based material comprising a silica content of at least 75 wt%; and / or the silica and / or silicate-based material may include a silicate-based material comprising a silicate content of at least 75 wt%.

[0011] In some non-limiting embodiments or aspects, the silica and / or silicate-based material may include a silicate-based material including at least one of the following: feldspar, nepheline syenite, clay, perlite, talc, mica, zeolite, and / or any combination thereof.

[0012] In some non-limiting embodiments or aspects, the dry milling may be conducted in a continuous process.

[0013] In some non-limiting embodiments or aspects, the silica and / or silicate-based material may not be wet milled to form the milled silica and / or silicate-based material.

[0014] In some non-limiting embodiments or aspects, the milling media may have a particle size of at least 1 mm.

[0015] In some non-limiting embodiments or aspects, the milling media has a Mohs hardness of at least 7.

[0016] In some non-limiting embodiments or aspects, the silica and / or silicate-based material may be milled by the mill to a d90 / d10 particle size ratio of less than 5.0.

[0017] In some non-limiting embodiments or aspects, the anti-marking material may include at least one of the following: a cured resin, a polyimide, a silicone elastomer, an acrylic and / or methacrylate, a fluorinated polymer and / or copolymer, and / or any combination thereof.

[0018] In some non-limiting embodiments or aspects, the anti-marking material may include a polymeric material comprising at least one of the following: polyether etherketone (PEEK), polyoxymethylene, polyamide, epoxy, polysiloxane, polyetherimide (PEI), polycarbonate, polyurethane, and / or any combination thereof.

[0019] In some non-limiting embodiments or aspects, the anti-marking material may include at least one of the following: AI2O3, polyurethane, SiC or other carbide, nitride, and / or any combination thereof.

[0020] The present disclosure also relates to a system for producing milled silica and / or silicate-based material, the system including: a mill configured to dry mill a silica and / or silicate-based material, the mill including a stationary container at least partially filled with a milling media and an agitator configured to mill the silica and / or silicate-based material disposed in the container, the mill configured to mill the silica and / or silicate-based material to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an anti-marking material such that the milled silica and / or silicate-based material has an L* of at least 80.

[0021] In some non-limiting embodiments or aspects, the system may further include a reducer configured to reduce the silica and / or silicate-based material to a d90 particle size of less than 5 mm prior to introducing the silica and / or silicate-based material to the mill.

[0022] In some non-limiting embodiments or aspects, the system may further include a classifier configured with an adjustable rotation speed to separate the milled silica and / or silicate-based material into a first grouping having a first d90 particle size and a second grouping have a second d90 particle size larger than the first d90 particle size.

[0023] In some non-limiting embodiments or aspects, the mill may include a stirred media mill (SMM) or agitator (media) mill.

[0024] The present disclosure also relates to a milled silica and / or silicate-based material formed as described herein.

[0025] The present disclosure also relates to an architectural material including the milled silica and / or silicate-based material as described herein.

[0026] In some non-limiting embodiments or aspects, the architectural material includes an asphalt substrate to which the milled silica and / or silicate-based material is adhered.

[0027] The present disclosure also relates to a coating, an adhesive, a sealant, an elastomer, an ink, a paint, and / or a cosmetic product including the milled silica and / or silicate-based material as described herein.

[0028] The present disclosure also relates to an electronics component including the milled silica and / or silicate-based material as described herein.

[0029] The present disclosure also relates to a method for producing milled mineral including: dry milling a mineral having an L* of at least 80 and a Mohs hardness of at least 6 in a mill including a stationary container at least partially filled with a milling media and an agitator configured to mill the mineral disposed in the container, the mineral milled by the mill to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an anti-marking material such that the milled mineral maintains the L* of at least 80.

[0030] The present disclosure also includes the following clauses.

[0031] Clause 1: A method for producing milled silica and / or silicate-based material, comprising: dry milling a silica and / or silicate-based material in a mill comprising a stationary container at least partially filled with a milling media and an agitator configured to mill the silica and / or silicate-based material disposed in the container, the silica and / or silicate-based material milled by the mill to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an antimarking material such that the milled silica and / or silicate-based material has an L* of at least 80.

[0032] Clause 2: The method of clause 1 , wherein the silica and / or silicate-based material has a Mohs hardness of from 6 to 8.

[0033] Clause 3: The method of clause 1 or 2, wherein the mill comprises a stirred media mill (SMM) or agitator (media) mill.

[0034] Clause 4: The method of any of clauses 1-3, further comprising: reducing the silica and / or silicate-based material to a d90 particle size of less than 5 mm prior to the dry milling.

[0035] Clause 5: The method of any of clauses 1-4, wherein the silica and / or silicate-based material comprises a silica-based material comprising at least one of the following: quartz, cristobalite, diatomaceous earth, opal, glass, and / or any combination thereof.

[0036] Clause 6: The method of any of clauses 1-5, wherein: the silica and / or silicate-based material comprises a silica-based material comprising a silica content of at least 75 wt%; and / or the silica and / or silicate-based material comprises a silicate-based material comprising a silicate content of at least 75 wt%.

[0037] Clause 7: The method of any of clauses 1-6, wherein the silica and / or silicate-based material comprises a silicate-based material comprising at least one of the following: feldspar, nepheline syenite, clay, perlite, talc, mica, zeolite, and / or any combination thereof.

[0038] Clause 8: The method of any of clauses 1-7, wherein the dry milling is conducted in a continuous process.

[0039] Clause 9: The method of any of clauses 1-8, wherein the silica and / or silicate-based material is not wet milled to form the milled silica and / or silicate-based material.

[0040] Clause 10: The method of any of clauses 1 -9, wherein the milling media has a particle size of at least 1 mm.

[0041] Clause 11: The method of any of clauses 1-10, wherein the milling media has a Mohs hardness of at least 7.

[0042] Clause 12: The method of any of clauses 1-11, wherein the silica and / or silicate-based material is milled by the mill to a d90 / d10 particle size ratio of less than 5.0.

[0043] Clause 13: The method of any of clauses 1-12, wherein the anti-marking material comprises at least one of the following: AI2O3, polyurethane, SiC or other carbide, nitride, and / or any combination thereof.

[0044] Clause 14: The method of any of claims 1-13, wherein the anti-marking material comprises at least one of the following: a cured resin, a polyimide, a silicone elastomer, an acrylic and / or methacrylate, a fluorinated polymer and / or copolymer, and / or any combination thereof.

[0045] Clause 15: The method of any of claims 1-14, wherein the anti-marking material comprises a polymeric material comprising at least one of the following: polyether ether ketone (PEEK), polyoxymethylene, polyamide, epoxy, polysiloxane, polyetherimide (PEI), polycarbonate, polyurethane, and / or any combination thereof.

[0046] Clause 16: A system for producing milled silica and / or silicate-based material, the system comprising: a mill configured to dry mill a silica and / or silicate-based material, the mill comprising a stationary container at least partially filled with a milling media and an agitator configured to mill the silica and / or silicate-based material disposed in the container, the mill configured to mill the silica and / or silicate-based material to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitatorlined with an anti-marking material such that the milled silica and / or silicate-based material has an L* of at least 80.

[0047] Clause 17: The system of clause 16, further comprising: a reducer configured to reduce the silica and / or silicate-based material to a d90 particle size of less than 5 mm prior to introducing the silica and / or silicate-based material to the mill.

[0048] Clause 18: The system of clause 16 or 17, further comprising a classifier configured with an adjustable rotation speed to separate the milled silica and / or silicate-based material into a first grouping having a first d90 particle size and a second grouping have a second d90 particle size larger than the first d90 particle size.

[0049] Clause 19: The system of any of clauses 16-18, wherein the mill comprises a stirred media mill (SMM) or agitator (media) mill.

[0050] Clause 20: A milled silica and / or silicate-based material formed according to the method of any of clauses 1-15.

[0051] Clause 21: An architectural material comprising the milled silica and / or silicate-based material of clause 20.

[0052] Clause 22: The architectural material of clause 21, comprising an asphalt substrate to which the milled silica and / or silicate-based material is adhered.

[0053] Clause 23: A coating, an adhesive, a sealant, an elastomer, an ink, a paint, and / or a cosmetic product comprising the milled silica and / or silicate-based material of clause 20.

[0054] Clause 24: An electronics component comprising the milled silica and / or silicate-based material of clause 20.

[0055] Clause 25: A method for producing milled mineral comprising: dry milling a mineral having an L* of at least 80 and a Mohs hardness of at least 6 in a mill comprising a stationary container at least partially filled with a milling media and an agitator configured to mill the mineral disposed in the container, the mineral milled by the mill to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an anti-marking material such that the milled mineral maintains the L* of at least 80.BRIEF DESCRIPTION OF THE DRAWING

[0056] Additional advantages and details are explained in greater detail below with reference to the non-limiting, exemplary embodiments that are illustrated in the accompanying schematic figures, in which:

[0057] FIG. 1 shows a stirred media mill or agitator (media) mill for producing milled mineral material according to non-limiting embodiments or aspects of the present disclosure; and

[0058] FIG. 2 shows a system for producing milled mineral material according to non-limiting embodiments or aspects of the present disclosure.DETAILED DESCRIPTION

[0059] For purposes of the following detailed description, it is understood that the invention may assume various alternative variations and step sequences, except where expressly specified to the contrary. Moreover, other than in any operating examples, or where otherwise indicated, all numbers expressing, for example, quantities of ingredients used in the specification and claims are to be understood as being modified in all instances by the term “about”. Accordingly, unless indicated to the contrary, the numerical parameters set forth in the following specification and attached claims are approximations that may vary depending upon the desired properties to be obtained by the present invention. At the very least, and not as an attempt to limit the application of the doctrine of equivalents to the scope of the claims, each numerical parameter should at least be construed in light of the number of reported significant digits and by applying ordinary rounding techniques.

[0060] Notwithstanding that the numerical ranges and parameters setting forth the broad scope of the invention are approximations, the numerical values set forth in the specific examples are reported as precisely as possible. Any numerical value, however, inherently contains certain errors necessarily resulting from the standard variation found in its respective testing measurement.

[0061] Also, it should be understood that any numerical range recited herein is intended to include all sub-ranges subsumed therein. For example, a range of “1 to 10” is intended to include all sub-ranges between (and including) the recited minimum value of 1 and the recited maximum value of 10, that is, having a minimum value equal to or greater than 1 and a maximum value of equal to or less than 10.

[0062] In this application, the use of the singular includes the plural and plural encompasses singular, unless specifically stated otherwise. In addition, in this application, the use of “or” means “and / or” unless specifically stated otherwise, even though “and / or” may be explicitly used in certain instances. Further, in this application, the use of “a” or “an” means “at least one” unless specifically stated otherwise.

[0063] As used herein, the transitional term “comprising” (and other comparable terms, e.g., “containing” and “including”) is “open-ended” and open to the inclusion of unspecified matter. Although described in terms of “comprising”, the terms “consisting essentially of” and “consisting of’ are also within the scope of the disclosure.

[0064] The present disclosure is directed to a method for producing milled silica and / or silicate-based material, comprising: dry milling a silica and / or silicate-based material in a mill comprising a stationary container at least partially filled with a milling media and an agitator configured to mill the silica and / or silicate-based material disposed in the container, the silica and / or silicate-based material milled by the mill to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an anti-marking material such that the milled silica and / or silicate-based material has an L* of at least 80.

[0065] The present disclosure is also directed to a system for producing milled silica and / or silicate-based material, the system comprising: a mill configured to dry mill a silica and / or silicate-based material, the mill comprising a stationary container at least partially filled with a milling media and an agitator configured to mill the silica and / or silicate-based material disposed in the container, the mill configured to mill the silica and / or silicate-based material to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an anti-marking material such that the milled silica and / or silicate-based material has an L* of at least 80.

[0066] The present disclosure is also directed to a method for producing milled mineral comprising: dry milling a mineral having an L* of at least 80 and a Mohs hardness of at least 6 in a mill comprising a stationary container at least partially filled with a milling media and an agitator configured to mill the mineral disposed in the container, the mineral milled by the mill to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an anti-marking material such that the milled mineral has an L* of at least 80.

[0067] In some non-limiting embodiments or aspects, a milled silica and / or silicate-based material may be produced. The produced mineral may comprise a milled silica-based material. The produced mineral may comprise a milled silicate-based material. The produced mineral may comprise a combination of a milled silica-based material and a milled silicate-based material.

[0068] The silica-based material may comprise at least one of the following: quartz, cristobalite, diatomaceous earth, opal, glass, and / or any combination thereof.Cristobalite may refer to a sand-based material that converts into cristobalite upon kilning. Cristobalite may be a crystalline polymorph of silica. For example, cristobalite may be produced by firing quartz at a temperature of at least 1000°C, such as from 1000°C-1600°C for a suitable amount of time. In some non-limiting embodiments or aspects, the silica-based material may comprise quartz and / or cristobalite.

[0069] In some non-limiting embodiments or aspects, the milled material comprises a silica-based material and may comprise a silica content of at least 75 wt%, based on total weight of the milled material, such as at least 80 wt%, at least 85 wt%, at least 90 wt%, at least 95 wt%, or 100 wt%. The silica-based material may be substantially free of silicate-based material, such as containing less than 5 wt% of silicate-based material, based on total weight of the milled material, such as free of silicate-based material (0 wt%).

[0070] The silicate-based material may comprise at least one of the following: feldspar, nepheline syenite, clay, asbestos, perlite, talc, mica, zeolite, and / or any combination thereof. In some non-limiting embodiments or aspects, the silica-based material may comprise a feldspar material.

[0071] In some non-limiting embodiments or aspects, the milled material comprises a silicate-based material and may comprise a silicate content of at least 75 wt%, based on total weight of the milled material, such as at least 80 wt%, at least 85 wt%, at least 90 wt%, at least 95 wt%, or 100 wt%. The silicate-based material may be substantially free of silica-based material, such as containing less than 5 wt% of silica-based material, based on total weight of the milled material, such as free of silica-based material (0 wt%).

[0072] The silica and / or silicate-based material may have a Mohs hardness of at least 6, such as at least 7. The silica and / or silicate-based material may have a Mohs hardness of from 6 to 8, such as from 6 to 7 or from 7 to 8. Mohs hardness of a material may be determined by the Mohs hardness test.

[0073] Referring to FIG. 1 , in some non-limiting embodiments or aspects, a mineral based material (e.g., the silica and / or silicate-based material) may be milled by a mill 10. Mill 10 may comprise a stirred media mill (SMM) or agitator (media) mill. Mill 10 may comprise a container 12. Container 12 may be configured to contain an agitator 14, a milling media 16, and the material to be milled. The container 12 may be a stationary container. The stationary container 12 may not move and / or rotate to mill the material with milling media 16. Instead, the material may be milled in stationarycontainer 12 by agitator 14 moving (e.g., stirring) milling media 16 and the material to mill the material.

[0074] Mill 10 may comprise any suitable agitator 14 to move the milling media 16 and the material to cause milling media 16 to mill the material. Agitator 14 may rotate, swing, stir, and / or otherwise move to cause milling of the material. Agitator 14 may comprise a screw, a stirrer, a paddle, and / or other type of device configured to cause milling of the material. Mill 10 may further comprise a motor 15 connected to agitator 14. Motor 15 may be configured to cause agitator 14 to move or stop moving to mill or cease milling. User may control motor 15 (e.g., using a controller (not shown)) to initiate or terminate the milling process.

[0075] With continued reference to FIG. 1, container 12 may contain milling media 16 therein. Milling media 16 may be any material suitable for milling the material to be milled when stirred therewith by agitator 14.

[0076] Milling media 16 may be in the form of beads and / or particles. Milling media 16 may have an average particle size of at least 1 mm, such as at least 5 mm, as reported by the milling media manufacturer. Milling media 16 may have an average particle size of from 1 to 20 mm, such as from 5 to 20 mm, 5 to 15 mm, or 5 to 10 mm.

[0077] Milling media 16 may have a Mohs hardness equal to or higher than the material to be milled. For example, milling media 16 may be harder than the material to be milled based on Mohs hardness. Milling media 16 may have a hardness of at least 7. For example, milling media 16 may have a Mohs hardness of at least 8, such as at least 9. The milling media 16 may have a Mohs hardness of from 8 to 10, such as from 8 to 9 or from 9 to 10. Mohs hardness of a material may be determined by the Mohs hardness test. The Mohs hardness of the milling media may be harder than the material being milled, such as having a Mohs hardness harder than silica and / or silicate when silica and / or silicate is the material being milled.

[0078] Non-limiting examples of suitable material for use as milling media 16 include steels, polymers, and / or ceramics, such as yttria-stabilized zirconium oxide (YSZ), zirconia oxides (ZrCh), zirconia silicates, alumina (AI2O3), silicon carbide (SiC) or other carbide, nitride, polyurethane, and the like.

[0079] With continued reference to FIG. 1, mill 10 may comprise a feed 18 and an output 20. Feed 18 may be in fluid communication with container 12 and be configured to flow material to be milled into container 12. Output 20 may be in fluid communication with container 12 and be configured to flow material milled in container 12 fromcontainer 12. Milling media 16 may remain in container 12 such that it is the material to be milled that enters the feed 18 and milled material that exits the output 20.

[0080] The material to be milled may be dry milled by mill 10. Drying milling may be performed by mill 10 using less than 5 wt% liquid additives, based on the mass flow rate of the feed to mill 10, in the milling process. In some non-limiting embodiments or aspects, dry milling may be performed by mill 10 without using any liquids (0 wt%) in the milling process. The material may not be wet milled by mill 10 or any other step in the production of the milled material.

[0081] In some non-limiting embodiments or aspects, mill 10 may dry mill the material to be milled in a continuous process. In the continuous process, material to be milled may be continuously flowed via feed 18 into container 12, which may continuously dry mill the material with agitator 14 and milling media 16, and the milled material may be continuously removed from container via output 20. The drying milling may not be done in a batch process.

[0082] The material dry milled by mill 10 may exit output 20. The milled material may have a d90 particle size ranging from 1 to 15 pm, such as from 1 to 10 pm or from 1 to 5 pm. The d90 particle size range may be achieved after the material exits output 20 and is processed by a classifier (see e.g., FIG. 2, classifier 108). Particle size measurements (e.g., d5, d50, d90, d95) may be determined by laser diffraction and / or dynamic image analysis.

[0083] The milled material may have a narrow particle size distribution as defined by a d90 / d10 and / or a d95 / d5 particle size ratio. The d90 / d10 particle size ratio for the milled material may be less than 5.0. The d95 / d5 particle size ratio for the milled material may be less than 8.0, such as less than 6.0. The particle size ratios achieved by mill 10 being an SMM or agitator (media) mill may be advantageously narrower compared to the same process except using a ball mill in which the container is not stationary but is rotated to mill the material.

[0084] With continued reference to FIG. 1, container 12 and / or agitator 14 may be lined by an anti-marking material 22. For example, an inner wall, a bottom, and / or a top of container 12 may be lined by anti-marking material 22. For example, a surface of agitator 14 may be lined by anti-marking material 22. A surface of container 12 and / or agitator 14 that contacts the material to be milled during the milling process may be lined by anti-marking material 22.

[0085] Anti-marking material 22 may comprise a material having a same or harder Mohs hardness compared to the milled material. Anti-marking material 22 may comprise a coating (e.g. liquid and / or powder), a film, a tape, and / or any combination thereof. Anti-marking material 22 may comprise a refractory material secured (e.g., cemented) into container 12, such as a brick or tile of anti-marking material 22. Container 12 and / or agitator 14 itself may be made from anti-marking material 22.

[0086] Non-limiting examples of suitable anti-marking material 22 include at least one of the following: AI2O3, polyurethane, SiC or other carbide, nitride, zirconia oxide, yttria-stabilized zirconium oxide, cured resins (e.g., epoxy and / or phenolic), polyimides, silicone elastomers, acrylics and / or methacrylates, fluorinated polymers and / or copolymers, and / or any combination thereof. Anti-marking material 22 may include a polymeric material, such as polyether ether ketone (PEEK), polyoxymethylene (Acetal), polyamide (e.g., Nylon), epoxy, polysiloxane, polyetherimide (PEI), polycarbonate, polyurethane (e.g., polyester-based polyurethane, polyether-based polyurethane), and / or any combination thereof. Antimarking material 22 may be selected so as not to contaminate the milled material.

[0087] Anti-marking material 22 may be selected to avoid marking and / or otherwise discoloring the material to be milled. Anti-marking material 22 may be a sacrificial layer configured to prevent the material being milled from coming into contact with metal (e.g., steel) components of the system that would easily mark the milled material. Container 12 and / or agitator 14 may be lined with anti-marking material 22 selected such that the material (e.g., milled silica and / or silicate-based material) has (and / or maintains) an L* of at least 80, such as at least 85, at least 90, or at least 95. L* may refer to a value in CIELAB Colorspace as measured using a colorimeter.

[0088] With continued reference to FIG. 1, in some non-limiting embodiments or aspects, prior to entering feed 18 (e.g., prior to dry milling), the material to be milled (e.g., silica and / or silicate-based material) may be reduced in particle size by a reducer 24 to a d90 particle size of less than 5mm. Mill 10 may then further reduce the size of the material having the d90 particle size of less than 5mm to the milled material having the d90 particle size ranging from 1 to 15 pm. Reducer 24 may comprise any device suitable to render the material to a size less than 5 mm, such as a crusher or a mill. Mill may comprise a ball mill or an SMM or agitator (media) mill. Reducer 24 may not wet mill the material.

[0089] Referring to FIG. 2, a system 100 is shown for producing milled mineral material according to non-limiting embodiments or aspects of the present disclosure. In system 100, mill 106 may correspond to mill 10 from FIG. 1 and include the same or similar features thereto as described herein.

[0090] System 100 may comprise reducer 24 including the same or similar features thereto as described in FIG. 1. In some non-limiting embodiments or aspects, reducer 24 may reduce the particle size of the feed material to have a d90 particle size of less than 5mm. Reducer 24 may flow its material to mill 106 to be milled as described herein by mill 106.

[0091] With continued reference to FIG. 2, mill 106 may dry mill the mineral material to be milled as described herein. Mill 106 may produce a milled mineral material (e.g., milled silica and / or silicate-based material) which may be processed to a d90 particle size ranging from 1-15 pm by mill 106 in combination with classifier 108, the milled material having an L* of at least 80. Mill 106 may comprise an SMM or agitator (media) mill.

[0092] Output from mill 106 (e.g., the milled mineral material) may be flowed to classifier 108. Classifier 108 may be configured to further separate the milled mineral material by one or more properties. For example, classifier 108 may be configured to further separate the milled mineral material by particle size. Classifier 108 may be configured to further separate the milled mineral material by particle size by rotating the material, which rotation causes the material of different particle sizes to separate.

[0093] Classifier 108 may comprise an adjustable rotation speed. In some nonlimiting embodiments or aspects, mill 106 may mill the material, and the milled material may have some material having a particle size less than or equal to a threshold and some materials having a particle size greater than the threshold. The threshold may be of a size selected by a user, such as the threshold being 15 pm. The adjustable rotation speed may enable classifier 108 to separate the milled mineral material into a first grouping (the material having a particle size less than or equal to the threshold) and a second group (the material having a particle size greater than the threshold). First grouping may have a first d90 particle size, and second grouping may have a second d90 particle size larger than the first d90 particle size. Adjusting the rotation speed of classifier 108 may change the size range of particles contained in the first and / or second grouping. The rotation speed of classifier 108 may be adjusted based on the desired particle size of the final product.

[0094] In some non-limiting embodiments or aspects, first grouping having the smaller d90 particle size may be flowed to product 110 for collecting the milled product. Second grouping having the larger d90 particle size may be recirculated to mill 106 by flowing the second grouping of material to inlet of mill 106 for further milling.

[0095] In some non-limiting embodiments or aspects, the milled material in the second grouping may be recirculated through the combination of mill 106 and classifier 108 one or more additional times prior to attaining the size of the desired product (e.g., the first grouping), at which time the milled material flows to product 110. For example, the milled material may be circulated through the combination of mill 106 and classifier 2-8 times before attaining the desired size and flowing to product 110.

[0096] Product 110 may be the region of system 100 in which final products collection occurs. At product 110, the milled mineral material may be the product mineral material used for specific applications. In some non-limiting embodiments or aspects, the product material may be packaged at product 110. The product mineral material may comprise a milled silica and / or silicate-based material.

[0097] The product milled mineral material may be used for any suitable application. For example, the milled mineral material be used to prepare an architectural material comprising the milled mineral material. The architectural material may comprise a roofing material or other building material. The architectural material may be positioned in an outdoor environment.

[0098] The roofing material may be formed by using the milled mineral material as a component of a granular composition and applying the granular composition to an asphalt layer to adhere the granular composition thereto. The asphalt layer may comprise bitumen or modified bitumen, modified with at least one reinforcing material, such as polyester or fiberglass. Such roofing material having the milled mineral material (e.g., a reflective material) applied to an asphalt layer may constitute a cool roof system.

[0099] In some non-limiting embodiments or aspects, the milled mineral material may be applied to the asphalt layer to adhere the milled mineral material thereto. Subsequently, further milled mineral material may be applied to the asphalt layer to adhere the further milled mineral material thereto. The further milled mineral material may have a smaller average particle size compared to the milled mineral material. The application of the further milled mineral material having a smaller average particle size (being finer in particle size) over the milled mineral material (being coarser inparticle size) may result in better coverage over the asphalt layer by milled mineral material, due to the smaller further milled mineral material filling in the gaps over the asphalt layer left by the initial application of the larger milled mineral material. Thus, the roofing material as a whole may have a higher total solar reflectance (TSR) compared to a roofing material using only a single layer of the coarser milled mineral material.

[0100] For example, the milled mineral material may be used as a component in at least one of the following: a coating, an adhesive, a sealant, an elastomer, an ink, a paint, a cosmetic product, and / or any combination thereof.

[0101] For example, the milled mineral material be used in electronics components. For example, the milled material may be used as filler for electrical components that require good dielectric properties or an insulator to isolate electronic components on a chip, and / or a structural layer in micromachining. The milled material being a silica-based material may be used to produce silicon wafers. The milled material being a silica-based material may be used to produce fiber optic cables for high speed data transmission.

[0102] In some non-limiting embodiments, the method for producing the milled mineral may comprise dry milling a mineral having an L* of at least 80 and a Mohs hardness of at least 6 in a mill, such as mill 10. The mineral may be dry milled by mill 10 to a d90 particle size ranging from 1 to 15 pm, and container 12 and / or the agitator 14 may be lined with anti-marking material 22 such that the milled mineral has an L* of at least 80. Such method may include any of the other features as previously described.EXAMPLES

[0103] The following examples are presented to demonstrate the general principles of the disclosure. The disclosure should not be considered to be limited to the specific examples presented.Examples 1-2

[0104] A cristobalite material was dry milled in Example 1 using a stirred media mill and according to the mill shown and described in connection with FIG. 1. The same cristobalite material was dry milled in Comparative Example 2 except using a ball millin place of the stirred media mill. The conditions of the dry milling are shown in Table 1.Table 1Millin gMedi Ener Max Chamb Rotati Media a gy Extern er on Media Materi Char Product (kW- al Mill Volum Speed Materi al ge Through h / ton Temp Type e (L) (RPM) al (mm) (kg) put (kg / h) ) (°F) Stirre Yttria- d stabilizMedi edEx 1 a Mill -50 415 ZrO26 75 37 202 190 Comp Ex Ball2 Mill -1830 30 AI2O3 11-40 975 30 232 95

[0105] The particle size and particle size distribution and L* from the dry milling operations is reported in Table 2.Table 2d90 (pm) d50 (pm) d10 (pm) d90 / d10 d95 / d5 L* Ex 1 4.8 2.6 1.2 4.0 5.9 97.7 Comp Ex 2 4.8 2.3 0.9 5.2 8.5 97.6

[0106] As shown in Tables 1 and 2, in at least some instances, a narrower particle size distribution was achieved using the stirred media mill of Example 1 compared to the ball mil of Example 2. Moreover, the milling energy used by the stirred media mill was comparatively reduced.Examples 3-4

[0107] A quartz material was dry milled in Example 3 using a stirred media mill and according to the mill shown and described in connection with FIG. 1. The same quartz material was dry milled in Comparative Example 4 except using a ball mill in place of the stirred media mill. The conditions of the dry milling are shown in Table 3.Table 3Media Media ProductMill Chamb Rotati 0 Materia Media Charg Throughp MillingType er n I Materie(kg) ut (kg / h) EnergyVolume Speed al (kW- (L) (RPM) (mm) h / ton) Stirred Yttria- Media stabilizEx 3 Mill -50 415 ed ZrC>2 6 75 25.4 323.0 Comp BallEx 4 Mill -1830 30 AI2O3 11-40 975 16.4 498.3

[0108] The particle size and L* from the dry milling operations is reported in Table 4.Table 4d90 (pm) d50 (pm) d10 (pm) L*Ex 3 3.9 1.5 0.7 93.3 Comp Ex 4 3.7 1.7 0.7 93.4

[0109] As shown in Tables 3 and 4, the milling energy used by the stirred media mill was comparatively reduced.

[0110] It will be readily appreciated by those skilled in the art that modifications may be made to the invention without departing from the concepts disclosed in the foregoing description. Accordingly, the particular embodiments described in detail herein are illustrative only and are not limiting to the scope of the invention, which is to be given the full breadth of the appended claims and any and all equivalents thereof.

Claims

WHAT IS CLAIMED IS1. A method for producing milled silica and / or silicate-based material, comprising:dry milling a silica and / or silicate-based material in a mill comprising a stationary container at least partially filled with a milling media and an agitator configured to mill the silica and / or silicate-based material disposed in the container, the silica and / or silicate-based material milled by the mill to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an antimarking material such that the milled silica and / or silicate-based material has an L* of at least 80.

2. The method of claim 1, wherein the silica and / or silicate-based material has a Mohs hardness of from 6 to 8.

3. The method of claim 1 or 2, wherein the mill comprises a stirred media mill (SMM) or agitator (media) mill.

4. The method of any of claims 1 -3, further comprising: reducing the silica and / or silicate-based material to a d90 particle size of less than 5 mm prior to the dry milling.

5. The method of any of claims 1 -4, wherein the silica and / or silicate-based material comprises a silica-based material comprising at least one of the following: quartz, cristobalite, diatomaceous earth, opal, glass, and / or any combination thereof.

6. The method of any of claims 1 -5, wherein:the silica and / or silicate-based material comprises a silica-based material comprising a silica content of at least 75 wt%; and / orthe silica and / or silicate-based material comprises a silicate-based material comprising a silicate content of at least 75 wt%.

7. The method of any of claims 1 -6, wherein the silica and / or silicate-based material comprises a silicate-based material comprising at least one of the following: feldspar, nepheline syenite, clay, asbestos, perlite, talc, mica, zeolite, and / or any combination thereof.

8. The method of any of claims 1-7, wherein the dry milling is conducted in a continuous process.

9. The method of any of claims 1 -8, wherein the silica and / or silicate-based material is not wet milled to form the milled silica and / or silicate-based material.

10. The method of any of claims 1 -9, wherein the milling media has a particle size of at least 1 mm.

11. The method of any of claims 1 -10, wherein the milling media has a Mohs hardness of at least 7.

12. The method of any of claims 1-11, wherein the anti-marking material comprises at least one of the following: AI2O3, polyurethane, SiC or other carbide, nitride, and / or any combination thereof.

13. The method of any of claims 1-12, wherein the anti-marking material comprises at least one of the following: a cured resin, a polyimide, a silicone elastomer, an acrylic and / or methacrylate, a fluorinated polymer and / or copolymer, and / or any combination thereof.

14. The method of any of claims 1-13, wherein the anti-marking material comprises a polymeric material comprising at least one of the following: polyether ether ketone (PEEK), polyoxymethylene, polyamide, epoxy, polysiloxane, polyetherimide (PEI), polycarbonate, polyurethane, and / or any combination thereof.

15. A system for producing milled silica and / or silicate-based material, the system comprising:a mill configured to dry mill a silica and / or silicate-based material, the mill comprising a stationary container at least partially filled with a milling media and an agitator configured to mill the silica and / or silicate-based material disposed in the container,the mill configured to mill the silica and / or silicate-based material to a d90 particle size ranging from 1 to 15 pm,the container and / or the agitator lined with an anti-marking material such that the milled silica and / or silicate-based material has an L* of at least 80.

16. The system of claim 15, further comprising:a reducer configured to reduce the silica and / or silicate-based material to a d90 particle size of less than 5 mm prior to introducing the silica and / or silicate-based material to the mill.

17. The system of claim 15 or 16, further comprising a classifier configured with an adjustable rotation speed to separate the milled silica and / or silicate-based material into a first grouping having a first d90 particle size and a second grouping have a second d90 particle size larger than the first d90 particle size.

18. The system of any of claims 15-17, wherein the mill comprises a stirred media mill (SMM) or agitator (media) mill.

19. A milled silica and / or silicate-based material formed according to the method of any of claims 1 -14.

20. An architectural material comprising the milled silica and / or silicate-based material of claim 19.

21. The architectural material of claim 20, comprising an asphalt substrate to which the milled silica and / or silicate-based material is adhered.

22. A coating, an adhesive, a sealant, an elastomer, an ink, a paint, and / or a cosmetic product comprising the milled silica and / or silicate-based material of claim 21.

23. An electronics component comprising the milled silica and / or silicate-based material of claim 21.

24. A method for producing milled mineral comprising:dry milling a mineral having an L* of at least 80 and a Mohs hardness of at least 6 in a mill comprising a stationary container at least partially filled with a milling media and an agitator configured to mill the mineral disposed in the container,the mineral milled by the mill to a d90 particle size ranging from 1 to 15 pm, the container and / or the agitator lined with an anti-marking material such that the milled mineral maintains the L* of at least 80.

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