Display panel and display device

Abstract

The present disclosure provides a display panel and a display device, the display panel comprising: a base substrate; a planarization layer, located on one side of the base substrate; a pixel defining layer, located on the side of the planarization layer facing away from the base substrate and comprising a plurality of first openings spaced apart from each other; and a padding layer, located on the side of the pixel defining layer close to the planarization layer, wherein an orthographic projection of the padding layer on the base substrate is located in peripheral areas of orthographic projections of the first openings on the base substrate, and the orthographic projection of the padding layer on the base substrate overlaps with an orthographic projection of the defining layer on the base substrate. The pixel defining layer comprises a first part and a second part, an orthographic projection of the first part on the base substrate is located within an orthographic projection on the base substrate of the surface of the side of the padding layer facing away from the base substrate, and the second part is located on the sides of the padding layer facing away from the first openings, the thickness of the first part being less than the thickness of the second part.

Description

Display panel and display device

[0001] Cross-referencing of related applications:

[0002] This application claims priority to Chinese Patent Application No. 202510370391.4, filed on March 26, 2025, entitled “Display Panel and Display Device”, the entire contents of which are incorporated herein by reference. Technical Field

[0003] This disclosure relates to the field of display technology, and in particular to a display panel and a display device. Background Technology

[0004] In the field of optoelectronic display technology, organic light-emitting diodes (OLEDs) have many advantages such as active light emission, high brightness, high contrast, ultra-thinness, low power consumption, flexibility, and wide operating temperature range. They are an advanced new mainstream flat panel display technology.

[0005] Overview

[0006] In a first aspect, a display panel is provided, comprising:

[0007] Substrate;

[0008] A planarization layer is located on one side of the substrate.

[0009] A pixel defining layer, located on the side of the planarization layer opposite to the substrate, includes a plurality of spaced-apart first openings;

[0010] The padding layer is located on the side of the pixel defining layer close to the planarization layer. The orthographic projection of the padding layer on the substrate is located in the peripheral area of ​​the orthographic projection of the first opening on the substrate. The orthographic projection of the padding layer on the substrate overlaps with the orthographic projection of the defining layer on the substrate.

[0011] The pixel defining layer includes a first part and a second part. The orthographic projection of the first part onto the substrate is located within the orthographic projection of the surface of the pad layer on the side away from the substrate onto the substrate. The second part is located on the side of the pad layer away from the first opening.

[0012] The thickness of the first part is less than the thickness of the second part.

[0013] For example, the display panel further includes a first electrode layer, the first electrode layer including a first electrode region and a second electrode region located around the first electrode region, the orthographic projection of the first electrode region on the substrate overlaps with the orthographic projection of the first opening on the substrate;

[0014] Wherein, the thickness of the second electrode region is greater than the thickness of the first electrode region, and the padding layer includes the second electrode region; and / or, the padding layer is located on the side of the second electrode region away from the substrate.

[0015] For example, the material of the padding layer includes polystyrene-based plastics.

[0016] For example, the thickness of the first portion is 10% to 60% of the thickness of the second portion.

[0017] For example, the thickness of the first portion is less than the maximum thickness of the padding layer.

[0018] For example, the thickness of the first portion is 0.7 to 0.9 μm, and the thickness of the second portion is 0.9 μm to 1.5 μm.

[0019] For example, the padding layer includes a surface facing away from the substrate, and a first sidewall and a second sidewall connected to the surface, the first sidewall being close to the first opening;

[0020] The slope angle of the first sidewall is 45-80°, and the slope angle of the sidewall of the first part near the first opening is 45-80°.

[0021] For example, the padding layer includes a surface facing away from the substrate, and a first sidewall and a second sidewall connected to the surface, wherein the first sidewall is close to the first opening and the second sidewall faces away from the first opening;

[0022] The pixel defining layer does not include the portion located on the first sidewall.

[0023] For example, the pixel defining layer is located near the boundary of the first opening in the orthographic projection on the substrate, and the surface of the pad layer on the side facing away from the substrate is located in the orthographic projection on the substrate.

[0024] For example, the display panel further includes a light-emitting element, the light-emitting element comprising:

[0025] The first electrode layer is located on one side of the substrate and includes first electrode regions corresponding to the plurality of first openings respectively. The orthographic projection of the first electrode region on the substrate overlaps with the orthographic projection of the first opening on the substrate.

[0026] The light-emitting layer is located on the side of the first electrode layer that is away from the substrate.

[0027] The second electrode layer is located on the side of the light-emitting layer that is away from the substrate.

[0028] A light-shielding layer is located on the side of the second electrode layer opposite to the substrate, and the light-shielding layer includes a second opening corresponding to the first opening;

[0029] A color conversion layer is located at the second opening, and the orthographic projection of the color conversion layer on the substrate at least partially overlaps with the orthographic projection of the light-emitting layer on the substrate.

[0030] For example, the orthographic projection of the light-shielding layer on the substrate is located within the orthographic projection of the pixel defining layer on the substrate.

[0031] For example, the orthographic projection of the light-shielding layer on the substrate does not overlap with the orthographic projection of the padding layer on the substrate; or, the orthographic projection of the light-shielding layer on the substrate partially overlaps with the orthographic projection of the padding layer on the substrate.

[0032] For example, the padding layer includes a first boundary near the first opening, the light-shielding layer includes a second boundary near the second opening, and the distance between the orthographic projections of the first boundary and the second boundary on the substrate is less than or equal to 6 μm.

[0033] For example, the padding layer includes a third boundary away from the first opening, the light-shielding layer includes a second boundary near the second opening, and the distance between the orthographic projections of the third boundary and the second boundary on the substrate is 0.5 μm to 4 μm.

[0034] For example, in the direction of the padding layer toward the first opening, the size of the padding layer is less than or equal to 6 μm.

[0035] A second aspect of this disclosure provides a display device including the display panel described in any exemplary embodiment of the first aspect.

[0036] The publicly available display panel includes a substrate, a planarization layer, a pixel defining layer, and a padding layer. The pixel defining layer includes a first opening. The padding layer is located in the peripheral area of ​​the first opening and is located on the side of the pixel defining layer closest to the substrate, overlapping with the pixel defining layer. This raises the peripheral area of ​​the first opening. The pixel defining layer may include a first portion on the padding layer and a second portion on the side of the padding layer opposite to the first opening. Because the peripheral area of ​​the first opening is raised, the thickness of the pixel defining layer above the padding layer can be reduced. After the pixel defining layer is thinned, the slope of the sidewall of the pixel defining layer near the first opening can be increased. In this way, when the display panel is displayed in a dark state, the reflection of external light by the sidewall of the first opening (i.e., the sidewall of the pixel defining layer) can be reduced, and the divergence of reflected light at the sidewall of the first opening can be avoided, thereby preventing the formation of a diffraction aperture and improving display quality.

[0037] The above description is merely an overview of the technical solution disclosed herein. In order to better understand the technical means of this disclosure and to implement it in accordance with the contents of the specification, and to make the above and other objects, features and advantages of this disclosure more apparent and understandable, specific embodiments of this disclosure are described below.

[0038] Brief description of the attached diagram

[0039] To more clearly illustrate the technical solutions in the embodiments or related technologies of this disclosure, the accompanying drawings used in the description of the embodiments or related technologies will be briefly introduced below. Obviously, the accompanying drawings described below are some embodiments of this disclosure. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort. It should be noted that the scale in the drawings is for illustration only and does not represent the actual scale.

[0040] Figure 1 shows a top view of the display panel of this embodiment;

[0041] Figure 2a shows a schematic cross-sectional structure of the first electrode layer;

[0042] Figure 2b shows a top view of the first electrode layer and the pixel defining layer;

[0043] Figures 3a and 3b show schematic cross-sectional structures between the padding layer and the pixel delimiting layer, respectively.

[0044] Figures 4-7 show schematic diagrams of the cross-sectional structure of four display panels along line AA' in Figure 1;

[0045] Figures 8-11 show schematic cross-sectional structures of several first electrode layers;

[0046] Figure 12 shows a planar schematic diagram of the pixel defining layer and the padding layer;

[0047] Figures 13 and 14 show schematic diagrams of several light-shielding layers, pixel-defining layers, and padding layers.

[0048] Detailed description

[0049] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. Based on the embodiments of this disclosure, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this disclosure.

[0050] In this specification, "electrical connection" and "coupling" include situations where components are connected together by elements that have some electrical function. There are no particular limitations on what constitutes an "electrical function," as long as it allows for the transmission and reception of electrical signals between the connected components. Examples of "electrical functions" include not only electrodes and wiring, but also switching elements such as transistors, resistors, inductors, capacitors, and other components with various functions.

[0051] In this specification, "parallel" refers to the state where the angle formed by two straight lines is greater than or equal to -10° and less than 10°, and therefore also includes the state where the angle is greater than or equal to -5° and less than 5°. Similarly, "perpendicular" refers to the state where the angle formed by two straight lines is greater than or equal to 80° and less than 100°, and therefore also includes the state where the angle is greater than or equal to 85° and less than 95°.

[0052] Unless the context otherwise requires, throughout the specification and claims, the term "comprising" is interpreted as open and encompassing, that is, "including, but not limited to".

[0053] In this application, "same layer" refers to the relationship between multiple film layers formed from the same material after undergoing the same step (e.g., a patterning process). "Same layer" here does not always mean that multiple film layers have the same thickness or the same height in a cross-sectional view. The polygons used in this specification are not strictly defined; they can be approximate triangles, parallelograms, trapezoids, pentagons, or hexagons, and may have minor deformations due to tolerances.

[0054] In the embodiments of this application, since the source and drain of the transistor are symmetrical, their source and drain can be interchanged. In the embodiments of this application, one of the source and drain of the transistor can also be called the first electrode, and the other of the source and drain can be called the second electrode.

[0055] In OLED display panels, with the widespread application of OLED products and the increasing demand for perfect display effects, COE (Color On Encapsulation, depolarized screen technology), which effectively reduces power consumption and comprehensively improves color, is increasingly being used in products. COE technology consists of BM, R / G / B color filters, and O / C cover layer (used to flatten the surface). COE technology increases the screen's reflectivity in dark conditions, and this increased reflectivity creates a diffraction pattern due to the reflection of external light.

[0056] In view of this, the present disclosure provides a display panel and a display device. The display panel reduces the thickness of the portion of the pixel defining layer located in the peripheral area of ​​the first opening by raising the peripheral area of ​​the first opening. The reduced thickness can increase the slope of the sidewall of the pixel defining layer at the first opening, thereby avoiding diffraction caused by the divergence of reflected light when external light is reflected at this sidewall.

[0057] The display panel of the present disclosure embodiment will now be described by way of example with reference to the accompanying drawings.

[0058] In one embodiment, a display panel is provided. Referring to Figures 1, 3a, 3b, and 4-7, Figure 1 shows a top plan view of the display panel of this embodiment; Figures 3a and 3b show cross-sectional structural diagrams of the padding layer; and Figures 4-7 show cross-sectional structural diagrams of four different display panels along line AA' in Figure 1. As shown in the figures above, the display panel in this embodiment may include:

[0059] Substrate 11;

[0060] Planarization layer 12 is located on one side of substrate 11;

[0061] The pixel defining layer 13 is located on the side of the substrate 12 away from the substrate 11 and includes a plurality of spaced-apart first openings 31.

[0062] The padding layer 29 is located on the side of the pixel defining layer 13 close to the substrate 11. The orthographic projection of the padding layer 29 on the substrate 11 is located in the peripheral area of ​​the orthographic projection of the first opening 31 on the substrate 11. The orthographic projection of the padding layer 29 on the substrate 11 overlaps with the orthographic projection of the defining layer 13 on the substrate.

[0063] The pixel defining layer 13 includes a first part 13a and a third part 13b. The orthographic projection of the first part 13a on the substrate is located on the surface of the pad layer 29 away from the substrate 11 and is within the orthographic projection on the substrate 11. The third part 13b is located on the side of the pad layer 29 away from the first opening 31.

[0064] The thickness of the first part 13a is less than the thickness of the third part 13b.

[0065] As shown in Figure 1, the substrate 11 can be a driving substrate. The substrate 11 can include a display area and a non-display area. The non-display area can partially or completely surround the display area. The display area can include multiple sub-pixel areas P, and the multiple sub-pixel areas P can be arranged in an array.

[0066] Each sub-pixel region P can be provided with a light-emitting element. In the thickness direction y of the substrate 11, the light-emitting element can include an anode, a cathode, and a light-emitting layer 28 located between the anode and the cathode.

[0067] The substrate 11 may include multiple pixel driving circuits, which may be located in the display area. Each pixel driving circuit corresponds to a sub-pixel area. The pixel driving circuit may include a capacitor and at least one thin-film transistor. For example, the pixel driving circuit may include two transistors and one capacitor (2T1C); or, it may include four transistors and two capacitors (4T2C); or, it may include five transistors and two capacitors (5T2C); or, it may include six transistors and two capacitors (6T1C); or, it may include seven transistors and one capacitor (7T1C); or, it may include eight transistors and one capacitor (8T1C).

[0068] In the case where the pixel driving circuit includes multiple thin-film transistors, the multiple thin-film transistors may include driving transistors connected to the anode of the light-emitting element.

[0069] The substrate 11 may further include a gate driving circuit GOA, which may be located in the non-display area and may be connected to multiple pixel driving circuits in the display area to provide gate driving signals to the pixel driving circuits.

[0070] In some examples, the substrate 11 can be applied to an AMOLED panel (Active-matrix organic light-emitting diode) of LTPS (Low Temperature Poly-Silicon)-TFT or an AMOLED panel of IGZO (Indium Gallium Zinc Oxide)-TFT.

[0071] As shown in Figures 4-7, a planarization layer 12 may also be included on one side of the substrate 11. The surface of the planarization layer 12 facing away from the substrate 11 can be a flat surface. The orthographic projection of the planarization layer 12 on the substrate 11 can cover the display area and the non-display area.

[0072] As shown in Figures 4-7, the pixel defining layer 13 can be located on the side of the planarization layer 12 facing away from the substrate 11. The pixel defining layer 13 can include a first opening 31, which corresponds to a sub-pixel region. In this way, the pixel defining layer 13 can define multiple sub-pixel regions. As shown in Figure 3a, the shape of the orthographic projection of the pixel defining layer 13 onto the substrate 11 can be a grid, and each grid can be regarded as a first opening 31.

[0073] As shown in Figures 3a, 4, 5 and 6, the padding layer 29 can be located on the side of the pixel defining layer 13 close to the substrate 11. As shown in Figure 1, the orthographic projection of the padding layer 29 on the substrate 11 can be located in the peripheral area of ​​the first opening 31. The padding layer 29 is used to increase the thickness of the pixel defining layer 13 in the peripheral area of ​​the first opening 31.

[0074] The padding layer 29 can be formed of insulating material or conductive material. When insulating material is used, the padding layer 29 can be an inorganic material.

[0075] Among them, the orthographic projection of the padding layer 29 on the substrate can be ring-shaped, such as a circular ring, an elliptical ring, or a polygonal ring.

[0076] Among them, the padding layer 29 surrounds the edge area of ​​the first opening 31, and the padding layer forms a third opening 33. The third opening 33 and the first opening 31 together form a sub-pixel area for placing the light-emitting element.

[0077] In some examples, as shown in FIG3a, the orthographic projection of the third opening 33 on the substrate 11 may lie within the orthographic projection of the first opening 31 on the substrate 11. In this way, the orthographic projection of the pad layer 29 on the substrate 11 may lie within the inner edge region of the first opening 31.

[0078] As shown in Figure 3a, in a specific example, the orthographic projection of the pad layer 29 on the substrate 11 may overlap with the orthographic projection of the first opening on the substrate 11. For example, the pad layer 29 may include a portion located inside the first opening 31 and a portion located outside the first opening 31.

[0079] In some examples, as shown in FIG3b, the orthographic projection of the third opening 33 on the substrate 11 can cover the orthographic projection of the first opening 31 on the substrate 11. In this way, the orthographic projection of the pad layer 29 on the substrate 11 can be located in the outer edge region of the first opening 31. For example, the orthographic projection of the pad layer 29 on the substrate 11 can enclose the orthographic projection of the first opening 31 on the substrate 11.

[0080] In an exemplary embodiment, as shown in FIG1, the orthographic projection of the first opening 31 on the substrate 11 can be circular, elliptical, or polygonal, and the orthographic projection of the padding layer 29 on the substrate 11 can be annular, for example, circular or elliptical, or the inner contour of the orthographic projection of the padding layer 29 on the substrate 11 can be polygonal and the outer contour can be circular or elliptical.

[0081] The outer contour of the orthographic projection of the padding layer 29 on the substrate 11 can be conformal with the outer contour of the orthographic projection of the first opening on the substrate 11. For example, if the outer contour of the orthographic projection of the first opening on the substrate 11 is circular, then the outer contour of the orthographic projection of the padding layer on the substrate 11 is also circular. In one example, the center of the orthographic projection of the padding layer on the substrate 11 coincides with the center of the orthographic projection of the first opening on the substrate 11.

[0082] The inner contour of the orthographic projection of the padding layer 29 onto the substrate 11 is also called the first boundary 291, and the outer contour of the orthographic projection of the padding layer onto the substrate 11 is also called the third boundary 292.

[0083] In this embodiment, the surface of the pad layer 29 facing away from the substrate 11 can directly contact the bottom surface of the pixel defining layer 13 near the substrate 11.

[0084] The pixel defining layer 13 may include a first part 13a and a second part 13c, as shown in FIG3a. The first part 13a is located on the side of the pad layer 29 away from the substrate 11. The orthographic projection of the first part 13a on the substrate 11 is located within the orthographic projection of the surface of the pad layer 29 on the side away from the substrate 11 on the substrate 11. The orthographic projection of the second part 13c on the substrate 11 is located on the side of the orthographic projection of the pad layer 29 on the substrate 11 away from the side of the orthographic projection of the first electrode region 26a on the substrate 11.

[0085] It should be noted that the orthographic projection of the surface of the pad layer 29 facing away from the substrate 11 onto the substrate 11 can refer to the orthographic projection of the top surface of the pad layer 29 onto the substrate 11. For example, the pad layer 29 may include a surface facing away from the substrate 11, and a first sidewall 263 and a second sidewall 264 connected to the surface. The first sidewall 263 is close to the first opening 31, and the second sidewall 264 is away from the first opening 31. The first part 13a can refer to the orthographic projection of the surface of the pad layer 29 onto the substrate 11.

[0086] In one example, please refer to Figure 3a, which shows a cross-sectional view of the pixel defining layer 13 and the first electrode layer 26. As shown in Figure 3a, the pixel defining layer 13 may also include a third portion 13b located on the second sidewall 264 of the pad layer 29. The third portion 13b is located between the first portion 13a and the second portion 13c. In the direction from the first portion 13a to the second portion 13c, the straight-line distance from the surface of the third portion 13b away from the substrate to the second sidewall 264 gradually increases, as if it shows a linear increasing trend.

[0087] In one example, referring to Figure 3b, the pixel defining layer 13 may further include a fourth portion 13d located on the first sidewall 263 of the pad layer 29. This fourth portion 13d can be located on the side of the first portion 13a closest to the first opening 31, and the thickness of the fourth portion 13d can be less than or equal to the thickness h1 of the first portion 13a. In this case, the fourth portion serves as a sidewall of the first opening 31, and its slope can be comparable to that of the first sidewall 263. Increasing the slope of the first sidewall 263 increases the slope of the fourth portion, thereby improving diffraction.

[0088] In this way, the orthographic projection of the first part 13a on the substrate 11 can be located within the orthographic projection of the pad layer 29 on the substrate 11.

[0089] The second part 13c of the pixel defining layer 13 does not overlap with the orthographic projection of the pad layer 29 on the substrate 11. As shown in FIG2b, when viewed in the plane direction of the substrate 11, the second part 13c is located on the side of the pad layer 29 away from the first opening 31. In one case, the second part 13c may also be the part of the pixel defining layer 13 located between two adjacent pad layers 29.

[0090] As shown in Figures 3a and 3b, the maximum thickness h3 of the second part 13c can be the sum of the thickness h1 of the first part 13a and the thickness h2 of the padding layer 29.

[0091] In this embodiment, the pixel defining layer 13 can be made of an opaque material, for example, the pixel defining material can be a black insulating material.

[0092] In this embodiment, the padding layer 29 can be formed of a reflective material, such as a white material, which can reflect the light from the light-emitting element located in the first opening 31 to improve the light extraction rate.

[0093] In some examples, the padding layer 29 can be formed of PS (Polystyrene) plastic, wherein PS material is a colorless and transparent thermoplastic with rigidity, transparency and strong water resistance.

[0094] Of course, in some other examples, other insulating materials may also be used.

[0095] In an exemplary embodiment, a light-emitting element may also be provided at the first opening 31. The light-emitting element may be any of the following: organic light-emitting diode (OLED), light-emitting diode (LED), quantum dot light-emitting diode (QLED), micro LED (including mini-LED or micro-LED).

[0096] In some exemplary embodiments, taking an organic light-emitting diode as an example, as shown in FIG7, the display panel further includes a first electrode layer 26. The first electrode layer 26 includes a first electrode region 26a and a second electrode region 26b located around the first electrode region. The orthographic projection of the first electrode region 26a on the substrate overlaps with the orthographic projection of the first opening 31 on the substrate 11.

[0097] As shown in Figures 6 and 7, the thickness of the second electrode region 26b is greater than the thickness of the first electrode region 26a, and the pad layer 29 includes the second electrode region 26b; and / or, as shown in Figures 4 and 5, the pad layer is located on the side of the second electrode region 26b away from the substrate 11.

[0098] In one example, when the pad layer 29 is located on the side of the second electrode region 26b facing away from the substrate, the thickness of the pad layer 29 is greater than the thickness of the second electrode region 26b and greater than the thickness of the first electrode region 26a. In this example, as shown in Figures 4-5, the thicknesses of the first electrode region 26a and the second electrode region 26b can be the same. Alternatively, in other examples, the thickness of the first electrode region 26a can be less than the thickness of the second electrode region 26b.

[0099] In this embodiment, as shown in Figures 6 and 7, when the padding layer 29 includes the second electrode region 26b, the second electrode region 26b can serve as the padding layer 29. Therefore, when forming the pixel defining layer 13 and the first electrode layer 26, the first electrode layer 26 can be formed first, followed by forming the pixel defining layer 13 on the side of the first electrode layer 26 facing away from the substrate 11. Since the thickness h2 of the second electrode region 26b in the first electrode layer 26 is greater than the thickness of the first electrode region 26a, the pixel defining layer 13 is thinner in the region near the first opening 31. The thickness h1 of the first portion 13a in the pixel defining layer 13 is less than the thickness h3 of the second portion 13c. This results in a higher slope on the sidewall of the pixel defining layer 13 near the first opening 31, reducing the divergence of reflected light from the sidewall of the pixel defining layer 13 and preventing the formation of a diffraction ring at the sidewall of the first opening 31, thereby improving the display quality of the display panel.

[0100] The first electrode layer 26 can be located on the side of the planarization layer 12 away from the substrate 11 and on the side of the pixel defining layer 13 close to the substrate 11. As shown in Figures 4-7, the orthographic projection of the first electrode layer 26 on the substrate 11 can cover the orthographic projection of the first opening 31 on the substrate 11.

[0101] As shown in Figures 4-7, the first electrode layer 26 may include a first electrode region 26a located in the first opening 31 and a second electrode region 26b located around the first electrode region 26a. The orthographic projection of the first electrode region 26a on the substrate 11 may overlap with the orthographic projection of the first opening 31 on the substrate 11. As shown in Figures 4-7, the orthographic projection of the first electrode region 26a on the substrate 11 may cover the orthographic projection of the first opening 31 on the substrate 11, or the orthographic projection of the first electrode region 26a on the substrate 11 may fall within the orthographic projection of the first opening 31 on the substrate 11.

[0102] The second electrode region 26b is located in the surrounding area of ​​the first electrode region 26a, as shown in Figures 2a and 2b. The orthographic projection of the second electrode region 26b on the substrate 11 can enclose the orthographic projection of the first electrode region 26a on the substrate 11.

[0103] The second electrode region 26b is located on the side of the pixel defining layer 13 close to the substrate 11. When the second electrode region 26b is used as a padding layer, the surface of the side of the second electrode region 26b facing away from the substrate 11 can directly contact the pixel defining layer 13.

[0104] As shown in Figure 2a, the thickness h2 of the second electrode region 26b is greater than the thickness of the first electrode region 26a, thus raising the surrounding area of ​​the first electrode layer 26.

[0105] In an exemplary embodiment, as shown in FIG2b, the orthographic projection of the first electrode region 26a on the substrate 11 can be circular, elliptical, or polygonal, and the orthographic projection of the second electrode region 26b on the substrate 11 can be annular, for example, circular or elliptical, or the inner contour line of the orthographic projection of the second electrode region 26b on the substrate 11 can be polygonal and the outer contour line can be circular.

[0106] The outer contour of the orthographic projection of the second electrode region 26b on the substrate 11 can be conformal with the outer contour of the orthographic projection of the first electrode region 26a on the substrate 11. For example, if the outer contour of the orthographic projection of the first electrode region 26a on the substrate 11 is circular, then the outer contour of the orthographic projection of the second electrode region 26b on the substrate 11 is also circular. In one example, the orthographic projections of the center of the first electrode region 26a and the center of the second electrode region 26b on the substrate 11 coincide.

[0107] The inner contour of the orthographic projection of the second electrode region 26b onto the substrate 11 is also called the first boundary 291, and the outer contour of the orthographic projection of the second electrode region 26b onto the substrate 11 is also called the third boundary 292.

[0108] In an exemplary embodiment, as shown in FIG2b, the area of ​​the orthographic projection of the first electrode region 26a onto the substrate 11 is larger than the area of ​​the orthographic projection of the second electrode region 26b onto the substrate 11. For example, if the orthographic projection of the first electrode region 26a onto the substrate 11 is circular and the orthographic projection of the second electrode region 26b onto the substrate 11 is annular, the diameter of the first electrode region 26a can be larger than the radial dimension of the second electrode region 26b of the first electrode region 26a.

[0109] In one example, the first electrode layer 26 can serve as the anode of the light-emitting element; in another example, the first electrode layer 26 can serve as the cathode of the light-emitting element.

[0110] The material of the first electrode layer 26 may include at least one of a light-transmitting conductive material and a reflective metallic conductive material.

[0111] In an exemplary embodiment, the materials of the first electrode region 26a and the second electrode region 26b in the first electrode layer 26 can be the same, so that the first electrode region 26a and the second electrode region 26b can be disposed in the same layer. When forming the first electrode layer 26, a conductive layer can be first patterned to form a conductive layer, and then the conductive layer can be etched to etch out the first electrode region 26a, thereby obtaining the first electrode region 26a and the second electrode region 26b.

[0112] In one exemplary embodiment, the materials of the first electrode region 26a and the second electrode region 26b can be different, so that the first electrode region 26a and the second electrode region 26b can be formed in multiple processes. For example, the first electrode region 26a can be formed first, and then the second electrode region 26b can be formed around the first electrode region 26a. Alternatively, the second electrode region 26b can be formed first, and then the first electrode region 26a can be formed in the area enclosed by the second electrode region 26b.

[0113] In one exemplary embodiment, the pad layer 29 may also be located on the side of the second electrode region 26b facing away from the substrate 11, such that the pad layer 29 can be located between the pixel defining layer 13 and the second electrode region 26b. In this example, the maximum thickness h2 of the pad layer 29 may be greater than or equal to the thickness of the first electrode region 26a.

[0114] In this embodiment, as shown in Figures 4 and 5, the orthogonal projection of the pad layer 29 on the substrate can overlap with the orthogonal projection of the second electrode region 26b on the substrate.

[0115] The thickness of the first part 13a and the second part 13c of the pixel defining layer 13 will be described below.

[0116] In some embodiments, the thickness h1 of the first portion 13a can be 10% to 60% of the thickness h3 of the second portion 13c.

[0117] As shown in Figures 2-7, the thickness h1 of the first part 13a of the pixel defining layer 13 is less than the thickness h3 of the second part 13c. In one example, the thickness h3 of the second part 13c can be the sum of the thickness h1 of the first part 13a and the maximum thickness h2 of the padding layer 29.

[0118] Wherein, the thickness h1 of the first part 13a is 0.1 to 0.6 times the thickness h3 of the second part 13c, then the maximum thickness h2 of the padding layer 29 can be 0.4 to 0.9 times the thickness h3 of the second part 13c. In this way, the padding layer 29 can be used to pad most of the thickness at the edge of the pixel defining layer 13, thereby thinning the portion of the pixel defining layer 13 above the padding layer 29.

[0119] Wherein, the thickness h1 of the first part 13a can be 0.1 times the thickness of the second part 13c, then the maximum thickness h2 of the padding layer 29 can be 0.9 times the thickness of the second part 13c.

[0120] Wherein, the thickness h1 of the first part 13a can be 0.2 times the thickness of the second part 13c, then the maximum thickness h2 of the padding layer 29 can be 0.8 times the thickness of the second part 13c.

[0121] Wherein, the thickness h1 of the first part 13a can be 0.4 times the thickness of the second part 13c, then the maximum thickness h2 of the padding layer 29 can be 0.6 times the thickness of the second part 13c.

[0122] Wherein, the thickness h1 of the first part 13a can be 0.5 times the thickness of the second part 13c, then the maximum thickness h2 of the padding layer 29 can be 0.5 times the thickness of the second part 13c.

[0123] Wherein, the thickness h1 of the first part 13a can be 0.6 times the thickness of the second part 13c, then the maximum thickness h2 of the padding layer 29 can be 0.4 times the thickness of the second part 13c.

[0124] In an exemplary embodiment, the thickness h1 of the first part 13a can be 0.3 to 0.9 μm, the thickness h3 of the second part 13c is 0.9 μm to 1.5 μm, and the thickness h2 of the padding layer 29 can be 0.6 to 1.2 μm.

[0125] Specifically, the thickness h1 of the first part 13a can be further 0.7 μm to 0.9 μm.

[0126] For example, the thickness h1 of the first part 13a can be 0.7 μm, the thickness h2 of the padding layer 29 can be 0.6 μm, then the thickness h3 of the second part 13c can be 1.3 μm; or, the thickness h1 of the first part 13a can be 0.8 μm, the thickness h2 of the padding layer 29 can be 0.6 μm, then the thickness h3 of the second part 13c can be 1.4 μm; or, the thickness h1 of the first part 13a is 0.8 μm, the thickness h2 of the padding layer 29 is 0.7 μm, then the thickness h3 of the second part 13c can be 1.5 μm.

[0127] Specifically, the thickness h2 of the padding layer 29 can be 0.6 to 0.8 μm, such as 0.6 μm, 0.65 μm, 0.7 μm, 0.75 μm, or 0.8 μm.

[0128] In one exemplary embodiment, the thickness h1 of the first portion 13a may be less than the maximum thickness of the padding layer 29.

[0129] In this embodiment, when the pad layer 29 is located on the side of the first electrode layer away from the substrate 11 and overlaps with the substrate 11, as shown in Figures 4-5, the maximum thickness h2 of the pad layer 29 can refer to the maximum vertical distance between the surface of the pad layer 29 away from the substrate 11 and the surface of the planarization layer 12 away from the substrate 11.

[0130] Where the thickness h1 of the first part 13a is less than the maximum thickness of the padding layer 29, the padding layer 29 occupies more space in the pixel defining layer 13 in the thickness direction y of the substrate 11, so that the thickness h1 of the first part 13a is at least 0.5 times less than the thickness h3 of the second part 13c, thereby making the pixel defining layer 13 thinner around the first opening 31, thereby increasing the slope of the edge sidewall of the pixel defining layer 13 to optimize the improvement of the diffraction effect.

[0131] In some embodiments, as shown in Figures 2-7, the pixel defining layer 13 may not include the portion of the sidewall located on the pad layer 29 near the first opening 31, i.e., it may not include the fourth portion.

[0132] For example, the pad layer 29 may include a surface facing away from the substrate 11, and a first sidewall 263 and a second sidewall 264 connected to the surface, the first sidewall 263 being close to the first opening 31 and the second sidewall 264 being away from the first opening 31.

[0133] As shown in Figure 3a, the pixel defining layer 13 may not include the fourth part located on the first sidewall 263.

[0134] In this way, the padding layer 29 can form a third opening 33, as shown in Figures 12-14. The orthographic projection of the third opening 33 on the substrate 11 is located within the orthographic projection of the first opening 31 of the pixel defining layer 13 on the substrate 11, so that the pixel defining layer 13 does not cover the sidewall of the padding layer 29 near the first opening 31.

[0135] Thus, the sidewalls of the opening in the sub-pixel region may include a first sidewall 263 of the pad layer 29 and a third sidewall 133 of the pixel defining layer 13, with the platform portion between the first sidewall 263 and the third sidewall 133 being the surface of the pad layer 29 facing away from the substrate.

[0136] In this embodiment, as shown in Figures 4-7, the light-emitting layer 28 of the light-emitting element can directly contact the first sidewall 263 of the pad layer 29, and the second electrode layer 14 of the light-emitting element can directly contact the first sidewall 263 of the pad layer 29, a portion of the surface of the pad layer facing away from the substrate 11, the third sidewall 133 of the pixel defining layer, and the surface of the pixel defining layer 13 facing away from the substrate 11.

[0137] Since the pixel defining layer 13 does not include the portion of the first sidewall 263 located on the pad layer 29 near the first opening 31, the thickness of the portion of the pixel defining layer 13 on the pad layer 29 is very thin, and its slope does not form a slope attached to the first sidewall 263, thereby ensuring that the slope value can be increased to improve the diffraction effect.

[0138] In one example of this embodiment, the orthographic projection of the first portion 13a in the pixel defining layer 13 onto the substrate 11 may coincide with the orthographic projection of the surface of the pad layer 29 onto the substrate 11.

[0139] In some other embodiments, as shown in Figures 2-7, when the pixel defining layer 13 does not include the portion located on the first sidewall 263, there may be a gap between the first portion 13a in the pixel defining layer 13 and the surface boundary of the padding layer 29, such that the orthographic projection of the first portion 13a on the substrate 11 may be located within the orthographic projection of the surface of the padding layer 29 on the substrate 11, as shown in Figures 12-14, where the boundary 131 of the first portion 13a near the first opening 31 is located within the surface of the padding layer 29.

[0140] In other words, the boundary 131 (hereinafter referred to as the fourth boundary 131) of the first part 13a in the orthographic projection on the substrate 11, which is close to the first opening 31, and the boundary 291 (hereinafter referred to as the first boundary 291) of the surface of the pad layer 29 on the side away from the substrate 11 in the orthographic projection on the substrate 11, which is close to the first opening 31, are spaced apart, that is, the orthographic projection of the first part 13a on the substrate 11 does not coincide with the surface of the pad layer 29.

[0141] The fourth boundary 131 can also be referred to as the boundary of the pixel defining layer 13 near the first opening 31.

[0142] For example, as shown in FIG12, the pad layer 29 includes a first boundary 291 near the first opening 31, and the first portion 13a in the pixel defining layer 13 may include a fourth boundary 131 near the first opening 31. The distance a between the orthographic projection of the first boundary 291 on the substrate 11 and the orthographic projection of the fourth boundary 131 on the substrate 11 is greater than or equal to 0.5 μm, for example, it can be 0.5 μm or it can be 0.6 μm.

[0143] In an exemplary embodiment, the distance 'a' between the orthographic projection of the first boundary 291 onto the substrate 11 and the orthographic projection of the fourth boundary 131 onto the substrate 11 can be less than the thickness h1 of the first portion 13a. For example, if the thickness h1 of the first portion 13a is 0.7 to 0.9 μm, then the distance 'a' can be 0.5 μm to 0.69 μm.

[0144] In some embodiments, as shown in FIG3a, when the pad layer 29 includes a surface facing away from the substrate 11, and a first sidewall 263 and a second sidewall 264 connected to the surface, the first sidewall 263, the second sidewall 264 and the surface of the pad layer 29 can form a trapezoid, and the slope of the first sidewall 263 and the slope of the second sidewall 264 can be the same or different.

[0145] The slope angle of the first sidewall 263 may be the same as the slope angle of the sidewall of the pixel defining layer 13 near the first opening 31 (hereinafter referred to as the third sidewall 133), or the slope angles of the two may be different.

[0146] For example, the slope angle of the first sidewall 263 can be 45 to 80°, and the slope angle of the third sidewall 133 of the first part 13a near the first opening 31 is 45 to 80°.

[0147] For example, the slope angle of the first sidewall 263 can be 45°, 55°, 60°, 65°, 70°, 75°, and 80°. In one example, the slope angle of the first sidewall 263 can be 70° to 80°.

[0148] For example, the slope angle of the third sidewall 133 can be 45°, 55°, 60°, 65°, 70°, 75°, and 80°. In one example, the slope angle of the third sidewall 133 can be 70° to 75°.

[0149] In one example, the slope angle of the first sidewall 263 may be smaller than the slope angle of the third sidewall 133. For example, the slope angle of the first sidewall 263 may be 70 degrees and the slope angle of the third sidewall 133 may be 73 degrees, or the slope angle of the first sidewall 263 may be 72 degrees and the slope angle of the third sidewall 133 may be 73 degrees; or the slope angle of the first sidewall 263 may be 74 degrees and the slope angle of the third sidewall 133 may be 75 degrees.

[0150] In one example, the slope angle of the first sidewall 263 can be greater than the slope angle of the third sidewall 133. For example, the slope angle of the first sidewall 263 is 75 degrees and the slope angle of the third sidewall 133 is 73 degrees, or the slope angle of the first sidewall 263 is 74 degrees and the slope angle of the third sidewall 133 is 72 degrees; or the slope angle of the first sidewall 263 is 72 degrees and the slope angle of the third sidewall 133 is 70 degrees.

[0151] In one example, the slope angle of the first sidewall 263 can be equal to the slope angle of the third sidewall 133.

[0152] In one example, the angle difference between the slope angles of the first sidewall 263 and the third sidewall 133 can be 0 degrees to 3 degrees. This allows for a smooth transition of the slope angles between the first sidewall 263 and the third sidewall 133, reducing the divergence of reflected light from the sidewall of the first opening 31 and further improving the diffraction effect.

[0153] In one embodiment, as shown in Figures 2-7, the light-emitting element is located in the first opening 31, which includes a light-emitting layer 28 and a second electrode layer 14 located on the side of the light-emitting layer 28 facing away from the substrate 11. The orthogonal projection of the second electrode layer 14 on the substrate 11 can cover the entire substrate 11.

[0154] Among them, the distance h2 from the surface of the padding layer 29 away from the substrate 11 to the substrate 11 is greater than the distance from the surface of the light-emitting layer 28 away from the substrate 11 to the substrate 11.

[0155] In this embodiment, the distance from the surface of the pad layer 29 away from the substrate 11 to the substrate 11 is greater than the distance from the surface of the light-emitting layer 28 away from the substrate 11 to the substrate 11.

[0156] The distance from the surface of the pad layer 29 away from the substrate 11 to the substrate 11 can refer to the maximum vertical distance from the surface of the pad layer 29 away from the substrate 11 to the substrate 11; the distance from the surface of the light-emitting layer 28 away from the substrate 11 to the substrate 11 can refer to the maximum vertical distance from the surface of the light-emitting layer 28 away from the substrate 11 to the substrate 11.

[0157] In this way, the sidewall of the padding layer 29 is in direct contact with the light-emitting layer 28, and the height of the sidewall of the padding layer 29 is greater than the thickness of the light-emitting layer 28. Therefore, when the light-emitting element emits light, the sidewall of the padding layer 29 can reflect the light emitted by the light-emitting layer 28, and the reflected light can be emitted out through the first opening 31, thereby improving the light emission efficiency of the light-emitting element.

[0158] The second electrode layer 14 can cover the entire pixel defining layer 13, and the second electrode layer 14 can be formed using a light-transmitting conductive material.

[0159] In an exemplary embodiment, as shown in Figures 2-7, the display panel may further include a light-shielding layer 23 located on the side of the light-emitting element away from the substrate 11 and a color conversion layer 24. The light-shielding layer 23 may include a second opening 32 corresponding to the first opening 31, and the color conversion layer 24 is located at the second opening 32.

[0160] As shown in Figures 2-7, the orthographic projection of the color conversion layer 24 on the substrate 11 at least partially overlaps with the orthographic projection of the light-emitting layer 28 on the substrate 11. For example, the orthographic projection of the color conversion layer 24 on the substrate 11 can cover the orthographic projection of the light-emitting layer 28 on the substrate 11. To ensure the aperture ratio, the orthographic projection of the second opening 32 on the substrate 11 can cover the orthographic projection of the first opening 31 on the substrate 11.

[0161] In this embodiment, all light-emitting elements can emit the same color. For example, all light-emitting devices emit blue light; or, for example, all light-emitting devices emit white light.

[0162] The color conversion layer 24 can be a filter, such as a red filter, a green filter, and a blue filter; or, for example, the color conversion layer 24 can include quantum dot layers (QD films) of different colors, such as a red quantum dot layer, a green quantum dot layer, and a white resin layer. For example, blue light emitted by the light-emitting element is emitted as red light after passing through the red quantum dot layer, as green light after passing through the green quantum dot layer, and as blue light after passing through the white resin layer, thereby achieving color display.

[0163] Of course, in other examples, multiple light-emitting elements may include green light-emitting elements that emit green light, red light-emitting elements that emit red light, and blue light-emitting elements that emit blue light. The color conversion layer 24 may include a green color film corresponding to the green light-emitting element, a red color film corresponding to the red light-emitting element, and a blue color film corresponding to the blue light-emitting element. Through the color conversion layer 24, the quality of the emitted light color of the display panel can be guaranteed.

[0164] In some examples, the display panel may also include an encapsulation layer 25 located on the side of the color conversion layer away from the substrate, which may be glass.

[0165] In some examples, as shown in Figures 2a-7, the light-emitting element and the light-shielding layer 23 may also include a first encapsulation layer 15, a second encapsulation layer 16 located on the side of the first encapsulation layer 15 away from the substrate 11, a third encapsulation layer 17 located on the side of the protective layer away from the substrate 11, a film buffer layer 18 located on the side of the third encapsulation layer 17 away from the substrate 11, a first metal layer 19 located on the side of the TBL layer 18 away from the substrate 11, an insulating layer 20 located on the side of the first metal layer 19 away from the substrate 11, a second metal layer 21 located on the side of the insulating layer 20 away from the substrate 11, an organic layer 22 located on the side of the second metal layer away from the substrate 11, and the light-shielding layer 23 and the color conversion layer 24 located on the side of the organic layer 22 away from the substrate 11.

[0166] In some examples, the pixel defining layer 13 includes a support pillar 27 on the side facing away from the substrate 11. The second electrode layer 14 can be located on the side of the support pillar 27 facing away from the substrate 11. The support pillar 27 can support the mask used when forming the light-emitting layer 28. After the light-emitting layer 28 is formed, the support pillar 27 can be removed or not. If it is not removed, the second electrode layer 14 is formed on the side of the support pillar 27 facing away from the substrate 11.

[0167] In an exemplary embodiment, as shown in FIG13 and FIG14, the orthographic projection of the pixel defining layer 13 on the substrate 11 can cover the orthographic projection of the light-shielding layer 23 on the substrate 11. As a result, the area of ​​the second opening of the light-shielding layer 23 can be larger than the area of ​​the first opening, thereby increasing the light-emitting area of ​​the light-emitting element and thus improving the light-emitting efficiency of the display panel.

[0168] In some embodiments, as shown in Figures 5 and 7, the orthographic projection of the light-shielding layer 23 onto the substrate 11 does not overlap with the orthographic projection of the padding layer 29 onto the substrate 11. This increases the opening area of ​​the second opening 32, thereby increasing the light-transmitting area and improving the light extraction efficiency. In this example, if the surface of the pixel defining layer 13 facing away from the substrate 11 is flat, the surface of the second electrode layer 14 formed on the side of the pixel defining layer 13 facing away from the substrate 11 is also flat. The second electrode layer 14 reflects external light uniformly, thus increasing the aperture ratio through the aforementioned arrangement of the light-shielding layer.

[0169] In some embodiments, as shown in Figures 4 and 6, the orthographic projection of the light-shielding layer 23 on the substrate 11 can overlap with the orthographic projection of the padding layer 29 on the substrate 11. This increases the blocking effect on external light reflected from the recessed area, improving the dark-state display quality. In this example, if the surface of the pixel defining layer 13 facing away from the substrate 11 is recessed towards the substrate 11, the surface of the second electrode layer 14 formed on the side of the pixel defining layer 13 facing away from the substrate 11 is also recessed towards the substrate 11. Thus, the second electrode layer 14 reflects external light in the recessed area. Therefore, through the overlap between the light-shielding layer 23 and the padding layer 29, the light-shielding layer 23 can block the external light reflected from the recessed area, further preventing the formation of a reflection halo.

[0170] In the above embodiments, the surface of the pixel defining layer 13 facing away from the substrate 11 can be approximately flat. For example, the difference between the vertical distances between different positions of the surface of the pixel defining layer 13 facing away from the substrate 11 and the substrate can be less than a preset value. The preset value can be 1 / 50 to 1 / 20 of the maximum vertical distance between the surface of the pixel defining layer 13 facing away from the substrate 11 and the substrate.

[0171] In one example of this embodiment, as shown in Figures 4-7 and 13-14, the padding layer 29 includes a first boundary 291 near the first opening 31, and the light-shielding layer 23 includes a second boundary 231 near the second opening 32. The distance between the orthographic projections of the first boundary 291 and the second boundary 231 on the substrate 11 is less than or equal to 6 μm.

[0172] In one example, as shown in Figures 5, 7 and 13, the orthographic projection of the light-shielding layer 23 on the substrate 11 does not overlap with the orthographic projection of the pad layer 29 on the substrate 11. In this case, the second boundary 231 is located outside the orthographic projection of the pad layer 29, and the distance between them can be less than or equal to 6 μm and greater than the dimension of the pad layer 29 in the target direction.

[0173] In one example, as shown in Figures 4, 6 and 14, the orthographic projection of the light-shielding layer 23 on the substrate 11 overlaps with the orthographic projection of the pad layer 29 on the substrate 11. In this case, the second boundary 231 is located within the orthographic projection of the pad layer 29, and the distance between the two can be less than or equal to 6 μm and less than the size of the pad layer 29 in the target direction.

[0174] The target direction refers to the arrangement direction of the first opening 31 and the padding layer 29, as shown in direction x in Figures 2-7.

[0175] In one example of this embodiment, the dimension of the padding layer 29 in the target direction is less than or equal to 6 μm, that is, the distance between the first boundary 291 and the third boundary 292 of the padding layer 29 is less than or equal to 6 μm.

[0176] As shown in Figures 4 and 6, the dimensions of the slab level 29 in the target direction can refer to the dimensions of regions a, b, and c in the figures. As shown in Figures 5 and 7, the dimensions of the slab level 29 in the target direction can refer to the dimensions of regions a and b in the figures.

[0177] Among them, region a is the region between the first boundary 291 of the padding layer 29 and the fourth boundary 131 of the pixel defining layer 13, region b is the region between the fourth boundary 131 of the pixel defining layer 13 and the second boundary 231 of the light-shielding layer 23, and region c is the region between the second boundary 231 of the light-shielding layer 23 and the second boundary 292 of the padding layer 29.

[0178] In this example, the difference between the spacing between the orthographic projections of the first boundary 291 and the second boundary 231 on the substrate 11 and the dimension of the pad layer 29 in the target direction can be smaller than the dimension of the pad layer 29 in the target direction.

[0179] For example, as shown in Figures 5, 7 and 13, the orthographic projection of the light-shielding layer 23 on the substrate 11 does not overlap with the orthographic projection of the pad layer 29 on the substrate 11. The second boundary 231 is located outside the orthographic projection of the pad layer 29. The distance between the two can be less than or equal to 6 μm and greater than the size of the pad layer 29 in the target direction. For example, the distance between the first boundary 291 and the second boundary 231 can be 6 μm, and the size of the pad layer 29 in the target direction can be 5 μm.

[0180] As an example, as shown in Figures 4, 6 and 14, Figure 14 shows a planar schematic diagram of the light-shielding layer 23, the pixel defining layer 13 and the first electrode layer 26. The orthographic projection of the light-shielding layer 23 on the substrate 11 overlaps with the orthographic projection of the pad layer 29 on the substrate 11. The second boundary 231 is located within the orthographic projection of the pad layer 29. The distance between the two can be 5 μm, and the dimension of the pad layer 29 in the target direction can be 6 μm.

[0181] In one example of this embodiment, the pad layer 29 includes a third boundary 292 that is away from the first electrode region 26a, and the light-shielding layer 23 includes a second boundary 231 that is close to the second opening 32. The distance between the orthographic projection of the third boundary 292 and the second boundary 231 on the substrate 11 is 0.5 μm to 4 μm.

[0182] For example, as shown in Figures 5, 7, and 13, the orthographic projection of the light-shielding layer 23 on the substrate 11 does not overlap with the orthographic projection of the pad layer 29 on the substrate 11. The second boundary 231 is located outside the orthographic projection of the pad layer 29, and the third boundary 292 is the side boundary of the pad layer 29 away from the first opening 31. The second boundary 231 is located on the side of the third boundary 292 away from the first opening 31. The distance c between the third boundary 292 and the second boundary 231 can be 0.5μm, 1μm, 2μm, 3μm, 3.5μm, or 4μm.

[0183] For example, as shown in Figures 4, 6, and 14, the orthographic projection of the light-shielding layer 23 on the substrate 11 overlaps with the orthographic projection of the pad layer 29 on the substrate 11, and the second boundary 231 is located on the side of the third boundary 292 closer to the first opening 31. The distance between the third boundary 292 and the second boundary 231 can be 0.5 μm, 1 μm, 2 μm, 3 μm, 3.5 μm, or 4 μm.

[0184] In one example, the case where the orthographic projection of the light-shielding layer 23 on the substrate 11 overlaps with the orthographic projection of the padding layer 29 on the substrate 11 is called the first case, and the case where the orthographic projection of the light-shielding layer 23 on the substrate 11 does not overlap with the orthographic projection of the padding layer 29 on the substrate 11 is called the second case. In the first case, the distance between the third boundary 292 and the second boundary 231 can be smaller than the distance between the third boundary 292 and the second boundary 231 in the second case. This ensures that while the light-shielding layer 23 blocks the reflected light from the second electrode layer 14, the light-emitting area of ​​the light-emitting element is maximized, thus ensuring light extraction efficiency.

[0185] Of course, the above dimensions are merely illustrative and do not represent any limitation on this application.

[0186] The morphology of the first electrode layer 26 will be described below by way of example. It should be noted that the thickness of the first electrode region 26a in the first electrode layer 26 of the following morphology is less than the thickness of the second electrode region 26b. The second electrode region 26b can be used as a pad layer 29, or a pad layer 29 can be provided on the side of the second electrode region 26b away from the substrate 11.

[0187] In one embodiment, as shown in FIG2a and FIG6, the first electrode layer 26 may include a first sub-electrode 261 and a second sub-electrode 262, wherein the first sub-electrode 261 includes a portion located in the first electrode region 26a and a portion located in the second electrode region 26b, and the second sub-electrode 262 is located in the second electrode region 26b. In the second electrode region 26b, the first sub-electrode 261 and the second sub-electrode 262 are stacked in the thickness direction y of the substrate 11.

[0188] In the second electrode region 26b, the orthographic projection of the first sub-electrode 261 onto the substrate 11 overlaps with the orthographic projection of the second sub-electrode 262 onto the substrate 11. For example, as shown in Figures 6 and 8, in the second electrode region 26b, the orthographic projection of the first sub-electrode 261 onto the substrate 11 can cover the orthographic projection of the second sub-electrode 262 onto the substrate 11. In this case, as shown in Figure 6, the second sub-electrode 262 can be located on the side of the first sub-electrode 261 away from the substrate 11. Alternatively, as shown in Figure 11, the second sub-electrode 262 is located on the side of the first sub-electrode 261 closer to the substrate 11.

[0189] In this embodiment, the thickness of the surrounding area can be increased by the second sub-electrode 262 of the first electrode layer 26.

[0190] In an exemplary embodiment, both the first sub-electrode 261 and the second sub-electrode 262 may be a single-layer structure, or the first sub-electrode 261 may be a multi-layer structure and the second sub-electrode 262 may be a single-layer structure; or the first sub-electrode 261 may be a single-layer structure and the second sub-electrode 262 may be a multi-layer structure; or both the first sub-electrode 261 and the second sub-electrode 262 may be multi-layer structures.

[0191] Among them, a single-layer structure refers to a structure containing only one layer of conductive material, while a multi-layer structure refers to a structure containing at least two layers of conductive material, and the types of conductive materials are not completely the same.

[0192] In cases where both the first sub-electrode 261 and the second sub-electrode 262 are multi-layer structures, the first sub-electrode 261 and the second sub-electrode 262 may include the same layer structure.

[0193] For example, as shown in FIG8, the first sub-electrode 261 may include a first conductive material 601, a second conductive material 602 and a third conductive material 603 stacked on the thickness direction y of the substrate 11, and the second sub-electrode 262 may include a fourth conductive material 604, a fifth conductive material 605 and a sixth conductive material 606 stacked on the thickness direction y of the substrate 11, wherein the fourth conductive material 604 is located between the fifth conductive material 605 and the sixth conductive material 606;

[0194] Among them, the first conductive material 601 and the fifth conductive material 605 are made of the same material, the second conductive material 602 and the fourth conductive material 604 are made of the same material, and the third conductive material 603 and the sixth conductive material 606 are made of the same material.

[0195] In this example, if the fifth conductive material 605 and the sixth conductive material 606 include light-transmitting conductive materials, then the first conductive material 601 and the third conductive material 603 may include light-transmitting conductive materials, and the second conductive material 602 and the fourth conductive material 604 may include metallic materials.

[0196] In this example, the first conductive material 601 and the fifth conductive material 605 have the same thickness, the second conductive material 602 may have a thickness less than the fourth conductive material 604, and the third conductive material 603 may have the same thickness as the sixth conductive material 606.

[0197] The thickness of the fifth conductive material 605 and the sixth conductive material 606 can be less than the thickness of the fourth conductive material 604.

[0198] In an exemplary embodiment, as shown in Figures 9-11, the first sub-electrode 261 and the second sub-electrode 262 may include different film layer structures. For example, as shown in Figures 9 and 11, the first sub-electrode 261 may include a first conductive material 601, a second conductive material 602, and a third conductive material 603 stacked in the thickness direction y of the substrate 11, and the second sub-electrode 262 may include a metal conductive layer, such as a fourth conductive material 604.

[0199] As shown in Figure 10, the first sub-electrode 261 may include a first conductive material 601, a second conductive material 602 and a third conductive material 603 stacked on the thickness direction y of the substrate 11, and the second sub-electrode 262 may include two conductive material layers, namely a fourth conductive material 604 and a fifth conductive material 605.

[0200] For example, as shown in Figures 8-11, the first sub-electrode 261 may be a multi-layer structure, including a light-transmitting conductive material and a metallic conductive material, and the second sub-electrode 262 may be a single-layer structure or a multi-layer structure, and the second sub-electrode 262 includes a metallic conductive material.

[0201] For example, as shown in FIG9 and FIG11, the first sub-electrode 261 includes a first conductive material 601, a second conductive material 602 and a third conductive material 603 stacked in the thickness direction y of the substrate 11, and the second sub-electrode 262 includes a fourth conductive material 604.

[0202] The first conductive material 601 and the third conductive material 603 are composed of light-transmitting conductive materials, while the second conductive material 602 and the fourth conductive material 604 are composed of metallic materials. Thus, the first sub-electrode 261 at the first opening 31 is composed of a combination of light-transmitting conductive material and metallic material, and the second sub-electrode 262 can be formed of metallic material to improve the reflection of light emitted from the light-emitting layer 28 and increase the light extraction efficiency.

[0203] The second conductive material 602 and the fourth conductive material 604 can be different metal materials or the same metal material.

[0204] The materials of the first conductive material 601 and the third conductive material 603 may be the same or different.

[0205] The thickness of the second conductive material 602 can be less than the thickness of the fourth conductive material 604, thereby raising the periphery height of the first electrode layer 26 through the fourth conductive material 604.

[0206] In an exemplary embodiment, the second sub-electrode 262 may also include a light-transmitting conductive material, as shown in FIG10. The second sub-electrode 262 may also include a fifth conductive material 605, and the fourth conductive material 604 and the fifth conductive material 605 may be stacked in the thickness direction y of the substrate 11.

[0207] The fifth conductive material 605 includes a light-transmitting conductive material, and the second sub-electrode 262 is located between the first conductive material 601 and the second conductive material 602 of the first sub-electrode 261.

[0208] Thus, the film layer in the direction of the vertical distance h2 between the side of the pad layer 29 away from the substrate and the substrate can be a film layer structure with alternating light-transmitting conductive material and metal. That is, in each of the two adjacent conductive layers in the second electrode region 26b, one conductive layer is a metal material and the other conductive layer is a light-transmitting conductive material.

[0209] Similarly, in each pair of adjacent conductive layers in the first sub-electrode 261, one conductive layer is a metallic material and the other is a light-transmitting conductive material.

[0210] In the above embodiments, the metal material may include silver, copper, gold, and other metal materials.

[0211] In the above embodiments, the light-transmitting and conductive material can be a metal oxide material, such as indium tin oxide.

[0212] In some embodiments, as shown in Figures 8 and 9, in the second electrode region 26b, the second sub-electrode 262 may be located on the side of the first sub-electrode 261 away from the substrate 11; or, as shown in Figure 11, the second sub-electrode 262 may be located on the side of the first sub-electrode 261 close to the substrate 11.

[0213] Based on the same inventive concept, this disclosure also provides a display device, which may include any of the display panels shown in Figures 1-14.

[0214] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.

[0215] Finally, it should be noted that in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0216] The above provides a detailed description of a display panel and display device provided by this disclosure. Specific examples have been used to illustrate the principles and implementation methods of this disclosure. The description of the above embodiments is only for the purpose of helping to understand the method and core ideas of this disclosure. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this disclosure. Therefore, the content of this specification should not be construed as a limitation of this disclosure.

[0217] Other embodiments of this disclosure will readily occur to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. This disclosure is intended to cover any variations, uses, or adaptations of this disclosure that follow the general principles of this disclosure and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of this disclosure are indicated by the following claims.

[0218] It should be understood that this disclosure is not limited to the precise structures described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from its scope. The scope of this disclosure is limited only by the appended claims.

[0219] The terms "an embodiment," "embodiment," or "one or more embodiments" as used herein mean that a particular feature, structure, or characteristic described in connection with an embodiment is included in at least one embodiment of this disclosure. Furthermore, please note that the examples of the phrase "in one embodiment" do not necessarily all refer to the same embodiment.

[0220] Numerous specific details are set forth in the specification provided herein. However, it will be understood that embodiments of this disclosure may be practiced without these specific details. In some instances, well-known methods, structures, and techniques have not been shown in detail so as not to obscure the understanding of this specification.

[0221] In the claims, any reference signs placed between parentheses should not be construed as limiting the claims. The word "comprising" does not exclude the presence of elements or steps not listed in the claims. The word "a" or "an" preceding an element does not exclude the presence of a plurality of such elements. This disclosure can be implemented by means of hardware comprising a plurality of different elements and by means of a suitably programmed computer. In a unit claim enumerating a plurality of means, several of these means may be embodied by the same item of hardware. The use of the words first, second, and third, etc., does not indicate any order. These words may be interpreted as names.

[0222] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this disclosure, and are not intended to limit them. Although this disclosure has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of this disclosure.

Claims

1. A display panel, characterized in that, include: Substrate; A planarization layer is located on one side of the substrate. A pixel defining layer, located on the side of the planarization layer opposite to the substrate, includes a plurality of spaced-apart first openings; The padding layer is located on the side of the pixel defining layer close to the planarization layer. The orthographic projection of the padding layer on the substrate is located in the peripheral area of ​​the orthographic projection of the first opening on the substrate. The orthographic projection of the padding layer on the substrate overlaps with the orthographic projection of the pixel defining layer on the substrate. The pixel defining layer includes a first part and a second part. The orthographic projection of the first part onto the substrate is located within the orthographic projection of the surface of the pad layer on the side away from the substrate onto the substrate. The second part is located on the side of the pad layer away from the first opening. The thickness of the first part is less than the thickness of the second part.

2. The display panel according to claim 1, characterized in that, The display panel further includes a first electrode layer, the first electrode layer including a first electrode region and a second electrode region located around the first electrode region, the orthographic projection of the first electrode region on the substrate overlaps with the orthographic projection of the first opening on the substrate. Wherein, the thickness of the second electrode region is greater than the thickness of the first electrode region, and the padding layer includes the second electrode region; and / or, the padding layer is located on the side of the second electrode region away from the substrate.

3. The display panel according to claim 1 or 2, characterized in that, The material of the padding layer includes polystyrene-based plastics.

4. The display panel according to claim 1 or 2, characterized in that, The thickness of the first part is 10% to 60% of the thickness of the second part.

5. The display panel according to claim 1 or 2, characterized in that, The thickness of the first part is less than the maximum thickness of the padding layer.

6. The display panel according to claim 1 or 2, characterized in that, The thickness of the first part is 0.7 to 0.9 μm, and the thickness of the second part is 0.9 μm to 1.5 μm.

7. The display panel according to claim 1 or 2, characterized in that, The padding layer includes a surface facing away from the substrate, and a first sidewall and a second sidewall connected to the surface, wherein the first sidewall is close to the first opening; The slope angle of the first sidewall is 45-80°, and the slope angle of the sidewall of the first part near the first opening is 45-80°.

8. The display panel according to claim 1 or 2, characterized in that, The padding layer includes a surface facing away from the substrate, and a first sidewall and a second sidewall connected to the surface. The first sidewall is close to the first opening, and the second sidewall faces away from the first opening. The pixel defining layer does not include the portion located on the first sidewall.

9. The display panel according to claim 8, characterized in that, The pixel defining layer is located near the boundary of the first opening in the orthographic projection of the substrate, and the surface of the pad layer on the side facing away from the substrate is located in the orthographic projection of the substrate.

10. The display panel according to any one of claims 1 or 2, 4-9, characterized in that, The display panel further includes light-emitting elements, which include: The first electrode layer is located on one side of the substrate and includes first electrode regions corresponding to the plurality of first openings respectively. The orthographic projection of the first electrode region on the substrate overlaps with the orthographic projection of the first opening on the substrate. The light-emitting layer is located on the side of the first electrode layer that is away from the substrate. The second electrode layer is located on the side of the light-emitting layer that is away from the substrate. A light-shielding layer is located on the side of the second electrode layer opposite to the substrate, and the light-shielding layer includes a second opening corresponding to the first opening.

11. The display panel according to claim 10, characterized in that, The orthographic projection of the light-shielding layer on the substrate lies within the orthographic projection of the pixel defining layer on the substrate.

12. The display panel according to claim 10, characterized in that, The orthographic projection of the light-shielding layer on the substrate does not overlap with the orthographic projection of the padding layer on the substrate; or, the orthographic projection of the light-shielding layer on the substrate partially overlaps with the orthographic projection of the padding layer on the substrate.

13. The display panel according to claim 10, characterized in that, The padding layer includes a first boundary near the first opening, and the light-shielding layer includes a second boundary near the second opening. The distance between the orthographic projections of the first boundary and the second boundary on the substrate is less than or equal to 6 μm.

14. The display panel according to claim 10, characterized in that, The padding layer includes a third boundary away from the first opening, and the light-shielding layer includes a second boundary close to the second opening. The distance between the orthographic projections of the third boundary and the second boundary on the substrate is 0.5 μm to 4 μm.

15. The display panel according to claim 1, characterized in that, In the direction of the padding layer toward the first opening, the size of the padding layer is less than or equal to 6 μm.

16. A display device, characterized in that, Includes the display panel described in any one of claims 1-15.

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