Composition for forming high-refractive-index film

Abstract

Provided is a composition for forming a high-refractive-index film, the composition giving a cured film having all of a high refractive index, high heat resistance, and high light resistance. The composition for forming a high-refractive-index film comprises (A) a non-polymeric or polymeric compound having an ultraviolet-absorbing group including a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton, (B) a hindered-amine light stabilizer, and (C) an organic solvent, wherein the content of the (B) component is 1-10 parts by mass per 100 parts by mass of the (A) component and the (B) component is a compound having a group represented by formula (b1). (In formula (b1), the R1b moieties each independently represent a methyl group or an ethyl group, R2b represents a C1-C20 linear alkyl group or a C4-C20 cyclic alkyl group, and * is a bond.)

Description

Composition for forming high refractive index films

[0001] This invention relates to a composition for forming a high refractive index film.

[0002] In the field of optical components such as eyeglass lenses, Fresnel lenses, lenticular lenses, aspherical lenses, optical discs, optical fibers, and optical waveguides, transparent resins made from polymer materials with excellent transparency in the visible light range are widely used.

[0003] In recent years, transparent resins made from polymer materials with excellent visible light transmittance have been widely used in the fields of electronic devices such as liquid crystal displays, organic electroluminescent (EL) displays, light-emitting diodes, solar cells, and CCD / CMOS image sensors, for optical components such as protective films, planarization films, insulating films, anti-reflective films, refractive index control films, microlenses, intralayer lenses, optical waveguides, and film substrates.

[0004] Such optical components often require not only transparency but also a high refractive index. Patent Document 1 discloses a film-forming composition that provides a cured film with a high refractive index and good weather resistance, comprising a triazine ring-containing polymer containing a specific repeating unit structure, a crosslinking agent, an ultraviolet absorber, and a light stabilizer. However, further improvements are needed from the viewpoint of improving the reliability of electronic devices.

[0005] International Publication No. 2015 / 093508

[0006] The present invention has been made in view of the above circumstances, and aims to provide a high refractive index film-forming composition that provides a cured film with a high refractive index, high heat resistance, and high light resistance.

[0007] As a result of diligent research to achieve the above objective, the present inventors have discovered that a composition comprising a compound having an ultraviolet-absorbing group including a triazine skeleton, a benzotriazole skeleton, or a benzophenone skeleton, a specific hindered amine-based light stabilizer that is non-basic or low-basic, and an organic solvent yields a cured film that possesses a high refractive index and high heat resistance and light resistance, thus completing the present invention.

[0008] That is, the present invention provides the following composition for forming a high refractive index film. 1. A non-polymer compound or polymer compound having (A) an ultraviolet-absorbing group containing a triazine skeleton, a benzophenone skeleton or a benzotriazole skeleton, (B) a hindered amine light stabilizer, and (C) an organic solvent, wherein the content of component (B) is 1 to 10 parts by mass relative to 100 parts by mass of component (A), and component (B) is a compound having a group represented by the following formula (b1). (In the formula, R 1b each independently represents a methyl group or an ethyl group, and R 2b represents a linear alkyl group having 1 to 20 carbon atoms or a cyclic alkyl group having 4 to 20 carbon atoms, and * represents a binding site.) 2. The composition for forming a high refractive index film according to 1, wherein the compound having a group represented by the above formula (b1) is a compound represented by the following formula (B1-1) or formula (B1-2). [(In the formula, R 1b and R 2b have the same definitions as in the above formula (b1), R 3b represents a linear alkylene group having 1 to 4 carbon atoms, R 4b represents a hydrogen atom, a methyl group or an ethyl group, X 1b represents a functional group having a triazine skeleton represented by the following formula (xb1), R 5b represents a single bond or a linear alkylene group having 1 to 8 carbon atoms, and each k independently represents 0 or 1.) (In the formula, each R 6b independently represents a hydrogen atom or a linear alkyl group having 1 to 4 carbon atoms, and * represents a binding site.)] 3. The composition for forming a high refractive index film according to 1 or 2, wherein component (A) is a non-polymer compound. 4. The composition for forming a high refractive index film according to 3, wherein the non-polymer compound is a compound represented by the following formula (A1), formula (A2) or formula (A3). (In the formula, X 1a represents an m-valent functional group having a triazine skeleton and a phenolic hydroxy group, each k independently represents 0 or 1, and Ar 1aEach of these independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may have an alkyl group having 1 to 4 carbon atoms as a substituent, and m represents 2 or 3. (In the formula, X 2a Each of the following independently represents a functional group having a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton and a phenolic hydroxyl group; each of the following independently represents 0 or 1; A represents an n-valent organic group which may have an oxygen atom; and n represents an integer from 3 to 6. (In the formula, X 3a Each independently represents a functional group having a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton and a phenolic hydroxyl group, and each independently represents 0 or 1, Ar 2a Each of these independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may each have substituents selected from the group consisting of methyl, ethyl, phenyl, and benzyl groups. 2a ) They may be linked to each other via ether bonds. 5. Composition 3 or 4 for forming a high refractive index film, wherein the molecular weight of the nonpolymer compound is 500 to 3,500. 6. Composition 1 to 5 for forming a high refractive index film, further comprising (D) a curing agent, wherein the content of the curing agent is 15 parts by mass or more per 100 parts by mass of component (A). 7. Composition 6 for forming a high refractive index film, wherein component (D) is a polyfunctional blocked isocyanate compound. 8. Composition 7 for forming a high refractive index film, wherein the polyfunctional blocked isocyanate compound is a homopolymer of (meth)acrylate having a blocked isocyanate group, or a copolymer containing (meth)acrylate having a blocked isocyanate group. 9. Composition 1 to 8 for forming a high refractive index film, further comprising (E) a surfactant. 10. Composition 1 to 9 for forming a high refractive index film, wherein the high refractive index film has a refractive index of 1.65 or more at a wavelength of 550 nm. 11. A microlens made from a cured product of any of the high refractive index film-forming compositions 1 to 10. 12. An electronic device equipped with the microlens of 11.

[0009] The high refractive index film-forming composition of the present invention can form a cured film that possesses both a high refractive index and high heat resistance and light resistance. The cured film formed from the above high refractive index film-forming composition is suitable as an optical component such as a protective film, planarization film, insulating film, anti-reflective film, refractive index control film, microlens, intralayer lens, optical waveguide, and film substrate.

[0010] The present invention will be described in more detail below. The high refractive index film-forming composition according to the present invention comprises: (A) a nonpolymer compound or polymer compound having an ultraviolet-absorbing group including a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton; (B) a hindered amine-based light stabilizer; and (C) an organic solvent, wherein the content of component (B) is 1 to 10 parts by mass per 100 parts by mass of component (A), and component (B) is a compound having a group represented by the following formula (b1). (In the formula, R 1b Each of these independently represents either a methyl group or an ethyl group, R 2b (where * represents a linear alkyl group having 1 to 20 carbon atoms or a cyclic alkyl group having 4 to 20 carbon atoms, and * represents a bond.)

[0011] (A) A nonpolymer or polymer compound having UV-absorbing groups including a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton. Component (A) is the main component constituting the high refractive index film (cured product of the composition of the present invention), but because it has UV-absorbing groups in its structure, it also functions as a UV absorber. Therefore, sufficient light resistance can be obtained without separately adding a UV absorber, which is expected to reduce costs. In addition, because the UV-absorbing groups are uniformly distributed within the high refractive index film, the light resistance effect can be imparted to the entire structure without causing any bias.

[0012] [Nonpolymer Compounds] Nonpolymer compounds having UV-absorbing groups containing a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton are not particularly limited as long as they have UV-absorbing groups containing these structures, but preferred examples include compounds represented by the following formulas (A1) to (A3) (these compounds may also be referred to as nonpolymer compounds (A1) to (A3)).

[0013] In this invention, "non-polymer compound" means a compound having a molecular weight of 3,500 or less and not being a polymer.

[0014] [Compound represented by formula (A1)]

[0015] In the formula, X 1a represents a m-valued functional group having a triazine skeleton and a phenolic hydroxyl group, and k independently represents 0 or 1, Ar 1a Each of these independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may have an alkyl group having 1 to 4 carbon atoms as a substituent, and m represents 2 or 3.

[0016] The above X 1a Examples of functional groups represented by the formula (x11) or formula (x12) below include, but are not limited to, the group represented by the formula (x11) or formula (x12).

[0017]

[0018] During the ceremony, Z 1a represents an aromatic hydrocarbon group having 6 to 20 carbon atoms or a non-aromatic heterocyclic group having 3 to 10 carbon atoms, which may have substituents selected from the group consisting of an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, or an alkyl group having 1 to 8 carbon atoms and an alkoxy group having 1 to 8 carbon atoms. * represents a bond.

[0019] Examples of aromatic hydrocarbon groups having 6 to 20 carbon atoms include phenyl, biphenyl, terphenyl, naphthyl, fluorenyl, benzofluorenyl, dibenzofluorenyl, phenanthryl, fluoranthenyl, anthryl, chrysenyl, pyrenyl, triphenylene, or perilenyl groups. In the present invention, aromatic hydrocarbon groups having 6 to 14 carbon atoms are preferred, groups having a benzene ring or a naphthalene ring are preferred, and phenyl, naphthyl, and biphenyl groups are more preferred.

[0020] Examples of non-aromatic heterocyclic groups having 3 to 10 carbon atoms include monovalent groups having a tetrahydrofuran ring, pyrrolidine ring, piperidine ring, imidazolidine ring, imidazoline ring, pyrazolidine ring, pyrazoline ring, oxazolidine ring, oxazoline ring, thiazolidine ring, thiazoline ring, morpholine ring, etc. More specifically, examples include non-aromatic heterocyclic groups containing at least one heteroatom such as a nitrogen atom, oxygen atom, or sulfur atom, such as a tetrahydrofuranyl group, pyrrolidyl group, piperidyl group, imidazolidyl group, imidazolyl group, pyrazolidine group, pyrazolyl group, oxazolidine group, oxazolyl group, thiazolidyl group, thiazolyl group, or morpholino group. In the present invention, among these, non-aromatic heterocyclic groups having 3 to 6 carbon atoms are preferred, oxazolidine groups and morpholino groups are preferred, and morpholino groups are more preferred.

[0021] Examples of alkyl groups having 1 to 8 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, i-butyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, and n-octyl group. In the present invention, alkyl groups having 1 to 4 carbon atoms are preferred among these, with methyl group and ethyl group being preferred, and methyl group being more preferred.

[0022] Examples of alkoxy groups having 1 to 8 carbon atoms include methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, i-butoxy, s-butoxy, t-butoxy, n-pentoxy, n-hexyloxy, n-heptyloxy, and n-octyloxy groups. In the present invention, among these, alkoxy groups having 1 to 4 carbon atoms are preferred, methoxy and ethoxy groups are preferred, and methoxy groups are more preferred.

[0023] The above Z 1a Suitable specific examples include, but are not limited to, the groups represented by the following formulas (z1) to (z4).

[0024] (In the formula, * represents a bond.)

[0025] The above X 1a Preferred embodiments of the functional group represented by the formulas (x13) and (x14) below include the group represented by the formulas (x13) and (x14).

[0026] (In the formula, Z 1a This is synonymous with the definition of equation (x11). * represents a bond.

[0027] Ar 1a Examples of aromatic hydrocarbon groups having 6 to 14 carbon atoms represented by include phenyl, naphthyl, anthracenyl, phenantrenyl, fluorenyl, and biphenylyl groups. In the present invention, among these, phenylene, naphthylene, and biphenylylene groups are preferred.

[0028] Ar 1aExamples of aromatic heterocyclic groups having 3 to 14 carbon atoms represented by include monovalent groups having a furan ring, thiophene ring, pyridine ring, thiazole ring, benzothiazole ring, quinoline ring, isoquinoline ring, benzofuran ring, isobenzofuran ring, or carbazole ring. More specifically, examples include aromatic heterocyclic groups containing at least one heteroatom such as a nitrogen atom, oxygen atom, or sulfur atom, such as a furyl group, thienyl group, pyridinyl group, thiazolyl group, benzothiazolyl group, quinolyl group, isoquinolinyl group, benzofuryl group, isobenzofuryl group, or carbazolyl group. Among these, the carbazolyl group is preferred in the present invention.

[0029] The above-mentioned aromatic hydrocarbon group and aromatic heterocyclic group may have a C1-C4 alkyl group as a substituent. Examples of C1-C4 alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, i-butyl, s-butyl, and t-butyl groups. When these groups have substituents, the number is not particularly limited and may be one or two or more.

[0030] Preferred embodiments of the above-mentioned nonpolymer compound (A1) include, but are not limited to, those represented by the following formulas (A1-1) or (A1-2).

[0031] (In the formula, Ar 1a And k is synonymous with the definition of formula (A1) above, and Z 1a This is equivalent to the definition of equation (x11).

[0032] Specific examples of the above-mentioned nonpolymer compound (A1) include, but are not limited to, the compounds represented by the following formulas (A1-1-1) to (A1-2-3).

[0033]

[0034]

[0035]

[0036] The above nonpolymer compound (A1) can be obtained by reacting a compound represented by the following formula (T1) with a compound represented by the following formula (E1).

[0037] (In the formula, X 1a , k, m and Ar 1a This is equivalent to the definition in formula (A1) above.

[0038] Specific examples of compounds represented by the above formula (T1) include, but are not limited to, the compounds represented by the following formulas (T1-1) to (T1-2).

[0039]

[0040] Specific examples of compounds represented by the following formula (E1) include, but are not limited to, the compounds represented by the following formulas (E1-1) to (E1-4).

[0041]

[0042] The method for synthesizing the above nonpolymer compound (A1) is not particularly limited, but for example, one method involves dissolving the compound represented by formula (T1) and the compound represented by formula (E1) in an organic solvent in an appropriate ratio (molar ratio) according to the valence of the compound represented by formula (T1) (corresponding to m in formula (T1)), and reacting them at 60 to 150°C for 1 to 48 hours in the presence of a catalyst.

[0043] The organic solvent used in the above reaction is not particularly limited as long as it dissolves the raw materials and catalyst used. Specific examples include those similar to the organic solvents used in the high refractive index film-forming composition described later, but from the viewpoint of solubility of the raw material compounds, tetrahydropyran, 1,4-dioxane, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclopentanone, cyclohexanone, N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, and N-ethyl-2-pyrrolidone are preferred. These organic solvents may be used individually or in combination of two or more.

[0044] Furthermore, while known catalysts that promote the reaction between epoxy groups and phenolic hydroxyl groups can be used as the catalyst, in the present invention, quaternary phosphonium salts and quaternary ammonium salts can be suitably used, with quaternary phosphonium salts being more preferred.

[0045] Examples of quaternary phosphonium salts include methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide, butyltriphenylphosphonium bromide, hexyltriphenylphosphonium bromide, tetrabutylphosphonium bromide, benzyltriphenylphosphonium bromide, methyltriphenylphosphonium chloride, ethyltriphenylphosphonium chloride, butyltriphenylphosphonium chloride, hexyltriphenylphosphonium chloride, tetrabutylphosphonium chloride, benzyltriphenylphosphonium chloride, methyltriphenylphosphonium iodide, ethyltriphenylphosphonium iodide, butyltriphenylphosphonium iodide, hexyltriphenylphosphonium iodide, tetrabutylphosphonium iodide, and benzyltriphenylphosphonium iodide. In the present invention, ethyltriphenylphosphonium bromide and tetrabutylphosphonium bromide can be suitably used.

[0046] Examples of quaternary ammonium salts include tetramethylammonium fluoride, tetramethylammonium chloride, tetramethylammonium bromide, tetramethylammonium nitrate, tetramethylammonium sulfate, tetramethylammonium acetate, tetraethylammonium chloride, tetraethylammonium bromide, tetrapropylammonium chloride, tetrapropylammonium bromide, tetrabutylammonium fluoride, tetrabutylammonium chloride, tetrabutylammonium bromide, benzyltrimethylammonium chloride, phenyltrimethylammonium chloride, benzyltriethylammonium chloride, methyltributylammonium chloride, benzyltributylammonium chloride, and methyltrioctylammonium chloride. In the present invention, benzyltriethylammonium chloride can be preferably used.

[0047] [Compound represented by formula (A2)]

[0048] In the formula, X 2a Each independently represents a functional group having a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton and a phenolic hydroxyl group, each independently represents 0 or 1, A represents an n-valent organic group which may have an oxygen atom, and n represents an integer from 3 to 6.

[0049] n represents an integer between 3 and 6, but 3 to 5 is preferred.

[0050] The organic group represented by A above may include, but is not limited to, any group represented by the following formulas (a1) to (a7). (In the formula, * represents a bond.)

[0051] Multiple X 2a These may all be the same base or they may all be different.

[0052] The above X 2aAmong these, groups having a triazine skeleton or a benzophenone skeleton are particularly preferred from the viewpoint of solubility in organic solvents and ultraviolet absorption. It is also preferable to have both a group having a triazine skeleton and a group having a benzophenone skeleton.

[0053] The above X 2a Examples of functional groups having a triazine skeleton represented by the formula (x21) below include the group represented by the formula (x21).

[0054] (In the formula, R 1a and R 2a Each of these independently represents a hydrogen atom, a hydroxyl group, a methyl group, or an ethyl group, and the above R 1a and R 2a At least one of them is a hydroxyl group, R 11 and R 12 Each of these independently represents either a methyl group or an ethyl group; each of these independently represents an integer from 0 to 3; and each of these independently represents an integer from 0 to 2.

[0055] In the group having a triazine skeleton represented by the above formula (x21), from the viewpoint of ultraviolet absorption, the above R 2a A preferred embodiment is one in which at least one of the groups is a hydroxyl group.

[0056] The above X 2a A more preferred embodiment of the functional group having a triazine skeleton represented by the formula (x21-1) below is the group represented by the formula (x21-1). Furthermore, considering ultraviolet absorption, it is more preferable that at least one of the n ultraviolet absorbing groups is the group represented by the formula (x21-1).

[0057] (In the formula, R 11 Each of the following independently represents either a methyl group or an ethyl group; each of the following independently represents an integer from 0 to 5; and * represents a bond.

[0058] The above X 2a Specific examples of functional groups having a triazine skeleton represented by the formula (x21-2) below include, but are not limited to, the group represented by the formula (x21-2).

[0059] (In the formula, * represents a bond.)

[0060] The above X 2a Examples of functional groups having a benzophenone skeleton represented by the formula (x22) include the group represented by the following formula.

[0061] (In the formula, R 3a Each of these independently represents a hydrogen atom or a hydroxyl group, and the above R 3a At least one of them is a hydroxyl group. (* represents a bond.)

[0062] The above X 2a A more preferred embodiment of the functional group having a benzophenone skeleton represented by the formula (x22-1) is the group represented by the following formula.

[0063] (In the formula, * represents a bond.)

[0064] The above X 2a Specific examples of functional groups having a benzophenone skeleton represented by the formula (x²²-2) below include, but are not limited to, the group represented by the formula (x²²-2).

[0065] (In the formula, * represents a bond.)

[0066] The above X 2a Examples of functional groups having a benzotriazole skeleton represented by the formula (x23) include the group represented by the following formula.

[0067] (In the formula, R 4a Each of these independently represents a hydrogen atom or a hydroxyl group, and the above R 4a At least one of them is a hydroxyl group. (* represents a bond.)

[0068] The above X 2a A more preferred embodiment of the functional group having a benzotriazole skeleton represented by the formula (x23-1) is the group represented by the following formula.

[0069] (In the formula, * represents a bond.)

[0070] The above X2a Specific examples of functional groups having a benzotriazole skeleton represented by the formula (x23-2) below include, but are not limited to, the group represented by the formula (x23-2).

[0071] (In the formula, * represents a bond.)

[0072] Specific examples of the above-mentioned nonpolymer compound (A2) include, but are not limited to, the compounds represented by the following formulas (A2-1) to (A2-21).

[0073]

[0074]

[0075] In the formula, X 21 and X 22 Each of these represents a base expressed by the following formula.

[0076] (In the formula, * represents a bond.)

[0077]

[0078]

[0079] The above nonpolymer compound (A2) is a compound having 3 to 6 epoxy groups in one molecule, and the above X 2a It can be obtained by reacting it with a compound having a functional group represented by .

[0080] Specific examples of compounds having 3 to 6 epoxy groups in one molecule include, but are not limited to, the compounds represented by the following formulas (E2-1) to (E2-7).

[0081]

[0082] The above X 2a Compounds having the functional group represented by the formulas (T2-1) to (T2-3) below include, but are not limited to, the compounds represented by these formulas.

[0083]

[0084]

[0085]

[0086] The method for synthesizing the above nonpolymer compound (A2) is not particularly limited, but for example, a compound having 3 to 6 epoxy groups in one molecule and the above X 2a One method involves dissolving a compound having a functional group represented by in an organic solvent in an appropriate ratio (molar ratio) corresponding to the number of epoxy groups, and reacting it in the presence of a catalyst at 60 to 150°C for 1 to 48 hours.

[0087] The organic solvent used in the above reaction is not particularly limited as long as it dissolves the raw materials and catalyst used. Specific examples include those similar to those exemplified in the description of the nonpolymer compound (A1) above.

[0088] Furthermore, while known catalysts that promote the reaction between epoxy groups and phenolic hydroxyl groups can be used as the catalyst, in the present invention, quaternary phosphonium salts and quaternary ammonium salts can be suitably used, with quaternary phosphonium salts being more preferred.

[0089] Specific examples of quaternary phosphonium salts and quaternary ammonium salts are the same as those exemplified in the description of the nonpolymer compound (A1) above.

[0090] [Compound represented by formula (A3)]

[0091] In the formula, X 3a Each independently represents a functional group having a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton and a phenolic hydroxyl group, and each independently represents 0 or 1, Ar 2a Each of these independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may each have substituents selected from the group consisting of methyl, ethyl, phenyl, and benzyl groups. 2a They may be linked to each other via etheric bonds.

[0092] Examples of aromatic hydrocarbon groups having 6 to 14 carbon atoms include phenylene, naphthylene, anthracenylene, phenantrenylene, fluorenylene, and biphenylylene groups. In the present invention, among these, phenylene, naphthylene, and biphenylylene groups are preferred.

[0093] Examples of aromatic heterocyclic groups having 3 to 14 carbon atoms include divalent groups having a furan ring, thiophene ring, pyridine ring, thiazole ring, benzothiazole ring, quinoline ring, isoquinoline ring, benzofuran ring, isobenzofuran ring, or carbazole ring. More specifically, examples include aromatic heterocyclic groups containing at least one heteroatom such as a nitrogen atom, oxygen atom, or sulfur atom, such as a franziyl group, pyrrolediyl group, thiophendiyl group, pyridinediyl group, thiazolediyl group, benzothiazolediyl group, quinolinediyl group, isoquinolinediyl group, benzofranziyl group, isobenzofranziyl group, and carbazolediyl group.

[0094] The above-mentioned aromatic hydrocarbon group and aromatic heterocyclic group may have the substituents described above. If these groups have substituents, the number is not particularly limited and may be one or two or more.

[0095] 2 Ar 2a Examples of groups formed by the linkage of these elements via ether bonds include the group represented by the following formula (Ar-1).

[0096] (In the formula, * represents a bond.)

[0097] The above X 3a These may all be the same base or they may all be different.

[0098] The above X 3a Among these, functional groups having a triazine skeleton or a benzophenone skeleton are preferred from the viewpoint of solubility in organic solvents and ultraviolet absorption, and it is also preferable to have both a group having a triazine skeleton and a functional group having a benzophenone skeleton.

[0099] The above X 3aExamples of functional groups having a triazine skeleton represented by the formula (x31) below include the group represented by the formula (x31) below. Examples of preferred embodiments of the group represented by the formula (x31) below include the group represented by the formula (x32) below.

[0100] (In formula (x31), Ar 3a Each independently represents an aromatic group having 6 to 14 carbon atoms, such as a benzene ring, or a nitrogen-containing heterocyclic group having 3 to 14 carbon atoms, such as a pyridine ring, which may each have substituents selected from the group consisting of hydroxyl, methyl, ethyl, and phenyl groups. 2a These are, independently, a single bond, an ether bond, a sulfide bond, an -O-C(=O)- group, or an -NR 23 - Represents the base, R 23 Ar represents a hydrogen atom, a methyl group, or an ethyl group. 3a At least one of them has a phenolic hydroxyl group. * represents a bond. In formula (x32), R 5a and R 6a Each of these independently represents a hydrogen atom, a hydroxyl group, a methyl group, or an ethyl group, and R 21 and R 22 Each independently represents a methyl group, an ethyl group, or a phenyl group, each independently represents an integer from 0 to 3, and each independently represents an integer from 0 to 2, Z 2a This is synonymous with the definition of equation (x31), and R 5a and R 6a At least one of them is a hydroxyl group. (* represents a bond.)

[0101] The above R 5a and R 6a Preferably, the R is a hydrogen atom, a hydroxyl group, or a methyl group. 5a and R 6a By having at least one of the groups be a hydroxyl group (i.e., a phenolic hydroxyl group), the resulting nonpolymer compound (A3) can be imparted with ultraviolet absorption properties, and an improvement in the light resistance of the resulting cured film can be expected. In particular, R 6a An embodiment in which at least one of the groups is a hydroxyl group is more effective.

[0102] As more preferable embodiments of the functional group having the triazine skeleton, groups represented by the following formula (x33) are mentioned, and as even more preferable embodiments, groups represented by the following formula (x34) are mentioned.

[0103] (wherein R 21 , p1 and * have the same definitions as in formula (x32) above.)

[0104] Specific examples of the functional group having the triazine skeleton include, but are not limited to, any group represented by the following formulas (x3-1) to (x3-11).

[0105] (wherein * represents a bonding site.)

[0106] The above-mentioned X 3a As the functional group having a benzophenone skeleton represented by , for example, a group represented by the following formula (x35) may be mentioned.

[0107] (wherein R 7a each independently represent a hydrogen atom or a hydroxy group, and at least one of the above R 7a is a hydroxy group. * represents a bonding site.)

[0108] The above-mentioned X 3a Preferable embodiments of the functional group having a benzophenone skeleton represented by include, but are not limited to, a group represented by the following formula (x36).

[0109] (wherein * represents a bonding site.)

[0110] The above-mentioned X 3a Specific examples of the functional group having a benzophenone skeleton represented by include, but are not limited to, a group represented by the following formula (x3-12).

[0111] (wherein * represents a bonding site.)

[0112] The above-mentioned X 3aExamples of functional groups having a benzotriazole skeleton represented by the formula (x37) include the group represented by the following formula.

[0113] (In the formula, R 8a Each of these independently represents a hydrogen atom or a hydroxyl group, and the above R 8a At least one of them is a hydroxyl group. (* represents a bond.)

[0114] The above X 3a A more preferred embodiment of the functional group having a benzotriazole skeleton represented by the formula (x38) is the group represented by the following formula.

[0115] (In the formula, * represents a bond.)

[0116] The above X 2a Specific examples of functional groups having a benzotriazole skeleton represented by the formula (x3-13) below include, but are not limited to, the group represented by the formula (x3-13).

[0117] (In the formula, * represents a bond.)

[0118] Specific examples of the above-mentioned nonpolymer compound (A3) include, but are not limited to, the compounds represented by the following formulas (A3-1) to (A3-8).

[0119]

[0120] In the formula, X 31 x represents one of the groups expressed by the above formulas (x³-1) to (x³-11) and (x³-12). Note that the two X 31 They may be the same or different, but it is preferable that they be the same.

[0121]

[0122] The above nonpolymer compound (A3) can be obtained by reacting a compound having two epoxy groups in one molecule and a fluorene skeleton (hereinafter sometimes referred to as "epoxy compound") with a compound having a functional group having a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton and a phenolic hydroxyl group (hereinafter sometimes referred to as "triazine skeleton-containing compound," "benzophenone skeleton-containing compound," or "benzotriazole skeleton-containing compound," respectively).

[0123] Specific examples of epoxy group compounds include, but are not limited to, the compounds represented by the following formulas (E3-1) to (E3-4).

[0124]

[0125] Examples of triazine skeleton-containing compounds include, but are not limited to, those represented by the following formulas (T3-1) to (T3-11).

[0126]

[0127] Examples of benzophenone skeleton-containing compounds include, but are not limited to, the compound represented by the following formula (T3-12).

[0128]

[0129] Examples of benzotriazole skeleton-containing compounds include, but are not limited to, the compound represented by the following formula (T3-13).

[0130]

[0131] The method for synthesizing the above-mentioned nonpolymer compound (A3) is not particularly limited, but for example, one method involves dissolving the epoxy group compound described above and the triazine skeleton-containing compound, benzophenone skeleton-containing compound, or benzotriazole skeleton-containing compound in an organic solvent in an appropriate ratio (molar ratio) according to the number of epoxy groups, and reacting them at 60 to 150°C for 1 to 48 hours in the presence of a catalyst.

[0132] The organic solvent used in the above reaction is not particularly limited as long as it dissolves the raw materials and catalyst used. Specific examples include those similar to those exemplified in the description of the nonpolymer compound (A1) above.

[0133] Furthermore, while catalysts known to promote the reaction between epoxy groups and phenolic hydroxyl groups or carboxyl groups can be used as the catalyst, in the present invention, quaternary phosphonium salts and quaternary ammonium salts can be suitably used, with quaternary phosphonium salts being more preferred.

[0134] Specific examples of quaternary phosphonium salts and quaternary ammonium salts are the same as those exemplified in the description of the nonpolymer compound (A1) above.

[0135] The molecular weight of the above nonpolymer compound is, from the viewpoint of solubility in organic solvents, for example, 500 to 3,500, preferably 500 to 3,000, and more preferably 1,000 to 3,000.

[0136] [Polymer Compounds] Polymer compounds having UV-absorbing groups containing a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton are not particularly limited as long as they contain repeating units having UV-absorbing groups containing these structures.

[0137] The polymer compound described above may be a polymer of a single monomer (homopolymer) or a copolymer of multiple monomers. If the polymer compound is a copolymer, it may be a random copolymer, a block copolymer, or a graft copolymer. If the polymer compound is a graft copolymer, it may be a comb-shaped graft copolymer or a star-shaped graft copolymer.

[0138] Examples of the UV-absorbing groups mentioned above are the same as those described in the description of the nonpolymer compound (A2). The UV-absorbing groups may be present in the main chain or the side chain of the polymer compound.

[0139] Examples of the repeating unit contained in the above polymer compound include, but are not limited to, those represented by the following formulas (P1) to (P5).

[0140] (In the formula, R 0 represents a hydrogen atom or a methyl group, and A 1 and A 2 each independently represent a hydrogen atom or a hydroxy group, at least one of A 1 and A 2 is a hydroxy group, each a independently represents an integer of 0 to 3, and X represents a divalent organic group including a ring selected from the group consisting of aromatic rings, aliphatic rings and nitrogen-containing heterocycles.)

[0141] Examples of the aromatic ring in the divalent organic group represented by X above include a benzene ring, a naphthalene ring, an anthracene ring, a fluorene ring, a pyrene ring, and a triphenylene ring.

[0142] Examples of the aliphatic ring in the divalent organic group represented by X above include a cyclopentane ring and a cyclohexane ring.

[0143] Examples of the nitrogen-containing heterocycle in the divalent organic group represented by X above include a triazine ring, a triazole ring, a pyridine ring, and a pyrazine ring.

[0144] In addition, preferred embodiments of the repeating unit represented by the above formula (P5) include those represented by the following formula (P5-1).

[0145] (In the formula, A 1 , A 2 and X have the same definitions as in the above formula (P5).)

[0146] The above polymer compound may, within a range that does not impair the effects of the present invention, contain other repeating units besides the repeating unit containing the above ultraviolet absorbing group. Examples of the other repeating units include those containing functional groups such as blocked isocyanate groups, carboxy groups blocked with vinyl ether, epoxy groups, hydroxy groups, and aryl groups.

[0147] Other repeating units mentioned above include, but are not limited to, those represented by the following formulas (Q1) to (Q8). By selecting the repeating units represented by the following formulas (Q1) to (Q6) as other repeating units, a self-crosslinking polymer can be formed. Furthermore, by selecting repeating units containing naphthyl groups or biphenylyl groups, such as the following formulas (Q7) and (Q8), as other repeating units, the refractive index of the polymer compound can be improved.

[0148] (In the formula, R 0 (This represents a hydrogen atom or a methyl group.)

[0149] When other repeating units are included as described above, their content is preferably 80 mol% or less, more preferably 70 mol% or less, and even more preferably 50 mol% or less, from the viewpoint of obtaining a thin film with a high refractive index with good reproducibility. The lower limit of the above content is not particularly limited, but 10 mol% or more is preferred as the amount that will produce the desired effect.

[0150] Specific examples of the polymer compounds mentioned above include, but are not limited to, compounds having repeating units represented by the following formulas (A3-9) to (A3-12).

[0151]

[0152] The weight-average molecular weight (Mw) of the above polymer compound is not particularly limited, but from the viewpoint of handling when preparing the solution, it is preferably 1,000 to 200,000, more preferably 1,500 to 150,000, and even more preferably 2,000 to 100,000.

[0153] Furthermore, the weight-average molecular weight (Mn) of the above polymer compound is not particularly limited, but from the viewpoint of handling when preparing the solution, it is preferably 500 to 150,000, more preferably 750 to 100,000, and even more preferably 1,000 to 50,000.

[0154] Note that the above Mw and Mn values ​​are polystyrene equivalent values ​​obtained by gel permeation chromatography (GPC).

[0155] The above polymer compounds can be synthesized by polymerization of monomers having acrylic, methacrylic, or vinyl groups, which serve as raw material compounds. Alternatively, they can be synthesized by polyaddition reaction between a diexoxy compound, which serves as a raw material compound, and a compound having two or more hydroxyl groups. The above synthesis method is not particularly limited as long as the desired compound is obtained, and known synthesis methods can be employed.

[0156] (B) Hindered amine light stabilizers (B) Known hindered amine light stabilizers having a group represented by the following formula (b1) can be used. Hindered amine light stabilizers having a group represented by the following formula (b1) are non-basic or low-basic.

[0157]

[0158] In the formula, R 1b Each of these independently represents either a methyl group or an ethyl group, R 2b * represents a linear alkyl group having 1 to 20 carbon atoms or a cyclic alkyl group having 4 to 20 carbon atoms, and * represents a bond.

[0159] Examples of chain-like alkyl groups having 1 to 20 carbon atoms include methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, n-heptadecyl, n-octadecyl, n-nonadecyl, and n-eicosanyl groups. Among the chain-like alkyl groups having 1 to 20 carbon atoms, those having 3 to 20 carbon atoms may have branched chains. In the present invention, among these, chain-like alkyl groups having 4 to 15 carbon atoms are preferred, and those having 8 to 11 carbon atoms are more preferred.

[0160] Examples of cyclic alkyl groups having 4 to 20 carbon atoms include cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, cyclononyl group, cyclodecyl group, bicyclobutyl group, bicyclopentyl group, bicyclohexyl group, bicycloheptyl group, bicyclooctyl group, bicyclononyl group, and bicyclodecyl group. In the present invention, among these, cyclic alkyl groups having 4 to 12 carbon atoms are preferred, and cyclic alkyl groups having 4 to 8 carbon atoms are more preferred.

[0161] As compounds having the group represented by the above formula (b1), compounds represented by the following formulas (B1-1) or (B1-2) are preferred.

[0162] [(wherein, R 1b and R 2b This is equivalent to the definition of equation (b1) above, and R 3b R represents a chain-like alkylene group having 1 to 4 carbon atoms. 4b X represents a hydrogen atom, a methyl group, or an ethyl group. 1b R represents a functional group having a triazine skeleton represented by the following formula (xb1), 5b (where k represents a single bond or a chain alkylene group having 1 to 8 carbon atoms, and k independently represents either 0 or 1.) (In the formula, R 6b Each of these independently represents a hydrogen atom or a chain-like alkyl group having 1 to 4 carbon atoms, and * represents a bond.

[0163] Examples of chain-like alkylene groups having 1 to 4 carbon atoms include methylene groups, ethylene groups, trimethylene groups, and n-butylene groups. In the present invention, methylene groups and ethylene groups are preferred among these.

[0164] Examples of chain alkyl groups having 1 to 4 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, and isobutyl groups. Among these, the n-butyl group is preferred in the present invention.

[0165] Specific examples of compounds represented by the above formula (B1-1) include, but are not limited to, the compound represented by the following formula (B1-1-1).

[0166]

[0167] Specific examples of compounds represented by the above formula (B1-2) include, but are not limited to, the compounds represented by the following formulas (B1-2-1) to (B1-2-2).

[0168]

[0169] The above-mentioned hindered amine-based light stabilizers may be used individually or in combination of two or more types.

[0170] The above component (B) can also be a commercially available product. Examples of commercially available products include TINUVIN® 123, TINUVIN® 152 (both manufactured by BASF Corporation); and ADEKA Stab® LA-81 (both manufactured by ADEKA Corporation).

[0171] The content of component (B) is 1 to 15 parts by mass, preferably 1 to 10 parts by mass, and more preferably 1 to 5 parts by mass, per 100 parts by mass of component (A).

[0172] (C) Organic solvent The organic solvent is not particularly limited as long as it dissolves the above nonpolymer compound. Specific examples include methylcyclohexane, ethylcyclohexane, n-heptane, toluene, o-xylene, m-xylene, mesitylene, chlorobenzene, o-dichlorobenzene, m-dichlorobenzene, anisole, phenethole, di-n-propyl ether, di-n-butyl ether, diisobutyl ether, di-n-pentyl ether, diisopentyl ether, di-n-hexyl ether, n-butyl ethyl ether, methyl-n-pentyl ether, cyclopentyl methyl ether, tetrahydropyran, 1,3-dioxane, 1,4-dioxane, 1-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol, 1-pentanol, 2-pentanol, 3-pentanol, cyclopentanol, benzyl alcohol, ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol Diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, triethylene glycol monomethyl ether, triethylene glycol dimethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol dimethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol dimethyl ether, n-butyl formate, isobutyl formate, n-pentyl formate, isopentyl formate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, tert-butyl acetate, n-pentyl acetate, isopentyl acetate, n-hexyl acetate, isohexyl acetate, n-heptyl acetate, isoheptyl acetate, n-octyl acetate,Isooctyl acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol diacetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate , propylene glycol diacetate, triacetin, ethyl propionate, n-propyl propionate, isopropyl propionate, n-butyl propionate, isobutyl propionate, tert-butyl propionate, propylene glycol monomethyl ether propionate, methyl butyrate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, isobutyl butyrate, tert-butyl butyrate, methyl isobutyrate, ethyl isobutyrate, n-propyl isobutyrate, isopropyl Ropyluisobutyrate, n-butylisobutyrate, isobutylisobutyrate, tert-butylisobutyrate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, tert-butyl lactate, methyl acetate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, tert-butyl acetate, dimethylmalonate, diethylmalonate, Methyl glycolate, ethyl glycolate, methyl pyruvate, ethyl pyruvate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, dimethyl carbonate, diethyl carbonate, 2-pentanone, 3-pentanone, cyclopentanone, 2,4-pentanedione, 4-methyl-2-pentanone, 4-hydroxy-4-methyl-2-pentanone, 2-hexanone, 3-hexanone, 3-methyl-2-hexanone, 5-methyl-2-hexanone,Examples include 2-methyl-3-hexanone, 5-methyl-3-hexanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, 2-heptanone, 3-heptanone, 4-heptanone, 2-methyl-3-heptanone, 5-methyl-3-heptanone, 2,6-dimethyl-4-heptanone, cycloheptanone, γ-butyrolactone, γ-valerolactone, γ-caprolactone, δ-valerolactone, δ-caprolactone, ε-caprolactone, N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diethylacetamide, N,N-dimethylisobutylamide, N-methyl-2-pyrrolidone, and N-ethyl-2-pyrrolidone. These organic solvents may be used individually or in combination of two or more.

[0173] Among the above organic solvents, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, ethyl lactate, n-butyl lactate, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, 2-heptanone, cyclopentanone, cyclohexanone, γ-butyrolactone, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, and N-ethyl-2-pyrrolidone are preferred from the viewpoint of improving the leveling properties of the coating film formed by applying the high refractive index film-forming composition of the present invention onto a substrate.

[0174] (D) Curing agent (D) The curing agent is an optional component included for the purpose of improving the chemical resistance (solvent resistance) of the cured film formed from the high refractive index film-forming composition of the present invention. If the above component (A) is a polymer compound and is a self-crosslinking polymer, the present invention does not require a curing agent.

[0175] Examples of the curing agents mentioned above include polyfunctional (meth)acrylate compounds, hydroxymethyl or alkoxymethyl group-substituted phenol compounds, compounds having alkoxyalkylated amino groups, and polyfunctional blocked isocyanate compounds. In this specification, (meth)acrylate means methacrylate and acrylate. These curing agents may be used individually or in combination of two or more.

[0176] If component (D) is included, its content varies depending on the coating solvent used, the substrate used, the required solution viscosity, the required film shape, etc., but is 15 parts by mass or more per 100 parts by mass of component (A), preferably 15 to 80 parts by mass, more preferably 15 to 70 parts by mass, and even more preferably 20 to 60 parts by mass. These curing agents may undergo a curing reaction by self-condensation, but if crosslinkable substituents are present in the nonpolymer compound of the present invention, they can undergo a crosslinking reaction with those crosslinkable substituents.

[0177] Examples of the above polyfunctional (meth)acrylate compounds include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, dipropylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, and polypropylene glycol di(meth)acrylate. , 1,4-butanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, tricyclodecanedimethanol di(meth)acrylate, dicyclopentanyl di(meth)acrylate, bisphenol A di(meth)acrylate, ethoxylated bisphenol A di(meth)acrylate, propoxylated bisphenol A di(meth)acrylate, bisphenol S di(meth)acrylate, phthalate di(meth)acrylate, 9,9 - Bis[4-(2-(meth)acryloyloxyethoxy)phenyl]fluorene, glycerin di(meth)acrylate, glycerin tri(meth)acrolate, glycerin ethoxytri(meth)acrylate, glycerin propoxytri(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolpropane ethoxytri(meth)acrylate, trimethylolpropane propoxytri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, penta Examples include erythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol ethoxytetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, sorbitol hexa(meth)acrylate, tris(2-(meth)acryloyloxyethyl) isocyanurate, and ε-caprolactone-modified tris-(2-(meth)acryloyloxyethyl) isocyanurate.

[0178] Furthermore, the above-mentioned polyfunctional (meth)acrylate compounds include hydroxyl group-containing (meth)acrylates or polyfunctional (meth)acrylates containing hydroxyl groups, such as 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, glycerin di(meth)acrylate, pentaerythritol tri(meth)acrylate, and dipentaerythritol penta(meth)acrylate, as well as 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylene diisocyanate, 1,4-xylene diisocyanate, xylylene diisocyanate, 1,5-naphthalene diisocyanate, and m-phenylene Examples include polyfunctional urethane (meth)acrylates obtained by reacting diisocyanate compounds such as diisocyanate, p-phenylenediisocyanate, diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate, 4,4'-dibenzyle diisocyanate, isophorone diisocyanate, 1,6-hexamethylene diisocyanate, dicyclohexylmethane diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, 1,3-bis(isocyanatomethyl)benzene, and 1,3-bis(isocyanatomethyl)cyclohexane.

[0179] Furthermore, as the above-mentioned polyfunctional (meth)acrylate compounds, polyfunctional epoxy (meth)acrylates can also be mentioned, which are synthesized by reacting (meth)acrylic acid with homopolymers or copolymers obtained by radical polymerization of epoxy group-containing (meth)acrylate monomers such as glycidyl (meth)acrylate, glycidyloxybutyl (meth)acrylate, and 3,4-epoxycyclohexylmethyl (meth)acrylate. Here, copolymer means a polymer obtained by polymerizing two or more monomers. The copolymer may be a copolymer obtained by polymerizing two or more epoxy group-containing (meth)acrylates, or it may be a copolymer obtained by polymerizing epoxy group-containing (meth)acrylate and other (meth)acrylates.

[0180] The above-mentioned polyfunctional (meth)acrylate compounds are also available commercially. Examples of such commercially available products include the following: Arronix® M-208, M-210, M-211B, M-215, M-220, M-225, M-233, M-240, M-245, M-260, M-270, M-303, M-305, M-306, M-309, M-310, M-313, M-315, M-321, M-350, M-360, M-400, M-402, M-403, M-404, M-405, and M-406. , M-408, M-450, M-452, M-460, M-510, M-520, M-1100, M-1200, M-1210, M-1310, M-1600, M-1960, M-6100, M-6200, M-6250, M-6500, M-7100, M-7300K, M-8030, M-8060, M-8100, M-8530, M-8560, M-9050 (all manufactured by Toagosei Co., Ltd.); KAYARAD® NPGDA, PEG400DA, FM-400, R-167, HX-220, HX-620, R-526, R-551, R-712, R-604, R-684, GPO-303, TMPTA, HDDA, TPGDA, KS-HDD A, KS-TPGDA, MANDA, THE-330, TPA-320, TPA-330, PET-30, T-1420, T-1 420(T), RP-1040, DPHA, DPEA-12, D-310, D-330, DPCA-20, DPCA-30, DP CA-60, DPCA-120, FM-700, DN-0075, DN-2475, TC-120S, R-115, R-130, R-381, EAM-2160, CCR-1291H, CCR-1235, ZAR-1035, ZAR-2000, ZFR-1401 H, ZFA-1491H, ZCR-1569H, ZCR-1601H, ZCR-1797H, ZCR-1798H, UXE-3000 , UXE-3024, UX-3204, UX-4101, UXT-6100, UX-6101, UX-7101, UX-8101,Same as UX-0937, UXF-4001-M35, UXF-4002, DPHA-40H, UX-5000, UX-5102D-M20, UX-5103D, UX-5005 (all manufactured by Nippon Pharmaceutical Co., Ltd.); NKエステルA200, same as A-400, same as A-600, same as A-1000, same as A-1500, same as A-2000, same as A BE-300, same as A-BPE-4, same as A-BPE-6, same as A-BPE-10, same as A-BPE-20, same as A-BPE- 30. The same as A-BPEF, the same as A-BPP-3, the same as A-DCP, the same as A-DOD-N, the same as A-HD-N, the same as A-NOD, the same as A-GLY-3E, same as A-GLY-9E, same as A-GLY-20E, same as A-TMPT, same as A-TMPT-3EO, same as A- TMPT-9EO, same as ATM-4E, same as ATM-35E, same as APG-100, same as APG-200, same as APG-400, same as APG-700, same as A-PTMG-65, same as A-1000PER, same as A-B1206PE, same as 701A, same as A-9300, same as A-9300-1CL, same as A-9300-6CL, same as A-9530, same as ADP-51EH, same as ATM-31EH, same as A-TMM-3, same as A-TMM-3L, same as A-TMM-3LM-N, same as AD-TMP, same as A-TMMT, same as A-9550, same as A-DPH, same as A-DPH-12E, same as 1G, same as 2G, same as 3G, same as 4G, same as 9G, same as 14G, same as 23G, same as BPE-80N, same as BPE-100, same as BPE-100N, same as BPE-200, same as BPE-500, same as BPE-900, same as BPE-1300N, same as DCP, same as DOD-N, same as HD-N, same as NOD-N, same as NPG, same as 1206PE, same as 701, same as 3PG, same as 9PG, same as TMPT, NK Economizer A-PG5009E, same as A-PG5027E, same as A -PG5054E, NK Origo U-2PPA, same as U-6LPA, same as U-10HA, same as U-10PA, same as UA-1100H, same as U-4H, same as U-6H, same as U-4HA, same as U-6HA, same as U-15HA, same as UA-32P, same as UA-33H, Same as UA-53H, U-200PA, U-324A, UA-160TM, UA-290TM, UA-4200, UA-4400, UA-122P, UA-7100, UA-W2A (all manufactured by Shin-Nakamura Chemical Industry Co., Ltd.); Viscort #195, same as #230, same as #260, same as #310HP, same as #335HP, same as #700HV, same as #540, same as #802.Same as #295, same as #300, same as #360, same as #230D, BAC-45, SPDBA-S30, STAR-501 (all manufactured by Osaka Organic Chemical Industry Co., Ltd.); Light Ester P-2M, P-2M, P-2M, P-2M, P-3M, P-4M, P-9M, P-14M, P-14M, P-14M, P-4M, P-5M, P-6M, P-101P, P-2M, P-2EMK, P-4M, P-5M, P-6M, P-4M, P-6M, P-9M, P-14M, P-6M, P-4M, P-6M, P-6M, P-7M, P-8M, P-9M, P-4M, P-6 BP-4PA, HPP-A, G-201P, TMP-A, PE-3A, PE-4A, DPE-6A, epoxy ester 40EM, 70PA, 200PA, 80MFA, 3002M(N), 3002A(N), 3000MK, 3000A, EX-0205, AH-600, AT-600, UA-306H, UA-306T, UA-306I, UA-510H, UF-8001G, DAUA-167 (all manufactured by Kyoeisha Chemical Co., Ltd.); Art Resin® UN-333, UN-350, UN-1255, UN-2600, UN-2700, UN-5200, UN-5500, UN-5590, UN-5507, UN-6060PTM, UN-6200, UN-6202, UN-6300, UN-6301, UN-7600, UN-7700, UN-90 00H, UN-9000PEP, UN-9200A, UN-3320HA, UN-3200HB, UN-3320HC, UN-3320HS, UN-904, UN -906S, UN-901T, UN-905, UN-906, UN-952, HDP-4T, HMP-2, H-61, HDP-M20 (manufactured by Negami Kogyo Co., Ltd.); Shiko [registered trademark] UV-1400B, UV-1700B, UV-2000B, UV-2010B, UV-2750B, UV-3000B, UV-3200B, UV-3210EA, UV-3 300B, UV-3310B, UV-3500BA, UV-3520TL, UV-3610D80, UV-3630D80, UV-3640PE80, UV-3700B, UV-6100B,UV-6300B, UV-6640B, UV-7000, UV-7000B, UV-7461TE, UV-7510B, UV-7550B, UV-7600B, UV-7605B, UV-7610B, UV- 7620EA, UV-7630B, UV-7640B, UV-7650B, UV-NS001, UV-NS034, UV-NS054, UV-NS063, UV-NS077 (manufactured by Nippon Gosei Kagaku Kogyo Co., Ltd.); Beamset® 243NS, 255, 261, 271, 502H, 504H, 505A-6, 550B, 575, 577, 700, 710, 730, 750, AQ-17, EM-90, EM-92, 371, 381 (all manufactured by Arakawa Chemical Industries, Ltd.); Funcryl® FA-124AS, FA-129AS, FA-222A, FA-240A, FA-P240A, FA-P270A, FA-321A, FA-324A, FA-PTG9A, FA-731A, FA-121M, FA-124M, FA-125M, FA-220M, FA-240M, FA-320M, FA-321M, FA-3218M, FA-PTG9M, FA-137M (all manufactured by Resonac Co., Ltd.); SR212, SR213, SR230, SR238F, SR259, SR268, SR272, SR306H, SR344, SR349, SR508, CD560, CD561, CD564, SR601, SR602, SR610, SR833S , SR9003, CD9043, SR9045, SR9209, SR205, SR206, SR209, SR210, SR214, SR231, SR239, SR248, SR252, SR297, SR348, SR480, CD540, CD5 41, CD542, SR603, SR644, SR9036, SR351S, SR368, SR415, SR444, SR454, SR492, SR499, CD501, SR502, SR9020, CD9021, SR9035, SR350, SR295, SR355, SR399, SR494, SR9041, SR9041, CN929, CN961E75, CN961H81, CN962, CN963, CN963A80, CN963B80, CN963E75, CN963E80,CN963J85, CN964, CN964E75, CN964A85, CN965, CN965A80, CN966A80, CN966H90, CN966J75, C N966R60, CN968, CN980, CN981, CN981A75, CN981B88, CN982, CN982A75, CN982B88, CN982E75, CN983, CN985B88, CN996, CN9001, CN9002, CN9788, CN9893, CN970A60, CN970E60, CN971, CN97 1A80, CN972, CN973A80, CN973H85, CN973J75, CN975, CN977C70, CN978, CN9782, CN9783, CN10 4, CN104A80, CN104B80, CN111, CN112C60, CN115, CN116, CN118, CN120, CN120A60, CN120A75 , CN120B60, CN120B80, CN120C60, CN120C80, CN120D80, CN102E50, CN120M50, CN124, CNUVE15 1. CNUVE151 / 80, CN151, CN2203, CN2270, CN2271, CN2273, CN2274, CN307, CN371, CN550, CN551, SB401, SB402, SB404, SB500E50, SB500K60, SB510E35, SB520E35, SB520M35 (all manufactured by Sartmar); DPGDA, HODA, TPGDA, PEG400DA-D, HPNDA, PETIA, PETRA, TMPTA, TMPEOTA, OTA480, DPHA, IRR214-K, IRR679, IRR742, IRR793, (ACA) Z200M, (ACA) Z230AA, (ACA) Z250, (ACA) Z251, (ACA) Z300, (ACA) Z320, (ACA) Z254F, EBECRYL® 145 , same 150, same 11, same 135, same 40, same 140, same 1142, same 180, same 204, same 205, same 210, same 215, same 220, same 230, same 244, same 245, same 264, same 265, same 270, same 280 / 151B, same 284, same 285, same 294 / 25HD, same 1259, same 1290, same 4820, same 4858, same 5129, same 8210, same 8254, same 8301R, same 8307, same 8402, same 8405, same 8411,Same 8465, same 8800, same 8804, same 8807, same 9260, same 9270, same 8311, same 8701, same 9227EA, same 436, same 438, same 446, same 450, same 524, same 525, same 770, same 800, same 810, same 811, same 812, same 1830, same 846, same 851, same 852, same 853, same 1870, same 884, same 885, same 600, same 605, same 645, same 648, same 860, same 1606, same 3500, same 3603, same 3608, same 3700, same 3701, same 3702, same 37 03, 3708, 6040, 8110, 271, 1258, 1291, 4100, 4200, 4500, 4680, 4220, 4265, 4491, 4513, 4587, 4666, 4683, 4738, 4740, 4250, 4510, KRM® 8200, 8200AE, 8296, 8452, 8904, 8667, 8912, 8981, 8762, 8713B, 8528 (all manufactured by Daicel Ornex Co., Ltd.); BAEA-100, BAEM-100, BAEM-50, BEEM-50, BFEA-50, HPEA-100, CNEA-100, PNEM-50, RNEA-100, TEA-100, KUA-4I, KUA-6I, KUA-9N, KUA-10H, KUA-15N, KUA-C2I, KUA-PC2I, KUA-PEA2I, KUA-PEB2I, KUA-PEC2I, RP-274S, RP-310 (all manufactured by KSM Corporation). ,

[0181] These polyfunctional (meth)acrylate compounds may be used individually or in combination of two or more.

[0182] Examples of the hydroxymethyl group or alkoxymethyl group-substituted phenol compounds include 1,3,5-trihydroxymethylbenzene, 2,6-dihydroxymethyl-4-methylphenol, 2,4-dihydroxymethyl-6-methylphenol, bis(2-hydroxy-3-hydroxymethyl-5-methylphenyl)methane, bis(4-hydroxy-3-hydroxymethyl-5-methylphenyl)methane, 2,2-bis(4-hydroxy-3,5-dihydroxymethylphenyl)propane, 3,3',5,5'-tetrahydroxymethyl-4,4'-bisphenol, and compounds in which some or all of the hydroxymethyl groups in these compounds are substituted with alkoxymethyl groups such as methoxymethyl groups and butoxymethyl groups. These hydroxymethyl group or alkoxymethyl group-substituted phenol compounds may be used individually or in combination of two or more.

[0183] Examples of compounds having the above-mentioned alkoxyalkylated amino group include nitrogen-containing compounds having multiple active methylol groups in a single molecule, such as (poly)methylolated melamine, (poly)methylolated glycoluryl, (poly)methylolated benzoguanamine, and (poly)methylolated urea, in which at least one hydrogen atom of the hydroxyl group in the methylol group is substituted with an alkyl group such as a methyl group or a butyl group.

[0184] The above-mentioned compound having an alkoxyalkylated amino group may be a mixture of multiple substituted compounds, and some mixtures may contain oligomeric components formed by the self-condensation of the compound, but any of these mixtures can be used.

[0185] The above-mentioned compounds having alkoxyalkylated amino groups can also be obtained as commercial products. Such commercial products include, for example, hexamethoxymethylmelamine (manufactured by CYTEC, CYMEL® 303, 303LF), tetrabutoxymethylglycoluryl (manufactured by CYTEC, CYMEL® 1170), tetramethoxymethylbenzoguanamine (manufactured by CYTEC, CYMEL® 1123), and other products in the CYMEL series; tetramethoxymethylglycoluryl (manufactured by CYTEC, Examples include products in the POWDERLINK series such as POWDERLINK® 1174), and products in the Nikalac series such as methylated melamine resin (manufactured by Sanwa Chemical Co., Ltd., Nikalac® MW-30HM, MW-390, MW-100LM, MX-750LM) and methylated urea resin (manufactured by Sanwa Chemical Co., Ltd., Nikalac® MX-270, MX-280, MX-290). These compounds having alkoxyalkylated amino groups may be used individually or in combination of two or more.

[0186] The above-mentioned polyfunctional blocked isocyanate compound has two or more isocyanate groups in one molecule, each isocyanate group blocked by an appropriate protecting group, and when exposed to the high temperature during thermal curing, the protecting group (blocking portion) thermally dissociates and detaches, and the resulting isocyanate group undergoes a crosslinking reaction with the resin.

[0187] Such polyfunctional blocked isocyanate compounds can be obtained, for example, by reacting a suitable blocking agent with a polyfunctional isocyanate compound having two or more isocyanate groups in one molecule.

[0188] The above polyfunctional isocyanate compounds include 1,4-tetramethylene diisocyanate, 1,5-pentamethylene diisocyanate, 1,6-hexamethylene diisocyanate, 2,2,4-trimethyl-1,6-hexamethylene diisocyanate, 1,3,6-hexamethylene triisocyanate, lysine diisocyanate, isophorone diisocyanate, 4,4'-dicyclohexylmethane diisocyanate, and 1,3-bis(isocyanate). Anate-methyl)cyclohexane, 1,4-cyclohexyl diisocyanate, 2,6-bis(isocyanate-methyl)tetrahydrodicyclopentadiene, bis(isocyanate-methyl)dicyclopentadiene, bis(isocyanate-methyl)adamantane, 2,5-diisocyanate-methylnorbornene, norbornane diisocyanate, dicycloheptane triisocyanate, 4,4'-diphenylmethane diisocyanate, 2,4 -Tolylene diisocyanate, 2,6-tolylene diisocyanate, xylylene diisocyanate, tetramethylxylylene diisocyanate, 1,5-naphthalene diisocyanate, p-phenylene diisocyanate, 1,3-bis(isocyanate methyl)benzene, dianisidine diisocyanate, 3,3'-dimethyldiphenyl-4,4'-diisocyanate, diphenyl ether diisocyanate, 2,6-bis(isocyanate Tomethyl)decahydronaphthalene, bis(diisocyanate tolyl)phenylmethane, 1,1'-methylenebis(3-methyl-4-isocyanate-benzene), 1,3-bis(1-isocyanate-1-methylethyl)benzene, 1,4-bis(1-isocyanate-1-methylethyl)benzene, 4,4'-biphenylenediisocyanate, 3,3'-dimethyl-4,4'-biphenylenediisocyanate, 3,3'-dimethoxy-4,Examples include 4'-biphenylenediisocyanate, bis(isocyanate-methyl)thiophene, bis(isocyanate-methyl)tetrahydrothiophene, and modified compounds thereof (e.g., isocyanurate, biuret, ethylene glycol adduct, propylene glycol adduct, trimethylolpropane adduct, ethanolamine adduct, polyester polyol adduct, polyether polyol adduct, polyamide adduct, polyamine adduct).

[0189] Examples of the above blocking agents include alcohols such as methanol, ethanol, isopropanol, n-butanol, heptanol, hexanol, 2-ethoxyhexanol, cyclohexanol, octanol, isononyl alcohol, stearyl alcohol, benzyl alcohol, 2-ethoxyethanol, methyl lactate, ethyl lactate, amyl lactate, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether), triethylene glycol monoethyl ether, N,N-dimethylaminoethanol, N,N-diethylaminoethanol, N,N-dibutylaminoethanol, phenol, ethylphenol, propylphenol, butylphenol, octylphenol, nonylphenol, nitrophenol, chlorophenol, o- Phenols such as cresol, m-cresol, p-cresol, and xylenol; lactams such as α-pyrrolidone, β-butyrolactam, β-propiolactam, γ-butyrolactam, δ-valerolactam, and ε-caprolactam; oximes such as acetone oxime, methyl ethyl ketone oxime, methyl isobutyl ketone oxime, diethyl ketone oxime, cyclohexanone oxime, acetophenone oxime, and benzophenone oxime; pyrazoles, 3,5-dimethylpyrazole, 3-methylpyrazole, and 4-methylpyrazole. Pyrazoles such as 3,5-dimethylpyrazole, 4-nitro-3,5-dimethylpyrazole, 4-bromo-3,5-dimethylpyrazole, and 3-methyl-5-phenylpyrazole; mercaptans such as butyl mercaptan, hexyl mercaptan, dodecyl mercaptan, and benzenethiol; active methylene compounds such as malonic acid diesters, acetoacetate esters, malonic acid dinitrile, acetylacetone, methylenedisulfone, dibenzoylmethane, dipivaloylmethane, and acetone dicarboxylic acid diesters;Examples include amines such as dibutylamine, diisopropylamine, di-tert-butylamine, di(2-ethylhexyl)amine, dicyclohexylamine, benzylamine, diphenylamine, aniline, and carbazole; imidazoles such as imidazole and 2-ethylimidazole; imines such as methyleneimine, ethyleneimine, polyethyleneimine, and propyleneimine; acid amides such as acetanilide, acrylamide, acetic acid amide, and dimer acid amide; acid imides such as succinimide, maleimide, and phthalimide; and urea compounds such as urea, thiourea, and ethyleneurea. Furthermore, internal block types due to uretdione bonding (dimerization of isocyanate groups) may also be present.

[0190] The above-mentioned polyfunctional blocked isocyanate compounds are also available commercially. Examples of such commercially available products include the following: Takenate® B-815N, B-830, B-842N, B-846N, B-870, B-870N, B-874, B-874N, B-882, B-882N, B-5010, B-7005, B-7030, and B-7075 (all manufactured by Mitsui Chemicals, Inc.); Duranate® ME20-B80S, MF-B60B, MF-B60X, MF-B90B, MF-K60B, MF-K60X, SBN-70D, 17B-60P, 17B-60PX, TPA-B80E, TPA-B80X, E402-B80B, E402-B80T, K6000 (all manufactured by Asahi Kasei Corporation); Coronate® 2503, 2507, 2512, 2513, 2515, 2520, 2554, BI-301, AP-M, Millionate MS-50 (all manufactured by Tosoh Corporation); Barnock® D-500, D-550, DB-980K (all manufactured by DIC Corporation); Desmodule® BL-3175, BL-4165, BL-4265, BL-1100, BL-1265, TPLS-2957, TPLS-2062, TPLS-2078, TPLS-2117, BL-3475, Desmosarm® 2170, 2265 (all manufactured by Sumika Covestro Urethane Co., Ltd.); TRIXENE BI-7641, BI-7642, BI-7986, BI-7987, BI-7950, BI-7951, BI-7960, BI-7961, BI-7963, BI-7981, BI-7982, BI-7984, BI-7986, BI-7990, BI-7991, BI-7992, BI-7770, BI-7772, BI-7779, DP9C / 214 (all manufactured by Bakusenden Chemicals Co., Ltd.); VESTANAT® B1358A, B1358 / 100, B1370, VESTAGON® B1065, B1400, B1530, BF1320, BF1540 (all manufactured by Evonik Industries).

[0191] Furthermore, examples of the polyfunctional blocked isocyanate compounds include homopolymers or copolymers obtained by radical polymerization of (meth)acrylates having blocked isocyanate groups. Here, copolymer means a polymer obtained by polymerizing two or more monomers. The copolymer may be a copolymer obtained by polymerizing two or more (meth)acrylates having blocked isocyanate groups, or a copolymer obtained by polymerizing a (meth)acrylate having blocked isocyanate groups and other (meth)acrylates. Such (meth)acrylates having blocked isocyanate groups can also be obtained as commercial products. Examples of such commercial products include Karens® MOI-BM, AOI-BM, MOI-BP, and AOI-BP manufactured by Resonaq Corporation.

[0192] Specific examples of homopolymers or copolymers obtained by radical polymerization of (meth)acrylates having blocked isocyanate groups include those represented by the following formulas (D-1) to (D-5).

[0193]

[0194] These polyfunctional block isocyanate compounds may be used individually or in combination of two or more.

[0195] In the present invention, as a catalyst to promote the above crosslinking reaction, acidic compounds such as p-toluenesulfonic acid, trifluoromethanesulfonic acid, pyridinium-p-toluenesulfonic acid, salicylic acid, sulfosalicylic acid, citric acid, benzoic acid, hydroxybenzoic acid, and naphthalenecarboxylic acid can be incorporated; and thermoacid generators such as 2,4,4,6-tetrabromocyclohexadienone, benzoin tosylate, 2-nitrobenzyl tosylate, and other organic alkyl sulfonates can be incorporated. The above acidic compounds and thermoacid generators can also be incorporated in combination.

[0196] The amount of catalyst added is preferably 0.0001 to 20 parts by mass, and more preferably 0.0005 to 10 parts by mass, per 100 parts by mass of component (A) of the high refractive index film forming composition of the present invention.

[0197] (E) Surfactant The high refractive index film-forming composition of the present invention may also contain (E) surfactant for the purpose of improving coatability.(E) Examples of surfactants include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, and polyoxyethylene oleyl ether; polyoxyethylene alkylaryl ethers such as polyoxyethylene octylphenyl ether and polyoxyethylene nonylphenyl ether; polyoxyethylene / polyoxypropylene block copolymers; sorbitan fatty acid esters such as sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate, sorbitan trioleate, and sorbitan tristearate; and polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monopalmitate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan trioleate, and polyoxyethylene sorbitan tristearate. Nonionic surfactants such as lensorbitan fatty acid esters; F-Top® EF301, EF303, EF352 (all manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd.), Megafac® F171, F173, R-30, R-40, R-40-LM (all manufactured by DIC Corporation), Florard FC430, FC431 (both manufactured by 3M Japan Ltd.), Asahi Guard® AG710, Surflon® S-382, SC101 Fluorine-based surfactants such as the F-Tergent series (manufactured by Neos Co., Ltd.), including SC102, SC103, SC104, SC105, SC106 (manufactured by AGC Inc.), DFX-18, FTX-206D, FTX-212D, FTX-218, FTX-220D, FTX-230D, FTX-240D, FTX-212P, FTX-220P, FTX-228P, FTX-240G, etc.; organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow No. 7, No. 36, No. 50E, No. 75, No. 77, No. 85, No. 85HF, No. Examples include non-fluorinated surfactants such as No. 90, No. 90D-50, No. 95, No. 99C, and No. PW-95 (all manufactured by Kyoeisha Chemical Co., Ltd.).These surfactants may be used individually or in combination of two or more.

[0198] If the above-mentioned component (E) is included, its content is preferably 0.0001 to 3 parts by mass, more preferably 0.001 to 1 part by mass, and even more preferably 0.01 to 0.5 parts by mass, per 100 parts by mass of component (A).

[0199] [Other Additives] The high refractive index film-forming composition of the present invention may contain, as necessary, antioxidants, thermobase generators, ultraviolet absorbers different from component (A) of the present invention (hereinafter sometimes referred to as "other ultraviolet absorbers"), adhesion aids, plasticizers, sensitizers, etc., as long as they do not impair the effects of the present invention.

[0200] A thermal base generator is a compound that generates a base by undergoing bond cleavage upon heating. Specific examples of thermal base generators include 1,8-diazabicyclo[5.4.0]undecene-7 2-ethylhexanoate, 1,8-diazabicyclo[5.4.0]undecene-7 phenol salt, 1,8-diazabicyclo[5.4.0]undecene-7 formate, 1,8-diazabicyclo[5.4.0]undecene-7 o-phthalate, 1,8-diazabicyclo[5.4.0]undecene-7 p-toluenesulfonate, 1,5-diazabicyclo[4.3.0]nonene-5 2-ethylhexanoate, benzyltriphenylphosphonium bromide, bis(2-morpholinoethyl) ether, and 1,1'-[[3-(dimethylamino)propyl]imino]bis(2-propanol). These compounds may be used individually or in combination of two or more.

[0201] The above-mentioned thermal base generators can also be commercially available. Commercially available products include U-CAT(registered trademark) SA1, U-CAT(registered trademark) SA102, U-CAT(registered trademark) SA102-50, U-CAT(registered trademark) SA106, U-CAT(registered trademark) SA112, U-CAT(registered trademark) SA506, U-CAT(registered trademark) SA603, U-CAT(registered trademark) 1000, U-CAT(registered trademark) 1102, U-CAT(registered trademark) 2000, U-CAT(registered trademark) 2024, U-CAT(registered trademark) 2026, U-CAT(registered trademark) 2030, U-CAT(registered trademark) Examples include 2110, U-CAT® 2313, U-CAT® 651M, U-CAT® 660M, U-CAT® 18X, U-CAT® 201G, U-CAT® 202, U-CAT® 420A, U-CAT® 130 (all manufactured by Sunapro Co., Ltd.), POLYCAT® 8, POLYCAT® 9, POLYCAT® 12, POLYCAT® 41 (all manufactured by Evonik Industries, Ltd.).

[0202] When the above-mentioned thermobase generating agent is included, its content is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 7 parts by mass, and even more preferably 0.5 to 5 parts by mass, per 100 parts by mass of component (A).

[0203] Specific examples of the above-mentioned other UV absorbers include 2-[4-[(2-hydroxy-3-dodecyloxypropyl)oxy]-2-hydroxy-phenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-[4-[(2-hydroxy-3-tridecyloxypropyl)oxy]-2-hydroxy-phenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-[4- [(2-hydroxy-3-(2-ethyl-hexyloxy)propyl)oxy]-2-hydroxy-phenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2,4-bis(2-hydroxy-4-butyroxyphenyl)-6-(2,4-bis-butyroxyphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-[1-octyroxycarbonylethoxy]phenyl)-4,6-bis Examples include benzotriazine-based UV absorbers such as (4-phenylphenyl)-1,3,5-triazine; benzotriazole-based UV absorbers such as 2-(2H-benzotriazole-2-yl)-4,6-bis(1-methyl-1-phenylethyl)phenol, 2-(2-hydroxy-5-tert-butylphenyl)-2H-benzotriazole, and 2-[2-hydroxy-5-(2-(meth)acryloyloxyethyl)phenyl]-2H-benzotriazole; benzophenone-based UV absorbers such as 2,4-dihydroxybenzophenone and 2-hydroxy-4-methoxybenzophenone; cyanoacrylate-based UV absorbers such as ethyl-2-cyano-3,3-diphenylacrylate and octyl-2-cyano-3,3-diphenylacrylate; and inorganic microparticles that absorb ultraviolet light, such as titanium dioxide microparticles, zinc oxide microparticles, and tin oxide microparticles. The UV absorbers listed above may be used individually or in combination of two or more.

[0204] Other UV absorbers listed above can also be commercially available. Examples of commercially available products include TINUVIN® PS, TINUVIN® 99-2, TINUVIN® 234, TINUVIN® 326, TINUVIN® 329, TINUVIN® 900, TINUVIN® 928, TINUVIN® 360, TINUVIN® 384-2, TINUVIN® 400, TINUVIN® 405, and TINUVIN® Examples include [Registered Trademark] 460, TINUVIN [Registered Trademark] 477, TINUVIN [Registered Trademark] 479 (all manufactured by BASF); Adeka Stab [Registered Trademark] LA-46, Adeka Stab [Registered Trademark] LA-F70, Adeka Stab [Registered Trademark] LA-29, Adeka Stab [Registered Trademark] LA-31G, Adeka Stab [Registered Trademark] LA-32, Adeka Stab [Registered Trademark] LA-36 (all manufactured by ADEKA Corporation); RUVA-93 (manufactured by Otsuka Chemical Co., Ltd.), etc.

[0205] If the above-mentioned other ultraviolet absorbers are included, their content is preferably 15 parts by mass or less, more preferably 10 parts by mass or less, and even more preferably 7 parts by mass or less, per 100 parts by mass of component (A), and it is most preferable that they are not included.

[0206] The method for preparing the high refractive index film-forming composition of the present invention is not particularly limited, but for example, one method is to dissolve the nonpolymer or polymer compound of component (A) and the hindered amine-based light stabilizer (B) in the organic solvent of component (C) to obtain a homogeneous solution. Furthermore, at an appropriate stage of this preparation method, one method is to further add and mix (D) a curing agent, (E) a surfactant, and other additives as needed. In order to obtain a thin film with higher flatness with good reproducibility, the high refractive index film-forming composition may be filtered using a sub-micrometer-order filter or the like at an intermediate stage in the preparation of the composition, or after all components have been mixed, as needed.

[0207] The solid content concentration of the high refractive index film-forming composition of the present invention is set appropriately considering the coating properties of the composition and the characteristics of the object to which the film is to be formed, but is usually about 0.1 to 35% by mass, preferably about 1 to 30% by mass, and more preferably about 5 to 25% by mass. The solid content refers to components other than the organic solvent that constitute the high refractive index film-forming composition.

[0208] The use of the high refractive index film-forming composition of the present invention will be described below. <Method for producing a cured film> A method for producing a cured film using the high refractive index film-forming composition of the present invention will be described below. The high refractive index film-forming composition of the present invention is applied to an organic film, a film substrate (e.g., PET film, polyimide film), or a component by an appropriate coating method such as a spinner or coater, and then baked using a heating means such as a hot plate or oven to produce a cured film. The baking conditions are appropriately selected from a baking temperature of 50 to 300°C and a baking time of 0.1 to 360 minutes. The baking process when producing the above cured film may be carried out in two or more steps. The thickness of the formed cured film is, for example, 0.001 to 1,000 μm, preferably 0.01 to 100 μm, and more preferably 0.1 to 10 μm.

[0209] The cured film produced using the high refractive index film-forming composition of the present invention can be used as an optical component such as a protective film, planarization film, insulating film, anti-reflective film, refractive index control film, microlens, intralayer lens, optical waveguide, or film substrate.

[0210] The present invention will be described in more detail below with reference to synthesis examples, examples, and comparative examples, but the present invention is not limited to the following examples.

[0211] The compounds used in the following synthesis examples, examples, and comparative examples are as follows: [Solvents] PGMEA: Propylene glycol monomethyl ether acetate CHN: Cyclohexanone CPN: Cyclopentanone THF: Tetrahydrofuran

[0212] [Ingredients] BDMT: 2,4-bis(2,4-dihydroxyphenyl)-6-(methoxyphenyl)-1,3,5-triazine

[0213] TDPT: 2,4,6-Tris(2,4-dihydroxyphenyl)-1,3,5-triazine

[0214] EX-142-IM: 2-phenylphenol glycidyl ether (manufactured by Nagase ChemteX Corporation, trade name: Denacol® EX-142-IM)

[0215] PETG: Epoxidation reaction product of pentaerythritol tetraallyl ether with hydrogen peroxide (manufactured by Resonac Co., Ltd., trade name: Showfree® PETG)

[0216] BNFG: 9,9-bis(6-glycidyloxy-2-naphthyl)fluorene

[0217] G01100: Epoxy group-containing acrylic polymer (manufactured by NOF Corporation, trade name: Marproof® G-01100), a polymer containing repeating units represented by the following formula, with more than six epoxy groups per molecule.

[0218] DBDT: 2-(2,4-dihydroxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine

[0219] PPT: 2-(2,4-dihydroxyphenyl)-4,6-bis(2,4-phenyl)-1,3,5-triazine

[0220] MOI-BP: 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl methacrylate (manufactured by Resonaq Corporation, trade name: Karenz (registered trademark) MOI-BP)

[0221] MOI-BM: 2-[O-(1'-methylpropyleneneamino)carboxyamino]ethyl methacrylate (manufactured by Resonac Co., Ltd., trade name: Karenz (registered trademark) MOI-BM)

[0222] AOI-BP: 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl acrylate (manufactured by Resonaq Corporation, trade name: Karenz® AOI-BP)

[0223] RUVA-93: 2-[2-hydroxy-5-[2-(methacryloyloxy)ethyl]phenyl]-2H-benzotriazole (manufactured by Otsuka Chemical Co., Ltd., trade name: RUVA-93)

[0224] Light stabilizer (HALS) 1:2,4-bis[N-butyl-N-(1-cyclohexyloxy-2,2,6,6-tetramethylpiperidine-4-yl)amino]-6-(2-hydroxyethylamino)-1,3,5-triazine (manufactured by BASF, trade name: TINUVIN® 152)

[0225] Light stabilizer (HALS) 2: Bis(1-octoxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate (manufactured by BASF, trade name: TINUVIN® 123)

[0226] Light stabilizer (HALS) 3: Bis(1,2,2,6,6-pentamethyl-4-piperidinyl)-[[3,5-bis(1,1-dimethylethyl)-4-hydroxyphenyl]methyl]butylmalonate (manufactured by BASF, trade name: TINUVIN® 144)

[0227] Light stabilizer (HALS) 4: Bis(1,2,2,6,6-pentamethyl-4-piperidyl) sebacate (manufactured by ADEKA Corporation, product name: ADEKA Stab® LA-72)

[0228] Light stabilizer (HALS) 5: Bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate (manufactured by ADEKA Corporation, product name: ADEKA Stab® LA-77G)

[0229] Furthermore, the weight-average molecular weight (Mw) and number-average molecular weight (Mn) of the polymers were measured using a GPC instrument manufactured by Shimadzu Corporation (columns: Shodex® KF803L and KF804L (manufactured by Resonac Corporation); eluent: THF, flow rate: 1.0 mL / min, column temperature: 40°C, Mw and Mn: values ​​equivalent to standard polystyrene).

[0230] [1] Synthesis of nonpolymer and polymer compounds [Synthesis Example 1-1] 3.00 g of PETG (epoxy equivalent 128), 12.86 g of DBDT (32.36 mmol), and 0.12 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 37.9 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 379 g of methanol, and the precipitated solid was filtered and dried to obtain 13.9 g of powder of the nonpolymer compound (A-1) represented by the following formula (yield 88%).

[0231]

[0232] [Synthesis Example 1-2] 3.93 g of EX-142-IM (240 g epoxy equivalent), 3.00 g of BDMT (7.44 mmol), and 0.17 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 28.9 g of CHN and reacted at 120°C for 18 hours. The reaction mixture was added dropwise to 289 g of methanol, and the precipitated solid was filtered and dried to obtain 5.67 g of powder of the nonpolymer compound (A-2) represented by the following formula (yield 88%).

[0233]

[0234] [Synthesis Example 1-3] 3.00 g of EX-142-IM (260 g epoxy equivalent), 1.69 g of TDPT (4.17 mmol), and 0.07 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 45.0 g of CHN and reacted at 120°C for 18 hours. The reaction mixture was added dropwise to 300 g of methanol, and the precipitated solid was filtered and dried to obtain 4.02 g of powder of the nonpolymer compound (A-3) represented by the following formula (yield 88%).

[0235]

[0236] [Synthesis Example 1-4] 3.89 g of BNFG (293 g epoxy equivalent), 5.00 g of DBDT (12.58 mmol), and 0.19 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 21.1 g of CHN and reacted at 120°C for 20 hours. The reaction mixture was added dropwise to 211 g of methanol, and the precipitated solid was filtered and dried to obtain 8.71 g of powder of the nonpolymer compound (A-4) represented by the following formula (yield 98%).

[0237]

[0238] [Synthesis Example 1-5] 4.29 g of BNFG (293 g epoxy equivalent), 5.00 g of PPT (14.65 mmol), and 0.22 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 22.2 g of CHN and reacted at 120°C for 20 hours. The reaction mixture was added dropwise to 222 g of methanol, and the precipitated solid was filtered and dried to obtain 9.01 g of powder of the nonpolymer compound (A-5) represented by the following formula (yield 97%).

[0239]

[0240] [Synthesis Example 1-6] 2.15 g of G01100 (epoxy equivalent 170), 5.00 g of DBDT (12.58 mmol), and 0.17 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 29.3 g of CHN and reacted at 120°C for 20 hours to obtain a polymer solution with a solid content of 20% by mass containing a polymer (A-6) having repeating units represented by the following formula. The obtained polymer compound had a Mw of 23,000 and a Mn of 12,000.

[0241]

[0242] [Synthesis Example 1-7] 9.00 g of BNFG (epoxy equivalent: 293.0 g / eq), 5.66 g of 2,4,4'-trihydroxybenzophenone, 0.23 g of ethyltriphenylphosphonium bromide, and 61.39 g of cyclohexanone were mixed and reacted at 120°C for 18 hours under a nitrogen atmosphere to obtain a solution (solid content concentration 20% by mass) containing a polymer having a structural unit represented by the following formula (A-7). The weight-average molecular weight Mw of the obtained polymer compound was 2,900 and Mn was 1,100.

[0243]

[0244] [Synthesis Example 1-8] 9.55 g (29.6 mmol) of RUVA-93, 1.52 g (9.85 mmol) of 2-vinylnaphthalene, 0.70 g (4.92 mmol) of glycidyl methacrylate, 0.92 g (4.92 mmol) of 1-butoxyethyl methacrylate, and 0.42 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 53.2 g of PGMEA and reacted at 70°C for 20 hours to obtain a polymer solution with a solid content of 15% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (A-8) having repeating units represented by the following formula. The obtained polymer compound had a Mw of 20,000 and a Mn of 9,100.

[0245]

[0246] [Synthesis Example 1-9] 10.0 g (30.9 mmol) of RUVA-93, 0.97 g (3.87 mmol) of MOI-BP, 0.50 g (3.87 mmol) of 2-hydroxyethyl methacrylate, and 0.57 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 55.8 g of PGMEA and reacted at 70°C for 20 hours to obtain a polymer solution with a solid content of 15% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (A-9) having repeating units represented by the following formula. The obtained polymer compound had a Mw of 24,000 and a Mn of 9,700.

[0247]

[0248] [2] Synthesis of curing agent [Synthesis Example 2-1] 10.00 g (39.79 mmol) of MOI-BP and 0.78 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 25.1 g of PGMEA and reacted at 70°C for 20 hours to obtain a polymer solution with a solid content of 30% by mass. The obtained polymer solution was gradually added dropwise to 400 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (D-1) having repeating units represented by the following formula. The obtained polymer had an Mw of 32,000 and an Mn of 14,000.

[0249]

[0250] [Synthesis Example 2-2] 10.00 g (41.27 mmol) of MOI-BM and 0.40 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 31.2 g of PGMEA and reacted at 80°C for 20 hours to obtain a polymer solution with a solid content of 25% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (D-2) having repeating units represented by the following formula. The obtained polymer had a Mw of 7,800 and a Mn of 4,100.

[0251]

[0252] [Synthesis Example 2-3] 10.00 g (42.15 mmol) of AOI-BP and 0.42 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 32.0 g of PGMEA and reacted at 80°C for 20 hours to obtain a polymer solution with a solid content of 25% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (D-3) having repeating units represented by the following formula. The obtained polymer had an Mw of 30,000 and an Mn of 13,000.

[0253]

[0254] [Synthesis Example 2-4] 5.00 g (19.90 mmol) of MOI-BP, 2.75 g (8.53 mmol) of RUVA-93, and 0.42 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 46.3 g of PGMEA and reacted at 70°C for 20 hours to obtain a polymer solution with a solid content of 15% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (D-4) having repeating units represented by the following formula. The obtained polymer had a Mw of 21,000 and a Mn of 9,300.

[0255]

[0256] [Synthesis Example 2-5] 5.00 g (19.90 mmol) of MOI-BP, 1.63 g (8.53 mmol) of vinyl biphenyl, and 0.42 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 35.6 g of PGMEA and reacted at 70°C for 20 hours to obtain a polymer solution with a solid content of 15% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (D-5) having repeating units represented by the following formula. The obtained polymer had a Mw of 31,000 and a Mn of 13,000.

[0257]

[0258] [3] Preparation of composition for forming high refractive index film [Example 1-1] 100 parts by mass of the nonpolymer compound (A-1) obtained in Synthesis Example 1-1 was mixed with 30 parts by mass of the polymer (B-1) obtained in Synthesis Example 2-1 as a curing agent, and 0.5 parts by mass of Polyflow No. 90 (manufactured by Kyoeisha Chemical Co., Ltd.) as a surfactant. CHN was added as an organic solvent to obtain a solution with a solid content of 21.0% by mass. The obtained solution was then filtered using a PTFE microfilter with a pore size of 0.2 μm to prepare the composition for forming high refractive index film (C-1).

[0259] [Examples 1-2 to 1-10, Comparative Examples 1-1 to 1-8] Compositions (C-2) to (C-18) for forming high refractive index films were prepared in the same manner as in Example 2-1, except that the types and amounts of each component were changed as shown in Table 1.

[0260]

[0261] [Example 1-11] 100 parts by mass of the polymer compound (A-6) obtained in Synthesis Example 1-6 (based on solid content), 30 parts by mass of the polymer (B-1) obtained in Synthesis Example 2-1 as a curing agent, and 0.5 parts by mass of Polyflow No. 90 (manufactured by Kyoeisha Chemical Co., Ltd.) as a surfactant were mixed, and CHN was added as an organic solvent to obtain a solution with a solid content concentration of 19.0% by mass. The obtained solution was then filtered using a PTFE microfilter with a pore size of 0.2 μm to prepare a high refractive index film-forming composition (C-19).

[0262] [Examples 1-12 to 1-14, Comparative Examples 1-9 to 1-12] Compositions (C-19) to (C-24) for forming high refractive index films were prepared in the same manner as in Example 1-1, except that the types and amounts of each component were changed as shown in Table 2.

[0263]

[0264] [4] Evaluation of the cured film The refractive index, light resistance, and heat resistance of the cured film formed using the high refractive index film-forming composition were evaluated according to the following procedure.

[0265] [Refractive Index] The high refractive index film-forming compositions prepared in Examples 1-1 to 1-14 and Comparative Examples 1-1 to 1-12 were each coated onto a silicon wafer using a spin coater, and baked on a hot plate at 100°C for 1 minute, followed by 230°C for 10 minutes, to form a cured film with a thickness of 1,000 nm. The refractive index at a wavelength of 550 nm was measured on the obtained cured film using a spectroscopic ellipsometer M-2000 (J.A. Woolam Japan Co., Ltd.). The results are shown in Table 2.

[0266] [Lightfastness Test] The high refractive index film-forming compositions prepared in Examples 1-1 to 1-14 and Comparative Examples 1-1 to 1-12 were applied to silicon wafers (for film thickness measurement) and quartz substrates (for transmittance measurement) using a spin coater, dried on a hot plate at 100°C for 1 minute, and then baked at 230°C for 10 minutes to form films with a thickness of 1,000 μm. The transmittance at a wavelength of 400 nm was measured for these films using a UV-2600 ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corporation). Furthermore, after performing the following lightfastness tests on these films, the film thickness and transmittance at a wavelength of 400 nm were measured again, and the rate of change in film thickness and the change in transmittance before and after the lightfastness test were calculated based on the following formulas. The results are shown in Table 2. Rate of change in film thickness (%) = [(Film thickness after test - Film thickness before test) / Film thickness before test] × 100 Change in transmittance (%) = Transmittance after test - Transmittance before test

[0267] [Lightfastness Test Details] Equipment: Xenon accelerated weathering tester Q-Sun Xe-1-B (manufactured by Q-Lab Corporation) Light source: Xenon arc lamp Optical filter: Window-B / SL Illuminance: 60 W / m 2 (Wavelength 300nm to 400nm) Black panel temperature: 63°C Test time: 500 hours

[0268] [Heat Resistance Test] The high refractive index film-forming compositions prepared in Examples 1-1 to 1-14 and Comparative Examples 1-1 to 1-12 were applied to silicon wafers (for film thickness measurement) and quartz substrates (for transmittance measurement) using a spin coater, respectively. The films were then baked on a hot plate at 100°C for 1 minute, followed by 230°C for 10 minutes, to form films with a thickness of 1,000 μm. The transmittance at a wavelength of 400 nm was measured for these films using a UV-2600 ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corporation). Furthermore, these films were subjected to a heat resistance test using a 150°C oven for 500 hours. After this, the film thickness and transmittance at a wavelength of 400 nm were measured again, and the rate of change in film thickness and the change in transmittance before and after the heat resistance test were calculated based on the following formulas. The results are shown in Tables 3 and 4. Film thickness change rate (%) = [(Film thickness after test - Film thickness before test) / Film thickness before test] × 100 Transmittance change (%) = Transmittance after test - Transmittance before test

[0269]

[0270]

[0271] The cured film formed from the high refractive index film-forming composition of the example showed a high refractive index (1.65 or higher). Therefore, the cured film obtained from the high refractive index film-forming composition of the present invention can improve light-gathering efficiency and improve the properties of microlens materials and electronic devices.

[0272] The cured films formed from the high refractive index film-forming compositions of the examples showed smaller changes in transmittance and film thickness before and after light resistance and heat resistance tests compared to the cured films formed from the high refractive index film-forming compositions of the comparative examples. The high refractive index film-forming compositions of Comparative Examples 1-2 to 1-4 have a compound without the group represented by formula (b1) added as a light stabilizer (HALS). Therefore, the cured films formed from the high refractive index film-forming compositions of the above examples, to which a non-basic or low-basic light stabilizer (HALS) having the group represented by formula (b1) was added, showed high stability against light and heat, and can improve the reliability of microlens materials and electronic devices.

Claims

1. A composition for forming a high refractive index film, comprising: (A) a nonpolymer compound or polymer compound having an ultraviolet absorbing group including a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton; (B) a hindered amine-based light stabilizer; and (C) an organic solvent, wherein the content of component (B) is 1 to 10 parts by mass per 100 parts by mass of component (A), and component (B) is a compound having a group represented by the following formula (b1). (In the formula, R 1b Each of these independently represents either a methyl group or an ethyl group, R 2b (where * represents a linear alkyl group having 1 to 20 carbon atoms or a cyclic alkyl group having 4 to 20 carbon atoms, and * represents a bond.) 2. The composition for forming a high refractive index film according to claim 1, wherein the compound having a group represented by the above formula (b1) is a compound represented by the following formula (B1-1) or formula (B1-2). [ (wherein R 1b and R 2b have the same definitions as in the above formula (b1), R 3b represents a linear alkylene group having 1 to 4 carbon atoms, R 4b represents a hydrogen atom, a methyl group or an ethyl group, X 1b represents a functional group having a triazine skeleton represented by the following formula (xb1), R 5b represents a single bond or a linear alkylene group having 1 to 8 carbon atoms, and each k independently represents 0 or 1. ) (wherein each R 6b independently represents a hydrogen atom or a linear alkyl group having 1 to 4 carbon atoms, and * represents a binding site.)] 3. The high refractive index film-forming composition according to claim 1, wherein component (A) is a nonpolymer compound.

4. The high refractive index film-forming composition according to claim 3, wherein the above nonpolymer compound is a compound represented by the following formula (A1), formula (A2), or formula (A3). (In the formula, X 1a represents a m-valued functional group having a triazine skeleton and a phenolic hydroxyl group, and k independently represents 0 or 1, Ar 1a Each of these independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may have an alkyl group having 1 to 4 carbon atoms as a substituent, and m represents 2 or 3. (In the formula, X 2a Each of the following independently represents a functional group having a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton and a phenolic hydroxyl group; each of the following independently represents 0 or 1; A represents an n-valent organic group which may have an oxygen atom; and n represents an integer from 3 to 6. (In the formula, X 3a Each independently represents a functional group having a triazine skeleton, a benzophenone skeleton, or a benzotriazole skeleton and a phenolic hydroxyl group, and each independently represents 0 or 1, Ar 2a Each of these independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may each have substituents selected from the group consisting of methyl, ethyl, phenyl, and benzyl groups. 2a They may be connected to each other via etheric bonds.

5. The composition for forming a high refractive index film according to claim 3, wherein the molecular weight of the nonpolymer compound is 500 to 3,500.

6. The composition for forming a high refractive index film according to claim 1, further comprising (D) a curing agent, wherein the content of the curing agent is 15 parts by mass or more per 100 parts by mass of component (A).

7. The composition for forming a high refractive index film according to claim 6, wherein component (D) is a polyfunctional blocked isocyanate compound.

8. The high refractive index film-forming composition according to claim 7, wherein the polyfunctional blocked isocyanate compound is a homopolymer of (meth)acrylate having a blocked isocyanate group, or a copolymer containing a (meth)acrylate having a blocked isocyanate group.

9. (E) The composition for forming a high refractive index film according to claim 1, further comprising a surfactant.

10. The composition for forming a high refractive index film according to claim 1, wherein the high refractive index film has a refractive index of 1.65 or higher at a wavelength of 550 nm.

11. A microlens comprising a cured product of a high refractive index film-forming composition according to any one of claims 1 to 10.

12. An electronic device comprising a microlens according to claim 11.

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