Polishing pad production method, jig, and polishing pad

Abstract

Provided is a polishing pad production method that makes it possible to precisely and easily produce a polishing pad. The polishing pad production method is for producing a polishing pad comprising a plurality of polishing pad pieces with protrusions and includes the following steps: a step in which a jig having recesses that can be fitted to at least some of the plurality of protrusions on the polishing pad pieces is prepared; a step in which the plurality of polishing pad pieces are temporarily fixed adjacent to each other on the jig by fitting the protrusions in each of the plurality of polishing pad pieces to the recesses in the jig; and a step in which the plurality of polishing pad pieces that are temporarily fixed adjacent to each other are fixed to each other.

Description

Method for manufacturing polishing pad, jig, and polishing pad

[0001] The present invention relates to a method for manufacturing a polishing pad, a jig, and a polishing pad.

[0002] In lapping and polishing of optical materials, semiconductor devices, glass substrates for hard disks, sapphire, GaN and SiC, polishing using a polishing pad is performed. Various types of polishing pads are known, including polishing pads using non-woven fabric, polishing pads using foamed or non-foamed polyurethane, polishing pads having abrasive grains in a polishing layer, and polishing pads using a polishing layer having a concavo-convex pattern as a polishing surface.

[0003] Among these, a polishing pad provided with a polishing layer having a concavo-convex pattern has advantages that the grooves forming the concavo-convex pattern affect the fluidity of slurry, improve polishing rate, and can uniformly polish an object to be polished. Examples of methods for manufacturing such a polishing pad include a method of forming grooves by cutting the surface of a flat base material, a method of forming a concavo-convex pattern on a substrate by applying a screen printing method, and a method of manufacturing a mold having a concavo-convex pattern and performing molding using the manufactured mold.

[0004] When manufacturing a polishing pad, a method is also known in which a plurality of polishing pad pieces forming the polishing pad are manufactured, and then these are bonded together to manufacture the polishing pad. For example, in Patent Document 1, a plurality of polishing cloths are bonded to each other along the same plane. In the bonded portion, the upper layers including the top surface for polishing an object of the plurality of polishing cloths are close to or in contact with each other and are not bonded to each other, and in the lower layer including the bottom surface that does not polish the object, a polishing mat is disclosed in which the polishing cloths are butt-bonded to each other with an adhesive.

[0005] Japanese Unexamined Patent Publication No. 2003-115468

[0006] While methods for manufacturing polishing pads by bonding multiple polishing pad pieces together are known, including in Patent Document 1, bonding the polishing pad pieces together requires skilled labor and is time-consuming. On the other hand, in such methods, if one tries to quickly bond the polishing pad pieces together to shorten the working time, misalignment is likely to occur between the multiple polishing pad pieces, making it difficult to manufacture polishing pads with high precision.

[0007] This invention has been made in view of the above-mentioned problems, and aims to provide a method for manufacturing polishing pads that enables the accurate and easy production of polishing pads.

[0008] The inventors of the present invention diligently studied the matter and, as a result, discovered that the above problems could be solved by using a jig having a predetermined configuration, thus completing the present invention.

[0009] In other words, the present invention is as follows: [1] A method for manufacturing a polishing pad comprising a plurality of polishing pad pieces having protrusions, comprising the steps of: preparing a jig having recesses that can be fitted with at least a portion of the plurality of protrusions on the polishing pad pieces; temporarily fixing the plurality of polishing pad pieces adjacent to each other to the jig by fitting the protrusions on each of the plurality of polishing pad pieces to the recesses on the jig; and fixing the plurality of polishing pad pieces that have been temporarily fixed adjacent to each other to each other. [2] The method for manufacturing a polishing pad according to [1], wherein the step of fixing them to each other is a step of attaching an adhesive layer to the surface of the polishing pad piece opposite to the surface having the protrusions, so as to span the portion where the plurality of temporarily fixed polishing pad pieces are adjacent to each other. [3] The method for manufacturing a polishing pad according to [1] or [2], further comprising the step of removing the jig from the plurality of polishing pad pieces. [4] A method for manufacturing a polishing pad according to any one of [1] to [3], further comprising a step of reinforcing the fixing of the polishing pad piece and the jig between the step of temporarily fixing and the step of fixing to each other. [5] A method for manufacturing a polishing pad according to any one of [1] to [4], wherein the jig has a shape having a gap in a plan view such that the parts adjacent to each other are exposed in the step of temporarily fixing and / or the step of fixing to each other. [6] A method for manufacturing a polishing pad according to any one of [1] to [5], wherein the surface of the jig on which the recess is provided has a larger area in a plan view than the surface on which the protrusion of the polishing pad is provided. [7] A method for manufacturing a polishing pad according to [6], wherein in the step of temporarily fixing and / or the step of fixing to each other, all of the protrusions of the plurality of polishing pad pieces fit into the recess of the jig. [8] A method for manufacturing a polishing pad according to any one of [1] to [7], wherein there is a gap in at least a portion of the adjacent portions of the plurality of polishing pad pieces. [9] A jig for manufacturing a polishing pad comprising a plurality of polishing pad pieces having protrusions, the jig having recesses that can be fitted with at least a portion of the plurality of protrusions on the polishing pad pieces.

[10] The jig according to [9], wherein the shape has a gap in a plan view.

[11] The jig according to [9] or

[10] , wherein the surface of the jig on which the recess is provided has a larger area in a plan view than the surface of the polishing pad on which the convex is provided.

[12] A polishing pad comprising a plurality of polishing pad pieces having protrusions, wherein each polishing pad piece includes a polishing surface that contacts an object to be polished and an end portion that defines the outer shape of the polishing pad piece, the polishing surface includes a plurality of the protrusions and recesses provided between adjacent protrusions, the protrusions are substantially rectangular in shape in plan view, the recesses are substantially grid-shaped in plan view, the polishing pad piece comprises a first polishing pad piece and a second polishing pad piece adjacent to the first polishing pad piece, the first polishing pad piece and the second polishing pad piece are arranged such that there is a gap between their respective ends in the portions adjacent to each other, and in the first polishing pad piece, point a is defined as the center point of the side of the protrusion adjacent to the second polishing pad piece that is substantially parallel to the end portion of the adjacent portion and adjacent to the second polishing pad piece, In the second polishing pad piece, when point b is the center of the side of the protrusion adjacent to the first polishing pad piece that is substantially parallel to the end of the adjacent portion, the width of the recess and the distance between point a and point b satisfy the condition expressed by the following formula (1): -0.50 ≤ (W - D1) / W ≤ 0.50 …(1) (wherein formula (1) is the width of the recess and D1 is the distance between point a and point b.) Polishing pad.

[13] A polishing pad comprising a plurality of polishing pad pieces having protrusions, wherein each polishing pad piece includes a polishing surface that contacts an object to be polished and an end portion that defines the outer shape of the polishing pad piece, the polishing surface includes a plurality of the protrusions and recesses provided between adjacent protrusions, the protrusions are substantially rectangular in shape in plan view, the recesses are substantially grid-shaped in plan view, the polishing pad piece comprises a first polishing pad piece and a second polishing pad piece adjacent to the first polishing pad piece, the first polishing pad piece and the second polishing pad piece are arranged such that there is a gap between their respective ends in the portions adjacent to each other, in the first polishing pad piece, point c is the center of side X of the protrusions adjacent to the second polishing pad piece that is substantially perpendicular to the end portion of the adjacent portion, and line C is the line passing through point c and perpendicular to side X, In the second polishing pad piece, if we define line D as the extension of side Y, which is substantially perpendicular to the end of the adjacent portion of the protrusion adjacent to the first polishing pad piece, and if we define the intersection of line C and line D as point f, then the distance between point c and point f and the length of side X of the first polishing pad piece satisfy the condition expressed by the following formula (2): D2 / L ≤ 0.20 …(2) (wherein L represents the length of side X, and D2 represents the distance between point c and point f). Polishing pad.

[0010] According to the present invention, it is possible to provide a method for manufacturing polishing pads that enables the accurate and easy production of polishing pads.

[0011] This is a schematic diagram showing an example of the configuration of the jig of this embodiment, where (a) is a plan view and (b) is a cross-sectional view. This is a schematic plan view showing another example of the configuration of the jig of this embodiment. This is a schematic plan view showing another example of the configuration of the jig of this embodiment. This is a schematic plan view showing an example of the use of the jig of this embodiment. This is a cross-sectional view showing an example of the use of the jig of this embodiment. This is a flowchart for explaining an example of how to manufacture the polishing pad of this embodiment. This is a schematic diagram for explaining step S1 in an example of how to manufacture the polishing pad of this embodiment. This is a schematic diagram for explaining step S2 in an example of how to manufacture the polishing pad of this embodiment. This is a schematic diagram for explaining step S3 in an example of how to manufacture the polishing pad of this embodiment. This is a schematic diagram for explaining other steps in an example of how to manufacture the polishing pad of this embodiment. This is a schematic diagram for explaining other steps in an example of how to manufacture the polishing pad of this embodiment, where (a) is a plan view and (b) is a cross-sectional view. This is a schematic perspective view for explaining an example of the polishing pad of this embodiment. This is a schematic enlarged plan view for explaining an example of the polishing pad of this embodiment. This is a schematic enlarged cross-sectional view for explaining an example of the polishing pad of this embodiment. This is a schematic enlarged plan view for explaining an example of the polishing pad of this embodiment. This is a schematic enlarged plan view illustrating the conditions that the positional relationship of the polishing pad pieces in this embodiment must satisfy.

[0012] The following describes in detail an embodiment of the present invention (hereinafter referred to as "this embodiment"), but the present invention is not limited thereto, and various modifications are possible without departing from its essence. In the drawings, the same elements are denoted by the same reference numerals, and redundant explanations are omitted. Furthermore, unless otherwise specified, positional relationships such as up, down, left, and right are based on the positional relationships shown in the drawings. Moreover, the dimensional ratios in the drawings are not limited to those shown.

[0013] 1. Jig The jig of this embodiment is used for manufacturing a polishing pad comprising a plurality of polishing pad pieces having protrusions, and has recesses that can be fitted with at least a portion of the plurality of protrusions on the polishing pad pieces.

[0014] Figure 1 shows a schematic diagram illustrating an example of the jig of this embodiment. Figure 1(a) is a plan view, and Figure 1(b) is a cross-sectional view showing the cross-section that appears when Figure 1(a) is cut along the line A-A. As shown in Figure 1, the jig 100 comprises a recess 11 and a ridge portion 12 that defines the recess 11. The recess 11 fits with the protrusion of the polishing pad.

[0015] There is a limit to the size of polishing pads that can be manufactured with high precision. Therefore, a suitable method for manufacturing large polishing pads is to manufacture multiple polishing pad pieces of a size that can be manufactured with high precision, and then fix these pieces together to create the polishing pad. Furthermore, if manufacturing defects such as chipping occur in the polishing pad pieces during the manufacturing process, only some of the polishing pad pieces need to be replaced, so the handling of manufacturing defects can be done at low cost.

[0016] On the other hand, when fixing multiple polishing pad pieces together, it is difficult to manually align the arrangement of the uneven patterns of the multiple polishing pad pieces precisely before fixing them. Furthermore, when attempting to fix polishing pad pieces where the distance from the outermost protrusion to the end of the polishing pad piece is not the same at multiple points where the pieces are adjacent to each other, in order to manufacture a polishing pad with high precision without the arrangement pattern of the protrusions (hereinafter, the "arrangement pattern of the protrusions in the polishing pad" will simply be referred to as the "arrangement pattern") shifting as much as possible, it becomes necessary to select polishing pad pieces suitable for fixing, taking into account the differences in the width of each groove. Therefore, manufacturing polishing pads with high precision requires skilled workers and is time-consuming. If misalignment occurs during the fixing of the polishing pad pieces, the arrangement pattern of the resulting polishing pad will be misaligned, which may prevent smooth polishing of the workpiece during polishing, and may also change the flow of the slurry, potentially leading to variations in polishing performance. In addition, the appearance of the polishing pad may also be negatively affected.

[0017] The jig 100 of this embodiment has recesses 11 that can be fitted with at least some of the multiple protrusions on the polishing pad piece. Before fixing the multiple polishing pad pieces, it is possible to temporarily fix the polishing pad pieces (hereinafter also simply referred to as "temporarily fixing") in a state where the protrusions of the polishing pad pieces are precisely aligned by fitting the protrusions of the polishing pad pieces into the recesses 11 of the jig 100. Then, since the temporarily fixed polishing pad pieces are fixed to each other, it becomes easy to fix them with the protrusions and convex patterns precisely aligned even without the operator's skill. Furthermore, when fixing polishing pad pieces where the distance from the protrusion located at the outermost end of the polishing pad piece to the end of the polishing pad piece is not the same at multiple points in the adjacent parts of the polishing pad pieces, it is particularly difficult to fix them with the protrusions and convex patterns aligned. However, using the jig 100 of this embodiment, even in such cases, it is easy to align the protrusions and convex patterns and fix the polishing pad pieces to each other. The method of manufacturing the jig is not particularly limited. The manufacturing method of the jig only needs to be designed taking into account the shape of the polishing pad, and may be manufactured using vacuum forming, injection molding, a 3D printer, etc. When the polishing pad is manufactured by mold forming, the plate used during the molding process may be used as a jig.

[0018] In Figure 1, the overall shape of the jig 100 in plan view is shown as a rectangle, but its overall shape is not particularly limited. For example, the overall shape of the jig 100 in plan view may be a polygon such as a triangle or a pentagon, or it may be a circle, an ellipse, or other irregular shape. Also, the jig may have a shape with a gap in plan view, or a shape with a gap in the center. Figure 2 shows another example of the configuration of the jig in this embodiment. The jig 110 shown in Figure 2 has an overall shape of a rectangle and a gap 13 in the center, and in plan view it has a shape of the letter "U". With such a jig 110, when temporarily fixing the polishing pad pieces (for example, step S2 described later) or when fixing the polishing pad pieces to each other (for example, step S3 described later), it is possible to check the arrangement of the polishing pad pieces, such as whether adjacent parts of the polishing pad pieces exposed from the gap 13 overlap. Furthermore, after fitting the recess of the jig with the protrusion of the polishing pad piece, if temporary fixing is to be reinforced using tape or the like, the tape can be applied to the adjacent portion of the polishing pad piece through the gap 13. Figure 3 shows another example of the jig configuration in this embodiment. The jig 120 shown in Figure 3 has an overall rectangular shape and a gap 13 extending from the center to the right, giving it a U-shape in plan view. The above-described effects are also achieved when using such a jig. Note that "plan view" means looking from the surface with the recess towards the back surface in Figure 1. In Figures 2 and 3, the shape of the gap in the jig is shown as a square or rectangle in plan view, but the shape of the gap is not particularly limited and may be a polygon such as a triangle or pentagon, or it may be a circle, ellipse, T-shape, cross shape, or other irregular shape.

[0019] The size of the jig 100 is not particularly limited as long as it is large enough to provide the recesses 11. In plan view, the area of ​​the surface on which the recesses 11 are formed may be about the same as the surface on which the protrusions of the polishing pad to be manufactured are provided, or it may be smaller or larger than the surface on which the protrusions of the polishing pad are provided. In particular, it is preferable that the surface of the jig 100 on which the recesses 11 are provided has a larger area in plan view than the surface on which the protrusions of the finished polishing pad are provided. Figure 4 is a schematic plan view showing a state in which the jig 101, which has a larger area in plan view than the finished polishing pad, and the polishing pad pieces 200a and 200b are fitted together and temporarily fixed. Some of the recesses 11 of the jig 101 (shown by dashed lines in Figure 4) are fitted together with the protrusions of the polishing pad pieces 200a and 200b, and the polishing pad pieces 200a and 200b are temporarily fixed to the jig 101. In Figure 4, the area of ​​the jig 101 in plan view is larger than the sum of the areas of the polishing pad pieces 200a and 200b, i.e., the area of ​​the finished polishing pad. As a result, the polishing pad pieces 200a and 200b are less likely to protrude from the jig 101, and the temporary fixation is less likely to come loose, allowing for easier and more accurate manufacturing of polishing pads. Furthermore, as shown in Figure 4, it is preferable that all the protrusions of the polishing pad pieces fit into the recesses 11 of the jig. By using such a jig, the temporary fixation becomes less likely to come loose, allowing for easier and more accurate manufacturing of polishing pads.

[0020] In another embodiment, the surface of the jig 100 on which the recess 11 is provided may have a smaller area than the surface of the finished polishing pad on which the protrusion is provided. In such a case, the jig 100 is easier to handle and work efficiency tends to improve.

[0021] Figures 5(a) and 5(b) are schematic cross-sectional views illustrating the fitting of the jig and the polishing pad piece. In Figure 5(a), the jig 100 is positioned so that the recess 11 and the protrusion 201 of the polishing pad piece 200 face each other. One recess 11 and one protrusion 201 are fitted together, and the polishing pad piece 200 is temporarily fixed to the jig 100. By fitting them together in this way, the jig 100 can temporarily fix the polishing pad piece 200, and by further fitting another polishing pad piece to the jig 100 and temporarily fixing it, it is possible to easily fix multiple polishing pad pieces together with their recess and protrusion patterns aligned. Furthermore, when one protrusion fits into one recess, the stability when temporarily fixing the polishing pad piece tends to be improved.

[0022] The arrangement pattern and shape of the recesses 11 are not particularly limited, and any arrangement that fits with the protrusions of the polishing pad piece is acceptable. The arrangement pattern of the recesses 11 may be regular or irregular, and may be the same as the arrangement pattern of the protrusions of the polishing pad. Examples of arrangement patterns of the recesses 11 include, in a plan view, an arrangement pattern in which a plurality of recesses 11 are arranged in a square grid; an arrangement pattern in which a plurality of recesses 11 are arranged in a triangular grid (staggered grid); an arrangement pattern in which a plurality of recesses 11 are arranged radially; an arrangement pattern in which a plurality of protrusions 11 are arranged spirally; an arrangement pattern in which a plurality of recesses 11 are arranged concentrically; and arrangement patterns that are combinations of these. As shown in Figure 5(a), in a plan view of the recesses 11, the arrangement pattern may be one in which one recess 11 fits with one protrusion, but as shown in Figure 5(b), the arrangement pattern of the recesses 11 may be one in which two adjacent protrusions on the polishing pad piece fit with one recess. In Figure 5(b), one recess 11 of the jig 130 is fitted with two protrusions 201 of the polishing pad piece 200, thereby temporarily fixing the polishing pad piece 200 to the jig 100. When two or more protrusions are fitted into one recess in this way, the protrusions are less likely to be damaged during temporary fixing, and it tends to be easier to remove the polishing pad piece after it has been temporarily fixed.

[0023] The shape of the recess 11 in plan view may be the same as the shape of the convex portion of the polishing pad piece. Examples include approximate triangles, approximate quadrilaterals (e.g., approximate squares, approximate rectangles, and approximate trapezoids), approximate pentagons, and other approximate polygons with chamfered corners; approximate circles, approximate ellipses, approximate trapezoids, and other irregular shapes. Alternatively, the recess 11 may have a different shape from the convex portion of the polishing pad piece in plan view, but be a fitting shape. For example, when the convex portion is circular, the recess 11 may be a square with a side length equal to the diameter of the circle of the convex portion. Preferably, the shapes of the recess and the convex portion are the same.

[0024] The cross-sectional shape of the recess 11 in a direction perpendicular to the arrangement direction of the recesses 11 is not limited as long as it is a shape into which the protrusions of the polishing pad pieces fit. Examples include a roughly triangular shape with a vertex at the bottom of the recess 11 and the open end of the recess 11 as the base, a roughly quadrilateral (e.g., roughly square, roughly rectangular, and roughly trapezoidal) with the open end of the recess 11 as one side, and a roughly polygonal shape such as a roughly pentagon with three vertices at the bottom of the recess 11 and the open end of the recess 11 as the base, and a shape in which the corners of the roughly polygonal shape are chamfered; and a roughly semicircular shape with the open end of the recess 11 as the diameter. Furthermore, the cross-sectional shape of the ridge portion 12 in a direction perpendicular to the arrangement direction of the recesses 11 is not particularly limited. For example, it can be a roughly polygonal shape such as a roughly triangle, a roughly quadrilateral, or a roughly pentagon, where the straight line connecting the bottoms of the two recesses 11 located on both sides of the ridge portion 12 forms one side, and the corners of the roughly polygonal shape are chamfered; or a roughly semicircular shape where the straight line connecting the bottoms of the two recesses 11 located on both sides of the ridge portion 12 forms the diameter. In particular, when the shape of the ridge portion 12 is a roughly polygonal shape with chamfered corners, the corners of the ridge portion 12 are less likely to catch when fitting the polishing pad piece, making it easier to fit.

[0025] The depth of the recess 11 is not particularly limited, but it may be the same length as the height of the protrusion of the polishing pad piece, shorter than the height of the protrusion, or longer than the height of the protrusion. Furthermore, the recess 11 only needs to be recessed on the side opposite to the side into which the polishing pad piece fits relative to the ridge 12, and may be a through hole penetrating to the side opposite to the side into which the polishing pad piece fits.

[0026] The jig material can be resin, metal, wood, or other materials, and is not particularly limited, but resin is preferred, for example. Using resin makes it less likely to damage the polishing pad piece during temporary fixing, thus enabling the production of polishing pads with higher precision. The resin is not particularly limited, but examples include thermoplastic resins such as polyethylene, polypropylene, polyvinyl chloride, polystyrene, ABS resin, acrylic resin, polycarbonate, polyamide, and polyester resin; thermosetting resins such as phenolic resin, epoxy resin, acrylic resin, urethane resin, and formaldehyde resin; and photocurable resins such as isocyanurate resins, acrylic (methacrylic) ester resins and their urethane-modified resins, and thiocol resins. These may be used individually or in combination of two or more.

[0027] 2. Method for Manufacturing Polishing Pads Figure 6 is a flowchart showing an example of a method for manufacturing polishing pads according to this embodiment. The manufacturing method according to this embodiment is a method for manufacturing polishing pads comprising a plurality of polishing pad pieces having protrusions, and includes the steps of: S1 preparing a jig having recesses that can be fitted with at least a portion of the plurality of protrusions on the polishing pad pieces; S2 temporarily fixing the plurality of polishing pad pieces adjacent to each other in the jig by fitting the protrusions on each of the plurality of polishing pad pieces into the recesses in the jig; and S3 fixing the plurality of polishing pad pieces that have been temporarily fixed adjacent to each other. In the manufacturing method according to this embodiment, by fitting the protrusions of the polishing pad pieces into the recesses of the jig, it is possible to temporarily fix the polishing pad pieces in a state in which the uneven patterns of the polishing pad pieces are aligned with each other. Then, by fixing the plurality of temporarily fixed polishing pad pieces to each other, the uneven patterns can be accurately aligned and fixed easily, even without the skill of the worker. Furthermore, when fixing polishing pads where the distance from the protrusion at the outermost end of the polishing pad to the end of the polishing pad is not the same at multiple points in adjacent areas, it is particularly difficult to fix them while aligning the arrangement pattern. However, using the jig of this embodiment, even in such cases, the uneven patterns can be easily aligned and fixed.

[0028] 2.1. Process S1 First, prepare the jig 100 as shown in the schematic cross-sectional view of Figure 7. The jig 100 is the one described above.

[0029] 2.2. Step S2 Next, in step S2, as shown in the schematic cross-sectional view of Figure 8, the protrusions 201a of the polishing pad piece 200a and the protrusions 201b of the polishing pad piece 200b are fitted into the recess 11 of the jig 100. As a result, the multiple polishing pad pieces are temporarily fixed to the jig 100 with the arrangement of the protrusions aligned. The material of each polishing pad piece may be a material conventionally known as a polishing pad material, and the method for manufacturing the polishing pad pieces into a predetermined shape may be the same as the conventional method for manufacturing polishing pads into a predetermined shape.

[0030] The polishing pad pieces may be in contact with each other in adjacent portions, or they may not be in contact in any part. In other words, as shown in Figure 8, the polishing pad pieces 200a and 200b may have a gap 202 in at least a portion of the adjacent portions. If the polishing pad pieces 200a and 200b overlap in adjacent portions, that portion will protrude beyond the convex portion in the resulting polishing pad, which may damage the workpiece during polishing or cause the polishing pad to tilt, reducing the flatness of the workpiece. Therefore, it is preferable for some or all of the adjacent portions of the polishing pad pieces to be spaced apart. Normally, it is difficult to fix the polishing pad pieces with the convex portions accurately aligned while there is a gap between the adjacent portions of the polishing pad pieces. However, in the manufacturing method of this embodiment, the convex portions are fitted together, and the convex portions are accurately aligned and temporarily fixed using a jig, so even in such cases, the manufacturing of the polishing pad becomes easier. The gap 202 between the polishing pad pieces 200a and 200b may be filled with resin or the like in a later process.

[0031] In Figure 8, the polishing pad pieces 200a and 200b are shown to be fitted onto the jig 100 from above. However, the polishing pad pieces 200a and 200b may be placed on the floor or other surface, and the jig 100 may be fitted onto them from above. Alternatively, after temporarily fixing them in place, the entire assembly of the polishing pad pieces 200a and 200b and the jig 100 may be inverted.

[0032] 2.3. Step S3 Next, in step S3, as shown in the schematic cross-sectional view of Figure 9, the polishing pad pieces are fixed to each other to form a polishing pad 300. The method of fixing is not particularly limited, but examples include a method of attaching an adhesive layer to the surface opposite to the surface having a protrusion, and a method of pouring adhesive into the gap 202 and bonding with adhesive. In particular, as shown in Figure 9, it is preferable to attach the adhesive layer 203 to the surface opposite to the surface having a protrusion of the polishing pad piece so that the multiple temporarily fixed polishing pad pieces straddle adjacent portions.

[0033] The adhesive layer 203 is not particularly limited, but for example, it may be a sheet-like member with an adhesive applied to its surface. It may also have cushioning properties or rigidity during polishing, and may have adhesive properties to other members.

[0034] Examples of materials for the sheet-like member include thermoplastic resins such as acrylic resin, vinyl resin, olefin resin, styrene resin, polyester resin, polycarbonate resin, and polyamide resin. Examples of adhesives include various adhesives such as acrylic adhesive, nitrile adhesive, silicone adhesive, and urethane adhesive. These may be used individually or in combination of two or more. The adhesive layer 203 may also contain an adhesive or bonding agent for bonding to a polishing platen or the like on the side opposite to the side that adheres to the polishing pad piece.

[0035] The adhesive layer 203 may be a layered member consisting of multiple sheet-like members. That is, the adhesive layer 203 may include, for example, a layer containing an adhesive for bonding to a polishing pad piece, a cushioning layer, or a rigid layer, and may further include a layer containing an adhesive for bonding to a polishing platen or the like. It may also have a release layer covering the layer containing the adhesive for bonding to the polishing platen or the like before bonding to the polishing platen or the like. The adhesive layer 203 may also be double-sided tape.

[0036] In Figure 9, the adhesive layer 203 is shown to be approximately the same size as the multiple polishing pads 300, but it is sufficient if it is large enough to cover the adjacent areas. For example, it may be smaller than the polishing pads 300, or it may be larger than the polishing pads 300. Preferably, it is the same size and shape as the polishing pads 300.

[0037] 2.4 Other Steps The method for manufacturing the polishing pad in this embodiment may include other steps. For example, it may include a step of removing the jig from the multiple polishing pad pieces.

[0038] Furthermore, a step to reinforce the fixing of the polishing pad piece to the jig may be included between the fixing step S2 and the fixing step S3. Figure 10 is a schematic cross-sectional view illustrating the step to reinforce the fixing of the polishing pad piece to the jig. In Figure 10, the vertical relationship between the jig 100 and the polishing pad pieces 210a and 210b is reversed compared to that shown in Figure 8, with the jig 100 positioned above the polishing pad pieces 210a and 210b. Also, in Figure 10, the jig 100 is smaller than the combined size of the polishing pad pieces 210a and 210b.

[0039] As shown in Figure 10, after step S2 in which the polishing pad pieces 210a and 210b are temporarily fixed to the jig 100, the fixing may be further reinforced with tape 400. By reinforcing in this way, the temporary fixing between the polishing pad pieces 210a and 210b and the jig 100 becomes less likely to come undone, resulting in better workability and the ability to manufacture polishing pads with the desired shape. As shown in Figure 10, it is preferable that the tape 400 is applied so as to straddle the surfaces of the polishing pad pieces 210a and 210b that have protrusions 201a and 201b and the surface of the jig 100 opposite to the surface that has a recess 11. By applying the tape 400 in this way, it is less likely to interfere with the fixing of the polishing pad pieces in step S3, and the polishing pads can be manufactured more easily. The tape 400 is not particularly limited, but it may be one with low adhesive strength and easy to remove.

[0040] Figures 11(a) and (b) are schematic diagrams illustrating a process for reinforcing the fixing of the polishing pad piece to the jig in another aspect of this embodiment. Figure 11(a) is a plan view, and Figure 11(b) is a cross-sectional view showing the cross-section that appears when Figure 11(a) is cut along the line B-B. In Figures 11(a) and (b), similar to Figure 10, the jig 110 is positioned above the polishing pad pieces 200a and 200b. Furthermore, since the jig 110 has a square shape in plan view, some of the protrusions 201a of the polishing pad piece 200a and some of the protrusions 201b of the polishing pad piece 200b are not covered by the jig 110 and are exposed on the upper side.

[0041] As shown in Figures 11(a) and (b), after step S2 in which the polishing pad pieces 200a and 200b are temporarily fixed to the jig 110, the temporary fixation between a portion of the protrusion 201a of the polishing pad piece 200a and a portion of the protrusion 201b of the polishing pad piece 200b, which are exposed through the gap 13 of the jig 110, may be further reinforced with tape 410.

[0042] 3. Polishing Pad The polishing pad of this embodiment is a polishing pad comprising a plurality of polishing pad pieces having protrusions, wherein each polishing pad piece includes a polishing surface that contacts the object to be polished and an end portion that defines the outer shape of the polishing pad piece, the polishing surface includes a plurality of protrusions and recesses provided between adjacent protrusions, the protrusions are substantially rectangular in shape in plan view, and the recesses are substantially grid-shaped in plan view, and the polishing pad piece comprises a first polishing pad piece and a second polishing pad piece adjacent to the first polishing pad piece, the first polishing pad piece and the second polishing pad piece are mutual The two polishing pads are arranged so that there is a gap between their respective ends in the adjacent portions. In the first polishing pad, point a is the midpoint of the side of the protrusion adjacent to the second polishing pad that is approximately parallel to the end of the adjacent portion. In the second polishing pad, point b is the midpoint of the side of the protrusion adjacent to the first polishing pad that is approximately parallel to the end of the adjacent portion. The width of the recess and the distance between points a and b may satisfy the condition expressed by the following formula (1): -0.50 ≤ (W - D1) / W ≤ 0.50 …(1) (In formula (1), W represents the width of the recess, and D1 represents the distance between points a and b.)

[0043] The polishing pad of the present embodiment is a polishing pad comprising a plurality of polishing pad pieces each having a convex portion, wherein each polishing pad piece includes a polishing surface that contacts an object to be polished and an end portion that defines an outer shape of the polishing pad piece, the polishing surface includes a plurality of convex portions and a concave portion provided between adjacent convex portions, the convex portions have a substantially square shape in a plan view, the concave portions have a substantially grid shape in a plan view, the polishing pad pieces include a first polishing pad piece and a second polishing pad piece adjacent to the first polishing pad piece, the first polishing pad piece and the second polishing pad piece are arranged such that a gap is provided between respective end portions thereof at a portion adjacent to each other, in the first polishing pad piece, among sides of the convex portion close to the second polishing pad piece, a center point of a side X that is substantially perpendicular to the end portion of the adjacent portion is defined as a point c, a line passing through the point c and perpendicular to the side X is defined as a line C, in the second polishing pad piece, among sides of the convex portion close to the first polishing pad piece, a line obtained by extending a side Y that is substantially perpendicular to the end portion of the adjacent portion is defined as a line D, when an intersection of the line C and the line D is defined as a point f, a distance between the point c and the point f and a length of the side X of the first polishing pad piece may satisfy a condition represented by the following formula (2): D2 / L≦0.20 (2) (in formula (2), L represents the length of the side X, and D2 represents the distance between the point c and the point f.)

[0044] FIG. 12A is a schematic perspective view showing an example of the polishing pad of the present embodiment. As shown in FIG. 12A, the polishing pad 500 includes a first polishing pad piece 510a and a second polishing pad piece 510b. The first polishing pad piece 510a includes a polishing surface 5101 for contacting an object to be polished. The first polishing pad piece 510a has, on the side of the polishing surface 5101, a convex portion 511 and a concave portion 512 which is a region where no convex portion is provided. Although not explicitly shown in FIG. 12A, the polishing pad 500 may further include polishing pad pieces other than the first polishing pad piece 510a and the second polishing pad piece 510b, and two adjacent polishing pad pieces among them may have the same relationship as the relationship between the first polishing pad piece 510a and the second polishing pad piece 510b. Further, although not shown in FIG. 12A, the convex portions 511 and the concave portions 512 may be provided over the entire polishing surface 5101 of the polishing pad 500.

[0045] In FIG. 12A, the overall shape of the polishing pad 500 in a plan view is shown as circular, but the overall shape is not particularly limited. For example, the overall shape of the polishing pad 500 in a plan view may be a polygon such as a triangle or a pentagon, or may be a circle, an ellipse, a circle with a hollowed center, or other irregular shapes. The term "plan view" as used herein means a viewpoint when viewed from a direction perpendicular to the polishing surface 5101 of the polishing pad 500 from the polishing surface 5101 side.

[0046] 3.1. Polishing Pad Pieces FIG. 12B is a schematic enlarged plan view for explaining an example of the polishing pad of the present embodiment. FIG. 12C is a schematic enlarged cross-sectional view for explaining an example of the polishing pad of the present embodiment, which is a cross-section appearing when cut along line A-A' in FIG. 12B. FIG. 12B is an enlarged view of an adjacent portion of a first polishing pad piece 510a and a second polishing pad piece 510b in the polishing pad 500. As shown in FIG. 12B, the first polishing pad piece 510a and the second polishing pad piece 510b each include an end portion 513 that defines the outer shape of the polishing pad piece. The first polishing pad piece 510a and the second polishing pad piece 510b are arranged such that their respective end portions 513 are close to each other at the adjacent portion, and a gap 514 is formed by the respective end portions 513.

[0047] As shown in FIG. 12C, the polishing pad 500 may be provided with an adhesive layer 520 for bonding the polishing pad piece 510a and the polishing pad piece 510b on a side opposite to the polishing surface 1501. The adhesive layer 520 may be configured in the same manner as the adhesive layer described in the section of the method for manufacturing a polishing pad.

[0048] The overall shape of the polishing pad piece in a plan view is not particularly limited. For example, it may be a quadrangle as shown in FIG. 12B, may be a polygon such as a triangle or a pentagon, or may be a circle, an ellipse, or other irregular shapes. The polishing pad pieces constituting the polishing pad 500 may each have substantially the same shape, or may each have different shapes. Further, the polishing pad pieces arranged near the outer edge of the polishing pad 500 may be joined in the process of forming the polishing pad, and then cut to make the outer shape of the polishing pad 500 into a desired shape.

[0049] The protrusions 511 of the polishing pad piece have a roughly square shape in plan view. The roughly square shape may be, for example, a roughly square with sides of roughly equal length or a roughly rectangular shape with opposite sides of roughly equal length. The recesses 512 of the polishing pad piece are the parts where the protrusions 511 are not formed. The recesses 512 have a roughly grid shape in plan view. For example, by arranging the roughly square protrusions 511 in a regular vertical and horizontal manner in plan view, recesses 512 having a roughly grid shape in plan view are formed. In addition, the protrusions 511 may be rectangular or trapezoidal in cross-sectional view, and at least one side may be curved. Here, "cross-sectional view" means the viewpoint when the cross-sectional surface that appears when the polishing pad 500 is cut in a direction perpendicular to its polishing surface 5101 is viewed from a direction parallel to the polishing surface 5101.

[0050] The material constituting the polishing pad piece is not particularly limited, but may include, for example, a resin composition containing a resin, a filler, and abrasive particles.

[0051] 3.1.1. Resins The resins are not particularly limited, but examples include thermoplastic resins such as polyethylene, polypropylene, polyvinyl chloride, polystyrene, ABS resin, acrylic resin, polycarbonate, polyamide, and polyester resin; thermosetting resins such as phenolic resin, epoxy resin, acrylic resin, polyurethane resin, and formaldehyde resin; and photocurable resins such as isocyanurate resins, acrylic (methacrylic) ester resins and their urethane-modified resins, and thiocol resins. Among these, thermoplastic resins and photocurable resins are preferred, and acrylic resins, polyurethane resins, unsaturated polyester resins, and phenol-modified alkyd resins are more preferred. The resins contained in the polishing layer may be used individually or in combination of two or more types.

[0052] The resin content is preferably 10% to 60% by mass, more preferably 20% to 50% by mass, and even more preferably 30% to 40% by mass, relative to the total amount of polishing pad pieces. When the resin content is within the above range, the polishing speed and wear resistance tend to improve further.

[0053] 3.1.2. Fillers Examples of fillers include silicate minerals such as potassium aluminum silicate (Mohs hardness 6), diatomaceous earth (Mohs hardness 6-7), wollastonite (Mohs hardness 4.5-5), talc (Mohs hardness 1-2), and kaolinite (Mohs hardness 1-2); metal oxides such as iron oxide (Mohs hardness 6), titanium oxide (Mohs hardness 6.5), zinc oxide (Mohs hardness 4), and alumina (Mohs hardness 9); metal carbonates such as calcium carbonate (Mohs hardness 3) and magnesium carbonate (Mohs hardness 3.5); and metal sulfates such as calcium sulfate (Mohs hardness 3.5) and barium sulfate (Mohs hardness 3-3.5). The shape of the filler is not particularly limited, but examples include whisker-like, columnar, flaky, and scale-like shapes. In particular, it is preferable that the filler has shape anisotropy. If the polishing pad pieces contain abrasive grains, the filler may have a lower Mohs hardness than the abrasive grains.

[0054] The filler content is preferably 30% to 80% by mass, more preferably 40% to 70% by mass, and even more preferably 50% to 60% by mass, relative to the total amount of polishing pad pieces. When the filler content is within the above range, the polishing speed and wear resistance tend to improve further.

[0055] 3.1.3. Abrasive Grains The polishing pad of this embodiment may contain abrasive grains. While polishing pads containing abrasive grains have improved polishing performance, they are not easy to cut because they contain hard abrasive grains, which tends to cause the shape of the edges to become distorted or the distance between the edges and the protrusions to become uneven. Therefore, the effect of improved quality stability due to the regularly arranged protrusions of the polishing pad of this embodiment is remarkable.

[0056] The components constituting the abrasive grains are not particularly limited, but examples include diamond, cubic boron nitride, green silicon carbide, silicon carbide, cerium oxide, silicon carbide, boron carbide, silicon oxide, zirconium oxide, iron oxide, aluminum oxide, manganese oxide, magnesium oxide, zinc oxide, titanium oxide, zirconium silicate, boron nitride, silicon nitride, barium carbonate, and calcium carbonate. Among these, diamond abrasive grains are preferred. Diamond abrasive grains have high polishing performance, but are hard and difficult to cut when made into polishing pad pieces. Therefore, the effect of improving quality stability due to the regularly arranged protrusions of the polishing pad in this embodiment is remarkable. These abrasive grains may be used individually or in combination of two or more types.

[0057] The abrasive particles may be composite particles in which the abrasive particles are dispersed within matrix particles. In this embodiment, the matrix particles are a solid dispersion medium for the dispersed abrasive particles. For convenience, they are referred to as "matrix particles" because they are particulate during the manufacturing process, but in the composite particles of this embodiment, the matrix particles are fused together and do not necessarily have to be particles. In other words, the abrasive particles may be dispersed within fused matrix particles.

[0058] The components constituting the matrix particles are not particularly limited, but examples include silicon dioxide, boron oxide, zinc oxide, boric acid, sodium tetraborate, aluminum oxide, magnesium oxide, calcium carbonate, strontium carbonate, barium carbonate, potassium carbonate, lithium carbonate, silver carbonate, potassium nitrate, copper(I) oxide, copper(II) oxide, silver oxide, bismuth oxide, and titanium oxide. The matrix particles may be used individually or in combination of two or more types.

[0059] The abrasive grain content is preferably 0.5% to 5.0% by mass, more preferably 1.5% to 4.0% by mass, and even more preferably 2.5% to 3.5% by mass, relative to the total amount of polishing pad pieces. When the abrasive grain content is within the above range, the polishing speed and wear resistance tend to improve further.

[0060] The polishing pad pieces may contain components other than those listed above. For example, they may contain dispersants, polymerization initiators, photosensitizers, etc.

[0061] Figure 13A is a schematic enlarged plan view illustrating the conditions that the positional relationship of the polishing pad pieces in this embodiment must satisfy. In Figure 13A, the first polishing pad piece 510a and the second polishing pad piece 510b are shown to be positioned offset from their actual positions for illustrative purposes. As shown in Figure 13A, in the first polishing pad piece 510a, point a is defined as the center point of the side 515a of the protrusion 511a adjacent to the second polishing pad piece 510b, which is substantially parallel to the end portion 513a of the adjacent portion and is close to the second polishing pad piece 510b. In the second polishing pad piece 510b, point b is defined as the center point of the side 515b of the protrusion 511b adjacent to the first polishing pad piece 510a, which is substantially parallel to the end portion 513b of the adjacent portion and is close to the first polishing pad piece 510a. Furthermore, it is preferable that the distance D1 between points a and b satisfies the following equation (1): -0.50 ≤ (W - D1) / W ≤ 0.50 ... (1) Here, in equation (1), W represents the width of the recess 512, and D1 represents the distance between points a and b.

[0062] When manufacturing polishing pads, which are produced by combining multiple polishing pad pieces, there are challenges in aligning the polishing pad pieces. In particular, if the ends of the polishing pad pieces are not straight, or if there is variation in the distance between the ends and the protrusions adjacent to the ends, even if the ends of adjacent polishing pad pieces are aligned, variations in the arrangement of the protrusions may occur. If the ends of each polishing pad piece are arranged to overlap, the height of the protrusions on the polishing surface will be uneven, reducing the flatness of the workpiece after polishing. On the other hand, it is difficult to align the protrusions while arranging the polishing pad pieces with gaps between them so that they do not overlap. If the arrangement of the protrusions of the polishing pad pieces is uneven, the arrangement of the protrusions and recesses will also be uneven, which can change the flow of the slurry on the polishing pad and potentially increase variations in the quality of the polishing pad. In addition, the appearance of the product will also deteriorate.

[0063] In this embodiment, it is preferable that the positional relationship of the convex portions of adjacent polishing pad pieces satisfies the predetermined conditions represented by formula (1) above. Since such polishing pad pieces have less error in the arrangement of convex and concave portions, the variation in the quality of the polishing pad can be reduced. Polishing pads that satisfy the conditions represented by formula (1) above may be manufactured by the polishing pad manufacturing method described above.

[0064] In this embodiment, the width W of the recess 512 is the average value of the width of the recess 512 between the protrusion 511a and the protrusion 511 other than the adjacent protrusion 511b, measured at five arbitrarily selected locations. In this case, if there is a protrusion 511 adjacent to the protrusion 511a inside the first polishing pad piece 510a, the width W of the recess 512 is the width of the recess 512 between that protrusion and the protrusion 511a. If there is no protrusion 511 adjacent to the protrusion 511a inside the first polishing pad piece 510a, the width W of the recess 512 is the width of the recess 512 between the protrusion 511a and the adjacent protrusion 511 of another polishing pad piece.

[0065] Formula (1) may satisfy any of the protrusions 511 of any of the polishing pad pieces constituting the polishing pad 500. Also, formula (1) may satisfy any of the protrusions 511 of more than half of the polishing pad pieces constituting the polishing pad 500. Also, formula (1) may satisfy any of the protrusions 511 of more than 80% of the polishing pad pieces constituting the polishing pad 500. Also, formula (1) may satisfy all of the protrusions 511 of all of the polishing pad pieces constituting the polishing pad 500.

[0066] Figure 13B is a schematic enlarged plan view illustrating the conditions that the positional relationship of other examples of polishing pad pieces of this embodiment must satisfy. In Figure 13B, the first polishing pad piece 510a and the second polishing pad piece 510b are shown to be positioned offset from their actual positions for illustrative purposes. As shown in Figure 13B, in the first polishing pad piece 510a, point c is defined as the center point of side X, which is approximately perpendicular to the end portion 513a of the protrusion 511a adjacent to the second polishing pad piece 510b, among the sides of the protrusion 511a adjacent to the second polishing pad piece 510b. Line C is defined as the line passing through point c and perpendicular to side X. In the second polishing pad piece 510b, line D is defined as the extension of side Y, which is approximately perpendicular to the end portion 513b of the protrusion 511b adjacent to the first polishing pad piece 510a, among the sides of the protrusion 511a adjacent to the first polishing pad piece 510a. Then, the intersection point of line C and line D is defined as point f. Preferably, the distance D2 between points c and f and the length of side X satisfy the following equation (2): D2 / L ≤ 0.20 …(2)

[0067] Polishing pads that satisfy formula (2) above may have less variation in quality because, due to the same factors as polishing pads that satisfy formula (1), there is less error in the arrangement of convex and concave portions. Polishing pads that satisfy the conditions represented by formula (2) above may be manufactured by the polishing pad manufacturing method described above. Furthermore, the polishing pad of this embodiment may satisfy only formula (1), only formula (2), or both formula (1) and formula (2).

[0068] Formula (2) may satisfy any of the protrusions 511 of any of the polishing pad pieces constituting the polishing pad 500. Also, formula (2) may satisfy any of the protrusions 511 of more than half of the polishing pad pieces constituting the polishing pad 500. Also, formula (2) may satisfy any of the protrusions 511 of more than 80% of the polishing pad pieces constituting the polishing pad 500. Also, formula (2) may satisfy all of the protrusions 511 of all of the polishing pad pieces constituting the polishing pad 500.

[0069] The present invention will be described more specifically below using examples and comparative examples. The present invention is not limited in any way by the following examples.

[0070] (Preparation of composite particles) Pre-particles were prepared by granulating 33 parts by mass of glass frit and 14 parts by mass of 4.3 μm diamond abrasive particles, and these were mixed with white alumina in a ratio of 2:1 (by mass) and then calcined to obtain a calcined product.

[0071] (Preparation of Resin Composition) A precursor composition was prepared by mixing 96.9 parts by mass of ultraviolet-curable resin, 1.6 parts by mass of dispersant, 1.0 part by mass of photopolymerization initiator, and 0.5 parts by mass of photosensitizer. Next, a curable resin composition was prepared by mixing 10.8 parts by mass of the calcined product obtained as described above, 34.6 parts by mass of the precursor composition, and 54.6 parts by mass of wollastonite.

[0072] (Preparation of polishing pad pieces) The obtained resin composition was poured into a resin intaglio plate in which rectangular prism-shaped recesses, each 1 mm deep, with a recess bottom dimension of 5 mm x 5 mm and a spacing of 2 mm between adjacent recesses, were arranged in a regular pattern. The resin composition was then cured by irradiating it with ultraviolet light using an ultraviolet irradiation machine. After that, the resulting cured body (polishing pad piece) was removed from the intaglio plate to obtain a polishing pad piece containing the composite particles of Example 1.

[0073] (Preparation of polishing pad) Two polishing pad pieces were prepared, along with a jig large enough to cover the entire polishing pad pieces. The polishing pad pieces were fitted into the jig so that they were adjacent to each other, and double-sided tape was applied to the entire surface of the polishing pad pieces to secure them and thus the polishing pad was prepared.

[0074] (Distance Measurement) Distances D1 and D2, as explained in Figures 13A and 13B, were observed and measured at eight locations using a microscope and are shown in Table 1.

[0075]

[0076] Table 1 shows the evaluation results of the polishing pads. As shown in Table 1, the polishing pads manufactured by the manufacturing method of this embodiment satisfied the conditions represented by formulas (1) and (2), and the convex and concave portions were aligned.

[0077] The polishing pads obtained by the polishing pad manufacturing method of the present invention have industrial applicability as polishing pads suitable for surface processing of various materials.

[0078] 100, 101, 110, 120, 130... Jig, 11... Recess, 12... Ridge, 13... Gap, 200, 200a, 200b, 210a, 210b, 510a, 510b... Polishing pad pieces, 201, 201a, 201b... Convex parts, 202, 514... Gaps, 203, 520... Adhesive layers, 300, 500... Polishing pads, 400, 410... Tape, 511, 511a, 511b... Convex parts, 512... Recess, 513, 513a, 513b... Ends, 515, 515a, 515b... Edges, 5101... Polishing surface.

Claims

1. A method for manufacturing a polishing pad comprising a plurality of polishing pad pieces having protrusions, comprising the steps of: preparing a jig having recesses that can be fitted with at least a portion of the plurality of protrusions on the polishing pad pieces; temporarily fixing the plurality of polishing pad pieces adjacent to each other in the jig by fitting the protrusions on each of the plurality of polishing pad pieces into the recesses in the jig; and fixing the plurality of polishing pad pieces that have been temporarily fixed adjacent to each other to each other.

2. The method for manufacturing a polishing pad according to claim 1, wherein the step of fixing the polishing pad pieces together is a step of attaching an adhesive layer to the surface of the polishing pad piece opposite to the surface having the protrusion, such that the adhesive layer spans the portion where the temporarily fixed polishing pad pieces are adjacent to each other.

3. The method for manufacturing a polishing pad according to claim 1, further comprising the step of removing the jig from the plurality of polishing pad pieces.

4. The method for manufacturing a polishing pad according to claim 1, further comprising a step of reinforcing the fixing of the polishing pad piece and the jig between the step of temporarily fixing and the step of fixing them to each other.

5. The method for manufacturing a polishing pad according to claim 1, wherein the jig has a shape with gaps in a plan view such that the portions adjacent to each other are exposed during the temporary fixing step and / or the step of fixing each other.

6. The surface of the jig on which the recess is provided has a larger area in plan view than the surface of the polishing pad on which the convex is provided, as described in claim 1.

7. The method for manufacturing a polishing pad according to claim 6, wherein in the step of temporarily fixing and / or fixing to each other, all of the protrusions on the plurality of polishing pad pieces fit into the recesses on the jig.

8. The method for manufacturing a polishing pad according to claim 1, wherein at least a portion of the portions where the plurality of polishing pad pieces are adjacent to each other.

9. A jig for manufacturing a polishing pad comprising a plurality of polishing pad pieces having protrusions, the jig having recesses that can be fitted with at least a portion of the plurality of protrusions on the polishing pad pieces.

10. The jig according to claim 9, having a shape with a gap in a plan view.

11. The jig according to claim 9, wherein the surface of the jig on which the recess is provided has a larger area in plan view than the surface of the polishing pad on which the convex portion is provided.

12. A polishing pad comprising a plurality of polishing pad pieces having protrusions, wherein each polishing pad piece includes a polishing surface that contacts the object to be polished and an end portion that defines the outer shape of the polishing pad piece, the polishing surface includes a plurality of the protrusions and recesses provided between adjacent protrusions, the protrusions are substantially rectangular in shape in plan view, the recesses are substantially grid-shaped in plan view, the polishing pad piece comprises a first polishing pad piece and a second polishing pad piece adjacent to the first polishing pad piece, the first polishing pad piece and the second polishing pad piece are arranged such that there is a gap between their respective ends in the portions adjacent to each other, and in the first polishing pad piece, point a is defined as the center point of the side of the protrusion adjacent to the second polishing pad piece that is substantially parallel to the end portion of the adjacent portion and adjacent to the second polishing pad piece, In the second polishing pad piece, when point b is the center of the side of the protrusion adjacent to the first polishing pad piece that is substantially parallel to the end of the adjacent portion, the width of the recess and the distance between point a and point b satisfy the condition expressed by the following formula (1): -0.50 ≤ (W - D1) / W ≤ 0.50 …(1) (wherein formula (1) is the width of the recess and D1 is the distance between point a and point b.) Polishing pad.

13. A polishing pad comprising a plurality of polishing pad pieces having protrusions, wherein each polishing pad piece includes a polishing surface that contacts the object to be polished and an end portion that defines the outer shape of the polishing pad piece, the polishing surface includes a plurality of the protrusions and recesses provided between adjacent protrusions, the protrusions are substantially rectangular in shape in plan view, the recesses are substantially grid-shaped in plan view, the polishing pad piece comprises a first polishing pad piece and a second polishing pad piece adjacent to the first polishing pad piece, the first polishing pad piece and the second polishing pad piece are arranged such that there is a gap between their respective ends in the portions adjacent to each other, in the first polishing pad piece, point c is the center of side X of the protrusions adjacent to the second polishing pad piece that is substantially perpendicular to the end portion of the adjacent portion, and line C is the line passing through point c and perpendicular to side X, In the second polishing pad piece, if we define line D as the extension of side Y, which is substantially perpendicular to the end of the adjacent portion of the protrusion adjacent to the first polishing pad piece, and if we define the intersection of line C and line D as point f, then the distance between point c and point f and the length of side X of the first polishing pad piece satisfy the condition expressed by the following formula (2): D2 / L ≤ 0.20 …(2) (wherein L represents the length of side X, and D2 represents the distance between point c and point f). Polishing pad.

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