Composition, surface treatment agent, article, and method for producing article

WO2026205546A1PCT designated stage Publication Date: 2026-10-01AGC INC
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Patent Information

Application Number
PCT/JP2026/012917
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-03-28
Filing Date
2026-03-27
Publication Date
2026-10-01

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Abstract

The present invention addresses the problem of providing a composition capable of forming a surface layer having excellent sweat resistance, a surface treatment agent, an article; and a method for producing an article. The composition of the present invention contains a first compound selected from a group consisting of a compound represented by formula (1-1) and compound represented by formula (1-2), a compound represented by formula (2-1), a compound represented by formula (2-2), and a second compound selected from a group consisting of polysilazanes. Formula (1-1): Aa1-La1-Qa1-(Ta1)ma1 Formula (1-2): (Ta1)ma1-Qa1-La2-Qa1-(Ta1)ma1 Formula (2-1): (RC1O)3-Si-QC1-Si-(ORC1)3 Formula (2-2): RC1O-(Si(ORC1)2-O)nc1-Si-(ORC1)3
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Description

Composition, surface treatment agent, article, and method for manufacturing article

[0001] This disclosure relates to compositions, surface treatment agents, articles, and methods for manufacturing articles.

[0002] In recent years, technologies that make optical articles less prone to fingerprints and easier to clean have become widespread in eyeglass lenses, wearable devices, and touch panel displays to improve their appearance and visibility. One specific method for applying these technologies to improve the appearance, visibility, and other performance aspects of these devices is to form a surface layer on the surface of the article using a surface treatment agent. The use of materials with such surface layers is expected to contribute to achieving Goal 12 of the United Nations' Sustainable Development Goals (SDGs), "Responsible Consumption and Production," as it leads to a longer product lifecycle and, consequently, a reduction in waste.

[0003] For example, Patent Document 1 describes a composition containing a specific silane compound having a divalent linear organopolysiloxane group.

[0004] International Publication No. 2023 / 017830

[0005] Regarding the surface layer formed on the surface of an object, there is a need for further improvement in sweat resistance, which means that the surface properties do not easily change even when in contact with human sweat.

[0006] This disclosure has been made in view of these circumstances and aims to provide a composition that can form a surface layer with excellent sweat resistance. Furthermore, this disclosure aims to provide a surface treatment agent, an article, and a method for manufacturing the article.

[0007] This disclosure includes the following embodiments: [1] A composition comprising a first compound selected from the group consisting of a compound represented by formula (1-1) described later and a compound represented by formula (1-2) described later, and a second compound selected from the group consisting of a compound represented by formula (2-1) described later, a compound represented by formula (2-2) described later, and a polysilazane. [2] The composition according to [1], wherein the second compound comprises a compound represented by formula (2-1). [3] The first compound comprises a compound represented by formula (1-1), wherein A in formula (1-1) a1The composition according to [1] or [2], wherein the group is represented by formula (A1) described later, the group is represented by formula (A2) described later, or the group is represented by formula (A3) described later. [4] The first compound contains the compound represented by formula (1-1), wherein L in formula (1-1) a1 However, the composition according to any one of [1] to [3], which includes a group represented by formula (LD) described later. [5] T in formulas (1-1) and (1-2) a1 The composition according to any one of [1] to [4], wherein the group is represented by formula (TA) described later. [6] The composition according to any one of [1] to [5], wherein the mass ratio of the content of the first compound to the content of the second compound is 70 / 30 to 99.9 / 0.1. [7] A surface treatment agent comprising the composition according to any one of [1] to [6]. [8] The surface treatment agent according to [7], further comprising a liquid medium. [9] The surface treatment agent according to [7], which is an antifouling coating agent or a waterproof coating agent.

[10] The surface treatment agent according to [8], which is an antifouling coating agent or a waterproof coating agent.

[11] An article having a surface layer formed using the surface treatment agent according to [7] on the surface of a substrate.

[12] The article according to

[11] , which is an optical member.

[13] The article according to

[11] or

[12] , which has the above surface layer on the surface of a member constituting the surface touched by a finger on a touch panel.

[14] A method for manufacturing an article, comprising forming a surface layer by a dry coating method using the surface treatment agent described in [7].

[15] A method for manufacturing an article, comprising forming a surface layer by a dry coating method using the surface treatment agent described in [8].

[16] A method for manufacturing an article, comprising forming a surface layer by a wet coating method using the surface treatment agent described in [8].

[0008] This disclosure provides a composition capable of forming a surface layer with excellent sweat resistance. Furthermore, this disclosure provides a surface treatment agent, an article, and a method for manufacturing the article.

[0009] This is a schematic cross-sectional view showing an example of an article of the present invention.

[0010] The embodiments for carrying out the embodiments of this disclosure will be described in detail below. However, the embodiments of this disclosure are not limited to the embodiments described below. In the embodiments described below, the components (including elemental steps, etc.) are not essential unless otherwise specified. The same applies to numerical values ​​and their ranges, and do not limit the embodiments of this disclosure.

[0011] In this disclosure, the term "process" includes not only processes that are independent of other processes, but also processes that cannot be clearly distinguished from other processes, provided that the purpose of the process is achieved. In this disclosure, numerical ranges indicated using "~" include the numbers before and after "~" as the minimum and maximum values, respectively. In numerical ranges described in stages in this disclosure, the upper or lower limit of one numerical range may be replaced with the upper or lower limit of another numerical range described in stages. Also, in numerical ranges described in this disclosure, the upper or lower limit of that numerical range may be replaced with the values ​​shown in the examples. In this disclosure, each component may contain multiple types of the corresponding substance. If multiple types of the substance corresponding to each component are present in the composition, the content or amount of each component means the total content or amount of the multiple types of substances present in the composition, unless otherwise specified. In this disclosure, "surface layer" means a layer formed on the surface of a substrate using a surface treatment agent. In this disclosure, when a compound or group is represented by a specific formula (X), the compound or group represented by formula (X) may be referred to as compound (X) or compound X, and as group (X) or group X, respectively. In this disclosure, "Me" may mean a methyl group, and "Et" may mean an ethyl group. In this disclosure, when there are multiple identical symbols in a single chemical formula, such identical symbols may represent the same structure or may represent different structures within a defined range.

[0012] [Composition] The composition of the present disclosure (hereinafter also referred to as the present composition) comprises a first compound selected from the group consisting of a compound represented by formula (1-1) described below and a compound represented by formula (1-2) described below, and a second compound selected from the group consisting of a compound represented by formula (2-1) described below, a compound represented by formula (2-2) described below, and polysilazane.

[0013] When the present composition is used as a surface treatment agent, a surface layer excellent in sweat resistance can be formed. Although the reason for this is not clear, it is presumed as follows. In the surface layer formed using the present composition, the second compound is arranged in a layer form on the substrate side of the surface layer, and crosslinking proceeds in the in-plane direction between the second compounds arranged in the layer form, whereby the adhesion between a part or all of the hydrolyzate or condensate of the first compound and the substrate is improved, and it is estimated that the sweat resistance of the surface layer formed on the surface of the substrate is improved. As a result, the surface layer formed using the present composition is considered to be excellent in sweat resistance. Hereinafter, the components contained in the present composition will be described in detail for each component.

[0014] <First Compound> The first compound is a compound selected from the group consisting of a compound represented by the following formula (1-1) and a compound represented by the following formula (1-2). A a1 -L a1 -Q a1 -(T a1 ) ma1 (1-1) (T a1 ) ma1 -Q a1 -L a2 -Q a1 -(T a1 ) ma1 (1-2) Provided that, A a1 is an alkyl group, or a group containing one or more selected from Si, Ge and Sn and having no reactive silyl group, L a1 is a chain group, L a2 is a chain group, Q a1 is a single bond or a (ma1+1)-valent group, T a1 is a group containing a reactive silyl group, and ma1 is an integer of 1 or more.

[0015] A a1 The alkyl group may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. Specific examples of alkyl groups include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group, an ethyl group, or a tert-butyl group is preferred, and a methyl group is more preferred.

[0016] A a1 Examples of groups that include one or more selected from Si, Ge, and Sn and do not have a reactive silyl group include the groups represented by the following formulas (A1) to (A3). a21 3 M-(Q) a11 ) za1 - (R aSi ) za2 - (A1)

[0017] However, R a21 Each of these independently comprises a hydrocarbon group, or R b21 3 M-R b22 - and R b21 Each of these independently comprises a hydrocarbon group, or R c21 3 M-R c22 - and R c21 Each of these independently comprises a hydrocarbon group, or R d21 3 M-R d22 - and R d21 Each of these independently comprises a hydrocarbon group, or R e21 3 M-R e22 - and R e21 Each of these is independently a hydrocarbon group, and R b22 , R c22 , R d22 , R e22 Each is independently an oxygen atom or an alkylene group having 1 to 6 carbon atoms, R a24Each of these independently comprises a hydrocarbon group or R b21 3 M-R b22 - and ta11 is an integer from 1 to 5, R a25 Each of these independently comprises a hydrocarbon group or R b21 3 M-R b22 - and M is independently Si, Ge, or Sn, Q a11 is -O-, -C(=O)-, or an alkylene group having 1 to 6 carbon atoms, za1 is 0 or 1, za2 is 0 or 1, R aSi This is a group represented by the following formula (RSi): -(SiR a41 2 O) sa41 -SiR a41 2 - (RSi) R a41 Each of these is independently a hydrocarbon group, and sa41 is a number greater than or equal to 0.

[0018] R a21 , R b21 , R c21 , R d21 , R e21 , R a24 , R a25 and R a41 The hydrocarbon group in this material can be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, with an aliphatic hydrocarbon group being preferred and an alkyl group being more preferred. The alkyl group may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred. The number of carbon atoms in the hydrocarbon group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. Specific examples of hydrocarbon groups include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group, with a methyl group or an ethyl group being preferred, and a methyl group being more preferred, from the viewpoint of further improving liquid repellency.

[0019] R b22 , R c22 , R d22 , R e22 and Q a11The alkylene group having 1 to 6 carbon atoms is preferably a linear alkylene group. Specific examples of the alkylene group having 1 to 6 carbon atoms include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, and a hexylene group.

[0020] ta11 is the number of repetitions of MR a24 2 O, which is an integer of 1 to 5, and preferably an integer of 1 to 3. M is Si, Ge or Sn, and Si is preferred. sa41 is the number of repetitions of SiR a41 2 O, which may be any number of 0 or more, is preferably 1 or more, more preferably 1 to 600, still more preferably 2 to 500, and particularly preferably 8 to 50.

[0021] From formula (A1), (Q a11 ) za1 -(R aSi ) za2 Specific examples of the partial structure excluding the above are listed below. Here, * represents a bonding position to Q a11 , R aSi or L a1 .

[0022]

[0023] From formula (A2), (Q a11 ) za1 -(R aSi ) za2 Specific examples of the partial structure excluding the above are listed below. Here, * represents a bonding position to Q a11 , R aSi or L a1 .

[0024]

[0025] From formula (A3), (Q a11 ) za1 -(R aSi ) za2 Specific examples of the partial structure excluding the above are listed below. Here, * represents a bonding position to Q a11 , R aSi or L a1 .

[0026]

[0027] A a1 Preferably, the group is represented by formula (A1), the group is represented by formula (A2), or the group is represented by formula (A3), where M is independently Si, and more preferably, the group represented by each formula is in the above preferred form.

[0028] L a1 and L a2 Examples of the chain-like groups in this include one or more combinations of groups selected from the following formulas (LA) to (LD): -(SiR a11 2 O) sa1 -SiR a11 2 - (LA) - (SiR a11 2 -R a12 ) sa2 -SiR a11 2 - (LB) -(SiR a11 2 -R a12 O) sa3 -SiR a11 2 - (LC) - (CR a13 2 ) sa4 - (LD) However, R a11 Each of these is independently a monovalent hydrocarbon group or organopolysiloxane residue which may have an ether bond between carbon atoms, and R a12 Each of these is independently a divalent hydrocarbon group which may have an ether bond between carbon atoms, and R a13 Each of these is independently a hydrogen atom or a monovalent hydrocarbon group which may have an ether bond between carbon atoms, sa1, sa2, and sa3 are each independently a number from 1 to 200, and sa4 is an integer from 1 to 200.

[0029] R a11Among these, hydrocarbon groups are preferred, and alkyl groups are more preferred. The alkyl group may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. From the viewpoint of improving liquid repellency, linear alkyl groups or branched alkyl groups are preferred. The number of carbon atoms in the hydrocarbon group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. Specific examples of hydrocarbon groups include methyl groups, ethyl groups, n-propyl groups, n-butyl groups, and tert-butyl groups. From the viewpoint of further improving liquid repellency, methyl groups or ethyl groups are preferred, and methyl groups are more preferred. a12 Among these, divalent hydrocarbon groups are preferred, and alkylene groups are more preferred. The alkylene group may be a linear alkylene group, a branched alkylene group, or a cyclic alkylene group. From the viewpoint of improving liquid repellency, linear alkylene groups or branched alkylene groups are preferred. The number of carbon atoms in the hydrocarbon group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. a13 R is preferably a hydrogen atom or a monovalent hydrocarbon group, and as a monovalent hydrocarbon group, a11 The structure mentioned above is preferred. a13 Hydrogen atoms are more preferred. Sa1, Sa2, and Sa3 are each independently preferably 1 to 150, more preferably 1 to 100, and even more preferably 1 to 20. Sa4 is preferably 11 to 150, more preferably 21 to 100, and even more preferably 29 to 36.

[0030] L a1 The group is preferably represented by the following formulas (L1a) to (L1b): -Ak 1 - (L1a) -Ak 1 -R Si -Ak 1 - (L1b) However, Ak 1 R is a group represented by the above formula (LD), Si is a group represented by the above formula (LA) or a group represented by the above formula (LB). Among them, L a1 As such, the group represented by the above formula (LD) is more preferred, and R in formula (LD) a13Furthermore, if sa4 is the above-described preferred embodiment, it is even more preferable.

[0031] L a2 The group is preferably represented by the following formulas (L2a) to (L2c). -R Si - (L2a) -Ak 1 -R Si -Ak 1 - (L2b) -R Si -Ak 1 -R Si - (L2c) However, Ak 1 R is a group represented by the above formula (LD), Si This is a group represented by the above formula (LA) or a group represented by the above formula (LB).

[0032] Q a1 In this, the (ma1+1) valence base is preferably the base represented by the following formula (QA). * a2 -Q a4 -R a3 -Q a5 (-R a4 - * a3 ) ma1 (QA) However, Q a4 R is a single bond or a divalent group. a3 Q is a hydrocarbon group which may have a single bond or an ether bond between carbon atoms. a5 R is a single bond or a (ma1+1) valence group. a4 is a hydrocarbon group which may have a single bond or an ether bond between carbon atoms, ma1 is an integer of 1 or more, * a2 is, L a1 or L a2 This is the bonding position with, * a3 is, T a1 This is the connection point.

[0033] Q a4 These are single bonds, -O-, -S-, -C(=O)NR a5 -, -NR a5 C(=O)-, -C(=O)-, -C(=O)O-, -OC(=O)-, -NR a5 C(=O)NRa5 -, -C(=O)S-, -SC(=O)-, -S(=O) 2 NR a5 -, -NR a5 S (=O) 2 -, -S (=O) 2 O-, -OS (=O) 2 - or a phenylene group is preferred. However, R a5 is a hydrogen atom or a hydrocarbon group.

[0034] Q a5 is a single bond, CR a6 ma2 , NR a7 ma3 , SiR a8 ma4 A (ma1+1) valent ring structure, a (ma1+1) valent organopolysiloxane residue, or a (ma1+1) valent hydrocarbon residue is preferred. However, R a6 R is a hydrogen atom, a hydroxyl group, or a hydrocarbon group which may have an ether bond between carbon atoms. a7 and R a8 m is a hydrogen atom, or a hydrocarbon group which may have an ether bond between carbon atoms, ma2 is an integer from 0 to 2 and the sum of ma1 and ma2 is 3, ma3 is 0 or 1 and the sum of ma1 and ma3 is 2, and ma4 is an integer from 0 to 2 and the sum of ma1 and ma4 is 3.

[0035] T a1 Examples of groups containing a reactive silyl group represented by the following formula (TA) include the group represented by the following formula. * a1 -[Si(R a1 ) 2 -Q a3 ] ra1 -Si(R a1 ) 3 (TA) However, R a1 Each of these is independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group, R a1 At least one of them is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, Q a3 is an oxygen atom, or -CR a22 - and R a2 is a hydrogen atom or hydrocarbon group, ra1 is an integer from 0 to 3, * a1 Q a1 This is the connection point.

[0036] A hydrolyzable group is a group that becomes a hydroxyl group through hydrolysis. Si-R a1 If the group represented is a silyl group having a hydrolyzable group, it undergoes a hydrolysis reaction to become a silanol group represented as Si-OH. The silanol groups further react with each other to form Si-O-Si bonds. In addition, silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0037] R a1 Examples of hydrolyzable groups in this context include alkoxy groups, aryloxy groups, halogen atoms, acyl groups, acyloxy groups, amino groups, and -O-N=CR groups. r 2 and isocyanate groups (-NCO) are examples. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes heteroaryl groups. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms. R r Each of these is independently an alkyl group having 1 to 10 carbon atoms.

[0038] R a1 Groups having hydrolyzable groups include groups in which the hydrolyzable group is bonded to a linking group. Examples of linking groups include alkylene groups, -O- groups, and combinations thereof. Examples of groups having hydrolyzable groups include alkoxyalkyleneoxy groups. Preferably, an alkoxyalkyleneoxy group is a group in which an alkoxy group having 1 to 4 carbon atoms is bonded to a carbon atom of an alkyleneoxy group having 1 to 10 carbon atoms. Specific examples of alkoxyalkyleneoxy groups include 2-methoxyethoxy groups. Among these, R a1From the viewpoint of ease of compound production, an alkoxy group having 1 to 4 carbon atoms or a halogen atom is preferred. a1 Because it exhibits less outgassing during application and superior storage stability of the compound, an alkoxy group having 1 to 4 carbon atoms is preferred, and an ethoxy group or a methoxy group is more preferred. Specific examples of hydrolyzable groups include -O-Si(OCH) 3 ) 3 ien-CH 2 -Si(OCH) 3 ) 3 , -C(CH 3 ) 2 -Si(OCH) 3 ) 3 , -O-Si(OCH 2 CH 3 ) 3 ien-CH 2 -Si(OCH) 2 CH 3 ) 3 , -C(CH 3 ) 2 -Si(OCH) 2 CH 3 ) 3 These are some examples.

[0039] R a1 Examples of hydrocarbon groups in this compound include alkyl groups, cycloalkyl groups, alkenyl groups, and allyl groups. From the viewpoint of ease of synthesis, saturated hydrocarbon groups are preferred, and alkyl groups are more preferred. a1 The number of carbon atoms in the hydrocarbon group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2.

[0040] Specific examples of groups (TA) when ra1 is 1 or greater include -Si(OCH) 3 ) 2 -O-Si(OCH) 3 ) 3 , -Si(OCH 3 ) 2 -CH 2 -Si(OCH) 3 ) 3 , -Si(OCH 3 ) 2 -C(CH 3 ) 2 -Si(OCH) 3 )3 ,-Si(OCH 2 CH 3 ) 2 -O-Si(OCH 3 ) 3 ,-Si(OCH 3 ) 2 -O-Si(OCH 2 CH 3 ) 3 ,-Si(OCH 2 CH 3 ) 2 -O-Si(OCH 2 CH 3 ) 3 ,-Si(OCH 2 CH 3 ) 2 -CH 2 -Si (OCH) 3 ) 3 ,-Si(OCH 3 ) 2 -CH 2 -Si (OCH) 2 CH 3 ) 3 ,-Si(OCH 2 CH 3 ) 2 -CH 2 -Si (OCH) 2 CH 3 ) 3 ,-Si(OCH 2 CH 3 ) 2 -C(CH) 3 ) 2 -Si(OCH 3 ) 3 ,-Si(OCH 3 ) 2 -C(CH) 3 ) 2 -Si(OCH 2 CH 3 ) 3 ,-Si(OCH 2 CH 3 ) 2 -C(CH) 3 ) 2 -Si(OCH 2 CH 3 ) 3 ,-Si(OH) 2 -O-Si(OH)3 -Si(OH) 2 -O-Si(OCH) 3 ) 3 , -Si(OCH 3 ) 2 -O-Si(OH) 3 -Si(OH) 2 -CH 2 -Si(OH) 3 -Si(OH) 2 -CH 2 -Si(OCH) 3 ) 3 , -Si(OCH 3 ) 2 -CH 2 -Si(OH) 3 -Si(OH) 2 -C(CH 3 ) 2 -Si(OH) 3 -Si(OH) 2 -C(CH 3 ) 2 -Si(OCH) 3 ) 3 , -Si(OCH 3 ) 2 -C(CH 3 ) 2 -Si(OH) 3 These are some examples.

[0041] When ra1 is 0, the above group (TA) is the group represented by the following formula (T1). * a1 -Si(R a1 ) 3 (T1) However, R a1 Each of these is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, * a1 Q a1 This is the connection point.

[0042] Q a1 - (T a1 ) ma1 Specific examples include the following. However, α is an integer from 1 to 100, and * is L a1 or L a2 This is the connection point.

[0043]

[0044]

[0045] The composition preferably contains a compound represented by formula (1-1) as the first compound, and more preferably contains a compound represented by formula (1-1) in which each group in formula (1-1) is in the preferred form described above.

[0046] Specific examples of the specified compounds are listed below. In the formula, n1 is the average and is 3, 4, 5, 6, 7, 8, 9, 10, 13, or 15.5.

[0047]

[0048]

[0049]

[0050]

[0051] The content of the first compound is preferably 0.001 to 99% by mass, more preferably 0.01 to 80% by mass, and even more preferably 0.1 to 70% by mass, based on the total amount of the composition. When the composition is used in a wet coating method, the content of the first compound is preferably 0.01 to 10% by mass, more preferably 0.02 to 5% by mass, even more preferably 0.03 to 3% by mass, and particularly preferably 0.05 to 2% by mass, based on the total amount of the composition.

[0052] <Second Compound> The second compound is a compound selected from the group consisting of the compound represented by the following formula (2-1), the compound represented by the following formula (2-2), and polysilazanes. (R C1 O) 3 -Si-Q C1 -Si-(OR C1 ) 3 (2-1) R C1 O-(Si(OR C1 ) 2 -O) nc1 -Si-(OR C1 ) 3 (2-2) However, Q C1 is -O- or -CH 2 - and RC1 Each of these is an alkyl group, and nc1 is a number of 2 or more.

[0053] R C1 The alkyl group in may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. A linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 or 2. Specific examples of alkyl groups include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group, with a methyl group or an ethyl group being preferred, and a methyl group being more preferred. Multiple R groups bonded to one silicon atom. C1 R in the O group C1 These may be the same or different, but from the viewpoint of ease of compound production, it is preferable that they be the same.

[0054] nc1 is a number of 2 or more, preferably 2 to 100, and more preferably 2 to 10.

[0055] Polysilazanes are compounds having multiple repeating units containing Si-N bonds in their main chain. Polysilazanes may be branched or have a cyclic structure. Preferably, polysilazanes have a structural unit represented by the following formula (s1). In formula (s1), R S11 , R S12 and R S13 Each of these independently represents a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms which may have substituents, or an alkylsilyl group.

[0056]

[0057] R S11 ~R S13The hydrocarbon groups having 1 to 10 carbon atoms represented by the formula include linear saturated aliphatic hydrocarbon groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, and decyl groups; branched saturated aliphatic hydrocarbon groups such as isopropyl, sec-butyl, tert-butyl, methylpentyl, ethylpentyl, methylhexyl, ethylhexyl, propylhexyl, and tert-octyl groups; and cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl groups. Examples include cyclic saturated aliphatic hydrocarbon groups; unsaturated aliphatic hydrocarbon groups such as vinyl groups, 1-propenyl groups, 2-propenyl groups, 1-butenyl groups, 2-butenyl groups, and 3-butenyl groups; aromatic hydrocarbon groups such as phenyl groups, naphthyl groups, p-tert-butylphenyl groups, tolyl groups, xylyl groups, cumenyl groups, mesityl groups, 2,6-diethylphenyl groups, and 2-methyl-6-ethylphenyl groups; and groups formed by combining the hydrocarbon groups exemplified above, such as alkylcycloalkyl groups, cycloalkylalkyl groups, and aralkyl groups.

[0058] Substituents that a hydrocarbon group having 1 to 10 carbon atoms may have include halogen atoms selected from fluorine, chlorine, bromine, and iodine atoms; hydroxyl groups; nitro groups; amino groups; cyano groups; thiol groups; epoxy groups; glycidoxy groups; (meth)acroyloxy groups; heteroaryl groups having 6 to 12 ring-forming atoms; alkoxy groups having 1 to 3 carbon atoms such as methoxy and ethoxy groups; and aryloxy groups having 6 to 12 ring-forming carbon atoms.

[0059] R S11 ~R S13 The hydrocarbon group having 1 to 10 carbon atoms represented by is preferably an unsubstituted saturated aliphatic hydrocarbon group having 1 to 10 carbon atoms, more preferably an unsubstituted linear saturated aliphatic hydrocarbon group having 1 to 6 carbon atoms, even more preferably an unsubstituted methyl group, ethyl group, propyl group, or butyl group, and particularly preferably a methyl group.

[0060] R S11 ~R S13Examples of alkylsilyl groups represented by this formula include trimethylsilyl, triethylsilyl, tri-n-propylsilyl, triisopropylsilyl, tri-t-butylsilyl, methyldiethylsilyl, dimethylsilyl, diethylsilyl, methylsilyl, and ethylsilyl groups.

[0061] The above polysilazane is represented by the above formula (s1), R S11 and R S12 Organic polysilazanes are preferred that have a structural unit (s2) in which at least one of is a hydrocarbon group having 1 to 10 carbon atoms. In the above organic polysilazane, R S13 A hydrogen atom is preferred.

[0062] The above polysilazane is more preferably having a structural unit represented by the following formula (s3) in addition to the above structural unit (s2). In formula (s3), R S31 and R S32 Each of these independently represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, Y S X represents a divalent hydrocarbon group having 1 to 10 carbon atoms, and multiple X S Each of these independently represents a hydrolyzable group.

[0063]

[0064] R S31 and R S32 The hydrocarbon group having 1 to 10 carbon atoms represented by the above R is S11 ~R S13 Examples include the same groups as those described for hydrocarbon groups having 1 to 10 carbon atoms represented by . Among these, saturated aliphatic hydrocarbon groups having 1 to 10 carbon atoms are preferred, linear saturated aliphatic hydrocarbon groups having 1 to 6 carbon atoms are more preferred, and methyl, ethyl, propyl, or butyl groups are even more preferred.

[0065] Y SThe number of carbon atoms in the divalent hydrocarbon group represented by is preferably 1 to 4, more preferably 1 to 3, and even more preferably 1 to 2. The divalent hydrocarbon group is preferably in a chain form, and if it is in a chain form, it may be either linear or branched. Furthermore, the divalent hydrocarbon group is preferably a divalent aliphatic hydrocarbon group, and an alkanediyl group is preferred. Examples of the divalent hydrocarbon group include a methylene group, an ethylene group, a propylene group, and a butylene group. Furthermore, some of the -CH contained in the divalent hydrocarbon group 2 The - can be replaced with -O-. In this case, two consecutive -CH 2 The - group does not simultaneously replace -O-, and the -CH group adjacent to the Si atom does not replace -O-. 2 - cannot be replaced by -O-. Two or more -CH 2 When a - is replaced by -O-, the number of carbon atoms between the -O- and -O- is preferably 2 to 4, and more preferably 2 to 3. Examples of groups in which a portion of a divalent hydrocarbon group is replaced by -O- include groups having (poly)ethylene glycol units and groups having (poly)propylene glycol units.

[0066] X S The hydrolyzable group represented by can be any group that yields a hydroxyl group (silanol group) upon hydrolysis, such as alkoxy groups having 1 to 4 carbon atoms, such as methoxy, ethoxy, propoxy, and butoxy groups; hydroxyl groups; acetoxy groups; chlorine atoms; and isocyanate groups. Among these, alkoxy groups having 1 to 4 carbon atoms are preferred, and alkoxy groups having 1 to 2 carbon atoms are more preferred. Multiple X S They may be the same or different, but it is preferable that they be the same.

[0067] SiX in the above formula (s3) S 3 The content of the group is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 8% by mass or more, and may also be 50% by mass or less, 40% by mass or less, or 30% by mass or less, based on 100% by mass of the above polysilazane.

[0068] When the above polysilazane is an organic polysilazane, the content ratio of hydrocarbon groups having 1 to 10 carbon atoms bonded to Si (hydrocarbon groups / hydrogen atoms) to the hydrogen atoms of Si-H is, for example, 0.1 to 50 in molar ratio, and preferably 0.2 to 10. These molar ratios can be calculated from NMR measurements or the like.

[0069] The content of the second compound is preferably 0.001 to 40% by mass, more preferably 0.01 to 20% by mass, and even more preferably 0.1 to 10% by mass, based on the total amount of the composition. In the case of the composition used in a wet coating method, the content of the second compound is preferably 0.01 to 10% by mass, more preferably 0.02 to 5% by mass, even more preferably 0.03 to 3% by mass, and particularly preferably 0.05 to 2% by mass, based on the total amount of the composition.

[0070] In this composition, the mass ratio of the content of the first compound to the content of the second compound is preferably 70 / 30 to 99.9 / 0.1, more preferably 70 / 30 to 99 / 1, even more preferably 70 / 30 to 97 / 3, and particularly preferably 75 / 25 to 93 / 7. When the above mass ratio is below the upper limit of the above range, a surface layer with superior sweat resistance can be formed. When the above mass ratio is above the lower limit of the above range, abrasion resistance is superior. Other preferred ranges include, in this composition, the mass ratio of the content of the first compound to the content of the second compound (content of the first compound / content of the second compound) is preferably 70.00 / 30.00 to 99.99 / 0.01, more preferably 80.00 / 20.00 to 99.95 / 0.05, and even more preferably 90.00 / 10.00 to 99.90 / 0.10. When the above mass ratio is below the upper limit of the above range, a surface layer with superior sweat resistance can be formed. When the above mass ratio is above the lower limit of the above range, abrasion resistance is even better.

[0071] <Liquid Medium> This composition may further contain a liquid medium. When this composition contains a liquid medium, it may be a solution or a dispersion. This composition containing a liquid medium is useful for coating applications and can be used as a coating liquid.

[0072] As the liquid medium, an organic solvent is preferred. The organic solvent may be a fluorine-containing organic solvent, a non-fluorine-containing organic solvent, or a mixture of both. Specific examples of fluorine-containing organic solvents include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines, fluoroalcohols, and hydrofluoroolefins (HFOs). As fluorinated alkanes, compounds having 4 to 8 carbon atoms are preferred. Specific examples of commercially available products include C 6 F 13 H (AGC Corporation, Asahi Clean® AC-2000), C 6 F 13 C 2 H 5 (Manufactured by AGC Corporation, Asahi Clean® AC-6000), C 2 F 5 CHFCHFCF 3 (Chemours Bartrell® XF) is one example. Specific examples of fluorinated aromatic compounds include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, and bis(trifluoromethyl)benzene. As for fluoroalkyl ethers, compounds with 4 to 12 carbon atoms are preferred. A specific example of a commercially available product is CF 3 CH 2 OCF 2 CF 2 H (AGC Corporation, Asahi Clean® AE-3000), C 4 F 9 OCH 3 (Manufactured by 3M, Novec® 7100), C 4 F 9 OC 2 H 5 (Manufactured by 3M, Novec® 7200), C 2 F 5 CF(OCH) 3 ) C 3 F 7(Novec® 7300, manufactured by 3M) is one example. Specific examples of fluorinated alkylamines include perfluorotripropylamine and perfluorotributylamine. Specific examples of fluoroalcohols include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol, and hexafluoroisopropanol. Specific examples of HFOs include 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (Amorea® AS-300, manufactured by AGC). As non-fluorinated organic solvents, compounds consisting only of hydrogen atoms and carbon atoms, and compounds consisting only of hydrogen atoms, carbon atoms, and oxygen atoms are preferred, and examples include hydrocarbon organic solvents, alcohol organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, and glycol organic solvents.

[0073] Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene.

[0074] Specific examples of alcoholic organic solvents include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0075] Specific examples of ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, and 3,3,5-trimethylcyclohexanone and isophorone.

[0076] Specific examples of ether-based organic solvents include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane.

[0077] Specific examples of ester-based organic solvents include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, and ethylene glycol monoethyl ether acetate. Examples include tate, ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, and 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate.

[0078] Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol monotert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, and diethylene glycol monobutyl ether. Examples include propylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, diethylene glycol monoethyl ether, tripropylene glycol methyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.

[0079] Other organic solvents include chlorinated organic solvents, nitrogen-containing compounds, sulfur-containing compounds, and siloxane compounds.

[0080] Specific examples of chlorinated organic solvents include dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane.

[0081] Specific examples of nitrogen-containing compounds include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone.

[0082] Specific examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide.

[0083] Specific examples of siloxane compounds include hexamethyldisiloxane, octamethyltrisiloxane, and decamethyltetrasiloxane.

[0084] The liquid medium contained in this composition may be one type or two or more types. When this composition contains a liquid medium, the content of the liquid medium is preferably 60 to 99.999% by mass, more preferably 80 to 99.99% by mass, and even more preferably 90 to 99.9% by mass, based on the total amount of the composition. When this composition is used in a wet coating method, the content of the liquid medium is preferably 90 to 99.99% by mass, more preferably 95 to 99.98% by mass, even more preferably 97 to 99.97% by mass, and particularly preferably 98 to 99.95% by mass, based on the total amount of the composition.

[0085] <Other Components> The composition may further contain other components besides the first compound, the second compound, and the liquid medium, to the extent that they do not impair the effects of the present disclosure. Examples of other components include additives, specifically catalysts such as acid catalysts and base catalysts that promote the hydrolysis and condensation reactions of reactive silyl groups.

[0086] Any suitable acid or base, transition metals (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having lone pairs of electrons in their molecular structure, nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphate amide compounds, amide compounds, urea compounds), etc. can be used as catalysts. Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide; and organic amines such as triethylamine and diethylamine.

[0087] Other components include metal compounds having hydrolyzable groups. When a surface treatment agent contains metal compounds having hydrolyzable groups, the slipperiness and antifouling properties of the surface layer can be further improved.

[0088] The content of other components that may be included in the surface treatment agent is preferably 10% by mass or less, and more preferably 1% by mass or less, relative to the total mass of the surface treatment agent. If the surface treatment agent contains the above-mentioned metal compound, the content of the above-mentioned metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, relative to the total mass of the surface treatment agent.

[0089] The total content of the first compound, the second compound, and other components (hereinafter also referred to as "solid content concentration") is preferably 0.001 to 40% by mass, more preferably 0.01 to 20% by mass, and even more preferably 0.1 to 10% by mass, based on the total mass of the surface treatment agent. The solid content concentration of the surface treatment agent is calculated from the mass before heating and the mass after heating in a convection dryer at 120°C for 4 hours.

[0090] [Surface Treatment Agent] In one embodiment, the surface treatment agent of the present disclosure (hereinafter also referred to as "the surface treatment agent") comprises the composition of the present disclosure. The surface treatment agent may also be the composition of the present disclosure. Preferred embodiments of the surface treatment agent are the same as preferred embodiments of the composition of the present disclosure.

[0091] This surface treatment agent is suitable for applications requiring sweat resistance, such as forming a surface layer on components that make up the touch surfaces of touch panels, eyeglass lenses, and displays of wearable devices. Furthermore, due to its excellent sweat resistance, this surface treatment agent is also suitable for use on glass-coated casings of portable devices such as smartphones and tablet terminals. This surface treatment agent is also suitable for use as an anti-fouling or waterproof coating agent.

[0092] [Article] In one embodiment, the article of the present disclosure (hereinafter also referred to as "the Article") has a surface layer formed using the surface treatment agent on the surface of a substrate. Preferably, the Article has a substrate and the above-mentioned surface layer.

[0093] The surface layer may be formed on a part of the surface of the substrate or on the entire surface of the substrate. The surface layer may spread as a film on the surface of the substrate or may be scattered as dots. In the surface layer, the first compound is contained in a state in which hydrolysis of some or all of the reactive silyl groups has progressed and the dehydration condensation reaction of the silanol groups has progressed.

[0094] The thickness of the surface layer is preferably 1 to 100 nm, and more preferably 1 to 50 nm. If the thickness of the surface layer is 1 nm or more, the effect of the surface layer is easily obtained. If the thickness of the surface layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface layer can be calculated from the vibration period of the interference pattern obtained by the X-ray reflectivity method using an X-ray diffractometer for thin film analysis (product name "ATX-G", manufactured by RIGAKU Corporation).

[0095] The surface layer may be provided directly on the surface of the substrate, or a base layer may be provided between the substrate and the surface layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface layer, it is preferable that the article includes a substrate, a base layer disposed on the substrate, and a surface layer formed using the surface treatment agent disposed on the base layer.

[0096] An example of this article will be described with reference to the drawings. Figure 1 is a schematic cross-sectional view showing a first article, which is an example of this article. The first article is an article 20 having a base material 12, a base layer 14, and a surface layer 22 in that order, wherein the base layer 14 contains an oxide containing silicon, and the surface layer 22 is a surface layer formed using this surface treatment agent.

[0097] The material and shape of the base material 12 may be appropriately selected according to the intended use of the article 20. The type of base material is not particularly limited; for example, a base material for which sweat resistance is required can be used. Examples of base materials include base materials that may be used in contact with human fingers; base materials that may be held by human fingers during operation; and base materials that may be placed on other articles (e.g., a stand). Examples of materials for the base material 12 include glass, resin, sapphire, metal, ceramic, stone, and composite materials thereof. Glass may be chemically strengthened. Examples of base materials 12 for which water-repellent and oil-repellent properties are particularly required include base materials for touch panels, base materials for displays, base materials that constitute the housing of electronic devices, and eyeglass lenses. The base materials for touch panels and display base materials are translucent. "Translucent" means that the normal incidence visible light transmittance in accordance with JIS R3106:1998 (ISO 9050:1990) is 25% or more. Glass or transparent resin is preferred as the material for the base material for touch panels.

[0098] The substrate 12 may have surface treatments such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment applied to the surface on which the underlayer 14 is provided. Surface treatment further improves the adhesion between the substrate 12 and the underlayer 14, and as a result, the abrasion resistance of the surface layer 22 is further improved. As for the surface treatment, corona discharge treatment or plasma treatment is preferred because it further improves the abrasion resistance of the surface layer 22.

[0099] The base layer 14 is a layer containing an oxide that includes at least silicon, and may also contain other elements. By including silanol groups on the surface of the base layer 14, the hydrolyzable silyl groups of the compound undergo dehydration condensation, forming Si-O-Si bonds between it and the base layer 14, resulting in a surface layer 22 with superior abrasion resistance.

[0100] The silicon dioxide content in the base layer 14 is preferably 65% ​​by mass or more, more preferably 80% by mass or more, even more preferably 85% by mass or more, and particularly preferably 90% by mass or more. If the silicon dioxide content is above the lower limit of the above range, sufficient Si-O-Si bonds are formed in the base layer 14, and the mechanical properties of the base layer 14 are sufficiently ensured. The silicon dioxide content is the remainder obtained by subtracting the total content of other elements (or the sum of the amounts converted to oxides in the case of oxides) from the mass of the base layer 14.

[0101] From the standpoint of excellent wear resistance of the surface layer 22, it is preferable that the oxide in the base layer 14 further contains one or more elements selected from alkali metal elements, alkaline earth metal elements, platinum group elements, boron, aluminum, phosphorus, titanium, zirconium, iron, nickel, chromium, molybdenum, and tungsten. The inclusion of these elements strengthens the bond between the base layer 14 and the compound, improving wear resistance.

[0102] To improve the adhesion of this surface treatment agent and to improve the water-repellent, oil-repellent, and abrasion-resistant properties of article 20, the base layer 14 is preferably a silicon oxide layer containing alkali metal atoms. In the silicon oxide layer, the average concentration of alkali metal atoms in the region at a depth of 0.1 to 0.3 nm from the surface in contact with the surface layer 22 is 2.0 × 10⁻¹⁶. 19 atoms / cm 3 The above is preferable. On the other hand, in order to ensure sufficient mechanical properties of the underlying layer, the average value of the alkali metal atom concentration should be 4.0 × 10 22 atoms / cm 3 The following is preferable:

[0103] The base layer may be a single layer or multiple layers. The base layer may have irregularities on its surface. The thickness of the base layer 14 is preferably 1 to 200 nm, and more preferably 2 to 20 nm. If the thickness of the base layer 14 is above the lower limit of the above range, the effect of improving adhesion by the base layer 14 is likely to be sufficiently obtained. If the thickness of the base layer 14 is below the upper limit of the above range, the abrasion resistance of the base layer 14 itself will be increased. Methods for measuring the thickness of the base layer 14 include cross-sectional observation of the base layer 14 using an electron microscope (SEM, TEM, etc.), and methods using an optical interferometer, spectroscopic ellipsometer, step meter, etc.

[0104] Specific examples of methods for forming the underlayer 14 include a method of depositing a vapor deposition material having the desired underlayer 14 composition onto the surface of the substrate 12. One example of a vapor deposition method is the vacuum vapor deposition method. The vacuum vapor deposition method involves evaporating the vapor deposition material in a vacuum chamber and depositing it onto the surface of the substrate 12. The temperature during vapor deposition (for example, the temperature of the boat in which the vapor deposition material is placed when using a vacuum vapor deposition apparatus) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the absolute pressure in the chamber in which the vapor deposition material is placed when using a vacuum vapor deposition apparatus) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming the underlayer 14 using a vapor deposition material, one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used. Examples of evaporation methods for the vapor deposition material include the resistance heating method, in which the vapor deposition material is melted and evaporated on a resistance heating boat made of high melting point metal, and the electron gun method, in which an electron beam is irradiated onto the vapor deposition material to directly heat the material, melt the surface, and evaporate it. As a method for evaporating the deposition material, the electron gun method is preferred because it allows for localized heating, enabling the evaporation of high-melting-point substances, and because the temperature is low in areas not exposed to the electron beam, eliminating the risk of reaction with the container or contamination by impurities. As the deposition material used in the electron gun method, molten granules or sintered bodies are preferred because they are less likely to scatter even if an airflow is generated.

[0105] Another example of this article is a second article. The second article is an article 20 having a substrate 10 with a base layer and a surface layer 22 in that order, wherein the substrate 10 with the base layer contains a silicon-containing oxide, and the surface layer 22 is a surface layer formed using this surface treatment agent.

[0106] In the second article, since the substrate 10 with the underlayer has the same composition as the underlayer 14 in the first article, the surface layer 22 has excellent abrasion resistance even when the surface layer 22 is directly formed on the substrate 10 with the underlayer. The material of the substrate 10 with the underlayer in the second article can be any material having the same composition as the underlayer 14, for example, a glass substrate. Details of the material of the substrate 10 with the underlayer are the same as those of the substrate 12 and the underlayer 14, so the explanation is omitted here. Also, the composition of the surface layer 22 is the same as that of the first article, so the explanation is omitted here.

[0107] Specific examples of this article include optical components (for example, optical components used as part of the products listed below), touch panels, anti-reflective films, anti-reflective glass, and SiO2. 2 Examples include processed glass, tempered glass, sapphire glass, quartz substrates, and mold metals. Products include: car navigation systems, mobile phones, digital cameras, digital video cameras, personal digital assistants (PDAs), portable audio players, car audio systems, gaming devices, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment (endoscopes, etc.), photocopiers, personal computers (PCs), liquid crystal displays, organic EL displays, plasma displays, touch panel displays, protective films, anti-reflective films, anti-reflective glass, nanoimprint templates, molds, etc.

[0108] [Method for Manufacturing Articles] One method for manufacturing articles is to use this surface treatment agent to form a surface layer on the surface of a substrate, thereby manufacturing an article having a substrate and a surface layer. Methods for forming the surface layer include dry coating and wet coating.

[0109] This surface treatment agent can be used directly in dry coating methods and is suitable for forming a surface layer with excellent adhesion by dry coating. Examples of dry coating methods include vacuum deposition, CVD, and sputtering. Vacuum deposition is preferably used because it suppresses the decomposition of this surface treatment agent and because of the simplicity of the equipment. For vacuum deposition, a pellet-like material may be used in which the first compound and the second compound, etc., are supported using this composition on a porous metal body made of a metal material such as iron or steel. The pellet-like material on which the above compounds are supported can be manufactured by impregnating the porous metal body with this composition containing a liquid medium and drying to remove the liquid medium.

[0110] This surface treatment agent (coating solution) containing a liquid medium can be suitably used in wet coating methods. Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Bludget coating, and gravure coating.

[0111] To improve the abrasion resistance of the surface layer, operations to promote the reaction between the first and second compounds contained in this composition and the substrate may be performed as needed. Such operations include heating, humidification, and light irradiation. For example, heating a substrate on which a surface layer has been formed in a humid atmosphere can promote reactions such as the hydrolysis of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds through the condensation reaction of silanol groups. After the formation of the surface layer, compounds in the surface layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Methods of removal include, for example, pouring a solvent onto the surface layer or wiping it with a cloth soaked in a solvent.

[0112] The present invention will be described in more detail below using examples, but the present invention is not limited to these examples. Examples 1 to 11 are examples, and Examples 12 to 13 are comparative examples.

[0113] [Synthesis Example 1: Synthesis of Compound 1-A] (Synthesis of Compound 1-A-1) 65 g of hexamethylcyclotrisiloxane was mixed with 101 g of THF (tetrahydrofuran) and stirred at 25°C until dissolved. The reaction mixture was then cooled to -30°C, and 100 mL of methyllithium (3.1 M in diethoxymethane) was added and the mixture was stirred at -30°C for 2 hours. Next, 100 g of chlorodimethylsilane was added and the mixture was stirred at -30°C for 1 hour, then the temperature was raised to 25°C and stirred for another hour. After removing the low-boiling components by distillation, hexane and water were added for extraction, and then the mixture was purified by distillation to obtain 65 g of Compound 1-A-1.

[0114]

[0115] 1 H NMR (400 MHz, CDCl3) δ 4.71 (p, J = 2.8 Hz, 1H), 0.50 - -0.23 (m, 27H).

[0116] (Synthesis of Compound 1-A-2) Compound 1-A-1 (1.0 g) was mixed with dichloromethane (20 g) and 18-bromo-1-octadecene (1.0 g) and stirred at 25°C until homogeneous. Next, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg) was added and stirred at 25°C for 2 hours. After removing the low-boiling components under reduced pressure, 1.5 g of compound 1-A-2 was obtained by flash column chromatography using silica gel (developing solvent: decane / dichloromethane).

[0117]

[0118] 1 H NMR (400 MHz, CDCl3) δ 3.41 (t, J = 6.9 Hz, 2H), 1.94 - 1.78 (m, 2H), 1.52 - 1.10 (m, 30H), 0.53 (t, J = 7.7 Hz, 2H), 0.39 - -0.24 (m, 27H).

[0119] (Synthesis of Compound 1-A-3) 11-bromo-1-undecene (2.0 g) was mixed with THF (20 g) and magnesium (1.1 g) and stirred at 60°C for 2 hours. After removing the magnesium residue by filtration of the reaction mixture, the reaction mixture was cooled to 0°C, and compound 1-A-2 (1.5 g) and tetrachlorocopper(II) dilithium solution (0.1 M in THF, 0.05 g) were added and stirred at 0°C for 24 hours. After extraction with hydrochloric acid and decane, low-boiling point components were removed by vacuum distillation, and 1.1 g of compound 1-A-3 was obtained by flash column chromatography using silica gel (developing solvent: decane).

[0120]

[0121] 1 H NMR (400 MHz, CDCl3) δ 6.00 - 5.67 (m, 1H), 5.15 - 4.67 (m, 2H), 2.19 - 1.86 (m, 2H), 1.55 - 1.08 (m, 50H), 0.53 (dd, J = 10.0, 5.3 Hz, 2H), 0.39 - -0.24 (m, 27H).

[0122] (Synthesis of Compound 1-A) Compound 1-A-3 (1.1 g) was dissolved in decane (10 g). Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.60 g) were added, and the mixture was stirred at 50°C for 2 hours. By removing the solvent under reduced pressure, 1.3 g of compound 1-A was obtained.

[0123]

[0124] 1 H NMR (400 MHz, CDCl3) δ 3.48 (s, 9H), 1.50 - 1.01 (m, 54H), 0.63 - 0.51 (m, 2H), 0.44 (t, J = 7.7 Hz, 2H), 0.39 - -0.24 (m, 27H).

[0125] [Synthesis Example 2: Synthesis of Compound 1-B] Compound 1-A-3 (1.1 g) was dissolved in decane (10 g). Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and dimethoxysilyltrimethyl silicate (1.0 g) were added, and the mixture was stirred at 50°C for 2 hours. By removing the solvent under reduced pressure, 1.3 g of compound 1-B was obtained.

[0126]

[0127] 1 H NMR (500 MHz, CDCl3) δ 3.72 - 3.21 (m, 15H), 1.58 - 1.04 (m, 54H), 0.85 - 0.43(m, 4H), 0.12 - -0.15 (m, 27H).

[0128] [Synthesis Example 3: Synthesis of Compound 1-C] Compound 1-C was obtained according to the method described in International Publication No. 2023 / 017830. In the formula, "18" is the average value.

[0129]

[0130] [Synthesis Example 4: Synthesis of Compound 1-D] Compound 1-D was obtained according to the method described in Japanese Patent Publication No. 2017-201010. The average value of the number of repeating units n was 17.

[0131]

[0132] [Synthesis Example 5: Synthesis of Compound 1-E] Compound 1-E was synthesized using the method described in International Publication No. 2024 / 262627. The average value of n was 7.

[0133]

[0134] [Second Compound] The reagents for compounds 2-A to 2-C listed below were purchased and used as the second compound. • Compound 2-A: Methyl silicate (The average value of the number of repeating units n was 6.)

[0135]

[0136] Compound 2-B: Hexamethoxydisiloxane

[0137]

[0138] Compound 2-C: 2,6-dioxa-3,5-disilaheptane,3,3,5,5-tetramethoxy-

[0139]

[0140] [Preparation of Compositions] The first and second compounds listed in Table 1, described later, were added to a polypropylene container equipped with a stirrer and a thermometer. The amount of each compound added was adjusted so that the mass ratio of the amount of the first compound to the amount of the second compound added was the ratio shown in the "Composition Ratio" column of Table 1. Next, heptane in an amount 39 times the total amount of the first and second compounds was added to the polypropylene container, and the mixture was stirred at 25°C for 30 minutes to obtain the compositions (surface treatment agents) of Examples 1 to 11. Furthermore, the compositions (surface treatment agents) of Examples 12 and 13 were obtained using the same procedure as above, except that the second compound was not added and only the first compound listed in Table 1, described later, was added.

[0141] [Manufacturing of Articles] A glass substrate (water contact angle: 5 degrees, 100 mm x 100 mm) whose surface was cleaned by plasma treatment was prepared as the base material. The composition for each example was applied to the plasma-treated surface of the glass substrate by spray coating. When applying the composition, the amount of composition applied was adjusted so that the amount of composition applied relative to the surface area of ​​the glass substrate was 0.074 mL / cm². Next, the formed coating film of the composition was heat-treated at 140°C for 30 minutes. After that, it was kept in a constant temperature and humidity chamber at 90°C and 60% RH for 24 hours. The surface of the formed coating film was wiped with a paper cloth soaked in ethanol to obtain an article having a glass substrate and a surface layer formed on the surface of the glass substrate using the composition for each example.

[0142] [Evaluation] <Water Contact Angle> Approximately 2 μL of distilled water was dropped onto the surface layer of each example's article, and the initial water contact angle (°) was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The arithmetic mean of the contact angle measurements taken at five locations on the surface layer was taken, and the resulting average value was defined as the water contact angle. The 2θ method was used to calculate the water contact angle. A larger initial water contact angle indicates better water repellency of the surface layer. Based on the obtained initial water contact angles, the initial water contact angles of the surface layers of each example's article were evaluated according to the evaluation criteria below. The evaluation results for each example are shown in the table below.

[0143] (Evaluation Criteria) ○: Initial water contact angle is 105° or higher ×: Initial water contact angle is less than 105°

[0144] <Sweat Resistance> Samples for sweat resistance evaluation were prepared by cutting each example's item into 1 cm x 1 cm squares. 0.79 parts by mass of disodium hydrogen phosphate / dodecahedra, 0.79 parts by mass of sodium chloride, 0.5 parts by mass of acetic acid, and 97.92 parts by mass of deionized water were mixed until homogeneous to prepare an artificial sweat solution (pH 8.0 at 25°C). The obtained samples were immersed in the artificial sweat solution at 20°C for 100 hours. After that, the samples were removed from the artificial sweat solution, washed with ethanol, dried, and the water contact angle was measured according to the procedure described above. The difference in water contact angle before and after the immersion test was calculated by subtracting the water contact angle measured after the immersion test in the artificial sweat solution from the initial water contact angle. A smaller calculated difference indicates less reduction in water repellency due to the immersion test using alkaline artificial sweat solution, and thus better sweat resistance. Based on the difference in water contact angle before and after the immersion test, the sweat resistance of the surface layer of each example's item was evaluated according to the evaluation criteria below. The evaluation results for each example are shown in the table below.

[0145] (Evaluation criteria for sweat resistance) A: Decrease in water contact angle before and after immersion test is 3° or less. B: Decrease in water contact angle before and after immersion test is greater than 3° and 5° or less. C: Decrease in water contact angle before and after immersion test is greater than 5° and 10° or less. D: Decrease in water contact angle before and after immersion test is greater than 10°.

[0146] The following table shows the types and compositional ratios of the first and second compounds contained in each example composition, as well as the evaluation results.

[0147]

[0148] As shown in Table 1, it was confirmed that a surface layer with excellent sweat resistance can be formed by using a composition containing the first compound and the second compound (Examples 1 to 11).

[0149] The articles of this disclosure have excellent sweat resistance. The articles of this disclosure include, as examples, optical articles, touch panels, anti-reflective films, anti-reflective glass, and SiO2, which are used as parts of the following products. 2 It is useful as processed glass, tempered glass, sapphire glass, quartz substrates, mold metals, etc. Products: Car navigation systems, mobile phones, digital cameras, digital video cameras, personal digital assistants (PDAs), portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment (endoscopes, etc.), photocopiers, personal computers (PCs), liquid crystal displays, organic EL displays, plasma displays, touch panel displays, protective films, anti-reflective films, anti-reflective glass, nanoimprint templates, molds, etc.

[0150] This application claims priority based on Japanese Patent Application No. 2025-055938, filed on 28 March 2025, and incorporates all of its disclosures herein.

[0151] 10 Substrate with undercoat 12 Substrate 14 Undercoat 20 Article 22 Surface layer

Claims

1. A composition comprising: a first compound selected from the group consisting of a compound represented by formula (1-1) and a compound represented by formula (1-2); and a second compound selected from the group consisting of a compound represented by formula (2-1), a compound represented by formula (2-2), and polysilazane. A a1 -L a1 -Q a1 -(T a1 ) ma1 (1-1) (T a1 ) ma1 -Q a1 -L a2 -Q a1 -(T a1 ) ma1 (1-2) Provided that, A a1 is an alkyl group, or a group that contains one or more selected from Si, Ge and Sn and does not have a reactive silyl group, L a1 is a chain group, L a2 is a chain group, Q a1 is a single bond or a (ma1+1)-valent group, T a1 is a group containing a reactive silyl group, and ma1 is an integer of 1 or more. (R C1 O) 3 -Si-Q C1 -Si-(OR C1 ) 3 (2-1) R C1 O-(Si(OR C1 ) 2 -O) nc1 -Si-(OR C1 ) 3 (2-2) Provided that, Q C1 is -O- or -CH 2 -, each R C1 is independently an alkyl group, and nc1 is a number of 2 or more.

2. The composition according to claim 1, wherein the second compound comprises the compound represented by formula (2-1).

3. The first compound includes the compound represented by formula (1-1), and A in formula (1-1) a1 The composition according to claim 1, wherein the group is represented by formula (A1), formula (A2), or formula (A3). a21 3 M-(Q) a11 ) za1 - (R aSi ) za2 - (A1) However, R a21 Each of these independently comprises a hydrocarbon group, or R b21 3 M-R b22 - and R b21 Each of these independently comprises a hydrocarbon group, or R c21 3 M-R c22 - and R c21 Each of these independently comprises a hydrocarbon group, or R d21 3 M-R d22 - and R d21 Each of these independently comprises a hydrocarbon group, or R e21 3 M-R e22 - and R e21 Each of these is independently a hydrocarbon group, and R b22 , R c22 , R d22 , R e22 Each is independently an oxygen atom or an alkylene group having 1 to 6 carbon atoms, R a24 Each of these independently comprises a hydrocarbon group or R b21 3 M-R b22 - and ta11 is an integer from 1 to 5, R a25 Each of these independently comprises a hydrocarbon group or R b21 3 M-R b22 - and M is Si, and Q a11 is -O-, -C(=O)-, or an alkylene group having 1 to 6 carbon atoms, za1 is 0 or 1, za2 is 0 or 1, R aSi This is a group represented by the following formula (RSi): -(SiR a41 2 O) sa41 -SiR a41 2 - (RSi) However, R a41 Each of these is independently a hydrocarbon group, and sa41 is a number greater than or equal to 0.

4. The first compound includes the compound represented by formula (1-1), and L in formula (1-1) a1 The composition according to claim 1, wherein it contains a group represented by formula (LD). - (CR a13 2 ) sa4 - (LD) However, R a13 Each of these is independently a hydrocarbon group which may have a hydrogen atom or an ether bond between carbon atoms, and sa4 is an integer from 1 to 200.

5. T in the above formula (1-1) and the above formula (1-2) a1 is a group represented by the following formula (TA), the composition according to claim 1. * a1 -[Si(R a1 ) 2 -Q a3 ra1 -Si(R a1 ) 3    (TA) Provided that, R a1 are each independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group, and at least one of R a1 is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and Q a3 is an oxygen atom, or -CR a2 2 -, wherein R a2 is a hydrogen atom or a hydrocarbon group, ra1 is an integer of 0 to 3, and * a1 is the bonding position to Q a1 .​ 6. The composition according to claim 1, wherein the mass ratio of the content of the first compound to the content of the second compound is 70 / 30 to 99.9 / 0.

1.

7. A surface treatment agent comprising the composition described in any one of claims 1 to 6.

8. The surface treatment agent according to claim 7, further comprising a liquid medium.

9. The surface treatment agent according to claim 7, which is an antifouling coating agent or a waterproof coating agent.

10. The surface treatment agent according to claim 8, which is an antifouling coating agent or a waterproof coating agent.

11. An article having a surface layer formed using the surface treatment agent described in claim 7 on the surface of a substrate.

12. The article according to claim 11, which is an optical component.

13. The article according to claim 11, wherein the surface layer is provided on the surface of a component that constitutes the surface of a touch panel that is touched by a finger.

14. A method for manufacturing an article, comprising forming a surface layer by a dry coating method using the surface treatment agent described in claim 7.

15. A method for manufacturing an article, comprising forming a surface layer by a dry coating method using the surface treatment agent described in claim 8.

16. A method for manufacturing an article, comprising forming a surface layer by a wet coating method using the surface treatment agent described in claim 8.