Articles and displays including an Anti-reflective coating and methods for fabricating an article

Abstract

An article includes a glass substrate including a main surface and an anti-reflective coating on the glass substrate. The anti-reflective coating includes a first layer, a second layer, a third layer, a fourth layer, and a fifth layer. The first layer includes silicon dioxide (SiO2) on the main surface of the glass substrate. The second layer includes niobium pentoxide (Nb2O5) on the first layer. The third layer includes SiO2 on the second layer. The fourth layer includes Nb2O5 on the third layer. The fifth layer includes SiO2 on the fourth layer.

Description

Attorney Docket No.: SP25-010ARTICLES AND DISPLAYS INCLUDING AN ANTI-REFLECTIVE COATING AND METHODS FOR FABRICATING AN ARTICLEBACKGROUNDCross-Reference To Related Applications

[0001] This application claims the benefit of priority under 35 U.S.C. § 119 of U.S. Provisional Application No. 63 / 900171 filed on October 16, 2025 and U.S. Provisional Application No. 63 / 777203 filed on March 25, 2025, the contents of each of which are relied upon and incorporated herein by reference in their entireties.Field

[0002] The present disclosure relates generally to articles including an anti-reflective coating. More particularly, it relates to articles and display devices including a glass substrate and a multi-layer anti -reflective coating on the glass substrate.Technical Background

[0003] As displays (e.g., organic light emitting diode (OUED) displays) are penetrating into information technology (IT) displays (e.g., mobile phones, notebook computers, tablets, monitors, etc.) and televisions (TVs), display picture quality and lifespan have become increasingly important. Typical OUED displays may use circular polarizers to reduce reflection from ambient light for high contrast. The circular polarizers reduce reflection but also reduce brightness by more than about 50 percent, which increases the power consumption of the OLED displays and consequently shortens the lifespan of the OLED displays. To overcome this issue, some OLED display manufacturers are introducing Pol-less or color filter on encapsulation (COE) technology, but the reflection from the ambient light on Pol-less or COE OLED displays is still higher than the level from OLED displays utilizing circular polarizers.SUMMARY

[0004] Some embodiments of the present disclosure relate to an article. The article includes a glass substrate including a main surface and an anti -reflective coating on the glass substrate. The anti-reflective coating includes a first layer, a second layer, a third layer, a fourth layer,iAttorney Docket No.: SP25-010 and a fifth layer. The first layer includes silicon dioxide (Si O2) on the main surface of the glass substrate. The second layer includes niobium pentoxide (NbzOs) on the first layer. The third layer includes Si O2 on the second layer. The fourth layer includes bt^Os on the third layer. The fifth layer includes SiCh on the fourth layer.

[0005] Yet other embodiments of the present disclosure relate to an article. The article includes a glass substrate including a main surface and an anti-reflective coating on the glass substrate. The anti-reflective coating includes a first layer, a second layer, a third layer, a fourth layer, and a fifth layer. The first layer includes silicon dioxide ( Si O2) on the main surface of the glass substrate. The second layer includes silicon nitride (SiN) on the first layer. The third layer includes SiC>2 on the second layer. The fourth layer includes SiN on the third layer. The fifth layer includes S i O2 on the fourth layer.

[0006] Yet other embodiments of the present disclosure relate to a method for fabricating an article. The method includes applying a protective layer on a first main surface of an alkaline earth boro-aluminosilicate glass substrate. The method includes cleaning a second main surface of the glass substrate. The method includes pre-etching the second main surface of the glass substrate to increase a surface hydrophilicity of the second main surface. The method includes chemically roughening the second main surface of the glass substrate with an etchant including potassium additives (K-additives) to texture the second main surface. The method includes removing the protective layer on the first main surface of the glass substrate. The method includes cleaning the first main surface and the second main surface of the glass substrate.

[0007] The anti-reflective coatings described herein includes a minimum total number of layers (e.g., 5 layer stack) to achieve ultra-low reflectivity (e.g., Rx equal to about 0.1 percent) over the visible light spectrum (e.g., about 380 nanometers to about 780 nanometers). In some examples, the layers include alternating S i O2 and Nb20s applied using a thin film deposition process (e.g., reactive magnetron sputtering). In some examples, the layers include alternating SiCh and SiN applied using a thin film deposition process (e.g., meta-mode drum sputtering). The 5 layer anti-reflective coatings are suitable for larger mass produced articles (e.g., diagonal size up to and greater than 85 inches), since less layers reduce the complexity of the tuning of the coating process and improve the yield during production as well as enabling fine tuning of the uniformity, which is very challenging for large article fabrication.

[0008] The anti-glare texture described herein has a relatively low PPD140 while DOI is equal to about 96.5 indicating high uniformity of the concavo-convex morphology of the texture. The etchant for the chemical roughening may be formulated using citric acid or other weakAttorney Docket No.: SP25-010 acids, or commonly used strong mineral acids (e.g., HC1, HNO3), which enhances the process safety and / or eases operations in the manufacturing plant.

[0009] Combining the anti-glare texture with the anti-reflective coatings described herein has a lower reflectance and higher transmittance than an anti-glare / anti-reflective fdm, which may be laminated onto a glass substrate. In addition, the anti -glare texture combined with the anti-reflective coatings has an improved anti-scratch performance compared to a laminated anti-glare / anti-reflective film.

[0010] Additional features and advantages will be set forth in the detailed description which follows, and in part will be readily apparent to those skilled in the art from that description or recognized by practicing the embodiments as described herein, including the detailed description which follows, the claims, as well as the appended drawings.

[0011] It is to be understood that both the foregoing general description and the following detailed description are merely exemplary and are intended to provide an overview or framework to understanding the nature and character of the claims. The accompanying drawings are included to provide a further understanding and are incorporated in and constitute a part of this specification. The drawings illustrate one or more embodiment(s), and together with the description explain principles and operation of the various embodiments.BRIEF DESCRIPTION OF THE DRAWINGS

[0012] FIG. 1 A is a simplified cross-sectional view of an exemplary article including an anti-reflective coating;

[0013] FIG. IB is a simplified cross-sectional view of an exemplary article including an anti-reflective coating and an anti -glare texture;

[0014] FIGS. 2A-2D are microscopy images of exemplary anti -glare textures;

[0015] FIGS. 3A and 3B are charts illustrating transmittance and reflectance for exemplary anti-reflective coatings on exemplary glass substrates;

[0016] FIGS. 4A-4C are flow diagrams of an exemplary method for fabricating an article;

[0017] FIG. 5A is a simplified cross-sectional view of an exemplary display including an anti-reflective coating;

[0018] FIG. 5B is a simplified cross-sectional view of an exemplary display including an anti-reflective coating and an anti-glare texture;

[0019] FIG. 6 is a simplified cross-sectional view of an exemplary article including an anti-reflective coating;Attorney Docket No.: SP25-010

[0020] FIG. 7 is a chart illustrating reflectance at different angles of incidence for the exemplary anti-reflective coating of FIG. 6;

[0021] FIG. 8 is a simplified cross-sectional view of an exemplary article including an anti-reflective coating;

[0022] FIG. 9 is a chart illustrating reflectance at different angles of incidence for the exemplary anti-reflective coating of FIG. 8; and

[0023] FIG. 10 is a flow diagram of an exemplary method for fabricating an article.DETAILED DESCRIPTION

[0024] Reference will now be made in detail to embodiments of the present disclosure, examples of which are illustrated in the accompanying drawings. Whenever possible, the same reference numerals will be used throughout the drawings to refer to the same or like parts. However, this disclosure may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.

[0025] Ranges can be expressed herein as from “about” one particular value, and / or to “about” another particular value. When such a range is expressed, another embodiment includes from the one particular value and / or to the other particular value. Similarly, when values are expressed as approximations, by use of the antecedent “about,” it will be understood that the particular value forms another embodiment. It will be further understood that the endpoints of each of the ranges are significant both in relation to the other endpoint, and independently of the other endpoint.

[0026] Directional terms as used herein - for example up, down, right, left, front, back, top, bottom, vertical, horizontal - are made only with reference to the figures as drawn and are not intended to imply absolute orientation.

[0027] Unless otherwise expressly stated, it is in no way intended that any method set forth herein be construed as requiring that its steps be performed in a specific order, nor that with any apparatus, specific orientations be required. Accordingly, where a method claim does not actually recite an order to be followed by its steps, or that any apparatus claim does not actually recite an order or orientation to individual components, or it is not otherwise specifically stated in the claims or description that the steps are to be limited to a specific order, or that a specific order or orientation to components of an apparatus is not recited, it is in no way intended that an order or orientation be inferred, in any respect. This holds for any possible non-express basis for interpretation, including: matters of logic with respect to arrangement of steps,Attorney Docket No.: SP25-010 operational flow, order of components, or orientation of components; plain meaning derived from grammatical organization or punctuation, and; the number or type of embodiments described in the specification.

[0028] As used herein, the singular forms "a," "an," and "the" include plural references unless the context clearly dictates otherwise. Thus, for example, reference to “a” component includes aspects having two or more such components, unless the context clearly indicates otherwise.

[0029] Television manufacturers may use anti-glare and / or anti-reflective films laminated onto a substrate (e.g., glass substrate) to improve picture quality, but further improvements are desired since anti-glare and anti-reflective films have the disadvantage of less durability and lower scratch resistance. Accordingly, the anti -glare textures and anti -reflective coatings on glass substrates described herein provide enhanced rigidity for displays (e.g., OLED displays), higher durability, and improved scratch resistance compared to anti-glare and anti-reflective films laminated onto a glass substrate.

[0030] Referring now to FIG. 1A, a simplified cross-sectional view of an exemplary article 100a is depicted. Article 100a includes a glass substrate 102a and an anti -reflective coating 108. The glass substrate 102a includes a main surface (e.g., top surface). The anti-reflective coating 108 is on (e.g., directly contacts) the glass substrate 102a. The anti-reflective coating 108 includes a first layer 110, a second layer 112, a third layer 114, a fourth layer 116, and a fifth layer 118. The first layer 110 includes (or consists of) silicon dioxide (SiC ) on (e.g., directly contacting) the main surface of the glass substrate 102a. The second layer 112 includes (or consists of) niobium pentoxide (bfeOs) on (e.g., directly contacting) the first layer 110. The third layer 114 includes (or consists of) SiCh on (e.g., directly contacting) the second layer 112. The fourth layer 116 includes (or consists of) bft^Os on (e.g., directly contacting) the third layer 114. The fifth layer 118 includes (or consists of) SiCh on (e.g., directly contacting) the fourth layer 116. While anti-reflective coating 108 includes (or consists of) 5 layers, in some examples, the anti-reflective coating 108 may include more than 5 layers, such as 6, 7, 8, 9, 10 or more layers.

[0031] In certain exemplary embodiments, the substrate 102a may include a glass material, such as aluminosilicate, alkali-aluminosilicate, borosilicate, alkali-borosilicate, aluminoboro silicate, alkali-aluminoborosilicate, soda lime, or other suitable glasses. Nonlimiting examples of commercially available glasses suitable for use as a glass substrate 102a include Astra™, EAGLE XG®, Lotus™, Willow®, Iris™, and Gorilla® glasses from Coming Incorporated. The glass substrate 102a may have a thickness 103 between the mainAttorney Docket No.: SP25-010 surfaces (e.g., between the top and bottom surfaces) within a range, for example, from about 0.1 millimeters to about 2 millimeters. The glass substrate 102a may have a refractive index within a range, for example, between about 1.45 and about 2.4, such as within a range between about 1.5 and about 1.54 at about 550 nanometers. The glass substrate 102amay have a transmittance greater than about 90 percent. In some embodiments, the glass substrate 102a may be a cover glass for a device, such as a display (e.g., OLED display).

[0032] In certain exemplary embodiments, the glass substrate 102a includes an alkaline earth boro-aluminosilicate glass substrate (e.g., Astra™ glass substrate) including a density at about 20 degrees Celsius of about 2.52 grams per cubic centimeter plus or minus about 0.025 grams per cubic centimeter, a Young’s modulus of about 81 gigapascals plus or minus about 0.8 gigapascals, a shear modulus of about 33 gigapascals plus or minus about 0.3 gigapascals, and a Poisson’s ratio of about 0.23 plus or minus about 0.002. The alkaline earth boro-aluminosilicate glass substrate may also include a coefficient of thermal expansion of 34xl0'7per degree Celsius. The alkaline earth boro-aluminosilicate glass substrate may also include a refractive index (at about 589.3 nanometers) of about 1.522, a stress optical coefficient of about 29.2, and a transmittance (from about 400 to about 800 nanometers) of greater than about 90 percent.

[0033] In some examples, the first layer 110 includes a thickness 111 (e.g., between the top and bottom surfaces) of about 25 nanometers plus or minus about 0.25 nanometers. The second layer 112 includes a thickness 113 (e.g., between the top and bottom surfaces) of about 11.6 nanometers plus or minus about 0.12 nanometers. The third layer 114 includes a thickness 115 (e.g., between the top and bottom surfaces) of about 35.3 nanometers plus or minus about 0.18 nanometers. The fourth layer 116 includes a thickness 117 (e.g., between the top and bottom surfaces) of about 104.8 nanometers plus or minus about 0.52 nanometers. The fifth layer 118 includes a thickness 119 (e.g., between the top and bottom surfaces) of about 84.9 nanometers plus or minus about 0.42 nanometers.

[0034] In some examples, due to the specified configuration of the anti-reflective coating 108 (e.g., number of layers, materials, thicknesses), the anti-reflective coating 108 includes a reflectance (380-740 nm) of about 0.13 percent plus or minus about 0.02 percent (measured herein according to ISO 13837), a transmittance (380-740 nm) of about 95.2 percent plus or minus about 0.08 percent (measured herein according to ISO 9050), and a color difference metric AEab (8-60°) within a range between about 4.6 and about 6.7 (measured herein according to CIE 1976).Attorney Docket No.: SP25-010

[0035] FIG. IB is a simplified cross-sectional view of an exemplary article 100b. Article 100b is similar to article 100a previously described with reference to FIG. 1A, except that article 100b includes a glass substrate 102b including an anti -glare texture 130 in addition to anti -reflective coating 108. In this example, the glass substrate 102b may include an alkaline earth boro-aluminosilicate glass substrate (e.g., Astra™ glass substrate) as previously described. The main (e.g., top surface) of the glass substrate 102b includes the anti-glare texture 130 having a maximum thickness 104, such that the first layer 110 of the anti-reflective coating 108 is on (e.g., directly contacting) the anti-glare texture 130. In certain exemplary embodiments as further described below with reference to FIGS. 2A-2D, the anti -glare texture 130 includes a concavo-convex morphology. The anti-glare texture includes, for example, a gloss 60 within a range between about 5 gloss units and about 120 gloss units (measured herein according to ASTM D523), a distinctiveness of image (DOI) within a range between about 0 and about 99 (measured herein according to ASTM D5767), a transmittance haze (Tx-haze) within a range between about 5 percent and about 95 percent (measured herein according to ASTM E430), and an average roughness (Ra) within a range between about 0.05 micrometers and about 0.5 micrometers.

[0036] By combining the anti-glare texture 130 with the anti-reflective coating 108, article 100b of FIG. IB may have improved characteristics compared to article 100a of FIG. 1A. For example, the combination may include a reflectance within a range between about 0.01 percent and about 0.2 percent, a transmittance within a range between about 94.5 percent and about 95.5 percent, a AEab (8-60°) within a range between about 4.5 and 6, and a Tx-haze within a range between about 10 percent and about 92 percent.

[0037] FIG. 2A is a 500X microscopy image of an exemplary anti-glare texture 200a (e.g., 130 of FIG. IB). Anti -glare texture 200a is formed by roughening a surface of a glass substrate (e.g., 102b of FIG. IB) to form a concavo-convex morphology including concave features 210 and convex features 212. The roughened surface consists of numerous polyhedrons including a lateral dimension within a range between about 5 micrometers and about 15 micrometers. In this example, the anti -glare texture 200a includes, for example, a gloss 60 of about 11.5 gloss units, a DOI of about 71.4, a Tx-haze of about 91.4 percent, and a Ra of about 0.235 micrometers.

[0038] As will be further described below with reference to FIGS. 4A-4C, anti-glare texture 200a is formed via a chemical roughening process. In this example, the etchant for the chemical roughening process may include about 17.8 weight percent (wt.%) of ammonium fluoride salts (e.g., NH4HF2), about 28.5 wt.% of acid (e.g., citric acid), about 8.9 wt.% of a first viscosityAttorney Docket No.: SP25-010 modifier (e.g., BaSCfi), about 10.3 wt.% of a second viscosity modifier (e.g., glycerol), about 30.3 wt.% ofl O (e.g., deionized water), and about 4.1 wt.% of K-additives (e.g., KF). The etchant may be applied to the glass substrate at about 20 degrees Celsius for about 4 minutes to form anti-glare texture 200a.

[0039] FIG. 2B is a 500X microscopy image of an exemplary anti-glare texture 200b. Antiglare texture 200b is formed via the chemical roughening process as previously described with reference to FIG. 2A plus an additional chemical polishing process. In this example, the antiglare texture 200a of FIG. 2A is chemically polished to further form anti-glare texture 200b including a concavo-convex morphology including concave features 220 and convex features 222. In this example, the anti -glare texture 200b includes a gloss 60 of about 17 gloss units, a DOI of about 5.8, a Tx-haze of about 49.2 percent, and an Ra of about 0.283 micrometers.

[0040] As will be further described below with reference to FIGS. 4A-4C, anti-glare texture 200b is formed via a chemical roughening process as previously described with reference to FIG. 2A followed by a chemical polishing process. In this example, the etchant for the chemical polishing process may include about 5 wt.% of HF, about 5 wt.% of HC1, and deionized water. The etchant may be applied to the glass substrate at about 24 degrees Celsius for about 10 minutes to form anti -glare texture 200b.

[0041] FIG. 2C is a 500X microscopy image of an exemplary anti -glare texture 200c. Antiglare texture 200c includes a concavo-convex morphology including concave features 230 and convex features 232. In this example, the anti-glare texture 200c includes a gloss 60 of about 16.9 gloss units, a DOI of about 1.2, a Tx-haze of about 56 percent, and a Ra of about 0.379 micrometers.

[0042] As will be further described below with reference to FIGS. 4A-4C, anti-glare texture 200c is formed via a chemical roughening process followed by a chemical polishing process. In this example, the etchant for the chemical roughening process may include about 18.2 wt.% of ammonium fluoride salts (e.g., NH4HF2), about 26.5 wt.% of acid (e.g., citric acid), about 7.8 wt.% of a first viscosity modifier (e.g., BaSCfi), about 11.1 wt.% of a second viscosity modifier (e.g., glycerol), about 32.7 wt.% of H2O (e.g., deionized water), and about 3.6 wt.% of K-additives (e.g., KF). The etchant may be applied to the glass substrate at about 15 degrees Celsius for about 2 minutes to form a roughened surface. The roughened surface is then chemically polished to form the anti -glare texture 200c of FIG. 2C. In this example, the etchant for the chemical polishing process may include about 10 wt.% of HF, about 10 wt.% of HC1, and deionized water. The etchant may be applied to the roughened glass substrate at about 24 degrees Celsius for about 10 minutes to form anti -glare texture 200c.Attorney Docket No.: SP25-010

[0043] FIG. 2D is a 500X microscopy image of an exemplary anti-glare texture 200d. Antiglare texture 200d includes a concavo-convex morphology including concave features 240 and convex features 242. In this example, the anti-glare texture 200d includes a gloss 60 of about 38.0 gloss units, a DOI of about 96.5, a Tx-haze of about 25.5 percent, a Ra of about 0.075 micrometers, and a PDDuo of about 2.5 percent.

[0044] As will be further described below with reference to FIGS. 4A-4C, anti-glare texture 200d is formed via a chemical roughening process followed by a chemical polishing process. In this example, the etchant for the chemical roughening process may include about 16.1 wt.% of ammonium fluoride salts (e.g., NH4HF2), about 28.2 wt.% of acid (e.g., citric acid), about 8.1 wt.% of a first viscosity modifier (e.g., BaSOr), about 8.1 wt.% of a second viscosity modifier (e.g., glycerol), about 35.5 wt.% of H2O (e.g., deionized water), and about 4.0 wt.% of K-additives (e.g., KF). The etchant may be applied to the glass substrate at about 17 degrees Celsius for about 2 minutes to form a roughened surface. The roughened surface is then chemically polished to form the anti -glare texture 200d of FIG. 2D. In this example, the etchant for the chemical polishing process may include about 10 wt.% of HF, about 10 wt.% of HC1, and deionized water. The etchant may be applied to the glass substrate at about 24 degrees Celsius for about 7 minutes to form anti-glare texture 200d.

[0045] FIG. 3 A is a chart 300a illustrating transmittance and reflectance for an anti -reflective coating on an exemplary glass substrate. In this example, the glass substrate includes an alkaline earth boro-aluminosilicate glass substrate (e.g., Astra™ glass substrate) and the anti-reflective coating includes a 5 layer anti -reflective coating 108 as previously described and illustrated with reference to FIG. 1A. As illustrated by chart 300a, the anti-reflective coating includes a transmittance of greater than about 99 percent for wavelengths between about 410 nanometers and about 670 nanometers and a reflectance of less than about 0.3 percent for wavelengths between about 410 nanometers and about 640 nanometers. In this example, the anti-reflective coating on the alkaline earth boro-aluminosilicate glass substrate includes a reflectance (380-740 nm) of about 0.13 percent plus or minus about 0.02 percent, a transmittance (380-740 nm) of about 95.2 percent plus or minus about 0.08 percent, and a Eab (8-60°) within a range between about 4.6 and about 4.7.

[0046] In some embodiments, the anti-reflective coating on the alkaline earth boro-aluminosilicate glass substrate in combination with the anti-glare texture may include a total transmittance (Tx) within a range between about 96.4 and about 96.6, a Tx-haze within a range between about 22.7 and about 25.2, a gloss 20 within a range between about 29.34 and about 34.64, a gloss 60 within a range between about 30.26 and about 35.71, a gloss 85 within a rangeAttorney Docket No.: SP25-010 between about 86.47 and about 87.44, a DOI within a range between about 97.09 and about 97.49, a specular reflectance (Rspec) within a range between about 26.38 and about 30.63, a sparkle- 134-DIM within a range between about 1.928 and about 2.131, and a sparkle- 190-DIM within a range between about 2.698 and about 2.982. In some embodiments, the anti-reflective coating on the alkaline earth boro-aluminosilicate glass substrate in combination with the antiglare texture may include Rx color values of L* within a range between about 1.34 and about 2.42, a* within a range between about -0.14 and about 0.56, b* within a range between about -4.63 and about -2.67 (measured herein according to ASTM El 164), and Rx within a range between about 0.15 and about 0.27.

[0047] FIG. 3B is a chart 300b illustrating transmittance and reflectance for an anti-reflective coating on an exemplary glass substrate. In this example, the glass substrate includes an aluminosilicate glass substrate (e.g., Gorilla® glass substrate) and the anti-reflective coating includes a 5 layer anti -reflective coating 108 as previously described and illustrated with reference to FIG. 1A. As illustrated by chart 300b, the anti-reflective coating includes a transmittance of greater than about 99 percent for wavelengths between about 410 nanometers and about 670 nanometers and a reflectance of less than about 0.3 percent for wavelengths between about 410 nanometers and about 640 nanometers. In this example, the reflectance of the anti-reflective coating on the aluminosilicate glass substrate is about 0.11 percent plus or minus about 0.02 percent, the transmittance is about 95.7 percent plus or minus about 0.08 percent, and the Eab (8 to 60°) is within a range between about 6.6 and about 6.7.

[0048] FIGS. 4A-4C are flow diagrams of an exemplary method 400 for fabricating an article, such as article 100b of FIG. IB. As illustrated in FIG. 4A at 402, method 400 includes applying a protective layer on a first main surface (e.g., bottom surface of substrate 102a of FIG. 1A) of an alkaline earth boro-aluminosilicate glass substrate (e.g., Astra™ glass substrate). The protective layer protects the first main surface of the glass substrate from chemical roughening and polishing. In some examples, the protective layer may include an acid-resistive plastic film (e.g., polyethylene film) or an acid-resistive ink layer.

[0049] At 404, method 400 includes cleaning a second main surface (e.g., top surface of substrate 102a of FIG. 1A) of the glass substrate. In some examples, the cleaning may include an about 5 minute rinse in deionized (DI) water followed by an about 15 minute soak in an about 4 wt.% of detergent (e.g., SemiClean) at about 60 degrees Celsius with ultrasound irradiation. Following the soak, the glass substrate may be rinsed again with distilled water for about 15 minutes with the ultrasound irradiation and given a final flushing under running DIAttorney Docket No.: SP25-010 water before drying at about 60 degrees Celsius. The glass substrate may then be cooled down before proceeding to the next step.

[0050] At 406, method 400 includes pre-etching the second main surface of the glass substrate to increase a surface hydrophilicity of the second main surface. In certain exemplary embodiments, pre-etching the second main surface of the glass substrate may comprise preetching with an etchant comprising hydrofluoric acid (HF) within a range between about 1 wt.% and about 20 wt.% and deionized (DI) water. In some examples, the etchant may further include a buffer comprising at least one of a mineral acid, an organic acid, ammonium fluoride (NH4F), or ammonium bifluoride (NH4HF2). The buffer, while optional, may be used to boost and stabilize the material removal rate (e.g., etch rate). For example, the glass substrate may first be dipped in DI water for about 1 to 2 seconds and then immediately immersed in a HFbased etching solution. The purpose of pre-etching is to improve the surface hydrophilicity and cleanness. The etching solution may be a diluted HF solution, a buffered HF solution, and / or a mixture of HF and another acid. After pre-etching, the glass substrate may be thoroughly rinsed under running DI water.

[0051] At 408, method 400 includes chemically roughening the second main surface of the glass substrate with an etchant comprising potassium additives (K-additives) to texture the second main surface. In certain exemplary embodiments, chemically roughening the second main surface of the glass substrate may comprise chemically roughening with an etchant comprising ammonium fluoride salts within a range between about 10 wt.% and 35 wt.%, acids within a range between about 20 wt.% and about 35 wt.%, viscosity modifiers within a range between about 10 wt.% and about 30 wt.%, deionized (DI) water within a range between about 25 wt.% and about 40 wt.%, and potassium additives (K-additives) within a range between about 0.1 wt.% and about 10 wt.%. In some examples, the ammonium fluoride salts may include one of NH4F and NH4HF2, or their combination. The acid may include either a concentrated acid solution / liquid (e.g., 37% HC1, 67% HNO3, and acetic acid) or solid-form acid (e.g., citric acid and malic acid). The viscosity modifiers may include substances that can thicken the etching solution but are inert to HF, such as the powder formed BaSC>4, CaF2, or polyols, such as glycerol, starch, etc. The K-additives may include precursors to release K+in the etchant. A well-formed etchant should exhibit a slurry like appearance. The glass substrate may be agitated as soon as the glass substrate contacts the etchant. In some examples, the velocity of the etchant on the glass substrate may be within a range between about 5 centimeters per second to about 20 centimeters per second. During the chemical roughening, the temperature of the etchant may be controlled to be within a range between about 12 degreesAttorney Docket No.: SP25-010 Celsius and about 22 degrees Celsius. The duration of the chemical roughening may be within a range between about 1 minute and about 5 minutes. With chemical roughening complete, the glass substrate is withdrawn from the etchant and may then be dipped in DI water and rinsed under running DI water to thoroughly remove acid residues and masking salts.

[0052] At 410, method 400 includes removing the protective layer on the first main surface of the glass substrate. In some examples, the protective layer may be peeled off. At 412, method 400 includes cleaning the first main surface and the second main surface of the glass substrate. In some examples, the cleaning may include an about 5 minute rinse in DI water followed by an about 15 minute soak in an about 4 wt.% of detergent (e.g., SemiClean) at about 60 degrees Celsius with ultrasound irradiation. Following the soak, the glass substrate may be rinsed again with distilled water for about 15 minutes with ultrasound irradiation and given a final flushing under running DI water before drying at about 60 degrees Celsius.

[0053] As illustrated in FIG. 4B at 414, method 400 may further include after chemically roughening the second main surface of the glass substrate and prior to removing the protective layer, chemically polishing the second main surface of the glass substrate to further shape the texture. In certain exemplary embodiments, chemically polishing the second main surface of the glass substrate comprises chemically polishing with an etchant comprising hydrofluoric acid (HF) within a range between about 1 wt.% and about 20 wt.% and DI water. In some examples, the etchant may further include a buffer including at least one of a mineral acid, an organic acid, ammonium fluoride (HNfiF), or ammonium bifluoride (NH4HF2). The buffer, while optional, may be used to boost and stabilize the material removal rate (e.g., etch rate). The chemical polishing further develops the texture formed in the chemical roughening step. The glass substrate may be immersed in the etchant for chemical polishing. The etchant may be either a HF-based solution or an alkali-based solution. The duration of the chemical polishing is a significant factor for the final anti-glare attributes. In some examples, the duration of the chemical polishing may be within a range between about 1 minute and about 15 minutes.

[0054] As illustrated in FIG. 4C at 416, method 400 may further include depositing a first layer (e.g., 110 of FIG. IB) comprising silicon dioxide (SiCh) directly on the textured second main surface (e.g., 130) of the glass substrate (e.g., 102b). At 418, method 400 may further include depositing a second layer (e.g., 112) comprising niobium pentoxide (bfeOs) directly on the first layer. At 420, method 400 may further include depositing a third layer (e.g., 114) comprising SiCh directly on the second layer. At 422, method 400 may further include depositing a fourth layer (e.g., 116) comprising Nb2Os directly on the third layer. At 424,Attorney Docket No.: SP25-010 method 400 may further include depositing a fifth layer (e.g., 118) comprising SiCh directly on the fourth layer. In some examples, each of the first, second, third, fourth, and fifth layers may be deposited by a reactive magnetron sputtering process or another suitable thin film deposition technique.

[0055] In certain exemplary embodiments, depositing the first layer may comprise depositing the first layer to a thickness of, for example, about 25 nanometers plus or minus about 0.25 nanometers. Depositing the second layer may comprise depositing the second layer to a thickness of, for example, about 11.6 nanometers plus or minus about 0.12 nanometers. Depositing the third layer may comprise depositing the third layer to a thickness of, for example, about 35.3 nanometers plus or minus about 0.18 nanometers. Depositing the fourth layer may comprise depositing the fourth layer to a thickness of, for example, about 104.8 nanometers plus or minus about 0.52 nanometers. Depositing the fifth layer may comprise depositing the fifth layer to a thickness of, for example, about 84.9 nanometers plus or minus about 0.42 nanometers.

[0056] FIG. 5 A is a simplified cross-sectional view of an exemplary display 500a. Display 500a may include a television, a monitor, or a device screen (e.g., for mobile phone, tablet, notebook computer, etc.). Display 500a includes a light emitting layer 502, a glass substrate 102a (e.g., an aluminosilicate glass substrate or an alkaline earth boro-aluminosilicate glass substrate), and an anti-reflective coating 108. The glass substrate 102a is over (e.g., directly contacting) the light emitting layer. In some examples, the light emitting layer may include an organic light emitting diode (OLED) layer, such as a quantum dot (QD) OLED layer or a red, green, blue (RGB) OLED layer.

[0057] The anti-reflective coating 108 is on (e.g., directly contacting) a main surface (e.g., top surface) of the glass substrate 102a. As previously described with reference to FIG. 1, anti-reflective coating 108 includes 5 layers. The first layer 110 includes silicon dioxide (SiO2) on (e.g., directly contacting) the main surface of the glass substrate 102a. The second layer 112 includes niobium pentoxide (bfeOs) on (e.g., directly contacting) the first layer 110. The third layer 114 includes SiCh on (e.g., directly contacting) the second layer 112. The fourth layer 116 includes bft^Os on (e.g., directly contacting) the third layer 114. The fifth layer 118 includes SiC>2 on (e.g., directly contacting) the fourth layer 116.

[0058] FIG. 5B is a simplified cross-sectional view of an exemplary display 500b. Display 500b is similar to display 500a of FIG. 5A, except that display 500b further includes an antiglare texture 130 as previously described with reference to FIG. IB. As previously described, glass substrate 102b (e.g., an alkaline earth boro-aluminosilicate glass substrate) includes aAttorney Docket No.: SP25-010 main surface (e.g., top surface) including the anti-glare texture 130, which includes a concavo-convex morphology. The anti-reflective coating 108 is on (e.g., directly contacting) the main surface of the glass substrate 102b, such that the first layer 110 is on (e.g., directly contacts) the anti -glare texture 130.

[0059] FIG. 6 is a simplified cross-sectional view of an exemplary article 600. Article 600 includes a glass substrate 102a and an anti-reflective coating 608. The glass substrate 102a includes a main surface (e.g., top surface). The anti-reflective coating 608 is on (e.g., directly contacts) the glass substrate 102a. The anti-reflective coating 608 includes a first layer 610, a second layer 612, a third layer 614, a fourth layer 616, and a fifth layer 618. The first layer 610 includes (or consists of) silicon dioxide (SiCh) on (e.g., directly contacting) the main surface of the glass substrate 102a. The second layer 612 includes (or consists of) silicon nitride (SiN) on (e.g., directly contacting) the first layer 610. The third layer 614 includes (or consists of) SiCh on (e.g., directly contacting) the second layer 612. The fourth layer 616 includes (or consists of) SiN on (e.g., directly contacting) the third layer 614. The fifth layer 618 includes (or consists of) SiCh on (e.g., directly contacting) the fourth layer 616. While anti-reflective coating 608 includes (or consists of) 5 layers, in some examples, the anti-reflective coating 608 may include more than 5 layers, such as 6, 7, 8, 9, 10 or more layers.

[0060] In certain exemplary embodiments, the substrate 102a may include a glass material as previously described with reference to FIG. 1A, such as aluminosilicate, alkalialuminosilicate, borosilicate, alkali-borosilicate, aluminoborosilicate, alkali-aluminoboro silicate, soda lime, or other suitable glasses. The glass substrate 102a may have a thickness 103 between the main surfaces (e.g., between the top and bottom surfaces) within a range, for example, from about 0.1 millimeters to about 2 millimeters. In some embodiments, the glass substrate 102a may be a cover glass for a device, such as a display (e.g., OLED display).

[0061] In some examples, the first layer 610 includes a thickness 611 (e.g., between the top and bottom surfaces) of about 23 nanometers plus or minus about 0.23 nanometers. The second layer 612 includes a thickness 613 (e.g., between the top and bottom surfaces) of about 20 nanometers plus or minus about 0.2 nanometers. The third layer 614 includes a thickness 615 (e.g., between the top and bottom surfaces) of about 23 nanometers plus or minus about 0.23 nanometers. The fourth layer 616 includes a thickness 617 (e.g., between the top and bottom surfaces) of about 105 nanometers plus or minus about 1.05 nanometers. The fifth layer 618 includes a thickness 619 (e.g., between the top and bottom surfaces) of about 82 nanometers plus or minus about 0.8 nanometers.Attorney Docket No.: SP25-010

[0062] In some examples, due to the specified configuration of the anti-reflective coating 608 (e.g., number of layers, materials, thicknesses), the anti-reflective coating 608 on glass substrate 102a includes a reflectance (380-740 nm) between about 0.36 percent and about 0.37 percent (measured herein according to ISO 13837), a transmittance (380-740 nm) between about 93.00 percent and about 93.06 percent (measured herein according to ISO 9050), and a color difference metric Eab (8-60°) within a range between about 6.68 and about 7.20 (measured herein according to CIE 1976). In some embodiments, the anti -reflective coating may include Rx color values of a* within a range between about 0.38 and about 0.50 and b* within a range between about -3.89 and about -2.39 (measured herein according to ASTM El 164.

[0063] In some examples, in place of anti -reflective coating 108, anti-reflective coating 608 may be fabricated on a glass substrate 102b including an anti -glare texture 130 as previously described and illustrated with reference to FIG. IB. Anti-reflective coating 608 may also be used in place of anti-reflective coating 108 in display 500a and / or display 500b previously described and illustrated with reference to FIGS. 5A and 5B, respectively.

[0064] FIG. 7 is a chart 700 illustrating reflectance at different angles of incidence (e.g., 8, 20, 40, and 60 degrees) for an exemplary anti-reflective coating. In this example, the glass substrate includes an alkaline earth boro-aluminosilicate glass substrate (e.g., Astra™ glass substrate) and the anti-reflective coating includes a 5 layer anti-reflective coating 608 as previously described and illustrated with reference to FIG. 6. As illustrated by chart 700, the anti -reflective coating includes a reflectance of less than about 0.5 percent for wavelengths between about 430 nanometers and about 640 nanometers at angles of incidence up to about 20 degrees (e.g., as indicated by traces 1-side R8 Avg and 1-side R20 Avg). The anti-reflective coating includes a reflectance less than about 1.0 percent for wavelengths between about 430 nanometers and about 610 nanometers at angles of incidence up to about 40 degrees (e.g., as indicated by trace 1-side R40 Avg). The anti -reflective coating includes a reflectance less than about 5.0 percent for wavelengths between about 430 nanometers and about 600 nanometers at angles of incidence up to about 60 degrees (e.g., as indicated by trace 1-side R60 Avg).

[0065] FIG. 8 is a simplified cross-sectional view of an exemplary article 800. Article 800 includes a glass substrate 102a and an anti-reflective coating 808. The glass substrate 102a includes a main surface (e.g., top surface). The anti-reflective coating 808 is on (e.g., directly contacts) the glass substrate 102a. The anti-reflective coating 808 includes a first layer 810, a second layer 812, a third layer 814, a fourth layer 816, and a fifth layer 818. The first layer 810 includes (or consists of) silicon dioxide (SiCh) on (e.g., directly contacting) the mainAttorney Docket No.: SP25-010 surface of the glass substrate 102a. The second layer 812 includes (or consists of) silicon nitride (SiN) on (e.g., directly contacting) the first layer 810. The third layer 814 includes (or consists of) SiCh on (e.g., directly contacting) the second layer 812. The fourth layer 816 includes (or consists of) SiN on (e.g., directly contacting) the third layer 814. The fifth layer 818 includes (or consists of) SiCh on (e.g., directly contacting) the fourth layer 816. While anti-reflective coating 808 includes (or consists of) 5 layers, in some examples, the anti-reflective coating 808 may include more than 5 layers, such as 6, 7, 8, 9, 10 or more layers.

[0066] In certain exemplary embodiments, the substrate 102a may include a glass material as previously described with reference to FIG. 1A, such as aluminosilicate, alkalialuminosilicate, borosilicate, alkali-borosilicate, aluminoborosilicate, alkali-aluminoboro silicate, soda lime, or other suitable glasses. The glass substrate 102a may have a thickness 103 between the main surfaces (e.g., between the top and bottom surfaces) within a range, for example, from about 0.1 millimeters to about 2 millimeters. In some embodiments, the glass substrate 102a may be a cover glass for a device, such as a display (e.g., OLED display).

[0067] In some examples, the first layer 810 includes a thickness 811 (e.g., between the top and bottom surfaces) of about 25 nanometers plus or minus about 0.25 nanometers. The second layer 812 includes a thickness 813 (e.g., between the top and bottom surfaces) of about 16 nanometers plus or minus about 0.16 nanometers. The third layer 814 includes a thickness 815 (e.g., between the top and bottom surfaces) of about 39 nanometers plus or minus about 0.39 nanometers. The fourth layer 816 includes a thickness 817 (e.g., between the top and bottom surfaces) of about 136 nanometers plus or minus about 1.36 nanometers. The fifth layer 818 includes a thickness 819 (e.g., between the top and bottom surfaces) of about 90 nanometers plus or minus about 0.9 nanometers.

[0068] In some examples, due to the specified configuration of the anti-reflective coating 808 (e.g., number of layers, materials, thicknesses), the anti-reflective coating 808 on glass substrate 102a includes a reflectance (380-740 nm) between about 0.84 percent and about 0.87 percent (measured herein according to ISO 13837), a transmittance (380-740 nm) between about 94.88 percent and about 94.96 percent (measured herein according to ISO 9050), and a color difference metric Eab (8-60°) within a range between about 2.87 and about 2.95 (measured herein according to CIE 1976). In some embodiments, the anti -reflective coating may include Rx color values of a* within a range between about -5.05 and about -4.80 and b* within a range between about -0.90 and about 0.69 (measured herein according to ASTMAttorney Docket No.: SP25-010

[0069] In some examples, in place of anti -reflective coating 108, anti-reflective coating 808 may be fabricated on a glass substrate 102b including an anti -glare texture 130 as previously described and illustrated with reference to FIG. IB. Anti-reflective coating 808 may also be used in place of anti-reflective coating 108 in display 500a and / or display 500b previously described and illustrated with reference to FIGS. 5A and 5B, respectively.

[0070] FIG. 9 is a chart 900 illustrating reflectance at different angles of incidence (e.g., 8, 20, 40, and 60 degrees) for an exemplary anti-reflective coating. In this example, the glass substrate includes an alkaline earth boro-aluminosilicate glass substrate (e.g., Astra™ glass substrate) and the anti-reflective coating includes a 5 layer anti-reflective coating 808 as previously described and illustrated with reference to FIG. 8. As illustrated by chart 900, the anti -reflective coating includes a reflectance of less than about 1.3 percent for wavelengths between about 400 nanometers and about 650 nanometers at angles of incidence up to about 20 degrees (e.g., as indicated by traces 1-side R8 Avg and 1-side R20 Avg). The anti-reflective coating includes a reflectance less than about 1.5 percent for wavelengths between about 400 nanometers and about 650 nanometers at angles of incidence up to about 40 degrees (e.g., as indicated by trace 1-side R40 Avg). The anti -reflective coating includes a reflectance less than about 5.0 percent for wavelengths between about 400 nanometers and about 650 nanometers at angles of incidence up to about 60 degrees (e.g., as indicated by trace 1-side R60 Avg).

[0071] FIG. 10 is a flow diagram of an exemplary method 1000 for fabricating an article, such as article 600 of FIG. 6 or article 800 of FIG. 8. At 1002, method 1000 includes depositing a first layer (e.g., 610 of FIG. 6 or 810 of FIG. 8) comprising silicon dioxide (SiCh) on a glass substrate. In certain exemplary embodiments, the first layer may be deposited directly on a main surface of a bare glass substrate (e.g., 102a). In some embodiments, the first layer may be deposited directly on a textured second main surface (e.g., 130) of a glass substrate (e.g., 102b). At 1004, method 1000 includes depositing a second layer (e.g., 612 of FIG. 6 or 812 of FIG. 8) comprising silicon nitride (SiN) directly on the first layer. At 1006, method 1000 includes depositing athird layer (e.g., 614 of FIG. 6 or 814 of FIG. 8) comprising SiCh directly on the second layer. At 1008, method 1000 includes depositing a fourth layer (e.g., 616 of FIG.6 or 816 of FIG. 8) comprising SiN directly on the third layer. At 1010, method 1000 includes depositing a fifth layer (e.g., 618 of FIG. 6 or 818 of FIG. 8) comprising SiCh directly on the fourth layer. In some examples, each of the first, second, third, fourth, and fifth layers may be deposited by a meta-mode drum sputtering process or another suitable thin film deposition technique.Attorney Docket No.: SP25-010

[0072] In certain exemplary embodiments to fabricate article 600 of FIG. 6, depositing the first layer may comprise depositing the first layer to a thickness of, for example, about 23 nanometers plus or minus about 0.23 nanometers. Depositing the second layer may comprise depositing the second layer to a thickness of, for example, about 20 nanometers plus or minus about 0.2 nanometers. Depositing the third layer may comprise depositing the third layer to a thickness of, for example, about 23 nanometers plus or minus about 0.23 nanometers. Depositing the fourth layer may comprise depositing the fourth layer to a thickness of, for example, about 105 nanometers plus or minus about 1.05 nanometers. Depositing the fifth layer may comprise depositing the fifth layer to a thickness of, for example, about 82 nanometers plus or minus about 0.8 nanometers.

[0073] In certain exemplary embodiments to fabricate article 800 of FIG. 8, depositing the first layer may comprise depositing the first layer to a thickness of, for example, about 25 nanometers plus or minus about 0.25 nanometers. Depositing the second layer may comprise depositing the second layer to a thickness of, for example, about 16 nanometers plus or minus about 0.16 nanometers. Depositing the third layer may comprise depositing the third layer to a thickness of, for example, about 39 nanometers plus or minus about 0.39 nanometers. Depositing the fourth layer may comprise depositing the fourth layer to a thickness of, for example, about 136 nanometers plus or minus about 1.36 nanometers. Depositing the fifth layer may comprise depositing the fifth layer to a thickness of, for example, about 90 nanometers plus or minus about 0.9 nanometers.

[0074] Anti-reflective coating 108 (FIGS. 1A, IB, 5A, 5B), anti-reflective coating 600 (FIG.6), and anti-reflective coating 800 (FIG. 8) each have improved scratch resistance compared to anti -reflective films laminated onto a glass substrate. Based on an anti-scratch reliability test using the Phire protocol CS-8 abrasion test, the CS-8 values of anti-reflective coatings 600 and 800 are less than about 0.2 percent both before and after thermal treatment. The CS-8 value of anti-reflective coating 108 before thermal treatment is about 1.6 percent and after thermal treatment is about 1.2 percent.

[0075] It will be apparent to those skilled in the art that various modifications and variations can be made to embodiments of the present disclosure without departing from the spirit and scope of the disclosure. Thus, it is intended that the present disclosure cover such modifications and variations provided they come within the scope of the appended claims and their equivalents.

Claims

Attorney Docket No.: SP25-010 What is claimed is:

1. An article comprising:a glass substrate comprising amain surface; andan anti -reflective coating on the glass substrate, the anti -reflective coating comprising:a first layer comprising silicon dioxide (S i O2) on the main surface of the glass substrate;a second layer comprising niobium pentoxide (M^Os) on the first layer; a third layer comprising SiCh on the second layer;a fourth layer comprising bfeOs on the third layer; anda fifth layer comprising S i O2 on the fourth layer.

2. The article of claim 1, wherein the glass substrate comprises an alkaline earth boro-aluminosilicate glass substrate.

3. The article of claim 2, wherein the main surface of the glass substrate comprises an anti-glare texture comprising a concavo-convex morphology.

4. The article of claim 3, wherein the anti-glare texture comprises a gloss 60 within a range between about 5 gloss units and about 120 gloss units, a distinctiveness of image (DOI) within a range between about 0 and about 99, a transmittance haze (Tx-haze) within a range between about 5 percent and about 95 percent, and an average roughness (Ra) within a range between about 0.05 micrometers and about 0.5 micrometers.

5. The article of claim 1, wherein:the first layer comprises a thickness of about 25 nanometers plus or minus about 0.25 nanometers,the second layer comprises a thickness of about 11.6 nanometers plus or minus about 0.12 nanometers,the third layer comprises a thickness of about 35.3 nanometers plus or minus about 0.18 nanometers,the fourth layer comprises a thickness of about 104.8 nanometers plus or minus about 0.52 nanometers, andAttorney Docket No.: SP25-010 the fifth layer comprises a thickness of about 84.9 nanometers plus or minus about 0.42 nanometers.

6. The article of claim 1, wherein the anti -reflective coating comprises a transmittance of greater than about 99 percent for wavelengths between about 410 nanometers and about 670 nanometers and a reflectance of less than about 0.3 percent for wavelengths between about 410 nanometers and about 640 nanometers.

7. An article comprising:a glass substrate comprising amain surface; andan anti -reflective coating on the glass substrate, the anti -reflective coating comprising:a first layer comprising silicon dioxide (S i O2) on the main surface of the glass substrate;a second layer comprising silicon nitride (SiN) on the first layer; a third layer comprising S i O2 on the second layer;a fourth layer comprising SiN on the third layer; anda fifth layer comprising S i O2 on the fourth layer.

8. The article of claim 7, wherein the glass substrate comprises an alkaline earth boro-aluminosilicate glass substrate.

9. The article of claim 7, wherein the glass substrate comprises a refractive index within a range between about 1.5 and about 1.54 at about 550 nanometers.

10. The article of claim 7, wherein:the first layer comprises a thickness of about 23 nanometers plus or minus about 0.23 nanometers,the second layer comprises a thickness of about 20 nanometers plus or minus about 0.2 nanometers,the third layer comprises a thickness of about 23 nanometers plus or minus about 0.23 nanometers,the fourth layer comprises a thickness of about 105 nanometers plus or minus about 1.05 nanometers, andAttorney Docket No.: SP25-010 the fifth layer comprises a thickness of about 82 nanometers plus or minus about 0.8 nanometers.

11. The article of claim 10, wherein the anti -reflective coating comprises a transmittance between about 93.00 percent and about 93.06 percent for wavelengths between about 380 nanometers and about 740 nanometers and a reflectance between about 0.36 percent and about 0.37 percent for wavelengths between about 380 nanometers and about 740 nanometers.

12. The article of claim 7, wherein:the first layer comprises a thickness of about 25 nanometers plus or minus about 0.25 nanometers,the second layer comprises a thickness of about 16 nanometers plus or minus about 0.16 nanometers,the third layer comprises a thickness of about 39 nanometers plus or minus about 0.39 nanometers,the fourth layer comprises a thickness of about 136 nanometers plus or minus about 1.36 nanometers, andthe fifth layer comprises a thickness of about 90 nanometers plus or minus about 0.9 nanometers.

13. The article of claim 12, wherein the anti -reflective coating comprises a transmittance between about 94.88 percent and about 94.96 percent for wavelengths between about 380 nanometers and about 740 nanometers and a reflectance between about 0.84 percent and about 0.87 percent for wavelengths between about 380 nanometers and about 740 nanometers.

14. A method for fabricating an article, the method comprising:applying a protective layer on a first main surface of an alkaline earth boro-aluminosilicate glass substrate;cleaning a second main surface of the glass substrate;pre-etching the second main surface of the glass substrate to increase a surface hydrophilicity of the second main surface;chemically roughening the second main surface of the glass substrate with an etchant comprising potassium additives (K-additives) to texture the second main surface;removing the protective layer on the first main surface of the glass substrate; andAttorney Docket No.: SP25-010 cleaning the first main surface and the second main surface of the glass substrate.

15. The method of claim 14, further comprising:after chemically roughening the second main surface of the glass substrate and prior to removing the protective layer, chemically polishing the second main surface of the glass substrate to further shape the texture.

16. The method of claim 15, wherein chemically polishing the second main surface of the glass substrate comprises chemically polishing with an etchant comprising hydrofluoric acid (HF) within a range between about 1 weight percent (wt.%) and about 20 wt.% and deionized (DI) water.

17. The method of claim 14, further comprising:depositing a first layer comprising silicon dioxide ( S i O2) directly on the textured second main surface of the glass substrate;depositing a second layer comprising niobium pentoxide (NbzOs) directly on the first layer;depositing a third layer comprising SiCh directly on the second layer;depositing a fourth layer comprising bft^Os directly on the third layer; and depositing a fifth layer comprising S i O2 directly on the fourth layer.

18. The method of claim 17,wherein depositing the first layer comprises depositing the first layer to a thickness of about 25 nanometers plus or minus about 0.25 nanometers,wherein depositing the second layer comprises depositing the second layer to a thickness of about 11.6 nanometers plus or minus about 0.12 nanometers,wherein depositing the third layer comprises depositing the third layer to a thickness of about 35.3 nanometers plus or minus about 0.18 nanometers,wherein depositing the fourth layer comprises depositing the fourth layer to a thickness of about 104.8 nanometers plus or minus about 0.52 nanometers, andwherein depositing the fifth layer comprises depositing the fifth layer to a thickness of about 84.9 nanometers plus or minus about 0.42 nanometers.Attorney Docket No.: SP25-010 19. The method of claim 14, wherein pre-etching the second main surface of the glass substrate comprises pre-etching with an etchant comprising hydrofluoric acid (HF) within a range between about 1 weight percent (wt.%) and about 20 wt.% and deionized (DI) water.

20. The method of claim 14, wherein chemically roughening the second main surface of the glass substrate comprises chemically roughening with an etchant comprising ammonium fluoride salts within a range between about 10 weight percent (wt.%) and 35 wt.%, acids within a range between about 20 wt.% and about 35 wt.%, viscosity modifiers within a range between about 10 wt.% and about 30 wt.%, deionized (DI) water within a range between about 25 wt.% and about 40 wt.%, and potassium additives (K-additives) within a range between about 0.1 wt.% and about 10 wt.%.

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