Color display processing method for nanoscale micro-engraved pattern

Abstract

The present invention relates to the technical field of nanoscale micro-engraving, and specifically disclosed is a color display processing method for a nanoscale micro-engraved pattern. Transparent glass is selected as a substrate material; and on the transparent glass, physical vapor deposition technology or chemical vapor deposition technology is used to alternately deposit a plurality of layers of thin film materials having different refractive indexes, so as to form a color mask. By precisely controlling the thickness and deposition sequence of each layer of film, the desired color effect is obtained. Micro-engraving pattern design software is used to design a corresponding black-and-white pattern according to user requirements. After the design is completed, the pattern is converted into a format that can be recognized by a nanoscale micro-engraving device, and is imported into the device. The method of the present invention can realize fine combination of a color mask and a black-and-white pattern, so that a nanoscale micro-engraved projection stone presents richer and more unique visual effects, meeting the market demand for high-quality and personalized artistic products.

Description

A method for color display processing of nano-micro-engraved patterns Technical Field

[0001] This invention relates to the field of nano-micro-carving technology, specifically to a method for color display processing of nano-micro-carved patterns. Background Technology

[0002] Nanoscale engraving technology involves black and white engraving on traditional electroplated metal glass sheets, meaning it can only produce a black and white effect. This limits its performance in applications requiring color and fails to meet people's pursuit of rich colors. Due to the lack of color variation, its visual impact and expressiveness are relatively weak when expressing complex patterns and information. For situations where different shades of gray are needed to distinguish layers and details, black and white technology may not be able to clearly and accurately represent them, resulting in unclear information transmission. In fields requiring colored signage or decoration, such as artistic creation and high-end decoration, the application of black and white technology is greatly limited.

[0003] Later, with market demand, colored nanofilm and colored glass lenses appeared on the market. However, colored glass lenses had drawbacks such as high customization costs (custom colored lenses require individual mold making and dyeing, resulting in high costs) and poor sales, making mass customization impossible. While nanofilm compensated for the color deficiency, the translucency of the film resulted in unclear projections, requiring specific dim lighting and distances for clear viewing. Furthermore, the development process involved many uncertainties, making it easy for the product's color to deviate from expectations.

[0004] Therefore, a method for color display processing of nano-micro-carved patterns has become an urgent problem to be solved. Technical solutions

[0005] The technical problem this invention aims to solve is to provide a color display processing method for nano-micro-engraved patterns. This method involves further engraving black and white patterns onto glass sheets with partially blurred colors using a photolithography machine. This overcomes the limitations of film and glass sheets, combining "dynamic (laser engraving of black and white patterns) and static (mining glass sheets with different colored background patterns as the engraving substrate)" approaches. It eliminates the need to create molds for every custom-designed colored pattern glass sheet; customers only need to select the colored pattern glass sheet for black and white customization. This significantly reduces process costs and improves efficiency, while also meeting market demands.

[0006] To solve the above-mentioned technical problems, the technical solution provided by the present invention is: a color display processing method for nano-micro-engraved patterns, comprising the following steps:

[0007] S1. Transparent glass is selected as the substrate material because of its good light transmittance and chemical stability, making it suitable as a substrate for multilayer thin film deposition.

[0008] S2. On transparent glass, multiple layers of thin film materials with different refractive indices, such as silicon dioxide (SiO₂) and titanium dioxide (TiO₂), are alternately deposited using physical vapor deposition (PVD) or chemical vapor deposition (CVD) techniques to form a color mask. By precisely controlling the thickness and deposition sequence of each film layer, the desired color effect can be obtained.

[0009] S3. Using micro-engraving pattern design software, design a corresponding black and white pattern according to the user's requirements. After the design is completed, convert the pattern into a format that the nano-micro-engraving equipment can recognize and import it into the equipment. This step ensures a seamless connection between pattern design and processing.

[0010] High-precision nano-micro-engraving equipment, such as laser direct writing or electron beam lithography, is used to engrave on a color mask. During the engraving process, by adjusting micro-engraving parameters such as laser power, scanning speed, and pulse frequency, black and white patterns are precisely engraved while ensuring the integrity of the color mask. This results in a final product that has both fine pattern details and retains the color effect of the underlying layer.

[0011] Furthermore, before step S1, the transparent glass substrate material is pretreated: the transparent glass is first immersed in hydrofluoric acid solution to remove the oxide layer and impurities on the glass surface, then rinsed with deionized water, and then dried in an oven to ensure that the glass surface is clean and dry.

[0012] Furthermore, after completing step S3, the micro-carved product undergoes post-processing: the product is placed in a vacuum annealing furnace and annealed at 300°C for 1 hour to eliminate the internal stress generated during the carving process. Beneficial effects

[0013] The advantages of this invention compared to existing technologies are as follows: The method of this invention enables a precise combination of color masks and black-and-white patterns, resulting in richer and more unique visual effects for the nano-micro-carved projection stones, meeting market demand for high-quality, personalized art products. This invention improves the precision and clarity of the patterns, enhancing the artistic expression and collectible value of the projection stones. The optimized process of this invention increases production efficiency, reduces production costs, and facilitates large-scale production and widespread application. Embodiments of the present invention

[0014] In the description of this invention, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "inner", "outer", "vertical", "circumferential", etc., indicating orientation or positional relationships, are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this invention.

[0015] In the description of this invention, "first feature" and "second feature" may include one or more of the indicated features. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined with "first" and "second" may explicitly or implicitly include one or more of the indicated features.

[0016] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0017] The following is a further detailed description of the color display processing method for nano-micro-carved patterns according to the present invention.

[0018] A method for color display processing of nano-micro-engraved patterns includes the following steps:

[0019] S1. Select transparent glass as the substrate material. The selected transparent glass must have high optical transmittance, with a transmittance of no less than 90% in the visible light band, and extremely low levels of bubbles and impurities within the glass. The number of bubbles larger than 1μm in diameter per unit area should not exceed 5, and the number of impurity particles should not exceed 10. This ensures the stability of subsequent processing and the display effect of the pattern. When selecting transparent glass, the above standards are strictly followed. High optical transmittance ensures that light can pass through fully during the subsequent color display process, reducing light loss, while extremely low bubble and impurity content avoids processing abnormalities caused by defects during micro-engraving and thin film deposition, providing a good foundation for the entire processing.

[0020] S2. Multiple thin film materials with different refractive indices are alternately deposited on transparent glass to form a colored mask. Alternating deposition of the thin films is achieved using either physical vapor deposition (PVD) or chemical vapor deposition (CVD). During the deposition process, environmental conditions are strictly controlled. For PVD, the vacuum level must be maintained between 10⁻⁵ Pa and 10⁻⁶ Pa; for CVD, the reaction chamber pressure is controlled between 100 Pa and 500 Pa to ensure the deposition environment is free from external interference and to guarantee film quality. Advanced in-situ monitoring technologies, such as ellipsometry, are used to monitor the changes in optical parameters during the deposition of each film layer in real time, thereby precisely adjusting the deposition time and controlling the thickness deviation of each layer within ±0.5 nm to ensure the accuracy of the color effect. The thin film materials are silicon dioxide and titanium dioxide. Before use, the purity of the silicon dioxide and titanium dioxide raw materials is tested. The purity of silicon dioxide must reach 99.999% or higher, and the purity of titanium dioxide must reach 99.99% or higher to prevent impurities in the raw materials from affecting the optical properties of the thin film and the final color display effect. By precisely controlling the thickness and deposition sequence of silicon dioxide and titanium dioxide thin films with different refractive indices, they are combined to form specific optical structures. Based on the principles of light interference and diffraction, selective transmission or reflection of different colors of light is achieved, thus presenting a rich color effect.

[0021] S3. Using micro-engraving pattern design software, design corresponding black and white patterns according to user requirements. This software has intelligent optimization functions, which can automatically optimize the lines of the designed pattern based on the performance parameters of the nano-micro-engraving equipment, reducing breakpoints and defects during the engraving process and improving engraving efficiency and quality. The completed pattern is then converted into a format recognizable by the nano-micro-engraving equipment and imported. The nano-micro-engraving equipment uses laser direct writing or electron beam lithography, and requires regular precision calibration. After every 100 engraving tasks, the positioning and focusing accuracy of the equipment is tested and calibrated using a standard template to ensure that the engraving accuracy remains within ±5nm. During the engraving process, micro-engraving parameters, including laser power, scanning speed, and pulse frequency, are adjusted. Simultaneously, the temperature data of the color mask surface is collected in real time. A closed-loop control system automatically adjusts the laser power to control the temperature change of the color mask surface within ±2℃, preventing changes in the film material properties due to excessive temperature and affecting the engraving quality. By precisely controlling these micro-carving parameters, black and white patterns that meet the design requirements can be accurately engraved on a color mask, achieving nanometer-level micro-carving precision.

[0022] Pre- and post-processing:

[0023] Before step S1, the transparent glass substrate material is pretreated. First, the glass is immersed in a 5% hydrofluoric acid solution for 5 minutes to remove the oxide layer and impurities on the glass surface. Then, it is rinsed 5 times with deionized water and dried in an oven at 120°C for 2 hours to ensure that the glass surface is clean and dry, thereby improving the adhesion of subsequent film deposition.

[0024] After completing step S3, the micro-carved product undergoes post-processing. The product is placed in a vacuum annealing furnace and annealed at 300℃ for 1 hour to eliminate internal stress generated during the carving process, improve the stability and durability of the pattern, and prevent problems such as pattern deformation and fading during long-term use.

[0025] Processing Environment Control: The entire processing is conducted in a cleanroom that meets ISO Class 5 standards. The concentration of airborne particles larger than 0.5μm does not exceed 3520 particles / m³, preventing dust and other impurities from contaminating the processing and ensuring the consistency and stability of product quality. This high level of cleanliness effectively prevents impurities from adhering to the substrate material, film, or engraved pattern surface, avoiding any adverse effects on processing accuracy and product performance.

[0026] The specific implementation process of the color display processing method for nano-micro-engraved patterns of the present invention is as follows:

[0027] 1. Select a high-quality glass substrate measuring 50mm x 50mm and 2mm thick, such as high-purity borosilicate glass. Before use, perform a rigorous and meticulous cleaning process on the glass substrate to remove any dust, oil, or other impurities, ensuring the cleanliness of the glass surface. Then, perform a pretreatment operation, such as chemical etching, to microscopically roughen the glass surface, enhancing the adhesion between the subsequently deposited thin film and the glass substrate, providing a good foundation for the smooth progress of subsequent processes.

[0028] 2. Using a Physical Vapor Deposition (PVD) system (a Chemical Vapor Deposition (CVD) system can also be used, with a similar operating principle), thin film deposition is performed according to a specific sequence. Taking the formation of a specific blue hue as an example, by controlling the gas flow control system of the equipment, 99.99% pure silane (SiH₄) gas is introduced at a rate of 10 sccm per minute (standard cubic centimeters per minute), while the equipment power is set to 150W and the deposition time is set to 20 minutes. A silicon dioxide (SiO₂) film with a thickness of 50 nanometers as measured by an ellipsometry is successfully deposited on the glass substrate. Next, the organic precursor gas for titanium is introduced, with a flow rate controlled at 8 sccm and the equipment power adjusted to 200W. Deposition is carried out for 30 minutes, resulting in a titanium dioxide (TiO₂) film with a thickness of approximately 80 nanometers. Finally, silane gas is introduced again at a flow rate of 10 sccm and a power of 150W, and deposition is carried out for 25 minutes, covering the substrate with a silicon dioxide (SiO₂) film with a thickness of 60 nanometers. Three-layer thin film is precisely deposited to produce an ideal blue effect color mask.

[0029] 3. Using professional micro-engraving pattern design software, design a black and white pattern such as a "blooming flower" according to actual needs. During the design process, fully consider factors such as the complexity of the lines, the clarity of details, and the color coordination with the color mask to ensure the best visual effect of the final product. After the design is completed, convert the pattern file to a format supported by the nano-micro-engraving equipment to ensure that the pattern can be successfully imported into the equipment.

[0030] 4. Import the converted pattern file into a high-precision nano-micro-engraving device, such as a laser direct-writing device. Before engraving, fine-tune the device parameters. Set the laser power to 20 milliwatts, ensuring effective engraving of the color mask without excessive damage to its underlying structure; set the scanning speed to 10 millimeters per second to ensure the accuracy and smoothness of the engraved lines; adjust the pulse frequency to 1000 Hz to ensure the laser pulses accurately target the color mask surface, engraving a clear black and white pattern. During the engraving process, closely monitor the device's operating status and the pattern engraving effect to ensure a smooth process.

[0031] 5. After engraving, the resulting nano-micro-carved projection stone is placed in a specialized cleaning solution made of ethanol and deionized water in a 1:1 ratio and ultrasonically cleaned for 10 minutes to remove debris and residual impurities generated during the engraving process, ensuring effective cleaning while avoiding damage to the pattern. After cleaning, the projection stone undergoes quality inspection. Microscopic examination is used to observe the clarity of the pattern, edge integrity, and the fusion effect with the color mask to ensure the product quality meets expected standards. If any defects are found, appropriate repairs are carried out promptly.

[0032] The present invention and its embodiments have been described above. This description is not restrictive. If a person skilled in the art is inspired by this description and designs a similar structure and embodiment without departing from the spirit of the present invention, such design should fall within the protection scope of the present invention.

Claims

1. A method for color display processing of nano-micro-engraved patterns, characterized in that: Includes the following steps, S1. Select transparent glass as the base material; S2. Multiple layers of thin film materials with different refractive indices are alternately deposited on transparent glass to form a colored mask; S3. Design black and white micro-carving content and perform micro-carving using a carving machine.

2. The color display processing method for nano-micro-engraved patterns according to claim 1, characterized in that: In step S2, multiple layers of thin film materials with different refractive indices are alternately deposited by physical vapor deposition or chemical vapor deposition to form a color mask.

3. The color display processing method for nano-micro-engraved patterns according to claim 2, characterized in that: In step S2, the thickness and deposition order of each film layer are controlled to obtain the desired color effect.

4. The color display processing method for nano-micro-engraved patterns according to claim 3, characterized in that: The thin film material includes silicon dioxide and titanium dioxide.

5. The color display processing method for nano-micro-engraved patterns according to claim 1, characterized in that: In step S3, micro-carving pattern design software is used to design a corresponding black and white pattern according to the user's requirements; the designed pattern is converted into a format that can be recognized by the nano-micro-carving device and imported.

6. The color display processing method for nano-micro-engraved patterns according to claim 1, characterized in that: The nano-micro-carving equipment uses laser direct writing lithography equipment or electron beam lithography equipment.

7. The color display processing method for nano-micro-engraved patterns according to claim 6, characterized in that: During the engraving process of the nano-micro-engraving equipment, the micro-engraving parameters are adjusted to engrave a black and white pattern on a colored mask; the micro-engraving parameters include laser power, scanning speed, and pulse frequency.

8. The color display processing method for nano-micro-engraved patterns according to claim 1, characterized in that: Before step S1, the transparent glass substrate material is pretreated: the transparent glass is first soaked in hydrofluoric acid solution to remove the oxide layer and impurities on the glass surface, then rinsed with deionized water, and then dried in an oven to ensure that the glass surface is clean and dry.

9. The color display processing method for nano-micro-engraved patterns according to claim 1, characterized in that: After completing step S3, post-process the micro-carved product: place the product in a vacuum annealing furnace and anneal it at a temperature of 250-350℃ for 1-1.5 hours to eliminate the internal stress generated during the carving process.