Inkjet adaptive planarization compositions

Abstract

The present application relates to inkjet adaptive planarization compositions and using thereof. The compositions may exhibit at least one of properties as an advanced material or as a high-performance material. The compositions may be used in the nanotechnology process to make semiconductor device / display device application, for example semiconductor chip, or a liquid crystal, quantum dot, OLED display fabricated on a substrate controlled by semiconductors.

Description

[0001] Foreignfiling_text_P25-178-SEC-W001_20260414

[0002] - 1 -

[0003] Inkjet adaptive planarization compositions

[0004] FIELD OF THE INVENTION

[0005] 5 The present application relates to inkjet adaptive planarization compositions, methods of forming a cured film, methods of manufacturing a device, and uses thereof.

[0006] BACKGROUND OF THE INVENTION

[0007] Inkjet Adaptive Planarization (IAP) is a process to apply a planarized material on a surface of a substrate. The process contains steps of jetting liquid drops of a photocurable composition on the surface of the substrate and bringing a superstrate in direct contact with the added liquid to form a liquid layer.

[0008] PRIOR ART DOCUMENTS PATENT DOCUMENTS

[0009] [Patent document 1] US2024 / 0376328 A1

[0010] [Patent document 2] WO2023 / 224746 A1

[0011] Patent Document 1 studies a photocurable composition containing a non-free radical compound as a hindered stabilizer.

[0012] Patent Document 2 studies a certain type of a photocurable composition having a multi-functional vinylbenzene and an oxime ester compound, which could decrease UV shrinkage. Patent Document 2 also studies 4-tert- butylcatechol can be included its composition.

[0013] SUMMARY OF THE INVENTION

[0014] The inventors newly have found that there are still one or more of

[0015] 30 considerable problems for which improvement is desired, as listed below: the thermal durability of an inkjet adaptive planarization composition is not sufficient in the shelf condition; the properties of an inkjet adaptive planarization composition can change when stored long; the viscosity of anForeignfiling_text_P25-178-SEC-W001_20260414

[0016] -2 -

[0017] inkjet adaptive planarization composition can increase; the surface tension of an inkjet adaptive planarization composition is not appropriate to be spread above a substrate when the composition is brought into contact with a 5 superstrate; an inkjet planarization composition can be gelatinized; the heat resistance of a cured film is insufficient; shrinkage of a film by heating is not suppressed; a cured film peels off due to its shrinkage; weight loss of a film is insufficiently suppressed; planarity of a cured film is insufficient; the viscosity of a composition is not sufficient to be used for inkjet adaptive planarization; an inkjet adaptive planarization composition is discharged unstably by an inkjet device or arranged inaccurately at designated portions; filling ability of an inkjet adaptive planarization composition into holes of a substrate is insufficient; filling ability of a cured film into holes of a substrate is insufficient; photocuring ability of an inkjet adaptive planarization is insufficient.

[0018] The inventors aimed to solve one or more of the above-mentioned problems. Then, the present inventors have surprisingly found that one or more of the above-described technical problems can be solved by the features as defined in the claims.

[0019] Namely, inventors found an adaptive planarization composition comprising an organic compound (A), and a free radical polymerization inhibitor (B).

[0020] As another aspect, inventors found a method of forming a cured film comprising the following steps (i-1) arranging droplets of the inkjet adaptive planarization composition above a substrate by an inkjet method; (ii) bringing the composition into contact with a superstrate; and (iii) irradiating the composition with light to polymerize the organic compound (A).

[0021] 30 Inventors further found some methods using above method of forming a cure film.

[0022] TECHNICAL EFFECTS OF THE INVENTIONForeignfiling_text_P25-178-SEC-W001_20260414

[0023] - 3 -

[0024] The present Inventors have found that one or more of the above-described technical problems can be solved by the features as defined in the claims.

[0025] 5 [Definition of the terms]

[0026] Unless otherwise specified in the present specification, the definitions and examples described in this paragraph are followed.

[0027] The singular form includes the plural form and “one” or “that” means “at least one”. An element of a concept can be expressed by a plurality of species, and when the amount (for example, mass % or mol%) is described, it means sum of the plurality of species. “And / or” includes a combination of all elements and also includes single use of the element.

[0028] When a numerical range is indicated using “to” or

[0029]

[0030] it includes both endpoints and units thereof are common. For example, 5 to 25 mol% means 5 mol% or more and 25 mol% or less.

[0031] The descriptions such as “Cx-y”, “Cx-Cy” and “Cx” mean the number of carbons in a molecule or substituent. For example, C1-6 alkyl means an alkyl chain having 1 or more and 6 or less carbons (methyl, ethyl, propyl, butyl, pentyl, hexyl etc.).

[0032] When a polymer has a plural type of repeating units, these repeating units copolymerize. The copolymerization of these repeating units is any of alternating copolymerization, random copolymerization, block copolymerization, graft copolymerization, or a mixture thereof. When polymer or resin is represented by a structural formula, n, m or the like that is attached next to parentheses indicate the number of repetitions.

[0033] 30 Celsius is used as the temperature unit. For example, 20 degrees means 20 degrees Celsius.Foreignfiling_text_P25-178-SEC-W001_20260414

[0034] -4 -

[0035] The additive refers to a compound itself having a function thereof (for example, in the case of a base generator, a compound itself that generates a base). An embodiment in which the compound is dissolved or dispersed in a 5 solvent and added to a composition is also possible.

[0036] DETAILED DESCRIPTION OF THE INVENTION

[0037] Hereinafter, embodiments of the present invention are described in detail.

[0038] - Inkjet adaptive planarization composition

[0039] The Inkjet adaptive planarization composition according to the present invention (hereinafter, referred to as “the composition”) comprises (preferably essentially consists of; more preferably consists of) an organic compound (A), and a free radical polymerization inhibitor (B). It is also one of embodiment of this invention that the composition comprises (preferably essentially consists of; more preferably consists of) an organic compound (A), a free radical polymerization inhibitor (B), a photo initiator (C), a polymerization inhibitor (D), and a solvent (S); and optionally can further comprise a surfactant (E).

[0040] In this specification, “viscosity” means kinematic viscosity in the following description, unless specifically described.

[0041] As one embodiment of this invention, the viscosity of the composition can be 1 to 25mPa·s (preferably 3 to 23mPa·s; more preferably 5 to 21mPa·s; further preferably 10 to 20mPa·s). This viscosity means the one measured just after the preparation of the inkjet adaptive planarization composition of this invention (initial viscosity). For handling samples, 2 days or less time duration at room temperature is accepted to measure initial viscosity since its 30 preparation. This duration can be prolonged by storing the sample by known method, like storing it in the refrigerator in the light blocked condition.

[0042] The viscosity can be measured by Cannon-Fenske Routine capillary viscometer (Industrial Research Glassware LTD). The measurement stepsForeignfiling_text_P25-178-SEC-W001_20260414

[0043] - 5 -

[0044] can be taken same manner to the ways described in the working example section.

[0045] 5 As one embodiment of this invention, the surface tension of the composition can be 25 to 45 mN / m (preferably 30 to 40 mN / m; more preferably 35 to 38 mN / m). This surface tension means the one measured just after the preparation of the inkjet adaptive planarization composition of this invention (initial surface tension).

[0046] The surface tension can be measured by pendant drop method with using the contact angle meter DMo-701 (Kyowa Interface Science). The measurement steps can be taken same manner to the ways described in the working example section.

[0047] As one embodiment of this invention, the composition can comprise an acrylate monomer 10 mass% or less (preferably 0 to 10 mass%; more preferably 0 to 5 mass%; further preferably 0.0 mass%) based on the composition. It is also one preferable embodiment of this invention that the composition doesn’t comprise acrylate monomer (0.0 mass%).

[0048] As one embodiment of this invention, the composition can comprise an methacrylate monomer 10 mass% or less (preferably 0 to 10 mass%; more preferably 0 to 5 mass%; further preferably 0.0 mass%) based on the composition. It is also one preferable embodiment of this invention that the composition doesn’t comprise methacrylate monomer (0.0 mass%).

[0049] Not to be bound by the theory, it is believed that limiting the amount of acrylate monomer and / or methacrylate monomer can leads higher carbon content of a cured film obtained from the composition and / or higher thermal durability.

[0050] Not to be bound by the theory, it is believed that by comprising later described 30 components the composition can exhibit longer-term stability and / or higher thermal durability. The acceleration test can be done same manner to the ways described in the working example section.Foreignfiling_text_P25-178-SEC-W001_20260414

[0051] -6 -

[0052] The viscosity of the composition after stored at 40 °C for 2 weeks can be less than 27 mPa·s (preferably 25 mPa·s or less; more preferably 23 mPa·s or less).

[0053] 5 The viscosity of the composition after stored at 40 °C for 4 weeks can be less than 27 mPa·s (preferably 25 mPa·s or less; more preferably 23 mPa·s or less).

[0054] The viscosity of the composition after stored at 40 °C for 2 weeks comparing to the initial is 95 to 130% (preferably 100 to 130%; more preferably 100 to 120%). In the case that 18 mPa·s of the initial viscosity changes to 20 mPa·s by 40 °C for 2 weeks acceleration, the viscosity of the composition after stored at 40 °C for 2 weeks comparing to initial is 20 / 18 (about 111 %).

[0055] The viscosity of the composition after stored at 40 °C for 4 weeks comparing to the initial is 95 to 150% (preferably 100 to 150%; more preferably 100 to 140%; further preferably 100 to 130%).

[0056] Not to be bound by the theory, it is believed in the case the composition is gelatinized after such acceleration, its viscosity becomes very big and difficult to be measured by the above-mentioned method. And it will fall out of the scope of the above-mentioned viscosity ranges.

[0057] - Organic compound (A)

[0058] The composition comprises an organic compound (A). The composition may comprise two or more of the different organic compounds (A).

[0059] As one aspect of this invention, the organic compound (A) can comprise one or more unsaturated hydrocarbon groups. Such group preferably has a double bonds or triple bond. An embodiment of such group is more preferably vinyl and / or ethynyl (further preferably vinyl).

[0060] 30

[0061] The organic compound (A) can be represented by formula (A).Foreignfiling_text_P25-178-SEC-W001_20260414

[0062] - 7 -

[0063]

[0064] LA1, LA2 and LA3 are each independently a single bond or C1-20 alkylene (preferably a single bond, linear C1-20 alkylene, branched C3-20 alkylene, or cyclic C3-20 alkylene; more preferably a single bond or linear C1-5 alkylene; further preferably a single bond, methylene or ethylene). LA1 is further more 15

[0065] preferably a methylene. LA2 and LA3 are further more preferably single bonds.

[0066] RAI and RA2 are each independently C1-20 alkyl (preferably linear C1-20 alkyl, branched C3-20 alkyl, or cyclic C3-20 alkyl; more preferably linear C1-5 alkyl or branched C3-5 alkyl; further preferably methyl, ethyl, i-propyl, n-propyl, n- 20

[0067] butyl, sec-butyl, i-butyl or t-butyl; further more preferably methyl, ethyl, i- propyl, or t-butyl).

[0068] R A3 is H or C1-20 alkyl (preferably H, linear C1-20 alkyl, branched C3-20 alkyl, or cyclic C3-20 alkyl; more preferably H, linear C1-5 alkyl or branched C3-5 alkyl; further preferably H, methyl, ethyl, i-propyl, or t-butyl; further more preferably H).

[0069] One or more of -CH2- (methylene) in RA1, RA2, RA3, LA1, LA2 or LA3 may be replaced by -O-, -S-, -SO2-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CRA4=CRA5- 30

[0070] or -C≡C- (preferably by -O-). Preferable embodiment of this invention is that such replacements are not done on adjacent methylenes. It is moreForeignfiling_text_P25-178-SEC-W001_20260414

[0071] - 8 -

[0072] preferable embodiment of this invention that none of -CH2- in RA1, RA2, RA3, LA1, LA2 nor LA3 is replaced.

[0073] 5 RA4 and RA5 are each independently H or C1-10 alkyl. Embodiments of RA4 and RA5 are each independently same to above described RA3.

[0074] One or more H in the alkyl of RA1, RA2, RA3, LA1, LA2 or LA3 may be substituted with -OH or -COOH. It is more preferable embodiment of this invention that none of H of RA1, RA2, RA3, LA1, LA2 nor LA3 is replaced.

[0075] mA1, mA2, nA1, and nA2 are each independently a number of 0 to 5.

[0076] nA3=0 or 1 (preferably 1). It is also one good embodiment of this invention that nA3 is 0.

[0077] mA1+mA2>0. When nA3=0, mA2 = nA2 =0.

[0078] Each independently, mA1 and mA2 are preferably a number of 0 to 3 (more preferably an integer of 0 to 3; further preferably 1, 2 or 3; further more preferably 1 or 2). In the case the organic compound (A) is a mixture of some compound which are all represented by formula (A), each of mA1 and mA2 can take a number which is not an integer. A chemical compound can exist in a distribution state, for example because of the extent of the reaction. Unless specifically describe, same applies to following descriptions.

[0079] Each independently, nA1 and nA2 are preferably a number of 0 to 3 (more preferably an integer of 0 to 3; further preferably 0 or 1; further more preferably 0).

[0080] As one embodiment of this invention, the content of the organic compound (A) is 30 to 98 mass% (preferably 60 to 97 mass%; more preferably 70 to 96 30 mass%; further preferably 80 to 95 mass%) based on the composition. For the reason of clarify, explanations follow. The above “based on the composition” means the “based on the total amount of the composition of this invention”. Because the mass% is %, the sum of components (e.g., compound (A), solventForeignfiling_text_P25-178-SEC-W001_20260414

[0081] - 9 -

[0082] (S)) becomes 100%, even each amount can have a certain width of range. Unless specifically described, same applies in following descriptions.

[0083] 5 The below compound can be read by the formula (A). For example, XA1 and XA2 are -LA2-CRA3=CH2. LA2 is a single bond. RA3 is H. LA1 is C1 alkylene (methylene). mA1=2, mA2=1. nA3=1. nA1=nA2=0.

[0084]

[0085] The below compound can be read by the formula (A). For example, XAI and XA2 are -LA2-CRA3=CH2. LA2 is a single bond. RA3 is H. mAi=mA2=2. nA3 =0.

[0086]

[0087] The composition may comprise one or more organic compounds other than the organic compound (A) (hereafter, referred to as “the other organic compound”). The other organic compound (A) is not represented by formula (A).

[0088] Exemplified embodiments of the organic compound (A) may be selected from one or more members of the following group consisting of;

[0089] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0090] - 10 -

[0091]

[0092] Foreignfiling_text_P25-178-SEC-WO01 20260414

[0093]

[0094] Foreignfiling_text_P25-178-SEC-W001_20260414

[0095] - 12 -

[0096] - Free radical polymerization inhibitor (B)

[0097] The composition comprises a free radical polymerization inhibitor (B) (hereinafter, possible to referred as compound (B)). The compound (B) is 5 stable in the intended conditions, such as it is sealed in a vial and stored under controlled temperature and atmosphere pressure in a light-protected environment. Preferably the compound (B) doesn’t need to be irradiated by light to capture radicals to inhibit the polymerization of solid component (eg., compound (A)). Solid component(s) means all component(s) except for the solvent (S) in the composition of this invention which remain in the cured film made from the composition of this invention. Unless specifically described, same applies in following descriptions.

[0098] Not to be bound by the theory, it is believed that having the compound (B) in the composition of this invention can inhibit the polymerization of the solid component (eg., compound (A)) particularly in the condition having less oxygen.

[0099] Not to be bound by the theory, it is believed that having the compound (B) in the composition of this invention can more inhibit the gelatinization of the composition.

[0100] Preferably the compound (B) is organic compound, which means it is a free radical organic polymerization inhibitor (B).

[0101] The compound (B) preferably comprises a “N-O*” structure (more preferably comprises a “> N-O*” structure). It is one embodiment of this invention that the compound (B) comprises a structure represented preferably by formula (B) (more preferably by formula (B1)) as one portion of it. It is possible that the compound (B) comprises two structure represented by formula (B).

[0102] Exemplified embodiments of the compound (B) may be described as below.

[0103] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0104] - 13 -

[0105]

[0106] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0107] - 14 -

[0108]

[0109] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0110] - 15 -

[0111]

[0112] -Anion represented by Formula (B), or its salt

[0113] The compound (B) can be an anion represented by formula (B), or its salt. Which means, the compound (B) can be a salt exchanged from a compound represented by formula (B). It is more preferable embodiment of this invention, that the compound (B) does not take a salt state, which means that the compound (B) is represented by formula (B).

[0114]

[0115] Each independently, RB1, RB2, RB5, and RB6 are more preferably methyl, ethyl, i-propyl, n-propyl, t-butyl, or n-butyl (further preferably methyl or t-butyl; further more preferably methyl).

[0116] Each independently RB7, RB8, RB9, RB10, RB11 and RB12 are more preferably H, 30 methyl, or ethyl (further preferably H). It is also one embodiment of this invention that RB8 and RB9 are ethyl.Foreignfiling_text_P25-178-SEC-W001_20260414

[0117] - 16 -

[0118] RB3 and RB4 are each independently H, C1-10 alkyl, or C6-12 aryl (preferably C1-10 alkyl; more preferably linear C1-10 alkyl or branched C3-10 alkyl; further preferably methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-heptyl, i-heptyl, 5 n-octyl, n-nonyl, or n-decyl; further more preferably methyl or ethyl).

[0119] One or more of -CH2- in the alkyl of RB1, RB2, RB3, RB4, RB5 or RB6 may be replaced by -O-, -C(=O)-, -C(=O)-O-, or -C(=O)-NRB7- (preferably -C(=O)- or or -C(=O)-NRB7-; more preferably -C(=O)-O-). In the case two or more of - CH2- in one alkyl are replaced, preferably they are not adjacent each other. It is one preferable embodiment of this invention that none of -CH2- in the alkyl of RB1, RB2, RB3, RB4, RB5 nor RB6 is replaced.

[0120] One or more of H in the alkyl or aryl of RB1, RB2, RB3, RB4, RB5 or RB6 may be substituted with -OH, -COOH, -N(RB8)2, -N+(RB9)3, -CRB10=C(RB11)2, - C≡CRB12, -SH, or-CN (preferably -OH, -COOH, -N(RB8)2, or-N+(RB9)3; more preferably -OH, -COOH, or -N+(RB9)3; further preferably -OH, or -COOH; further more preferably -OH). It is one preferable embodiment of this invention that none of H in the alkyl or aryl of RB1, RB2, RB3, RB4, RB5 or RB6 is substituted. It is another aspect of this invention that none of RB1, RB2, RB3, RB5 nor RB6 is substituted, and RB4 is substituted.

[0121] One or more of alkyl portion of RB1, RB2, RB3, RB4, RB5, or RB6 may bond to form a cyclic ring. For example, a n-hexyl may bond to form a cyclohexyl. Such cyclic ring can be preferably a saturated hydrocarbon ring or an unsaturated hydrocarbon ring (more preferably an unsaturated hydrocarbon ring; further preferably aromatic hydrocarbon ring).

[0122] Preferably one alkyl portion of RB3 or RB4 bond to form a cyclic ring.

[0123] One or more of carbon atom in the cyclic ring may be replaced by hetero 30 atom (preferably one of carbon atom in the cyclic ring is replaced by hetero atom). Such hetero atom can be N, S or 0 (preferably N). It is another aspect of this invention that such replacement by hetero atom does not happen in the cyclic ring.Foreignfiling_text_P25-178-SEC-W001_20260414

[0124] - 17 -

[0125] It is another preferable embodiment of this invention that none of alkyl portion of RB1, RB2, RB3, RB4, RB5, nor RB6 bonds to form a cyclic ring.

[0126] 5 One or more of the combination of “RBI and RB2”, “RBS and RB4”, or “RBS and RBS” may bond each other to form a cyclic ring. Preferably RBS and RB4 bond each other to form a cyclic ring. It is another aspect of this invention that none of the combination of “RBI and RB2” nor “RBS and RBS” bond each other to form a cyclic ring.

[0127] Such bonding can be caused by bonding between “H and alkyl” or “alky and alkyl” (more preferably “H and alkyl”). Such cyclic ring can be preferably a saturated hydrocarbon ring or an unsaturated hydrocarbon ring (more preferably a saturated hydrocarbon ring).

[0128] One or more of carbon atom in the cyclic ring may be replaced by hetero atom (preferably one of carbon atom in the cyclic ring is replaced by hetero atom). Such hetero atom can be N, S or 0 (preferably N). It is another aspect of this invention that such replacement by hetero atom does not happen in the cyclic ring.

[0129] Below compound can be read by formula (B). For example, RBI, RB2, RBS, and RB6 are methyl. RBS is methyl. RB4 is linear C9 alkyl. RBS and RB4 bond each other to form a cyclic ring. One of -CH2- in the C9 alkyl of RB4 is replaced by - C(=O)-NRB7- RB? is H. One of H in the C9 alkyl of RB4 is substituted with - N+(RB9)3. The “N+” of the “N+(RB9)3” makes salt with Br. Three RB9 are ethyl.

[0130] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0131] - 18 -

[0132]

[0133] Below compound can be read by formula (B). For example, RB1, RB2, RB5, and RB6 are methyl. RB3 is methyl. RB4 is C2 alkyl (ethyl). RB3 and RB4 bond each other to form a cyclic ring. One of H in the C2 alkyl of RB4 is substituted with N(RB8)2. Another H in the C2 alkyl of RB4 is substituted with -COOH. Two RB8 are H.

[0134]

[0135] Below compound can be read by formula (B). For example, RB1, RB2, RB5, and RB6 are methyl. RB3 is H. RB4 is C3 alkyl. RB3 and RB4 bond each other to form a cyclic ring. One of -CH2- in the alkyl of RB4 is replaced by -C(=O)-.

[0136] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0137] - 19 -

[0138]

[0139] The compound (B) can be represented by formula (B1).

[0140]

[0141] Formula (B1)

[0142] 20 Each independently, definitions, detailed explanations and embodiments of RB1, RB2, RB5, RB6, RB7, RB8, RB9, RB10, RB11, and RB12 are each independently same to described as above, unless specifically described.

[0143] RB3’ and RB4’ are each independently H, C1-9 alkyl, or Ce-i 1 aryl.

[0144] As one embodiment of this invention, RB3’ and RB4’ are each independently H or C1-7 alkyl (preferably H, linear C1-7 alkyl or branched C3-7 alkyl; more preferably H, methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-heptyl, or i- heptyl; further preferably H).

[0145] 30 One or more of -CH2- in the alkyl of RBI, RB2, RB3’, RB4’, RBS or RBS may be replaced by -O-, -C(=O)-, -C(=O)-O-, or -C(=O)-NRB7- (preferably -C(=O)- or - C(=O)-NRB7-; more preferably -C(=O)-). In the case two or more of -CH2- in one alkyl are replaced, preferably they are not adjacent each other. It is oneForeignfiling_text_P25-178-SEC-W001_20260414

[0146] - 20 -

[0147] preferable embodiment of this invention that none of -CH2- in the alkyl of RBI, RB2, RB3’, RB4’, RBS nor RB6 is replaced.

[0148] 5 One or more of H in the alkyl or aryl of RBI, RB2, RB3’, RB4’, RBS or RBS may be substituted with -OH, -COOH, -N(RBS)2, -N+(RB9)3, -CRBIO=C(RBH)2, - C=CRBI2, -SH, or-CN (preferably -OH, -COOH, -N(RBS)2, or-N+(RB9)3; more preferably -OH, -COOH, or -N+(RB9)3; further preferably -OH, or -COOH; further more preferably -OH). It is one preferable embodiment of this invention that none of H in the alkyl or aryl of RBI, RB2, RB3’, RB4’, RBS or RBS is substituted. It is another aspect of this invention that none of RBI, RB2, RB3’, RBS nor RB6 is substituted, and RB4’ is substituted.

[0149] One or more of alkyl portion of RBI, RB2, RB3’, RB4’, RBS, or RBS may bond to form a cyclic ring. For example, a n-hexyl may bond to form a cyclohexyl. Such cyclic ring can be preferably a saturated hydrocarbon ring or an unsaturated hydrocarbon ring (more preferably an unsaturated hydrocarbon ring; further preferably aromatic hydrocarbon ring).

[0150] Preferably one alkyl portion of RB3’ or RB4’ bond to form a cyclic ring.

[0151] One or more of carbon atom in the cyclic ring may be replaced by hetero atom (preferably one of carbon atom in the cyclic ring is replaced by hetero atom). Such hetero atom can be N, S or 0 (preferably N). It is another aspect of this invention that such replacement by hetero atom does not happen in the cyclic ring.

[0152] It is another preferable embodiment of this invention that none of alkyl portion of RBI, RB2, RB3’, RB4’, RBS, nor RBS bonds to form a cyclic ring.

[0153] nB1 and nB2 are each independently 0 or 1 (preferably 1).

[0154] 30 Below compound can be read by formula (B1). For example, RBI, RB2, RBS, and RB6 are methyl. nBi=nB2=1. RB3’ is H. RB4’ is C7 alky. One of -CH2- in the alkyl of RB4’ is replaced by -C(=O)-O- One of alkyl portion of RB4’ bonds toForeignfiling_text_P25-178-SEC-W001_20260414

[0155] - 21 -

[0156] form a cyclic ring to make an unsaturated hydrocarbon ring. One of the carbon atom in the cyclic ring is replaced by N.

[0157]

[0158] Below compound can be read by formula (B1). For example, RBI, RB2, RBS, and RB6 are methyl. nBi=nB2=1. RB3’ is H. RB4’ is C2 alky. One of -CH2- in the alkyl of RB4’ is replaced by -C(=O)-O- one H in the alkyl of RB4’ is substituted with -CRBIO=C(RBH )2. RB is methyl. Two RBU are H.

[0159]

[0160] Below left compound can be read by formula (B1). For example, RBI, RB2, RBS, and RB6 are methyl. nBi=nB2=1. RB3’ and RB4’ are H.

[0161] Below right compound can be read by formula (B1). For example, RBI, RB2, RBS, and RBS are methyl. nBi=nB2=1. RB3’ and RB4’ are H. The H of RB4’ is substituted with -OH.

[0162] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0163] - 22 -

[0164]

[0165] - Formula (B2)

[0166] In the case RB3 is H, formula (B1) can be described as formula (B2).

[0167]

[0168] Each independently, definitions, detailed explanations and embodiments of RBI, RB2, RB4’, RBS, RB6, RB7, RBS, RB9, RB, RBI 1, and RBI2 are each independently same to described as above, unless specifically described.

[0169] The content of the free radical polymerization inhibitor (B) based on the organic compound (A) is 0.001 to 20 mass% (preferably 0.005 to 5 mass%; more preferably 0.01 to 1.0 mass%; further preferably 0.01 to 0.50 mass%; further more preferably 0.01 to 0.20 mass%). For the reason of clarify, explanations follow. The above “based on the organic compound (A)” means the “based on the total amount of the organic compound (A) in the composition of this invention”. Unless specifically described, same applies in following descriptions.

[0170] 30

[0171] - Photo initiator (C)Foreignfiling_text_P25-178-SEC-W001_20260414

[0172] The composition can comprise a photo initiator (C). The composition may comprise two or more of the different photo initiators (C). The photo initiator is activated by irradiation light and generates radicals. Such irradiation lights can 5 be visible light, ultraviolet light, infrared light, X-rays, electron beams, alpha rays, or gamma rays (more preferably ultraviolet light).

[0173] As one embodiment of the present invention, the photo initiator (C) can be at least one selected from the group consisting of 2,4,5-triarylimidazole dimer, benzophenone derivative, quinone, benzoin ether derivative, benzyl derivative, N-phenylglycine derivative, acetophenone derivative, thioxanthone derivative, acylphosphine oxide derivative and oxime ester derivative (preferably oxime ester derivative).

[0174] The photo initiator (C) can comprise a “-C=N-O-C(=O)-” structure.

[0175] As one aspect of this invention, the photo initiator (C) can be represented by

[0176]

[0177] Formula (C)

[0178] LC11, and LC12 are each independently C1-20 alkylene or -NRC16- (preferably C1-5 alkylene or -NRC16-; more preferably methylene or -NRC16-; further

[0179] 30 preferably methylene). It is one preferable embodiment of this invention that one or more of -CH2- in the alkyl of LC11 and LC12 are replaced with -CO-.Foreignfiling_text_P25-178-SEC-W001_20260414

[0180] -24 -

[0181] RC11, RC12, RC13, RC14, RC15 and RC16 are each independently H, C1-20 alkyl, C6-12 aryl, C6-20 arylalkyl, or C6-20 alkylaryl.

[0182] Each independently, RC11, RC12, RC13 and RC16 are preferably H, C1-10 alkyl, 5 C6-12 aryl, or C6-20 alkylaryl (more preferably H, C1-4 alkyl, or tolyl; further preferably H or tolyl).

[0183] Each independently RC14 and RC15 are preferably H, C1-10 alkyl, or C6-12 aryl (more preferably H or C1-4 alkyl; further preferably methyl or ethyl; further more preferably methyl).

[0184] One or more of -CH2- in the alkyl of RC11, RC12, RC13, RC14, RC15, RC16, LC11, or LC12 may each independently be replaced with -O-, -S-, -SO2-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CRC17=CRC18- or -C≡C-. It is one embodiment of this invention that preferably none of them except for LC11 and LC12 (more preferably none of them) are replaced.

[0185] Xcu and Xci2 are each independently a single bond, -CRC19RC20-, -NRC21-, - O-, -S-, or -S(= 0)-. Preferably, Xcu and Xci2 don’t take single bonds simultaneously.

[0186] XC11 is preferably a single bond, -CRC19RC20-, -NRC21- or -S(=O)- (more preferably a single bond, -CRC19RC20- or -S(=O)-; further preferably a single bond or -S(=O)-; further more preferably a single bond).

[0187] XC12 is preferably a single bond, -CRC19RC20-, -NRC21- or -S(=O)- (more preferably a single bond, -CRC19RC20- or -S(=O)-; further preferably -CRC19RC20- or -NRC21-; Further more preferably -NRC21-). It is also one of the preferable embodiment of this invention that XC12 is -CRC19RC20-.

[0188] RC17, RC18, RC19, RC20, and RC21 are each independently H or C1-10 alkyl.

[0189] Each independently, RC17 and RC18 are preferably H, C1-10 alkyl, or C6-12 aryl 30 (more preferably H or C1-4 alkyl; further preferably H).

[0190] Each independently RC19, RC20, and RC21 are preferably H, C1-10 alkyl, or C6-12 aryl (more preferably H or C1-4 alkyl; further preferably linear C1-4 alkyl; further more preferably ethyl).Foreignfiling_text_P25-178-SEC-W001_20260414

[0191] - 25 -

[0192] One or more H of RC11, RC12, RC13, RC14, RC15, RC16, LC11, or LC12 may each independently be substituted with -OH or -COOH. It is one of preferable 5 embodiment of this invention that none of H of RC11, RC12, RC13, RC14, RC15, RC16, LC11, nor LC12 is substituted with -OH or -COOH.

[0193] nC11 and nC13 are each independently a number of 0 to 5 (preferably a number of 1 to 5; more preferably 1, 2 or 3; further preferably 1).

[0194] mC12 and mC13 are each independently a number of 0 to 3 (preferably a number of 0 to 2; more preferably 0, or 1; further preferably 0).

[0195] oC11 is a number of 0 to 2 (preferably 0, 1 or 2; more preferably 0 or 1; further preferably 1). It is also one preferable embodiment of this invention that oC11=0. oC12 is a number of 1 to 3 (preferably 1, 2 or 3; more preferably 1 or 2; further preferably 1).

[0196] The below compound can be read by formula (C). For example, RC11 is tolyl (phenyl substituted with methyl). LC11 is C1 alkylene (methylene), and it is replaced with -CO-. oC11=oC12=1. nC11=1. nC13=0. mC12=mC13=0. XC11 is single bond. XC12 is -NRC21-. RC21 is alkyl (ethyl). RC14 is RC15 are methyl.

[0197]

[0198] 30 As the one of more concrete embodiment of this invention, the photo initiator (C) is represented by formula (C2).Foreignfiling_text_P25-178-SEC-W001_20260414

[0199]

[0200] Details and embodiments of LC11, LC12, RC11, RC12, RC13, RC14, RC15, RC16, XC11, XC12, RC17, RC18, RC19, RC20, RC21, nC11, nC13, mC12, mC13, oC11, and oC12 are each independently same to described above.

[0201] As the one of further concrete embodiment of this invention, the photo initiator (C) is represented by formula (C3).

[0202]

[0203] Formula (C3) Details and embodiments of LC11, LC12, RC11, RC12, RC13, RC14, RC15, RC16, XC12, RC17, RC18, RC19, RC20, RC21, oC11, nC13, mC12, and mC13 are each independently 30 same to described above.Foreignfiling_text_P25-178-SEC-W001_20260414

[0204] - 27 -

[0205] As the one of the embodiment of this invention, the content of the photo initiator (C) is 0.01 to 30 mass% (preferably 0.5 to 20 mass%; more preferably 0.8 to 15 mass%; further preferably 1 to 10 mass%; further more preferably 1.5 to 8 5 mass%) based on the organic compound (A).

[0206] - Polymerization inhibitor (D)

[0207] The composition can comprise a polymerization inhibitor (D). The polymerization inhibitor (D) comprises a structure (D1). More preferably, the polymerization inhibitor (D) only consists of the structure (D1), which can be described as the polymerization inhibitor (D) is represented by formula (D1). The structure (D1) is represented by formula (D1).

[0208]

[0209] RD12 is each independently an organic substituent (preferably C1-10 alkyl or C6-20 aryl; more preferably C1-10 alkyl; further preferably methyl, ethyl or t-butyl; further more preferably t-butyl).

[0210] nD11 is a number of 0 to 5 (preferably a number of 1 to 5; more preferably a number of 1 to 2; further preferably 1 or 2; further more preferably 1). nD12 is a number of 0 to 5 (preferably a number of 0 to 2; more preferably 0, 1 or 2; further preferably 1 or 2; further more preferably 1).

[0211] 1 ≤ (nD11+nD12) ≤ 5. More preferably 1 ≤ (nD11+nD12) ≤ 2.

[0212] For example, both of below two compounds are embodiments of the photo inhibitor (D). They comprise three structure (D1)s. In each of formula (D1), nD11=0, nD12=2, and RD12 are t-butyl.

[0213] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0214] - 28 -

[0215]

[0216] Below compound is one embodiment of the photo inhibitor (D), which consists of the structure (D1) only. It can be read by formula (D1), as nD11=nD12=1, and RD12 is t-butyl.

[0217]

[0218] 30 As the one of the embodiment of this invention, the content of the polymerization inhibitor (D) is 0.001 to 20 mass% (preferably 0.001 to 10 mass%; more preferably 0.005 to 2 mass%; further preferably 0.01 to 1.0Foreignfiling_text_P25-178-SEC-W001_20260414

[0219] - 29 -

[0220] mass%; further more preferably 0.04 to 0.90 mass%) based on the organic compound (A).

[0221] 5 Not to be bound by the theory, it is believed that having the polymerization inhibitor (D) in the composition of this invention can efficiently inhibit increasing viscosity particularly in the short period. Not to be bound by the theory, it is believed that the composition of this invention having the polymerization inhibitor (D) can more inhibit the polymerization of the solid component (e.g. compound (A)) particularly in the condition having oxygen. Without oxygen, its polymerization inhibition capability is not sufficiently strong.

[0222] Not to be bound by the theory, it is believed that having both of compound (B) and the polymerization inhibitor (D) in the composition of this invention can lead better long-term stability for example inhibiting gelatinization and / or viscosity increase.

[0223] - Solvent (S)

[0224] The composition can comprise a solvent (S). The solvent (S) comprise an organic solvent (S1).

[0225] The content of the solvent (S) based on the composition is 0.01 to 40 mass% (preferably 0.01 to 30 mass%; more preferably 0.8 to 20 mass%; further preferably 1 to 10 mass%; further more preferably 1.5 to 6 mass%).

[0226] The content of the solvent (S) based on the compound (A) is 0.01 to 40 mass% (preferably 0.01 to 30 mass%; more preferably 0.8 to 20 mass%; further preferably 1 to 10 mass%; further more preferably 1.5 to 6 mass%).

[0227] The organic solvent (S1) can comprise at least one selected from the group consisting of an aromatic hydrocarbon solvent, an ester solvent, a ketone solvent, an ether solvent, and an alcohol solvent. It is one embodiment of this 30 invention that solvent (S1) is an aromatic hydrocarbon solvent, an ester solvent, a ketone solvent, an ether solvent, an alcohol solvent, or any mixture of any of these (preferably an aromatic hydrocarbon solvent, an ester solvent, a ketone solvent or the mixture of two of them; more preferably anForeignfiling_text_P25-178-SEC-W001_20260414

[0228] - 30 -

[0229] aromatic hydrocarbon solvent, and an ester solvent, or mixture of them; further preferably an aromatic hydrocarbon solvent).

[0230] 5 The content of the organic solvent (S1 ) based on the total of the solvent (S) can be 80 to 100 mass% (preferably 90 to 100 mass%; more preferably 95 to 100 mass%; further preferably 100 mass%). It is one of preferable embodiment that the solvent (S) consists of the organic solvent (S1 ) only, which can be described as solvent (S) is the organic solvent (S1).

[0231] In a preferable embodiment of this invention, the boiling point of the solvent (S) is 60 to 200°C (preferably 70 to 180°C; more preferably 80 to 160°C; further preferably 80 to 145°C) at 1 atm.

[0232] The organic solvent (S1 ) can be selected from one or more members of the following group consisting of methanol, ethanol, n-propanol, i-propanol, n- butanol, i-butanol, sec-butanol, t-butanol, n-pentanol, i-pentanol, 2- methylbutanol, sec-pentanol, t-pentanol, 3-methoxybutanol, n-hexanol, 2- methylpentanol, sec-hexanol, 2-ethylbutanol, sec-heptanol, heptanol-3, n- octanol, 2-ethylhexanol, sec-octanol, n-nonyl alcohol, 2,6-dimethylheptanol-4, n-decanol, sec-undecyl alcohol, trimethylnonyl alcohol, sec-tetradecyl alcohol, sec-heptadecyl alcohol, phenol, cyclohexanol, methylcyclohexanol, 3,3,5-trimethylcyclohexanol, benzyl alcohol, phenylmethylcarbinol, diacetone alcohol, cresol, toluene, anisole, cyclopentanone, cyclohexanone, ethylene glycol, propylene glycol, 1,3-butylene glycol, pentanediol-2,4, 2- methylpentanediol-2,4, hexanediol-2,5, heptanediol-2,4, 2-ethyl-1,3- hexanediol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol, glycerin, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-butyl ether, ethylene glycol 30 mono-n-hexyl ether, ethylene glycol monophenyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-hexyl ether, ethoxytriglycol, propylene glycol monomethyl ether (PGME), propylene glycol monomethylForeignfiling_text_P25-178-SEC-W001_20260414

[0233] - 31 -

[0234] ether acetate (PGMEA), propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol 5 mono propyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, 4-methyl-2-pentanol, 3-methyl-2-pentanol, 2-methyl-2- pentanol, 3-methyl-2-butanol, 2-methyl-2-butanol, 4-methyl-2-hexanol, 5- methyl-2-hexanol, 3-methyl-2-hexanol, 2-methyl-2-hexanol, ethyl lactate (EL), propyl lactate, n-butyl lactate, n-butyl acetate, n-amyl lactate, butyric acid, methyl 2-hydroxyisobutyrate, methyl 2-hydroxybutyrate, methyl 3- hydroxybutyrate, methyl 4-hydroxy butyrate, ethyl 2-hydroxyisobutyrate, ethyl 2-hydroxybutyrate, ethyl 3-hydroxybutyric acid and ethyl 4-hydroxybutyrate (preferably selected from one or more members of the following group consisting of PGMEA, EL, toluene, n-butyl acetate, anisole, cyclopentanone and cyclohexanone; more preferably selected from one or more members of the following group consisting of PGMEA, toluene, n-butyl acetate, and cyclopentanone).

[0235] The organic solvent (S1) can be PGMEA, toluene, n-butyl acetate, cyclopentanone, or mixture of any of these (preferably PGMEA, toluene, n- butyl acetate, cyclopentanone, or the mixture of two of them; more preferably PGMEA, toluene, n-butyl acetate, or cyclopentanone).

[0236] - Surfactant (E)

[0237] The composition can comprise a surfactant (E).

[0238] Examples of surfactants (E) include fluorine-containing surfactants, nonionic surfactants, anionic surfactants, amphoteric surfactants, silicon-containing surfactants and any combination thereof.

[0239] The content of the surfactant (E) based on the organic compound (A) can be 0.01 to 30 mass% (preferably 0.1 to 10 mass%; more preferably 1.0 to 5.0 30 mass%). It is also one of preferable embodiment of this invention that the composition doesn’t comprise the surfactant (E), which can be described as the content of the surfactant (E) based on the organic compound (A) is 0.00 mass%.Foreignfiling_text_P25-178-SEC-W001_20260414

[0240] - 32 -

[0241] - A photo initiator (F)

[0242] The composition can comprise a photo initiator (F), which is different from the 5 photo initiator (C). Preferably the photo initiator (F) doesn’t comprise “-C=N-O- C(=O)-” structure.

[0243] The content of the photo initiator (F) based on the organic compound (A) can be 0.01 to 30 mass% (preferably 0.1 to 10 mass%; more preferably 1.0 to 5.0 mass%). It is also one of preferable embodiment of this invention that the composition doesn’t comprise the photo initiator (F), which can be described as the content of the photo initiator (F) based on the organic compound (A) is 0.00 mass%.

[0244] - Additives (G)

[0245] The composition can comprise one or more additives. Such additive (G) can be selected from at least one of the group consisting of wetting agents, release agents, oxygen quenchers, stabilizers, photosensitizer, adhesion promoter, peeling agent, and reactive diluent.

[0246] Additive (G) is different from each of the compound (A) to (F) and solvent (S).

[0247] The content of the additive (G) based on the organic compound (A) can be 0.01 to 30 mass% (preferably 0.1 to 10 mass%; more preferably 1.0 to 5.0 mass%). It is also one of preferable embodiment of this invention that the composition doesn’t comprise the additive (G), which can be described as the content of the additive (G) based on the organic compound (A) is 0.00 mass%.

[0248] - Method of forming a cured film

[0249] In another aspect, the present invention also relates to a method of forming a cured film (hereinafter, referred to as “the method”) comprising the following 30 steps (i-1 ), (ii) and (iii) in the following order;

[0250] (i-1) arranging droplets of the inkjet adaptive planarization composition of this invention above a substrate by an inkjet method;

[0251] (ii) bringing the composition into contact with a superstrate;Foreignfiling_text_P25-178-SEC-W001_20260414

[0252] - 33 -

[0253] (iii) irradiating the composition with light to polymerize the organic compound (A).

[0254] 5 - Step (i-1)

[0255] “Above a substrate” means that the composition according to the present invention may be applied either directly or via one or more other layers on the substrate. It is a more preferable embodiment of this invention that step (i-a) arranges droplets of the composition directly on the substrate.

[0256] The droplets may be arranged from an inkjet nozzle of an inkjet device such as an inkjet recording printer in the step (i-1). The fluid pressure of the inkjet device can be from 0.1 to 3MPa. The nozzle pitch of the inkjet device can be 1 to 10mm. The amount of the droplet can be 50 to 300 nl.

[0257] Examples of the substrate include a silicone substrate, a glass substrate and a resin film. The substrate may be patterned on its surface. The adhesion of the surface of the substrate to the composition may be improved by treatments such as a silane coupling treatment, a silazane treatment, or deposition of an organic thin film.

[0258] - Step (ii)

[0259] The duration of the step (ii) is preferably 0.1 to 3 sec (more preferably 0.1 sec to 1 sec).

[0260] Examples of the superstrate to be used in the step (ii) include a silicone substrate, a glass substrate and a resin film. The superstrate may be patterned on its surface. The pattern on the surface of the superstrate may have a height of 4 to 200 nm.

[0261] 30

[0262] The pressure to be applied to the composition when bringing the superstrate into contact with the composition (A) is preferably 0 to 100 MPa (more preferably 0 to 50 MPa; further preferably 0 to 20 MPa).Foreignfiling_text_P25-178-SEC-W001_20260414

[0263] - 34 -

[0264] - Step (iii)

[0265] In a preferable embodiment of the present invention, the wavelength of the 5 light for the irradiation in the step (iii) is 150 to 450nm (preferably 200 to 440nm; more preferably 250 to 410nm). The light to be used in the step (iii) may have either a single wavelength or multiple wavelengths. When the light has multiple wavelengths, the values of the multiple wavelengths may respectively be selected in the above-mentioned ranges. Known light source which emits each of above-mentioned wavelength can be used in this invention.

[0266] In another preferable embodiment of the present invention, the exposure during the light irradiation in the step (iii) is 10 to 40,000mJ / cm2(preferably 20 to 30,000mJ / cm2; more preferably 30 to 20,000mJ / cm2).

[0267] As one embodiment of the present invention, the light is intermittently emitted to the entire region of the composition on the substrate a plurality of times in the step (iii).

[0268] As another embodiment of the present invention, the light is continuously emitted to the entire region of the composition on the substrate in the step (iii).

[0269] - Step (i-2)

[0270] The method according of this invention may further comprise the following step (i-2) between the step (i-1) and the step (ii);

[0271] (i-2) waiting for the arranged droplets to combine with their respective adjacent droplets to form a continuous liquid film on the substrate.

[0272] As a preferable embodiment of the present invention, the duration of the step 30 (i-2) is 0.1 to 600 sec (preferably 10 to 600 sec; more preferably 50 to 500 sec;

[0273] further preferably 100 to 400 sec).Foreignfiling_text_P25-178-SEC-W001_20260414

[0274] - 35 -

[0275] As a more preferable embodiment of this invention, the arranged droplets in the step (i-1 ) are heated for one or more partial durations of the step (i-2) or throughout the step (i-2).

[0276] 5

[0277] As a furthermore preferable embodiment of the present invention, the heating temperature is 30 to 200°C (preferably 50 to 180°C).

[0278] The heating of the step (i-2) may be conducted in an oxygen gas atmosphere, atmospheric air, or an atmosphere of an inert gas such as nitrogen. When heating is performed by multiple steps, the steps may be conducted under different atmospheric conditions.

[0279] In the present invention, the oxygen gas atmosphere means that the partial pressure of the oxygen gas is 0.5 to 1 times the total pressure. In the present invention, the nitrogen gas atmosphere means that the partial pressure of the nitrogen gas is 0.5 to 1 times the total pressure.

[0280] - Step (iv)

[0281] The method according to the present invention may further comprise the following step (iv) just after the step (iii);

[0282] (iv) heating the irradiated composition.

[0283] The heating temperature of the step (iv) is preferably 60 to 1,000°C (more preferably 70 to 750°C; further preferably 80 to 600°C; further more preferably 90 to 500°C).

[0284] The heating duration of the step (iv) is preferably 20 to 400 sec (more preferably 40 to 300sec; further preferably 60 to 200sec; further more preferably 80 to 150sec).

[0285] 30

[0286] - Steps (v), (vi)

[0287] The method according to the present invention may further comprise the following step (v) or (vi);Foreignfiling_text_P25-178-SEC-W001_20260414

[0288] - 36 -

[0289] (v) releasing the superstrate from the composition.

[0290] (vi) releasing the substrate from the composition.

[0291] 5 In the step (v), the way of releasing the superstrate from the composition is not limited, unless the step (v) does not physically damage any portion of the cured film manufactured by above mentioned method. As one embodiment of this invention, the substrate is fixed and the superstrate is carefully moved away from the composition in the step (v).

[0292] In the step (vi), the way of releasing the substrate from the composition is not limited, unless the step (vi) does not physically damage any portion of the cured film manufactured by above mentioned method.

[0293] As one embodiment of the present invention, the superstrate is fixed and the substrate is carefully removed away from the cured film in the step (vi).

[0294] Steps (v) or (vi) may be performed any time after the step (iii) is performed.

[0295] - Step (vii)

[0296] The method according to the present invention may further comprise the following step (vii) just after the step (v) or (vi);

[0297] (vii) heating the irradiated composition.

[0298] The heating temperature of the step (vii) is preferably 150 to 1,000°C (more preferably 200 to 950°C; further preferably 250 to 900°C; further more preferably 300 to 850°C).

[0299] The heating duration of the step (vii) is 30 to 1,800sec (more preferably 40 to 1,500sec; further preferably 50 to 1,200sec; further more preferably 60 to 900sec).

[0300] 30

[0301] - Method of manufacturing a device

[0302] In another aspect, the present invention also relates to a method of manufacturing a device comprising the following steps (I) and (II);Foreignfiling_text_P25-178-SEC-W001_20260414

[0303] - 37 -

[0304] (I) forming a cured film by the method of this invention;

[0305] (II) processing the substrate.

[0306] 5 The device manufactured by the method is preferably a semiconductor device.

[0307] The step (II) may comprise one or more etching processes to transfer a relief image into the substrate. The relief image corresponds to the pattern in the patterned layer or an inverse of that pattern. The step (II) may further comprise processes selected from one or more members of the group consisting of inspection, layer formation, deposition, doping, etching, formable material removal, dicing, bonding, packaging, mounting and circuit board assembly.

[0308] [Use of a composition for inkjet adaptive planarization]

[0309] In another aspect, the present invention also relates to use of a composition for inkjet adaptive planarization.

[0310] The detail of the composition is described in above.

[0311] - Woking examples

[0312] The present invention is described below with reference to several examples. The embodiment of the present invention is not limited only to these examples.

[0313] Synthesis example of compound (A1)

[0314] 500g of 1,3-dibromo-5-[(3-bromophenyl)methyl]benzene, 565g of potassium vinyltrifluoroborate and 1.3g of bis-(di-tert-butyl-(4-dimethylaminophenyl)- phosphin)-dichloro-palladium(ll) are dissolved in 4.3L of tetrahydrofuran. The mixture is heated up to 50 °C. 1.19L of 50% sodium hydroxide aqueous 30 solution is added dropwise. The mixture is stirred overnight at 50 °C. 2.6 L of n-heptane and 14.9 L of water are added. The aqueous phase is separated. A solution of 99.2g of N-acetylcysteine and 3.3L of water is added to the organic layer. The mixture is heated up to 40 °C and stirred for 1 h. The aqueous phaseForeignfiling_text_P25-178-SEC-W001_20260414

[0315] is separated. The organic phase is fritted over aluminum oxide. The solvent of the obtained filtrate is removed under vacuum at 40°C. 271.4g of the compound (A1) is obtained. The compound (A1) is 1,3-diethenyl-5-[3- 5 ethenylphenylmethyl] benzene. Its structure is as below.

[0316]

[0317] Preparation of comparative example composition 11

[0318] Solid components mixture is prepared as adding Irgacure OXE02 (as a photo initiator (C)) to the compound (A1 ). OXE02 is added 6.0 mass parts comparing to 100 mass parts as the total weight of the compound (A1). Then, Toluene is added to the solid components mixture, up to 3.8 mass% of solvent (S) based on whole mass% of the resultant composition. The solution is stirred overnight. Then, comparative example composition 11 is obtained.

[0319]

[0320] Preparations of comparative example composition 12-14, and working example composition 11 to 16

[0321] Compositions are prepared by the same manner as described in the Preparation of comparative example composition 11, except for components 30 and amounts are changed as described in Table 1. Except for solvent, each amount of additives is based on mass parts comparing to 100 mass parts of the compound (A1). Amounts of solvent is described as solvent% in the TableForeignfiling_text_P25-178-SEC-W001_20260414

[0322] 1. Solid% means the sum of mass amount of components other than solvent in the composition.

[0323] 5 Table 1

[0324]

[0325] In the above Table 1, each of C means that the composition is a comparative example, and each of W means that the composition is a working example. For example, C11 means a comparative example composition 11. Unless specifically described, same applies to the shorten characters in following Tables.

[0326]

[0327] 2,2,6,6-Tetramethylpiperidine 1-Oxyl Free Radical (described as TEMPO, Tokyo Chemical Industry, hereinafter referred as TCI)

[0328] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0329] 5

[0330]

[0331] 4-tert-Butylpyrocatechol (described as tBC, TCI)

[0332]

[0333] Non free radical type polymerization inhibitor (described as HA1, TCI)

[0334]

[0335] Hindered amine. Non free radical type polymerization inhibitor (described as HA2, TCI)

[0336] Evaluation of surface tension

[0337] The surface tension of each composition is measured by the contact angle meter DMo-701 (Kyowa Interface Science). The surface tension is determined using the pendant drop method as below. 6 pl of a composition is extruded from the tip of a vertical capillary tube, creating a droplet suspended at the tip of the tube. After confirming that the created droplet is stable, the contour shape and density difference values of this droplet are processed using the analysis software " FAMAS" to fit the Young-Laplace equation and calculate the surface tension. The density is measured by the density meter (DMA 30

[0338] 5000M or SVM 3001, Anton Paar GmbH). All measurements are conducted at 23 ± 0.5°C. Additionally, the surface tension is measured three times for theForeignfiling_text_P25-178-SEC-W001_20260414

[0339] droplet, and the final value is the average of these measurements. The results are shown in Table 2.

[0340] Table 2

[0341] 5

[0342]

[0343] Units for each figure of surface tension is (mN / m). Units for each figure of viscosity is [mPa·s]. Same applies for following examples and following Tables, unless specifically explained.

[0344] Measurement of viscosity

[0345] The viscosity of each composition is measured by Cannon-Fenske Routine capillary viscometer (Industrial Research Glassware). The composition is measured at 8 ml with a glass pipette and loaded into a capillary viscometer of size 150. The solution temperature is maintained at 23°C. The viscometer is placed into the holder vertically and inserted into the waterbath. The efflux time is measured by allowing the solution to flow freely down past marks. The kinematic viscosity of liquid sample in centistokes is calculated by multiplying the efflux time in seconds by the viscometer constant (0.035).

[0346] Viscosity evaluations of initial compositions

[0347] Soon after composition are prepared, each of its viscosity is measured as 30 described “Measurement of viscosity”. The results are described in Table 2.

[0348] 2 weeks acceleration testForeignfiling_text_P25-178-SEC-W001_20260414

[0349] - 42 -

[0350] 9mL of each composition is added into a TS Screw Tube Bottle No.4 13.5mL ((φ14.5×φ24×50 mm, Clear, Purchased by Maruemu Corp.), and securely sealed. The tube is placed into a light-blocking bag to prevent 5 exposure to light. The sample is stored in the hot air dryer at 40°C for 2 weeks.

[0351] Gelatinization evaluation

[0352] After the “2 weeks acceleration test”, each TS Screw Tube Bottle is inverted to visually evaluate the stability based on the state change of the internal composition. Criteria follows.

[0353] A: The composition flows and completely moves to the bottom within 5 seconds. It is deemed to be in a liquid state with flowability.

[0354] B: Between A and C, meaning not evaluated as A nor C.

[0355] C: The composition does not move from the top to the bottom even after waiting for more than 30 seconds, or if only a portion of the composition moves to the bottom. It is classified as a gelled state.

[0356] The results are described in Table 2.

[0357] Viscosity evaluations of compositions accelerated 2 weeks

[0358] After the “2 weeks acceleration test”, each composition is measured its viscosity, otherwise the composition is rated as C in “Gelatinization evaluation”. Measurements are done in same manner described in “Viscosity evaluations of initial compositions”. When a composition is gelatinized, its viscosity becomes too huge to measure. Measured figures are described in Table 2. Each composition is evaluated by following criteria.

[0359] A: Viscosity is in the range of 18 to 23 mPa·s.

[0360] B: Viscosity is out of the range of 18 to 23 mPa·s.

[0361] Evaluated results are described in Table 2.

[0362] 30

[0363] 4 weeks acceleration testForeignfiling_text_P25-178-SEC-W001_20260414

[0364] - 43 -

[0365] Following acceleration is conducted, as same manner described in “2 weeks acceleration test” except for changing the duration from 2 weeks to 4 weeks, otherwise the composition is rated as C in “Gelatinization evaluation”. 4 weeks 5 samples do not re-use 2 weeks samples, but are accelerated from initial.

[0366] Viscosity evaluations of compositions accelerated 4 weeks

[0367] After the “4 weeks acceleration test”, each composition is measured its viscosity and evaluated same manner described in “Viscosity evaluations of compositions accelerated 2 weeks”. Measured figures and evaluation results are described in Table 2.

[0368] Total evaluation

[0369] As the total evaluation, each composition is evaluated as below criteria.

[0370] AA: Gelatinization is evaluated as A. Both viscosities of 2w and 4 are evaluated as A.

[0371] A: Gelatinization is evaluated as A. The viscosity of 2w is evaluated as A, and the one of 4w is evaluated as B.

[0372] B: Gelatinization is evaluated as A. Other than evaluation A and B in this criteria.

[0373] C: Gelatinization is evaluated as B or C.

[0374] Preparations of comparative example composition 21-23, and working example composition 21 to 26

[0375] Compositions are prepared by the same manner as described in the “Preparations of comparative example composition 12-14, and working example composition 11 to 16”, except for components and amounts are changed as described in Table 3.

[0376] 30

[0377] Table 3

[0378]

[0379] Foreignfiling_text_P25-178-SEC-W001_20260414

[0380] 5

[0381]

[0382] Evaluations of comparative example composition 21-23, and working example composition 21 to 26

[0383] Evaluations are done for comparative example composition 21-23, and working example composition 21 to 26, same manner to each procedures and criteria described in above. Results are described in Table 4.

[0384] Table 4

[0385]

[0386] Preparations of working example composition 31 to 33

[0387] Compositions are prepared by the same manner as described in the 30

[0388] “Preparations of comparative example composition 12-14, and working example composition 11 to 16”, except for components and amounts are changed as described in Table 5.Foreignfiling_text_P25-178-SEC-W001_20260414

[0389] Table 5

[0390] 5

[0391]

[0392] TG-10 is a shorten name of Nikkacure TG-10, which is a photo initiator. Purchased from Nippon Chemical Works.

[0393] Evaluations of working example composition 31 to 33

[0394] Evaluations are done for working example composition 31 to 33, same manner to each procedures and criteria described in above. Results are described in Table 6.

[0395] Table 6

[0396]

[0397] Preparations of working example composition 41 to 45

[0398] Compositions are prepared by the same manner as described in the 30 “Preparations of comparative example composition 12-14, and working example composition 11 to 16”, except for components and amounts are changed as described in Table 7.Foreignfiling_text_P25-178-SEC-W001_20260414

[0399]

[0400] 30Foreignfiling_text_P25-178-SEC-W001_20260414

[0401] - 47 -

[0402] Evaluations of working example composition 41 to 45

[0403] Evaluations are done for working example composition 31 to 33, same manner 5 to each procedures and criteria described in above. Results are described in Table 7.

[0404] 30

Claims

Foreignfiling_text_P25-178-SEC-W001_20260414Claims5 1. An inkjet adaptive planarization composition comprising an organic compound (A), and a free radical polymerization inhibitor (B).

2. The composition according to claim 1, wherein the free radical polymerization inhibitor (B) comprises a “N-O*” structure.

3. The composition according to claim 1 or 2, wherein the free radical polymerization inhibitor (B) is an anion represented by formula (B), or its salt;Formula (B)wherein RB1, RB2, RB5, RB6, RB7, RB8, RB9, RB10, RB11 and RB12 are each independently H, C1-10 alkyl, or C6-12 aryl;RB3 and RB4 are each independently H, C1-10 alkyl, or C6-12 aryl;one or more of -CH2- in the alkyl of RB1, RB2, RB3, RB4, RB5 or RB6 may be replaced by -O-, -C(=O)-, -C(=O)-O-, or -C(=O)-NRB7-;one or more of H in the alkyl or aryl of RB1, RB2, RB3, RB4, RB5 or RB6 may be substituted with -OH, -COOH, -N(RB8)2, -N+(RB9)3, -CRB10=C(RB11)2, -C≡CRB12, -SH, or -CN;one or more of alkyl portion of RB1, RB2, RB3, RB4, RB5, or RB6 may bond to form a cyclic ring;one or more of the combination of “RBI and RB2”, “RBS and RB4”, or “RBS and RBS” may bond each other to form a cyclic ring; andone or more of carbon atom in the cyclic ring may be replaced by hetero 30atom.

4. The composition according to any one or more of claims 1 to 3,Foreignfiling_text_P25-178-SEC-W001_20260414the free radical polymerization inhibitor (B) is represented by formula (B1);RB1, RB2, RB5, RB6, RB7, RB8, RB9, RB10, RB11, and RB12 are each independently as defined in claim 3;RB3’ and RB4’ are each independently H, C1-9 alkyl, or Ce-i 1 aryl;one or more of -CH2- in the alkyl of RBI, RB2, RB3’, RB4’, RBS or RBS may be replaced by -O-, -C(=O)-, -C(=O)-O- or -C(=O)-NRB?-;15one or more of H in the alkyl or aryl of RBI, RB2, RB3’, RB4’, RBS or RBS may be substituted with -OH, -COOH, -N(RBS)2, -N+(RB9)3, -CRBIO=C(RBH)2, - C CRB12, -SH, or -CN;one or more of alkyl portion of RBI, RB2, RB3’, RB4’, RBS, or RBS may bond to form a cyclic ring;20one or more of carbon atom in the cyclic ring may be replaced by hetero atom; andnB1 and nB2 are each independently 0 or 1.

5. The composition according to any one or more of claims 1 to 4, wherein the organic compound (A) is represented by formula (A);30where XA1 and XA2 are each independently -LA2-CRA3=CH2 or -LA3-C≡CH;Foreignfiling_text_P25-178-SEC-W001_20260414LA1, LA2 and LA3 are each independently a single bond or C1-20 alkylene; RA1 and RA2 are each independently C1-20 alkyl;RA3 is H or C1-20 alkyl;5 one or more of -CH2- in RA1, RA2, RA3, LA1, LA2 or LA3 may be replaced by -O-, -S-, -SO2-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CRA4=CRA5- or -C≡C-; RA4 and RAS are each independently H or C1-10 alkyl;one or more H in the alkyl of RA1, RA2, RA3, LA1, LA2 or LA3 may be substituted with -OH or -COOH;mA1, mA2, nA1, and nA2 are each independently a number of 0 to 5;nA3=0 or 1;mA1+mA2>0; andwhen nA3=0, mA2 = nA2 =0.

6. The composition according to any one or more of claims 1 to 5, further comprising a photo initiator (C); whereoptionally the photo initiator (C) comprises a “-C=N-O-C(=O)-” structure; or optionally the photo initiator (C) is represented by formula (C);Formula (C)where LC11, and LC12 are each independently C1-20 alkylene or -NRC16-;RC11, RC12, RC13, RC14, RC15 and RC16 are each independently H, C1-20 alkyl, C6-12 aryl, C6-20 arylalkyl, or C6-20 alkylaryl;Foreignfiling_text_P25-178-SEC-W001_20260414one or more of -CH2- in the alkyl of RC11, RC12, RC13, RC14, RC15, RC16, LC11, or LC12may each independently be replaced with -O-, -S-, -SO2-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CRC17=CRC18- or -C=C-;5 XC11and XC12are each independently a single bond, -CRC19RC20-, -NRC21-, - O-, -S-, or -S(=O)-;RC17, RC18, RC19, RC20, and RC21are each independently H or C1-10 alkyl; one or more H of RC11, RC12, RC13, RC14, RC15, RC16, LC11, or LC12may each independently be substituted with -OH or -COOH;nC11and nC13are each independently a number of 0 to 5; mC12and mC13are each independently a number of 0 to 3; oC11is a number of 0 to 2; and oC12is a number of 1 to 3.

7. The composition according to any one or more of claims 1 to 6, further comprising a polymerization inhibitor (D), wherein the polymerization inhibitor (D) comprises a structure (D1);the structure (D1) is represented by formula (D1)OHRD12Formula (D1)where RD12is each independently an organic substituent;nD11is a number of 0 to 5; nD12is a number of 0 to 5; and1 ≤ (nD11+nD12) ≤ 5.

8. The composition according to any one or more of claims 1 to 7, further comprising a solvent (S); wherein the solvent (S) comprises an organic solvent (S1);optionally the organic solvent (S1) comprises at least one selected from the 30group consisting of an aromatic hydrocarbon solvent, an ester solvent, a ketone solvent, an ether solvent, and an alcohol solvent.Foreignfiling_text_P25-178-SEC-W001_20260414- 52 -9. The composition according to any one or more of claims 1 to 8, wherein the content of the organic compound (A) based on the composition is 30 to 98 mass%; or5 the content of the free radical polymerization inhibitor (B) based on the organic compound (A) is 0.001 to 20 mass%;optionally the content of the photo initiator (C) based on the organic compound (A) is 0.01 to 30 mass%;optionally the content of the polymerization inhibitor (D) based on the organic compound (A) is 0.001 to 20 mass%;optionally the content of the solvent (S) based on the organic compound (A) is 0.01 to 40 mass%; oroptionally the content of the organic solvent (S1 ) based on the solvent (S) is 80 to 100 mass%.

10. The composition according to any one or more of claims 1 to 9, further comprising a surfactant (E), a photo initiator (F), or additive (G); wherein the additive (G) is selected from at least one of the group consisting of wetting agents, release agents, oxygen quenchers, stabilizers, photosensitizer, adhesion promoter, peeling agent, and reactive diluent; optionally the content of the surfactant (E) based on the organic compound (A) is 0.01 to 30 mass%;optionally the content of the photo initiator (F) based on the organic compound (A) is 0.01 to 30 mass%; oroptionally the content of the additive (G) based on the organic compound (A) is 0.01 to 30 mass%.

11. The composition according to any one or more of claims 1 to 10, wherein the composition comprises an acrylate monomer 10 mass% or less based on 30 the composition; orthe composition comprises a methacrylate monomer 10 mass% or less based on the composition.Foreignfiling_text_P25-178-SEC-W001_20260414- 53 -12. The composition according to any one or more of claims 1 to 11, wherein the viscosity of the composition is 1 to 25mPa·s; orthe surface tension of the composition is 25 to 45 mN / m.

513. The composition according to any one or more of claims 1 to 12, wherein the viscosity of the composition after stored at 40 °C for 2 weeks is less than 27 mPa·s;the viscosity of the composition after stored at 40 °C for 4 weeks is less than 27 mPa·s;the viscosity of the composition after stored at 40 °C for 2 weeks comparing to the initial is 95 to 130%; orthe viscosity of the composition after stored at 40 °C for 4 weeks comparing to the initial is 95 to 150%.

14. A method of forming a cured film comprising the following steps (i-1 ), (ii) and (iii) in the following order;(i-1) arranging droplets of the inkjet adaptive planarization composition according to one or more of claims 1 to 13 above a substrate by an inkjet method;(ii) bringing the composition into contact with a superstrate;(iii) irradiating the composition with light to polymerize the organic compound (A).

15. The method of forming a cured film according to claim 14,wherein the wavelength of the light in the step (iii) is 150 to 450nm.

16. The method of forming a cured film according to claim 14 or 15, wherein the exposure during the light irradiation in the step (iii) is 10 to 30 40,000mJ / cm2.

17. The method of forming a cured film according to any one of claims 14 toForeignfiling_text_P25-178-SEC-W001_20260414- 54 -wherein the method further comprises the following step (i-2) between the step (i-1) and the step (ii);(i-2) waiting for the arranged droplets to combine with their respective 5 adjacent droplets to form a continuous liquid film on the substrate;whereinoptionally the duration of the step (i-2) is 0.1 to 600 sec.

18. The method of forming a cured film according to claim 17,wherein the arranged droplets are heated for one or more partial durations of the step (i-2) or throughout the step (i-2);whereinoptionally the duration of the heating is preferably 10 to 600 sec; or optionally the heating temperature is preferably 30 to 200°C.

19. The method of forming a cured film according to any one of claims 14 to 18,wherein the method further comprises the following step (iv) after the step (iii);(iv) heating the irradiated composition;optionally the heating temperature is 60 to 1,000°C; oroptionally the heating duration is 20 to 400sec.

20. A method of manufacturing a device comprising(I) forming a cured film according to one or more of claims 14 to 19; and (II) processing the substrate;wherein optionally the device is a semiconductor device.30

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