Cryopump and method for controlling same

Abstract

A cryopump according to one embodiment of the present disclosure comprises: a cryocooler for cooling a stage part by using a high-pressure refrigerant; a second-stage panel, which is cooled by means of the stage part and includes at least one array; a first-stage panel including a radiation shield, which is thermally connected to the stage part and encompasses the second-stage panel and the stage part, and a fixing baffle for covering a portion of an opening of the radiation shield; and a cryopump container encompassing a cryopanel and having one side to which the cryocooler is coupled, wherein the size of an open area in the opening of the radiation shield is variable.

Description

Cryopump and method for controlling the same

[0001] The present disclosure relates to a cryo pump for cooling a cryo panel and a method for controlling the same.

[0002] Cryopumps are used as equipment to vacuum chambers where workpieces are located in manufacturing processes for OLED displays, semiconductors, and IT devices. Cryopumps include cryogenic chillers to cool cryopanels, and GM (Gifford-McMahon) chillers, which are designed for high-vacuum cryopumps, are primarily used. Since cryopumps exhaust process gases through condensation and adsorption processes, ultra-low surface temperatures and vapor pressure have a significant impact on exhaust performance. In particular, the speed at which moisture is removed from the interior determines the operational performance of the cryopump.

[0003] FIGS. 1a and 1b are schematic diagrams illustrating the operating state of a cryo pump (C) according to the prior art.

[0004] Referring to FIGS. 1a and 1b, the cryo pump (C) performs an exhaust operation as a low vacuum pump (dry pump, rotary pump) from atmospheric pressure (1 atm) to 1E-2 Torr, and operates as a cryo pump at 1E-2 Torr or lower. In this process, the cryo pump (C) has a vacuum state between 1E-2 Torr and 1E-10 Torr in which moisture (V) in the gas accounts for about 99% or more.

[0005] Here, in order to increase the exhaust speed of the cryo pump (C), the opening area (opening) excluding the baffle (B) must be increased when having the same inlet diameter.

[0006] As illustrated in FIG. 1a, when the baffle (B) is reduced to increase the opening of the cryo pump (C), the size of the array (A) that the baffle must protect from external gas is also reduced, and as the likelihood of moisture (V) condensing on the array (A) where moisture (V) should not condense increases, the exhaust capacity of the process gas (G) is consequently reduced.

[0007] On the other hand, as illustrated in FIG. 1b, if the baffle (B) is expanded to reduce the opening of the cryo pump (C), the exhaust speed of the moisture (V) increases, and the probability of the moisture (V) condensing on the array (A) decreases. However, as the opening decreases, a problem arises in that the exhaust speed of the process gas (G) decreases.

[0008] One objective of the present disclosure is to provide a cryopump capable of varying the size of the opening area for the opening of the radiation shield internally.

[0009] In addition, one objective of the present disclosure is to increase the exhaust rate of moisture and reduce moisture condensation on the array by varying the opening area of ​​the radiation shield opening inside the cryo pump, while simultaneously increasing the exhaust capacity of the process gas.

[0010] However, the technical problems that this embodiment aims to solve are not limited to the technical problems described above, and other technical problems may exist.

[0011] A cryo pump according to one embodiment of the present disclosure comprises: a cryogenic refrigerator configured to cool a stage portion using a high-pressure refrigerant; a two-stage panel cooled by the stage portion and comprising at least one array; a first-stage panel thermally connected to the stage portion and comprising a radiation shield surrounding the two-stage panel and the stage portion, and a fixed baffle covering a portion of the opening of the radiation shield; and a cryo pump vessel surrounding the cryo panel and coupled to the cryogenic refrigerator on one side, wherein the size of the open area at the opening of the radiation shield may be variable.

[0012] A method for controlling a cryopump according to one embodiment of the present disclosure may include a process of reducing the size of the open area to increase the exhaust of moisture during the initial vacuum evacuation of the cryopump, and a process of expanding the size of the open area to increase the exhaust of process gas after reaching the lowest pressure of the cryopump.

[0013] According to one embodiment of the present disclosure, a cryo pump can achieve high efficiency and high reliability under various operating conditions by solving the conflict between array protection and exhaust performance through a structure that can variably adjust the opening area of ​​the opening of the radiation shield.

[0014] In addition, according to one embodiment of the present disclosure, the opening of the radiation shield is reduced during the initial vacuum evacuation of the cryo pump to maximize the moisture evacuation rate and effectively prevent moisture from condensing on the array, thereby improving the evacuation efficiency.

[0015] In addition, according to one embodiment of the present disclosure, by expanding the opening of the radiation shield after the lowest pressure reached by the cryopump to maximize the exhaust capacity and velocity of the process gas, it is possible to prevent performance degradation that may occur during process gas discharge and provide a stable process environment.

[0016] FIGS. 1a and 1b are schematic diagrams illustrating the operating state of a cryopump according to the prior art.

[0017] FIG. 2 is a configuration diagram of a cryo pump according to one embodiment of the present disclosure.

[0018] FIG. 3 is an enlarged view of the radiation shield and open area of ​​a cryo pump according to one embodiment of the present disclosure.

[0019] FIG. 4 is a schematic diagram illustrating the operating state of a cryopump during initial vacuum evacuation according to one embodiment of the present disclosure.

[0020] FIG. 5 is a schematic diagram illustrating the operating state of a cryo pump after the lowest reached pressure according to one embodiment of the present disclosure.

[0021] FIG. 6a is a schematic diagram of an operating mechanism according to a first embodiment of the present disclosure.

[0022] Fig. 6b is an enlarged view of area A of Fig. 6a.

[0023] FIG. 6c illustrates the closed and open states of a variable baffle according to the first embodiment of the present disclosure.

[0024] FIG. 6d is an enlarged view of a motor according to a first embodiment of the present disclosure.

[0025] FIG. 6e is an enlarged view of a pulley according to a first embodiment of the present disclosure.

[0026] FIG. 7a is a schematic diagram of an operating mechanism according to a second embodiment of the present disclosure.

[0027] FIG. 7b is a perspective view of an operating mechanism according to a second embodiment of the present disclosure.

[0028] FIG. 7c illustrates the closed and open states of a variable baffle according to a second embodiment of the present disclosure.

[0029] FIG. 8a is a schematic diagram of an operating mechanism according to a third embodiment of the present disclosure.

[0030] Figure 8b is an enlarged view of area B of Figure 8a.

[0031] FIG. 8c illustrates the closed and open states of a variable baffle according to the third embodiment of the present disclosure.

[0032] Embodiments of the present invention are described below with reference to the attached drawings so that those skilled in the art can easily implement them. However, the present invention may be embodied in various different forms and is not limited to the embodiments described herein. Furthermore, in order to clearly explain the present invention in the drawings, parts unrelated to the explanation have been omitted, and similar parts throughout the specification are denoted by similar reference numerals.

[0033] Throughout this specification, when a component is described as being located "on" another component, this includes not only cases where a component is in contact with another component, but also cases where another component exists between the two components.

[0034] Throughout this specification, when a part is described as "comprising" a certain component, this means that, unless specifically stated otherwise, it does not exclude other components but may include additional components.

[0035] Throughout this specification, terms of degree such as “about,” “substantially,” etc., are used to mean at or near the stated value when inherent manufacturing and material tolerances are presented in the stated meaning, and are used to prevent unscrupulous infringers from unfairly exploiting the disclosure in which precise or absolute values ​​are mentioned to aid in understanding this specification. Throughout this specification, terms of degree such as “step” or “step of” do not mean “step for”.

[0036] Throughout this specification, the term “combination(s) of these” included in the Markush-type expression means one or more mixtures or combinations selected from the group consisting of the components described in the Markush-type expression, and means including one or more selected from the group consisting of said components.

[0037] Throughout this specification, the description "A and / or B" means "A or B, or A and B".

[0038] Hereinafter, embodiments and examples of the present invention will be described in detail with reference to the attached drawings. However, the present invention may not be limited to these embodiments and examples and drawings.

[0039] FIG. 2 is a configuration diagram of a cryo pump (100) according to one embodiment of the present disclosure. FIG. 3 is an enlarged view of a radiation shield (133) and an open area (300) of a cryo pump (100) according to one embodiment of the present disclosure. FIG. 4 is a schematic diagram illustrating the operating state of a cryo pump (100) during initial vacuum evacuation according to one embodiment of the present disclosure. FIG. 5 is a schematic diagram illustrating the operating state of a cryo pump (100) after reaching a minimum pressure according to one embodiment of the present disclosure.

[0040] Referring to FIGS. 2 to 5, a cryo pump (100) according to one embodiment may include a cryogenic refrigerator (110), a two-stage panel (120) including at least one array (125), a one-stage panel (130) including a radiation shield (133) and a fixed baffle (135), and a cryo pump container (140).

[0041] In one embodiment, the cryo pump (100) may be formed in a structure that surrounds the cryo panels (120, 130) and has a refrigerator (110) inserted and coupled to one side of the cryo pump container (140). In one embodiment, the cryo pump container (140) may be configured to maintain pressure hermetically as a vacuum container for isolating the inside and outside of the cryo pump (100).

[0042] In one embodiment, the cryo pump (100) may be formed in a structure in which a refrigerator (110) is inserted and coupled vertically from the side of the cryo pump container (140), or a refrigerator (110) is coupled through the bottom of the cryo pump container (140) in a direction parallel to the cryo pump container (140).

[0043] In one embodiment, the cryogenic refrigerator (110) may be configured to cool a stage section (not shown) using a high-pressure refrigerant. In one embodiment, the cryogenic refrigerator (110) includes a first stage section (not shown) and a second stage section (not shown), and may cool the first stage section (not shown) and the second stage section (not shown) using a high-pressure refrigerant.

[0044] In one embodiment, the two-stage panel (120) is cooled by a stage section (not shown) and may include at least one array (125). In one embodiment, the two-stage panel (120) may be cooled by a two-stage section (not shown).

[0045] In one embodiment, the first stage panel (130) is thermally connected to the first stage section (not shown) and may include a radiation shield (133) and a fixed baffle (135).

[0046] In one embodiment, the radiation shield (133) may be thermally connected to a stage portion (not shown) and may have a shape that surrounds a two-stage panel (120) and a stage portion (not shown). In one embodiment, the radiation shield (133) may have an opening formed on one side.

[0047] In one embodiment, the fixed baffle (135) is connected to the radiation shield (133) and can cover a portion of the opening of the radiation shield (133). In one embodiment, the fixed baffle (135) can collect gas inside the cryo pump container (140) as it is cooled by the cryogenic refrigerator (110) and its temperature drops below a certain temperature.

[0048] In one embodiment, a two-stage panel (120) composed of at least one array (125) can capture gases (G) such as argon, nitrogen, and oxygen, and a one-stage panel (130) including a radiation shield (133) and a fixed baffle (135) can capture moisture (V). Additionally, activated carbon is provided on the outer surface of a two-stage section (not shown) to further capture gases (e.g., hydrogen, helium, neon) that were not captured by the one-stage panel (130) and the two-stage panel (120).

[0049] In one embodiment, the size of the open area (300) in the opening of the radiation shield (133) may be variable. For example, the opening of the radiation shield (133) may be partially covered by a fixed baffle (135), and the area in the opening of the radiation shield (133) that is not covered by the fixed baffle (135) may be the open area (300). Here, the open area (300) may be an area that is open so that gas (G) or moisture (V) can pass through the opening of the radiation shield (133).

[0050] A cryo pump (100) according to one embodiment may further include a variable baffle (137) configured to selectively cover at least a portion of the open area (300) of the opening of the radiation shield (133).

[0051] In one embodiment, the variable baffle (137) can expand or contract the opening of the open area (300) by selectively covering at least a portion of the open area (300) by moving or rotating.

[0052] In one embodiment, the size of the open area (300) may be reduced to increase the exhaust of moisture during the initial vacuum exhaust of the cryo pump (100). For example, the degree of opening of the open area (300) may be reduced by selectively covering (closing) at least a portion of the open area (300) with a variable baffle (137).

[0053] In one embodiment, the size of the open area (300) may be expanded to increase the exhaust of the process gas after reaching the lowest pressure of the cryo pump (100). For example, the degree of opening of the open area (300) may be reduced by selectively removing (opening) the variable baffle (137) from at least a portion of the open area (300).

[0054] In one embodiment, the fixed baffle (135) may be positioned in the center of the opening of the radiation shield (133). In one embodiment, the fixed baffle (135) may be installed in the opening of the radiation shield (133) to cover a portion of the opening of the radiation shield (133). In one embodiment, the fixed baffle (135) may be positioned in the center of the opening of the radiation shield (133) to cover the center of the opening, and an open area (300) may be formed on the outer side of the fixed baffle (135).

[0055] In one embodiment, the variable baffle (137) may be installed on the outside of the fixed baffle (135) and configured to selectively cover a portion of the open area (300) as it moves or rotates.

[0056] In one embodiment, the variable baffle (137) has a shape that extends in a planar direction, and one end may be rotatably coupled to the radiation shield (133). In one embodiment, the variable baffle (137) may be formed in multiple numbers and arranged to be spaced apart from each other in a circumferential direction on the outside of the fixed baffle (135).

[0057] In one embodiment, the variable baffle (137) may be rotatably coupled to a fixed part (310) fixed to the radiation shield (133). In one embodiment, the fixed part (310) may be configured to be integrally coupled to the radiation shield (133) and may partially cover the opening of the radiation shield (133). In one embodiment, the fixed part (310) may have a shape that complements the inner end (e.g., arc shape) of the radiation shield (133) and the outer end (e.g., straight shape) of the variable baffle (137). As described below, the variable baffle (137) may be rotatably coupled to the fixed part (310) through a hinge member (e.g., a hinge structure, etc.).

[0058] In another embodiment, the variable baffle (137) has a shape that extends in a planar direction, and one end may be coupled to the radiation shield (133) so as to be movable relative to it.

[0059] A cryo pump (100) according to one embodiment may further include an operating mechanism (160) configured to selectively rotate a variable baffle (137). In one embodiment, the operating mechanism (160) may be implemented with various mechanisms.

[0060] A cryo pump (100) according to one embodiment may further include a controller (150) including at least one processor (153) and at least one memory (157) including computer program code.

[0061] In one embodiment, at least one memory (157) and computer program code can be configured so that the controller (150) varies the size of the open area (300) based on the operating state of the cryo pump (100) through at least one processor (153).

[0062] In one embodiment, the controller (150) may reduce the size of the open area (300) to increase the exhaust of moisture during the initial vacuum exhaust of the cryo pump (100). In one embodiment, the controller (150) may control the operating mechanism (160) so that the variable baffle (137) selectively covers (closes) at least a portion of the open area (300).

[0063] As illustrated in FIG. 4, the cryo pump (100) can increase the exhaust rate of moisture (V) and prevent condensation of moisture (V) in at least one array (125) by selectively covering (closing) at least a portion of the open area (300) during initial vacuum exhaust by the variable baffle (137).

[0064] In one embodiment, the controller (150) may expand the size of the open area (300) to increase the exhaust of the process gas after reaching the lowest pressure of the cryo pump (100). In one embodiment, the controller (150) may control the operating mechanism (160) to selectively remove (open) the variable baffle (137) from at least a portion of the open area (300).

[0065] As illustrated in FIG. 5, after the cryo pump (100) reaches the lowest pressure, the exhaust speed and exhaust capacity of the process gas (G) can be increased by selectively removing (opening) at least a portion of the open area (300) through the variable baffle (137).

[0066] FIG. 6a is a schematic diagram of an operating mechanism (160) according to a first embodiment of the present disclosure. FIG. 6b is an enlarged view of area A of FIG. 6a. FIG. 6c illustrates the closed state and open state of a variable baffle (137) according to a first embodiment of the present disclosure. FIG. 6d is an enlarged view of a motor (620) according to a first embodiment of the present disclosure. FIG. 6e is an enlarged view of a pulley (630) according to a first embodiment of the present disclosure.

[0067] Referring to FIGS. 6a to 6e, the operating mechanism (160) according to the first embodiment may include a wire (610) having one end connected to a variable baffle (137) at a position spaced apart from one end, a motor (620) connected to the other end of the wire (610) and configured to wind or unwind the wire (610), and a pulley (630) positioned between the variable baffle (137) and the motor (620) and configured to support the wire (610).

[0068] In one embodiment, one end of the variable baffle (137) is rotatably coupled to the radiation shield (133), and one end of the wire (610) can be coupled to the variable baffle (137) at a position spaced apart from one end of the variable baffle (137).

[0069] In one embodiment, the variable baffle (137) can be rotatably coupled to the variable baffle (137) through a hinge member (640), such as a hinge structure.

[0070] In one embodiment, the variable baffle (137) may be rotated downward along the direction of gravity by its own weight. For example, as the variable baffle (137) is rotated downward along the direction of gravity, at least a portion of the open area (300) may be selectively covered (closed).

[0071] In one embodiment, the variable baffle (137) may be provided with a weight (660) that rotates the variable baffle (137) downward along the direction of gravity by gravity.

[0072] In one embodiment, the wire (610) may apply tension so that the variable baffle (137) rotates upward in the direction of gravity with respect to the radiation shield (133). In one embodiment, the variable baffle (137) may rotate upward in the direction of gravity by the tension of the wire (610). For example, as the variable baffle (137) rotates upward in the direction of gravity, at least a portion of the open area (300) may be selectively opened (open state).

[0073] In one embodiment, the motor (620) is connected to the other end of the wire (610) and can wind or unwind the wire (610) as it operates selectively. In one embodiment, the motor (620) may be positioned inside the cryo pump container (140) and outside the radiation shield (133). In one embodiment, a feedthrough (145) may be formed in the cryo pump container (140) through which at least a portion is penetrated to supply power to the motor (620).

[0074] In one embodiment, the motor (620) is composed of plates spaced apart from each other and is fixed through a support structure (625) that is fixedly coupled (bolted) to the cryo pump container (140) or radiation shield (133) so as to rotate the rotation axis.

[0075] In one embodiment, the pulley (630) may be configured to be positioned between the variable baffle (137) and the motor (620) to support the wire (610). In one embodiment, the pulley (630) may support the wire (610) so as to be rotatable by the movement of the wire (610) and may change the direction of the tension acting on the wire (610).

[0076] In one embodiment, the pulley (630) is composed of plates spaced apart from each other and can be rotated by being fixed through a support structure (635) that is fixedly coupled (bolted) to the cryo pump container (140) or radiation shield (133).

[0077] In one embodiment, a support (650) configured to prevent rotation of the variable baffle (137) relative to the radiation shield (133) at a preset angle may be formed in the radiation shield (133).

[0078] In one embodiment, the support member (650) is fixedly coupled to the radiation shield (133) or the fixed part (310) fixed to the radiation shield (133), so as to prevent the upward rotation of the variable baffle (137) in the direction of gravity due to the tension of the wire (610) at a preset angle. Accordingly, stability and reliability regarding the opening / closing of the variable baffle (137) can be ensured.

[0079] In one embodiment, the support members (650) are provided in a plurality of spaced-apart units to stably support the variable baffle (137).

[0080] FIG. 7a is a schematic diagram of an operating mechanism (160) according to a second embodiment of the present disclosure. FIG. 7b is a perspective view of an operating mechanism (160) according to a second embodiment of the present disclosure. FIG. 7c illustrates the closed state and open state of a variable baffle (137) according to a second embodiment of the present disclosure.

[0081] Referring to FIGS. 7a to 7c, the operating mechanism (160) according to the second embodiment may include a support member (710) having one end rotatably coupled to a variable baffle (137) at a position spaced apart from one end, a moving member (720) having the other end of the support member (710) rotatably coupled, and a motor (730) configured to move the moving member (720) in a straight direction.

[0082] In one embodiment, the support member (710) may be extended in the longitudinal direction and may have a rigidity capable of supporting a compressive force of a certain level or higher.

[0083] In one embodiment, the moving member (720) may apply tension to the supporting member (710) while moving in one direction (downward) so that the variable baffle (137) rotates in a first direction (downward according to the direction of gravity) with respect to the radiation shield (137). In one embodiment, the variable baffle (137) may rotate downward according to the direction of gravity by the tension on the supporting member (710).

[0084] In one embodiment, the moving member (720) may apply a compressive force to the supporting member (710) while moving in the other direction (upward) so that the variable baffle (137) rotates in a second direction (upward in the direction of gravity) relative to the radiation shield (137). In one embodiment, the variable baffle (137) may rotate upward in the direction of gravity by the compressive force of the supporting member (710).

[0085] In one embodiment, one end of the support member (710) is rotatably coupled to the variable baffle (137) at a position spaced apart from one end which is the rotation axis of the variable baffle (137), and the other end of the support member (710) can be rotatably coupled to the moving member (720).

[0086] In one embodiment, one end of the support member (710) is composed of plates spaced apart from each other and can be integrally coupled with a pulley (715) rotatably coupled to a support structure (740) that is fixedly coupled (bolted) to a variable baffle (137).

[0087] In one embodiment, the other end of the support member (710) can be rotatably connected to the movable member (720) by means of a rotatable bearing (713) and welding.

[0088] In one embodiment, the support member (710) is rotated in conjunction with the movement of the moving member (720) and the other end in the vertical direction (UD) according to the direction of gravity, and accordingly, the variable baffle (137) and one end of the support member (710) can be rotated with respect to one end of the variable baffle (137).

[0089] In one embodiment, the moving member (720) can be moved in a straight direction by a motor (730). In one embodiment, the moving member (720) is connected to a rotation axis (735) of the motor (730) that extends in the up-down direction (UD), and can be moved in the up-down direction (UD) by converting the rotational motion of the rotation axis (735) according to the operation of the motor (730) into linear motion.

[0090] In one embodiment, the motor (730) and the rotating shaft (735) may be fixedly coupled to the cryo pump container (140) and the radiation shield (133). In one embodiment, the motor (730) may be coupled to the inner bottom surface of the cryo pump container (140) through the lower end of the support structure (725), and the upper end of the support structure (725) may be coupled to the inner surface of the radiation shield (133).

[0091] In one embodiment, the radiation shield (133) may be divided from each other in at least some areas, and the rotation axis (735) or support structure (725) may pass through the radiation shields (133) that are divided from each other and be fixedly connected to the cryo pump container (140) and the radiation shield (133), respectively. In one embodiment, the radiation shields (133) that are divided from each other may be fixedly connected.

[0092] FIG. 8a is a schematic diagram of an operating mechanism (160) according to a third embodiment of the present disclosure. FIG. 8b is an enlarged view of area B of FIG. 8a. FIG. 8c illustrates the closed state and open state of a variable baffle (137) according to a third embodiment of the present disclosure.

[0093] Referring to FIGS. 8a to 8c, the operating mechanism (160) according to the third embodiment may include a bending member (810) configured to selectively support a variable baffle (137) in the direction of gravity downwards at a position spaced apart from one end by rotating with respect to a fixed end, a weight (860) coupled to the bending member (810) to rotate the bending member (810) in a first direction (D1) in which the other end of the bending member (810) supports the variable baffle (137) by its own weight, a strap (850) configured to rotate the bending member (810) in a second direction (D2) opposite to the first direction (D1) as it is wound, and a motor (820) configured to wind or unwind the strap (850).

[0094] In one embodiment, the variable baffle (137) may be configured to rotate downward in the direction of gravity relative to the radiation shield (133) by its own weight. In one embodiment, the operating mechanism (160) may rotate the variable baffle (137) upward in the direction of gravity by selectively supporting the variable baffle (137) from below.

[0095] In one embodiment, the variable baffle (137) can be opened by rotating downward in the direction of gravity relative to the radiation shield (133) by its own weight. In one embodiment, the variable baffle (137) can be closed by being supported from below by the operating mechanism (160) and rotating upward in the direction of gravity.

[0096] In one embodiment, the bending member (810) may be shaped such that it extends in an up-and-down direction according to the direction of gravity and is bent in a cross direction that intersects the up-and-down direction. In one embodiment, the end portion and the other portion of the bending member (810) may be spaced apart in an up-and-down direction and in a cross direction that intersects the up-and-down direction. Accordingly, as the position of the bending member (810) is fixed based on the fixed end portion, the other portion of the bending member (810) can stably support the variable baffle (137) from below according to the direction of gravity.

[0097] In one embodiment, one end of the bending member (810) may be fixedly coupled to a pulley (815) rotatably coupled to a support structure (830) fixedly coupled (bolted) to the cryo pump container (140). In one embodiment, the one end of the bending member (810) may be fixed in position relative to the cryo pump container (140) and may only be rotatable.

[0098] In one embodiment, the other end of the bending member (810) can selectively support the variable baffle (137) from below by sliding on the variable baffle (137) by the rotation of the bending member (810). In one embodiment, the other end of the bending member (810) may be moved to a state separated from the variable baffle (137) by the rotation of the bending member (810).

[0099] In one embodiment, the other end of the bending member (810) may be provided with a friction material (813) composed of Teflon or polytetrafluoroethylene (PTFE) having a relatively low friction coefficient (e.g., 0.05 to 0.1, etc.).

[0100] In one embodiment, a weight (860) is attached to one end of the bending member (810), and the weight (860) can rotate the bending member (810) in a first direction (D1) where the other end of the bending member (810) supports the variable baffle (137) by its own weight. In one embodiment, the weight (860) can be attached at a certain distance from one end of the bending member (810).

[0101] In one embodiment, the strap (850) may selectively apply tension to the bending member (810) while being supported by the support (840) so as not to come into contact with the refrigerator (110) or the cryo pump container (140). In one embodiment, the strap (850) may apply tension to rotate the bending member (810) in a second direction (D2) by being wound by the motor (820).

[0102] In one embodiment, the length of the strap (850) can be adjusted by the operation of the motor (820). In one embodiment, the motor (820) can be configured to wind or unwind the strap (850). In one embodiment, the strap (850) can be a hose clamp whose length is adjusted by the operation of the motor (820).

[0103] In one embodiment, the strap (850) is released by the motor (820) so as not to apply tension to the bending member (810), and accordingly, the bending member (810) can be rotated in a first direction (D1) by the weight of the weight body (860).

[0104] A method for controlling a cryo pump (100) according to one embodiment may include a process of reducing the size of an open area (300) to increase the exhaust of moisture during the initial vacuum exhaust of the cryo pump (100).

[0105] A method for controlling a cryo pump (100) according to one embodiment may include a process of expanding the size of an open area (300) to increase the exhaust of process gas after reaching the lowest pressure of the cryo pump (100).

[0106] The method of controlling the cryo pump (100) described above may also be implemented in the form of a computer program stored on a computer-readable recording medium executed by a computer or in the form of a recording medium containing instructions executable by a computer. Additionally, the method of controlling the cryo pump (100) described above may also be implemented in the form of a computer program stored on a computer-readable recording medium executed by a computer.

[0107] A computer-readable recording medium may be any available medium accessible by a computer and includes both volatile and non-volatile media, and both removable and inremovable media. Additionally, a computer-readable recording medium may include a computer storage medium. A computer storage medium includes both volatile and non-volatile, removable and inremovable media implemented by any method or technique for storing information such as computer-readable instructions, data structures, program modules, or other data.

[0108] The functions realized by the components described herein may be implemented in a general-purpose processor, a specific-purpose processor, an integrated circuit, an Application Specific Integrated Circuit (ASIC), a Central Processing Unit (CPU), a circuit, and / or a combination thereof, which are programmed to realize the described functions. A processor may include transistors or other circuits and is considered to be a circuit or a processing circuit. A processor may be a programmed processor that executes a program stored in memory.

[0109] In this specification, circuits, parts, units, and means are hardware programmed to perform or execute the described functions. Such hardware may be any hardware disclosed in this specification or any hardware known to be programmed or execute the described functions.

[0110] If the hardware is a processor considered to be a circuit type, the circuit, the part, means, or unit is a combination of the hardware and the software used to constitute the hardware and / or processor.

[0111] The foregoing description of the present disclosure is for illustrative purposes only, and those skilled in the art will understand that other specific forms can be easily modified without altering the technical spirit or essential features of the present disclosure. Therefore, the embodiments described above should be understood as illustrative in all respects and not restrictive. For example, each component described as a single unit may be implemented in a distributed manner, and components described as distributed may likewise be implemented in a combined form.

[0112] The scope of the present disclosure is defined by the claims set forth below rather than by the detailed description above, and all modifications or variations derived from the meaning and scope of the claims and equivalent concepts thereof should be interpreted as being included within the scope of the present disclosure.

Claims

1. In a cryopump, A cryogenic refrigerator configured to cool the stage section using high-pressure refrigerant; A two-stage panel cooled by the above-mentioned stage and comprising at least one array; A first-stage panel thermally connected to the stage portion and comprising a radiation shield surrounding the second-stage panel and the stage portion, and a fixed baffle covering a portion of the opening of the radiation shield; and It includes a cryopump vessel surrounding the above-mentioned first-stage panel and second-stage panel, to which the cryogenic refrigerator is coupled on one side, and Characterized by the fact that the size of the open area in the opening of the above radiation shield is variable. Cryo pump.

2. In Paragraph 1, The further comprising a variable baffle configured to selectively cover at least a portion of the above-mentioned open area, Cryo pump.

3. In Paragraph 1, The size of the above-mentioned open area is reduced to increase the evacuation of moisture during the initial vacuum evacuation of the cryo pump, Cryo pump.

4. In Paragraph 1, The size of the above-mentioned open area is expanded to increase the exhaust of the process gas after the minimum pressure of the cryo pump is reached, Cryo pump.

5. In Paragraph 1, The controller further includes at least one processor and at least one memory containing computer program code, and The above at least one memory and the computer program code are configured such that, through the above at least one processor, the controller is configured to vary the size of the opening area based on the operating state of the cryo pump, Cryo pump.

6. In Paragraph 1, The above fixed baffle is positioned in the center of the opening of the radiation shield, and The variable baffle is installed on the outer side of the fixed baffle and is configured to selectively cover a portion of the open area as it moves or rotates. Cryo pump.

7. In Paragraph 6, The above variable baffle has a shape that extends in a planar direction, and one end is rotatably coupled to the radiation shield, and The further comprising an operating mechanism configured to selectively rotate the above variable baffle, Cryo pump.

8. In Paragraph 7, The above operating mechanism includes a wire, one end of which is connected to the variable baffle at a position spaced apart from the one end; a motor connected to the other end of the wire and configured to wind or unwind the wire; and a pulley disposed between the variable baffle and the motor and configured to support the wire. The above wire applies tension to the variable baffle so that the variable baffle rotates upward in the direction of gravity with respect to the radiation shield. Cryo pump.

9. In Paragraph 8, The radiation shield is formed with a support configured to prevent rotation of the variable baffle relative to the radiation shield at a preset angle. Cryo pump.

10. In Paragraph 7, The above operating mechanism includes a support member, one end of which is rotatably coupled to the variable baffle at a position spaced apart from the one end, a moving member, the other end of which is rotatably coupled to the support member, and a motor configured to move the moving member in a straight direction. The above-mentioned moving member applies tension to the supporting member while moving in one direction so that the variable baffle rotates in a first direction relative to the radiation shield, and applies compressive force to the supporting member while moving in the other direction so that the variable baffle rotates in a second direction relative to the radiation shield. Cryo pump.

11. In Paragraph 7, The above variable baffle is configured to rotate downward in the direction of gravity relative to the radiation shield due to its own weight, and The above operating mechanism comprises: a bending member configured to selectively support the variable baffle downward in the direction of gravity at a position spaced apart from the one end by rotating with respect to a fixed end; a weight coupled to the bending member to rotate the bending member in a first direction in which the other end of the bending member supports the variable baffle by its own weight; a strap configured to rotate the bending member in a second direction opposite to the first direction as it is wound; and a motor configured to wind or unwind the strap. Cryo pump.

12. In a method for controlling a cryopump according to claim 1, A process of reducing the size of the open area to increase the evacuation of moisture during the initial vacuum evacuation of the above cryo pump; and The method comprises a process of expanding the size of the open area to increase the exhaust of the process gas after reaching the minimum pressure of the cryo pump. method.

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