Controlled atmosphere chamber for laser semiconductor manufacturing apparatus

WO250382SUndetermined Publication Date: 2026-07-31II VI DELAWARE INC
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Designs
Current Assignee / Owner
II VI DELAWARE INC
Filing Date
2025-07-28
Publication Date
2026-07-31

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Abstract

The dashed broken lines in the reproductions illustrate portions of the controlled atmosphere chamber for laser semiconductor manufacturing apparatus that form no part of the claimed design; a characteristic feature of the design is that it may be for a controlled atmospheric chamber used in the field of laser processing.
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