Electric Discharge Tubes TRIZ Cases
- Plasma Processing Apparatus Edge Exclusion Reduction
Dielectric cover ring uncouples bias power to maintain constant sheath thickness, reducing edge exclusion region size for uniform etching.
- Hydrogen-Free Plasma Etching for Selective Groove Processing
Hydrogen-free plasma etching removes groove films via fluorine chemistry, avoiding side reactions and simplifying process complexity.
- Planar RF Voltage-Current Probe for High-Temperature Plasma
An alumina ceramic substrate enables the probe to survive 600°C plasma environments while maintaining measurement accuracy.
- RF Pulse Reflection Reduction in Plasma Processing
Real-time impedance matching reduces reflected power during dual-level pulsing, improving energy efficiency and chamber consistency.
- Precleaning Apparatus for Semiconductor Substrates
A precleaning apparatus uses hydrogen baking and plasma etching to prepare semiconductor substrates.
- Filament Clamp Assembly with Spring-Loaded Locking Pin
Spring-loaded locking pins compensate for thermal relaxation in ion implanters, maintaining stable electrical connections without manual adjustment.
- Axial Charged Particle Detector for Electron Beam Devices
Positioning a detection element on the objective lens optical axis enables direct capture of high-energy signal electrons without deflecting the primary beam.
- Class-D Amplifier Oscillation Absorption Circuit
An oscillation absorption circuit with RL parallel configuration connects to the power supply of a Class-D amplifier.
- Plasma Annealing Backside Substrate Heating Uniformity
Irradiates the backside of a semiconductor substrate with plasma to eliminate heating unevenness and prevent electromagnetic damage to devices.
- Connector Assembly for Flex Circuits Eliminating Mounting Brackets
A plug and receptacle connector assembly establishes direct electrical contact between terminals without separate mounting brackets or cables.
- Showerhead Shroud Faraday Cage RF Isolation
A showerhead shroud enclosure acts as a Faraday cage to contain radio frequency interference generated during substrate processing.