Halogenated Silanes TRIZ Cases
- Low-Temperature Disilane Cleavage for Safe Chloromonosilane Conversion
Ether/HCl and related promoters cleave Siemens side-product disilanes below 200°C to raise chloromonosilane yield while avoiding popping gels.
- Structure-Optimised Silicon Particles for Trichlorosilane Selectivity
By tuning silicon particle sphericity and poured density, the process improves trichlorosilane selectivity, silicon use, and reactor uptime.
- Chlorosilane Production via Controlled Impurity Silicon
Strict impurity control prevents double salt formation, resolving yield and stability trade-offs.
- Chlorosilane Purification via Aldehyde-Oxidation Distillation
Aromatic aldehydes react with oxygen to convert boron and phosphorus impurities into high-boiling compounds for easy separation.
- High-Purity Chloropolysilane Production via Copper Catalyst Mediation
Copper catalyst mediates chlorination of high-purity silicon at low temperatures, preventing reactor accumulation and enabling rapid reaction rates.
- Primary Distillation Boron Reduction in Polysilicon Production
Injecting cooled liquid trichlorosilane below the distillation tower liquid level scrubs boron impurities, achieving a 13.9 times reduction in boron ppm.
- Metallurgical Silicon TCS Selectivity via Titanium
Titanium content above 0.06 wt% in metallurgical silicon mitigates phosphorus impurities to improve trichlorosilane selectivity by 1.8 percent.
- Chlorosilane Purification via Cinnamaldehyde Impurity Conversion
Cinnamaldehyde derivatives convert donor and acceptor impurities into high-boiling substances, eliminating complex adsorption columns.
- Trichlorosilane Purification via Chlorine Disproportionation
Chlorine disproportionation converts methyldichlorosilane into methyltrichlorosilane, resolving separation difficulties caused by close boiling points.
- Chlorosilane Purification via Divided Column and Adsorber Recycle
A divided distillation column recycles bottoms through an external adsorber to remove boron, arsenic, and phosphorus impurities from chlorosilane mixtures.
- Trichlorosilane Production via Waste Gas Hydrogen Reuse
A trichlorosilane production process reuses waste gas hydrogen from condensation separation in a second reaction vessel.
- Halosilane Synthesis Selectivity Benzene Avoidance
Catalytic halide reaction with cyclic silanes yields pure diiodosilane without benzene carcinogen byproducts.
- Coupled Distillation Columns with Dividing Wall for Multicomponent Separation
A three-column configuration with a dividing wall reduces capital costs and energy expenses by mimicking complex separation tasks.
- Silicon Granules for Trichlorosilane Production
Low-dopant silicon granules reduce distillation cycles needed for trichlorosilane purification by removing impurities before reaction.
- Nitrogen Passivation of Graphite Heating Elements in STC Hydrogenation
Molecular nitrogen passivates graphite heating surfaces, preventing methanation corrosion and extending element life.
- Pentachlorodisilane Synthesis via Hexachlorodisilane Reduction
Partial reduction of hexachlorodisilane with metal hydrides yields pentachlorodisilane, lowering energy consumption compared to oligomerization.
- Pentachlorodisilane Recovery via Rapid Cooling
Rapid cooling of chlorosilane reaction gas generates pentachlorodisilane condensate, enabling 90 mass percent purity recovery.
- Hexachlorodisilane Distillation Purity Control
Controlled distillation prevents thermal decomposition and silanol formation, ensuring product stability.