Metal bumps and a relay substrate support the vibrator, eliminating resin outgassing that degrades frequency characteristics.
Groove-based degassing eliminates unstable dimension management and extended times, stabilizing hermetic sealing quality.
Protective cover prevents molding compound intrusion into resonant area, enabling copper pillar reflow bonding without frequency response alteration.
A translucent alumina ceramic supporting substrate enables visual alignment of piezoelectric layers during flip chip bonding.
Segmented silicon dioxide lamellas lower permittivity in the substrate, reducing switching losses and improving capacitive readout sensitivity.
A clamshell housing with deformable strips adapts slot width to cable diameter and flexibility for secure attachment.
Direct acoustic wave filter connection to common terminals reduces insertion loss and propagation loss without large inductors.
Merging conductor layers into a single shield portion eliminates interface degradation, maintaining shielding performance at high frequencies.
Grooves in the piezoelectric thin film adjust acoustic velocity, enabling frequency band support without altering film thickness.
Wafer scale packaging integrates single crystal acoustic resonators with copper pillar interconnects to reduce filter insertion loss and power dissipation.
A piezoelectric elastic wave device uses an interdigital transducer electrode passing through the substrate to stabilize acoustic velocity and fractional bandwidth.
An inorganic insulating layer positioned at the side of a resin layer prevents water vapor invasion and maintains high airtight sealing performance.
Multi-period arccosine apodization shapes interdigital electrode edges to accumulate capacitance while suppressing transverse modes that degrade performance.
Mutual inductance enables signal transmission across isolated die boundaries, allowing operation at different voltage levels without direct electrical contact.
A vibration device uses a high rigidity second elastic plate and mass member to maintain strong ultrasonic output in compact portable electronics.
Curved third conductors on multiple layers connect via vias to reduce electromagnetic band gap size while maintaining wave attenuation.
Varying piezoelectric layer thickness scatters horizontal vibrations to reduce acoustic noise.
Angled sidewalls confine acoustic modes in miniaturized quartz MEMS resonators, maintaining high Q factors despite fabrication variations.
Grounding the conductive side wall eliminates parasitic capacitance between signal pads, restoring propagation characteristics in surface acoustic wave filters.
A dedicated wiring space houses thick interconnects to prevent cover peeling and gap formation on acoustic wave devices.
Capacitance elements cancel distorted signals via specific gap ratios, suppressing inter-modulation distortion without increasing resonator size.
Extending adhesive layer to substrate side face prevents lid peeling during reflow heating, ensuring hermetic seal integrity under thermal stress.
A bulk acoustic wave resonator employs a stressed boundary frame to prevent crack formation and normalize crystal growth, reducing insertion loss.
A compliant elastic layer decouples thermal expansion forces from the molding compound, preventing seal-ring separation and solder joint failures.
Metal plate supports cavity on acoustic wave element to prevent misalignment and maintain strength.
A bonding layer within an elastic wave device distributes stress across stacked films to prevent warpage and fractures.
BAW resonators use fractal electrodes to suppress lateral wave propagation, improving Q factor without increasing circuitry footprint.
A flip-chip MEMS package integrates a non-evaporable getter film to maintain high vacuum conditions.
Relocating pads with an insulating layer eliminates vertical wires between the resonator and IC chip, reducing thickness while maintaining electrical coupling.
A two-layer cover structure combines a rigid first layer with a microfabricated second layer to seal hollow cavities in electronic apparatuses.
Graded inductance values suppress harmonic waves to improve isolation between band pass and elimination filters.
Segmented vibrating arms with strategic through-holes suppress deformation and stabilize resonant frequency.
Embedding the sensing element inside the resonant body eliminates insulation errors and improves measurement precision for accurate frequency stability.
A black marker composition containing borosilicate glass and black oxide provides high contrast adhesion on electronic component bodies.
Segmented hinged strips on an amorphous ribbon extend detection range to 48 inches while reducing Poisson contraction loading.
Dual-layer interdigital transducers expand fractional bandwidth while minimizing frequency variations caused by dielectric coverage.
A reinforcement electrode contacts both upper and lower connection wirings via a hole electrode, reducing electric loss caused by insufficient reinforcement.
Ion beam machining based on thickness data resolves crystallinity defects in ultrathin layers, ensuring frequency stability.
Wafer-level segmentation of packaged arrays reduces manufacturing costs and improves yields for high-frequency RF filters.
Stacked semiconductor and elastic wave devices use side electrodes to conduct heat laterally between substrates.
A semi-conducting layer diffuses pyroelectric charge to prevent polarization inversion and electrode breakage in piezoelectric devices.
A close contact layer with inclined lateral surfaces mitigates stress concentration on the main electrode layer.
Piezoelectric layers and P-N junction depletion regions stabilize resonance frequency, reducing temperature-induced deviations without active power consumption.
A bulk acoustic wave resonator incorporates a planarization border in its inactive region to modify evanescent wave decay rates.
Temperature compensation structures offset thermal drift in bulk acoustic wave resonators, reducing power consumption and minimizing runaway heating.
Dielectric barriers block molding compound flow to create under-die cavities, eliminating complex lid attachment steps and reducing manufacturing costs.
Ion beam machining creates a thickness gradient on piezoelectric substrates to enable precise chemical mechanical polishing.
Graded oxygen concentration in the amorphous bonding layer reduces warping caused by thermal expansion mismatch during heating.