Ta or Ti enriched insulating layer controls plasma etching rates in magnetoresistive element fabrication.
Dual TMR films with orthogonal pinned layers utilize the full magnetoresistance range, resolving reduced sensitivity from limited field orientation.
A spin valve element integrates multiple magnetic groups to generate synchronized microwave oscillation signals.
Asymmetric TMR resistor counts in a Wheatstone bridge create a non-zero working bias field for magnetic sensing applications.
A magnetic sensing element employs a bilayer enhancement structure to increase the rate of change in magnetoresistance while suppressing Barkhausen noise.
Removing grain boundary material from a granular mask enables sub-10 nanometer feature patterning while reducing erosion during argon-free reactive ion etching.