Non-Surface-Active Detergent Solvents TRIZ Cases
- Wafer Meniscus Vapor Drying to Reduce CMP Residue Defects
A mixed solvent-cleaner-inert gas vapor over the wafer meniscus cuts CMP residue reattachment, streaking, and spotting during drying.
- 2-Heptanone Cleaning Solution for Uniform Wafer and Bevel Cleanliness
Controlling 2-heptanone, water, and carbonyl content improves wafer surface and bevel cleanliness while reducing substrate defects.
- Bio-Based Solvent Blend for Low-CO2e Industrial Cleaning
A blend of ethyl acetate and crude turpentine removes oils, carbon deposits, paints, and adhesives with lower flammability, toxicity, and CO2e.
- Sulfate Ester Cleaning Composition for Stable Photoresist Removal
A trace sulfate ester stabilizes alcohol solvent, limits impurity formation during storage, and improves photoresist residue cleaning.
- Fluorinated Cleaning Fluid Composition for Oily Dirt and Polymer Compatibility
A two-component fluorinated cleaning fluid combines oily-dirt removal, low surface tension, and polymer compatibility.
- Ru/W Selective Etching Composition Using Periodic Acid and Benzotriazole
A chemical composition removes ruthenium from substrates using periodic acid oxidation and quaternary ammonium surfactants.
- Azeotrope-like Solvent Blends for Vapor Degreasing
Solvent blends prevent fractionation during distillation to ensure safe vapor degreasing operations.