Vacuum Evaporation Coating TRIZ Cases
- Electrostatic Mask Support for Precise Large-Area Deposition
Opposing voltages between a grid member and mask create electrostatic support that prevents sagging and preserves deposition precision on large substrates.
- Voxel Film Formation Simulation for Faster Morphology Prediction
Probability-based representative particles and voxel states predict film quality and coverage faster than Monte Carlo-heavy deposition simulation.
- Diamond Coating on Cemented Carbide Using Al2O3 Diffusion Barriers
An Al2O3 or AlCrXN intermediate layer blocks binder diffusion and improves diamond CVD adhesion on cemented carbide.
- Deposition Mask Bridge Pattern for Warpage and Pixel Accuracy
A patterned inorganic bridge around the mask membrane limits thin-film stress and warpage, improving pixel position accuracy during deposition.
- Display Layer Deposition Source Layout for Uniform Refractive Index
Alternating multi-source deposition improves layer uniformity and refractive index control while cutting display manufacturing time and waste.
- Multilayer Vapor-Deposited Coating for Expanded Color Variety
Adjusting the second vapor-deposition layer thickness uses optical interference to expand the color palette of substrate coatings beyond single-layer options.
- Ferrule Through-Hole Structure for Low-Force Fiber Connection
A through-hole ferrule leaves a preset gap between fiber ends, reducing insertion force, wear, pollution, and optical transmission loss.
- Alternating Dielectric Optical Filter for NIR Detection
Multiple high- and low-index layers reduce ambient-light interference in NIR receivers, improving 3D image generation and gesture-recognition accuracy.
- Reflective Optical Metasurface Films Using Roll-to-Roll Fabrication
Roll-to-roll processing forms flexible polymer films beyond 300 mm while preserving nanostructured optical phase, amplitude, and polarization control.
- Mixed-Gas Chromium Nitride Films by Reactive Magnetron Sputtering
Reactive nitrogen–argon sputtering forms 500–1500 nm CrN films at moderate pressure, offering a lower-cost alternative to molecular beam epitaxy for cryogenic sensors.