2D Material Quantum Well Junctions via Van der Waals Assembly

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Solution Overview

Problem

Conventional quantum well structures require precise control of layer thickness and defect-free interfaces, which can be challenging to achieve using traditional epitaxial crystal growth techniques, limiting their performance and flexibility in electronic and optoelectronic devices.

Innovation Solution

A quantum well device is fabricated using two-dimensional semiconductor materials that adhere predominantly by van der Waals forces, allowing for simpler design, lower temperature processing, and defect-free interfaces, with tunable bandgaps and adjustable energy levels achieved through layer thickness control.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional epitaxial crystal growth techniques are used to manufacture quantum well structures, then the manufacturing process is well-established, but precise control of layer thickness and defect-free interfaces becomes challenging

Engineering Contradiction:
Improvelayer thickness control and interface qualityVSAvoidmanufacturing complexity
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent transitions from traditional epitaxial growth to mechanical exfoliation and van der Waals assembly, fundamentally changing the manufacturing parameters from thermal/chemical processes to mechanical manipulation and weak-force assembly. This enables atomic-layer precision without the complexity of epitaxial equipment and process control

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent introduces van der Waals force as an intermediary bonding mechanism between layers. This weak, non-covalent interaction allows for defect-free interfaces by avoiding the strong chemical bonds that cause lattice mismatch and defects in traditional epitaxial growth, while still providing sufficient adhesion for device operation

Inventive Principle:
Principle #24Intermediary (Mediator)

2Temperature

If conventional quantum well structures are used, then the device structure is well-defined, but the processing temperature must be high, limiting substrate choices

Engineering Contradiction:
Improveprocessing temperatureVSAvoidsubstrate flexibility
Core Design Contradiction:
TemperatureVSAdaptability or versatility

Solution Approach 1:

The patent replaces thermal processing with mechanical exfoliation and room-temperature assembly processes. By using mechanical force to peel and stack layers instead of thermal energy to grow them, the process temperature drops dramatically, enabling the use of temperature-sensitive substrates like flexible polymers and biological materials

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The two-dimensional materials self-assemble through van der Waals forces at room temperature without requiring external thermal energy input. The materials' intrinsic properties enable spontaneous layer stacking and alignment, eliminating the need for high-temperature processing and expanding substrate compatibility

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables high-speed carrier mobility, improved efficiency in photoemitters and photodetectors, and flexibility in achieving desired wavelengths and photon energy selectivity, suitable for various electronic and optoelectronic applications.

Implementation Method 1

a first layer of a first two-dimensional material, a second layer of a second two-dimensional material, and a third layer of a third two-dimensional material disposed between the first layer and second layer, wherein the first layer, the second layer, and the third layer are adhered predominantly by van der Waals force

Methodology Applied
Scientific EffectVan der Waals force: Van der Waals Force

Data Source

PatentUS10446705B2Two-dimensional layered material quantum well junction devices
Publication Date: 2019.10.15 KONICA MINOLTA SYSTEMS LABORATORY INC
  • US10446705B2 patent drawing
  • US10446705B2 patent drawing
  • US10446705B2 patent drawing

AI summary

A quantum well device includes a first layer of a first two-dimensional material, a second layer of a second two-dimensional material, and a third layer of a third two-dimensional material disposed between the first layer and second layer. The first layer, the second layer, and the third layer are adhered predominantly by van der Waals force.