2DEG Bottom-Electrode Resonators for High-Frequency RF Filters

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Solution Overview

Problem

Modern communication systems face challenges with radio frequency (RF) filters due to increased frequency bands and modes of communication, where existing RF filters with metal electrodes and sputtered piezoelectric materials suffer from limited quality and performance, especially at high frequencies.

Innovation Solution

The development of integrated circuit resonator devices with a two-dimensional electron gas (2DEG) bottom electrode and epitaxial piezoelectric materials, such as aluminum nitride and gallium nitride, which provide improved carrier transport and higher crystallographic quality, leading to enhanced performance and higher Q-factors in RF filters.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If metal electrodes and sputtered piezoelectric materials are used in RF filters, then the device structure is simple and manufacturing is easier, but the quality and performance are limited especially at high frequencies

Engineering Contradiction:
Improvequality and performanceVSAvoidmanufacturing complexity
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent employs composite materials by combining epitaxial piezoelectric materials (such as aluminum nitride and gallium nitride) with 2DEG bottom electrodes to create a multi-layered structure. This composite approach enables higher crystallographic quality and improved carrier transport, directly resolving the contradiction by achieving superior performance through material composition rather than simple metal electrodes.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent changes the fundamental parameters of the electrode and piezoelectric materials by transitioning from metal electrodes to 2DEG (two-dimensional electron gas) bottom electrodes, and from sputtered piezoelectric materials to epitaxial piezoelectric materials. This parameter change in material state and structure enables high-frequency operation while maintaining manufacturability through established epitaxial growth techniques.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If epitaxial piezoelectric materials and 2DEG bottom electrodes are used, then carrier transport and crystallographic quality are improved, but the device structure and manufacturing process become more complex

Engineering Contradiction:
Improvecarrier transport and crystallographic qualityVSAvoiddevice structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent segments the device into distinct functional layers including the 2DEG bottom electrode layer, epitaxial piezoelectric material layers, and top electrode structures. This segmentation allows each layer to be optimized independently for its specific function while maintaining overall device performance, thereby managing complexity through modular layer design.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The 2DEG (two-dimensional electron gas) serves as an intermediary between the bottom electrode and the epitaxial piezoelectric materials. This intermediary layer enables improved carrier transport and crystallographic quality by providing a suitable interface that facilitates electron mobility while supporting the growth of high-quality piezoelectric layers, thus resolving the complexity issue through functional mediation.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Manufacturing precision

If sputtered piezoelectric materials are used, then the manufacturing process is simpler, but the quality and Q-factors are limited

Engineering Contradiction:
Improvecrystallographic qualityVSAvoiddeposition method
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent replaces the mechanical sputtering deposition process with epitaxial growth methods for forming piezoelectric material layers. This substitution transitions from a physical vapor deposition mechanism to a chemical vapor deposition or molecular beam epitaxy process, enabling atomic-layer precision and monocrystalline quality that directly addresses the crystallographic quality limitation of sputtered materials.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the deposition parameters and material formation process by using epitaxial growth instead of sputtering. This parameter change in the manufacturing process enables precise control over crystal orientation, lattice matching, and material purity, thereby achieving superior crystallographic quality and higher Q-factors while maintaining manufacturing feasibility through controlled epitaxial processes.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

These devices achieve comparable or improved carrier transport and performance compared to metal electrode-based filters, with higher quality RF filters capable of handling high frequencies, such as 3 GHz or greater, and offer increased versatility in implementation.

Implementation Method 1

a second electrode including a two-dimensional electron gas (2DEG) region in the III-N layer

Methodology Applied
Scientific EffectTwo-dimensional electron gas (2DEG):

Implementation Method 2

a piezoelectric film may be used as a polarization layer

Methodology Applied
Scientific EffectPiezoelectric effect: Piezoelectric Effect

Implementation Method 3

the 2DEG is formed at a heterojunction of two epitaxial layers formed of group III-V materials

Methodology Applied
Scientific EffectHeterojunction:

Data Source

PatentUS10979012B2Single-flipped resonator devices with 2DEG bottom electrode
Publication Date: 2021.04.13 INTEL CORP
  • US10979012B2 patent drawing
  • US10979012B2 patent drawing
  • US10979012B2 patent drawing

AI summary

Techniques are disclosed for forming integrated circuit single-flipped resonator devices that include an electrode formed of a two-dimensional electron gas (2DEG). The disclosed resonator devices may be implemented with various group III-nitride (III-N) materials, and in some cases, the 2DEG may be formed at a heterojunction of two epitaxial layers each formed of III-N materials, such as a gallium nitride (GaN) layer and an aluminum nitride (AlN) layer. The 2DEG electrode may be able to achieve similar or increased carrier transport as compared to a resonator device having an electrode formed of metal. Additionally, in some embodiments where AlN is used as the piezoelectric material for the resonator device, the AlN may be epitaxially grown which may provide increased performance as compared to piezoelectric material that is deposited by traditional sputtering techniques.